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USB392136I5 - - Google Patents

Info

Publication number
USB392136I5
USB392136I5US392136DDUSB392136I5US B392136 I5USB392136 I5US B392136I5US 392136D DUS392136D DUS 392136DDUS B392136 I5USB392136 I5US B392136I5
Authority
US
United States
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of USB392136I5publicationCriticalpatent/USB392136I5/en
Pendinglegal-statusCriticalCurrent

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US392136D1964-08-26PendingUSB392136I5 (en)

Applications Claiming Priority (1)

Application NumberPriority DateFiling DateTitle
US392136AUS3345210A (en)1964-08-261964-08-26Method of applying an ohmic contact to thin film passivated resistors

Publications (1)

Publication NumberPublication Date
USB392136I5true USB392136I5 (en)

Family

ID=23549384

Family Applications (2)

Application NumberTitlePriority DateFiling Date
US392136DPendingUSB392136I5 (en)1964-08-26
US392136AExpired - LifetimeUS3345210A (en)1964-08-261964-08-26Method of applying an ohmic contact to thin film passivated resistors

Family Applications After (1)

Application NumberTitlePriority DateFiling Date
US392136AExpired - LifetimeUS3345210A (en)1964-08-261964-08-26Method of applying an ohmic contact to thin film passivated resistors

Country Status (8)

CountryLink
US (2)US3345210A (en)
CH (1)CH432628A (en)
DE (1)DE1540175B2 (en)
FR (1)FR1445320A (en)
GB (1)GB1038609A (en)
NL (1)NL6510206A (en)
NO (1)NO120943B (en)
SE (1)SE218574C1 (en)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US3411048A (en)*1965-05-191968-11-12Bell Telephone Labor IncSemiconductor integrated circuitry with improved isolation between active and passive elements
US3523038A (en)*1965-06-021970-08-04Texas Instruments IncProcess for making ohmic contact to planar germanium semiconductor devices
US3462658A (en)*1965-10-121969-08-19Bendix CorpMulti-emitter semiconductor device
US3462723A (en)*1966-03-231969-08-19Mallory & Co Inc P RMetal-alloy film resistor and method of making same
US3505134A (en)*1966-04-131970-04-07Du PontMetalizing compositions whose fired-on coatings can be subjected to acid bath treatment and the method of using such metalizing compositions
US3501829A (en)*1966-07-181970-03-24United Aircraft CorpMethod of applying contacts to a microcircuit
US3513022A (en)*1967-04-261970-05-19Rca CorpMethod of fabricating semiconductor devices
US3623961A (en)*1968-01-121971-11-30Philips CorpMethod of providing an electric connection to a surface of an electronic device and device obtained by said method
US3636619A (en)*1969-06-191972-01-25Teledyne IncFlip chip integrated circuit and method therefor
US3663279A (en)*1969-11-191972-05-16Bell Telephone Labor IncPassivated semiconductor devices
US3765937A (en)*1970-11-061973-10-16Western Electric CoMethod of making thin film devices
US4050053A (en)*1976-04-221977-09-20North American Philips CorporationResistor end terminations
DE2822011C3 (en)*1978-05-191987-09-10Fujitsu Ltd., Kawasaki, Kanagawa Semiconductor device and method for its manufacture
US4217570A (en)*1978-05-301980-08-12Tektronix, Inc.Thin-film microcircuits adapted for laser trimming
US4394678A (en)*1979-09-191983-07-19Motorola, Inc.Elevated edge-protected bonding pedestals for semiconductor devices
DE3161228D1 (en)*1980-04-171983-11-24Post OfficeGold metallisation in semiconductor devices
US4392992A (en)*1981-06-301983-07-12Motorola, Inc.Chromium-silicon-nitrogen resistor material
US4591821A (en)*1981-06-301986-05-27Motorola, Inc.Chromium-silicon-nitrogen thin film resistor and apparatus
US7659475B2 (en)*2003-06-202010-02-09ImecMethod for backside surface passivation of solar cells and solar cells with such passivation
US20050255410A1 (en)2004-04-292005-11-17Guerrero Douglas JAnti-reflective coatings using vinyl ether crosslinkers
US7914974B2 (en)2006-08-182011-03-29Brewer Science Inc.Anti-reflective imaging layer for multiple patterning process
JP5357186B2 (en)*2008-01-292013-12-04ブルーワー サイエンス アイ エヌ シー. On-track process for hard mask pattern formation by multiple dark field exposure
US9640396B2 (en)*2009-01-072017-05-02Brewer Science Inc.Spin-on spacer materials for double- and triple-patterning lithography

Also Published As

Publication numberPublication date
GB1038609A (en)1966-08-10
NL6510206A (en)1966-02-28
DE1540175B2 (en)1971-10-07
NO120943B (en)1970-12-28
US3345210A (en)1967-10-03
FR1445320A (en)1966-07-08
DE1540175A1 (en)1970-01-02
SE218574C1 (en)1968-01-30
CH432628A (en)1967-03-31

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