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WO2014124857A3 - Power supply arrangement for supplying industrial processes with power - Google Patents

Power supply arrangement for supplying industrial processes with powerDownload PDF

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Publication number
WO2014124857A3
WO2014124857A3PCT/EP2014/052282EP2014052282WWO2014124857A3WO 2014124857 A3WO2014124857 A3WO 2014124857A3EP 2014052282 WEP2014052282 WEP 2014052282WWO 2014124857 A3WO2014124857 A3WO 2014124857A3
Authority
WO
WIPO (PCT)
Prior art keywords
direct
current
power
converter
output
Prior art date
Application number
PCT/EP2014/052282
Other languages
French (fr)
Other versions
WO2014124857A2 (en
Inventor
Pawel Ozimek
Andrzej Klimczak
Krzysztof Ruda
Original Assignee
Trumpf Huettinger Sp. Z O.O.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Trumpf Huettinger Sp. Z O.O.filedCriticalTrumpf Huettinger Sp. Z O.O.
Publication of WO2014124857A2publicationCriticalpatent/WO2014124857A2/en
Publication of WO2014124857A3publicationCriticalpatent/WO2014124857A3/en

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Abstract

A power supply arrangement (10, 100) for supplying industrial processes with power comprises: a. a direct-current-converter (13) which has an input (12) for connection to a direct-current voltage and which provides an intermediate circuit voltage at the output (18) thereof; b. a converter (23) which is connected to the output (18) of the direct-current-converter (13) and which is configured to produce an alternating-current voltage or a pulsed direct-current voltage and to output it at the output (18) thereof, c. the output (18) of the direct-current-converter being connected to the input (12) of the direct-current-converter (13) directly by means of a non-linear element (40) or a series connection comprising a plurality of non-linear elements (102, 103).
PCT/EP2014/0522822013-02-142014-02-06Power supply arrangement for supplying industrial processes with powerWO2014124857A2 (en)

Applications Claiming Priority (2)

Application NumberPriority DateFiling DateTitle
DE102013202428.22013-02-14
DE102013202428.2ADE102013202428A1 (en)2013-02-142013-02-14 Power supply arrangement for powering industrial processes

Publications (2)

Publication NumberPublication Date
WO2014124857A2 WO2014124857A2 (en)2014-08-21
WO2014124857A3true WO2014124857A3 (en)2015-05-07

Family

ID=50070549

Family Applications (1)

Application NumberTitlePriority DateFiling Date
PCT/EP2014/052282WO2014124857A2 (en)2013-02-142014-02-06Power supply arrangement for supplying industrial processes with power

Country Status (2)

CountryLink
DE (1)DE102013202428A1 (en)
WO (1)WO2014124857A2 (en)

Cited By (21)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US11462389B2 (en)2020-07-312022-10-04Applied Materials, Inc.Pulsed-voltage hardware assembly for use in a plasma processing system
US11476145B2 (en)2018-11-202022-10-18Applied Materials, Inc.Automatic ESC bias compensation when using pulsed DC bias
US11476090B1 (en)2021-08-242022-10-18Applied Materials, Inc.Voltage pulse time-domain multiplexing
US11495470B1 (en)2021-04-162022-11-08Applied Materials, Inc.Method of enhancing etching selectivity using a pulsed plasma
US11508554B2 (en)2019-01-242022-11-22Applied Materials, Inc.High voltage filter assembly
US11569066B2 (en)2021-06-232023-01-31Applied Materials, Inc.Pulsed voltage source for plasma processing applications
US11694876B2 (en)2021-12-082023-07-04Applied Materials, Inc.Apparatus and method for delivering a plurality of waveform signals during plasma processing
US11699572B2 (en)2019-01-222023-07-11Applied Materials, Inc.Feedback loop for controlling a pulsed voltage waveform
US11791138B2 (en)2021-05-122023-10-17Applied Materials, Inc.Automatic electrostatic chuck bias compensation during plasma processing
US11798790B2 (en)2020-11-162023-10-24Applied Materials, Inc.Apparatus and methods for controlling ion energy distribution
US11810760B2 (en)2021-06-162023-11-07Applied Materials, Inc.Apparatus and method of ion current compensation
US11901157B2 (en)2020-11-162024-02-13Applied Materials, Inc.Apparatus and methods for controlling ion energy distribution
US11948780B2 (en)2021-05-122024-04-02Applied Materials, Inc.Automatic electrostatic chuck bias compensation during plasma processing
US11967483B2 (en)2021-06-022024-04-23Applied Materials, Inc.Plasma excitation with ion energy control
US11972924B2 (en)2022-06-082024-04-30Applied Materials, Inc.Pulsed voltage source for plasma processing applications
US11984306B2 (en)2021-06-092024-05-14Applied Materials, Inc.Plasma chamber and chamber component cleaning methods
US12106938B2 (en)2021-09-142024-10-01Applied Materials, Inc.Distortion current mitigation in a radio frequency plasma processing chamber
US12148595B2 (en)2021-06-092024-11-19Applied Materials, Inc.Plasma uniformity control in pulsed DC plasma chamber
US12198966B2 (en)2017-09-202025-01-14Applied Materials, Inc.Substrate support with multiple embedded electrodes
US12272524B2 (en)2022-09-192025-04-08Applied Materials, Inc.Wideband variable impedance load for high volume manufacturing qualification and on-site diagnostics
US12315732B2 (en)2022-06-102025-05-27Applied Materials, Inc.Method and apparatus for etching a semiconductor substrate in a plasma etch chamber

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
DE102014220094A1 (en)*2014-10-022016-04-07TRUMPF Hüttinger GmbH + Co. KG Method of operating a MF power generator and MF power generator
EP3035365A1 (en)2014-12-192016-06-22TRUMPF Huettinger Sp. Z o. o.Method of detecting an arc occurring during the power supply of a plasma process, control unit for a plasma power supply, and plasma power supply

Citations (3)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US3737755A (en)*1972-03-221973-06-05Bell Telephone Labor IncRegulated dc to dc converter with regulated current source driving a nonregulated inverter
JPH04271283A (en)*1991-02-251992-09-28Okuma Mach Works LtdHigh frequency power supply
US5418707A (en)*1992-04-131995-05-23The United States Of America As Represented By The United States Department Of EnergyHigh voltage dc-dc converter with dynamic voltage regulation and decoupling during load-generated arcs

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
DE19937859C2 (en)*1999-08-132003-06-18Huettinger Elektronik Gmbh Electrical supply unit for plasma systems

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US3737755A (en)*1972-03-221973-06-05Bell Telephone Labor IncRegulated dc to dc converter with regulated current source driving a nonregulated inverter
JPH04271283A (en)*1991-02-251992-09-28Okuma Mach Works LtdHigh frequency power supply
US5418707A (en)*1992-04-131995-05-23The United States Of America As Represented By The United States Department Of EnergyHigh voltage dc-dc converter with dynamic voltage regulation and decoupling during load-generated arcs

Cited By (33)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US12198966B2 (en)2017-09-202025-01-14Applied Materials, Inc.Substrate support with multiple embedded electrodes
US11476145B2 (en)2018-11-202022-10-18Applied Materials, Inc.Automatic ESC bias compensation when using pulsed DC bias
US12057292B2 (en)2019-01-222024-08-06Applied Materials, Inc.Feedback loop for controlling a pulsed voltage waveform
US11699572B2 (en)2019-01-222023-07-11Applied Materials, Inc.Feedback loop for controlling a pulsed voltage waveform
US11508554B2 (en)2019-01-242022-11-22Applied Materials, Inc.High voltage filter assembly
US11848176B2 (en)2020-07-312023-12-19Applied Materials, Inc.Plasma processing using pulsed-voltage and radio-frequency power
US11462388B2 (en)2020-07-312022-10-04Applied Materials, Inc.Plasma processing assembly using pulsed-voltage and radio-frequency power
US12237148B2 (en)2020-07-312025-02-25Applied Materials, Inc.Plasma processing assembly using pulsed-voltage and radio-frequency power
US11462389B2 (en)2020-07-312022-10-04Applied Materials, Inc.Pulsed-voltage hardware assembly for use in a plasma processing system
US11776789B2 (en)2020-07-312023-10-03Applied Materials, Inc.Plasma processing assembly using pulsed-voltage and radio-frequency power
US12183557B2 (en)2020-11-162024-12-31Applied Materials, Inc.Apparatus and methods for controlling ion energy distribution
US11798790B2 (en)2020-11-162023-10-24Applied Materials, Inc.Apparatus and methods for controlling ion energy distribution
US11901157B2 (en)2020-11-162024-02-13Applied Materials, Inc.Apparatus and methods for controlling ion energy distribution
US11495470B1 (en)2021-04-162022-11-08Applied Materials, Inc.Method of enhancing etching selectivity using a pulsed plasma
US11948780B2 (en)2021-05-122024-04-02Applied Materials, Inc.Automatic electrostatic chuck bias compensation during plasma processing
US11791138B2 (en)2021-05-122023-10-17Applied Materials, Inc.Automatic electrostatic chuck bias compensation during plasma processing
US12347647B2 (en)2021-06-022025-07-01Applied Materials, Inc.Plasma excitation with ion energy control
US11967483B2 (en)2021-06-022024-04-23Applied Materials, Inc.Plasma excitation with ion energy control
US12394596B2 (en)2021-06-092025-08-19Applied Materials, Inc.Plasma uniformity control in pulsed DC plasma chamber
US11984306B2 (en)2021-06-092024-05-14Applied Materials, Inc.Plasma chamber and chamber component cleaning methods
US12148595B2 (en)2021-06-092024-11-19Applied Materials, Inc.Plasma uniformity control in pulsed DC plasma chamber
US11810760B2 (en)2021-06-162023-11-07Applied Materials, Inc.Apparatus and method of ion current compensation
US11887813B2 (en)2021-06-232024-01-30Applied Materials, Inc.Pulsed voltage source for plasma processing
US12125673B2 (en)2021-06-232024-10-22Applied Materials, Inc.Pulsed voltage source for plasma processing applications
US11569066B2 (en)2021-06-232023-01-31Applied Materials, Inc.Pulsed voltage source for plasma processing applications
US11476090B1 (en)2021-08-242022-10-18Applied Materials, Inc.Voltage pulse time-domain multiplexing
US12261019B2 (en)2021-08-242025-03-25Applied Materials, Inc.Voltage pulse time-domain multiplexing
US12106938B2 (en)2021-09-142024-10-01Applied Materials, Inc.Distortion current mitigation in a radio frequency plasma processing chamber
US11694876B2 (en)2021-12-082023-07-04Applied Materials, Inc.Apparatus and method for delivering a plurality of waveform signals during plasma processing
US12368020B2 (en)2022-06-082025-07-22Applied Materials, Inc.Pulsed voltage source for plasma processing applications
US11972924B2 (en)2022-06-082024-04-30Applied Materials, Inc.Pulsed voltage source for plasma processing applications
US12315732B2 (en)2022-06-102025-05-27Applied Materials, Inc.Method and apparatus for etching a semiconductor substrate in a plasma etch chamber
US12272524B2 (en)2022-09-192025-04-08Applied Materials, Inc.Wideband variable impedance load for high volume manufacturing qualification and on-site diagnostics

Also Published As

Publication numberPublication date
WO2014124857A2 (en)2014-08-21
DE102013202428A1 (en)2014-08-14

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