BACKGROUND OF THE INVENTION AND RELATED ART STATEMENT The present invention relates to a cleaning apparatus for cleaning and removing fine particles or organic substances on a surface of a hard disk medium, a silicon wafer, or the like.
It is necessary to completely clean a surface of a hard disk medium, a silicon wafer, or a glass plate of a liquid crystal display to remove fine particles or organic substances, so that irregularities of the surface is minimized and micromachining is applied.
An example of a cleaning apparatus for cleaning a surface of a silicon wafer or the like has been disclosed in Japanese Patent Publication (Kokai) No. 2003-1208.FIG. 5 is a view showing a structure of the cleaning apparatus disclosed in the publication. InFIG. 5,reference numeral11 denotes a cylinder of CO2as a cleaning agent (hereinafter referred to as solvent), and CO2within thecylinder11 is divided into aliquid portion111 with a temperature T and agas portion112 with a pressure PO.Reference numeral12 denotes a heater for maintaining thecylinder11 at a constant temperature.Reference numeral13 denotes a pipe for taking out CO2gas. Reference numeral14 denotes a pressure gage disposed in thepipe13 for measuring a pressure within thepipe13. A pressure within thepipe13 is equal to the pressure Poof thegas portion112.Reference numeral16 denotes a line filter attached to thepipe13, and reference numeral17 denotes an air operate valve attached to thepipe13. The CO2cylinder, theline filter16, and the air operate valve17 are arranged in an order shown inFIG. 5.
Reference numeral19 denotes a hard disk medium as an object to be cleaned, and aspindle20 rotates the hard disk medium.Reference numeral18 denotes a nozzle disposed with a predetermined gap d from theobject19 to be cleaned. Thenozzle18 is a double pipe type, in which CO2gas guided into thepipe13 passes through an inner pipe, and N2gas passes through an outer pipe. Reference numeral21 denotes an infrared heater for heating theobject19 to be cleaned. Reference numeral22 denotes a purge pipe for ejecting N2gas. InFIG. 5, the pressure gage14 measures a pressure within thepipe13, and theheater12 is controlled to maintain the pressure within thepipe13 constant. Since CO2liquid and CO2gas coexist in thecylinder11, the pressure Poof thegas portion112 corresponds to a saturation vapor pressure of theliquid portion111 at the temperature T. The liquid temperature has a direct relationship relative to the saturation vapor pressure. Accordingly, when theheater12 is controlled to adjust the temperature of theliquid portion111, the saturation vapor pressure, i.e. the pressure within thepipe13, can be controlled. For example, when the liquid temperature is adjusted at 22° C., the saturation vapor pressure becomes 6.0 MPa.
With the structure described above, it is possible to remove particles such as dusts from gas of the solvent (CO2) through the line filter, and eject the solvent from the nozzle in a form of solid particles or droplets against the object to be cleaned, thereby removing particles or organic substances on the object. It is possible to change the solvent into solid particles or droplets by controlling a gap between the nozzle and the object to be cleaned. Accordingly, it is possible to select an optimum state of the solvent according to an extent of cleanness. Further, it is possible to easily remove particles such as dusts in the solvent through filtering, so that there is no need for an expensive and pure solvent, thereby reducing running cost.
However, the cleaning apparatus described above has the problems as follows. The infrared heater21 is provided for heating theobject19 to be cleaned to a predetermined temperature, so that the infrared heater21 generates particles such as dusts.
When CO2is ejected, an end of thenozzle18 is rapidly cooled due to adiabatic expansion, and liquefaction occurs within a CO2passage as the temperature decreases. As a result, it is difficult to control generation of dry ice. To avoid this, the infrared heater21 controls the temperature, but the generation of CO2may become unstable since the temperature of thenozzle18 is not independently controlled.
In view of the problems described above, an object of the present invention is to provide a cleaning apparatus capable of cleaning while reducing dusts, and preventing dew condensation of an object to be cleaned due to CO2sprayed thereto and condensation of CO2within a pipe.
Further objects and advantages of the invention will be apparent from the following description of the invention.
SUMMARY OF THE INVENTION To attain the objects described above, according to a first aspect of the invention, a cleaning apparatus cleans an object to be cleaned by ejecting a cleaning agent from a nozzle, and includes gas ejecting means for ejecting heated gas to a surface of the object to be cleaned. The ejecting means is configured to move to a position above the object to be cleaned when cleaning is performed, and retract from the object to be cleaned when cleaning is not performed. An ejection quantity of the heated gas is controlled when cleaning is performed and when cleaning is not performed.
According to a second aspect of the invention, in the cleaning apparatus according to the first aspect, the gas ejecting means has a plurality of jet holes, and the heated gas at a predetermined temperature is ejected through the plurality of jet holes.
According to a third aspect of the invention, in the cleaning apparatus according to one of the first and second aspects, the gas ejecting means has one end thereof supported by a supporting member, and is disposed at a predetermined interval from the surface of the object to be cleaned such that the gas is ejected toward the surface of the object to be cleaned.
According to a fourth aspect of the invention, in the cleaning apparatus according to one of the first to third aspects, the jet holes of the gas ejecting means are at a predetermined angle with respect to the surface of the object to be cleaned.
According to a fifth aspect of the invention, in the cleaning apparatus according to the fourth aspect, the gas ejecting means is disposed between a center and a circumference of the object to be cleaned, and the jet holes are arranged with at least two directions, i.e. a direction perpendicular to the surface of the object to be cleaned and an inner circumferential direction or an outer circumferential direction.
According to a sixth aspect of the invention, in the cleaning apparatus according to one of the first to fifth aspects, a filter is provided for cleaning gas.
According to a seventh aspect of the invention, in the cleaning apparatus according to one of the third to sixth aspects, the supporting member, the filter and a heater for heating gas are disposed within an environmental chamber.
According to an eighth aspect of the invention, in the cleaning apparatus according to one of the third to seventh aspects, at least one of the supporting member and the filter has a temperature control mechanism.
According to a ninth aspect of the invention, in the cleaning apparatus according to one of the third to eighth aspects, the gas ejecting means supported by the supporting member includes at least two portions disposed on the surface of the object to be cleaned with a center thereof in between.
According to a tenth aspect of the invention, in the cleaning apparatus according to the ninth aspect, the gas flows into the at least two portions of the gas ejecting means from one gas source.
According to an eleventh aspect of the invention, in the cleaning apparatus according to one of the second to tenth aspects, solvent ejecting means is mounted in the vicinity of a center of the at least two portions of the gas ejecting means supported by the supporting means. The gas ejecting means and the solvent ejecting means are driven together.
According to a twelfth aspect of the invention, in the cleaning apparatus according to one of the first to eleventh aspects, the solvent ejecting means comprises temperature control means for maintaining the solvent ejecting means at a temperature equal to or higher than a dew point of the solvent.
According to a thirteen aspect of the invention, in the cleaning apparatus according to one of the first to twelfth aspects, a gas jetting hole is formed on an outer circumference of a nozzle provided in the solvent ejecting means for ejecting the gas.
According to a fourteenth aspect of the invention, in the cleaning apparatus according to one of the first to thirteenth aspects, the solvent ejecting means has a rod shape, and is provided with a wedge-shaped surface inclined in a longitudinal direction relative to the surface of the object to be cleaned.
BRIEF DESCRIPTION OF THE DRAWINGSFIG. 1 is a view showing a structure of an essential part of a cleaning apparatus according to an embodiment of the present invention;
FIGS.2(a) to2(c) are views showing solvent ejecting means according to the embodiment of the present invention, whereinFIG. 2(a) is a sectional view thereof,FIG. 2(b) is a side view thereof, andFIG. 2(c) is an enlarged sectional view ofFIG. 2(b);
FIGS.3(a) to3(c) are views showing the solvent ejecting means according to another embodiment, whereinFIG. 3(a) is a sectional view thereof,FIG. 3(b) is a side view thereof, andFIG. 3(c) is an enlarged sectional view ofFIG. 3(b);
FIGS.4(a) to4(c) are views showing the solvent ejecting means ejecting dry ice (CO2) according to the embodiment of the present invention, whereinFIG. 4(a) is a front view thereof,FIG. 4(b) is a side view thereof, and aFIG. 4(c) is a perspective view thereof;
FIG. 5 is a view showing a structure of a conventional cleaning apparatus.
DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS Hereunder, embodiments of the present invention will be described in detail with reference to the accompanying drawings.FIG. 1 is a view showing a structure of an essential part of a cleaning apparatus according to an embodiment of the present invention. InFIG. 1, an area A enclosed by a phantom line is a environmental chamber, in which a heat insulting material (not shown) prevents heat exchange with outside. The environmental chamber A contains aheater block4, afilter3, and a supportingmember2.Reference numeral1 denotes pipes as gas ejecting means having closed one ends and the other ends fixed to the supporting member (manifold)2. As shown inFIG. 1, each of thepipes1 is disposed between a center and a periphery of anobject19 to be cleaned. It is preferred that fourpipes1 are provided on both sides of theobject19 to be cleaned for preventing dew condensation on theobject19 to be cleaned. However, onepipe1 may be provided as far as dew condensation can be prevented.
Each of the
pipes1 is provided with series of
holes1aand
1bin the longitudinal direction thereof. The
holes1aand
1bare formed with regular intervals in between at a predetermined angle relative to the surface of the
object19 to be cleaned. Specifically, the holes
1aare formed in a direction perpendicular to the surface of the
object19 to be cleaned, and the
holes2aare formed with an angle of 45
degrees relative to the center of the
object19 to be cleaned.
The supportingmember2 has a branchedhole2a, and the other ends of the twopipes1 are airtightly fixed to both ends of thebranched hole2a. Apipe3acommunicating with an outlet of thefilter3 is connected to a predetermined location of thebranched hole2a. Apipe4ais connected to an inlet of theheater block4 for guiding N2gas, and apipe4bconnected to the inlet of thefilter3 is connected to the outlet of theheater block4. Thepipe4afor guiding N2gas is configured such that N2gas flows in from two directions. That is, a small quantity of N2gas constantly flows into thepipe4afrom an inlet of a constant lead-inpipe6a, and a relatively large quantity of N2gas flows into thepipe4afrom an ejection lead-inpipe6bvia an air operatevalve5 during cleaning.
Reference numeral8 denotes rod-shaped CO2ejecting means formed of a high thermalcapacity metal block8ahaving, for example, 50 mm in length and 15 mm in side. The CO2ejecting means has one end fixed to the supportingmember2 and the other end provided with anozzle8bhaving a jet hole of about 0.3 mm, for example.
FIGS.2(a) to2(c) are views showing the CO2ejecting means8 according to the embodiment, in whichFIG. 2(a) is a sectional view thereof,FIG. 2(b) is a side view thereof, andFIG. 2(c) is an enlarged sectional view ofFIG. 2(b). In FIGS.2(a) to2(c),reference numeral8cdenotes a CO2passage for guiding CO2as a solvent, andreference numeral8ddenotes an N2passage for guiding N2gas. It is configured such that N2gas led into the N2passage8dis ejected from the periphery of thenozzle8b.
Thenozzle8bis fabricated as a separate part, and is fixed to an end of themetal block8aby press-fitting, welding, or the like.Reference numeral8edenotes temperature control means having a temperature sensor and a temperature control circuit (not shown).
FIGS.3(a) to3(c) are views showing the ejecting means8 according to another embodiment, in whichFIG. 3(a) is a sectional view thereof,FIG. 3(b) is a side view thereof, andFIG. 3(c) is an enlarged sectional view ofFIG. 3(b). In FIGS.3(a) to3(c),reference numeral8fdenotes a CO2passage for guiding CO2as a solvent, and reference numeral8edenotes temperature control means having a temperature sensor and a temperature control circuit (not shown). The CO2ejecting means8 shown in FIGS.3(a) to3(c) differs from the CO2ejecting means8 shown in FIGS.2(a) to2(c) in that the N2passage8dfor N2gas ejection (refer to FIGS.2(a) to2(c)) is not provided, and a wedge-shapedpart9 and arelief part10 are provided on a surface opposite to the surface of theobject19 to be cleaned.
FIGS.4(a) to4(c) show a flow of CO2when the CO2ejecting means8 (metal block8a) shown in FIGS.3(a) to3(c) ejects CO2.FIG. 4(a) is a front view thereof,FIG. 4(b) is a side view thereof, and aFIG. 4(c) is a perspective view thereof. As is apparent from FIGS.4(a) to4(c), CO2jetted from thenozzle8bsmoothly flows without rebounding between thenozzle8band themetal block8a.
Referring toFIG. 1, the supportingmember2, thefilter3, theheater block4, the CO2ejecting means8, and thepipes1 are provided in the environmental chamber A indicated by the phantom line, and are driven integrally with each other. When theobject19 to be cleaned is cleaned, the environmental chamber A moves in an arrow direction B so as to seek theobject19 to be cleaned. As theobject19 to be cleaned is sought, CO2is ejected from thenozzle8b. In synchronism with timing of the CO2ejection, the air operatevalve5 is opened, so that a large quantity of N2gas is ejected from the ejection lead-inpipe6b.
When the cleaning is completed, the environmental chamber A retracts in an arrow direction C so as to attach/remove theobject19 to be cleaned. Even when the environmental chamber A retracts, a small quantity of N2gas heated to a predetermined temperature is jetted into thepipes1 via the constant lead-inpipe6a, theheater block4, thefilter3, and the supportingmember2 in this order, so that thepipes1 is maintained at a predetermined temperature.
During the cleaning, N
2gas from the jet holes
1aperpendicular to the
object19 to be cleaned heats mainly the surface of the
object19 to be cleaned. Similarly, N
2gas from the jet holes
1bformed inwardly with an angle of 45
degress heats evenly the whole area of the
object19 to be cleaned. It should be noted that temperature control means provided in the
heater block4 and the
filter3 maintains N
2gas at a predetermined temperature.
As described above, the CO2ejecting means is shown in FIGS.2(a)-2(c) and3(a)-3(c). The CO2ejecting means shown in FIGS.2(a)-2(c) emits CO2gas from the CO2passage8cvia thenozzle8b, while the CO2ejecting means shown in FIGS.3(a)-32(c) ejects N2gas through the holes formed in the periphery of thenozzle8b. N2gas is ejected from the periphery of thenozzle8bfor the following reason. When CO2gas is ejected from thenozzle8b, CO2gas is cooled by adiabatic expansion and a temperature around the periphery of thenozzle8bis lowered. Therefore, the temperature of the entire nozzle block is lowered below the liquefying temperature of CO2gas (22° C. at 6 MPa). Accordingly, CO2gas liquefies in a pipe section of the nozzle block, and is ejected as liquid. As a result, generation of dry ice becomes unstable, and it is difficult to control the generation of dry ice. To prevent this phenomenon, the temperature control means8econtrols the temperatures of CO2and N2gas.
In the embodiment shown inFIG. 3, the CO2ejecting means8 omits ejection of N2gas, and has thenozzle8bsimplified. The temperature control means8eheats the entire high thermalcapacity metal block8aso that it can be kept at a temperature equal to or higher than the liquefying temperature of CO2.
With this arrangement, it is not necessary to eject N2gas for purging as shown inFIG. 2. Accordingly, it is possible to omit a filter and valve, thereby reducing a size and weight of the entire system. Further, it is not necessary to join thenozzle8b, thereby making thenozzle8bsimple.
In the present embodiment, the side of the CO2ejecting means facing theobject19 to be cleaned is formed in a wedge-shape. As a result, it is possible to smoothly clean theobject19 to be cleaned without dry ice jetted from thenozzle8brebounding between themetal block8aand thenozzle8b. It should be noted that the wedge-shapedpart9 may be provided in the CO2ejecting means8 shown inFIG. 2 as well.
The present invention has been described in detail with reference to the specific embodiments for purposes of explanation and illustration. Accordingly, it will be apparent to a person skilled in the art that certain changes and modifications may be practiced within the scope of the invention. For example, in the embodiments described above, the CO2ejecting means has a rectangular shape, and the pipes are used as the N2ejecting means, but they may have an arbitrary shape. Further, the temperature control means for heating is provided in both thefilter3 and theheater block4, and may be provided in one of them. N2gas is used for heating, and dry air or the like may be used. The scope of the present invention is defined by the claims, and includes modifications and variations within the scope of the present invention.
As described above, the following effects can be obtained according to the present invention. In the first aspect of the invention, the cleaning apparatus ejects the cleaning agent from a nozzle to clean an object. The cleaning apparatus includes the gas ejecting means for ejecting heated gas to a surface of the object to be cleaned. The ejecting means is configured to move to a position above the object to be cleaned when the cleaning is performed, and retract from the object to be cleaned when the cleaning is not performed. An ejection quantity of the heated gas is controlled when the cleaning is performed and is not performed. Therefore, the cleaning apparatus can perform more satisfactory cleaning by reducing dust sources and preventing dew condensation caused by CO2jetted onto the object to be cleaned.
In the second to fifth aspects of the invention of, the gas ejecting means comprises a plurality of jet holes from which gas heated to a predetermined temperature is ejected, and is disposed at a predetermined interval above the surface of the object to be cleaned. The jet holes are formed with at least two directions, i.e. a direction perpendicular to the surface of the object to be cleaned and an inner circumferential direction or an outer circumferential direction. Therefore, it is possible to prevent temperature irregularities on the surface of the object to be cleaned as well as the thermal cleaning thereof.
In the sixth aspect of the invention, the filter it provided for cleaning gas, thereby eliminating contamination on the object to be cleaned due to heated gas.
In the seventh and eighth aspects of the invention, the supporting member and the filter as well as the heater for heating gas are disposed within the environmental chamber. At least one of the supporting member and the filter includes the temperature control mechanism. Therefore, it is possible to accurately control the temperature of N2gas supplied to the gas ejecting means.
In the ninth to eleventh aspects of the invention, at least two gas ejecting means supported by the supporting member are disposed on the surface of the object to be cleaned across the center thereof. The single gas source supplies gas into the two gas ejecting means, and the solvent ejecting means is mounted in the vicinity of a center of the two gas ejecting means supported by the supporting means, and is driven integrally with the gas ejecting means. Therefore, it is possible to simplify the entire structure of the cleaning apparatus.
In the twelfth aspect of the invention, the solvent ejecting means for ejecting solvent is provided with the temperature control means for controlling solvent at a temperature equal to or higher than a dew point. Accordingly, it is possible to accurately control the temperature of CO2.
In the thirteenth aspect of the invention, the gas jetting holes for jetting gas are formed on an outer circumference of the nozzle provided in the solvent ejecting means. Accordingly, it is possible to accurately control the temperature of CO2.
In the fourteenth aspect of the invention, the solvent ejecting means has a rod shape and a wedge-shaped surface inclined in a longitudinal direction thereof and facing the surface of the object to be cleaned. Accordingly, it is possible to smoothly clean the object to be cleaned without ejected dry ice rebounding between the nozzle and the metal block.
The disclosure of the specification and drawings explained in Japanese Patent Application No. 2003-156321 filed on Jun. 2, 2003 is hereby incorporated.
While the invention has been explained with reference to the specific embodiments of the invention, the explanation is illustrative and the invention is limited only by the appended claims.