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USD425919S - Electrostatic chuck with improved spacing mask and workpiece detection device - Google Patents

Electrostatic chuck with improved spacing mask and workpiece detection device
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Publication number
USD425919S
USD425919SUS29/079,585US07958597FUSD425919SUS D425919 SUSD425919 SUS D425919SUS 07958597 FUS07958597 FUS 07958597FUS D425919 SUSD425919 SUS D425919S
Authority
US
United States
Prior art keywords
electrostatic chuck
detection device
workpiece detection
spacing mask
improved spacing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US29/079,585
Inventor
Vincent E. Burkhart
Allen Flanigan
Steven Sansoni
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Filing date
Publication date
Application filed by Applied Materials IncfiledCriticalApplied Materials Inc
Assigned to APPLIED MATERIALS, INC.reassignmentAPPLIED MATERIALS, INC.ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: BURKHART, VINCENT E., FLANIGAN, ALLEN, SANSONI, STEVEN
Application grantedgrantedCritical
Publication of USD425919SpublicationCriticalpatent/USD425919S/en
Anticipated expirationlegal-statusCritical
Expired - Lifetimelegal-statusCriticalCurrent

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Description

FIG. 1 depicts a top view of the electrostatic chuck with improved spacing mask and workpiece detection device;
FIG. 2 depicts an elevation view of the electrostatic chuck when looking up along the y-axis of FIG. 1;
FIG. 3 depicts a detailed view of part of a surface and circumferential edge of the electrostatic chuck seen of FIG. 2;
FIG. 4 depicts an elevation view of the electrostatic chuck when looking down along the y-axis of FIG. 1;
FIG. 5 depicts an elevation view of the electrostatic chuck when looking to the left along the x-axis of FIG. 1, the view when looking to the right being a mirror image to that of FIG. 5; and,
FIG. 6 is a bottom view of the electrostatic chuck.

Claims (1)

  1. The ornamental design for an electrostatic chuck with improved spacing mask and workpiece detection device, as shown.
US29/079,5851997-11-14Electrostatic chuck with improved spacing mask and workpiece detection deviceExpired - LifetimeUSD425919S (en)

Publications (1)

Publication NumberPublication Date
USD425919Strue USD425919S (en)2000-05-30

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Cited By (33)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
USD489739S1 (en)2002-12-202004-05-11Ngk Spark Plug Co., Ltd.Electrostatic chuck
USD489740S1 (en)2002-12-202004-05-11Ngk Spark Plug Co., Ltd.Electrostatic chuck
USD490095S1 (en)2002-12-202004-05-18Ngk Spark Plug Co., Ltd.Electrostatic chuck
USD490096S1 (en)2002-12-202004-05-18Ngk Spark Plug Co., Ltd.Electrostatic chuck
USD490093S1 (en)2002-12-202004-05-18Ngk Spark Plug Co., Ltd.Electrostatic chuck
USD490094S1 (en)2002-12-202004-05-18Ngk Spark Plug Co., Ltd.Electrostatic chuck
USD490827S1 (en)2002-12-202004-06-01Ngk Spark Plug Co., Ltd.Electrostatic chuck
USD491206S1 (en)2002-12-202004-06-08Ngk Spark Plug Co., Ltd.Electrostatic chuck
USD497171S1 (en)2002-12-202004-10-12Ngk Spark Plug Co., Ltd.Electrostatic chuck
US20100003824A1 (en)*2008-07-072010-01-07Lam Research CorporationClamped showerhead electrode assembly
US20100252197A1 (en)*2009-04-072010-10-07Lam Reseach CorporationShowerhead electrode with centering feature
US20110070740A1 (en)*2009-09-182011-03-24Lam Research CorporationClamped monolithic showerhead electrode
US20110083809A1 (en)*2009-10-132011-04-14Lam Research CorporationEdge-clamped and mechanically fastened inner electrode of showerhead electrode assembly
US8206506B2 (en)2008-07-072012-06-26Lam Research CorporationShowerhead electrode
US8221582B2 (en)2008-07-072012-07-17Lam Research CorporationClamped monolithic showerhead electrode
US8272346B2 (en)2009-04-102012-09-25Lam Research CorporationGasket with positioning feature for clamped monolithic showerhead electrode
US8573152B2 (en)2010-09-032013-11-05Lam Research CorporationShowerhead electrode
USD723077S1 (en)*2013-12-032015-02-24Applied Materials, Inc.Chuck carrier film
USD795208S1 (en)*2015-08-182017-08-22Tokyo Electron LimitedElectrostatic chuck for semiconductor manufacturing equipment
USD802472S1 (en)*2015-08-062017-11-14Tokyo Electron LimitedElectrostatic chuck for semiconductor manufacturing equipment
USD803802S1 (en)*2015-08-182017-11-28Tokyo Electron LimitedElectrostatic chuck for semiconductor manufacturing equipment
USD931240S1 (en)*2019-07-302021-09-21Applied Materials, Inc.Substrate support pedestal
USD937329S1 (en)*2020-03-232021-11-30Applied Materials, Inc.Sputter target for a physical vapor deposition chamber
USD940765S1 (en)*2020-12-022022-01-11Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD946638S1 (en)*2017-12-112022-03-22Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD947802S1 (en)2020-05-202022-04-05Applied Materials, Inc.Replaceable substrate carrier interfacing film
USD984972S1 (en)*2021-03-292023-05-02Beijing Naura Microelectronics Equipment Co., Ltd.Electrostatic chuck for semiconductor manufacture
USD990533S1 (en)*2020-10-212023-06-27Bryan Ross SchmittSanding table for attachment to a garbage can
USD1007449S1 (en)*2021-05-072023-12-12Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD1053230S1 (en)2022-05-192024-12-03Applied Materials, Inc.Sputter target for a physical vapor deposition chamber
USD1057675S1 (en)*2021-04-122025-01-14Lam Research CorporationPedestal for a substrate processing system
USD1072774S1 (en)2021-02-062025-04-29Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD1073913S1 (en)*2021-11-262025-05-06Tomoegawa CorporationHeat exchange plate

Citations (3)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US5671116A (en)1995-03-101997-09-23Lam Research CorporationMultilayered electrostatic chuck and method of manufacture thereof
US5691876A (en)1995-01-311997-11-25Applied Materials, Inc.High temperature polyimide electrostatic chuck
US5745332A (en)1996-05-081998-04-28Applied Materials, Inc.Monopolar electrostatic chuck having an electrode in contact with a workpiece

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US5691876A (en)1995-01-311997-11-25Applied Materials, Inc.High temperature polyimide electrostatic chuck
US5671116A (en)1995-03-101997-09-23Lam Research CorporationMultilayered electrostatic chuck and method of manufacture thereof
US5745332A (en)1996-05-081998-04-28Applied Materials, Inc.Monopolar electrostatic chuck having an electrode in contact with a workpiece

Cited By (45)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
USD497171S1 (en)2002-12-202004-10-12Ngk Spark Plug Co., Ltd.Electrostatic chuck
USD491206S1 (en)2002-12-202004-06-08Ngk Spark Plug Co., Ltd.Electrostatic chuck
USD490095S1 (en)2002-12-202004-05-18Ngk Spark Plug Co., Ltd.Electrostatic chuck
USD490096S1 (en)2002-12-202004-05-18Ngk Spark Plug Co., Ltd.Electrostatic chuck
USD490093S1 (en)2002-12-202004-05-18Ngk Spark Plug Co., Ltd.Electrostatic chuck
USD490094S1 (en)2002-12-202004-05-18Ngk Spark Plug Co., Ltd.Electrostatic chuck
USD489740S1 (en)2002-12-202004-05-11Ngk Spark Plug Co., Ltd.Electrostatic chuck
USD490827S1 (en)2002-12-202004-06-01Ngk Spark Plug Co., Ltd.Electrostatic chuck
USD489739S1 (en)2002-12-202004-05-11Ngk Spark Plug Co., Ltd.Electrostatic chuck
US20100003824A1 (en)*2008-07-072010-01-07Lam Research CorporationClamped showerhead electrode assembly
US8796153B2 (en)2008-07-072014-08-05Lam Research CorporationClamped monolithic showerhead electrode
US8313805B2 (en)2008-07-072012-11-20Lam Research CorporationClamped showerhead electrode assembly
US8414719B2 (en)2008-07-072013-04-09Lam Research CorporationClamped monolithic showerhead electrode
US8161906B2 (en)2008-07-072012-04-24Lam Research CorporationClamped showerhead electrode assembly
US8206506B2 (en)2008-07-072012-06-26Lam Research CorporationShowerhead electrode
US8221582B2 (en)2008-07-072012-07-17Lam Research CorporationClamped monolithic showerhead electrode
US8402918B2 (en)2009-04-072013-03-26Lam Research CorporationShowerhead electrode with centering feature
US20100252197A1 (en)*2009-04-072010-10-07Lam Reseach CorporationShowerhead electrode with centering feature
US8272346B2 (en)2009-04-102012-09-25Lam Research CorporationGasket with positioning feature for clamped monolithic showerhead electrode
US8536071B2 (en)2009-04-102013-09-17Lam Research CorporationGasket with positioning feature for clamped monolithic showerhead electrode
US8419959B2 (en)2009-09-182013-04-16Lam Research CorporationClamped monolithic showerhead electrode
US20110070740A1 (en)*2009-09-182011-03-24Lam Research CorporationClamped monolithic showerhead electrode
US9245716B2 (en)2009-10-132016-01-26Lam Research CorporationEdge-clamped and mechanically fastened inner electrode of showerhead electrode assembly
US20110083809A1 (en)*2009-10-132011-04-14Lam Research CorporationEdge-clamped and mechanically fastened inner electrode of showerhead electrode assembly
US10262834B2 (en)2009-10-132019-04-16Lam Research CorporationEdge-clamped and mechanically fastened inner electrode of showerhead electrode assembly
US8573152B2 (en)2010-09-032013-11-05Lam Research CorporationShowerhead electrode
USD723077S1 (en)*2013-12-032015-02-24Applied Materials, Inc.Chuck carrier film
USD802472S1 (en)*2015-08-062017-11-14Tokyo Electron LimitedElectrostatic chuck for semiconductor manufacturing equipment
USD795208S1 (en)*2015-08-182017-08-22Tokyo Electron LimitedElectrostatic chuck for semiconductor manufacturing equipment
USD803802S1 (en)*2015-08-182017-11-28Tokyo Electron LimitedElectrostatic chuck for semiconductor manufacturing equipment
USD946638S1 (en)*2017-12-112022-03-22Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD931240S1 (en)*2019-07-302021-09-21Applied Materials, Inc.Substrate support pedestal
USD937329S1 (en)*2020-03-232021-11-30Applied Materials, Inc.Sputter target for a physical vapor deposition chamber
USD970566S1 (en)*2020-03-232022-11-22Applied Materials, Inc.Sputter target for a physical vapor deposition chamber
USD947802S1 (en)2020-05-202022-04-05Applied Materials, Inc.Replaceable substrate carrier interfacing film
USD990533S1 (en)*2020-10-212023-06-27Bryan Ross SchmittSanding table for attachment to a garbage can
USD966357S1 (en)*2020-12-022022-10-11Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD940765S1 (en)*2020-12-022022-01-11Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD1072774S1 (en)2021-02-062025-04-29Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD984972S1 (en)*2021-03-292023-05-02Beijing Naura Microelectronics Equipment Co., Ltd.Electrostatic chuck for semiconductor manufacture
USD1057675S1 (en)*2021-04-122025-01-14Lam Research CorporationPedestal for a substrate processing system
USD1007449S1 (en)*2021-05-072023-12-12Applied Materials, Inc.Target profile for a physical vapor deposition chamber target
USD1073913S1 (en)*2021-11-262025-05-06Tomoegawa CorporationHeat exchange plate
USD1092422S1 (en)*2021-11-262025-09-09Tomoegawa CorporationHeat exchange plate
USD1053230S1 (en)2022-05-192024-12-03Applied Materials, Inc.Sputter target for a physical vapor deposition chamber

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