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USD711843S1 - Reaction tube - Google Patents

Reaction tube
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Publication number
USD711843S1
USD711843S1US29/477,766US201329477766FUSD711843SUS D711843 S1USD711843 S1US D711843S1US 201329477766 FUS201329477766 FUS 201329477766FUS D711843 SUSD711843 SUS D711843S
Authority
US
United States
Prior art keywords
reaction tube
view
elevational view
reaction
ornamental design
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/477,766
Inventor
Keishin Yamazaki
Masahiro Miyake
Kosuke Takagi
Yasuaki Komae
Shinya Morita
Naonori Akae
Masato Terasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
Original Assignee
Hitachi Kokusai Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Kokusai Electric IncfiledCriticalHitachi Kokusai Electric Inc
Assigned to HITACHI KOKUSAI ELECTRIC INC.reassignmentHITACHI KOKUSAI ELECTRIC INC.ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: AKAE, NAONORI, KOMAE, YASUAKI, MIYAKE, MASAHIRO, MORITA, SHINYA, TAKAGI, KOSUKE, TERASAKI, MASATO, YAMAZAKI, KEISHIN
Application grantedgrantedCritical
Publication of USD711843S1publicationCriticalpatent/USD711843S1/en
Assigned to Kokusai Electric CorporationreassignmentKokusai Electric CorporationASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: HITACHI KOKUSAI ELECTRIC INC.
Activelegal-statusCriticalCurrent
Anticipated expirationlegal-statusCritical

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Description

FIG. 1 is a front, top, right side perspective view of a reaction tube showing our new design;
FIG. 2 is a rear, bottom and left side perspective view thereof;
FIG. 3 is a front elevational view thereof;
FIG. 4 is a rear elevational view thereof;
FIG. 5 is a left side elevational view thereof;
FIG. 6 is a right side elevational view thereof;
FIG. 7 is a top plan view thereof;
FIG. 8 is a bottom plan view thereof; and,
FIG. 9 is a cross-sectional view taken along line9-9 inFIG. 3.
The broken lines shown in the drawings represent portions of the reaction tube that form no part of the claimed design.

Claims (1)

    CLAIM
  1. We claim the ornamental design for a reaction tube, as shown and described.
US29/477,7662013-06-282013-12-26Reaction tubeActiveUSD711843S1 (en)

Applications Claiming Priority (2)

Application NumberPriority DateFiling DateTitle
JP20130148312013-06-28
JP2013-0148312013-06-28

Publications (1)

Publication NumberPublication Date
USD711843S1true USD711843S1 (en)2014-08-26

Family

ID=51359017

Family Applications (1)

Application NumberTitlePriority DateFiling Date
US29/477,766ActiveUSD711843S1 (en)2013-06-282013-12-26Reaction tube

Country Status (2)

CountryLink
US (1)USD711843S1 (en)
TW (1)TWD167986S (en)

Cited By (24)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
USD770993S1 (en)*2015-09-042016-11-08Hitachi Kokusai Electric Inc.Reaction tube
USD772824S1 (en)*2015-02-252016-11-29Hitachi Kokusai Electric Inc.Reaction tube
USD778458S1 (en)*2015-02-232017-02-07Hitachi Kokusai Electric Inc.Reaction tube
USD790490S1 (en)*2015-09-042017-06-27Hitachi Kokusai Electric Inc.Reaction tube
USD791090S1 (en)*2015-09-042017-07-04Hitachi Kokusai Electric Inc.Reaction tube
USD842824S1 (en)*2017-08-092019-03-12Kokusai Electric CorporationReaction tube
USD842823S1 (en)*2017-08-102019-03-12Kokusai Electric CorporationReaction tube
USD843958S1 (en)*2017-08-102019-03-26Kokusai Electric CorporationReaction tube
USD853979S1 (en)*2017-12-272019-07-16Kokusai Electric CorporationReaction tube
USD901406S1 (en)*2019-03-202020-11-10Kokusai Electric CorporationInner tube of reactor for semiconductor fabrication
USD926963S1 (en)*2012-05-152021-08-03Airius Ip Holdings, LlcAir moving device
US11092330B2 (en)2013-12-192021-08-17Airius Ip Holdings, LlcColumnar air moving devices, systems and methods
US11105341B2 (en)2016-06-242021-08-31Airius Ip Holdings, LlcAir moving device
USD931823S1 (en)*2020-01-292021-09-28Kokusai Electric CorporationReaction tube
US11221153B2 (en)2013-12-192022-01-11Airius Ip Holdings, LlcColumnar air moving devices, systems and methods
US11236766B2 (en)2014-06-062022-02-01Airius Ip Holdings LlcColumnar air moving devices, systems and methods
US11365743B2 (en)2004-03-152022-06-21Airius Ip Holdings, LlcTemperature destratification systems
US11598539B2 (en)2019-04-172023-03-07Airius Ip Holdings, LlcAir moving device with bypass intake
USD987054S1 (en)2019-03-192023-05-23Airius Ip Holdings, LlcAir moving device
USD1019581S1 (en)*2022-05-302024-03-26Kokusai Electric CorporationInner tube of reaction tube for semiconductor manufacturing equipment
USD1019582S1 (en)*2022-05-302024-03-26Kokusai Electric CorporationInner tube of reaction tube for semiconductor manufacturing equipment
USD1019583S1 (en)*2022-05-302024-03-26Kokusai Electric CorporationInner tube of reaction tube for semiconductor manufacturing equipment
USD1053156S1 (en)*2022-03-152024-12-03Kokusai Electric CorporationFurnace for substrate processing apparatus
USD1070797S1 (en)*2022-03-152025-04-15Kokusai Electric CorporationFurnace for substrate processing apparatus

Citations (25)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
USD404368S (en)*1997-08-201999-01-19Tokyo Electron LimitedOuter tube for use in a semiconductor wafer heat processing apparatus
USD405062S (en)*1997-08-201999-02-02Tokyo Electron Ltd.Processing tube for use in a semiconductor wafer heat processing apparatus
USD405431S (en)*1997-08-201999-02-09Tokyo Electron Ltd.Tube for use in a semiconductor wafer heat processing apparatus
USD405430S (en)*1997-01-311999-02-09Tokyo Electron LimitedInner tube for use in a semiconductor wafer heat processing apparatus
USD405429S (en)*1997-01-311999-02-09Tokyo Electron LimitedProcessing tube for use in a semiconductor wafer heat processing apparatus
USD406113S (en)*1997-01-311999-02-23Tokyo Electron LimitedProcessing tube for use in a semiconductor wafer heat processing apparatus
USD407696S (en)*1997-08-201999-04-06Tokyo Electron LimitedInner tube for use in a semiconductor wafer heat processing apparatus
USD417438S (en)*1997-01-311999-12-07Tokyo Electron LimitedQuartz outer tube
USD423463S (en)*1997-01-312000-04-25Tokyo Electron LimitedQuartz process tube
USD424024S (en)*1997-01-312000-05-02Tokyo Electron LimitedQuartz process tube
USD520467S1 (en)*2003-11-042006-05-09Tokyo Electron LimitedProcess tube for semiconductor device manufacturing apparatus
US20080090195A1 (en)*2006-10-132008-04-17Tokyo Electron LimitedHeat treatment apparatus
USD586768S1 (en)*2006-10-122009-02-17Tokyo Electron LimitedProcess tube for manufacturing semiconductor wafers
USD594488S1 (en)*2007-04-202009-06-16Tokyo Electron LimitedProcess tube for manufacturing semiconductor wafers
US20090194521A1 (en)*2008-01-312009-08-06Tokyo Electron LimitedThermal processing furnace
USD600659S1 (en)*2006-09-122009-09-22Tokyo Electron LimitedProcess tube for manufacturing semiconductor wafers
US20090250005A1 (en)*2008-04-032009-10-08Tokyo Electron LimitedReaction tube and heat processing apparatus for a semiconductor process
USD610559S1 (en)2008-05-302010-02-23Hitachi Kokusai Electric, Inc.Reaction tube
USD611013S1 (en)*2008-03-282010-03-02Tokyo Electron LimitedProcess tube for manufacturing semiconductor wafers
USD618638S1 (en)*2008-05-092010-06-29Hitachi Kokusai Electric, Inc.Reaction tube
USD655258S1 (en)*2010-10-212012-03-06Tokyo Electron LimitedSide wall for reactor for manufacturing semiconductor
USD655255S1 (en)*2010-06-182012-03-06Hitachi Kokusai Electric Inc.Boat of wafer processing apparatus
USD655262S1 (en)*2010-10-212012-03-06Tokyo Electron LimitedSide wall for reactor for manufacturing semiconductor
USD655682S1 (en)*2010-06-182012-03-13Hitachi Kokusai Electric Inc.Boat of wafer processing apparatus
USD661265S1 (en)*2010-05-192012-06-05Nippon Mektron, Ltd.Flexible printed circuit board

Patent Citations (25)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
USD405430S (en)*1997-01-311999-02-09Tokyo Electron LimitedInner tube for use in a semiconductor wafer heat processing apparatus
USD405429S (en)*1997-01-311999-02-09Tokyo Electron LimitedProcessing tube for use in a semiconductor wafer heat processing apparatus
USD406113S (en)*1997-01-311999-02-23Tokyo Electron LimitedProcessing tube for use in a semiconductor wafer heat processing apparatus
USD417438S (en)*1997-01-311999-12-07Tokyo Electron LimitedQuartz outer tube
USD423463S (en)*1997-01-312000-04-25Tokyo Electron LimitedQuartz process tube
USD424024S (en)*1997-01-312000-05-02Tokyo Electron LimitedQuartz process tube
USD404368S (en)*1997-08-201999-01-19Tokyo Electron LimitedOuter tube for use in a semiconductor wafer heat processing apparatus
USD405062S (en)*1997-08-201999-02-02Tokyo Electron Ltd.Processing tube for use in a semiconductor wafer heat processing apparatus
USD405431S (en)*1997-08-201999-02-09Tokyo Electron Ltd.Tube for use in a semiconductor wafer heat processing apparatus
USD407696S (en)*1997-08-201999-04-06Tokyo Electron LimitedInner tube for use in a semiconductor wafer heat processing apparatus
USD520467S1 (en)*2003-11-042006-05-09Tokyo Electron LimitedProcess tube for semiconductor device manufacturing apparatus
USD600659S1 (en)*2006-09-122009-09-22Tokyo Electron LimitedProcess tube for manufacturing semiconductor wafers
USD586768S1 (en)*2006-10-122009-02-17Tokyo Electron LimitedProcess tube for manufacturing semiconductor wafers
US20080090195A1 (en)*2006-10-132008-04-17Tokyo Electron LimitedHeat treatment apparatus
USD594488S1 (en)*2007-04-202009-06-16Tokyo Electron LimitedProcess tube for manufacturing semiconductor wafers
US20090194521A1 (en)*2008-01-312009-08-06Tokyo Electron LimitedThermal processing furnace
USD611013S1 (en)*2008-03-282010-03-02Tokyo Electron LimitedProcess tube for manufacturing semiconductor wafers
US20090250005A1 (en)*2008-04-032009-10-08Tokyo Electron LimitedReaction tube and heat processing apparatus for a semiconductor process
USD618638S1 (en)*2008-05-092010-06-29Hitachi Kokusai Electric, Inc.Reaction tube
USD610559S1 (en)2008-05-302010-02-23Hitachi Kokusai Electric, Inc.Reaction tube
USD661265S1 (en)*2010-05-192012-06-05Nippon Mektron, Ltd.Flexible printed circuit board
USD655255S1 (en)*2010-06-182012-03-06Hitachi Kokusai Electric Inc.Boat of wafer processing apparatus
USD655682S1 (en)*2010-06-182012-03-13Hitachi Kokusai Electric Inc.Boat of wafer processing apparatus
USD655258S1 (en)*2010-10-212012-03-06Tokyo Electron LimitedSide wall for reactor for manufacturing semiconductor
USD655262S1 (en)*2010-10-212012-03-06Tokyo Electron LimitedSide wall for reactor for manufacturing semiconductor

Cited By (30)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US12085084B2 (en)2004-03-152024-09-10Airius Ip Holdings, LlcTemperature destratification systems
US11703062B2 (en)2004-03-152023-07-18Airius Ip Holdings, LlcTemperature destratification systems
US11365743B2 (en)2004-03-152022-06-21Airius Ip Holdings, LlcTemperature destratification systems
USD926963S1 (en)*2012-05-152021-08-03Airius Ip Holdings, LlcAir moving device
US11221153B2 (en)2013-12-192022-01-11Airius Ip Holdings, LlcColumnar air moving devices, systems and methods
US11092330B2 (en)2013-12-192021-08-17Airius Ip Holdings, LlcColumnar air moving devices, systems and methods
US11713773B2 (en)2014-06-062023-08-01Airius Ip Holdings, LlcColumnar air moving devices, systems and methods
US11236766B2 (en)2014-06-062022-02-01Airius Ip Holdings LlcColumnar air moving devices, systems and methods
USD778458S1 (en)*2015-02-232017-02-07Hitachi Kokusai Electric Inc.Reaction tube
USD772824S1 (en)*2015-02-252016-11-29Hitachi Kokusai Electric Inc.Reaction tube
USD791090S1 (en)*2015-09-042017-07-04Hitachi Kokusai Electric Inc.Reaction tube
USD770993S1 (en)*2015-09-042016-11-08Hitachi Kokusai Electric Inc.Reaction tube
USD790490S1 (en)*2015-09-042017-06-27Hitachi Kokusai Electric Inc.Reaction tube
US11421710B2 (en)2016-06-242022-08-23Airius Ip Holdings, LlcAir moving device
US11105341B2 (en)2016-06-242021-08-31Airius Ip Holdings, LlcAir moving device
USD842824S1 (en)*2017-08-092019-03-12Kokusai Electric CorporationReaction tube
USD843958S1 (en)*2017-08-102019-03-26Kokusai Electric CorporationReaction tube
USD842823S1 (en)*2017-08-102019-03-12Kokusai Electric CorporationReaction tube
USD853979S1 (en)*2017-12-272019-07-16Kokusai Electric CorporationReaction tube
USD987054S1 (en)2019-03-192023-05-23Airius Ip Holdings, LlcAir moving device
USD901406S1 (en)*2019-03-202020-11-10Kokusai Electric CorporationInner tube of reactor for semiconductor fabrication
US11598539B2 (en)2019-04-172023-03-07Airius Ip Holdings, LlcAir moving device with bypass intake
US11781761B1 (en)2019-04-172023-10-10Airius Ip Holdings, LlcAir moving device with bypass intake
US12259156B2 (en)2019-04-172025-03-25Airius Ip Holdings, LlcAir moving device with bypass intake
USD931823S1 (en)*2020-01-292021-09-28Kokusai Electric CorporationReaction tube
USD1053156S1 (en)*2022-03-152024-12-03Kokusai Electric CorporationFurnace for substrate processing apparatus
USD1070797S1 (en)*2022-03-152025-04-15Kokusai Electric CorporationFurnace for substrate processing apparatus
USD1019581S1 (en)*2022-05-302024-03-26Kokusai Electric CorporationInner tube of reaction tube for semiconductor manufacturing equipment
USD1019582S1 (en)*2022-05-302024-03-26Kokusai Electric CorporationInner tube of reaction tube for semiconductor manufacturing equipment
USD1019583S1 (en)*2022-05-302024-03-26Kokusai Electric CorporationInner tube of reaction tube for semiconductor manufacturing equipment

Also Published As

Publication numberPublication date
TWD167986S (en)2015-05-21

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