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US20050274219A1 - Method and system to control movement of a body for nano-scale manufacturing - Google Patents

Method and system to control movement of a body for nano-scale manufacturing
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Publication number
US20050274219A1
US20050274219A1US10/858,100US85810004AUS2005274219A1US 20050274219 A1US20050274219 A1US 20050274219A1US 85810004 AUS85810004 AUS 85810004AUS 2005274219 A1US2005274219 A1US 2005274219A1
Authority
US
United States
Prior art keywords
inner frame
flexure
spaced
recited
axes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US10/858,100
Inventor
Byung-Jin Choi
Sidlgata Sreenivasan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Nanotechnologies Inc
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US10/858,100priorityCriticalpatent/US20050274219A1/en
Application filed by Molecular Imprints IncfiledCriticalMolecular Imprints Inc
Assigned to MOLECULAR IMPRINTS, INC.reassignmentMOLECULAR IMPRINTS, INC.ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: CHOI, BYUNG-JIN, SREENIVASAN, SIDLGATA V.
Assigned to VENTURE LENDING & LEASING IV, INC.reassignmentVENTURE LENDING & LEASING IV, INC.SECURITY INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: MOLECULAR IMPRINTS, INC.
Priority to JP2007515426Aprioritypatent/JP4964764B2/en
Priority to CN200580022972.XAprioritypatent/CN1997491A/en
Priority to EP05757972Aprioritypatent/EP1754122B1/en
Priority to KR1020067027283Aprioritypatent/KR20070027617A/en
Priority to PCT/US2005/018862prioritypatent/WO2005119395A2/en
Priority to TW094117822Aprioritypatent/TWI296965B/en
Priority to US11/142,825prioritypatent/US20060005657A1/en
Publication of US20050274219A1publicationCriticalpatent/US20050274219A1/en
Assigned to MOLECULAR IMPRINTS, INC.reassignmentMOLECULAR IMPRINTS, INC.RELEASE BY SECURED PARTY (SEE DOCUMENT FOR DETAILS).Assignors: VENTURE LENDING & LEASING IV, INC.
Priority to US12/209,049prioritypatent/US20090037004A1/en
Priority to US12/942,652prioritypatent/US8387482B2/en
Abandonedlegal-statusCriticalCurrent

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Abstract

The present invention is directed towards a method and system of controlling movement of a body coupled to an actuation system that features translating movement of the body in a plane extending by imparting angular motion in the actuation system with respect to two spaced-apart axes. Specifically, rotational motion is generated in two spaced-apart planes, one of which extending parallel to the plane in which the body translates. This facilitates proper orientation of body with respect to a surface spaced-apart therefrom.

Description

Claims (30)

US10/858,1002000-10-122004-06-01Method and system to control movement of a body for nano-scale manufacturingAbandonedUS20050274219A1 (en)

Priority Applications (10)

Application NumberPriority DateFiling DateTitle
US10/858,100US20050274219A1 (en)2004-06-012004-06-01Method and system to control movement of a body for nano-scale manufacturing
JP2007515426AJP4964764B2 (en)2004-06-012005-05-27 Method and system for controlling body movement for nanoscale manufacturing
CN200580022972.XACN1997491A (en)2004-06-012005-05-27Method and system to control movement of a body for nano-scale manufacturing
EP05757972AEP1754122B1 (en)2004-06-012005-05-27Method and system to control movement of a body for nano-scale manufacturing
KR1020067027283AKR20070027617A (en)2004-06-012005-05-27Method and system to control movement of a body for nano-scale manufacturing
PCT/US2005/018862WO2005119395A2 (en)2004-06-012005-05-27Method and system to control movement of a body for nano-scale manufacturing
TW094117822ATWI296965B (en)2004-06-012005-05-31Method to control movement of a body for nano-scale manufacturing
US11/142,825US20060005657A1 (en)2004-06-012005-06-01Method and system to control movement of a body for nano-scale manufacturing
US12/209,049US20090037004A1 (en)2000-10-122008-09-11Method and System to Control Movement of a Body for Nano-Scale Manufacturing
US12/942,652US8387482B2 (en)2004-06-012010-11-09Method and system to control movement of a body for nano-scale manufacturing

Applications Claiming Priority (1)

Application NumberPriority DateFiling DateTitle
US10/858,100US20050274219A1 (en)2004-06-012004-06-01Method and system to control movement of a body for nano-scale manufacturing

Related Parent Applications (1)

Application NumberTitlePriority DateFiling Date
US11/142,838DivisionUS7387508B2 (en)2000-10-122005-06-01Compliant device for nano-scale manufacturing

Related Child Applications (1)

Application NumberTitlePriority DateFiling Date
US11/142,825Continuation-In-PartUS20060005657A1 (en)2000-10-122005-06-01Method and system to control movement of a body for nano-scale manufacturing

Publications (1)

Publication NumberPublication Date
US20050274219A1true US20050274219A1 (en)2005-12-15

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Family Applications (2)

Application NumberTitlePriority DateFiling Date
US10/858,100AbandonedUS20050274219A1 (en)2000-10-122004-06-01Method and system to control movement of a body for nano-scale manufacturing
US12/942,652Active2028-12-16US8387482B2 (en)2004-06-012010-11-09Method and system to control movement of a body for nano-scale manufacturing

Family Applications After (1)

Application NumberTitlePriority DateFiling Date
US12/942,652Active2028-12-16US8387482B2 (en)2004-06-012010-11-09Method and system to control movement of a body for nano-scale manufacturing

Country Status (7)

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US (2)US20050274219A1 (en)
EP (1)EP1754122B1 (en)
JP (1)JP4964764B2 (en)
KR (1)KR20070027617A (en)
CN (1)CN1997491A (en)
TW (1)TWI296965B (en)
WO (1)WO2005119395A2 (en)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US20050271955A1 (en)*2004-06-032005-12-08Board Of Regents, The University Of Texas SystemSystem and method for improvement of alignment and overlay for microlithography
US20070228609A1 (en)*2006-04-032007-10-04Molecular Imprints, Inc.Imprinting of Partial Fields at the Edge of the Wafer
US20070287081A1 (en)*2004-06-032007-12-13Molecular Imprints, Inc.Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques
US20080070481A1 (en)*2006-09-152008-03-20Nihon Micro Coating Co., Ltd.Probe cleaner and cleaning method
US20090026657A1 (en)*2007-07-202009-01-29Molecular Imprints, Inc.Alignment System and Method for a Substrate in a Nano-Imprint Process
US20090140445A1 (en)*2007-12-042009-06-04Molecular ImprintsHigh Throughput Imprint Based on Contact Line Motion Tracking Control
US7670530B2 (en)2006-01-202010-03-02Molecular Imprints, Inc.Patterning substrates employing multiple chucks
US7670529B2 (en)2005-12-082010-03-02Molecular Imprints, Inc.Method and system for double-sided patterning of substrates
US7785526B2 (en)2004-07-202010-08-31Molecular Imprints, Inc.Imprint alignment method, system, and template
US20100320645A1 (en)*2009-06-192010-12-23Molecular Imprints, Inc.Dual zone template chuck
US20110048160A1 (en)*2004-06-012011-03-03Molecular Imprints. Inc.Method and System to Control Movement of a Body for Nano-Scale Manufacturing
US8468943B2 (en)2009-09-022013-06-25Tokyo Electron LimitedImprint method, computer storage medium and imprint apparatus
JP2014167980A (en)*2013-02-282014-09-11Osaka Prefecture UnivPattern forming apparatus and pattern forming method using the same
US10935884B2 (en)2017-03-082021-03-02Canon Kabushiki KaishaPattern forming method and methods for manufacturing processed substrate, optical component and quartz mold replica as well as coating material for imprint pretreatment and set thereof with imprint resist
US11037785B2 (en)2017-03-082021-06-15Canon Kabushiki KaishaMethod for fabricating pattern of cured product and methods for manufacturing optical component, circuit board and quartz mold replica as well as coating material for imprint pretreatment and cured product thereof
EP4123375A1 (en)*2021-07-212023-01-25Koninklijke Philips N.V.Imprinting apparatus
WO2023001797A1 (en)*2021-07-212023-01-26Koninklijke Philips N.V.Imprinting apparatus

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
DE102010007970A1 (en)*2010-02-152011-08-18Suss MicroTec Lithography GmbH, 85748 Method and device for active wedge error compensation between two objects which can be positioned substantially parallel to one another
CN102059576B (en)*2010-11-252012-02-08西安理工大学 Two-axis linear movement micro-drive device
JP6553926B2 (en)*2015-04-092019-07-31キヤノン株式会社 Imprint apparatus, imprint method, and article manufacturing method
KR20180023102A (en)2016-08-232018-03-07삼성디스플레이 주식회사Wire grid pattern and method for fabricating the same
US10996560B2 (en)2017-07-312021-05-04Canon Kabushiki KaishaReal-time correction of template deformation in nanoimprint lithography
US10866510B2 (en)2017-07-312020-12-15Canon Kabushiki KaishaOverlay improvement in nanoimprint lithography
US10409178B2 (en)*2017-12-182019-09-10Canon Kabushiki KaishaAlignment control in nanoimprint lithography based on real-time system identification
US10996561B2 (en)2017-12-262021-05-04Canon Kabushiki KaishaNanoimprint lithography with a six degrees-of-freedom imprint head module
US10444624B1 (en)2018-11-302019-10-15Canon Kabushiki KaishaActive metrology frame and thermal frame temperature control in imprint lithography
US11815811B2 (en)2021-03-232023-11-14Canon Kabushiki KaishaMagnification ramp scheme to mitigate template slippage
US12124165B2 (en)2021-10-252024-10-22Canon Kabushiki KaishaApparatus and method for optimizing actuator forces

Citations (96)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US3783520A (en)*1970-09-281974-01-08Bell Telephone Labor IncHigh accuracy alignment procedure utilizing moire patterns
US3807027A (en)*1972-03-311974-04-30Johns ManvilleMethod of forming the bell end of a bell and spigot joint
US3807029A (en)*1972-09-051974-04-30Bendix CorpMethod of making a flexural pivot
US3811665A (en)*1972-09-051974-05-21Bendix CorpFlexural pivot with diaphragm means
US4070116A (en)*1975-06-231978-01-24International Business Machines CorporationGap measuring device for defining the distance between two or more surfaces
US4155169A (en)*1978-03-161979-05-22The Charles Stark Draper Laboratory, Inc.Compliant assembly system device
US4201800A (en)*1978-04-281980-05-06International Business Machines Corp.Hardened photoresist master image mask process
US4202107A (en)*1978-10-231980-05-13Watson Paul CRemote axis admittance system
US4267212A (en)*1978-09-201981-05-12Fuji Photo Film Co., Ltd.Spin coating process
US4326805A (en)*1980-04-111982-04-27Bell Telephone Laboratories, IncorporatedMethod and apparatus for aligning mask and wafer members
US4426247A (en)*1982-04-121984-01-17Nippon Telegraph & Telephone Public CorporationMethod for forming micropattern
US4440804A (en)*1982-08-021984-04-03Fairchild Camera & Instrument CorporationLift-off process for fabricating self-aligned contacts
US4451507A (en)*1982-10-291984-05-29Rca CorporationAutomatic liquid dispensing apparatus for spinning surface of uniform thickness
US4507331A (en)*1983-12-121985-03-26International Business Machines CorporationDry process for forming positive tone micro patterns
US4512848A (en)*1984-02-061985-04-23Exxon Research And Engineering Co.Procedure for fabrication of microstructures over large areas using physical replication
US4657845A (en)*1986-01-141987-04-14International Business Machines CorporationPositive tone oxygen plasma developable photoresist
US4724222A (en)*1986-04-281988-02-09American Telephone And Telegraph Company, At&T Bell LaboratoriesWafer chuck comprising a curved reference surface
US4731155A (en)*1987-04-151988-03-15General Electric CompanyProcess for forming a lithographic mask
US4737425A (en)*1986-06-101988-04-12International Business Machines CorporationPatterned resist and process
US4808511A (en)*1987-05-191989-02-28International Business Machines CorporationVapor phase photoresist silylation process
US4826943A (en)*1986-07-251989-05-02Oki Electric Industry Co., Ltd.Negative resist material
US4891303A (en)*1988-05-261990-01-02Texas Instruments IncorporatedTrilayer microlithographic process using a silicon-based resist as the middle layer
US4908298A (en)*1985-03-191990-03-13International Business Machines CorporationMethod of creating patterned multilayer films for use in production of semiconductor circuits and systems
US4919748A (en)*1989-06-301990-04-24At&T Bell LaboratoriesMethod for tapered etching
US4921778A (en)*1988-07-291990-05-01Shipley Company Inc.Photoresist pattern fabrication employing chemically amplified metalized material
US4929083A (en)*1986-06-191990-05-29Xerox CorporationFocus and overlay characterization and optimization for photolithographic exposure
US4999280A (en)*1989-03-171991-03-12International Business Machines CorporationSpray silylation of photoresist images
US5108875A (en)*1988-07-291992-04-28Shipley Company Inc.Photoresist pattern fabrication employing chemically amplified metalized material
US5110514A (en)*1989-05-011992-05-05Soane Technologies, Inc.Controlled casting of a shrinkable material
US5179863A (en)*1990-03-051993-01-19Kabushiki Kaisha ToshibaMethod and apparatus for setting the gap distance between a mask and a wafer at a predetermined distance
US5198326A (en)*1990-05-241993-03-30Matsushita Electric Industrial Co., Ltd.Process for forming fine pattern
US5204739A (en)*1992-02-071993-04-20Karl Suss America, Inc.Proximity mask alignment using a stored video image
US5206983A (en)*1991-06-241993-05-04Wisconsin Alumni Research FoundationMethod of manufacturing micromechanical devices
US5212147A (en)*1991-05-151993-05-18Hewlett-Packard CompanyMethod of forming a patterned in-situ high Tc superconductive film
US5277749A (en)*1991-10-171994-01-11International Business Machines CorporationMethods and apparatus for relieving stress and resisting stencil delamination when performing lift-off processes that utilize high stress metals and/or multiple evaporation steps
US5314772A (en)*1990-10-091994-05-24Arizona Board Of RegentsHigh resolution, multi-layer resist for microlithography and method therefor
US5380474A (en)*1993-05-201995-01-10Sandia CorporationMethods for patterned deposition on a substrate
US5392123A (en)*1991-09-061995-02-21Eastman Kodak CompanyOptical monitor for measuring a gap between two rollers
US5414514A (en)*1993-06-011995-05-09Massachusetts Institute Of TechnologyOn-axis interferometric alignment of plates using the spatial phase of interference patterns
US5417802A (en)*1994-03-181995-05-23At&T Corp.Integrated circuit manufacturing
US5480047A (en)*1993-06-041996-01-02Sharp Kabushiki KaishaMethod for forming a fine resist pattern
US5508527A (en)*1992-01-311996-04-16Canon Kabushiki KaishaMethod of detecting positional displacement between mask and wafer, and exposure apparatus adopting the method
US5512131A (en)*1993-10-041996-04-30President And Fellows Of Harvard CollegeFormation of microstamped patterns on surfaces and derivative articles
US5515167A (en)*1994-09-131996-05-07Hughes Aircraft CompanyTransparent optical chuck incorporating optical monitoring
US5601641A (en)*1992-07-211997-02-11Tse Industries, Inc.Mold release composition with polybutadiene and method of coating a mold core
US5723176A (en)*1994-03-021998-03-03Telecommunications Research LaboratoriesMethod and apparatus for making optical components by direct dispensing of curable liquid
US5724145A (en)*1995-07-171998-03-03Seiko Epson CorporationOptical film thickness measurement method, film formation method, and semiconductor laser fabrication method
US5726548A (en)*1992-12-181998-03-10Canon Kabushiki KaishaMoving stage apparatus and system using the same
US5725788A (en)*1996-03-041998-03-10MotorolaApparatus and method for patterning a surface
US5736424A (en)*1987-02-271998-04-07Lucent Technologies Inc.Device fabrication involving planarization
US5737064A (en)*1994-03-151998-04-07Matsushita Electric Industrial Co., Ltd.Exposure apparatus for transferring a mask pattern onto a substrate
US5740699A (en)*1995-04-061998-04-21Spar Aerospace LimitedWrist joint which is longitudinally extendible
US5743998A (en)*1995-04-191998-04-28Park Scientific InstrumentsProcess for transferring microminiature patterns using spin-on glass resist media
US5855686A (en)*1994-05-241999-01-05Depositech, Inc.Method and apparatus for vacuum deposition of highly ionized media in an electromagnetic controlled environment
US5876550A (en)*1988-10-051999-03-02Helisys, Inc.Laminated object manufacturing apparatus and method
US5877036A (en)*1996-02-291999-03-02Nec CorporationOverlay measuring method using correlation function
US5877861A (en)*1997-11-141999-03-02International Business Machines CorporationMethod for overlay control system
US5888650A (en)*1996-06-031999-03-30Minnesota Mining And Manufacturing CompanyTemperature-responsive adhesive article
US5895263A (en)*1996-12-191999-04-20International Business Machines CorporationProcess for manufacture of integrated circuit device
US6033977A (en)*1997-06-302000-03-07Siemens AktiengesellschaftDual damascene structure
US6032549A (en)*1996-10-082000-03-07Agency Of Industrial Science And TechnologyActuator, method of driving actuator, computer-readable medium for storing program processed by computer for executing driving method, and compact machine tool utilizing actuator
US6038280A (en)*1997-03-132000-03-14Helmut Fischer Gmbh & Co. Institut Fur Electronik Und MesstechnikMethod and apparatus for measuring the thicknesses of thin layers by means of x-ray fluorescence
US6039897A (en)*1996-08-282000-03-21University Of WashingtonMultiple patterned structures on a single substrate fabricated by elastomeric micro-molding techniques
US6046056A (en)*1996-06-282000-04-04Caliper Technologies CorporationHigh throughput screening assay systems in microscale fluidic devices
US6049373A (en)*1997-02-282000-04-11Sumitomo Heavy Industries, Ltd.Position detection technique applied to proximity exposure
US6051345A (en)*1998-04-272000-04-18United Microelectronics Corp.Method of producing phase shifting mask
US6168845B1 (en)*1999-01-192001-01-02International Business Machines CorporationPatterned magnetic media and method of making the same using selective oxidation
US6180239B1 (en)*1993-10-042001-01-30President And Fellows Of Harvard CollegeMicrocontact printing on surfaces and derivative articles
US6188150B1 (en)*1999-06-162001-02-13Euv, LlcLight weight high-stiffness stage platen
US6204922B1 (en)*1998-12-112001-03-20Filmetrics, Inc.Rapid and accurate thin film measurement of individual layers in a multi-layered or patterned sample
US6218316B1 (en)*1998-10-222001-04-17Micron Technology, Inc.Planarization of non-planar surfaces in device fabrication
US6334960B1 (en)*1999-03-112002-01-01Board Of Regents, The University Of Texas SystemStep and flash imprint lithography
US6355198B1 (en)*1996-03-152002-03-12President And Fellows Of Harvard CollegeMethod of forming articles including waveguides via capillary micromolding and microtransfer molding
US20020042027A1 (en)*1998-10-092002-04-11Chou Stephen Y.Microscale patterning and articles formed thereby
US6514672B2 (en)*1999-06-172003-02-04Taiwan Semiconductor Manufacturing CompanyDry development process for a bi-layer resist system
US6517995B1 (en)*1999-09-142003-02-11Massachusetts Institute Of TechnologyFabrication of finely featured devices by liquid embossing
US6518189B1 (en)*1995-11-152003-02-11Regents Of The University Of MinnesotaMethod and apparatus for high density nanostructures
US6518168B1 (en)*1995-08-182003-02-11President And Fellows Of Harvard CollegeSelf-assembled monolayer directed patterning of surfaces
US6522411B1 (en)*1999-05-252003-02-18Massachusetts Institute Of TechnologyOptical gap measuring apparatus and method having two-dimensional grating mark with chirp in one direction
US20030034329A1 (en)*1998-06-302003-02-20Chou Stephen Y.Lithographic method for molding pattern with nanoscale depth
US6534418B1 (en)*2001-04-302003-03-18Advanced Micro Devices, Inc.Use of silicon containing imaging layer to define sub-resolution gate structures
US6541360B1 (en)*2001-04-302003-04-01Advanced Micro Devices, Inc.Bi-layer trim etch process to form integrated circuit gate structures
US20040007799A1 (en)*2002-07-112004-01-15Choi Byung JinFormation of discontinuous films during an imprint lithography process
US20040009673A1 (en)*2002-07-112004-01-15Sreenivasan Sidlgata V.Method and system for imprint lithography using an electric field
US20040008334A1 (en)*2002-07-112004-01-15Sreenivasan Sidlgata V.Step and repeat imprint lithography systems
US20040010341A1 (en)*2002-07-092004-01-15Watts Michael P.C.System and method for dispensing liquids
US20040021254A1 (en)*2002-08-012004-02-05Sreenivasan Sidlgata V.Alignment methods for imprint lithography
US20040021866A1 (en)*2002-08-012004-02-05Watts Michael P.C.Scatterometry alignment for imprint lithography
US20040022888A1 (en)*2002-08-012004-02-05Sreenivasan Sidlgata V.Alignment systems for imprint lithography
US20040029041A1 (en)*2002-02-272004-02-12Brewer Science, Inc.Novel planarization method for multi-layer lithography processing
US20040033515A1 (en)*2002-04-162004-02-19Han CaoGradient structures interfacing microfluidics and nanofluidics, methods for fabrication and uses thereof
US6696220B2 (en)*2000-10-122004-02-24Board Of Regents, The University Of Texas SystemTemplate for room temperature, low pressure micro-and nano-imprint lithography
US20040036201A1 (en)*2000-07-182004-02-26Princeton UniversityMethods and apparatus of field-induced pressure imprint lithography
US6703190B2 (en)*1999-12-072004-03-09Infineon Technologies AgMethod for producing resist structures
US20040046288A1 (en)*2000-07-182004-03-11Chou Stephen Y.Laset assisted direct imprint lithography
US6716767B2 (en)*2001-10-312004-04-06Brewer Science, Inc.Contact planarization materials that generate no volatile byproducts or residue during curing

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US4498038A (en)*1983-02-151985-02-05Malueg Richard MStabilization system for soft-mounted platform
DE3788773T2 (en)*1986-09-091994-08-04Hitachi Construction Machinery Device for fine adjustment and device for controlling these adjustments.
US5813287A (en)*1994-03-021998-09-29Renishaw PlcCoordinate positioning machine
KR100334902B1 (en)*1999-12-062002-05-04윤덕용6 Degree-of-freedom Parallel Mechanism for Micro-positioning Task
CN1092092C (en)*2000-04-212002-10-09清华大学Spatial triaxial parallel machine tool structure with two-dimensional shift and one-dimensional rotation
US20050274219A1 (en)*2004-06-012005-12-15Molecular Imprints, Inc.Method and system to control movement of a body for nano-scale manufacturing
US20060005657A1 (en)*2004-06-012006-01-12Molecular Imprints, Inc.Method and system to control movement of a body for nano-scale manufacturing
US6997866B2 (en)*2002-04-152006-02-14Simon Fraser UniversityDevices for positioning implements about fixed points
US7019819B2 (en)2002-11-132006-03-28Molecular Imprints, Inc.Chucking system for modulating shapes of substrates
US6936194B2 (en)2002-09-052005-08-30Molecular Imprints, Inc.Functional patterning material for imprint lithography processes
US20040065252A1 (en)2002-10-042004-04-08Sreenivasan Sidlgata V.Method of forming a layer on a substrate to facilitate fabrication of metrology standards
US8349241B2 (en)2002-10-042013-01-08Molecular Imprints, Inc.Method to arrange features on a substrate to replicate features having minimal dimensional variability
US6808344B2 (en)*2002-12-272004-10-26Jeng-Shyong ChenMulti-axis cartesian guided parallel kinematic machine

Patent Citations (99)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US3783520A (en)*1970-09-281974-01-08Bell Telephone Labor IncHigh accuracy alignment procedure utilizing moire patterns
US3807027A (en)*1972-03-311974-04-30Johns ManvilleMethod of forming the bell end of a bell and spigot joint
US3807029A (en)*1972-09-051974-04-30Bendix CorpMethod of making a flexural pivot
US3811665A (en)*1972-09-051974-05-21Bendix CorpFlexural pivot with diaphragm means
US4070116A (en)*1975-06-231978-01-24International Business Machines CorporationGap measuring device for defining the distance between two or more surfaces
US4155169A (en)*1978-03-161979-05-22The Charles Stark Draper Laboratory, Inc.Compliant assembly system device
US4201800A (en)*1978-04-281980-05-06International Business Machines Corp.Hardened photoresist master image mask process
US4267212A (en)*1978-09-201981-05-12Fuji Photo Film Co., Ltd.Spin coating process
US4202107A (en)*1978-10-231980-05-13Watson Paul CRemote axis admittance system
US4326805A (en)*1980-04-111982-04-27Bell Telephone Laboratories, IncorporatedMethod and apparatus for aligning mask and wafer members
US4426247A (en)*1982-04-121984-01-17Nippon Telegraph & Telephone Public CorporationMethod for forming micropattern
US4440804A (en)*1982-08-021984-04-03Fairchild Camera & Instrument CorporationLift-off process for fabricating self-aligned contacts
US4451507A (en)*1982-10-291984-05-29Rca CorporationAutomatic liquid dispensing apparatus for spinning surface of uniform thickness
US4507331A (en)*1983-12-121985-03-26International Business Machines CorporationDry process for forming positive tone micro patterns
US4512848A (en)*1984-02-061985-04-23Exxon Research And Engineering Co.Procedure for fabrication of microstructures over large areas using physical replication
US4908298A (en)*1985-03-191990-03-13International Business Machines CorporationMethod of creating patterned multilayer films for use in production of semiconductor circuits and systems
US4657845A (en)*1986-01-141987-04-14International Business Machines CorporationPositive tone oxygen plasma developable photoresist
US4724222A (en)*1986-04-281988-02-09American Telephone And Telegraph Company, At&T Bell LaboratoriesWafer chuck comprising a curved reference surface
US4737425A (en)*1986-06-101988-04-12International Business Machines CorporationPatterned resist and process
US4929083A (en)*1986-06-191990-05-29Xerox CorporationFocus and overlay characterization and optimization for photolithographic exposure
US4826943A (en)*1986-07-251989-05-02Oki Electric Industry Co., Ltd.Negative resist material
US5736424A (en)*1987-02-271998-04-07Lucent Technologies Inc.Device fabrication involving planarization
US4731155A (en)*1987-04-151988-03-15General Electric CompanyProcess for forming a lithographic mask
US4808511A (en)*1987-05-191989-02-28International Business Machines CorporationVapor phase photoresist silylation process
US4891303A (en)*1988-05-261990-01-02Texas Instruments IncorporatedTrilayer microlithographic process using a silicon-based resist as the middle layer
US4921778A (en)*1988-07-291990-05-01Shipley Company Inc.Photoresist pattern fabrication employing chemically amplified metalized material
US5108875A (en)*1988-07-291992-04-28Shipley Company Inc.Photoresist pattern fabrication employing chemically amplified metalized material
US5876550A (en)*1988-10-051999-03-02Helisys, Inc.Laminated object manufacturing apparatus and method
US4999280A (en)*1989-03-171991-03-12International Business Machines CorporationSpray silylation of photoresist images
US5110514A (en)*1989-05-011992-05-05Soane Technologies, Inc.Controlled casting of a shrinkable material
US4919748A (en)*1989-06-301990-04-24At&T Bell LaboratoriesMethod for tapered etching
US5179863A (en)*1990-03-051993-01-19Kabushiki Kaisha ToshibaMethod and apparatus for setting the gap distance between a mask and a wafer at a predetermined distance
US5198326A (en)*1990-05-241993-03-30Matsushita Electric Industrial Co., Ltd.Process for forming fine pattern
US5314772A (en)*1990-10-091994-05-24Arizona Board Of RegentsHigh resolution, multi-layer resist for microlithography and method therefor
US5212147A (en)*1991-05-151993-05-18Hewlett-Packard CompanyMethod of forming a patterned in-situ high Tc superconductive film
US5206983A (en)*1991-06-241993-05-04Wisconsin Alumni Research FoundationMethod of manufacturing micromechanical devices
US5392123A (en)*1991-09-061995-02-21Eastman Kodak CompanyOptical monitor for measuring a gap between two rollers
US5277749A (en)*1991-10-171994-01-11International Business Machines CorporationMethods and apparatus for relieving stress and resisting stencil delamination when performing lift-off processes that utilize high stress metals and/or multiple evaporation steps
US5508527A (en)*1992-01-311996-04-16Canon Kabushiki KaishaMethod of detecting positional displacement between mask and wafer, and exposure apparatus adopting the method
US5204739A (en)*1992-02-071993-04-20Karl Suss America, Inc.Proximity mask alignment using a stored video image
US5601641A (en)*1992-07-211997-02-11Tse Industries, Inc.Mold release composition with polybutadiene and method of coating a mold core
US5726548A (en)*1992-12-181998-03-10Canon Kabushiki KaishaMoving stage apparatus and system using the same
US5380474A (en)*1993-05-201995-01-10Sandia CorporationMethods for patterned deposition on a substrate
US5414514A (en)*1993-06-011995-05-09Massachusetts Institute Of TechnologyOn-axis interferometric alignment of plates using the spatial phase of interference patterns
US5480047A (en)*1993-06-041996-01-02Sharp Kabushiki KaishaMethod for forming a fine resist pattern
US5512131A (en)*1993-10-041996-04-30President And Fellows Of Harvard CollegeFormation of microstamped patterns on surfaces and derivative articles
US6180239B1 (en)*1993-10-042001-01-30President And Fellows Of Harvard CollegeMicrocontact printing on surfaces and derivative articles
US5723176A (en)*1994-03-021998-03-03Telecommunications Research LaboratoriesMethod and apparatus for making optical components by direct dispensing of curable liquid
US5737064A (en)*1994-03-151998-04-07Matsushita Electric Industrial Co., Ltd.Exposure apparatus for transferring a mask pattern onto a substrate
US5417802A (en)*1994-03-181995-05-23At&T Corp.Integrated circuit manufacturing
US6035805A (en)*1994-05-242000-03-14Depositech, Inc.Method and apparatus for vacuum deposition of highly ionized media in an electromagnetic controlled environment
US5855686A (en)*1994-05-241999-01-05Depositech, Inc.Method and apparatus for vacuum deposition of highly ionized media in an electromagnetic controlled environment
US5515167A (en)*1994-09-131996-05-07Hughes Aircraft CompanyTransparent optical chuck incorporating optical monitoring
US5740699A (en)*1995-04-061998-04-21Spar Aerospace LimitedWrist joint which is longitudinally extendible
US5743998A (en)*1995-04-191998-04-28Park Scientific InstrumentsProcess for transferring microminiature patterns using spin-on glass resist media
US5724145A (en)*1995-07-171998-03-03Seiko Epson CorporationOptical film thickness measurement method, film formation method, and semiconductor laser fabrication method
US6518168B1 (en)*1995-08-182003-02-11President And Fellows Of Harvard CollegeSelf-assembled monolayer directed patterning of surfaces
US6518189B1 (en)*1995-11-152003-02-11Regents Of The University Of MinnesotaMethod and apparatus for high density nanostructures
US5877036A (en)*1996-02-291999-03-02Nec CorporationOverlay measuring method using correlation function
US5725788A (en)*1996-03-041998-03-10MotorolaApparatus and method for patterning a surface
US6355198B1 (en)*1996-03-152002-03-12President And Fellows Of Harvard CollegeMethod of forming articles including waveguides via capillary micromolding and microtransfer molding
US5888650A (en)*1996-06-031999-03-30Minnesota Mining And Manufacturing CompanyTemperature-responsive adhesive article
US6046056A (en)*1996-06-282000-04-04Caliper Technologies CorporationHigh throughput screening assay systems in microscale fluidic devices
US6039897A (en)*1996-08-282000-03-21University Of WashingtonMultiple patterned structures on a single substrate fabricated by elastomeric micro-molding techniques
US6032549A (en)*1996-10-082000-03-07Agency Of Industrial Science And TechnologyActuator, method of driving actuator, computer-readable medium for storing program processed by computer for executing driving method, and compact machine tool utilizing actuator
US5895263A (en)*1996-12-191999-04-20International Business Machines CorporationProcess for manufacture of integrated circuit device
US6049373A (en)*1997-02-282000-04-11Sumitomo Heavy Industries, Ltd.Position detection technique applied to proximity exposure
US6038280A (en)*1997-03-132000-03-14Helmut Fischer Gmbh & Co. Institut Fur Electronik Und MesstechnikMethod and apparatus for measuring the thicknesses of thin layers by means of x-ray fluorescence
US6033977A (en)*1997-06-302000-03-07Siemens AktiengesellschaftDual damascene structure
US5877861A (en)*1997-11-141999-03-02International Business Machines CorporationMethod for overlay control system
US6051345A (en)*1998-04-272000-04-18United Microelectronics Corp.Method of producing phase shifting mask
US20030034329A1 (en)*1998-06-302003-02-20Chou Stephen Y.Lithographic method for molding pattern with nanoscale depth
US6713238B1 (en)*1998-10-092004-03-30Stephen Y. ChouMicroscale patterning and articles formed thereby
US20020042027A1 (en)*1998-10-092002-04-11Chou Stephen Y.Microscale patterning and articles formed thereby
US6677252B2 (en)*1998-10-222004-01-13Micron Technology, Inc.Methods for planarization of non-planar surfaces in device fabrication
US6218316B1 (en)*1998-10-222001-04-17Micron Technology, Inc.Planarization of non-planar surfaces in device fabrication
US6204922B1 (en)*1998-12-112001-03-20Filmetrics, Inc.Rapid and accurate thin film measurement of individual layers in a multi-layered or patterned sample
US6168845B1 (en)*1999-01-192001-01-02International Business Machines CorporationPatterned magnetic media and method of making the same using selective oxidation
US6334960B1 (en)*1999-03-112002-01-01Board Of Regents, The University Of Texas SystemStep and flash imprint lithography
US6522411B1 (en)*1999-05-252003-02-18Massachusetts Institute Of TechnologyOptical gap measuring apparatus and method having two-dimensional grating mark with chirp in one direction
US6188150B1 (en)*1999-06-162001-02-13Euv, LlcLight weight high-stiffness stage platen
US6514672B2 (en)*1999-06-172003-02-04Taiwan Semiconductor Manufacturing CompanyDry development process for a bi-layer resist system
US6517995B1 (en)*1999-09-142003-02-11Massachusetts Institute Of TechnologyFabrication of finely featured devices by liquid embossing
US6703190B2 (en)*1999-12-072004-03-09Infineon Technologies AgMethod for producing resist structures
US20040046288A1 (en)*2000-07-182004-03-11Chou Stephen Y.Laset assisted direct imprint lithography
US20040036201A1 (en)*2000-07-182004-02-26Princeton UniversityMethods and apparatus of field-induced pressure imprint lithography
US6696220B2 (en)*2000-10-122004-02-24Board Of Regents, The University Of Texas SystemTemplate for room temperature, low pressure micro-and nano-imprint lithography
US6534418B1 (en)*2001-04-302003-03-18Advanced Micro Devices, Inc.Use of silicon containing imaging layer to define sub-resolution gate structures
US6541360B1 (en)*2001-04-302003-04-01Advanced Micro Devices, Inc.Bi-layer trim etch process to form integrated circuit gate structures
US6716767B2 (en)*2001-10-312004-04-06Brewer Science, Inc.Contact planarization materials that generate no volatile byproducts or residue during curing
US20040029041A1 (en)*2002-02-272004-02-12Brewer Science, Inc.Novel planarization method for multi-layer lithography processing
US20040033515A1 (en)*2002-04-162004-02-19Han CaoGradient structures interfacing microfluidics and nanofluidics, methods for fabrication and uses thereof
US20040010341A1 (en)*2002-07-092004-01-15Watts Michael P.C.System and method for dispensing liquids
US20040008334A1 (en)*2002-07-112004-01-15Sreenivasan Sidlgata V.Step and repeat imprint lithography systems
US20040009673A1 (en)*2002-07-112004-01-15Sreenivasan Sidlgata V.Method and system for imprint lithography using an electric field
US20040007799A1 (en)*2002-07-112004-01-15Choi Byung JinFormation of discontinuous films during an imprint lithography process
US20040022888A1 (en)*2002-08-012004-02-05Sreenivasan Sidlgata V.Alignment systems for imprint lithography
US20040021866A1 (en)*2002-08-012004-02-05Watts Michael P.C.Scatterometry alignment for imprint lithography
US20040021254A1 (en)*2002-08-012004-02-05Sreenivasan Sidlgata V.Alignment methods for imprint lithography

Cited By (26)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US8387482B2 (en)2004-06-012013-03-05Molecular Imprints, Inc.Method and system to control movement of a body for nano-scale manufacturing
US20110048160A1 (en)*2004-06-012011-03-03Molecular Imprints. Inc.Method and System to Control Movement of a Body for Nano-Scale Manufacturing
US7768624B2 (en)2004-06-032010-08-03Board Of Regents, The University Of Texas SystemMethod for obtaining force combinations for template deformation using nullspace and methods optimization techniques
US7535549B2 (en)2004-06-032009-05-19Board Of Regents, University Of Texas SystemSystem and method for improvement of alignment and overlay for microlithography
US20050271955A1 (en)*2004-06-032005-12-08Board Of Regents, The University Of Texas SystemSystem and method for improvement of alignment and overlay for microlithography
US20070287081A1 (en)*2004-06-032007-12-13Molecular Imprints, Inc.Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques
US8366434B2 (en)*2004-07-202013-02-05Molecular Imprints, Inc.Imprint alignment method, system and template
US7785526B2 (en)2004-07-202010-08-31Molecular Imprints, Inc.Imprint alignment method, system, and template
US7670529B2 (en)2005-12-082010-03-02Molecular Imprints, Inc.Method and system for double-sided patterning of substrates
US7670530B2 (en)2006-01-202010-03-02Molecular Imprints, Inc.Patterning substrates employing multiple chucks
US7802978B2 (en)2006-04-032010-09-28Molecular Imprints, Inc.Imprinting of partial fields at the edge of the wafer
US20070228609A1 (en)*2006-04-032007-10-04Molecular Imprints, Inc.Imprinting of Partial Fields at the Edge of the Wafer
US20080070481A1 (en)*2006-09-152008-03-20Nihon Micro Coating Co., Ltd.Probe cleaner and cleaning method
US20090026657A1 (en)*2007-07-202009-01-29Molecular Imprints, Inc.Alignment System and Method for a Substrate in a Nano-Imprint Process
US7837907B2 (en)2007-07-202010-11-23Molecular Imprints, Inc.Alignment system and method for a substrate in a nano-imprint process
US20090140445A1 (en)*2007-12-042009-06-04Molecular ImprintsHigh Throughput Imprint Based on Contact Line Motion Tracking Control
US8945444B2 (en)2007-12-042015-02-03Canon Nanotechnologies, Inc.High throughput imprint based on contact line motion tracking control
US20100320645A1 (en)*2009-06-192010-12-23Molecular Imprints, Inc.Dual zone template chuck
US9164375B2 (en)2009-06-192015-10-20Canon Nanotechnologies, Inc.Dual zone template chuck
US8468943B2 (en)2009-09-022013-06-25Tokyo Electron LimitedImprint method, computer storage medium and imprint apparatus
JP2014167980A (en)*2013-02-282014-09-11Osaka Prefecture UnivPattern forming apparatus and pattern forming method using the same
US10935884B2 (en)2017-03-082021-03-02Canon Kabushiki KaishaPattern forming method and methods for manufacturing processed substrate, optical component and quartz mold replica as well as coating material for imprint pretreatment and set thereof with imprint resist
US11037785B2 (en)2017-03-082021-06-15Canon Kabushiki KaishaMethod for fabricating pattern of cured product and methods for manufacturing optical component, circuit board and quartz mold replica as well as coating material for imprint pretreatment and cured product thereof
US12362176B2 (en)2017-03-082025-07-15Canon Kabushiki KaishaMethod for fabricating pattern of cured product and methods for manufacturing optical component, circuit board and quartz mold replica as well as coating material for imprint pretreatment and cured product thereof
EP4123375A1 (en)*2021-07-212023-01-25Koninklijke Philips N.V.Imprinting apparatus
WO2023001797A1 (en)*2021-07-212023-01-26Koninklijke Philips N.V.Imprinting apparatus

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KR20070027617A (en)2007-03-09

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