




| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9-65092 | 1997-08-20 | ||
| JP6509297 | 1997-08-20 |
| Publication Number | Publication Date |
|---|---|
| USD405062Strue USD405062S (en) | 1999-02-02 |
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/083,422Expired - LifetimeUSD405062S (en) | 1997-08-20 | 1998-02-05 | Processing tube for use in a semiconductor wafer heat processing apparatus |
| Country | Link |
|---|---|
| US (1) | USD405062S (en) |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD520467S1 (en)* | 2003-11-04 | 2006-05-09 | Tokyo Electron Limited | Process tube for semiconductor device manufacturing apparatus |
| USD521465S1 (en)* | 2003-11-04 | 2006-05-23 | Tokyo Electron Limited | Process tube for semiconductor device manufacturing apparatus |
| USD521464S1 (en)* | 2003-11-04 | 2006-05-23 | Tokyo Electron Limited | Process tube for semiconductor device manufacturing apparatus |
| USD586768S1 (en)* | 2006-10-12 | 2009-02-17 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD590359S1 (en)* | 2006-02-20 | 2009-04-14 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers or the like |
| USD594488S1 (en)* | 2007-04-20 | 2009-06-16 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD600659S1 (en)* | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD619630S1 (en)* | 2007-05-08 | 2010-07-13 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD711843S1 (en)* | 2013-06-28 | 2014-08-26 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD719114S1 (en)* | 2013-06-28 | 2014-12-09 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD720309S1 (en)* | 2011-11-18 | 2014-12-30 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| USD720308S1 (en)* | 2011-11-18 | 2014-12-30 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| USD720707S1 (en)* | 2013-06-28 | 2015-01-06 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD724551S1 (en)* | 2011-11-18 | 2015-03-17 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| USD725055S1 (en)* | 2013-06-28 | 2015-03-24 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD725053S1 (en)* | 2011-11-18 | 2015-03-24 | Tokyo Electron Limited | Outer tube for process tube for manufacturing semiconductor wafers |
| USD739832S1 (en)* | 2013-06-28 | 2015-09-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD742339S1 (en)* | 2014-03-12 | 2015-11-03 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD748594S1 (en)* | 2014-03-12 | 2016-02-02 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD770993S1 (en)* | 2015-09-04 | 2016-11-08 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD772824S1 (en)* | 2015-02-25 | 2016-11-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD778458S1 (en)* | 2015-02-23 | 2017-02-07 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD790490S1 (en)* | 2015-09-04 | 2017-06-27 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD791090S1 (en)* | 2015-09-04 | 2017-07-04 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD842824S1 (en)* | 2017-08-09 | 2019-03-12 | Kokusai Electric Corporation | Reaction tube |
| USD842823S1 (en)* | 2017-08-10 | 2019-03-12 | Kokusai Electric Corporation | Reaction tube |
| USD853979S1 (en)* | 2017-12-27 | 2019-07-16 | Kokusai Electric Corporation | Reaction tube |
| USD901406S1 (en)* | 2019-03-20 | 2020-11-10 | Kokusai Electric Corporation | Inner tube of reactor for semiconductor fabrication |
| USD919583S1 (en) | 2020-08-26 | 2021-05-18 | Mahdi Al-Husseini | Mortarboard with electronic tube display |
| USD931823S1 (en)* | 2020-01-29 | 2021-09-28 | Kokusai Electric Corporation | Reaction tube |
| USD986826S1 (en)* | 2020-03-10 | 2023-05-23 | Kokusai Electric Corporation | Reaction tube |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4587689A (en)* | 1983-01-12 | 1986-05-13 | Minoru Nakamura | Meat packing apparatus |
| US5046909A (en)* | 1989-06-29 | 1991-09-10 | Applied Materials, Inc. | Method and apparatus for handling semiconductor wafers |
| US5314574A (en)* | 1992-06-26 | 1994-05-24 | Tokyo Electron Kabushiki Kaisha | Surface treatment method and apparatus |
| US5320218A (en)* | 1992-04-07 | 1994-06-14 | Shinko Electric Co., Ltd. | Closed container to be used in a clean room |
| US5407449A (en)* | 1992-03-10 | 1995-04-18 | Asm International N.V. | Device for treating micro-circuit wafers |
| US5516732A (en)* | 1992-12-04 | 1996-05-14 | Sony Corporation | Wafer processing machine vacuum front end method and apparatus |
| US5518360A (en)* | 1990-11-16 | 1996-05-21 | Kabushiki-Kaisha Watanabe Shoko | Wafer carrying device and wafer carrying method |
| US5536128A (en)* | 1988-10-21 | 1996-07-16 | Hitachi, Ltd. | Method and apparatus for carrying a variety of products |
| US5658115A (en)* | 1991-09-05 | 1997-08-19 | Hitachi, Ltd. | Transfer apparatus |
| US5752796A (en)* | 1996-01-24 | 1998-05-19 | Muka; Richard S. | Vacuum integrated SMIF system |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4587689A (en)* | 1983-01-12 | 1986-05-13 | Minoru Nakamura | Meat packing apparatus |
| US5536128A (en)* | 1988-10-21 | 1996-07-16 | Hitachi, Ltd. | Method and apparatus for carrying a variety of products |
| US5046909A (en)* | 1989-06-29 | 1991-09-10 | Applied Materials, Inc. | Method and apparatus for handling semiconductor wafers |
| US5518360A (en)* | 1990-11-16 | 1996-05-21 | Kabushiki-Kaisha Watanabe Shoko | Wafer carrying device and wafer carrying method |
| US5658115A (en)* | 1991-09-05 | 1997-08-19 | Hitachi, Ltd. | Transfer apparatus |
| US5407449A (en)* | 1992-03-10 | 1995-04-18 | Asm International N.V. | Device for treating micro-circuit wafers |
| US5320218A (en)* | 1992-04-07 | 1994-06-14 | Shinko Electric Co., Ltd. | Closed container to be used in a clean room |
| US5314574A (en)* | 1992-06-26 | 1994-05-24 | Tokyo Electron Kabushiki Kaisha | Surface treatment method and apparatus |
| US5516732A (en)* | 1992-12-04 | 1996-05-14 | Sony Corporation | Wafer processing machine vacuum front end method and apparatus |
| US5752796A (en)* | 1996-01-24 | 1998-05-19 | Muka; Richard S. | Vacuum integrated SMIF system |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD521465S1 (en)* | 2003-11-04 | 2006-05-23 | Tokyo Electron Limited | Process tube for semiconductor device manufacturing apparatus |
| USD521464S1 (en)* | 2003-11-04 | 2006-05-23 | Tokyo Electron Limited | Process tube for semiconductor device manufacturing apparatus |
| USD520467S1 (en)* | 2003-11-04 | 2006-05-09 | Tokyo Electron Limited | Process tube for semiconductor device manufacturing apparatus |
| USD590359S1 (en)* | 2006-02-20 | 2009-04-14 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers or the like |
| USD600659S1 (en)* | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD586768S1 (en)* | 2006-10-12 | 2009-02-17 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD594488S1 (en)* | 2007-04-20 | 2009-06-16 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD619630S1 (en)* | 2007-05-08 | 2010-07-13 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD724551S1 (en)* | 2011-11-18 | 2015-03-17 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| USD725053S1 (en)* | 2011-11-18 | 2015-03-24 | Tokyo Electron Limited | Outer tube for process tube for manufacturing semiconductor wafers |
| USD720309S1 (en)* | 2011-11-18 | 2014-12-30 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| USD720308S1 (en)* | 2011-11-18 | 2014-12-30 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| USD725055S1 (en)* | 2013-06-28 | 2015-03-24 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD720707S1 (en)* | 2013-06-28 | 2015-01-06 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD719114S1 (en)* | 2013-06-28 | 2014-12-09 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD711843S1 (en)* | 2013-06-28 | 2014-08-26 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD739832S1 (en)* | 2013-06-28 | 2015-09-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD742339S1 (en)* | 2014-03-12 | 2015-11-03 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD748594S1 (en)* | 2014-03-12 | 2016-02-02 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD778458S1 (en)* | 2015-02-23 | 2017-02-07 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD772824S1 (en)* | 2015-02-25 | 2016-11-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD770993S1 (en)* | 2015-09-04 | 2016-11-08 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD790490S1 (en)* | 2015-09-04 | 2017-06-27 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD791090S1 (en)* | 2015-09-04 | 2017-07-04 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD842824S1 (en)* | 2017-08-09 | 2019-03-12 | Kokusai Electric Corporation | Reaction tube |
| USD842823S1 (en)* | 2017-08-10 | 2019-03-12 | Kokusai Electric Corporation | Reaction tube |
| USD853979S1 (en)* | 2017-12-27 | 2019-07-16 | Kokusai Electric Corporation | Reaction tube |
| USD901406S1 (en)* | 2019-03-20 | 2020-11-10 | Kokusai Electric Corporation | Inner tube of reactor for semiconductor fabrication |
| USD931823S1 (en)* | 2020-01-29 | 2021-09-28 | Kokusai Electric Corporation | Reaction tube |
| USD986826S1 (en)* | 2020-03-10 | 2023-05-23 | Kokusai Electric Corporation | Reaction tube |
| USD919583S1 (en) | 2020-08-26 | 2021-05-18 | Mahdi Al-Husseini | Mortarboard with electronic tube display |
| Publication | Publication Date | Title |
|---|---|---|
| USD405062S (en) | Processing tube for use in a semiconductor wafer heat processing apparatus | |
| USD405429S (en) | Processing tube for use in a semiconductor wafer heat processing apparatus | |
| USD405431S (en) | Tube for use in a semiconductor wafer heat processing apparatus | |
| USD404372S (en) | Ring for use in a semiconductor wafer heat processing apparatus | |
| USD411176S (en) | Wafer boat for use in a semiconductor wafer heat processing apparatus | |
| USD409158S (en) | Wafer boat for use in a semiconductor wafer heat processing apparatus | |
| USD404371S (en) | Wafer boat for use in a semiconductor wafer heat processing apparatus | |
| USD406113S (en) | Processing tube for use in a semiconductor wafer heat processing apparatus | |
| USD404370S (en) | Cap for use in a semiconductor wafer heat processing apparatus | |
| USD405430S (en) | Inner tube for use in a semiconductor wafer heat processing apparatus | |
| USD407696S (en) | Inner tube for use in a semiconductor wafer heat processing apparatus | |
| USD421969S (en) | Semiconductor device | |
| USD396847S (en) | Semiconductor device | |
| USD396846S (en) | Semiconductor device | |
| USD404127S (en) | Pessary extractor apparatus | |
| USD404368S (en) | Outer tube for use in a semiconductor wafer heat processing apparatus | |
| USD404015S (en) | Wafer boat for use in a semiconductor wafer heat processing apparatus | |
| USD424024S (en) | Quartz process tube | |
| USD379799S (en) | Heat sink | |
| USD418485S (en) | Semiconductor device | |
| USD381011S (en) | Heat sink | |
| USD404369S (en) | Manifold cover for use in a semiconductor wafer heat processing apparatus | |
| USD385788S (en) | Article carrier | |
| USD378915S (en) | Heat sink | |
| USD427912S (en) | Bottle |