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USRE41559E1 - Semiconductor device package with improved cooling - Google Patents

Semiconductor device package with improved cooling
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Publication number
USRE41559E1
USRE41559E1US11/514,327US51432706AUSRE41559EUS RE41559 E1USRE41559 E1US RE41559E1US 51432706 AUS51432706 AUS 51432706AUS RE41559 EUSRE41559 EUS RE41559E
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major surface
web portion
conductive
semiconductor device
electrode
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US11/514,327
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Charles S. Cardwell
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Infineon Technologies North America Corp
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International Rectifier Corp USA
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Assigned to Infineon Technologies Americas Corp.reassignmentInfineon Technologies Americas Corp.CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).Assignors: INTERNATIONAL RECTIFIER CORPORATION
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Abstract

A chip scale package has a semiconductor MOSFET die which has a top electrode surface covered with a layer of a photosensitive liquid epoxy which is photolithographically patterned to expose portions of the electrode surface and to act as a passivation layer and as a solder mask. A solderable contact layer is then formed over the passivation layer. The individual die are mounted drain side down in a metal clip or can with the drain electrode disposed coplanar with a flange extending from the can bottom. The metal clip or drain clip has a plurality, a parallel spaced fins extending from its outwardly facing surface.

Description

RELATED APPLICATION
This application claims the benefit and priority of U.S. Provisional Application No. 60/328,362 filed Oct. 10, 2001 entitled SEMICONDUCTOR DEVICE PACKAGE WITH IMPROVED COOLING and which is incorporated herein by reference.
FIELD OF THE INVENTION
This invention relates to semiconductor device packages and more specifically relates to a novel semiconductor device package with a finned heat sink for improved cooling.
BACKGROUND OF THE INVENTION
This invention relates to semiconductor devices and more specifically relates to a process for the low cost manufacture of a novel semiconductor device.
In prior art semiconductor devices, the housing area is frequently a large multiple of the area of the semiconductor die contained therein. Further, in many known semiconductor device, heat is taken out only from one side of the die, usually the bottom surface. In addition, the process for the manufacturing of prior art semiconductor devices is costly, specially when single device handling techniques are used.
In the presently known semiconductor die, particularly power MOSgated die, the top electrode (the source) is generally an aluminum contact containing about 1.0% silicon (hereafter an aluminum contact). The aluminum contact is used because it is well adapted to the wafer manufacturing process. However, it is difficult to form electrical connections to such aluminum contacts so a wire bond process is usually used in which a wire is ultrasonically bonded to the underlying aluminum contact. These wire-bond connections have a limited area and are thus a source of electrical resistance (RDSON) and of heat generation during operation. However, the bottom drain contact of a conventional MOSgated die is frequently a trimetal which is easily solderable or otherwise electrically connectable to a wide area contact surface without wire bonding as shown, for example, in U.S. Pat. No. 5,451,544. Thus, heat is primarily removed from the silicon die at the back contact surface, even though most heat is generated at the junction in the top surface and at the wire bonds. It would be desirable to remove heat from such a bottom drain in an improved manner.
It is known that solderable top contacts can be made to the top surface of a die, as shown in U.S. Pat. No. 5,047,833. However, the packages used for such solderable top contact structures have had very large “footprints” in comparison to the die area.
It would be desirable to produce a semiconductor device and a process for its manufacture which would occupy a smaller area on a circuit and would exhibit a lower RDSONthan the known semiconductor devices.
It would be further desirable to produce such devices in a process which permits batch handling with reduced equipment on the production line and lower costs.
Devices are known in which the source side of a MOSgated device wafer is covered with a passivation layer, preferably a photosensitive liquid epoxy, or a silicon nitride layer, or the like. To form the passivation layer, the wafer is coated by spinning, screening, or otherwise depositing the liquid epoxy onto the wafer surface. The material is then dried and the coated wafer is exposed using standard photolithographic and masking techniques to form openings in the passivation layer to produce a plurality of spaced exposed surface areas of the underlying source metal and a similar opening to expose the underlying gate electrode of each die on the wafer. Thus, the passivation layer acts as a conventional passivation layer, but further acts as a plating resist (if required) and as a solder mask, designating and shaping the solder areas. The openings in the novel passivation layer can be made through to a conventional underlying solderable top metal such as a titanium/tungsten/nickel/silver metal. Alternatively, if the underlying metal is the more conventional aluminum metal the exposed aluminum can be plated with nickel and gold flash or other series of metals, resulting in a solderable surface, using the passivation as a plating resist. The tops of the plated metal segments are easily solderable, or otherwise contacted with low resistance, as compared to the high resistance connection of the usual wire bond to an aluminum electrode.
The source contact areas may have various geometries and can even constitute a single layer area region.
The wafer is then sawn or otherwise singulated into individual die. The individual die are then placed source-side down and a U-shaped, an L-shaped or a cup shaped, partially plated drain clip is connected to the solderable drain side of the die, using a conductive epoxy or solder, or the like to bond the drain clip to the bottom drain electrode of the die. The bottoms of the posts of the drain clip may be coplanar with the source-side surface (that is the tops of the contact projections) of the die, or the source-side surface may be offset inwardly with respect to the bottoms of the post to improve reliability. The outer surface of the die is then overmolded in a mold tray. A large number of die with such drain clips can be simultaneously molded in the mold tray.
The bonding material may be protected with a fillet of passivation material or by overmolding all, or a part of the assembly. The parts can be made in production by using a lead frame, a continuous strip, or by molding devices in a single block and singulating devices from that block.
After molding, the devices are tested and laser marked and are again sawn into individual devices.
Devices of this kind are shown in a copending application Ser. No. 09/819,774, filed Mar. 28, 2001 entitled CHIP SCALE SURFACE MOUNTED DEVICE AND PROCESS OF MANUFACTURE, the disclosure of which is incorporated herein by reference.
BRIEF DESCRIPTION OF THE INVENTION
In accordance with the invention the bottom of a die, that is, the upward facing drain or other power contact of a semiconductor die, is at least thermally connected to a conductive heat sink with a finned structure. Such a structure is particularly useful in applications which employ forced air cooling such as servers, in which the heat sink may be several millimeters thick; or in lap top or other applications, in which the heat sink may have a thickness of only ½ millimeter. The heat sink may be connected to the die as by a conductive solder, or a conductive adhesive such as a silver filled epoxy. The heat sink itself may be made of any suitable conductive material such as aluminum or metal-matrix polymer/epoxy and can be extruded, formed or molded.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a top view of a singulated power MOSFET die which can be housed in accordance with the invention.
FIG. 2 is a cross-section ofFIG. 1 taken acrosssection line22 in FIG.1.
FIG. 3 is a top view of the die ofFIG. 1 after it has been processed to define a plurality of separate “solderable” source contact areas and a “solderable” gate area.
FIG. 4 is a cross-section ofFIG. 3 taken across section line44 in FIG.3.
FIG. 5 is a view like that ofFIG. 3 of a die with a modified source contact pattern.
FIG. 6 is a view like that ofFIGS. 3 and 5 of a still further and large area “solderable” source contact pattern.
FIG. 7 is a top view of a still further contact topology (with a corner gate).
FIG. 8 is a cross-section ofFIG. 7 taken acrosssection lines88 in FIG.7.
FIG. 9 is a perspective view of a drain clip which can be modified in accordance with the invention.
FIG. 10 is a top view of the drain clip ofFIG. 9, with mold lock openings formed in the clip.
FIG. 11 is a bottom view of the subassembly of the die ofFIGS. 3 and 4 and the clip of FIG.9.
FIG. 12 is a cross-section ofFIG. 11 taken acrosssection line1212 in FIG.11.
FIG. 13 shows the subassembly ofFIGS. 11 and 12 after overmolding in a molding tray.
FIG. 14 is a cross-section ofFIG. 13, taken acrosssection lines1414 in FIG.13.
FIG. 15 is a cross-section ofFIG. 13 taken acrosssection line1515 in FIG.13.
FIG. 16 is a perspective view of a further embodiment of a drain clip which can be modified by the invention.
FIG. 17 is a top view of the clip of FIG.16.
FIG. 18 is a bottom view of assembly of the clip ofFIGS. 16 and 17 with a die of the general kind of that ofFIGS. 3 and 4 after overmolding.
FIG. 19 is a cross-section ofFIG. 18 taken acrosssection line1919 in FIG.18.
FIG. 20 is a bottom view of a cup shaped drain clip with a die of the topology ofFIGS. 7 and 8.
FIG. 21 is a cross-section ofFIG. 20 taken acrosssection lines2121 in FIG.20.
FIG. 22 shows a wafer of MOSFET die before singulation.
FIG. 23 shows process steps for the formation and patterning of a passivation layer on the source surface of the wafer of FIG.22.
FIG. 24 shows the metalizing atop the passivation layer of FIG.23.
FIG. 25 is an isometric view of the novel drain clip according to the invention.
FIG. 26 is a top plan view of the clip of FIG.25.
FIG. 27 is a side plan view of FIG.26.
FIG. 28 is an exploded perspective view of the modified drain clip of the invention as applied to a die and a support board.
FIG. 29 shows the structure ofFIG. 25 after assembly.
FIG. 30 is a front plan view of FIG.29.
FIG. 31 is an enlarged view of a portion of the device shown by FIG.30.
FIGS. 32a and 32b show side and top views of a clip according to an alternative embodiment.
DETAILED DESCRIPTION OF THE DRAWINGS
The present invention provides a novel package for semiconductor die of the kind having power or other electrodes on opposite surfaces of the die and makes it possible, with low cost manufacturing techniques, to make both electrodes available for surface mounting on a common support surface, for example the metallized pattern on a printed circuit board with improved cooling. While the invention is described with reference to a vertical conduction power MOSFET having the gate and source electrode on one surface and a drain electrode on the opposite surface, the invention is equally applicable to IGBTs, thyristors, diodes and the like of various topologies.
Thus, as will be seen, a novel die clip surrounds and contacts at least a portion of the back side electrode (a drain electrode in a MOSFET) and at least one post of the clip extends over an edge of the die and terminates in a plane which is coplanar with, but insulated from the front surface contacts (gate and source in a MOSFET) and the die clip acts as a good heat sink by virtue. The device may then be overmolded around the back and sides of the die and clip to present flat, coplanar solderable contact surfaces for all die electrodes to a mounting surface.
All top contact surfaces are formed, using a novel solder mask to form easily solderable contact surfaces on the die top surface, while the die are in the wafer stage. Drain clips are then attached to the die after die singulation and are overmolded in a batch molding process.
FIG. 1 shows atypical power MOSFET30 to which the invention can apply. The die30 may be of the type shown in U.S. Pat. No. 5,795,793 but can be any kind of die having a junction containingsilicon body31, a top aluminum (that is, aluminum with 1.0% silicon)source electrode32, analuminum gate electrode33 and a bottom drain electrode34 (FIG.2), which may be a conventional easily solderable trimetal. The top aluminum layer may be any other suitable metallic material. Connections are normally made toaluminum electrodes32 and33 by wire bonding.
As will be later described, a plurality of easily solderable contact posts36 are secured to (formed on) thesource electrode32 and acontact post37 is secured to thegate electrode33 as shown inFIGS. 3 and 4.Contacts36 and37 are sub-flush by the thickness of the passivation in the case of a silver top metal die, and by about one-half the passivation thickness in the case of a plated aluminum top metal die. The flat contact tops are coplanar. Contact to these contact surfaces is made by a solder paste, which at minimum printable solder thickness is about 4 to 5 times as thick aslayer38, which is the passivation layer residing on the top surface of the die.
The pattern ofcontacts36 can take different forms such as those shown inFIGS. 5,11 and18. Further, it is also possible to use a large area solderable contact such assource contacts40, for the die of FIG.6 andFIGS. 7 and 8. A metallizing process for formingcontacts36,37 and40 shall be later described.
In forming the package with die prepared as shown inFIGS. 3 to8, a conductive plated (or partly plated)metal clip45 ofFIG. 9 is employed.Clip45 may be a copper alloy with at least partially plated silver surfaces where contact to other surfaces is to be made. As will be later described,clip45 is modified with fins for improved cooling.
Clip45 has a general “U-shape” withshallow posts46 of a length slightly greater than the thickness ofdie31 as measured from thesurface47 to the free surfaces ofcolumns36,37, plus the thickness of an adhesive used to connect the drain to the platedinterior surface47 of the flatthin web48 of the clip. For example, the clip may have a total thickness along the full length ofposts45 of 0.7 mm and a length fromsurface47 to the free end ofposts46 of about 0.39 mm. The distance between theposts46 depends on the size of the die, and a distance of 5.6 mm has been used for a size 4.6 die of International Rectifier Corporation, with a total width of about 1.5 mm for each of posts46.
Mold lock openings48 and49 may also be formed in theclip45 as shown in FIG.10.
The solderablebottom drain electrode34 of the die30 is electrically connected to and secured to the plated interior ofdrain clip45 as by a conductive adhesive60 as shown inFIGS. 12,29,30 and31. The adhesive can, for example, be a silver loaded epoxy material which is suitably cured.Gaps61 and62 are left between the side edges ofdie30 and the opposite sides ofposts46 ofclip45.
In the embodiment shown, the structure is dimensioned so that the free surfaces of posts46 (the drain connector) andposts36 and37 are coplanar. In a preferred embodiment, the source electrode of the die may be offset inwardly in relation to free surfaces ofposts46 in order to improve the reliability of the device.
Thereafter and as shown inFIGS. 13,14 and15, the device ofFIGS. 11 and 12 is overmolded withmold compound70 in a mold tray.Mold compound70 lies over the full exposed outer surface ofclip45, except for the outer free surfaces ofposts46. Mold compound fills into thegaps61 and62 as shown inFIGS. 13 and 15. The device is now ready for surface mounting to conductive traces on a printed circuit board, which are aligned withcontacts36,37 and46.
FIGS. 16 to19 show a further embodiment of a device which can be modified by the invention, using a different clip geometry. Thus, theclip80 ofFIGS. 16 and 17 has aweb81 and three segmented projectingposts82,83 and84. A die30, which has projectingcontacts36 and37 is first adhered, at its drain contact (not shown) toweb81 as shown inFIGS. 18 and 19 so thatcontacts36,37 and the free surfaces ofdrain clip projections82,83 and84 lie in a common place. The device is then overmolded with moldedcompound70 in a suitable mold tray.
FIGS. 20 and 21 show a still further embodiment of a package that may be modified according to the present invention in which the die ofFIGS. 7 and 8 is mounted in a cup-shapedclip100 which is a silver plated copper alloy.Clip100 has an internal area greater in length and width than the die30, and, the bottom drain electrode ofdie30 is connected to the interior web surface101 (FIG. 21) by silver loaded (conductive)epoxy102, which is cured. Optionally, a ring of low stresshigh adhesion epoxy103 may be applied around the die edge, sealing and adding structural strength to the package.
The top surface ofsolderable contact40 is coplanar with drain clip projection surfaces105. Thus, all ofcontacts105,40 and27 will align with contact traces on a printed circuit board. The drain contacts may take any suitable form and could comprise a single contact or side, if desired.
FIGS. 22 to24 show a process for forming conductive posts on the aluminum electrodes of a conventional die. Thus, a plurality of identical die, each having agate electrode37 and separate source electrodes (not numbered) are shown withinwafer110 prior to die singulation. While still in wafer form, the top surface of thewafer110 is coated with aphotoimagable solder mask111.Mask111 is a photosensitive liquid epoxy which will act as a passivation layer, a plating resist (if required) and a solder mask designating and shaping the solder areas. However, other mask materials, for example, silicon nitride, can be used. Using a conventional reticule, multiple openings111a to111d are formed through the mask to the underlying source and gate contacts on the die top metal. A laser etch process can also be used to form these openings.
As shown inFIG. 24, a series of metals112 are then plated stop the surface of the wafer and the plating adheres to the metal of source32 (and other electrodes) which are exposed through openings111a to111d, forming contacts112a to112d with the source and a similar contact to the gate. Metals112a to112d can consist of a first layer of nickel which makes good contact to the aluminum, followed by a gold flash. Alternatively, the nickel can be followed by layers of copper or tin, and the like, ending with an easily solderable metal top surface such a silver.
The wafer is then sawn to separate the die at lines112 and113 for example, and the die are singulated. Thetypical die30 has the appearance shown inFIGS. 3 to8 and has a plurality of solderable source contacts and gate contacts which project aboveinsulation surface38.
The singulated die are then placed drain source-side down, into conductive clips which are plated on their interior with silver or some other conductive coating. The die is bonded to the clip, using conventional bond material such as a conductive epoxy as previously described. The clips/cans can be presented in the form of a lead frame and the devices can be later singulated from the lead frame.
According to the present invention, the clip45 (or80 or100) can be modified to improve the dissipation of heat that is generated by thedie30. Referring toFIGS. 25-27, a modifiedclip45, for example, would include aweb portion201 having a free surface from which a plurality of coolingfins200 extend away. According to an aspect of the present invention,web portion201 can have an increased thickness for better heat extraction and spreading. In the embodiment shown byFIGS. 25-27, theclip45 includes twoposts46 disposed at opposing edges ofweb portion201 and extending away from the surface ofweb portion201 which is electrically connected to an electrode ofdie30, as will be explained later. The plurality of coolingfins200, the twoposts46 and theweb portion201 are integrally connected to one another and form a unitary body, which may be made of aluminum, a metal matrix polymer, copper, a copper alloy or some other suitable thermally conductive material through extrusion, molding or some other suitable method. Of course, it should be recognized that a clip according to the present invention is not necessarily limited to the configuration shown byFIGS. 25-27 and may, for example, include fewer or more posts disposed at other positions.
Referring now toFIGS. 28-29, theback drain34 ofdie30 is conductively attached to theclip45 by solder or by a conductive silver filled epoxy. Thus, the structure can be attached to a PCB or other mountingboard210 which will have suitable traces (not shown) to receive the source andgate electrodes32,33, while theposts46 may also be connected to drain contact patterns onboard210. Referring specifically toFIGS. 30 and 31, theposts46 are insulated from the edges ofdie30 by aninsulation filler103.
The gate andsource32,33 and drain46 are separated within the die/board210 bondline using a passivation process, similar to that used in the previously described manufacturing process.
A device according to the present invention is not restricted to clips having fins for dissipating the generated heat; other heat dissipating structures may be utilized. For example, as shown byFIGS. 32a and 32b, according to another embodiment of the present invention, a clip having an array of heat dissipating pins may be used to improve air flow. Each pin in such a clip is a mesa type structure which is able to dissipate heat, but not restrict the flow of air across the heat emitting surface.
In order to improve the solderability of the clips to contacts on a circuit board, the clips may be coated with a material that can be easily soldered such as, for example, nickel, nickel-gold, nickel-palladium or silver. In addition, the clips according to the present invention may be coated with a highly emissive coating to improve heat dissipation by radiation.
Although the present invention has been described in relation to particular embodiments thereof, many other variations and modifications and other uses will become apparent to those skilled in the art. It is preferred, therefore, that the present invention be limited not by the specific disclosure herein, but only by the appended claims.

Claims (36)

1. A semiconductor device comprising:
a semiconductor die having a first electrode disposed on a first major surface thereof and a second electrode disposed on a second major surface thereof;
an electrically conductive web portion having a first major surface electrically connected to said first electrode;
a plurality of heat conductive structures extending away from a second major surface of said web portion, said second major surface of said web portion being opposite to its first major surface; and
at least one conductive post extending from an edge of said web portion in a direction away from said first major surface of said web portion wherein said second electrode of said semiconductor die is adapted to be directly connected electrically and mechanically to a conductive pad and said conductive post includes a connection surface for electrical and mechanical connection to another conductive pad so that said package semiconductor die may become externally connectable to a substrate having said conductive pads with a conductive adhesive without the necessity for an auxiliary element for external connection.
16. A semiconductor device comprising:
a semiconductor die having a first electrode disposed on a first major surface thereof and a second electrode disposed on a second major surface thereof;
an electrically conductive web portion having a first major surface electrically connected to said first electrode;
a plurality of heat conductive structures extending away from a second major surface of said web portion, said second major surface of said web portion being opposite to its first major surface;
at least one conductive post extending from an edge of said web portion in a direction away from said first major surface of said web portion; and
a third electrode disposed on said second major surface of said die;
a passivation layer disposed over at least portions of said second electrode and said third electrode of said semiconductor die.
20. A semiconductor device comprising:
a semiconductor die having a first electrode disposed on a first major surface thereof and a second electrode disposed on a second major surface thereof;
an electrically conductive web portion having a first major surface electrically connected to said first electrode;
a plurality of heat conductive structures thermally and mechanically coupled to a second major surface of said web portion, said second major surface of said web portion being opposite to its first major surface; and
at least one conductive post extending from an edge of said web portion in a direction away from said first major surface of said web portion wherein said second electrode of said semiconductor die is adapted to be directly connected electrically and mechanically to a conductive pad and said conductive post includes a connection surface for electrical and mechanical connection to another conductive pad so that said semiconductor die may become externally connectable to a substrate having said conductive pads with a conductive adhesive without the necessity for an auxiliary element for external connection.
US11/514,3272001-10-102006-08-31Semiconductor device package with improved coolingExpired - LifetimeUSRE41559E1 (en)

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US10/267,142US6784540B2 (en)2001-10-102002-10-08Semiconductor device package with improved cooling
US11/514,327USRE41559E1 (en)2001-10-102006-08-31Semiconductor device package with improved cooling

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US6784540B2 (en)2004-08-31
CN1568541A (en)2005-01-19
US20030067071A1 (en)2003-04-10

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