Uh et al., 1997
ViewPDF| Publication | Publication Date | Title |
|---|---|---|
| Uh et al. | Process design and emission properties of gated n+ polycrystalline silicon field emitter arrays for flat-panel display applications | |
| US5814924A (en) | Field emission display device having TFT switched field emission devices | |
| US5229682A (en) | Field electron emission device | |
| US7042148B2 (en) | Field emission display having reduced power requirements and method | |
| US20070052339A1 (en) | Electron emitters with dopant gradient | |
| US5228878A (en) | Field electron emission device production method | |
| Temple et al. | Fabrication of column‐based silicon field emitter arrays for enhanced performance and yield | |
| JPH0594762A (en) | Field emission type electron source and manufacture thereof | |
| US4986787A (en) | Method of making an integrated component of the cold cathode type | |
| US5607335A (en) | Fabrication of electron-emitting structures using charged-particle tracks and removal of emitter material | |
| Oh et al. | Fabrication of metal field emitter arrays for low voltage and high current operation | |
| Uh et al. | Fabrication and characterization of gated n/sup+/polycrystalline silicon field emitter arrays | |
| Lim et al. | Investigation of field emission characteristics for Si-base materials: Titanium silicide, poly-Si, and single crystal Si | |
| JP3406895B2 (en) | Field emission cold cathode device, method of manufacturing the same, and vacuum micro device | |
| Albin et al. | Diamond coated silicon field emitter array | |
| Lee et al. | Fabrication and characterization of silicon field emitter arrays with focusing electrode by the chemical mechanical polishing process | |
| US5516404A (en) | Method for manufacturing a micro-electronic component having an electrically conductive tip of doped silicon | |
| Kim et al. | Fabrication of silicon field emitters by forming porous silicon | |
| Lee et al. | New approach to manufacturing field emitter arrays with sub‐half‐micron gate apertures | |
| Lee et al. | A new fabrication process of field emitter arrays with submicron gate apertures using local oxidation of silicon | |
| Uh et al. | New fabrication method of silicon field emitter arrays using thermal oxidation | |
| Gray et al. | Silicon field‐emitter arrays for cathodoluminescent flat‐panel displays | |
| Lee et al. | Fabrication and characterization of volcano-shaped field emitters surrounded by planar gates | |
| KR100852764B1 (en) | Manufacturing method of a semiconductor vacuum tube | |
| Matsuzaki et al. | Characteristics of Silicon‐Field Emitter Arrays Fabricated by Using Wafers Separated by Implantation of Oxygen |