US8656936B2 - Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluids - Google Patents

Abstract

Apparatuses, and related methods, for processing a workpiece that include a particular barrier structure that can overlie and cover a workpiece. Apparatuses, and related methods, for processing a workpiece that include a particular movable member that can be positioned over and moved relative to a workpiece. Apparatuses, and related methods, for processing a workpiece that include a particular ceiling structure that can overlie a processing chamber. Nozzle devices, and related methods, that include a particular annular body. Nozzle devices, and related methods, that include a particular first, second, and third nozzle structure.

Description

PRIORITY CLAIM

This application is a division of patent application Ser. No. 11/376,996, filed Mar. 15, 2006 now U.S. Pat. No. 8,544,483, now U.S. publication No. 2007-0245954-A1, and entitled BARRIER STRUCTURE AND NOZZLE DEVICE FOR USE IN TOOLS USED TO PROCESS MICROELECTRONIC WORKPIECES WITH ONE OR MORE TREATMENT FLUIDS, wherein the entirety of said nonprovisional application is incorporated herein by reference and wherein said nonprovisional application claims priority under 35 USC §119(e) from U.S. Provisional Patent Applications having Ser. No. 60/667,263, filed on Apr. 1, 2005, by Collins et al. and titled COMPACT DUCT SYSTEM INCORPORATING MOVEABLE AND NESTABLE BAFFLES FOR USE IN TOOLS USED TO PROCESS MICROELECTRONIC WORKPIECES WITH ONE OR MORE TREATMENT FLUIDS and Ser. No. 60/667,369, filed on Apr. 1, 2005, by Rose et al. and titled COMPACT DUCT SYSTEM INCORPORATING MOVEABLE AND NESTABLE BAFFLES FOR USE IN TOOLS USED TO PROCESS MICROELECTRONIC WORKPIECES WITH ONE OR MORE TREATMENT FLUIDS, wherein the respective entireties of said provisional patent applications are incorporated herein by reference.

FIELD OF THE INVENTION

The present invention relates to barrier plates and dispense assemblies for tools used to process microelectronic substrates with one or more treatment fluids, including liquids and gases. More particularly, the present invention relates to such tools that include movable and nestable baffle members that that can be positioned to open and close, and help define the boundaries of, one or more ducts for collecting and recovering the treatment fluids that are used.

BACKGROUND OF THE INVENTION

The microelectronic industry relies on a variety of different processes to manufacture microelectronic devices. Many processes involve a sequence of treatments in which different kinds of treatments fluids are caused to contact the workpiece in accordance with desired recipes. These fluids may be liquids, gases, or combinations thereof. In some treatments, solids may be suspended or dissolved in a liquid or entrained in a gas. It is highly desirable to capture and recover these treatment fluids for a variety of reasons including proper disposal, recycling, fume containment, process monitoring, process control, or other handling.

One capture technique involves using appropriately positioned ducts to capture treatment fluids. For instance, a typical manufacturing tool in the microelectronics industry involves supporting one or more workpieces in a processing chamber on a suitable support, such as a stationary platen, rotating turntable, or rotatable chuck. One or more ducts are positioned at least partially around the outer periphery of the support. As a treatment fluid is introduced into the processing chamber, an exhaust can be used to help pull the treatment fluid into the one or more ducts. With respect to rotating supports, centrifugal force causes fluids on a spinning workpiece and/or support surface to flow radially outward from the spin axis and into the duct(s).

Conventionally, a tool may include a single duct to capture different treatment fluids. However, using a single duct like this is not desirable in all instances. For example, some treatment fluids may be too reactive in the presence of other treatment materials. Other times, it may be desirable to capture different fluids using different capture conditions. Still other times, such as when recycling is desired, it may be desirable to capture a fluid in a dedicated duct to avoid contamination with other fluids.

Accordingly, tools containing multiple, stacked ducts, fixed relative to each other, have been used. Either the workpiece support and/or the stacked ducts themselves are raised and lowered in order to bring the appropriate duct into position. This conventional approach suffers from serious drawbacks. The stacked ducts make high-density tool packaging more difficult. The different ducts may also be subject to cross-contamination because they are always open to the workpiece and/or exhaust levels are not individually controlled. Some conventional duct systems also may not have the capability to separate the liquid and gas constituents of an exhaust stream. In some tools in which the duct structures themselves are moveable, drain and exhaust connections to external plumbing must also move, thereby adding undue complexity to tool design, manufacture, use, and service.

There is a continuing need, therefore, in the microelectronics industry to provide compact tools that nonetheless incorporate multiple ducts for capturing different kinds of treatment fluids.

SUMMARY OF THE INVENTION

The present invention provides a novel duct system for use in tools in which microelectronic workpieces are treated with treatment fluids, including liquids, gases, fluidized solids, dispersions, combinations of these and the like. The ducts are used to capture the various treatment fluids for recycling, discarding, or other handling. Different treatment fluids can be recovered in different, independent ducts to minimize cross-contamination and/or to use unique capture protocols for different fluids.

The duct system of the present invention is extremely compact. The duct system is defined at least in part by moveable and nestable duct structures in which portions of duct pathways may exist between these structures and/or between these and other structures in the tool. For example, when the structures are moved apart relatively, a duct pathway opens and is enlarged between the structures. When the structures are moved together relatively, the duct between the structures is choked and is reduced in size. In preferred embodiments, multiple ducts can exist in the same volume of space depending upon how the moveable duct structures are positioned. Thus, multiple ducts can occupy a volume minimally larger than the volume occupied by only a single duct.

The moveable duct structures are preferably fluidly coupled to fixed duct structures so that drain and exhaust connections between the tool and external plumbing are fixed and need not move.

In one aspect, the present invention relates to an apparatus for processing a microelectronic workpiece. The apparatus includes a support on which the workpiece is positioned during a process. The apparatus also includes a plurality of moveable and nestable baffle members defining at least portions of a plurality of duct pathways having respective duct inlets proximal to an outer periphery of the workpiece.

In another aspect, the present invention relates to an apparatus for processing a microelectronics workpiece. The apparatus includes a rotatable support on which the workpiece is positioned during a process. The apparatus also includes a plurality of moveable baffle members defining at least a first duct pathway between the baffle members and having an inlet proximal to an outer periphery of the rotatable workpiece. Displacement of the baffle members relative to each other opens and chokes at least the first duct pathway.

In another aspect, the present invention relates to an apparatus for processing a microelectronic workpiece. The apparatus includes a housing and a rotatable support positioned in the housing and onto which the workpiece is positioned for processing. The apparatus includes a plurality of duct pathways having respective inlets proximal to an outer periphery of the rotatable workpiece. Each duct pathway is defined at least in part by structures comprising a plurality of fixed duct structures that are relatively distal from the rotatable workpiece and a plurality of independently moveable baffle members that are relatively proximal to the rotatable workpiece and that define duct pathway portions that are fluidly coupled to respective fixed duct structures.

In another aspect, the present invention relates to an apparatus for processing a microelectronic workpiece. The apparatus includes a processing chamber in which the workpiece is positioned during a process. A barrier structure overlies and covers the workpiece in a manner effective to help provide a tapering flow channel proximal to a major surface of the workpiece.

In another aspect, the present invention relates to a method of processing a microelectronic workpiece. The workpiece is positioned in a processing chamber. A barrier structure overlies and covers the workpiece in a manner effective to help provide a tapering flow channel proximal to a major surface of the workpiece that tapers in a radially outward direction relative to said surface. While the workpiece is positioned in the processing chamber and covered by the barrier structure, at least one processing material is caused to flowingly contact said major surface of the workpiece.

In another aspect, the present invention relates to an apparatus, comprising a processing chamber in which the workpiece is positioned during a process. A barrier structure overlies and covers the workpiece in a manner effective to help provide a tapering flow channel proximal to a major surface of the workpiece that tapers in a radially outward direction relative to said surface. The barrier structure is controllably moveable through a range of motion including a first position in which the processing chamber is sufficiently open to allow workpiece transfer to and from the processing chamber and a second position in which the barrier structure helps to guide at least one material flowing over said major surface.

In another aspect, the present invention relates to a nozzle device comprising an annular body having a lower surface that is angled so as to help define a tapering flow channel over a workpiece surface when the body is positioned over the workpiece surface. At least one nozzle is integrated with the annular body in a manner effective to dispense one or more processing materials downward onto the workpiece surface. The annular body includes one or more processing material supply conduits through which one or more processing materials are supplied to the at least one nozzle.

In another aspect, the present invention relates to a nozzle device comprising an annular body having a lower surface that is angled so as to help define a tapering flow channel over a workpiece surface when the annular body is positioned over the workpiece surface. The annular body comprises an inner periphery defining a central pathway that provides egress between a volume above the annular body and a volume below the annular body. An arm structure is coupled to the annular body and extends generally across the central pathway in a manner effective to help define first and second pathway portions. At least a first, independent array of nozzles is integrated with the annular body in a manner such that the first array extends at least partially along the arm structure and a first radius of the annular body in a manner effective to dispense one or more processing materials downward onto the workpiece surface. At least one independent nozzle is integrated into the central arm in a manner effective to dispense one or more processing materials downward onto a central portion of the workpiece. At least one independent nozzle is positioned to dispense one or more processing materials onto the workpiece from a flow path that extends through at least one of the central flow pathway portions.

In another aspect, the present invention relates to a nozzle device comprising a first nozzle structure through which one or more processing materials independently are atomizingly dispensed onto a workpiece surface across at least a portion of a radius of the workpiece surface; a second nozzle structure is provided through which one or more processing materials independently are dispensed onto a central portion of the workpiece surface; and a third nozzle structure through which one or more processing materials are independently introduced into a headspace above the workpiece surface. The first, second and third nozzle structures are moveable relative to the workpiece surface.

In another aspect, the present invention relates to an apparatus for processing a microelectronic workpiece. The apparatus includes a processing chamber in which the workpiece is positioned during a process and a moveable member comprising a tube portion having a through bore. The moveable member is positioned over the workpiece and is moveable relative to a major surface of the workpiece. At least one independent nozzle structure is physically coupled to the moveable member such that movement of the moveable member allows the relative spacing between the major surface of the workpiece and the nozzle structure to be controllably adjusted. At least a portion of at least one fluid supply pathway in the through bore of the tube portion is fluidly coupled to the at least one independent nozzle structure and workpiece.

In another aspect, the present invention relates to an apparatus for processing a microelectronic workpiece. The apparatus includes a processing chamber in which the workpiece is positioned during a process and a ceiling structure overlying the processing chamber in a manner effective to provide a first zone relatively distal from the processing chamber and a second zone relatively proximal to the processing chamber. The ceiling structure comprises a walled conduit providing egress between the first and second zones. A moveable member is housed in the walled conduit. The member comprises at least a tube portion having a first port to provide egress into the through bore from the first zone. The moveable member is moveable relative to the walled conduit and with respect to the workpiece. A nozzle structure is coupled to the moveable member in a manner such that the nozzle structure is positionable to dispense one or more processing materials into the processing chamber.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows an isometric view of a preferred tool embodiment of the present invention.

FIG. 2 shows an isometric, cross-sectional view of a portion of the tool ofFIG. 1 taken along line A-A in which the tool is in a configuration in which an inner duct pathway is open and the shutter is lowered/closed.

FIG. 3 shows an isometric, cross-sectional view of a portion of the tool ofFIG. 1 taken along line B-B in which the tool is in a configuration in which an inner duct pathway is open and the shutter is raised/open.

FIG. 4 shows an isometric, cross-sectional view of a portion of the tool ofFIG. 1 taken along line B-B in which the tool is in a configuration in which a middle duct pathway is open.

FIG. 5 shows an isometric, cross-sectional view of a portion of the tool ofFIG. 1 taken along line B-B in which the tool is in a configuration in which an outer duct pathway is open.

FIG. 6 shows an isometric cross-sectional view of the tool ofFIG. 1 taken along line A-A in which the tool is in a workpiece transfer configuration.

FIG. 7 shows an isometric cross-sectional view of the tool ofFIG. 1 taken along line B-B in which the tool is in a workpiece transfer configuration.

FIG. 8 is an isometric view of the bottom of the tool ofFIG. 1.

FIG. 9 is an alternative isometric view of the bottom of the tool ofFIG. 1.

FIG. 10 is an isometric view of the base pan of the tool ofFIG. 1 with components removed to show a series of annular, concentric walls rising upward from the bottom of the base pan to define a plurality of exhaust plenums and drain basins.

FIG. 11 is an isometric view of the drip ring used in the tool ofFIG. 1.

FIG. 12 is an isometric view of the outer, annular baffle plate used in the tool ofFIG. 1 (The middle and inner baffle plates are not shown but are similar except for being sized to nest inside each other as shown in other Figures and described further herein).

FIG. 13 is an isometric view of the outer baffle hood used in the tool ofFIG. 1 (The middle and inner baffle hoods are not shown but are similar except for being sized to nest inside each other as shown in other Figures and described further herein).

FIG. 14.A is a close-up, cross-sectional view of a portion of the tool ofFIG. 1 taken along line B-B that generally identifies the area around the annular drip ring.

FIG. 14.B is a close-up, cross-sectional view of a portion of the tool ofFIG. 1 taken along line B-B that generally identifies the area around the inner baffle member.

FIG. 14.C is a close-up, cross-sectional view of a portion of the tool ofFIG. 1 taken along line B-B that generally identifies the area around the middle baffle member.

FIG. 14.D is a close-up, cross-sectional view of a portion of the tool ofFIG. 1 taken along line B-B that generally identifies the area around the outer baffle member.

FIG. 14.E is a close-up, cross-sectional view of a portion of the tool ofFIG. 1 taken along line B-B that generally identifies exhaust plenums and drain basins.

FIG. 15 is another close-up, cross-sectional view of a portion of the tool ofFIG. 1 taken along line B-B.

FIG. 16 is a cross-sectional view of a portion of the tool ofFIG. 1 taken along line B-B.

FIG. 17 shows an isometric, cross-sectional view of a portion of the tool ofFIG. 1 taken along line A-A in which the tool is in a configuration in which the dispense assembly is lowered to carry out a treatment and the shutter is lowered/closed.

FIG. 18 shows an isometric view of the ceiling plate used in the tool ofFIG. 1.

FIG. 19 shows an isometric view of the moveable support member used in the tool ofFIG. 1.

FIG. 20 is a cross-sectional view of a portion of the tool ofFIG. 1 taken along line C-C ofFIG. 8 showing actuator parts for the outer and inner baffle members.

FIG. 21 is an isometric view of the dispense assembly used in the tool ofFIG. 1.

FIG. 22.A is a cross-sectional, isometric view of the dispense assembly ofFIG. 21 taken along line G-G.

FIG. 22.B is a cross-sectional, isometric view of the dispense assembly ofFIG. 21 taken along line G-G that is similar toFIG. 22.A except for identifying additional reference characters.

FIG. 23 is an isometric view of the spray nozzle/barrier structure used in the dispense assembly ofFIG. 22 looking generally at the underside of the structure.

FIG. 24 is an isometric view of the spray nozzle/barrier structure used in the dispense assembly ofFIG. 22 looking generally at the top side of the structure.

FIG. 25 is a cross-sectional view of the spray nozzle barrier structure ofFIG. 24 taken along line H-H.

FIG. 26 is a cross-sectional view of the spray nozzle barrier structure ofFIG. 24 taken along line J-J.

FIG. 27 is an isometric view of the central dispense nozzle member used in the dispense assembly ofFIG. 22.

FIG. 28 is an isometric view of the retainer/spacer clamp used in the dispense assembly ofFIG. 22.

FIG. 29 is an isometric view of a portion of the dispense assembly ofFIG. 22 including the central dispense nozzle and retainer/spacer clamp subassembly.

FIG. 30 is a cross-sectional, isometric view of the subassembly ofFIG. 29 taken along line D-D.

FIG. 31 is a cross-sectional, isometric view of the subassembly ofFIG. 29 taken along line C-C.

FIG. 32 is an isometric view of the showerhead dispense assembly used in the dispense assembly ofFIG. 22, looking generally at the top side of the assembly.

FIG. 33 is an isometric view of the showerhead dispense assembly ofFIG. 22 looking generally at the bottom side of the assembly.

FIG. 34 is an isometric view of the base used in the showerhead dispense assembly ofFIG. 32.

FIG. 35 is an isometric view of the cover used in the showerhead dispense assembly ofFIG. 32.

FIG. 36 is an isometric view of a mounting standoff used in the dispense assembly ofFIG. 22.

FIG. 37 is a cross-sectional view of a portion of the tool ofFIG. 1 taken along line A-A showing the nesting relationship among the moveable support member, the shutter, and the ceiling plate.

FIG. 38 is an isometric view of the shutter used in the tool ofFIG. 1.

DETAILED DESCRIPTION OF PRESENTLY PREFERRED EMBODIMENTS

The embodiments of the present invention described below are not intended to be exhaustive or to limit the invention to the precise forms disclosed in the following detailed description. Rather the embodiments are chosen and described so that others skilled in the art may appreciate and understand the principles and practices of the present invention. While the present invention will be described in the specific context of fluid based microelectronic substrate cleaning systems, the principles of the invention are applicable to other microelectronic processing systems as well.

FIGS. 1 through 38 show anillustrative tool10 that incorporates principles of the present invention. For purposes of illustration,tool10 is of the type in which asingle workpiece12 is housed in thetool10 at any one time and subjected to one or more treatments in which liquid(s) and/or gas(es) are caused to contact theworkpiece12. In the microelectronics industry, for instance,tool10 may be referred to as a single wafer processing tool.Workpiece12 is typically a semiconductor wafer or other microelectronic substrate.

Tool10 generally includes as mainassemblies processing section11 and barrier dispensesection500. In actual use, the dispensesection500 andprocessing section11 would be mounted to a framework (not shown) and enclosed within a housing (not shown) oftool10. This mounting can occur in any manner such as via screws, bolts, rivets, adhesives, welds, clamps, brackets, combinations of these, or the like. Desirably, though, thesections11 and500 and/or components thereof are independent and removably mounted to facilitate service, maintenance, upgrade, and/or replacement.

Processing section11 generally includes a base14 formed at least in part bybase pan16 andperipheral sidewall18.Base pan16 and sidewalls18 may be formed from parts that are screwed, bolted, glued, welded, or otherwise attached to each other. Alternatively,base pan16 and sidewalls18 may be integrally formed as one part as is shown.

In this particular preferred embodiment, three pairs of annular, generallyconcentric walls22 and23,24 and25, and26 and27 project upward frombase pan16. These walls help to defineexhaust plenums29,30, and31 anddrain basins52,53,54 and55. Theexhaust plenums29,30, and31 and thedrain basins52,53, and54 form portions of three independent, nestedexhaust duct pathways330,338, and346 to be discussed further below. Of course, other representative embodiments of the invention may include a lesser or greater number of such ducts as desired in which case a lesser or greater number of exhaust plenums and drain basins would be provided, as appropriate.

Also in the embodiment oftool10 as shown, theducts330,338, and346 preferably are independent and discrete from each other in that each such duct has its own exhaust plenum(s) and drain basin(s). Advantageously, this allows individual exhaust streams to be separately handled at the exhaust and/or other stage(s) of processing. This may be desirable for a variety of reasons. For instance, it may be desirable to recover liquid constituents of an exhaust stream for recycling. Use of a dedicated exhaust duct for such liquid constituents avoids cross-contamination with other streams. In other instances, it may be desirable to exhaust different streams under different conditions. The use of independent and discrete exhaust duct pathways thus is preferred in many instances. However, in other embodiments, especially where an even more compact design is desired, two or more exhaust ducts may share a drain basin and/or an exhaust plenum.

The top rims33 and34 ofwalls22 and23 define a generallyannular exhaust inlet35 by which an exhaust stream entersinner exhaust plenum29. The bottom ofexhaust plenum29 includes one or more exhaust outlet ports48 through which an exhaust stream exitsinner exhaust plenum29. In similar fashion, thetop rims38 and39 ofwalls24 and25 define anannular exhaust inlet40 by which an exhaust stream entersmiddle exhaust plenum30. The floor ofplenum30 includes one or more exhaust outlet ports49 through which an exhaust stream exitsmiddle exhaust plenum30. Also in similar fashion, thetop rims43 and44 ofwalls26 and27 define anannular exhaust inlet45 by which an exhaust stream entersouter exhaust plenum31. The floor ofplenum31 includes one or more exhaust outlet ports50 through which an exhaust stream exitsouter exhaust plenum31.

Eachdrain basin52,53,54, and55 respectively includes afloor56,57,58, and59. Each offloors56,57,58, and59 respectively includes one or more drain outlets such asoutlets63 and67 through which collected liquid exits the corresponding drain basin. Thefloor56 ofinner drain basin52 is appropriately sloped to direct collected liquid to drain outlet(s)63.Floors57,58, and59 may be sloped in a similar manner. The various drain outlets are fitted withdrain couplings62 or68 to facilitate connection to suitable drain plumbing (not shown).

In the preferred embodiment as shown, a plurality ofactuator shaft housings69 including shaft bores70 are positioned ininner exhaust plenum29. These essentially subdivideinner exhaust plenum29 into three sub-plenums. To facilitate uniform exhaust flow through the entirety of exhaust plenum, it is therefore desirable to provide one or more exhaust ports in each of such sub-plenums.Shaft housings69 and bores70 provide access foractuator shafts314 to be coupled to and thereby control movement ofinner baffle member174 that operationally engagesinner exhaust plenum29. In similar fashion,actuator shaft housings73 including shaft bores72 are positioned inmiddle exhaust plenum30 and provide access for actuator shafts (not shown) to be coupled to and thereby control movement ofmiddle baffle member218 that operationally engagesmiddle exhaust plenum30. Also in similar fashion,actuator shaft housings75 including shaft bores76 are positioned inouter exhaust plenum31 and provide access foractuator shafts326 to be coupled to and thereby control movement ofouter baffle member262 that operationally engagesouter exhaust plenum31.

The central area ofbase pan16 includes central throughbore78. Central through bore78 preferably is generally circular in cross-section as shown but could also be provided with other geometries as desired. Cylindricalinner flange80 projects upward frombase pan16 and helps to define cylindricalinner sidewall82 andouter sidewall84.Outer sidewall84 includesshoulder90 at its top rim, andinner sidewall82 includes ashoulder92 at its lower rim.

Inside processingchamber503,workpiece12 is supported and held bychuck94.Chuck94 is generally cylindrical in shape and includes anupper face96,lower face98,annular base100, central throughbore102,sidewall104 at the outer periphery, andannular splash shield108.Chuck94 may be stationary or it may be rotatable about acentral axis106. For purposes of illustration, the figures illustrate an embodiment oftool10 in whichchuck94 is rotatably driven bymotor110 so thatworkpiece12 may be spun aboutaxis106 during a treatment. In those embodiments in which workpiece12 is spun by arotating chuck94, the spinning helps to spread dispensed treatment materials uniformly over theworkpiece12.Motor110 may be of the hollow shaft type havingcentral bore112 and is mounted totool10 by any convenient approach such as by mountingstructures114.

Annular splash shield108 extends downward fromlower face98 ofchuck94.Lower end109 ofshield108 is nested inshoulder90 ofinner flange80 and helps to prevent liquids from splashing overinner flange80 and then into central throughbore78. In embodiments in whichchuck94 is rotatable, there is a gap betweenshield108 and the walls ofshoulder90 to avoid having theshield108 and shoulder walls rub against each other, which could generate undesirable debris as thechuck94 rotates.

Chuck94 may secureworkpiece12 in any of a variety of different ways in accordance with conventional practices now or hereafter developed. Preferably, chuck94 includes edge gripping structures (not shown) that securely holdworkpiece12 aboveupper face96 ofchuck94 such that there is a gap betweenworkpiece12 and theupper face96. Thus, treatment chemicals, including rinse water, may be dispensed onto eitherupper face128 orlower face130 ofworkpiece12.

Optionally,tool10 may include dispense structure(s) for treating thelower face130 ofworkpiece12. An illustrative backside dispense mechanism is shown as a generally circular dispensehead136 in which one or more treatment chemicals may be dispensed towardlower face130 ofworkpiece12 through a plurality of nozzle orifices (not shown). Treatment chemicals are supplied to backside dispensehead136 viashaft138 that passes throughcentral bore102 ofchuck94 andcentral bore112 ofmotor110. In embodiments in whichchuck94 rotates, there are gaps in betweenshaft138, andcentral bores102 and112 so that the parts do not rub as thechuck94 rotates. The backside dispensehead136 may be coupled to one or more supplies (not shown) of treatment materials to be dispensed as supplied or blended on demand.

Annular drip ring156 is fitted tobase pan16 proximal toinner flange80.Drip ring156 generally includesfloor158,inner wall160,middle wall162, curvedtop rim164, andouter wall166.Floor158 cants downward to generally match the slope of and fit againstfloor56 indrain basin52.Inner wall160 ofdrip ring156 is fitted againstlower sidewall portion86 ofinner flange80.Middle wall162 jogs outward so that there is a gap betweenmiddle wall162 and thesidewall104 ofchuck94. Curvedtop rim164 provides a smooth transition betweenmiddle wall162 andouter wall166. This helps promote a smooth flow when an exhaust stream flows overdrip ring156 and into one or more open ducts to be described further below. Curvedtop rim164 in this embodiment projects slightly above theupper face96 ofchuck94. In this way, some liquid spun outward fromchuck94 and/orworkpiece12 is caught incatch basin170 formed bydrip ring156.Drain ports172 are provided in the lower portion ofdrip ring156 formed byfloor158 andmiddle wall162 to allow liquid collected incatch basin170 to drain intodrain basin52.

Tool10 further includes a plurality of moveable andnestable baffle members174,218, and262 generally corresponding to the number ofexhaust plenums29,30, and31 in this particular preferred embodiment. Thebaffle members174,218, and262 advantageously can be moved independently relative to each other to selectively and controllably open and/or choke one or more exhaust ducts into which exhaust streams may flow radially outward fromworkpiece12 and/orchuck94. Thebaffle members174,218, and262 further define at least a portion of the boundaries of such one or more exhaust ducts and thus help guide exhaust streams flowing through the duct(s). The ability of thebaffle members174,218, and262 to both move and nest together as desired allowstool10 to be more compact in that the portions of multiple ducts whose boundaries are at least in part defined by these baffle members can occupy very nearly the same volume in space as only a single duct. Compactness is important for a variety of reasons, including lower required stack height, easier packaging, lesser tool dimensions, and the like.

Inner baffle member174 generally includesannular baffle plate176 andannular baffle hood194. Althoughplate176 andhood194 can be formed as a single, unitary part, it is preferred that these be separate parts that are fastened or otherwise secured together to ease assembly, maintenance, and service oftool10.Annular baffle plate176 hasupper surface178,lower surface180,inner rim182 proximal to the outer periphery ofchuck94,outer sidewall flange186, andinner sidewall flange190. The surfaces among the components ofannular baffle plate176 are connected by smooth transitions to promote smooth exhaust flows over and/or underinner baffle member174. The double wall structure provided byouter sidewall flange186 andinner sidewall flange190 provides multiple functions. As one function, theseflanges186 and190 provide a secure, rigid way to secureannular baffle plate176 to correspondingannular baffle hood194. For any of thebaffle members174,218, or262, the respective baffle plate may be attached to the corresponding hood in any desired manner. Preferred approaches are non-permanent so that the parts can be easily separated and replaced after service and maintenance. Using bothflanges186 and190 also makes it easier to define smooth flow pathways both above and belowinner baffle member174, as desired.

Annular baffle hood194 fits over and enshroudsexhaust inlet35 ofexhaust plenum29.Inner baffle member174 is translatable up and down so that corresponding movement ofhood194 up and down opens and chokes, to the desired degree, theexhaust inlet35. Additionally,hood194 includes structure that helps provide drain trap functionality indrain basin52. This helps to separate liquid and gas constituents of exhaust streams that flow throughdrain basin52. Such separated constituents may be independently recovered for disposal, recycling, further reaction, or other handling as desired. As an additional function,hood194 helps to fluidly coupleexhaust plenum29 with a portion of the duct pathway whose boundaries are further defined at least in part by thelower surface180 ofannular baffle plate176.

In more detail,annular baffle hood194 includescap plate196,inner flange198,outer flange206,lower end202, andinner surface204.Cap plate196 is generally positioned overexhaust inlet35 and helps to define aheadspace208 overexhaust inlet35. Asinner baffle member174 is lowered, the volume ofheadspace208 is reduced as cap plate approaches and thereby chokes flow enteringexhaust inlet35.Inner baffle member174 desirably can be lowered far enough so thatcap plate196 seats against and closesexhaust inlet35. Asinner baffle member174 is raised, the volume ofheadspace208 overexhaust inlet35 is increased ascap plate196 moves away from and thereby increases flow access toexhaust inlet35.

Inner flange198 is spaced apart fromannular wall22 to provide aflow channel200 fluidlycoupling drain basin52 toheadspace208. The lower end ofinner flange198 extends below rims33 and34 that help defineexhaust inlet35 toexhaust plenum29. In this way,inner flange198 forms a barrier that blocks exhaust streams that enter thedrain basin52 from flowing directly intoexhaust plenum29. Instead, such a stream must flow downward towardfloor56, around the lower end ofinner flange198, and then upward through theflow channel200 before gaining access toexhaust inlet35 viaheadspace208. Thus, the positioning and configuration ofinner flange198 helps provide trap functionality withindrain basin52. Liquid constituents in an exhaust stream flowing throughdrain basin52 will have a relatively greater tendency to collect withindrain basin52, while gaseous constituents will have a relatively greater tendency to flow throughdrain basin52 and intoexhaust plenum29.

To help promote this trap functionality, the inner surface ofinner flange198 is provided with surface features that help promote condensation or other collection of liquid upon the inner surface. The liquid collected in this way then drips or otherwise flows downward tofloor56, where the liquid can be recovered via drain port(s)63 for further handling. Preferred surface features as shown include an array oftriangular protuberances210. Eachtriangular protuberance210 is oriented so that itsapex212 is upward (facing the incoming exhaust flow) while thebase214 is downward (away from the incoming flow). The relatively sharp apex212 confronting the incoming exhaust flow is believed to enhance liquid collection. Generally, using a greater number of theseprotuberances210 is desired to facilitate liquid trapping. However, the density of these features on theinner flange198 is such that thebases214 of thetriangular protuberances210 are spaced apart sufficiently so that liquid collected on the sides of the protuberances can readily drip or flow downward tofloor56.

Outer flange206 extends downward and is sufficiently close toannular wall23 to substantially prevent exhaust from flowing betweenouter flange206 andannular wall23. To minimize the risk of generating debris due to rubbing contact, there preferably is a small gap betweenannular wall23 andouter flange206. When an exhaust is being pulled throughexhaust plenum29, this close gap spacing provides a sufficiently high resistance to flow such that substantially all the exhaust will be pulled throughplenum29.

Middle baffle member218 is similar toinner baffle member174 and includesannular baffle plate220 andannular baffle hood238.Annular baffle plate220 includesupper surface222,lower surface224,inner rim226,outer flange230, andinner flange234.Annular baffle hood238 includescap plate240 helping to defineheadspace252,inner flange242 helping to define a flow path throughflow channel244 and havinglower end246 andinner surface248,outer flange250, andtriangular protuberances254 havingapexes256 and bases258.Hood238 ofmiddle baffle member218 operationally enshroudsmiddle exhaust plenum30 and helps to provide trap functionality withinmiddle drain basin53. Additionally,inner baffle member174 and/ormiddle baffle member218 are moveable so thatinner baffle member174 may nest withinmiddle baffle member218 and thereby variably choke, shut off, or otherwise restrict the flow of a material between the two. Alternatively, the twobaffle members174 and218 can be separated to variably open a flow path between the two.

Outer baffle member262 is similar toinner baffle member174 andmiddle baffle member218 and includesannular baffle plate264 andannular baffle hood282.Annular baffle plate264 includesupper surface266,lower surface268,inner rim270,outer flange274, andinner flange278.Annular baffle hood282 includescap plate284 helping to defineheadspace296,inner flange286 helping to define aflow channel288 and havinglower end290 andinner surface292,outer flange294, andtriangular protuberances298 havingapexes300 and bases302.Hood282 ofouter baffle member262 operationally enshroudsouter exhaust plenum31 and helps to provide trap functionality withinouter drain basin54. Additionally,outer baffle member262 is moveable relative toinner baffle member174 and/ormiddle baffle member218 so thatmiddle baffle member218 may nest withinouter baffle member262 and thereby variably choke, shut off, or otherwise restrict the flow of a material between the two. Alternatively, the twobaffle members218 and262 can be separated to variably open a flow path between the two.

Tool10 includes actuating mechanism(s) that independently actuate one or more ofbaffle members174,218, and/or262 to allow these barriers to be controllably and variably moved and nested relative to each other. Preferred actuating mechanisms for movingbaffle members174 and262 are shown in the Figures. The actuating mechanisms formiddle baffle member218 would be similar. With respect toinner baffle member174, inner baffle actuating motors312 (motors318 are used for middle baffle member218) are coupled to correspondingshafts314 at one end andinner baffle member174 at the other. Theshafts314 are housed and move up and down within bores70 ofhousings69.Seals316 help prevent leaking at these egress areas. Thus,inner baffle member174 may be moved independently relative to themiddle baffle member218 andouter baffle member262.

In similar fashion, outerbaffle actuating motors324 are coupled to correspondingshafts326 at one end andbaffle member262 at the other. Theshafts326 are housed and move up and down within bores76 ofhousings75.Seals328 help prevent leaking at these egress areas. Thus,outer baffle member262 may be moved independently relative to theinner baffle member174 andmiddle baffle member218.

Thebaffle members174,218, and262 are features of a compact and controllable multi-duct system that can be used to collect and exhaust treatment fluids from processingchamber503. One or more of the ducts of the system can be variably opened and/or choked at any one time. In the preferred embodiment depicted in the Figures, each exhaust duct is independent of and discrete from the others. This allows different exhaust protocols to be used with streams exhausted through the different ducts. Also, different treatment materials can be collected in different ducts to facilitate recycling without undue cross-contamination that might otherwise occur if a recycled treatment material were to be recovered from a duct used with other materials. In a typical treatment, one or more kinds of treatment fluids are dispensed onto one or both surfaces ofworkpiece12. Whenchuck94, and hence workpiece12 rotate, the treatment chemicals tend to flow radially outward and into the appropriate, open exhaust duct(s). Desirably, an exhaust can be pulled through the open duct(s) to help pull materials into the duct(s). Pulling such an exhaust also helps control particles and fumes. A minimal amount of exhaust may be applied to the closed ducts to help prevent cross-contamination. In those embodiments in which thechuck94, and hence workpiece12, are stationary, pulling an exhaust helps to draw the treatment materials radially outward and into the appropriate exhaust duct(s).

It can be appreciated, therefore, thattool10 has many possible exhaust configurations. For purposes of illustration,FIGS. 2 through 7 show four representative exhaust configurations that show the versatility oftool10.FIGS. 2 and 3show tool10 in an exhaust configuration in which aninner duct pathway330 is open. In this configuration, all three ofbaffle members174,218, and262 are raised and nested together. This chokes flow between the members but opensannular duct inlet332 toduct pathway330 belowinner baffle member174. Thebaffle plates176,220, and264 may be physically touching to choke off flow between the plates, but this can create an undue risk that particles could be generated. Accordingly, it is preferred that theplates176,220, and264 do not physically touch, but nonetheless are sufficiently close enough to create enough flow resistance that substantially the entirety of the exhaust stream flows into theopen duct pathway330.

Theannular duct inlet332 surrounds the outer peripheries ofworkpiece12 andchuck94. Theduct pathway330 extends radially outward from duct inlet332 a short distance.Duct pathway330 then transitions downward to include a more axially oriented flow channel betweeninner baffle member174 andouter wall166 ofdrip ring156. This extendsduct pathway330 intodrain basin52. Theduct pathway330 continues underhood194 throughflow channel200, intoheadspace208, intoexhaust plenum29 viaexhaust inlet35, and then out throughoutlet port36 into suitable plumbing such asinner exhaust manifold336.

FIG. 4 shows an alternative exhaust configuration oftool10 in which amiddle duct pathway338 is open. In this configuration,inner baffle member174 is lowered sufficiently so that flow into theinner duct pathway330 is choked off.Inner baffle member174 may physically contact curvedtop rim164 ofannular drip ring156, but it is more preferred that these parts do not touch but are close enough together to choke the flow. At the same time,cap plate196 seats against and chokesexhaust inlet35 intoinner exhaust plenum29. In the meantime, bothmiddle baffle member218 andouter baffle member262 are raised withmiddle baffle member218 being nested withinouter baffle member262. This chokes flow between the members but opensannular duct inlet340 tomiddle duct pathway338 aboveinner baffle member174 but belowmiddle baffle member218.

Theannular duct inlet340 surrounds the outer peripheries ofworkpiece12 andchuck94. Theduct pathway338 extends radially outward from duct inlet340 a short distance.Duct pathway338 then transitions downward to include a more axially oriented flow channel betweenmiddle baffle member218 andinner baffle member174. This extendsduct pathway338 intodrain basin53. Theduct pathway338 continues underhood238 throughflow channel244, intoheadspace252, intoexhaust plenum30 viaexhaust inlet40, and then out through outlet port (not shown) into suitable plumbing such asmiddle exhaust manifold344.

FIG. 5 shows an alternative exhaust configuration oftool10 in which anouter duct pathway346 is open. In this configuration,inner baffle member174 andmiddle baffle member218 are lowered and nested so thatplates176 and220 are close enough to choke off flow into the inner andmiddle duct pathways330 and338. At the same time,cap plate196 seats against and closesexhaust inlet35 intoinner exhaust plenum29, andcap plate240 seats against and closesexhaust inlet40 intomiddle exhaust plenum30. In the meantime,outer baffle member262 is raised to thereby openannular duct inlet348 toouter duct pathway346 abovemiddle baffle member218 but belowouter baffle member262.

Theannular duct inlet348 surrounds the outer peripheries ofworkpiece12 andchuck94. Theduct pathway346 extends radially outward from duct inlet348 a short distance.Duct pathway346 then transitions downward to include a more axially oriented flow channel betweenouter baffle member262 andmiddle baffle member218. This extendsduct pathway346 intodrain basin54. Theduct pathway346 continues underhood282 throughflow channel288, intoheadspace296, intoexhaust plenum31 viaexhaust inlet45, and then out throughoutlet port46 into suitable plumbing such asouter exhaust manifold352.

FIGS. 6 and 7 show an alternative exhaust configuration oftool10 in whichduct pathways330,338, and346 are all closed andworkpiece12 may be loaded into and/or taken from processingchamber503. In this configuration,inner baffle member174,middle baffle member218, andouter baffle member262 are lowered and nested so thatplates176,220, and264 are close enough to choke off flow into the inner, middle, andouter duct pathways330,338, and346. At the same time,cap plate196 seats against and closesexhaust inlet35 intoinner exhaust plenum29,cap plate240 seats against and closesexhaust inlet40 intomiddle exhaust plenum30, andcap plate284 seats against and closesexhaust inlet45 intoouter exhaust plenum31. Optionally,barrier plate556 may be raised to ease access to and from processingchamber503.

The figures show an illustrative embodiment of one kind of preferred barrier/dispensesection500 useful in dispensing one or more processing materials in the course of processing one or more microelectronic workpieces. The dispense mechanism may be coupled to one or more supplies (not shown) of treatment materials provided via supply lines (not shown). These materials can be dispensed as supplied or blended on demand. A wide variety of treatment materials may be used, astool10 is quite flexible in the types of treatments that may be carried out. Just a small sampling of representative treatment materials include gases and liquids such as nitrogen, carbon dioxide, clean dry air, argon, HF gas, aqueous HF, aqueous isopropyl alcohol, deionized water, aqueous ammonia, aqueous sulfuric acid, aqueous nitric acid, hydrogen peroxide, ozone gas, aqueous ozone, organic acids and solvents, combinations of these and the like. Additional representative examples of processes and chemistries suitably practiced intool10 include those described in application entitled APPARATUS AND METHOD FOR SPIN DRYING A MICROELECTRONIC SUBSTRATE, Ser. No. 11/096,935, naming Tracy Gast as one of the inventors, the disclosure of which is fully incorporated herein by reference.

Barrier/dispensesection500 includes as majorcomponents ceiling plate504,moveable support member526, dispenseassembly554, and optional butpreferred shutter818. Electric, pneumatic, or other suitable actuators (not shown) can be utilized to effect the desired motion of these components.Ceiling plate504 forms a barrier that helps to define afirst zone506 aboveceiling plate504 and asecond zone508 belowceiling plate504.Second zone508 generally includesheadspace502, which is generally the volume ofsecond zone508 aboveannular body558, andprocessing chamber503, which is generally the volume ofsecond zone508 belowannular body558. The dimensions ofheadspace502 andprocessing chamber503 correspondingly change with movement of dispenseassembly554 in z-axis527.

Ceiling plate504 includespanel510 having anouter periphery512 and aninner periphery514 defining a generally central throughaperture516. Thisaperture516 may have any desired shape, but preferably is circular as shown.Outer wall515 extends upward frompanel510 to essentially form a wall aroundpanel510.Wall515 enhances the rigidity ofceiling plate504, helps to capture leaks from dispensing components, and provides convenient surfaces by which to mountceiling plate504 to its framework/housing.Cylindrical center wall518 extends upward frompanel510 and hastop rim520 andbase522.Base522 is attached topanel510 proximal toaperture516. Thus,cylindrical wall518 provides apathway524 extending fromtop rim520 tobase522 that provides egress betweenfirst zone506 andsecond zone508. As described further below, thispathway524 also helps to house a portion ofshutter818 as well as a portion of themoveable support member526 which is used to raise and lower the dispenseassembly554 to desired positions. In the preferred embodiment shown,moveable support member526 and shutter818 are co-axially nested within thispathway524.

Moveable support member526 includesinner wall528 havingtop rim530 andbottom rim532.Outer wall534 is generally concentric withinner wall528 and extends fromtop rim536 tobottom rim538.Annular plate540 couples top rim530 ofinner wall528 totop rim536 ofouter wall534, thus forming anannular chamber542 betweenwalls528 and534. Outerannular flange546 extends outward from generally the bottom rim ofouter wall534, and innerannular flange548 extends inward generally frombottom rim532 ofinner wall528. Theannular flanges546 and548 help to stiffenmoveable support member526.Annular flange548 also provides a convenient surface for mounting dispenseassembly554 to the lower end ofmoveable support member526 via mountingholes549. Actuating mechanisms (not shown) that causemoveable support member526 to move through a range of motion in the z-axis527 may be conveniently coupled to outerannular flange546.

Inner wall528 ofmoveable support member526 helps to define aconduit544 that is open fromrim530 tobottom rim532. Thisconduit544 provides a convenient, protected pathway for leading plumbing and other componentry fromfirst zone506 to the dispenseassembly554 mounted at the lower end ofmoveable support member526.

Moveable support member526 is moveable in a z-axis527 relative to theworkpiece12. Because dispenseassembly554 is mounted to the lower end ofmoveable support member526, movement ofmoveable support member526 along the z-axis527 raises and lowers dispenseassembly554 relative to workpiece12 as well.

Moveable support member526 is positioned so thatinner wall528 is housed insidepathway524.Outer wall534, on the other hand, is outside ofpathway524 so thatwall518 remains nested insideannular chamber542. There are small, annular gaps betweenwalls518,528, and534 so that these walls do not touch during z-axis movement ofmoveable support member526. These gaps reduce the risk of contamination from debris that might otherwise be generated from contacting surfaces during the course of a treatment. During the course of a treatment, it also may be desirable to maintain thefirst zone506 at a slight negative pressure relative tosecond zone508. This would help prevent contamination from passing fromfirst zone506 through the annular gaps between theceiling plate504 and themoveable support member526 down into theprocessing chamber503 area ofsecond zone508. As another feature that helps minimize contamination fromfirst zone506 from compromising the environment withinsecond zone508,outer wall534 ofmoveable support member526 also functions in part as a baffle to help block direct access fromfirst zone506 into the annular gap betweeninner wall528 andcenter wall518. The manner in whichcenter wall518 is nested insideannular chambers542 and836 also helps to provide a labyrinth seal betweencenter wall518 andmoveable support member526 and shutter818 to further protect the integrity of the environment withinsecond zone508.

Dispenseassembly554 is mounted to the lower end ofmoveable support member526 and generally includes one or more independent mechanisms for dispensing treatment materials into theprocessing chamber503. For instance, the illustrative embodiment of dispenseassembly554 includes at least one, preferably at least two, and more preferably at least three different kinds of dispensing capabilities. As one capability, these mechanisms include one or more dispensing structures that allowassembly554 to spray one or more treatment fluids downward towardworkpiece12. In preferred embodiments, this capability is provided by a dispensing structure such as spray nozzle/barrier structure556 that integrally incorporates independent first and second spray bar functionalities. These independent spraying functionalities allow two independent treatment materials to be sprayed ontoworkpiece12 at the same time. Of course, other embodiments may include only a single spray system or three or more spray systems, as desired.

Additionally with respect to this particular embodiment, the generallyannular body558 of the spray nozzle/barrier structure556 functions in one respect as a lid overprocessing chamber503 in order to help provide a protected environment for workpiece treatment. However, the generallyannular body558 preferably does not sealprocessing chamber503, but rather comes into close proximity withbaffle members174,218, and262 to produce a high restriction to air flow. Whentool10 is placed into a wafer transfer configuration (described further below), the generallyannular body558 andbaffle members174,218, and262 are separated by movement of one or more of these components to allowworkpiece12 to be placed into and taken from processingchamber503.

In more detail, spray nozzle/barrier structure556 includes anannular body558 having alower surface560,top surface562,inner periphery564 defining a generallycentral aperture575, andouter periphery566. Theinner periphery564 is rounded to help promote smooth gas flow throughcentral aperture575.Annular lip568 extends generally radially outward fromouter periphery566 preferably in a manner so thatlip568 is generally aligned withtop surface562.Lip568 andouter periphery566 form aannular gap572. Via z-axis movement ofmoveable support member526 to whichannular body558 is mounted,annular body558 may be positioned so that the ends182,226, and/or270 of one or more ofbaffle members174,218 and/or262 may fit intoannular gap572. Preferably, a small gap is maintained inannular gap572 to avoid contact between baffles andannular body558. This helps to prevent flow of materials fromheadspace502 into theprocess chamber503. Threaded bores574 facilitate mountingannular body558, and hence dispenseassembly554, to the innerannular flange548 ofmoveable support member526 usingscrews846, or the like, fitted through mountingholes549.

Preferably, at leastlower surface560 ofannular body558 is canted downward in a radially outward direction relative to workpiece12 to establish atapering flow channel576 betweenworkpiece12 andannular body558. Thecanted surface560 can have a variety of geometries. For instance, its geometry can be one or more of conical, parabolic, polynomial, or the like. For purposes of illustration,annular body558 has a hollow, frustoconical geometry that is truncated atinner periphery564 so as to provide generallycentral aperture575. The resultant tapering flow channel helps to promote radial flow outward from center ofworkpiece12 while minimizing recirculation zones. The taper also helps to smoothly converge and increase the velocity of flowing fluids approaching the outer edge of theworkpiece12. This helps to reduce liquid splash effects. The angle oflower surface560 also helps liquid to drain from or drip off of theouter periphery566 ofannular body558 rather than drain or drip straight down onto theunderlying workpiece12.

Arm structure578 of spray nozzle/barrier structure556 extends generally acrosscentral aperture575 and is coupled toinner periphery564 ofannular body558 atjunctures580 and582.Arm structure578 includes first and secondsub-arm portions584 and586.Arm structure578 includesaperture589 for mounting central dispensenozzle member754. In the preferred embodiment shown, firstsub-arm portion584 is generally aligned with anadjacent portion590 ofannular body558, while secondsub-arm portion586 is generally aligned with anadjacent portion592 ofannular body558. In particular, the bottom surfaces598 and608 ofsub-arms584 and586 are aligned withlower surface560 ofannular body558. Thus, sub-arms584 and586 generally meet at an oblique angle.Arm structure578 subdividescentral aperture575 into first andsecond aperture portions594 and596. Theseaperture portions594 and596 may function as air intake ports with respect toprocessing chamber503 during a treatment. The edges of theadjacent arm structure578 are desirably rounded to promote smooth, uniform flow through these intake ports.

A first generallytriangular groove600 is formed on the underside of spray nozzle/barrier structure556. Thisgroove600 spans at least a portion of a first radius of spray nozzle/barrier structure556 that extends along portions of firstsub-arm portion584 and theadjacent portion590 ofannular body558. Thisgroove600 includes anapex region602 extending along the length ofgroove600 andadjacent faces604 and606. In a similar fashion, a second generallytriangular groove610 is formed on the underside of spray nozzle/barrier structure556. Thisgroove610 spans at least a portion of a second radius of spray nozzle/barrier structure556 that extends along portions of secondsub-arm portion586 and theadjacent portion592 ofannular body558. Likegroove600, thisgroove610 includes an apex region (not shown) extending along the length ofgroove610 and adjacent faces (not shown).

Thegrooves600 and610 independently include nozzle features that allow separate streams of treatment materials to be dispensed from one or more respective nozzles or nozzle arrays (described further below) incorporated into the grooves. These nozzles generally dispense treatment material(s) downward towardworkpiece12, with the nozzle(s) associated with each groove providing coverage with respect to a respective radius of theworkpiece12 for excellent cleaning efficiency. In the preferred embodiment as shown, thegrooves600 and610 span first and second radii of spray nozzle/barrier structure556 and are generally opposed with respect to each other. Thus, together, the two grooves substantially span the full diameter of theworkpiece12.

Spray nozzle/barrier structure556 includes several features in order to incorporate a first, independent spray bar capability intosub-arm portion584 and theadjacent portion590 ofannular body558. These features generally includefluid inlet member622 having threadedbase624 andflare coupling626. Asupply tube854 is fluidly coupled to flarecoupling626 and held in place viaflare nut856 that threadably engages threadedbase624.Conduit628 extends frominlet port630 to flowchannel632 extending generally radially outward throughsub-arm portion584 and a portion of theadjacent portion590 ofannular body558.Branch conduits636 extend fromflow channel632 outward to an array ofrespective nozzles638 distributed alongapex region602. Preferably, the array ofnozzles638 is linear, although other array patterns may be used if desired. It is also preferred that the array ofnozzles638 spans at least a portion and more preferably at least substantially all of a radius of theunderlying workpiece12.

In use, material to be dispensed vianozzles638 is fed throughsupply tube854 intoinlet port630. Frominlet port630, the material flows throughconduit628 and then throughflow channel632. Fromflow channel632, the material is distributed among thebranch conduits636 leading tonozzles638, and then is dispensed from the array ofnozzles638.

Sub-arm portion584 further incorporatesfluid inlet member642 having threadedbase644 andflare coupling646. Asupply tube850 is fluidly coupled to flarecoupling646 and held in pace viaflare nut852 that threadably engages threadedbase644. Aninlet conduit648 extends frominlet port650 tobifurcation652, where the flow channel then splits intoconduits654 and656.Conduits654 and656 extend frombifurcation652 torespective flow channels658 and660. Each offlow channels658 and660 extend generally radially outward throughsub-arm portion584 and theadjacent portion590 ofannular body558. A plurality of branch conduits (not shown) extend fromflow channel658 outward to an array ofrespective nozzles664 distributed alongface604 ofgroove600, while branch conduits (not shown) extend fromflow channel660 outward to an array ofrespective nozzles665 distributed alongface606 ofgroove600. Preferably, each of the arrays ofnozzles664 and665 is linear and parallel to each other as well as to the array ofnozzles638, although other array patterns may be used if desired. It is also preferred that the arrays ofnozzles664 and665 span at least a portion and more preferably at least substantially all of a radius of theunderlying workpiece12.

Material to be dispensed vianozzles664 and665 is fed throughsupply tube850 intoinlet port650. Frominlet port650, the material flows throughconduit648. At bifurcation, the flow is distributed betweenconduits654 and656. The respective flows then flow throughchannels658 and660. Fromflow channels658 and660, the respective flows of material are distributed among the branch conduits (not shown) and are then dispensed from the arrays ofnozzles664 and665.

Conduit628,flow channel632, andbranch conduits636 are conveniently formed using any desired boring techniques. For instance, flowchannels632,658, and660 may be conveniently formed by boring corresponding holes in a direction from theouter periphery566 ofannular body558 radially inward. After boring the holes to provideflow channels632,658, and660, plugs640 may be inserted to seal the ends of theresultant flow channels632,658, and660.

Thenozzles638,664, and665 generally dispense fluid streams in a converging fashion so that the dispensed streams atomizingly collide with each other. Liquids, gases, or combinations of these may be dispensed usingspray bar system620. In one representative mode of operation a liquid material is fed throughsupply tube850 and consequently dispensed throughnozzles664 and665, while a gaseous material is fed throughsupply tube854 and consequently dispensed throughnozzles638. The respective feeds can be supplied separately or together. When fed together, the dispensed gas stream will help to more energetically atomize the dispensed liquid streams.

The spacing, dispense trajectory with respect to the surface ofworkpiece12, orifice size of thenozzles638,664, and665, and the like may be varied to adjust the spray characteristics of the dispensed streams. For instance, to help create a more uniform spray across the radius ofworkpiece12, the spacing of the nozzle orifices and nozzle orifice sizes may be varied.

Additional, independent spray bar functionality may also be incorporated into spray nozzle/barrier structure556. As shown, this additional spray functionality is generally identical to that of the first spray bar functionality already described, except for being integrated into secondsub-arm portion586 and theadjacent portion592 of annular body and extending along a second radius of spray nozzle/barrier structure556. The features providing this second spray bar functionality include firstfluid inlet member668 having threadedbase670 andflare coupling672, and secondfluid inlet member674 having threadedbase676 andflare coupling678. Asupply tube862 is fluidly coupled to flarecoupling672 and held in place byflare nut864 that threadably engages threadedbase670. Materials fed throughsupply tube862 are dispensed through an array of nozzles (not shown) along an apex ofgrove610 that are similar to the array ofnozzles638 alongapex602. These materials are conveyed through conduits (not shown) that are similar toconduit628,flow channel632, andbranch conduits636 of first integratedspray bar system620. Anothersupply tube858 is fluidly coupled to flarecoupling678 and held in place byflare nut860 that threadably engages threadedbase676. Materials fed throughsupply tube858 are dispensed through arrays of nozzles (not shown) on faces ofgroove610 that are similar to arrays ofnozzles664 and665 onfaces604 and606. These materials are conveyed through conduits (not shown) that are similar toinlet conduit648,bifurcation652,conduits654 and656,flow channels658 and660, and branch conduits (not shown) used in first integratedspray bar system620.

At least thelower surface560 ofannular body558 may be hydrophilic or hydrophobic, as desired, depending upon the nature of the treatment(s) that might be carried out usingtool10. More preferably, the entirety of spray nozzle/barrier structure556 may be formed from one or more materials having the desired hydrophobic or hydrophilic character.

In addition to spraying capabilities, dispenseassembly554 further incorporates dispensing capabilities to dispense one or more treatment fluids generally onto the center of theunderlying workpiece12. The treatment fluids may be dispensed serially, simultaneously, in overlapping fashion, and/or the like. In preferred embodiments, this capability is provided by a dispensing structure such as central dispensemember754. For purposes of illustration, central dispensemember754 as shown includes two independent nozzles allowing two different treatment materials to be dispensed ontoworkpiece12 at the same time. Of course, other embodiments may include only a single dispensing nozzle or three or more nozzles, as desired.

In more detail, central dispensemember754 generally includesbody756 having top758,sidewall760, andbottom762. First andsecond flare couplings764 and766 project fromtop758. First andsecond rims768 and770 project frombottom762. A first throughconduit772 extends fromfirst inlet port774 tofirst outlet port776, while a second throughconduit778 extends fromsecond inlet port780 tosecond outlet port782.

Apin786 having a threadedbore788 is housed inconduit790 extending acrossbody756.Pin786 is inserted intobody756 so that threaded bore788 is generally aligned withconduit791. Mountingscrew793 engages threadedbore788 and is housed withinconduit791 to help mount central dispensemember754 to dispenseassembly554. A pair ofreliefs792 and794 are formed inbody756 to prevent sprayed treatment fluids from impinging on central dispensemember754.

Supply tubes866 and868 are coupled to flarecouplings764 and766 using retainer/spacer clamp796. In use, material to be dispensed from central dispensemember754 is fed through one or both ofsupply tubes866 and868 and into one or both ofinlet ports774 and780, as the case may be. Frominlet ports774 and/or780, the material flows throughconduits772 and/or778. Fromconduits772 and/or778, the material is dispensed from theoutlet ports776 and/or782 which constitute a pair of nozzles, towards the center ofworkpiece12.Outlet ports776 and/or782 can also be angled to help provide fuller coverage of the treatment fluids on the center ofworkpiece12.

In addition to spraying and central dispense capabilities, dispenseassembly554 further incorporates still yet further dispensing capabilities to dispense one or more treatment fluids showerhead-style generally downward towardworkpiece12. This approach is especially useful for dispensing uniform flows of one or more gases and/or vapors intoprocessing chamber503. In preferred embodiments, this capability is provided by a dispensing structure such as showerhead dispensemember680. For purposes of illustration, showerhead dispensemember680 is fed by two supply feeds, which may be the same or independent, thus allowing two different treatment materials to be dispensed intoprocessing chamber503 at the same time. Of course, other embodiments may include only a single supply feed or three or more feeds, as desired.

In more detail, showerhead dispensemember680 generally includesbase682 andcover734.Base682 includes generallycircular floor684 and recessedsubfloor686.Walls688interconnect floor684 andsubfloor686.Subfloor686 includes several aperture features that allow plumbing features to be conveniently and compactly led to spray nozzle/barrier structure556 and central dispensenozzle member754. In particular,apertures690,696,702, and708 fit overfluid inlet members622,642,668, and674, respectively.Flare nuts852,856,864, and860, seat againstshoulders700,694,706, and712, respectively, when mountingsupply tubes850,854,862, and858 to theirrespective flare couplings646,626,672, and678. Optionally, a jam nut can be used to seat againstshoulders694,700,706 and712 so flare nut does not have to perform dual functions. Similarly,apertures714 and716 provide access forcoupling supply tubes866 and868 to theirrespective flare couplings764 and766 on central dispensenozzle member754.

Aperture718 facilitates mounting of central dispensemember754 withinaperture589 and to the underside ofsubfloor686 using retainer/spacer clamp796 andscrew793.Clamp796 includesbody798 havingsidewall800, top802, andbottom804. First andsecond conduits806 and808 house and help maintain the alignment ofsupply tubes866 and868 that are coupled to central dispensemember754.Conduit810 houses screw793 used to clamp central dispensemember754 in position.Body798 is relieved on opposing sides so thatclamp796 nests betweenflare nuts856 and864.

Floor684 ofbase682 includesfirst region720 andsecond region725 positioned on opposing sides ofsubfloor686.First region720 includes an array ofnozzles722, whilesecond region725 includes a second array ofnozzles728.

Cover734 generally includes raisedcentral panel736 stiffened byannular rim738 and beams739. First andsecond chambers740 and741 are formed betweencover734 andbase682.First chamber740 is generally betweencover734 andnozzles722, whilesecond chamber741 is generally betweencover734 andnozzles728. As illustrated, first andsecond chambers740 and741 are isolated from each other, but have a common supply source. If desired, independent supply sources may be used.Fluid inlet members742 project upward fromcentral panel736.Fluid inlet members742 include threadedbases744 and flarecouplings746.Supply tubes747 are fluidly coupled to flarecouplings746 and held in place viaflare nuts748 that threadably engage threadedbases744.Conduits749 extend frominlet ports750 tooutlet ports751, whereconduits749 open intochambers740 and741.

Mountingholes730 onouter periphery732 ofbase682 and mountingholes752 oncover734 facilitate mounting showerhead dispensemember680 toannular body558 usingscrews846.Standoffs844 help to maintain the desired positioning of showerhead dispensemember680. Showerhead dispensemember680 is mounted to spray nozzle/barrier structure556 in a manner so thatnozzles722 and728 generally overlieaperture sub-sections594 and596.

In use, one or more treatment fluids, especially one or more flows of gas(es), are supplied to showerhead dispensemember680 via one or both ofsupply tubes747. The treatment fluids supplied to eachtube747 may be the same or different. The treatment fluids are introduced intochambers740 and741 viaconduits749. The pressure of the treatment fluid(s) withinchambers740 and741 is generally equalized so that the flow through thenozzles722 and728 is uniform. Desirably, the pressure differential of the fluid(s) withinchambers740 and741 upstream from the showerhead nozzles is desirably less than pressure drop through thenozzles722 and728 themselves in accordance with conventional practices to promote such uniform flow. When dispensed through thenozzles722 and728, the dispensed fluid(s) generally flow towardsworkpiece12 throughaperture sub-sections594 and596. An exhaust may be pulled through one or more ofplenums29,30, or31 to facilitate this flow.

Shutter818 is independently moveable in the z-axis527 relative to theworkpiece12 through a range of motion that includes the generally fully open position as shown inFIGS. 3 and 6 and the generally fully closed position shown inFIG. 2. Desirably, shutter818 can be positioned in intermediate locations between these two extremes in which shutter818 is partially opened/closed. InFIG. 2 in which shutter818 is in a closed position,moveable support member526 is lowered into a treatment position at which bafflemembers174,218, and262 are positioned withinannular gap572 ofannular body558. This helps to protect the integrity of the environment withinprocess chamber503. In the meantime,shutter818 is raised so that its top portion is nested withinannular chamber542 withannular plate832 being positioned adjacent toannular plate540. A small gap, though, preferably is maintained betweenannular plates832 and540 to prevent contact that might otherwise generate undesired contamination. With theshutter818 raised and open in this fashion, one or more gases and/or vapors inheadspace502 are free to be drawn intoprocessing chamber503 through air intake vents formed byaperture sub-sections594 and596. In short,FIG. 2 shows one embodiment of an illustrative configuration oftool10 useful to carry out treatment(s) with respect toworkpiece12.

InFIG. 6, moveable support member526 (and hence dispense assembly554) is raised away frombaffle members174,218, and262 to allowworkpiece12 to be transferred to and from its position on supportingchuck94 viaresultant gap874. In short,FIG. 6 shows one embodiment of an illustrative configuration oftool10 useful to accomplish workpiece transfer to and fromtool10.

FIG. 2 shows an illustrative configuration oftool10 in which shutter818 is in a closed position. The tool configuration ofFIG. 2 is similar to that ofFIG. 3 except that now shutter818 is lowered relative tomoveable support member526 so thatbottom rim824 is positioned in close proximity to thetop surface562 ofannular body558. Desirably, a small gap is maintained so thatbottom rim824 does not actually contacttop surface562. In this configuration,shutter818 helps to choke the air intake intoprocessing chamber503 from the volume ofheadspace502 external to shutter818, while also helping to contain one or more gases and/or vapors introduced toprocessing chamber503 via dispenseassembly554. For instance, theclosed shutter818 facilitates containing a “fog” of IPA-enriched gas/vapor mixture that might be dispensed towardworkpiece12 via showerhead dispensemember680. As another example, theclosed shutter818 also could help to contain fluids used to wash the underside of spray nozzle/barrier structure556. A suitable negative pressure maintained inheadspace502 relative toprocessing chamber503 can help to prevent contamination from enteringprocess chamber503.

In more detail,shutter818 includesinner wall820 havingtop rim822 andbottom rim824.Outer wall826 is generally concentric withinner wall820 and extends fromtop rim828 tobottom rim830.Annular plate832 couples top rim822 ofinner wall820 totop rim828 ofouter wall826, thus forming anannular chamber836 betweenwalls820 and826. Outerannular flange838 extends outward from generally thebottom rim830 ofouter wall826 to help stiffenshutter818.Annular flange838 also provides a convenient surface for mounting actuating structures (not shown) that help to moveshutter818 through a range of motion in a z-axis527 relative to the surface ofworkpiece12.

Inner wall820 ofshutter818 helps to define aconduit834 that is open fromtop rim822 tobottom rim824. Theinner wall528 ofmoveable support member526 is housed inside thisconduit834. A small annular gap separatesinner wall528 frominner wall820 so that the parts do not contact each other when one or both are moved in the z-axis527.

Shutter818 is positioned so thatouter wall826 is outside ofpathway524 so thatwall518 remains nested insideannular chamber836. In turn, the top part ofshutter818 is nested inside ofannular chamber542 ofmoveable support member526. Preferably, there are small, annular gaps betweenwalls528,820,518,826, and534 so that these walls do not touch during z-axis movements ofmoveable support member526 as any contact between the wall surfaces could generate contamination.

Other embodiments of this invention will be apparent to those skilled in the art upon consideration of this specification or from practice of the invention disclosed herein. Various omissions, modifications, and changes to the principles and embodiments described herein may be made by one skilled in the art without departing from the true scope and spirit of the invention which is indicated by the following claims.

Claims (9)

What is claimed is:

1. A barrier structure having a lower surface, comprising:

a) an annular body having a lower surface that is angled so as to help define a tapering flow channel over a workpiece surface when the body is positioned over the workpiece surface;

b) a plurality of independent arrays of nozzles integrated within the annular body in a manner effective to permit one or more processing materials to be dispensed in fluid streams that converge externally with each other and flow downward onto the workpiece surface, wherein the lower surface of the barrier structure comprises a first face having a first array of nozzles integrated within the annular body, a second face having a second array of nozzles integrated within the annular body, and an apex region located between the first and second adjacent faces and having a third array of nozzles integrated within the annular body, wherein the first face is adjacent to the second face in an angled manner that permits a fluid to be dispensed from the first array of nozzles and converge externally with a fluid to be dispensed from the second array of nozzles and a fluid to be dispensed from the third array of nozzles, wherein the converged fluid can flow downward onto the workpiece surface; and

c) one or more processing material supply conduits in the annular body through which one or more processing materials can be supplied to the plurality of independent arrays of nozzles.

2. The barrier structure ofclaim 1, wherein the flow channel tapers in a radially outward direction relative to said surface of the workpiece.

3. The barrier structure ofclaim 1, wherein the annular body comprises an inner periphery defining a central pathway that provides egress between a volume above the annular body and a volume below the annular body, and wherein the barrier structure further comprises an arm structure extending generally across the central pathway.

4. The barrier structure ofclaim 3, wherein the arm structure comprises at least one nozzle through which at least one processing material is dispensed.

5. A barrier structure having a lower surface, comprising:

a) an annular body that can overlie and cover a workpiece when the body is positioned over the workpiece;

b) a plurality of independent arrays of nozzles integrated within the annular body in a manner effective to permit one or more processing materials to be dispensed in fluid streams that converge externally with each other and flow downward onto the workpiece surface, wherein the lower surface of the barrier structure comprises a first face having a first array of nozzles integrated within the annular body, a second face having a second array of nozzles integrated within the annular body, and an apex region located between the first and second adjacent faces and having a third array of nozzles integrated within the annular body, wherein the first face is adjacent to the second face in an angled manner that permits a fluid to be dispensed from the first array of nozzles and converge externally with a fluid to be dispensed from the second array of nozzles and a fluid to be dispensed from the third array of nozzles, wherein the converged fluid can flow downward onto the workpiece surface; and

c) one or more processing material supply conduits in the annular body through which one or more processing materials can be supplied to the plurality of independent arrays of nozzles.

6. The barrier structure ofclaim 1, wherein the barrier structure comprises at least one pathway providing egress through the barrier structure from a volume above the barrier structure to a volume below the barrier structure.

7. The barrier structure ofclaim 6, wherein the pathway generally overlies the workpiece.

8. The barrier structure ofclaim 5, wherein the barrier structure comprises at least one pathway providing egress through the barrier structure from a volume above the barrier structure to a volume below the bather structure.

9. The barrier structure ofclaim 8, wherein the pathway generally overlies the workpiece.

Images