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USD810705S1 - Self-centering wafer carrier for chemical vapor deposition - Google Patents

Self-centering wafer carrier for chemical vapor deposition
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Publication number
USD810705S1
USD810705S1US29/559,977US201629559977FUSD810705SUS D810705 S1USD810705 S1US D810705S1US 201629559977 FUS201629559977 FUS 201629559977FUS D810705 SUSD810705 SUS D810705S
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US
United States
Prior art keywords
self
vapor deposition
chemical vapor
wafer carrier
centering wafer
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Active
Application number
US29/559,977
Inventor
Sandeep Krishnan
Alexander I. Gurary
Chenghung Paul Chang
Earl Marcelo
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Veeco Instruments Inc
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Veeco Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Priority to US29/559,977priorityCriticalpatent/USD810705S1/en
Application filed by Veeco Instruments IncfiledCriticalVeeco Instruments Inc
Priority to JPD2016-16295Fprioritypatent/JP1570950S/ja
Priority to TW105301931D02Fprioritypatent/TWD186210S/en
Priority to JPD2016-16296Fprioritypatent/JP1570951S/ja
Priority to TW105301931Fprioritypatent/TWD183209S/en
Priority to TW105301931D01Fprioritypatent/TWD184276S/en
Priority to JPD2016-8300Fprioritypatent/JP1570910S/ja
Priority to TW105301931D03Fprioritypatent/TWD186211S/en
Priority to JPD2016-16294Fprioritypatent/JP1570949S/ja
Application grantedgrantedCritical
Publication of USD810705S1publicationCriticalpatent/USD810705S1/en
Assigned to VEECO INSTRUMENTS, INCreassignmentVEECO INSTRUMENTS, INCASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: KRISNAN, SANDEEP, CHANG, CHENGHUNG PAUL, GURARY, ALEXANDER, MARCELO, Earl
Assigned to HSBC BANK USA, NATIONAL ASSOCIATION, AS COLLATERAL AGENTreassignmentHSBC BANK USA, NATIONAL ASSOCIATION, AS COLLATERAL AGENTPATENT SECURITY AGREEMENTAssignors: VEECO INSTRUMENTS INC.
Assigned to HSBC BANK USA, NATIONAL ASSOCIATIONreassignmentHSBC BANK USA, NATIONAL ASSOCIATIONSECURITY INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: VEECO INSTRUMENTS INC.
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FIG. 1 is a top perspective view of a first embodiment of an ornamental design for a self-centering wafer carrier for chemical vapor deposition;
FIG. 2 is a bottom perspective view of the first embodiment thereof;
FIG. 3 is a top view of the first embodiment thereof;
FIG. 4 is a bottom view of the first embodiment thereof;
FIG. 5 is a right view of the first embodiment thereof,
FIG. 6 is a left view of the first embodiment thereof;
FIG. 7 is a rear view of the first embodiment thereof;
FIG. 8 is a front view of the first embodiment thereof; and
FIG. 9 is a cross section view taken along9-9 inFIG. 3 of the first embodiment thereof.
FIG. 10 is a top perspective view of a second embodiment of an ornamental design for a self-centering wafer carrier for chemical vapor deposition;
FIG. 11 is a bottom perspective view of the second embodiment thereof;
FIG. 12 is a top view of the second embodiment thereof;
FIG. 13 is a bottom view of the second embodiment thereof;
FIG. 14 is a right view of the second embodiment thereof;
FIG. 15 is a left view of the second embodiment thereof;
FIG. 16 is a rear view of the second embodiment thereof;
FIG. 17 is a front view of the second embodiment thereof; and
FIG. 18 is a cross section view taken along18-18 inFIG. 12 of the second embodiment thereof.
FIG. 19 is a top perspective view of a third embodiment of an ornamental design for a self-centering wafer carrier for chemical vapor deposition;
FIG. 20 is a bottom perspective view of the third embodiment thereof;
FIG. 21 is a top view of the third embodiment thereof;
FIG. 22 is a bottom view of the third embodiment thereof;
FIG. 23 is a right view of the third embodiment thereof;
FIG. 24 is a left view of the third embodiment thereof;
FIG. 25 is a rear view of the third embodiment thereof; and
FIG. 26 is a front view of the third embodiment thereof.
FIG. 27 is a top perspective view of a fourth embodiment of an ornamental design for a self-centering wafer carrier for chemical vapor deposition;
FIG. 28 is a bottom perspective view of the fourth embodiment thereof;
FIG. 29 is a top view of the fourth embodiment thereof;
FIG. 30 is a bottom view of the fourth embodiment thereof;
FIG. 31 is a right view of the fourth embodiment thereof;
FIG. 32 is a left view of the fourth embodiment thereof;
FIG. 33 is a rear view of the fourth embodiment thereof;
FIG. 34 is a front view of the fourth embodiment thereof; and,
FIG. 35 is a cross section view taken along35-35 inFIG. 29 of the fourth embodiment thereof.

Claims (1)

    CLAIM
  1. The ornamental design for a self-centering wafer carrier for chemical vapor deposition, as shown and described.
US29/559,9772015-10-142016-04-01Self-centering wafer carrier for chemical vapor depositionActiveUSD810705S1 (en)

Priority Applications (9)

Application NumberPriority DateFiling DateTitle
US29/559,977USD810705S1 (en)2016-04-012016-04-01Self-centering wafer carrier for chemical vapor deposition
JPD2016-16294FJP1570949S (en)2015-10-142016-04-14
JPD2016-16296FJP1570951S (en)2015-10-142016-04-14
TW105301931FTWD183209S (en)2016-04-012016-04-14Wafer carrier for deposition
TW105301931D01FTWD184276S (en)2016-04-012016-04-14Wafer carrier for deposition
JPD2016-8300FJP1570910S (en)2015-10-142016-04-14
JPD2016-16295FJP1570950S (en)2015-10-142016-04-14
TW105301931D02FTWD186210S (en)2016-04-012016-04-14Wafer carrier for deposition
TW105301931D03FTWD186211S (en)2016-04-012016-04-14Wafer carrier for deposition

Applications Claiming Priority (1)

Application NumberPriority DateFiling DateTitle
US29/559,977USD810705S1 (en)2016-04-012016-04-01Self-centering wafer carrier for chemical vapor deposition

Publications (1)

Publication NumberPublication Date
USD810705S1true USD810705S1 (en)2018-02-20

Family

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Family Applications (1)

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US29/559,977ActiveUSD810705S1 (en)2015-10-142016-04-01Self-centering wafer carrier for chemical vapor deposition

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US (1)USD810705S1 (en)
TW (4)TWD186211S (en)

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