Movatterモバイル変換


[0]ホーム

URL:


US20050160552A1 - Cleaning apparatus - Google Patents

Cleaning apparatus
Download PDF

Info

Publication number
US20050160552A1
US20050160552A1US10/855,340US85534004AUS2005160552A1US 20050160552 A1US20050160552 A1US 20050160552A1US 85534004 AUS85534004 AUS 85534004AUS 2005160552 A1US2005160552 A1US 2005160552A1
Authority
US
United States
Prior art keywords
gas
cleaning apparatus
ejecting means
cleaning
solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US10/855,340
Inventor
Takashi Yoshida
Osayasu Kikuchi
Motoaki Iwasaki
Kurao Habaya
Tatsuro Yano
Takahiro Shiroma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by IndividualfiledCriticalIndividual
Assigned to FUJI ELECTRIC DEVICE TECHNOLOGY CO., LTD.reassignmentFUJI ELECTRIC DEVICE TECHNOLOGY CO., LTD.ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: IWASAKI, MOTOAKI, KIKUCHI, OSAYASU, YOSHIDA, TAKASHI, Habaya, Kurao , SHIROMA, TAKAHIRO, YANO, TATSURO
Publication of US20050160552A1publicationCriticalpatent/US20050160552A1/en
Assigned to FUJI ELECTRIC HOLDINGS CO., LTD.reassignmentFUJI ELECTRIC HOLDINGS CO., LTD.CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).Assignors: FUJI ELECTRIC CO., LTD.
Assigned to FUJI ELECTRIC DEVICE TECHNOLOGY CO., LTD.reassignmentFUJI ELECTRIC DEVICE TECHNOLOGY CO., LTD.ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: FUJI ELECTRIC HOLDINGS CO., LTD.
Assigned to FUJI ELECTRIC HOLDINGS CO., LTD.reassignmentFUJI ELECTRIC HOLDINGS CO., LTD.ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: FUJI ELECTRIC CO., LTD
Abandonedlegal-statusCriticalCurrent

Links

Images

Classifications

Definitions

Landscapes

Abstract

A cleaning apparatus cleans an object to be cleaned by ejecting a cleaning agent from a nozzle. The cleaning apparatus includes a gas ejecting device for ejecting heated gas to a surface of the object to be cleaned. The gas ejecting device is configured to move to a position above the object to be cleaned when cleaning is performed, and retract from the object to be cleaned when cleaning is not performed. An ejection quantity of the heated gas is controlled when cleaning is performed and when cleaning is not performed.

Description

Claims (14)

1. A cleaning apparatus for cleaning an object with a cleaning agent, comprising:
gas ejecting means for ejecting heated gas to a surface of the object, said ejecting means moving to a position above the object when cleaning is performed and retracting from the position above the object when cleaning is not performed, and
means for controlling a quantity of the heated gas when cleaning is performed and is not performed, said controlling means being connected to the gas ejecting means.
2. A cleaning apparatus according toclaim 1, wherein said gas ejecting means has a plurality of jet holes, and ejects the heated gas with a predetermined temperature through the plurality of the jet holes.
3. A cleaning apparatus according toclaim 1, further comprising a supporting member for supporting one end of the gas ejecting means to be disposed at a position with a predetermined distance from the surface of the object so that the heated gas is ejected toward the surface of the object.
4. A cleaning apparatus according toclaim 2, wherein said jet holes of the gas ejecting means are arranged with a predetermined angle relative to the surface of the object.
5. A cleaning apparatus according toclaim 2, wherein said jet holes are arranged with at least two directions including a direction perpendicular to the surface of the object and an inner circumferential direction or an outer circumferential direction of the object.
6. A cleaning apparatus according toclaim 1, further comprising a filter for cleaning the heated gas.
7. A cleaning apparatus according toclaim 3, further comprising a heater for heating the heated gas, a filter for cleaning the heated gas and an environmental chamber for retaining the heater, the filter and the supporting member.
8. A cleaning apparatus according toclaim 7, wherein at least one of said supporting member and said filter includes a temperature control mechanism.
9. A cleaning apparatus according toclaim 3, wherein said gas ejecting means includes at least two portions supported by the supporting member to be disposed above the surface of the object with a center of the object therebetween.
10. A cleaning apparatus according toclaim 9, further comprising one gas source for supplying the heated gas into the at least two portions.
11. A cleaning apparatus according toclaim 9, further comprising solvent ejecting means disposed between the two portions, said solvent ejecting means being driven together with the gas ejecting means.
12. A cleaning apparatus according toclaim 11, wherein said solvent ejecting means includes temperature control means for maintaining solvent at a temperature equal to or higher than a dew point thereof.
13. A cleaning apparatus according toclaim 11, wherein said solvent ejecting means includes a nozzle having a gas jetting hole at an outer circumference thereof for ejecting gas.
14. A cleaning apparatus according toclaim 11, wherein said solvent ejecting means has a rod shape and a wedge-shaped surface inclined in a longitudinal direction thereof to face the surface of the object.
US10/855,3402003-06-022004-05-28Cleaning apparatusAbandonedUS20050160552A1 (en)

Applications Claiming Priority (2)

Application NumberPriority DateFiling DateTitle
JP2003-1563212003-06-02
JP2003156321AJP4118194B2 (en)2003-06-022003-06-02 Cleaning device

Publications (1)

Publication NumberPublication Date
US20050160552A1true US20050160552A1 (en)2005-07-28

Family

ID=34050437

Family Applications (1)

Application NumberTitlePriority DateFiling Date
US10/855,340AbandonedUS20050160552A1 (en)2003-06-022004-05-28Cleaning apparatus

Country Status (5)

CountryLink
US (1)US20050160552A1 (en)
JP (1)JP4118194B2 (en)
CN (1)CN1572383A (en)
MY (1)MY135287A (en)
SG (1)SG140459A1 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
CN102380492A (en)*2011-09-302012-03-21么丽敏Cleaning machine of plastic greenhouse
WO2013076395A1 (en)*2011-11-242013-05-30L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges ClaudeDevice for dispensing jets of cryogenic fluid, including a plenum chamber
US20160279688A1 (en)*2013-03-182016-09-29Sandvik Materials Technology Deutschland GmbhMethod for producing a steel tube including cleaning of the outer tube wall
EP3330660A1 (en)*2016-11-302018-06-06AIC GmbHMethod, use and device for cleaning cooling tower inserts

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
JPH0975958A (en)*1995-09-061997-03-25Daiei Kogyo Kk Ozone water discharge device
JP4528677B2 (en)*2005-06-242010-08-18株式会社東芝 Patterned medium manufacturing method and manufacturing apparatus
JP5829082B2 (en)*2011-09-092015-12-09オリンパス株式会社 Cleaning device
EP2973560B1 (en)*2013-03-142019-03-13Koolance, Inc.Phonograph record cleaner
KR101387024B1 (en)*2013-11-252014-04-21한모기술주식회사The combined cleaning system for hear exchanger
JP6509104B2 (en)*2015-09-302019-05-08東京エレクトロン株式会社 Substrate liquid processing system
CN106078530B (en)*2016-06-232018-08-17南通普瑞特机械有限公司A kind of ball blast abrasive jet cleaning device
CN108188112B (en)*2018-01-082020-10-30迪普干冰制造(大连)有限公司Liquid carbon dioxide cleaning system
CN113814226B (en)*2020-06-192023-01-24理光高科技(深圳)有限公司Dry type cleaning device
CN113701068B (en)*2021-09-112023-12-29深圳市源科光电有限公司Anti-interference LED lamp bead

Citations (58)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US2042145A (en)*1931-03-051936-05-26William A DarrahProcess of evaporating and equipment therefor
US2316670A (en)*1940-03-281943-04-13Colgate Palmolive Peet CoFlash distillation of organic sulphonate solutions
US2332215A (en)*1937-08-051943-10-19Edward H FrenchDistillation apparatus
US2515098A (en)*1945-08-011950-07-11Chain Belt CoContinuous low-temperature dehydration
US2571143A (en)*1947-03-281951-10-16Leslie Eugene HendricksDesolventizing of solventextracted solid particles
US3250315A (en)*1963-04-081966-05-10American Mach & FoundryVapor impingement heating
US3367034A (en)*1965-10-231968-02-06Blaw Knox CoMeal desolventizing and deodorizing system and process
US3401195A (en)*1964-04-241968-09-10Clifford A. CramptonProcess of producing sulphamic acid derivatives
US3520066A (en)*1966-05-261970-07-14Pillsbury CoSpray drying method
US3585731A (en)*1968-01-041971-06-22Truman B WayneMethod for desolventizing solvent extracted milled rice
US3615723A (en)*1970-04-151971-10-26Pillsbury CoSpray-drying apparatus
US3635454A (en)*1970-05-071972-01-18IbmApparatus and process for the removal of insulation from wire
US3767379A (en)*1971-12-231973-10-23Texaco Development CorpOre reduction process using recirculated cooled gas
US3862078A (en)*1972-02-151975-01-21Burke Oliver W JunProcess for converting coarse aqueous polymer emulsion to fine emulsion
US3907703A (en)*1971-12-231975-09-23Texaco Development CorpProcess for producing reducing gas
US4095974A (en)*1975-09-241978-06-20Thagard Technology CompanyHigh temperature chemical reaction processes utilizing fluid-wall reactors
US4143468A (en)*1974-04-221979-03-13Novotny Jerome LInert atmosphere chamber
US4385929A (en)*1981-06-191983-05-31Sumitomo Metal Industries LimitedMethod and apparatus for production of metal powder
US4411075A (en)*1980-10-141983-10-25Lohmann Gmbh & Co. KgProcess and apparatus for drying of solvent containing material
US4442143A (en)*1982-03-031984-04-10Liquid Carbonic Inc.Catalytic curing of coatings
US4582120A (en)*1985-01-031986-04-15Ashland Oil, Inc.Apparatus for cooling fluid solid particles in a regeneration system
US4798007A (en)*1987-05-281989-01-17Eichenlaub John EExplosion-proof, pollution-free infrared dryer
US4952145A (en)*1988-04-071990-08-28Vits Maschinenbau GmbhApparatus for the heat treatment and/or drying of a web of material passing continuously through
US5060572A (en)*1989-01-251991-10-29Baldwin-Gegenheimer GmbhContinuous drier on rotary offset printing presses and operation of such a drier during the printing and cylinder washing processes with the web running
US5107764A (en)*1990-02-131992-04-28Baldwin Technology CorporationMethod and apparatus for carbon dioxide cleaning of graphic arts equipment
US5348718A (en)*1990-04-041994-09-20Phillips Petroleum CompanyMethod and apparatus for producing carbride products
US5354384A (en)*1993-04-301994-10-11Hughes Aircraft CompanyMethod for cleaning surface by heating and a stream of snow
US5366156A (en)*1993-06-141994-11-22International Business Machines CorporationNozzle apparatus for producing aerosol
US5400603A (en)*1993-06-141995-03-28International Business Machines CorporationHeat exchanger
US5452045A (en)*1992-10-301995-09-19Konica CorporationApparatus for processing a light-sensitive silver halide photographic material
US5486132A (en)*1993-06-141996-01-23International Business Machines CorporationMounting apparatus for cryogenic aerosol cleaning
US5536158A (en)*1993-10-251996-07-16Eastman Kodak CompanyApparatus for drying solvent based film
US5565180A (en)*1987-03-021996-10-15Turbotak Inc.Method of treating gases
US5939139A (en)*1997-01-241999-08-17Tokyo Electron LimitedMethod of removing coated film from substrate edge surface and apparatus for removing coated film
US5940985A (en)*1996-03-011999-08-24Tokyo Electron LimitedApparatus and method for drying substrates
US5996242A (en)*1997-04-041999-12-07Ryoden Semiconductor System Engineering CorporationDrying apparatus and method
US6280573B1 (en)*1998-08-122001-08-28Kimberly-Clark Worldwide, Inc.Leakage control system for treatment of moving webs
US6282812B1 (en)*1999-12-202001-09-04St Assembly Test Services Pte Ltd.Multi air-knife box and method of use
US20020073576A1 (en)*2000-12-152002-06-20Yuji KamikawaLiquid processing apparatus and method
US20030000228A1 (en)*2000-02-252003-01-02Hans LeuenbergerMethod for producing particulate goods
US6530823B1 (en)*2000-08-102003-03-11Nanoclean Technologies IncMethods for cleaning surfaces substantially free of contaminants
US6543462B1 (en)*2000-08-102003-04-08Nano Clean Technologies, Inc.Apparatus for cleaning surfaces substantially free of contaminants
US6589359B2 (en)*2000-07-112003-07-08Tokyo Electron LimitedCleaning method and cleaning apparatus for substrate
US20030154619A1 (en)*2001-03-262003-08-21Voith Paper Patent GmbhApparatus for coating moving fiber webs
US20030222364A1 (en)*2002-03-202003-12-04Jackson Blair C.Method and apparatus for producing dry particles
US6729041B2 (en)*2000-12-282004-05-04Tokyo Electron LimitedSubstrate processing apparatus and substrate processing method
US6818097B2 (en)*2002-04-222004-11-16Nisshinbo Industries, Inc.Highly heat-resistant plasma etching electrode and dry etching device including the same
US6899110B2 (en)*2001-06-252005-05-31Fuji Electric Co., Ltd.Cleaning method and apparatus
US20050178020A1 (en)*2003-02-072005-08-18Ferro CorporationLyophilization method and apparatus for producing particles
US20060021307A1 (en)*2004-07-292006-02-02Caterpillar, Inc.Particulate trap filter element
US20060179680A1 (en)*2000-09-242006-08-173M Innovative Properties CompanyVapor collection method and apparatus
US20060204671A1 (en)*2005-03-102006-09-14Fuji Photo Film Co., Ltd.Method and apparatus for curing coated film and optical film
US20060213077A1 (en)*2005-03-282006-09-28Konica Minolta Opto, Inc.Manufacturing method of optical film, and optical film
US20070018361A1 (en)*2003-09-052007-01-25Xiaoming XuNanofibers, and apparatus and methods for fabricating nanofibers by reactive electrospinning
US7225561B2 (en)*2002-10-252007-06-05South African Nuclear Energy Corporation LimitedOxyfluorination
US20080314870A1 (en)*2005-02-072008-12-25Yuki InoueSubstrate Processing Method, Substrate Processing Apparatus, and Control Program
US20090039565A1 (en)*2005-04-212009-02-12The University Of AkronProcess for producing fibers and their uses
US20090077825A1 (en)*2007-07-172009-03-26Semiconductor Analytical Services, Inc. (Sas Inc.)Apparatus and method for cleaning and drying solid objects

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US5125979A (en)*1990-07-021992-06-30Xerox CorporationCarbon dioxide snow agglomeration and acceleration
US5315793A (en)*1991-10-011994-05-31Hughes Aircraft CompanySystem for precision cleaning by jet spray
US5372652A (en)*1993-06-141994-12-13International Business Machines CorporationAerosol cleaning method
JP3504023B2 (en)*1995-05-262004-03-08株式会社ルネサステクノロジ Cleaning device and cleaning method

Patent Citations (61)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US2042145A (en)*1931-03-051936-05-26William A DarrahProcess of evaporating and equipment therefor
US2332215A (en)*1937-08-051943-10-19Edward H FrenchDistillation apparatus
US2316670A (en)*1940-03-281943-04-13Colgate Palmolive Peet CoFlash distillation of organic sulphonate solutions
US2515098A (en)*1945-08-011950-07-11Chain Belt CoContinuous low-temperature dehydration
US2571143A (en)*1947-03-281951-10-16Leslie Eugene HendricksDesolventizing of solventextracted solid particles
US3250315A (en)*1963-04-081966-05-10American Mach & FoundryVapor impingement heating
US3401195A (en)*1964-04-241968-09-10Clifford A. CramptonProcess of producing sulphamic acid derivatives
US3367034A (en)*1965-10-231968-02-06Blaw Knox CoMeal desolventizing and deodorizing system and process
US3520066A (en)*1966-05-261970-07-14Pillsbury CoSpray drying method
US3585731A (en)*1968-01-041971-06-22Truman B WayneMethod for desolventizing solvent extracted milled rice
US3615723A (en)*1970-04-151971-10-26Pillsbury CoSpray-drying apparatus
US3635454A (en)*1970-05-071972-01-18IbmApparatus and process for the removal of insulation from wire
US3907703A (en)*1971-12-231975-09-23Texaco Development CorpProcess for producing reducing gas
US3767379A (en)*1971-12-231973-10-23Texaco Development CorpOre reduction process using recirculated cooled gas
US3862078A (en)*1972-02-151975-01-21Burke Oliver W JunProcess for converting coarse aqueous polymer emulsion to fine emulsion
US4143468A (en)*1974-04-221979-03-13Novotny Jerome LInert atmosphere chamber
US4095974A (en)*1975-09-241978-06-20Thagard Technology CompanyHigh temperature chemical reaction processes utilizing fluid-wall reactors
US4411075A (en)*1980-10-141983-10-25Lohmann Gmbh & Co. KgProcess and apparatus for drying of solvent containing material
US4385929A (en)*1981-06-191983-05-31Sumitomo Metal Industries LimitedMethod and apparatus for production of metal powder
US4442143A (en)*1982-03-031984-04-10Liquid Carbonic Inc.Catalytic curing of coatings
US4582120A (en)*1985-01-031986-04-15Ashland Oil, Inc.Apparatus for cooling fluid solid particles in a regeneration system
US5565180A (en)*1987-03-021996-10-15Turbotak Inc.Method of treating gases
US4798007A (en)*1987-05-281989-01-17Eichenlaub John EExplosion-proof, pollution-free infrared dryer
US4952145A (en)*1988-04-071990-08-28Vits Maschinenbau GmbhApparatus for the heat treatment and/or drying of a web of material passing continuously through
US5060572A (en)*1989-01-251991-10-29Baldwin-Gegenheimer GmbhContinuous drier on rotary offset printing presses and operation of such a drier during the printing and cylinder washing processes with the web running
US5107764A (en)*1990-02-131992-04-28Baldwin Technology CorporationMethod and apparatus for carbon dioxide cleaning of graphic arts equipment
US5348718A (en)*1990-04-041994-09-20Phillips Petroleum CompanyMethod and apparatus for producing carbride products
US5452045A (en)*1992-10-301995-09-19Konica CorporationApparatus for processing a light-sensitive silver halide photographic material
US5354384A (en)*1993-04-301994-10-11Hughes Aircraft CompanyMethod for cleaning surface by heating and a stream of snow
US5486132A (en)*1993-06-141996-01-23International Business Machines CorporationMounting apparatus for cryogenic aerosol cleaning
US5400603A (en)*1993-06-141995-03-28International Business Machines CorporationHeat exchanger
US5366156A (en)*1993-06-141994-11-22International Business Machines CorporationNozzle apparatus for producing aerosol
US5536158A (en)*1993-10-251996-07-16Eastman Kodak CompanyApparatus for drying solvent based film
US5940985A (en)*1996-03-011999-08-24Tokyo Electron LimitedApparatus and method for drying substrates
US5939139A (en)*1997-01-241999-08-17Tokyo Electron LimitedMethod of removing coated film from substrate edge surface and apparatus for removing coated film
US5996242A (en)*1997-04-041999-12-07Ryoden Semiconductor System Engineering CorporationDrying apparatus and method
US6579418B2 (en)*1998-08-122003-06-17Kimberly-Clark Worldwide, Inc.Leakage control system for treatment of moving webs
US6280573B1 (en)*1998-08-122001-08-28Kimberly-Clark Worldwide, Inc.Leakage control system for treatment of moving webs
US6282812B1 (en)*1999-12-202001-09-04St Assembly Test Services Pte Ltd.Multi air-knife box and method of use
US20030000228A1 (en)*2000-02-252003-01-02Hans LeuenbergerMethod for producing particulate goods
US6589359B2 (en)*2000-07-112003-07-08Tokyo Electron LimitedCleaning method and cleaning apparatus for substrate
US6530823B1 (en)*2000-08-102003-03-11Nanoclean Technologies IncMethods for cleaning surfaces substantially free of contaminants
US6543462B1 (en)*2000-08-102003-04-08Nano Clean Technologies, Inc.Apparatus for cleaning surfaces substantially free of contaminants
US20060179680A1 (en)*2000-09-242006-08-173M Innovative Properties CompanyVapor collection method and apparatus
US20020073576A1 (en)*2000-12-152002-06-20Yuji KamikawaLiquid processing apparatus and method
US6647642B2 (en)*2000-12-152003-11-18Tokyo Electron LimitedLiquid processing apparatus and method
US6729041B2 (en)*2000-12-282004-05-04Tokyo Electron LimitedSubstrate processing apparatus and substrate processing method
US20030154619A1 (en)*2001-03-262003-08-21Voith Paper Patent GmbhApparatus for coating moving fiber webs
US6899110B2 (en)*2001-06-252005-05-31Fuji Electric Co., Ltd.Cleaning method and apparatus
US20030222364A1 (en)*2002-03-202003-12-04Jackson Blair C.Method and apparatus for producing dry particles
US6818097B2 (en)*2002-04-222004-11-16Nisshinbo Industries, Inc.Highly heat-resistant plasma etching electrode and dry etching device including the same
US7225561B2 (en)*2002-10-252007-06-05South African Nuclear Energy Corporation LimitedOxyfluorination
US20050178020A1 (en)*2003-02-072005-08-18Ferro CorporationLyophilization method and apparatus for producing particles
US20070018361A1 (en)*2003-09-052007-01-25Xiaoming XuNanofibers, and apparatus and methods for fabricating nanofibers by reactive electrospinning
US20060021307A1 (en)*2004-07-292006-02-02Caterpillar, Inc.Particulate trap filter element
US20080314870A1 (en)*2005-02-072008-12-25Yuki InoueSubstrate Processing Method, Substrate Processing Apparatus, and Control Program
US20060204671A1 (en)*2005-03-102006-09-14Fuji Photo Film Co., Ltd.Method and apparatus for curing coated film and optical film
US20060213077A1 (en)*2005-03-282006-09-28Konica Minolta Opto, Inc.Manufacturing method of optical film, and optical film
US7363729B2 (en)*2005-03-282008-04-29Konica Minolta Opto, Inc.Manufacturing method of optical film, and optical film
US20090039565A1 (en)*2005-04-212009-02-12The University Of AkronProcess for producing fibers and their uses
US20090077825A1 (en)*2007-07-172009-03-26Semiconductor Analytical Services, Inc. (Sas Inc.)Apparatus and method for cleaning and drying solid objects

Cited By (8)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
CN102380492A (en)*2011-09-302012-03-21么丽敏Cleaning machine of plastic greenhouse
WO2013076395A1 (en)*2011-11-242013-05-30L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges ClaudeDevice for dispensing jets of cryogenic fluid, including a plenum chamber
FR2983106A1 (en)*2011-11-242013-05-31Air Liquide DEVICE FOR DISPENSING CRYOGENIC FLUID JETS WITH A TRANQUILIZING CHAMBER
CN103958127A (en)*2011-11-242014-07-30乔治洛德方法研究和开发液化空气有限公司Device including plenum chamber and being used for dispensing jets of cryogenic fluid
US10180294B2 (en)2011-11-242019-01-15L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges ClaudeDevice for dispensing jets of cryogenic fluid, including a plenum chamber
US20160279688A1 (en)*2013-03-182016-09-29Sandvik Materials Technology Deutschland GmbhMethod for producing a steel tube including cleaning of the outer tube wall
US9808844B2 (en)*2013-03-182017-11-07Sandvik Materials Technology Deutschland GmbhMethod for producing a steel tube including cleaning of the outer tube wall
EP3330660A1 (en)*2016-11-302018-06-06AIC GmbHMethod, use and device for cleaning cooling tower inserts

Also Published As

Publication numberPublication date
CN1572383A (en)2005-02-02
JP4118194B2 (en)2008-07-16
MY135287A (en)2008-03-31
SG140459A1 (en)2008-03-28
JP2004363145A (en)2004-12-24

Similar Documents

PublicationPublication DateTitle
US20050160552A1 (en)Cleaning apparatus
JP4210045B2 (en) Cleaning device
US7762869B2 (en)Nozzle for spraying sublimable solid particles entrained in gas for cleaning surface
US4970535A (en)Ink jet print head face cleaner
JP4904420B2 (en) Wiping apparatus for inkjet and wiping method using the same
CN104859305A (en)Liquid Ejection Head, Recording Apparatus And Heat Radiation Method For Liquid Ejection Head
US11932030B2 (en)Inkjet printer with temperature controlled substrate support
WO2017217252A1 (en)Foreign matter removal device
US6782902B2 (en)Sootblower lance tube for dual cleaning media
KR101967115B1 (en)Apparatus of cleaning using micro dry ice particle injection
KR20190126157A (en) Systems and methods for monitoring the processing of microelectronic substrates using fluid sprays, such as cryogenic fluid sprays
JPH02108549A (en)Method and device for washing ink-jet-head
JPH06140378A (en)Carbon dioxide precision cleaning system for cylindrical substrate
US6832827B2 (en)Cleaning nozzle
JP2006191022A (en)Substrate processing unit and substrate processing method
KR102263012B1 (en)Dry type cleaning apparatus and dry type cleaning system
JP2005111329A (en) Cleaning device
TW202242990A (en)Polishing apparatus and polishing method
KR101884852B1 (en)Chemical nozzle and apparatus for treating substrate
JP5399053B2 (en) Nozzle head cleaning device for inkjet coating apparatus, and nozzle wiping device for inkjet coating apparatus including the same
KR102675534B1 (en)Nozzle bar and dry cleaning unit having the same
EP2118567A1 (en)Glass furnace cleaning system
JPH10138139A (en)Liquid coolant discharge device for centerless grinding machine
JPH09170025A (en)Purge gas feeding device
JPH05192556A (en)Vacuum device and use thereof

Legal Events

DateCodeTitleDescription
ASAssignment

Owner name:FUJI ELECTRIC DEVICE TECHNOLOGY CO., LTD., JAPAN

Free format text:ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:YOSHIDA, TAKASHI;KIKUCHI, OSAYASU;IWASAKI, MOTOAKI;AND OTHERS;REEL/FRAME:015659/0094;SIGNING DATES FROM 20040628 TO 20040701

ASAssignment

Owner name:FUJI ELECTRIC HOLDINGS CO., LTD., JAPAN

Free format text:ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:FUJI ELECTRIC CO., LTD;REEL/FRAME:019889/0057

Effective date:20031001

Owner name:FUJI ELECTRIC DEVICE TECHNOLOGY CO., LTD., JAPAN

Free format text:ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:FUJI ELECTRIC HOLDINGS CO., LTD.;REEL/FRAME:019884/0677

Effective date:20070823

Owner name:FUJI ELECTRIC HOLDINGS CO., LTD., JAPAN

Free format text:CHANGE OF NAME;ASSIGNOR:FUJI ELECTRIC CO., LTD.;REEL/FRAME:019888/0433

Effective date:20031001

STCBInformation on status: application discontinuation

Free format text:ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION


[8]ページ先頭

©2009-2025 Movatter.jp