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US5349192A - Solid state detector for polarized x-rays - Google Patents

Solid state detector for polarized x-rays
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US5349192A
US5349192AUS08/065,127US6512793AUS5349192AUS 5349192 AUS5349192 AUS 5349192AUS 6512793 AUS6512793 AUS 6512793AUS 5349192 AUS5349192 AUS 5349192A
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rays
polarized
ray detector
impinging
solid state
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US08/065,127
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James F. Mackay
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Wisconsin Alumni Research Foundation
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Abstract

A solid state x-ray detector has a set of bilayers formed on its front surface. Each bilayer includes a spacing layer and an absorbing layer which have different indexes of refraction, and the impinging x-rays strike the bilayers at an angle which satisfies the Bragg condition. As a result, x-rays polarized in one direction are substantially reflected while x-rays polarized in an orthogonal direction pass through the bilayers for detection by the solid state x-ray detector.

Description

This invention was made with United States Government support awarded by the National Institute of Health (NIH), Grant No. CA 52475-02. The United States Government has certain rights in the invention.
BACKGROUND OF THE INVENTION
The field of the invention is radiation detectors and, more particularly, solid state x-ray detectors used singly or in arrays.
X-ray flux density is usually measured in one of two ways. First, a scintillation element may be used to convert the impinging x-rays into a luminescent intensity which is detected by a separate photomultiplier tube or a silicon photosensitive device. Such detectors are described, for example, in U.S. Pat. No. 5,103,092. Or second, photovoltaic or photoconductive solid state diodes that are directly sensitive to impinging x-rays may be used to produce electric currents. Such x-ray detectors are disclosed, for example, in U.S. Pat. Nos. 2,885,562; 3,598,997; 3,329,815; 4,926,052; and 5,103,100. Such x-ray detectors may be used singly, or they may be combined to form arrays of detectors.
In some applications, it is desirable to polarize the x-rays that impinge on the x-ray detector. One such application is described, for example, in U.S. Pat. No. 4,227,082, where a separate polarizer element is mounted in front of the x-ray detector. This approach can become awkward and expensive in some applications where polarized x-rays are required. For example, when an array of x-ray detectors are employed the use of separate polarizer elements is complex. Or, when the polarizer is to be rotated to observe the polarization characteristics of an x-ray source, the resulting structure is awkward and expensive.
SUMMARY OF THE INVENTION
The present invention relates to a solid state x-ray detector in which a polarizer is integrally formed as part of the x-ray detector. More particularly, the present invention includes a solid state x-ray detector which presents a substantially flat surface for receiving x-rays to be detected; a multilayer polarizing structure formed on the flat surface and including alternating layers of a material having a relatively high index of refraction and a material having a relatively low index of refraction; and means for mounting the solid state x-ray detector such that the x-rays strike the flat surface at an angle such, that the multilayer polarizing structure reflects substantially more x-rays having a first polarization than x-rays having a second, orthogonal polarization.
A general object of the invention is to provide a solid state x-ray detector which is sensitive to x-ray polarization. The multilayer polarizing structure is comprised of alternating layers of materials which are deposited on the surface of the x-ray detector using well known methods such as sputter deposition. These layers are very thin and become an integral part of the x-ray detector. The direction of polarization is determined by the angle and orientation at which the resulting structure is positioned with respect to the impinging x-rays.
Another object of the invention is to provide a polarized x-ray detector which is inexpensive to make and convenient to use. The multilayer polarizing structure is formed as additional steps during the manufacture of the solid state x-ray detector. These additional steps of depositing the alternating layers may use the same technology employed to form the x-ray detector itself. No additional mechanical support is needed for the polarizing structure, thus reducing its cost and making it very easy to revolve the detector or to build arrays of polarized x-ray detectors.
The foregoing and other objects and advantages of the invention will appear from the following description. In the description, reference is made to the accompanying drawings which form a part hereof, and in which there is shown by way of illustration a preferred embodiment of the invention. Such embodiment does not necessarily represent the full scope of the invention, however, and reference is made therefore to the claims herein for interpreting the scope of the invention.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a view in cross section of an x-ray detector diode which employs the polarization structure of the present invention;
FIG. 2 is a pictoral view of the x-ray detector diode of FIG. 1 illustrating its orientation; and
FIG. 3 is a pictoral view of an array of x-ray detector diodes of FIG. 1.
DESCRIPTION OF THE PREFERRED EMBODIMENT
Referring particularly to FIG. 1, the semiconductive x-ray detector device includes asemiconductor substrate 10 of the p-conductivity type having afront surface 11 and aback surface 12. An n-conductivitytype semiconductor region 13 is formed in the front surface of thesubstrate 10 to form apn junction 14 between thesemiconductor regions 10 and 13. Theedge 15 of thispn junction 14 forms a circle on the substantiallyflat front surface 11. When x-rays impinge on thesurface 11, electrons and holes are produced in pairs at thejunction 14 and a current flows in a circuit (not shown) which includes the diode. The amount of current flow is a direct measure of the incident x-ray flux density.
There are numerous semiconductor x-ray detector diodes known to the art and the present invention may be applied to any of them. As will now be described, the polarization structure is formed on thefront surface 11 using the same methods and equipment employed to manufacture the diode itself. An x-ray diode such as that described in by L. R. Canfield, J. Kerner and R. Korde, in Applied Optics, 28, 3940 (1989) and R. Korde, L. R. Canfield and B. Wallis in SPIE, 932, 153-160 (1988) are typical of the devices to which the present invention may be applied.
Referring still to FIG. 1, the polarizing structure is comprised ofalternating layers 20 and 21 of materials which have a substantially different index of refraction for the impinging x-rays. Eachsuch bilayer 22 is approximately 90 Angstroms thick and is formed by deposition of a twentyAngstrom absorbing layer 21 of rhodium and a seventy Angstrowspacing layer 20 of silicon. In the preferred embodiment, twenty of thesebilayers 22 are deposited on thefront surface 11 of the x-ray detector diode using a sputter deposition process. The resultingx-ray detector 24 presents a substantiallyflat front surface 25 that is parallel to thefront surface 11 of the x-ray detector diode. When the structure is oriented such that x-rays impinge at an angle θ with respect to thefront surface 25, thebilayers 22 reflect or absorb 90% of the x-rays polarized in the plane of the front surface 25 (s) while they absorb 60% of the x-rays polarized in the orthogonal direction (p). For 100 keV x-rays, the polarization structure thus provides a factor of four difference in the sensitivity of the x-ray detector diode to the (s) (p) polarization. In other words, 40% of the (p) polarized x-rays are detected while only 10% of the (s) polarized x-rays are detected.
The materials selected for thebilayers 22 as well as the number of bilayers used will depend on a number of factors, including the energy of the x-rays and their strength. The degree of polarization depends on both the selection of materials and the number of bilayers used. The more bilayers used, the greater the polarization sensitivity. But, a larger number of bilayers also reduces the x-ray flux reaching the detector diode, and as a result, an increased number ofbilayers 22 reduces the signal-to-noise ratio of thex-ray detector 24. Materials suitable for the absorbinglayer 21 are listed in Table A and those suitable for thespacing layer 20 are listed in Table B. Polarized sensitivity is maximized when the angle θ is set to satisfy the Bragg condition
ηλ=2d sinθ
where:
λ=x-rays wavelength;
d=bilayer thickness;
θ=angle of incidence; and
η=a whole number.
              TABLE A                                                     ______________________________________                                                Rhodium                                                                   Tungsten                                                                  Molybdenum                                                                Cobalt                                                                    Platinum                                                      ______________________________________
              TABLE B                                                     ______________________________________                                                Silicon                                                                   Carbon                                                                    Boron                                                                     Beryllium                                                     ______________________________________
While thebilayers 22 are deposited by sputtering in the preferred embodiment, other methods may be used. For example, evaporation deposition, molecular beam epitaxy or chemical vapor deposition may be used, and will depend primarily on the manufacturing equipment and expertise available.
Referring particularly to FIG. 2, thepolarized x-ray detector 24 is an integral unit which may be used in a number of applications. In one application, a singlepolarized x-ray detector 24 is mounted to a base 30 which rotates about anaxis 31. Thefront surface 25 is disposed at an angle 0 with respect to therotary axis 31 which satisfies the Bragg condition in accordance with the above formula. As a result, when therotary axis 31 is aligned with the impingingx-rays 33, the signal produced by thepolarized x-ray detector 24 will vary in magnitude as a function of x-ray polarization as it is rotated about theaxis 31. In other words, during one revolution about theaxis 31 thepolarized x-ray detector 24 will produce a signal which indicates by its strength how the impingingx-rays 33 are polarized.
In another application shown in FIG. 3, anarray 40 of ninepolarized x-ray detectors 24 are employed to measure the polarization of x-rays impinging orthogonal to thefront surface 25 of acentral reference detector 24a. The front surfaces 25 of the remaining eightdetectors 24 are tilted at the Bragg angle θ in the directions indicated by the arrows to measure the impinging x-rays at eight different polarizing angles. The signals produced by the ninex-ray detectors 24 provide an accurate indication of x-ray flux density and the degree to which the x-rays are polarized.
It should be apparent to those skilled in the art that other applications are easily implemented with the integralpolarized x-ray detector 24.Additional detectors 24 optimized for other wavelengths and x-ray energy levels may be added to thearray 40 oradditional detectors 24 optimized for other wavelengths and x-ray energy levels may be mounted as in FIG. 2 for rotation aboutaxis 31.

Claims (4)

What is claimed is:
1. A solid state polarized x-ray detector which comprises:
a solid state x-ray detector for producing an electric current which is indicative of the flux density of x-rays impinging on a substantially flat surface;
a bilayer formed on the flat surface and including a spacing layer of a first material and an absorbing layer of a second material said first and second materials having substantially different indexes of refraction and a front surface on the bilayer being oriented at an angle θ with respect to the direction of the impinging x-rays such that a substantial portion of the impinging x-rays polarized in the direction in the plane of the front surface are reflected while a substantial portion of the impinging x-rays polarized in direction orthogonal thereto pass through the bilayer to impinge the flat surface of the solid state x-ray detector.
2. The polarized x-ray detector as recited in claim 1 in which a plurality of said bilayers are formed on the flat surface, one on top of the other.
3. The polarized x-ray detector as recited in claim 1 in which the first material is selected from a first group including silicon, carbon, boron and beryllium and the second material is selected from a second group including rhodium, tungsten, molybdenum, cobalt and platinum.
4. The polarized x-ray detector as recited in claim 1 in which the angle θ is set to satisfy the Bragg condition:
ηλ=2d sin θ
where λ is the wavelength of the impinging x-rays, d is the thickness of said bilayer and η is a whole number.
US08/065,1271993-05-201993-05-20Solid state detector for polarized x-raysExpired - LifetimeUS5349192A (en)

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Cited By (28)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US5485499A (en)*1994-08-051996-01-16Moxtek, Inc.High throughput reflectivity and resolution x-ray dispersive and reflective structures for the 100 eV to 5000 eV energy range and method of making the devices
US5994713A (en)*1997-06-251999-11-30Quantum Imaging Corp.Filmless photon imaging apparatus
US6447120B2 (en)1999-07-282002-09-10MoxtexImage projection system with a polarizing beam splitter
US6452724B1 (en)1998-05-142002-09-17MoxtekPolarizer apparatus for producing a generally polarized beam of light
US6666556B2 (en)1999-07-282003-12-23Moxtek, IncImage projection system with a polarizing beam splitter
US6785050B2 (en)2002-05-092004-08-31Moxtek, Inc.Corrosion resistant wire-grid polarizer and method of fabrication
US20060011850A1 (en)*2002-09-052006-01-19Seely John FMultilayer polarization sensor (MPS) for x-ray and extreme ultraviolet radiation
US7184115B2 (en)2002-01-072007-02-27Moxtek, Inc.Display apparatus with two polarization compensators
US7221420B2 (en)2002-01-072007-05-22Sony CorporationDisplay with a wire grid polarizing beamsplitter
US7306338B2 (en)1999-07-282007-12-11Moxtek, IncImage projection system with a polarizing beam splitter
US20080001042A1 (en)*2004-09-162008-01-03Quiroga Lecy M VAnatomic Support for Hand and Wrist
US7375887B2 (en)2001-03-272008-05-20Moxtek, Inc.Method and apparatus for correcting a visible light beam using a wire-grid polarizer
US7570424B2 (en)2004-12-062009-08-04Moxtek, Inc.Multilayer wire-grid polarizer
US7630133B2 (en)2004-12-062009-12-08Moxtek, Inc.Inorganic, dielectric, grid polarizer and non-zero order diffraction grating
US7789515B2 (en)2007-05-172010-09-07Moxtek, Inc.Projection device with a folded optical path and wire-grid polarizer
US7800823B2 (en)2004-12-062010-09-21Moxtek, Inc.Polarization device to polarize and further control light
US20110095142A1 (en)*2004-09-162011-04-28Eduardo Luis Bueno De Sousa FreitasAnatomic support for hand and wrist
US7961393B2 (en)2004-12-062011-06-14Moxtek, Inc.Selectively absorptive wire-grid polarizer
US8248696B2 (en)2009-06-252012-08-21Moxtek, Inc.Nano fractal diffuser
US8611007B2 (en)2010-09-212013-12-17Moxtek, Inc.Fine pitch wire grid polarizer
US8755113B2 (en)2006-08-312014-06-17Moxtek, Inc.Durable, inorganic, absorptive, ultra-violet, grid polarizer
US8873144B2 (en)2011-05-172014-10-28Moxtek, Inc.Wire grid polarizer with multiple functionality sections
US8913320B2 (en)2011-05-172014-12-16Moxtek, Inc.Wire grid polarizer with bordered sections
US8913321B2 (en)2010-09-212014-12-16Moxtek, Inc.Fine pitch grid polarizer
US8922890B2 (en)2012-03-212014-12-30Moxtek, Inc.Polarizer edge rib modification
US9348076B2 (en)2013-10-242016-05-24Moxtek, Inc.Polarizer with variable inter-wire distance
DE102013008486B4 (en)*2013-05-182016-07-14Saxray GmbH Low-noise optical element for detecting radiation by measuring electrical signals and using the same to set a reflection condition
CN110471101A (en)*2019-08-122019-11-19西北核技术研究院Impulse gamma X-ray detection X method and detection system based on laser polarization modulation

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US5163078A (en)*1991-08-021992-11-10Olympus Optical Co., Ltd.Multilayer film reflecting mirror for X-rays
US5199058A (en)*1990-12-171993-03-30Ricoh Company, Ltd.X-ray monochromator and spectral measurement apparatus using the x-ray monochromator
US5265143A (en)*1993-01-051993-11-23At&T Bell LaboratoriesX-ray optical element including a multilayer coating

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US5199058A (en)*1990-12-171993-03-30Ricoh Company, Ltd.X-ray monochromator and spectral measurement apparatus using the x-ray monochromator
US5163078A (en)*1991-08-021992-11-10Olympus Optical Co., Ltd.Multilayer film reflecting mirror for X-rays
US5265143A (en)*1993-01-051993-11-23At&T Bell LaboratoriesX-ray optical element including a multilayer coating

Cited By (37)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
WO1996004577A1 (en)*1994-08-051996-02-15Moxtek, Inc.High resolution x-ray dispersive and reflective structure
US5485499A (en)*1994-08-051996-01-16Moxtek, Inc.High throughput reflectivity and resolution x-ray dispersive and reflective structures for the 100 eV to 5000 eV energy range and method of making the devices
US5994713A (en)*1997-06-251999-11-30Quantum Imaging Corp.Filmless photon imaging apparatus
US6452724B1 (en)1998-05-142002-09-17MoxtekPolarizer apparatus for producing a generally polarized beam of light
US6710921B2 (en)1998-05-142004-03-23MoxtekPolarizer apparatus for producing a generally polarized beam of light
US6447120B2 (en)1999-07-282002-09-10MoxtexImage projection system with a polarizing beam splitter
US6666556B2 (en)1999-07-282003-12-23Moxtek, IncImage projection system with a polarizing beam splitter
US7306338B2 (en)1999-07-282007-12-11Moxtek, IncImage projection system with a polarizing beam splitter
US7375887B2 (en)2001-03-272008-05-20Moxtek, Inc.Method and apparatus for correcting a visible light beam using a wire-grid polarizer
US7184115B2 (en)2002-01-072007-02-27Moxtek, Inc.Display apparatus with two polarization compensators
US7221420B2 (en)2002-01-072007-05-22Sony CorporationDisplay with a wire grid polarizing beamsplitter
US6785050B2 (en)2002-05-092004-08-31Moxtek, Inc.Corrosion resistant wire-grid polarizer and method of fabrication
US20060011850A1 (en)*2002-09-052006-01-19Seely John FMultilayer polarization sensor (MPS) for x-ray and extreme ultraviolet radiation
US20080001042A1 (en)*2004-09-162008-01-03Quiroga Lecy M VAnatomic Support for Hand and Wrist
US8851431B2 (en)2004-09-162014-10-07Marrio Luiz Novaes AvilaAnatomic support for hand
US20110095142A1 (en)*2004-09-162011-04-28Eduardo Luis Bueno De Sousa FreitasAnatomic support for hand and wrist
US7861984B2 (en)2004-09-162011-01-04De Sousa Freitas, Eduardo Luis BuenoAnatomic support for hand and wrist
US7813039B2 (en)2004-12-062010-10-12Moxtek, Inc.Multilayer wire-grid polarizer with off-set wire-grid and dielectric grid
US7570424B2 (en)2004-12-062009-08-04Moxtek, Inc.Multilayer wire-grid polarizer
US7800823B2 (en)2004-12-062010-09-21Moxtek, Inc.Polarization device to polarize and further control light
US7630133B2 (en)2004-12-062009-12-08Moxtek, Inc.Inorganic, dielectric, grid polarizer and non-zero order diffraction grating
US7961393B2 (en)2004-12-062011-06-14Moxtek, Inc.Selectively absorptive wire-grid polarizer
US8027087B2 (en)2004-12-062011-09-27Moxtek, Inc.Multilayer wire-grid polarizer with off-set wire-grid and dielectric grid
US8755113B2 (en)2006-08-312014-06-17Moxtek, Inc.Durable, inorganic, absorptive, ultra-violet, grid polarizer
US7789515B2 (en)2007-05-172010-09-07Moxtek, Inc.Projection device with a folded optical path and wire-grid polarizer
US8248696B2 (en)2009-06-252012-08-21Moxtek, Inc.Nano fractal diffuser
US8913321B2 (en)2010-09-212014-12-16Moxtek, Inc.Fine pitch grid polarizer
US8611007B2 (en)2010-09-212013-12-17Moxtek, Inc.Fine pitch wire grid polarizer
US8873144B2 (en)2011-05-172014-10-28Moxtek, Inc.Wire grid polarizer with multiple functionality sections
US8913320B2 (en)2011-05-172014-12-16Moxtek, Inc.Wire grid polarizer with bordered sections
US8922890B2 (en)2012-03-212014-12-30Moxtek, Inc.Polarizer edge rib modification
DE102013008486B4 (en)*2013-05-182016-07-14Saxray GmbH Low-noise optical element for detecting radiation by measuring electrical signals and using the same to set a reflection condition
US9348076B2 (en)2013-10-242016-05-24Moxtek, Inc.Polarizer with variable inter-wire distance
US9354374B2 (en)2013-10-242016-05-31Moxtek, Inc.Polarizer with wire pair over rib
US9632223B2 (en)2013-10-242017-04-25Moxtek, Inc.Wire grid polarizer with side region
CN110471101A (en)*2019-08-122019-11-19西北核技术研究院Impulse gamma X-ray detection X method and detection system based on laser polarization modulation
CN110471101B (en)*2019-08-122020-11-17西北核技术研究院Pulse gamma ray detection method and detection system based on laser polarization modulation

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