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USD582949S1 - Cover for a heater stage of a plasma processing apparatus - Google Patents

Cover for a heater stage of a plasma processing apparatus
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Publication number
USD582949S1
USD582949S1US29/281,069US28106907FUSD582949SUS D582949 S1USD582949 S1US D582949S1US 28106907 FUS28106907 FUS 28106907FUS D582949 SUSD582949 SUS D582949S
Authority
US
United States
Prior art keywords
cover
processing apparatus
plasma processing
heater stage
heater
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US29/281,069
Inventor
Jun Yamashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron LtdfiledCriticalTokyo Electron Ltd
Assigned to TOKYO ELECTRON LIMITEDreassignmentTOKYO ELECTRON LIMITEDASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: YAMASHITA, JUN
Application grantedgrantedCritical
Publication of USD582949S1publicationCriticalpatent/USD582949S1/en
Anticipated expirationlegal-statusCritical
Expired - Lifetimelegal-statusCriticalCurrent

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Description

FIG. 1 is a front view of a cover for a heater stage of a plasma processing apparatus showing my new design:
FIG. 2 is a rear view thereof;
FIG. 3 is a right side view thereof;
FIG. 4 is a top plan view thereof;
FIG. 5 is a sectional view taken alongline55 ofFIG. 1 thereof;
FIG. 6 is an enlarged view taken alongline66 ofFIG. 5 thereof,
FIG. 7 is an enlarged view taken alongline77 ofFIG. 5 thereof; and,
FIG. 8 is a perspective view thereof.

Claims (1)

    CLAIM
  1. The ornamental design for a cover for a heater stage of a plasma processing apparatus, as shown.
US29/281,0692006-12-152007-06-14Cover for a heater stage of a plasma processing apparatusExpired - LifetimeUSD582949S1 (en)

Applications Claiming Priority (2)

Application NumberPriority DateFiling DateTitle
JP2006-0345192006-12-15
JP20060345192006-12-15

Publications (1)

Publication NumberPublication Date
USD582949S1true USD582949S1 (en)2008-12-16

Family

ID=40119132

Family Applications (1)

Application NumberTitlePriority DateFiling Date
US29/281,069Expired - LifetimeUSD582949S1 (en)2006-12-152007-06-14Cover for a heater stage of a plasma processing apparatus

Country Status (2)

CountryLink
US (1)USD582949S1 (en)
TW (1)TWD130501S1 (en)

Cited By (25)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
USD616390S1 (en)*2009-03-062010-05-25Tokyo Electron LimitedQuartz cover for manufacturing semiconductor wafers
USD694791S1 (en)*2011-09-202013-12-03Tokyo Electron LimitedBaffle plate for manufacturing semiconductor
USD694790S1 (en)*2011-09-202013-12-03Tokyo Electron LimitedBaffle plate for manufacturing semiconductor
USD706076S1 (en)*2012-08-062014-06-03Barbara AndersenGlass cover
USD802546S1 (en)*2016-01-082017-11-14Asm Ip Holding B.V.Outer wall of reactor for semiconductor manufacturing apparatus
USD826300S1 (en)*2016-09-302018-08-21Oerlikon Metco Ag, WohlenRotably mounted thermal plasma burner for thermalspraying
USD840540S1 (en)*2016-11-232019-02-12General Electric CompanyConnector for a medical imaging device
USD851144S1 (en)*2017-12-042019-06-11Liqua-Tech CorporationRegister gear adapter plate
USD851693S1 (en)*2017-12-042019-06-18Liqua-Tech CorporationRegister gear adapter plate
USD857131S1 (en)*2017-05-302019-08-20Hyper Ice, Inc.Endplate for vibrating exercise roller
USD862539S1 (en)*2017-12-042019-10-08Liqua-Tech CorporationRegister gear adapter plate
USD868124S1 (en)*2017-12-112019-11-26Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD894137S1 (en)2017-10-052020-08-25Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD902165S1 (en)2018-03-092020-11-17Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD908645S1 (en)2019-08-262021-01-26Applied Materials, Inc.Sputtering target for a physical vapor deposition chamber
USD940765S1 (en)2020-12-022022-01-11Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD970566S1 (en)2020-03-232022-11-22Applied Materials, Inc.Sputter target for a physical vapor deposition chamber
USD982638S1 (en)*2021-12-302023-04-04Cloudminds Robotics Co., Ltd.Harmonic actuator
USD1001749S1 (en)*2020-05-132023-10-17University Of South FloridaBase plate for a foot pedal
USD1007449S1 (en)2021-05-072023-12-12Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD1053230S1 (en)2022-05-192024-12-03Applied Materials, Inc.Sputter target for a physical vapor deposition chamber
USD1071103S1 (en)*2022-04-112025-04-15Applied Materials, Inc.Gas distribution plate
USD1072774S1 (en)2021-02-062025-04-29Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD1073758S1 (en)*2022-10-132025-05-06Lam Research CorporationBaffle for substrate processing system
USD1085029S1 (en)*2022-07-192025-07-22Applied Materials, Inc.Gas distribution plate

Citations (22)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US4048845A (en)*1976-10-141977-09-20Glass Containers CorporationCanning jar lid test device and method
US4122964A (en)*1976-07-021978-10-31Morris Neal RReusable closures for hermetically sealing containers
US4213537A (en)*1978-09-201980-07-22Sherri Cup, Inc.Container lid assembly
USD265176S (en)*1978-06-231982-06-29Superfos Emballage A/SPacking drum
US4779748A (en)*1985-06-101988-10-25King Plastics, Inc.Ridged container closure
USD309109S (en)*1986-11-031990-07-10Allen Tool Company, Inc.Combined lid and seal for containers
US4978567A (en)*1988-03-311990-12-18Materials Technology Corporation, Subsidiary Of The Carbon/Graphite Group, Inc.Wafer holding fixture for chemical reaction processes in rapid thermal processing equipment and method for making same
USD315309S (en)*1987-06-041991-03-12Rieke CorporationPlastic internally threaded container insert
USD328837S (en)*1988-11-071992-08-25Christian Dior S.A.Dinner plate or similar article
US5209601A (en)*1991-08-141993-05-11Cretex Companies, Inc.Manhole grade adjusting ring and method
EP0592017A2 (en)*1987-03-311994-04-13Advanced Semiconductor Materials America, Inc.Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment
US5354626A (en)*1991-02-221994-10-11Murata Manufacturing Co., Ltd.Distributor for a solid oxide fuel cell and manufacturing process thereof
USD357385S (en)*1993-08-061995-04-18Addison F ClarkHeat reduction volume compensator with center hole for disposition between a coffee pot and hot plate
US5595496A (en)*1993-11-101997-01-21Sumitomo Wiring Systems, Ltd.Water-proof connector
USD386792S (en)*1995-10-311997-11-25Miller Garry ARotating display
US5771576A (en)*1997-05-221998-06-30Braxton; Thomas R.Strain relief device and method
USD399245S (en)*1997-02-191998-10-06Shachihata Inc.Stamper
US6093583A (en)*1998-06-012000-07-25Semiconductor Components Industries, LlcSemiconductor component and method of manufacture
USD442864S1 (en)*2000-07-122001-05-29Houston Harvest Gift Products, LlcTwo-piece lid
JP2004307939A (en)2003-04-072004-11-04Tokyo Electron LtdHeat treatment apparatus
TWD110109S1 (en)2004-04-212006-04-11東京威力科創股份有限公司Adsorption board for electric chuck used in semiconductor manufacturing
TWD113217S1 (en)2005-03-302006-10-01東京威力科創股份有限公司Cover ring

Patent Citations (22)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US4122964A (en)*1976-07-021978-10-31Morris Neal RReusable closures for hermetically sealing containers
US4048845A (en)*1976-10-141977-09-20Glass Containers CorporationCanning jar lid test device and method
USD265176S (en)*1978-06-231982-06-29Superfos Emballage A/SPacking drum
US4213537A (en)*1978-09-201980-07-22Sherri Cup, Inc.Container lid assembly
US4779748A (en)*1985-06-101988-10-25King Plastics, Inc.Ridged container closure
USD309109S (en)*1986-11-031990-07-10Allen Tool Company, Inc.Combined lid and seal for containers
EP0592017A2 (en)*1987-03-311994-04-13Advanced Semiconductor Materials America, Inc.Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment
USD315309S (en)*1987-06-041991-03-12Rieke CorporationPlastic internally threaded container insert
US4978567A (en)*1988-03-311990-12-18Materials Technology Corporation, Subsidiary Of The Carbon/Graphite Group, Inc.Wafer holding fixture for chemical reaction processes in rapid thermal processing equipment and method for making same
USD328837S (en)*1988-11-071992-08-25Christian Dior S.A.Dinner plate or similar article
US5354626A (en)*1991-02-221994-10-11Murata Manufacturing Co., Ltd.Distributor for a solid oxide fuel cell and manufacturing process thereof
US5209601A (en)*1991-08-141993-05-11Cretex Companies, Inc.Manhole grade adjusting ring and method
USD357385S (en)*1993-08-061995-04-18Addison F ClarkHeat reduction volume compensator with center hole for disposition between a coffee pot and hot plate
US5595496A (en)*1993-11-101997-01-21Sumitomo Wiring Systems, Ltd.Water-proof connector
USD386792S (en)*1995-10-311997-11-25Miller Garry ARotating display
USD399245S (en)*1997-02-191998-10-06Shachihata Inc.Stamper
US5771576A (en)*1997-05-221998-06-30Braxton; Thomas R.Strain relief device and method
US6093583A (en)*1998-06-012000-07-25Semiconductor Components Industries, LlcSemiconductor component and method of manufacture
USD442864S1 (en)*2000-07-122001-05-29Houston Harvest Gift Products, LlcTwo-piece lid
JP2004307939A (en)2003-04-072004-11-04Tokyo Electron LtdHeat treatment apparatus
TWD110109S1 (en)2004-04-212006-04-11東京威力科創股份有限公司Adsorption board for electric chuck used in semiconductor manufacturing
TWD113217S1 (en)2005-03-302006-10-01東京威力科創股份有限公司Cover ring

Cited By (28)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
USD616390S1 (en)*2009-03-062010-05-25Tokyo Electron LimitedQuartz cover for manufacturing semiconductor wafers
USD694791S1 (en)*2011-09-202013-12-03Tokyo Electron LimitedBaffle plate for manufacturing semiconductor
USD694790S1 (en)*2011-09-202013-12-03Tokyo Electron LimitedBaffle plate for manufacturing semiconductor
USD706076S1 (en)*2012-08-062014-06-03Barbara AndersenGlass cover
USD802546S1 (en)*2016-01-082017-11-14Asm Ip Holding B.V.Outer wall of reactor for semiconductor manufacturing apparatus
USD826300S1 (en)*2016-09-302018-08-21Oerlikon Metco Ag, WohlenRotably mounted thermal plasma burner for thermalspraying
USD840540S1 (en)*2016-11-232019-02-12General Electric CompanyConnector for a medical imaging device
USD862700S1 (en)*2016-11-232019-10-08General Electric CompanyConnector for a medical imaging device
USD857131S1 (en)*2017-05-302019-08-20Hyper Ice, Inc.Endplate for vibrating exercise roller
USD894137S1 (en)2017-10-052020-08-25Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD851144S1 (en)*2017-12-042019-06-11Liqua-Tech CorporationRegister gear adapter plate
USD851693S1 (en)*2017-12-042019-06-18Liqua-Tech CorporationRegister gear adapter plate
USD862539S1 (en)*2017-12-042019-10-08Liqua-Tech CorporationRegister gear adapter plate
USD868124S1 (en)*2017-12-112019-11-26Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD946638S1 (en)2017-12-112022-03-22Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD902165S1 (en)2018-03-092020-11-17Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD908645S1 (en)2019-08-262021-01-26Applied Materials, Inc.Sputtering target for a physical vapor deposition chamber
USD970566S1 (en)2020-03-232022-11-22Applied Materials, Inc.Sputter target for a physical vapor deposition chamber
USD1001749S1 (en)*2020-05-132023-10-17University Of South FloridaBase plate for a foot pedal
USD940765S1 (en)2020-12-022022-01-11Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD966357S1 (en)2020-12-022022-10-11Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD1072774S1 (en)2021-02-062025-04-29Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD1007449S1 (en)2021-05-072023-12-12Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD982638S1 (en)*2021-12-302023-04-04Cloudminds Robotics Co., Ltd.Harmonic actuator
USD1071103S1 (en)*2022-04-112025-04-15Applied Materials, Inc.Gas distribution plate
USD1053230S1 (en)2022-05-192024-12-03Applied Materials, Inc.Sputter target for a physical vapor deposition chamber
USD1085029S1 (en)*2022-07-192025-07-22Applied Materials, Inc.Gas distribution plate
USD1073758S1 (en)*2022-10-132025-05-06Lam Research CorporationBaffle for substrate processing system

Also Published As

Publication numberPublication date
TWD130501S1 (en)2009-08-21

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