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US2435997A - Apparatus for vapor coating of large surfaces - Google Patents

Apparatus for vapor coating of large surfaces
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Publication number
US2435997A
US2435997AUS509236AUS50923643AUS2435997AUS 2435997 AUS2435997 AUS 2435997AUS 509236 AUS509236 AUS 509236AUS 50923643 AUS50923643 AUS 50923643AUS 2435997 AUS2435997 AUS 2435997A
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Prior art keywords
coating
coated
carrier
coating material
chamber
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US509236A
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Alva H Bennett
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American Optical Corp
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American Optical Corp
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Feb. 17, 1948. A. H. BENNETT 3 APPARATUS FOR VAPOR comma 0! LARGE SURFACES Filed Nov. 6, 1945 2 Sheets-Sheet 1 414 o 23 mm\\\\\\\\\Y 2;; 3 22f 2 9a I l ,0 ,j fl
INVENTOR.
ALVA MBENNETT Feb. 17, 1948. H k -r 2,435,997
APPARATUS FOR VAPOR COATING OF LARGE SURFACES Filed 'Nov. 6, 1943 2 Shepts-Sheet 2 AL v: M JEN/Y5 TT Patented Feb. 17, 1948 APPARATUS FOR varon comma or LARGE SURFACES Alva H. Bennett, Kenmore, N. Y., assignor, by
mesne assignments. American Optical Company, Sonthbrldge, Mass a voluntary association Application November s, 1943, Serial No. 509,236
I- Claims.
This invention relates to new and improved means and process for coating surfaces and more particularly to the coating of such surfaces by deposition of a vaporized coating material in a vacuum.
' An object of the present invention is to provide new and improved means and method for the coating of the surfaces of large rigid objects by deposition of a vaporized coating material in an evacuated chamber.
Another object of the invention is to provide a new and improved means and method for coating the surface of a large rigid object whereby substantially uniform distribution of the coating material over the entire surface of the object may be obtained.
Another object of the invention is to provide new and improved means and method whereby the surface of a large object may be coated with greater speed than previously possible and with greater uniformity of coating.
Other objects and advantages of the invention will be apparent from the following description taken in connection with the accompanying drawings. It will be understood that many changes may be made in the details of construction, ar-
rangement of parts and steps of the processwithout departing from the spirit of the invention as expressed in the accompanying claims. I; therefore, do not wish to be limited to the exact details of construction, arrangement of parts and steps of the process shown and described as the preferred form and process have been given by way of illustration only.
Referring to the drawings:
Fig. 1 is a sectional view of an apparatus for carrying out the invention; I
Fig. 2 is a sectional view taken on line 2-2 of Fig. 1 looking in the direction of the arrows;
Fig. 3 is a sectional viewtaken on line 3-3 of Fig. 2 looking in the direction of the arrows;
Fig. 4 is a view similar to Fig. 1 but showing a further form of apparatus for carrying out the invention; and
Fig. 5 is a fragmentary top or plan view similar to Fig. 2 but showing the form of the invention shown in Fig. 4.
In the coating of the surfaces of large objects such as large plates of glass for windows, etc., with reflection reducing coatings or with reflective coatings it is desirable that the coating be obtained in as short a time as possible for ease and economy in manufacture and also that the deposited coating be uniformly distributed over the entire surface. In the past this has required 2 either a plurality of sources or else a single source was placed a considerable distance from the surface to be coated which increased considerably the size of the chamber to be evacuated and made difficult the obtaining of uniform coatings. It is, therefore, the object of the present invention to provide a new and improved means and method of coating the surface of a large object whereby the coating will be uniformly distributed over the entire surface and whereby said coating will be deposited in a relatively short time.
Referring more particularly to the drawings wherein similar reference characters designate corresponding parts throughout the several views the form of apparatus shown in Figures 1 to 3 inclusive for carrying out the invention comprises a base I on which is positioned the vacuum chamber orbell jar member 2 which may be evacuated through the opening 3 in the usual manner. The openings 3 may be of desired number depending upon the size of the vacuum chamber.
Within theevacuated chamber are the upright supports 4 for supporting the object to be coated 5 whicnmay be a large sheet of glass, plastic or other similar material with the surface thereof to be coated placed in the direction of the source of coating material. If desired apparatus could' be provided for rotating the article to permit coating of both sides but this would require the vacuum chamber to be large.
On the surface of the base i is placed the guide member 6 or this guide member 6 may be formed directly in the upper surface of the base i itself if desired. This guide member 6 has the guideway I which contains therails 8 and 9 which may be energized by the current from the leads "I and II.
Within the guideway I is the traveling carrier I! which comprises the crucible portion [3 containing' the coating material II which coating material is-adapted to be vaporized by heat from the heating coil II which is energized by the leads I! and I! from the terminals la -and liirespectively which in turn receive currentbymeans of the leads ll and 2| from the posts 222 Thetraveling carrier 12 has the wheels 23- which are adapted to be driven by theelectric motor 24 which receives current from the tracks 7 said crucible is a shield member which both acts as a support for said crucible and also acts 8.8%
radiation shield to retain the heat within said crucible.
It is pointed out that if desired the heating coil I I could be eliminated and the" coating material l4 vaporized by resistance heating in which case the current would be applied directly to the crucible which would then become heated and vaporize said coating material.
The vaporized coating material from the crucible i3 is deposited on the surface of the plate 5 on the side toward said source to form the desired coating on said surface.
The pattern or design of the guideway 1 andtracks 8 and O is so computed or determined as to provide the desired uniformity of coating on the surface of the article to be coated and the traveling carrier traverses the full extent of the way I and then is reversed by themembers 9a engaging either of theswitches 25 or 26 to reverse themotor 24 which may be of the universal type, to reverse its direction of travel and it therefore returns to the starting point where it again is reversed and this travel of the carrier continues until the coating of desired thickness is deposited which thickness can be observed directly by the operator observing the coated surface through thechamber member 2 where the said chamber member is transparent or through suitable windows in said chamber.
If desired, instead of the heating coil I5 and the resistance form of heating as previously described the crucible I! could be heated by induction heating coils surrounding said crucible.
The form of the invention shown in Figures 4 and 5 is similar to that shown in Figures 1 to 3, inclusive, except that in this case instead of the traveling carrier I! being directly associated with the motor, the carrier is driven by amagnet 29 which is driven by themotor 30 and which magnet rides on thetracks 32 and 33 which are beneath the base I and themagnet 29 causes movement of themagnet 28 and carrier l2 to the same extent as the movement of themagnet 29. Thewheels 30 and ii are driven by themotor 34,
The movement of themagnet 29 automatically causes movement therewith of the traveling carrier i 2 within the evacuated chamber and themotor 34 is reversed by themember 35 engaging themember 36 in the manner described above for the prior form and the coating continued until the desired coating is applied. Th carrier i2 in this case rides in the grooves 40 and 4| which grooves are arranged in a pattern similar to thetracks 32 and 33 for thewheels 30. In this case the base 39 is supported by thelegs 31 on a sup-P rt 38.
It is pointed out that should the surface to be coated be irregular, that is, not all the same plane, then the contour of the guideway 1 could be formed to correspond to the contour of the surface to be coated so that the distance between the source of coating material and surface to be coated could be kept constant during the coating operation.
Before the surface is coated it should, of course, be cleaned in the usual way and may if desired be heated by placing a heating coil within the vacuum chamber between the upper surface of the article to be coated and the top of the chamber. This will facilitate the coating and also increase the hardness of the resultant coating.
It is also pointed out that if desired instead of moving the crucible or sourc of coating material relative to the surface to be coated that the article to be coated could be movably mounted relative to a stationar source of coating material but this would require a much larger vacuum chamber than otherwise necessary.
From the foregoing it will be seen that I have provided simple, efficient and economical means for obtaining all of the objects and advantages of the invention.
Having described my invention, I claim:
1. In a device of the character described, means for supporting the large rigid object the surface of which is to be coated, a movable carrier, said carrier having means for supporting a coating material, means for vaporizing said coating material and a guideway in spaced relation with an object supported by said object support and extending substantially over the area thereof for guiding said carrierduring the distribution of the coating material on the surface to be coated, current conduction means in said guideway and means on said carrier adapted to be energized by current from said current conducting means in said guidewa to cause movement of said carrier in said guideway.
2. In a device of the character described, a vacuum chamber, means in said vacuum chamber for supporting an object the surface of which is to be coated, a movable carrier, said carrier hav. ing means for supporting a coating material and means for vaporizing said coating material, a guideway for guiding said carrier along paths substantially uniformly distributed relative to the surface of the object to be coated and means operable during evacuation of said chamber for moving said carrier along the paths of said guideway,
3. In a device of the character described, a vacuum chamber, means in said vacuum chamber for supporting the object to be coated, a guideway in said vacuum chamber, said guideway being arranged according to the distribution desired of the coating material, a carrier adapted to be movable in said guideway, said carrier having means for supporting a coating material and means for vaporizing said coating material, a guide member without the evacuated chamber and being of substantially the same configuration as the guideway within the chamber and means movable on said guideway without the evacuated chamber, said movable means having means for causing simultaneous movement of the carrier within the chamber whereby said carrier may be moved relative to the surface to be coated while causing emission of said coating material.
4. Apparatus for coating relatively extensive surfaces comprising a vacuum chamber, means for supporting an object to be coated within said vacuum chamber, means associated with said container for vaporizing the coating material and transport means operable during evacuation of I 5 said chamber for moving said carrier along paths substantially uniformly distributed relative to the surface of the object to be coated.
6. Apparatus for coating relatively extensive surfaces comprising a vacuum chamber, means for supporting an object to be coated within said chamber, a container for the coating material, a. carrier for said container movable in said vacuum chamber, electric heating means associated with said container for vaporizing the coating material, and means for producing movement of said carrier within said vacuum chamber along paths substantially uniformly distributed relative to the surface of the object to be coated- 7. Apparatus for coating, relatively extensive surfaces comprising a vacuum chamber, means for supporting an object to be coated within said chamber, a crucible for containing the coating material, a carrier for said crucible movable in said vacuum chamber, heating means associated with said crucible for vaporizing the coating material, andtransport means operable by a servo-motor movable therewith for moving said carrier along a network of paths distributed 6 relative to the surface to ALVA H. BENNETT.
* REFERENCES CITED substantially uniformly be coated.
The following references are of record in the iile of this patent:
UNITED STATES PATENTS Number Name Date 1,817,311 Hedde Aug. 4, 1931 2,074,281 Sommer. Mar. 16, 1937 2,153,363 Bruche Apr. 4, 1939 2,267,296 Bennewitz at 9.1.. Dec. 23, 1941.- 1,256,599 Schoop Feb, 19, 1918 2,239,642 Burkhard ,et al. Apr, 22, 1941 2,317,173 Bleakley Apr. 20,1943 1,439,743 Mathes Dec. 26, 1922 998,579 Herz July 18, 1,911
FOREIGN PATENTS Number Country I Date 806,066 France Nov. 10, 1936
US509236A1943-11-061943-11-06Apparatus for vapor coating of large surfacesExpired - LifetimeUS2435997A (en)

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Cited By (29)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US2527747A (en)*1946-01-031950-10-31Margaret N LewisApparatus for coating articles by thermal evaporation
US3382843A (en)*1965-10-231968-05-14Optical Coating Laboratory IncVacuum coating apparatus utilizing rotating sources
US3414503A (en)*1964-03-121968-12-03GlaverbelApparatus for coating the surface of plates uniformly by cathode sputtering
US3984585A (en)*1974-05-301976-10-05Fuji Xerox Co., Ltd.Vacuum evaporation plating method
US4002880A (en)*1975-08-131977-01-11Gte Sylvania IncorporatedEvaporation source
US4187801A (en)*1977-12-121980-02-12Commonwealth Scientific CorporationMethod and apparatus for transporting workpieces
US4748935A (en)*1985-02-051988-06-07Balzers AktiengesellschaftVapor source for vacuum coating installation
EP0997552A4 (en)*1997-07-142001-05-02Matsushita Electric Industrial Co Ltd METHOD FOR MANUFACTURING THIN FUNCTIONAL FILM AND APPARATUS THEREOF
US20020009538A1 (en)*2000-05-122002-01-24Yasuyuki AraiMethod of manufacturing a light-emitting device
US20030162314A1 (en)*2002-02-252003-08-28Shunpei YamazakiFabrication system and a fabrication method of light emitting device
US20030194484A1 (en)*2002-04-152003-10-16Semiconductor Engergy Laboratory Co., Ltd.Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device
US20030221620A1 (en)*2002-06-032003-12-04Semiconductor Energy Laboratory Co., Ltd.Vapor deposition device
US20040031442A1 (en)*2002-05-172004-02-19Semiconductor Energy Laboratory Co., Ltd.Evaporation method, evaporation device and method of fabricating light emitting device
US20040035360A1 (en)*2002-05-172004-02-26Semiconductor Energy Laboratory Co., Ltd.Manufacturing apparatus
US20040040504A1 (en)*2002-08-012004-03-04Semiconductor Energy Laboratory Co., Ltd.Manufacturing apparatus
US20040139914A1 (en)*2002-08-302004-07-22Semiconductor Energy Laboratory Co., Ltd.Fabrication system, light-emitting device and fabricating method of organic compound-containing layer
US20040216673A1 (en)*2003-02-142004-11-04Semiconductor Energy Laboratory Co., Ltd.Manufacturing apparatus
US20050005848A1 (en)*2003-04-252005-01-13Shunpei YamazakiApparatus for forming a film and an electroluminescence device
US20050034671A1 (en)*2003-08-152005-02-17Semiconductor Energy Laboratory Co., Ltd.Deposition apparatus and manufacturing apparatus
US20050053720A1 (en)*2003-07-252005-03-10Shunpei YamazakiManufacturing method of a light emitting device
JP2005097730A (en)*2003-08-152005-04-14Semiconductor Energy Lab Co LtdFilm-forming apparatus and manufacturing apparatus
US20060011136A1 (en)*2004-07-152006-01-19Semiconductor Energy Laboratory Co., Ltd.Manufacturing apparatus
US20090170227A1 (en)*2003-04-102009-07-02Semiconductor Energy Laboratory Co., Ltd.Mask and container and manufacturing
US20100021624A1 (en)*1999-12-272010-01-28Semiconductor Energy Laboratory Co., LtdFilm Formation Apparatus and Method for Forming a Film
US20100159124A1 (en)*2000-05-022010-06-24Semiconductor Energy Laboratory Co., Ltd.Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device
US7943443B2 (en)2002-09-202011-05-17Semiconductor Energy Laboratory Co., Ltd.Manufacturing method of light-emitting device
US20120090544A1 (en)*2010-10-182012-04-19Kim Mu-GyeomThin film deposition apparatus for continuous deposition, and mask unit and crucible unit included in thin film deposition apparatus
EP2775009A3 (en)*2010-10-182014-11-12Samsung Display Co., Ltd.Crucible unit for a thin film deposition apparatus
US10081860B2 (en)*2015-06-302018-09-25Boe Technology Group Co., Ltd.Vacuum deposition apparatus and vapor deposition method

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US998579A (en)*1911-03-221911-07-18Nat Varnish CompanySpraying-machine.
US1256599A (en)*1916-07-031918-02-19Max Ulrich SchoopProcess and mechanism for the production of electric heaters.
US1439743A (en)*1916-04-291922-12-26Du PontProcess for finishing footwear
US1817311A (en)*1929-06-191931-08-04Firm La Soc Societe Nouvelle DMethod and means for the obtainment of decorative effects upon textile fabrics by brilliant metallic deposits
FR805066A (en)*1935-08-021936-11-10 Device for the production of deposits by sublimation in vacuum
US2074281A (en)*1933-07-131937-03-16Sommer Ludwig AugustMethod and apparatus for the production of metallic coatings on electrically nonconducting substances by the thermal vaporization of metals in vacuo
US2153363A (en)*1935-12-181939-04-04Gen ElectricLaminated metal body
US2239642A (en)*1936-05-271941-04-22Bernhard BerghausCoating of articles by means of cathode disintegration
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US998579A (en)*1911-03-221911-07-18Nat Varnish CompanySpraying-machine.
US1439743A (en)*1916-04-291922-12-26Du PontProcess for finishing footwear
US1256599A (en)*1916-07-031918-02-19Max Ulrich SchoopProcess and mechanism for the production of electric heaters.
US1817311A (en)*1929-06-191931-08-04Firm La Soc Societe Nouvelle DMethod and means for the obtainment of decorative effects upon textile fabrics by brilliant metallic deposits
US2074281A (en)*1933-07-131937-03-16Sommer Ludwig AugustMethod and apparatus for the production of metallic coatings on electrically nonconducting substances by the thermal vaporization of metals in vacuo
FR805066A (en)*1935-08-021936-11-10 Device for the production of deposits by sublimation in vacuum
US2153363A (en)*1935-12-181939-04-04Gen ElectricLaminated metal body
US2239642A (en)*1936-05-271941-04-22Bernhard BerghausCoating of articles by means of cathode disintegration
US2267296A (en)*1939-03-301941-12-23Oilgear CoBonding machine
US2317173A (en)*1940-02-011943-04-20Bleakley CorpApparatus for melting powdered materials

Cited By (65)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US2527747A (en)*1946-01-031950-10-31Margaret N LewisApparatus for coating articles by thermal evaporation
US3414503A (en)*1964-03-121968-12-03GlaverbelApparatus for coating the surface of plates uniformly by cathode sputtering
US3382843A (en)*1965-10-231968-05-14Optical Coating Laboratory IncVacuum coating apparatus utilizing rotating sources
US3984585A (en)*1974-05-301976-10-05Fuji Xerox Co., Ltd.Vacuum evaporation plating method
US4002880A (en)*1975-08-131977-01-11Gte Sylvania IncorporatedEvaporation source
US4187801A (en)*1977-12-121980-02-12Commonwealth Scientific CorporationMethod and apparatus for transporting workpieces
US4748935A (en)*1985-02-051988-06-07Balzers AktiengesellschaftVapor source for vacuum coating installation
EP0997552A4 (en)*1997-07-142001-05-02Matsushita Electric Industrial Co Ltd METHOD FOR MANUFACTURING THIN FUNCTIONAL FILM AND APPARATUS THEREOF
US6337105B1 (en)1997-07-142002-01-08Matsushita Electric Industrial Co., Ltd.Method and apparatus for forming thin functional film
US20170137930A1 (en)*1999-12-272017-05-18Semiconductor Energy Laboratory Co., Ltd.Film Formation Apparatus and Method for Forming a Film
US8968823B2 (en)*1999-12-272015-03-03Semiconductor Energy Laboratory Co., Ltd.Method of manufacturing a light emitting device
US20100021624A1 (en)*1999-12-272010-01-28Semiconductor Energy Laboratory Co., LtdFilm Formation Apparatus and Method for Forming a Film
US8119189B2 (en)*1999-12-272012-02-21Semiconductor Energy Laboratory Co., Ltd.Method of manufacturing a display device
US9559302B2 (en)1999-12-272017-01-31Semiconductor Energy Laboratory Co., Ltd.Method of manufacturing a display device
US20120201955A1 (en)*2000-05-022012-08-09Semiconductor Energy Laboratory Co., Ltd.Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device
US8815331B2 (en)*2000-05-022014-08-26Semiconductor Energy Laboratory Co., Ltd.Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device
US20100159124A1 (en)*2000-05-022010-06-24Semiconductor Energy Laboratory Co., Ltd.Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device
US20020009538A1 (en)*2000-05-122002-01-24Yasuyuki AraiMethod of manufacturing a light-emitting device
US7517551B2 (en)2000-05-122009-04-14Semiconductor Energy Laboratory Co., Ltd.Method of manufacturing a light-emitting device
US9551063B2 (en)2002-02-252017-01-24Semiconductor Energy Laboratory Co., Ltd.Fabrication system and a fabrication method of a light emitting device
US20030162314A1 (en)*2002-02-252003-08-28Shunpei YamazakiFabrication system and a fabrication method of light emitting device
US20090074952A1 (en)*2002-02-252009-03-19Semiconductor Energy Laboratory Co., Ltd.Fabrication System and a Fabrication Method of a Light Emitting Device
US9209427B2 (en)2002-04-152015-12-08Semiconductor Energy Laboratory Co., Ltd.Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device
US7309269B2 (en)2002-04-152007-12-18Semiconductor Energy Laboratory Co., Ltd.Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device
US20030194484A1 (en)*2002-04-152003-10-16Semiconductor Engergy Laboratory Co., Ltd.Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device
US20080282984A1 (en)*2002-04-152008-11-20Semiconductor Energy Laboratory Co., Ltd.Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device
US8206507B2 (en)2002-05-172012-06-26Semiconductor Energy Laboratory Co., Ltd.Evaporation method, evaporation device and method of fabricating light emitting device
US20140147588A1 (en)*2002-05-172014-05-29Semiconductor Energy Laboratory Co., Ltd.Evaporation method, evaporation device and method of fabricating light emitting device
US20090075411A1 (en)*2002-05-172009-03-19Semiconductor Energy Laboratory Co., Ltd.Manufacturing apparatus
US20040035360A1 (en)*2002-05-172004-02-26Semiconductor Energy Laboratory Co., Ltd.Manufacturing apparatus
US8110509B2 (en)2002-05-172012-02-07Semiconductor Energy Laboratory Co., Ltd.Method of fabricating light emitting devices
US20090269486A1 (en)*2002-05-172009-10-29Semiconductor Energy Laboratory Co., Ltd.Evaporation method, evaporation device and method of fabricating light emitting device
US20110132260A1 (en)*2002-05-172011-06-09Semiconductor Energy Laboratory Co., Ltd.Manufacturing apparatus
US20040031442A1 (en)*2002-05-172004-02-19Semiconductor Energy Laboratory Co., Ltd.Evaporation method, evaporation device and method of fabricating light emitting device
US20030221620A1 (en)*2002-06-032003-12-04Semiconductor Energy Laboratory Co., Ltd.Vapor deposition device
US7820231B2 (en)2002-08-012010-10-26Semiconductor Energy Laboratory Co., Ltd.Manufacturing apparatus
US20070148351A1 (en)*2002-08-012007-06-28Shunpei YamazakiManufacturing apparatus
US20040040504A1 (en)*2002-08-012004-03-04Semiconductor Energy Laboratory Co., Ltd.Manufacturing apparatus
US20040139914A1 (en)*2002-08-302004-07-22Semiconductor Energy Laboratory Co., Ltd.Fabrication system, light-emitting device and fabricating method of organic compound-containing layer
US7378133B2 (en)2002-08-302008-05-27Semiconductor Energy Laboratory Co., Ltd.Fabrication system, light-emitting device and fabricating method of organic compound-containing layer
US8377764B2 (en)2002-09-202013-02-19Semiconductor Energy Laboratory Co., Ltd.Manufacturing method for light emitting device
US20110217802A1 (en)*2002-09-202011-09-08Semiconductor Energy Laboratory Co., Ltd.Fabrication System and Manufacturing Method of Light Emitting Device
US7943443B2 (en)2002-09-202011-05-17Semiconductor Energy Laboratory Co., Ltd.Manufacturing method of light-emitting device
US8609476B2 (en)2002-09-202013-12-17Semiconductor Energy Laboratory Co., Ltd.Manufacturing method of light emitting device
US8168483B2 (en)2002-09-202012-05-01Semiconductor Energy Laboratory Co., Ltd.Manufacturing method for light emitting device
US20070186852A1 (en)*2003-02-142007-08-16Junichiro SakataManufacturing apparatus
US8747558B2 (en)2003-02-142014-06-10Semiconductor Energy Laboratory Co., Ltd.Manufacturing apparatus
US7211461B2 (en)2003-02-142007-05-01Semiconductor Energy Laboratory Co., Ltd.Manufacturing apparatus
US20040216673A1 (en)*2003-02-142004-11-04Semiconductor Energy Laboratory Co., Ltd.Manufacturing apparatus
US20090170227A1 (en)*2003-04-102009-07-02Semiconductor Energy Laboratory Co., Ltd.Mask and container and manufacturing
US20050005848A1 (en)*2003-04-252005-01-13Shunpei YamazakiApparatus for forming a film and an electroluminescence device
US8399362B2 (en)2003-04-252013-03-19Semiconductor Energy Laboratory Co., Ltd.Apparatus for forming a film and an electroluminescence device
US8778809B2 (en)2003-04-252014-07-15Semiconductor Energy Laboratory Co., Ltd.Apparatus for forming a film and an electroluminescence device
US8034182B2 (en)2003-04-252011-10-11Semiconductor Energy Laboratory Co., Ltd.Apparatus for forming a film and an electroluminescence device
US7211454B2 (en)2003-07-252007-05-01Semiconductor Energy Laboratory Co., Ltd.Manufacturing method of a light emitting device including moving the source of the vapor deposition parallel to the substrate
US20050053720A1 (en)*2003-07-252005-03-10Shunpei YamazakiManufacturing method of a light emitting device
JP2005097730A (en)*2003-08-152005-04-14Semiconductor Energy Lab Co LtdFilm-forming apparatus and manufacturing apparatus
US8524313B2 (en)2003-08-152013-09-03Semiconductor Energy Laboratory Co., Ltd.Method for manufacturing a device
US20050034671A1 (en)*2003-08-152005-02-17Semiconductor Energy Laboratory Co., Ltd.Deposition apparatus and manufacturing apparatus
US8123862B2 (en)2003-08-152012-02-28Semiconductor Energy Laboratory Co., Ltd.Deposition apparatus and manufacturing apparatus
US20100239746A1 (en)*2004-07-152010-09-23Semiconductor Energy Laboratory Co., Ltd.Manufacturing Apparatus
US20060011136A1 (en)*2004-07-152006-01-19Semiconductor Energy Laboratory Co., Ltd.Manufacturing apparatus
EP2775009A3 (en)*2010-10-182014-11-12Samsung Display Co., Ltd.Crucible unit for a thin film deposition apparatus
US20120090544A1 (en)*2010-10-182012-04-19Kim Mu-GyeomThin film deposition apparatus for continuous deposition, and mask unit and crucible unit included in thin film deposition apparatus
US10081860B2 (en)*2015-06-302018-09-25Boe Technology Group Co., Ltd.Vacuum deposition apparatus and vapor deposition method

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