USD1053230S1 - Sputter target for a physical vapor deposition chamber - Google Patents
Sputter target for a physical vapor deposition chamberDownload PDFInfo
- Publication number
- USD1053230S1 USD1053230S1US29/839,271US202229839271FUSD1053230SUS D1053230 S1USD1053230 S1US D1053230S1US 202229839271 FUS202229839271 FUS 202229839271FUS D1053230 SUSD1053230 SUS D1053230S
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- US
- United States
- Prior art keywords
- vapor deposition
- physical vapor
- deposition chamber
- sputter target
- view
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
The dashed lines inFIGS.1-8 represent unclaimed environment and form no part of the claimed design.
Claims (1)
- The ornamental design for a sputter target for a physical vapor deposition chamber, as shown and described.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/839,271USD1053230S1 (en) | 2022-05-19 | 2022-05-19 | Sputter target for a physical vapor deposition chamber |
| TW111305669FTWD234834S (en) | 2022-05-19 | 2022-11-16 | Sputter target for a physical vapor deposition chamber |
| TW112306777FTWD235758S (en) | 2022-05-19 | 2022-11-16 | Sputter target for a physical vapor deposition chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/839,271USD1053230S1 (en) | 2022-05-19 | 2022-05-19 | Sputter target for a physical vapor deposition chamber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USD1053230S1true USD1053230S1 (en) | 2024-12-03 |
Family
ID=93649613
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/839,271ActiveUSD1053230S1 (en) | 2022-05-19 | 2022-05-19 | Sputter target for a physical vapor deposition chamber |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | USD1053230S1 (en) |
| TW (2) | TWD234834S (en) |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD1071103S1 (en)* | 2022-04-11 | 2025-04-15 | Applied Materials, Inc. | Gas distribution plate |
| USD1082731S1 (en)* | 2023-01-11 | 2025-07-08 | Nuflare Technology, Inc. | Susceptor |
| USD1082728S1 (en)* | 2023-01-11 | 2025-07-08 | Nuflare Technology, Inc. | Susceptor |
| USD1082730S1 (en)* | 2023-01-11 | 2025-07-08 | Nuflare Technology, Inc. | Cover base for susceptors |
| USD1082729S1 (en)* | 2023-01-11 | 2025-07-08 | Nuflare Technology, Inc. | Susceptor cover |
| USD1090468S1 (en) | 2021-09-08 | 2025-08-26 | Lam Research Corporation | Debubbler component |
| USD1093328S1 (en)* | 2023-01-11 | 2025-09-16 | Nuflare Technology, Inc. | Susceptor |
| USD1094323S1 (en)* | 2023-01-11 | 2025-09-23 | Nuflare Technology, Inc. | Susceptor unit |
| USD1094320S1 (en)* | 2022-10-20 | 2025-09-23 | Nuflare Technology, Inc. | Susceptor |
| USD1094322S1 (en)* | 2022-10-20 | 2025-09-23 | Nuflare Technology, Inc. | Susceptor |
| USD1094321S1 (en)* | 2022-10-20 | 2025-09-23 | Nuflare Technology, Inc. | Susceptor cover |
| USD1096676S1 (en)* | 2022-10-20 | 2025-10-07 | Nuflare Technology, Inc. | Cover base for susceptors |
| USD1098057S1 (en)* | 2022-10-20 | 2025-10-14 | Nuflare Technology, Inc. | Susceptor cover |
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| USD908645S1 (en) | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
| USD913979S1 (en) | 2019-08-28 | 2021-03-23 | Applied Materials, Inc. | Inner shield for a substrate processing chamber |
| USD922229S1 (en) | 2019-06-05 | 2021-06-15 | Asm Ip Holding B.V. | Device for controlling a temperature of a gas supply unit |
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| USD937329S1 (en)* | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
| USD940765S1 (en) | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
| TWD223430S (en) | 2021-11-25 | 2023-02-01 | 日商大王製紙股份有限公司 | Bag for packaging |
| TWD223429S (en) | 2021-11-25 | 2023-02-01 | 日商大王製紙股份有限公司 | Packaging bag containing individually wrapped contents |
| USD984972S1 (en) | 2021-03-29 | 2023-05-02 | Beijing Naura Microelectronics Equipment Co., Ltd. | Electrostatic chuck for semiconductor manufacture |
| USD1007449S1 (en)* | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
| USD1037778S1 (en)* | 2022-07-19 | 2024-08-06 | Applied Materials, Inc. | Gas distribution plate |
- 2022
- 2022-05-19USUS29/839,271patent/USD1053230S1/enactiveActive
- 2022-11-16TWTW111305669Fpatent/TWD234834S/enunknown
- 2022-11-16TWTW112306777Fpatent/TWD235758S/enunknown
Patent Citations (143)
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| US5320728A (en) | 1990-03-30 | 1994-06-14 | Applied Materials, Inc. | Planar magnetron sputtering source producing improved coating thickness uniformity, step coverage and step coverage uniformity |
| USD363464S (en) | 1992-08-27 | 1995-10-24 | Tokyo Electron Yamanashi Limited | Electrode for a semiconductor processing apparatus |
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