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US20050067146A1 - Two phase cooling system method for burn-in testing - Google Patents

Two phase cooling system method for burn-in testing
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Publication number
US20050067146A1
US20050067146A1US10/929,871US92987104AUS2005067146A1US 20050067146 A1US20050067146 A1US 20050067146A1US 92987104 AUS92987104 AUS 92987104AUS 2005067146 A1US2005067146 A1US 2005067146A1
Authority
US
United States
Prior art keywords
cooling system
condenser
chamber
coolant
pool
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US10/929,871
Inventor
John Thayer
Donald Ernst
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aavid Thermal Corp
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Priority to US10/929,871priorityCriticalpatent/US20050067146A1/en
Assigned to THERMAL CORP.reassignmentTHERMAL CORP.ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: ERNST, DONALD M., THAYER, JOHN GILBERT
Publication of US20050067146A1publicationCriticalpatent/US20050067146A1/en
Abandonedlegal-statusCriticalCurrent

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Abstract

A cooling system for a semiconductor device burn-in test station includes one or more evaporators arranged in close thermal proximity to a semiconductor device. Each evaporator includes a chambered enclosure having a capillary wick disposed on the walls of the enclosure that define the chamber. A condenser is arranged in fluid communication with each chamber, and a pump is arranged in flow communication between each evaporator and the condenser so as to circulate a coolant liquid between a pool of the coolant liquid that is maintained within the chambered enclosure and the condenser.

Description

Claims (26)

US10/929,8712003-09-022004-08-30Two phase cooling system method for burn-in testingAbandonedUS20050067146A1 (en)

Priority Applications (1)

Application NumberPriority DateFiling DateTitle
US10/929,871US20050067146A1 (en)2003-09-022004-08-30Two phase cooling system method for burn-in testing

Applications Claiming Priority (3)

Application NumberPriority DateFiling DateTitle
US49948303P2003-09-022003-09-02
US50212503P2003-09-112003-09-11
US10/929,871US20050067146A1 (en)2003-09-022004-08-30Two phase cooling system method for burn-in testing

Publications (1)

Publication NumberPublication Date
US20050067146A1true US20050067146A1 (en)2005-03-31

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US10/929,871AbandonedUS20050067146A1 (en)2003-09-022004-08-30Two phase cooling system method for burn-in testing

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Cited By (12)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US20070159202A1 (en)*2006-01-102007-07-12Freescale Semiconductor, Inc.Methods of testing electronic devices
US20090230985A1 (en)*2005-09-152009-09-17Advantest CorporationBurn-in system with measurement block accomodated in cooling block
CN101852749B (en)*2009-04-032012-02-08李蔚All-in-on device for evaporation/condensation heat transmission testing in micro pipe and testing method thereof
WO2013021259A1 (en)*2011-08-082013-02-14Toyota Jidosha Kabushiki KaishaCooling system
JP2013057439A (en)*2011-09-082013-03-28Fujitsu LtdLoop-type heat pipe and electronic apparatus
CN104483148A (en)*2014-12-022015-04-01北京空间飞行器总体设计部Gravity-driven two-phase liquid loop service life testing method
US20150114605A1 (en)*2011-09-142015-04-30Euro Heat PipesHeat transfer device using capillary pumping
US9366721B2 (en)2014-09-252016-06-14Pentamaster Instrumentation Sdn BhdApparatus for burn-in test
US9709324B1 (en)*2012-11-092017-07-18Rockwell Collins, Inc.Liquid cooling with parasitic phase-change pumps
US9958214B2 (en)2011-09-142018-05-01Euro Heat PipesCapillary-pumping heat-transport device
US10356950B2 (en)*2017-12-182019-07-16Ge Aviation Systems, LlcAvionics heat exchanger
US11742538B2 (en)*2020-06-092023-08-29Inventec (Pudong) Technology Corp.Liquid tank system and Li-ion battery cooling system therewith

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US6037793A (en)*1997-01-302000-03-14Tokyo Electron LimitedInspecting method and apparatus for semiconductor integrated circuit
US6073681A (en)*1997-12-312000-06-13Temptronic CorporationWorkpiece chuck
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US6313649B2 (en)*1992-06-112001-11-06Cascade Microtech, Inc.Wafer probe station having environment control enclosure
US6394797B1 (en)*1997-04-022002-05-28Hitachi, Ltd.Substrate temperature control system and method for controlling temperature of substrate
US6471913B1 (en)*2000-02-092002-10-29Semitool, Inc.Method and apparatus for processing a microelectronic workpiece including an apparatus and method for executing a processing step at an elevated temperature
US6549408B2 (en)*2000-11-202003-04-15Global Cooling BvCPU cooling device using thermo-siphon
US6550530B1 (en)*2002-04-192003-04-22Thermal Corp.Two phase vacuum pumped loop
US6583638B2 (en)*1999-01-262003-06-24Trio-Tech InternationalTemperature-controlled semiconductor wafer chuck system
US20030205363A1 (en)*2001-11-092003-11-06International Business Machines CorporationEnhanced air cooling of electronic devices using fluid phase change heat transfer
US20030205364A1 (en)*2001-06-292003-11-06Ioan SauciucMethod and apparatus for dissipating heat from an electronic device
US6688377B2 (en)*2002-03-082004-02-10Ching-Feng WangLoop heat pipe modularized heat exchanger
US20040050533A1 (en)*2001-09-202004-03-18Intel CorporationModular capillary pumped loop cooling system
US6771086B2 (en)*2002-02-192004-08-03Lucas/Signatone CorporationSemiconductor wafer electrical testing with a mobile chiller plate for rapid and precise test temperature control
US6810946B2 (en)*2001-12-212004-11-02Tth Research, Inc.Loop heat pipe method and apparatus

Patent Citations (48)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US3543839A (en)*1969-05-141970-12-01Trw IncMulti-chamber controllable heat pipe
US4037830A (en)*1976-09-071977-07-26International Business Machines CorporationWafer handler
USRE31053E (en)*1978-01-231982-10-12Bell Telephone Laboratories, IncorporatedApparatus and method for holding and planarizing thin workpieces
US4213698A (en)*1978-12-011980-07-22Bell Telephone Laboratories, IncorporatedApparatus and method for holding and planarizing thin workpieces
US4444249A (en)*1981-08-201984-04-24Mcdonnell Douglas CorporationThree-way heat pipe
US4470450A (en)*1981-10-221984-09-11Lockheed Missiles & Space Co.Pump-assisted heat pipe
US4551192A (en)*1983-06-301985-11-05International Business Machines CorporationElectrostatic or vacuum pinchuck formed with microcircuit lithography
US4609037A (en)*1985-10-091986-09-02Tencor InstrumentsApparatus for heating and cooling articles
US4784213A (en)*1986-04-081988-11-15Temptronic CorporationMixing valve air source
US5084671A (en)*1987-09-021992-01-28Tokyo Electron LimitedElectric probing-test machine having a cooling system
US5001423A (en)*1990-01-241991-03-19International Business Machines CorporationDry interface thermal chuck temperature control system for semiconductor wafer testing
US5383971A (en)*1990-10-121995-01-24Genus, Inc.Differential pressure CVD chuck
US6313649B2 (en)*1992-06-112001-11-06Cascade Microtech, Inc.Wafer probe station having environment control enclosure
US5478609A (en)*1992-07-231995-12-26Canon Kabushiki KaishaSubstrate heating mechanism
US5435379A (en)*1992-08-141995-07-25Texas Instruments IncorporatedMethod and apparatus for low-temperature semiconductor processing
US5534073A (en)*1992-09-071996-07-09Mitsubishi Denki Kabushiki KaishaSemiconductor producing apparatus comprising wafer vacuum chucking device
US5458687A (en)*1992-11-201995-10-17Hitachi, Ltd.Method of and apparatus for securing and cooling/heating a wafer
US5460684A (en)*1992-12-041995-10-24Tokyo Electron LimitedStage having electrostatic chuck and plasma processing apparatus using same
US5382311A (en)*1992-12-171995-01-17Tokyo Electron LimitedStage having electrostatic chuck and plasma processing apparatus using same
US5738165A (en)*1993-05-071998-04-14Nikon CorporationSubstrate holding apparatus
US5830808A (en)*1993-10-291998-11-03Applied Materials, Inc.Plasma reactor with magnet for protecting an electroacoustic chuck from the plasma
US5588827A (en)*1993-12-171996-12-31Brooks Automation Inc.Passive gas substrate thermal conditioning apparatus and method
US5474877A (en)*1994-02-241995-12-12Nec CorporationMethod for developing a resist pattern
US5816313A (en)*1994-02-251998-10-06Lockheed Martin CorporationPump, and earth-testable spacecraft capillary heat transport loop using augmentation pump and check valves
US5721090A (en)*1994-09-221998-02-24Tokyo Electron LimitedMethod of etching a substrate
US5762714A (en)*1994-10-181998-06-09Applied Materials, Inc.Plasma guard for chamber equipped with electrostatic chuck
US5610529A (en)*1995-04-281997-03-11Cascade Microtech, Inc.Probe station having conductive coating added to thermal chuck insulator
US5958140A (en)*1995-07-271999-09-28Tokyo Electron LimitedOne-by-one type heat-processing apparatus
US5730803A (en)*1996-02-231998-03-24Applied Materials, Inc.Apparatus and method for transferring heat from a hot electrostatic chuck to an underlying cold body
US6245202B1 (en)*1996-04-122001-06-12Hitachi, Ltd.Plasma treatment device
US5904776A (en)*1996-04-261999-05-18Applied Materials, Inc.Conduits for flow of heat transfer fluid to the surface of an electrostatic chuck
US5820723A (en)*1996-06-051998-10-13Lam Research CorporationUniversal vacuum chamber including equipment modules such as a plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support
US5885353A (en)*1996-06-211999-03-23Micron Technology, Inc.Thermal conditioning apparatus
US6032724A (en)*1996-10-292000-03-07Tokyo Electron LimitedTemperature control apparatus for sample susceptor
US5904779A (en)*1996-12-191999-05-18Lam Research CorporationWafer electrical discharge control by wafer lifter system
US6037793A (en)*1997-01-302000-03-14Tokyo Electron LimitedInspecting method and apparatus for semiconductor integrated circuit
US6394797B1 (en)*1997-04-022002-05-28Hitachi, Ltd.Substrate temperature control system and method for controlling temperature of substrate
US6073681A (en)*1997-12-312000-06-13Temptronic CorporationWorkpiece chuck
US6583638B2 (en)*1999-01-262003-06-24Trio-Tech InternationalTemperature-controlled semiconductor wafer chuck system
US6471913B1 (en)*2000-02-092002-10-29Semitool, Inc.Method and apparatus for processing a microelectronic workpiece including an apparatus and method for executing a processing step at an elevated temperature
US6549408B2 (en)*2000-11-202003-04-15Global Cooling BvCPU cooling device using thermo-siphon
US20030205364A1 (en)*2001-06-292003-11-06Ioan SauciucMethod and apparatus for dissipating heat from an electronic device
US20040050533A1 (en)*2001-09-202004-03-18Intel CorporationModular capillary pumped loop cooling system
US20030205363A1 (en)*2001-11-092003-11-06International Business Machines CorporationEnhanced air cooling of electronic devices using fluid phase change heat transfer
US6810946B2 (en)*2001-12-212004-11-02Tth Research, Inc.Loop heat pipe method and apparatus
US6771086B2 (en)*2002-02-192004-08-03Lucas/Signatone CorporationSemiconductor wafer electrical testing with a mobile chiller plate for rapid and precise test temperature control
US6688377B2 (en)*2002-03-082004-02-10Ching-Feng WangLoop heat pipe modularized heat exchanger
US6550530B1 (en)*2002-04-192003-04-22Thermal Corp.Two phase vacuum pumped loop

Cited By (16)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US20090230985A1 (en)*2005-09-152009-09-17Advantest CorporationBurn-in system with measurement block accomodated in cooling block
US20070159202A1 (en)*2006-01-102007-07-12Freescale Semiconductor, Inc.Methods of testing electronic devices
US7432729B2 (en)*2006-01-102008-10-07Freescale Semiconductor, Inc.Methods of testing electronic devices
CN101852749B (en)*2009-04-032012-02-08李蔚All-in-on device for evaporation/condensation heat transmission testing in micro pipe and testing method thereof
WO2013021259A1 (en)*2011-08-082013-02-14Toyota Jidosha Kabushiki KaishaCooling system
CN103717429A (en)*2011-08-082014-04-09丰田自动车株式会社Cooling system
JP2013057439A (en)*2011-09-082013-03-28Fujitsu LtdLoop-type heat pipe and electronic apparatus
US20150114605A1 (en)*2011-09-142015-04-30Euro Heat PipesHeat transfer device using capillary pumping
US9766016B2 (en)*2011-09-142017-09-19Euro Heat PipesHeat transfer device using capillary pumping
US9958214B2 (en)2011-09-142018-05-01Euro Heat PipesCapillary-pumping heat-transport device
US9709324B1 (en)*2012-11-092017-07-18Rockwell Collins, Inc.Liquid cooling with parasitic phase-change pumps
US9366721B2 (en)2014-09-252016-06-14Pentamaster Instrumentation Sdn BhdApparatus for burn-in test
CN104483148A (en)*2014-12-022015-04-01北京空间飞行器总体设计部Gravity-driven two-phase liquid loop service life testing method
US10356950B2 (en)*2017-12-182019-07-16Ge Aviation Systems, LlcAvionics heat exchanger
US10980153B2 (en)2017-12-182021-04-13Ge Aviation Systems LlcDirect contact heat exchanger
US11742538B2 (en)*2020-06-092023-08-29Inventec (Pudong) Technology Corp.Liquid tank system and Li-ion battery cooling system therewith

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Legal Events

DateCodeTitleDescription
ASAssignment

Owner name:THERMAL CORP., DELAWARE

Free format text:ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:THAYER, JOHN GILBERT;ERNST, DONALD M.;REEL/FRAME:015437/0918;SIGNING DATES FROM 20040827 TO 20040921

STCBInformation on status: application discontinuation

Free format text:ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION


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