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US5401584A - Surveillance marker and method of making same - Google Patents

Surveillance marker and method of making same
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Publication number
US5401584A
US5401584AUS08/118,723US11872393AUS5401584AUS 5401584 AUS5401584 AUS 5401584AUS 11872393 AUS11872393 AUS 11872393AUS 5401584 AUS5401584 AUS 5401584A
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United States
Prior art keywords
strip
magnetic
deactivatable
markers
marker
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US08/118,723
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Arthur J. Minasy
Peter Y. Zhou
Thomas P. Solaski
Edward J. Callaghan
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Sentry Technology Corp
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Knogo Corp
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Assigned to KNOGO CORPORATIONreassignmentKNOGO CORPORATIONASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: CALLAGHAN, EDWARD J., MINASY, ARTHUR J., SOLASKI, THOMAS P., ZHOU, PETER Y.
Priority to US08/118,723priorityCriticalpatent/US5401584A/en
Priority to AU71408/94Aprioritypatent/AU665720B2/en
Priority to CA002131127Aprioritypatent/CA2131127A1/en
Priority to BR9403475Aprioritypatent/BR9403475A/en
Priority to DE69427106Tprioritypatent/DE69427106T2/en
Priority to EP94114113Aprioritypatent/EP0643376B1/en
Priority to CN94116211.7Aprioritypatent/CN1106947A/en
Priority to JP21732294Aprioritypatent/JP2831575B2/en
Assigned to KNOGO NORTH AMERICA INC.reassignmentKNOGO NORTH AMERICA INC.ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: KNOGO CORPORATION
Publication of US5401584ApublicationCriticalpatent/US5401584A/en
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Assigned to GENERAL ELECTRIC CAPITAL CORPORATIONreassignmentGENERAL ELECTRIC CAPITAL CORPORATIONSECURITY AGREEMENTAssignors: KNOGO NORTH AMERICA, INC.
Assigned to CIT GROUP/BUISNESS CREDIT, INC.reassignmentCIT GROUP/BUISNESS CREDIT, INC.SECURITY AGREEMENTAssignors: SENTRY TECHNOLOGY CORPORATION
Assigned to ROYAL BANK OF CANADAreassignmentROYAL BANK OF CANADASECURITY AGREEMENTAssignors: SENTRY TECHNOLOGY CORPORATION
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Abstract

A deactivatable electronic theft detection marker is made from a strip or ribbon of high magnetic permeability strip or ribbon and then high magnetic coercivity material is deposited on the strip or ribbon by electroplating.

Description

BACKGROUND OF THE INVENTION
1. Field of the Invention
This invention relates to electronic article surveillance systems and more particularly it concerns novel deactivatable and reactivatable markers for use in such systems as well as novel methods of making such markers.
2. Description of the Related Art
It is known to electronically monitor the passage of goods from a protected area by setting up an interrogation zone at an exit from the protected area, attaching special targets or markers to the goods and detecting the presence of the targets or markers when the goods are carried through the interrogation zone. In magnetic type electronic article surveillance systems, a continuous alternating magnetic interrogation field is generated in the interrogation zone; and when a marker is subjected to this field it becomes driven alternately into and out of magnetic saturation and thereby produces characteristic detectable disturbances of the interrogation field. When such a disturbance is detected, the system produces an alarm.
The markers in magnetic type electronic article surveillance systems are usually provided with deactivation elements which comprise magnetizable material of a substantially higher magnetic coercivity than that of the markers. When the deactivation elements are magnetized, they produce magnetic fields which bias the markers into magnetic saturation to such a degree that the magnetic interrogation fields can no longer drive the markers into and out of saturation. Thus the markers are rendered incapable of producing detectable disturbances of the interrogating fields; and the articles to which they are attached may pass through the interrogation zone without activating an alarm. These markers may thereafter be reactivated by demagnetizing their respective deactivation elements. U.S. Pat. Nos. 5,146,204, 5,225,807 and U.S. Pat. No. 4,623,877 describe such markers and electronic article surveillance systems in which such markers are used.
There are two basic types of deactivatable markers which can be used in magnetic electronic article surveillance systems. The first type makes use of a plurality of high coercivity magnetizable elements which are spaced apart and distributed along the length of the marker. These markers can be activated and deactivated by remotely generated magnetic fields, provided that the markers are substantially aligned with these fields the second type of deactivatable marker makes use of a single elongated strip of high coercivity material which extends along the length of the marker. When magnetic elements capable of generating a series of spaced apart magnetic fields are brought into contact with the high coercivity material, they cause a pattern of magnetization to be imposed along the material so that it appears as a series of spaced apart magnetic elements.
In the past, both types of deactivatable marker have been expensive to produce, both from the standpoint of the materials required and from the standpoint of the number of separate manufacturing steps involved in producing the marker. In most cases, the marker and its deactivation element or elements, because of their very different magnetic and mechanical characteristics, had to be separately produced and then assembled. In some instances, for example, as described in U.S. Pat. Nos. 4,950,550 and 5,130,698, it has been proposed that the marker and the deactivation element be formed together and subjected to common drawing and heat treating operations. This however, results in less than optimum processing for the marker or the deactivation element or both. Moreover such process cannot be used for markers which have a series of deactivation elements and therefore they can not be remotely activated and deactivated. Also, as described in U.S. Pat. No. 5,181,021, it has been proposed to form high coercivity deactivation elements by painting onto a marker a coating which comprises high coercivity magnetic powder such as ferric oxide dispersed in a polymer binder. However, the thickness required for such deactivation elements is prohibitively large when such elements are used with markers of thickness greater than 0.001 inch (0.004 mm). U.S. Pat. No. 4,536,229 proposes to separately produce deactivation elements which are cold rolled.
U.S. Pat. No. 4,956,636 proposes a process for manufacturing a deactivatable marker by electroplating a nickel ferrite layer onto a flexible polyester substrate that has been treated by first depositing thereon thin films of chromium and copper to form a "strike layer". Thereafter a hard magnetic layer is made by cutting out strips of magnetic tapes and arranging them on the nickel ferrite layer. This however does not solve the problem of separate manufacture of the hard magnetic layer or of attaching the layer to the marker.
SUMMARY OF THE INVENTION
The present invention provides a novel deactivatable type marker for electronic article surveillance systems which is thin and compact and therefore suited for "source tagging", that is, insertion into articles to be protected at their source of manufacture. This type of tagging can be automated; and it relieves the merchant of the need for applying markers to individual articles of merchandise. Source tagging is also desirable because markers can be hidden in the merchandise and are not susceptible to tampering. The present invention also provides a novel method of manufacturing deactivatable type markers which eliminates most of the manufacturing steps of prior methods and which also eliminates much of the extra material that was required in prior manufacturing processes.
According to one aspect of the present invention there is provided a deactivatable electronic article surveillance system marker which comprises an element of easily magnetizable material having high magnetic permeability and low magnetic coercivity such that, when subjected to continuous alternating magnetic interrogation fields, the element will produce characteristic detectable disturbances of those fields; and another magnetizable material which has a higher magnetic coercivity than the material of the element. The other magnetizable material is deposited on the element on an atom by atom basis, that is, by electrodeposition, vacuum deposition or sputtering.
According to another aspect of the invention there is provided a novel method of manufacturing a deactivatable electronic article surveillance system marker. This method comprises the steps of providing an element of easily magnetizable material having high magnetic permeability and low magnetic coercivity such that, when subjected to continuous alternating magnetic interrogation fields, will produce characteristic detectable disturbances of those fields. Then, another magnetizable material which has a higher magnetic coercivity than the material of the element, is deposited onto the surface of the element, on an atom by atom basis, that is by electroplating, vacuum deposition or by sputtering.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a schematic representation of a first portion of a process for producing deactivatable markers according to a first embodiment of the invention;
FIG. 2 is a schematic representation of a second portion of the process according to the first embodiment;
FIG. 3 is an enlarged perspective view of a deactivatable marker produced according to the process of FIGS. 1 and 2;
FIG. 4 is a schematic representation of a first alternative embodiment according to the present invention;
FIG. 5 is a schematic representation of a second alternative embodiment according to the present invention;
FIG. 6 is a schematic representation similar to FIG. 1 but showing the process as it may be applied to produce markers of different configuration;
FIG. 7 is a plan view of a portion of a ribbon after an etching step in the process shown in FIG. 6;
FIG. 8 is a plan view of a portion of the ribbon after a masking step in the process shown in FIG. 6;
FIG. 9 is a plan view of a portion of the ribbon after a plating step in the process shown in FIG. 6; and
FIG. 10 is a partially exploded perspective view of the ribbon shown in FIG. 9 and showing the manner of removing individual markers from the ribbon.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
As shown in FIG. 1 a continuous thin ribbon orstrip 10 of soft magnetic material such as Permalloy or amorphous metal such as Metglas®, is wound off asupply spool 12. Thestrip 10 first passes through a degreasing bath 14 which removes impurities from the surfaces of the strip. The degreasing bath solution may comprise any conventional commercial cleaner/degreaser such as methyl alcohol (CH3 OH).
Thestrip 10 then passes between a pair ofmasking rollers 16 which have spaced apartmask forming elements 16a distributed along their surface. These mask forming elements pass through ahot wax bath 18 as the masking rollers turn and in doing so they acquire a coating of hot wax. As thestrip 10 passes between therollers 16 it encounters the spaced apartmask forming elements 16a which deposit spaced apart wax coatings which formmasks 10a on the surfaces of thestrip 10.
After receiving themasks 10a, thestrip 10 passes through anelectrolytic plating bath 20. Electroplating baths suitable for this purpose are described in U.S. Pat. Nos. 2,834,725 and 2,619,454; and they may comprise a mixture of cobaltus chloride CoCl2 6H2 O) nickel chloride (NiCl2 6H2 O), boric acid and potassium thiocyanate. Upon entering thebath 20, the film contacts anelectrode wheel 22 which is connected to the negative side of avoltage source 24. The positive side of thevoltage source 24 is connected to an anode 26, which may be a block or bar of cobalt, nickel, cobalt-nickel alloy or an insoluble, conductive material such as graphite or platinum immersed in theplating bath 20. Astirrer 28 within thebath 20 keeps it in constant motion. During its passage through the bath, thestrip 10 has deposited thereon, in the non-masked regions, spaced apart regions of the high magnetic coercivity magnetic material, which in this case is a nickel-cobalt alloy.
After exiting thebath 20, thestrip 10, with the electroplated layer thereon, is passed through adewaxing solution 29, which dissolves and removes the wax masking on the strip. The strip is then directed into arinsing solution 30, which may be water, to rinse off any excess masking material as well as any excess electroplating solution. The strip then passes through adryer 32 which blows hot air on the strip to dry it. The strip is then wound up on a take upspool 34.
Thespool 34 with the electroplatedstrip 10 wound thereon is then transferred to a cutting station as illustrated in FIG. 2. Here thestrip 10 is unwound from thespool 34 and is passed through a pair of cutting rolls 36 havingcutting elements 36a which cut the strip intoindividual markers 40. These markers, which have no covering or other material associated with them, may then be inserted into articles to be protected or to packaging for those articles during their manufacture. This eliminates the need for attaching the markers to the articles or to their packaging at the point of retail sale, which is usually a time consuming and costly operation.
The above described process produces what are known as remotely deactivatable markers. That is, the plated regions of themarkers 40 can be magnetized to desensitize the markers by application of magnetic fields from sources which do not touch the marker, so long as those fields are oriented along the length of the marker. The invention can also be used to produce what are known as colineal markers. In this case, the step of masking selected portions of the marker prior to the electroplating step would be eliminated; and the plating would extend along the entire length of the marker without interruption.
Two specific examples of the electroplating process described in general above, will now be described.
EXAMPLE NO. 1
A plating bath as described in U.S. Pat. No. 2,834,725 was used to produce plated film on thestrip 10 which was made of known marker material, namely a ribbon of either Permalloy or an amorphous material known as Metglas®. Other plating baths may be used, for example that disclosed in U.S. Pat. No. 2,619,454. Operating parameters in this embodiment were as follows:
Temperature (of the bath): 40°-80° Centigrade;
Current Density: 100 amp/ft2 DC and 200 amp/ft2 AC (60 Hz);
(A current density of 200 Amps per foot squaredAC 60 Hertz superimposed on 100 Amps per foot squared DC achieves desired semi-hard magnetic properties.)
pH of the bath: 2.0-3.0;
Time in bath: 2.5 to 10 minutes;
Anode material: Co, Co-Ni, Ni or an insoluble electrically conductive material such as graphite or platinum.
Films of 0.0005-0.001 inch (0.0127-0.0254 mm) were plated within 5-10 minutes. The films so deposited were smooth, bright and adhered to the substrate very well. Properties of such as-plated films are given below. For comparison, the properties of a ribbon of Arnokrome® (a material normally used as a desensitizing element) are also included.
Sample No. 1--2.5"×0.0625"×0.0010" (6.35 cm×0.0159 mm×0.025 mm)
Sample No. 2--2.5"×0.0590"×0.006" (6.35 cm×0.0006 mm×0.015 mm)
Sample No. 3--2.5"×0.0260"×0.0010" (6.35 cm×0.0006 mm×0.0025 mm)
Arnokrome--2.5"×0.0625"×0.0020" (6.35 cm×0.0159 mm×0.050 mm)
              TABLE I                                                     ______________________________________                                                           Saturation                                                                          Residual                                            Coercivity  Induction Induction                                Sample     (H.sub.c)   (B.sub.s) (B.sub.r)                                ______________________________________                                    No. 1      101         311       288                                      No. 2      84          174       158                                      No. 3      91          100        94Arnochrome 92          328       300                                      ______________________________________
Note: The values given for saturation induction and residual induction are given in arbitrary units and are for comparison only. The coercivity is measured in oersteds.
EXAMPLE NO. 2
Markers, i.e. targets, were prepared as described in EXAMPLE NO. 1, except that the substrate orstrip 10 was selectively masked in order to place segments of the plated material on the strip. Masking was accomplished by placing acid resistant tape onto the substrate at locations that were to be kept from being plated. Also, if desired, similar patterns could be obtained by masking with waxes described in connection with FIG. 1 or by coating thestrip 10 with wax and then removing the wax from those areas that are to be plated. Alternatively a non-conductive paint or lacquer can be sprayed onto the strip at locations that are not to be plated. Photomasking techniques may also be used.
FIG. 3 shows, in enlarged perspective view, amarker 40 produced according to the present invention. As can be seen, themarker 40 comprises acontinuous base 40a, which is the same as theoriginal strip 10, withregions 40b of high coercivity material which has been plated onto thebase 40a. The high coercivity material has been applied to the base in an atom by atom deposition process. As a result, an intimate contact is achieved between the base and the high coercivity material; and no adhesive or other intervening material exists between the base and the high coercivity material. Consequently, the high coercivity material is effective even in a very thin layer, to bias the base material into magnetic saturation. It will also be appreciated that only the precise amount of material found on the finished target or marker is used in its manufacture and the cost of producing the marker is minimized. Further, this process avoids the need to separately form high magnetic coercivity elements and then to physically apply them to the base material. Because of this, the number of manufacturing steps needed to make the marker is reduced.
In the embodiment of FIG. 4, thestrip 10 is not electroplated but instead the higher coercivity magnetic material is deposited onto the strip by vacuum deposition.
In FIG. 4 there is provided avacuum chamber 50 in which thestrip 10 is unwound from asupply spool 52 and is wound back onto a receivingspool 54 within thechamber 50. Also provided in thechamber 50 is acrucible 56 which contains amolten alloy 57 of the material to be deposited, in this case a cobalt/nickel alloy, preferably about 80% cobalt and 20% nickel. Thecrucible 56 is provided with aheater 58 to keep the alloy in a molten state. Anevacuation pump 59 on thechamber 50 operates to maintain a pressure inside the chamber approximately at 10-3 Torr. (One Torr equals one millimeter of mercury, or 1/760 atmospheres). Thecrucible 56 is maintained at a temperature of about 1200° C. in order to maintain the alloy in the crucible in a molten state. Thestrip 10 is directed to pass directly over the open top of thecrucible 56 as it moves from thesupply spool 52 to the receivingspool 54. The speed of strip movement is preferably maintained at about 10 cm/min. A faster speed will result in a thinner deposition and a slower speed will result in a thicker deposition. It will be appreciated that thestrip 10 may be masked in the manner described above by means of masking rolls 16 or in any other well known way to restrict the deposition to non-masked regions of the strip.
FIG. 5 shows a still further embodiment of the invention wherein the higher magnetic coercivity material is deposited on thestrip 10 by a sputtering process. In FIG. 5 there is provided avacuum chamber 60 in which an Argon atmosphere is maintained by means of avacuum pump 61 at a pressure of about 1 Torr. Thestrip 10 is unwound from asupply spool 62 and is wound back onto a receivingspool 64 in thechamber 60. Ablock 66 of a solid nickel/cobalt alloy (preferably 80% cobalt and 20% nickel) is positioned within thechamber 60 at a location such that thestrip 10 passes over it as the strip moves from the supply spool to the receiving spool. Theblock 66 is maintained in a liquid cooledjacket 68 to keep it from melting during the deposition process. Anelectrode 70, which may be made of steel, is positioned near the surface of theblock 66 which faces thestrip 10. Avoltage source 72, which is capable of generating approximately 2000 volts, is applied between theblock 66 and theelectrode 70. This voltage causes anarc 73 to be struck between electrode and the block. This results in a sputtering action in which a stream of atoms of theblock material 66a are driven off the block and thrown against thestrip 10. Thus, an atom by atom deposition of the block material is produced on the strip. Preferably thestrip 10 is moved between thespools 62 and 64 at a rate of about 1 cm per minute. This ensures that an adequate amount of the high magnetic coercivity material from the block will be deposited on the strip. This sputtering action can take place of room temperature. It will be appreciated that thestrip 10 may be masked in any of the ways described above in order that the material to be deposited by sputtering will be applied only to selected regions of the strip.
It will be appreciated that in each of the embodiments described herein, a higher coercivity magnetic material used for desensitizing is applied to the base material of the target or marker in a deposition process in which application of the higher coercivity material occurs on an atom by atom basis. This produces intimate contact between the base material and the higher coercivity material; and it avoids the need for any intermediate adhesive or other material to connect the two materials. As a result, an effective deactivatable marker can be made with less material and fewer manufacturing steps than was previously necessary. Also, the resulting marker is thinner and more easily handled than prior art deactivatable markers and is better suited for "source tagging", that is, application of the marker to goods during their manufacture.
The process of the present invention may also be used to produce markers of other configurations, for example, closed loop markers as shown and described in co-pending U.S. patent application No. 08/076,247. In this process, which is illustrated in FIG. 6, aribbon 80 of a high magnetic permeability, low coercivity material such as Permalloy or an amorphous magnetic alloy, is drawn off from aspool 82. Theribbon 80, which in the illustrated embodiment is about one inch (2.54 cm) in width, is first passed through adegreaser bath 84 which removes impurities from the surface of the ribbon. Theribbon 80 then passes through aphotoprint machine 86 and anetching bath 88 which removes material from selected areas of the ribbon according to a special pattern. This special pattern is shown in FIG. 7.
As shown in FIG. 7,arcuate slits 90 and 92 are etched out of theribbon 80. These slits formindividual patterns 94 each comprising a pair of concentric circles. The slits forming each circle are separated bythin bridges 96 which provide support during manufacture but can readily be snapped apart at a subsequent time. Also, elongatedarcuate openings 98 are formed by etching in the regions between the inner and outer circles.
Reverting to FIG. 6, the etchedribbon 80 passes through a cleaning and rinsingbath 100 and from there it passes through aphotoprint operation 101 which applies masking in selected regions. This masking is shown in the dashed outlines 102 of FIG. 8; and as can be seen, the masking extends along the arcuate strips formed on each side of theopenings 98. The masking is resistant to electroplating. The thus patterned andmasked ribbon 80 is then passed through anelectroplating bath 104 similar to that described in connection with FIG. 1. In the electroplating bath a high magnetic coercivity metal, such as described in connection with the preceding embodiment, is applied to the unmasked regions of the patterned ribbon.
Following the plating operation, theribbon 80 is passed through arinsing solution 106 and adryer 108 and is then wound up onto a receivingspool 110. The ribbon as wound onto thespool 110 appears as shown in FIG. 9. As can be seen by stippling 112, the entire ribbon, except for the thin arcuate regions adjacent theopenings 98 is electroplated with the high coercivity material. Thereafter, when markers are to be applied to merchandise, they can be snapped out of theribbon 80 as shown in FIG. 10. As can be seen, a ring shapedmarker 114 withopenings 98 and thin arcuateunplated strips 116 alongside each opening, is snapped out of theribbon 80 and acenter circle 118 is punched out of the center of the marker.
It will be appreciated that the process of the present invention is not limited to the specific shape of the markers nor to the location on the markers that are masked; and in fact, for some applications no masking may be used so that the entire marker will be plated. Also, the invention does not depend on the particular type of masking to be used nor on the particular process used to produce the masking. Further, the vacuum deposition and the sputtering processes described above may be used in place of the electroplating process to produce deactivation elements on markers of various shapes such as the ring shapedmarkers 114 shown in FIG. 10. What is important is that the deactivation elements be applied on an atom by atom basis so as to achieve an intimate bond between the marker material and the deactivation element material.

Claims (7)

We claim:
1. A deactivatable electronic article surveillance system marker comprising:
an element of easily magnetizable material having high magnetic permeability and low magnetic coercivity such that said material, when subjected to continuous alternating magnetic interrogation fields, will produce characteristic detectable disturbances of those fields; and
another magnetizable material which has a higher magnetic coercivity than the material of said element, said another magnetizable material being in direct contact with said element on an atom by atom basis, the interface between said magnetic materials being essentially free of any other materials.
2. A deactivatable marker according to claim 1, wherein said another material is electroplated onto the surface of said element.
3. A deactivatable marker according to claim 1, wherein said another material is vacuum deposited onto the surface of said element.
4. A deactivatable marker according to claim 1, wherein said another material is sputtered onto the surface of said element.
5. A deactivatable marker according to claim 1, wherein said another material is arranged at spaced apart locations along said element.
6. A deactivatable marker according to claim 1, wherein said element is a portion of an elongated strip of said high permeability material and wherein said another material is deposited onto said strip.
7. A deactivatable marker according to claim 1, wherein said element is a ring shaped member and wherein said another material is deposited at discrete spaced apart locations around said member.
US08/118,7231993-09-101993-09-10Surveillance marker and method of making sameExpired - LifetimeUS5401584A (en)

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US08/118,723US5401584A (en)1993-09-101993-09-10Surveillance marker and method of making same
AU71408/94AAU665720B2 (en)1993-09-101994-08-23Surveillance marker and method of making same
CA002131127ACA2131127A1 (en)1993-09-101994-08-30Surveillance marker and method of making same
BR9403475ABR9403475A (en)1993-09-101994-09-08 Process of making a deactivable marker for electronic article surveillance system and the respective deactivable marker
DE69427106TDE69427106T2 (en)1993-09-101994-09-08 Surveillance label and process for its manufacture
EP94114113AEP0643376B1 (en)1993-09-101994-09-08Surveillance marker and method of making same
CN94116211.7ACN1106947A (en)1993-09-101994-09-10Surveillance marker and method of making same
JP21732294AJP2831575B2 (en)1993-09-101994-09-12 Monitoring marker and method for producing the same

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US08/118,723US5401584A (en)1993-09-101993-09-10Surveillance marker and method of making same

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JP (1)JP2831575B2 (en)
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DE69427106T2 (en)2001-10-25
CA2131127A1 (en)1995-03-11
JP2831575B2 (en)1998-12-02
CN1106947A (en)1995-08-16
AU665720B2 (en)1996-01-11
EP0643376A1 (en)1995-03-15
DE69427106D1 (en)2001-05-23
BR9403475A (en)1995-05-16
JPH07175979A (en)1995-07-14
AU7140894A (en)1995-03-23
EP0643376B1 (en)2001-04-18

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