CROSS REFERENCE TO RELATED APPLICATIONSThis application is a continuation of U.S. patent application Ser. No. 17/736,653, filed May 4, 2022 (now U.S. Pat. No. 12,224,480), which claims the benefit of the filing date of U.S. Provisional Patent Application No. 63/192,548, which was filed May 24, 2021, the contents of all of which are herein incorporated by reference in its entirety.
TECHNICAL FIELDThis application relates generally to microelectronic device packages and more particularly to microelectronic device packages including antennas and semiconductor devices.
BACKGROUNDProcesses for producing microelectronic device packages include mounting a semiconductor die to a package substrate and covering the electronic devices with a dielectric material such as a mold compound to form packaged devices. Incorporating antennas with semiconductor devices in a microelectronic device package is desirable. Antennas are increasingly used with microelectronic devices and portable devices, such as communications systems, communications devices, including 4G, 5G or LTE capable cellphones, tablets, and smartphones. Additional applications include microelectronic devices in automotive systems such as radar, navigation and over the air communications systems. Mold compounds used in molded microelectronic devices and some substrate materials used when packaging semiconductor devices have high dielectric constants of about 3 or higher, which can interfere with the efficiency of embedded antennas. Systems using antennas with packaged semiconductor devices therefore often place the antennas on a separate printed circuit board, an organic substrate, spaced from the semiconductor devices. Existing approaches require additional elements, including expensive printed circuit board (PCB) substrates, which are sometimes used inside a module with semiconductor dies, or sometimes used with packaged semiconductor devices provided spaced apart from the antennas. These solutions are relatively high cost and require substantial device area. It is a challenge to form microelectronic device packages having efficient and cost-effective antennas within the packages.
SUMMARYIn an arrangement, a semiconductor package comprises a patch antenna formed in a first conductor layer of a multilayer package substrate. The multilayer package substrate comprises conductor layers spaced from one another by dielectric material and coupled to one another by conductive vertical connection layers. The multilayer package substrate has a board side surface opposite a device side surface. The semiconductor package further comprises a semiconductor die mounted to the device side surface of the multilayer package substrate spaced from and coupled to the patch antenna, and an antenna horn mounted to the device side surface and aligned with the patch antenna. The semiconductor package further comprises a reflector formed on a second conductor layer in the multilayer package substrate. The second conductor layer is positioned closer to the board side surface of the multilayer package substrate compared to the patch antenna. The reflector is aligned with and spaced from the patch antenna.
In one arrangement, the first conductor layer may form a portion of the device side surface of the multilayer package substrate. In another arrangement, the first conductor layer is below and spaced apart from the device side surface of the multilayer package substrate.
The semiconductor package further comprises a ground layer formed on a second conductor layer in the multilayer package substrate. The second conductor layer forms a portion of the device side surface of the multilayer package substrate. In one arrangement, the ground layer surrounds the patch antenna on the device side surface.
The antenna horn may be coupled to the device side surface using solder. In another arrangement, a mounting structure is formed on the device side surface of the multilayer package substrate. The mounting structure is configured to define a desired position of the antenna horn and to attach the antenna horn to the multilayer package substrate. The mounting structure may comprise a first elevated trace formed on the device side surface of the multilayer package substrate. The mounting structure may further comprise a second elevated trace formed on the device side surface of the multilayer package substrate, wherein the first elevated trace surrounds the second elevated trace. The first and second elevated traces may comprise a solid line of material built-up on the device side surface. The first and second elevated traces may comprise a segmented line of material built-up on the device side surface. The antenna horn may be coupled to the mounting structure using solder.
The semiconductor die and the device side surface of the multilayer package substrate may be covered with a mold compound. An outside surface of the antenna horn is also surrounded by the mold compound. In some arrangements, an interior of the antenna horn is filled with the mold compound. In other arrangements, an interior of the antenna horn is air filled and exposed from the mold compound.
In an example microelectronic device package, a multilayer package substrate comprises conductor layers spaced from one another by dielectric material. The multilayer package substrate comprises vertical connections extending through the dielectric material between the conductor layers and coupling portions of the conductor layers one to another. The multilayer package substrate has a device side surface and an opposite board side surface. An antenna is formed in a first conductor layer at or below the device side surface of the multilayer package substrate. A reflector is formed in a second conductor layer of the multilayer package substrate. The reflector is aligned with and spaced away from the antenna by the dielectric material toward the board side surface. A ground plane is formed at the device side surface of the multilayer package substrate. An antenna horn mounting structure is formed on the ground plane and extending above the device side surface. An antenna horn is positioned on the mounting structure and aligned with the antenna. A semiconductor die is mounted to the device side surface of the multilayer package substrate and coupled to the antenna. The antenna may further comprise a planar antenna that is a rectangular, circular, triangular, oval, or E-patch shape. The antenna horn mounting structure may comprise two concentric rings spaced apart to form a slot, and wherein the slot is adapted to receive walls of the antenna horn. The semiconductor die and the device side surface of the multilayer package substrate are covered with mold compound. An outside surface of the antenna horn is surrounded by the mold compound. An interior of the antenna horn is filled with the mold compound in some arrangements. In other arrangements, an interior of the antenna horn is exposed from the mold compound and is air filled.
BRIEF DESCRIPTION OF THE DRAWINGSHaving thus described the invention in general terms, reference will now be made to the accompanying drawings, wherein:
FIGS.1A-1C illustrate, in an isometric view, a plan view, and a cross-sectional view, respectively, an example arrangement;FIG.1D illustrates in a cross-sectional view an alternative arrangement.
FIG.2 illustrates, in a plan view, an E-patch antenna that can be used with examples described herein.
FIG.3 illustrates, in a cross-sectional view, a multilayer package substrate for use with one example.
FIGS.4A-4B illustrate, in a series of cross-sectional views, the major steps in manufacturing a multilayer package substrate that can be used in one example.
FIGS.5A and5B illustrate top and bottom isometric views, respectively, of an antenna horn according to one example.
FIGS.6A-6C illustrate, in an isometric view, a plan view, and a cross-sectional view, respectively, an example arrangement in which an insertion aid structure is incorporated on to a multilayer package substrate for attachment of the antenna horn;FIG.6D illustrates, in an isometric view, an antenna horn installed on the multilayer package substrate using the insertion aid structure;FIG.6E illustrates a plan view of a further arrangement of an insertion aid structure.
FIGS.7A-D illustrate, in a series of cross-sectional views, selected steps for a semiconductor package molding process.
DETAILED DESCRIPTIONThe present disclosure is described with reference to the attached figures. The figures are not drawn to scale, and they are provided merely to illustrate the disclosure. Several aspects of the disclosure are described below with reference to example applications for illustration. It should be understood that numerous specific details, relationships, and methods are set forth to provide an understanding of the disclosure. The present disclosure is not limited by the illustrated ordering of acts or events, as some acts may occur in different orders and/or concurrently with other acts or events. Furthermore, not all illustrated acts or events are required to implement a methodology in accordance with the present disclosure.
Corresponding numerals and symbols in the different figures generally refer to corresponding parts, unless otherwise indicated. The figures are not necessarily drawn to scale. In the drawings, like reference numerals refer to like elements throughout, and the various features are not necessarily drawn to scale. In the following discussion and in the claims, the terms “including,” “includes,” “having,” “has,” “with,” or variants thereof are intended to be inclusive in a manner similar to the term “comprising,” and thus should be interpreted to mean “including, but not limited to . . . ” Also, the terms “coupled,” “couple,” and/or or “couples” is/are intended to include indirect or direct electrical or mechanical connection or combinations thereof. For example, if a first device couples to or is electrically coupled with a second device that connection may be through a direct electrical connection, or through an indirect electrical connection via one or more intervening devices and/or connections. Elements that are electrically connected with intervening wires or other conductors are considered to be coupled. Terms such as “top,” “bottom,” “front,” “back,” “over,” “above,” “under,” “below,” and such, may be used in this disclosure. These terms should not be construed as limiting the position or orientation of a structure or element but should be used to provide spatial relationship between structures or elements.
The term “semiconductor die” is used herein. A semiconductor device can be a discrete semiconductor device such as a bipolar transistor, a few discrete devices such as a pair of power FET switches fabricated together on a single semiconductor die, or a semiconductor die can be an integrated circuit with multiple semiconductor devices such as the multiple capacitors in an A/D converter. The semiconductor device can include passive devices such as resistors, inductors, filters, sensors, or active devices such as transistors. The semiconductor device can be an integrated circuit with hundreds or thousands of transistors coupled to form a functional circuit, for example a microprocessor or memory device. The semiconductor device may also be referred to herein as a semiconductor device or an integrated circuit (IC) die.
The term “semiconductor package” is used herein. A semiconductor package has at least one semiconductor die electrically coupled to terminals and has a package body that protects and covers the semiconductor die. In some arrangements, multiple semiconductor dies can be packaged together. For example, a power metal oxide semiconductor (MOS) field effect transistor (FET) semiconductor device and a second semiconductor device (such as a gate driver die, or a controller die) can be packaged together to from a single packaged electronic device. Additional components such as passive components, such as capacitors, resistors, and inductors or coils, can be included in the packaged electronic device. The semiconductor die is mounted with a package substrate that provides conductive leads. A portion of the conductive leads form the terminals for the packaged device. In wire bonded integrated circuit packages, bond wires couple conductive leads of a package substrate to bond pads on the semiconductor die. The semiconductor die can be mounted to the package substrate with a device side surface facing away from the substrate and a backside surface facing and mounted to a die pad of the package substrate. The semiconductor package can have a package body formed by a thermoset epoxy resin mold compound in a molding process, or by the use of epoxy, plastics, or resins that are liquid at room temperature and are subsequently cured. The package body may provide a hermetic package for the packaged device. The package body may be formed in a mold using an encapsulation process, however, a portion of the leads of the package substrate are not covered during encapsulation, these exposed lead portions form the terminals for the semiconductor package. The semiconductor package may also be referred to as a “integrated circuit package,” a “microelectronic device package,” or a “semiconductor device package.”
The term “package substrate” is used herein. A package substrate is a substrate arranged to receive a semiconductor die and to support the semiconductor die in a completed semiconductor device package. Package substrates useful with the arrangements include conductive lead frames, which can be formed from copper, aluminum, stainless steel, steel, and alloys such as Alloy 42 and copper alloys. The lead frames can include a die pad with a die side surface for mounting a semiconductor die, and conductive leads arranged near and spaced from the die pad for coupling to bond pads on the semiconductor die using wire bonds, ribbon bonds, or other conductors. In example arrangements, a heat slug is attached to the package substrate, and the heat slug has a die mounting area for mounting semiconductor devices. The lead frames can be provided in strips or arrays. The conductive lead frames can be provided as a panel with strips or arrays of unit device portions in rows and columns. Semiconductor dies can be placed on respective unit device portions within the strips or arrays. A semiconductor die can be placed on a die mount area for each packaged semiconductor die. Die attach or die adhesive can be used to mount the semiconductor dies. In wire bonded packages, bond wires can couple bond pads on the semiconductor dies to the leads of the lead frames. The lead frames may have plated portions in areas designated for wire bonding, for example silver, nickel, gold, or palladium plating can be used. After the bond wires are in place, a portion of the package substrate, the semiconductor die, and at least a portion of the die pad can be covered with a protective material such as a mold compound. More than one semiconductor die can be mounted to a package substrate for each unit.
The term “multilevel package substrate” is used herein. A multilevel package substrate is a substrate that has multiple conductor levels including conductive traces, and which has vertical conductive connections extending through the dielectric material between the conductor levels. In an example arrangement, a multilayer package substrate is formed by plating a patterned conductor level and then covering the conductor with a layer of dielectric material. Grinding can be performed on the dielectric material to expose portions of the layer of conductors. Additional plating layers can be formed to add additional levels of conductors, some of which are coupled to the prior layers by vertical connectors, and additional dielectric material can be deposited at each level and can cover the conductors. By using an additive or build up manufacturing approach, and by performing multiple plating steps, molding steps, and grinding steps, a multilayer package substrate is formed with an arbitrary number of layers. In an example arrangement, copper conductors are formed by plating, and a thermoplastic material can be used as the dielectric material.
In packaging microelectronic and semiconductor devices, a mold compound may be used to partially cover a package substrate, to cover components, to cover a semiconductor die, and to cover the electrical connections from the semiconductor die to the package substrate. This molding process can be referred to as an “encapsulation” process, although some portions of the package substrates are not covered in the mold compound during encapsulation, for example terminals and leads are exposed from the mold compound. Encapsulation is often a compressive molding process, where thermoset mold compound such as resin epoxy can be used. A room temperature solid or powder mold compound can be heated to a liquid state and then molding can be performed by pressing the liquid mold compound into a mold through runners or channels. Transfer molding can be used. Unit molds shaped to surround an individual device may be used, or block molding may be used, to form multiple packages simultaneously for several devices from mold compound. The devices to be molded can be provided in an array or matrix of several, hundreds or even thousands of devices in rows and columns that are then molded together.
After the molding, the individual packaged devices are cut from each other in a sawing operation by cutting through the mold compound and package substrate in saw streets formed between the devices. Portions of the package substrate leads are exposed from the mold compound package to form terminals for the packaged semiconductor device.
The term “quad flat no-lead” (QFN) is used herein for a type of electronic device package. A QFN package has conductive leads that are coextensive with the sides of a molded package body, and in a quad package the leads are on four sides. Alternative flat no-lead packages may have leads on two sides or only on one side. These can be referred to as small outline no-lead or SON packages. No-lead packaged electronic devices can be surface mounted to a board. Leaded packages can be used with the arrangements where the leads extend away from the package body and are shaped to form a portion for soldering to a board. A dual in line package (DIP) can be used with the arrangements. A small outline package (SOP) can be used with the arrangements. Small outline no-lead (SON) packages can be used, and a small outline transistor (SOT) package is a leaded package that can be used with the arrangements. Leads for leaded packages are arranged for solder mounting to a board. The leads can be shaped to extend towards the board and form a mounting surface. Gull wing leads, J-leads, and other lead shapes can be used. In a DIP package, the leads end in pin shaped portions that can be inserted into conductive holes formed in a circuit board, and solder is used to couple the leads to the conductors within the holes.
The term “patch antenna” is used herein. A patch antenna is a planar conductor in a rectangular, square, circular, oval, triangular, or other geometrically shaped sheet or “patch” of material mounted over and spaced from a ground plane. In the arrangements, a patch antenna is formed of a first conductor layer in a multilayer substrate, and a ground reflector is formed of a lower layer of conductor in the multilayer substrate to reflect signals from the patch antenna back to the patch antenna. The patch antenna and the ground reflector are spaced by dielectric material of the package substrate. The term “E-patch antenna” is used herein. An E-patch antenna is a patch antenna with a central portion that is a rectangular or square shape, a first end portion that is a rectangular shape spaced from the central portion by a first slot, and a second end portion that is a rectangular shape spaced from the central portion by a second slot. The E-patch antenna pattern resembles a capital letter “E” when viewed from a top view.
The term “antenna horn” is used herein. An antenna horn is a flared metal waveguide shaped to direct radio waves. The antenna horn is typically positioned in alignment with a device that radiates radio waves, such as a patch antenna.
In the arrangements, a microelectronic device package includes a semiconductor die and an antenna horn mounted side-by-side on a multilayer package substrate. The multilayer package substrate has a device side surface, a semiconductor die mounted on a portion of the device side surface, and a patch antenna formed spaced from the die portion. An antenna horn is mounted to the device side surface above the patch antenna. In an example arrangement, the semiconductor die will be mounted beside, or side by side, with respect to a patch antenna formed on the device side surface. In the multilayer package substrate, the patch antenna can be formed in a conductive layer at or near the device side surface of the multilayer package substrate, for example as a patterned plated conductor layer of the multilayer package substrate. Another layer of the multilayer package substrate can have a reflector patterned in a conductor beneath the antenna pattern, to increase efficient transmission by the patch antenna by reflecting radiated energy back towards the patch antenna and away from the device side surface of the multilayer package substrate. Another layer of the multilayer package substrate can have a ground plane patterned in a conductor above or at the same level as the patch antenna pattern. An antenna horn is mounted on and electrically attached to the ground plane. A semiconductor die mounted to the device side surface of the multilayer package substrate can be coupled to the patch antenna by conductive traces formed in conductor layers of the multilayer package substrate. In one example, the semiconductor die is flip chip mounted to the multilayer package substrate. In an alternative example, a semiconductor die mounted facing away from the device side surface of the multilayer package substrate and is wire bonded to conductive traces on the multilayer package substrate.
Examples of a microelectronic device package having a semiconductor die mounted side-by-side on a multilayer package substrate and a patch antenna formed spaced from the die portion are disclosed in pending U.S. patent application Ser. No. 17/566,067, filed Dec. 30, 2021, the disclosure of which is hereby incorporated herein in its entirety.
In an example arrangement, a patch antenna with an antenna horn is configured to operate in the rectangular waveguide 5 (WR5) frequency range, between 140 GHz and 220 GHz. In other examples, the patch antenna can be configured to operate in the millimeter wave range between 30 GHz and 300 GHz, with signals having wavelengths in air between 10 millimeters (mm) and 1 mm. Other frequency signals, such as RF signals, can be transmitted or received by the antenna. In one example arrangement, the patch antenna is an E-patch antenna. In the arrangements, a planar layer of conductor in the multilayer package substrate is patterned to form a patch antenna and the corresponding feed line, and a planar reflector, spaced from the patch antenna by dielectric material, is formed to reflect radiated energy from the patch antenna back to the patch antenna, to increase the transmitted energy.
In one example, the antenna horn is formed by a metal stamping process. The antenna horn may be attached to the device side of the multilayer package substrate using solder. Alternatively, a mounting structure or insertion aid structure may be formed on a ground plane one the device side of the multilayer package substrate. The mounting structure may be adapted to receive the antenna horn to ensure positioning and alignment of the antenna horn. The interior of the antenna horn may be filled with the mold compound in some arrangements. In other arrangements, the antenna horn is air filled and the mold compound does not flow into the antenna horn.
The semiconductor die used in the arrangements can be a monolithic millimeter wave integrated circuit (MMIC). The MMIC can be a transmitter, receiver, transceiver, or a component in a system for transmitting or receiving signals such as an amplifier, encoder, filter, or decoder. The semiconductor die can be provided as multiple semiconductor dies or as components mounted to the multilayer package substrate, to form a system. Additional passive components can be mounted to the multilayer package substrate.
FIGS.1A-1F illustrate example configurations of amicroelectronic device package100.FIG.1A illustrates themicroelectronic device package100 in an isometric view.FIG.1B illustrates themicroelectronic device package100 in a plan or top view.FIG.1C illustrates themicroelectronic device package100 in a cross-sectional view. The illustrated arrangement uses a quad flat no lead (QFN) package. QFN packages are one type of package that is useful with the arrangements. Other package types, including leaded and other no lead packages, can be used. Themicroelectronic device package100 includes amultilayer package substrate101.
A number ofterminals102 are formed of a conductor material on a board side surface103 (i.e., the bottom surface as the arrangement is oriented inFIG.1A) of themultilayer package substrate101. The dielectric material of themultilayer package substrate101 can be a thermoplastic or a thermoset material. An example thermoplastic material is ABS (Acrylonitrile Butadiene Styrene). Alternative dielectric materials include thermoplastics such as ASA (Acrylonitrile Styrene Acrylate), thermoset mold compound including epoxy resin, epoxies, resins, or plastics.
Vertical connectors104 (shown inFIG.1C) extend fromterminals102 through layers of dielectric material of themultilayer package substrate101 to adevice side surface105 of themultilayer package substrate101. A number ofleads106 are formed of a conductive material on thedevice side surface105 of themultilayer package substrate101. A semiconductor die107 is mounted to themultilayer package substrate101. The semiconductor die107 in the illustrated example is flip chip mounted, so that anactive surface108 of the semiconductor die107 is oriented facing thedevice side surface105 of themultilayer package substrate101. Conductive post connects109 extend from the semiconductor die107 toleads106 and make electrical connections between semiconductor die107 andmultilayer package substrate101. An underfill material, such as a resin or epoxy, or a glob top mold compound applied as a gel or liquid, can be flowed beneath the semiconductor die107, after mounting the semiconductor die107, to protect the post connects109 and solder connections to leads106.
In the examples, asemiconductor device107 is mounted to adevice side surface105 of amultilayer package substrate101. In forming themicroelectronic device package100, thesemiconductor devices107 can be formed independently of the multilayer package substrate, so that methods for forming thesemiconductor device107, and themultilayer package substrate101, can be performed at different times, and at different locations, then the components can be assembled together to complete themicroelectronic device package100.
As illustrated inFIG.1C, apatch antenna110 is a planar or microstrip antenna formed of a conductor layer within themultilayer package substrate101. Thepatch antenna110 is coupled to atransmission line111, which is coupled to the semiconductor die107 by avertical connector112 withinmultilayer package substrate101 and aconductive post113.Transmission line111 may function as a coplanar waveguide feed in one example. Although a patch antenna is described herein as the source of radiation for an antenna horn, in other arrangements other radiating structures may be used.
A first ground layer orreflector114 is formed in a lower conductor layer of themultilayer package substrate101. Thereflector114 is positioned beneath and aligned with theantenna110. The conductor layer forreflector114 is formed closer to or at theboard side surface103 of themultilayer package substrate101. Thereflector114 is aligned with and spaced from theantenna110 by dielectric material in themultilayer package substrate101.Vias115 extend from a feed portion of thepatch antenna110 to thereflector114, which can be at ground.
Asecond ground layer116 is formed on thedevice side surface105 ofmultilayer package substrate101.Second ground layer116 is formed generally above and around theantenna110 with ahole117 positioned directly above theantenna110.Hole117 is configured to allow radio frequency (RF) energy to pass from theantenna110 and then into and through ahorn118.Horn118 may be made of a metal, such as copper, and is attached to thedevice side surface105 such as by soldering thehorn118 to thesecond ground layer116.
As illustrated inFIGS.1A and1C, a mold compound or otherprotective material119 is shown overlying thedevice side surface105, thesecond ground layer116, and thesemiconductor device107.Mold compound119 surrounds and fillshorn118. In the arrangement illustrated inFIGS.1A-1C,patch antenna110 is covered by themold compound119, and signals radiated from or received by theantenna110 traverse themold compound119. In an alternative arrangement, themold compound119 only surrounds thehorn118 and aninterior region120 ofhorn119 is left open and not filled with themold compound119.Mold compound119 can be a thermoset mold compound of epoxy resin, another epoxy, a resin, or a plastic.
Terminals102 on theboard side surface103 are configured for mounting to a system board, for example a printed circuit board.Leads106 are formed on thedevice side surface105 of themultilayer package substrate101 can be formed of the same material aspatch antenna110, for example, copper, gold, aluminum, silver, or an alloy of these. Protective plating layers such as palladium, nickel, gold, or multiple layers of these can be formed on thedevice side surface105 of themultilayer package substrate101.
The semiconductor die107 is shown mounted on thedevice side surface105 of themultilayer package substrate101 in a side-by-side orientation with respect to theantenna110. Although not shown in the illustration for simplicity of explanation, additional components such as passives or additional semiconductor devices can be mounted to thedevice side surface105 of themultilayer package substrate101.Leads106 are formed on the device side surface of themultilayer package substrate101 and couple the semiconductor die107 tovertical connectors104, which are conductors formed of the intervening conductive layers of themultilayer package substrate101 that extend through dielectric material to theterminals102.
FIG.1D is a cross-sectional view illustrating an alternative configuration of amicroelectronic device package130. Inmicroelectronic device package130 thepatch antenna120 is formed in a conductor layer on thedevice side surface105 ofmultilayer package substrate101 instead of in an intermediate conductor layer as shown inFIG.1C.Patch antenna121 is coupled totransmission line111 via conductive via122 through the dielectric material ofmultilayer package substrate101. In an alternative arrangement of the configuration shown inFIG.1D, themold compound119 is not provided withininterior region120 ofhorn119, so that a surface of theE-patch antenna121 is exposed to air. In this arrangement, signals radiated from theE-patch antenna121 do not traverse themold compound119 or the dielectric layers ofmultilayer package substrate101 and are instead transmitted directly to the air.
The arrangements shown inFIGS.1A-D can be formed using additive manufacturing, or build up processing, to form the multilayer package substrate including the patch antenna, the reflector, and ground layer. As is further described herein, by using a series of plating, molding, and grinding steps, successive layers of trace level conductors, vertical connections, and dielectric can be formed, and these steps can be repeated to form a multilayer package substrate. The E-patch antenna can be formed by forming a pattern on a rectangular portion of the desired conductor layer, which may be a first or top conductor layer or an intermediate layer. Because the vertical connections are formed using an additive process, and then dielectric material is molded over the vertical connections, the need for drilling precise via holes, and the need to plate or fill the via holes with conductors, is eliminated, so the multilayer package substrate is cost effective when compared to organic substrates such as printed circuit boards. By mounting the semiconductor die on the multilayer package substrate in a position spaced from and coupled to the patch antenna using existing flip chip or wire bonding connections, a reliable and cost-effective microelectronic device package including an antenna is provided by use of the arrangements. While an E-patch antenna is shown as the illustrated example, other patch antenna shapes can be used to from alternative arrangements.
FIG.1C illustrates a spacing distance labeled Drefl between thepatch antenna110 and thereflector114. In the arrangements, thepatch antenna110 is configured to radiate signals upwards away from thedevice side surface105 of themultilayer package substrate101. When energy is applied to thepatch antenna110, the energy radiates in all directions, including through themultilayer substrate101 towards thereflector114. Because as the signal energy travels, the phase shifts, and because thereflector114 will cause a λ/2 phase shift, where λ is the wavelength of the signal in the dielectric material, the distance Drefl can be adjusted to be approximately λ/4, so that the energy transmitted to the reflector, reflected by the reflector, and returned to theantenna110 traverses a phase shift of λ/4+λ/2+λ/4, or λ. The reflected energy fromreflector114 arrives at thepatch antenna110 in phase with the energy being transmitted upwards from thepatch antenna110, adding to the gain of the signal using of constructive interference. By using different layers of themultilayer package substrate101 to form thereflector114, the distance Drefl can be altered so as to increase the efficiency of thepatch antenna110 andreflector114. This same alteration can be used to optimize the distance betweenground116 andantenna110 and/or the betweenground116 andreflector114 to achieve a desired phase shift. The thickness of themultilayer package substrate101 can be varied to vary the distance Drefl. Note that the wavelength λ in the multilayer package substrate differs from the wavelength in air, because it depends on the dielectric constant of the material the signal is traversing. Simulation of the signal propagation in the selected dielectric material can be used to determine the proper spacing distance Drefl to get the phase shift of λ/4.
FIG.2 illustrates, in plan view, an exampleE-patch antenna200 for use in some arrangements.E-patch antenna200 may be formed in a conductor layer, for example, a copper, aluminum, or gold layer can be used. The conductor layer can be formed as a layer on or in a multilayer package substrate as illustrated herein.E-patch antenna200 has tworectangular end portions201,202 that are spaced from acentral portion203 by twoslots204,205. TheE-patch antenna200 is a patterned conductor material that is coupled to afeed input206, such as transmission line111 (FIGS.1A-D).Feed input206 may be formed in the same conductor layer asantenna200.E-patch antenna arrangement200 may be configured for radiating signals in the 30 GHz and 300 GHz frequency range (millimeter wave range) or in other radio frequency ranges. In an alternative arrangement, additional patch antenna shapes can be used. For example, rectangular, circular, triangular, oval, and other shapes can be used as the patch antenna in microelectronic device packages100 or130. Thepatch antenna200 can be formed on a first conductor layer on the device side of a multilayer package substrate. Alternatively, thepatch antenna200 may be formed in a conductor layer buried within the multilayer package substrate.Patch antenna110 can be formed of conductive material such as copper, gold, or alloys. Other conductive materials that are compatible with plating processes can also be used, including silver and aluminum.
In an example arrangement,patch antenna200 may have twoparasitic antennas207,208 that are alongside the ends of the E-patch pattern. Theseparasitic antennas207,208 are optional and can be larger, smaller, and spaced at varying distances from the E-patch antenna to tune the antenna response as desired. Simulations can be performed to determine the size and placement of theparasitic antennas207,208 for a particular application.
The dimensions ofE-patch antenna200 can be varied with application and can be determined in a simulation of the antenna design. Useful sizes for an example of a multilayer package substrate could be from 2 to 7 millimeters by 2 to 7 millimeters, for example. The size of the multilayer package substrate can be varied depending on the size and number of semiconductor devices mounted, as well as the patch antenna dimensions, so that the area of the device side surface is sufficient for mounting the semiconductor devices and the antenna spaced from the semiconductor devices. As frequencies increase, the wavelengths become compatible with microelectronics package sizes, for example millimeter wave signals between 30 and 300 GHz have wavelengths of between 10 and 1 millimeters. The patch antennas of the arrangements take advantage of these sizes. As the transmit and receive frequencies increase and wavelengths correspondingly decrease, the size of the patch antenna may decrease, and the useful sizes of the multilayer package substrate may also decrease. The arrangements are useful in implementing antennas with millimeter wave frequencies and 5G standard frequencies, for example.
Areflector209 is formed in a conductor layer of the multilayer package substrate that is set below the conductor layer used to form thepatch antenna200. Additionally, a ground layer (not shown inFIG.2) is formed on the device side of the multilayer package substrate. The ground layer is configured to provide a base on which a horn can be attached, such ashorn118 mounted onground layer116 inFIGS.1A-D. Thereflector209, ground layer, andantenna200 may be formed of the same material or different conductor materials. For example,reflector209 and ground layer can be formed of copper or gold.
FIG.3 illustrates in a cross sectional view amultilayer package substrate300 that can be used with the example arrangements disclosed herein. Themultilayer package substrate300 has adevice side surface301 and aboard side surface302. Three trace layers303,304,305 are formed spaced from one another bydielectric material306. The trace layers303,304,305 are patterned for making horizontal connections. Three vertical conductor layers307,308,309 form electrical connections between the threetrace layers303,304,305. Vertical conductor layers307,308,309 extend through thedielectric material306 that is disposed over and between the trace layers303,304,305. Thedielectric material306 can be a thermoplastic material, such as ABS or ASA, or can be a thermoset material, such as epoxy resin mold compound. While the illustrated example shows three trace layers and three vertical conductor layers, in other examples and arrangements any number of trace layers and vertical conductor layers may be used by forming additional layers as described herein.
In one example,multilayer package substrate300 has a substrate thickness labeled “TS” of 200 microns. Thefirst trace layer303 is near thedevice side surface301 of themultilayer package substrate300 and has a trace layer thickness TL1 of 15 microns. The firstvertical conductor layer307 has a thickness VC1 of 50 microns. Thesecond trace layer304 is sometimes coupled to thefirst trace layer303 by the firstvertical connection layer306 and has a thickness labeled TL2 of 15 microns. The secondvertical connection layer308 has a thickness labeled VC2 of 85 microns. Thethird trace layer305 has a thickness labeled TL3 of 15 microns. The thirdvertical connection layer309 has a thickness labeled VC3 of 20 microns. A continuous vertical connection between thedevice side surface301 and theboard side surface302 can be formed by patterning a stack of trace layers and the corresponding vertical connection layers to form a continuous conductive path extending through thedielectric material306. Additional layers, such as conductive lands on thedevice side surface301 or terminals on theboard side surface302, may be formed by plating (not shown inFIG.3).
In an example ofmultilayer package substrate300, an antenna can be formed by patterning thesecond trace layer304, while a reflector can be formed by patterning thethird trace layer305 and a ground plane formed by patterning thefirst trace layer303. In another example, an antenna can be formed onsurface301 ofmultilayer package substrate300 by patterning thefirst trace layer303, while a reflector is formed by patterning thethird trace layer305 and a ground plane formed by patterning an area on thefirst trace layer303 that surrounds the antenna.
An antenna horn, such as horn118 (FIG.1A), may be attached to thedevice side surface301 such as by soldering the antenna horn to a patterned area onfirst trace layer303. In an alternative example, anelevated trace310 may be patterned on thedevice side surface301. For example,elevated trace310 may be patterned to function as an insertion aid for an antenna horn to ensure a secure physical and electrical attachment between the antenna horn and themultilayer package substrate300.Elevated trace310 may be a conductive material, such as copper, that is electrically coupled tofirst trace layer303. Theelevated trace310 and the first trace layer may be the same or different materials. In one example, the elevated trace has a thickness ET of 60 microns.
A semiconductor device mounting area positioned spaced from the antenna, as described above, can be formed by patterning thefirst trace layer303. Note that in this description, the vertical connection layers307,308, and309 are not described as “vias” to distinguish the vertical connections of the arrangements from the vertical connections of PCBs or other circuit board substrates, which are filled via holes. The vertical connections of the arrangements are formed using additive manufacturing, while vias in PCBs are usually formed by removing material, for example via holes are drilled into the substrate. These via holes between conductor layers then must be plated and then filled with a conductor, which requires additional plating steps after the drilling steps. These additional steps are precise manufacturing processes that add costs and require additional manufacturing tools and capabilities. In contrast the vertical connection layers used in the multilayer package substrates of the arrangements herein are formed in the same plating processes as forming the trace layers, simplifying manufacture, and reducing costs. In addition, the vertical connection layers in the arrangements can be arbitrary shapes, such as rails, columns, or posts, and the rails can be formed in continuous patterns to form electric shields, tubs, or tanks, and can be coupled to grounds or other potentials, isolating regions of the multilayer package substrate from one another. Noise reduction and the ability to create electrically isolated portions of the multilayer package substrate can be enhanced by use of the vertical connections to form tanks, shields, and tubs. Thermal performance of the microelectronic device packages of example arrangements can be improved by use of the vertical connection layers to form thermally conductive columns, sinks or rails that can be coupled to thermal paths on a system board to increase thermal dissipation from the semiconductor devices mounted on the multilayer package substrate.
FIGS.4A-4B illustrate, in a series of cross-sectional views, selected steps for a method for forming a multilayer package substrate that is useful for example semiconductor packages. InFIG.4A, atstep401, ametal carrier471 is readied for a plating process. Themetal carrier471 may be stainless steel, steel, aluminum, or another metal that will support the multilayer package substrate layers during plating and molding steps. After use in the illustrated process and a multilayer package substrate is then removed, themetal carrier471 may be cleaned for use in additional manufacturing processes.
Atstep403, afirst trace layer451 is formed by plating. In an example process, a seed layer is deposited over the surface of themetal carrier471 by sputtering, chemical vapor deposition (CVD), or other deposition step. A photoresist layer is deposited over the seed layer, exposed, developed, and cured to form a pattern to be plated. Electroless or electroplating may be performed using the exposed portions of the seed layer to start the plating. The pattern is formed according to patterns in the photoresist layer.
Atstep405, the plating process continues. A second photoresist layer is deposited, exposed, and developed to pattern a firstvertical connection layer452. By leaving the first photoresist layer in place, the second photoresist layer can be used without an intervening strip and clean step, which simplifies processing. Thefirst trace layer451 can be used as a seed layer for the second plating operation to further simplify processing.
Atstep407, a first molding operation is performed. Thefirst trace layer451 and the firstvertical connection layer452 are covered in a dielectric material. In one example, a thermoplastic material is used. In particular examples ABS or ASA can be used. Alternatively, a thermoset epoxy resin mold compound, or resins, epoxies, or plastics can be used. In an example compressive molding operation, a mold compound can be heated to a liquid state, forced under pressure through runners into a mold to cover thefirst trace layer451 and the firstvertical connection layer452, and subsequently cured to form solidmold compound layer461.
Atstep409, a grinding operation performed on thesurface462 of themold compound461 exposes a surface of thevertical connection layer452 and providesconductive surfaces463 for mounting devices or for use in additional plating operations. If the multilayer package substrate is complete, the method ends atstep410, where a de-carrier operation removes themetal carrier471 from thedielectric material461, leaving thefirst trace layer451 and the firstvertical connection layer452 in adielectric material461, thereby providing a package substrate.
In examples where additional trace layers and additional vertical connection layers are needed, the method continues after leavingstep409 and transitioning to step411 inFIG.4B.
Atstep411, asecond trace layer453 is formed by plating using the same processes as described above with respect to step405. A seed layer for the plating operation is deposited and a photoresist layer is deposited and patterned. The plating operation forms thesecond trace layer453 over themold compound461, with portions of thesecond trace layer453 electrically connected to the firstvertical connection layer452.
Atstep413, a secondvertical connection layer454 is formed using an additional plating step on thesecond trace layer453. The secondvertical connection layer454 can be plated using thesecond trace layer453 as a seed layer, and without the need for removing the preceding photoresist layer, thereby simplifying the process.
Atstep415, a second molding operation is performed to cover thesecond trace layer453 and the secondvertical connection layer454 in a layer ofdielectric material464. The multilayer package substrate at this stage has afirst trace layer451, a firstvertical connection layer452, asecond trace layer453, and a secondvertical connection layer454. Portions of the layers are electrically connected together to form vertical paths through the mold compound layers461 and464.
Atstep417, themold compound layer464 is mechanically ground in a grinding process or chemically etched to expose asurface465 of the secondvertical connection layer454.
Atstep419 the example method ends by removing themetal carrier471, leaving a multilayer package substrate including the conductor layers451,452,453 and454 indielectric layers461,464. The steps ofFIGS.4A-4B can be repeated to form multilayer package substrates for use with the arrangements having more layers, such as to create three or more conductive trace layers, by repeatedly performing plating of a trace layer, plating of a vertical connection layer, molding, and grinding.
FIGS.5A and5B illustrate top and bottom isometric views, respectively, of anantenna horn500 according to one example.Antenna horn500 may be manufactured using a metal stamping process, for example.Antenna horn500 may be created from a metal sheet, such as a copper, gold, silver, or other alloy sheet.Antenna horn500 has awaveguide section501 and a flaredsection502. Thewaveguide section501 has a constant length and width. The flaredsection502 starts at a narrow end with the same dimensions as thewaveguide section501 and then expands in both length and width as the flaredsection501 extends away from thewaveguide section501. In one arrangement, thewaveguide section501 has an outside width WW of 0.54 mm and an outside length WL of 1.07 mm. The far end of the flaredsection502 has an outside width FW of 1.78 mm and an outside length FL of 2.42 mm. Thewaveguide section501 has a height WH of 0.45 mm, and the flared section has a height FH of 0.88 mm, which makes the overall height of theantenna horn500 to be 1.03 mm. The thickness ofantenna horn500 may consistent across the height of the waveguide and flared sections or one section may be thicker than the other, such as due to the manufacturing method wherein the flaredsection502 may be thinner thanwaveguide section501. In one example, the thickness WT of the waveguide section is 100 microns, and the thickness FT of the flared section is 50 microns.
Antenna horn500 may be mounted on amultilayer package substrate101 as illustrated inFIGS.1A-D.Antenna horn500 may be positioned aligned above apatch antenna110 or121 in a configuration that directs RF radiation throughantenna horn500.Antenna horn500 may be mounted on themultilayer package substrate101 by solderingfeed end503 of theantenna horn500 to theground trace layer116.
FIGS.6A-6C illustrate, in an isometric view, a plan view, and a cross-sectional view, respectively, an example arrangement in which aninsertion aid structure600 is incorporated on to a multilayer package substrate for attachment of the antenna horn.Insertion aid structure600 provides a mounting structure for an antenna horn. Referring to common elements illustrated in inFIGS.1A-C,FIG.6A illustrates areflector114 formed in a lower conductor layer of the multilayer package substrate. A stripline orfeed line111 is formed in a conductor layer above thereflector114. Thefeed line111 is coupled to avertical connector112 and aconductive post113, which provide an electrical connection through the multilayer package substrate between an antenna (e.g.,antenna110 or121) and a semiconductor die (e.g., semiconductor die107).
Aground layer601 is formed on the device side surface of the multilayer package substrate. In one arrangement, theground layer601 is formed in a conductive layer abovefeed line111 and the antenna, and an opening602 (such as hole117) allows radiation to pass from the antenna. In another arrangement, the antenna is formed in the same conductive layer asground layer601, and thehole602 surrounds the antenna. Twoelevated traces603 and604 are built up onground layer601 such as by a plating process described with respect toFIG.3.Trace603 forms an outer ring, and trace604 forms an inner ring. Togetherelevated traces603,604 create aninsertion slot605 between them.Elevated trace310 may be a conductive material, such as copper, that is electrically coupled toground trace layer602.
In one example, theouter ring trace603 has a thickness OT of 100 microns, and theinner ring trace604 has a thickness IT of 50 microns. The elevated traces603 and604 may have a trace height TH of 60 microns. In other arrangements, the thickness of theouter ring trace603 and theinner ring trace604 may be wider or narrower than described herein, and the height of thetraces603,604 may be higher or lower than 60 microns. The parameters of theelevated traces603,604 may be selected, for example, based upon the size of the antenna horn to be mounted or any other feature of the multilayer package substrate or intended application of the final package. In some examples, the thickness of theelevated traces603,604 and theinsertion slot605 are not consistent on all sides. For example, the thickness oflength portions603a,604a,605amay be wider or narrower than the thickness ofwidth portions603b,604b,605b.
FIG.6D illustrates, in an isometric view, anantenna horn606 installed on theground layer601 of a multilayer package substrate using theinsertion aid structure600. As shown in the arrangement ofFIG.6D,insertion aid structure600 ensures proper placement and alignment of theantenna horn606 relative toopening602 and the antenna (not shown). Antenna horn60 may be attached to theinsertion aid structure600 and held in place by friction, such as by clamping the walls of thewaveguide section607 ofantenna horn606 into theinsertion slot605 between theelevated traces603,604 (e.g., “snapping” the walls of theantenna horn606 into place in slot605). Alternatively,antenna horn606 may be fixedly attached toinsertion aid structure600 by solder, epoxy, or other material. The term “ring” is used to describe the shape ofelevated traces603,604, which may be a circular, oval, rectangular, or other shape as required to conform to the shape of thewaveguide section607 ofantenna horn606.
In another arrangement,insertion aid structure600 may comprise a singleelevated trace603 or604 that is used to locate a desired position for anantenna horn606. For example, a singleelevated trace603 may be provided to encircle an outer surface of the walls of thewaveguide section607 ofantenna horn606. For example, a singleelevated trace604 may be provided to fit within the walls of thewaveguide section607 ofantenna horn606.
FIG.6E illustrates a further arrangement of aninsertion aid structure610 theground layer601 of a multilayer package substrate. InFIG.6E, an insertion slot (designated by dashed line615) is formed between intermittentelevated traces613,614 consisting of a plurality ofsegments613a,614a.Anouter ring613 is a segmented or dashed line formed bysegments613, and aninner ring614 is a segmented or dashed line formed bysegments614a.The walls of awaveguide section607 onantenna horn606 are positioned between theelevated trace segments613a,614a,which hold the antenna horn in a desired location on the multilayer package substrate.
In one arrangement,antenna horn606 is manufactured by a metal stamping process and has dimensions similar to antenna horn500 (FIGS.5A-B). In other examples,antenna horn606 may have any appropriate dimensions that are compatible with the configuration ofinsertion aid structure600 and that are adapted for a desired RF spectrum and radiation pattern.
FIGS.7A-D illustrate, in a series of cross-sectional views, selected steps for a semiconductor package molding process.FIG.7A is a schematic cross section in part illustrating a side view of one configuration of mold system components. The mold system may include amold700 having amold cavity701.Mold700 may include afirst chase702 and asecond chase703 that cooperate to form a system of passages and cavities between the chases. Thechases702,703 form aninput passage704 that is configured to allow a molding material to enter themold cavity702. Thechases702,703 also form anoutput passage705 that is configured to evacuate air and excess molding material from themold cavity702. The molding processes may incorporate layers ofrelease film706,707 that are vacuum formed to the surface of eachchase702,703 along themold cavity701. Whenfirst chase702 andsecond chase703 are assembled to formmold700, each layer of therelease film706,707 is compressed and forms a seal surroundingmold cavity701.
FIG.7B illustrates an example arrangement in which asemiconductor device708 has been positioned inmold cavity701. For example, chase702 may be opened or otherwise separated fromchase703 to create room forsemiconductor device708 to be loaded intomold cavity701.Semiconductor device708 may include asemiconductor die709 andantenna horn710 that are mounted on amultilayer substrate711.Chases702,703 are then clamped together to sealsemiconductor device708 withincavity701.Chase702 is moved against anopen end712 ofantenna horn710 onsemiconductor device708.Release film706 is sealed againstopen end712, andrelease film707 may be sealed against a bottom side ofmultilayer substrate711.Output passage705 may be used to evacuate air frommold cavity701 to ensure that therelease films706,707 are compressed againstopen end712 and the bottom side ofsubstrate711.
FIG.7C illustrates amold compound713 being injected intomold cavity701 throughinput passage704. If a vacuum has not already been created withinmold cavity701, then themold compound713 replaces air withinmold cavity701 and forces air out ofoutput passage705.Mold compound713 surrounds and encapsulatessemiconductor device708 including semiconductor die709,antenna horn710, andmultilayer substrate711. However,release film706, which is sealed againstopen end709 ofantenna horn710, preventsmold compound713 from entering the hollow interior ofantenna horn710.
Mold material713 may be any type of plastic or polymer, such as thermosetting plastics or thermoplastics. Prior to the molding process, molding material60 may be in the form of powder, cold compacted powder in the form of pellets or preforms, or granules.Molding material713 may also be a low viscosity molding material. Lowviscosity molding materials713 may include liquid, putty, or other materials that have a low viscosity during the molding process.
FIG.7D illustrates a packagedsemiconductor device714 after themold compound713 has cured and the molding process is complete.Chases702,703 are separated and releasefilms706,707 are removed. The including semiconductor die709,antenna horn710, andmultilayer substrate711 are covered by and surrounded bymold compound713, but the interior of antenna horn is free of themold compound713.
In some configurations, an air-filledhorn710 may be desired for best antenna performance. For those configurations, the process illustrated inFIGS.7A-D using a film-assisted molding process will provide an air-filledhorn710. In other configurations, a fully moldedsemiconductor package714 may be desired with a mold-filledhorn710, such as to provide for improved mechanical integrity of thepackage714. In those configurations, the process illustrated inFIGS.7A-D may be used withoutrelease film706 coveringopen end712 ofhorn710 and/or with achase702 modified to allowmold compound713 to enter the interior ofhorn710. Semiconductor packages, such aspackage714, may be used in mmWave and radar devices, for example. In those devices, the structures described herein, such as the insertion aid structure having an elevated trace and/or an air-filled antenna horn may be identified by x-ray and cross-section inspection. Such devices with an antenna horn on package with a multilevel substrate provide performance advantages such as no resonance elements, wide bandwidth, good directivity, etc.
In one example, a method comprises forming a patch antenna in a first conductor layer on or below a device side surface of a multilayer package substrate. The multilayer package substrate comprises conductor layers spaced from one another by dielectric material and vertical connection layers extending through the dielectric material between the conductor layers and coupling portions of the conductor layers to one another. The multilayer package substrate has a board side surface opposite the device side surface. The method further comprises forming a reflector in a second conductor layer of the multilayer package substrate. The reflector is aligned with and spaced from the patch antenna by the dielectric material. The second conductor layer is spaced apart from the patch antenna toward the board side surface. The method further comprises mounting a semiconductor die on the device side surface of the multilayer package substrate. The semiconductor die is coupled to the patch antenna. The method further comprises mounting an antenna horn on the device side surface. The antenna horn aligned with the patch antenna. In one arrangement, the antenna horn is mounted using a mounting structure on the device side surface.
The method may further comprise forming a ground plane in a conductor layer on the device side surface. The antenna horn may be mounted on the ground plane.
The method may further comprise covering the semiconductor die and a portion of the device side surface of the multilayer package substrate with a mold compound. The mold compound surrounds the antenna horn. In some arrangements, the mold compound fills an interior of the antenna horn. In other arrangements, the mold compound does not cover or fill an interior of the antenna horn and the antenna horn is air filled.
The patch antenna may be patterned as an E-patch antenna in a rectangular portion of the first conductor layer. The E-patch antenna comprises a central portion that is a rectangular shape, a first end portion that is a rectangular shape that is spaced from the central portion by a first slot, the first end portion coupled to the central portion by the first conductor layer, and a second end portion that is a rectangular shape that is spaced from the central portion by a second slot, the second end portion coupled to the central portion by the first conductor layer. The E-patch antenna may be configured to radiate signals at frequencies between 30 GHz and 300 GHz. A feed input for the E-patch antenna may be formed comprising a line in the first conductor layer coupled to the central portion.
The conductor layer may comprise copper, gold silver, aluminum, or an alloy of these. The multilayer package substrate may comprise dielectric material that is acrylonitrile butadiene styrene (ABS), acrylonitrile styrene acrylate (ASA) or epoxy resin mold compound.
In some arrangements, a microelectronic device package has a semiconductor die that is flip-chip mounted to the device side surface of a multilayer package substrate. In another arrangement, a wire bonded semiconductor die is mounted on the device side surface of the multilayer package substrate. The multilayer package substrate has an antenna formed on or below the device side surface and spaced from a semiconductor device mounting portion where the semiconductor die is attached. A die attach material may be used to mount the semiconductor die in a face up orientation with bond pads facing away from the multilayer package substrate. The semiconductor die may be coupled to the multilayer package substrate and the antenna using wire bonds. A mold compound is formed over the wire bonds and the semiconductor die. The mold compound may cover the antenna and other features, such as an antenna horn.
While various examples of the present disclosure have been described above, it should be understood that they have been presented by way of example only and not limitation. Numerous changes to the disclosed examples can be made in accordance with the disclosure herein without departing from the spirit or scope of the disclosure. Modifications are possible in the described embodiments, and other embodiments are possible, within the scope of the claims. Thus, the breadth and scope of the present invention should not be limited by any of the examples described above. Rather, the scope of the disclosure should be defined in accordance with the following claims and their equivalents.