DigitalMicrograph Software
DigitalMicrograph, also known as Gatan Microscopy Suite, drives your digital cameras and surrounding components to support key applications including tomography, in-situ, spectrum and diffraction imaging, plus more.
DigitalMicrograph, also known as Gatan Microscopy Suite, drives your digital cameras and surrounding components to support key applications including tomography, in-situ, spectrum and diffraction imaging, plus more.
DigitalMicrograph® is the industry standard software for (scanning) transmission electron microscope ((S)TEM) experimental control and analysis, which people also know as Gatan Microscopy Suite®. DigitalMicrograph 3 is completely revamped and uses a new, much-simplified user interface. DigitalMicrograph 3 enables novice users to easily perform basic research applications, while it continues to provide the deep access and control highly experienced microscopists are used to and demand.
Recent highlights:
Selected benefits of DigitalMicrograph software:
Real-time in-situ insights: Dynamic mapping with 4D STEM
4D STEM orientation mapping in DigitalMicrograph with STEMx OIM
DPC in DigitalMicrograph
In-situ data processing with GMS 3.4: Data filtering
In-Situ Data Processing with GMS 3.4: Alignment Filters
MLLS Internal References
In-Situ Data Processing with GMS 3.4: Drift Correction_ROI
In-Situ Data Processing with GMS 3.4: Drift Correction_Full Frame
Spectrum Imaging Picker and Slice Tool
Extract line profile from spectrum imageNondeterministic dynamics in the η-to-θ phase transition of alumina nanoparticles
Sakakibara, M.; Hanaya, M.; Nakamuro, T.; Nakamura, E.
Hogan-Lamarre, P.; Luo, Y.; Bücker, R.; Miller, R. J. D.; Zou, X.
Yang, T.; Xua, H.; Zoua, X.
Antiferroelectric PbSnO3 epitaxial thin films
Lai, Y. H.; Zheng, J. D.; Lu, S. C.; Wang, Y. K.; Duan, C. G.; Yu, P.; Zheng, Y. Z.; Huang, R.; Chang, L.; Chu, M. W.; Hsu, J. H.; Chu, Y. H.
Mg segregation at inclined facets of pyramidal inversion domains in GaN:Mg
Persson, A. R.; Papamichail, A.; Darakchieva, V.
Organic crystal growth: Hierarchical self-assembly involving nonclassical and classical steps
Biran, I.; Rosenne, S.; Weissman, H.; Tsarfati, Y.; Houben, L.; Rybtchinski. B.
Vasculogenesis in kidney organoids upon transplantation
Koning, M.; Dumas, S. J.; Avramut, M. C.; Koning, R. I.; Meta, E.; Lievers, E. ; Wiersma, L. E.; Borri, M.; Liang, X.; Xie, L.; Liu, P.; Chen, F.; Lin, L.; Luo, Y.; Mulder, J.; Spijker, H. S.; Jaffredo, T.; van den Berg, B. M.; Carmeliet, P.; van den Berg. C. W.; Rabelink, T. J.
Zanetta, P. -M.
Mozgawa, B.; Sobańska, K.; Grybo, J.; Pietrzy, P.
Laser-induced graphenization of PDMS as flexible electrode for microsupercapacitors
Zaccagnini, P.; Ballin, C.; Fontana, M.; Parmeggiani, M.; Bianco, S.; Stassi, S.; Pedico, A.; Ferrero, S.; Lamberti, A.
A simple pressure-assisted method for MicroED specimen preparation
Zhao, J.; Xu, H.; Lebrette, H.; Carroni, M.; Taberman, H.; Hogbom, M.; Zou, X.
So, H.; Lee, R. W.; Hong, S. T.; Kim, K. -H.
Verification of water presence in graphene liquid cells
Keskin, S.; Pawell, C.; de Jonge, N.
Revalorization of agro-industrial waste as a catalyst source for production of biofuels
Ledesma, B.; Beltramone, A.
Atomic layer deposition of photoelectrocatalytic material on 3D-printed nanocarbon structures
Ng, S.; Zazpe, R.; Rodriguez-Pereira, H.; Michalička, J.; Macak, J. M.; Pumera, M.
Ag droplets nano-shape design on SiC: Study on wetting and energetics
Censabella, M.; Irrera, D.; Boscarino, S.; Piccitto, G.; Grimaldi, M. G.; Ruffino, F.
Dye-sensitized solar cell with plasmonic gold nanoparticles modified photoanode
Kabir, D.; Forhad, T.; Ghann, W.; Richards, B.; Rahman, M. M.; Uddin, Md. N.; Rakib, R. J.; Shariare, M. H.; Chowdhury, F. I.; Rabbani, M. M.; Bahadur, N. M.; Uddin, J.
Reddy, K. H. P.; Kim, B. -S.; Lam, S. S.; Jung, S. -C.; Song, J.; Park, Y. -K.
Key role of exopolysaccharide on di-butyl phthalate adsorbing by Lactobacillus plantarum CGMCC18980
Fan, Y. -H.; Shen, Y. -L.; Lin, Z. -W.; Zhou, Y.; Ye, B. -C.
Subramanian, V.; Rodemoyer, B.; Shastri, V.; Rasmussen, L. J.; Desler, C.; Schmidt, K. H.
Sulym, I.; Wiśniewska, M.; Storozhuk, L.; Terpilowski, K.; Sternik, D.; Borysenko, M.; Derylo-Marczewska, A.
Oxygen evolution reaction in Ba0.5Sr0.5Co0.8Fe0.2O3‑δ aided by intrinsic Co/Fe spinel-like surface
Shen, T. -H.; Spillane, L.; Vavra, J.; Pham, T. H. M.; Peng, J.; Shao-Horn, Y.; Tileli, V.
Download Software Learn more about the most recent version
Digital imaging software | |
| Latitude D | Delivers the efficiency and high-throughput data collection that you expect from Latitude software to MicroED studies. |
| Latitude S | Sets a new standard for the efficient, high-throughput collection of low-dose, single-particle, cryo-EM datasets from Gatan’s cameras |
| In-Situ Explorer | Full in-situ control and data handling within DigitalMicrograph software. Module includes eaSI™ proprietary technology. |
| TEM AutoTune | Automates adjustment of focus, astigmatism, and misalignment |
| DigitalMontage® | Stage and optics control so you can seamlessly stitch images together |
| HREM AutoTune | Facilitate your HREM assays by automatically adjusting the critical imaging parameters of a TEM microscope focus, stigmation, and beam tilt |
| DIFPACK | Diffraction analysis package to automate the selection area of your electron diffraction (SAED) patterns and high-resolution lattice images of crystalline samples. Module includes eaSI proprietary technology. |
| HoloWorks | Computes live phase images from live holograms, allows for live phase unwrapping, and provides image stack acquisition and stack processing (including sample and interference-fringe drift correction), enabling high-resolution phase images at the 2pi/1000 level |
EELS, EFTEM & STEM software | |
| STEM Diffraction Imaging | Allows you to acquire diffraction patterns pixel-by-pixel as a 4D data set. Module includes eaSI proprietary technology. |
| Advanced AutoFilter | Automates your multi-element EELS and EFTEM data acquisition experiments |
EELS App Scripts EELS.info WhatIsCL.info DigitalMicrograph Tips & Tricks
Gatan’s DigitalMicrograph application and Gatan Microscopy Suite (GMS) software suite, including all the plug-ins and modules developed by Gatan, do not use the Log4j framework and is therefore not exposed to the Log4Shell vulnerability.
DigitalMicrograph makes only very limited use of third-party software modules and only uses one that actually installs a Java Virtual Machine, which is necessary to run Log4j. This 3rd party module is developed by National Instruments. Gatan uses a National Instruments card to integrate the JEOL EDS detector, and NI’s statement is available here. National Instruments has indicated that the product we use is not affected.
