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US4407934A - Method of making an assembly of electrodes - Google Patents

Method of making an assembly of electrodes
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Publication number
US4407934A
US4407934AUS06/327,598US32759881AUS4407934AUS 4407934 AUS4407934 AUS 4407934AUS 32759881 AUS32759881 AUS 32759881AUS 4407934 AUS4407934 AUS 4407934A
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United States
Prior art keywords
plate
electrodes
glass
slots
strip portions
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Expired - Lifetime
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US06/327,598
Inventor
Saul Kuchinsky
Robert H. Bellman
James A. Ogle
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Unisys Corp
Corning Glass Works
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Burroughs Corp
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Assigned to BURROUGHS CORPORATION, A CORP. OF MIreassignmentBURROUGHS CORPORATION, A CORP. OF MIASSIGNMENT OF ASSIGNORS INTEREST.Assignors: KUCHINSKY, SAUL, OGLE, JAMES A.
Priority to US06/327,598priorityCriticalpatent/US4407934A/en
Priority to JP83500315Aprioritypatent/JPS58502075A/en
Priority to PCT/US1982/001696prioritypatent/WO1983002034A1/en
Priority to DE8282306456Tprioritypatent/DE3270679D1/en
Priority to EP82306456Aprioritypatent/EP0081359B1/en
Publication of US4407934ApublicationCriticalpatent/US4407934A/en
Application grantedgrantedCritical
Assigned to BURROUGHS CORPORATIONreassignmentBURROUGHS CORPORATIONMERGER (SEE DOCUMENT FOR DETAILS). DELAWARE EFFECTIVE MAY 30, 1982.Assignors: BURROUGHS CORPORATION A CORP OF MI (MERGED INTO), BURROUGHS DELAWARE INCORPORATED A DE CORP. (CHANGED TO)
Assigned to BURROUGHS CORPORATION A CORP OF DE, CORNING GLASS WORKS A CORP OF NEW YORKreassignmentBURROUGHS CORPORATION A CORP OF DEASSIGNMENT OF ASSIGNORS INTEREST.Assignors: KUCHINSKY, SAUL, OGLE, JAMES, BELLMAN, ROBERT H.
Assigned to UNISYS CORPORATIONreassignmentUNISYS CORPORATIONMERGER (SEE DOCUMENT FOR DETAILS).Assignors: BURROUGHS CORPORATION
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Abstract

This invention is directed to the making of an electrode assembly which comprises providing anode electrodes on one surface of a photosensitive glass plate, providing cathode electrodes on the opposite surface of said glass plate oriented transversely to said anode electrodes, and dissolving away the plate material in alignment with said anode electrodes forming slots extending between the surfaces of said plate, thereby placing said anode and cathode electrodes in operative relation with each other.

Description

BACKGROUND OF THE INVENTION
U.S. application Ser. No. 327,597, filed concurrently herewith by the present inventors, titled Method of Making An Electrode Assembly, points out that there are numerous types of electronic devices, such as dot matrix display panels, which involve the use of two sets of electrodes spaced apart but in operative relation with one another. The text also notes that the electrodes are supported and separated by a body of electrical insulating material in which are located slots, holes, grooves, or other open passages which are frequently difficult to make and, consequently, greatly increase the cost of the assemblies.
A discussion is also provided disclosing the prior use of glasses, glass-ceramics, and ceramics for fabricating supporting structures for use in electronic devices, and the problems encountered. Glasses, glass-ceramics, and sintered ceramics demonstrate high refractoriness, good chemical resistance to the ambient environment, relative inertness to impinging radiations of various wavelengths, and high mechanical strength but are difficult to drill, punch, or otherwise mechanically shape into complex geometries.
Finally, U.S. Pat. Nos. 2,628,160, dated Feb. 10, 1953, 2,684,911, dated July 27, 1954, and 2,971,853, dated Feb. 14, 1961, of Stanley D. Stookey, are reviewed. The first two patents describe thermally opacifiable glass compotions which exhibit photosensitivity and the capability of being chemically machined to fine tolerances, and the third patent describes the production of glass-ceramic bodies which also demonstrate photosensitivity and the capability of being chemically sculptured.
The opal glasses described consist essentially, expressed in weight percent on the oxide basis, of 9-15% Li2 O, 0-8% total Na2 O and/or K2 O, 9-23% Li2 O+Na2 O+K2 O, 70-85% SiO2, 0.001-0.020% Ag, computed as AgCl, 0-10% Al2 O3, 0-2.4% F, and 0-0.05% CeO2. When portions of such glass bodies are exposed to short wave radiation, customarily ultraviolet radiation, a latent image is produced in those portions. Subsequent heat treatment of at least those portions of the glass bodies at temperatures generally below the softening point of the glass causes the development of crystallites of a lithium silicate and/or an alkali metal fluoride therein which impart opacity thereto. Those crystals are much more soluble in mineral acids, e.g., dilute hydrofluoric acid, than the surrounding glass. Advantage has been taken of this solubility differential between the crystallites and the residual glass to implement the chemical machining or sculpturing of such glass articles into very complex configurations and to produce holes therein without the need for mechanical tools.
The glass-ceramic articles disclosed in U.S. Pat. No. 2,971,853 consist essentially, expressed in weight percent on the oxide basis, of 60-85% SiO2, 5.5-15% Li2 O, 2-25% Al2 O3, the ratio Al2 O3 :Li2 O being less than 1.7:1, and a photosensitive metal in the indicated proportions selected from the group of 0.001-0.03% gold, computed as Au, 0.001-0.3% silver, computed as AgCl, and 0.001-1% copper, computed as CuO. When portions of glass bodies having compositions within those cited ranges are exposed to short wave radiation, normally ultraviolet radiation, a latent image is produced in those portions. Thereafter, at least those previously-exposed areas of glass bodies are subjected to a two-step heat treatment. Thus, those portions are initially subjected to temperatures between the annealing and softening points of the glass, and then to temperatures above the softening point of the glass. This latter step effects crystallization in situ in the previously-exposed portions of the bodies, the unexposed portions being essentially unchanged. The exposed areas are highly crystalline and include at least one lithium-containing crystal phase which is more readily soluble in mineral acids, e.g., dilute hydrofluoric acid, than the residual glass. These glass-ceramic articles are mechanically stronger and possess the capability of being used in higher temperature applications than the above-discussed photosensitive opal glasses.
Chemically-sculpturable, photosensitive glasses and glass-ceramics have been employed commercially in a number of applications including electronic and fluidic devices where grooves, slots, holes, etc., of high tolerances have been etched therein. For example, Corning Glass Works, Corning, New York, has marketed a chemically machinable, photosensitive glass product under the trademark FOTOFORM and chemically machinable glass-ceramic product under the trademark FOTOCERAM.
OBJECTIVES OF THE INVENTION
The principal objective of the invention is to provide an improved method for fabricating electrode assemblies comprising two sets of electrodes spaced apart in operative relation with each other in which the supporting structure therfor is of such complex geometry that removal of material from the supporting structure is conventionally demanded, said inventive method eliminating the need for machining, milling, drilling, punching, or other mechanical means for removing material from the supporting structure.
Another objective of the invention is to fabricate electrode assemblies which can be incorporated into gas-filled display panels or into other types of devices that utilize crossed electrodes and cell matrices.
DESCRIPTION OF THE DRAWINGS
FIG. 1 is a plan view of a plate of electrical insulating material at one stage in the preparation of an assembly according to the inventive method;
FIG. 2 is a sectional view through the plate of FIG. 1 along thelines 2--2 in FIG. 1;
FIG. 3 illustrates the composite article formed incorporating the plate of FIG. 2 at a later stage in the preparation of an assembly according to the inventive method;
FIG. 4 is a perspective view of the completed assembly prepared from the composite article of FIG. 3;
FIG. 5 is a sectional view of a modification of the inventive assembly; and
FIG. 6 is a sectional view of the assembly of FIG. 5 at a later stage in its preparation.
SUMMARY OF THE INVENTION
The method of the invention comprises five general steps:
First, a plate of photosensitive, electrical insulating material is exposed to actinic radiation, commonly ultraviolet radiation, to develop a latent image therein in a selected pattern;
Second, said plate is heat-treated in a manner to develop a phase in the previously-exposed portions which can be selectively chemically remove from said plate material;
Third, an array of electrodes, e.g., anodes, is disposed onto one surface of said plate in alignment with said exposed and developed portions;
Fourth, an array of electrodes, e.g., cathodes is disposed onto the opposite surface of said plate oriented transversely to said first array of electrodes;
Fifth, said plate in at least said exposed and developed portions is contacted with a solvent to selectively remove said phase in said exposed and developed portions, thereby producing slots in said plate and placing said arrays of electrodes in operative relation with each other.
DESCRIPTION OF THE INVENTION
The detailed description following is drawn to photosensitive glasses and glass-ceramics of the types disclosed in U.S. Pat. Nos. 2,628,160 and 2,971,853, supra, because of their intrinsic high mechanical strength, good weathering resistance, relative inertness to radiations of various wave lengths, relatively high mechanical strength, and low vapor pressure.
Adverting now to the appended drawings and to FIG. 1, aplate 10 of a photosensitive glass is subjected to collimated ultraviolet radiation through a patterned mask composed of material opaque to ultraviolet radiation, or in some other manner, to produce latent images in the form of parallel, linear exposedregions 20 which pass through the body ofplate 10 as is seen in FIG. 2. It can be observed in FIG. 1 thatregions 20 do not extend to the edges ofplate 10. This practice enables the edge portions ofplate 10 to remain in place, thereby serving to maintain the integrity ofplate 10 when portions thereof are subsequently removed from exposedregions 20. It will be recognized, of course, that other arrangements can be devised to holdplate 10 together after exposedregions 20 have been chemically removed.Plate 10 is then heated to a temperature generally below the softening point of the glass, but above the transformation range thereof, to develop crystallites in exposedregions 20 selected from the group of a lithium silicate and an alkali metal fluoride.
Next, as is depicted in FIG. 2, an array of parallel,linear electrodes 30, to be operated as anode electrodes, is formed by any suitable process, on thebottom surface 12 ofplate 10.Electrodes 30 are aligned with exposed anddeveloped regions 20. As illustrated in FIG. 2,anodes 30 are represented as flat, strip-like bodies which may be of any suitable width.
Thereafter, as is shown in FIG. 3, an array of parallel,linear electrodes 40, to be operated as glow cathodes, is applied via any convenient technique to thetop surface 14 ofplate 10 oriented transversely toanode electrodes 30. FIGS. 3 and 4 represent these cathodes as flat-strip-like bodies of any desired width.
The crystallizedportions 20 are contacted with a mineral acid, e.g., dilute hydrofluoric acid, to dissolve those portions, thereby formingopen slots 50 and leaving a structure as represented in FIG. 3. Hence, an assembly is fabricated, as illustrated in FIG. 4, which comprisesplate 10 having an array ofslots 50 with ananode electrode 30 aligned with each slot and a plurality ofcathode electrodes 40 disposed acrossslots 50. This assembly, after the attachment of leads thereto, can be incorporated into a gas-filled display panel or other type of device.
It will be appreciated that the anodes and cathodes can be formed from any suitable material which is highly electrically conducting and exhibits a coefficient of thermal expansion relatively closely matching that of the plate material. Customarily, the electrodes will be metallic, fabricated from stainless steel, nickel, or an alloy demonstrating the required expansion properties. Methods for applying the electrodes include, but are not limited to, evaporation, silk screening, RF sputtering, electroless metal and galvanic plating, and vapor deposition.
Furthermore, it will be understood that configurations other than rectilinear slots, for example, V-shaped grooves and arc-shaped channels, will likewise be operable in the final assembly.
FIGS. 5 and 6 illustrate a modification of the basic method depicted in FIGS. 1-4. Thus,plate 10 is subjected to collimated ultraviolet radiation through a patterned mask to produce latent images in the form of parallel, linear exposedregions 20 which pass through the body ofplate 10. Thereafter,plate 10 is heat-treated at temperatures between the transformation range and the softening point of the glass to develop crystallites selected from the group of a lithium silicate and an alkali metal fluoride inregions 20.
An array of parallel,linear cathode electrodes 40 is applied via any suitable method to thetop surface 14 ofplate 10 in transverse orientation tocrystallized regions 20. A plurality of parallel,linear anodes 30 is applied through any convenient means to the surface ofsupport plate 60.Support plate 60 is prepared from an electrical insulating material, e.g., glass, and is oriented in such relation to plate 10 that anodes 30 are aligned withcrystallized regions 20 ofplate 10.
Thereafter,plate 10 is attached to supportplate 60 via any suitable means. Frequently, a sealing glass frit having a fusing temperature lower than those ofplates 10 and 60 is applied to contact areas onplate 10 and/orsupport plate 60. The assembly is then fired at a sufficiently high temperature to fuse the sealing glass frit and therebybond plates 10 and 60 together. Finally, crystallizedportions 20 are contacted with a mineral acid to etch out those regions leavingopen slots 50.
The completed assembly comprises a matrix of cells which, after the attachment of leads thereto, can be utilized in a gas-filled display panel or other type of device which employs crossed electrodes and cell matrices. While not a requirement, the leads will desirably also be covered with a frit at the point of attachment to provide a measure of protection from mechanical abuse and atmospheric weathering.
The inventive assemblies readily lend themselves to the production of multi-unit structures since two or more individual units can be laid up in a desired configuration and bonded together through conventional frit sealing or other means.
Finally, where the higher strength and greater refractoriness of a glass-ceramic body is desired, the heat treatment will follow the manner disclosed in U.S. Pat. No. 2,971,853 and will consist of, first, subjecting the glass to temperatures between the annealing point and softening point thereof and, second, heating to temperatures above the softening point of the glass to develop a high degree of crystallization in the portions of the glass which were previously exposed to short wave radiation.

Claims (12)

What is claimed is:
1. A method for making an electrode assembly comprising the steps of
(a) exposing a plate of photosensitive, electrically insulating glass to ultraviolet radiation to develop a latent image therein in a pattern of parallel strips across a face of said plate, but not extending to the edges thereof;
(b) heat treating said plate at a temperature below the softening point of the glass to develop crystallites in the previously-exposed strip portions which can be selectively chemically removed from said glass plate;
(c) applying an array of first elongated electrodes to one surface of said plate in transverse orientation to said strip portions;
(d) contacting the obverse surface of said plate in at least said strip portions thereof with a solvent to selectively chemically remove said crystallites in said strip portions fully into said plate to form parallel slots therein; and
(e) applying to the obverse surface of said plate having said parallel slots therein a support plate of electrically insulating glass carrying elongated parallel second electrodes, said support plate being oriented in such relation that the second electrodes carried thereby are aligned with and positioned within said slots, said second electrodes being transverse to said first electrodes and in operative relation therewith through said slots.
2. A method according to claim 1 wherein said heat treating consists of exposing said glass plate at a temperature above the annealing point of said glass but below the softening point thereof, and thereafter subjecting said plate to a temperature above the softening point of said glass to cause the generation of crystals therein.
3. A method for making an electrode assembly comprising the steps of
(a) exposing a plate of photosensitive, electrically insulating glass to ultraviolet radiation to develop a latent image therein in a pattern of parallel strips across a face of said plate, but not extending to the edges thereof;
(b) heat treating said plate at a temperature below the softening point of the glass to develop crystallites in the previously-exposed strip portions which can be selectively chemically removed from said glass plate;
(c) applying an array of elongated parallel, strip-like first electrodes to one surface of said plate in transverse orientation to said strip portions and applying an array of elongated parallel, strip-like second electrodes to the opposite surface of said plate and oriented transverse to said first electrodes;
(d) contacting both surfaces of said plate in at least said strip portions thereof with a solvent to selectively chemically remove said crystallites in said strip portions to form parallel slots therein,with said first and second electrodes in operative relation with each other through said slots; and
(e) applying to one surface of said plate, a support plate of electrically insulating glass.
4. The method of claim 3 wherein said first electrodes are disposed transverse to said second electrodes and said second electrodes are disposed in and lie along said slots.
5. A method according to claim 3 wherein said slots have essentially a rectilinear, V-shaped, or arc-shaped configuration.
6. A method according to claim 3 wherein said electrodes are applied through a technique selected from the group of silk screening, evaporation, RF sputtering, electroless metal plating, and vapor deposition.
7. A method according to claim 3 wherein leads are attached to said electrodes and said leads are covered with a glass frit.
8. A method according to claim 3 wherein said first array of electrodes is carried on a support plate which is attached to the surface of said plate.
9. A method according to claim 3 wherein said electrodes consist of a metal selected from the group of nickel, stainless steel, and other metal alloys having a coefficient of thermal expansion relatively closely matching that of said glass plate.
10. A method according to claim 3 wherein said crystallites are selected from the group of a lithium silicate and an alkali metal fluoride.
11. A method according to claim 17 wherein said solvent is a mineral acid.
12. A method according to claim 18 wherein said acid is dilute hydrofluoric acid.
US06/327,5981981-12-041981-12-04Method of making an assembly of electrodesExpired - LifetimeUS4407934A (en)

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Application NumberPriority DateFiling DateTitle
US06/327,598US4407934A (en)1981-12-041981-12-04Method of making an assembly of electrodes
JP83500315AJPS58502075A (en)1981-12-041982-12-01 How to manufacture electrode assemblies
PCT/US1982/001696WO1983002034A1 (en)1981-12-041982-12-01Method of making an assembly of electrodes
EP82306456AEP0081359B1 (en)1981-12-041982-12-03Method of making an assembly of electrodes
DE8282306456TDE3270679D1 (en)1981-12-041982-12-03Method of making an assembly of electrodes

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US06/327,598US4407934A (en)1981-12-041981-12-04Method of making an assembly of electrodes

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EP (1)EP0081359B1 (en)
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WO (1)WO1983002034A1 (en)

Cited By (9)

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Publication numberPriority datePublication dateAssigneeTitle
US4532453A (en)*1982-12-031985-07-30Iwatsu Electric Co., Ltd.Storage target for storage tubes and method of fabrication
US5083958A (en)*1990-07-161992-01-28Hughes Aircraft CompanyField emitter structure and fabrication process providing passageways for venting of outgassed materials from active electronic area
US5104343A (en)*1989-10-261992-04-14Matsushita Electric Industrial Co., Ltd.Method for manufacturing flat display device
US5462467A (en)*1993-09-081995-10-31Silicon Video CorporationFabrication of filamentary field-emission device, including self-aligned gate
US5503582A (en)*1994-11-181996-04-02Micron Display Technology, Inc.Method for forming spacers for display devices employing reduced pressures
US5562516A (en)*1993-09-081996-10-08Silicon Video CorporationField-emitter fabrication using charged-particle tracks
US5827099A (en)*1993-09-081998-10-27Candescent Technologies CorporationUse of early formed lift-off layer in fabricating gated electron-emitting devices
US20030168580A1 (en)*2002-03-072003-09-11Cis Institut Fur Mikrosensorik GmbhSensor detecting reflected light and method for its manufacture
US20070086874A1 (en)*2005-07-142007-04-19Paul SullivanReactive Fasteners

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* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
JP2835430B2 (en)*1995-10-301998-12-14株式会社住友金属エレクトロデバイス Method of manufacturing plasma display panel barrier
AU2313700A (en)*1999-03-042000-09-21Electrovac, Fabrikation, elektrotechnischer Spezialartikel Gesellschaft m.b.H.Cathode structure for a field emission display

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US2879147A (en)*1956-08-171959-03-24Houston R BakerMethod of etching glass
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US3776613A (en)*1970-03-201973-12-04Philips CorpGas-discharge display panel
US3781984A (en)*1971-07-151974-01-01Fujitsu LtdMethod for manufacturing electrodes of a display device utilizing gas discharge
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US3789470A (en)*1968-06-121974-02-05Fujitsu LtdMethod of manufacture of display device utilizing gas discharge
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US4092166A (en)*1976-12-271978-05-30International Business Machines CorporationDouble exposure and double etch technique for producing precision parts from crystallizable photosensitive glass
US4108521A (en)*1976-08-301978-08-22Burroughs CorporationMethod of making a display panel and the anodes therefor
US4276335A (en)*1978-03-131981-06-30General Electric CompanyElectron beam matrix deflector and method of fabrication

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US2971853A (en)*1953-03-051961-02-14Corning Glass WorksCeramic body and method of making it
US2933648A (en)*1956-08-141960-04-19Gen ElectricInformation display apparatus
US2879147A (en)*1956-08-171959-03-24Houston R BakerMethod of etching glass
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US3776613A (en)*1970-03-201973-12-04Philips CorpGas-discharge display panel
US3687513A (en)*1971-03-241972-08-29Burroughs CorpMethod of aging a display panel
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Cited By (15)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US4532453A (en)*1982-12-031985-07-30Iwatsu Electric Co., Ltd.Storage target for storage tubes and method of fabrication
US5104343A (en)*1989-10-261992-04-14Matsushita Electric Industrial Co., Ltd.Method for manufacturing flat display device
US5083958A (en)*1990-07-161992-01-28Hughes Aircraft CompanyField emitter structure and fabrication process providing passageways for venting of outgassed materials from active electronic area
US5851669A (en)*1993-09-081998-12-22Candescent Technologies CorporationField-emission device that utilizes filamentary electron-emissive elements and typically has self-aligned gate
US5562516A (en)*1993-09-081996-10-08Silicon Video CorporationField-emitter fabrication using charged-particle tracks
US5813892A (en)*1993-09-081998-09-29Candescent Technologies CorporationUse of charged-particle tracks in fabricating electron-emitting device having resistive layer
US5827099A (en)*1993-09-081998-10-27Candescent Technologies CorporationUse of early formed lift-off layer in fabricating gated electron-emitting devices
US5462467A (en)*1993-09-081995-10-31Silicon Video CorporationFabrication of filamentary field-emission device, including self-aligned gate
US5913704A (en)*1993-09-081999-06-22Candescent Technologies CorporationFabrication of electronic devices by method that involves ion tracking
US6204596B1 (en)*1993-09-082001-03-20Candescent Technologies CorporationFilamentary electron-emission device having self-aligned gate or/and lower conductive/resistive region
US5503582A (en)*1994-11-181996-04-02Micron Display Technology, Inc.Method for forming spacers for display devices employing reduced pressures
US5698932A (en)*1994-11-181997-12-16Micron Display Technology, Inc.Interelectrode spacers for display devices including field emission displays
US20030168580A1 (en)*2002-03-072003-09-11Cis Institut Fur Mikrosensorik GmbhSensor detecting reflected light and method for its manufacture
US7030359B2 (en)*2002-03-072006-04-18CiS Institut für Mikrosensorik gGmbHSensor detecting reflected light and method for its manufacture
US20070086874A1 (en)*2005-07-142007-04-19Paul SullivanReactive Fasteners

Also Published As

Publication numberPublication date
WO1983002034A1 (en)1983-06-09
JPS58502075A (en)1983-12-01
EP0081359B1 (en)1986-04-16
EP0081359A1 (en)1983-06-15
JPH0574175B2 (en)1993-10-15
DE3270679D1 (en)1986-05-22

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