USD902165S1 - Target profile for a physical vapor deposition chamber target - Google Patents
Target profile for a physical vapor deposition chamber targetDownload PDFInfo
- Publication number
- USD902165S1 USD902165S1US29/726,094US202029726094FUSD902165SUS D902165 S1USD902165 S1US D902165S1US 202029726094 FUS202029726094 FUS 202029726094FUS D902165 SUSD902165 SUS D902165S
- Authority
- US
- United States
- Prior art keywords
- target
- vapor deposition
- physical vapor
- deposition chamber
- profile
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
The dashed lines inFIGS. 1-9 represent unclaimed environment and form no part of the claimed design.
Claims (1)
- The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/726,094USD902165S1 (en) | 2018-03-09 | 2020-02-28 | Target profile for a physical vapor deposition chamber target |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/639,953USD877101S1 (en) | 2018-03-09 | 2018-03-09 | Target profile for a physical vapor deposition chamber target |
| US29/726,094USD902165S1 (en) | 2018-03-09 | 2020-02-28 | Target profile for a physical vapor deposition chamber target |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/639,953DivisionUSD877101S1 (en) | 2018-03-09 | 2018-03-09 | Target profile for a physical vapor deposition chamber target |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USD902165S1true USD902165S1 (en) | 2020-11-17 |
Family
ID=67769548
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/639,953ActiveUSD877101S1 (en) | 2018-03-09 | 2018-03-09 | Target profile for a physical vapor deposition chamber target |
| US29/726,094ActiveUSD902165S1 (en) | 2018-03-09 | 2020-02-28 | Target profile for a physical vapor deposition chamber target |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/639,953ActiveUSD877101S1 (en) | 2018-03-09 | 2018-03-09 | Target profile for a physical vapor deposition chamber target |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | USD877101S1 (en) |
| JP (2) | JP1651699S (en) |
| TW (2) | TWD203691S (en) |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD933725S1 (en)* | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
| USD933726S1 (en)* | 2020-07-31 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a semiconductor processing chamber |
| USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
| USD940765S1 (en) | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
| USD946638S1 (en) | 2017-12-11 | 2022-03-22 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
| US11581166B2 (en) | 2020-07-31 | 2023-02-14 | Applied Materials, Inc. | Low profile deposition ring for enhanced life |
| USD1007449S1 (en) | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
| USD1012051S1 (en)* | 2019-06-17 | 2024-01-23 | Tokyo Electron Limited | Electrostatic chuck for semiconductor manufacturing device |
| USD1012873S1 (en)* | 2020-09-24 | 2024-01-30 | Asm Ip Holding B.V. | Electrode for semiconductor processing apparatus |
| USD1053230S1 (en) | 2022-05-19 | 2024-12-03 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
| USD1071103S1 (en)* | 2022-04-11 | 2025-04-15 | Applied Materials, Inc. | Gas distribution plate |
| USD1072774S1 (en)* | 2021-02-06 | 2025-04-29 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
| USD1085029S1 (en)* | 2022-07-19 | 2025-07-22 | Applied Materials, Inc. | Gas distribution plate |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD851613S1 (en)* | 2017-10-05 | 2019-06-18 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
| US10746511B2 (en) | 2017-11-06 | 2020-08-18 | JMA Outdoors, Inc. | Apparatus for generating a vitals target |
| USD877101S1 (en) | 2018-03-09 | 2020-03-03 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
| USD917003S1 (en)* | 2018-06-06 | 2021-04-20 | JMA Outdoors, Inc. | Simulating target |
| JP1646505S (en)* | 2018-12-07 | 2019-11-25 | ||
| US12125728B2 (en) | 2019-01-21 | 2024-10-22 | Applied Materials, Inc. | Substrate carrier |
| USD904640S1 (en)* | 2019-01-21 | 2020-12-08 | Applied Materials, Inc. | Substrate carrier |
| USD942516S1 (en)* | 2019-02-08 | 2022-02-01 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
| USD908645S1 (en)* | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
| USD941371S1 (en)* | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
| USD941372S1 (en)* | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
| JP1700776S (en)* | 2021-03-04 | 2021-11-29 | Substrate placement plate for substrate processing apparatus | |
| USD1037778S1 (en) | 2022-07-19 | 2024-08-06 | Applied Materials, Inc. | Gas distribution plate |
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| USD496951S1 (en) | 2003-01-30 | 2004-10-05 | Thermal Dynamics Corporation | Mechanized cap for a plasma arc torch |
| US6815352B1 (en) | 1999-11-09 | 2004-11-09 | Shin-Etsu Chemical Co., Ltd. | Silicon focus ring and method for producing the same |
| USD503729S1 (en) | 2003-10-31 | 2005-04-05 | Nordson Corporation | Nozzle for dispensing adhesives and sealants |
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- 2018
- 2018-03-09USUS29/639,953patent/USD877101S1/enactiveActive
- 2018-09-07JPJPD2019-5062Fpatent/JP1651699S/jaactiveActive
- 2018-09-07JPJPD2018-19579Fpatent/JP1640252S/jaactiveActive
- 2018-09-10TWTW108303594Fpatent/TWD203691S/enunknown
- 2018-09-10TWTW107305358Fpatent/TWD202101S/enunknown
- 2020
- 2020-02-28USUS29/726,094patent/USD902165S1/enactiveActive
Patent Citations (107)
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| USD877101S1 (en) | 2020-03-03 |
| JP1640252S (en) | 2019-09-02 |
| TWD202101S (en) | 2020-01-11 |
| JP1651699S (en) | 2020-01-27 |
| TWD203691S (en) | 2020-04-01 |
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