US20080085587A1 - Epitaxial silicon growth - Google Patents

Abstract

Memory cell structures, including PSOIs, NANDs, NORs, FinFETs, etc., and methods of fabrication have been described that include a method of epitaxial silicon growth. The method includes providing a silicon layer on a substrate. A dielectric layer is provided on the silicon layer. A trench is formed in the dielectric layer to expose the silicon layer, the trench having trench walls in the <100> direction. The method includes epitaxially growing silicon between trench walls formed in the dielectric layer.

Description

TECHNICAL FIELD
• The present disclosure relates generally to semiconductor devices and, more particularly, to semiconductor devices formed from epitaxial silicon growth.
BACKGROUND
• Higher performance, lower cost, increased miniaturization of semiconductor components, and greater packing density of integrated circuit are ongoing goals of the semiconductor industry. Integrated circuit (IC) processing/fabrication is used to produce transistors having various structures including recessed access device (RAD), Fin field effect transistor (FinFET), pseudo silicon on insulator (PSOI), and nanowire, etc., for use in dynamic random access memory (DRAM), NOR and NAND Flash memory, and floating body memory, among other semiconductor devices.
• IC processing for memory and other semiconductor devices are currently performed on silicon wafers having a top surface of (100) crystal plane. This surface structures was chosen over the previously used (111) crystal plane because of its comparatively low surface state density on thermally oxidized surfaces. For example, in the diamond lattice of silicon the (111) plane is more densely packed than the (100) plane, and thus etch rates of {111} orientated surfaces are expected to be lower than those with {100} orientation. Bonding orientation of the different planes also contributes to etchant selectivity to exposed planes. One etchant that exhibits such orientation dependent etching properties consists of a mixture of KOH and isopropyl alcohol. For example, such a mixture may etch about one hundred times faster along (100) planes than along (111) planes.
• Various chemistries have been used to etch silicon. For example, both single crystal and polycrystalline silicon may be wet etched in mixtures of nitric acid (HNO3) and hydrofluoric acid (HF). With use of such etchants, the etching may be isotropic. The reaction is initiated by the HNO3, which forms a layer of silicon dioxide on the silicon, and the HF dissolves the silicon oxide away. In some cases, water is used to dilute the etchant, with acetic acid (CH3COOH) used as a buffering agent.
• Wafers having the top surface of {100} crystal plane are currently provided with a registration mark in the orthogonal <110> direction. IC processing of the wafer is then performed using this <110> registration mark. Hence, masks are aligned along the <110> direction.
• Integrated circuitry can be fabricated relative to one or both of bulk semiconductor substrates, such as silicon wafers, and semiconductor on insulator (SOI) substrates. SOI forms a semiconductor layer, e.g., silicon, onto an insulator, e.g., silicon dioxide. One method of forming SOI circuitry, at least in part, includes epitaxially growing single crystalline silicon electively from a single crystalline surface. Unfortunately in some instances epitaxially grown silicon tends to form crystalline defects, known as dislocations and stacking faults, which can result in undesired leakage within or between the resulting fabricated devices.
BRIEF DESCRIPTION OF THE DRAWINGS
• FIG. 1 illustrates an example silicon comprising semiconductor wafer.
• FIG. 2 is a three dimensional cross sectional view illustrating cuts oriented along different crystalline direction of the silicon comprising material.
• FIGS. 3A-1 through3K-2 illustrate a NAND Flash process embodiment according to the present disclosure.
• FIGS. 4A-1 through4F-2 illustrate a dynamic random access memory (DRAM) process embodiment according to the present disclosure.
• FIGS. 5A-1 through5J-3 illustrates a pseudo silicon on insulator (PSOI) involving epitaxially grown single crystalline silicon process embodiment involving epitaxially grown single crystalline silicon according to the present disclosure.
• FIG. 6 illustrates an example of an embodiment of an electronic system which includes structures formed in epitaxially grown silicon according to the embodiments of the present disclosure.
• FIG. 7 is a functional block diagram of a memory module having at least one memory device having structures formed in epitaxially grown silicon according to the embodiments of the present disclosure.
DETAILED DESCRIPTION
• Methods, devices, and arrays are described which include semiconductor devices formed from epitaxially grown silicon. Various embodiments reduce dislocations and/or defects in the epitaxial (“epi”) silicon and resulting devices, arrays, etc.
• One method embodiment includes providing a silicon layer on a substrate, the silicon having a top surface with a (100) crystal plane. A dielectric layer is provided on the silicon layer. As one example, providing a dielectric layer can include performing a high density plasma (HDP) oxide deposition on the silicon layer. A trench is formed in the dielectric layer to expose the silicon layer, the trench having trench walls in the <100> direction. The method includes epitaxially growing silicon between trench walls formed in the dielectric layer.
• In some embodiments, the silicon layer is provided on a wafer having a registration mark in the <110> direction and the wafer is rotated such that the trench walls will be formed in the <100> direction, e.g., the wafer is rotated forty five degrees so that a mask is aligned in the <100> direction. Alternatively, the registration mark can be provided in the orthogonal <010> direction. In some embodiments, a pre-clean which includes exposing the silicon layer and the trench walls to a solution including a fluoride component, an oxidizing agent, and an inorganic acid, is performed prior to epitaxially growing silicon between the trench walls.
• As used herein the terms “wafer” and “substrate” may include a number of semiconductor-based structures that have an exposed semiconductor surface. Structure can be understood to include silicon, silicon-on-insulator (SOI), silicon-on sapphire (SOS), doped, and undoped semiconductors. In addition, structure can be understood to include epitaxial layers of silicon supported by a base semiconductor foundation. The base semiconductor foundation is typically the lowest layer of silicon material on a wafer or a silicon layer deposited on another material.
• The semiconductor need not be silicon-based. For example, the semiconductor can be silicon-germanium, germanium, or gallium-arsenide. When reference is made to “wafer” and “substrate” in the following description, previous process steps may have been utilized to form regions or junctions in or on the semiconductor structure and/or foundation. When reference is made to a substrate assembly, various process steps may have been previously used to fomm or define regions, junctions, various structures or features, and openings such as capacitor plates or barriers for capacitors.
• As used herein, “layer” can refer to a layer formed on a substrate using a deposition process, e.g., plasma and/or chemical vapor deposition (CVD) process. The term “layer” is meant to include layers specific to the semiconductor industry, such as “barrier layer”, “dielectric layer”, and “conductive layer”. The term “layer” is also meant to include layers found in technology outside of semiconductor technology, such as coatings on glass.
• In the Figures, the first digit of a reference number refers to the Figure in which it is used, while the remaining two digits of the reference number refer to the same or equivalent parts of embodiment(s) of the present disclosure used throughout the several figures of the drawing. The scaling of the figures does not represent precise dimensions and/or dimensional ratios of the various elements illustrated herein.
• FIG. 1 an example silicon comprisingsemiconductor wafer100. The wafer includes a number of unsingulated die102 for undergoing integrated circuit fabrication and processing thereupon. As shown inFIG. 1,such wafers100 are provided with a registration mark, shown in this example aswafer edge103, which is used to orient the integrated circuit fabrication and processing steps in the <110> direction. As shown,such wafers100 are also provided with atop surface101 exposing the (100) crystalline plane of the silicon thereon. Embodiments of the present disclosure, which are discussed more below, involve rotating thewafer100 such that integrated circuit fabrication and processing are instead oriented along the <100> direction of the silicon crystalline structure provided on thewafer100.
• FIG. 2 is a three dimensional cross sectional view illustrating cuts oriented along different crystalline direction of the silicon comprising material. The three dimensional view ofFIG. 2 illustrate atop surface202 having a (100) silicon crystal plane.FIG. 2 illustrates a threedimensional cut210 as could be made into the silicon comprising material of the wafer in the <110> direction of silicon crystalline structure.FIG. 2 additionally illustrates a threedimensional cut220 as is made into the silicon comprising material of the wafer along the <100> direction such that the walls, e.g., thesurface204, also run along the <100> direction and have a (100) silicon crystal plane. According to the embodiments described below, the wafer, e.g.,wafer100 shown inFIG. 1, is oriented such that integrated circuit fabrication and processing is performed with cuts being made into the silicon comprising material of the wafer to form walls in the <100> crystal direction versus the <110> crystal direction.
• FIGS. 3A-1 through3K-2 illustrate a NAND Flash process embodiment according to the present disclosure.FIG. 3A-1 illustrates a top view of a portion of a memory die, e.g., as can be formed on a semiconductor wafer as shown inFIG. 1. The illustrated portion is intended to represent that portion of a memory die whereupon a memory cell array is to be formed. The illustrated portion include atop surface302 of single crystalline silicon having a (100) crystal plane. In the embodiment ofFIG. 3A-1 the illustratedsurface302 can be etched to open the memory cell array while creating periphery shallow trench isolation (STI) on the die, as will be appreciated by one of ordinary skill in the art. Hence,FIG. 3A-2 illustrates a side view cross section taken along-cut line3A-2 reflecting the recessed singlecrystalline silicon302 in the memory cell array portion of the die.
• FIG. 3B-1 illustrates a top view of the portion of the die after a next sequence of processing steps. InFIG. 3B-1 a fill ofdielectric material304 is provided to the opened portions of the memory die. In various embodiments the dielectric fill is an STI oxide fill, e.g., using a dielectric such as TEOS. InFIGS. 3B-1 and3B-2 the fill has been performed for the periphery of the array along with a subsequent planarization, e.g. chemical mechanical planarization (CMP). In the process that portion of the memory die whereupon a memory cell array is to be formed can also be concurrently filled withoxide304 and planarized.FIG. 3B-2 provides the cross-sectional side view taken alongcut line3B-2 showing theoxide layer304 formed above the singlecrystalline silicon302.
• InFIG. 3C-1 ahardmask308 is formed over theoxide layer306 on the wafer, e.g., using photolithographic techniques. According to embodiments of the present disclosure, thehardmask308 is patterned to form lines oriented in the <100> direction of the underlying single crystalline silicon. In various embodiments this can involve rotating a supporting wafer which has an original registration mark intended to orient processing steps in the <110> direction such that the process sequence will instead orient thehardmask308 along the <100> direction of the underlying single crystalline silicon.FIG. 3C-2 provides the cross-sectional side view taken alongcut line3C-2.FIGS. 3C-1 and3C-2 illustrate an optional additional dielectric layer, e.g., TiN layer,306 which can be provided, e.g., using a chemical vapor deposition (CVD), to afford added smoothness and/or a sacrificial layer for removal later in the process flow.FIG. 3C-2 thus illustrates a side view of thehardmask308 patterned in the <100> direction on theoxide layer304 and an additionaldielectric layer306.
• FIGS. 3D-1 and3D-2 illustrate a top view and a side view of the portion of the die after a next sequence of processing steps. InFIGS. 3D-1 and3D-2 the hardmask andoxide layer306 have been etched, e.g., using a wet etch, plasma etch, or other suitable technique, etc., to expose the singlecrystalline silicon302 with lines for the NAND array patterned in the <100> direction. Hence, what is shown in top view ofFIG. 3D-1 are lines of thesacrificial dielectric layer306 and lines of the exposed singlecrystalline silicon302 oriented along the <100> direction of exposed singlecrystalline silicon302.FIG. 3D-2 is the cross section taken alongcut line3D-2 illustrating the remainingsacrificial dielectric layer306 on columns ofoxide304 and the exposed singlecrystalline silicon302 underneath. The embodiments described herein have thus formed a number of trenches in theoxide dielectric material304 havingtrench walls305 in the <100> direction relative to the exposed the singlecrystalline silicon302 underneath.
• InFIG. 3E-1 thehardmask308 andsacrificial dielectric layer306 have been removed, e.g., using a selective etch, etc. According to various embodiments the exposed surfaces are pre-cleaned before next epitaxially growing single crystalline silicon betweentrench walls305 formed in theoxide dielectric layer304.FIG. 3E-2 is a cross sectional view showing thetrench walls305 formed in theoxide dielectric layer304 with the exposed singlecrystalline silicon302 below and therebetween. In various embodiments the pre-clean includes exposing the singlecrystalline silicon302 to a solution including a fluoride component, an oxidizing agent, and an inorganic acid. One example of exposing the singlecrystalline silicon302 to a solution including a fluoride component, an oxidizing agent, and an inorganic acid is provided in a copending, commonly assigned U.S. patent application entitled, “Wet Etch Suitable for Creating Square Cuts in Si and Resulting Structures”, Ser. No. 11/445,718, filed Jun. 2, 2006, which is incorporated in full herein.
• FIGS. 3F-1 and3F-2 illustrate a top view and a side view of the portion of the die after a next sequence of processing steps. InFIGS. 3F-1 and3F-2 singlecrystalline silicon312 has been epitaxially grown from the exposed singlecrystalline silicon302 in the channels formed by the walls of thetrenches305 in theoxide dielectric material304. Apad oxide310 can then be grown, e.g., O₂or H₂O diffusion, and planarized or etched back to provide the structure shown inFIGS. 3F-1 and3F-2. According to the process embodiments described herein the epitaxially grown singlecrystalline silicon312 is substantially free of dislocations. That is, due to the process of epitaxially growing the singlecrystalline silicon312 betweendielectric walls304 oriented in the <100> direction relative to the exposed singlecrystalline silicon302 any dislocations are pinned at the semiconductor/dielectric interface, e.g., alongtrench walls305. Thus, according to this example embodiment, the low defects enables STI scaling of NAND Flash stripes down as far as oxide may be patterned without the complication of spin on dielectric (SOD) or high density plasma (HDP) fill and densification at STI. Theoxide fins304 created here can be approximately 20 nanometers (nm) wide which will allow STI scaling down to a feature size of 20 nm (F=20 nm).
• In contrast, other process flows have tackled epitaxially growing single crystalline silicon over geometric features in silicon (Si) or silicon/germanium (Si/Ge) but these works have all directed their attention to dislocations being pinned at interfaces of the semiconductors. One example of this is provided in a copending, commonly assigned U.S. patent application entitled, “Integrated Circuits and Methods of Forming a Field Effect Transistor”, application Ser. No. 11/076,774, filed Mar. 10, 2005, and which is incorporated in full herein.
• FIGS. 3G-1 and3G-2 illustrate a top view and a side view of the portion of the die after a next sequence of processing steps. InFIGS. 3G-1 and3G-2 implants to the cell array and array periphery work have been completed.Cell tunnel oxide314 is grown from thepad oxide310. The floatinggate316, e.g., polysilicon, can next be deposited, e.g., by CVD, etc., and a dielectric layer,sacrificial oxide318 applied thereover, e.g., by SOD.
• As shown inFIGS. 3H-1 and3H-2, the structure can then be planarized, e.g., by CMP, down to the original STI oxide level, e.g., top surface level of theoxide dielectric layer304, or optional sacrificialdielectric layer306, e.g., nitride cap, if one was applied.
• InFIGS. 3I-1 and3I-2, the floatinggate polysilicon316 in the cell array can be recessed. The cell array structure is now appears in the top view illustration ofFIG. 3I-1 and in the side view ofFIG. 3I-2 taken along cut line3I-2.
• InFIGS. 3J-1 and3J-2, the resulting structure is illustrated after thesacrificial oxide318 has been removed and theoxide dielectric layer304 has been leveled to beneath a top surface of the floatinggates316. The cell array structure is now as appears in the top view illustration ofFIG. 3J-1 and in the side view ofFIG. 3J-2 taken alongcut line3J-2.
• InFIGS. 3K-1 and3K-2, the resulting NAND cell array structure is illustrated after ahigh vacuum oxide320 is applied and acontrol gate material322 is applied which can be patterned. The cell array structure is now appears in the top view illustration ofFIG. 3K-1 and in the side view ofFIG. 3K-2 taken alongcut line3J-2.
• FIGS. 4A-1 through4F-2 illustrates a dynamic random access memory (DRAM) process embodiment according to the present disclosure.FIG. 4A-1 illustrates a top view of a portion of a memory die, e.g., as can be formed on a semiconductor wafer as shown inFIG. 1. The illustrated portion is intended to represent that portion of a memory die whereupon a DRAM memory cell array is to be formed. As part of the processing a top surface of the wafer can be processed to include a top surface of single crystalline silicon having a (100) crystal plane.
• The top view illustrated inFIG. 4A shows an embodiment in which strips of “Fins”401 have been pattered into the silicon. One of ordinary skill in the art will appreciate the manner in which the wafer can be masked, patterned, and etched to create strips of silicon Fins on the wafer. In previous approaches a wafer would undergo DRAM processing using a registration intended to orient the processing steps in the <110> direction as shown inFIG. 1.
• According to embodiments of the present disclosure, however, the wafer is rotated relative to the original <110> direction registration mark such that the wafer is oriented in the <100> direction as shown byarrow400. In the embodiments described herein, it is while the wafer is oriented in the <100> direction that the top surface of the wafer is masked, patterned, and etched to create the strips ofsilicon Fins401 on the wafer. As such, the strips of single crystalline silicon Fins shown in FIGS.4A-4F-2 are oriented along the <100> direction of the underlying single crystalline silicon.
• FIG. 4A-2 provides the cross-sectional side view taken along cut line4A-2.FIG. 4A-2 illustrates that apad oxide layer406 and a silicon-nitride layer404 masking material are used and patterned before etching to form the strips of singlecrystalline silicon Fins401 on the wafer. Thepad oxide406 andnitride layer404 can be deposited, for example, using CVD. A photolithographic etch process can be employed as used for the STI formation. In various embodiments a light wet nitride etch can be employed to reduce thenitride404 critical dimension, e.g., from approximately 1.0 photolithographic feature (IF), above the singlecrystalline silicon Fins401 and expose the single crystalline silicon along thenitride404. The example embodiment ofFIG. 4A-1 illustrates the singlecrystalline Fins404 having a IF dimension with a 6F dimension between the singlecrystalline silicon Fins401. However, as the reader will appreciate the pattern can be modified to achieve various single crystalline silicon channel dimensions as tied to the substrate of the wafer.
• FIGS. 4B-1 and4B-2 illustrate a top view and a side view of the portion of the die after a next sequence of processing steps. As shown inFIGS. 4B-1 and4B-2 the structure ofFIGS. 4A-1 and4A-2 has been patterned for the addition of a buried oxide (BOX)408 which has been filled into the space between the singlecrystalline silicon Fins401 and planarized, e.g., using CMP, as part of the STI formation process. The side view ofFIG. 4B-2 thus illustrates a cross sectional view of the structure taken along cut line4A-2 inFIG. 4A-1.FIG. 4A-2 illustrates theBOX408 between the singlecrystalline silicon Fins401 formed in the singlecrystalline silicon surface402 of the wafer.FIG. 4A-2 illustrates thepad oxide406 and thenitride408 remaining on the top of the singlecrystalline silicon Fins401 oriented in strips along the <100> direction as well as on the top of the periphery to the DRAM memory cell array. TheBOX408 between the singlecrystalline silicon Fins401 formed in the singlecrystalline silicon surface402 of the wafer effectively provides isolation trenches. TheBOX408 embodiment inFIGS. 4B-1 and4B-2 is illustrated without the inclusion of a nitride liner thereto.
• FIGS. 4C-1 and4C-2 illustrate a top view and a side view of the portion of the die after a next sequence of processing steps. InFIGS. 4C-1 and4C-2 theBOX408 has been recessed to below atop surface409, as shown inFIG. 4D-2, of the singlecrystalline silicon Fins401. According to various embodiments of the present disclosure, the exposed single crystalline silicon surfaces are pre-cleaned before next epitaxially growing singlecrystalline silicon410 betweentrench walls412 formed from recessing theBOX408. In various embodiments the pre-clean includes exposing the single crystalline silicon of thetrench walls412 to theFins401 to a solution including a fluoride component, an oxidizing agent, and an inorganic acid. One example of exposing the single crystalline silicon of thetrench walls412 to a solution including a fluoride component, an oxidizing agent, and an inorganic acid is provided in a copending, commonly assigned U.S. patent application entitled, “Wet Etch Suitable for Creating Square Cuts in Si and Resulting Structures”, Ser. No. 11/445,718, filed Jun. 2, 2006, which is incorporated in full herein.
• FIG. 4C-2 illustrates a side view of the portion of the die after epitaxially growing the singlecrystalline silicon410 from thetrench walls412. According to the process embodiments described herein the epitaxially grown singlecrystalline silicon410 is substantially free of dislocations. That is, due to the process of epitaxially growing the singlecrystalline silicon410 between dielectric walls, e.g., thenitride404, oriented in the <100> direction relative to the exposed singlecrystalline silicon402 any dislocations are pinned at the semiconductor/dielectric interface, e.g., alongnitride walls404. Thus, according to this example embodiment, the low defects enable DRAM access transistors to be formed, as described further below, in the epitaxial singlecrystalline silicon410. In various embodiments, this achieves reduced stress in the active area of small geometry DRAM material to enable low defect retrograde access fins or recessed access devices (RADs) and Fin field effect transistor (FinFET) structures. As the reader will appreciate, the epitaxial singlecrystalline silicon410 material can be cut across thetrenches412 by patterning and etching to enable isolation of DRAM or NOR devices using, for example, STI techniques in one direction of isolation.
• In contrast, other process flows have tackled epitaxially growing single crystalline silicon over geometric features in silicon (Si) or silicon/germanium (Si/Ge) but these works have all directed their attention to dislocations being pinned at interfaces of the semiconductors. One example of this is provided in a copending, commonly assigned U.S. patent application entitled, “Integrated Circuits and Methods of Forming a Field Effect Transistor”, application Ser. No. 11/076,774, filed Mar. 10, 2005, and which is incorporated in full herein.
• The top view ofFIG. 4C-1 illustrates the epitaxially grown singlecrystalline silicon410 formed only betweentrench walls412 of the singlecrystalline silicon Fins410. However, the cross sectional view ofFIG. 4C-2 illustrates that embodiments are not so limited and that the epitaxially grown single crystalline silicon may be grown to connect and form overtop thenitride404.
• FIGS. 4D-1 and4D-2 illustrate a top view and a side view embodiment of the portion of the die after a next sequence of processing steps. InFIGS. 4D-1 and4D-2 the epitaxially grown singlecrystalline silicon410 is planarized, e.g., by CMP, to thenitride404. The exposednitride404 andpad oxide406 can next be removed, e.g., by using a wet strip, etc., to reveal the structure shown in the cross sectional view ofFIG. 4D-2. As the reader will appreciate, an STI flow process can next be followed to continue with forming DRAM cells.
• FIGS. 4E-1 and4E-2 illustrate the structure after a next sequence of processing steps. As represented by the top view and side view embodiment ofFIGS. 4E-1 and4E-2 another pad oxide layer and another nitride layer can be deposited and patterned for the formation ofadditional trench isolation412 and to define cell arrayactive areas414 and peripheralactive areas402.FIG. 4E-2 is a cross sectional view illustrating the same taken along4E-2. A selective wet etch can be performed to remove the nitride and an HF clean can be performed to remove the pad oxide.FIGS. 4E-1 and4E-2 illustrate both the exposed single crystalline siliconepitaxial regions412 and the singlecrystalline silicon layer402 of the wafer.
• FIGS. 4F-1 and4F-2 illustrate the structure after a next sequence of processing steps. Embodiments for integrated circuitry in fabrication of DRAM cell array and peripheral gate is represented by the top view and side view embodiment ofFIGS. 4F-1 and4F-2. In particular the cross sectional view shown inFIG. 4F-2 illustrates a number of gate structures415-1,415-2,415-3, . . . ,415-N for the cell array and the peripheral gate415-P. In various embodiments, each of thegate structures415 includes agate dielectric layer416, a conductively dopedpolysilicon region417, conductive metal ormetal silicide region418, and insulative caps420. Electrically insulative sidewall spacers (not shown) are received about the respective gate structures. Electrically insulative material is illustrated at408 (trench isolation BOX) and412 (STI oxide for isolating adjacent devices) as the same have been described above.
• In the cross sectional embodiment ofFIG. 4F-2 the epitaxially grown singlecrystalline silicon410 is illustrated as forming asource region421 and achannel region422. In this embodiment, the shareddrain region423 is illustrated as formed from the singlecrystalline silicon402 of the wafer. The cell array structure is now as appears in the top view illustration ofFIG. 4F-1 and in the side view ofFIG. 4F-2 taken alongcut line4F-2. One of ordinary skill in the art will appreciate the manner in which electrically conductive contacts can be formed to connect with the source and drain regions, respectively, and the DRAM fabrication process continued and completed as suitable for particular implementations. As such more detail is not provided hereafter.
• FIGS. 5A-1 through5K-3-2 illustrates a pseudo silicon on insulator (PSOI) involving epitaxially grown single crystalline silicon process embodiment involving epitaxially grown single crystalline silicon according to the present disclosure.FIG. 5A-1 illustrates a top view of a portion of a memory die, e.g., as can be formed on a semiconductor wafer as shown inFIG. 1. The illustrated portion is intended to represent that portion of a memory die whereupon a DRAM memory cell array is to be formed. As part of the processing a top surface of the wafer can be processed to include a top surface of single crystalline silicon having a (100) crystal plane.
• The top view illustrated inFIG. 5A shows an embodiment in which photo resist lines orthogonal to planned epitaxially single crystal silicon overgrowth in the <100> direction is planned. One of ordinary skill in the art will appreciate the manner in which the wafer can be masked and patterned. In previous approaches a wafer would undergo DRAM processing using a registration intended to orient the processing steps in the <110> direction as shown inFIG. 1.
• According to embodiments of the present disclosure, however, the wafer is rotated relative to the original <110> direction registration mark such that the wafer is oriented in the <100> direction as shown byarrow500. In the embodiments described herein, it is while the wafer is oriented in the <100> direction that the top surface of the wafer is masked and patterned to create the strips of photo resistlines506 on the wafer.
• FIG. 5A-2 provides the cross-sectional side view taken alongcut line5A-2.FIG. 5A-2 illustrates that a silicon-nitride504 hardmask layer has been applied beneath the patterned strips of photo resistlines506 in the <100> direction and over theunderlying substrate502 of the wafer. One of ordinary skill in the art will appreciate that thesubstrate502 portion shown can include bulk semiconductive silicon comprising material and may include a layer of single crystalline silicon.
• FIGS. 5B-1 and5B-2 illustrate a top view and a side view of the portion of the die after a next sequence of processing steps. As shown in embodiment ofFIGS. 5B-1 and5B-2 the structure ofFIGS. 5A-1 and5A-2 has undergone an anisotropic etch to etch into thenitride hardmask504 and the singlecrystalline silicon502. In particular the cross sectional view ofFIG. 5B-2 illustrates thetrench walls505 formed in the <100> direction in the singlecrystalline silicon502 from the etch process above. In various embodiments, the trenches can be formed to a depth in the range of 500 to 3000 Angstroms. Embodiments, however, are not limited to this example.
• Additionally, using various photolithographic techniques, a width to the trenches can be patterned to provide a particular dimension to the trenches. However, due to factors such as optics and light or radiation wavelength, photolithography techniques each have a minimum pitch below which a particular photolithographic technique cannot reliably form features. Pitch is defined as the distance between an identical point in two neighboring features. These features are typically defined by openings in, and spaced from each other by, a material, such as an insulator or conductor. As a result, pitch can be viewed as the sum of the width of a feature and of the width of the space separating that feature from a neighboring feature.
• As one of ordinary skill in the art will appreciate “pitch doubling” is one method for extending the capabilities of photolithographic techniques beyond their minimum pitch and can be used in forming the trenches shown in various embodiments. One example method for the same is described in U.S. Pat. No. 5,328,810, issued to Lowrey et al., the entire disclosure of which is incorporated herein by reference. As a result, the smallest feature size possible with a photolithographic technique is effectively decreased. It will be appreciated that while the pitch is actually reduced by such techniques this reduction in pitch can be referred to as pitch “doubling” or more generally, pitch “multiplication”. That is, “multiplication” of pitch by a certain factor actually involves reducing the pitch by that factor. This terminology is retained herein. Note that by forming spacers upon spacers, the definable feature size can be further decreased. Thus, pitch multiplication refers to the process generally, regardless of the number of times the spacer formation process is employed.
• FIGS. 5C-1 and5C-2 illustrate a top view and a side view of the portion of the die after a next sequence of processing steps. As shown in embodiment ofFIGS. 5C-1 and5C-2 an optional silicon nitride (Si₃N₄) liner and spacer etch can be performed to createnitride spacers508 alongtrench walls505 of the singlecrystalline silicon502. The structure is now as appears inFIGS. 5C-1 and5C-2.
• According to various embodiments the exposed surfaces are pre-cleaned before next epitaxially growing single crystalline silicon from the exposed portions of single crystalline silicon on thetrench walls505. In various embodiments the pre-clean includes exposing the singlecrystalline silicon502 to a solution including a fluoride component, an oxidizing agent, and an inorganic acid. One example of exposing the singlecrystalline silicon502 to a solution including a fluoride component, an oxidizing agent, and an inorganic acid is provided in a copending, commonly assigned U.S. patent application entitled, “Wet Etch Suitable for Creating Square Cuts in Si and Resulting Structures”, Ser. No. 11/445,718, filed Jun. 2, 2006, which is incorporated in full herein.
• FIGS. 5D-1 and5D-2 illustrate a top view and a side view of the portion of the die after a next sequence of processing steps. InFIGS. 5D-1 and5D-2 single crystalline silicon has been epitaxially grown from the exposed singlecrystalline silicon502 with mergingfronts510. In various embodiments anoptional polysilicon layer512 is applied over the top, e.g., via CVD. According to the embodiments described herein, theepitaxial overgrowth510 above the dielectric fins, e.g.,nitride spacers508 is substantially free of dislocations. That is, due to the process of epitaxially overgrowing the singlecrystalline silicon510 as would be the portion in between the dielectric508, as described in connection withFIGS. 3 and 4, hence enabling a PSOI DRAM access transistor to be formed as described further below.
• According to various embodiments, the dielectric (here, nitride spacers508) can be recessed to allowepitaxial silicon growth510 over thegaps509 which will merge (100) single crystalline silicon planes. As the reader will appreciate this embodiment allows PSOI DRAM devices without using two (2) CMPs.
• FIGS. 5E-1 and5E-2 illustrate a top view and a side view of the portion of the die after a next sequence of processing steps. InFIGS. 5E-1 and5E-2 an optional silicon buff polish can be performed to planarize. As the reader will appreciate the top surface may be planarized and pattered to open some of the dielectric wall, e.g.,nitride spacers508, to enable recessed access device (RAD) construction. Also, dielectric wall height oriented in the <100> direction can be set be recessing the dielectric in some places and not others prior to opening the single crystalline silicon for epitaxial single crystalline silicon growth.
• FIGS. 5F-1 and5F-2 illustrate a top view and a side view of the portion of the die after a next sequence of processing steps. As shown inFIGS. 5F-1 and5F-2 a nitride hardmask is deposited, e.g., via CVD, and can be patterned using various photolithographic techniques to create apatterned nitride514 over the epitaxially grown singlecrystalline silicon510 as will be used to define islands in STI oxide.
• FIGS. 5G-1 illustrates a top view of the portion of the die after the next sequence of processing steps.FIGS. 5G-2 and5G-3 illustrate cross sectional views taken alongcut lines5G-2 and5G-3, respectively, shown inFIG. 5G-1. InFIGS. 5G-1,5G-2, and5G-3 thenitride514 and epitaxially grown singlecrystalline silicon510 have been etched using a plasma dry etch, e.g., using a Br, Ar base gas recipe, to defineislands511 as shown by contrasting cross sectional views ofFIG. 5G-2 and5G-3 along those respective cut lines from5G-1 as well as undercut source/drain regions509. Thenitride spacers508 shown inFIG. 5G-3 can optionally be removed by a dry etch or a wet etch.
• FIGS. 5H-1 illustrates a top view of the portion of the die after the next sequence of processing steps.FIGS. 5H-2 and5H-3 illustrate cross sectional views taken alongcut lines5H-2 and5H-3, respectively, shown inFIG. 5H-1. InFIGS. 5H-1,5H-2, and5H-3 a spin on dielectric (SOD)oxide deposition518 and planarization, e.g. via CMP, have been performed to complete the STI sequence. The structure is now as appears inFIGS. 5H-1,5H-2, and5H-3showing oxide518 in the undercut source/drain regions in the view of5H-2 and in isolation regions outside of the active regions of the devices to be formed in the view of5H-3.
• FIGS. 5I-1 illustrates a top view of the portion of the die after the next sequence of processing steps.FIGS. 5I-2 and5I-3 illustrate cross sectional views taken along cut lines5I-2 and5I-3, respectively, shown inFIG. 5I-1. InFIGS. 5I-1,5I-2, and5I-3 thenitride514 fromFIGS. 5H-1,5H-2, and5H-3 has been removed, e.g., using a nitride wet etch or other suitable technique.
• FIGS. 5J-1 illustrates a top view of the portion of the die after the next sequence of processing steps.FIGS. 5J-2 and5J-3 illustrate cross sectional views taken alongcut lines5J-2 and5J-3, respectively, shown inFIG. 5J-1. InFIGS. 5J-1,5J-2, and5J-3 the structure illustrates a DRAM devicearray having gates519 over the silicon island body ties511. Thegates519 and source/drain regions (not enumerated) can be formed, for example, according to the process embodiment described above in connection withFIGS. 4F-1 and4F-2. That is each of thegates519 can be formed to include agate dielectric layer520, a conductively dopedpolysilicon region521, conductive metal ormetal silicide region522, and insulative caps523. Thegates519 are thus formed over the epitaxially grown singlecrystalline silicon510 which serves as a channel region connected toisland511 body ties as shown in crosssectional view5J-2 and pass over theoxide isolation material518 outside of the active areas of the DRAM cells as shown in the cross sectional view of5J-3. The source/drain regions are thus formed in the epitaxially grown singlecrystalline silicon510 undercut by theoxide isolation material518 as shown in the cross sectional view ofFIG. 5J-2. One of ordinary skill in the art will appreciate the manner in which electrically conductive contacts can be formed to connect with the source and drain regions, respectively, and the DRAM fabrication process continued and completed for the PSOI DRAM devices according to these embodiments as suitable for particular implementations. As such more detail is not provided hereafter.
• FIG. 6 illustrates an example of an embodiment of anelectronic system600 which includes structures formed in epitaxially grown silicon according to the embodiments of the present disclosure. Thesystem600 illustrated in the embodiment ofFIG. 6 includes amemory device602 that includes an array ofmemory cells604 formed according to the embodiments described herein, anaddress decoder606,row access circuitry608,column access circuitry610,control circuitry612, Input/Output (I/O)circuitry614, and anaddress buffer616.
• Electronic system600 includes anexternal processor620, e.g., a memory controller or host processor, electrically connected tomemory device602 for memory accessing. Thememory device602 receives control signals from theprocessor620 over acontrol link622. The memory cells are used to store data that are accessed via a data (DQ)link624. Address signals are received via anaddress link626 that are decoded ataddress decoder606 to access thememory array604.Address buffer circuit616 latches the address signals. The memory cells are accessed in response to the control signals and the address signals.
• FIG. 7 is a functional block diagram of amemory module700 having at least one memory device having structures formed in epitaxially grown silicon according to the embodiments of the present disclosure.Memory module700 is illustrated as a memory card, although the concepts discussed with reference tomemory module700 are applicable to other types of removable or portable memory (e.g., USB flash drives) and are intended to be within the scope of “memory module” as used herein. In addition, although one example form factor is depicted inFIG. 7, these concepts are applicable to other form factors as well.
• In some embodiments,memory module700 will include ahousing705 to enclose one ormore memory devices710, though such a housing is not essential to all devices or device applications. Thehousing705 includes one ormore contacts715 for communication with a host device. Examples of host devices include digital cameras, digital recording and playback devices, PDAs, personal computers, memory card readers, interface hubs and the like. For some embodiments, thecontacts715 are in the form of a standardized interface. For example, with a USB flash drive, thecontacts715 might be in the form of a USB Type-A male connector. For some embodiments, thecontacts715 are in the form of a semi-proprietary interface, such as might be found on CompactFlash™ memory cards licensed by SanDisk Corporation, Memory Stick™ memory cards licensed by Sony Corporation, SD Secure Digital™ memory cards licensed by Toshiba Corporation and the like. In general, however,contacts715 provide an interface for passing control, address and/or data signals between thememory module700 and a host having compatible receptors for thecontacts715.
• Thememory module700 may optionally includeadditional circuitry720, which may be one or more integrated circuits and/or discrete components. For some embodiments, theadditional circuitry720 may include a memory controller for controlling access acrossmultiple memory devices710 and/or for providing a translation layer between an external host and amemory device710. For example, there may not be a one-to-one correspondence between the number ofcontacts715 and a number of connections to the one ormore memory devices710. Thus, a memory controller could selectively couple an I/O connection (not shown inFIG. 7) of amemory device710 to receive the appropriate signal at the appropriate I/O connection at the appropriate time or to provide the appropriate signal at theappropriate contact715 at the appropriate time. Similarly, the communication protocol between a host and thememory module700 may be different than what is required for access of amemory device710. A memory controller could then translate the command sequences received from a host into the appropriate command sequences to achieve the desired access to thememory device710. Such translation may further include changes in signal voltage levels in addition to command sequences.
• Theadditional circuitry720 may further include functionality unrelated to control of amemory device710 such as logic functions as might be performed by an ASIC. Also, theadditional circuitry720 may include circuitry to restrict read or write access to thememory module700, such as password protection, biometrics or the like. Theadditional circuitry720 may include circuitry to indicate a status of thememory module700. For example, theadditional circuitry720 may include functionality to determine whether power is being supplied to thememory module700 and whether thememory module700 is currently being accessed, and to display an indication of its status, such as a solid light while powered and a flashing light while being accessed. Theadditional circuitry720 may further include passive devices, such as decoupling capacitors to help regulate power requirements within thememory module700.
CONCLUSION
• Memory cell structures, including PSOIs, NANDs, NORs, FinFETs, etc., and methods of fabrication have been described that include a method of epitaxial silicon growth. The method includes providing a silicon layer on a substrate. A dielectric layer is provided on the silicon layer. A trench is formed in the dielectric layer to expose the silicon layer, the trench having trench walls in the <100> direction. The method includes epitaxially growing silicon between trench walls formed in the dielectric layer. The single crystalline silicon is grown substantially free of dislocations. That is, the various techniques described herein provide a process of epitaxially growing the single crystalline silicon oriented in the <100> direction relative to the underlying silicon crystalline structures such that any defects are pinned at semiconductor/dielectric interfaces, e.g., along trench walls.
• In various embodiments, such epitaxially grown single crystalline silicon can be grown substantially free of dislocations at multiple elevations and then overgrowth methods used to create defect free silicon over silicon (SOS), hence stacking devices, e.g., transistors at multiple levels. Other devices such as pass gates or local amplifiers atop contacts which contact lower level gate and source/drain regions could similarly be constructed using the embodiments described herein. Additionally building micro electro mechanical (MEM) structures or optical electrical devices out of silicon on (100) crystal planes may be enabled by the ability to put down substantially defect free epitaxially grown single crystalline silicon as described herein.
• Although specific embodiments have been illustrated and described herein, those of ordinary skill in the art will appreciate that an arrangement calculated to achieve the same results can be substituted for the specific embodiments shown. This disclosure is intended to cover adaptations or variations of various embodiments of the present disclosure. It is to be understood that the above description has been made in an illustrative fashion, and not a restrictive one. Combination of the above embodiments, and other embodiments not specifically described herein will be apparent to those of skill in the art upon reviewing the above description. The scope of the various embodiments of the present disclosure includes other applications in which the above structures and methods are used. Therefore, the scope of various embodiments of the present disclosure should be determined with reference to the appended claims, along with the full range of equivalents to which such claims are entitled.
• In the foregoing Detailed Description, various features are grouped together in a single embodiment for the purpose of streamlining the disclosure. This method of disclosure is not to be interpreted as reflecting an intention that the disclosed embodiments of the present disclosure have to use more features than are expressly recited in each claim. Rather, as the following claims reflect, inventive subject matter lies in less than all features of a single disclosed embodiment. Thus, the following claims are hereby incorporated into the Detailed Description, with each claim standing on its own as a separate embodiment.

Claims (34)

1. A method of epitaxial silicon growth, comprising:

providing a dielectric layer on a crystalline silicon layer having a (100) crystal plane;

forming a trench in the dielectric layer to expose the silicon layer, the trench having trench walls parallel to a <100> direction; and

epitaxially growing silicon between trench walls formed in the dielectric layer.

2. The method ofclaim 1, wherein providing the silicon layer includes providing the silicon layer having a top surface with a (100) crystal plane.

3. The method ofclaim 1, wherein the method includes performing a pre-clean prior to epitaxially growing silicon between the trench walls.

4. The method ofclaim 3, wherein performing the pre-clean includes exposing the silicon layer and the trench walls to a solution including a fluoride component, an oxidizing agent, and an inorganic acid.

5. The method ofclaim 4, wherein the method includes epitaxially growing silicon between the trench walls without a presence of a nitride liner on the trench walls.

6. A method of epitaxial silicon growth, comprising:

providing a semiconductor wafer having a silicon surface with a (100) crystal plane, and processing along a <110> direction relative to a crystalline structure of the silicon;

forming a dielectric layer over the silicon surface;

forming a trench in the dielectric layer to expose the silicon surface, the trench having trench walls in the <100> direction;

exposing the silicon surface to a solution including a fluoride component, an oxidizing agent, and an inorganic acid; and

epitaxially growing silicon between trench walls formed in the dielectric layer.

7. The method ofclaim 6, wherein the method includes epitaxially growing silicon between the trench walls without a presence of a nitride liner on the trench walls.

8. The method ofclaim 6, wherein forming the trench includes patterning the trench using a pitch multiplication technique.

9. A method for non-volatile memory fabrication, comprising:

orienting a semiconductor wafer having a number of unsingulated die having a silicon surface with a (100) crystal plane for integrated circuit fabrication and processing along a <100> direction relative to a crystalline structure of the silicon;

opening an array portion of a die while performing a periphery shallow trench isolation (STI) process;

performing an STI oxide fill in the array portion;

etching a trench in the STI oxide fill to expose the silicon surface; and

epitaxially growing silicon between trench walls formed in the STI oxide fill.

10. The method ofclaim 9, wherein the method includes etching the trench in the STI oxide fill to have trench walls in the <100> direction.

11. The method ofclaim 9, wherein the method includes exposing the silicon surface to a solution including a fluoride component, an oxidizing agent, and an inorganic acid prior to epitaxially growing silicon between trench walls.

12. The method ofclaim 9, wherein the method is a NAND non-volatile memory fabrication process.

13. A method for dynamic random access memory (DRAM) fabrication, comprising:

orienting a semiconductor wafer having a number of unsingulated die having a silicon surface with a (100) crystal plane for integrated circuit fabrication and processing along a <100> direction relative to a crystalline structure of the silicon;

forming fins of silicon having walls oriented in the <100> direction in an array portion of a die;

depositing a dielectric material between the fins of silicon to a level below a top surface of the fins; and

epitaxially growing silicon from the walls of the fins.

14. The method ofclaim 13, wherein the method includes exposing the dielectric material and the walls of the fins to a solution including a fluoride component, an oxidizing agent, and an inorganic acid prior to epitaxially growing silicon between trench walls.

15. The method ofclaim 13, wherein depositing the dielectric material includes depositing an oxide between the fins of silicon without a nitride liner.

16. The method ofclaim 13, wherein the method includes:

forming the fins of silicon with a nitride cap over the fins; and

epitaxially growing the silicon to fill between walls of the fins and above the nitride cap.

17. A method for pseudo silicon on insulator (PSOI) structure fabrication, comprising:

orienting a semiconductor wafer having a number of unsingulated die having a silicon surface with a (100) crystal plane for integrated circuit fabrication and processing along a <100> direction;

etching trenches in the silicon surface to form fins of silicon having walls oriented in the <100> direction in an array portion of a die; and

epitaxially growing silicon to have merging fronts without entirely filling trenches between walls of the fins.

18. The method ofclaim 17, wherein the method includes etching the epitaxially grown silicon to define islands of epitaxially grown silicon having the fins as a body tie to a substrate of the wafer.

19. The method ofclaim 18, wherein the method includes depositing a dielectric material between the islands and within the trenches undercutting portions of the epitaxially grown silicon.

20. The method ofclaim 19, wherein the method includes forming gates above the islands such that the epitaxially grown silicon above the fins serves as a channel region and the epitaxially grown silicon above the trenches undercutting portions of the epitaxially grown silicon serves as a source/drain region.

21. The method ofclaim 17, wherein the method includes forming a dielectric spacer on the sides of the fins of silicon to a level below a top surface of the fins.

22. The method ofclaim 21, wherein the method includes exposing the dielectric spacer and exposed walls of the fins to a solution including a fluoride component, an oxidizing agent, and an inorganic acid prior to epitaxially growing silicon to have merging fronts.

23. A non-volatile memory cell array, comprising:

a number of non-volatile memory cells having floating gates formed over epitaxially grown single crystalline silicon (epi), wherein the epi is formed between dielectric walls oriented in a <100> direction relative to the epi.

24. The array ofclaim 23, wherein the epi is substantially defect free having dislocations pinned between the epi and the dielectric walls.

25. The array ofclaim 23, wherein the array is a NAND array.

26. A dynamic random access memory (DRAM) array, comprising:

a number of DRAM cells located above a dielectric isolation material formed in a trench without a nitride liner, wherein each DRAM cell includes:

a gate located above a channel region formed in a layer of epitaxially grown single crystalline silicon (epi);

a source region adjacent the channel and formed in the layer of epi; and

a drain region adjacent the channel and formed in the layer of epi.

27. The array ofclaim 26, wherein the epi is substantially defect free having dislocations pinned between the epi and the dielectric isolation material.

28. The array ofclaim 26, wherein the trench includes walls oriented in a <100> direction relative to the epi.

29. A pseudo-silicon on insulator (PSOI) structure, comprising:

a number of devices located above a dielectric isolation material, wherein the devices are formed from epitaxially grown single crystalline silicon (epi), the epi having a number of fins of silicon connecting the epi through the dielectric isolation material to a substrate;

a wall surface of the number of fins oriented in a <100> direction relative to the epi.

30. The PSOI structure ofclaim 29, wherein the PSOI is part of a recessed access device (RAD).

31. The PSOI structure ofclaim 29, wherein the PSOI is part of a micro electro mechanical (MEM) structure.

32. The PSOI structure ofclaim 29, wherein the PSOI is part of an optical electrical device.

33. The PSOI structure ofclaim 29, wherein the number of fins have a feature size obtained according to a pitch multiplication technique.

34. The PSOI structure ofclaim 29, wherein the number of devices are DRAM cells, and wherein each DRAM cell includes:

a gate located above a channel region formed in the epi;

a source region adjacent the channel and formed in the epi; and

a drain region adjacent the channel and formed in the epi.

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