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USD1026054S1 - Collimator for a physical vapor deposition (PVD) chamber - Google Patents

Collimator for a physical vapor deposition (PVD) chamberDownload PDF

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Publication number
USD1026054S1
USD1026054S1US29/835,991US202229835991FUSD1026054SUS D1026054 S1USD1026054 S1US D1026054S1US 202229835991 FUS202229835991 FUS 202229835991FUS D1026054 SUSD1026054 SUS D1026054S
Authority
US
United States
Prior art keywords
collimator
pvd
chamber
vapor deposition
physical vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/835,991
Inventor
Martin Lee Riker
Keith A. Miller
Luke Vianney Varkey
Xiangjin Xie
Kishor Kumar KALATHIPARAMBIL
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials IncfiledCriticalApplied Materials Inc
Priority to US29/835,991priorityCriticalpatent/USD1026054S1/en
Assigned to APPLIED MATERIALS, INC.reassignmentAPPLIED MATERIALS, INC.ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: KALATHIPARAMBIL, KISHOR KUMAR, MILLER, KEITH A., RIKER, MARTIN LEE, VARKEY, LUKE VIANNEY, XIE, XIANGJIN
Priority to JP2022014277Fprioritypatent/JP1732968S/en
Priority to TW111303316Fprioritypatent/TWD227585S/en
Application grantedgrantedCritical
Publication of USD1026054S1publicationCriticalpatent/USD1026054S1/en
Activelegal-statusCriticalCurrent
Anticipated expirationlegal-statusCritical

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FIG.1 is a top isometric view of collimator for a physical vapor deposition (PVD) chamber showing our new design.
FIG.2 is a bottom isometric view thereof.
FIG.3 is a top plan view thereof.
FIG.4 is a bottom plan view thereof.
FIG.5 is a front elevation view thereof.
FIG.6 is a back elevation view thereof.
FIG.7 is a left side elevation view thereof.
FIG.8 is a right side elevation view thereof; and,
FIG.9 is a cross-sectional view taken along line9-9 inFIG.3.
The broken lines in the drawings illustrate portions of the article that form no part of the claimed design.

Claims (1)

    CLAIM
  1. We claim the ornamental design for a collimator for a physical vapor deposition (PVD) chamber, as shown and described.
US29/835,9912022-04-222022-04-22Collimator for a physical vapor deposition (PVD) chamberActiveUSD1026054S1 (en)

Priority Applications (3)

Application NumberPriority DateFiling DateTitle
US29/835,991USD1026054S1 (en)2022-04-222022-04-22Collimator for a physical vapor deposition (PVD) chamber
JP2022014277FJP1732968S (en)2022-04-222022-07-04 Collimator for physical vapor deposition chamber
TW111303316FTWD227585S (en)2022-04-222022-07-05Collimator for use in a physical vapor deposition (pvd) chamber

Applications Claiming Priority (1)

Application NumberPriority DateFiling DateTitle
US29/835,991USD1026054S1 (en)2022-04-222022-04-22Collimator for a physical vapor deposition (PVD) chamber

Publications (1)

Publication NumberPublication Date
USD1026054S1true USD1026054S1 (en)2024-05-07

Family

ID=84533806

Family Applications (1)

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US29/835,991ActiveUSD1026054S1 (en)2022-04-222022-04-22Collimator for a physical vapor deposition (PVD) chamber

Country Status (3)

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US (1)USD1026054S1 (en)
JP (1)JP1732968S (en)
TW (1)TWD227585S (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
USD1026054S1 (en)*2022-04-222024-05-07Applied Materials, Inc.Collimator for a physical vapor deposition (PVD) chamber
TWD235352S (en)2023-08-312024-12-11美商應用材料股份有限公司 (美國)Flux-optimizer

Citations (19)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US5544771A (en)*1994-02-231996-08-13Samsung Electronics Co., Ltd.Method for manufacturing a collimator
US5770026A (en)*1996-09-191998-06-23Lg Semicon Co., Ltd.Semiconductor fabrication apparatus having improved sputtering collimator and wiring method for a semiconductor device using such apparatus
US20090308739A1 (en)*2008-06-172009-12-17Applied Materials, Inc.Wafer processing deposition shielding components
US20150114823A1 (en)*2013-10-242015-04-30Applied Materials, Inc.Bipolar collimator utilized in a physical vapor deposition chamber
US20150354054A1 (en)*2014-06-062015-12-10Applied Materials, Inc.Cooled process tool adapter for use in substrate processing chambers
US20160145735A1 (en)*2014-11-262016-05-26Applied Materials, Inc.Collimator for use in substrate processing chambers
USD760180S1 (en)*2014-02-212016-06-28Hzo, Inc.Hexcell channel arrangement for use in a boat for a deposition apparatus
US20170117121A1 (en)*2015-10-272017-04-27Applied Materials, Inc.Biasable flux optimizer / collimator for pvd sputter chamber
US20170253959A1 (en)*2016-03-052017-09-07Applied Materials, Inc.Methods and apparatus for controlling ion fraction in physical vapor deposition processes
US20170301525A1 (en)*2014-11-052017-10-19Kabushiki Kaisha ToshibaProcessing apparatus and collimator
US20180233335A1 (en)*2016-03-142018-08-16Kabushiki Kaisha ToshibaProcessing device and collimator
US20180237903A1 (en)*2016-03-142018-08-23Kabushiki Kaisha ToshibaProcessing device, sputtering device, and collimator
US20180265964A1 (en)*2017-03-172018-09-20Kabushiki Kaisha ToshibaCollimator and processing apparatus
US20190027346A1 (en)*2016-03-142019-01-24Kabushiki Kaisha ToshibaProcessing apparatus and collimator
USD858468S1 (en)*2018-03-162019-09-03Applied Materials, Inc.Collimator for a physical vapor deposition chamber
USD859333S1 (en)*2018-03-162019-09-10Applied Materials, Inc.Collimator for a physical vapor deposition chamber
JP1719724S (en)2021-08-292022-07-13 Collimator for physical vapor deposition chamber
JP1732968S (en)*2022-04-222022-12-22 Collimator for physical vapor deposition chamber
USD998575S1 (en)*2020-04-072023-09-12Applied Materials, Inc.Collimator for use in a physical vapor deposition (PVD) chamber

Patent Citations (23)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US5544771A (en)*1994-02-231996-08-13Samsung Electronics Co., Ltd.Method for manufacturing a collimator
US5770026A (en)*1996-09-191998-06-23Lg Semicon Co., Ltd.Semiconductor fabrication apparatus having improved sputtering collimator and wiring method for a semiconductor device using such apparatus
US20090308739A1 (en)*2008-06-172009-12-17Applied Materials, Inc.Wafer processing deposition shielding components
US20150114823A1 (en)*2013-10-242015-04-30Applied Materials, Inc.Bipolar collimator utilized in a physical vapor deposition chamber
USD760180S1 (en)*2014-02-212016-06-28Hzo, Inc.Hexcell channel arrangement for use in a boat for a deposition apparatus
US20150354054A1 (en)*2014-06-062015-12-10Applied Materials, Inc.Cooled process tool adapter for use in substrate processing chambers
US20170301525A1 (en)*2014-11-052017-10-19Kabushiki Kaisha ToshibaProcessing apparatus and collimator
US20160145735A1 (en)*2014-11-262016-05-26Applied Materials, Inc.Collimator for use in substrate processing chambers
US9543126B2 (en)*2014-11-262017-01-10Applied Materials, Inc.Collimator for use in substrate processing chambers
US10347474B2 (en)2015-10-272019-07-09Applied Materials, Inc.Biasable flux optimizer / collimator for PVD sputter chamber
US9960024B2 (en)2015-10-272018-05-01Applied Materials, Inc.Biasable flux optimizer / collimator for PVD sputter chamber
US20170117121A1 (en)*2015-10-272017-04-27Applied Materials, Inc.Biasable flux optimizer / collimator for pvd sputter chamber
US20170253959A1 (en)*2016-03-052017-09-07Applied Materials, Inc.Methods and apparatus for controlling ion fraction in physical vapor deposition processes
US20180233335A1 (en)*2016-03-142018-08-16Kabushiki Kaisha ToshibaProcessing device and collimator
US20180237903A1 (en)*2016-03-142018-08-23Kabushiki Kaisha ToshibaProcessing device, sputtering device, and collimator
US20190027346A1 (en)*2016-03-142019-01-24Kabushiki Kaisha ToshibaProcessing apparatus and collimator
US20180265964A1 (en)*2017-03-172018-09-20Kabushiki Kaisha ToshibaCollimator and processing apparatus
USD858468S1 (en)*2018-03-162019-09-03Applied Materials, Inc.Collimator for a physical vapor deposition chamber
USD859333S1 (en)*2018-03-162019-09-10Applied Materials, Inc.Collimator for a physical vapor deposition chamber
USD998575S1 (en)*2020-04-072023-09-12Applied Materials, Inc.Collimator for use in a physical vapor deposition (PVD) chamber
JP1719724S (en)2021-08-292022-07-13 Collimator for physical vapor deposition chamber
TWD224691S (en)2021-08-292023-04-11美商應用材料股份有限公司Collimator for use in a physical vapor deposition (pvd) chamber
JP1732968S (en)*2022-04-222022-12-22 Collimator for physical vapor deposition chamber

Also Published As

Publication numberPublication date
TWD227585S (en)2023-09-21
JP1732968S (en)2022-12-22

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