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WO2004013693A3 - Scatterometry alignment for imprint lithography - Google Patents

Scatterometry alignment for imprint lithographyDownload PDF

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Publication number
WO2004013693A3
WO2004013693A3PCT/US2003/023948US0323948WWO2004013693A3WO 2004013693 A3WO2004013693 A3WO 2004013693A3US 0323948 WUS0323948 WUS 0323948WWO 2004013693 A3WO2004013693 A3WO 2004013693A3
Authority
WO
WIPO (PCT)
Prior art keywords
imprint lithography
scatterometry
alignment
liquid
template
Prior art date
Application number
PCT/US2003/023948
Other languages
French (fr)
Other versions
WO2004013693A2 (en
Inventor
Michael P C Watts
Ian Mcmackin
Sidlgata V Sreenivasan
Byung-Jin Choi
Ronald D Voisin
Norman E Schumaker
Original Assignee
Molecular Imprints Inc
Michael P C Watts
Ian Mcmackin
Sidlgata V Sreenivasan
Byung-Jin Choi
Ronald D Voisin
Norman E Schumaker
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/210,894external-prioritypatent/US7070405B2/en
Priority claimed from US10/210,780external-prioritypatent/US6916584B2/en
Priority claimed from US10/210,785external-prioritypatent/US7027156B2/en
Application filed by Molecular Imprints Inc, Michael P C Watts, Ian Mcmackin, Sidlgata V Sreenivasan, Byung-Jin Choi, Ronald D Voisin, Norman E SchumakerfiledCriticalMolecular Imprints Inc
Priority to AU2003261317ApriorityCriticalpatent/AU2003261317A1/en
Priority to JP2004526254Aprioritypatent/JP2006516065A/en
Priority to EP03767009Aprioritypatent/EP1573395A4/en
Publication of WO2004013693A2publicationCriticalpatent/WO2004013693A2/en
Publication of WO2004013693A3publicationCriticalpatent/WO2004013693A3/en

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Abstract

Described are methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. Alignment of the template with a previously formed layer on a substrate, in one embodiment, is accomplished by using scatterometry.
PCT/US2003/0239482002-08-012003-07-31Scatterometry alignment for imprint lithographyWO2004013693A2 (en)

Priority Applications (3)

Application NumberPriority DateFiling DateTitle
AU2003261317AAU2003261317A1 (en)2002-08-012003-07-31Scatterometry alignment for imprint lithography
JP2004526254AJP2006516065A (en)2002-08-012003-07-31 Scatter measurement alignment for imprint lithography
EP03767009AEP1573395A4 (en)2002-08-012003-07-31Scatterometry alignment for imprint lithography

Applications Claiming Priority (6)

Application NumberPriority DateFiling DateTitle
US10/210,7802002-08-01
US10/210,894US7070405B2 (en)2002-08-012002-08-01Alignment systems for imprint lithography
US10/210,8942002-08-01
US10/210,7852002-08-01
US10/210,780US6916584B2 (en)2002-08-012002-08-01Alignment methods for imprint lithography
US10/210,785US7027156B2 (en)2002-08-012002-08-01Scatterometry alignment for imprint lithography

Publications (2)

Publication NumberPublication Date
WO2004013693A2 WO2004013693A2 (en)2004-02-12
WO2004013693A3true WO2004013693A3 (en)2006-01-19

Family

ID=31499238

Family Applications (1)

Application NumberTitlePriority DateFiling Date
PCT/US2003/023948WO2004013693A2 (en)2002-08-012003-07-31Scatterometry alignment for imprint lithography

Country Status (6)

CountryLink
EP (1)EP1573395A4 (en)
JP (2)JP2006516065A (en)
KR (1)KR20050026088A (en)
AU (1)AU2003261317A1 (en)
TW (1)TWI266970B (en)
WO (1)WO2004013693A2 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US7027156B2 (en)2002-08-012006-04-11Molecular Imprints, Inc.Scatterometry alignment for imprint lithography
US7037639B2 (en)2002-05-012006-05-02Molecular Imprints, Inc.Methods of manufacturing a lithography template
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US7692771B2 (en)2005-05-272010-04-06Asml Netherlands B.V.Imprint lithography
US7708924B2 (en)2005-07-212010-05-04Asml Netherlands B.V.Imprint lithography

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Cited By (8)

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US7098572B2 (en)1999-10-292006-08-29Board Of Regents, The University Of Texas SystemApparatus to control displacement of a body spaced-apart from a surface
US7037639B2 (en)2002-05-012006-05-02Molecular Imprints, Inc.Methods of manufacturing a lithography template
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Also Published As

Publication numberPublication date
AU2003261317A8 (en)2004-02-23
TWI266970B (en)2006-11-21
TW200406651A (en)2004-05-01
EP1573395A4 (en)2010-09-29
AU2003261317A1 (en)2004-02-23
JP5421221B2 (en)2014-02-19
JP2011101016A (en)2011-05-19
EP1573395A2 (en)2005-09-14
WO2004013693A2 (en)2004-02-12
KR20050026088A (en)2005-03-14
JP2006516065A (en)2006-06-15

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