US20070091327A1 - Spectroscopic Scatterometer System - Google Patents

Abstract

Before the diffraction from a diffracting structure on a semiconductor wafer is measured, where necessary, the film thickness and index of refraction of the films underneath the structure are first measured using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous model is then used to calculate intensity or ellipsometric signatures of the diffracting structure. The diffracting structure is then measured using a spectroscopic scatterometer using polarized and broadband radiation to obtain an intensity or ellipsometric signature of the diffracting structure. Such signature is then matched with the signatures in the database to determine the grating shape parameters of the structure.

Description

BACKGROUND OF THE INVENTION
• This invention relates in general to scatterometers and in particular, to a spectroscopic scatterometer system.
• As the integration and speed of microelectronic devices increase, circuit structures continue to shrink in dimension size and to improve in terms of profile edge sharpness. The state-of-the-art devices require a considerable number of process steps. It is becoming increasingly important to have an accurate measurement of submicron linewidth and quantitative description of the profile of the etched structures on a pattern wafer at each process step. Furthermore, there is a growing need for wafer process monitoring and close-loop control such as focus-exposure control in photolithography.
• Diffraction-based analysis techniques such as scatterometry are especially well suited for microelectronics metrology applications because they are nondestructive, sufficiently accurate, repeatable, rapid, simple and inexpensive relative to critical dimension-scanning electron microscopy (CD-SEM).
• Scatterometry is the angle-resolved measurement and characterization of light scattered from a structure. For structures that are periodic, incident light is scattered or diffracted into different orders. The angular location θ_rof the m^thdiffraction order with respect to the angle of incidence θ_iis specified by the grating equation:$\begin{array}{cc}\sin {\mathrm{<figure-callout\; label="\theta "\; filenames="US20070091327A1-20070426-D00005.png"\; state="\{\{state\}\}">\theta </figure-callout>}}_1+\sin {\theta }_r=m\frac{\lambda }{d}& \left(1\right)\end{array}$
  where λ is the wavelength of incident light and d the period of the diffracting structure.
• The diffracted light pattern from a structure can be used as a “fingerprint” or “signature” for identifying the dimensions of the structure itself. In addition to period, more specific dimensions, such as width, step height, and the shape of the line, the thickness of the underlay film layers, and angle of the side-walls, referred to below as parameters of the structure, can also be measured by analyzing the scatter pattern.
• Since the periods of the gratings in the state-of-the-art devices are generally below 1 μm, only the 0^thand +/−1^STdiffraction orders exist over a practical angular range. A traditional scatterometer that measures the entire diffraction envelope does not provide the data required for an accurate analysis. One prior optical technique for characterizing submicron periodic topographic structures is called 2-Θ scatterometry.
• The 2-Θ scatterometer monitors the intensity of a single diffraction order as a function of-the angle of incidence of the illuminating light beam. The intensity variation of the 0^thas well as higher diffraction orders from the sample provides information which is useful for determining the properties of the sample which is illuminated. Because the properties of a sample are determined by the process used to fabricate the sample, the information is also useful as an indirect monitor of the process.
• In 2-Θ scatterometry, a single wavelength coherent light beam, for example, a helium-neon laser, is incident upon a sample mounted on a stage. By either rotating the sample stage or illumination beam, the angle of incidence on the sample is changed. The intensity of the particular diffraction order (such as zeroth-order or first order) as a function of incident angle, which is called a 2-Θ plot or scatter “signature” is then downloaded to a computer. In order to determine the different parameters such as linewidth, step height, shape of the line, and angle of the side-walls (the angle the side-wall makes with the underlying surface, also known as the “wall angle”), a diffraction model is employed. Different grating parameters outlined above are parameterized and a parameter space is defined by allowing each grating-shaped parameter to vary over a certain range.
• A rigorous diffraction model is used to calculate the theoretical diffracted light fingerprint from each grating in the parameter space, and a statistical prediction algorithm is trained on this theoretical calibration data. Subsequently, this prediction algorithm is used to determine the parameters that correspond to the 2-Θ plots or scatter “signature” measured from a target structure on a sample.
• While 2-Θ scatterometry has been useful in some circumstances, it has many disadvantages. The periodic diffracting structure is frequently situated over one or more films that transmit light. Therefore, any diffraction model employed must account for the thicknesses and refractive indices of all films underneath the diffracting structure. In one approach, the thickness and refractive indices of all layers must be known in advance. This is undesirable since frequently, these quantities are not known in advance. In particular, the film thickness and optical indices of materials used in semiconductor fabrication often vary from process to process.
• Another approach to solve the above problem is to include all unknown parameters in the model, including film thickness and optical indices of underlying film materials. By thus increasing the number of variables in the model, the number of signatures that has to be calculated increase exponentially, so that the computation time involved renders such approach inappropriate for real-time measurements.
• Furthermore, since the intensity of the particular diffraction order as a function of incidence angle of the sampling beam is acquired sequentially as the incident angle is varied, data acquisition for the 2-Θ plot or scatter “signature” is slow and the detected intensity is subject to various noise sources such as system vibration and random electronic noise which may change over time as the incident angle is varied.
• Another approach is proposed by Ziger in U.S. Pat. No. 5,607,800. In this approach, where the measurement of a particular patterned film is desired, a first patterned arrangement having predetermined and known grating characteristics close to those of the patterned film to be measured is first made, such as by forming a line-and-space pattern on a first wafer. A spectroreflectometer is then used to measure the amplitude of reflected signals from such first arrangement to obtain a signature. Then a second patterned arrangement having known grating characteristics close to those of the patterned film to be measured, such as another line-and-space pattern on a second wafer, is obtained and a spectroreflectometer is used to measure the amplitude of reflected signal from such arrangement to obtain a second signature. The process is repeated on additional wafers and the signatures so formed are organized as a database. Then, the target pattern film of the sample is measured using a spectroref lectometer and its signature compared to those present in the database. The signature in the database that matches the signature of the target film is then used to find the grating characteristics or parameters of the target film.
• Ziger's approach is limited and impractical, since it requires replication of multiple reference patterns analogous to the target pattern and measurements of such reference patterns to construct a database before a measurement can be made of the target pattern. Ziger's approach also requires contrast difference between the reflectivity of the film versus the reflectivity of the substrate. In other words, Ziger's method cannot be used to measure the grating characteristics on line patterns made of a material having a reflectivity similar to that of the underlying substrate.
• None of the above-described approaches is entirely satisfactory. It is therefore desirable to provide an improved scatterometer with better performance.
SUMMARY OF THE INVENTION
• One aspect of the invention is directed towards a method of measuring one or more parameters of a diffracting structure on an underlying structure, said underlying structure having a film thickness and an optical index, comprising providing an optical index and a film thickness of the underlying structure; constructing a reference database of one or more parameters related to said diffracting structure using said optical index and film thickness of the underlying structure; and directing a beam of electromagnetic radiation at a plurality of wavelengths at said diffracting structure. The method further comprises detecting intensities or ellipsometric parameters at said plurality of wavelengths of a diffraction from said structure; and comparing said detected intensities or ellipsometric parameters to said database to determine said one or more parameters.
• Another aspect of the invention is directed towards an apparatus for measuring one or more parameters of a diffracting structure on an underlying structure, said underlying structure having a film thickness and an optical index, comprising means for constructing a reference database of one or more parameters related to said diffracting structure using an optical index and a film thickness of the underlying structure; and means for directing a beam of electromagnetic radiation including energy at a plurality of wavelengths at said diffracting structure. The apparatus further comprises means for detecting intensities or ellipsometric parameters of a diffraction from said structure at said plurality of wavelengths; and means for comparing said detected intensities or ellipsometric parameters to said database to determine said one or more parameters.
• Another aspect of the invention is directed towards a scatterometer for measuring a parameter of a diffracting structure of a sample, including a source which emits broadband radiation; a polarizer that polarizes the broadband radiation to produce a sampling beam sampling the structure; and means for detecting intensities or ellipsometric parameters of a diffraction from the structure over a range of wavelengths.
• An additional aspect of the invention is directed towards a method for measuring one or more parameters of a diffracting structure of a sample, including providing broadband radiation; polarizing the broadband radiation to produce a sampling beam; and directing the sampling beam towards the structure. The method further comprises detecting radiation of the sampling beam that has been diffracted from the structure over a range of wavelengths; and comparing the detected radiation to a reference to determine said one or more parameters.
• One more aspect of the invention is directed towards an instrument for measuring one or more parameters of a diffracting structure on an underlying structure of a sample, comprising a source of broadband radiation; a polarizer polarizing said radiation to provide a sampling beam towards the sample; and an analyzer for receiving diffracted radiation from the structure to provide an output beam. The instrument further comprises a spectrometer detecting the output beam.
• One more aspect of the invention is directed towards a method for measuring one or more parameters of a diffracting structure on an underlying structure of a sample, comprising performing spectroscopic measurements on the underlying structure to determine its characteristics; constructing a reference database of one or more parameters related to said diffracting structure using characteristics of the underlying structure; and performing scatterometric measurements on the diffracting structure to obtain intensity or ellipsometric data; and comparing said intensity or ellipsometric data to the reference database to derive said one or more parameters.
• Yet another aspect of the invention is directed towards an instrument for measuring a sample, comprising a spectroscopic device measuring film thickness data, and index of refraction data of the sample over a spectrum; a scatterometer measuring diffraction data from a diffracting structure of said sample over a spectrum and means for deriving physical parameters related to the structure from the film thickness data, index of refraction data, and diffraction data.
BRIEF DESCRIPTION OF THE DRAWINGS
• FIG. 1A is a schematic view of a spectroscopic scatterometer to illustrate the preferred embodiment of the invention.
• FIG. 1B is a schematic view of a portion of the spectroscopic scatterometer ofFIG. 1A to illustrate the preferred embodiment of the invention.
• FIG. 2 is a cross-sectional view of a semiconductor wafer including a line pattern of photoresist on a bare silicon substrate useful for illustrating the invention.
• FIG. 3A is a graphical plot of the intensity of the zeroth diffraction order as 51 different functions of the angle of incidence of the illuminating light beam in a 2-Θ scatterometer, where the nominal linewidth is assumed to be 250 nanometers, and the 51 functions are obtained assuming linewidths from 225 to 275 nanometers, at 1 nanometer steps, for comparison with predicted results of the invention.
• FIG. 3B is a graphical plot of the intensity of the zeroth diffraction order as 51 different functions of the wavelength of the illuminating light beam according to the invention where the nominal linewidth is assumed to be 250 nanometers, and the 51 functions are obtained assuming linewidths from 225 to 275 nanometers, at 1 nanometer steps, for comparison with predicted results of the invention.
• FIG. 3C is a plot of the means square error difference measurement as a function of linewidth,. between the signature generated for the grating having the nominal linewidth of 250 nanometers and other signatures obtained for other linewidths using 2-Θ scatterometry, and using the preferred embodiment of this invention over a full range of the spectrum and over UV and visual wavelength bands of the full spectrum useful for illustrating the invention.
• FIG. 4A is a graphical plot of the intensity of an ellipsometric parameter tan(psi) as 5 different functions of the wavelength of the illuminating light beam according to the invention where the nominal linewidth is assumed to be 180 nanometers, and the 5 functions are obtained assuming linewidths at 178, 179, 180, 181, 182 nanometers, for comparison with predicted results of the invention.
• FIG. 4B is a graphical plot of the intensity of an ellipsometric parameter cos(delta) as 5 different functions of the wavelength of the illuminating light beam according to the invention where the nominal linewidth is assumed to be 180 nanometers, and the 5 functions are obtained assuming linewidths at 178, 179, 180, 181, 182 nanometers, for comparison with predicted results of the invention.
• FIG. 5 is a plot of two sets of correlation functions between the signature for the grating having the nominal linewidth of 180 nanometers and other signatures for gratings at other linewidths, one set obtained using tan(psi) and the other set obtained using cos(delta).
• For simplicity in description, identical components are identified by the same numerals in this application.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT
• This invention is based on the recognition that, by measuring or otherwise obtaining characteristics such as the film thickness and optical index of the underlying films underneath the diffracting structure, the subsequent tasks of construction of a database and matching a signature of the diffracting structure to the database are much simplified. Furthermore, if spectroscopic ellipsometry is used to measure the film thickness and optical index of the underlying film(s) under the diffracting structure, an instrument which can be used for spectroscopic ellipsometry as well as for spectroscopic scatterometry may be provided for carrying out both functions. In the preferred embodiment, the spectroscopic ellipsometer and its associated spectroscopic scatterometer in the instrument may share many common optical elements to reduce the cost of the combined instrument and simplify its operation.
• By first measuring the film thickness and optical refractive index of the underlying films, one no longer needs to include such parameters in the computation of the model or database and subsequent matching of signatures that much simplifies the computation task.
• FIG. 1A is a schematic view of a spectroscopic scatterometer system to illustrate the preferred embodiment of the invention. As shown inFIG. 1A,system10 advantageously combines features of a spectroscopic scatterometer, spectroscopic ellipsometer and spectroscopic reflectometer. The spectroscopic reflectometer or the spectroscopic ellipsometer may be used for measuring the film thickness and refractive index of the underlying structure underneath the diffracting structure. As shown inFIG. 1A, a semiconductor wafer may comprise asilicon substrate12a, afilm12bon the substrate and a diffractingstructure12csuch as a photoresist pattern on the film, where the film is at least partially light-transmissive and has a certain film thickness and refractive index (n and k, the real and imaginary components of the index).
• Before the diffractingstructure12cis measured, anXYZ stage14 is used for moving the wafer in the horizontal XY directions in order to first measure the film thickness and refractive index of the underlying structure underneath thephotoresist pattern12c.Stage14 may also be used to adjust the z height of thewafer12 as described below.Stage14 moves the wafer to a position as shown inFIG. 1B so that the sampling beam of radiation illuminates a portion offilm12baway fromstructure12c. In reference toFIGS. 1A, 1B, for the purpose of measuring the film thickness and refractive index of the underlying structure (12band12a), a broadband radiation source such aswhite light source22 supplies light through afiber optic cable24 which randomizes the polarization and creates a uniform light source for illuminating the wafer. Preferably,source22 supplies electromagnetic radiation having wavelengths in the range of at least 230 to 800 nm. Upon emerging fromfiber24, the radiation passes through an optical illuminator that may include a slit aperture and a focus lens (not shown). The slit aperture causes the emerging light beam to image a small area oflayer12b. The light emerging fromilluminator26 is polarized by apolarizer28 to produce apolarized sampling beam30 illuminating thelayer12b.
• The radiation originating from samplingbeam30 that is reflected bylayer12b, passed through ananalyzer32 and to aspectrometer34 to detect different spectral components of the reflected radiation. In the spectroscopic ellipsometry mode ofsystem10 for measuring film thickness and refractive index, either thepolarizer28 or theanalyzer30 is rotated (to cause relative rotational motion between the polarizer and the analyzer) whenspectrometer34 is detecting the reflected light at a plurality of wavelengths, such as those in the spectrum of theradiation source22, where the rotation is controlled bycomputer40 in a manner known to those skilled in the art. The reflected intensities at different wavelengths detected is supplied tocomputer40 which computes the film thickness and n and k values of the refractive index oflayer12bin a manner known to those skilled in the art. For a description of a spectroscopic ellipsometer, please see U.S. Pat. No. 5,608,526, issued Mar. 4, 1997.
• While spectroscopic ellipsometry may be preferred for measuring film thickness and refractive index, in some applications where there may only be one or two relatively thick films underneath the diffracting structure, a spectroscopic reflectometer (also known as spectroreflectometer and spectrophotometer) may be adequate for measuring the film thickness and refractive index. For this purpose,lens23 collects and directs radiation fromsource22 to abeam splitter52, which reflects part of the incoming beam towards thefocus lens54 which focuses the radiation to layer12b. The light reflected by thelayer12bis collected bylens54, passes through thebeam splitter52 to a spectrometer in thespectroscopic reflectometer60. The spectral components at different wavelengths measured are detected and signals representing such components are supplied tocomputer40 for determining the film thickness and refractive index in a manner described, for example, in U.S. patent application Ser. No. 08/227,482, filed Apr. 14, 1994. Spectroscopic devices other than the spectroscopic reflectometer and spectroscopic ellipsometer may also be used for measuring the film thickness and refractive index oflayer12band are within the scope of the invention. An example of such spectroscopic devices include the n & k Analyzer of n & k Technology Inc. of Santa Clara, California, and described in “Optical Characterization of Amorphous and Polycrystalline Silicon Films,” by Ibok et al., reprinted from August 1995 edition ofSolid State Technologypublished by PennWell Publishing Company; “Optical Dispersion Relations for Amorphous Semiconductors and Amorphous Dielectrics,” by Forouhi et al.,Physical Review B,vol. 34, no. 10, pp 7018-7026, Nov. 15, 1986; “Optical Properties of Crystalline Semiconductors and Dielectrics,” by Forouhi et al.,Physical Review B,vol. 38, no. 3, pp 1865-1874, Jul. 15, 1988 and U.S. Pat. No. 4,905,170.
• For the purpose of adjusting the height ofwafer12 relative to thepolarizer28,analyzer32 to achieve proper focus in the spectroscopic ellipsometry measurement, or relative to thefocus lens54 andspectroscopic reflectometer60 in the spectroreflectometer measurement, the height of the wafer may need to be adjusted by means ofstage14 prior to the measurement. For this purpose, a portion of the radiation reflected bylayer12b(orlayer12cin the, description that follows) and collected bylens54 is reflected by abeamsplitter62 towards a focusing andpattern recognition block64 for comparing the reflected image to a pattern.Block62 then sends information concerning the comparison tocomputer40 which controlsstage14.Stage14, in turn, moves thewafer12 up or down in the vertical or Z direction in order to movewafer12 to a proper height relative to the optical components ofsystem10.
• Once the film thickness and refractive index of the one or more films underneath the diffractingstructure12chave been so measured, a reference database may now be constructed by means ofcomputem40. Where the film thickness and refractive index of the one or more films underneath the diffractingstructure12care known to begin with, or can be estimated, it is possible to omit the step of measuring these quantities. To construct the reference database, characteristics concerning the diffractingstructure12cmay be parameterized and the parameters database is defined by allowing an unknown grating parameter of the structure, such as linewidth, height and wall angle to vary over a certain range. This is illustrated by reference toFIG. 2.
• FIG. 2 is a cross-sectional view of a semiconductor wafer comprising asilicon substrate12aand a diffractingstructure12c′ having a linewidth CD, pitch p, height h, and wall angle α as shown inFIG. 2. Thus, the grating shape parameters that can be parameterized and varied over a certain range include CD, h and α. A rigorous diffraction model, such as the model method by modal expansion (MMME), is used to calculate the theoretical diffracted light fingerprint from each grating in the parameter space, and a, statistical prediction algorithm such as Partial-Leased-Squares (PLS) or Minimum-Mean-Square-Error (MMSE) is trained on this theoretical calibration data. For a description of the MMME, please see “Convergence of the Coupled-wave Method for Metallic Lamellar Diffraction Gratings,” by Li et al.,Journal of the Optical Society of America AVol. 10, No. 6, pp. 1184-1189, June 1993; and “Multilayer Modal Method for Diffraction Gratings of Arbitrary Profile, Depth, and Permittivity,” by Li et al.,Journal of the Optical Society of America AVol. 10, No. 12, pp. 2582-2591, December 1993.
• Instead of using the MMME, the grating shape parameters can also be parameterized using rigorous coupling waveguide analysis (“RCWA”). Such method is described, for example, in “Rigorous coupled-wave analysis of planar-grating diffraction,” by M. Moharam et al.,J. Opt. Soc. Am.,Vol. 71, No. 7, July 1981, pp. 811-818, “Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach,” by M. Moharam et al.,J. Opt. Soc. Am. A,Vol. 12, No. 5, May 1995, pp. 1077-1086, and “Analysis and Applications of Optical Diffraction by Gratings,” T. Gaylord et al.,Proceedinqs of the IEEE,Vol. 73, No. 5, May 1985, pp. 894-937.
• Where more than one grating shape parameter is varied, the calculation of fingerprints may be performed by varying only one parameter at a time while keeping the other parameters at selected constant values within selected ranges. Then another parameter is allowed to vary and so on. Subsequently, this prediction algorithm is used to determine the values of the parameters that correspond to the fingerprint measured fromlayer12c′.
• Since the film thickness and optical indices of any film underlying diffractingstructure12cor12c′ are known from the spectroscopic ellipsometry or spectroreflectometry measurements, or are otherwise known, these values may be used in construction of the reference database so that the film thickness and refractive index need not be parameters in the database. This greatly reduces the number of variables in the parameter space and also greatly reduces the number of signatures that need to be calculated for the reference database. Thus, compared to the 2-Θ scatterometry method where such variables need to be taken into account in the parameter space and the calculation of signatures, this invention enables a smaller database to be used when searching for solutions. Furthermore, due to the number of variables that are parameterized in such 2-Θ scatterometry method, there may be multiple solutions which causes difficulties in obtaining a correct solution. By reducing the size of the database, this invention enables unique solutions to be found in most cases. In this manner, this invention reduces the computation time by many orders of magnitude compared to 2-Θ scatterometry.
• The process for measuring the signature fromlayer12cand12c′ will now be described in reference toFIG. 1A. As described above,stage14moves wafer12 so that thesampling beam30 illuminates an area of theunderlying film12bwithout illuminating any portion of the diffractingstructure12c. Now in order to measurestructure12c, thecomputer40 causes stage14 to move the wafer along a direction in the XY plane so that thesampling beam30 impinges onlayer12c(or12c′ inFIG. 2). Broadband radiation fromsource22 is polarized bypolarizer28 into a polarizedbroadbeam sampling beam30. A diffraction ofbeam30 is supplied tospectrometer34 which measures substantially simultaneously the radiation intensities at different wavelengths of a diffraction fromstructure12c, such as at wavelengths across the spectrum ofradiation source22. In the preferred embodiment, the zeroth diffraction order intensity is measured, although for some structures, measurement of higher diffraction order intensities may also be feasible. The process just described is the scatterometric measurement mode ofsystem10.
• Zeroth or higher diffraction order intensities at different wavelengths detected byspectrometer34 are supplied tocomputer40 for analysis and determination of a signature ofstructure12cor12c′. This signature is then compared to those precomputed in the reference database in the manner described above. The grating shape parameters of the signature in the reference database that matches the measured signature ofstructure12cor12c′ are then the grating shape parameters of the structure.
• In the scatterometric measurement mode,analyzer32 may be simply removed from the optical path fromstructure12ctospectrometer34. Alternatively,polarizer28 andanalyzer32 may be controlled by means ofcomputer40 so that polarizer28 passes radiation of a certain polarization andanalyzer32 is oriented to pass radiation of the same polarization as that passed bypolarizer28. This invention is based on the discovery that, where the incidence plane of thebeam30 is substantially normal to the grating12c, the sensitivity of scatterometric measurements is improved ifpolarizer28 is oriented to supply asampling beam30 polarized in the TE mode (S-polarized) andanalyzer32 is oriented to pass light in the TE mode. Alternatively, where the incidence plane of thebeam30 is substantially parallel to the grating12c, the sensitivity of scatterometric measurements is improved ifpolarizer28 is oriented to supply asampling beam30 polarized in the TM mode (P-polarized) andanalyzer32 is oriented to pass light in the TM mode.
• If more than one diffracting structure having different shape parameters are present onwafer12,stage14 may be controlled bycomputer40 to movewafer12 so that thesampling beam30 is directed towards each of such diffracting structures one at a time.System10 is then operated in the scatterometric measuring mode to obtain signatures from each of such diffracting structures. The signature of each diffracting structure may then be matched with a signature in the reference database in order to obtain the grating shape parameters of such structure. It will be noted that, where measurement of the characteristics of the underlying structure (12a,12b) is necessary, this will need to be performed only once for each wafer and the reference database will need to be constructed only once for the wafer as well. After these have been accomplished, the scatterometric measurements of the different diffracting structures onwafer12 may be performed quickly and the signatures of each diffracting structure matched to the reference database expeditiously. As noted above, since the reference database contains a smaller number of signatures, the matching or prediction speed of the grating shape parameters of the different diffracting structures onwafer12 is greatly increased. This makes real time and in-line measurements of the diffracting structures possible. In some applications, a number of semiconductor wafers made by the same process have the same underlying structure underneath the diffraction structures; these underlying structures of the different wafers may have substantially the same film thicknesses and indices of refraction. If this is the case, the above-described process for measuring film thickness and index refraction and the construction of the reference database may need to be performed only once for the entire batch of wafers made by the same process, if the tolerance of the process is known. This further speeds up the measurement and calculation process.
• As compared to 2-Θ scatterometry, the spectroscopic scatterometer of this invention measures diffraction and a number of wavelengths simultaneously. This is in contrast to 2-Θ scatterometry where the user takes a measurement of the diffraction at one angle of incidence at a time. Such feature also speeds up the measurement process. It will also be noted that the above-described reference database is constructed without the use of reference samples. Thus, the user does not have to make reference wafers having diffracting structures analogous to the one being measured or having to take measurements from such reference samples before a database can be constructed. Furthermore, a rigorously radical model such as MMME is used to achieve accurate results.
• Preferably, in the spectroscopic ellipsometry mode and the scatterometric measurement mode,sampling beam30 is directed towardswafer12 at an oblique angle to layer12band12c. Samplingbeam30 is preferably at an oblique angle in the range of 40 to 80°, and more preferably in the range of 60 to 80° for measurement of silicon wafers, from a normal to the layers on thewafer12. A particularly preferred angle of incidence from the normal is about 76° which is substantially the Brewster angle for silicon. Insystem10, the spectroscopic ellipsometer and spectroscopic scatterometer advantageously employ many common optical elements, such as thebroadband source22,fiber24,illuminator26,polarizer28 andspectrometer34. This simplifies the design ofsystem10, reduces cost and simplifies its operation.
• The process for adjusting the height ofwafer12 relative to the optical components in the spectroreflectometry and spectroscopic ellipsometry modes has been described above. However, when light reflected frombeamsplitter52 is directed towards a diffracting structure such as12c, it is preferable for the light so reflected to be polarized and to have the same polarization as that insampling beam30 when the height of thewafer12 is adjusted. For this purpose,. radiation supplied bysource22 is passed through apolarizer72 before it is directed tobeamsplitter52. The optical axis ofpolarizer72 is controlled bycomputer40 so that it has the same orientation as the optical axis ofpolarizer28 when the focusing andpattern recognition block64 is used to detect radiation reflected fromstructure12candstage14 is controlled bycomputer40 to adjust height of the wafer until it is at the proper height relative to thesampling beam30.Polarizer72 does not affect the height adjustment process during the spectroreflectometry and spectroscopic ellipsometry modes or the spectroscopic reflectometry measurements. The polarized radiation detected byspectroscopic reflectometer60 may also be used to normalize the intensity measurement in the scatterometer mode described above at an oblique angle to reduce the effects of intensity variations ofsource22.
• FIG. 3A is a graphical plot of the intensity of the zeroth diffraction order as 51 functions of the angle of incidence of the illuminating light beam in a 2-Θscatterometer measuring structure12c′ ofFIG. 2, where the nominal linewidth is assumed to be 250 nm, and the 51. functions are obtained assuming linewidths from 225 to 275 nanometers, at 1 nanometer steps. The incidence angles used in a calculation of the graphical plot inFIG. 3A varies from 0 to 60° with an uniform increment of 1°, which results in 61 datapoints per signature curve. The light beam is assumed to be TE polarized and the wavelength was 0.6328 microns.
• FIG. 3B is a graphical plot of the intensity of zeroth diffraction order as a function of the wavelength of the illuminating light beam according to the invention used for measuringstructure12c′ ofFIG. 2 where the nominal linewidth is assumed to be 250 nm, and the 51 functions are obtained assuming linewidths from 225 to 275 nanometers, at 1 nanometer steps. These 51 functions are obtained by means of the MMME model method rigorous diffraction method described above, making use of the known or measured index of refraction and film thickness information. These curves are used in comparison with measured results of the invention to predict linewidth of the measured structure. The intensity of the zeroth order is calculated as a function of the wavelength of the illuminating light beam and the wavelengths used in the calculation varies from 0.23 to 0.850 microns with an uniform increment of 0.01 micron which results in 63 datapoints per signature curve. The light beam is assumed to be TE polarized and is illuminated at an oblique angle of 76° from the normal.FIG. 3C is a plot of the mean squares error difference measurement as a function of linewidth, between the signature generated for the grating having the linewidth of 250 nm and other signatures obtained at other linewidths using 2-Θ scatterometry.FIG. 3C also shows plots of the mean squares error difference measurement as a function of linewidth, between the signature generated for the grating having the linewidth of 250 nm and other signatures obtained at other linewidths, and using the preferred embodiment of this invention over a full range of the spectrum as well as over ultraviolet (UV) and visual wavelength bands of the full spectrum. As will be evident fromFIG. 3C, the spectroscopic scatterometer of this invention is more sensitive than the 2-Θ scatterometer. The mean square area difference for 1 nm linewidth (CD) sensitivity are shown by Tables 1 and 2 below.

  TABLE 1
  MSE Different for 1 nm CD Sensitivity

  CD (nm)	Full Band	UV Band	Visual Band	2-Θ
  250	0.0339	0.0528	0.0142	0.0051

• TABLE 2
  MSE Ratio With Respect to 2-Θ

  	CD (nm)	Full Band	UV Band	Visual Band
  	250	6.62	10.31	2.78

• FromFIG. 3C, it is also evident that the sensitivity may be higher if only data collected using radiation at a sub-band of the full spectrum is used for matching the signature. Thus, even though thespectrometer34 records the diffraction for the full range of wavelengths in the spectrum, sensitivity may be improved if only the diffraction at wavelengths in the ultraviolet (UV) band is used to construct the measured signatures from the diffracting structure of12cand12c′. Such signatures are then matched to signatures in the database calculated for the UV band as well. FromFIG. 3B, it is noted that each of the curves is a function characterizing a particular signature of a grating. While inFIG. 3C, information in the ultraviolet band may provide higher sensitivity compared to the visual band or the full band, information in a different portion of the spectrum may provide better sensitivity for gratings of other shapes and dimensions. All such variations are within the scope of the invention.
• Another aspect of the invention is based on the observation that, instead of detecting the intensity of the zero, first or other order of diffraction fromstructure12cor12c′, theapparatus10 ofFIG. 1A may be used to detect ellipsometric parameters of such order diffraction from the structure for determining one or more parameters of the diffracting structure. In other words, during the scatterometer mode,computer40 controls polarizer28 andanalyzer32 to cause relative rotation and motion between them, andsystem10 is used for measuring ellipsometric parameters such as tan (psi) and cos (delta) adds a plurality of wavelengths, such as at wavelengths in the spectrum ofradiation source22. With either known or measured index or refraction and film thickness information of the one or more underlying films underneath thestructure12cor12c′, the MMME model method described above may be used to construct a database of tan (psi) and cos (delta) as functions of wavelength, as illustrated inFIGS. 4A and 4B, corresponding to different values of parameters of thestructure12cor12c′. Thus as shown inFIG. 4A, the model may be used to construct five functions for tan (psi) as functions of wavelength at five different linewidths.FIG. 4B illustrates a similar plot for the ellipsometric parameter cos (delta). The nominal linewidth is 180 nanometers. By measuring the two ellipsometric parameters ofstructure12cor12c′ by means ofsystem10, the measured functions may be compared to those inFIGS. 4A and 4B to find the best fit. The sensitivity in using the ellipsometric parameters is illustrated inFIGS. 5. FIG.FIG. 5 is a plot of the correlation between the ellipsometric parameters corresponding to the nominal 180 nanometer value and those corresponding to the remaining four line width values. Other than the above noted differences, in this aspect of the invention where ellipsometric parameters are used for determining characteristics of thestructure12c,12c′, thesystem10 operates in a manner and shares the same advantages essentially as those described above for measuring intensity of diffraction in determining characteristics of thestructure12c,12c′. For some applications, measuring the ellipsometric parameters may offer higher sensitivity.
• While the construction of database is illustrated above by reference to functions corresponding to different linewidths, it will be understood that similar functions may be constructed using the model for other parameters of thestructure12cor12c′, such as height or wall angle of the structure. Such and other variations are within the scope of the invention.
• While the invention has been described by reference to various embodiments, it will be understood that different changes and modifications may be made without departing from the scope of the invention which is to be defined only by the appended claims and their equivalents.

Claims (2)

1. A method for measuring one or more parameters of a diffracting structure on an underlying structure, said underlying structure having a thickness and an optical index, comprising:

providing an optical index and a film thickness of the underlying structure;

constructing a reference database of one or more parameters related to said diffracting structure using said optical index and film thickness of the underlying structure;

directing a beam of electromagnetic radiation at a plurality of wavelengths at said diffracting structure;

detecting intensities or ellipsometric parameters of a diffraction at said plurality of wavelengths from said structure of said beam; and

comparing said detected intensities or ellipsometric parameters to said database to determine said one or more parameters.

2.-75. (canceled)

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