Movatterモバイル変換


[0]ホーム

URL:


USRE43841E1 - Printing by active tiling - Google Patents

Printing by active tiling
Download PDF

Info

Publication number
USRE43841E1
USRE43841E1US12/044,693US4469301AUSRE43841EUS RE43841 E1USRE43841 E1US RE43841E1US 4469301 AUS4469301 AUS 4469301AUS RE43841 EUSRE43841 EUS RE43841E
Authority
US
United States
Prior art keywords
sub
light
area
array
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related, expires
Application number
US12/044,693
Inventor
Richard Jonathan Miller
Mark Anthony Gleeson Smith
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
F Poszat HU LLC
Original Assignee
F Poszat HU LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GBGB0030444.4Aexternal-prioritypatent/GB0030444D0/en
Application filed by F Poszat HU LLCfiledCriticalF Poszat HU LLC
Priority to US12/044,693priorityCriticalpatent/USRE43841E1/en
Assigned to QINETIQ LIMITEDreassignmentQINETIQ LIMITEDASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: MILLER, RICHARD JONATHAN, SMITH, MARK ANTHONY GLEESON
Assigned to F. POSZAT HU, LLCreassignmentF. POSZAT HU, LLCASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: QINETIQ LIMITED
Application grantedgrantedCritical
Publication of USRE43841E1publicationCriticalpatent/USRE43841E1/en
Adjusted expirationlegal-statusCritical
Expired - Fee Relatedlegal-statusCriticalCurrent

Links

Images

Classifications

Definitions

Landscapes

Abstract

A photosensitive area11, such as a photolithographic sheet, in an images plane is notionally subdivided in both dimensions to form contiguous (tiled) sub-areas. Variable illumination means1,4 provides a selected pixellated light pattern, which is directed8, 9, 10 to fill a selected one of the sub-areas so that pixels of said pattern are, at least 15 microns across at the sub-area, and control means are responsive to an input signal representative of an image conjointly to control the production and direction of the pixellated patterns so that an entire image is produced over all of the said sub-areas. As shown, the variable illumination means comprises a light source2 with digital micro-mirror array deflector device4, and the sub-area is selected by lens array8 with a shutter10 and polariser array11 10. The latter may be replaced by a two-axis steering mirror and lens array. An analogue micro-mirror array, optionally with, a kaleidoscope, may be used in the illumination means, with (a) collimating optics and lens array; or (b) a focussing macrolens, for sub-area selection.

Description

This application is a broadening reissue of U.S. application Ser. No. 10/450,554, filed on Jun. 13, 2003, now U.S. Pat. No. 7,009,688, which is a national phase application of PCT Application No. GB2001/05438, filed on Dec. 11, 2001, which claims priority to GB Patent Application No. 0030444, filed on Dec. 14, 2000.
The present invention relates to the use of active tiling in two dimensions for exposing a photosensitive surface to an optical pattern or image. it has particular but not exclusive relevance to the preparation of printing plates, especially those of relatively large dimensions where it is desired to maintain a good resolution.
While it is possible to take a displayed image, e.g. from a liquid crystal matrix, and transfer it to a photoresist to create a mask or printing plate, there are size versus resolution limitations. For example, a plate of say 10 by 20 inches at a resolution of 600 dpi would require 6000 by 12000 pixels. It is currently not practical, and maybe not possible, to produce a passive matrix addressed liquid crystal spatial light modulator having these numbers of edge contacts. Furthermore, 600 dpi equates to a pixel size of 40 microns, and this again is not possible for current active matrix liquid crystal displays.
The invention uses an active tiling technique for the piecemeal selective exposure of a photosensitive surface, whereby it is possible to use a device with relatively low numbers of pixels to synthesise an image having a much larger number of pixels. In this way a large image can be recorded on the photosensitive surface with good resolution.
The use of active tiling in the preparation of holographic images is known. In such a system, sub-images are tiled onto the surface of an optically addressed spatial light modulator (OASLM), e.g. a bistable electro-optic liquid crystal device incorporating a photoconductive layer, and the resulting image is illuminated with coherent light, normally in the visible range so that the resultant image can be directly viewed. An example is disclosed on UK Patent Application No 2330471 (Secretary of State for Defence).
This type of holographic image preparation system only works when the pixels are suitably small, preferably of the order of the wavelength of the coherent radiation, but in present practice somewhat larger at around 6 microns, which size nevertheless remains very difficult to obtain. It should be noted that the above-mentioned patent application refers to the use of demagnifying optics to decrease the effective pitch of each pixel in the spatial light modulator(s), i.e. as incident on the OASLM. In addition, in this type of application a very large number of pixels is required (say around) 1010) for a workable system, and in one approach a 3-inch diagonal OASLM supports 25 (5 by 5) tiled images (25×106) pixels forming one channel, there being a collection of such channels which provide a section (only) of the complete hologram.
Technical requirements for a mask printing system are different. Shorter wavelength UV light is commonly used, with a different type of photosensitive material such as a photoresist/photocurable material, or conversely a, material which becomes removable, e.g. soluble, when optically exposed. The resolution necessary for printing is much lower than for holographic systems, and so less demanding. As noted above, 40 microns equates approximately to 600 dpi, and would be a common requirement, although 20 microns or even 15 microns could be preferred in some applications.
Additionally it is known to use a liquid crystal matrix for selectively exposing photosensitive material in applications involving the printing of typed material see for example U.S. Pat. No. 4,830,468 (Xerox) and U.S. Pat. No. 4,783,146 (Xerox) in which a linear array of liquid crystal shutters is used to print an image one line at a time; and U.S. Pat. No. 3,824,604 (Stein) and U.S. Pat. No. 4,429,369 (Stanly) which employ a liquid crystal matrix to form alphanumeric characters for transmission to a xerographic machine or photographic material. In this type of apparatus, the array either extends over the whole of one of the dimensions of the photosensitive surface (or that area thereof to be used), or the size of the basic alphanumeric image is very small and is moved relative to the receiving surface in some way. Text formed from alphanumeric characters differs from other types of image in that a space is naturally provided between each pair of characters so that tiling need not be as precise as in images where there is a degree of correlation of image content between tiles.
In a first aspect, the invention provides apparatus for exposing a photosensitive area in a predetermined image plane which is notionally subdivided in both dimensions to form contiguous sub-regions, the apparatus comprising variable illumination means for producing a selected pixellated light pattern, directing means for directing said pattern to fill a selected one of said sub-regions, and control means responsive to an input signal representative of an image conjointly to control said illumination means and said directing means such that the entire image is produced over all of the sub-regions in said plane. For production of a printing plate, for example, the pixels need be no smaller than 15 microns at the image plane, preferably no smaller than 20 microns. While they can be significantly larger, e.g. 100 microns, according to desired result, it is preferred that they are no larger than 40 microns.
The illumination means may be a light source (for example an array of light emitting diodes, VCSELs—vertical cavity surface emitting lasers, or an electroluminescent array) or a light modulator receiving illumination from a separate source. Typical such, light modulators are liquid crystal arrays and micro-electromechanical (MEM) devices, such as an array of very small movable mirrors. The amount of contrast available will be determined at least in part by the type of illumination means which is used.
A typical MEM mirror array comprises 1000 by 1000 pixels or 2000 by 2000 pixels, each pixel being provided by a mirror switchable between two states, e.g. plus andminus 10° relative to the plane of the array. These devices would require 12 by 12, or 6 by 6 replications (sub-regions) for a 20 by 20 inch photosensitive area. Also known are MEM mirror arrays in which the angular deflection of each mirror may take a selected one of three or more values, e.g. seven as particularly described later. In the simplest from of construction, deflection of each mirror element is about a single axis; but arrangements where each element is deflectable about two axes have been proposed.
In certain instances, for example where it is desired to expose a photosensitive surface to ultra-violet (UV) or near UV light (blue end of the spectrum), the wavelength limitation may prevent the use of certain optical elements (for example liquid crystals tend to degrade with excessive UV illumination, or are incapable of providing the required modulation), and may limit the choice of illumination means. In such a case, or where a broad optical range of illumination wavelength may need to be employed for different purposes, the use of an MEM device may be preferred by virtue of its relative insensitivity to wavelength. It is also relatively insensitive to high radiation intensities, and does not require polarising optics.
Preferably, the illumination means is electrically addressed, although other pixelwise addressing means may be used which are known per se for the type of illumination means adopted.
Often the illumination means will not contain any facility for directing the light therefrom. In such a case, the directing means will be entirely separate therefrom, and may comprise a variable light deflector or spatial selector for selecting the sub-region to be illuminated, and/or even a means for moving the photosensitive area. In other cases, light direction provided by the illumination means is in one direction only (e.g. an array of micro-mirrors tiltable about a single axis to a selected one of a plurality of angles, and a separate means maybe required for the second direction, e.g. a variable light deflector, spatial selector or moving means as before.
In one type of arrangement light from the illuminating means is spread over a wide angle, for example using a diffuser at an image plane, and multiple images of the illuminating means are formed, for example using a lenticular lens array. A suitable spatial selector for receiving the resulting light comprises collimating optics for receiving light from the illuminating means, followed by replication optics, such as a lenticular lens array each lens of which receives the same pattern of illumination from the collimating means, and a spatial shutter array for selecting the lenticular lens corresponding to the selected sub-region. The spatial shutter could be any known suitable device, but one device preferred for its speed comprises an array of nematic liquid crystal π cells.
However, it is often simpler and more efficient to use a light deflector capable of acting in both dimensions. Any suitable light deflector or combination of light deflectors (one per dimension) known in the art may be used for this purpose, but a preferred device is provided by a two-axis steerable mirror, which again has the virtue of being relatively insensitive to wavelength and high radiation intensity. In an embodiment, a light pattern from an illuminating means is directed via focussing optics, such as a lens, onto a two-axis steerable mirror followed by a focussing lenticular lens array. The steerable mirror is controlled to select which lenticular lens is illuminated, corresponding to the selected sub-region.
Either of the above arrangements can be used in conjunction with an MEM mirror array operated digitally, i.e. each single mirror of the array providing a pixel of the pattern) is operated digitally either to direct light toward the predetermined image plane or in another direction.
In other instances, the illuminating means may itself contribute to the determination of the light direction, and so form part of the light directing means. A typical and preferred example thereof is an MEM mirror array operated in an analogue manner. For the provision of a pattern for a selected sub-region, the array is operated in a quasi-digital manner as above. However, the all mirrors providing the light to be directed towards the image plane are deflected by the same angle, which can be varied according to the location of the selected sub-region. Thus, such a device operated in this manner could be followed by a kaleidoscopic system and a focussing macro-lens, the angle of deflection of the mirrors of the array determining which area of the lens is illuminated for transmission to an adjacent (selected) sub-region. In this arrangement the kaleidoscope provides even illumination of the spatial light modulator and multiple images are available therefrom by internal reflection—which of the multiple images actually contains the light energy depends on the deflection angle provided by the mirrors. Alternatively, light from an analogue operated MEM mirror array could be passed by collimating optics such as a macro-lens, a selected region of which is illuminated as before, to a selected one of lenticular lens array corresponding to the selected sub-region. Unlike the two arrangements discussed in the previous three paragraphs, both of these arrangements require light which is relatively well collimated.
In a second aspect, the invention provides a method of exposing a photosensitive area, in response to an input signal representative of an image, said area being notionally subdivided in both dimensions to form contiguous sub-regions, comprising the steps of providing a light pattern corresponding to a selected part of said image and directing said pattern to fill a corresponding selected one of said sub-regions and repeating the process for other sub-regions until the entire image is produced over all of the sub-regions of said area.
Further details and advantages of the invention will become evident on a reading of the appended claims, to which the reader is directed, and upon a consideration of the following description of embodiments of the invention, made with reference to the accompanying drawings, in which:
FIG. 1 shows a first embodiment of the invention using a digitally operated MEM mirror array in conjunction with a spatial shutter array;
FIG. 2 shows a second embodiment of the invention using a digitally operated MEM mirror array in conjunction with a two-axis steerable mirror;
FIG. 3 shows a third embodiment of the invention using an analogue operated MEM mirror array in conjunction with collimating optics and a lenticular lens array; and
FIG. 4 shows a fourth embodiment of the invention using an analogue operated MEM mirror array in conjunction with a kaleidoscope and focusing optics.
In the Figures the same reference number is used in respect of corresponding elements performing similar functions.
InFIG. 1 light from a lamp orlaser source1 is directed via alens2 and abean beam splitter3 onto amicro-electromechanical array4 of 1000 by 1000 mirrors each of which can be deflected between two angles.Light7 reflected from mirrors at one of the angles is lost from the system, but diverging light5 reflected from mirrors at the other angle and transmitted through thesplitter3 is collimated by alens6 and is then incident on a 12 by 12lens array8. Each lenticular lens forms a separate image of thearray4.
One such image is selected by a corresponding 12 by 12 array of shutters formed by aliquid crystal array10 9 of π cells and a 12 by 12 array of (Glan-Taylor polarisers10 (a single large polariser could be used). Light incident on the liquid crystal array should be polarised, and this is effected either by a separate polariser, for example immediately following thelamp1, by using alaser source1,or 1, or by providing apolarising beam splitter3. In use a selected π cell is activated to rotate the plane of incident light by 90° to enable transmission byte by the correspondingpolariser10 in a known manner so that an image of thewhole array4 is formed on a selected sub-area in animage plane11.
In operation of the system, an input signal representative of an image which is very large in terms of numbers of pixels, for example 12000 by 12000, is effectively broken down to sub-image signals representative of 12 by 12 contiguous (tiled) sub-images. Each sub-image signal in turn is used to address themirror array4, while information concerning the location of the sub-image within the entire image is used to control the shutter array so that the sub-image is directed to the correct location inplane11, so that eventually the entire image is reproduced inplane11. The sub-images may be provided in any predetermined order, but preferably immediately adjacent sub-images are formed in immediate succession, for example serially along a first line of 12 sub-images, the serially along succeeding lines, either in the same line direction (as in conventional raster scanning) or in reverse directions (as in boustrophedral scanning).
In use, a photosensitive surface is located inplane11. Where this surface is for production of a printing mask or plate, e.g. a photoresist layer, it may be necessary to use aUV source1.
In this system it must be ensured that thelight5 is sufficiently diverging for uniform illumination of thelens array8. With certain types of light source or illumination optics, or where an alternative type of light modulator replaces themirror array4, this may occur naturally, but in other cases additional means known per se are provided to ensure that this happens.
Generally it is preferred to avoid the use of polarisation optics, andFIGS. 2 to 4 have no such requirement. In these Figures the light source may provide polarised (for example laser) or unpolarised light.
InFIG. 2, the diverginglight beam5, is focused by alens12 via amirror13 and a 12 by 12lens array14 onto theimaging plane11. Themirror13 is tiltable about two axes so that a selected one of the lenses ofarray14 receives substantially all of the sub-image light5 from thearray4 and produces a corresponding sub-image at its location inplane11, so that again a complete image may eventually be synthesised thereon by tiling. In this arrangement, the light fromsource1 need not be collimated. As shown and preferred, the mirror is planar, but a mirror curved in one or both dimensions could be employed to act in conjunction withlens13, or even alone (although this requires a larger movable component) for focussing purposes.
FIG. 3 is somewhat similar toFIG. 1, but here themirror array4 is replaced by a 2000 by 2000micro-electromechanical array15 of mirrors which can be tilted in at least 7 different directions, one direction producing light7 lost to the system, leaving at least 6 useful directions. In this case the light incident on the mirror array is arranged to be reasonably well collimated, so that light reflected from mirrors of the array set to one of the useful angles is transmitted by thesplitter3 to fall on a corresponding restricted area of acollimating lens6 and thence to a corresponding one of a 6 by 6array16 of lenses illuminating a corresponding local area ofplane11.
In use a sub-image signal is fed toarray15 and its location on theplane11 is selected in at least a first dimension by selection of the deflection angle of the selected mirrors ofarray15. For any sub-image, this deflection angle is selected from the six useful angles, and is common to all selected mirrors for that sub-image. If the mirrors of thearray15 are capable of multi-angle deflection about two axes (six useful direction for each axis), this alone enables selection of the sub-image location in both dimensions, and again the complete image is synthesised by tiling of the sub-images onplane11.
Alternatively some other manner of providing selecting of the sub-area location in the second dimension must be provided—for example, the position of the photosensitive surface inplane11 could be changed, theentire mirror array15 could be rotated about the second axis, or a further steerable deflecting mirror could be located betweensplitter3 andlens6. It will be noted that as illustratedFIG. 3 does away with the need for the shutter array ofFIG. 1.
The arrangement ofFIG. 4 avoids the requirement for thelens array16 ofFIG. 3 by the use of akaleidoscope17 between thesplitter3 and themirror array15. Sub-image light emerging fromsplitter3 after reflection atarray15 falls onto a local area of alens18 in dependence On the deflection angle of the micro-mirrors, and thelens18 focuses it onto a corresponding local area ofplane11 so that tiling of sub-images in at least one direction may be accomplished. Arrangements for tiling in the second dimension are much the same as those discussed with reference toFIG. 3.
It should be clear to the skilled reader that these embodiments are exemplary only, and that various modification may be made within the scope of the invention defined by the appended claims. For example, althoughFIGS. 1 and 2 have been described with respect to a two-dimensional placement of each sub-image inplane11 by control of theshutter array10,11 or the two-axis mirror13, it should be clear that placement in one dimension may be so provided (i.e. a linear shutter array, or a one axis mirror) together with an alternative method of controlling placement in the other dimension. As discussed with respect toFIGS. 3 and 4, this could be provided, for example, by movement of the photosensitive surface, provision of a further one-axis tiltable mirror (so that inFIG. 2 there will be two such mirrors in series), or by tilting of thearray4.

Claims (51)

15. Apparatus for exposing a photosensitive area in an image plane which area is notionally subdivided in first and second dimensions to form contiguous sub-areas, the apparatus comprising variable illumination means both for producing a selected pixellated light pattern and for directing said pattern in a direction corresponding to a selected one of said sub-areas in said image plane, the variable illumination means comprising, in part, a micro-electrochemical micro-electromechanical device in the form of a two dimensional array to of tiltable mirors mirrors, and control means responsive to an input signal representative of an image to control said illumination means such that respective said pixellated light patterns are provided in each of the sub-areas in a sequence, one sub-area at a time, to synthesise synthesize the entire image, wherein the illumination means comprises an array of selectively operable elements, each element being individually capable of directing incident light towards the image plane at any selected one of a plurality of angles in at least the first said dimension so to form a said pixellated light pattern, said selected angle determining at least in part the selected sub-area.
30. A method of exposing a photosensitive area, in response to an input signal representative of an image, said area being notionally subdivided in both dimensions to form contiguous sub-regions, comprising the steps of providing a pixellated light pattern corresponding to a selected part of said image and directing said pattern to fill a corresponding selected one of said sub-regions and repeating the process for other sub-regions, one sub-region at a time, until the entire image is produced over all of the sub-regions of said area, said method including the steps of controlling individual elements of a light modulator array both to produce said pixellated pattern with light and to direct light towards the image plane at any selected one of a plurality of angles thereby to determine at least in part the selected sub-area, the light modulator comprising in part a micro-electromechanical device in the form of a two dimensional array to of tiltable mirors mirrors.
32. An apparatus comprising:
illumination means configured to produce a pixellated light pattern and to direct said pattern in a direction corresponding to a selected sub-area in an image plane which is subdivided to form contiguous sub-areas, wherein said illumination means comprises:
a micro-electromechanical device comprised of an array of tiltable mirrors, wherein said pattern is directed to said selected sub-area according to selected deflection angles associated with said array of tiltable mirrors, and
control means configured to control said micro-electromechanical device to sequentially provide a selected pixellated light pattern in each of said sub-areas, one sub-area at a time, to synthesize an entire image comprised of a plurality of pixellated light patterns sequentially formed on the image plane.
US12/044,6932000-12-142001-12-11Printing by active tilingExpired - Fee RelatedUSRE43841E1 (en)

Priority Applications (1)

Application NumberPriority DateFiling DateTitle
US12/044,693USRE43841E1 (en)2000-12-142001-12-11Printing by active tiling

Applications Claiming Priority (5)

Application NumberPriority DateFiling DateTitle
GB00304442000-12-14
GBGB0030444.4AGB0030444D0 (en)2000-12-142000-12-14Printing by active tiling
US10/450,554US7009688B2 (en)2000-12-142001-12-11Printing by active tiling
US12/044,693USRE43841E1 (en)2000-12-142001-12-11Printing by active tiling
PCT/GB2001/005438WO2002048797A2 (en)2000-12-142001-12-11Exposure apparatus and method using active tiling

Related Parent Applications (1)

Application NumberTitlePriority DateFiling Date
US10/450,554ReissueUS7009688B2 (en)2000-12-142001-12-11Printing by active tiling

Publications (1)

Publication NumberPublication Date
USRE43841E1true USRE43841E1 (en)2012-12-04

Family

ID=47226884

Family Applications (1)

Application NumberTitlePriority DateFiling Date
US12/044,693Expired - Fee RelatedUSRE43841E1 (en)2000-12-142001-12-11Printing by active tiling

Country Status (1)

CountryLink
US (1)USRE43841E1 (en)

Citations (38)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US3824604A (en)1972-10-121974-07-16E SteinAlphanumeric printing system employing liquid crystal matrix
US4429369A (en)1976-12-271984-01-31Stanly Albert LElectro-optical printer
US4639073A (en)*1984-03-191987-01-27Xerox CorporationElectro-optic pulse imaging raster output scanner
US4668080A (en)1985-11-291987-05-26Rca CorporationMethod and apparatus for forming large area high resolution patterns
EP0253129A2 (en)1986-06-131988-01-20MIVATEC Hard- und Software GmbHPhotoplotting method and photoplotter for film exposure
US4769680A (en)1987-10-221988-09-06Mrs Technology, Inc.Apparatus and method for making large area electronic devices, such as flat panel displays and the like, using correlated, aligned dual optical systems
US4783146A (en)1987-01-201988-11-08Xerox CorporationLiquid crystal print bar
US4830468A (en)1987-01-201989-05-16Xerox CorporationLiquid crystal print bar having a single backplane electrode
US5164848A (en)1989-11-031992-11-17Gec Marconi LimitedHelmet mounted display
EP0562873A1 (en)1992-03-271993-09-29General Electric CompanyPolygonal-shaped optical coupling member for use with a high brightness light source
US5331338A (en)1992-01-301994-07-19Printware, Inc.Web steering for an image recorder
US5353150A (en)1991-08-271994-10-04Hughes Aircraft CompanyGain homogenization apparatus and method for use in stimulated scattering of beams with non-uniform spatial intensity distribution
US5379135A (en)1992-03-241995-01-03Victor Company Of Japan, Ltd.Optical system for display apparatus
GB2284684A (en)1993-12-071995-06-14Heidelberger Druckmasch AgMethod of imaging a photosensitive printing forme and apparatus therefor
US5485291A (en)1994-02-221996-01-16Precision Lamp, Inc.Uniformly thin, high efficiency large area lighting panel with two facet grooves that are spaced apart and have light source facing facets with smaller slopes than the facets facing away from the light source
US5621486A (en)1995-06-221997-04-15International Business Machines CorporationEfficient optical system for a high resolution projection display employing reflection light valves
US5680257A (en)1995-07-311997-10-21Texas Instruments IncorporatedLight collection optics for spatial light modulator
US5691541A (en)1996-05-141997-11-25The Regents Of The University Of CaliforniaMaskless, reticle-free, lithography
EP0845710A1 (en)1996-11-291998-06-03Schablonentechnik Kufstein AktiengesellschaftProcess and device for making a stencil printing master
WO1998037448A1 (en)1997-02-191998-08-27Digital Projection LimitedIllumination system
GB2330471A (en)1997-10-151999-04-21Secr DefenceProduction of moving images for holography
EP0933925A2 (en)1997-12-311999-08-04Texas Instruments Inc.Photofinishing utilizing modulated light source array
WO1999052416A1 (en)1998-04-091999-10-21Isis Innovation LimitedImaging apparatus
US6046794A (en)*1994-01-282000-04-04Kabushiki Kaisha Komatsu SeisakushoControl device for marking device
EP1003071A2 (en)1998-11-192000-05-24Eastman Kodak CompanyReflective liquid crystal modulator based printing system
WO2000075799A1 (en)1999-06-072000-12-14Hewlett-Packard CompanyA system and related methods for dynamically compiling a publication
US6211948B1 (en)1994-02-212001-04-03Friedrich LuellauProcess and apparatus for photomechanical production of structured surfaces, especially for irradiation of offset press plates
US20010038268A1 (en)1998-08-042001-11-08Hermann FuchsbergerDevice for the ecpoaure of photographic recording material
US20010043383A1 (en)*1999-03-052001-11-22Takeshi SugaDirect-view-type confocal point optical system
US20020012110A1 (en)1996-12-312002-01-31Friedrich LuellauExposure device for printing plates and method of controlling same
US6359676B1 (en)*1997-08-012002-03-19Agfa-Gevaert AktiengesellschaftMethod and apparatus for printing photographs from developed film onto light-sensitive photoprint material
US6396565B1 (en)*1998-01-272002-05-28Noritsu Koki Co., Ltd.Photograph printing device, electronic image input device, film scanner, scratch recognition method, memory medium recording scratch recognition program, and image restoration method
US20020135673A1 (en)2000-11-032002-09-26Favalora Gregg E.Three-dimensional display systems
WO2002103458A1 (en)2001-06-192002-12-27Holographic Imaging LlcImage replication system
US6515734B1 (en)*1999-12-062003-02-04Olympus Optical Co., Ltd.Exposure apparatus
US6753990B1 (en)1999-06-092004-06-22Holographic Imaging LlcHolographic displays
US7009688B2 (en)2000-12-142006-03-07Qinetiq LimitedPrinting by active tiling
US20080079922A1 (en)*1998-03-022008-04-03Torbjorn SandstromPattern generator

Patent Citations (40)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US3824604A (en)1972-10-121974-07-16E SteinAlphanumeric printing system employing liquid crystal matrix
US4429369A (en)1976-12-271984-01-31Stanly Albert LElectro-optical printer
US4639073A (en)*1984-03-191987-01-27Xerox CorporationElectro-optic pulse imaging raster output scanner
US4668080A (en)1985-11-291987-05-26Rca CorporationMethod and apparatus for forming large area high resolution patterns
EP0253129A2 (en)1986-06-131988-01-20MIVATEC Hard- und Software GmbHPhotoplotting method and photoplotter for film exposure
US4783146A (en)1987-01-201988-11-08Xerox CorporationLiquid crystal print bar
US4830468A (en)1987-01-201989-05-16Xerox CorporationLiquid crystal print bar having a single backplane electrode
US4769680A (en)1987-10-221988-09-06Mrs Technology, Inc.Apparatus and method for making large area electronic devices, such as flat panel displays and the like, using correlated, aligned dual optical systems
US5164848A (en)1989-11-031992-11-17Gec Marconi LimitedHelmet mounted display
US5353150A (en)1991-08-271994-10-04Hughes Aircraft CompanyGain homogenization apparatus and method for use in stimulated scattering of beams with non-uniform spatial intensity distribution
US5331338A (en)1992-01-301994-07-19Printware, Inc.Web steering for an image recorder
US5379135A (en)1992-03-241995-01-03Victor Company Of Japan, Ltd.Optical system for display apparatus
EP0562873A1 (en)1992-03-271993-09-29General Electric CompanyPolygonal-shaped optical coupling member for use with a high brightness light source
GB2284684A (en)1993-12-071995-06-14Heidelberger Druckmasch AgMethod of imaging a photosensitive printing forme and apparatus therefor
US6046794A (en)*1994-01-282000-04-04Kabushiki Kaisha Komatsu SeisakushoControl device for marking device
US6211948B1 (en)1994-02-212001-04-03Friedrich LuellauProcess and apparatus for photomechanical production of structured surfaces, especially for irradiation of offset press plates
US5485291A (en)1994-02-221996-01-16Precision Lamp, Inc.Uniformly thin, high efficiency large area lighting panel with two facet grooves that are spaced apart and have light source facing facets with smaller slopes than the facets facing away from the light source
US5621486A (en)1995-06-221997-04-15International Business Machines CorporationEfficient optical system for a high resolution projection display employing reflection light valves
US5680257A (en)1995-07-311997-10-21Texas Instruments IncorporatedLight collection optics for spatial light modulator
US5691541A (en)1996-05-141997-11-25The Regents Of The University Of CaliforniaMaskless, reticle-free, lithography
EP0845710A1 (en)1996-11-291998-06-03Schablonentechnik Kufstein AktiengesellschaftProcess and device for making a stencil printing master
US6411366B2 (en)1996-12-312002-06-25Friedrich LuellauExposure device for printing plates including digitally controlled micromirror picture-generating unit and method of triggering same
US20020012110A1 (en)1996-12-312002-01-31Friedrich LuellauExposure device for printing plates and method of controlling same
WO1998037448A1 (en)1997-02-191998-08-27Digital Projection LimitedIllumination system
US6359676B1 (en)*1997-08-012002-03-19Agfa-Gevaert AktiengesellschaftMethod and apparatus for printing photographs from developed film onto light-sensitive photoprint material
GB2330471A (en)1997-10-151999-04-21Secr DefenceProduction of moving images for holography
EP0933925A2 (en)1997-12-311999-08-04Texas Instruments Inc.Photofinishing utilizing modulated light source array
US6396565B1 (en)*1998-01-272002-05-28Noritsu Koki Co., Ltd.Photograph printing device, electronic image input device, film scanner, scratch recognition method, memory medium recording scratch recognition program, and image restoration method
US20080079922A1 (en)*1998-03-022008-04-03Torbjorn SandstromPattern generator
WO1999052416A1 (en)1998-04-091999-10-21Isis Innovation LimitedImaging apparatus
US20010038268A1 (en)1998-08-042001-11-08Hermann FuchsbergerDevice for the ecpoaure of photographic recording material
EP1003071A2 (en)1998-11-192000-05-24Eastman Kodak CompanyReflective liquid crystal modulator based printing system
US20010043383A1 (en)*1999-03-052001-11-22Takeshi SugaDirect-view-type confocal point optical system
WO2000075799A1 (en)1999-06-072000-12-14Hewlett-Packard CompanyA system and related methods for dynamically compiling a publication
US6753990B1 (en)1999-06-092004-06-22Holographic Imaging LlcHolographic displays
US6515734B1 (en)*1999-12-062003-02-04Olympus Optical Co., Ltd.Exposure apparatus
US20020135673A1 (en)2000-11-032002-09-26Favalora Gregg E.Three-dimensional display systems
US7009688B2 (en)2000-12-142006-03-07Qinetiq LimitedPrinting by active tiling
WO2002103458A1 (en)2001-06-192002-12-27Holographic Imaging LlcImage replication system
US7012659B2 (en)2001-06-192006-03-14Qinetiq LimitedImage replication system having focusing means to receive reflected light through lightguide from spatial light modulator

Non-Patent Citations (6)

* Cited by examiner, † Cited by third party
Title
European Examination Report for EP02735632.8, Apr. 9, 2008, 3 pages.
European Examination Report for EP03756556.1, Sep. 28, 2010, 5 pages.
Fukaya et al., "Expansion of the image size and viewing zone in holographic display using liquid crystal devices", Proceedings of the International Society for Optical Engineering (SPIE), SPIE, USA, vol. 2406, Jan. 1, 1995, pp. 283-289.
International Preliminary Examination Report for PCT/GB02/02827, prepared by the European Patent Office on Sep. 16, 2003, 6 pages.
International Search Report for PCT/GB01/05438.
Rudge, et al., "Fly's-Eye Lens Technique for Generating Semiconductor Device Fabrication Masks", IBM Journal, Apr. 1963, pp. 146-150.

Similar Documents

PublicationPublication DateTitle
US6204875B1 (en)Method and apparatus for light modulation and exposure at high exposure levels with high resolution
JP4743966B2 (en) Image display device
KR101993565B1 (en)Combined light modulation device for tracking users
EP1480441B1 (en)Method and apparatus for multi-track imaging using single-mode beams and diffraction-limited optics
US8335999B2 (en)System and method for optical shearing
US7009688B2 (en)Printing by active tiling
IL96200A (en)Television display apparatus
EP0077188B1 (en)Electro-optic modulator
US6753898B2 (en)Method and apparatus for high speed digitized exposure
JP2000503923A (en) High-resolution video system and imaging method used therefor
WO1989012369A1 (en)Multi-beam laser scanner system
USRE43841E1 (en)Printing by active tiling
EP1637915B1 (en)Apparatus for multi-beam exposure
US6734889B2 (en)Color printer comprising a linear grating spatial light modulator
US7289191B2 (en)Illumination optical system, and image display apparatus and image exposure apparatus using the same
WO2011070350A1 (en)Compact holographic printer
US20050212900A1 (en)Multibeam exposure method and device
GB2224132A (en)Laser raster scanner
JP2006085071A (en)Multi-beam exposure device
JP2006085073A (en)Multi-beam exposure device
JP2006085072A (en)Multi-beam exposure device
WO2006003457A1 (en)An optical device, an optical system and a method of manufacturing a holographic optical element
JP2006085070A (en)Multi-beam exposure method and device
US20070258119A1 (en)Optical Device, an Optical System and a Method of Manufacturing a Holographic Optical Element
JP2006113412A (en)Drawing method and apparatus

Legal Events

DateCodeTitleDescription
ASAssignment

Owner name:QINETIQ LIMITED, UNITED KINGDOM

Free format text:ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:MILLER, RICHARD JONATHAN;SMITH, MARK ANTHONY GLEESON;SIGNING DATES FROM 20030527 TO 20030602;REEL/FRAME:021131/0013

ASAssignment

Owner name:F. POSZAT HU, LLC, DELAWARE

Free format text:ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:QINETIQ LIMITED;REEL/FRAME:021180/0369

Effective date:20070327

CCCertificate of correction
REMIMaintenance fee reminder mailed
LAPSLapse for failure to pay maintenance fees

[8]ページ先頭

©2009-2025 Movatter.jp