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US20050145496A1 - Thermal reaction device and method for using the same - Google Patents

Thermal reaction device and method for using the same
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Publication number
US20050145496A1
US20050145496A1US10/876,046US87604604AUS2005145496A1US 20050145496 A1US20050145496 A1US 20050145496A1US 87604604 AUS87604604 AUS 87604604AUS 2005145496 A1US2005145496 A1US 2005145496A1
Authority
US
United States
Prior art keywords
channel
reagent
sample
reaction
devices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US10/876,046
Inventor
Federico Goodsaid
Marc Unger
Jiang Huang
Emerson Quan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Standard Biotools Inc
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/818,642external-prioritypatent/US7666361B2/en
Priority claimed from US10/837,885external-prioritypatent/US7476363B2/en
Priority to US10/876,046priorityCriticalpatent/US20050145496A1/en
Application filed by IndividualfiledCriticalIndividual
Assigned to FLUIDIGM CORPORATIONreassignmentFLUIDIGM CORPORATIONASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: HUANG, JIANG, GOODSAID, FEDERICO, QUAN, EMERSON, UNGER, MARC
Priority to US11/084,357prioritypatent/US7604965B2/en
Priority to CN2005800225837Aprioritypatent/CN1997454B/en
Priority to PCT/US2005/015352prioritypatent/WO2005107938A2/en
Priority to JP2007511507Aprioritypatent/JP5502275B2/en
Priority to SG200902863-0Aprioritypatent/SG166024A1/en
Priority to CN2010101546166Aprioritypatent/CN101811074B/en
Priority to CN201210270352XAprioritypatent/CN102778432A/en
Priority to EP05766055.7Aprioritypatent/EP1796824A4/en
Priority to SG2013006333Aprioritypatent/SG2013006333A/en
Publication of US20050145496A1publicationCriticalpatent/US20050145496A1/en
Assigned to FLUIDIGM CORPORATION - A DELAWARE CORPORATIONreassignmentFLUIDIGM CORPORATION - A DELAWARE CORPORATIONREINCORPORATION ASSIGNMENTAssignors: FLUIDIGM CORPORATION - A CALIFORNIA CORPORATION
Priority to US11/929,370prioritypatent/US7867454B2/en
Priority to US11/929,436prioritypatent/US7749737B2/en
Priority to US12/579,347prioritypatent/US8247178B2/en
Priority to JP2012020787Aprioritypatent/JP2012085659A/en
Priority to US13/548,068prioritypatent/US9150913B2/en
Priority to US14/477,602prioritypatent/US20150174575A1/en
Priority to US14/873,958prioritypatent/US20160129441A1/en
Priority to US15/805,720prioritypatent/US10131934B2/en
Priority to US15/829,665prioritypatent/US20180243741A1/en
Priority to US16/150,096prioritypatent/US20190169676A1/en
Abandonedlegal-statusCriticalCurrent

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Abstract

An M×N matrix microfluidic device for performing a matrix of reactions, the device having a plurality of reaction cells in communication with one of either a sample inlet or a reagent inlet through a via formed within an elastomeric block of the device. Methods provided include a method for forming vias in parallel in an elastomeric layer of an elastomeric block of a microfluidic device, the method comprising using patterned photoresist masks and etching reagents to etch away regions or portions of an elastomeric layer of the elastomeric block.

Description

Claims (19)

13. A method for making a feature in an elastomeric block comprising the steps of:
providing a first elastomeric layer;
applying a photoresist layer upon a surface of said first elastomeric layer;
applying a light pattern to said photoresist layer to form a pattern of reacted photoresist material;
removing unreacted photoresist material leaving said pattern of reacted photoresist upon said surface of said first elastomeric layer;
applying an etching reagent to said first elastomeric surface to etch said surface of said first elastomeric layer not covered by said pattern of reacted photoresist material thereby removing regions of said first elastomeric layer not covered by said pattern of reacted photoresist and leaving a pattern of said elastomeric layer corresponding to said pattern of reacted photoresist material.
US10/876,0462003-04-032004-06-23Thermal reaction device and method for using the sameAbandonedUS20050145496A1 (en)

Priority Applications (20)

Application NumberPriority DateFiling DateTitle
US10/876,046US20050145496A1 (en)2003-04-032004-06-23Thermal reaction device and method for using the same
US11/084,357US7604965B2 (en)2003-04-032005-03-18Thermal reaction device and method for using the same
SG2013006333ASG2013006333A (en)2004-05-022005-05-02Thermal reaction device and method for using the same
CN2005800225837ACN1997454B (en)2004-05-022005-05-02Thermal reaction apparatus and method of using the same
EP05766055.7AEP1796824A4 (en)2004-05-022005-05-02 THERMAL REACTION DEVICE AND METHOD OF USING SAME
CN201210270352XACN102778432A (en)2004-05-022005-05-02Thermal reaction device and using method thereof
PCT/US2005/015352WO2005107938A2 (en)2004-05-022005-05-02Thermal reaction device and method for using the same
JP2007511507AJP5502275B2 (en)2004-05-022005-05-02 Thermal reaction device and method of using the thermal reaction device
SG200902863-0ASG166024A1 (en)2004-05-022005-05-02Thermal reaction device and method for using the same
CN2010101546166ACN101811074B (en)2004-05-022005-05-02Thermal reaction equipment and using method thereof
US11/929,436US7749737B2 (en)2003-04-032007-10-30Thermal reaction device and method for using the same
US11/929,370US7867454B2 (en)2003-04-032007-10-30Thermal reaction device and method for using the same
US12/579,347US8247178B2 (en)2003-04-032009-10-14Thermal reaction device and method for using the same
JP2012020787AJP2012085659A (en)2004-05-022012-02-02Thermal reaction device and method for using the same
US13/548,068US9150913B2 (en)2003-04-032012-07-12Thermal reaction device and method for using the same
US14/477,602US20150174575A1 (en)2003-04-032015-03-02Thermal Reaction Device and Method for Using the Same
US14/873,958US20160129441A1 (en)2003-04-032015-10-02Thermal reaction device and method for using the same
US15/805,720US10131934B2 (en)2003-04-032017-11-07Thermal reaction device and method for using the same
US15/829,665US20180243741A1 (en)2004-05-022017-12-01Thermal reaction device and method for using the same
US16/150,096US20190169676A1 (en)2003-04-032018-10-02Thermal reaction device and method for using the same

Applications Claiming Priority (4)

Application NumberPriority DateFiling DateTitle
US46063403P2003-04-032003-04-03
US10/818,642US7666361B2 (en)2003-04-032004-04-05Microfluidic devices and methods of using same
US10/837,885US7476363B2 (en)2003-04-032004-05-02Microfluidic devices and methods of using same
US10/876,046US20050145496A1 (en)2003-04-032004-06-23Thermal reaction device and method for using the same

Related Parent Applications (1)

Application NumberTitlePriority DateFiling Date
US10/837,885Continuation-In-PartUS7476363B2 (en)2003-04-032004-05-02Microfluidic devices and methods of using same

Related Child Applications (2)

Application NumberTitlePriority DateFiling Date
US11/084,357Continuation-In-PartUS7604965B2 (en)2003-04-032005-03-18Thermal reaction device and method for using the same
US11/929,370ContinuationUS7867454B2 (en)2003-04-032007-10-30Thermal reaction device and method for using the same

Publications (1)

Publication NumberPublication Date
US20050145496A1true US20050145496A1 (en)2005-07-07

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Application NumberTitlePriority DateFiling Date
US10/876,046AbandonedUS20050145496A1 (en)2003-04-032004-06-23Thermal reaction device and method for using the same
US11/929,370Expired - LifetimeUS7867454B2 (en)2003-04-032007-10-30Thermal reaction device and method for using the same

Family Applications After (1)

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US11/929,370Expired - LifetimeUS7867454B2 (en)2003-04-032007-10-30Thermal reaction device and method for using the same

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