BACKGROUND OF THE INVENTION1. Field of the Invention[0001]
This invention relates to a non-rotating pad type floor working machine including a body frame, an electric drive unit, a pad unit having a first pad and a second pad opposed to each other and defining polishing surfaces for contacting a floor surface, and a pad control mechanism for reciprocating the pads by using drive of the electric drive unit.[0002]
2. Description of the Related Art[0003]
The floor working machine of the type noted above has an advantage over a floor working machine for polishing a floor surface with pads rotated by using torque of an electric motor, in that a cleaning solution does not easily scatter to the ambient. For, with the rotating pad type floor working machine, each pad is rotatable at a higher speed at the periphery than near the axis of rotation, and the peripheral speed becomes too fast when the speed near the axis of rotation is adjusted to an optimal value for cleaning or polishing the floor. This problem becomes the more serious, the larger diameter the pads have for an enlarged range of treatment.[0004]
One example of non-rotating pad type floor working machine having an advantage over the rotating pad type floor working machine as noted above is known from Japanese patent publication (unexamined) H7-39506, for example. This floor working machine has two pads supported by a body frame through elastically movable fulcrums. These two pads are swung elliptically by eccentric cams rotatable by an electric motor. To increase the range of movement of the pads, it is necessary to increase the elastic deformation of the movable fulcrums. However, an increased elastic deformation of the movable fulcrums makes it difficult for the polishing surfaces of the two pads to move synchronously with appropriateness on a fixed horizontal plane. Moreover, reaction forces that the pads receive from the floor surface deform the elastically movable fulcrums in the direction of extension also, whereby the pads are struck against the floor surface. It is thus impossible to perform a smooth polishing operation.[0005]
SUMMARY OF THE INVENTIONThe object of this invention is to provide a floor working machine having a pad control mechanism for synchronously reciprocating at least two pads so that polishing surfaces thereof follow accurately along a horizontal floor surface.[0006]
The above object is fulfilled, according to this invention, by a floor working machine including a body frame, an electric drive unit, a pad unit including a first pad and a second pad having polishing surfaces for contacting a floor surface, the first pad and second pad being opposed to each other, and a pad control mechanism for controlling the pad unit by using drive of the electric drive unit, in which the pad control mechanism controls the first pad and second pad such that the first pad and second pad reciprocate, with the respective polishing surfaces contacting the floor surface, in a first direction in which the first pad and second pad approach each other and in a second direction in which the first pad and second pad move away from each other, and a guiding device is provided for guiding the first pad and second pad in reciprocating movement such that the first direction and second direction are linear and parallel to the floor surface.[0007]
With this construction, even at increased treatment speed, the first pad and second pad are synchronously driven to repeat the reciprocation toward and away from each other, and the reciprocating directions of the first pad and second pad are linear and parallel to the floor surface. Thus, the polishing surfaces of the first pad and second pad are movable accurately along the horizontal floor surface. The moving tracks of the pads are not elliptical as in the prior art, but linear to smooth the polishing operation.[0008]
Preferably, the guiding device comprises a linear guide unit including linear rails, and sliders for sliding along the linear rails. Such linear guide units are readily available in the market, and desired specifications may be selected from a wide variety of products. It will be convenient if the linear rails are supported the body frame as guide rails common to the first pad and second pad, at least one of the sliders being supported by the first pad, and at least another of the sliders being supported by the second pad.[0009]
The least expensive electric drive unit is an electric motor. Where an electric motor is employed as the electric drive unit, the pad control mechanism may be constructed as a rotational displacement to linear displacement converting eccentric mechanism for converting a rotational displacement from the electric drive unit into a linear reciprocation of the first pad and second pad toward and away from each other. A specific construction of the rotational displacement to linear displacement converting eccentric mechanism may be selected according to specifications required of the floor working machine.[0010]
In one preferred embodiment, the rotational displacement to linear displacement converting eccentric mechanism includes a drive gear connected to an output shaft of the electric drive unit to be rotatable together, a plurality of driven gears meshed with the drive gear, eccentric cams provided for the driven gears, respectively, and linear cam followers provided for the pads for engaging the eccentric cams, respectively. This construction has an advantage that the pads make a steady linear reciprocation.[0011]
In another preferred embodiment, the rotational displacement to linear displacement converting eccentric mechanism includes a drive gear connected to an output shaft of the electric drive unit to be rotatable together, a plurality of driven gears meshed with the drive gear, and slider/crank mechanism links extending between the driven gears and the pads, respectively. This construction has an advantage of being simple and requiring a reduced number of components.[0012]
In one preferred embodiment of this invention, the floor working machine includes a cleaning solution supplying device for supplying a cleaning solution to the floor surface at least between the first pad and second pad. With this construction, since the cleaning solution is supplied to the floor surface between the pads, the part of the cleaning solution remaining on the floor surface after the solution spreading action of the pads tends to collect between the pads. Such part of the cleaning solution is held between the pads and does not readily flow out from between the pads. Thus, the part of the cleaning solution remaining on the floor surface after the solution spreading action of the pads does not readily scatter.[0013]
Where the first pad and second pad are arranged in the traveling (fore and aft) direction of the working machine, and are reciprocable in the traveling (fore and aft) direction, the machine may engaging in an operation along a wall, with lateral ends of the pads moving close along the wall. With the rear pad following the front pad, no part of the floor remains untreated even though the pads are spaced from each other.[0014]
The floor working machine according to this invention may be the type moved by an operator, or may be the self-propelled type.[0015]
Other features and advantages of this invention will be apparent from the following description of the embodiments to be taken with reference to the drawings.[0016]
BRIEF DESCRIPTION OF THE DRAWINGSFIG. 1 is a side view in vertical section of a floor working machine in a first embodiment of this invention;[0017]
FIG. 2 is a perspective view of a polisher device;[0018]
FIG. 3 is a plan view of the polisher device;[0019]
FIG. 4 is a side view in vertical section of the polisher device;[0020]
FIG. 5 is a front view of a pad control mechanism;[0021]
FIG. 6 is a plan view of the pad control mechanism;[0022]
FIG. 7 is a perspective view of a floor working machine in a second embodiment of this invention;[0023]
FIG. 8 is an explanatory view showing a mode of transporting the floor working machine shown in FIG. 7;[0024]
FIG. 9 is a side view in vertical section of a polisher device of the floor working machine shown in FIG. 7; and[0025]
FIG. 10 is a plan view of a pad control mechanism of the floor working machine shown in FIG. 7.[0026]
DESCRIPTION OF THE PREFERRED EMBODIMENTS[First Embodiment][0027]
As shown in FIG. 1, a floor working machine in this embodiment includes a[0028]body frame1, onefront wheel2 disposed in a longitudinally and transversely middle position of thebody frame1, freely rotatablerear wheels3 of the caster type disposed at opposite sides adjacent the rear end ofbody frame1, asteering post4 disposed at the rear end ofbody frame1,steering handles5 fixed to opposite upper sides of thesteering post4, a power supply unit with a plurality ofbatteries6 arranged fore and aft in a rear region of thebody frame1, and a cleaningsolution collecting device30. Further, a cleaningsolution supplying device10 and apolisher device20 are disposed below the front end of thebody frame1. Asqueegee31 is attached to the rear end of thebody frame1 and connected to the cleaningsolution collecting device30. The cleaningsolution supplying device10 has a pair ofcleaning nozzles11 arranged in the fore and aft direction.
The[0029]polisher device20 includes a pad unit with afirst pad21 and asecond pad21 arranged in the traveling direction (fore and aft direction) of the machine. This embodiment provides two pads which are named the first pad and the second pad. However, they may be called just the pads when no distinguishment is needed therebetween. Eachpad21 is shaped rectangular parallelopiped with a bottom surface acting as apolishing surface21afor contacting a floor surface.
The[0030]front wheel2 has awheel drive sprocket2aconnected to the rim thereof to be rotatable together. Thesprocket2ais interlocked through atransmission chain7 to anoutput sprocket8aattached to an output shaft of anelectric propelling motor8. With thefront wheel2 driven by theelectric propelling motor8, the floor working machine moves in a self-propelled mode as supported by thefront wheel2 and the pair ofrear wheels3. At the same time, thepolisher device20 is operated to dean and polish the floor surface continuously. That is, as the machine moves, the cleaningsolution supplying device10 supplies a cleaning solution stored in acleaning solution tank12 mounted in a front region of the machine body, through the pair of cleaningnozzles11 to the floor surface. Thepolisher device20 with the pad unit deans and polishes the floor surface supplied with the cleaning solution. The cleaningsolution collecting device30 collects the cleaning solution contaminated as a result of cleaning treatment, into acollection tank32 mounted in a rear region of the machine body.
As shown in FIGS. 1 and 2, for example, the cleaning[0031]solution supplying device10 includes afront cleaning nozzle11 formed of one long metal pipe extending transversely of the machine body, arear cleaning nozzle11 formed of one long metal pipe extending transversely of the machine body, and thecleaning solution tank12 having anoutlet port12acommunicating with opposite ends of each cleaningnozzle11 through cleaningsolution supplying hoses13. Thefront cleaning nozzle11 is fixed through a pair of right and leftsupport brackets22bto an outer surface of afront wall22aof a box-like sub-frame22 vertically adjustably attached to a front portion of thebody frame1 through alift mechanism40. Therear cleaning nozzle11 is fixed to right and leftside walls22cof thesub-frame22 and disposed above and between thefirst pad21 andsecond pad21.
The cleaning[0032]solution supplying hoses13 include a plurality of nozzle-side hoses13aeach communicating at one end thereof with one end of onecleaning nozzle11, and a tank-side hose13bhaving one end thereof communicating with the other ends of the plurality of nozzle-side hoses13athrough a distributingpipe14, and the other end communicating with theoutlet port12aofcleaning solution tank12. The tank-side hose13bhas anelectromagnetic switch valve15 mounted thereon.
As shown in FIGS. 3 and 4, for example, the[0033]lift mechanism40 includes a connectingmember41 fixed to thesub-frame22, two pairs of upper andlower swing links42 extending between the connectingmember41 and opposite sides of asupport member1aforming part of thebody frame1, acontrol member44 rigidly connected to one end of arotary shaft43 swingably connecting the upper swing links42 to thesupport member1a, afemale screw member45 rotatably attached to thecontrol member44, and anelectric lift motor46 having anoutput screw shaft46ameshed with thefemale screw member45.
When the[0034]lift motor46 is rotated forward or backward, thecontrol member44 is swung in an ascending or descending direction by the drive oflift motor46. As a result, the swing links42 are swung to raise or lower thesub-frame22. Thus, thelift motor46 drives thesub-frame22 upward or downward for selectively establishing a lower operative state and an upper inoperative state. In the lower operative state, thepolisher device20 is in a lower position with the pad unit contacting the floor surface with a contact pressure necessary for polishing treatment. In the upper inoperative state, thepolisher device20 is in an upper position with the pad unit afloat above the floor surface, for the machine to move while thepads21 remain clear of the floor surface. Further, when thepolisher device20 is lowered to the lower operative position, the pair of front andrear cleaning nozzles11 are lowered to a level close to the floor surface. When thepolisher device20 is raised to the upper inoperative position, the pair of front andrear cleaning nozzles11 are raised high above the floor surface.
The[0035]cleaning solution tank12 has an inlet port formed in an upper rearward position thereof and opened and closed by aremovable lid12b. The cleaning solution is supplied through the inlet port into and stored in thecleaning solution tank12. With thepolisher device20 switched to the lower operative position, the cleaningsolution supplying device10 opens theelectromagnetic switch valve15 to supply the cleaning solution to the floor surface.
That is, when the[0036]polisher device20 is switched to the lower operative position, the pair of cleaningnozzles11 assume an operative state close above the floor surface. The cleaning solution flows down by gravity from thecleaning solution tank12 into the tank-side hose13bof the cleaningsolution supplying hoses13. The distributingpipe14 distributes the cleaning solution to each nozzle-side hose13awhereby the cleaning solution flows in from the opposite ends of each cleaningnozzle11. Then, thefront cleaning nozzle11 allows the cleaning solution to drip from a plurality of supply bores11aformed longitudinally of thenozzle11, to the floor surface forwardly of the pad unit. Therear cleaning nozzle11 allows the cleaning solution to drip from a plurality of supply bores11aformed longitudinally of thenozzle11, to the floor surface between thefirst pad21 andsecond pad21.
As shown in FIGS. 4 and 5, for example, the[0037]polisher device20 includes a pair of right andleft guide rails23 formed of round rods arranged at opposite sides in thesub-frame22 and extending straight longitudinally of the machine body, pad supports24 rectangular in plan view, extending transversely of the machine body and arranged fore and aft in a lower region of thesub-frame22 for supporting thefirst pad21 andsecond pad21, respectively, and apad control mechanism50 having adrive gear51 mounted in thesub-frame22.
As shown in FIG. 6, for example, each of the right and[0038]left guide rails23 extends between and fixed to thefront wall22aandrear wall22eof thesub-frame22. Eachpad support24 has rail receiving blocks25 fixed to upper surfaces adjacent opposite ends thereof and acting as sliding elements for sliding along the guide rails23. The rail receiving blocks25 adjacent one end of eachpad support24 receive one of the guide rails23, while the rail receiving blocks25 adjacent the other end receive theother guide rail23. Thestraight guide rails23 and rail receiving blocks25 act as a device for guiding the pad supports24 or thepads21. Thus, thepads21 are guided to reciprocate straight along the traveling direction of the machine. As a result, eachpad21 reciprocates linearly while maintaining a track of its polishingsurface21ain one plane. The polishingsurface21athereby contacts the floor surface reliably and smoothly.
The[0039]first pad21 is removably connected to the lower surface of thefront pad support24 by a mountingpawl26adisposed at one end of a mountingplate26 attached to the upper surface of thefirst pad21, the mountingpawl26aengaging a mounting bore formed in thepad support24, and a mountingbracket27 at the other end of the mountingplate26 fastened to thepad support24 by ahook28 of thepad support24. Similarly, thesecond pad21 is removably connected to therear pad support24. The pad supports24 carrying thepads21 are supported by thesub-frame22 to be slidable along the traveling direction of the machine by thepad control mechanism50 and the guiding device.
As shown in FIGS. 4, 5 and[0040]6, for example, thepad control mechanism50 includes apolisher motor29 fixed to an upper surface of atop board22dof thesub-frame22 to act as an electric drive unit of thepolisher device20, thedrive gear51 connected, to be rotatable together, to anoutput shaft29aprojecting downward from themotor29, and four drivengears53 acting as rotatable control elements arranged equidistantly around thedrive gear51 and meshed with thedrive gear51. Each drivengear53 is supported by asupport shaft52 attached to thetop board22dto be rotatable about theaxis52a, with agear portion53athereof having a smaller number of teeth than thedrive gear51.
Each driven[0041]gear53 has aneccentric cam55 formed of a bearing disposed below amain body54 thereof and having an axis of rotation offset from the axis ofrotation52aof drivengear53. Thiseccentric cam55 is slidably and rotatably fitted in acontrol groove57 formed in a profile member acting as alinear cam follower56 formed on the upper surface of thepad support24. That is, thedrive gear51, driven gears53,eccentric cams55 andlinear cam followers56 constitute a rotational displacement to linear displacement converting eccentric mechanism.
Thus, by appropriately adjusting a position of each[0042]eccentric cam55, thefirst pad21 andsecond pad21 are driven to reciprocate in a first direction A in which thefirst pad21 andsecond pad21 approach each other and in a second direction B in which thefirst pad21 andsecond pad21 move away from each other. Moreover, by the, aid of the guiding device described above, the first direction A and second directions B for reciprocating thefirst pad21 andsecond pad21 may be made linear and parallel the floor surface.
More particularly, when the[0043]polisher motor29 is operated, thedrive gear51 is driven by thepolisher motor29 to rotate all the driven gears53. Then, theeccentric cams55 of the pair of right and left drivengears53 disposed forwardly of thedrive gear51 with respect to the traveling direction of the machine reciprocate thefirst pad21 in the traveling direction of the machine along the right and left guide rails23. Similarly, theeccentric cams55 of the pair of right and left drivengears53 disposed rearwardly of thedrive gear51 with respect to the traveling direction of the machine reciprocate thesecond pad21 in the traveling direction of the machine along the right and left guide rails23.
By appropriately selecting a relative position (phase relationship) between the[0044]eccentric cams55 of drivengears53 that drive thefirst pad21 and theeccentric cams55 of drivengears53 that drive thesecond pad21, thefirst pad21 andsecond pad21 repeat a linear reciprocation toward and away from each other.
As described hereinbefore, the[0045]polisher device20 is placed in the lower operative state by lowering action of thelift mechanism40 driven by thelift motor46. In this state, thepolisher motor26 may be driven to dean and polish the floor surface.
That is, the[0046]polisher motor29 drives thedrive gear51, whereby thepads21 repeat the linear reciprocation toward and away from each other as noted above, to polish the floor surface while spreading the cleaning solution dripping from the cleaningnozzles11 over the floor surface. At this time, thefront cleaning nozzle11 supplies the cleaning solution forwardly of thefirst pad21, and therear cleaning nozzle11 supplies the cleaning solution between thefirst pad21 andsecond pad21. Even if each cleaningnozzle11 supplies a relatively small quantity of the cleaning solution, a proper quantity of the cleaning solution reliably adheres to bothpads21 to be spread over the floor surface. As a result, a minimum quantity of the cleaning solution will remain on the floor surface as excess. With thefirst pad21 andsecond pad21 repeating the linear reciprocation toward and away from each other, any excess quantity of the cleaning solution spread and remaining on the floor surface is collected and held between thepads21. As a result, such part of the cleaning solution does not readily flow out or scatter to the ambient.
As shown in FIG. 1, the cleaning[0047]solution collecting device30 includes thesqueegee31 disposed below thesteering post4, thecollection tank32 having its interior communicating through asuction hose33 with asuction port31adisposed in a middle position of thesqueegee31 transversely of the machine body, and anelectric vacuum pump35 communicating through anexhaust hose34 with the interior of thecollection tank32.
The[0048]squeegee31 is connected to thebody frame1 to be vertically movable between a lower operative position having a lower end thereof in contact with the floor surface, and an upper inoperative position above the floor surface. With thesqueegee31 placed in the lower operative position and thevacuum pump35 driven, the cleaningsolution collecting device30 collects into thecollection tank32 the cleaning solution contaminated as a result of the cleaning and polishing action of thepolisher device20.
Specifically, the[0049]vacuum pump35 takes air out of thecollection tank32 through theexhaust hose34, and discharges the air from anexhaust port35a, to generate a suction force in thecollection tank32. Thesqueegee31, by flexion, rakes to its middle portion the contaminated cleaning solution remaining on the floor surface after thepolisher device20. Thesuction hose33, by virtue of the suction force in thecollection tank32, sucks the cleaning solution collected to the middle portion of thesqueegee31, from thesuction port31ainto thecollection tank32.
[Second Embodiment][0050]
FIG. 7 shows a floor working machine in the second embodiment. This working machine includes a[0051]body frame60, a pair of right and lefttransport wheels61 attached to the rear end of thebody frame60, acontrol handle62 withlegs62aconnected to opposite sides of a middle portion in the fore and aft direction of thebody frame60, a cleaningsolution supplying device70 having a pair of front andrear cleaning nozzles71 arranged in the fore and aft direction under thebody frame60, and apolisher device20 having afirst pad21 and asecond pad21 arranged in the fore and aft direction.
This working machine may be moved to a site of operation by the operator holding the control handle[0052]62 bygrips62band using thetransport wheels61 as shown in FIG. 8. At the site of operation, the machine is allowed to rest on the floor surface through the pair ofpads21, with the entire weight thereof falling on thepads21. A cleaning solution stored in acleaning solution tank72 installed in a halfway position on the control handle62 is supplied to the floor surface through the pair of cleaningnozzles71. A pad unit having thefirst pad21 andsecond pad21 cleans and polishes the floor surface supplied with the cleaning solution.
The cleaning[0053]solution supplying device70 includes thefront cleaning nozzle71 formed of one long metal pipe fixed to an outer surface of a front wall of thebody frame60 and extending transversely of the machine body, the rear cleaning nozzle171 formed of one long metal pipe disposed between thefirst pad21 andsecond pad21, extending transversely of the machine body and fixed to right and left side walls of themachine frame60, and thecleaning solution tank72 having anoutlet port72acommunicating with opposite ends of each cleaningnozzle71 through cleaningsolution supplying hoses73.
The cleaning[0054]solution supplying hoses73 include a plurality of nozzle-side hoses73aeach communicating at one end thereof with one end of onecleaning nozzle71, and a tank-side hose73bhaving one end thereof communicating with the other ends of the plurality of nozzle-side hoses73athrough a distributingpipe74, and the other end communicating with theoutlet port72aofcleaning solution tank72.
A[0055]switch valve75 is mounted in theoutlet port72aofcleaning solution tank72. Control levers76 are disposed on the control handle62 below thegrips62bfor operating theswitch valve75 through a control cable.
Thus, the cleaning solution is supplied through an[0056]inlet port72bdisposed in an upper position of thecleaning solution tank72 and stored in thecleaning solution tank72. The cleaning solution is supplied to the floor surface by operating theswitch lever76 to open theswitch valve75.
That is, the cleaning solution flows down by gravity from the[0057]cleaning solution tank72 into the tank-side hose73bof the cleaningsolution supplying hoses73. The distributingpipe74 distributes the cleaning solution to each nozzle-side hose73awhereby the cleaning solution flows in from the opposite ends of each cleaningnozzle71. Then, thefront cleaning nozzle71 allows the cleaning solution to drip from a plurality of supply bores formed longitudinally thereof, to the floor surface forwardly of the pad unit. Therear cleaning nozzle71 allows the cleaning solution to drip from a plurality of supply bores formed longitudinally thereof, to the floor surface between thefirst pad21 andsecond pad21.
As shown in FIGS. 9 and 10, the[0058]polisher device20, as in the preceding embodiment, includes a pair of right andleft guide rails23 formed of round rods arranged at opposite sides in themachine frame60 and extending straight longitudinally of the machine body, a pair of front and rear pad supports24 rectangular in plan view, extending transversely of the machine body and arranged fore and aft in a lower region of themachine frame60, thefirst pad21 andsecond pad21 supported by the pad supports24, respectively, and apad control mechanism80 having adrive gear81 mounted centrally of themachine frame60.
Each of the right and[0059]left guide rails23 extends between and fixed to the front wall and rear wall of themachine frame60. Each of the front and rear pad supports24 has rail receiving blocks25 fixed to upper surfaces adjacent opposite ends thereof and acting as sliding elements for sliding along the guide rails23. In this embodiment also, the guide rails23 and rail receiving blocks25 act as a device for guiding thefirst pad21 andsecond pad21.
The[0060]first pad21 disposed forwardly with respect to the traveling direction of the machine is detachably attached to the lower surface of thefront pad support24 by the same mounting structure as in the preceding embodiment. As a result, thefirst pad21 is supported by thebody frame60 to be slidable longitudinally of the machine body through thepad support24 and the pair of right and left guide rails23. Similarly, thesecond pad21 disposed rearwardly with respect to the traveling direction of the machine is detachably attached to the lower surface of therear pad support24, and supported by thebody frame60 to be slidable longitudinally of the machine body through thepad support24 and the pair of right and left guide rails23.
The[0061]pad control mechanism80 includes apolisher motor29 fixed to an upper surface of atop board60aof themachine frame60 through amotor deck64, thedrive gear81 connected, to be rotatable together, to anoutput shaft29aprojecting downward from themotor29, and two drivengears82 acting as rotatable control elements distributed forwardly and rearwardly and to the right and left of thedrive gear51 and supported bysupport shafts82afixed to thetop board60aof themachine frame60 to be rotatable about theaxes82bof thesupport shafts82a, and links83 each having one end thereof pivotally connected to a position of one of the driven gears82 offset from the axis ofrotation82b, and the other end pivotally connected to the upper surface of one of the pad supports24. Both of the driven gears82 are meshed with thedrive gear81. Thedrive gear81, driven gears82 andlinks83 constitute a slider/crank mechanism for the pad unit.
The[0062]pad control mechanism80 acting as the slider/crank mechanism is driven by thepolisher motor29 to reciprocate thefirst pad21 andsecond pad21 in a first direction A in which thefirst pad21 andsecond pad21 approach each other and in a second direction B in which thefirst pad21 andsecond pad21 move away from each other. Moreover, by the aid of the guiding device described above, the first direction A and second directions B for reciprocating thefirst pad21 andsecond pad21 are linear and parallel the floor surface.
More particularly, when the[0063]polisher motor29 is operated, thedrive gear81 is driven by thepolisher motor29 to rotate the two driven gears82. Then, thelinks83 connected to the driven gears53 convert the rotation of the driven gears82 to a linear reciprocal displacement. This converted drive slides the pad supports24 back and forth along the right and left guide rails23. As a result, the twopads21 also reciprocate in the fore and aft direction of themachine frame60 along the right and left guide rails23.
By adjusting a phase of assembly between the two driven[0064]gears82 andcorresponding links83, thefirst pad21 andsecond pad21 may make a linear reciprocation toward and away from each other.
With the[0065]machine body60 resting on the floor surface through thepads21, thepolisher motor29 may be operated to drive thedrive gear81. Then thepad control mechanism80 is driven to reciprocate the twopads21 linearly toward and away from each other in the fore and aft direction on the floor surface. The twopads21 polish the floor surface while spreading the cleaning solution dripping from the front andrear nozzles11 over the floor surface.
This working machine is operable with the weight of the entire machine body falling on the[0066]pads21. The twopads21 are slidably supported by thebody frame60 through the pad supports24 andguide rails23 to make a linear reciprocation toward and away from each other. Thus, reaction forces applied from the floor to therespective pads21 cancel each other. The machine can operate while suppressing slippage and vibration due to the reaction forces from the floor. As a result, the machine body is maintained steady by the operator lightly holding the control handle62, and the operation may be carried out easily with little vibration transmitted to the operator's hands holding the control handle62.
In each of the above embodiments, the pad unit includes two[0067]pads21. Instead, the pad unit may include three ormore pads21. In this case, an adjacent pair of pads among the plurality ofpads21 may be arranged linearly reciprocable toward and away from each other.
The cleaning[0068]solution supplying device10 or70 may have only a cleaning nozzle for supplying the cleaning solution forwardly of the pad unit, or only a cleaning nozzle for supplying the cleaning solution between thepads21.