Movatterモバイル変換


[0]ホーム

URL:


Jump to content
WikipediaThe Free Encyclopedia
Search

Novolak

From Wikipedia, the free encyclopedia
Lightweight aldehyde- and phenol-derived polymer
Segment of novolak, illustrating the predominance of cresol subunits and presence ofcrosslinking.

Novolaks (sometimes: novolacs) are low molecular weightpolymers derived fromphenols andformaldehyde. They are related toBakelite, which is more highly crosslinked. The term comes from Swedish "lack" for lacquer and Latin "novo" for new, since these materials were envisioned to replace natural lacquers such ascopal resin.

Typically novolaks are prepared by the condensation of phenol or a mixture of p- and m-cresol with formaldehyde (as formalin). The reaction is acid catalyzed.Oxalic acid is often used because it can be subsequently removed bythermal decomposition. Novolaks have adegree of polymerization of approximately 20-40. The branching density, determined by the processing conditions, m- vs p-cresol ratio, as well as CH2O/cresol ratio is typically around 15%.[1]

Novolaks are especially important inmicroelectronics where they are used asphotoresist materials.[2][3] They are also used astackifiers in rubber.

See also

[edit]

References

[edit]
  1. ^Ralph Dammel (1993). "Basic Chemistry of Novolaks".Diazonaphthoquinone-based Resists. Int. Soc. Optical Engineering.doi:10.1117/3.2265072.ch3.ISBN 9780819410191.
  2. ^Hinsberg, W. D.; Wallraff, G. M. (2005). "Lithographic Resists".Kirk-Othmer Encyclopedia of Chemical Technology. New York: John Wiley.doi:10.1002/0471238961.1209200808091419.a01.pub2.ISBN 9780471238966.
  3. ^Integrated Laboratory Systems (January 2006).Chemical Information Review Document for Diazonaphthoquinone Derivatives Used in Photoresists(PDF) (Report). National Toxicology Program.
Retrieved from "https://en.wikipedia.org/w/index.php?title=Novolak&oldid=1263558518"
Categories:
Hidden categories:

[8]ページ先頭

©2009-2025 Movatter.jp