US20190360116A1 - System for reliable, high throughput, complex electric field generation, and method for producing coatings therefrom - Google Patents

Abstract

Embodiments of the present disclosure include a system for depositing a layered nanolaminate alloy including a controller for an electrodeposition process that includes a waveform synthesizer circuit configured to generate a complex waveform signal corresponding to a desired electrodeposition waveform to be output from an electrodeposition power supply. The controller also includes a synthesizer control circuit configured to control the waveform synthesizer circuit. Based at least in part on a recipe having information related to the electrodeposition process, the synthesizer control circuit controls the generation of the complex waveform signal by modulating in real-time at least one of a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, and a derivative of the complex waveform signal. The controller further includes a controller output circuit configured to transmit the complex waveform signal to an input of the electrodeposition power supply.

Description

BACKGROUNDTechnical Field
• Depositing multilayer nanolaminate coatings on a workpiece via electrochemical manufacturing methods at relatively high rates or throughput requires stable and precise electric field generators (e.g., waveform generators). Additionally, varying the composition and microstructure of the deposited coatings (e.g., deposited species and/or microstructure) requires precise control of the waveform provided (e.g., the current and/or the voltage waveform) to one or more sets of electrodes simultaneously. Further, based on the desired galvanic interaction among or between individual layers of the coating and/or between the coating layers and the workpiece, electrodeposition may require complex features in the waveform and/or the waveform may have to be modified in real-time based on a process step and/or process feedback in order to achieve specific combinations of properties.
Description of the Related Art
• Traditional electrodeposition systems typically use current pulses, based on abrupt voltage or current transitions, which limit the degree of precision that can be applied to the electrodeposition process. Although in some related electroplating systems, for example, electroplating systems in the semiconductor industry or coatings industries, the power supplies may include analog circuitry and micro-controllers that are capable of a range of waveforms. However, the range of waveforms in these electroplating systems is limited in both the number of available waveforms and the type of waveforms that can be created. In addition, the types of waveforms that can be created are further limited to pre-loaded full-length waveforms and/or limited to standard waveform profile patterns. That is, the waveforms cannot be modified in real-time. Further, power supplies and controllers in traditional systems typically only control the voltage or current to one pair of electrodes (i.e., an anode and a cathode).
• While some traditional systems provide flexibility in the controller by including field-programmable gate arrays, in known power supply systems the controller is required to be connected to a specific bulk power supply or power supplies. That is, each controller is configured to be used with, for example, a power supply of a specific model or a limited range of models, power supplies from a specific manufacturer, and/or power supplies having specific output ranges. This means that a user is required to purchase and learn different software for each power supply. Moreover, known systems have varying degrees of instability, which can adversely affect the coating process. Known systems cannot calibrate for and/or modify the output waveform to account for process instabilities. Accordingly, there is a need for improved power control systems and methods. The present disclosure provides this and related advantages.
BRIEF SUMMARY
• In embodiments of the present technology, the power supply systems, which include a controller and a power supply, dynamically generate electrodeposition waveforms having any desired waveform profile (e.g., generate a complex waveform) by modulating or changing in real-time the waveform shape, the frequency, the amplitude, the offset, the slew, the wavelength, the phase, the velocity, the derivative, and/or some other waveform parameter. The desired waveform profile can apply to the voltage and/or the current profile of the electrodeposition waveform. The electrodeposition waveform is then output to a set of electrodes in an electrochemical tank to perform the electrodeposition process.
• In embodiments, the present disclosure provides a system, comprising: an electrochemical processing tank; a set of electrodes configured to be used in depositing a multilayer nanolaminate coating on a workpiece; an electrodeposition power supply connected to the set of electrodes, the electrodeposition power supply comprising an input connection configured to receive a complex waveform signal, the electrodeposition power supply configured to amplify the complex waveform signal to generate a desired electrodeposition waveform, the desired electrodeposition waveform configured to deposit at least one layer of the multilayer nanolaminate coating on the workpiece; and a processor-based controller comprising: a waveform synthesizer circuit configured to generate the complex waveform signal; a synthesizer control circuit configured to control the waveform synthesizer circuit based at least in part on a recipe having parameters related to the depositing at least one layer of the multilayer nanolaminate coating, the synthesizer control circuit configured to control the complex waveform signal generated by modulating in real-time a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, a derivative of the complex waveform signal, or a combination thereof; and a controller output circuit connected to the input of the electrodeposition power supply, the controller output circuit configured to transmit the complex waveform signal to the input.
• In other embodiments, the present disclosure provides a controller for an electrodeposition process, comprising: a waveform synthesizer circuit configured to generate a complex waveform signal corresponding to an electrodeposition waveform, and configured to transmit the complex waveform signal to an electrodeposition power supply; a synthesizer control circuit configured to control the waveform synthesizer circuit based at least in part on a recipe having parameters related to depositing at least one layer of a multilayer nanolaminate coating, the synthesizer control circuit configured to control the complex waveform signal generated by modulating in real-time a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, a derivative of the complex waveform signal, or a combination thereof; and a controller output circuit configured to transmit the complex waveform signal to an input of the electrodeposition power supply.
• In further embodiments, the present disclosure provides a method for electrodepositing a coating on a workpiece, the method comprising: selecting a recipe corresponding to a electrodeposition process; producing a specialized recipe by adjusting the recipe based on information related to workpiece geometry, workpiece surface area, an electrodeposition power supply, or a combination thereof; generating a complex waveform signal corresponding to a desired electrodeposition waveform that is based on the adjusted recipe, the generating comprising modulating in real-time a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, a derivative of the complex waveform signal, or a combination thereof, based at least on the recipe; providing the complex waveform signal to the electrodeposition power supply; generating an electrodeposition waveform based on the complex waveform signal by the power supply; and transmitting the electrodeposition waveform to an electrode set in an electrodeposition processing tank, thereby depositing the coating on the workpiece.
BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS
• The detailed description is described with reference to the accompanying figures. In the figures, the left-most digit(s) of a reference number identifies the figure in which the reference number first appears. The use of the same reference numbers in different figures indicates similar or identical components or features.
• FIG. 1 illustrates an embodiment of an electrodeposition system depicting the control of electrochemical processing tanks via network connected controllers.
• FIG. 2A illustrates an embodiment of a controller that can be used in the system ofFIG. 1.
• FIG. 2B illustrates another embodiment of a controller that can be used in the system ofFIG. 1.
• FIG. 3 illustrates a method of calibrating an electrodeposition power supply to create a power supply driver file.
• FIGS. 4A-4C illustrate a high-level overview of the steps for operating a system to perform an electrodeposition process on a workpiece surface.
• FIG. 5A illustrates generation of a second-order waveform using the characteristics of two first-order waveforms.
• FIG. 5B illustrates an embodiment of a complex waveform that can be generated by the system ofFIG. 1.
DETAILED DESCRIPTION
• Described herein is a system and apparatus for electrodeposition of coating (e.g., a laminated coating) on a workpiece. In embodiments, such systems are used to electrodeposit one or more nanolaminated or microlaminated metal or metal alloy coatings on all or part of a workpiece, e.g., the surface of the workpiece. The workpiece can be an activated workpiece in that it has been prepared (i.e., pretreated) for the deposition process. In some embodiments, the workpiece is activated, at least in part, by electrochemical etching controlled by an etching waveform or a portion of a complex waveform that produces the one or more nanolaminated or microlaminated coatings on the workpiece.
• Prior to setting forth this disclosure in more detail, it may be helpful to an understanding thereof to provide definitions of certain terms to be used herein. Additional definitions are set forth throughout this disclosure.
• A “set of electrodes” or “electrode set,” as used herein, refers to at least one anode and the corresponding at least one cathode. In embodiments, a set of electrodes is an anode/cathode pair. However, in such embodiments, either the anode or the cathode may be common between two or more sets of electrodes. For example, an electrochemical tank can have one, two, three, four, or more anodes and a common cathode, and an “electrode set” may refer to a respective anode in combination with the common cathode. In other embodiments, an electrode set refers to a common cathode that corresponds to a plurality of anodes.
• “Electrolyte,” as used herein, means an electrolyte bath, plating bath, or electroplating solution from which one or more metals may be electrodeposited.
• “Electrodeposition” or “electrodeposited” refers to a process or a resultant product, respectively, in which electrolysis is used to deposit a coating onto a workpiece. In other words, a workpiece is contacted with (e.g., partially immersed in, or fully immersed in) an electrolyte solution containing one or more ions (e.g., metal, ceramic, etc.) while an electric current is passed through the workpiece and the electrolyte solution, resulting in a thin coating being deposited on the surface of the workpiece.
• “Coatings” include thin layers that are electrodeposited onto a surface of a workpiece. Therefore “coatings,” as used herein, includes claddings, which are made of a series of thin electrodeposited layers on a surface of a mandrel, where the mandrel is removed after formation of the electrodeposited layers. Claddings are generally fastened to another article as a protective layer after formation.
• “Laminated,” or “laminate” as used herein, refers to materials (e.g., coatings) that comprise two or more layers. In embodiments, laminate or laminated refers to materials that comprise, consist essentially of, or consist of, a series of layers that may be in an alternating or non-alternating pattern. Alternating layers may comprise two types of layers (e.g., A, B, A, B, A, B . . . ), three types of layers (e.g., A, B, C, A, B, C, A, B, C . . . ), four types of layers (e.g., A, B, C, D, A, B, C, D . . . ), or more types of layers. Non-alternating layers may comprise three or more, four or more, or five or more different types of layers. Laminated, as used herein includes nanolaminated.
• “Nanolaminate” or “nanolaminated,” within the meaning of this disclosure includes coatings comprising two or more layers in which each of the individual layers has a thickness of less than 10,000 nanometers (i.e., 10 microns). In other words, the term “nanolaminated” in “nanolaminated coatings” in this disclosure refers to the thickness of the layers in the coating, not the overall thickness of the coating made up of the individual layers. In embodiments, “nanolaminated” refers to materials or coatings that comprise, consist essentially of, or consist of, a series of laminated layers less than 1 micron. The processes described herein are particularly suited for providing nanolaminated coatings, however, they certainly also can be used to make articles in which the individual layers that are thicker than 10 microns.
• “Workpiece” includes any item with a surface onto which a coating is electrodeposited. Workpieces include substrates, which are objects on which a coating is applied, and mandrels, which are substrates from which the coating is removed after formation. Workpieces can be formed of a conductive material (e.g., a metal), formed of a mixture of conductive and non-conductive materials (e.g., a polymer-metal mixture), or coated with a conductive material (e.g., non-conductive material coated with a metal layer through electroless deposition).
• A workpiece employed in embodiments of the present disclosure may be any suitable workpiece. In embodiments, a workpiece is made of a polymeric material. In some embodiments, a polymeric material is a plastic material. In other embodiments, a workpiece is made of a metal or an alloy. In some embodiments, the metal is a steel alloy.
• The term “wavelength” refers to the thickness of two adjacent layers that are formed in a single deposition cycle in embodiments where the current density is a periodic function.
• “Complex waveform” as used herein refers to any arbitrary waveform that can be generated or modified during the electrodeposition process, including waveforms consisting of a fundamental frequency, waveforms with a fundamental frequency having superimposed harmonics, and/or waveforms consisting of a combination of two or more waveforms. The complex waveform can include off periods and periods where current is reversed (e.g., pulse and pulse reverse plating waveforms).
• As used herein, “generate” includes the initial creation of a new waveform and/or subsequent modifications or changes to the waveform. The generation of the full waveform can use a nested loop sequence control in which the final electrodeposition waveform is generated by looping the sequenced sub-waveforms for a predetermined cycle count, a predetermined time period, or indefinitely until the electrodeposition process is stopped or changed for some reason. In some embodiments, the custom electrodeposition waveform is generated by modulating a base waveform using characteristics of a second waveform to generate a “second-order” waveform that is then used as the electrodeposition waveform. Characteristics of the second waveform may include one, two, three, or more of amplitude, frequency, offset, slew, overshoot, wavelength, phase, velocity, and derivative of the waveform (to account for sharp or continuous transitions of the waveform). The waveforms that are used to generate the second-order waveform are also referred to herein as “first-order” waveforms. The first-order waveforms can be selected from a plurality of preloaded waveforms and can be standard waveforms such as, for example, sinusoidal waveforms, triangular waveforms, square waves, etc., and/or another custom waveform. Information from one or more of the first-order waveforms (e.g., information related to the amplitude, frequency, offset, slew, wavelength, phase, velocity, derivative of the waveform, etc.) can be used to modify another first-order waveform or an existing electrodeposition waveform to generate an electrodeposition waveform that is output to one or more set of electrodes in the electrochemical processing tanks.
• The terms “a,” “an,” “the,” and similar articles or terms used in the context of describing the disclosure (especially in the context of the following claims) are to be construed to cover both the singular and the plural (i.e., “one or more”), unless otherwise indicated herein or clearly contradicted by context. Ranges of values recited herein are intended to serve as a shorthand method of referring individually to each separate value falling within the range. In the present description, any concentration range, percentage range, ratio range, or integer range is to be understood to include the value of any integer within the recited range and, when appropriate, fractions thereof (such as one tenth and one hundredth of an integer), unless otherwise indicated. Also, any number range recited herein relating to any physical feature, such as size or thickness, are to be understood to include any integer within the recited range, unless otherwise indicated. Unless otherwise indicated herein, each individual value is incorporated into the specification as if it were individually recited herein.
• The use of the alternative (e.g., “or”) should be understood to mean one, both, or any combination thereof of the alternatives. The various embodiments described above can be combined to provide further embodiments. Groupings of alternative elements or embodiments of the disclosure described herein should not be construed as limitations. Each member of a group may be referred to and claimed individually, or in any combination with other members of the group or other elements found herein. The phrase “or,” as used herein in the specification and in the claims, should be understood to mean “either or both” of the elements so conjoined, i.e., elements that are conjunctively present in some cases and disjunctively present in other cases. Multiple elements listed with “or” should be construed in the same fashion, i.e., “one or more” of the elements so conjoined. Other elements may optionally be present other than the elements specifically identified by the “or” clause, whether related or unrelated to those elements specifically identified. Thus, as an example, a reference to “A or B”, when used in conjunction with open-ended language such as “comprising” can refer, in one embodiment, to A only (optionally including elements other than B); in another embodiment, to B only (optionally including elements other than A); in yet another embodiment, to both A and B (optionally including other elements); etc.
• The phrase “and/or,” as used herein, should be understood to mean “either or both” of the elements so conjoined, i.e., elements that are conjunctively present in some cases and disjunctively present in other cases. Multiple elements listed with “and/or” should be construed in the same fashion, i.e., “one or more” of the elements so conjoined. Other elements may optionally be present other than the elements specifically identified by the “and/or” clause, whether related or unrelated to those elements specifically identified. Thus, as an example, a reference to “A and/or B”, when used in conjunction with open-ended language such as “comprising” can refer, in one embodiment, to A only (optionally including elements other than B); in another embodiment, to B only (optionally including elements other than A); in yet another embodiment, to both A and B (optionally including other elements); etc.
• As used herein, the phrase “at least one,” in reference to a list of one or more elements, should be understood to mean at least one element selected from any one or more of the elements in the list of elements, but not necessarily including at least one of each and every element specifically listed within the list of elements and not excluding any combinations of elements in the list of elements. This definition also allows that elements may optionally be present other than the elements specifically identified within the list of elements to which the phrase “at least one” refers, whether related or unrelated to those elements specifically identified. Thus, as an example, “at least one of A and B” (or, equivalently, “at least one of A or B,” or, equivalently “at least one of A and/or B”) can refer, in one embodiment, to at least one, optionally including more than one, A, with no B present (and optionally including elements other than B); in another embodiment, to at least one, optionally including more than one, B, with no A present (and optionally including elements other than A); in yet another embodiment, to at least one, optionally including more than one, A, and at least one, optionally including more than one, B (and optionally including other elements); etc.
• In the context of this disclosure, the words “process” and “method” are synonymous. It should also be understood that, unless clearly indicated to the contrary, processes described herein and claimed below can include steps in addition to the steps recited, and the order of the steps or acts of the process is not necessarily limited to the order in which the steps or acts of the process are recited.
• Each embodiment disclosed herein can comprise, consist essentially of, or consist of a particular stated element, step, ingredient, or component. The term “comprise” or “comprises” means “includes, but is not limited to,” and allows for the inclusion of unspecified elements, steps, ingredients, or components, even in major amounts. The phrase “consisting of” excludes any element, step, ingredient, or component that is not specified. The phrase “consisting essentially of” limits the scope of the embodiment to the specified elements, steps, ingredients, or components, and to those that do not materially affect the basic and novel characteristics of the claimed disclosure.
• In embodiments, a system for depositing a layered nanolaminate alloy includes one or more electrochemical processing tanks, with each electrochemical processing tank having one or more sets of electrodes for use in depositing multilayer nanolaminate coatings on one or more workpieces. Such a system may also include one or more electrodeposition power supplies, with each power supply respectively connected to an electrode set of the one or more sets of electrodes. In embodiments, each power supply has an input connection configured to receive a complex waveform signal corresponding to a desired electrodeposition waveform to be output from the power supply, and each power supply is configured to amplify the received complex waveform signal to generate the desired electrodeposition waveform. Each electrodeposition power supply may transmit the desired electrodeposition waveform to the corresponding electrode set in the one or more sets of electrodes. In some embodiments, an electrodeposition power supply independently provides electrodeposition waveforms to more than one corresponding electrode set. Such electrodeposition waveforms provided by the corresponding power supply drives the deposition of the nanolaminate coatings on the corresponding workpiece. A given electrodeposition power supply has a maximum switching speed, which measures how fast the power supply changes from a first amplitude level to a second amplitude level.
• In embodiments, the system also includes a processor-based controller having a waveform synthesizer circuit configured to generate each complex waveform signal to be transmitted to the input of the respective electrodeposition power supply. In some embodiments, the processor-based controller also includes a synthesizer control circuit that is configured to control the waveform synthesizer circuit. Based at least in part on a recipe having information related to the depositing of the multilayer nanolaminate coatings, the synthesizer control circuit controls the generating of the respective complex waveform signal by modulating in real-time at least one of a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, and a derivative of the complex waveform signal. As such, in some embodiments, the processor-based controller provides for, and modulates in real-time, off periods, forward pulse times, reverse pulse times, or a combination thereof. In further embodiments, the processor-based controller further includes one or more controller output circuits respectively connected to the input of each electrodeposition power supply, with each controller output circuit configured to transmit the corresponding complex waveform signal to the input of each electrodeposition power supply. In embodiments, the synthesizer control circuit includes a field-programmable gate array (FPGA). In some embodiments, the modulating in real-time of at least one of a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, and a derivative of the complex waveform signal includes modulating one or more first characteristics of a base first-order waveform using one or more second characteristics of at least one other first-order waveform based on a functional relationship between the first and second characteristics to generate the respective complex waveform signal. In some embodiments, the modulating in real-time of at least one of a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, and a derivative of the complex waveform signal includes serially combining sub-waveform sequences to generate the respective complex waveform signal.
• A processor-based controller has a maximum sample rate (also called the clock rate or clock frequency), which is the rate at which the power output is sampled. Generally, to produce accurate waveforms a sample rate is many times greater than the signal's highest frequency. A sample rate defines the step width of the generated signal as well as the maximum achievable signal frequency. In embodiments, sampling rates are range from DC to 12 GHz. In other embodiments, sampling rates range from DC to 350 KHz. In embodiments, a processor-based controller modulates a sample rate. In some embodiments, a processor-based controller has a sample rate that is higher than the maximum sample rate for a given power supply. In such embodiments, a processor-based controller may modulate the sample speed to meet the maximum sample rate of the power supply, for example, in order to conserve resources.
• In further embodiments, a processor-based controller controls and/or modulates a switching speed of an electrodeposition power supply. The switching speed may range from 1 picosecond to 500 milliseconds. In embodiments, a switching speed is less than about 5 milliseconds. In further embodiments, a switching speed is about 5 milliseconds.
• Embodiments of the systems discussed herein demonstrate improved stability over extended operational periods when compared to existing systems by, in part, incorporating a controller having a waveform synthesizer circuit and a synthesizer control circuit to dynamically change the electrodeposition waveform based on a process step and/or process feedback, such as temperature of the electrolyte, total thickness of a deposited coating, thickness of a deposited layer or deposited layers, coating resistivity, current and/or voltage readings between individual electrodes, and/or other process and/or system feedback. In some embodiments, the synthesizer control circuit is a FPGA that provides parallel processing capability. Additionally, the controller enables the generation of waveforms having any desired waveform profiles (e.g., a complex waveform having any desired waveform shape, frequency, amplitude, offset, slew, wavelength, phase, velocity, and derivative, and/or other waveform parameter(s)), to produce a desired coating composition and/or microstructure. The desired waveform profile can apply to the voltage and/or to the current profile of the waveform.
• The ability to generate complex waveforms provides significantly more flexibility in the electrodeposition process than traditional power supplies. The additional flexibility may be necessary in order to produce nanolaminated coatings that are within a desired range of deposited species, microstructures, and/or thicknesses. Thus, power supply systems that are capable of producing a variety of waveforms having any desired waveform profile represent an improvement over traditional power supply systems for controlling the production of nanolaminated coatings. In contrast, traditional power supply systems may be preloaded and/or have a limited number of waveform profile patterns (e.g., only square waves).
• In embodiments of the present disclosure, the electrodeposition power supply provides electrodeposition waveforms, including periodic waveforms and non-periodic waveforms having any desired parameter. In some embodiments, the electrodeposition waveform is selected from a plurality of waveforms that have been preloaded into, for example, a controller or another device in the electrodeposition system.
• Alternatively, or in addition to preloaded waveforms, the electrodeposition waveform can be custom-built using waveform software that can create entirely new waveforms and/or modify existing waveforms (e.g., existing waveforms that have been preloaded into the system). In some embodiments, the custom electrodeposition waveform is generated from sub-waveforms, which can also be preloaded into the system, that are then sequenced together to generate the full electrodeposition waveform.
• Another embodiment of the present disclosure is directed to a controller for an electrodeposition process that includes a waveform synthesizer circuit configured to generate a complex waveform signal corresponding to a desired electrodeposition waveform to be output from an electrodeposition power supply. In embodiments, the controller also includes a synthesizer control circuit configured to control the waveform synthesizer circuit. Based at least in part on a recipe having information related to the electrodeposition process, the synthesizer control circuit controls the generating of the complex waveform signal by modulating in real-time at least one of a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, and a derivative of the complex waveform signal. In some embodiments, the controller further includes a controller output circuit configured to transmit the complex waveform signal to an input of the electrodeposition power supply. In embodiments, the synthesizer control circuit includes a FPGA. In some embodiments, the modulating in real-time of at least one of a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, and a derivative of the complex waveform signal includes modulating one or more first characteristics of a base first-order waveform using one or more second characteristics of at least one other first-order waveform based on a functional relationship between the first and second characteristics to generate the respective complex waveform signal. In some embodiments, the modulating in real-time of at least one of a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, and a derivative of the complex waveform signal includes serially combining sub-waveform sequences to generate the respective complex waveform signal.
• Another embodiment of the present disclosure is directed to a method for electrodepositing a coating on a workpiece. In embodiments, the method includes selecting a standardized recipe corresponding to a desired electrodeposition process and adjusting the standardized recipe based on information related to at least one of the workpiece geometry, the workpiece surface area, and an electrodeposition power supply used for the electrodepositing of the coating on the workpiece. In some embodiments, the method also includes generating a complex waveform signal corresponding to a desired electrodeposition waveform based on the adjusted recipe and providing the complex waveform to the electrodeposition power supply. The method may further include generating an electrodeposition waveform in the power supply based on the complex waveform signal and outputting the electrodeposition waveform from the power supply to an electrode set corresponding to the workpiece. In some embodiments, the method includes depositing coatings on the workpiece based on the electrodeposition waveform. The method further involves modulating in real-time at least one of a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, and a derivative of the complex waveform signal based at least in part on a recipe having information related to the depositing of the coatings. In any of the described embodiments, the workpiece may be a substrate.
• FIG. 1 illustrates an embodiment of anelectrodeposition operating environment100 depicting the control of one or moreelectrochemical processing tanks114,116,118 via one or morerespective controllers106,108,110. The system is operative to deposit a coating, e.g., nanolayered, nanolaminate coating, onworkpieces120,122,124. Theworkpieces120,122,124 in therespective tanks114,116,118 may be a metal (e.g., iron, steel, etc.), metal alloy, or polymeric material (e.g., thermoplastic, thermoset, and/or composite thereof, etc.). Theworkpieces120,122,124 are connected toelectrodes140a,142a,144a, respectively. In embodiments, pumps132,134,136 pump the electrolytic solution to the respectiveelectrochemical processing tanks114,116,118 prior to the electrodeposition process. In some embodiments, pumps132,134,136 are used to add electrolytic solution during the electrodeposition process, if needed.Control valves156,158,160 are respectively connected to processingtanks114,116,118 to remove the electrolytic solution from the respective tanks.Agitators170,172,174 mix the electrolyte solution in therespective tanks114,116,118.
• In embodiments,agitators170,172,174, pumps132,134,136 andcontrol valves156,158,160 are respectively controlled bytank automation controllers150,152,154. Thetank automation controllers150,152,154 control at least one of an electrolyte level, an electrolyte concentration, an electrolyte temperature, and a flow rate in each of theelectrochemical processing tanks114,116,118, respectively. In other embodiments, a single tank automation controller controls at least one of an electrolyte level, an electrolyte concentration, an electrolyte temperature, and a flow rate in each of the electrochemical processing tanks independently. Thetank automation controllers150,152,154 can operate autonomously or can operate based on commands received from therespective controllers106,108,110. In embodiments, thecontrollers106,108,110 communicate with the respectivetank automation controllers150,152,154 using a direct communication connection (either wired or wireless) and/or are connected to acommon network180. The common network may be any suitable network, such as an Ethernet network, a Modbus network, a CAN bus network, or some other appropriate communications network.
• Each of theelectrochemical processing tanks114,116,118 can havesensor assemblies162,164,166 that measure or sense process parameters such as temperature, level, electrolyte concentration, coating thickness, coating resistivity, voltage or current between the electrodes, and/or some other process parameter. In embodiments, the output from thesensor assemblies162,164,166 is sent directly to thecontrollers106,108,110. In other embodiments, the output from thesensor assemblies162,164,166 is sent to thecontrollers106,108,110 via the respectivetank automation controllers150,152,154, which may also use the sensor signals for controlling, e.g., the temperature, level, electrolyte concentration, etc., in therespective processing tanks114,116,118. In each of thecontrollers106,108,110, the sensor data can then be used to appropriately control, modify, adjust, etc. the electrodeposition process, including modifying the process sequence steps and/or modifying the electrodeposition waveform, if necessary.
• As seen inFIG. 1, in embodiments, each of thecontrollers106,108,110 are connected to anetwork104 and can communicate with acentral control station102 via thenetwork104. Thenetwork104 can be wireless and/or wired and can be a WAN, LAN, cloud network, and/or the Internet. In embodiments, thecontrollers106,108,110 include a webserver and thecentral control station102 communicates with thecontrollers106,108,110 using a web browser. By using a browser interface, thecentral control station102 does not have to include specialized software for communicating with thecontrollers106,108,110 and can be any standard computer, smart phone, mobile device, or any other device that has a web browser. Any required process monitoring and/or process configuration software can be incorporated into one or all of thecontrollers106,108,110. In some embodiments, thecentral control station102 is a specialized computer that includes software for monitoring and/or configuring the electrodeposition process of theelectrochemical processing tanks114,116,118. In some embodiments, thecentral control station102 is disposed locally, i.e., in the same location as thecontrollers106,108,110. In some embodiments, thecentral control station102 is located remotely (e.g., in a central control room, another facility, or in another geographic location). In some embodiments, a central control station is not used, and the electrodeposition process is controlled using one or all of thecontrollers106,108,110.
• In operation, thecontrol station102 transmits commands to one or more of thecontrollers106,108,110 to control the electrodeposition process. The commands can be in the form of a “recipe” for the deposition of a coating layer (e.g., a nanolayered metal or metal alloy coating) on a workpiece. In embodiments, the recipe is in a standardized format for features common to a type of electrodeposition process so that the same recipe can be used, (i.e., a “standardized recipe”). For example, in many cases, the sequence of steps for coating a workpiece, the criteria for adding back solution during the process, and/or the output waveform of the power supply used in the electrodeposition process may be the same despite the scale of the electrodeposition process. However, differences in the workpiece size, workpiece geometry, power supply amperage rating, chemical addback quality, etc. from that used for configuring the standardized recipe should be taken into account when the actual process deviates from that of the standardized recipe, which is typically the case. To this end, once the operator selects the desired standardized recipe, the operator inputs details of the actual process (e.g., details of the power supplies, the workpiece, etc.). These operator inputs are then used by therespective controllers106,108,110 to adjust for the differences between the standardized recipe and the actual process. In embodiments, the operator inputs are simplified by having the operator select from predetermined selection lists. For example, the operator may be presented with a list of workpiece sizes and/or geometries and a list of power supply model numbers having various amperages that are compatible with the selected recipe, to name a few. Thecontrollers106,108,110 are configured to use the operator inputted information to confirm and/or adjust, if needed, the set points for the electrodeposition process (e.g., power supply amperage, chemical concentration, pump flow, etc.) and/or the criteria for satisfying each recipe step of the recipe (e.g., a predetermined time duration, a predetermined amp-hour accumulation, process feedback such as solution concentration satisfying a predetermined value, etc.). Alternatively, or in addition to predetermined lists, the operator can also have the option of inputting information directly.
• In embodiments, the recipe is in a generic (e.g., non-proprietary) format that is received and used by controllers of different models, manufacturers, etc. In some embodiments, the recipe is in human-readable form to identify the coating that will be produced by the recipe. In embodiments, the recipe includes information on the sequencing steps for controlling each of the coating layers of the electrodeposition process. For example, the sequencing steps can include instructions for controlling the various equipment (e.g., pumps132,134,136,agitators170,172,174,control valves156,158,160, etc.) used in the electrodeposition process, the time duration for each step, the amp-hour accumulation for each step, and/or information for creating and/or criterial for modifying an electrodeposition waveform profile (e.g., a current and/or voltage waveform profile, to be transmitted to one or more sets ofelectrodes140a,140b,142a,142b,144a,144binelectrochemical processing tanks114,116,118). The recipe can also include instructions for the current density used in the various steps of the electrodeposition process (e.g., the current density for each of the coating layers in a multilayer nanolaminate process).
• Based on the geometric shape and size of therespective workpieces120,122,124, in some embodiments, thecontrollers106,108,110 use the current density information to appropriately control the output power of therespective power supplies126,128,130 during the various steps of the electrodeposition process. The geometric shape and size of theworkpiece120,122,124 can also be transmitted via the recipe and/or can be manually input in thecontroller106,108,110. Operational instructions, such as, for example, setting the flow rate, temperature, and/or the electrolyte concentration in theelectrochemical processing tanks114,116,118, can be directly executed by thecontrollers106,108,110 and/or be transmitted to the respectivetank automation controllers150,152,154 for further processing and execution. The recipe can also include instructions for responding to a change in system conditions such as, for example, instructions for modifying the electrodeposition waveform and/or the sequence steps based on, for example, a predetermined time period or duration, a predetermined amp-hour accumulation, and/or feedback fromsensor assemblies162,164,166 in theelectrochemical processing tanks114,116,118.
• In embodiments, one or more of thecontrollers106,108,110 receive the instructions from the control station102 (e.g., via a web browser interface), and then respectively transmit, via thecommunication network104, appropriate commands to at least one other controller. Thus, eachcontroller106,108,110 on thenetwork104 can act as a node of a mesh network. The mesh network of controllers improves the stability of the system by reducing the system's reliance on a single external control station, such ascontrol station102, for providing a master control of the controllers in the system. For example, once the instructions are sent by thecontrol station102 to one or more of thecontrollers106,108,110, all the other controllers can cooperate to ensure that the instruction data is properly distributed. Thecontrollers106,108,110 can act autonomously when controlling theirrespective tanks114,116,118 based on the respective recipes. However, when needed, thecontrollers106,108,110 can also share data (e.g., the instructions fromcontrol station102, process data, etc.) via thenetwork104 to improve system stability. In some embodiments, rather than aseparate control station102, one or more of thecontrollers106,108,110 store the recipes for the entire electrodeposition process and act as the master control station. In some embodiments, at least one of thecontrollers106,108,110 includes a database for storing data related to the deposition processes. For example, each of thecontrollers106,108,110 can include a database to store the instruction data received from thecontrol station102.
• In still further embodiments, the one ormore controllers106,108,110 are deployed in a single tank and cooperate to ensure that the instruction data is properly distributed to individual portions of the single tank. A single tank system may be deployed for depositing coatings on large structures (e.g., oil and natural gas production tubulars having lengths ranging between approximately 15 and 45 feet). In the foregoing embodiments,controllers106,108,110 may individually control portions of a bus bar in a large electrodeposition tank having a single power supply or multiple supplies. In some embodiments, a single controller controls a plurality of power supplies (e.g., distributed along the length of a bus bar).
• Embodiments of thecontroller106,108,110 will now be described. For clarity, the embodiments will be described with respect to the tank system associated withcontroller106. However, those skilled in the art will understand that the description will also be applicable to the tank systems associated withcontrollers108 and110. Thecontroller106 can include any type of programmable processor-based computer. In embodiments, thecontroller106 is a stand-alone controller in that the controller is not connected to other computers. However, it is contemplated that thecontroller106 will be part of a network with other computers and processor-based controllers that are interconnected (e.g., vianetwork104, as seen inFIG. 1).
• In some embodiments, thecontroller106 is a single-board reconfigurable I/O device (sbRIO). For example, as seen inFIG. 2A, thecontroller106 is a sbRIO that includes aprocessor202 to execute the steps for controlling the electrodeposition process. Thecontroller106 also includes computer-readable media204, which can be, for example, a disk drive, optical drive, solid-state drive, flash drive, or another type of drive to store, for example, the operating system and/or application software such as, for example, waveform generation software to be executed by theprocessor202 to generate theelectrodeposition waveform signal222 and/or process software to perform other operational functions with respect to the electrodeposition process. In some embodiments, theprocessor202 generates theelectrodeposition waveform signal222 in real-time. Thecontroller106 can be used to control and/or monitor the electrodeposition process via aGUI circuit212. TheGUI circuit212 can include a display220 (e.g., an LCD, an LED display or another type of display). In some embodiments, thedisplay220 is integral to thecontroller106 and/or a remote GUI (graphical user interface) is attached to thecontroller106 via appropriate hardware. A user can use thedisplay220 and/or a remote GUI to monitor and/or control the deposition process oftank114 and/or another tank via thenetwork104.
• Thecontroller106 includes anetwork communication device210 that can be connected to an external network104 (seeFIG. 1). The external network can be a LAN, WAN, cloud, Internet, or some other network, and can be wired and/or wireless. In some embodiments, a separate communication circuit is included for thecontroller106 to communicate withtank automation controller150 via, for example,network180. Depending on the network and/or the portion of the network, the protocol used innetwork104 and/or thenetwork180 can be any standard protocol, such as, for example, Ethernet, Modbus, CAN bus, TCP/IP, or any other appropriate protocol. Of course, the protocol between thenetwork104 andnetwork180 need not be the same and can be different. In some embodiments, thetank automation controller150 communicates with othertank automation controllers152,154 via thenetwork180.
• Thecontroller106 can include adatabase206 for storing the recipe and/or other instructions. Thedatabase206 can be stored in computer-readable media204 and/or thedatabase206 can be stored on a separate device or devices. Along with thedatabase206, the computer-readable media204 can include the operating system and/or application software, such as, for example, waveform generation software and/or process software, for controlling the electrodeposition process. In some embodiments, thecontroller106 includes awaveform synthesizer circuit208 that is operatively connected to an a synthesizer control circuit configured to control thewaveform synthesizer circuit208 to generate theelectrodeposition waveform signal222 based at least in part on the recipe. In embodiments, the synthesizer control circuit is anFPGA circuit216. In embodiments, theFPGA circuit216 has a plurality of logic blocks or logic cells that are configurable. The logic blocks on theFPGA circuit216 can be configured into functional control blocks, such as, for example, sequence controllers, PID controllers, comparators, multipliers, upper and/or lower limit blocks for process parameters, summers, multiplexers, amplifiers, and/or any other type of functional logic circuit. The functional control blocks from one or more independent control circuits, such as, for example, generation of the electrodeposition waveform by controlling thewaveform synthesizer circuit208 and/or circuits to control the sequence steps of the electrodeposition process. For brevity, embodiments of thecontroller106 will be described using theFPGA circuit216. However, the synthesizer control circuit and/or the circuits to control the sequence steps are not limited to an FPGA, and other type of programmable logic circuits can be used.
• TheFPGA circuit216 controls the generating of thewaveform signal222 by modulating in real-time a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, a derivative, and/or another waveform parameter of thewaveform signal222. Specifically, theFPGA circuit216 controls thewaveform synthesizer circuit208 to generate a digital waveform signal based on the instructions in the recipe. That is, based on the recipe that is stored indatabase206 and/or received from thecontrol station102 or another controller, theFPGA circuit216 can control thewaveform synthesizer208 to generate anelectrodeposition waveform signal222 having any desired waveform profile (e.g., any desired amplitude, any desired frequency (including steady-state, e.g., zero frequency and up to the capability of the electrodeposition power supply), any desired waveform shape (e.g., a sinusoidal shape, a triangular shape (e.g., sawtooth), a square wave and/or another type of waveform shape), any desired offset, any desired slew, any desired wavelength, any desired phase, any desired velocity, and/or any desired derivative). Of course, those skilled in the art understand that “any desired” amplitude, frequency, offset, shape, etc. means up to the limits and rating of the power supplies and the other components used in the electrodeposition system.
• In addition, the desired waveform profile can be based at least in part on the desired current density generated throughout the workpiece, which can also be transmitted as part of the recipe. Thecontroller106 can use the information related to the current density and the information related to the geometric shape ofworkpiece120 to generate the desiredelectrodeposition waveform signal222. For example, at least one of the amplitude, frequency, offset, slew, wavelength, phase, velocity, and derivative of theelectrodeposition waveform signal222 can depend on the desired current density and the geometric shape and size of theworkpiece120. The digital waveform signal may then be converted to an analog signal (e.g., electrodeposition waveform signal222) by a digital-to-analog circuit, which can be incorporated in thewaveform synthesizer circuit208 and/or theFPGA circuit216. In some embodiments, thewaveform signal222 is then output from thecontroller106 via acontroller output circuit218 to the input of thepower supply126. In embodiments, theelectrodeposition signal222 output fromcontroller output circuit218 is an analog signal that is transmitted to a plurality of different types of power supplies. In some embodiments, the digital waveform signal from thewaveform synthesizer circuit208 is not converted to an analog signal, and the digital waveform signal is sent directly to thepower supply126.
• In some embodiments, thecontroller106 has more than oneoutput circuit218. For example, thecontroller106 can have up to eight output circuits. Of course, in other embodiments, thecontroller106 has more than eight output circuits. Thepower supply126 is configured to track or follow thewaveform signal222 and output theelectrodeposition waveform224 to, for example,electrodes140a,140b. That is, thepower supply126 amplifies thewaveform signal222 to generate theelectrodeposition waveform224.
• In some embodiments, thecontroller106 includes a means for receiving the feedback from theelectrodeposition process tank114. For example, thecontroller106 can include asensor management circuit214 that receives process feedback signals from one or more sensors insensor assembly162 disposed in theelectrochemical processing tank114. The feedback signals can be sent tosensor management circuit214 fromsensor assembly162 either directly or viatank automation controller150.Sensor management circuit214 can be configured to receive digital and/or analog signals. However, in some embodiments, the sensor management circuit receives the feedback via network communications. For example,sensor assembly162 can be directed connected totank automation controller150, which can then transmit the feedback signals vianetwork180. Thesensor management circuit214 can include a network communications circuit for communication withnetwork180, which can also be connected tosensor assemblies164,166 via the respectivetank automation controllers152,154, and the feedback signals fromsensor assemblies164,166 can be used in controllingpower supply126, if desired. In embodiments, thesensor assembly162 include one or more sensors such as, for example, a temperature sensor, an electrolyte level sensor, a electrolyte concentration sensor, a sensor to determine agitation rate, a sensor to determine coating thickness, and/or a sensor to determine coating resistivity. In embodiments, thesensor assembly162 also includes a current sensor and/or a voltage sensor for determining current and/or voltage betweenindividual electrodes140a,140bin thetank114. Alternatively, or in addition to the current/voltage sensors ofsensor assembly162, thepower supply126 can include current and/or voltage sensors that are then fed back tocontroller106. Of course, other types of sensors can be used based on the process parameter to be monitored. Based on the feedback signals, thecontroller106 can modify the output electrodeposition waveform (e.g., the current and/or voltage waveform) to improve the accuracy of the electrodeposition process for producing the desired coating composition and/or microstructure. For example, based on the feedback signals, theFPGA circuit216 can dynamically control, in real time,waveform synthesizer circuit208 to adjust the amplitude, frequency, offset, slew, wavelength, phase, velocity, derivative, and/or another waveform characteristic to precisely control the electrodeposition process.
• The information on generating theelectrodeposition waveform224 can be sent via the recipe. For example, in addition to including the instructions for initially generating an electrodeposition waveform, which can be any complex waveform, the recipe can also include instructions for modifying, in real-time, waveform parameters such as the waveform profile, current density, etc., of theelectrodeposition waveform224. For example, any one of the waveform profile characteristics such as, for example, the waveform shape, frequency, amplitude, offset, slew, wavelength, phase, velocity, derivative, or some other waveform profile characteristic, can be dynamically changed or modified. The instructions to change one or more of the waveform parameters, such as waveform profile, current density, etc., can be based on a predetermined time duration, based on a process step being performed or to be performed, based on a feedback from process sensors, and/or based on some other basis for modifying a waveform parameter. For example, the recipe can include instructions to use a sinusoidal waveform for a predetermined time duration (e.g., the first half of a deposition process, and then to use a square wave for the second half of the deposition process). In addition, the electrodeposition process can include different waveform profiles for some or each of the coating layers being deposited. That is, the recipe can specify the type of waveform profile and/or current density to be used for each deposition layer, and at least one of the layers can be deposited using a waveform that is different than those used to deposit the other layers. In embodiments, based on the recipe, theFPGA circuit216 appropriately controls thewaveform synthesizer circuit208 to produce the desired waveform for each layer being deposited.
• Further, in some embodiments, theFPGA circuit216 is configured such that theelectrodeposition waveform signal222 is modified based on the process feedback signals from, for example,sensor assembly162. For example, based on data from sensor assembly162 (which can relate to, e.g., process temperatures, electrolyte concentration, electrolyte level, coating thicknesses, coating resistivity, current and/or voltage readings between individual electrodes, and/or some other process/system feedback), theFPGA circuit216 can control thewaveform synthesizer circuit208 to appropriately adjust the current density, waveform profile (e.g., frequency, amplitude, offset, slew, wavelength, phase, velocity, derivative, etc.), and/or any other waveform parameter of theelectrodeposition waveform signal222.
• After thecontroller106 generates thewaveform signal222, thewaveform signal222 is then output fromcontroller output circuit218 of thecontroller106 and sent to, for example an input of anelectrodeposition power supply126. Theelectrodeposition power supply126 then generates theoutput electrodeposition waveform224 based on the receivedwaveform signal222. In embodiments, theelectrodeposition power supply126 acts as an amplifier that precisely tracks or follows theinput waveform222 from thecontroller106 and outputs anappropriate electrodeposition waveform224, which is transmitted to theelectrodes140a,140bintank114. The waveform profile (e.g., frequency, amplitude, shape, etc.) of theoutput electrodeposition waveform224 corresponds to the waveform profile of thewaveform signal222 and provides the appropriate current density.
• In some embodiments, to ensure that theoutput electrodeposition waveform224 from the electrodeposition power supply matches thewaveform signal222 from the controller, the controller takes into account the capabilities of theelectrodeposition power supply126. For example, thecontrol106 can take into account one or more waveform parameters, such as, for example, slew rate, percentage overshoot, and/or another waveform parameter that can be dependent on the characteristic of theelectrodeposition power supply126 when generating thewaveform signal222. That is, in some embodiments, when generating the waveform using thewaveform synthesizer circuit208, the waveform instructions from the recipe are implemented using known characteristics of theelectrodeposition power supply126. In some embodiments, the characteristics are common to a group of power supplies. For example, the slew-rate, percentage overshoot, or some other characteristic can be common to all power supplies of a specific type, such as, for example, the same model, the same manufacturer, the same rating or rating range, and/or some other distinguishing feature for a class of power supplies. Knowing the characteristics of the individual electrodeposition power supply and/or a class of electrodeposition power supplies provides advantages not found in prior art controllers because embodiments of controllers of the present disclosure can use the power supply characteristics information to precisely control the output electrodeposition waveform of the power supply.
• Information related to the characteristics of the individual power supplies and/or a group of power supplies can be stored in power supply driver files corresponding to the individual power supplies and/or a group of power supplies. The power supply driver files can be physically stored in, for example, thedatabase206 and/or some other location. The power supply driver file functions similar to a printer driver file that provides information on converting the data to be printed to correspond to the type of printer being used. In this case, the power supply driver file includes information on the type of power supply being used or, more particularly, the characteristics of the power supply being used. For example, the power supply driver file can include information as to whether thepower supply126 can be a forward and/or a reverse power supply and/or can include information as to the output current rating of thepower supply126. The characteristic information can be associated to individual power supplies (e.g., via the serial numbers of the power supplies) and/or associated to a class that the power supply belong to (e.g., manufacturer, model, output power range, any combination thereof, etc.).
• The waveform generation software uses the information in the power supply driver file when generating the electrodeposition waveform based on the recipe. For example, theFPGA circuit216 can modify how it controls thewaveform synthesizer circuit208 based on the information in the power supply driver file. The power supply diver file ensures that theelectrodeposition waveform signal222 matches as close as possible the waveform requested in the recipe but also ensures theelectrodeposition waveform signal222 does not go beyond the capabilities of theelectrodeposition power supply126. For example, the driver file will ensure that parameters such as the slew rate rating and percent overshoot of theelectrodeposition power supply126 are considered when generating theelectrodeposition waveform signal222. The slew rate can identify to the waveform generation software the maximum frequency and amplitude that theelectrodeposition power supply126 can be driven at and still be within acceptable limits. The percent overshoot identifies the response of theelectrodeposition power supply126 to a step change in the input signal. By considering these and other waveform parameters, the information in the power supply driver file ensures there is minimal distortion of theelectrodeposition waveform224 during the deposition process (e.g., little or no overshoot or undershoot of the electrodeposition waveform224). In addition, the power supply driver file allows the waveform instructions in the recipe to be standardized for a range of power supplies. For example, asingle controller106 can control a range of power supplies that can provide electrodeposition currents from, for example, about 200 A to about 15,000 kA. That is, by using the power supply driver file, the waveform instructions in the recipe can be generic in that the instructions are not tailored to a specific power supply or to a class of power supplies. Further, a power supply driver file may include information regarding a maximum switching speed and/or a maximum sample rate of the electrodeposition power supply. In such embodiments, a controller that has a higher sample rate than the maximum sample rate of the electrodeposition power supply may reduce the sample rate used in order to conserve resources.
• The same standardized or generic instructions can be used for different types of power supplies, for example, power supplies of different manufactures, different models, different power ratings, etc. For example, the recipe can merely provide standardized or generic instructions to produce a square wave and theFPGA circuit216 will control thewaveform synthesizer circuit208 based on the driver file to output awaveform signal222 with the proper characteristics, such as, for example, the frequency, amplitude, slew rate, etc., for theelectrodeposition power supply126 to prevent undesired distortion on theoutput electrodeposition waveform224, such as, for example, undesired overshoot and/or undershoot in thewaveform224. In embodiments, if the requested waveform in the recipe exceeds the capabilities of the electrodeposition power supply126 (e.g., the requested frequency, amplitude, etc. is beyond the capabilities of the power supply), the information in the power supply driver file alerts thecontroller106 and ultimately the operator that the requested deposition process will not work with the present equipment. In this case, in some embodiments, theFPGA circuit216 is configured to not perform the requested operation and/or stop the electrodeposition process. In still further embodiments, thecontroller106 receives a measure of the output electrodeposition waveform between a set of electrodes and compare the measured output to ensure that theoutput electrodeposition waveform224 from the electrodeposition power supply matches thewaveform signal222 from the controller.
• In some embodiments, thecontroller106 creates the power supply driver file. For example, the response of the electrodeposition power supply126 (e.g., slew rate, percent overshoot, etc.) can be measured with respect to a test waveform signal (e.g., a “calibration” waveform signal) that is output by thecontroller106. For example, as seen inFIG. 3, instep302, thecontroller106 receives a recipe that includes instructions for a test or calibration waveform. In some embodiments, the test or calibration waveform or waveforms are stored in thecontroller106, and thecontroller106 reads a stored calibration waveform when performing the calibration procedure. The test or calibration waveform can include instructions for generating a waveform having various subsections that test the capabilities of the electrodeposition power supply. Each subsection can have a different waveform shape (e.g., sinusoidal, triangular, square wave, etc.), a different frequency, a different amplitude, a different offset, a different slew, a different wavelength, a different phase, a different velocity, a different derivative, and/or some other difference between the subsections.
• Instep304, a known shunt resistor or other known load is placed across the output terminals of the electrodeposition power supply being tested. Instep306, thecontroller106 generates the waveform requested in the recipe and outputs awaveform signal222 to the input of theelectrodeposition power supply126 being tested. Instep308, desired parameters, such as, for example, the frequency, amplitude, slew rate, percentage overshoot, etc., are measured at the output of theelectrodeposition power supply126, for example, across the shunt resistor or load. Instep310, the measured parameters are compared to thewaveform signal222 output by thecontroller106 and any differences/similarities in the waveform profiles of thesignal222 and theelectrodeposition waveform224 are captured for analysis. Instep312, based on the analysis of, for example, at least one of frequency, amplitude, slew rate, and percentage overshoot, a power supply driver file is created and stored in, for example,database206 or another location for later use bycontroller106. As discussed above, thecontroller106 can then use the power supply driver file when generating thewaveform signal222 such that thewaveform signal222 matches the characteristics of thepower supply126. The power supply driver file can be associated to the specific power supply being tested, for example, based on the serial number, and/or be associated with a class of power supplies that have a similar structure as the power supply being tested.
• The embodiments of the electrodeposition system discussed above can be used in, for example, in barrel, rack, basket, and brush processing systems. However, for the sake of brevity, a generic electrodeposition process method is illustrated inFIGS. 4A to 4C.FIGS. 4A to 4C illustrate a high-level overview of anelectrodeposition process400 using a controller (e.g., an electrodeposition process that can perform a layered nanolaminate alloy coating having two or more periodic nanoscale layers that vary in electrodeposited species and/or electrodeposited structure). For purposes of brevity, the description is provided with respect tocontroller106 and related equipment. However, those skilled in the art will understand that the description is also applicable to a series or a number ofcontrollers including controllers108 and110. Instep410, the operator starts the electrodeposition either remotely (e.g., at remote computer102) or locally at thecontroller106.
• Instep412, the operator selects the standardized recipe to be used in the electrodeposition process. Once selected, thecontroller106 can request to receive the recipe from aremote control station102, another controller, and/or, if stored in the controller, read the recipe that corresponds to the selected electrodeposition process fromdatabase206. As discussed above, the recipe includes instructions for generating anelectrodeposition waveform224 based on, for example, the sequencing step, the nanoscale layer to be deposited, the species to be deposited, the structure to be deposited, and/or feedback from the electrodeposition process. The recipe can also include the current density, voltage, waveform phase, and/or another waveform parameter to be used for the electrodeposition process and/or each step of the electrodeposition process. In addition, the recipe can include instructions for controlling other devices (e.g., pump132, agitator170,control valve156, etc.).
• Also, as discussed above, the recipe information is in a standardized format so that a single generic recipe can be used with various workpieces, power supplies, etc. Instep414, the operator inputs process specific configuration information regarding the deposition process. The inputted information can be information related to the geometry and/or size of the workpiece (e.g., surface area) to be electroplated, information related to the electrodeposition power supply (e.g., model no., manufacturer, the amperage rating, slew rate, etc.), and information related to the add back chemicals (e.g., the type and/or quantity of chemicals to add back, amp-hour at which the chemicals are added, the concentrations of the chemicals, etc.). Of course, the operator can also input any other desired information related to the process. Instep416, the controller makes adjustments to the standardized recipe based on the process specific information input by the operator instep414. For example, based on the inputted workpiece surface geometry and/or area, thecontroller106 can make adjustments to, for example, the waveform profile, the time duration and amp-hour accumulation, and/or some other adjustment, as appropriate, for the recipe steps. Instep418, thecontroller106 executes the steps of the recipe, which are shown inFIG. 4B.
• As shown inFIG. 4B, thecontroller106 sequences through the process steps for the deposition process. For each of the process steps, based on the recipe, thecontroller106 controls the species and/or the structure of the layer to be deposited by setting and/or controlling the current density, the profile of the electrodeposition waveform, the flow rate, the process temperature, the electrolyte level, the electrolyte concentration, any combination thereof, etc. The number and nature of the process steps in the recipe can vary depending on the type of deposition process. Turning toFIG. 4B, instep422, thecontroller106 reads the next step in the recipe. Instep424a, thecontroller106 sets theoutput waveform224 of thepower supply126 toelectrodes140a,140b. For example, based on the geometry ofworkpiece120 and/or other information in the current recipe step, thecontroller106 generates theelectrodeposition waveform signal222 having, for example, the desired waveform profile and the desired current density using, for example, the waveform algorithms discussed below. As discussed above, thewaveform signal222 can have any desired waveform profile (e.g., based on the recipe, thecontroller106 can generate any complex waveform profile by modulating or changing in real-time the waveform shape, the frequency, the amplitude, the offset, the slew, the wavelength, the phase, the velocity, the derivative, and/or some other waveform parameter). In some embodiments, in generating thewaveform signal222, thecontroller106 uses the power supply driver file forelectrodeposition power supply126 to ensure thewaveform signal222 matches the characteristics of theelectrodeposition power supply126. As discussed above, theelectrodeposition waveform signal222 is output from thecontroller106 to an input of anelectrodeposition power supply126. Theelectrodeposition power supply126 then tracks and amplifies theelectrodeposition waveform signal222 and outputs theelectrodeposition waveform224, which corresponds to theelectrodeposition waveform signal222.
• During the setting of the output waveform instep424a, thecontroller106 concurrently performsstep424b, which monitors the process steps and/or process feedback fromsensor assembly162 related to, for example, electrolyte temperature, electrolyte level, electrolyte concentration, thickness of the coating layers, coating resistivity, current, and/or voltage readings between individual electrodes and/or some other process/system feedback. Duringstep424b, thecontroller106 executes the steps shown inFIG. 4C. Duringstep432 ofFIG. 4C, thecontroller106 receives process feedback signals as discussed above. For example, instep432, thecontroller106 and/or thetank controller150 can receive feedback such as coating resistivity, electrolyte temperature, or process chemistries such as electrolyte concentration, etc. In addition, instep434, the accumulated amp-hours for thepower supply126 are received from thepower supply126 or calculated bycontroller106. The accumulated amp-hours can be used to control various equipment in the deposition process. For example, the accumulated amp-hours can be used to controlpump132 to add back some of the chemicals used in the electrodeposition process. In addition, the accumulated amp-hours and feedback of the process chemistries can be used to determine coating thickness.
• Instep436, based on the instructions in the recipe and/or on the monitored feedback signals and/or the calculations ofsteps432 and434, thecontroller106 determines whether theelectrodeposition waveform224 should remain the same, be switched (e.g., to a preloaded waveform), or be modified, or whether an entirely new custom waveform should be created. For example, if the determination is to keep the same waveform, thecontroller106 continues to generate the presentelectrodeposition waveform signal222. If the determination is to switch waveforms, thecontroller106 switches to a different electrodeposition waveform signal (e.g., to a preloaded waveform such as a standard sine wave, square wave, triangular wave, etc.). If the determination is to modify the waveform, thecontroller106 modifies thepresent electrodeposition waveform222 using, for example, the examples of waveform algorithms discussed below and/or another algorithm, and if the determination is to create a new custom waveform, the controller creates anew electrodeposition waveform222 using, for example, the waveform algorithms discussed below, and/or another algorithm.
• Oncestep436 is completed, the controller loops back to step424band advances to step426. Instep426, the controller determines whether the criteria for completing the current process step have been met. For example, the criteria for completing the current process step can be based on the amount of time the system has been in the current step, the accumulated amp-hours, the process chemistries, the calculated coating thickness, and/or some other criteria. If the criteria have not been met, thecontroller106 loops back to thestep424b. If the criteria have been met, thecontroller106 advances to step428. Instep428, thecontroller106 checks to see if there are additional process steps or not. If so, the controller loops back to step422 and starts the next step. If there are no additional steps, the controller returns to step418 ofFIG. 4A and advances to step420 to stop the process. Of course, thecontroller106 can be configured such that the process can also be terminated at any time due to, for example, a manual stop command, a feedback signal, an error signal, etc.
• As discussed above, waveform algorithms can be used to create the initialelectrodeposition waveform signal222 and/or to subsequently change or modify theelectrodeposition waveform signal222. In some embodiments, to generate theelectrodeposition waveform signal222, thecontroller106 includes a loop waveform algorithm that initiates a nested loop-type control sequence to generate a waveform that forms, at least in part, theelectrodeposition waveform signal222. In some embodiments, to generate theelectrodeposition waveform signal222, thecontroller106 includes a second-order waveform algorithm that combines the characteristics of two or more base or first-order waveforms to generate a second-order waveform that forms, at least in part, theelectrodeposition waveform signal222. In some embodiments, thecontroller106 includes both the loop waveform algorithm and the second-order waveform algorithm to generate a waveform that forms, at least in part, theelectrodeposition waveform signal222.
• In the nested loop-type control sequence of the loop waveform algorithm, an output waveform is generated by using, for example,waveform synthesizer circuit208 to serially combine (or sequence) sub-waveform sequences (e.g., serially combine different waveforms or portions of different waveforms), and then repeat the sequencing steps to produce one full cycle of theelectrodeposition waveform signal222. The full waveform cycle, which includes the nested sub-waveform cycles, can then be repeated or looped as desired (e.g., the nested loop control sequence can be repeated or looped for a predetermined number of cycles, for a predetermined time period, for a given process step or steps, and/or continuously until stopped based on, e.g., a process feedback signal from sensor assembly162 (e.g., coating thickness, coating resistance, electrolyte concentration, or some other feedback signal) and/or a stop command for the deposition process). In some embodiments, theFPGA circuit216 is configured to control towaveform synthesizer circuit208 such that sub-waveforms are generated a desired number of times and in a desired sequence order to generate the fullelectrodeposition waveform signal222. For example, if anelectrodeposition waveform signal222 that has three sinewave cycles followed by three triangle-shaped waveform cycles is required, theFPGA circuit216 can be configured to controlwaveform synthesizer circuit208 such that three cycles of a sinewave sub-waveform are generated and then immediately two cycles of a triangle-shaped sub-waveform are generated to create one full cycle of theelectrodeposition waveform signal222. TheFPGA circuit216 then repeats or loops the full waveform generation cycle, which includes the nested sub-waveform generation cycles, as desired. Of course, the type and number of cycles of sub-waveforms and the sequencing order of the sub-waveforms is not limited to the above embodiment, and any desired sub-waveform type, sub-waveform cycle count, and sub-waveform sequence order can be used. In addition, the sub-waveform types, the sub-waveform cycle count, and/or the sub-waveform sequencing order used in theelectrodeposition waveform signal222 can be changed dynamically by thecontroller106 based on the process step, a feedback signal fromsensor assembly162, a predetermined time period, a predetermined cycle count, etc. For example, the sinewave/triangle waveform discussed above can be changed to a sinewave/square wave waveform based on a predetermined criteria related to, for example, electrolyte concentration, electrolyte level, electrolyte temperature, coating thickness, coating resistance, the process step, a predetermined time period, number of cycles, any combination thereof, etc.
• In addition to the loop waveform algorithm, thecontroller106 can also include a second-order waveform algorithm. The second-order waveform algorithm modulates one or more characteristics (e.g., frequency, amplitude, offset, slew, wavelength, phase, velocity, derivative or some other waveform property) of a base or first-order waveform using characteristics (e.g., frequency, amplitude, offset, slew, wavelength, phase, velocity, derivative, and/or some other waveform property) of one or more additional first-order waveforms to generate a desired output waveform (or second-order waveform). The modulation algorithm can include, for example, additive functions, subtractive functions, multiplying functions, and/or some other functional relationship between the one or more characteristics of the base first-order waveform and the characteristics of the one or more additional first-order waveforms to modify the base first-order waveform and generate a second-order waveform.
• The modulation of the characteristic(s) of the base first-order waveform can be selective in that not all of the base waveform characteristics are subject to being changed. For example, only the amplitude of the base first-order waveform can be changed while the remaining characteristics, such as, for example, the frequency, offset, etc., are not modified. The functional relationship can be between characteristics that are the same between the waveforms (e.g., amplitude to amplitude, frequency to frequency, offset to offset, etc.). For example, the amplitude A₁of a base first-order waveform can be modified using the information (e.g., magnitude and/or polarity) of an amplitude A₂of another first-order waveform to generate a second-order waveform with an amplitude A₃that can be, for example, c₁A₁+c₂A₂, c₁A₁−c₂A₂, c₁A₁*c₂A₂, c₁A₁/c₂A₂(where c₁and c₂are constants), or some other functional relationship. The frequency, offset, or another waveform characteristic of a base first-order waveform can similarly be modulated using the respective same characteristic of other waveforms. However, the functional relationship can also be between waveform characteristics that are not the same. For example, the amplitude of the base first-order waveform can be modified using the frequency or some characteristic other than the amplitude of another first-order waveform to generate the second-order waveform. The functional relationship can have a one-to-one characteristic correlation in that one characteristic (e.g., amplitude) of the base first-order waveform is modulated by one characteristic (e.g., frequency) of another first-order waveform. However, the functional relationship need not be a one-to-one characteristic relationship. For example, the amplitude of a first-order waveform can be used to modify both the amplitude and frequency of the base first-order waveform to generate the second-order waveform or both the amplitude and frequency of the first-order waveform can be used to modify just the amplitude (or another characteristic) of the base first-order waveform to generate the second-order waveform. That is, one or more waveform characteristics of a base first-order waveform can be modified based on one or more characteristics of another first-order waveform to generate the second-order waveform.
• In the above embodiments, the “base” first order-waveform can itself be a combination of two or more first-order waveforms. Accordingly, any combination of waveform characteristics of a first set of one or more first-order waveforms can be used to modify any combination of waveform characteristics of a second set of one or more first-order waveforms in generating a second-order waveform. The resulting second-order waveforms can be periodic or non-periodic and can result from a modulation of the same type of first-order waveforms (e.g., two or more sinusoidal waveforms, two or more square waves, two or more triangular waveforms, etc.) or can result from a modulation of two or more different types of waveforms (e.g., one or more sinusoidal waveforms with one or more square waves or one or more triangular waveforms, etc.). In some embodiments, the currentelectrodeposition waveform signal222 is the base first-order waveform that is then modulated by using the characteristics of one or more other first order waveforms to generate a newelectrodeposition waveform signal222.
• The modulation of a first-order waveform based on the characteristics of another first-order waveform to generate a second-order waveform is graphically illustrated inFIG. 5A.FIG. 5A illustrates asecond order waveform506 that was generated using two first-order waveforms502 and504. Thesecondary waveform506 can be either a voltage waveform or a current waveform. In the embodiment ofFIG. 5A, a base first-order waveform504 is modulated using the characteristics of another first-order waveform502 to generate the second-order waveform506. The base first-order waveform signal504 is a sinusoidal waveform having, for example, a frequency F₁and an amplitude A₁. However, thewaveform504 can have any desired waveform profile. During the deposition process, thecontroller106 may determine that the current electrodeposition waveform signal222 (which can be the waveform504) should be switched, for example, to preloaded waveform, or be modified or that an entirely newelectrodeposition waveform signal222 should be created because, e.g., the current process step and/or feedback signal(s) from thesensor assembly162 requires it. If it is determined that thewaveform signal222 should be modified or a new waveform created, thecontroller106 can generate a second-order waveform506 using the characteristics of the base first-order waveform504 and another first-order waveform502. The second-order waveform506 will then be the newelectrodeposition waveform signal222 that can then be transmitted to theelectrodeposition power supply126, as discussed above.
• As seen in the embodiment ofFIG. 5A, the second-order waveform506 is generated by modifying the amplitude A₁of the base first-order waveform504 based on the absolute magnitude of amplitude A₂of first-order waveform502. In this example, the frequency F₁of thefirst order waveform504 remains unchanged. Thus, in this example, after the modification, a sinusoidal second-order waveform504 is generated having a frequency F₁and an amplitude (A₁+|A₂|). That is, the second order waveform oscillates at a fixed frequency while varying the amplitude over time. Of course, any combination of waveform characteristics of the two or more first-order waveforms can be employed to generate the second-order waveform. For example, in another embodiment, the second order waveform has a frequency that varies and amplitude that remains the same. By dynamically changing the second-order waveform profile (e.g., the combination of frequency, amplitude, waveform shape, offset, slew, wavelength, phase, velocity, derivative, etc.), the current and/or voltage applied during the electrochemical deposition adjusts for and/or drives variations in the composition and/or the microstructure of the nanolaminate composite coating.
• The first-order waveforms502,504 can be “template waveforms” that are stored in thecontroller106 or another location. Thecontroller106 can have a plurality of first-order template waveforms that are configured to facilitate the generation of second-order waveforms that correspond to specific process steps and/or specific deposition processes. For example, a first set of template waveforms may be beneficial in generating second-order waveforms for the deposition of a first coating layer and a second set of template waveforms may be beneficial in generating second-order waveforms for the deposition of another coating layer in the deposition process. Thecontroller106 can be configured to use the proper set of template waveforms based on, for example, the type of deposition process, the process step being performed, and/or the feedback signal(s) fromsensor assembly162.
• By incorporating either or both the loop waveform algorithm and/or the second-order waveform algorithm, embodiments of thecontroller106 are able to produce complex waveforms that are highly complex as shown inFIG. 5B. As seen inFIG. 5B, theelectrodeposition waveform510, includes sinusoidal waveform portions, triangular waveform portions and square wave portions of different frequencies, amplitudes, and offsets. Prior art electrodeposition systems are not capable of dynamically creating or subsequently modifying such complex electrodeposition waveforms.
• In the above embodiments, although oneelectrodeposition waveform signal222 is shown being output from thecontroller106, thewaveform synthesizer circuit208 and associated circuitry can provide a plurality of electrodeposition waveform signals, each of which can be connected via a separatecontroller output circuit218 to respective electrodeposition power supplies that generate the respective electrodeposition waveforms. For example, in some embodiments, thecontroller106 outputs up to eight waveform signals. Of course, depending on the application, thecontroller106 can be configured to provide more than eight waveform signals. Because theFPGA circuit216 can provide parallel processing, the control circuits in theFPGA circuit216 can be configured to simultaneously and independently control thewaveform synthesizer circuit208 to generate each of the different electrodeposition waveforms. The electrodeposition waveform signals can all be the same, all different, or any combination thereof.
• The plurality of electrodeposition waveforms can be transmitted to respective sets of electrodes that are disposed in the same tank, in respectively different tanks, or any combination thereof. For example, as shown inFIG. 2B, anelectrodeposition power supply126′ is connected to a first set ofelectrodes140a,140band anelectrodeposition power supply126″ is connected to a second set ofelectrodes140a,140c. Thecontroller106 generates the electrodeposition waveform signals that are then transmitted to therespective power supplies126′ and126″ and thus controls the electrodeposition waveforms transmitted to the electrode sets. In some embodiments, thecontroller106 simultaneously and independently controls the waveform parameters of the individual electrodeposition waveforms transmitted to the electrode sets (e.g., in order to account for variances in the process). For example, in some embodiments, thecontroller106 is configured to simultaneously and independently control a current density, a voltage, a waveform phase, or combination thereof, of an electrodeposition waveform frompower supply126′ to a set ofelectrodes140a,140band control a current density, a voltage, a waveform phase, or combination thereof, of an electrodeposition waveform frompower supply126″ to a set ofelectrodes140a,140cin theelectrochemical processing tank114.
• By controlling the current densities, the voltages and/or the waveform phases of the respective electrodeposition waveforms, the deposition process onworkpiece120 can be adjusted or modified to compensate for variations in the electrodeposition process on theworkpiece120. For example, variations in the electrolyte concentration (e.g., from one end of theworkpiece120 to the other end, from the ends to the middle ofworkpiece120, or variations in the process due to some other reason) can be compensated for by individually adjusting the current density, the voltage, and/or the waveform phase of the respective electrodeposition waveform transmitted to the set ofelectrodes140a,140band140a,140c. These variations can be sensed by one or more sensors in, for example,sensor assembly162, and/or these variations may be known to occur theoretically and/or by subsequent analysis of the workpiece. By compensating for these variations, the coating layers acrossworkpiece120 can be deposited evenly or be deposited to have any other desired layering profile.
• The current densities, voltages, and/or the waveform phases, respectively, between the corresponding electrodeposition waveforms can be the same or different. Of course, the controlling of multiple electrode sets by thecontroller106 is not limited to electrode sets in a single tank. In other embodiments, the controller controls a plurality of electrodeposition waveforms from respective power supplies to one or more sets of electrodes in different tanks (e.g., in systems where each tank has its own workpiece (e.g., seeFIG. 1) and/or in systems where a workpiece or workpieces are transferred from one tank to another during the electrodeposition process). In such systems, the controller appropriately controls the current density, the voltage, and/or the waveform phase of each electrodeposition waveform to the respective electrode sets in order to ensure the workpiece(s) transferred from tank to tank and/or in the respective tanks have the desired layer profile. Of course, the adjustments in the current densities, voltages, and/or waveform phases between the electrode sets can be in addition to the electrodeposition waveform profile and current density adjustments discussed above. That is, along with modulating theelectrodeposition waveform signal222 based on the process step and/or feedback signal(s) as discussed above, in systems that provide more than one electrodeposition waveform signal to more than one set of electrodes, theelectrodeposition waveform signal222 can be further adjusted based on variations in the process between the electrode sets.
• In the above embodiments that include a plurality of electrode sets, thecontroller106 was configured to generate more than one electrodeposition waveform signal corresponding to each of the electrode sets. However, multiple controllers that communicate with each other via, for example, network104 (seeFIG. 1) can also provide the same functionality of adjusting for variances in the electrodeposition process. That is, thecontrollers106,108,110 can communicate with each other to appropriately adjust the electrodeposition process in therespective tanks114,116,118 to adjust for variances in the deposition process as discussed above.
• In addition, along with controlling the waveform, theFPGA circuit216 ofcontroller106 can be configured to simultaneously control other process devices such as, for example, thepump132, agitator170,control valve156, etc. Because theFPGA circuit216 can provide parallel processing, the control circuits in theFPGA circuit216 can be configured to simultaneously and independently control each of the different electrodeposition waveforms and/or other control functions without adversely affecting the real-time processing capability ofcontroller106.
• The following embodiments are included within the scope of the disclosure:
• 1. A system for depositing a layered nanolaminate alloy, comprising:
• one or more electrochemical processing tanks, each electrochemical processing tank having one or more sets of electrodes for use in depositing multilayer nanolaminate coatings or claddings on one or more substrates;
• one or more electrodeposition power supplies, each power supply respectively connected to a corresponding electrode set of the one or more sets of electrodes, each power supply having an analog input connection for receiving a complex waveform signal corresponding to a desired electrodeposition waveform to be output from the power supply, each power supply configured to amplify the received complex waveform signal to generate the desired electrodeposition waveform and transmit the desired electrodeposition waveform to the corresponding electrode set in the one or more sets of electrodes, each desired electrodeposition waveform from the corresponding power supply generating the deposition of at least one layer of the multilayer nanolaminate coatings or claddings on the corresponding substrate; and
• a processor-based controller having
• • a waveform synthesizer circuit configured to generate each complex waveform signal to be transmitted to the analog input of the respective electrodeposition power supply,
  • a synthesizer control circuit configured to control the waveform synthesizer circuit, the synthesizer control circuit, based at least in part on a recipe having information related to the depositing of the multilayer nanolaminate coatings or claddings, controlling the generating of the respective complex waveform signal by modulating in real-time at least one of a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, and a derivative of the complex waveform signal, and
  • one or more controller output circuits respectively connected to the analog input of each electrodeposition power supply, each controller output circuit configured to transmit the corresponding complex waveform signal to the analog input of each electrodeposition power supply.
• 2. The system of embodiment 1, wherein the synthesizer control circuit includes a field-programmable gate array.
• 3. The system of embodiment 1, wherein the recipe is stored in the processor-based controller and wherein the recipe includes instructions for generating the respective electrodeposition waveform,
• wherein the instructions include at least one of a current density, a current waveform profile, and a voltage waveform profile of the respective electrodeposition waveform.
• 4. The system of embodiment 1, wherein the one or more sets of electrodes includes a cathode and one, two, three, four, or more anodes and wherein the processor-based controller transmits the desired electrodeposition waveform to the one or more sets of electrodes.
• 5. The system of embodiment 1, wherein the modulating in real-time at least one of a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, and a derivative of the complex waveform signal includes modulating one or more first characteristics of a base first-order waveform using one or more second characteristics of at least one other first-order waveform based on a functional relationship between the first and second characteristics to generate the respective complex waveform signal.
• 6. The system of embodiment 5, wherein the base first-order waveform and the at least one other first-order waveform are selected from a plurality of preloaded waveforms that are stored in the processor-based controller.
• 7. The system of embodiment 6, wherein two or more electrodeposition power supplies are connected to the processor-based controller and wherein the power supplies control individual portions of a cathode bus bar along a length of individual ones of the one or more electrochemical processing tanks.
• 8. The system of embodiment 5, wherein the first characteristics of the base first-order waveform and the second characteristics of the one or more other first-order waveforms include a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, or a derivative of the respective first-order waveform.
• 9. The system of embodiment 5, wherein the base first-order waveform is the respective complex waveform signal, and
• wherein the at least one other first-order waveform is selected from a plurality of preloaded waveforms that are stored in the processor-based controller.
• 10. The system of embodiment 1, wherein the modulating in real-time at least one of a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, and a derivative of the complex waveform signal includes serially combining sub-waveform sequences to generate the respective complex waveform signal.
• 11. The system of embodiment 10, wherein the serially combining sub-waveform sequences includes generating the sub-waveforms for a desired number of cycle counts and in a desired sequence order.
• 12. The system of embodiment 11, wherein at least one of the sub-waveform cycle count and the sub-waveform sequence order is dynamically modified based on at least one of a predetermined time period, a predetermined sub-waveform cycle count, a process step of the deposition of the nanolaminate coatings or claddings, and a feedback signal related to the deposition of the nanolaminate coatings or claddings.
• 13. The system of embodiment 12, wherein at least one of the sub-waveform cycle count and the sub-waveform sequence order is dynamically modified based on the feedback signal, and
• wherein the feedback signal relates to at least one of an electrolyte concentration, an electrolyte level, an electrolyte temperature, a coating thickness, and a coating resistance.
• 14. The system of embodiment 1, wherein the processor-based controller further includes a network communications circuit communicatively connected to an external communications network, and a communication input circuit operatively connected to the network communication circuit and configured to receive, from a remote computing device, the recipe.
• 15. The system of embodiment 14, further comprising:
• one or more other processor-based controllers connected to the external communications network,
• wherein the processor-based controller is connected to the one or more other processor-based controllers via the external communications network and each of the processor-based controllers represents a node on the external communication network, and
• • wherein the recipe from the remote computing device is received by each of the nodes of the external communication network.
• 16. The system of embodiment 14, further comprising:
• one or more other processor-based controllers connected to the external communications network,
• wherein the processor-based controller is connected to the one or more other processor-based controllers via the external communications network and each of the processor-based controllers represents a node on the external communications network, and
• wherein the processor-based controller is further configured to transmit the instructions or a portion of the instructions in the recipe to the one or more other processor-based controllers via the external communications network.
• 17. The system of embodiment 2, wherein the processor-based controller is configured to generate a plurality of complex waveform signals and the field-programmable gate array includes parallel processing capability to simultaneously and independently control the waveform synthesizer circuit to generate each of the plurality of complex waveform signals.
• 18. The system of embodiment 17, wherein the processor-based controller is configured to adjust at least one of a current density, a voltage and a waveform phase of the respective desired electrodeposition waveform to compensate for variations in the deposition of the nanolaminate coatings or claddings on the corresponding substrate.
• 19. The system of embodiment 1, wherein the processor-based controller is configured to use a power supply driver file corresponding to at least one of the one or more electrodeposition power supplies to take into account at least one characteristic of the at least one of the one or more electrodeposition power supplies.
• 20. The system of embodiment 19, wherein the at least one characteristic includes at least one of a slew-rate and a percent overshoot.
• 21. The system of embodiment 19, wherein the power supply driver file is based on a calibration procedure performed by the processor-based controller on the at least one of the one or more electrodeposition power supplies, and
• wherein the calibration procedure includes transmitting a calibration waveform signal to the at least one of the one or more electrodeposition power supplies, placing a known load across output terminals of the at least one of the one or more electrodeposition power supplies, measuring at least one of a slew rate and a percent overshoot of the at least one of the one or more electrodeposition power supplies, and creating the power supply driver file using, at least in part, the measured results of the calibration procedure.
• 22. The system of embodiment 1, further comprising:
• one or more tank automation controllers to control at least one of an electrolyte level, an electrolyte temperature, an agitation rate, and a flow rate of the respective electrochemical processing tank.
• 23. A controller for an electrodeposition process, comprising:
• a waveform synthesizer circuit configured to generate a complex waveform signal corresponding to a desired electrodeposition waveform to be output from an electrodeposition power supply,
• a synthesizer control circuit configured to control the waveform synthesizer circuit, the synthesizer control circuit, based at least in part on a recipe having information related to the electrodeposition process, controlling the generating of the complex waveform signal by modulating in real-time at least one of a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, and a derivative of the complex waveform signal, and
• a controller output circuit configured to transmit the complex waveform signal to an analog input of the electrodeposition power supply.
• 24. The controller of embodiment 23, wherein the synthesizer control circuit includes a field-programmable gate array.
• 25. The controller of embodiment 23, wherein the recipe includes instructions for generating the electrodeposition waveform, and
• wherein the instructions include at least one of a current density, a current waveform profile, and a voltage waveform profile of the electrodeposition waveform.
• 26. The controller of embodiment 23, wherein the recipe is stored in the controller.
• 27. The controller of embodiment 23, wherein the modulating in real-time at least one of a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, and a derivative of the complex waveform signal includes modulating one or more first characteristics of a base first-order waveform using one or more second characteristics of at least one other first-order waveform based on a functional relationship between the first and second characteristics to generate the complex waveform signal.
• 28. The controller of embodiment 27, wherein the base first-order waveform and the at least one other first-order waveform are selected from a plurality of preloaded waveforms that are stored in the controller.
• 29. The controller of embodiment 28, wherein the plurality of preloaded waveforms includes a triangular waveform, a sinewave, a square wave, or a custom waveform.
• 30. The controller of embodiment 27, wherein the first characteristics of the base first-order waveform and the second characteristics of the at least one other first-order waveform include a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, or a derivative of the respective first-order waveform.
• 31. The controller of embodiment 27, wherein the base first-order waveform is the complex waveform signal, and
• wherein the at least one other first-order waveform is selected from a plurality of preloaded waveforms that are stored in the controller.
• 32. The controller of embodiment 23, wherein the modulating in real-time at least one of a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, and a derivative of the complex waveform signal includes serially combining sub-waveform sequences to generate the complex waveform signal.
• 33. The controller of embodiment 32, wherein the serially combining sub-waveform sequences includes generating the sub-waveforms for a desired number of cycle counts and in a desired sequence order.
• 34. The controller of embodiment 33, wherein at least one of the sub-waveform cycle count and the sub-waveform sequence order is dynamically modified based on at least one of a predetermined time period, a predetermined sub-waveform cycle count, a process step of the electrodeposition process, and a feedback signal related to the electrodeposition process.
• 35. The controller of embodiment 34, wherein at least one of the sub-waveform cycle count and the sub-waveform sequence order is dynamically modified based on the feedback signal, and
• wherein the feedback signal relates to at least one of an electrolyte concentration, an electrolyte level, an electrolyte temperature, a coating thickness, and a coating resistance.
• 36. The controller of embodiment 23, wherein the controller further includes a network communications circuit communicatively connected to an external communications network, and a communication input circuit operatively connected to the network communications circuit and configured to receive, from a remote computing device, the recipe.
• 37. The controller of embodiment 36, wherein the controller is connected to one or more other controllers via the external communications network and each of the controllers represents a node on the external communications network.
• 38. The controller of embodiment 37, wherein the controller is further configured to transmit the instructions or a portion of the instructions in the recipe to the one or more other controllers via the external communications network.
• 39. The controller of embodiment 24, wherein the controller is configured to generate a plurality of complex waveform signals corresponding to a plurality of electrodeposition waveforms, and
• wherein the field-programmable gate array includes parallel processing capability to simultaneously and independently control the waveform synthesizer circuit to generate each of the plurality of complex waveform signals.
• 40. The controller of embodiment 39, wherein the controller is configured to adjust at least one of a current density, a voltage, and a waveform phase of the respective electrodeposition waveform to compensate for variations in the electrodeposition process.
• 41. The controller of embodiment 23, wherein the controller is configured to use a power supply driver file corresponding to at least one of one or more electrodeposition power supplies to take into account at least one characteristic of the at least one of the one or more electrodeposition power supplies.
• 42. The controller of embodiment 41, wherein the at least one characteristic includes at least one of a slew-rate and a percent overshoot.
• 43. The controller of embodiment 41, wherein the power supply driver file is based on a calibration procedure performed by the controller on the at least one of the one or more electrodeposition power supplies, and
• wherein the calibration procedure includes transmitting a calibration waveform signal to the at least one of the one or more electrodeposition power supplies, placing a known load across output terminals of the at least one of the one or more electrodeposition power supplies, measuring at least one of a slew rate and a percent overshoot of the at least one of the one or more electrodeposition power supplies, and creating the power supply driver file using, at least in part, the measured results of the calibration procedure.
• 44. A method for electrodepositing a coating or cladding on a substrate, the method comprising:
• selecting a standardized recipe corresponding to a desired electrodeposition process;
• adjusting the standardized recipe based on information related to at least one of the substrate geometry, the substrate surface area, and an electrodeposition power supply used for electrodepositing the coating or cladding on the substrate;
• generating a complex waveform signal corresponding to a desired electrodeposition waveform based on the adjusted recipe;
• providing the complex waveform signal to the electrodeposition power supply;
• generating an electrodeposition waveform in the power supply based on the complex waveform signal;
• outputting the electrodeposition waveform from the power supply to an electrode set corresponding to the substrate; and
• depositing nanolaminate coatings or claddings on the substrate based on the electrodeposition waveform;
• wherein the outputting includes modulating in real-time at least one of a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, and a derivative of the complex waveform signal based, at least in part, on a recipe having information related to the depositing of the nanolaminate coatings or claddings.
• 45. The method of embodiment 44, wherein the generation of the complex waveform signal includes synthesizing the complex waveform signal using a field-programmable gate array.
• 46. The method of embodiment 44, wherein the recipe includes instructions for generating the electrodeposition waveform, and
• wherein the instructions include at least one of a current density, a current waveform profile and a voltage waveform profile of the electrodeposition waveform.
• 47. The method of embodiment 44, wherein the modulating in real-time of at least one of a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, and a derivative of the complex waveform signal includes modulating one or more first characteristics of a base first-order waveform using one or more second characteristics of at least one other first-order waveform based on a functional relationship between the first and second characteristics to generate the complex waveform signal.
• 48. The method of embodiment 47, wherein the base first-order waveform and the at least one other first-order waveform are selected from a plurality of preloaded waveforms that are stored in the processor-based controller.
• 49. The method of embodiment 48, wherein the plurality of preloaded waveforms includes a triangular waveform, a sinewave, a square wave, or a custom waveform.
• 50. The method of embodiment 47, wherein the first characteristics of the base first-order waveform and the second characteristics of the one or more other first-order waveforms include a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, or a derivative of the respective first-order waveform.
• 51. The method of embodiment 47, wherein the base first-order waveform is the complex waveform signal, and
• wherein the at least one other first-order waveform is selected from a plurality of preloaded waveforms.
• 52. The method of embodiment 44, wherein the modulating in real-time of at least one of a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, and a derivative of the complex waveform signal includes serially combining sub-waveform sequences to generate the complex waveform signal.
• 53. The method of embodiment 52, wherein the serially combining sub-waveform sequences includes generating the sub-waveforms for a desired number of cycle counts and in a desired sequence order.
• 54. The method of embodiment 53, wherein at least one of the sub-waveform cycle count and the sub-waveform sequence order is dynamically modified based on at least one of a predetermined time period, a predetermined sub-waveform cycle count, a process step of the deposition of the coatings or claddings, and a feedback signal related to the deposition of the coatings or claddings.
• 55. The method of embodiment 54, wherein at least one of the sub-waveform cycle count and the sub-waveform sequence order is dynamically modified based on the feedback signal, and
• wherein the feedback signal relates to at least one of an electrolyte concentration, an electrolyte level, an electrolyte temperature, a coating thickness, and a coating resistance.
• 56. The method of embodiment 45, further comprising generating a plurality of complex waveform signals,
• wherein the field-programmable gate array includes parallel processing capability to simultaneously and independently generate each of the plurality of complex waveform signals.
• 57. The method of embodiment 44, wherein the generating of the complex waveform signal takes into account at least one characteristic of the electrodeposition power supply.
• 58. The method of embodiment 57, wherein the at least one characteristic includes at least one of a slew-rate and a percent overshoot.
• 59. A system, comprising:
• an electrochemical processing tank;
• a set of electrodes configured to be used in depositing a multilayer nanolaminate coatings on a workpiece;
• an electrodeposition power supply connected to the set of electrodes, the electrodeposition power supply comprising an input connection configured to receive a complex waveform signal, the electrodeposition power supply configured to amplify the complex waveform signal to generate a desired electrodeposition waveform, the desired electrodeposition waveform configured to deposit at least one layer of the multilayer nanolaminate coating on the workpiece; and
• a processor-based controller comprising:
• a waveform synthesizer circuit configured to generate the complex waveform signal;
• a synthesizer control circuit configured to control the waveform synthesizer circuit based at least in part on a recipe having parameters related to the depositing at least one layer of the multilayer nanolaminate coating, the synthesizer control circuit configured to control the complex waveform signal generated by modulating in real-time a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, a derivative of the complex waveform signal, or a combination thereof; and
• a controller output circuit connected to the input of the electrodeposition power supply, the controller output circuit configured to transmit the complex waveform signal to the input.
• 60. A system, comprising:
• an electrochemical processing tank;
• a set of electrodes, in use, depositing a multilayer nanolaminate coatings on a workpiece;
• an electrodeposition power supply connected to the set of electrodes, the electrodeposition power supply comprising an input connection that, in use, receives a complex waveform signal, the electrodeposition power supply, in use, amplifies the complex waveform signal to generate a desired electrodeposition waveform, wherein the desired electrodeposition waveform, in use, deposits at least one layer of the multilayer nanolaminate coating on the workpiece; and
• a processor-based controller comprising:
• a waveform synthesizer circuit that, in use, generates the complex waveform signal;
• a synthesizer control circuit that, in use, controls the waveform synthesizer circuit based at least in part on a recipe having parameters related to the depositing at least one layer of the multilayer nanolaminate coating, the synthesizer control circuit, in use, controlling the complex waveform signal generated by modulating in real-time a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, a derivative of the complex waveform signal, or a combination thereof; and
• a controller output circuit connected to the input of the electrodeposition power supply, wherein the controller output circuit, in use, transmits the complex waveform signal to the input.
• 61. A system, comprising:
• an electrochemical processing tank;
• a set of electrodes for use in depositing a multilayer nanolaminate coatings on a workpiece;
• an electrodeposition power supply for amplifying a complex waveform signal to generate a desired electrodeposition waveform for depositing at least one layer of the multilayer nanolaminate coating on the workpiece, the electrodeposition power supply comprising an input connection for receiving the complex waveform signal; and
• a processor-based controller comprising:
• • a waveform synthesizer circuit for generating the complex waveform signal;
  • a synthesizer control circuit for controlling the waveform synthesizer circuit based at least in part on a recipe having parameters related to the depositing at least one layer of the multilayer nanolaminate coating, the synthesizer control circuit controlling the complex waveform signal generated by modulating in real-time a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, a derivative of the complex waveform signal, or a combination thereof; and
  • a controller output circuit for transmitting the complex waveform signal to the input of the electrodeposition power supply.
• 62. The system of any one of embodiments 59 to 61, wherein the synthesizer control circuit comprises a field-programmable gate array.
• 63. The system of any one of embodiments 59 to 62, wherein the recipe is stored in the processor-based controller;
• 64. The system of any one of embodiments 59 to 63, wherein the recipe comprises instructions for generating the desired electrodeposition waveform; and
• wherein the instructions comprise a current density of the desired electrodeposition waveform, a current waveform profile of the desired electrodeposition waveform, a voltage waveform profile of the desired electrodeposition waveform, or a combination thereof.
• 65. The system of any one of embodiments 59 to 64, wherein the set of electrodes comprises a cathode and one, two, three, four, or more anodes.
• 66. The system of any one of embodiments 59 to 65, wherein the electrodeposition power supply is configured to transmit the desired electrodeposition waveform to the set of electrodes.
• 67. The system of any one of embodiments 59 to 65, wherein the electrodeposition power supply, in use, transmits the desired electrodeposition waveform to the set of electrodes.
• 68. The system of any one of embodiments 59 to 67, wherein the processor-based controller is configured to transmit the desired electrodeposition waveform to the set of electrodes.
• 69. The system of any one of embodiments 59 to 67, wherein the processor-based controller, in use, transmits the desired electrodeposition waveform to the set of electrodes.
• 70. The system of any one of embodiments 59 to 69, wherein the modulating in real-time comprises modulating a first characteristic of a base first-order waveform using a second characteristic of a second first-order waveform based on a functional relationship between the first characteristic and the second characteristic to generate the complex waveform signal.
• 71. The system of embodiment 70, wherein the base first-order waveform and the second first-order waveform are independently selected from a plurality of preloaded waveforms that are stored in the processor-based controller.
• 72. The system of embodiment 71, wherein the electrodeposition power supply is one of a plurality of electrodeposition power supplies that are connected to the processor-based controller.
• 73. The system of embodiment 73, wherein the plurality of electrodeposition power supplies independently control individual portions of a cathode bus bar positioned along at least a portion of a length the electrochemical processing tank.
• 74. The system of any one of embodiments 70 to 73, wherein the first characteristic of the base first-order waveform and the second characteristic of the second first-order waveform independently comprise a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, a derivative of the respective first-order waveform, or a combination thereof.
• 75. The system of embodiment 74, wherein the base first-order waveform is the complex waveform signal; and wherein the second first-order waveform is selected from a plurality of preloaded waveforms that are stored in the processor-based controller.
• 76. The system of any one of embodiments 59 to 75, wherein the modulating in real-time comprises serially combining sub-waveform sequences to generate the complex waveform signal.
• 77. The system of embodiment 76, wherein the modulating in real-time comprises generating the sub-waveform sequences for a desired number of cycle counts and in a desired sequence order.
• 78. The system of embodiment 77, wherein at least one of the desired number of cycle counts and the desired sequence order is independently dynamically modified based on a predetermined time period, a predetermined sub-waveform cycle count, a process step of the depositing at least one layer of the nanolaminate coating, a feedback signal related to the depositing at least one layer of the nanolaminate coating, or a combination thereof.
• 79. The system of embodiment 78, wherein at least one of the desired number of cycle counts and the desired sequence order is independently dynamically modified based on the feedback signal, and
• wherein the feedback signal relates to an electrolyte concentration, an electrolyte level, an electrolyte temperature, a coating thickness, a coating resistance, or a combination thereof.
• 80. The system of any one of embodiments 59 to 79, wherein the processor-based controller further comprises a network communications circuit communicatively connected to an external communications network, the network communications circuit configured to receive the recipe from a remote computing device.
• 81. The system of any one of embodiments 59 to 79, wherein the processor-based controller further comprises a network communications circuit communicatively connected to an external communications network, the network communications circuit, in use, receives the recipe from a remote computing device.
• 82. The system of embodiment 80 or 81, further comprising one or more other processor-based controllers configured to be connected to the external communications network;
• wherein the processor-based controller is configured to be connected to the one or more other processor-based controllers via the external communications network; and
• wherein each of the processor-based controllers represents a node on the external communications network.
• 83. The system of embodiment 80 or 81, further comprising one or more other processor-based controllers that, in use, are connected to the external communications network;
• wherein the processor-based controller, in use, is connected to the one or more other processor-based controllers via the external communications network; and
• wherein each of the processor-based controllers represents a node on the external communications network.
• 84. The system of embodiment 82 or 83, wherein each node of the external communications network is configured to receive the recipe.
• 85. The system of embodiment 82 or 83, wherein each node of the external communications network, in use, receives the recipe.
• 86. The system of any one of embodiments 82 to 85, wherein the processor-based controller is further configured to transmit at least a portion of the instructions of the recipe to the one or more other processor-based controllers via the external communications network.
• 87. The system of any one of embodiments 82 to 85, wherein the processor-based controller, in use, transmits at least a portion of the instructions of the recipe to the one or more other processor-based controllers via the external communications network.
• 88. The system of any one of embodiments 62 to 87, wherein the processor-based controller is configured to generate a plurality of complex waveform signals and the field-programmable gate array has parallel processing capability to simultaneously and independently control the waveform synthesizer circuit to generate each of the plurality of complex waveform signals.
• 89. The system of any one of embodiments 62 to 77, wherein the processor-based controller, in use, generates a plurality of complex waveform signals and the field-programmable gate array has parallel processing capability to simultaneously and independently control the waveform synthesizer circuit to generate each of the plurality of complex waveform signals.
• 90. The system of embodiment 88 or 89, wherein the processor-based controller is configured to adjust a current density, a voltage, a waveform phase, or a combination thereof, of the desired electrodeposition waveform to compensate for variations in the deposition of the at least one layer of the nanolaminate coating on the workpiece.
• 91. The system of embodiment 88 or 89, wherein the processor-based controller, in use, compensates for variations in the deposition of the at least one layer of the nanolaminate coating on the workpiece by adjusting a current density, a voltage, a waveform phase, or a combination thereof, of the desired electrodeposition waveform.
• 92. The system of any one of embodiments 59 to 91, wherein the processor-based controller is configured to use a power supply driver file corresponding to the electrodeposition power supply to take into account a characteristic of the electrodeposition power supply.
• 93. The system of any one of embodiments 59 to 91, wherein the processor-based controller, in use, uses a power supply driver file corresponding to the electrodeposition power supply to take into account a characteristic of the electrodeposition power supply.
• 94. The system of embodiment 92 or 93, wherein the characteristic of the electrodeposition power supply comprises a slew-rate, a percent overshoot, or a combination thereof.
• 95. The system of embodiment 92 or 93, wherein the power supply driver file is based on a calibration procedure performed on the electrodeposition power supply by the processor-based controller.
• 96. The system of embodiment 95, wherein the calibration procedure comprises:
• transmitting a calibration waveform signal to the electrodeposition power supply;
• placing a known load across output terminals of the electrodeposition power supply;
• measuring a slew rate, a percent overshoot, or a combination thereof, of the electrodeposition power supply; and
• creating the power supply driver file using at least results of the measuring the slew rate, the percent overshoot, or the combination thereof.
• 97. The system of any one of embodiments 59 to 96, further comprising a tank automation controller configured to control an electrolyte level, an electrolyte temperature, an agitation rate, a flow rate of the respective electrochemical processing tank, or a combination thereof.
• 98. The system of any one of embodiments 59 to 96, further comprising a tank automation controller that, in use, controls an electrolyte level, an electrolyte temperature, an agitation rate, a flow rate of the respective electrochemical processing tank, or a combination thereof.
• 99. The system of embodiment 59 to 98, further comprising a sensor assembly configured to detect temperature, level, electrolyte concentration, coating thickness, coating resistivity, voltage or current between the electrodes, agitation rate, or a combination thereof.
• 100. The system of embodiment 59 to 98, further comprising a sensor assembly that, in use, detects temperature, level, electrolyte concentration, coating thickness, coating resistivity, voltage or current between the electrodes, agitation rate, or a combination thereof.
• 101. The system ofembodiment 99 or 100, wherein the sensor assembly is configured to provide a feedback signal to the processor-based controller.
• 102. The system ofembodiment 99 or 100, wherein the sensor assembly, in use, provides a feedback signal to the processor-based controller.
• 103. The system ofembodiment 101 or 102, wherein the modulating in real-time comprises adjusting the waveform shape, the frequency, the amplitude, the offset, the slew, the wavelength, the phase, the velocity, the derivative of the complex waveform signal, or the combination thereof in response to receiving the feedback signal.
• 104. The system of any one ofembodiment 99 or 100, wherein the sensor assembly is configured to provide a feedback signal to the tank automation controller.
• 105. The system of any one ofembodiment 99 or 100, wherein the sensor assembly, in use, provides a feedback signal to the tank automation controller.
• 106. The system ofembodiment 104 or 105, wherein the tank automation controller is configured to provide the feedback signal to the processor-based controller.
• 107. The system ofembodiment 104 or 105, wherein the tank automation controller, in use, provides the feedback signal to the processor-based controller.
• 108. The system of any one of embodiments 97 to 107, wherein the tank automation controller is configured to adjust the electrolyte level, the electrolyte temperature, the agitation rate, the flow rate of the respective electrochemical processing tank, or the combination thereof in response to receiving the feedback signal.
• 109. The system of any one of embodiments 97 to 107, wherein the tank automation controller, in use, adjusts the electrolyte level, the electrolyte temperature, the agitation rate, the flow rate of the respective electrochemical processing tank, or the combination thereof in response to receiving the feedback signal.
• 110. The system of any one of embodiments 59 to 109, wherein the processor-based controller has a sample rate ranging from DC to about 350 KHz.
• 111. The system of any one of embodiments 59 to 110, wherein the electrodeposition power supply has a switching speed of about 5 milliseconds or less.
• 112. A controller for an electrodeposition process, comprising:
• a waveform synthesizer circuit configured to generate a complex waveform signal corresponding to an electrodeposition waveform, the waveform synthesizer circuit being further configured to transmit the complex waveform signal to an electrodeposition power supply;
• a synthesizer control circuit configured to control the waveform synthesizer circuit based at least in part on a recipe having parameters related to depositing at least one layer of a multilayer nanolaminate coating, the synthesizer control circuit configured to control the complex waveform signal generated by modulating in real-time a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, a derivative of the complex waveform signal, or a combination thereof; and
• a controller output circuit configured to transmit the complex waveform signal to an input of the electrodeposition power supply.
• 113. A controller for an electrodeposition process, comprising:
• a waveform synthesizer circuit that, in use, generates a complex waveform signal corresponding to an electrodeposition waveform and transmits the complex waveform signal to an electrodeposition power supply;
• a synthesizer control circuit that, in use, controls the waveform synthesizer circuit based at least in part on a recipe having parameters related to depositing at least one layer of a multilayer nanolaminate coating, wherein the synthesizer control circuit, in use, controls the complex waveform signal generated by modulating in real-time a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, a derivative of the complex waveform signal, or a combination thereof; and
• a controller output circuit that, in use, transmits the complex waveform signal to an input of the electrodeposition power supply.
• 114. A controller for an electrodeposition process, comprising:
• a waveform synthesizer circuit that, in use, generates a complex waveform signal corresponding to an electrodeposition waveform and transmits the complex waveform signal to an electrodeposition power supply;
• a synthesizer control circuit that, in use, controls the waveform synthesizer circuit based at least in part on a recipe having parameters related to depositing at least one layer of a multilayer nanolaminate coating, wherein the synthesizer control circuit, in use, controls the complex waveform signal generated by modulating in real-time a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, a derivative of the complex waveform signal, or a combination thereof; and
• a controller output circuit that, in use, transmits the complex waveform signal to an input of the electrodeposition power supply.
• 115. The controller of any one of embodiments 112 to 114, wherein the synthesizer control circuit comprises a field-programmable gate array.
• 116. The controller of any one of embodiments 112 to 115, wherein the recipe comprises instructions for generating the electrodeposition waveform; and
• wherein the instructions comprise a current density of the electrodeposition waveform, a current waveform profile of the electrodeposition waveform, a voltage waveform profile of the electrodeposition waveform, or a combination thereof.
• 117. The controller of any one of embodiments 112 to 116, wherein the recipe is stored in the controller.
• 118. The controller of any one of embodiments 112 to 117, wherein the modulating in real-time comprises modulating a first characteristic of a base first-order waveform using a second characteristic of a second first-order waveform based on a functional relationship between the first and second characteristics to generate the complex waveform signal.
• 119. The controller ofembodiment 118, wherein the base first-order waveform and the second first-order waveform are independently selected from a plurality of preloaded waveforms that are stored in the controller.
• 120. The controller of embodiment 119, wherein the plurality of preloaded waveforms comprises a triangular waveform, a sinewave, a square wave, or a custom waveform.
• 121. The controller ofembodiment 118 to 120, wherein the first characteristic of the base first-order waveform and the second characteristic of the second first-order waveform independently comprise a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, a derivative of the respective first-order waveform, or a combination thereof.
• 122. The controller ofembodiment 118, wherein the base first-order waveform is the complex waveform signal, and
• wherein the second first-order waveform is selected from a plurality of preloaded waveforms that are stored in the controller.
• 123. The controller of any one of embodiments 112 to 122, wherein the modulating in real-time comprises serially combining sub-waveform sequences to generate the complex waveform signal.
• 124. The controller of embodiment 123, wherein the modulating in real time comprises generating the sub-waveform sequences for a sub-waveform cycle count and in a sub-waveform sequence order.
• 125. The controller ofembodiment 124, wherein at least one of the sub-waveform cycle count and the sub-waveform sequence order is independently dynamically modified based on a predetermined time period, a predetermined sub-waveform cycle count, a process step of the electrodeposition process, a feedback signal related to the electrodeposition process, or a combination thereof 5126. The controller of embodiment 125, wherein at least one of the sub-waveform cycle count and the sub-waveform sequence order is independently dynamically modified based on the feedback signal; and
• wherein the feedback signal relates to an electrolyte concentration, an electrolyte level, an electrolyte temperature, a coating thickness, a coating resistance, or a combination thereof.
• 127. The controller of any one of embodiments 112 to 126, further comprising a network communications circuit communicatively connected to an external communications network, the network communications circuit configured to receive the recipe via the external communications network.
• 128. The controller of any one of embodiments 112 to 126, further comprising a network communications circuit communicatively connected to an external communications network, the network communications circuit, in use, receives the recipe via the external communications network.
• 129. The controller ofembodiment 127 or 128, wherein the external communications network is connected to one or more other controllers and each of the one or more other controllers represents a node on the external communications network.
• 130. The controller of embodiment 129, wherein the network communication circuit is configured to transmit at least a portion of the instructions of the recipe to the one or more other controllers via the external communications network.
• 131. The controller of embodiment 129, wherein the network communication circuit, in use, transmits at least a portion of the instructions of the recipe to the one or more other controllers via the external communications network.
• 132. The controller of any one of embodiments 115 to 131, wherein the controller is configured to generate a plurality of complex waveform signals corresponding to a plurality of electrodeposition waveforms; and
• wherein the field-programmable gate array comprises parallel processing capability to simultaneously and independently control the waveform synthesizer circuit to generate each of the plurality of complex waveform signals.
• 133. The controller of any one of embodiments 115 to 131, wherein the controller, in use, generates a plurality of complex waveform signals corresponding to a plurality of electrodeposition waveforms; and
• wherein the field-programmable gate array comprises parallel processing capability to simultaneously and independently control the waveform synthesizer circuit to generate each of the plurality of complex waveform signals.
• 134. The controller ofembodiment 132 or 133, wherein the controller is configured to adjust a current density, a voltage, a waveform phase, or a combination thereof, of the respective electrodeposition waveform to compensate for variations in the electrodeposition process.
• 135. The controller ofembodiment 132 or 133, wherein the controller, in use, adjusts a current density, a voltage, a waveform phase, or a combination thereof, of the respective electrodeposition waveform to compensate for variations in the electrodeposition process.
• 136. The controller of any one of embodiments 112 to 135, wherein the controller is configured to use a power supply driver file corresponding to the electrodeposition power supply to take into account a characteristic of the electrodeposition power supply.
• 137. The controller of any one of embodiments 112 to 135, wherein the controller, in use, uses a power supply driver file corresponding to the electrodeposition power supply to take into account a characteristic of the electrodeposition power supply.
• 138. The controller ofembodiment 136 or 137, wherein the characteristic comprises a slew-rate, a percent overshoot, or a combination thereof.
• 139. The controller of any one ofembodiments 136 to 138, wherein the power supply driver file is based on a calibration procedure performed by the controller on the electrodeposition power supply.
• 140. The controller of embodiment 139, wherein the calibration procedure comprises:
• transmitting a calibration waveform signal to the electrodeposition power supply;
• placing a known load across output terminals of the electrodeposition power supply;
• measuring a slew rate, a percent overshoot, or a combination thereof, of the electrodeposition power supply; and
• creating the power supply driver file using at least results of the measuring the slew rate, the percent overshoot, or the combination thereof.
• 141. The controller of any one of embodiments 112 to 140, wherein the modulating in real-time comprises adjusting the waveform shape, the frequency, the amplitude, the offset, the slew, the wavelength, the phase, the velocity, the derivative of the complex waveform signal, or the combination thereof in response to receiving the feedback signal from a sensor assembly.
• 142. The controller of any one of embodiments 112 to 141, wherein the controller is configured to transmit the electrodeposition waveform to a set of electrodes.
• 143. The controller of any one of embodiments 112 to 142, wherein the controller, in use, transmits the electrodeposition waveform to a set of electrodes.
• 144. The controller of any one of embodiments 112 to 143, wherein the controller has a sample rate ranging from DC to about 350 KHz.
• 145. A method for electrodepositing a coating on a workpiece, the method comprising:
• selecting a recipe corresponding to a electrodeposition process;
• producing a specialized recipe by adjusting the recipe based on information related to workpiece geometry, workpiece surface area, an electrodeposition power supply, or a combination thereof;
• generating a complex waveform signal corresponding to a desired electrodeposition waveform that is based on the adjusted recipe, the generating comprising modulating in real-time a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, a derivative of the complex waveform signal, or a combination thereof, based at least on the recipe;
• providing the complex waveform signal to the electrodeposition power supply;
• generating an electrodeposition waveform based on the complex waveform signal by the power supply; and
• transmitting the electrodeposition waveform to an electrode set in an electrodeposition processing tank, thereby depositing the coating on the workpiece.
• 146. The method of embodiment 145, wherein the complex waveform signal is generated using a field-programmable gate array.
• 147. The method of embodiment 145 or 146, wherein the recipe comprises instructions for generating the electrodeposition waveform, and
• wherein the instructions comprise at least one of a current density of the electrodeposition waveform, a current waveform profile of the electrodeposition waveform, a voltage waveform profile of the electrodeposition waveform, or a combination thereof.
• 148. The method of any one of embodiments 145 to 147, wherein the generating the complex waveform signal comprises modulating a first characteristic of a base first-order waveform using a second characteristic of a second first-order waveform based on a functional relationship between the first and second characteristics.
• 149. The method of embodiment 148, wherein the base first-order waveform and the second first-order waveform are independently selected from a plurality of preloaded waveforms that are stored in a processor-based controller.
• 150. The method of embodiment 149, wherein the plurality of preloaded waveforms comprises a triangular waveform, a sinewave, a square wave, or a custom waveform.
• 151. The method of any one of embodiments 148 to 150, wherein the first characteristic of the base first-order waveform and the second characteristic of the second first-order waveform independently comprise a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, a derivative of the first-order waveform, or a combination thereof.
• 152. The method of any one of embodiments 148 to 151, wherein the base first-order waveform is the complex waveform signal; and
• wherein the second first-order waveform is selected from a plurality of preloaded waveforms.
• 153. The method of any one of embodiments 145 to 152, wherein the generating the complex waveform signal comprises serially combining sub-waveform sequences.
• 154. The method of embodiment 153, wherein the serially combining sub-waveform sequences comprises generating the sub-waveforms for a sub-waveform cycle count and in a sub-waveform sequence order.
• 155. The method ofembodiment 154, wherein the sub-waveform cycle count, the sub-waveform sequence order, or a combination thereof, is independently dynamically modified based on a predetermined time period, a predetermined sub-waveform cycle count, a process step of the depositing the coating, a feedback signal related to the depositing the coating, or a combination thereof.
• 156. The method of embodiment 155, wherein the sub-waveform cycle count, the sub-waveform sequence order, or a combination thereof, is independently dynamically modified based on the feedback signal, and wherein the feedback signal relates to an electrolyte concentration, an electrolyte level, an electrolyte temperature, a coating thickness, a coating resistance, or a combination thereof.
• 157. The method of any one of embodiments 146 to 156, further comprising generating a plurality of complex waveform signals by the field-programmable gate array, which has parallel processing capability to simultaneously and independently generate each of the plurality of complex waveform signals.
• 158. The method of any one of embodiments 145 to 157, wherein the generating the complex waveform signal takes into account a characteristic of the electrodeposition power supply.
• 159. The method ofembodiment 158, wherein the characteristic comprises a slew-rate, a percent overshoot, or a combination thereof.
• 160. The method of any one of embodiments 145 to 159, further comprising detecting, by a sensor assembly, temperature, level, electrolyte concentration, coating thickness, coating resistivity, voltage or current between the electrodes, agitation rate, or a combination thereof.
• 161. The method ofembodiment 160, further comprising providing, by the sensor assembly, a feedback signal to the processor-based controller.
• 162. The method of embodiment 161, wherein the modulating in real-time comprises adjusting the waveform shape, the frequency, the amplitude, the offset, the slew, the wavelength, the phase, the velocity, the derivative of the complex waveform signal, or the combination thereof in response to receiving the feedback signal.
• 163. The method ofembodiment 160, further comprising providing, by the sensor assembly, a feedback signal to the tank automation controller.
• 164. The method of embodiment 163, further comprising providing, by the tank automation controller, the feedback signal to the processor-based controller.
• 165. The method ofembodiment 160, further comprising adjusting, by the tank automation controller, the electrolyte level, the electrolyte temperature, the agitation rate, the flow rate of the respective electrochemical processing tank, or the combination thereof in response to receiving the feedback signal.
• 166. The method of any one of embodiments 145 to 165, wherein the electrodeposition waveform is transmitted from the power supply to the electrode set.
• 167. The method of any one of embodiments 149 to 165, wherein the electrodeposition waveform is transmitted from the processor-based controller to the electrode set.
• 168. The method of any one of embodiments 149 to 167, wherein the processor-based controller has a sample rate ranging from DC to about 350 KHz.
• 169. The method of any one of embodiments 145 to 168, wherein the electrodeposition power supply has a switching speed of about 5 milliseconds or less.
• Although the subject matter has been described in language specific to structural features and/or methodological acts, it is to be understood that the subject matter defined in the appended claims is not necessarily limited to the specific features or acts described. Rather, the specific features and acts are disclosed as illustrative forms of implementing the claims.
• The various embodiments described above can be combined to provide further embodiments. All of the U.S. patents, U.S. patent application publications, U.S. patent applications, foreign patents, foreign patent applications and non-patent publications referred to in this specification and/or listed in the Application Data Sheet, including U.S. Patent Application No. 62/394,552, are incorporated herein by reference, in their entirety. Aspects of the embodiments can be modified, if necessary to employ concepts of the various patents, applications and publications to provide yet further embodiments.
• These and other changes can be made to the embodiments in light of the above-detailed description. In general, in the following claims, the terms used should not be construed to limit the claims to the specific embodiments disclosed in the specification and the claims, but should be construed to include all possible embodiments along with the full scope of equivalents to which such claims are entitled. Accordingly, the claims are not limited by the disclosure.

Claims (62)

What is claimed is:

1. A system, comprising:

an electrochemical processing tank;

a set of electrodes configured for depositing a multilayer nanolaminate coating on a workpiece;

an electrodeposition power supply connected to the set of electrodes, the electrodeposition power supply comprising an input connection configured to receive a complex waveform signal, the electrodeposition power supply configured to amplify the complex waveform signal to generate a desired electrodeposition waveform, the desired electrodeposition waveform configured to deposit at least one layer of the multilayer nanolaminate coating on the workpiece; and

a processor-based controller comprising:

a waveform synthesizer circuit configured to generate the complex waveform signal;

a synthesizer control circuit configured to control the waveform synthesizer circuit based at least in part on a recipe having parameters related to the depositing at least one layer of the multilayer nanolaminate coating, the synthesizer control circuit configured to control the complex waveform signal generated by modulating in real-time a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, a derivative of the complex waveform signal, or a combination thereof; and

a controller output circuit connected to the input of the electrodeposition power supply, the controller output circuit configured to transmit the complex waveform signal to the input.

2. The system ofclaim 1, wherein the synthesizer control circuit comprises a field-programmable gate array.

3. The system ofclaim 1 or2, wherein the recipe is stored in the processor-based controller.

4. The system of any one ofclaims 1 to3, wherein the recipe comprises instructions for generating the desired electrodeposition waveform; and

wherein the instructions comprise a current density of the desired electrodeposition waveform, a current waveform profile of the desired electrodeposition waveform, a voltage waveform profile of the desired electrodeposition waveform, or a combination thereof.

5. The system of any one ofclaims 1 to4, wherein the modulating in real-time comprises modulating a first characteristic of a base first-order waveform using a second characteristic of a second first-order waveform based on a functional relationship between the first characteristic and the second characteristic to generate the complex waveform signal.

6. The system ofclaim 5, wherein the base first-order waveform and the second first-order waveform are independently selected from a plurality of preloaded waveforms that are stored in the processor-based controller.

7. The system ofclaim 6, wherein the electrodeposition power supply is one of a plurality of electrodeposition power supplies that are connected to the processor-based controller; and

wherein the plurality of electrodeposition power supplies independently control individual portions of a cathode bus bar positioned along at least a portion of a length of the electrochemical processing tank.

8. The system of any one ofclaims 5 to7, wherein the first characteristic of the base first-order waveform and the second characteristic of the second first-order waveform independently comprise a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, a derivative of the respective first-order waveform, or a combination thereof.

9. The system ofclaim 5, wherein the base first-order waveform is the complex waveform signal; and

wherein the second first-order waveform is selected from a plurality of preloaded waveforms that are stored in the processor-based controller.

10. The system of any one ofclaims 1 to4, wherein the modulating in real-time comprises serially combining sub-waveform sequences to generate the complex waveform signal.

11. The system ofclaim 10, wherein the modulating in real-time comprises generating the sub-waveform sequences for a desired number of cycle counts and in a desired sequence order.

12. The system ofclaim 11, wherein at least one of the desired number of cycle counts and the desired sequence order is independently dynamically modified based on a predetermined time period, a predetermined sub-waveform cycle count, a process step of the depositing at least one layer of the nanolaminate coating, a feedback signal related to the depositing at least one layer of the nanolaminate coating, or a combination thereof.

13. The system ofclaim 12, wherein at least one of the desired number of cycle counts and the desired sequence order is independently dynamically modified based on the feedback signal, and

wherein the feedback signal relates to an electrolyte concentration, an electrolyte level, an electrolyte temperature, a coating thickness, a coating resistance, or a combination thereof.

14. The system of any one ofclaims 1 to13, wherein the processor-based controller further comprises a network communications circuit communicatively connected to an external communications network, the network communications circuit configured to receive the recipe from a remote computing device.

15. The system ofclaim 14, further comprising one or more other processor-based controllers configured to be connected to the external communications network;

wherein the processor-based controller is configured to be connected to the one or more other processor-based controllers via the external communications network; and

wherein each of the processor-based controllers represents a node on the external communications network.

16. The system ofclaim 15, wherein each node of the external communications network is configured to receive the recipe.

17. The system ofclaim 15 or16, wherein the processor-based controller is further configured to transmit at least a portion of the instructions of the recipe to the one or more other processor-based controllers via the external communications network.

18. The system of any one ofclaims 2 to17, wherein the processor-based controller is configured to generate a plurality of complex waveform signals, and the field-programmable gate array has parallel processing capability to simultaneously and independently control the waveform synthesizer circuit to generate each of the plurality of complex waveform signals.

19. The system ofclaim 18, wherein the processor-based controller is configured to adjust a current density, a voltage, a waveform phase, or a combination thereof, of the desired electrodeposition waveform to compensate for variations in the deposition of the at least one layer of the nanolaminate coating on the workpiece.

20. The system of any one ofclaims 1 to19, wherein the processor-based controller is configured to use a power supply driver file corresponding to the electrodeposition power supply to take into account a characteristic of the electrodeposition power supply.

21. The system ofclaim 20, wherein the power supply driver file is based on a calibration procedure performed on the electrodeposition power supply by the processor-based controller; and

wherein the calibration procedure comprises:

transmitting a calibration waveform signal to the electrodeposition power supply;

placing a known load across output terminals of the electrodeposition power supply;

measuring a slew rate, a percent overshoot, or a combination thereof, of the electrodeposition power supply; and

creating the power supply driver file using at least results of the measuring the slew rate, the percent overshoot, or the combination thereof.

22. The system of any one ofclaims 1 to21, further comprising a tank automation controller configured to control an electrolyte level, an electrolyte temperature, an agitation rate, a flow rate of the respective electrochemical processing tank, or a combination thereof.

23. The system of any one ofclaims 1 to22, wherein the electrodeposition power supply is configured to transmit the desired electrodeposition waveform to the set of electrodes.

24. The system of any one ofclaims 1 to22, wherein the processor-based controller is configured to transmit the desired electrodeposition waveform to the set of electrodes.

25. A controller for an electrodeposition process, comprising:

a waveform synthesizer circuit configured to generate a complex waveform signal corresponding to an electrodeposition waveform, the waveform synthesizer circuit being further configured to transmit the complex waveform signal to an electrodeposition power supply;

a synthesizer control circuit configured to control the waveform synthesizer circuit based at least in part on a recipe having parameters related to depositing at least one layer of a multilayer nanolaminate coating, the synthesizer control circuit configured to control the complex waveform signal generated by modulating in real-time a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, a derivative of the complex waveform signal, or a combination thereof; and

a controller output circuit configured to transmit the complex waveform signal to an input of the electrodeposition power supply.

26. The controller ofclaim 25, wherein the synthesizer control circuit comprises a field-programmable gate array.

27. The controller ofclaim 25 or26, wherein the recipe comprises instructions for generating the electrodeposition waveform; and

wherein the instructions comprise a current density of the electrodeposition waveform, a current waveform profile of the electrodeposition waveform, a voltage waveform profile of the electrodeposition waveform, or a combination thereof.

28. The controller of any one ofclaims 25 to27, wherein the recipe is stored in the controller.

29. The controller of any one ofclaims 25 to28, wherein the modulating in real-time comprises modulating a first characteristic of a base first-order waveform using a second characteristic of a second first-order waveform based on a functional relationship between the first and second characteristics to generate the complex waveform signal.

30. The controller ofclaim 29, wherein the base first-order waveform and the second first-order waveform are independently selected from a plurality of preloaded waveforms that are stored in the controller.

31. The controller ofclaim 30, wherein the plurality of preloaded waveforms comprises a triangular waveform, a sinewave, a square wave, or a custom waveform.

32. The controller of any one ofclaims 29 to31, wherein the first characteristic of the base first-order waveform and the second characteristic of the second first-order waveform independently comprise a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, a derivative of the respective first-order waveform, or a combination thereof.

33. The controller ofclaim 29, wherein the base first-order waveform is the complex waveform signal, and

wherein the second first-order waveform is selected from a plurality of preloaded waveforms that are stored in the controller.

34. The controller of any one ofclaims 25 to28, wherein the modulating in real-time comprises serially combining sub-waveform sequences to generate the complex waveform signal.

35. The controller ofclaim 34, wherein the modulating in real time comprises generating the sub-waveform sequences for a sub-waveform cycle count and in a sub-waveform sequence order.

36. The controller ofclaim 35, wherein at least one of the sub-waveform cycle count and the sub-waveform sequence order is independently dynamically modified based on a predetermined time period, a predetermined sub-waveform cycle count, a process step of the electrodeposition process, a feedback signal related to the electrodeposition process, or a combination thereof.

37. The controller ofclaim 36, wherein at least one of the sub-waveform cycle count and the sub-waveform sequence order is independently dynamically modified based on the feedback signal; and

wherein the feedback signal relates to an electrolyte concentration, an electrolyte level, an electrolyte temperature, a coating thickness, a coating resistance, or a combination thereof.

38. The controller of any one ofclaims 25 to37, further comprising a network communications circuit communicatively connected to an external communications network, the network communications circuit configured to receive the recipe via the external communications network.

39. The controller ofclaim 38, wherein the external communications network is connected to one or more other controllers, and each of the one or more other controllers represents a node on the external communications network.

40. The controller ofclaim 39, wherein the network communication circuit is configured to transmit at least a portion of the instructions of the recipe to the one or more other controllers via the external communications network.

41. The controller ofclaim 26, wherein the controller is configured to generate a plurality of complex waveform signals corresponding to a plurality of electrodeposition waveforms; and

wherein the field-programmable gate array comprises parallel processing capability to simultaneously and independently control the waveform synthesizer circuit to generate each of the plurality of complex waveform signals.

42. The controller ofclaim 41, wherein the controller is configured to adjust a current density, a voltage, a waveform phase, or a combination thereof, of the respective electrodeposition waveform to compensate for variations in the electrodeposition process.

43. The controller of any one ofclaims 25 to42, wherein the controller is configured to use a power supply driver file corresponding to the electrodeposition power supply to take into account a characteristic of the electrodeposition power supply.

44. The controller ofclaim 43, wherein the characteristic comprises a slew-rate, a percent overshoot, or a combination thereof.

45. The controller ofclaim 43 or44, wherein the power supply driver file is based on a calibration procedure performed by the controller on the electrodeposition power supply, and

wherein the calibration procedure comprises:

transmitting a calibration waveform signal to the electrodeposition power supply;

placing a known load across output terminals of the electrodeposition power supply;

measuring a slew rate, a percent overshoot, or a combination thereof, of the electrodeposition power supply; and

creating the power supply driver file using at least results of the measuring the slew rate, the percent overshoot, or the combination thereof.

46. A method for electrodepositing a coating on a workpiece, the method comprising:

selecting a recipe corresponding to an electrodeposition process;

producing a specialized recipe by adjusting the recipe based on information related to workpiece geometry, workpiece surface area, an electrodeposition power supply, or a combination thereof;

generating a complex waveform signal corresponding to a desired electrodeposition waveform that is based on the adjusted recipe, the generating comprising modulating in real-time a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, a derivative of the complex waveform signal, or a combination thereof, based at least on the recipe;

providing the complex waveform signal to the electrodeposition power supply;

generating an electrodeposition waveform based on the complex waveform signal by the power supply; and

transmitting the electrodeposition waveform to an electrode set in an electrodeposition processing tank, thereby depositing the coating on the workpiece.

47. The method ofclaim 46, wherein the complex waveform signal is generated using a field-programmable gate array.

48. The method ofclaim 46 or47, wherein the recipe comprises instructions for generating the electrodeposition waveform, and

wherein the instructions comprise at least one of a current density of the electrodeposition waveform, a current waveform profile of the electrodeposition waveform, a voltage waveform profile of the electrodeposition waveform, or a combination thereof.

49. The method of any one ofclaims 46 to48, wherein the generating the complex waveform signal comprises modulating a first characteristic of a base first-order waveform using a second characteristic of a second first-order waveform based on a functional relationship between the first and second characteristics.

50. The method ofclaim 49, wherein the base first-order waveform and the second first-order waveform are independently selected from a plurality of preloaded waveforms that are stored in a processor-based controller.

51. The method ofclaim 50, wherein the plurality of preloaded waveforms comprises a triangular waveform, a sinewave, a square wave, or a custom waveform.

52. The method ofclaim 49, wherein the first characteristic of the base first-order waveform and the second characteristic of the second first-order waveform independently comprise a waveform shape, a frequency, an amplitude, an offset, a slew, a wavelength, a phase, a velocity, a derivative of the first-order waveform, or a combination thereof.

53. The method ofclaim 49, wherein the base first-order waveform is the complex waveform signal; and

wherein the second first-order waveform is selected from a plurality of preloaded waveforms.

54. The method of any one ofclaims 46 to48, wherein the generating the complex waveform signal comprises serially combining sub-waveform sequences.

55. The method ofclaim 54, wherein the serially combining sub-waveform sequences comprises generating the sub-waveforms for a sub-waveform cycle count and in a sub-waveform sequence order.

56. The method ofclaim 55, wherein the sub-waveform cycle count, the sub-waveform sequence order, or a combination thereof, is independently dynamically modified based on a predetermined time period, a predetermined sub-waveform cycle count, a process step of the depositing the coating, a feedback signal related to the depositing the coating, or a combination thereof.

57. The method ofclaim 56, wherein the sub-waveform cycle count, the sub-waveform sequence order, or a combination thereof, is independently dynamically modified based on the feedback signal, and

wherein the feedback signal relates to an electrolyte concentration, an electrolyte level, an electrolyte temperature, a coating thickness, a coating resistance, or a combination thereof.

58. The method of any one ofclaims 47 to57, further comprising generating a plurality of complex waveform signals by the field-programmable gate array, which has parallel processing capability to simultaneously and independently generate each of the plurality of complex waveform signals.

59. The method of any one ofclaims 46 to58, wherein the generating the complex waveform signal takes into account a characteristic of the electrodeposition power supply.

60. The method ofclaim 59, wherein the characteristic comprises a slew-rate, a percent overshoot, or a combination thereof.

61. The method of any one of embodiments 46 to 60, wherein the electrodeposition waveform is transmitted from the power supply to the electrode set.

62. The method of any one of embodiments 50 to 60, wherein the electrodeposition waveform is transmitted from the processor-based controller to the electrode set.

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