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US20090015830A1 - Methods and devices for measuring a concentrated light beam - Google Patents

Methods and devices for measuring a concentrated light beam
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Publication number
US20090015830A1
US20090015830A1US12/201,251US20125108AUS2009015830A1US 20090015830 A1US20090015830 A1US 20090015830A1US 20125108 AUS20125108 AUS 20125108AUS 2009015830 A1US2009015830 A1US 2009015830A1
Authority
US
United States
Prior art keywords
light
wavelength
disk
profiling
sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US12/201,251
Inventor
Timothy N. Thomas
Bruce Adams
Dean C. Jennings
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials IncfiledCriticalApplied Materials Inc
Priority to US12/201,251priorityCriticalpatent/US20090015830A1/en
Assigned to APPLIED MATERIALS, INC.reassignmentAPPLIED MATERIALS, INC.ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: JENNINGS, DEAN C., THOMAS, TIMOTHY N., ADAMS, BRUCE
Publication of US20090015830A1publicationCriticalpatent/US20090015830A1/en
Abandonedlegal-statusCriticalCurrent

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Abstract

Methods and devices are provided for profiling a beam of light that includes a wavelength λ. The beam of light is received. Secondary light is generated at a wavelength λ′ different from wavelength λ by fluorescing a material with the received beam of light. The secondary light is separated from the received beam of light. The separated secondary light is optically directed to a sensor.

Description

Claims (20)

US12/201,2512004-10-282008-08-29Methods and devices for measuring a concentrated light beamAbandonedUS20090015830A1 (en)

Priority Applications (1)

Application NumberPriority DateFiling DateTitle
US12/201,251US20090015830A1 (en)2004-10-282008-08-29Methods and devices for measuring a concentrated light beam

Applications Claiming Priority (3)

Application NumberPriority DateFiling DateTitle
US62372004P2004-10-282004-10-28
US11/261,439US7440088B2 (en)2004-10-282005-10-28Methods and devices for measuring a concentrated light beam
US12/201,251US20090015830A1 (en)2004-10-282008-08-29Methods and devices for measuring a concentrated light beam

Related Parent Applications (1)

Application NumberTitlePriority DateFiling Date
US11/261,439ContinuationUS7440088B2 (en)2004-10-282005-10-28Methods and devices for measuring a concentrated light beam

Publications (1)

Publication NumberPublication Date
US20090015830A1true US20090015830A1 (en)2009-01-15

Family

ID=35840443

Family Applications (2)

Application NumberTitlePriority DateFiling Date
US11/261,439Expired - Fee RelatedUS7440088B2 (en)2004-10-282005-10-28Methods and devices for measuring a concentrated light beam
US12/201,251AbandonedUS20090015830A1 (en)2004-10-282008-08-29Methods and devices for measuring a concentrated light beam

Family Applications Before (1)

Application NumberTitlePriority DateFiling Date
US11/261,439Expired - Fee RelatedUS7440088B2 (en)2004-10-282005-10-28Methods and devices for measuring a concentrated light beam

Country Status (6)

CountryLink
US (2)US7440088B2 (en)
EP (1)EP1805490A1 (en)
JP (1)JP4777995B2 (en)
KR (1)KR20070065908A (en)
CN (1)CN101048647A (en)
WO (1)WO2006052512A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US11067438B2 (en)*2017-07-272021-07-20Canare Electric Co., Ltd.Laser beam profile measurement device

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US7947584B2 (en)*2008-05-022011-05-24Applied Materials, Inc.Suitably short wavelength light for laser annealing of silicon in DSA type systems
US9018108B2 (en)2013-01-252015-04-28Applied Materials, Inc.Low shrinkage dielectric films
DE102015016240B3 (en)*2015-12-162017-05-24Primes GmbH Meßtechnik für die Produktion mit Laserstrahlung Transparent measuring probe for beam scanning
DE102016011568B4 (en)2016-09-262019-03-07Primes GmbH Meßtechnik für die Produktion mit Laserstrahlung Apparatus and method for determining spatial dimensions of a light beam
JP6244502B1 (en)*2017-04-172017-12-06カナレ電気株式会社 Laser beam profile measuring device
JPWO2020179049A1 (en)*2019-03-072021-11-25カナレ電気株式会社 Laser beam profile measuring device

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US4425907A (en)*1980-09-251984-01-17Exxon Research And Engineering Co.Reflector-coupled fluorescent solar collector
US4848902A (en)*1987-02-261989-07-18Erwin StriglDevice for measuring the intensity profile of a laser beam
US4885471A (en)*1988-04-221989-12-05Taunton Technologies, Inc.Ultraviolet radiometer
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US6114704A (en)*1998-10-132000-09-05Cymer, Inc.Front-illuminated fluorescent screen for UV imaging
US6242292B1 (en)*1994-12-162001-06-05Semiconductor Energy Laboratory Co., Ltd.Method of producing a semiconductor device with overlapped scanned linear lasers
US6365870B1 (en)*1997-10-222002-04-02Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V.Method and device for treating work pieces with laser radiation
US6393042B1 (en)*1999-03-082002-05-21Semiconductor Energy Laboratory Co., Ltd.Beam homogenizer and laser irradiation apparatus
US6531681B1 (en)*2000-03-272003-03-11Ultratech Stepper, Inc.Apparatus having line source of radiant energy for exposing a substrate
US20080241978A1 (en)*2003-09-172008-10-02Erchak Alexei ALight emitting device processes

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DE3738480A1 (en)*1987-11-121989-05-24Lambda Physik ForschungMethod and device for measuring the intensity of a UV-laser beam
JPH05231929A (en)*1992-02-251993-09-07Chiyoda Kohan KkMeasuring apparatus of illuminance of ultraviolet ray
JP3529195B2 (en)*1994-06-212004-05-24株式会社住田光学ガラス Infrared visible wavelength up-conversion material
JPH08304172A (en)*1995-04-281996-11-22Advantest CorpPolarization-independent optical detector
JP2003031467A (en)*2001-07-132003-01-31Canon Inc Projection exposure apparatus, projection exposure method, and semiconductor manufacturing method
JP2003042844A (en)*2001-07-312003-02-13Konica CorpApparatus and method for measurement of ultraviolet quantity
GB0201916D0 (en)2002-01-292002-03-13Advanced Laser Solutions LtdMethod and apparatus for monitoring light beams
US6987240B2 (en)2002-04-182006-01-17Applied Materials, Inc.Thermal flux processing by scanning

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US4425907A (en)*1980-09-251984-01-17Exxon Research And Engineering Co.Reflector-coupled fluorescent solar collector
US4848902A (en)*1987-02-261989-07-18Erwin StriglDevice for measuring the intensity profile of a laser beam
US4885471A (en)*1988-04-221989-12-05Taunton Technologies, Inc.Ultraviolet radiometer
US5459565A (en)*1993-08-201995-10-17Duma Optronics, Ltd.Laser beam analyzer
US6242292B1 (en)*1994-12-162001-06-05Semiconductor Energy Laboratory Co., Ltd.Method of producing a semiconductor device with overlapped scanned linear lasers
US6365870B1 (en)*1997-10-222002-04-02Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V.Method and device for treating work pieces with laser radiation
US5922617A (en)*1997-11-121999-07-13Functional Genetics, Inc.Rapid screening assay methods and devices
US6114704A (en)*1998-10-132000-09-05Cymer, Inc.Front-illuminated fluorescent screen for UV imaging
US6393042B1 (en)*1999-03-082002-05-21Semiconductor Energy Laboratory Co., Ltd.Beam homogenizer and laser irradiation apparatus
US6531681B1 (en)*2000-03-272003-03-11Ultratech Stepper, Inc.Apparatus having line source of radiant energy for exposing a substrate
US20080241978A1 (en)*2003-09-172008-10-02Erchak Alexei ALight emitting device processes

Cited By (2)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US11067438B2 (en)*2017-07-272021-07-20Canare Electric Co., Ltd.Laser beam profile measurement device
DE112017007786B4 (en)*2017-07-272025-06-18BPF Laser Innovation Co., Ltd. Laser beam profile measuring device

Also Published As

Publication numberPublication date
KR20070065908A (en)2007-06-25
US20060158641A1 (en)2006-07-20
CN101048647A (en)2007-10-03
EP1805490A1 (en)2007-07-11
JP4777995B2 (en)2011-09-21
WO2006052512A1 (en)2006-05-18
US7440088B2 (en)2008-10-21
JP2008519263A (en)2008-06-05

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Legal Events

DateCodeTitleDescription
ASAssignment

Owner name:APPLIED MATERIALS, INC., CALIFORNIA

Free format text:ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:THOMAS, TIMOTHY N.;ADAMS, BRUCE;JENNINGS, DEAN C.;REEL/FRAME:021563/0991;SIGNING DATES FROM 20060124 TO 20060328

STCBInformation on status: application discontinuation

Free format text:ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION


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