USD979524S1 - Confinement liner for a substrate processing chamber - Google Patents

Description

FIG.1 is a top isometric view of a confinement liner for a substrate processing chamber showing my new design;

FIG.2 is a top plan view thereof;

FIG.3 is a bottom plan view thereof;

FIG.4 is a front elevation view thereof;

FIG.5 is a rear elevation view thereof;

FIG.6 is a left side elevation view thereof;

FIG.7 is a right side elevation view thereof; and,

FIG.8 is an enlarged cross sectional view taken along line8-8 ofFIG.2.

The broken lines shown in the drawings represent portions of a confinement liner for a substrate processing chamber that form no part of the claimed design.

Claims (1)

CLAIM
1. The ornamental design for a confinement liner for a substrate processing chamber, as shown and described.

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