USD981969S1 - Elastic membrane for semiconductor wafer polishing apparatus - Google Patents

Description

FIG.1 is a top perspective view of an elastic membrane for semiconductor wafer polishing apparatus showing our new design;

FIG.2 is a bottom perspective view thereof;

FIG.3 is a top view thereof;

FIG.4 is a bottom view thereof;

FIG.5 is a front view thereof, the rear view being identical;

FIG.6 is a right-side view thereof, the left-side view being identical;

FIG.7 is an enlarged cross-sectional end view taken along line7-7 inFIG.3 thereof; and,

FIG.8 is an enlarged detail view ofsection8 inFIG.7 thereof.

Claims (1)

CLAIM
1. The ornamental design for an elastic membrane for semiconductor wafer polishing apparatus, as shown and described.

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