CROSS-REFERENCE TO RELATED APPLICATIONSThis application is a divisional of U.S. patent application Ser. No. 13/238,622 filed on Sep. 21, 2011, which claims the priority of Korean Patent Application No. 10-2011-0070276 filed on Jul. 15, 2011, in the Korean Intellectual Property Office, the disclosure of which is incorporated herein by reference.
BACKGROUND OF THE INVENTION1. Field of the Invention
The present invention relates to a semiconductor package and a method of manufacturing the same, and more particularly, to a semiconductor package in which a metal pattern and a semiconductor chip may be easily connected, and a method of manufacturing the same.
2. Description of the Related Art
As a frequency resource for a next generation information communications service, a frequency in the millimeter wave band, a high frequency resource of 30 GHz or more, has been actively studied.
This frequency in the millimeter wave band may transfer a large amount of information at high speed using wideband characteristics. In addition, the frequency in the millimeter wave band does not suffer interference from other frequencies in adjacent geographical areas, due to significant electrical wave attenuation in the air. Therefore, the frequency in the millimeter wave band is advantageous in that it may be re-used.
As a result, the development of an information communications service and system using the frequency in the millimeter wave band, as well as and research into, and development of, various components required for the information communications service and system have been actively conducted.
Meanwhile, in a communications device for the millimeter wave band, an electrical connection distance between an antenna and a semiconductor chip is very important. That is, in the communications device for the millimeter wave band (particularly the 60 GHz band), as a distance between the antenna and the semiconductor chip increases, radiation loss of an antenna increases. Therefore, the semiconductor chip and the antenna may be disposed as closely as possible and then be electrically connected.
To this end, in the communications device according to the related art, an antenna is disposed at a position significantly adjacent to a semiconductor package in which a semiconductor chip is embedded, and the antenna and the semiconductor package are connected at the shortest possible distance.
However, in the case of the related art, a process of separately manufacturing each of the semiconductor package and the antenna and then mounting both thereof on a substrate to thereby be electrically connected needs to be performed. Therefore, a manufacturing process may be complicated.
Further, in the case of the related art, an antenna power feeding structure is complicated, such that a manufacturing process is difficult. As a result, analysis of an influence on a process error may be difficult.
Therefore, the development of a new type of semiconductor package in which an antenna and a semiconductor chip may be disposed as closely as possible has been urgently required.
SUMMARY OF THE INVENTIONAn aspect of the present invention provides a semiconductor package capable of being easily manufactured while minimizing an electrical distance between an antenna and a semiconductor chip, and a method of manufacturing the same.
Another aspect of the present invention provides a semiconductor package including an antenna embedded therein, and a method of manufacturing the same.
Another aspect of the present invention provides a semiconductor package capable of maximizing radiation efficiency of an antenna, and a method of manufacturing the same.
Another aspect of the present invention provides a semiconductor package in which an antenna and a semiconductor chip may be easily connected, and a method of manufacturing the same.
According to an aspect of the present invention, there is provided a semiconductor package including: a substrate including a semiconductor chip mounted thereon; a protective layer covering the semiconductor chip; a metal pattern mounted on the protective layer; and a first connective member connecting the semiconductor chip and the metal pattern.
The first connective member may be a wire or a thin plate.
The first connective member may have a coil shape.
The semiconductor chip may include a connection pad, and the first connective member may be connected to the connection pad.
The metal pattern may be an antenna pattern.
The antenna pattern may transceive a signal in the millimeter wave band (particularly the 60 GHz band).
The antenna pattern may include a first antenna pattern transceiving a high frequency signal in the millimeter wave band and a second antenna pattern transceiving a WiFi signal in a low frequency band.
The protective layer may be made of an epoxy mold compound (EMC).
The semiconductor package may further include a second connective member connecting the substrate and the metal pattern.
According to another aspect of the present invention, there is provided a method of manufacturing a semiconductor package, the method including: preparing a substrate including at least one semiconductor chip mounted thereon; connecting one end of a first connective member to the at least one semiconductor chip; covering the at least one semiconductor chip using a protective layer; and forming a metal pattern on an upper surface of the protective layer and connecting the metal pattern and the other end of the first connective member.
The method may further include, after the covering of the at least one semiconductor chip, grinding the protective layer such that a height from an upper surface of the at least one semiconductor chip to the upper surface of the protective layer is equal to a preset height.
The first connective member may have a coil shape.
The metal pattern may include a first antenna pattern transceiving a high frequency signal in the millimeter wave band and a second antenna pattern transceiving a WiFi signal in a low frequency band.
The connecting of the one end of the first connective member to the at least one semiconductor chip may further include connecting the substrate and one end of a second connective member, and the forming of the metal pattern on the upper surface of the protective layer and the connecting of the metal pattern and the other end of the first connective member may further include connecting the metal pattern and the other end of the second connective member.
The method may further include cutting a completed semiconductor package into predetermined module units.
The method may further include melting a portion of the protective layer such that the other end of the first connective member is exposed, and forming a conductive layer in the melted portion such that the other end of the first connective member is stably connected to the metal pattern.
The first connective member may be formed at the time of wire-bonding the at least one semiconductor chip and the substrate.
BRIEF DESCRIPTION OF THE DRAWINGSThe above and other aspects, features and other advantages of the present invention will be more clearly understood from the following detailed description taken in conjunction with the accompanying drawings, in which:
FIG. 1 is a cross-sectional view of a semiconductor package according to a first embodiment of the present invention;
FIGS. 2 and 3 are cross-sectional views of a semiconductor package showing another form of a connective member shown inFIG. 1;
FIG. 4 is a cross-sectional view of a semiconductor package according to a second embodiment of the present invention;
FIGS. 5 and 6 are cross-sectional views of a semiconductor package according to a third embodiment of the present invention;
FIG. 7 is a cross-sectional view of a semiconductor package according to a fourth embodiment of the present invention;
FIG. 8 is a cross-sectional view of a semiconductor package according to a fifth embodiment of the present invention;
FIGS. 9A through 9D and 10A through 10D are views showing a method of manufacturing a semiconductor package according to a first embodiment of the present invention;
FIGS. 11A through 11F are views showing a method of manufacturing a semiconductor package according to a second embodiment of the present invention;
FIGS. 12A through 12E are views showing a method of manufacturing a semiconductor package according to a third embodiment of the present invention;
FIGS. 13A through 13E are views showing a method of manufacturing a semiconductor package according to a fourth embodiment of the present invention;
FIGS. 14A through 14E are views showing a method of manufacturing a semiconductor package according to a fifth embodiment of the present invention; and
FIGS. 15A through 15F are views showing a method of manufacturing a semiconductor package according to a sixth embodiment of the present invention.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTHereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
In describing the present invention below, terms indicating components of the present invention are used in consideration of the functions of each of the components. Therefore, these terms should not be interpreted as limiting the technical components of the present invention.
A semiconductor package and a method of manufacturing the same according to the present invention are characterized in that a metal pattern is formed on a surface a protective layer in order to solve a mismatching problem generated in a semiconductor package in the millimeter wave band (particularly the 60 GHz band)
Particularly, in the semiconductor package and the method of manufacturing the same, according to the present invention, a metal pattern and a semiconductor chip are connected using a wire, unlike an existing semiconductor package using a via electrode.
In the semiconductor package and the method of manufacturing the same according to the present invention as described above, a via electrode may not need to be formed on a protective layer, whereby a manufacturing process of a semiconductor package is relatively simple and a manufacturing cost thereof may be reduced.
Hereinafter, a configuration of a semiconductor package according to the present invention having the above-mentioned features and effects will be described.FIG. 1 is a cross-sectional view of a semiconductor package according to a first embodiment of the present invention; andFIGS. 2 and 3 are cross-sectional views of a semiconductor package showing another form of a connective member shown inFIG. 1.
Asemiconductor package100 according to a first embodiment of the present invention may include asubstrate10, asemiconductor chip20, aprotective layer30, ametal pattern40, and a firstconnective member50.
Thesubstrate10 may be manufactured through a semiconductor manufacturing process and may be various kinds of substrate (for example, a silicon substrate, a ceramic substrate, a printed circuit board (PCB), a flexible substrate, or the like) well known in the art. Thesemiconductor chip20 may be mounted on one surface of thesubstrate10. And, the semiconductor chips20 may be mounted on one surface or both surfaces of thesubstrate10. In addition, although not shown, external electrodes, internal electrodes, and circuit patterns may be formed on thesubstrate10. These external electrodes, internal electrodes, and circuit patterns may be formed to have fine patterns through the semiconductor manufacturing process. In addition, although the accompanying drawings show a case in which thesubstrate10 is formed of a single layer, thesubstrate10 may be formed of a plurality of layers according to a kind of thesemiconductor package100. In this case, separate circuit patterns may be formed between the respective layers.
Thesemiconductor chip20 may include a plurality of connective pads for a connection to the outside. The connection pads may be formed on at least one of an upper surface, a lower surface, and sides (in a direction based onFIG. 1) of thesemiconductor chip20. Here, the connective pad formed on the upper surface of thesemiconductor chip20 may be represented byreference numeral22 as shown inFIG. 1. The connective pad may have a bump form. However, the connection pad is not limited thereto. That is, the connective pad may also have a solder ball form. Thesemiconductor chip20, configured as described above, may communicate with an external device through themetal pattern40. In this case, themetal pattern40 may be an antenna pattern.
Theprotective layer30 may be formed such that thesemiconductor chip20 is accommodated in an inner portion thereof. That is, theprotective layer30 may completely seal thesemiconductor chip20 in such a manner that thesemiconductor chip20 is not exposed to the outside. Theprotective layer30 may stably fix thesemiconductor chip20 to thesubstrate10 and protect thesemiconductor chip20 from external impacts.
Theprotective layer30, configured as described above, may be formed through a molding method. However, theprotective layer30 may be formed through various methods such as a printing method, a spin coating method, a jetting method, and the like, in addition to the molding method. Theprotective layer30 may be made of an epoxy mold compound (EMC) or of other polymers.
Themetal pattern40 may be formed on a surface (a top portion based onFIG. 1) of theprotective layer30. Themetal pattern40 may be a circuit pattern adding functionality to thesemiconductor chip20, or assisting a function of the semiconductor chips, or may be an antenna pattern capable of transceiving a wireless frequency signal. When themetal pattern40 is an antenna pattern, it may be variously shaped, such as having a linear shape, a polygonal shape, a circular shape, or the like, and be formed of at least one radiator. In addition, themetal pattern40 may be formed in a monopole or dipole form, according to a function thereof, or be formed in a patch or waveguide form as shown inFIG. 8. Further, althoughFIG. 1 shows that themetal pattern40 is formed of a single layer, themetal pattern40 may be made of several layers as required.
Themetal pattern40, configured as described above, may be connected to thesemiconductor chip20 through the firstconnective member50, and assist a function of thesemiconductor chip20 or add additional functionality to thesemiconductor chip20. For example, when themetal pattern40 is the antenna pattern, it may help thesemiconductor chip20 in transceiving a signal in the millimeter wave band (particularly the 60 GHz band).
The firstconnective member50 may be mounted on thesemiconductor chip20. More specifically, one end of the firstconnective member50 may be mounted on theconnection pad22 of thesemiconductor chip20. The firstconnective member50 may be upwardly extended lengthwise (in a direction based onFIG. 1) from thesemiconductor chip20. The other end of the upwardly extended firstconnective member50 may be connected to themetal pattern40. The firstconnective member50, configured as described above, may be a metal pin. Alternatively, the firstconnective member50 may be a metal coil or a metal plate as shown inFIGS. 2 and 3. Meanwhile, the firstconnective member50 may be formed in an operation of wire-bonding a connection terminal of thesemiconductor chip20 to a connection terminal of thesubstrate10. Therefore, the firstconnective member50 may have a wire form connecting thesemiconductor chip20 and thesubstrate10.
Since thesemiconductor package100, configured as described above, has a structure in which thesemiconductor chip20 and themetal pattern40 are connected by the firstconnective member50, a via electrode may not need to be formed in theprotective layer30. Therefore, according to the present embodiment, thesemiconductor package100 may be simply manufactured.
Further, in thesemiconductor package100 according to the present embodiment, a thickness of theprotective layer30 is changed, whereby a distance (h1) between an upper surface (based onFIG. 1) of thesemiconductor chip20 and a lower surface of the metal pattern40 (a surface contacting the protective layer30) may be easily adjusted.
Therefore, in thesemiconductor package10 according to the present embodiment, when themetal pattern40 is an antenna pattern for the millimeter wave band (particularly the 60 GHz band), radiation characteristics of themetal pattern40 may be easily optimized.
Hereinafter, other embodiments of the present invention will be described. For reference, the same reference numerals will be used to describe the same components as those of the first embodiment among components of other embodiments, and a detailed description of these components will be omitted.FIG. 4 is a cross-sectional view of a semiconductor package according to a second embodiment of the present invention.FIGS. 5 and 6 are cross-sectional views of a semiconductor package according to a third embodiment of the present invention.FIG. 7 is a cross-sectional view of a semiconductor package according to a fourth embodiment of the present invention.FIG. 8 is a cross-sectional view of a semiconductor package according to a fifth embodiment of the present invention.
Thesemiconductor package100 according to a second embodiment of the present invention will be described with reference toFIG. 4.
Thesemiconductor package100 according to the present embodiment is different from the semiconductor package according to the first embodiment of the present invention in that it further includes a secondconnective member52.
The secondconnective member52 may be made of a metallic material and have a pin shape, a coil shape, or a thin plate shape. The secondconnective member52 may be mounted on thesubstrate10 and electrically connect thesubstrate10 and themetal pattern40. That is, one end of the secondconnective member52 may be connected to thesubstrate10, and the other end thereof may be connected to themetal pattern40. This secondconnective member52 may be used as a ground electrode of themetal pattern40.
In the case of thesemiconductor package100, configured as described above, since the ground electrode for themetal pattern40 is formed by the secondconnective member52, a via hole and a via electrode for a ground electrode need not be formed.
Hereinafter, thesemiconductor package100 according to a third embodiment of the present invention will be described with reference toFIGS. 5 and 6.
Thesemiconductor package100 according to the present embodiment is different from the semiconductor packages according to the above-mentioned embodiments of the present invention, in that it includes a plurality of firstconnective members50 and51 and a plurality of secondconnective members52 and53.
Thesemiconductor package100 shown inFIG. 5 may have themetal pattern40 including the same kind or different kinds of first andsecond metal patterns42 and44. As an example, thefirst metal pattern42 may be an antenna pattern, and thesecond metal pattern44 may be a circuit pattern having a function other than an antenna function. As another example, thefirst metal pattern42 may be an antenna pattern for an ultrahigh frequency band, and thesecond metal pattern44 may be an antenna pattern for a low frequency band. As another example, thefirst metal pattern42 and thesecond metal pattern44 may be an antenna pattern for the same band (the millimeter wave band (particularly the 60 GHz band)).
Here, each of themetal patterns42 and44 may be connected to thesemiconductor chip20 through the firstconnective members50 and51. In addition, each of themetal patterns42 and44 may be connected to thesubstrate10 through the secondconnective members52 and53. Here, the secondconnective members52 and53 may be used as ground electrodes.
Thesemiconductor package100, configured as described above, may be usefully used to provide a complex function to thesingle semiconductor chip20 or enhance a specific function (for example, transceiving of an ultrahigh frequency signal).
Thesemiconductor package100 shown inFIG. 6 may have themetal pattern40 including the same kind or different kinds ofmetal patterns42 and44, and may the same kind or different kinds of first andsecond semiconductor chips20 and21.
As an example, thefirst metal pattern42 may be an antenna pattern, and thesecond metal pattern44 may be a circuit pattern having an antenna function. In this case, thefirst semiconductor chip20 may be an element for transceiving a wireless signal, and thesecond semiconductor chip21 may be an element having another function.
As another example, thefirst metal pattern42 may be an antenna pattern for an ultrahigh frequency band, and thesecond metal pattern44 may be an antenna pattern for a low frequency band. As another example, thefirst metal pattern42 and thesecond metal pattern44 may be an antenna pattern for the same band (the millimeter wave band (particularly the 60 GHz band)). In the case of the above-mentioned two examples, both of the first andsecond semiconductor chips20 and21 may be elements for transceiving a wireless signal.
Thesemiconductor package100, configured as described above, includes at least twosemiconductor chips20 and21, and at least twometal patterns42 and44, and may be usefully used to perform a complex function.
Thesemiconductor package100 according to a fourth embodiment of the present invention will be described with reference toFIG. 7.
Thesemiconductor package100 according to the present embodiment is different from the semiconductor packages according to the above-mentioned embodiments of the present invention in that agroove32 is formed in theprotective layer30.
Thegroove32 may be formed by removing a portion of theprotective layer30 which has been cured or may be formed integrally with the protective layer through a separately manufactured mold. Thegroove32 may have a depth h2 that is identical to or larger than a thickness t of themetal pattern40. In the former case, a thickness of thesemiconductor package100 may be minimized, and in the latter case, themetal pattern40 may be protected through thegroove32.
However, when themetal pattern40 is an antenna pattern, the depth h2 of thegroove32 may be set or the distance h1 (SeeFIG. 1) between the upper surface of thesemiconductor chip20 and the lower surface of themetal pattern40 may be set to be minimized in order that best antenna characteristics of themetal pattern40 are realized.
Thesemiconductor package100, configured as described above, may arbitrarily adjust characteristics (for example, a radiation pattern and a gain) of themetal pattern40 by adjusting the depth h2 of thegroove32.
Thesemiconductor package100 according to a fifth embodiment of the present invention will be described with reference toFIG. 8.
Thesemiconductor package100 according to the present embodiment is different from the semiconductor packages according to the above-mentioned embodiments of the present invention in that it includes a plurality of first and secondprotective layers30 and31.
In thesemiconductor package100 according to the present embodiment, thefirst metal pattern42 may be formed on a surface of the firstprotective layer30, and thesecond metal pattern44 may be formed on a surface of the secondprotective layer31. Thefirst metal pattern42 may be connected to thesemiconductor chip20 by the firstconnective member50 and be connected to thesubstrate10 by the secondconnective members52 and53. In addition, thesecond metal pattern44 may be connected to thesemiconductor chip20 by the firstconnective member51. Here, the secondconnective members52 and53 may be used as ground electrodes of thefirst metal pattern42.
Meanwhile, thefirst metal pattern42 may be an antenna pattern, and thesecond metal pattern44 may be an antenna pattern, a circuit pattern having a function other than an antenna function, or a ground pattern. When thesecond metal pattern44 is the ground pattern, the firstconnective member51 may be used as a ground electrode of thesemiconductor chip20.
According to the present embodiment, each of the first andsecond metal patterns42 and44 is formed on the first and secondprotective layers30 and31, whereby a space for mounting themetal patterns42 and44 may be advantageously secured and interference between the first andsecond metal patterns42 and44 may be prevented.
Hereinafter, a method of manufacturing a semiconductor package according to the present invention will be described.FIGS. 9A through 9D and 10A through 10D are views showing a method of manufacturing a semiconductor package according to a first embodiment of the present invention.
The method of manufacturing a semiconductor package according to the first embodiment of the present invention may include an operation of preparing asubstrate10, an operation of connecting a firstconnective member50, an operation of forming aprotective layer30, and an operation of forming and connecting ametal pattern40.
a) Operation of PreparingSubstrate10
In the operation, thesubstrate10 which will be a base of the semiconductor package100 (SeeFIG. 1) may be prepared. Thesubstrate10 may be various kinds of substrate (for example, a silicon substrate, a ceramic substrate, a printed circuit board (PCB), a flexible substrate, or the like) well known in the art. Thesemiconductor chip20 may be previously mounted on one surface or both surfaces of thesubstrate10. Alternatively, thesemiconductor chip20 may be mounted on thesubstrate10 in the present operation. Thesubstrate10 and thesemiconductor chip20 may be electrically connected in the operation or in a separate operation.
b) Operation of ConnectingFirst Connective Member50
In the present operation, the firstconnective member50 may be connected to one surface (an upper surface based onFIGS. 9A through 9D) of thesemiconductor chip20. The firstconnective member50 may have a pin shape, a coil shape, or a thin plate shape and be connected to theconnection pad22 of thesemiconductor chip20 through a method such as soldering, or the like. Here, the firstconnective member50 may be mounted lengthwise in a direction perpendicular to one surface of the semiconductor chip20 (a vertical direction based onFIGS. 9A through 9D). Meanwhile,FIGS. 9A through 9D show that the firstconnective member50 is mounted on a central portion of thesemiconductor chip20. However, the firstconnective member50 may be connected to an edge or a side of thesemiconductor chip20 according to a kind ofsemiconductor chip20.
Meanwhile, the firstconnective member50 may be formed in an operation of wire-bonding aconnection pad12 of thesubstrate10 and thesemiconductor chip20 as shown inFIG. 10B. That is, the firstconnective member50 may be formed during an operation of connecting theconnection pad12 of thesubstrate10 and a connection pad (not shown) of thesemiconductor chip20 using awire56. In this case, the firstconnective member50 may be the same as, or similar to, the wire denoted by areference numeral56.
When the firstconnective member50 is formed in the operation of wire-bonding theconnection pad12 of thesubstrate10 and thesemiconductor chip20, the firstconnective member50 is easily formed, whereby the number of processes required in manufacturing thesemiconductor package100 may be reduced. In addition, since an operation of forming a via hole and an operation of forming a via electrode for electrically connecting thesemiconductor chip20 and ametal pattern40 may be omitted, manufacturing costs of thesemiconductor package100 may be reduced.
Meanwhile, the firstconnective member50 may be a wire having tension higher than that of thewire56 so as not to incline sidewardly or fall down, even in the operation of forming aprotective layer30. For example, the firstconnective member50 may be made of copper or a copper alloy. In addition, the firstconnective member50 may have a coil shape.
c) Operation of FormingProtective Layer30
In the present operation, theprotective layer30 covering thesemiconductor chip20 may be formed. Theprotective layer30 may be formed through a molding method. However, theprotective layer30 may be formed through various kinds of method, such as a printing method, a spin coating method, a jetting method, or the like, in addition to the molding method. Theprotective layer30 may be made of an epoxy mold compound (EMC) or other polymers.
Meanwhile, theprotective layer30 may be formed by performing a formation operation at least twice. For example, theprotective layer30 may be formed in a scheme of first forming a portion corresponding to reference numeral302 and then forming a portion corresponding to reference numeral304. This scheme may allow for easy confirmation of a defect, such as inclination, fall-down, or the like, of the firstconnective member50 in the operation of forming theprotective layer30.
d) Operation of Forming andConnecting Metal Pattern40
In the operation, themetal pattern40 may be formed. Themetal pattern40 may be formed on an upper surface (an upper surface based onFIGS. 9 through 9D) of theprotective layer30. For example, themetal pattern40 may be formed in a scheme of attaching a previously manufactured pattern to theprotective layer30. Themetal pattern40 may be formed as an antenna pattern for transceiving a wireless signal. Meanwhile, in the operation, themetal pattern40 and the firstconnective member50 may be electrically connected. Themetal pattern40 and the firstconnective member50 may be electrically connected by disposing a portion of themetal pattern40 on an upper end portion of the firstconnective member50. Alternatively, themetal pattern40 and the firstconnective member50 may also be electrically connected by previously forming a solder ball on the upper end portion of the firstconnective member50 and disposing themetal pattern40 on the solder ball.
In the case of the method of manufacturing a semiconductor package as described above, since the firstconnective member50 may be formed in the operation of wire-bonding theconnection pad12 of thesubstrate10 and thesemiconductor chip20, an additional separate process for forming the firstconnective member50 may not required. That is, in thesemiconductor package100 according to the embodiment, the operation of forming a via hole and the operation of forming a via electrode for electrically connecting thesemiconductor chip20 and themetal pattern40 may be omitted. Therefore, in the method of manufacturing a semiconductor package according to the embodiment, the number of manufacturing processes may be reduced, as compared to the related art.
Hereinafter, methods of manufacturing a semiconductor package according to other embodiments of the present invention will be described. For reference, in a description of the following embodiments, a description of operations that are the same as, or similar to, the operations of the first embodiment will be omitted.FIGS. 11A through 11 F are views showing a method of manufacturing a semiconductor package according to a second embodiment of the present invention.FIGS. 12A through 12E are views showing a method of manufacturing a semiconductor package according to a third embodiment of the present invention.FIGS. 13A through 13E are views showing a method of manufacturing a semiconductor package according to a fourth embodiment of the present invention.FIGS. 14A through 14E are views showing a method of manufacturing a semiconductor package according to a fifth embodiment of the present invention.FIGS. 15A through 15F are views showing a method of manufacturing a semiconductor package according to a sixth embodiment of the present invention.
A method of manufacturing a semiconductor package according to a second embodiment of the present invention will be described with reference toFIGS. 11A through 11 F. The method of manufacturing a semiconductor package according to the second embodiment of the present invention is different from the method of manufacturing a semiconductor package according to the first embodiment of the present invention in that a process of melting aprotective layer30 is further performed.
In the case of the method of manufacturing a semiconductor package according to the first embodiment, in the operation of forming theprotective layer30, the firstconnective member50 may not be exposed to the outside. Alternatively, in the case of the method of manufacturing a semiconductor package according to the first embodiment, since an exposed area of the firstconnective member50 is significantly small, the firstconnective member50 and themetal pattern40 may not be satisfactorily connected.
In consideration of this, the process of melting theprotective layer30 and a process of forming aconductive layer70 may be further performed in the embodiment. That is, in the embodiment, after theprotective layer30 is formed, theprotective layer30 in the vicinity of the firstconnective member40 may be melted (SeeFIG. 11D). Then, theconductive layer70, made of a metallic material, may be further formed in a melted portion34 (SeeFIG. 11E). Theconductive layer70 may be made of a solder paste or other materials through which a current is conducted.
In the present embodiment that further includes the above-mentioned operations, themetal pattern40 and the firstconnective member50 are connected to theconductive layer70, such that they may be stably connected.
A method of manufacturing a semiconductor package according to a third embodiment of the present invention will be described with reference toFIGS. 12A through 12E. The method of manufacturing a semiconductor package according to the third embodiment of the present invention is different from the methods for manufacturing a semiconductor package according to the above-mentioned embodiments of the present invention in that a process of grinding (for example, EMC back grinding) theprotective layer30 is further performed.
When themetal pattern40 is an antenna pattern, it is very important to minimize the distance between themetal pattern40 and thesemiconductor chip20. In consideration of this, the process of grinding theprotective layer30 in which a thickness of theprotective layer30 may be adjusted may be further performed in the embodiment.
That is, in the embodiment, after theprotective layer30 is formed, theprotective layer30 is ground using a separate grinder200 (SeeFIG. 12D). The grinding of theprotective layer30 may be performed by a grinder known in the art to which the present invention pertains. Alternatively, theprotective layer30 may be ground through a method that is known to those skilled in the art or may be appreciated by those skilled in the art.
Meanwhile, theprotective layer30 may be ground until the distance h1 from an upper surface of thesemiconductor chip20 to a lower surface of themetal pattern40 is equal to a preset distance. For reference, since the upper surface of thesemiconductor chip20 may not be confirmed in a state in which it is covered by theprotective layer30, theprotective layer30 may be ground until a distance h5 from an upper surface of thesubstrate10 to an upper surface of theprotective layer30 reaches to an object value.
The thickness of theprotective layer30 may be easily adjusted in the embodiment in which the above-mentioned operation is further included. Therefore, in the embodiment, the mismatching between thesemiconductor chip20 and themetal pattern40 may be effectively solved.
In addition, the embodiment may be usefully used even in the case in which the firstconnective member50 is not exposed to an outer portion of the protective layer30 (that is, in the case in which a distance h3 from thesubstrate10 to an end of the firstconnective member50 is smaller than a height h4 of the protective layer30).
For reference, the firstconnective member50 according to the embodiment may be formed in the operation of wire-bonding a connection terminal of thesubstrate10 and a connection terminal of thesemiconductor chip20, similar to the first embodiment. In addition, the firstconnective member50 may be a wire.
Hereinafter, a method of manufacturing a semiconductor package according to a fourth embodiment of the present invention will be described with reference toFIGS. 13A through 13E. The method of manufacturing a semiconductor package according to the fourth embodiment of the present invention is different from the methods for manufacturing a semiconductor package according to the above-mentioned embodiments of the present invention in that a process of connecting a secondconnective member52 is further performed.
In the embodiment, an operation of mounting the secondconnective member52 may be further performed. The secondconnective member52 may be mounted together with the firstconnective member50 in an operation of mounting the first connective member50 (SeeFIG. 13B). This secondconnective member52 may be used as a ground electrode of themetal pattern40 as described above.
The present embodiment is useful manufacture thesemiconductor package100 including the ground electrode of themetal pattern40.
Meanwhile, in the embodiment, a process of grinding theprotective layer30 according to the third embodiment may be further performed. In addition, the firstconnective member50 and the secondconnective member52 may be formed in the operation of wire-bonding the connection pad of thesubstrate10 and the connection terminal of thesemiconductor chip20. Therefore, in this case, the first and secondconnective members50 and52 may be wires.
Hereinafter, a method of manufacturing a semiconductor package according to a fifth embodiment of the present invention will be described with reference toFIGS. 14A through 14E. The method of manufacturing a semiconductor package according to the fifth embodiment of the present invention is different from the methods for manufacturing a semiconductor package according to the above-mentioned embodiments of the present invention in that an operation of forming a secondprotective layer31 is further performed.
In the embodiment, an operation of forming the secondprotective layer31 on the firstprotective layer30 may be further performed as shown inFIG. 14D. More specifically, the operation of forming the secondprotective layer31 may be further performed after thefirst metal pattern42 is formed on a surface of the firstprotective layer30. In addition, after the secondprotective layer31 is formed, an operation of forming thesecond metal pattern44 may be further performed. Thesecond metal pattern44 may be formed on a surface of the secondprotective layer31, and may be an antenna pattern, a circuit pattern having a function other than an antenna function, or a ground pattern.
The method of manufacturing a semiconductor package according to the embodiment is advantageous in forming several types of themetal patterns42 and44 on thesingle semiconductor chip20.
Hereinafter, a method of manufacturing a semiconductor package according to a sixth embodiment of the present invention will be described with reference toFIGS. 15A through 15F. The method of manufacturing a semiconductor package according to the sixth embodiment of the present invention is different from the methods for manufacturing a semiconductor package according to the above-mentioned embodiments of the present invention in that an operation of cutting a semiconductor package array into individual module units is further performed.
In the embodiment, thesubstrate10 may be provided in plural, and an operation of arranging the plurality ofsubstrates10 at a predetermined interval, eachsubstrate10 having thesemiconductor chip20 mounted thereon and covering all of the plurality ofsubstrates10 using theprotective layer30 may be further performed. In addition, in the embodiment, an operation of cutting a semiconductor package array intorespective semiconductor packages100 may be further performed.
The embodiment, configured as described above, is advantageous in manufacturing a plurality of semiconductor packages at the same time.
As set forth above, according to the embodiments of the present invention, the semiconductor chip may be sealed to be protected from the outside, whereby performance of the semiconductor package may be stably secured.
In addition, according to the embodiments of the present invention, the antenna is disposed at a position adjacent to the semiconductor chip, whereby an electrical connection distance between the semiconductor chip and the antenna could be minimized. Therefore, since the semiconductor package according to the embodiment of the present invention may minimize loss generated between the antenna and the semiconductor chip, it may be usefully used in a communications device utilizing the millimeter wave band (particularly the 60 GHz band).
Further, in the method of manufacturing a semiconductor package according to the embodiments of the present invention, the antenna is formed together with the substrate during a process of forming the substrate, whereby a manufacturing process may be simplified as compared to the related art in which the antenna is separately manufactured and mounted.
Furthermore, in the method of manufacturing a semiconductor package according to the embodiment of the present invention, semiconductor manufacturing equipment according to the related art is utilized, whereby required investment in new equipment for manufacturing the semiconductor package may be minimized.
In addition, in the method of manufacturing a semiconductor package according to the embodiment of the present invention, since a distance between the semiconductor chip and the antenna may be adjusted by grinding the protective layer, the characteristics of the antenna may be adjusted. As a result, the signal matching of the antenna may be performed.
While the present invention has been shown and described in connection with the embodiments, it will be apparent to those skilled in the art that modifications and variations can be made without departing from the spirit and scope of the invention as defined by the appended claims.