USD966357S1 - Target profile for a physical vapor deposition chamber target - Google Patents
Target profile for a physical vapor deposition chamber targetDownload PDFInfo
- Publication number
- USD966357S1 USD966357S1US29/821,669US202129821669FUSD966357SUS D966357 S1USD966357 S1US D966357S1US 202129821669 FUS202129821669 FUS 202129821669FUS D966357 SUSD966357 SUS D966357S
- Authority
- US
- United States
- Prior art keywords
- target
- vapor deposition
- physical vapor
- deposition chamber
- profile
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
The broken lines in the drawings represent unclaimed environment and form no part of the claimed design.
The long dash short dash broken lines inFIGS. 4 and 8 represent the region of enlargement taken fromFIG. 4 as shown inFIG. 8 and form no part of the claimed design.
Claims (1)
- We claim the ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/821,669USD966357S1 (en) | 2020-12-02 | 2021-12-31 | Target profile for a physical vapor deposition chamber target |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/760,578USD940765S1 (en) | 2020-12-02 | 2020-12-02 | Target profile for a physical vapor deposition chamber target |
| US29/821,669USD966357S1 (en) | 2020-12-02 | 2021-12-31 | Target profile for a physical vapor deposition chamber target |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/760,578DivisionUSD940765S1 (en) | 2020-12-02 | 2020-12-02 | Target profile for a physical vapor deposition chamber target |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USD966357S1true USD966357S1 (en) | 2022-10-11 |
Family
ID=79168170
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/760,578ActiveUSD940765S1 (en) | 2020-12-02 | 2020-12-02 | Target profile for a physical vapor deposition chamber target |
| US29/821,669ActiveUSD966357S1 (en) | 2020-12-02 | 2021-12-31 | Target profile for a physical vapor deposition chamber target |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/760,578ActiveUSD940765S1 (en) | 2020-12-02 | 2020-12-02 | Target profile for a physical vapor deposition chamber target |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | USD940765S1 (en) |
| TW (2) | TWD232578S (en) |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD980814S1 (en)* | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas distributor for substrate processing apparatus |
| USD980813S1 (en)* | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas flow control plate for substrate processing apparatus |
| USD989012S1 (en)* | 2020-09-17 | 2023-06-13 | Ebara Corporation | Elastic membrane |
| USD990441S1 (en)* | 2021-09-07 | 2023-06-27 | Asm Ip Holding B.V. | Gas flow control plate |
| USD1006768S1 (en)* | 2021-01-07 | 2023-12-05 | Solaero Technologies Corp. | Semiconductor wafer for mosaic solar cell fabrication |
| USD1007449S1 (en)* | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
| USD1012051S1 (en)* | 2019-06-17 | 2024-01-23 | Tokyo Electron Limited | Electrostatic chuck for semiconductor manufacturing device |
| USD1012873S1 (en)* | 2020-09-24 | 2024-01-30 | Asm Ip Holding B.V. | Electrode for semiconductor processing apparatus |
| USD1053230S1 (en) | 2022-05-19 | 2024-12-03 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
| USD1071103S1 (en)* | 2022-04-11 | 2025-04-15 | Applied Materials, Inc. | Gas distribution plate |
| USD1071886S1 (en)* | 2022-01-20 | 2025-04-22 | Applied Materials, Inc. | Substrate support for a substrate processing chamber |
| USD1072774S1 (en)* | 2021-02-06 | 2025-04-29 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
| USD1085029S1 (en)* | 2022-07-19 | 2025-07-22 | Applied Materials, Inc. | Gas distribution plate |
| USD1086087S1 (en)* | 2023-03-30 | 2025-07-29 | Samsung Electronics Co., Ltd. | CMP (chemical mechanical planarization) retaining ring |
| USD1090468S1 (en) | 2021-09-08 | 2025-08-26 | Lam Research Corporation | Debubbler component |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD937329S1 (en)* | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
| USD973609S1 (en)* | 2020-04-22 | 2022-12-27 | Applied Materials, Inc. | Upper shield with showerhead for a process chamber |
| US12080522B2 (en) | 2020-04-22 | 2024-09-03 | Applied Materials, Inc. | Preclean chamber upper shield with showerhead |
| USD940765S1 (en)* | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
| JP1700776S (en)* | 2021-03-04 | 2021-11-29 | Substrate placement plate for substrate processing apparatus |
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| TWD202101S (en) | 2018-03-09 | 2020-01-11 | 美商應用材料股份有限公司 | Target profile for a physical vapor deposition chamber target |
| US10662520B2 (en) | 2017-03-29 | 2020-05-26 | Applied Materials, Inc. | Method for recycling substrate process components |
| USD888903S1 (en) | 2018-12-17 | 2020-06-30 | Applied Materials, Inc. | Deposition ring for physical vapor deposition chamber |
| USD891382S1 (en) | 2019-02-08 | 2020-07-28 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
| USD893441S1 (en) | 2019-06-28 | 2020-08-18 | Applied Materials, Inc. | Base plate for a processing chamber substrate support |
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| USD908645S1 (en)* | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
| USD913980S1 (en)* | 2018-02-01 | 2021-03-23 | Asm Ip Holding B.V. | Gas supply plate for semiconductor manufacturing apparatus |
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| USD933725S1 (en)* | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
| USD933726S1 (en)* | 2020-07-31 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a semiconductor processing chamber |
| USD937329S1 (en)* | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
| USD940765S1 (en)* | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
| USD941371S1 (en)* | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
- 2020
- 2020-12-02USUS29/760,578patent/USD940765S1/enactiveActive
- 2021
- 2021-05-21TWTW111302514Fpatent/TWD232578S/enunknown
- 2021-05-21TWTW110302622Fpatent/TWD232372S/enunknown
- 2021-12-31USUS29/821,669patent/USD966357S1/enactiveActive
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