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WO1999012184A3 - Microwave power applicator for generating reactive chemical species from gaseous reagent species - Google Patents

Microwave power applicator for generating reactive chemical species from gaseous reagent species
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Publication number
WO1999012184A3
WO1999012184A3PCT/US1998/018474US9818474WWO9912184A3WO 1999012184 A3WO1999012184 A3WO 1999012184A3US 9818474 WUS9818474 WUS 9818474WWO 9912184 A3WO9912184 A3WO 9912184A3
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WO
WIPO (PCT)
Prior art keywords
substrate
plasma
microwave
generating
species
Prior art date
Application number
PCT/US1998/018474
Other languages
French (fr)
Other versions
WO1999012184A2 (en
Inventor
Jeff Albom
Original Assignee
Alcad Pro Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alcad Pro IncfiledCriticalAlcad Pro Inc
Publication of WO1999012184A2publicationCriticalpatent/WO1999012184A2/en
Publication of WO1999012184A3publicationCriticalpatent/WO1999012184A3/en

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Abstract

A plasma generating device including a microwave applicator for generating a microwave electric field in the plasma chamber, a plasma chamber for generation of plasma, gas sources for supplying a variety of gases to the plasma generating and reaction chambers, a reaction chamber having a support structure for supporting a substrate. The microwave applicator contains one or more individual microwave generating sources that provide microwave energy into the plasma chamber through a dielectric vacuum window via an array of radiating antenna structures. The use of an array of antennae creates a more uniform field over the substrate to be treated, thereby increasing the consistency of the coating on the substrate. An optional substrate heating system consisting of either an infrared illuminating system for radiating the substrate with thermal energy or a heated platen in contact with the substrate, and a metal grid disposed between the plasma and reaction chambers may also be used.
PCT/US1998/0184741997-09-051998-09-05Microwave power applicator for generating reactive chemical species from gaseous reagent speciesWO1999012184A2 (en)

Applications Claiming Priority (2)

Application NumberPriority DateFiling DateTitle
US5806497P1997-09-051997-09-05
US60/058,0641997-09-05

Publications (2)

Publication NumberPublication Date
WO1999012184A2 WO1999012184A2 (en)1999-03-11
WO1999012184A3true WO1999012184A3 (en)1999-05-27

Family

ID=22014438

Family Applications (1)

Application NumberTitlePriority DateFiling Date
PCT/US1998/018474WO1999012184A2 (en)1997-09-051998-09-05Microwave power applicator for generating reactive chemical species from gaseous reagent species

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WO (1)WO1999012184A2 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
EP1739717A1 (en)*2005-06-302007-01-03Alter S.r.l.Plasma generator with a slot antenna
US7485827B2 (en)2006-07-212009-02-03Alter S.R.L.Plasma generator
US10748745B2 (en)*2016-08-162020-08-18Applied Materials, Inc.Modular microwave plasma source
US9812295B1 (en)2016-11-152017-11-07Lyten, Inc.Microwave chemical processing
US9997334B1 (en)2017-02-092018-06-12Lyten, Inc.Seedless particles with carbon allotropes
US9767992B1 (en)2017-02-092017-09-19Lyten, Inc.Microwave chemical processing reactor
US10920035B2 (en)2017-03-162021-02-16Lyten, Inc.Tuning deformation hysteresis in tires using graphene
EP3596163A4 (en)2017-03-162021-01-13Lyten, Inc. CARBON AND ELASTOMER INTEGRATION
WO2019126196A1 (en)2017-12-222019-06-27Lyten, Inc.Structured composite materials
SG11202006088XA (en)2018-01-042020-07-29Lyten IncResonant gas sensor
US10644368B2 (en)2018-01-162020-05-05Lyten, Inc.Pressure barrier comprising a transparent microwave window providing a pressure difference on opposite sides of the window
DE102020113578A1 (en)*2020-05-192021-11-25Muegge Gmbh Microwave treatment facility

Citations (8)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US4940015A (en)*1988-07-301990-07-10Kabushiki Kaisha Kobe Seiko ShoPlasma reactor for diamond synthesis
US5202095A (en)*1988-12-271993-04-13Matsushita Electric Industrial Co., Ltd.Microwave plasma processor
GB2265635A (en)*1992-03-311993-10-06Commissariat Energie AtomiqueCathodic sputtering device comprising at least four targets using plasma produced by microwaves
JPH06103908A (en)*1992-09-211994-04-15Nissin Electric Co LtdMicrowave ion source
US5370765A (en)*1989-03-091994-12-06Applied Microwave Plasma Concepts, Inc.Electron cyclotron resonance plasma source and method of operation
EP0674334A1 (en)*1994-03-181995-09-27Hitachi, Ltd.Plasma processing method and apparatus
JPH09181052A (en)*1995-05-261997-07-11Tokyo Electron LtdPlasma treating apparatus
US5698036A (en)*1995-05-261997-12-16Tokyo Electron LimitedPlasma processing apparatus

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US4940015A (en)*1988-07-301990-07-10Kabushiki Kaisha Kobe Seiko ShoPlasma reactor for diamond synthesis
US5202095A (en)*1988-12-271993-04-13Matsushita Electric Industrial Co., Ltd.Microwave plasma processor
US5370765A (en)*1989-03-091994-12-06Applied Microwave Plasma Concepts, Inc.Electron cyclotron resonance plasma source and method of operation
GB2265635A (en)*1992-03-311993-10-06Commissariat Energie AtomiqueCathodic sputtering device comprising at least four targets using plasma produced by microwaves
JPH06103908A (en)*1992-09-211994-04-15Nissin Electric Co LtdMicrowave ion source
EP0674334A1 (en)*1994-03-181995-09-27Hitachi, Ltd.Plasma processing method and apparatus
JPH09181052A (en)*1995-05-261997-07-11Tokyo Electron LtdPlasma treating apparatus
US5698036A (en)*1995-05-261997-12-16Tokyo Electron LimitedPlasma processing apparatus

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 018, no. 369 (E - 1576) 12 July 1994 (1994-07-12)*

Also Published As

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