







| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP2021019931FJP1713189S (en) | 2021-09-15 | 2021-09-15 | |
| JP2021019931D | 2021-09-15 | 
| Publication Number | Publication Date | 
|---|---|
| USD1042340S1true USD1042340S1 (en) | 2024-09-17 | 
| Application Number | Title | Priority Date | Filing Date | 
|---|---|---|---|
| US29/830,627ActiveUSD1042340S1 (en) | 2021-09-15 | 2022-03-14 | Tubular reactor | 
| Country | Link | 
|---|---|
| US (1) | USD1042340S1 (en) | 
| JP (1) | JP1713189S (en) | 
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| US5618349A (en)* | 1993-07-24 | 1997-04-08 | Yamaha Corporation | Thermal treatment with enhanced intra-wafer, intra-and inter-batch uniformity | 
| USD405429S (en)* | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus | 
| USD405431S (en)* | 1997-08-20 | 1999-02-09 | Tokyo Electron Ltd. | Tube for use in a semiconductor wafer heat processing apparatus | 
| US5948300A (en)* | 1997-09-12 | 1999-09-07 | Kokusai Bti Corporation | Process tube with in-situ gas preheating | 
| USD424024S (en)* | 1997-01-31 | 2000-05-02 | Tokyo Electron Limited | Quartz process tube | 
| US20030221779A1 (en)* | 2002-03-28 | 2003-12-04 | Kazuyuki Okuda | Substrate processing apparatus | 
| USD590359S1 (en)* | 2006-02-20 | 2009-04-14 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers or the like | 
| USD594488S1 (en)* | 2007-04-20 | 2009-06-16 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers | 
| USD600659S1 (en)* | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers | 
| US20090250005A1 (en)* | 2008-04-03 | 2009-10-08 | Tokyo Electron Limited | Reaction tube and heat processing apparatus for a semiconductor process | 
| USD618638S1 (en) | 2008-05-09 | 2010-06-29 | Hitachi Kokusai Electric, Inc. | Reaction tube | 
| USD619630S1 (en)* | 2007-05-08 | 2010-07-13 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers | 
| USD742339S1 (en) | 2014-03-12 | 2015-11-03 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| TWD175510S (en) | 2015-09-18 | 2016-05-11 | 亞智科技股份有限公司 | Adsorption element | 
| USD770993S1 (en)* | 2015-09-04 | 2016-11-08 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| USD772824S1 (en)* | 2015-02-25 | 2016-11-29 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| US20160368031A1 (en)* | 2015-06-17 | 2016-12-22 | Vistec Electron Beam Gmbh | Particle beam apparatus and method for operating a particle beam apparatus | 
| USD778457S1 (en)* | 2015-02-23 | 2017-02-07 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| USD778458S1 (en)* | 2015-02-23 | 2017-02-07 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| USD791090S1 (en)* | 2015-09-04 | 2017-07-04 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| TWD230585S (en)* | 2022-03-01 | 2024-04-01 | 日商國際電氣股份有限公司 (日本) | reaction tube | 
| TWD230586S (en)* | 2022-03-01 | 2024-04-01 | 日商國際電氣股份有限公司 (日本) | reaction tube | 
| TWD230584S (en)* | 2022-03-01 | 2024-04-01 | 日商國際電氣股份有限公司 (日本) | reaction tube | 
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| US5618349A (en)* | 1993-07-24 | 1997-04-08 | Yamaha Corporation | Thermal treatment with enhanced intra-wafer, intra-and inter-batch uniformity | 
| USD405429S (en)* | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus | 
| USD424024S (en)* | 1997-01-31 | 2000-05-02 | Tokyo Electron Limited | Quartz process tube | 
| USD405431S (en)* | 1997-08-20 | 1999-02-09 | Tokyo Electron Ltd. | Tube for use in a semiconductor wafer heat processing apparatus | 
| US5948300A (en)* | 1997-09-12 | 1999-09-07 | Kokusai Bti Corporation | Process tube with in-situ gas preheating | 
| US20030221779A1 (en)* | 2002-03-28 | 2003-12-04 | Kazuyuki Okuda | Substrate processing apparatus | 
| USD590359S1 (en)* | 2006-02-20 | 2009-04-14 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers or the like | 
| USD600659S1 (en)* | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers | 
| USD594488S1 (en)* | 2007-04-20 | 2009-06-16 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers | 
| USD619630S1 (en)* | 2007-05-08 | 2010-07-13 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers | 
| US20090250005A1 (en)* | 2008-04-03 | 2009-10-08 | Tokyo Electron Limited | Reaction tube and heat processing apparatus for a semiconductor process | 
| USD618638S1 (en) | 2008-05-09 | 2010-06-29 | Hitachi Kokusai Electric, Inc. | Reaction tube | 
| USD742339S1 (en) | 2014-03-12 | 2015-11-03 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| USD778457S1 (en)* | 2015-02-23 | 2017-02-07 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| USD778458S1 (en)* | 2015-02-23 | 2017-02-07 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| USD772824S1 (en)* | 2015-02-25 | 2016-11-29 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| US20160368031A1 (en)* | 2015-06-17 | 2016-12-22 | Vistec Electron Beam Gmbh | Particle beam apparatus and method for operating a particle beam apparatus | 
| USD770993S1 (en)* | 2015-09-04 | 2016-11-08 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| USD791090S1 (en)* | 2015-09-04 | 2017-07-04 | Hitachi Kokusai Electric Inc. | Reaction tube | 
| TWD175510S (en) | 2015-09-18 | 2016-05-11 | 亞智科技股份有限公司 | Adsorption element | 
| TWD230585S (en)* | 2022-03-01 | 2024-04-01 | 日商國際電氣股份有限公司 (日本) | reaction tube | 
| TWD230586S (en)* | 2022-03-01 | 2024-04-01 | 日商國際電氣股份有限公司 (日本) | reaction tube | 
| TWD230584S (en)* | 2022-03-01 | 2024-04-01 | 日商國際電氣股份有限公司 (日本) | reaction tube | 
| Title | 
|---|
| Notification of Review Opinions dated May 2, 2023 in corresponding TW Application 111300907. | 
| Publication number | Publication date | 
|---|---|
| JP1713189S (en) | 2022-04-21 | 
| Publication | Publication Date | Title | 
|---|---|---|
| USD980016S1 (en) | Water bottle | |
| USD896291S1 (en) | Robot | |
| USD974046S1 (en) | Bath brush | |
| USD970312S1 (en) | Bartending tool holder | |
| USD995811S1 (en) | Male masturbator | |
| USD935211S1 (en) | Chair | |
| USD899357S1 (en) | Generator | |
| USD986383S1 (en) | Faucet | |
| USD921799S1 (en) | Hoverboard | |
| USD919425S1 (en) | Container | |
| USD919728S1 (en) | Hoverboard | |
| USD921798S1 (en) | Hoverboard | |
| USD948509S1 (en) | Mouse | |
| USD921801S1 (en) | Hoverboard | |
| USD922508S1 (en) | Hoverboard | |
| USD977017S1 (en) | Scooter | |
| USD919727S1 (en) | Hoverboard | |
| USD921797S1 (en) | Hoverboard | |
| USD944669S1 (en) | T-shirt ruler guide | |
| USD1000443S1 (en) | Mouse | |
| USD1096269S1 (en) | Container preform | |
| USD989439S1 (en) | Baby footed pajamas | |
| USD1013474S1 (en) | Pipe cutter | |
| USD1029900S1 (en) | Speed reducer | |
| USD982277S1 (en) | Safe | 
| Date | Code | Title | Description | 
|---|---|---|---|
| FEPP | Fee payment procedure | Free format text:ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: BIG.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |