




| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP2013014831 | 2013-06-28 | ||
| JP2013-014831 | 2013-06-28 | 
| Publication Number | Publication Date | 
|---|---|
| USD711843S1true USD711843S1 (en) | 2014-08-26 | 
| Application Number | Title | Priority Date | Filing Date | 
|---|---|---|---|
| US29/477,766ActiveUSD711843S1 (en) | 2013-06-28 | 2013-12-26 | Reaction tube | 
| Country | Link | 
|---|---|
| US (1) | USD711843S1 (en) | 
| TW (1) | TWD167986S (en) | 
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| USD770993S1 (en)* | 2015-09-04 | 2016-11-08 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| USD772824S1 (en)* | 2015-02-25 | 2016-11-29 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| USD778458S1 (en)* | 2015-02-23 | 2017-02-07 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| USD790490S1 (en)* | 2015-09-04 | 2017-06-27 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| USD791090S1 (en)* | 2015-09-04 | 2017-07-04 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| USD842824S1 (en)* | 2017-08-09 | 2019-03-12 | Kokusai Electric Corporation | Reaction tube | 
| USD842823S1 (en)* | 2017-08-10 | 2019-03-12 | Kokusai Electric Corporation | Reaction tube | 
| USD843958S1 (en)* | 2017-08-10 | 2019-03-26 | Kokusai Electric Corporation | Reaction tube | 
| USD853979S1 (en)* | 2017-12-27 | 2019-07-16 | Kokusai Electric Corporation | Reaction tube | 
| USD901406S1 (en)* | 2019-03-20 | 2020-11-10 | Kokusai Electric Corporation | Inner tube of reactor for semiconductor fabrication | 
| USD926963S1 (en)* | 2012-05-15 | 2021-08-03 | Airius Ip Holdings, Llc | Air moving device | 
| US11092330B2 (en) | 2013-12-19 | 2021-08-17 | Airius Ip Holdings, Llc | Columnar air moving devices, systems and methods | 
| US11105341B2 (en) | 2016-06-24 | 2021-08-31 | Airius Ip Holdings, Llc | Air moving device | 
| USD931823S1 (en)* | 2020-01-29 | 2021-09-28 | Kokusai Electric Corporation | Reaction tube | 
| US11221153B2 (en) | 2013-12-19 | 2022-01-11 | Airius Ip Holdings, Llc | Columnar air moving devices, systems and methods | 
| US11236766B2 (en) | 2014-06-06 | 2022-02-01 | Airius Ip Holdings Llc | Columnar air moving devices, systems and methods | 
| US11365743B2 (en) | 2004-03-15 | 2022-06-21 | Airius Ip Holdings, Llc | Temperature destratification systems | 
| US11598539B2 (en) | 2019-04-17 | 2023-03-07 | Airius Ip Holdings, Llc | Air moving device with bypass intake | 
| USD987054S1 (en) | 2019-03-19 | 2023-05-23 | Airius Ip Holdings, Llc | Air moving device | 
| USD1019581S1 (en)* | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment | 
| USD1019582S1 (en)* | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment | 
| USD1019583S1 (en)* | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment | 
| USD1053156S1 (en)* | 2022-03-15 | 2024-12-03 | Kokusai Electric Corporation | Furnace for substrate processing apparatus | 
| USD1070797S1 (en)* | 2022-03-15 | 2025-04-15 | Kokusai Electric Corporation | Furnace for substrate processing apparatus | 
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| USD404368S (en)* | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Outer tube for use in a semiconductor wafer heat processing apparatus | 
| USD405062S (en)* | 1997-08-20 | 1999-02-02 | Tokyo Electron Ltd. | Processing tube for use in a semiconductor wafer heat processing apparatus | 
| USD405431S (en)* | 1997-08-20 | 1999-02-09 | Tokyo Electron Ltd. | Tube for use in a semiconductor wafer heat processing apparatus | 
| USD405430S (en)* | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Inner tube for use in a semiconductor wafer heat processing apparatus | 
| USD405429S (en)* | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus | 
| USD406113S (en)* | 1997-01-31 | 1999-02-23 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus | 
| USD407696S (en)* | 1997-08-20 | 1999-04-06 | Tokyo Electron Limited | Inner tube for use in a semiconductor wafer heat processing apparatus | 
| USD417438S (en)* | 1997-01-31 | 1999-12-07 | Tokyo Electron Limited | Quartz outer tube | 
| USD423463S (en)* | 1997-01-31 | 2000-04-25 | Tokyo Electron Limited | Quartz process tube | 
| USD424024S (en)* | 1997-01-31 | 2000-05-02 | Tokyo Electron Limited | Quartz process tube | 
| USD520467S1 (en)* | 2003-11-04 | 2006-05-09 | Tokyo Electron Limited | Process tube for semiconductor device manufacturing apparatus | 
| US20080090195A1 (en)* | 2006-10-13 | 2008-04-17 | Tokyo Electron Limited | Heat treatment apparatus | 
| USD586768S1 (en)* | 2006-10-12 | 2009-02-17 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers | 
| USD594488S1 (en)* | 2007-04-20 | 2009-06-16 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers | 
| US20090194521A1 (en)* | 2008-01-31 | 2009-08-06 | Tokyo Electron Limited | Thermal processing furnace | 
| USD600659S1 (en)* | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers | 
| US20090250005A1 (en)* | 2008-04-03 | 2009-10-08 | Tokyo Electron Limited | Reaction tube and heat processing apparatus for a semiconductor process | 
| USD610559S1 (en) | 2008-05-30 | 2010-02-23 | Hitachi Kokusai Electric, Inc. | Reaction tube | 
| USD611013S1 (en)* | 2008-03-28 | 2010-03-02 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers | 
| USD618638S1 (en)* | 2008-05-09 | 2010-06-29 | Hitachi Kokusai Electric, Inc. | Reaction tube | 
| USD655258S1 (en)* | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Side wall for reactor for manufacturing semiconductor | 
| USD655255S1 (en)* | 2010-06-18 | 2012-03-06 | Hitachi Kokusai Electric Inc. | Boat of wafer processing apparatus | 
| USD655262S1 (en)* | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Side wall for reactor for manufacturing semiconductor | 
| USD655682S1 (en)* | 2010-06-18 | 2012-03-13 | Hitachi Kokusai Electric Inc. | Boat of wafer processing apparatus | 
| USD661265S1 (en)* | 2010-05-19 | 2012-06-05 | Nippon Mektron, Ltd. | Flexible printed circuit board | 
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| USD405430S (en)* | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Inner tube for use in a semiconductor wafer heat processing apparatus | 
| USD405429S (en)* | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus | 
| USD406113S (en)* | 1997-01-31 | 1999-02-23 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus | 
| USD417438S (en)* | 1997-01-31 | 1999-12-07 | Tokyo Electron Limited | Quartz outer tube | 
| USD423463S (en)* | 1997-01-31 | 2000-04-25 | Tokyo Electron Limited | Quartz process tube | 
| USD424024S (en)* | 1997-01-31 | 2000-05-02 | Tokyo Electron Limited | Quartz process tube | 
| USD404368S (en)* | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Outer tube for use in a semiconductor wafer heat processing apparatus | 
| USD405062S (en)* | 1997-08-20 | 1999-02-02 | Tokyo Electron Ltd. | Processing tube for use in a semiconductor wafer heat processing apparatus | 
| USD405431S (en)* | 1997-08-20 | 1999-02-09 | Tokyo Electron Ltd. | Tube for use in a semiconductor wafer heat processing apparatus | 
| USD407696S (en)* | 1997-08-20 | 1999-04-06 | Tokyo Electron Limited | Inner tube for use in a semiconductor wafer heat processing apparatus | 
| USD520467S1 (en)* | 2003-11-04 | 2006-05-09 | Tokyo Electron Limited | Process tube for semiconductor device manufacturing apparatus | 
| USD600659S1 (en)* | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers | 
| USD586768S1 (en)* | 2006-10-12 | 2009-02-17 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers | 
| US20080090195A1 (en)* | 2006-10-13 | 2008-04-17 | Tokyo Electron Limited | Heat treatment apparatus | 
| USD594488S1 (en)* | 2007-04-20 | 2009-06-16 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers | 
| US20090194521A1 (en)* | 2008-01-31 | 2009-08-06 | Tokyo Electron Limited | Thermal processing furnace | 
| USD611013S1 (en)* | 2008-03-28 | 2010-03-02 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers | 
| US20090250005A1 (en)* | 2008-04-03 | 2009-10-08 | Tokyo Electron Limited | Reaction tube and heat processing apparatus for a semiconductor process | 
| USD618638S1 (en)* | 2008-05-09 | 2010-06-29 | Hitachi Kokusai Electric, Inc. | Reaction tube | 
| USD610559S1 (en) | 2008-05-30 | 2010-02-23 | Hitachi Kokusai Electric, Inc. | Reaction tube | 
| USD661265S1 (en)* | 2010-05-19 | 2012-06-05 | Nippon Mektron, Ltd. | Flexible printed circuit board | 
| USD655255S1 (en)* | 2010-06-18 | 2012-03-06 | Hitachi Kokusai Electric Inc. | Boat of wafer processing apparatus | 
| USD655682S1 (en)* | 2010-06-18 | 2012-03-13 | Hitachi Kokusai Electric Inc. | Boat of wafer processing apparatus | 
| USD655258S1 (en)* | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Side wall for reactor for manufacturing semiconductor | 
| USD655262S1 (en)* | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Side wall for reactor for manufacturing semiconductor | 
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| US12085084B2 (en) | 2004-03-15 | 2024-09-10 | Airius Ip Holdings, Llc | Temperature destratification systems | 
| US11703062B2 (en) | 2004-03-15 | 2023-07-18 | Airius Ip Holdings, Llc | Temperature destratification systems | 
| US11365743B2 (en) | 2004-03-15 | 2022-06-21 | Airius Ip Holdings, Llc | Temperature destratification systems | 
| USD926963S1 (en)* | 2012-05-15 | 2021-08-03 | Airius Ip Holdings, Llc | Air moving device | 
| US11221153B2 (en) | 2013-12-19 | 2022-01-11 | Airius Ip Holdings, Llc | Columnar air moving devices, systems and methods | 
| US11092330B2 (en) | 2013-12-19 | 2021-08-17 | Airius Ip Holdings, Llc | Columnar air moving devices, systems and methods | 
| US11713773B2 (en) | 2014-06-06 | 2023-08-01 | Airius Ip Holdings, Llc | Columnar air moving devices, systems and methods | 
| US11236766B2 (en) | 2014-06-06 | 2022-02-01 | Airius Ip Holdings Llc | Columnar air moving devices, systems and methods | 
| USD778458S1 (en)* | 2015-02-23 | 2017-02-07 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| USD772824S1 (en)* | 2015-02-25 | 2016-11-29 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| USD791090S1 (en)* | 2015-09-04 | 2017-07-04 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| USD770993S1 (en)* | 2015-09-04 | 2016-11-08 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| USD790490S1 (en)* | 2015-09-04 | 2017-06-27 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| US11421710B2 (en) | 2016-06-24 | 2022-08-23 | Airius Ip Holdings, Llc | Air moving device | 
| US11105341B2 (en) | 2016-06-24 | 2021-08-31 | Airius Ip Holdings, Llc | Air moving device | 
| USD842824S1 (en)* | 2017-08-09 | 2019-03-12 | Kokusai Electric Corporation | Reaction tube | 
| USD843958S1 (en)* | 2017-08-10 | 2019-03-26 | Kokusai Electric Corporation | Reaction tube | 
| USD842823S1 (en)* | 2017-08-10 | 2019-03-12 | Kokusai Electric Corporation | Reaction tube | 
| USD853979S1 (en)* | 2017-12-27 | 2019-07-16 | Kokusai Electric Corporation | Reaction tube | 
| USD987054S1 (en) | 2019-03-19 | 2023-05-23 | Airius Ip Holdings, Llc | Air moving device | 
| USD901406S1 (en)* | 2019-03-20 | 2020-11-10 | Kokusai Electric Corporation | Inner tube of reactor for semiconductor fabrication | 
| US11598539B2 (en) | 2019-04-17 | 2023-03-07 | Airius Ip Holdings, Llc | Air moving device with bypass intake | 
| US11781761B1 (en) | 2019-04-17 | 2023-10-10 | Airius Ip Holdings, Llc | Air moving device with bypass intake | 
| US12259156B2 (en) | 2019-04-17 | 2025-03-25 | Airius Ip Holdings, Llc | Air moving device with bypass intake | 
| USD931823S1 (en)* | 2020-01-29 | 2021-09-28 | Kokusai Electric Corporation | Reaction tube | 
| USD1053156S1 (en)* | 2022-03-15 | 2024-12-03 | Kokusai Electric Corporation | Furnace for substrate processing apparatus | 
| USD1070797S1 (en)* | 2022-03-15 | 2025-04-15 | Kokusai Electric Corporation | Furnace for substrate processing apparatus | 
| USD1019581S1 (en)* | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment | 
| USD1019582S1 (en)* | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment | 
| USD1019583S1 (en)* | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment | 
| Publication number | Publication date | 
|---|---|
| TWD167986S (en) | 2015-05-21 | 
| Publication | Publication Date | Title | 
|---|---|---|
| USD902625S1 (en) | Holder | |
| USD725055S1 (en) | Reaction tube | |
| USD711843S1 (en) | Reaction tube | |
| USD770993S1 (en) | Reaction tube | |
| USD739832S1 (en) | Reaction tube | |
| USD766704S1 (en) | Shimless spacer | |
| USD774272S1 (en) | Safe | |
| USD701464S1 (en) | Can | |
| USD730343S1 (en) | Case | |
| USD727200S1 (en) | Ring | |
| USD760088S1 (en) | Container | |
| USD719114S1 (en) | Reaction tube | |
| USD722165S1 (en) | Sphygmomanometer | |
| USD701592S1 (en) | Faucet | |
| USD742224S1 (en) | Container | |
| USD866384S1 (en) | Ring | |
| USD710024S1 (en) | Microplate | |
| USD733058S1 (en) | Connector | |
| USD741221S1 (en) | Bicycle | |
| USD772824S1 (en) | Reaction tube | |
| USD791090S1 (en) | Reaction tube | |
| USD722295S1 (en) | Connector | |
| USD721246S1 (en) | Container | |
| USD717675S1 (en) | Set-square | |
| USD719399S1 (en) | Container |