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USD405062S - Processing tube for use in a semiconductor wafer heat processing apparatus - Google Patents

Processing tube for use in a semiconductor wafer heat processing apparatus
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Publication number
USD405062S
USD405062SUS29/083,422US8342298FUSD405062SUS D405062 SUSD405062 SUS D405062SUS 8342298 FUS8342298 FUS 8342298FUS D405062 SUSD405062 SUS D405062S
Authority
US
United States
Prior art keywords
semiconductor wafer
wafer heat
processing apparatus
tube
heat processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US29/083,422
Inventor
Tomohisa Shimazu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron LtdfiledCriticalTokyo Electron Ltd
Assigned to TOKYO ELECTRON LIMITEDreassignmentTOKYO ELECTRON LIMITEDASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: SHIMAZU, TOMOHISA
Application grantedgrantedCritical
Publication of USD405062SpublicationCriticalpatent/USD405062S/en
Anticipated expirationlegal-statusCritical
Expired - Lifetimelegal-statusCriticalCurrent

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Description

FIG. 1 a perspective view of a processing tube for use in a semiconductor wafer heat processing apparatus;
FIG. 2 a front elevational view thereof;
FIG. 3 a top plan view thereof;
FIG. 4 a bottom plan view thereof;
FIG. 5 a rear elevational view thereof;
FIG. 6 a left side view thereof;
FIG. 7 a right side view thereof;
FIG. 8 a cross-sectional view taken along line VIII-VIII in FIG. 3;
FIG. 9 a cross-sectional view taken along line IX-IX in FIG. 2; and,
FIG. 10 a cross-sectional view taken along line X-X in FIG. 3.

Claims (1)

  1. I claim the ornamental design for processing tube for use in a semiconductor wafer heat processing apparatus, as shown and described.
US29/083,4221997-08-201998-02-05Processing tube for use in a semiconductor wafer heat processing apparatusExpired - LifetimeUSD405062S (en)

Applications Claiming Priority (2)

Application NumberPriority DateFiling DateTitle
JP9-650921997-08-20
JP65092971997-08-20

Publications (1)

Publication NumberPublication Date
USD405062Strue USD405062S (en)1999-02-02

Family

ID=71669769

Family Applications (1)

Application NumberTitlePriority DateFiling Date
US29/083,422Expired - LifetimeUSD405062S (en)1997-08-201998-02-05Processing tube for use in a semiconductor wafer heat processing apparatus

Country Status (1)

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US (1)USD405062S (en)

Cited By (31)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
USD520467S1 (en)*2003-11-042006-05-09Tokyo Electron LimitedProcess tube for semiconductor device manufacturing apparatus
USD521465S1 (en)*2003-11-042006-05-23Tokyo Electron LimitedProcess tube for semiconductor device manufacturing apparatus
USD521464S1 (en)*2003-11-042006-05-23Tokyo Electron LimitedProcess tube for semiconductor device manufacturing apparatus
USD586768S1 (en)*2006-10-122009-02-17Tokyo Electron LimitedProcess tube for manufacturing semiconductor wafers
USD590359S1 (en)*2006-02-202009-04-14Tokyo Electron LimitedProcess tube for manufacturing semiconductor wafers or the like
USD594488S1 (en)*2007-04-202009-06-16Tokyo Electron LimitedProcess tube for manufacturing semiconductor wafers
USD600659S1 (en)*2006-09-122009-09-22Tokyo Electron LimitedProcess tube for manufacturing semiconductor wafers
USD619630S1 (en)*2007-05-082010-07-13Tokyo Electron LimitedProcess tube for manufacturing semiconductor wafers
USD711843S1 (en)*2013-06-282014-08-26Hitachi Kokusai Electric Inc.Reaction tube
USD719114S1 (en)*2013-06-282014-12-09Hitachi Kokusai Electric Inc.Reaction tube
USD720309S1 (en)*2011-11-182014-12-30Tokyo Electron LimitedInner tube for process tube for manufacturing semiconductor wafers
USD720308S1 (en)*2011-11-182014-12-30Tokyo Electron LimitedInner tube for process tube for manufacturing semiconductor wafers
USD720707S1 (en)*2013-06-282015-01-06Hitachi Kokusai Electric Inc.Reaction tube
USD724551S1 (en)*2011-11-182015-03-17Tokyo Electron LimitedInner tube for process tube for manufacturing semiconductor wafers
USD725055S1 (en)*2013-06-282015-03-24Hitachi Kokusai Electric Inc.Reaction tube
USD725053S1 (en)*2011-11-182015-03-24Tokyo Electron LimitedOuter tube for process tube for manufacturing semiconductor wafers
USD739832S1 (en)*2013-06-282015-09-29Hitachi Kokusai Electric Inc.Reaction tube
USD742339S1 (en)*2014-03-122015-11-03Hitachi Kokusai Electric Inc.Reaction tube
USD748594S1 (en)*2014-03-122016-02-02Hitachi Kokusai Electric Inc.Reaction tube
USD770993S1 (en)*2015-09-042016-11-08Hitachi Kokusai Electric Inc.Reaction tube
USD772824S1 (en)*2015-02-252016-11-29Hitachi Kokusai Electric Inc.Reaction tube
USD778458S1 (en)*2015-02-232017-02-07Hitachi Kokusai Electric Inc.Reaction tube
USD790490S1 (en)*2015-09-042017-06-27Hitachi Kokusai Electric Inc.Reaction tube
USD791090S1 (en)*2015-09-042017-07-04Hitachi Kokusai Electric Inc.Reaction tube
USD842824S1 (en)*2017-08-092019-03-12Kokusai Electric CorporationReaction tube
USD842823S1 (en)*2017-08-102019-03-12Kokusai Electric CorporationReaction tube
USD853979S1 (en)*2017-12-272019-07-16Kokusai Electric CorporationReaction tube
USD901406S1 (en)*2019-03-202020-11-10Kokusai Electric CorporationInner tube of reactor for semiconductor fabrication
USD919583S1 (en)2020-08-262021-05-18Mahdi Al-HusseiniMortarboard with electronic tube display
USD931823S1 (en)*2020-01-292021-09-28Kokusai Electric CorporationReaction tube
USD986826S1 (en)*2020-03-102023-05-23Kokusai Electric CorporationReaction tube

Citations (10)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US4587689A (en)*1983-01-121986-05-13Minoru NakamuraMeat packing apparatus
US5046909A (en)*1989-06-291991-09-10Applied Materials, Inc.Method and apparatus for handling semiconductor wafers
US5314574A (en)*1992-06-261994-05-24Tokyo Electron Kabushiki KaishaSurface treatment method and apparatus
US5320218A (en)*1992-04-071994-06-14Shinko Electric Co., Ltd.Closed container to be used in a clean room
US5407449A (en)*1992-03-101995-04-18Asm International N.V.Device for treating micro-circuit wafers
US5516732A (en)*1992-12-041996-05-14Sony CorporationWafer processing machine vacuum front end method and apparatus
US5518360A (en)*1990-11-161996-05-21Kabushiki-Kaisha Watanabe ShokoWafer carrying device and wafer carrying method
US5536128A (en)*1988-10-211996-07-16Hitachi, Ltd.Method and apparatus for carrying a variety of products
US5658115A (en)*1991-09-051997-08-19Hitachi, Ltd.Transfer apparatus
US5752796A (en)*1996-01-241998-05-19Muka; Richard S.Vacuum integrated SMIF system

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US4587689A (en)*1983-01-121986-05-13Minoru NakamuraMeat packing apparatus
US5536128A (en)*1988-10-211996-07-16Hitachi, Ltd.Method and apparatus for carrying a variety of products
US5046909A (en)*1989-06-291991-09-10Applied Materials, Inc.Method and apparatus for handling semiconductor wafers
US5518360A (en)*1990-11-161996-05-21Kabushiki-Kaisha Watanabe ShokoWafer carrying device and wafer carrying method
US5658115A (en)*1991-09-051997-08-19Hitachi, Ltd.Transfer apparatus
US5407449A (en)*1992-03-101995-04-18Asm International N.V.Device for treating micro-circuit wafers
US5320218A (en)*1992-04-071994-06-14Shinko Electric Co., Ltd.Closed container to be used in a clean room
US5314574A (en)*1992-06-261994-05-24Tokyo Electron Kabushiki KaishaSurface treatment method and apparatus
US5516732A (en)*1992-12-041996-05-14Sony CorporationWafer processing machine vacuum front end method and apparatus
US5752796A (en)*1996-01-241998-05-19Muka; Richard S.Vacuum integrated SMIF system

Cited By (31)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
USD521465S1 (en)*2003-11-042006-05-23Tokyo Electron LimitedProcess tube for semiconductor device manufacturing apparatus
USD521464S1 (en)*2003-11-042006-05-23Tokyo Electron LimitedProcess tube for semiconductor device manufacturing apparatus
USD520467S1 (en)*2003-11-042006-05-09Tokyo Electron LimitedProcess tube for semiconductor device manufacturing apparatus
USD590359S1 (en)*2006-02-202009-04-14Tokyo Electron LimitedProcess tube for manufacturing semiconductor wafers or the like
USD600659S1 (en)*2006-09-122009-09-22Tokyo Electron LimitedProcess tube for manufacturing semiconductor wafers
USD586768S1 (en)*2006-10-122009-02-17Tokyo Electron LimitedProcess tube for manufacturing semiconductor wafers
USD594488S1 (en)*2007-04-202009-06-16Tokyo Electron LimitedProcess tube for manufacturing semiconductor wafers
USD619630S1 (en)*2007-05-082010-07-13Tokyo Electron LimitedProcess tube for manufacturing semiconductor wafers
USD724551S1 (en)*2011-11-182015-03-17Tokyo Electron LimitedInner tube for process tube for manufacturing semiconductor wafers
USD725053S1 (en)*2011-11-182015-03-24Tokyo Electron LimitedOuter tube for process tube for manufacturing semiconductor wafers
USD720309S1 (en)*2011-11-182014-12-30Tokyo Electron LimitedInner tube for process tube for manufacturing semiconductor wafers
USD720308S1 (en)*2011-11-182014-12-30Tokyo Electron LimitedInner tube for process tube for manufacturing semiconductor wafers
USD725055S1 (en)*2013-06-282015-03-24Hitachi Kokusai Electric Inc.Reaction tube
USD720707S1 (en)*2013-06-282015-01-06Hitachi Kokusai Electric Inc.Reaction tube
USD719114S1 (en)*2013-06-282014-12-09Hitachi Kokusai Electric Inc.Reaction tube
USD711843S1 (en)*2013-06-282014-08-26Hitachi Kokusai Electric Inc.Reaction tube
USD739832S1 (en)*2013-06-282015-09-29Hitachi Kokusai Electric Inc.Reaction tube
USD742339S1 (en)*2014-03-122015-11-03Hitachi Kokusai Electric Inc.Reaction tube
USD748594S1 (en)*2014-03-122016-02-02Hitachi Kokusai Electric Inc.Reaction tube
USD778458S1 (en)*2015-02-232017-02-07Hitachi Kokusai Electric Inc.Reaction tube
USD772824S1 (en)*2015-02-252016-11-29Hitachi Kokusai Electric Inc.Reaction tube
USD770993S1 (en)*2015-09-042016-11-08Hitachi Kokusai Electric Inc.Reaction tube
USD790490S1 (en)*2015-09-042017-06-27Hitachi Kokusai Electric Inc.Reaction tube
USD791090S1 (en)*2015-09-042017-07-04Hitachi Kokusai Electric Inc.Reaction tube
USD842824S1 (en)*2017-08-092019-03-12Kokusai Electric CorporationReaction tube
USD842823S1 (en)*2017-08-102019-03-12Kokusai Electric CorporationReaction tube
USD853979S1 (en)*2017-12-272019-07-16Kokusai Electric CorporationReaction tube
USD901406S1 (en)*2019-03-202020-11-10Kokusai Electric CorporationInner tube of reactor for semiconductor fabrication
USD931823S1 (en)*2020-01-292021-09-28Kokusai Electric CorporationReaction tube
USD986826S1 (en)*2020-03-102023-05-23Kokusai Electric CorporationReaction tube
USD919583S1 (en)2020-08-262021-05-18Mahdi Al-HusseiniMortarboard with electronic tube display

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