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US3227132A - Apparatus for depositing coatings of tin on a flexible substrate - Google Patents

Apparatus for depositing coatings of tin on a flexible substrate
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US3227132A
US3227132AUS248731AUS24873162AUS3227132AUS 3227132 AUS3227132 AUS 3227132AUS 248731 AUS248731 AUS 248731AUS 24873162 AUS24873162 AUS 24873162AUS 3227132 AUS3227132 AUS 3227132A
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tin
substrate
chamber
source
vacuum
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US248731A
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Philip J Clough
Robert W Steeves
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National Research Corp
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National Research Corp
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Jan. 4, 1966 P. J. CLOUGH ETAL 3,227,132 APPARATUS FOR DEPOSITING COATINGS OF TIN ON A FLEXIBLE SUBSTRATE Filed Dec. 31, 1962 2 Sheets-Sheet 1 L VAC.
7 PUMP VAC. PUMP Fig. I
INVENTORS PHILIP J. CLOUGH BY ROBERT W. STEEVES Maw ATTORNEY Jan. 4, 1966 P. J. CLOUGH ETAL 3,227,132
I APPARATUS FOR DEPOSITING COATINGS OF TIN ON A FLEXIBLE SUBSTRATE 2 Sheets-Sheet 2 Filed Dec. 31, 1962 VAC. PUMP Fig. 2
INVENTORS PHILIP J. CLOUGH BY ROBERT W. STEEVES ATTORNEY United States Patent 3,227,132 APPARATUS FOR DEPOSETING COATINGS 0F TIN ON A FLEXIBLE SUBSTRATE Philip J. Clough, Reading, and Robert W. Steeves, Nahant, Mass, assignors, by rnesne assignments, to National Research Corporation, a corporation of Massachusetts Filed Dec. 31, 1962, Ser. No. 248,731 3 Claims. (Cl. 11849) This invention relates to coating and more particularly to the coating of various substrate materials with tin by vacuum evaporation and deposition of tin.
In the coating of various substrates with a tin film by vacuum evaporation of the tin, considerable difficulty has been experienced in obtaining uniform tin coatings of high purity and high evaporation rates of the tin, which is necessary in producing bright specular metallic tin coatings for use in products requiring a high quality specular metallic appearance. The principal reason for these difficulties results from the fact that the tin metal exhibits an oxide skin on the surface of the molten metal. This oxide results either from residual oxide in the metal itself or is formed by the tin metal in combination with residual gas molecules of oxygen, water or carbon monoxide remaining in the vacuum chamber. This coating of tin oxide forms a thin skin on the surface of the tin preventing evaporation of the tin metal thereunder. Where increased heat is used in order to obtain an increased evaporation rate there results a spora-tic bursting of portions of the oxide skin due to the increased vapor pressure which builds up underneath the skin. This results in uneven or nonuniform coatings and low evaporation rates at the evaporation temperature. Additionally, the tin coatings produced are milky white, hazy, or brown and non specular in appearance.
Accordingly, an object of the present invention is to provide an improved apparatus for evaporating molten tin in a vacuum for the purpose of providing tin coatings having a high degree of purity and uniformity and a high quality specular metallic appearance.
Another object of the present invention is to provide for high tin evaporation rates by the prevention of the formation of oxide scum on the surface of the molten tin being evaporated.
Another object of the present invention is to provide for a clean tin evaporating surface over long periods of operation.
Other objects of the invention will in part be obvious and will in part appear hereinafter.
The invention accordingly comprises an apparatus possessing the construction, combination of elements and arrangement of parts, which are exemplified in the following detailed disclosure, and the scope of the application of which will be indicated in the claims.
For a fuller understanding of the nature and objects of the invention, reference should be had to the following detailed description taken in connection with the accompanying drawing wherein:
FIG. 1 is a schematic, diagrammatic, sectional view of one preferred embodiment of the invention; and
FIG. 2 is a schematic, diagrammatic sectional view of an alternative embodiment of the invention.
Referring now to the drawing, there is illustrated a diagrammatic, schematic, sectional representation of one preferred embodiment of the invention. As illustrated, the apparatus includes .a first vacuum chamber arranged to be evacuated to .a pressure on the order of 1x 10* torr by a high capacityvacuum pumping system 12. Thechamber 10 has a vacuumtight cover 14 which can be lifted up to permit loading and unloading of rolls of thesubstrate 16 to be coated. The apparatus also includes avacuum coating chamber 18 arranged to be 3,227,132 Patented Jan. 4, 1966 evacuated by a highcapacity pumping system 19 to a pressure on the order of 5X10 torr or less. Positioned within thevacuum coating chamber 18 is a source of tin vapors 2d. The tin source 21 is preferably an elongated container having a length substantially equal to the width of the substrate to be coated. In the preferred embodiment the tin source is constructed as shown in the copending application of Clough et 211., Serial No. 130,647, filed August 10, 1961, assigned to the same assignee as is this application and which is now abandoned.
As disclosed therein the tin vapor source comprises a refractory base of carbon or graphite having the inner surface which is to be exposed to tin vapors coated with molybdenum metal. The outer surface of the refractory base is provided with a plurality of layers of refractory materials which are effective to prevent heat loss from the outer surface of the crucible source. The tin source is preferably heated byinduction heating coils 22. Between thefirst vacuum chamber 10 and thevacuum coating chamber 18 there is provided in a preferred embodiment 2.large drum 24 which almost completely fills an opening 26 between these two chambers. This opening is defined in part bycurved surfaces 28 which cooperate with the drum surface to form high impedance paths substantially preventing large quantities of gas such as air, oxygen, water and carbon monoxide from passing from the first chamber Ill to the highvacuum coating chamber 18. Preferably the drum Z4 is so positioned, with respect to a pair of guide rolls 39, that thesubstrate 16 is pressed into contact with thedrum 24 and held in contact with this drum while it is carried into thecoating chamber 18, through the tin vapors and back out of the coating chambet. The impedance paths created by the curved surfaces or shrouds and the drum thus constitute apertures through which the substrate to be coated must pass. For highest impedance to gases the aperture must be minimized; however, there must be sufficient clearance for the paper to pass While in contact with the drum, without touching the shrouds. Moreover, when it is necessary to join one length of substrate with another by means of a lap joint, the aperture must be large enough to allow two thicknesses of the substrate to pass without interference. Accordingly, it is preferred that the spacing between the shrouds and the drum be made adjustable to permit optimum spacing for different thicknesses of the substrate.
In the preferred embodiment of the present invention, the vacuum coating chamber is provided with a source ofinert gas 32 for filling the vacuum coating chamber with an atmosphere of an inert gas such as nitrogen, argon, helium and the like. When the substrate is to be loaded or unloaded vacuum chamber In is vented to the atmosphere and thecover 14 removed to permit access tochamber 10. In order to prevent contamination of the molten tin and formation of an oxide scum on the surface ofthe molten tin by leakage of gases fromchamber 10 into thevacuum coating chamber 18, thevacuum chamber 18 is filled or flooded with an inert gas. Preferably an inert gas pressure in excess of atmospheric is provided in the vacuum coating chamber so that any leakage through the opening 26 will be in a direction intochamber 10. After the unloading and loading of the substrate is completed,chamber 10 is evacuated to operating pressure and then thecoating chamber 18 is evacuated. The tin source is then brought up to operating temperature and the coating resumed. In this manner a clean tin evaporating surface is maintained whereby vola-t-ilized t-in is rapidly deposited onto the substrate to provide tin coatings having a high degree of uniformity and purity and a high quality specular metallic appearance.
In the preferred embodiment of the invention shown in FIG. 1 thevacuum coating chamber 18 is provided with aremovable bottom 38 which provides access to the coating zone or coating .chamber 18. Ashield 34 is also preferably provided to permit the tin source to be brought up to operating temperature without exposing the substrate to radiation from the crucible until the tin is at the desired high evaporating temperature on the order of at least 1400 C. to 1600 C.
In the preferred embodiment of the present invention, the molten tin is preferably fed to thesource 20 from asupply 41 positioned outside of thevacuum coating chamber 18. In this manner the tin metal can be heated by suitable means to a molten state andpure tin metal 42, free from oxide impurities, introduced into thesource 20 by drawing the molten tin metal from below the surface on which the oxide scum 44 forms.
Referring now to FIG. 2 of the drawing, wherein like numbers refer to like elements, there is shown an alternative embodiment of the present invention. In this embodiment of the invention the vacuum coating chamber comprises a singlevacuum coating chamber 50. In ac- 'co'rdance with this embodiment of the invention there is provided a movable cover orlid member 48 positioned adjacent the surface of the molten tin and defining aspace 52 therebetween. Preferably this cover has an area greater than the area of the upper end of thetin source 20. Preferably the edge of thecover 48 is adapted to extend downwardly beyond the upper edge of the tin source so that when the cover is positioned over the source a gas outlet orpassage 54 is provided between the cover and the source. Associated with thecover 48 is conduit means 36 which provides connection to the source ofinert gas 32. In operation of this embodiment of the invention, when thechamber 50 is to be opened to load and unload the substrate, for example, the heating of thesource 20 is discontinued. Thecover 48 is then moved by suitable means not shown from a position shown by the dotted lines at b to the superimposed position over thesource 20. Thechamber 50 is then vented to the atmosphere and preferably simultaneously a stream of inert gas such as nitrogen is passed into the area defined by the cover and the tin source. The inert gas fil'ls the area defined by the cover and the source, and flows over the surface of the molten tin and out of the passage oroutlet 54 formed between the cover and the source in a direction shown by the arrows. A suiiicient flow of nitrogen is provided to maintain a sufiiciently great concentration of nitrogen over the surface of the molten tin to prevent atmospheric gases from contacting the surface of the tin and forming oxide impurities. Thecover 14 is then removed and the coated substrate unloaded and a new substrate loaded. Thechamber cover 14 is then replaced and evacuation of the chamber to operating pressure begun. When the contaminating atmospheric gases have been removed, the flow of inert gas is stopped and heating of the tin to vaporization temperatures is begun. At this point thecover 48 is preferably moved to a position shown by the dotted lines at a to prevent any coupling to the cover during induction heating. In this position the cover serves as a shield to protect the substrate from radiation from the tin source while the tin source is being brought up to operating temperature. When the operating temperature is reachedcover 48 is then moved to a position shown by the dotted lines [2 and coating of the substrate is commenced.
In accordance with this embodiment of the invention the molten tin metal is protected from contaminating gases during opening of the chamber by the concentrated flow of inert gas over the surface of the tin metal. While thecover 48 is shown as being loosely fitted, it naturally is made as tight as is consistent with the large temperature gradients encountered. "In any case the pressure in thespace 52 is maintained greater than atmosphere whenchamber 50 is open.
While the invention has been described in connection with preferred embodiments, it is apparent that numerous changes can be made without departing from the spirit of the invention. For example, the tin source may be wholly formed of molybdenum metal. However, such crucibles are relatively expensive and are not easily formed or machined. Equally the geometric shape of the source and/ or cover can be varied and other heating systems such as resistance heating may be employed. Additionally the substrate may be passed from the atmosphere into the coating chamber through a series of locks of the type shown in US. Patent No. 2,927,330 to Bugbee.
Additionally, themeans 41 for feeding molten tin to the tin source can be enclosed in a suitable outgassing chamber.
Since certain changes may be made in the above process and apparatus without departing from the scope of the invention herein involved, it is intended that all matter contained in the above description, or shown in the accompanying drawing, shall be interpreted as illustrative and not in a limiting sense.
What is claimed is:
1. An apparatus for coating a roll of a substrate with tin metal by vacuum evaporating tin and condensing tin on the substrate, said apparatus comprising means defin ing a vacuum chamber, means for evacuating said chamber, means for unrolling said substrate, moving said substrate past a source of tin metal vapors positioned in said chamber and rerolling said substrate in the vacuum chamber, door means for loading an uncoate-d roll of substrate into, and removing a coated roll of substrate from said vacuum chamber, means for melting the tin in the source and heating the surface of the molten tin to vaporization temperature, means for isolating the surface of the molten tin from the door means, said isolation means comprising an elongated narrow opening, and means for providing a superatmospheric pressure of an inert gas over the molten tin with a flow of inert gas through said opening at a sufiicient rate to prevent ingress of oxygen to the surface of the molten tin while said door means is open.
2. The apparatus of claim 1 wherein the tin vapor source and the substrate roll are positioned in different portions of the vacuum chamber and the narrow opening constitutes a portion of the path of travel of the substrate as it is unrolled, coated and rerolled.
3. An apparatus for coating a roll of a substrate with tin meta-l by vacuum evaporating tin and condensing tin on the substrate, said apparatus comprising means defining a vacuum chamber, means for evacuating said chamber, means for unrolling said substrate, moving said substrate past a source of tin metal vapors positioned in said chamber, and rerolling said substrate in the vacuum chamber, door means for loading an uncoated roll of substrate into, and removing a coated roll of substrate from, said vacuum chamber, means for melting the tin in the source and heating the surface of the molten tin to vaporization temperature, means for isolating the surface of the molten tin from the door means, said isolation means comprising a closure for separating the portion of said vacuum chamber adjacent the molten tin from the remainder of the vacuum chamber, and means providing a superatmospheric pressure of an inert gas over the surface of the molten tin, the closure and the superatrnospheric pressure cooperating to prevent backleakage of oxygen to the surface of the molten tin while said door means is open.
References Cited by the Examiner UNITED STATES PATENTS 2,382,432 8/1945 McManus et a1. 117107 2,639,490 5/1953 Brennan 117-107 2,853,970 9/1958 Novak 118-49 2,971,862 2/1961 Baer et al 1l849 X 2,996,037 8/1961 Eng 117106 X 2,996,418 8/1961 Bleil 117106 X 3,087,838 4/1963 Lubin 204-192 X RICHARD D. NEVIUS, Primary Examiner.

Claims (1)

1. AN APPARATUS FOR COATING A ROLL OF A SUBSTRATE WITH TIN METAL BY VACUUM EVAPORATING TIN AND CONDENSING TIN ON THE SUBSTRATE, SAID APPARATUS COMPRISING MEANS DEFINING A VACUUM CHAMBER, MEANS FOR EVACUATING SAID CHAMBER, MEANS FOR UNROLLING SAID SUBSTRATE, MOVING SAID SUBSTRATE PAST A SOURCE OF TIN MEALS VAPORS POSITIONED IN SAID CHAMBER AND REROLLING SAID SUBSTRATE IN THE VACUUM CHAMBER, DOOR MEANS FOR LOADING AN UNCOATED ROLL OF SUBSTRATE INTO, AND REMOVING A COATED ROLL OF SUBSTRATE FROM SAID VACUUM CHAMBER, MEANS FOR MELTING THE TIN IN THE SOURCE AND HEATING THE SURFACE OF THE MOLTEN TIN TO VAPORIZATION TEMPERATURE, MEANS FOR ISOLATING THE SURFACE OF THE MOLTEN TIN FROM THE DOOR MEANS, SAID ISOLATION MEANS COMPRISING AN ELONGATED NARROW OPENING, AND MEANS FOR PROVIDING A SUPERATMOSPHERIC PRESSURE OF AN INSERT GAS OVER THE MOLTEN TIN WITH A FLOW OF INSERT GAS THROUGH SAID OPENING AT A SUFFICIENT RATE TO PREVENT INGRESS OF OXYGEN TO THE SURFACE OF THE MOLTEN TIN WHILE SAID DOOR MEANS IS OPEN.
US248731A1962-12-311962-12-31Apparatus for depositing coatings of tin on a flexible substrateExpired - LifetimeUS3227132A (en)

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Cited By (17)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US3334908A (en)*1964-04-131967-08-08Pennsalt Chemicals CorpRotary seal
US3425484A (en)*1966-02-021969-02-04United States Steel CorpApparatus for introducing coating metal to a vapor-deposition chamber
US3480464A (en)*1964-09-211969-11-25Dow Chemical CoLaminate material and method of making
US3854442A (en)*1971-08-201974-12-17Bosch Gmbh RobertVapor-deposition apparatus
US3868106A (en)*1971-12-141975-02-25ArbedVacuum chamber seal
DE3046564A1 (en)*1979-12-101981-09-17Fuji Photo Film Co., Ltd., Minami-Ashigara, KanagawaVacuum vapour deposition plant for strip substrates - esp. for depositing magnetic metal or alloy films onto polymer tape to mfr. magnetic recording media
US4454836A (en)*1979-12-101984-06-19Fuji Photo Film Co., Ltd.Vacuum evaporating apparatus utilizing multiple rotatable cans
US4462332A (en)*1982-04-291984-07-31Energy Conversion Devices, Inc.Magnetic gas gate
US4810531A (en)*1984-10-131989-03-07Metal Box PlcVapor deposition of tin
US4904526A (en)*1988-08-291990-02-273M CompanyElectrically conductive metal oxide coatings
US5017255A (en)*1989-01-231991-05-21Clyde D. CalhounMethod of transferring an inorganic image
US5026599A (en)*1988-08-291991-06-25Minnesota Mining & ManufacturingArray of densely packed discrete metal microspheres coated on a substrate
US5219655A (en)*1989-01-231993-06-15Minnesota Mining And Manufacturing CompanyComposite including an inorganic image and method of transferring such an image
US5350598A (en)*1993-03-271994-09-27Leybold AktiengesellschaftApparatus and method for selectively coating a substrate in strip form
US6270861B1 (en)*1994-07-212001-08-07Ut, Battelle LlcIndividually controlled environments for pulsed addition and crystallization
US20130199447A1 (en)*2010-12-132013-08-08PoscoContinuous Coating Apparatus
US20180151851A1 (en)*2016-11-302018-05-31Lg Display Co., Ltd.Roll-to-roll substrate deposition apparatus

Citations (7)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US2382432A (en)*1940-08-021945-08-14Crown Cork & Seal CoMethod and apparatus for depositing vaporized metal coatings
US2639490A (en)*1948-08-121953-05-26Joseph B BrennanFormation of metal strip under controlled pressures
US2853970A (en)*1956-03-091958-09-30Ohio Commw Eng CoContinuous gas plating apparatus under vacuum seal
US2971862A (en)*1957-04-261961-02-14Nat Res CorpVapor deposition method and apparatus
US2996418A (en)*1957-06-051961-08-15Gen Motors CorpMethod and apparatus for vapor depositing thin films
US2996037A (en)*1959-01-261961-08-15Nat Res CorpVacuum coating apparatus
US3087838A (en)*1955-10-051963-04-30Hupp CorpMethods of photoelectric cell manufacture

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US2382432A (en)*1940-08-021945-08-14Crown Cork & Seal CoMethod and apparatus for depositing vaporized metal coatings
US2639490A (en)*1948-08-121953-05-26Joseph B BrennanFormation of metal strip under controlled pressures
US3087838A (en)*1955-10-051963-04-30Hupp CorpMethods of photoelectric cell manufacture
US2853970A (en)*1956-03-091958-09-30Ohio Commw Eng CoContinuous gas plating apparatus under vacuum seal
US2971862A (en)*1957-04-261961-02-14Nat Res CorpVapor deposition method and apparatus
US2996418A (en)*1957-06-051961-08-15Gen Motors CorpMethod and apparatus for vapor depositing thin films
US2996037A (en)*1959-01-261961-08-15Nat Res CorpVacuum coating apparatus

Cited By (20)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US3334908A (en)*1964-04-131967-08-08Pennsalt Chemicals CorpRotary seal
US3480464A (en)*1964-09-211969-11-25Dow Chemical CoLaminate material and method of making
US3425484A (en)*1966-02-021969-02-04United States Steel CorpApparatus for introducing coating metal to a vapor-deposition chamber
US3854442A (en)*1971-08-201974-12-17Bosch Gmbh RobertVapor-deposition apparatus
US3868106A (en)*1971-12-141975-02-25ArbedVacuum chamber seal
DE3046564A1 (en)*1979-12-101981-09-17Fuji Photo Film Co., Ltd., Minami-Ashigara, KanagawaVacuum vapour deposition plant for strip substrates - esp. for depositing magnetic metal or alloy films onto polymer tape to mfr. magnetic recording media
US4454836A (en)*1979-12-101984-06-19Fuji Photo Film Co., Ltd.Vacuum evaporating apparatus utilizing multiple rotatable cans
US4462332A (en)*1982-04-291984-07-31Energy Conversion Devices, Inc.Magnetic gas gate
US4810531A (en)*1984-10-131989-03-07Metal Box PlcVapor deposition of tin
US5026599A (en)*1988-08-291991-06-25Minnesota Mining & ManufacturingArray of densely packed discrete metal microspheres coated on a substrate
US4904526A (en)*1988-08-291990-02-273M CompanyElectrically conductive metal oxide coatings
US5017255A (en)*1989-01-231991-05-21Clyde D. CalhounMethod of transferring an inorganic image
US5219655A (en)*1989-01-231993-06-15Minnesota Mining And Manufacturing CompanyComposite including an inorganic image and method of transferring such an image
US5328534A (en)*1989-01-231994-07-12Minnesota Mining And Manufacturing CompanyComposite including an inorganic image and method of transferring such an image
US5350598A (en)*1993-03-271994-09-27Leybold AktiengesellschaftApparatus and method for selectively coating a substrate in strip form
US6270861B1 (en)*1994-07-212001-08-07Ut, Battelle LlcIndividually controlled environments for pulsed addition and crystallization
US20130199447A1 (en)*2010-12-132013-08-08PoscoContinuous Coating Apparatus
US9267203B2 (en)*2010-12-132016-02-23PoscoContinuous coating apparatus
US20180151851A1 (en)*2016-11-302018-05-31Lg Display Co., Ltd.Roll-to-roll substrate deposition apparatus
US10873058B2 (en)*2016-11-302020-12-22Lg Display Co., Ltd.Roll-to-roll substrate deposition apparatus

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