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US20080065213A1 - Interspinous process implants and methods of use - Google Patents

Interspinous process implants and methods of use
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Publication number
US20080065213A1
US20080065213A1US11/768,224US76822407AUS2008065213A1US 20080065213 A1US20080065213 A1US 20080065213A1US 76822407 AUS76822407 AUS 76822407AUS 2008065213 A1US2008065213 A1US 2008065213A1
Authority
US
United States
Prior art keywords
implant
implant member
end portion
distal end
wing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US11/768,224
Inventor
James Zucherman
Ken Hsu
Henry Klyce
Charles Winslow
Scott Yerby
John Flynn
Steven Mitchell
John Markwart
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Medtronic PLC
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/694,103external-prioritypatent/US20050075634A1/en
Priority claimed from US10/816,173external-prioritypatent/US7549999B2/en
Priority claimed from US11/095,680external-prioritypatent/US7909853B2/en
Priority claimed from US11/095,440external-prioritypatent/US20060064165A1/en
Priority claimed from US11/234,555external-prioritypatent/US8048117B2/en
Priority claimed from US11/384,055external-prioritypatent/US20060264939A1/en
Priority claimed from US11/378,893external-prioritypatent/US8070778B2/en
Priority claimed from US11/378,892external-prioritypatent/US8147548B2/en
Priority claimed from US11/377,971external-prioritypatent/US7931674B2/en
Priority claimed from US11/378,894external-prioritypatent/US20060271194A1/en
Priority claimed from US11/389,002external-prioritypatent/US7959652B2/en
Application filed by IndividualfiledCriticalIndividual
Priority to US11/768,224priorityCriticalpatent/US20080065213A1/en
Assigned to ST. FRANCIS MEDICAL TECHNOLOGIES, INC.reassignmentST. FRANCIS MEDICAL TECHNOLOGIES, INC.ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: MARKWART, JOHN A., FLYNN, JOHN J., WINSLOW, CHARLES J., KLYCE, HENRY A., HSU, KEN Y., MITCHELL, STEVEN T., YERBY, SCOTT A., ZUCHERMAN, JAMES F.
Assigned to KYPHON INC.reassignmentKYPHON INC.MERGER (SEE DOCUMENT FOR DETAILS).Assignors: ST. FRANCIS MEDICAL TECHNOLOGIES, INC.
Publication of US20080065213A1publicationCriticalpatent/US20080065213A1/en
Assigned to MEDTRONIC SPINE LLCreassignmentMEDTRONIC SPINE LLCCHANGE OF NAME (SEE DOCUMENT FOR DETAILS).Assignors: KYPHON INC
Assigned to KYPHON SARLreassignmentKYPHON SARLASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: MEDTRONIC SPINE LLC
Abandonedlegal-statusCriticalCurrent

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Abstract

Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.

Description

Claims (36)

1. An apparatus, comprising:
a first implant member having a central portion and a distal end portion, at least a portion of the central portion configured to be disposed between a first spinous process and a second spinous process, the distal end portion having a first configuration and a second configuration; and
a second implant member configured to move the distal end portion of the first implant member from the first configuration to the second configuration when the central portion of the first implant member is disposed between the first spinous process and the second spinous process,
the distal end portion of the first implant member configured to limit lateral movement of the first implant member relative to the first spinous process and the second spinous process when in the second configuration.
5. The apparatus ofclaim 1, wherein:
the second implant member has a distal end portion and a proximal end portion, the distal end portion of the second implant member configured to be slidably disposed within the first implant member, the distal end portion of the second implant member configured to move the distal end portion of the first implant member from the first configuration to the second configuration when the distal end portion of the second implant member is disposed within the first implant member,
the proximal end portion of the second implant member having a protrusion configured to be matingly received within an opening defined by an outer surface of the first implant member, the first spinous process disposed between the distal end portion of the first implant member and the protrusion of the proximal end portion of the second implant member when the central portion of the first implant member is disposed between the first spinous process and the second spinous process.
11. An apparatus, comprising:
a first implant member having a central portion and a distal end portion, the central portion configured to be disposed between a first spinous process and a second spinous process; and
a second implant member having a distal end portion and a proximal end portion, the distal end portion of the second implant member configured to move the distal end portion of the first implant member relative to the central portion of the first implant member when the central portion of the first implant member is disposed between the first spinous process and the second spinous process,
the first spinous process being disposed between the distal end portion of the first implant member and the proximal end portion of the second implant member when the central portion of the first implant member is disposed between the first spinous process and the second spinous process and when distal end portion of the second implant member has moved the distal end portion of the first implant member.
28. An apparatus, comprising:
a first implant member having a distal end portion and a central portion defining a lumen, at least a portion of the central portion configured to be disposed between a first spinous process and a second spinous process; and
a second implant member configured to be slidably disposed within the lumen of the first implant member between a first longitudinal position and a second longitudinal position, a size of the distal end portion of the first implant member being less than a distance between the first spinous process and the second spinous process when the second implant member is in the first longitudinal position, a size of the distal end portion of the first implant member being greater than the distance between the first spinous process and the second spinous process when the second implant member is in the second longitudinal position.
US11/768,2242002-10-292007-06-26Interspinous process implants and methods of useAbandonedUS20080065213A1 (en)

Priority Applications (1)

Application NumberPriority DateFiling DateTitle
US11/768,224US20080065213A1 (en)2002-10-292007-06-26Interspinous process implants and methods of use

Applications Claiming Priority (27)

Application NumberPriority DateFiling DateTitle
US42191502P2002-10-292002-10-29
US47281703P2003-05-222003-05-22
US10/694,103US20050075634A1 (en)2002-10-292003-10-27Interspinous process implant with radiolucent spacer and lead-in tissue expander
US10/816,173US7549999B2 (en)2003-05-222004-04-01Interspinous process distraction implant and method of implantation
US10/850,267US7695513B2 (en)2003-05-222004-05-20Distractible interspinous process implant and method of implantation
US61246504P2004-09-232004-09-23
US61258204P2004-09-232004-09-23
US66388505P2005-03-212005-03-21
US66391805P2005-03-212005-03-21
US66392205P2005-03-212005-03-21
US66407605P2005-03-222005-03-22
US66431105P2005-03-222005-03-22
US66404905P2005-03-222005-03-22
US11/095,680US7909853B2 (en)2004-09-232005-03-31Interspinous process implant including a binder and method of implantation
US11/095,440US20060064165A1 (en)2004-09-232005-03-31Interspinous process implant including a binder and method of implantation
US67240205P2005-04-182005-04-18
US11/234,555US8048117B2 (en)2003-05-222005-09-23Interspinous process implant and method of implantation
US11/384,055US20060264939A1 (en)2003-05-222006-03-17Interspinous process implant with slide-in distraction piece and method of implantation
US11/378,894US20060271194A1 (en)2005-03-222006-03-17Interspinous process implant having deployable wing as an adjunct to spinal fusion and method of implantation
US11/377,971US7931674B2 (en)2005-03-212006-03-17Interspinous process implant having deployable wing and method of implantation
US11/378,892US8147548B2 (en)2005-03-212006-03-17Interspinous process implant having a thread-shaped wing and method of implantation
US11/378,108US7749252B2 (en)2005-03-212006-03-17Interspinous process implant having deployable wing and method of implantation
US11/378,893US8070778B2 (en)2003-05-222006-03-17Interspinous process implant with slide-in distraction piece and method of implantation
US11/389,002US7959652B2 (en)2005-04-182006-03-24Interspinous process implant having deployable wings and method of implantation
US11/806,528US20080021468A1 (en)2002-10-292007-05-31Interspinous process implants and methods of use
US11/806,526US8221463B2 (en)2002-10-292007-05-31Interspinous process implants and methods of use
US11/768,224US20080065213A1 (en)2002-10-292007-06-26Interspinous process implants and methods of use

Related Parent Applications (2)

Application NumberTitlePriority DateFiling Date
US11/806,526ContinuationUS8221463B2 (en)2002-10-292007-05-31Interspinous process implants and methods of use
US11/806,528ContinuationUS20080021468A1 (en)2002-10-292007-05-31Interspinous process implants and methods of use

Publications (1)

Publication NumberPublication Date
US20080065213A1true US20080065213A1 (en)2008-03-13

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Family Applications (13)

Application NumberTitlePriority DateFiling Date
US11/806,528AbandonedUS20080021468A1 (en)2002-10-292007-05-31Interspinous process implants and methods of use
US11/806,526Active2027-06-29US8221463B2 (en)2002-10-292007-05-31Interspinous process implants and methods of use
US11/768,224AbandonedUS20080065213A1 (en)2002-10-292007-06-26Interspinous process implants and methods of use
US11/768,222Active2026-10-15US8092535B2 (en)2002-10-292007-06-26Interspinous process implants and methods of use
US11/768,223AbandonedUS20080065212A1 (en)2002-10-292007-06-26Interspinous process implants and methods of use
US11/771,092Active2027-06-08US8454659B2 (en)2002-10-292007-06-29Interspinous process implants and methods of use
US11/770,931AbandonedUS20080065214A1 (en)2002-10-292007-06-29Interspinous process implants and methods of use
US11/771,087Active2026-06-13US8894686B2 (en)2002-10-292007-06-29Interspinous process implants and methods of use
US11/770,943AbandonedUS20080051898A1 (en)2002-10-292007-06-29Interspinous process implants and methods of use
US11/770,915Expired - Fee RelatedUS8007537B2 (en)2002-10-292007-06-29Interspinous process implants and methods of use
US11/771,046AbandonedUS20080051899A1 (en)2002-10-292007-06-29Interspinous process implants and methods of use
US11/770,924AbandonedUS20080046081A1 (en)2002-10-292007-06-29Interspinous process implants and methods of use
US11/771,099Expired - LifetimeUS7662187B2 (en)2002-10-292007-06-29Interspinous process implants and methods of use

Family Applications Before (2)

Application NumberTitlePriority DateFiling Date
US11/806,528AbandonedUS20080021468A1 (en)2002-10-292007-05-31Interspinous process implants and methods of use
US11/806,526Active2027-06-29US8221463B2 (en)2002-10-292007-05-31Interspinous process implants and methods of use

Family Applications After (10)

Application NumberTitlePriority DateFiling Date
US11/768,222Active2026-10-15US8092535B2 (en)2002-10-292007-06-26Interspinous process implants and methods of use
US11/768,223AbandonedUS20080065212A1 (en)2002-10-292007-06-26Interspinous process implants and methods of use
US11/771,092Active2027-06-08US8454659B2 (en)2002-10-292007-06-29Interspinous process implants and methods of use
US11/770,931AbandonedUS20080065214A1 (en)2002-10-292007-06-29Interspinous process implants and methods of use
US11/771,087Active2026-06-13US8894686B2 (en)2002-10-292007-06-29Interspinous process implants and methods of use
US11/770,943AbandonedUS20080051898A1 (en)2002-10-292007-06-29Interspinous process implants and methods of use
US11/770,915Expired - Fee RelatedUS8007537B2 (en)2002-10-292007-06-29Interspinous process implants and methods of use
US11/771,046AbandonedUS20080051899A1 (en)2002-10-292007-06-29Interspinous process implants and methods of use
US11/770,924AbandonedUS20080046081A1 (en)2002-10-292007-06-29Interspinous process implants and methods of use
US11/771,099Expired - LifetimeUS7662187B2 (en)2002-10-292007-06-29Interspinous process implants and methods of use

Country Status (1)

CountryLink
US (13)US20080021468A1 (en)

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US20080046081A1 (en)2008-02-21
US20080027545A1 (en)2008-01-31
US20080033560A1 (en)2008-02-07
US20080039947A1 (en)2008-02-14
US20080065212A1 (en)2008-03-13
US20080065214A1 (en)2008-03-13
US20080051898A1 (en)2008-02-28
US8007537B2 (en)2011-08-30
US8221463B2 (en)2012-07-17
US8092535B2 (en)2012-01-10
US7662187B2 (en)2010-02-16
US8894686B2 (en)2014-11-25
US20080033558A1 (en)2008-02-07
US8454659B2 (en)2013-06-04
US20080033553A1 (en)2008-02-07
US20080033559A1 (en)2008-02-07
US20080021468A1 (en)2008-01-24
US20080051899A1 (en)2008-02-28

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