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US20140147800A1 - Quartz boat method and apparatus for thin film thermal treatment - Google Patents

Quartz boat method and apparatus for thin film thermal treatment
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Publication number
US20140147800A1
US20140147800A1US13/889,602US201313889602AUS2014147800A1US 20140147800 A1US20140147800 A1US 20140147800A1US 201313889602 AUS201313889602 AUS 201313889602AUS 2014147800 A1US2014147800 A1US 2014147800A1
Authority
US
United States
Prior art keywords
substrates
substrate
planar
thermal treatment
grooved
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US13/889,602
Inventor
Paul Alexander
Jurg Schmitzberger
Ashish Tandon
Robert D. Wieting
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CM Manufacturing Inc
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CM Manufacturing Inc
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Publication date
Application filed by CM Manufacturing IncfiledCriticalCM Manufacturing Inc
Priority to US13/889,602priorityCriticalpatent/US20140147800A1/en
Assigned to CM MANUFACTURING, INC.reassignmentCM MANUFACTURING, INC.CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).Assignors: STION CORPORATION
Assigned to HETF SOLAR INC.reassignmentHETF SOLAR INC.SECURITY AGREEMENTAssignors: DEVELOPMENT SPECIALIST, INC., SOLELY IN ITS CAPACITY AS THE ASSIGNEE FOR THE BENEFIT OF THE CREDITORS OF CM MANUFACTURING, INC. (F/K/A STION CORPORATION), AND CM MANUFACTURING (F/K/A STION CORPORATION)
Assigned to STION CORPORATIONreassignmentSTION CORPORATIONCHANGE OF NAME (SEE DOCUMENT FOR DETAILS).Assignors: HETF SOLAR INC.
Publication of US20140147800A1publicationCriticalpatent/US20140147800A1/en
Abandonedlegal-statusCriticalCurrent

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Abstract

A method of supporting a plurality of planar substrates in a tube shaped furnace for conducting a thermal treatment process is disclosed. The method uses a boat fixture having a base frame including two length portions and a first width portion, a second width portion, and one or more middle members connected between the two length portions. Additionally, the method includes mounting a removable first grooved rod respectively on the first width portion, the second width portion, and each of the one or more middle members, each first grooved rod having a first plurality of grooves characterized by a first spatial configuration. The method further includes inserting one or two substrates of a plurality of planar substrates into each groove in the boat fixture separated by a distance.

Description

Claims (11)

What is claimed is:
1. An apparatus for holding substrates for thermal treatment comprising:
a frame fixture having a substantially rectangular prism shape, the frame fixture including a base frame, a top frame, side connection bars coupling the base frame and the top frame, the base frame having two width members and middle joint members connected between the two length members;
a first grooved rod removably mounted on each of the two width members and each of the middle joint members, each first grooved rod including a first plurality of grooves for supporting planar substrates;
a first grooved bar removably mounted on each of two width members of the top frame, each first grooved bar including a second plurality of grooves aligned with the first plurality of grooves for guiding the plurality of planar substrates into the apparatus; and
a rack structure configured to be a mechanical support of the frame fixture in a loading position inside a furnace for subjecting the plurality of planar substrates in the first configuration to one or more reactive thermal treatment processes.
2. The apparatus ofclaim 1 wherein the frame fixture and the first grooved rod and the first grooved bar comprise quartz.
3. The apparatus ofclaim 1 wherein each of the plurality of planar substrates comprises glass having at least one surface overlaid by a photovoltaic precursor layer which includes at least copper, indium, and gallium species.
4. The apparatus ofclaim 1 wherein each of the plurality of planar substrates comprises a piece of soda lime glass having a form factor selected at least from a 65 cm×165 cm rectangle, a 20 cm×50 cm rectangle, a 20 cm×20 cm square.
5. The apparatus ofclaim 1 wherein the first configuration comprises an arrangement of the plurality of planar substrates in a substantially vertical orientation and parallel to a neighboring planar substrate at a distance equal to or greater than a predetermined value associated with at least the furnace and the one or more thermal treatment processes.
6. The apparatus ofclaim 5 wherein the predetermined value comprises a minimum spacing for maintaining a sufficient convection flow so that a temperature difference across each planar substrate is smaller than 15 degrees Celsius at least during a dwell stage of the thermal treatment processes.
7. The apparatus ofclaim 6 further comprising a second grooved rod for replacing the first grooved rod to mount on each of the two width members and each of the one or more middle joint members, each second grooved rod including a second plurality of grooves respectively configured to support a plurality of planar substrates in a second configuration, each groove supporting at least one planar substrate.
8. The apparatus ofclaim 7 wherein the second configuration comprises an arrangement of the plurality of planar substrates substantially parallel to each other with a front/back surface of one planar substrate facing another front/back surface of a neighboring planar substrate at a first/second distance away, the first distance being equal to or greater than the predetermined value, the second distance being substantially smaller than the first distance.
9. The apparatus ofclaim 8 wherein the front surface of each planar substrate comprises a precursor layer being subjected to the one or more thermal treatment processes.
10. The apparatus ofclaim 8 wherein the second distance is substantially zero and each groove is configured to support two planar substrates in back-to-back configuration.
11. The apparatus ofclaim 1 wherein the furnace is made of quartz material for enclosing a volume configured to form a gaseous environment comprising at least selenium species or sulfur species during the one or more thermal treatment processes.
US13/889,6022010-07-232013-05-08Quartz boat method and apparatus for thin film thermal treatmentAbandonedUS20140147800A1 (en)

Priority Applications (1)

Application NumberPriority DateFiling DateTitle
US13/889,602US20140147800A1 (en)2010-07-232013-05-08Quartz boat method and apparatus for thin film thermal treatment

Applications Claiming Priority (3)

Application NumberPriority DateFiling DateTitle
US36721110P2010-07-232010-07-23
US13/171,089US8461061B2 (en)2010-07-232011-06-28Quartz boat method and apparatus for thin film thermal treatment
US13/889,602US20140147800A1 (en)2010-07-232013-05-08Quartz boat method and apparatus for thin film thermal treatment

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US13/171,089DivisionUS8461061B2 (en)2010-07-232011-06-28Quartz boat method and apparatus for thin film thermal treatment

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US20140147800A1true US20140147800A1 (en)2014-05-29

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US13/171,089Expired - Fee RelatedUS8461061B2 (en)2010-07-232011-06-28Quartz boat method and apparatus for thin film thermal treatment
US13/889,602AbandonedUS20140147800A1 (en)2010-07-232013-05-08Quartz boat method and apparatus for thin film thermal treatment

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CN (1)CN102347211B (en)
DE (1)DE102011108321A1 (en)
TW (1)TWI466192B (en)

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