US20110318917A1 - Methods of forming through-silicon via structures including conductive protective layers - Google Patents

Abstract

Through-Silicon-Via (TSV) structures can be provided by forming a conductive via through a substrate extending from an upper surface of the substrate to a backside surface of the substrate, that is opposite the upper surface, and having a conductive protective layer comprising Ni and/or Co formed at a bottom of the conductive via. A polymer insulating layer can be formed on the backside surface that is separate from the substrate and in contact with the conductive protective layer.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS
• This application is a divisional of U.S. patent application Ser. No. 12/408,369, filed Mar. 20, 2009, which claims priority to Korean Patent Application No. 2008-0080494, filed in the Korean Intellectual Property Office on Aug. 18, 2008, the disclosures of which are incorporated herein in their entirety by reference.
FIELD OF THE INVENTION
• The present invention relates to the field of semiconductors in general, and more particularly, to Through-Silicon-Via structures and methods of forming.
BACKGROUND
• Advances in integration technology have led to the development of a three dimensionally stacked LSI approach taken in favor of the conventional two-dimensional LSI approach. Some types of three dimensional integration include package stacking, die stacking, and wafer stacking. Among the wafer stacking approach, a technique called Through-Silicon-Via (TSV) can be used to extend a via hole through a substrate so that a conductive via may be formed that completely penetrates the substrate. In turn, multiple substrates including TSVs can be stacked on one another to achieve three dimensional integration. In particular, the TSVs of different substrates can conduct signals from one substrate to another without the use of, for example, wires.
• Two approaches that can be used in the formation of TSVs include a “via first” approach and a “via last” approach. According to a via first approach, TSVs are formed through the substrate before a back end of line process, for example, a metal interconnection process, is accomplished. Furthermore, the via first approach may be used before CMOS devices are formed in the substrates. According to the via first approach, vias can be formed in the substrates to only partially penetrate the substrate wherein after the CMOS and back end of line processing can be provided. Subsequently, the substrates can be thinned so that the vias are exposed and bound together to achieve a three-dimensional stacked structure.
• Alternatively, the TSVs can be formed after the formation of the CMOS devices but before the back end of line processing. In particular, the CMOS devices can be formed on the substrate whereupon the vias can be formed to partially penetrate the substrate. Then, the back end of line processing can be provided and followed by a thinning process to complete the TSVs. Finally, the substrates having the TSVs formed therein can be bonded together to provide the three dimensionally stacked structure.
• According to the via first approach, vias can be formed in the substrate either before the CMOS devices are formed or before the back end of line processing is provided. For example, the vias can be formed before the formation of CMOS devices by first forming vias that partially penetrate the substrate. Then, the C-MOS and back end of line processing can be provided and followed by a thinning process, which can complete the formation of the TSVs and the substrate. Subsequently, multiple substrates including the TSVs can be bonded together to provide the three dimensionally stacked structure.
• According to the via last approach, the vias can be formed during or after the back end of line processing (BEOL) or after a bonding process. When the TSVs are formed during the BEOL, the process can be referred to as a “TSV middle process.” Conventionally, the TSV middle process can be included in the TSV last process as well. For example, processes for the formation of layer in a CMOS process, such formation of ILD, metal 1 TSV, and metal 2 processes.) For example, the via last approach can be used to provide TSVs after the back end of line processing, but before bonding by forming CMOS devices and a back end of line processing before the formation of vias which partially penetrate the substrate. Subsequently, a thinning process can be used to complete the TSV structure, which penetrates the substrate whereupon a bonding process can be used to connect the substrates including the TSV structures to provide the three dimensionally stacked structure.
• Alternatively, the via last approach can be used to provide the TSVs after the bonding. For example, the CMOS and back end of line processing can be provided and followed by the bonding of separate wafers together. The bonding wafers can then be thinned to form the TSVs to provide the three dimensionally stacked structure.
• TSV structures are also discussed in, for example, the following U.S. patent documents: U.S. Pat. No. 6,916,725, U.S. Pat. No. 7,214,615, U.S. Pat. No. 7,282,444, and U.S. Patent Publication No. 2004/0245623.
SUMMARY
• Embodiments according to the invention can provide methods of forming Through-Silicon-Via (TSV) structures including forming a conductive via through a substrate extending from an upper surface of the substrate to a backside surface of the substrate, that is opposite the upper surface, and having a conductive protective layer comprising Ni and/or Co formed at a bottom of the conductive via. A polymer insulating layer can be formed on the backside surface that is separate from the substrate and in contact with the conductive protective layer.
BRIEF DESCRIPTION OF THE DRAWINGS
• FIG. 1 is a cross sectional view that illustrates Through-Silicon-Via structures including conductive protective layers formed thereon in some embodiments according to the invention.
• FIG. 2 is a flow chart that illustrates methods of forming Through-Silicon-Via structures in some embodiments according to the invention.
• FIGS. 3-5 are cross sectional views that illustrate methods of forming TSV structures in some embodiments according to the invention.
• FIG. 6 is a graph that illustrates the comparative diffusivity of different metals over a range of temperatures.
• FIGS. 7-9 are cross sectional views that illustrate the formation of TSV structures in some embodiments according to the invention.
• FIGS. 10-12 are cross sectional views that illustrate the formation of TSV structures in some embodiments according to the invention.
• FIGS. 13-16 are cross sectional views that illustrate the formation of TSV structures in some embodiments according to the invention.
• FIG. 17 is a cross sectional view that illustrates TSV structures including a groove formed on a contact pad in some embodiments according to the invention.
• FIG. 18 is a cross sectional view that illustrates TSV structures having an upper planar surface formed offset from a contact pad in some embodiments according to the invention.
• FIGS. 19-22 are cross sectional views that illustrate the formation of TSV structures in some embodiments according to the invention.
• FIG. 23 is a cross sectional view that illustrates a schematic representation of a stack of substrates including respective TSV structures used to interconnect the substrates included in a package configured for interconnection to an under lying structure using solder bumps in some embodiments according to the invention.
• FIG. 24 is a cross sectional view that illustrates immediately adjacent substrates in the stack, electrically connected to one another by respective TSV structures wherein at least one of the TSV structures includes a groove filled with solder to define a coplanar surface with an upper surface at the TSV structure having a groove formed therein in some embodiments according to the invention.
• FIG. 25 is a cross sectional view that illustrates immediately adjacent substrates in a three dimensional stack electrically coupled to one another by respective TSV structures wherein at least one of the structures includes a groove filled with solder that extends outside the groove in some embodiments according to the invention.
• FIG. 26 is a cross sectional view that illustrates immediately adjacent substrates in the three dimensional stack electrically connected to one another by respective TSV structures wherein solder is formed on the planar surface of at least one of the TSV structures used to electrically connect to the immediately adjacent TSV structure in some embodiments according to the invention.
• FIG. 27 is a cross sectional schematic representation of a three dimensional stacked structure including TSVs in a zigzag pattern utilizing contact pads offset from the TSV structures in some embodiments according to the invention.
• FIG. 28 is a cross sectional schematic representation of a three dimensional stacked structure including TSV structures in an aligned pattern including contact pads formed within the TSV structures in some embodiments according to the invention.
• FIG. 29 is a cross sectional schematic representation of a three dimensional structure including inverted TSV structures in some embodiments according to the invention.
• FIG. 30 is a cross sectional view that illustrates the immediately adjacent substrates within three dimensional stack structure ofFIG. 29 wherein at least one of the TSV structures includes a groove therein filled with solder to define a planar surface of the TSV structure electrically connected to the adjacent TSV structure in some embodiments according to the invention.
• FIG. 31 is a cross sectional view that illustrates immediately adjacent substrates within the three dimensionally stacked structures shown inFIG. 29 wherein the immediately adjacent TSV structures are electrically connected by solder therebetween formed one a planar surface of at least one of the TSV structures in some embodiments according to the invention.
• FIG. 32 is a cross sectional schematic view that illustrates a three dimensionally stacked structure including TSV structures used to interconnect substrates therein arranged to make a zigzag pattern wherein the TSV structures include contact pads that are offset from the TSV structures in some embodiments according to the invention.
• FIG. 33 is a plan schematic view of a standard form factor memory card in some embodiments according to the invention.
• FIG. 34 is a cross sectional view taken along the cross sectional line I-I′ shown inFIG. 33 that illustrates a three dimensionally stacked structure used to implement the memory card as part of the stack and further a controller chip associated therewith in some embodiments according to the invention.
• FIG. 35 is a plan view of a standard form factor memory card included in a three dimensionally stacked structure including TSV structures in some embodiments according to the invention.
• FIG. 36 is a cross sectional schematic view taken along cross sectional line II-II′ shown inFIG. 35 wherein a three dimensionally stacked structure including TSV structures are used to implement non-volatile memory with TSV structures including contact pads formed therein used to electrically connect the substrates in the stack to one another in some embodiments according to the invention.
• FIG. 37 is schematic representation of a memory module including memory devices with TSV structures therein in some embodiments according to the invention.
• FIG. 38 is a block diagram that illustrates an electronic system including various devices including TSV structures in some embodiments according to the invention.
DESCRIPTION OF EMBODIMENTS ACCORDING TO THE INVENTION
• The present invention now will be described more fully hereinafter with reference to the accompanying drawings, in which embodiments of the invention are shown. However, this invention should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. In the drawings, the thickness of layers and regions may be exaggerated for clarity. Like numbers refer to like elements throughout. As used herein the term “and/or” includes any and all combinations of one or more of the associated listed items and may be abbreviated as “/”.
• The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the singular forms “a,” “an” and “the” are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms “comprises,” “comprising,” “having,” “having,” “includes,” and/or “including” when used in this specification, specify the presence of stated features, regions, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, regions, steps, operations, elements, components, and/or groups thereof.
• It will be understood that when an element such as a layer or region is referred to as being “on” or extending “onto” another element (or variations thereof), it can be directly on or extend directly onto the other element or intervening elements may also be present. In contrast, when an element is referred to as being “directly on” or extending “directly onto” another element (or variations thereof), there are no intervening elements present. It will also be understood that when an element is referred to as being “connected” or “coupled” to another element (or variations thereof), it can be directly connected or coupled to the other element or intervening elements may be present. In contrast, when an element is referred to as being “directly connected” or “directly coupled” to another element (or variations thereof), there are no intervening elements present.
• It will be understood that, although the terms first, second, etc. may be used herein to describe various elements, components, regions, layers and/or sections, these elements, materials, regions, layers and/or sections should not be limited by these terms. These terms are only used to distinguish one element, material, region, layer or section from another element, material, region, layer or section. Thus, a first element, material, region, layer or section discussed below could be termed a second element, material, region, layer or section without departing from the teachings of the present invention.
• Relative terms, such as “lower”, “back”, and “upper” may be used herein to describe one element's relationship to another element as illustrated in the Figures. It will be understood that relative terms are intended to encompass different orientations of the device in addition to the orientation depicted in the Figures. For example, if the structure in theFIG. 1 is turned over, elements described as being on the “backside” of substrate would then be oriented on “upper” surface of the substrate. The exemplary term “upper”, can therefore, encompasses both an orientation of “lower” and “upper,” depending on the particular orientation of the figure. Similarly, if the structure in one of the figures is turned over, elements described as “below” or “beneath” other elements would then be oriented “above” the other elements. The exemplary terms “below” or “beneath” can, therefore, encompass both an orientation of above and below.
• Embodiments of the present invention are described herein with reference to cross section and perspective illustrations that are schematic illustrations of idealized embodiments of the present invention. As such, variations from the shapes of the illustrations as a result, for example, of manufacturing techniques and/or tolerances, are to be expected. Thus, embodiments of the present invention should not be construed as limited to the particular shapes of regions illustrated herein but are to include deviations in shapes that result, for example, from manufacturing. For example, a region illustrated or described as flat may, typically, have rough and/or nonlinear features. Moreover, sharp angles that are illustrated, typically, may be rounded. Thus, the regions illustrated in the figures are schematic in nature and their shapes are not intended to illustrate the precise shape of a region and are not intended to limit the scope of the present invention.
• Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and the present disclosure, and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.
• FIG. 1 is a cross sectional view that illustrates a Through-Silicon-Via (TSV)structure100 including a conductive via105 that extends through asubstrate110 from anupper surface111 to aback side surface112. It will be understood that the terms “upper” and “back” sides are relative terms used herein for convenience to differentiate one surface from another and, further, can be generally referred to the surfaces that are processed by thinning or etching to expose a protruding portion of the conductive via105 as part of the completedTSV structure100.
• A conductiveprotective layer115 is formed on the conductive via and extends on the side wall thereof to a bottom region of the conductive via105 proximate to theback side surface112. A diffusion barrier layer525 is formed on the conductiveprotective layer115 and extends along the side wall of the conductive via105 but does not extend on to the bottom region thereof. Still further, an insulatinglayer120 is formed on the diffusion barrier layer525 and also extends on the side wall on the conductive via105 and further, does not extend to the bottom region of the conductive via105. It will be understood that in some embodiments according to the invention, the diffusion barrier layer525 and the insulatinglayer120 can be combined into a single layer.
• Still referring toFIG. 1 a separatepolymer insulating layer130 is formed on theback side surface112 of thesubstrate110 and extends on to the side walls of the conductiveprotective layer115 proximate to the conductive via105. Furthermore, the outer surface of the separatepolymer insulating layer130 has an inclined profile proximate to where the separate insulatinglayer130 contacts the conductiveprotective layer115.
• In some embodiments according to the invention, thepolymer insulating layer130 has an average thickness, measure relative to theback side surface112 at the conductive via that is greater than the thickness of the polymer insulating layer on thebackside surface112 spaced apart from the conductive via. In some embodiments according to the invention, thepolymer insulating layer130 is thinner on the conductive via side wall than when measured relative to the back side surface. In still other embodiments according to the invention, thepolymer insulating layer130 has a thickness of about 8 microns where the conductive via105 protrudes from theback side surface112. In still other embodiments according to the invention, thepolymer insulating layer130 has a thickness of about 1 to 2 microns and a position that is spaced apart from within the protruding portion of the conductive via105. In some embodiments according to the invention, thepolymer insulating layer130 has a viscosity of about 290 cP, and a resistivity of about 10 to the 10-ohm-cm and modules of about 1 GPa to about 3 GPa.
• In some embodiments according to the invention, the conductiveprotective layer115 can be a metal that forms in inter-metallic compound with solder that can be used to electrically connect theTSV structure100 to another TSV structure stacked on. In some embodiments according to the invention the conductiveprotective layer115 can be a metal having a wet ability with solder that is greater than that of Td, Ti, TiM, Ta, and TaN. In some embodiments according to the invention, the conductiveprotective layer115 can be Ni, and/or Co doped with a rare earth element or transition metal. In some embodiments according to the invention, the conductiveprotective layer115 can be Ni doped with V and/or P or can be Co doped with W, P, Cr, and/or B.
• In some embodiments according to the invention, the conductiveprotective layer115 can be a metal having diffusivity into Si that is less than that of Au, Cu, and Ag into Si. Some exemplary metals according to the present invention are illustrated, for example, inFIG. 6.
• In some embodiments according to the invention, the protruding portion of the conductive via115 can protrude from theback side surface112 by about 15 microns and can have a total height (i.e., from the portions of the conductive via105 located on theupper surface111 to the protruding portion) of about 45 microns and have a width of about 30 microns where the thickness of thesubstrate110 is about 30 microns. Although not shown inFIG. 1, in some embodiments according to the invention, the conductive via105 can be formed on a conductive pad located in thesubstrate110 just beneath the portion of the conductive via105 located on theupper surface111. In still other embodiments according to the invention, the conductive via105 can be formed offset from the conductive pad such that the conductive pad is located on theupper surface111 spaced apart from the conductive via105.
• FIG. 2 is a flow chart that illustrates methods of forming TSV structures in some embodiments according to the invention. According toFIG. 2 a hole is formed in a substrate (Block505) and an insulator, diffusion barrier layer and conductive protective layer are formed on a substrate and in the hole (Block210).
• A conductive material is formed in the hole (Block515), and the back side surface of the substrate is processed to expose the diffusion barrier layer, conductive protective layer on the back side of the substrate to provide a TSV structure (Block220).
• A polymer insulating layer is formed on the back side surface of the substrate and on the back side portion of the TSV structure (Block225) and a portion of the polymer insulating layer is removed to expose the TSV structure on the back side surface (Block330).
• FIGS. 3-5 and7-9 are cross sectional views that illustrate methods of forming TSV structures in some embodiments according to the invention. According toFIG. 3, asubstrate11 includes an upper surface11F and a back side surface11B and includes circuits from therein. Further, an insulatinglayer15 is formed on the upper surface11F to have hole15H therein that exposes anelectrical interconnect13 that lies within the redistribution region in which a redistributed contact pad will be formed offset from the TSV structure formed in thesubstrate11. In some embodiments according to the invention theinterconnect13 can be Cu, Al, W, Ti, Ta, which can be used to provide the contact pad. In some embodiments according to the invention, the insulatinglayer15 can be a passivation layer formed of Si, O, Si, N, and/or Si ON.
• According toFIG. 4, arecess20 is formed in thesubstrate11 using dry etching or laser drilling. In some embodiments according to the invention, therecess20 has a diameter of about 30 microns and a depth of about 30 to about 100 microns.
• According toFIG. 5, aninsulator layer21 can be formed in therecess20 and on the upper surface11F. In some embodiments according to the invention, theinsulator21 is not deposited in or is removed from the opening15H. Adiffusion barrier layer23 can be formed in therecess20 on theinsulator layer21 as well as on the upper surface11F. In some embodiments according to the invention, thediffusion barrier layer23 can be Ti, TiN, TaN. In some embodiments according to the invention, thediffusion barrier layer23 is also not deposited or is removed from the opening15H wherein the contact pad will be formed. A conductiveprotective layer24 is formed inside therecess20 and on the upper surface11F including in the opening15H. In some embodiments according to the invention, the insulatinglayer21 and diffusion barrier layer can be combined in a single layer having the properties of both. It will be further understood that the conductiveprotective layer24 described above in reference toFIG. 5 can have the same properties as described above in reference toFIGS. 1 and 6.
• According toFIG. 7, a photo resistpattern32 is formed on the conductiveprotective layer24 so that an opening in the photo resistpattern32 exposes therecess20 and a portion of theupper surface11 that includes the redistribution area including the contact pad.
• According toFIG. 8, aconductive material25 is formed on therecess20 and on the upper surface11F. In some embodiments according to the invention, the conductive material can be Cu, W, Al, which is formed using electroless plating, CVD, or PVD.
• According toFIG. 9, theconductive material25 can be used as a hard mask to remove the photo resistpattern32 as well as portions of the conductiveprotective layer24 and thediffusion barrier layer23 laying beneath the photo resistpattern32. Further, a groove27S can be formed in theconductive material33 that is self aligned to the center of therecess20. In some embodiments according to the invention, a bottom of the groove of27S can extend to a level into the recess that is beneath a level of the upper surface11F by a distance d1. As further shown inFIG. 9, formation of theconductive material25 in therecess20 and on the redistributed pad can provide for the formation of a redistribution pattern27E wherein theconductive material25 is electrically connected to theinterconnect13 and thesubstrate11.
• FIGS. 10-12 are cross sectional views that illustrate the formation of theconductive material27 in therecess20 and on the upper surface11F according to other embodiments according to the invention.
• According toFIG. 10, a photo resistpattern32 is formed in therecess20 and on the redistribution region including over the whole15H. According toFIG. 11, the photo resistpattern32 is used as an etch mask to remove the materials on the upper surface11F located outside the photo resistpattern32 to provide for the formation of therecess20 and to expose a portion of the upper surface11F including the redistribution region.
• According toFIG. 12, theconductive material27 is formed in therecess20 and on the portions of the upper surface11F on which on the conductiveprotective layer24 remains. Accordingly, the conductive via can be formed in the recess along with the electrical connection to the inter connect13 for the processing as described below.
• FIGS. 13-16 are cross sectional views that illustrate formation of TSV structures by processing the back side surface11B of thesubstrate11 in some embodiments according to the invention. According toFIG. 13, the back side surface11B is processed using grinding or a chemical policy process to reduce the thickness of thesubstrate11 but still avoids the exposure of a bottom portion27B of the conductiveprotective layer24.
• According toFIG. 14, a dry etch process is used to expose the bottom portion24B of the conductiveprotective layer24, which includes a protrudingportion25, which protrudes from the reduced back side surface11B of thesubstrate11. As further shown inFIG. 14, a portion of theinsulator layer21 and an underlying portion of thediffusion barrier layer23 are removed where the protruding portion occurs.
• According toFIG. 15, apolymer insulating layer31 is formed on the back side surface11B including on the protruding portion of the via and particularly on the conductiveprotective layer24. In some embodiments according to the invention, thepolymer insulating layer31 is applied to the back side surface11B using a spin coating or a spraying method and, further, the polymer insulating layer can have an etch selectivity relative to the conductiveprotective layer24. It will be understood that thepolymer insulating layer31 can help relieve stress caused by materials that are formed on or in the substrate to reduce the tendency of the substrate to warp. Accordingly, because thepolymer insulating layer31 is coated on to the back side surface11B, thepolymer insulating layer31 can be a separate layer distinct from thesubstrate11.
• According toFIG. 16, thepolymer insulating layer31 is etched back to reduce the thickness thereof and the backside surface11B as well as to expose the conductive protective layer through thepolymer insulating layer31. Furthermore, the etch back process can provide thepolymer insulating layer31 to have an incline profile at a point where the polymer insulating layer contacts the conductiveprotective layer24. As shown inFIG. 16, the etch back process reduces the thickness of thepolymer insulating layer31 to a thickness D2 which is less than the distance which the protruding portion of the via protrudes from the back side surface11B so that the protruding portion of the via protrudes through thepolymer insulating layer31. Furthermore, as shown inFIG. 10, in some embodiments according to the invention, a thickness D3 of thepolymer insulating layer31 on a side wall of the conductiveprotective layer24 included in the protruding portion thereof is less than the thickness D2 of thepolymer insulating layer31 on the back side surface11B. It will be further understood that the thickness D3 can be controlled by adjusting the viscosity of the polymer used to form thepolymer insulating layer31.
• FIG. 17 is a cross sectional view that illustrates a TSV structure co-located with acontact pad13′ having portions located in thesubstrate11 as shown.
• FIG. 18 is a cross sectional view is a view that illustrates TSV structures wherein an upper surface27E′ of the conductive via is plainer and does not include agroove20.
• FIGS. 19-22 are cross sectional views that illustrate methods of forming a TSV structure in some embodiments according to the invention. According toFIG. 19, aninsulator layer21,diffusion barrier layer23, and a conductiveprotective layer24 are formed in therecess20 and on the upper surface11F of thesubstrate11 as described above. According toFIG. 20, a photo resistmask35 is formed partially in therecess20 as well as on the upper surface11F of thesubstrate11. In particular, a central portion of therecess20 is left exposed by the photo resistpattern35 that covers remaining portions of therecess20 as well as those portions of the conductive protective24 layer outside the recess.
• According toFIG. 21, the etching step is conducted using the photo resistpattern35 to remove a portion of the conductiveprotective layer24 located at the bottom ofrecess20, which is exposed by the photo resistpattern35. Subsequently, the photo resistpattern35 is removed. Accordingly, theinsulator layer21 and thediffusion barrier layer23 of the only remaining portions of the layers located at the bottom of the recess at region B.
• According toFIG. 22, aconductive material25 is formed in therecess20 as well as on the upper surface11F from thesubstrate11 including on the redistribution region to provide the contact pad as described above. It will be understood that theconductive material25 deposited in the recess can be patterned to provide the TSV structure according to any of the approaches described herein.
• FIG. 23 is the cross sectional schematic view of apackage118 including a three dimensional stack of substrate121-128 connected to one another byTSV structures27 on asubstrate110. It will be further understood that the three dimensional stack can include asubstrate129 including logic devices also connected to the 3-D stack using TSV structures in some embodiments according to the invention. Further, thepackage118 can be conducted to other devices or a substrate by solder bumps111. As further shown inFIG. 23, thesubstrate110 can include interconnect113 used to provide signals to-from the three dimensional stacks of substrates and the solder bumps111.
• FIG. 24 is a cross sectional view that illustrates TSV structures included in the three dimensional stack of substrates and thepackage118 highlighted at region E1 shown inFIG. 23 in some embodiments according to the invention. According toFIG. 24, the groove in the upper surface of the conductive material includessolder33 which is used to electrically connect the underlying TSV structure to another TSV structure located directly above the groove. It will be understood that thesolder33 is limited to being within the groove and does not extend on to the upper surface of the conductive material.
• FIG. 25 is a cross sectional view that illustrates alternative embodiments of interconnected TSV structures included in thepackage118 shown inFIG. 23 in some embodiments according to the invention. In particular,solder33′ used to interconnect the two immediately adjacent TSV structures is not limited to within the groove and rather extends on to at least a portion of the upper surface of the conductive material used to form the lower TSV structure.
• FIG. 26 is cross sectional view that illustrates a conventional structure wherein asolder34 used to electrically connect the upper and lower TSV structures may provide additional thickness D4 to the overall height of the three dimensional stack.
• FIG. 27 is a cross sectional schematic view that illustrate a three dimensional stack of substrates including TSV structures used for electrical connections between the three dimensionally stacked substrates. In particular, the TSV structures can be configured with the redistributed region including the pads which can be electrically coupled to TSV structures located in the immediately adjacent substrates in the three dimensional stack. Furthermore, the redistribution regions and TSV structures associated therewith can be arranged to make zigzag pattern as shown. It will be understood that the arrangement shown inFIG. 27 can be utilized to provide a three dimensional stack of substrates including memory devices as well as alogic chip139 located within the three dimensional stack.
• FIG. 28 is a cross sectional schematic view of apackage118 which would include the three dimensional stack of substrate electrically connected to one another by TSV structures in some embodiments according to the invention. In contrast, the two embodiments illustrated inFIG. 27, the arrangement illustrated inFIG. 28 provide parallel interconnection of the TSV structures utilizing the contact pad located within the TSV structures rather than offset therefrom as shown inFIG. 27. Furthermore, as shown inFIG. 28 the three dimensional stack of substrates can be used to implement memory devices within the package which may also exclude alogic device139 in comparison to that shown inFIG. 27.
• FIG. 29 is a cross sectional schematic view that illustrates a three dimensional stack of substrates electrically interconnected with one another using TSV structures in some embodiments according to the invention. As further shown inFIG. 29, alogic chip159 can be included within the three dimensional stack of substrates. As further illustrated inFIG. 29, the TSV structures can be coupled to one another using an inverted TSV structure.
• FIG. 30 is a cross sectional view that illustrates the adjacent TSV structures within the three dimensional stack of substrates shown at region E1 inFIG. 29. According toFIG. 30,solder33 located in the groove of the upper TSV structure is fully confined therein and does not extend out of the groove.
• FIG. 32 is a cross sectional schematic representation of apackage118 including a three dimensional stack of substrate electrically connected to one another by TSV structures arranged in a zigzag pattern in some embodiments according to the invention.
• FIG. 33 is a plan view of a memory card formatted to a standard form-factor card including non-volatile memory,controller chip195, andexternal terminals193 used to interconnect the memory card to a socket in some embodiments according to the invention.
• FIG. 34 is a cross sectional schematic view along cross section I-I′ shown inFIG. 33 in some embodiments according to the invention. In particular, a substrate within thecard199 includesinterconnect192 that is connected to theexternal terminals193. Theinterconnect192 also electrically connects to substrates for thecontroller chip195 as well as the substrates within the three dimensional stack of substrates used to implement the non-volatile memory within the memory card. According toFIG. 34, both thecontroller chip195 and the substrates within the three dimensional stack used to implement the non-volatile memory are electrically connected to one another using TSV structures where the contact pads are included within the TSV structures themselves as illustrated above, for example, inFIG. 17.
• FIG. 35 is a plan view of a non-volatile memory implemented according to a standard form factor including anon-volatile memory198 andexternal terminals193 in some embodiments according to the invention.
• FIG. 36 is a cross sectional schematic view along cross section II-II prime shown inFIG. 35. According toFIG. 36, a three dimensional stack of substrates is used to implement thenon-volatile memory198 and further can include asubstrate195 prime used to implement the controller. Further, thesubstrate191 prime includeselectrical interconnect192 that is used to electrically connect theexternal terminals193 to the substrates within the three dimensional stack. Furthermore, the three dimensional stack substrates are interconnected by TSV structures having contact pads formed therein as shown for example above inFIG. 17.
• FIG. 37 is a schematic representation of a memorymodule including packages207 including memory devices on asubstrate201 whereinIO terminals205 are used to connect the memories within thepackages207 to devices located outside the memory module. Furthermore, the memory module can include acontroller unit203 to coordinate operations of the memory devices included on the module. It will be understood that memory devices included within thepackages207 can be formed with TSV structures as described herein in some embodiments according to the invention.
• FIG. 38 is a block diagram of an electronic system that includes aprocessor215 coupled to amemory217 and anIO device213 by abus219. It will be understood that the devices used to implement theprocessor215, thememory devices217 and theIR devices213 can all be implemented using TSV structures in some embodiments according to the invention.
• Many alterations and modifications may be made by those having ordinary skill in the art, given the benefit of present disclosure, without departing from the spirit and scope of the invention. Therefore, it must be understood that the illustrated embodiments have been set forth only for the purposes of example, and that it should not be taken as limiting the invention as defined by the following claims. The following claims are, therefore, to be read to include not only the combination of elements which are literally set forth but all equivalent elements for performing substantially the same function in substantially the same way to obtain substantially the same result. The claims are thus to be understood to include what is specifically illustrated and described above, what is conceptually equivalent, and also what incorporates the essential idea of the invention.

Claims (14)

1. A method of forming a Through-Silicon-Via (TSV) comprising:

forming a conductive via through a substrate extending from an upper surface of the substrate to a backside surface of the substrate, opposite the upper surface, having a conductive protective layer comprising Ni and/or Co formed at a bottom of the conductive via; and

forming a polymer insulating layer on the backside surface that is separate from the substrate and in contact with the conductive protective layer.

2. A method according toclaim 1 wherein forming a conductive via further comprises:

forming a recess in the substrate, the recess having an opening on the upper surface of the substrate;

forming the conductive protective layer at the bottom of the recess;

depositing a conductive material on the conductive protective layer in the recess; and

processing the backside of the substrate to provide a protruding portion of the conductive material and the conductive protective layer protruding from the backside surface.

3. A method according toclaim 2 further comprising:

forming a groove in an upper surface of the conductive material having an opening facing away from the substrate and configured to extend into the via to beneath the upper surface of the substrate.

4. A method according toclaim 3 further comprising:

forming solder in the groove; and

electrically connecting the solder to another TSV structure above the conductive via.

5. A method according toclaim 2 further comprising:

forming solder on a planar upper surface of the conductive material; and

electrically connecting the solder to another TSV structure above the conductive via.

6. A method according toclaim 1 wherein the polymer insulating layer has a viscosity comprising about 290 cP, a resistivity of about 1010 ohm-cm, and a modulus of about 1 GPa to about 3 GPa.

7. A method of forming a Through-Silicon-Via (TSV) comprising:

forming a recess in a substrate having an opening on an upper surface of the substrate;

forming a conductive protective layer at a bottom of the recess;

depositing a conductive material on the conductive protective layer in the recess;

processing a backside surface of the substrate, opposite the upper surface, to provide a protruding portion of the conductive material and the conductive protective layer protruding from the backside surface; and

coating the protruding portion and the substrate with a polymer insulating layer to a thickness of about 1 to about 2 micrometers at a first location spaced apart from where the protruding portion protrudes from the backside surface and a thickness of about 8 micrometers at a second location at the protruding portion measured relative to the backside surface.

8. A method according toclaim 7 wherein the conductive protective layer comprises Ni and/or Co.

9. A method of forming a Through-Silicon-Via (TSV) comprising:

forming a recess in a substrate having an opening on an upper surface of the substrate;

forming an insulator layer, a diffusion barrier layer, and a conductive protective layer comprising Ni and/or Co, at a bottom of the recess and on the upper surface;

forming a photo-resist pattern including an opening on the upper surface exposing the recess;

depositing a conductive material in the recess through the opening;

processing the upper surface to remove the photo-resist pattern and portions of the conductive protective layer and the diffusion barrier layer beneath the photo-resist pattern;

processing a backside surface of the substrate, opposite the upper surface, to provide a protruding portion of the conductive material and the conductive protective layer protruding from the backside surface;

coating the protruding portion with a polymer insulating layer that is separate from the substrate; and

removing a portion of the polymer insulating layer to expose the protruding portion.

10. A method according toclaim 9 wherein processing further comprises:

processing the backside surface using grinding or chemical-mechanical-polishing (CMP) to reduce a thickness of the substrate to provide a reduced backside surface and to avoid exposing the conductive protective layer; and then

dry-etching the reduced backside surface to further thin the substrate and to expose the conductive protective layer.

11. A method of forming a Through-Silicon-Via (TSV) comprising:

forming a recess in a substrate having an opening on an upper surface of the substrate;

forming an insulator layer, a conductive protective layer comprising Ni and/or Co, and a diffusion barrier layer at a bottom of the recess and on the upper surface;

forming a photo-resist pattern including an opening on the upper surface exposing a central portion of the bottom of the recess and covering an outer portion of the bottom of the recess;

processing the upper surface to remove a portion of the barrier layer in the opening to expose an underlying portion of the conductive protective layer;

depositing a conductive material in the recess through the opening;

processing a backside surface of the substrate, opposite the upper surface, to provide a protruding portion of the conductive material and the conductive protective layer protruding from the backside surface;

coating the protruding portion with a polymer insulating layer that is separate from the substrate; and

removing a portion of the polymer insulating layer to expose the protruding portion

12. A method according toclaim 11 wherein processing further comprises:

processing the backside surface using grinding or chemical-mechanical-polishing (CMP) to reduce a thickness of the substrate to provide a reduced backside surface and to avoid exposing the conductive protective layer; and then

dry-etching the reduced backside surface to further thin the substrate and to expose the conductive protective layer.

13. A method of forming a Through-Silicon-Via (TSV) comprising:

forming a recess in a substrate having an opening on an upper surface of the substrate;

forming an insulator layer, a diffusion barrier layer, and a conductive protective layer comprising Ni and/or Co, at a bottom of the recess and on the upper surface;

forming a photo-resist pattern in the recess and outside the recess so that a portion of the insulator layer, the diffusion barrier layer, and the conductive protective layer outside the recess is exposed;

etching the portion of the insulator layer, the diffusion barrier layer, and the conductive protective layer outside the recess to remove the portion;

removing the photo-resist pattern;

depositing a conductive material in the recess;

processing a backside surface of the substrate, opposite the upper surface, to provide a protruding portion of the conductive material and the conductive protective layer protruding from the backside surface;

coating the protruding portion with a polymer insulating layer that is separate from the substrate; and

removing a portion of the polymer insulating layer to expose the protruding portion.

14. A method according toclaim 9 wherein processing further comprises:

processing the backside surface using grinding or chemical-mechanical-polishing (CMP) to reduce a thickness of the substrate to provide a reduced backside surface and to avoid exposing the conductive protective layer; and then

dry-etching the reduced backside surface to further thin the substrate and to expose the conductive protective layer.

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