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US20030162179A1 - Fabrication, performance testing, and screening of three dimensional arrays of materials - Google Patents

Fabrication, performance testing, and screening of three dimensional arrays of materials
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Publication number
US20030162179A1
US20030162179A1US10/083,727US8372702AUS2003162179A1US 20030162179 A1US20030162179 A1US 20030162179A1US 8372702 AUS8372702 AUS 8372702AUS 2003162179 A1US2003162179 A1US 2003162179A1
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samples
array
substrate
dimensional
sample
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US10/083,727
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Radislav Potyrailo
James Cawse
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General Electric Co
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General Electric Co
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Assigned to GENERAL ELECTRIC COMPANYreassignmentGENERAL ELECTRIC COMPANYASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).Assignors: CAWSE, JAMES N., POTYRAILO, RADISLAV A.
Publication of US20030162179A1publicationCriticalpatent/US20030162179A1/en
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Abstract

The present invention relates to methods for the fabrication, performance testing and screening of combinatorial libraries of materials arranged as three dimensional arrays. The invention describes the generation and screening of three dimensional arrays by depositing a plurality of samples onto at least one substrate at discrete and defined positions in a three dimensional format such that each sample is isolated by the substrate from the other samples, and wherein each sample is defined by its (x, y, and z) coordinate, collecting analytical data from the sample array, correlating the analytical data collected from the array to the position of samples within the array, and analyzing the analytical data for a parameter of interest. The array may be performance tested for stability to chemical degradation, environmental stress, or other factors. Also described is the use of techniques such as confocal and multi-photon microscopy for the measurement and analysis of samples in the array.

Description

Claims (71)

What is claimed is:
1. A method for the generation and screening of three dimensional arrays comprising:
depositing a plurality of samples onto at least one substrate at discrete and defined positions in a three dimensional format such that each sample is isolated by the substrate from the other samples, and wherein each sample is defined by its (x, y, and z) coordinate to generate a three dimensional array of samples;
collecting analytical data from the sample array, wherein the analytical data is at least partially defined by its (x, y, and z) coordinate within the sample array;
correlating the analytical data collected from the array to the position of samples within the array; and
analyzing the analytical data for a parameter of interest.
2. The method ofclaim 1, wherein the array comprises multiple two dimensional arrays.
3. The method ofclaim 1, wherein the array comprises samples deposited on the surface of a three dimensional structure.
4. The method ofclaim 1, further comprising the use of masking and gradient deposition techniques to limit the deposit of samples to regions of interest.
5. The method ofclaim 3, further comprising evaporative methods for deposition of said samples.
6. The method ofclaim 5, wherein the evaporative methods comprise lasers, filaments, electron beams, or ion beams.
7. The method ofclaim 5, further comprising molecular beam epitaxy.
8. The method ofclaim 3, further comprising glow-discharge processes for deposition of said samples.
9. The method ofclaim 8, wherein the glow-discharge processes comprises sputtering.
10. The method ofclaim 3, further comprising chemical vapor deposition for deposition of said samples.
11. The method ofclaim 10, wherein the chemical vapor deposition process comprises photo-enhanced chemical vapor deposition or plasma-enhanced chemical vapor deposition.
12. The method ofclaim 3, further comprising pulsed-laser assisted deposition for deposition of said samples.
13. The method ofclaim 3, further comprising mechanical deposition of said samples.
14. The method ofclaim 13, wherein the mechanical deposition comprises spraying, spinning, dipping draining, flow coating, roller coating, pressure-curtain coating, or brushing.
15. The method ofclaim 3, wherein the samples have a thickness which ranges from 0.1 nm to 1 cm.
16. The method ofclaim 3, wherein the samples have a thickness which ranges from 1 nm to 1 mm.
17. The method ofclaim 3, wherein the samples have a thickness which ranges from 10 nm to 200 μm.
18. The method ofclaim 1, wherein the array comprises samples deposited within the interior of a three dimensional substrate.
19. The method ofclaim 18, wherein the samples are introduced into a pre-formed substrate.
20. The method ofclaim 18, wherein the samples are diffused into a pre-formed substrate.
21. The method ofclaim 18, wherein the substrate is tetrahedral.
22. The method ofclaim 18, wherein the substrate is polyhedral.
23. The method ofclaim 18, wherein the substrate is cylindrical.
24. The method ofclaim 18, wherein the substrate is spherical.
25. The method ofclaim 18, wherein the substrate is cubical.
26. The method ofclaim 18, wherein materials are diffused inwards from predetermined surface locations on the substrate.
27. The method ofclaim 26, wherein materials are diffused inwards from at least one surface plane of said substrate.
28. The method ofclaim 26, wherein materials are diffused inwards from at least one vertex of said substrate.
29. The method ofclaim 18, wherein at least some of the samples are introduced into a partially formed substrate and at least part of the substrate transformed to its final structure after deposition of the samples.
30. The method ofclaim 29, wherein the substrate comprises a gel which is polymerized upon application of radiation.
31. The method ofclaim 29, wherein the gel comprises acrylates or unsaturated polyester.
32. The method ofclaim 1, further comprising treating the deposited samples to initiate a chemical reaction within the three dimensional array.
33. The method ofclaim 32, wherein the treatment comprises the addition of a chemical agent.
34. The method ofclaim 33, wherein the treatment is applied differentially to at least some locations of the array.
35. The method ofclaim 33, wherein the treatment is applied in a constant manner to all locations of the array.
36. The method ofclaim 32, wherein the treatment comprises the application of electromagnetic radiation.
37. The method ofclaim 32, wherein the treatment comprises the application of ultrasound.
38. The method ofclaim 32, wherein the treatment comprises a change in temperature.
39. The method ofclaim 1, wherein the substrate is substantially inert.
40. The method ofclaim 1, wherein the substrate comprises a substance that interacts with at least some of the samples of the array.
41. The method ofclaim 1, wherein individual elements of the array are performance tested for stability upon exposure to at least one external agent.
42. The method ofclaim 41, wherein the external agent comprises a physical force.
43. The method ofclaim 41, wherein the external agent comprises electromagnetic radiation.
44. The method ofclaim 41, wherein the external agent comprises heat.
45. The method ofclaim 41, wherein the external agent comprises a chemical reagent.
46. The method ofclaim 41, wherein said external agent is applied in a constant manner to all samples of the array.
47. The method ofclaim 41, wherein the external agent is applied differentially to at least some of the individual samples in the array.
48. The method ofclaim 1, wherein spatially resolved measurement tools are used to collect and process data from said array.
49. The method ofclaim 48, further comprising applying a scanning probe over at least one of the samples.
50. The method ofclaim 49, wherein said scanning probe comprises confocal microscopy.
51. The method ofclaim 50, further comprising Raman confocal microscopy.
52. The method ofclaim 50, further comprising luminescence confocal microscopy.
53. The method ofclaim 49, wherein said scanning probe comprises two-photon microscopy.
54. The method ofclaim 49, wherein said scanning probe comprises multi-photon microscopy.
55. The method ofclaim 1, wherein collecting analytical data from the array is substantially simultaneous for each sample of the array.
56. The method ofclaim 1, wherein collecting analytical data from the array is performed separately for each sample of the array.
57. The method ofclaim 1, wherein the step of analyzing the collected data comprises univariate analysis.
58. The method ofclaim 1, wherein the step of analyzing the collected data comprises multivariate analysis.
59. A method for the generation and performance testing of three dimensional arrays comprising:
depositing a plurality of samples onto at least one substrate at discrete and defined positions in a three dimensional format such that each sample is isolated by said substrate from the other samples, and wherein each sample is defined by its (x, y, and z) coordinate to generate a three dimensional array of samples;
performance testing the array;
collecting data from the performance testing, wherein the data is at least partially defined by its (x, y, and z) coordinate within the sample array;
correlating the analytical data collected from the array to the position of samples within the array; and
analyzing the analytical data for a parameter of interest.
60. The method ofclaim 59, wherein the step of performance testing comprises applying at least one external agent to at least some of the samples of the array.
61. The method ofclaim 60, wherein the external agent comprises a physical force.
62. The method ofclaim 60, wherein the external agent comprises electromagnetic radiation.
63. The method ofclaim 60, wherein the external agent comprises heat.
64. The method ofclaim 60, wherein the external agent comprises a chemical reagent.
65. The method ofclaim 60, wherein said external agent is applied in a constant manner to all samples of the array.
66. The method ofclaim 60, wherein the external agent is applied differentially to at least some of the individual samples in the array.
67. A method for the analysis of three dimensional arrays comprising:
applying a scanning probe over a plurality of samples deposited onto at least one substrate at discrete and defined positions in a three dimensional format such that each sample is isolated by said substrate from the other samples, and wherein each sample is defined by its (x, y, and z) coordinate;
collecting analytical data from the array, wherein the analytical data is at least partially defined by its (x, y, and z) coordinate within the sample array;
correlating the analytical data collected from the array to the position of samples within the array; and
analyzing the analytical data for a parameter of interest.
68. The method ofclaim 67, comprising luminescent confocal microscopy.
69. The method ofclaim 67, comprising Raman confocal microscopy.
70. The method ofclaim 67, comprising two photon microscopy.
71. The method ofclaim 67, comprising multi-photon microscopy.
US10/083,7272002-02-272002-02-27Fabrication, performance testing, and screening of three dimensional arrays of materialsAbandonedUS20030162179A1 (en)

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US10/083,727US20030162179A1 (en)2002-02-272002-02-27Fabrication, performance testing, and screening of three dimensional arrays of materials

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Cited By (11)

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US20040196037A1 (en)*2001-10-252004-10-07Intematix CorporationDetection with evanescent wave probe
US20050253092A1 (en)*2002-10-032005-11-17Asml Netherlands B.V.Radiation source, lithographic apparatus, and device manufacturing method
US20070243556A1 (en)*2004-04-142007-10-18Catalyst Design IncSmart combinatorial operando spectroscopy catalytic system
US20080123090A1 (en)*2006-11-272008-05-29General Electric CompanyDevice and method to transfer objects for optical analysis
US8758863B2 (en)2006-10-192014-06-24The Board Of Trustees Of The University Of ArkansasMethods and apparatus for making coatings using electrostatic spray
US20180080888A1 (en)*2016-09-192018-03-22Energy Storage And Retention Solutions Holdings, LlcRapid high temperature thermal analysis
US20180286940A1 (en)*2017-03-292018-10-04Globalfoundries Singapore Pte. Ltd.A 3-dimensional printing process for integrated magnetics
US10752997B2 (en)2006-10-192020-08-25P&S Global Holdings LlcMethods and apparatus for making coatings using ultrasonic spray deposition
RU2745223C1 (en)*2020-06-172021-03-22Федеральное государственное автономное образовательное учреждение высшего образования "Национальный исследовательский технологический университет "МИСиС"Method for combinatorial production of new compositions of materials in a multicomponent system
US11181446B2 (en)*2020-02-212021-11-23Ut-Battelle, LlcLaser ablation sampling system and method
CN114839169A (en)*2021-02-012022-08-02中国科学院长春应用化学研究所 A multifunctional in situ online detection electrochemical cell for fluorescence confocal and Raman spectroscopy measurements

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Cited By (21)

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Publication numberPriority datePublication dateAssigneeTitle
US20040196037A1 (en)*2001-10-252004-10-07Intematix CorporationDetection with evanescent wave probe
US7148683B2 (en)2001-10-252006-12-12Intematix CorporationDetection with evanescent wave probe
US20070090836A1 (en)*2001-10-252007-04-26Intematix CorporationDetection with evanescent wave probe
US7268546B2 (en)2001-10-252007-09-11Intematix CorporationDetection with evanescent wave probe
US7276902B1 (en)2001-10-252007-10-02Intematix CorporationDetection with evanescent wave probe
US7282911B2 (en)2001-10-252007-10-16Intematix CorporationDetection with evanescent wave probe
US20070247147A1 (en)*2001-10-252007-10-25Intermatix CorporationDetection with evanescent wave probe
US20050253092A1 (en)*2002-10-032005-11-17Asml Netherlands B.V.Radiation source, lithographic apparatus, and device manufacturing method
US20070243556A1 (en)*2004-04-142007-10-18Catalyst Design IncSmart combinatorial operando spectroscopy catalytic system
US8758863B2 (en)2006-10-192014-06-24The Board Of Trustees Of The University Of ArkansasMethods and apparatus for making coatings using electrostatic spray
US10752997B2 (en)2006-10-192020-08-25P&S Global Holdings LlcMethods and apparatus for making coatings using ultrasonic spray deposition
US20080123090A1 (en)*2006-11-272008-05-29General Electric CompanyDevice and method to transfer objects for optical analysis
US20180080888A1 (en)*2016-09-192018-03-22Energy Storage And Retention Solutions Holdings, LlcRapid high temperature thermal analysis
US10697914B2 (en)*2016-09-192020-06-30Energy Storage & Retention Solutions Holdings, LlcRapid high temperature thermal analysis
US20180286940A1 (en)*2017-03-292018-10-04Globalfoundries Singapore Pte. Ltd.A 3-dimensional printing process for integrated magnetics
US10446639B2 (en)*2017-03-292019-10-15Globalfoundries Singapore Pte. Ltd.3-dimensional printing process for integrated magnetics
US10825888B2 (en)2017-03-292020-11-03Globalfoundries Singapore Pte. Ltd.3-dimensional printing process for integrated magnetics
US11181446B2 (en)*2020-02-212021-11-23Ut-Battelle, LlcLaser ablation sampling system and method
US11841297B2 (en)2020-02-212023-12-12Ut-Battelle, LlcLaser ablation sampling system and method
RU2745223C1 (en)*2020-06-172021-03-22Федеральное государственное автономное образовательное учреждение высшего образования "Национальный исследовательский технологический университет "МИСиС"Method for combinatorial production of new compositions of materials in a multicomponent system
CN114839169A (en)*2021-02-012022-08-02中国科学院长春应用化学研究所 A multifunctional in situ online detection electrochemical cell for fluorescence confocal and Raman spectroscopy measurements

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Legal Events

DateCodeTitleDescription
ASAssignment

Owner name:GENERAL ELECTRIC COMPANY, NEW YORK

Free format text:ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:POTYRAILO, RADISLAV A.;CAWSE, JAMES N.;REEL/FRAME:012663/0088;SIGNING DATES FROM 20020204 TO 20020211

STCBInformation on status: application discontinuation

Free format text:ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION


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