Lee et al., 2009
| Publication | Publication Date | Title |
|---|---|---|
| Lee et al. | Low‐temperature atomic layer deposition of copper metal thin films: Self‐limiting surface reaction of copper dimethylamino‐2‐propoxide with diethylzinc | |
| US11624112B2 (en) | Synthesis and use of precursors for ALD of molybdenum or tungsten containing thin films | |
| Kaloyeros et al. | Review—Cobalt Thin Films: Trends in Processing Technologies and Emerging Applications | |
| Klesko et al. | Low temperature thermal atomic layer deposition of cobalt metal films | |
| Knisley et al. | Precursors and chemistry for the atomic layer deposition of metallic first row transition metal films | |
| Kalutarage et al. | Low-temperature atomic layer deposition of copper films using borane dimethylamine as the reducing co-reagent | |
| US10577466B2 (en) | Ordered nanoscale domains by infiltration of block copolymers | |
| Gordon et al. | Trends in copper precursor development for CVD and ALD applications | |
| George | Atomic layer deposition: an overview | |
| Kerrigan et al. | Low temperature, selective atomic layer deposition of cobalt metal films using Bis (1, 4-di-tert-butyl-1, 3-diazadienyl) cobalt and alkylamine precursors | |
| Leskelä et al. | Atomic layer deposition chemistry: recent developments and future challenges | |
| Li et al. | Atomic layer deposition of ultrathin copper metal films from a liquid copper (I) amidinate precursor | |
| Kerrigan et al. | Low temperature, selective atomic layer deposition of nickel metal thin films | |
| Li et al. | Vapor deposition of ruthenium from an amidinate precursor | |
| US8084087B2 (en) | Fabrication method of size-controlled, spatially distributed nanostructures by atomic layer deposition | |
| Kim et al. | High quality area-selective atomic layer deposition Co using ammonia gas as a reactant | |
| Makela et al. | Studies on thermal atomic layer deposition of silver thin films | |
| EP3366808B1 (en) | Method of forming layers on a substrate | |
| KR20180063852A (en) | Atomic layer deposition of rhenium containing thin films | |
| Hong et al. | Atomic layer deposition of Ru thin films using a Ru (0) metallorganic precursor and O2 | |
| Provine et al. | Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors | |
| Zanders et al. | Cobalt metal ALD: Understanding the mechanism and role of zinc alkyl precursors as reductants for low-resistivity Co thin films | |
| KR20180040499A (en) | Synthesis and use of precursors for vapor deposition of tungsten containing thin films | |
| Mäkelä et al. | Potential gold (I) precursors evaluated for atomic layer deposition | |
| Park et al. | Atomic layer deposition of copper nitride film and its application to copper seed layer for electrodeposition |