Bipartisan group of lawmakers want the U.S. government to impose export controls on all wafer fab equipment bound to China except those that can be made locally and make allies do the following.

PremiumChinese fabs are quietly extending the useful life and performance of older ASML deep ultraviolet lithography systems by upgrading key subsystems, as Beijing pushes to sustain advanced chip output.

PremiumJapan’s Dai Nippon Printing (DNP) claims to have developed a nanoimprint lithography template capable of patterning logic with a feature size of 1.4nm, with plans for mass production in 2027.

PremiumBut chipmakers already know this empirically.

PremiumThink tank suggests tighter semiconductor controls amid rare earth tensions.

PremiumWith EUV locked out by sanctions, China is leaning on DUV multi-patterning and fledgling domestic scanners.

Huawei-linked Chinese startup has developed a nearly complete suite of semiconductor manufacturing tools to enable fully domestic chip production amid escalating export controls.

The Chinese Academy of Sciences has developed a light source that produces 193-nm DUV light, but it is years away from commercialization.

Without EUV, Chinese semiconductor industry is over a decade behind Taiwan, U.S.

Shipments of litho tools accelerate by a whopping 1,050% year-over-year.