US20020047123A1 - Semiconductor structure, semiconductor device, communicating device, integrated circuit, and process for fabricating the same - Google Patents

Abstract

High quality epitaxial layers of compound semiconductor materials can be grown overlying large silicon wafers by first growing an accommodating buffer layer on a silicon wafer. The accommodating buffer layer is a layer of monocrystalline oxide spaced apart from the silicon wafer by an amorphous interface layer of silicon oxide. The amorphous interface layer dissipates strain and permits the growth of a high quality monocrystalline oxide accommodating buffer layer. The accommodating buffer layer is lattice matched to both the underlying silicon wafer and the overlying monocrystalline compound semiconductor layer. Any lattice mismatch between the accommodating buffer layer and the underlying silicon substrate is taken care of by the amorphous interface layer.

Description

CROSS REFERENCE TO RELATED APPLICATION
• The present application is related to U.S. patent application Ser. No. 09/273929 entitled “Method for Fabricating a Semiconductor Structure Having a Crystalline Alkaline Earth Metal Oxide Interface with Silicon,” filed Mar. 22, 1999, U.S. patent application Ser. No. 09/274268 entitled “Semiconductor Structure Having a Crystalline Alkaline Earth Metal Oxide Interface with Silicon,” filed Mar. 22, 1999, and (Attorney Reference No. SC10903TP) entitled “Semiconductor Substrate and Method for Preparing the Same,” filed concurrently herewith, all of which are assigned to the current assignee hereof.[0001]
FIELD OF THE INVENTION
• This invention relates generally to semiconductor structures and devices and to a method for their fabrication, and more specifically to compound semiconductor structures and devices and to the fabrication and use of semiconductor structures, devices, and integrated circuits that include a monocrystalline compound semiconductor material.[0002]
BACKGROUND OF THE INVENTION
• The vast majority of semiconductor discrete devices and integrated circuits are fabricated from silicon, at least in part because of the availability of inexpensive, high quality monocrystalline silicon substrates. Other semiconductor materials, such as the so called compound semiconductor materials, have physical attributes, including wider bandgap and/or higher mobility than silicon, or direct bandgaps that makes these materials advantageous for certain types of semiconductor devices. Unfortunately, compound semiconductor materials are generally much more expensive than silicon and are not available in large wafers as is silicon. Gallium arsenide (GaAs), the most readily available compound semiconductor material, is available in wafers only up to about 150 millimeters (mm) in diameter. In contrast, silicon wafers are available up to about 300 mm and are widely available at 200 mm. The 150 mm GaAs wafers are many times more expensive than are their silicon counterparts. Wafers of other compound semiconductor materials are even less available and are more expensive than GaAs.[0003]
• Because of the desirable characteristics of compound semiconductor materials, and because of their present generally high cost and low availability in bulk form, for many years attempts have been made to grow thin films of the compound semiconductor materials on a foreign substrate. To achieve optimal characteristics of the compound semiconductor material, however, a monocrystalline film of high crystalline quality is desired. Attempts have been made, for example, to grow layers of a monocrystalline compound semiconductor material on germanium, silicon, and various insulators. These attempts have generally been unsuccessful because lattice mismatches between the host crystal and the grown crystal have caused the resulting thin film of compound semiconductor material to be of low crystalline quality.[0004]
• If a large area thin film of high quality monocrystalline compound semiconductor material was available at low cost, a variety of semiconductor devices could advantageously be fabricated in that film at a low cost compared to the cost of fabricating such devices on a bulk wafer of compound semiconductor material or in an epitaxial film of such material on a bulk wafer of compound semiconductor material. In addition, if a thin film of high quality monocrystalline compound semiconductor material could be realized on a bulk wafer such as a silicon wafer, an integrated device structure could be achieved that took advantage of the best properties of both the silicon and the compound semiconductor material.[0005]
• Accordingly, a need exists for a semiconductor structure that provides a high quality monocrystalline compound semiconductor film over another monocrystalline material and for a process for making such a structure.[0006]
BRIEF DESCRIPTION OF THE DRAWINGS
• The present invention is illustrated by way of example and not limitation in the accompanying figures, in which like references indicate similar elements, and in which:[0007]
• FIGS. 1, 2,[0008]4,5 illustrate schematically, in cross section, device structures in accordance with various embodiments of the invention;
• FIG. 3 illustrates graphically the relationship between maximum attainable film thickness and lattice mismatch between a host crystal and a grown crystalline overlayer;[0009]
• FIG. 6 includes an illustration of a block diagram of a portion of a communicating device;[0010]
• FIGS.[0011]7-11 include illustrations of cross-sectional views of a portion of an integrated circuit that includes a compound semiconductor portion, a bipolar portion, and an MOS portion; and
• FIGS.[0012]12-18 includes illustrations of cross-sectional views of a portion of another integrated circuit that includes a semiconductor laser and an MOS transistor.
• Skilled artisans will appreciate that elements in the figures are illustrated for simplicity and clarity and have not necessarily been drawn to scale. For example, the dimensions of some of the elements in the figures may be exaggerated relative to other elements to help to improve understanding of embodiments of the present invention.[0013]
DETAILED DESCRIPTION OF THE DRAWINGS
• FIG. 1 illustrates schematically, in cross section, a portion of a[0014]semiconductor structure20 in accordance with an embodiment of the invention.Semiconductor structure20 includes amonocrystalline substrate22,accommodating buffer layer24 comprising a monocrystalline material, and alayer26 of a monocrystalline compound semiconductor material. In this context, the term “monocrystalline” shall have the meaning commonly used within the semiconductor industry. The term shall refer to materials that are a single crystal or that are substantially a single crystal and shall include those materials having a relatively small number of defects such as dislocations and the like as are commonly found in substrates of silicon or germanium or mixtures of silicon and germanium and epitaxial layers of such materials commonly found in the semiconductor industry.
• In accordance with one embodiment of the invention,[0015]structure20 also includes an amorphousintermediate layer28 positioned betweensubstrate22 andaccommodating buffer layer24.Structure20 may also include atemplate layer30 between the accommodating buffer layer andcompound semiconductor layer26. As will be explained more fully below, the template layer helps to initiate the growth of the compound semiconductor layer on the accommodating buffer layer. The amorphous intermediate layer helps to relieve the strain in the accommodating buffer layer and by doing so, aids in the growth of a high crystalline quality accommodating buffer layer.
• [0016]Substrate22, in accordance with an embodiment of the invention, is a monocrystalline semiconductor wafer, preferably of large diameter. The wafer can be of a material from Group IV of the periodic table, and preferably a material from Group IVA. Examples of Group IV semiconductor materials include silicon, germanium, mixed silicon and germanium, mixed silicon and carbon, mixed silicon, germanium and carbon, and the like. Preferablysubstrate22 is a wafer containing silicon or germanium, and most preferably is a high quality monocrystalline silicon wafer as used in the semiconductor industry.Accommodating buffer layer24 is preferably a monocrystalline oxide or nitride material epitaxially grown on the underlying substrate. In accordance with one embodiment of the invention, amorphousintermediate layer28 is grown onsubstrate22 at the interface betweensubstrate22 and the growing accommodating buffer layer by the oxidation ofsubstrate22 during the growth oflayer24. The amorphous intermediate layer serves to relieve strain that might otherwise occur in the monocrystalline accommodating buffer layer as a result of differences in the lattice constants of the substrate and the buffer layer. As used herein, lattice constants refers to the distance between atoms of a cell measured in the plane of the surface. If such strain is not relieved by the amorphous intermediate layer, the strain may cause defects in the crystalline structure of the accommodating buffer layer. Defects in the crystalline structure of the accommodating buffer layer, in turn, would make it difficult to achieve a high quality crystalline structure in monocrystallinecompound semiconductor layer26.
• Accommodating[0017]buffer layer24 is preferably a monocrystalline oxide or nitride material selected for its crystalline compatibility with the underlying substrate and with the overlying compound semiconductor material. For example, the material could be an oxide or nitride having a lattice structure matched to the substrate and to the subsequently applied semiconductor material. Materials that are suitable for the accommodating buffer layer include metal oxides such as the alkaline earth metal titanates, alkaline earth metal zirconates, alkaline earth metal hafnates, alkaline earth metal tantalates, alkaline earth metal ruthenates, alkaline earth metal niobates, alkaline earth metal vanadates, alkaline earth metal tin-based perovskites, lanthanum aluminate, lanthanum scandium oxide, and gadolinium oxide. Additionally, various nitrides such as gallium nitride, aluminum nitride, and boron nitride may also be used for the accommodating buffer layer. Most of these materials are insulators, although strontium ruthenate, for example, is a conductor. Generally, these materials are metal oxides or metal nitrides, and more particularly, these metal oxide or nitrides typically include at least two different metallic elements. In some specific applications, the metal oxides or nitride may include three or more different metallic elements.
• [0018]Amorphous interface layer28 is preferably an oxide formed by the oxidation of the surface ofsubstrate22, and more preferably is composed of a silicon oxide. The thickness oflayer28 is sufficient to relieve strain attributed to mismatches between the lattice constants ofsubstrate22 andaccommodating buffer layer24. Typically,layer28 has a thickness in the range of approximately 0.5-5 nm.
• The compound semiconductor material of[0019]layer26 can be selected, as needed for a particular semiconductor structure, from any of the Group IIIA and VA elements (III-V semiconductor compounds), mixed III-V compounds, Group II(A or B) and VIA elements (II-VI semiconductor compounds), and mixed II-VI compounds. Examples include gallium arsenide (GaAs), gallium indium arsenide (GaInAs), gallium aluminum arsenide (GaAlAs), indium phosphide (InP), cadmium sulfide (CdS), cadmium mercury telluride (CdHgTe), zinc selenide (ZnSe), zinc sulfur selenide (ZnSSe), and the like. Suitable template materials chemically bond to the surface of theaccommodating buffer layer24 at selected sites and provide sites for the nucleation of the epitaxial growth of the subsequentcompound semiconductor layer26. Appropriate materials fortemplate30 are discussed below.
• FIG. 2 illustrates, in cross section, a portion of a[0020]semiconductor structure40 in accordance with a further embodiment of the invention.Structure40 is similar to the previously describedsemiconductor structure20 except that anadditional buffer layer32 is positioned betweenaccommodating buffer layer24 and layer of monocrystallinecompound semiconductor material26. Specifically, the additional buffer layer is positioned between thetemplate layer30 and the overlying layer of compound semiconductor material. The additional buffer layer, formed of a semiconductor or compound semiconductor material, serves to provide a lattice compensation when the lattice constant of the accommodating buffer layer cannot be adequately matched to the overlying monocrystalline compound semiconductor material layer.
• The following non-limiting, illustrative examples illustrate various combinations of materials useful in[0021]structure20 andstructure40 in accordance with various alternative embodiments of the invention. These examples are merely illustrative, and it is not intended that the invention be limited to these illustrative examples.
EXAMPLE 1
• In accordance with one embodiment of the invention,[0022]monocrystalline substrate22 is a silicon substrate oriented in the (100) direction. The silicon substrate can be, for example, a silicon substrate as is commonly used in making complementary metal oxide semiconductor (CMOS) integrated circuits having a diameter of about 200-300 mm. In accordance with this embodiment of the invention,accommodating buffer layer24 is a monocrystalline layer of Sr_zBa_1−zTiO₃where z ranges from 0 to 1 and the amorphous intermediate layer is a layer of silicon oxide (SiO_x) formed at the interface between the silicon substrate and the accommodating buffer layer. The value of z is selected to obtain one or more lattice constants closely matched to corresponding lattice constants of the subsequently formedlayer26. The accommodating buffer layer can have a thickness of about 2 to about 100 nanometers (nm) and preferably has a thickness of about 10 nm. In general, it is desired to have an accommodating buffer layer thick enough to isolate the compound semiconductor layer from the substrate to obtain the desired electrical and optical properties. Layers thicker than 100 nm usually provide little additional benefit while increasing cost unnecessarily; however, thicker layers may be fabricated if needed. The amorphous intermediate layer of silicon oxide can have a thickness of about 0.5-5 nm, and preferably a thickness of about 1.5-2.5 nm.
• In accordance with this embodiment of the invention, compound[0023]semiconductor material layer26 is a layer of gallium arsenide (GaAs) or aluminum gallium arsenide (AlGaAs) having a thickness of about 1 nm to about 100 micrometers (μm) and preferably a thickness of about 0.5 μm to 10 μm. The thickness generally depends on the application for which the layer is being prepared. To facilitate the epitaxial growth of the gallium arsenide or aluminum gallium arsenide on the monocrystalline oxide, a template layer is formed by capping the oxide layer. The template layer is preferably 1-10 monolayers of Ti—As, Sr—O—As, Sr—Ga—O, or Sr—Al—O. By way of a preferred example, 1-2 monolayers of Ti—As or Sr—Ga—O have been shown to successfully grow GaAs layers.
EXAMPLE 2
• In accordance with a further embodiment of the invention,[0024]monocrystalline substrate22 is a silicon substrate as described above. The accommodating buffer layer is a monocrystalline oxide of strontium or barium zirconate or hafnate in a cubic or orthorhombic phase with an amorphous intermediate layer of silicon oxide formed at the interface between the silicon substrate and the accommodating buffer layer. The accommodating buffer layer can have a thickness of about 2-100 nm and preferably has a thickness of at least 5 nm to ensure adequate crystalline and surface quality and is formed of a monocrystalline SrZrO₃, BaZrO₃, SrHfO₃, BaSnO₃or BaHfO₃. For example, a monocrystalline oxide layer of BaZrO₃can grow at a temperature of about 700 degrees C. The lattice structure of the resulting crystalline oxide exhibits a 45 degree rotation with respect to the substrate silicon lattice structure.
• An accommodating buffer layer formed of these zirconate or hafnate materials is suitable for the growth of compound semiconductor materials in the indium phosphide (InP) system. The compound semiconductor material can be, for example, indium phosphide (InP) or indium gallium arsenide (InGaAs) having a thickness of about 1.0 nm to 10 μm. A suitable template for this structure is 1-10 monolayers of zirconium-arsenic (Zr—As), zirconium-phosphorus (Zr—P), hafnium-arsenic (Hf—As), hafnium-phosphorus (Hf—P), strontium-oxygen-arsenic (Sr—O—As), strontium-oxygen-phosphorus (Sr—O—P), barium-oxygen-arsenic (Ba—O—As), indium-strontium-oxygen (In—Sr—O), or barium-oxygen-phosphorus (Ba—O—P), and preferably 1-2 monolayers of one of these materials. By way of an example, for a barium zirconate accommodating buffer layer, the surface is terminated with 1-2 monolayers of zirconium followed by deposition of 1-2 monolayers of arsenic to form a Zr—As template. A monocrystalline layer of the compound semiconductor material from the indium phosphide system is then grown on the template layer. The resulting lattice structure of the compound semiconductor material exhibits a 45 degree rotation with respect to the accommodating buffer layer lattice structure and a lattice mismatch to (100) InP of less than 2.5%, and preferably less than about 1.0%.[0025]
EXAMPLE 3
• In accordance with a further embodiment of the invention, a structure is provided that is suitable for the growth of an epitaxial film of a II-VI material overlying a silicon substrate. The substrate is preferably a silicon wafer as described above. A suitable accommodating buffer layer material is Sr[0026]_xBa_1−xTiO₃, where x ranges from 0 to 1, having a thickness of about 2-100 nm and preferably a thickness of about 5-15 nm. The II-VI compound semiconductor material can be, for example, zinc selenide (ZnSe) or zinc sulfur selenide (ZnSSe). A suitable template for this material system includes 1-10 monolayers of zinc-oxygen (Zn—O) followed by 1-2 monolayers of an excess of zinc followed by the selenidation of zinc on the surface. Alternatively, a template can be, for example, strontium-sulfur (Sr—S) followed by the ZnSeS.
EXAMPLE 4
• This embodiment of the invention is an example of[0027]structure40 illustrated in FIG. 2.Substrate22,monocrystalline oxide layer24, and monocrystalline compoundsemiconductor material layer26 can be similar to those described in example 1. In addition, anadditional buffer layer32 serves to alleviate any strains that might result from a mismatch of the crystal lattice of the accommodating buffer layer and the lattice of the monocrystalline semiconductor material.Buffer layer32 can be a gallium arsenide phosphide (GaAs_xP_1−x) or indium gallium phosphide (In_yGa_1−yP) strain compensated superlattice. In the gallium arsenide phosphide superlattice the value of x ranges from 0 to 1, and in the indium gallium phosphide superlattice the value of y ranges from 0 to 1. By so varying the value of x or y, as the case may be, the lattice constant is varied from bottom to top across the superlattice to create a match between lattice constants of the underlying oxide and the overlying compound semiconductor material. The superlattice can have a thickness of about 50-500 nm and preferably has a thickness of about 200-100 nm. The template for this structure can be the same of that described in example 1. Alternatively, the buffer layer can be a layer of monocrystalline germanium having a thickness of 1-50 nm and preferably having a thickness of about 2-20 nm. In using a germanium buffer layer, a template layer of either germanium-strontium (Ge—Sr) or germanium-titanium (Ge—Ti) having a thickness of about one monolayer can be used. The formation of the oxide layer is capped with either a monolayer of strontium or a monolayer of titanium to act as a nucleating site for the subsequent deposition of the monocrystalline germanium. The monolayer of strontium or titanium provides a nucleating site to which the first monolayer of germanium can bond.
EXAMPLE 5
• This example also illustrates materials useful in a[0028]structure40 as illustrated in FIG. 2.Substrate material22,accommodating buffer layer24, monocrystalline compoundsemiconductor material layer26 andtemplate layer30 can be the same as those described above in example 2. In addition, abuffer layer32 is inserted between the accommodating buffer layer and the overlying monocrystalline compound semiconductor material layer. The buffer layer, a further monocrystalline semiconductor material, can be, for example, a graded layer of indium gallium arsenide (InGaAs) in which the indium composition varies from 0 to about 47%. The buffer layer preferably has a thickness of about 10-30 nm. Varying the composition of the buffer layer from GaAs to InGaAs serves to provide a lattice match between the underlying monocrystalline oxide material and the overlying layer of monocrystalline compound semiconductor material. Such a buffer layer is especially advantageous if there is a lattice mismatch betweenaccommodating buffer layer24 and monocrystalline compoundsemiconductor material layer26.
• Referring again to FIGS. 1 and 2,[0029]substrate22 is a monocrystalline substrate such as a monocrystalline silicon substrate. The crystalline structure of the monocrystalline substrate is characterized by a lattice constant and by a lattice orientation. In similar manner,accommodating buffer layer24 is also a monocrystalline material and the lattice of that monocrystalline material is characterized by a lattice constant and a crystal orientation. The lattice constants of the accommodating buffer layer and the monocrystalline substrate must be closely matched or, alternatively, must be such that upon rotation of one crystal orientation with respect to the other crystal orientation, a substantial match in lattice constants is achieved. In this context the terms “substantially equal” and “substantially matched” mean that there is sufficient similarity between the lattice constants to permit the growth of a high quality crystalline layer on the underlying layer.
• FIG. 3 illustrates graphically the relationship of the achievable thickness of a grown crystal layer of high crystalline quality as a function of the mismatch between the lattice constants of the host crystal and the grown crystal.[0030]Curve42 illustrates the boundary of high crystalline quality material. The area to the right ofcurve42 represents layers that tend to be polycrystalline. With no lattice mismatch, it is theoretically possible to grow an infinitely thick, high quality epitaxial layer on the host crystal. As the mismatch in lattice constants increases, the thickness of achievable, high quality crystalline layer decreases rapidly. As a reference point, for example, if the lattice constants between the host crystal and the grown layer are mismatched by more than about 2%, monocrystalline epitaxial layers in excess of about 20 nm cannot be achieved.
• In accordance with one embodiment of the invention,[0031]substrate22 is a (100) or (111) oriented monocrystalline silicon wafer andaccommodating buffer layer24 is a layer of strontium barium titanate. Substantial matching of lattice constants between these two materials is achieved by rotating the crystal orientation of the titanate material by 45° with respect to the crystal orientation of the silicon substrate wafer. The inclusion in the structure ofamorphous interface layer24, a silicon oxide layer in this example, serves to reduce strain in the titanate monocrystalline layer that might result from any mismatch in the lattice constants of the host silicon wafer and the grown titanate layer. As a result, in accordance with an embodiment of the invention, a high quality, thick, monocrystalline titanate layer is achievable.
• Still referring to FIGS. 1 and 2,[0032]layer26 is a layer of epitaxially grown monocrystalline compound semiconductor material and that crystalline material is also characterized by a crystal lattice constant and a crystal orientation. To achieve high crystalline quality in this epitaxially grown layer, the accommodating buffer layer must be of high crystalline quality. In addition, in order to achieve high crystalline quality inlayer26, substantial matching between the crystal lattice constant of the host crystal, in this case, the monocrystalline accommodating buffer layer, and the grown crystal is desired. With properly selected materials this substantial matching of lattice constants is achieved as a result of rotation of the crystal orientation of the grown crystal with respect to the orientation of the host crystal. If the grown crystal is gallium arsenide, aluminum gallium arsenide, zinc selenide, or zinc sulfur selenide and the accommodating buffer layer is monocrystalline Sr_xBa_1−xTiO₃, substantial matching of crystal lattice constants of the two materials is achieved, wherein the crystal orientation of the grown layer is rotated by 45° with respect to the orientation of the host monocrystalline oxide. Similarly, if the host material is a strontium or barium zirconate or a strontium or barium hafnate or barium tin oxide and the compound semiconductor layer is indium phosphide or gallium indium arsenide or aluminum indium arsenide, substantial matching of crystal lattice constants can be achieved by rotating the orientation of the grown crystal layer by 45° with respect to the host oxide crystal. In some instances, a crystalline semiconductor buffer layer between the host oxide and the grown compound semiconductor layer can be used to reduce strain in the grown monocrystalline compound semiconductor layer that might result from small differences in lattice constants. Better crystalline quality in the grown monocrystalline compound semiconductor layer can thereby be achieved.
• The following example illustrates a process, in accordance with one embodiment of the invention, for fabricating a semiconductor structure such as the structures depicted in FIGS. 1 and 2. The process starts by providing a monocrystalline semiconductor substrate comprising silicon or germanium. In accordance with a preferred embodiment of the invention, the semiconductor substrate is a silicon wafer having a (100) orientation. The substrate is preferably oriented on axis or, at most, about 0.5° off axis. At least a portion of the semiconductor substrate has a bare surface, although other portions of the substrate, as described below, may encompass other structures. The term “bare” in this context means that the surface in the portion of the substrate has been cleaned to remove any oxides, contaminants, or other foreign material. As is well known, bare silicon is highly reactive and readily forms a native oxide. The term “bare” is intended to encompass such a native oxide. A thin silicon oxide may also be intentionally grown on the semiconductor substrate, although such a grown oxide is not essential to the process in accordance with the invention. In order to epitaxially grow a monocrystalline oxide layer overlying the monocrystalline substrate, the native oxide layer must first be removed to expose the crystalline structure of the underlying substrate. The following process is preferably carried out by molecular beam epitaxy (MBE). The native oxide can be removed by first thermally depositing a thin layer of strontium in an MBE apparatus. The substrate is then heated to a temperature of about 750° C. to cause the strontium to react with the native silicon oxide layer. The strontium serves to reduce the silicon oxide to leave a silicon oxide-free surface. The resultant surface, which exhibits an ordered 2×1 structure, includes strontium, oxygen, and silicon. The ordered 2×1 structure forms a template for the ordered growth of an overlying layer of a monocrystalline oxide. The template provides the necessary chemical and physical properties to nucleate the crystalline growth of an overlying layer.[0033]
• In accordance with an alternate embodiment of the invention, the native silicon oxide can be converted and the substrate surface can be prepared for the growth of a monocrystalline oxide layer by depositing strontium oxide onto the substrate surface by MBE at a low temperature and by subsequently heating the structure to a temperature of about 750° C. At this temperature a solid state reaction takes place between the strontium oxide and the native silicon oxide causing the reduction of the native silicon oxide and leaving an ordered 2×1 structure with strontium, oxygen, and silicon remaining on the substrate surface. Again, this forms a template for the subsequent growth of an ordered monocrystalline oxide layer.[0034]
• Following the removal of the silicon oxide from the surface of the substrate, in accordance with one embodiment of the invention, the substrate is cooled to a temperature in the range of about 400-600° C. and a layer of strontium titanate is grown on the template layer by molecular beam epitaxy. The MBE process is initiated by opening shutters in the MBE apparatus to expose strontium, titanium and oxygen sources. The ratio of strontium and titanium is approximately 1:1. The partial pressure of oxygen is initially set at a minimum value to grow stochiometric strontium titanate at a growth rate of about 0.3-0.5 nm per minute. After initiating growth of the strontium titanate, the partial pressure of oxygen is increased above the initial minimum value. The overpressure of oxygen causes the growth of an amorphous silicon oxide layer at the interface between the underlying substrate and the growing strontium titanate layer. The growth of the silicon oxide layer results from the diffusion of oxygen through the growing strontium titanate layer to the interface where the oxygen reacts with silicon at the surface of the underlying substrate. The strontium titanate grows as an ordered monocrystal with the crystalline orientation rotated by 45° with respect to the ordered 2×1 crystalline structure of the underlying substrate. Strain that otherwise might exist in the strontium titanate layer because of the small mismatch in lattice constant between the silicon substrate and the growing crystal is relieved in the amorphous silicon oxide intermediate layer.[0035]
• After the strontium titanate layer has been grown to the desired thickness, the monocrystalline strontium titanate is capped by a template layer that is conducive to the subsequent growth of an epitaxial layer of a desired compound semiconductor material. For the subsequent growth of a layer of gallium arsenide, the MBE growth of the strontium titanate monocrystalline layer can be capped by terminating the growth with 1-2 monolayers of titanium, 1-2 monolayers of titanium-oxygen or with 1-2 monolayers of strontium-oxygen. Following the formation of this capping layer, arsenic is deposited to form a Ti—As bond, a Ti—O—As bond or a Sr—O—As. Any of these form an appropriate template for deposition and formation of a gallium arsenide monocrystalline layer. Following the formation of the template, gallium is introduced to the reaction with the arsenic and gallium arsenide forms. Alternatively, gallium can be deposited on the capping layer to form a Sr—O—Ga bond, and arsenic is introduced with the gallium to form the GaAs.[0036]
• The structure illustrated in FIG. 2 can be formed by the process discussed above with the addition of an additional buffer layer deposition step. The buffer layer is formed overlying the template layer before the deposition of the monocrystalline compound semiconductor layer. If the buffer layer is a compound semiconductor superlattice, such a superlattice can be deposited, by MBE for example, on the template described above. If instead the buffer layer is a layer of germanium, the process above is modified to cap the strontium titanate monocrystalline layer with a final layer of either strontium or titanium and then by depositing germanium to react with the strontium or titanium. The germanium buffer layer can then be deposited directly on this template.[0037]
• The process described above illustrates a process for forming a semiconductor structure including a silicon substrate, a monocrystalline strontium titanate accommodating buffer layer, and a monocrystalline gallium arsenide compound semiconductor layer by the process of molecular beam epitaxy. The process can also be carried out by the process of chemical vapor deposition (CVD), metal organic chemical vapor deposition (MOCVD), migration enhanced epitaxy (MEE), atomic layer epitaxy (ALE), or the like. Further, by a similar process, other monocrystalline accommodating buffer layers such as alkaline earth metal titanates, zirconates, hafnates, tantalates, vanadates, ruthenates, and niobates, alkaline earth metal tin-based perovskites, lanthanum aluminate, lanthanum scandium oxide, and gadolinium oxide can also be grown. Further, by a similar process such as MBE, other III-V and II-VI monocrystalline compound semiconductor layers can be deposited overlying the monocrystalline oxide accommodating buffer layer.[0038]
• Each of the variations of compound semiconductor materials and monocrystalline oxide accommodating buffer layer uses an appropriate template for initiating the grown of the compound semiconductor layer. For example, if the accommodating buffer layer is alkaline earth metal zirconate, the oxide can be capped by a thin layer of zirconium. The deposition of zirconium can be followed by the deposition of arsenic or phosphorus to react with the zirconium as a precursor to depositing indium gallium arsenide, indium aluminum arsenide, or indium phosphide respectively. Similarly, if the monocrystalline oxide accommodating buffer layer is an alkaline earth metal hafnate, the oxide layer can be capped by a thin layer of hafnium. The deposition of hafnium is followed by the deposition of arsenic or phosphorous to react with the hafnium as a precursor to the growth of an indium gallium arsenide, indium aluminum arsenide, or indium phosphide layer, respectively. In a similar manner, strontium titanate can be capped with a layer of strontium or strontium and oxygen and barium titanate can be capped with a layer of barium or barium and oxygen. Each of these depositions can be followed by the deposition of arsenic or phosphorus to react with the capping material to form a template for the deposition of a compound semiconductor material layer comprising indium gallium arsenide, indium aluminum arsenide, or indium phosphide.[0039]
• FIG. 4 illustrates schematically, in cross section, a[0040]device structure50 in accordance with a further embodiment of the invention.Device structure50 includes amonocrystalline semiconductor substrate52, preferably a monocrystalline silicon wafer.Monocrystalline semiconductor substrate52 includes two regions,53 and54. An electrical semiconductor component generally indicated by the dashedline56 is formed inregion53.Electrical component56 can be a resistor, a capacitor, an active semiconductor component such as a diode or a transistor or an integrated circuit such as a CMOS integrated circuit. For example,electrical semiconductor component56 can be a CMOS integrated circuit configured to perform digital signal processing or another function for which silicon integrated circuits are well suited. The electrical semiconductor component inregion53 can be formed by conventional semiconductor processing as well known and widely practiced in the semiconductor industry. A layer of insulatingmaterial58 such as a layer of silicon dioxide or the like may overlieelectrical semiconductor component56.
• Insulating[0041]material58 and any other layers that may have been formed or deposited during the processing ofsemiconductor component56 inregion53 are removed from the surface ofregion54 to provide a bare silicon surface in that region. As is well known, bare silicon surfaces are highly reactive and a native silicon oxide layer can quickly form on the bare surface. A layer of barium or barium and oxygen is deposited onto the native oxide layer on the surface ofregion54 and is reacted with the oxidized surface to form a first template layer (not shown). In accordance with one embodiment of the invention amonocrystalline oxide layer60 is formed overlying the template layer by a process of molecular beam epitaxy. Reactants including barium, titanium and oxygen are deposited onto the template layer to form the monocrystalline oxide layer. Initially during the deposition the partial pressure of oxygen is kept near the minimum necessary to fully react with the barium and titanium to form monocrystallinebarium titanate layer60. The partial pressure of oxygen is then increased to provide an overpressure of oxygen and to allow oxygen to diffuse through the growing monocrystalline oxide layer. The oxygen diffusing through the barium titanate reacts with silicon at the surface ofregion54 to form anamorphous layer62 of silicon oxide on the second region and at the interface between the silicon substrate and the monocrystalline oxide.
• In accordance with an embodiment of the invention, the step of depositing[0042]monocrystalline oxide layer60 is terminated by depositing asecond template layer64, which can be 1-10 monolayers of titanium, barium, barium and oxygen, or titanium and oxygen. Alayer66 of a monocrystalline compound semiconductor material is then deposited overlying the second template layer by a process of molecular beam epitaxy. The deposition oflayer66 is initiated by depositing a layer of arsenic onto the template. This initial step is followed by depositing gallium and arsenic to form monocrystalline gallium arsenide. Alternatively, strontium can be substituted for barium in the above example.
• In accordance with a further embodiment of the invention, a semiconductor component, generally indicated by a dashed[0043]line68 is formed incompound semiconductor layer66.Semiconductor component68 can be formed by processing steps conventionally used in the fabrication of gallium arsenide or other III-V compound semiconductor material devices.Semiconductor component68 can be any active or passive component, and preferably is a semiconductor laser, light emitting diode, photodetector, heterojunction bipolar transistor (HBT), high frequency MESFET, or other component that utilizes and takes advantage of the physical properties of compound semiconductor materials. A metallic conductor schematically indicated by theline70 can be formed toelectrically couple device68 anddevice56, thus implementing an integrated device that includes at least one component formed in the silicon substrate and one device formed in the monocrystalline compound semiconductor material layer. Althoughillustrative structure50 has been described as a structure formed on asilicon substrate52 and having a barium (or strontium)titanate layer60 and agallium arsenide layer66, similar devices can be fabricated using other substrates, monocrystalline oxide layers and other compound semiconductor layers as described elsewhere in this disclosure.
• FIG. 5 illustrates a[0044]semiconductor structure72 in accordance with a further embodiment of the invention.Structure72 includes amonocrystalline semiconductor substrate74 such as a monocrystalline silicon wafer that includes aregion75 and aregion76. An electrical component schematically illustrated by the dashedline78 is formed inregion75 using conventional silicon device processing techniques commonly used in the semiconductor industry. Using process steps similar to those described above, amonocrystalline oxide layer80 and an intermediate amorphoussilicon oxide layer82 are formedoverlying region76 ofsubstrate74. Atemplate layer84 and subsequently amonocrystalline semiconductor layer86 are formed overlyingmonocrystalline oxide layer80. In accordance with a further embodiment of the invention, an additionalmonocrystalline oxide layer88 is formedoverlying layer86 by process steps similar to those used to formlayer80, and an additionalmonocrystalline semiconductor layer90 is formed overlyingmonocrystalline oxide layer88 by process steps similar to those used to formlayer86. In accordance with one embodiment of the invention, at least one oflayers86 and90 are formed from a compound semiconductor material.
• A semiconductor component generally indicated by a dashed[0045]line92 is formed at least partially inmonocrystalline semiconductor layer86. In accordance with one embodiment of the invention,semiconductor component92 may include a field effect transistor having a gate dielectric formed, in part, bymonocrystalline oxide layer88. In addition,monocrystalline semiconductor layer92 can be used to implement the gate electrode of that field effect transistor. In accordance with one embodiment of the invention,monocrystalline semiconductor layer86 is formed from a group III-V compound andsemiconductor component92 is a radio frequency amplifier that takes advantage of the high mobility characteristic of group III-V component materials. In accordance with yet a further embodiment of the invention, an electrical interconnection schematically illustrated by theline94electrically interconnects component78 andcomponent92.Structure72 thus integrates components that take advantage of the unique properties of the two monocrystalline semiconductor materials.
• By way of more specific examples, other integrated circuits and systems are illustrated in FIGS.[0046]6-18. FIG. 6 includes a simplified block diagram illustrating a portion of a communicatingdevice100 having a signal transceiving means101, anintegrated circuit102, anoutput unit103, and aninput unit104. Examples of the signal transceiving means include an antenna, a modem, or any other means by which information or data can be sent either to or from an external unit. As used herein, transceiving is used to denote that the signal transceiving means may be capable of only receiving, only transmitting, or both receiving and transmitting signals from or to the communicating device. Theoutput unit103 can include a display, a monitor, a speaker, or the like. The input unit can include a microphone, a keyboard, or the like. Note that in alternative embodiments theoutput unit103 andinput unit104 could be replaced by a single unit such as a memory, or the like. The memory can include random access memory or nonvolatile memory, such as a hard disk, a flash memory card or module, or the like.
• An integrated circuit is generally a combination of at least two circuit elements (e.g., transistors, diodes, resistors, capacitors, and the like) inseparably associated on or within a continuous substrate. The[0047]integrated circuit102 includes acompound semiconductor portion1022, abipolar portion1024, and anMOS portion1026. Thecompound semiconductor portion1022 includes electrical components that are formed at least partially within a compound semiconductor material. Transistors and other electrical components within thecompound semiconductor portion1022 are capable of processing signals at radio frequencies of at least approximately 0.8 GHz. In other embodiments, the signals could be at lower or higher frequencies. For example, some materials, such as indium gallium arsenide, are capable of processing signals at radio frequency signals at approximately 27 GHz.
• The[0048]compound semiconductor portion1022 further includes aduplexer10222, a radio frequency-to-baseband converter10224 (demodulating means or demodulating circuit), baseband-to-radio frequency converter10226 (modulating means or modulating circuit), apower amplifier10228, and anisolator10229. Thebipolar portion1024 and theMOS portion1026 typically are formed in a Group IV semiconductive material. Thebipolar portion1024 includes a receivingamplifier10242, an analog-to-digital converter10244, a digital-to-analog converter10246, and a transmittingamplifier10248. TheMOS portion1026 includes a digital signal processing means10262. An example of such means includes any one of the commonly available DSP cores available in the market, such as the Motorola DSP 566xx (from Motorola, Incorporated of Schaumburg, Ill.) and Texas Instruments TMS 320C54x (from Texas Instruments of Dallas, Tex.) families of digital signal processors. This digital signal processing means10262 typically includes complementary MOS (CMOS) transistors and analog-to-digital and digital-to-analog converters. Clearly, other electrical components are present in theintegrated circuit102.
• In one mode of operation, the communicating[0049]device100 receives a signal from an antenna, which is part of the signal transceiving means101. The signal passes through the duplexer10227 to the radio frequency-to-baseband converter10224. The analog data or other information is amplified by receivingamplifier10224 and transmitted to the digital signal processing means10262. After the digital signal processing means10262 has processed the information or other data, the processed information or other data is transmitted to theoutput unit103. If the communicating device is a pager, the output unit can be a display. If the communicating device is a cellular telephone, theoutput unit103 can include a speaker, a display, or both.
• Data or other information can be sent through the communicating[0050]device100 in the opposite direction. The data or other information will come in through theinput unit104. In a cellular telephone, this could include a microphone or a keypad. The information or other data is then processed using the digital signal processing means10262. After processing, the signal is then converted using the digital-to-analog converter10246. The converted signal is amplified by the transmittingamplifier10248. The amplified signal is modulated by the baseband-to-radio frequency converter10226 and further amplified bypower amplifier10228. The amplified RF signal passes through theisolator10229 andduplexer10222 to the antenna.
• Prior art embodiments of the communicating[0051]device100 would have at least two separate integrated circuits: one for thecompound semiconductor portion1022 and one for theMOS portion1026. Thebipolar portion1024 may be on the same integrated circuit as theMOS portion1026 or could be on still another integrated circuit. With an embodiment of the present invention, all three portions can now be formed within a single integrated circuit. Because all of the transistors can reside on a single integrated circuit, the communicating device can be greatly miniaturized and allow for greater portability of a communicating device.
• Attention is now directed to a method for forming exemplary portions of the[0052]integrated circuit102 as illustrated in FIGS.7-11. In FIG. 7, a p-type doped,monocrystalline silicon substrate110 is provided having acompound semiconductor portion1022, abipolar portion1024, and anMOS portion1026. Within the bipolar portion, the monocrystalline silicon substrate is doped to form an N⁺buriedregion1102. A lightly p-type doped epitaxialmonocrystalline silicon layer1104 is then formed over the buriedregion1102 and thesubstrate110. A doping step is then performed to create a lightly n-type dopeddrift region1117 above the N³⁰buriedregion1102. The doping step converts the dopant type of the lightly p-type epitaxial layer within a section of thebipolar region1024 to a lightly n-type monocrystalline silicon region. Afield isolation region1106 is then formed between thebipolar portion1024 and theMOS portion1026. Agate dielectric layer1110 is formed over a portion of theepitaxial layer1104 withinMOS portion1026, and thegate electrode1112 is then formed over thegate dielectric layer1110.Sidewall spacers1115 are formed along vertical sides of thegate electrode1112 andgate dielectric layer1110.
• A p-type dopant is introduced into the[0053]drift region1117 to form an active orintrinsic base region1114. An n-type,deep collector region1108 is then formed within thebipolar portion1024 to allow electrical connection to the buriedregion1102. Selective n-type doping is performed to form N⁺dopedregions1116 and theemitter region1120. N⁺dopedregions1116 are formed withinlayer1104 along adjacent sides of thegate electrode1112 and are source, drain, or source/drain regions for the MOS transistor. The N⁺dopedregions1116 andemitter region1120 have a doping concentration of at least 1E19 atoms per cubic centimeter to allow ohmic contacts to be formed. A p-type doped region is formed to create the inactive orextrinsic base region1118 which is a P⁺doped region (doping concentration of at least 1E19 atoms per cubic centimeter).
• In the embodiment described, several processing steps have been performed but are not illustrated or further described, such as the formation of well regions, threshold adjusting implants, channel punchthrough prevention implants, field punchthrough prevention implants, as well as a variety of masking layers. The formation of the device up to this point in the process is performed using conventional steps. As illustrated, a standard N-channel MOS transistor has been formed within the[0054]MOS region1026, and a vertical NPN bipolar transistor has been formed within thebipolar portion1024. As of this point, no circuitry has been formed within thecompound semiconductor portion1022.
• All of the layers that have been formed during the processing of the bipolar and MOS portions of the integrated circuit are now removed from the surface of[0055]compound semiconductor portion1022. A bare silicon surface is thus provided for the subsequent processing of this portion, for example in the manner set forth above.
• An[0056]accommodating buffer layer124 is then formed over thesubstrate110 as illustrated in FIG. 8. The accommodating buffer layer will form as a monocrystalline layer over the properly prepared (i.e., having the appropriate template layer) bare silicon surface inportion1022. The portion oflayer124 that forms overportions1024 and1026, however, may be polycrystalline or amorphous because it is formed over a material that is not monocrystalline, and therefore, does not nucleate monocrystalline growth. Theaccommodating buffer layer124 typically is a monocrystalline metal oxide or nitride layer and typically has a thickness in a range of approximately 2-100 nanometers. In one particular embodiment, the accommodating buffer layer is approximately 5-15 nm thick. During the formation of the accommodating buffer layer, an amorphousintermediate layer122 is formed along the uppermost silicon surfaces of theintegrated circuit102. This amorphousintermediate layer122 typically includes an oxide of silicon and has a thickness and range of approximately 1-5 nm. In one particular embodiment, the thickness is approximately 2 nm. Following the formation of theaccommodating buffer layer124 and the amorphousintermediate layer122, atemplate layer126 is then formed and has a thickness in a range of approximately one to ten monolayers of a material. In one particular embodiment, the material includes titanium-arsenic, strontium-oxygen-arsenic, or other similar materials as previously described with respect to FIGS.1-5.
• A monocrystalline[0057]compound semiconductor layer132 is then epitaxially grown overlying the monocrystalline portion ofaccommodating buffer layer124 as shown in FIG. 9. The portion oflayer132 that is grown over portions oflayer124 that are not monocrystalline may be polycrystalline or amorphous. The monocrystalline compound semiconductor layer can be formed by a number of methods and typically includes a material such as gallium arsenide, aluminum gallium arsenide, indium phosphide, or other compounds semiconductor materials as previously mentioned. The thickness of the layer is in a range of approximately 1-5,000 nm, and more preferably 100-500 nm. In this particular embodiment, each of the elements within the template layer are also present in theaccommodating buffer layer124, the monocrystallinecompound semiconductor material132, or both. Therefore, the delineation between thetemplate layer126 and its two immediately adjacent layers disappears during processing. Therefore, when a transmission electron microscopy (TEM) photograph is taken, an interface between theaccommodating buffer layer124 and the monocrystallinecompound semiconductor layer132 is seen.
• At this point in time, sections of the[0058]compound semiconductor layer132 and theaccommodating buffer layer124 are removed from portions overlying thebipolar portion1024 and theMOS portion1026 as shown in FIG. 10. After the section is removed, an insulatinglayer142 is then formed over thesubstrate110. The insulatinglayer142 can include a number of materials such as oxides, nitrides, oxynitrides, low-k dielectrics, or the like. As used herein, low-k is a material having a dielectric constant no higher than approximately 3.5. After the insulatinglayer142 has been deposited, it is then polished, removing portions of the insulatinglayer142 that overlie monocrystallinecompound semiconductor layer132.
• A[0059]transistor144 is then formed within the monocrystallinecompound semiconductor portion1022. Agate electrode148 is then formed on the monocrystallinecompound semiconductor layer132.Doped regions146 are then formed within the monocrystallinecompound semiconductor layer132. In this embodiment, thetransistor144 is a metal-semiconductor field-effect transistor (MESFET). If the MESFET is an n-type MESFET, the dopedregions146 and monocrystallinecompound semiconductor layer132 are also n-type doped. If a p-type MESFET were to be formed, then thedoped regions146 and monocrystallinecompound semiconductor layer132 would have just the opposite doping type. The heavier doped (N⁺)regions146 allow ohmic contacts to be made to the monocrystallinecompound semiconductor layer132. At this point in time, the active devices within the integrated circuit have been formed. This particular embodiment includes an n-type MESFET, a vertical NPN bipolar transistor, and a planar n-channel MOS transistor. Many other types of transistors, including P-channel MOS transistors, p-type vertical bipolar transistors, p-type MESFETs, and combinations of vertical and planar transistors, can be used. Also, other electrical components, such as resistors, capacitors, diodes, and the like, may be formed in one or more of theportions1022,1024, and1026.
• Processing continues to form a substantially completed[0060]integrated circuit102 as illustrated in FIG. 11. An insulatinglayer152 is formed over thesubstrate110. The insulatinglayer152 may include an etch-stop or polish-stop region that is not illustrated in the FIG. 11. A second insulatinglayer154 is then formed over the first insulatinglayer152. Portions oflayers154,152,142,124, and122 are removed to define contact openings where the devices are to be interconnected. Interconnect trenches are formed within insulatinglayer154 to provide the lateral connections between the contacts. As illustrated in FIG. 11,interconnect1562 connects a source or drain region of the n-type MESFET withinportion1022 to thedeep collector region1108 of the NPN transistor within thebipolar portion1024. Theemitter region1120 of the NPN transistor is connected to one of the dopedregions1116 of the n-channel MOS transistor within theMOS portion1026. The otherdoped region1116 is electrically connected to other portions of the integrated circuit that are not shown.
• A[0061]passivation layer156 is formed over theinterconnects1562,1564, and1566 and insulatinglayer154. Other electrical connections are made to the transistors as illustrated as well as to other electrical or electronic components within theintegrated circuit102 but are not illustrated in the figures. Further, additional insulating layers and interconnects may be formed as necessary to form the proper interconnections between the various components within theintegrated circuit102.
• As can be seen from the previous embodiment, active devices for both compound semiconductor and Group IV semiconductor materials can be integrated into a single integrated circuit. Because there is some difficulty in incorporating both bipolar transistors and MOS transistors within a same integrated circuit, it may be possible to move some of the components within bipolar portion into the[0062]compound semiconductor portion1022 or theMOS portion1024. More specifically, turning to the embodiment as described with respect to FIG. 6, theamplifiers10248 and10242 may be moved over to thecompound semiconductor portion1022, and theconverters10244 and10246 can be moved over into theMOS portion1026. Therefore, the requirement of special fabricating steps solely used for making a bipolar transistor can be eliminated. Therefore, there would only be a compound semiconductor portion and a MOS portion to the integrated circuit.
• In still another embodiment, an integrated circuit can be formed such that it includes an optical laser in a compound semiconductor portion and an optical interconnect (waveguide) to an MOS transistor within a Group IV semiconductor region of the same integrated circuit. FIGS.[0063]12-18 include illustrations of one embodiment.
• FIG. 12 includes an illustration of a cross-section view of a portion of an integrated circuit[0064]160 that includes amonocrystalline silicon wafer161. An amorphousintermediate layer162 and anaccommodating buffer layer164, similar to those previously described, have been formed overwafer161. In this specific embodiment, the layers needed to form the optical laser will be formed first, followed by the layers needed for the MOS transistor. In FIG. 12, thelower mirror layer166 includes alternating layers of compound semiconductor materials. For example, the first, third, and fifth films within the optical laser may include a material such as gallium arsenide, and the second, fourth, and sixth films within thelower mirror layer166 may include aluminum gallium arsenide or vice versa.Layer168 includes the active region that will be used for photon generation.Upper mirror layer170 is formed in a similar manner to thelower mirror layer166 and includes alternating films of compound semiconductor materials. In one particular embodiment, theupper mirror layer170 may be p-type doped compound semiconductor materials, and thelower mirror layer166 may be n-type doped compound semiconductor materials.
• Another[0065]accommodating buffer layer172, similar to theaccommodating buffer layer164, is formed over theupper mirror layer170. In an alternative embodiment, the accommodating buffer layers164 and172 may include different materials. However, their function is essentially the same in that each is used for making a transition between a compound semiconductor layer and a monocrystalline Group IV semiconductor layer. A monocrystalline GroupIV semiconductor layer174 is formed over theaccommodating buffer layer172. In one particular embodiment, the monocrystalline GroupIV semiconductor layer174 includes germanium, silicon germanium, silicon germanium carbide, or the like.
• In FIG. 13, the MOS portion is processed to form electrical components within this upper monocrystalline Group[0066]IV semiconductor layer174. As illustrated in FIG. 13, afield isolation region171 is formed from a portion oflayer174. Agate dielectric layer173 is formed over thelayer174, and agate electrode175 is formed over thegate dielectric layer173.Doped regions177 are source, drain, or source/drain regions for thetransistor181, as shown.Sidewall spacers179 are formed adjacent to the vertical sides of thegate electrode175. Other components can be made within at least a part oflayer174. These other components include other transistors (n-channel or p-channel), capacitors, transistors, diodes, and the like.
• A monocrystalline Group IV semiconductor layer is epitaxially grown over one of the doped[0067]regions177. Anupper portion184 is P+ doped, and alower portion182 remains substantially intrinsic (undoped) as illustrated in FIG. 13. The layer can be formed using a selective epitaxial process. In one embodiment, an insulating layer (not shown) is formed over thetransistor181 and thefield isolation region171. The insulating layer is patterned to define an opening that exposes one of the dopedregions177. At least initially, the selective epitaxial layer is formed without dopants. The entire selective epitaxial layer may be intrinsic, or a p-type dopant can be added near the end of the formation of the selective epitaxial layer. If the selective epitaxial layer is intrinsic, as formed, a doping step may be formed by implantation or by furnace doping. Regardless how the P+upper portion184 is formed, the insulating layer is then removed to form the resulting structure shown in FIG. 13.
• The next set of steps is performed to define the[0068]optical laser180 as illustrated in FIG. 14. Thefield isolation region171 and theaccommodating buffer layer172 are removed over the compound semiconductor portion of the integrated circuit. Additional steps are performed to define theupper mirror layer170 andactive layer168 of theoptical laser180. The sides of theupper mirror layer170 andactive layer168 are substantially coterminous.
• [0069]Contacts186 and188 are formed for making electrical contact to theupper mirror layer170 and thelower mirror layer166, respectively, as shown in FIG. 14. Contact186 has an annular shape to allow light (photons) to pass out of theupper mirror layer170 into a subsequently formed optical waveguide.
• An insulating[0070]layer190 is then formed and patterned to define optical openings extending to thecontact layer186 and one of the dopedregions177 as shown in FIG. 15. The insulating material can be any number of different materials, including an oxide, nitride, oxynitride, low-k dielectric, or any combination thereof. After defining theopenings192, a higherrefractive index material202 is then formed within the openings to fill them and to deposit the layer over the insulatinglayer190 as illustrated in FIG. 16. With respect to the higherrefractive index material202, “higher” is in relation to the material of the insulating layer190 (i.e.,material202 has a higher refractive index compared to the insulating layer190). Optionally, a relatively thin lower refractive index film (not shown) could be formed before forming the higherrefractive index material202. Ahard mask layer204 is then formed over the highrefractive index layer202. Portions of thehard mask layer204, and highrefractive index layer202 are removed from portions overlying the opening and to areas closer to the sides of FIG. 16.
• The balance of the formation of the optical waveguide, which is an optical interconnect, is completed as illustrated in FIG. 17. A deposition procedure (possibly a dep-etch process) is performed to effectively create[0071]sidewalls sections212. In this embodiment, thesidewall sections212 are made of the same material asmaterial202. Thehard mask layer204 is then removed, and a low refractive index layer214 (low relative tomaterial202 and layer212) is formed over the higherrefractive index material212 and202 and exposed portions of the insulatinglayer190. The dash lines in FIG. 17 illustrate the border between the highrefractive index materials202 and212. This designation is used to identify that both are made of the same material but are formed at different times.
• Processing is continued to form a substantially completed integrated circuit as illustrated in FIG. 18. A[0072]passivation layer220 is then formed over theoptical laser180 andMOSFET transistor181. Although not shown, other electrical or optical connections are made to the components within the integrated circuit but are not illustrated in FIG. 18. These interconnects can include other optical waveguides or may include metallic interconnects.
• In other embodiments, other types of lasers can be formed. For example, another type of laser can emit light (photons) horizontally instead of vertically. If light is emitted horizontally, the MOSFET transistor could be formed within the[0073]substrate161, and the optical waveguide would be reconfigured, so that the laser is properly coupled (optically connected) to the transistor. In one specific embodiment, the optical waveguide can include at least a portion of the accommodating Duffer layer. Other configurations are possible.
• Clearly, these embodiments of integrated circuits having compound semiconductor portions and Group IV semiconductor portions, are meant to illustrate embodiments of the present invention and not limit the present invention. There are multiplicity of other combinations and other embodiments of the present invention. For example, the compound semiconductor portion may include light emitting diodes, photodetectors, diodes, or the like, and the Group IV semiconductor can include digital logic, memory arrays, and most structures that can be formed in conventional MOS integrated circuits. By using embodiments of the present invention, it is now simpler to integrate devices that work better in compound semiconductor materials with other components that work better in Group IV semiconductor materials. This allows a device to be shrunk, the manufacturing costs to decrease, and yield and reliability to increase.[0074]
• Although not illustrated, a monocrystalline Group IV wafer can be used in forming only compound semiconductor electrical components over the wafer. In this manner, the wafer is essentially a “handle” wafer used during the fabrication of the compound semiconductor electrical components within a monocrystalline compound semiconductor layer overlying the wafer. Therefore, electrical components can be formed within III-V or II-VI semiconductor materials over a wafer of at least approximately 200 millimeters in diameter and possibly at least approximately 300 millimeters.[0075]
• By the use of this type of substrate, a relatively inexpensive “handle” wafer overcomes the fragile nature of the compound semiconductor wafers by placing them over a relatively more durable and easy to fabricate base material. Therefore, an integrated circuit can be formed such that all electrical components, and particularly all active electronic devices, can be formed within the compound semiconductor material even though the substrate itself may include a Group IV semiconductor material. Fabrication costs for compound semiconductor device should decrease because larger substrates can be processed more economically and more readily compared to the relatively smaller and more fragile, conventional compound semiconductor wafers.[0076]
• In the foregoing specification, the invention has been described with reference to specific embodiments. However, one of ordinary skill in the art appreciates that various modifications and changes can be made without departing from the scope of the present invention as set forth in the claims below. Accordingly, the specification and figures are to be regarded in an illustrative rather than a restrictive sense, and all such modifications are intended to be included within the scope of present invention.[0077]
• Benefits, other advantages, and solutions to problems have been described above with regard to specific embodiments. However, the benefits, advantages, solutions to problems, and any element(s) that may cause any benefit, advantage, or solution to occur or become more pronounced are not to be construed as a critical, required, or essential feature or element of any or all the claims. As used herein, the terms “comprises,” “comprising,” or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.[0078]

Claims (143)

1. A semiconductor structure comprising:

a monocrystalline oxide material; and

a monocrystalline compound semiconductor material of first type formed overlying the monocrystalline oxide material.

2. The semiconductor structure ofclaim 1 further comprising a template layer formed between the monocrystalline oxide material and the monocrystalline compound semiconductor material of first type.

3. The semiconductor structure ofclaim 1 further comprising a buffer layer of monocrystalline semiconductor material of second type formed between the monocrystalline oxide material and the monocrystalline compound semiconductor material of first type.

4. The semiconductor structure ofclaim 3 further comprising a template layer formed between the monocrystalline oxide material and the buffer layer of monocrystalline semiconductor material of second type.

5. The semiconductor structure ofclaim 3 wherein the buffer layer comprises a monocrystalline semiconductor material selected from the group consisting of:

Germanium, a GaAs_xP_1−xsuperlattice, an In_yGa_1−yP superlattice, and an InGaAs superlattice.

6. The semiconductor structure ofclaim 1 wherein the monocrystalline oxide material comprises an oxide selected from the group consisting of alkaline earth metal titanates, alkaline earth metal zirconates, alkaline earth metal hafnates, alkaline earth metal tantalates, alkaline earth metal ruthenates, alkaline earth metal niobates, alkaline earth metal vanadates, alkaline earth metal tin based perovskites, lanthanum aluminate, lanthanum scandium oxide and gadolinium oxide.

7. The semiconductor structure ofclaim 1 wherein the monocrystalline oxide material comprises Sr_zBa_1−zTiO₃wherein z ranges from 0 to 1.

8. The semiconductor structure ofclaim 1 wherein the monocrystalline oxide material comprises a perovskite oxide.

9. The semiconductor structure ofclaim 1 wherein the monocrystalline compound semiconductor material comprises a material selected from the group consisting of: III-V compounds, mixed III-V compounds, II-VI compounds, and mixed II-VI compounds.

10. The semiconductor structure ofclaim 1 wherein the monocrystalline compound semiconductor material comprises a material selected from the group consisting of: GaAs, AlGaAs, InP, InGaAs, InGaP, ZnSe, AlInAs, CdS, CdHgTe, and ZnSeS.

11. A semiconductor structure comprising:

a monocrystalline oxide material having a first characteristic; and

a monocrystalline compound semiconductor material having a second characteristic grown on the monocrystalline oxide material; and

wherein the first and second characteristics relate to each other in a manner selected from the group consisting of:

the first and second characteristics are lattice constants and the first and second characteristics are substantially matched; and

the first and second characteristics are related to crystal orientation of the monocrystalline oxide material and the monocrystalline compound semiconductor material and wherein the crystal orientations are rotated with respect to each other.

12. The semiconductor structure ofclaim 11 wherein the monocrystalline compound semiconductor material comprises a material selected from the group consisting of: GaAs, AlGaAs, InP, InGaAs, InGaP, ZnSe, and ZnSeS.

13. The semiconductor structure ofclaim 11 wherein the monocrystalline oxide material comprises an oxide selected from the group consisting of alkaline earth metal titanates, alkaline earth metal zirconates, alkaline earth metal hafnates, alkaline earth metal tantalates, alkaline earth metal ruthenates, alkaline earth metal niobates, alkaline earth metal vanadates, alkaline earth metal tin based perovskites, lanthanum aluminate, lanthanum scandium oxide and gadolinium oxide.

14. The semiconductor structure ofclaim 11 wherein the monocrystalline oxide material comprises Sr_zBa_1−zTiO₃wherein z ranges from 0 to 1.

15. The semiconductor structure ofclaim 11 wherein the crystal orientations are rotated by 45 degrees with respect to each other.

16. A semiconductor structure comprising:

a monocrystalline semiconductor substrate;

an amorphous layer overlying the monocrystalline semiconductor substrate;

a monocrystalline oxide layer overlying the amorphous layer; and

a monocrystalline compound semiconductor layer overlying the monocrystalline oxide layer.

17. The semiconductor structure ofclaim 16 wherein the monocrystalline semiconductor substrate comprises a layer of a material comprising silicon.

18. The semiconductor structure ofclaim 17 wherein the amorphous layer comprises a silicon oxide.

19. The semiconductor structure ofclaim 16 further comprising a template layer between the monocrystalline oxide layer and the monocrystalline compound semiconductor layer.

20. The semiconductor structure ofclaim 19 further comprising a buffer layer between the template layer and the monocrystalline compound semiconductor layer.

21. The semiconductor structure ofclaim 16 further comprising a buffer layer between the monocrystalline oxide layer and the monocrystalline compound semiconductor layer.

22. The semiconductor structure ofclaim 21 wherein the buffer layer comprises a layer of semiconductor material.

23. The semiconductor structure ofclaim 16 wherein the monocrystalline oxide material comprises Sr_zBa_1−zTiO₃wherein z ranges from 0 to 1.

24. The semiconductor structure ofclaim 16 wherein the monocrystalline compound semiconductor material comprises a material selected from the group consisting of: GaAs, AlGaAs, InP, InGaAs, InGaP, ZnSe, and ZnSeS.

25. A semiconductor structure comprising:

a monocrystalline substrate characterized by a first lattice constant;

a monocrystalline insulator layer having a second lattice constant different than the first lattice constant overlying the monocrystalline substrate; and

a monocrystalline compound semiconductor layer having a third lattice constant different than the first lattice constant overlying the monocrystalline insulator layer.

26. The semiconductor structure ofclaim 25 wherein the third lattice constant is different from the second lattice constant.

27. The semiconductor structure ofclaim 25 further comprising an amorphous oxide layer between the monocrystalline substrate and the monocrystalline insulator layer.

28. The semiconductor structure ofclaim 27 wherein the amorphous oxide layer has a thickness sufficient to relieve strain in the monocrystalline insulator layer.

29. The semiconductor structure ofclaim 25 further comprising a template layer between the monocrystalline insulator layer and the monocrystalline compound semiconductor layer.

30. The semiconductor structure ofclaim 25 further comprising a buffer layer between the monocrystalline insulator layer and the monocrystalline compound semiconductor layer.

31. The semiconductor structure ofclaim 25 wherein the monocrystalline substrate is characterized by a first crystalline orientation and the monocrystalline insulator layer is characterized by a second crystalline orientation and wherein the second crystalline orientation is rotated with respect to the first crystalline orientation.

32. The semiconductor structure ofclaim 25 wherein the monocrystalline substrate comprises silicon.

33. The semiconductor structure ofclaim 25 wherein the monocrystalline substrate comprises a material comprising silicon, the monocrystalline insulator comprises an alkaline earth metal titanate and the monocrystalline compound semiconductor material comprises a material selected from the group consisting of: GaAs, AlGaAs, ZnSe, and ZnSeS.

34. The semiconductor structure ofclaim 33 wherein the monocrystalline insulator layer comprises Sr_zBa_1−zTiO₃where z ranges from 0 to 1.

35. The semiconductor structure ofclaim 25 wherein the monocrystalline insulator comprises an oxide selected from the group consisting of alkaline earth metal zirconates, and alkaline earth metal hafnates and the monocrystalline compound semiconductor layer comprises a material selected from the group consisting of: InP and InGaP.

36. A semiconductor structure comprising:

a monocrystalline substrate characterized by a first lattice constant;

a monocrystalline nitride layer having a second lattice constant different than the first lattice constant overlying the monocrystalline substrate; and

a monocrystalline compound semiconductor layer having a third lattice constant different than the first and second lattice constants overlying the monocrystalline nitride layer.

37. The semiconductor structure ofclaim 36 wherein the monocrystalline nitride comprises a material selected from the group consisting of gallium nitride, aluminum nitride and boron nitride.

38. A semiconductor structure comprising:

a first monocrystalline semiconductor substrate comprising silicon and having a first region and a second region;

an intermediate layer comprising a silicon oxide overlying the first region;

a first monocrystalline oxide layer overlying the intermediate layer;

a second monocrystalline semiconductor layer overlying the first monocrystalline oxide layer;

a second monocrystalline oxide layer overlying the second monocrystalline semiconductor layer; and

a third monocrystalline semiconductor layer overlying the second monocrystalline oxide layer and wherein at least one of the second monocrystalline semiconductor layer and the third semiconductor layer comprises a compound semiconductor material.

39. The semiconductor structure ofclaim 38 further comprising a template layer between the first monocrystalline oxide layer and the second monocrystalline semiconductor layer.

40. The semiconductor structure ofclaim 38 further comprising an active semiconductor component positioned at least partially in the second region.

41. The semiconductor structure ofclaim 40 further comprising a second semiconductor component positioned at least partially in the second monocrystalline semiconductor layer.

42. The semiconductor structure ofclaim 41 wherein the second monocrystalline oxide layer comprises a gate dielectric of the second semiconductor component.

43. The semiconductor structure ofclaim 41 further comprising an electrical interconnection between the active semiconductor component and the second semiconductor component.

44. The semiconductor structure ofclaim 41 wherein the second monocrystalline semiconductor layer comprises a group III-V compound and the second semiconductor component comprises a component in a radio frequency amplifier.

45. A semiconductor device comprising:

a first monocrystalline semiconductor layer comprising a first region and a second region;

an electrical semiconductor component positioned at least partially within the first region;

a second monocrystalline compound semiconductor layer overlying the second region; and

a second semiconductor component positioned at least partially within the second monocrystalline compound semiconductor layer.

46. The semiconductor device ofclaim 45 further comprising a monocrystalline oxide layer positioned between the first region and the second monocrystalline compound semiconductor region.

47. The semiconductor device ofclaim 46 further comprising an electrical interconnection between the active semiconductor component and the second semiconductor component.

48. The semiconductor device ofclaim 46 wherein the first monocrystalline semiconductor layer comprises silicon and the monocrystalline oxide layer comprises a material selected from the group consisting of: alkaline earth metal titanates, alkaline earth metal zirconates, and alkaline earth metal hafnates.

49. The semiconductor device ofclaim 45 further comprising an electrical interconnection between the active semiconductor component and the second semiconductor component.

50. A process for fabricating a semiconductor structure comprising the steps of:

providing a monocrystalline semiconductor substrate comprising silicon;

epitaxially growing a monocrystalline oxide layer overlying the monocrystalline substrate;

oxidizing the monocrystalline semiconductor substrate during the step of epitaxially growing to form a silicon oxide layer between the monocrystalline semiconductor substrate and the monocrystalline oxide layer;

epitaxially growing a monocrystalline compound semiconductor layer overlying the monocrystalline oxide layer.

51. The process ofclaim 50 further comprising the step of forming a first template layer on the monocrystalline semiconductor substrate.

52. The process ofclaim 51 wherein the step of providing a monocrystalline semiconductor substrate comprises providing a substrate having a silicon oxide layer on a surface thereof and the step of forming a first template layer comprises the steps of:

depositing a material selected from the group consisting of barium and strontium onto the silicon oxide layer and

heating the substrate to react the material with the silicon oxide.

53. The process ofclaim 51 wherein the step of providing a monocrystalline semiconductor substrate comprises providing a substrate having a silicon oxide layer on a surface thereof and the step of forming a first template layer comprises the steps of:

depositing strontium and oxygen onto the silicon oxide layer and

heating the substrate to react the strontium and oxygen with the silicon oxide.

54. The process ofclaim 50 wherein the step of epitaxially growing a monocrystalline oxide layer comprises the steps of:

heating the substrate to a temperature between about 400° C. and about 600° C.; and

introducing reactants comprising strontium, titanium, and oxygen.

55. The process ofclaim 54 wherein the step of introducing comprises controlling the ratio of strontium to titanium and controlling partial pressure of oxygen.

56. The process ofclaim 55 wherein the step of oxidizing the monocrystalline semiconductor substrate comprises increasing the partial pressure of oxygen above a level necessary for epitaxially growing the monocrystalline oxide layer.

57. The process ofclaim 50 further comprising the step of forming a second template layer overlying the monocrystalline oxide layer.

58. The process ofclaim 57 wherein the step of forming a second template layer comprises the step of capping the monocrystalline oxide layer with a layer comprising a monolayer of a material selected from the group consisting of titanium, titanium and oxygen, strontium, and strontium and oxygen.

59. The process ofclaim 58 wherein the step of epitaxially growing a monocrystalline compound semiconductor layer comprises:

depositing arsenic on the second template layer; and

reacting the arsenic with the material of the second template layer.

60. The process ofclaim 59 wherein the step of epitaxially growing a monocrystalline compound semiconductor layer further comprises the steps of deposing gallium and arsenic after the step of reacting.

61. The process ofclaim 57 further comprising the step of forming a buffer layer overlying the second template layer.

62. The process ofclaim 50 further comprising the step of forming a buffer layer overlying the monocrystalline oxide layer.

63. The process ofclaim 62 wherein the process of forming a buffer layer comprises the step of epitaxially depositing a layer of germanium overlying the monocrystalline oxide layer.

64. The process ofclaim 62 wherein the process of forming a buffer layer comprises the step of depositing a superlattice comprising a III-V group compound semiconductor material.

65. The process ofclaim 50 wherein the step of epitaxially growing a monocrystalline oxide layer comprises the step of epitaxially growing an alkaline earth metal titanate.

66. The process ofclaim 65 wherein the step of epitaxially growing a monocrystalline compound semiconductor layer comprises the step of epitaxially growing a layer from the group consisting of the GaAs, AlGaAs, ZnSe, and ZnSSe.

67. The process ofclaim 50 wherein the step of epitaxially growing a monocrystalline oxide layer comprises the step of epitaxially growing an oxide from the group consisting of the alkaline earth metal zirconates and the alkaline earth metal hafnates.

68. The process ofclaim 67 wherein the step of epitaxially growing a monocrystalline compound semiconductor layer comprises the step of epitaxially growing a monocrystalline layer of compound semiconductor material selected from the group consisting of InP and InGaAs.

69. The process ofclaim 68 further comprising the step of forming a second template layer overlying the monocrystalline oxide layer by depositing a layer having a thickness of about 1-10 monolayers of a material selected from the group consisting of Zr—As, Zr—P, Hf—As, Hf—P, Sr—O—As, Sr—O—P, Sr—As, Sr—P, Ba—O—As, Ba—O—P, Ba—As, Sr—Ga—O, Ba—Ga—O, and Ba—P.

70. The process ofclaim 50 wherein the step of epitaxially growing a monocrystalline oxide layer comprises epitaxially growing at a growth rate of about 0.3-0.5 nm per minute.

71. A process for fabricating a semiconductor structure comprising the steps of:

providing a monocrystalline semiconductor substrate;

epitaxially growing a monocrystalline oxide layer overlying the monocrystalline substrate;

oxidizing the monocrystalline semiconductor substrate during the step of epitaxially growing to form a silicon oxide layer between the monocrystalline semiconductor substrate and the monocrystalline oxide layer;

epitaxially growing a monocrystalline compound semiconductor layer overlying the monocrystalline oxide layer.

72. A process for fabricating a semiconductor structure comprising the steps of:

providing a monocrystalline oxide layer having a surface;

forming a template layer on the surface; and

epitaxially growing a monocrystalline compound semiconductor layer overlying the template.

73. The process ofclaim 72 wherein the step of providing a monocrystalline oxide layer comprises providing a monocrystalline oxide layer comprising a material selected from the group consisting of alkaline earth metal titanates, alkaline earth metal zirconates, and alkaline earth metal hafnates.

74. The process ofclaim 72 wherein the step of providing a monocrystalline oxide layer comprises epitaxially growing a monocrystalline oxide layer lattice matched to an underlying monocrystalline silicon substrate.

75. The process ofclaim 72 wherein the step of providing a monocrystalline oxide layer comprises providing an oxide layer comprising Sr_zBa_1−zTiO₃where z ranges from 0 to 1.

76. The process ofclaim 75 wherein the step of forming a template layer comprises capping the oxide layer with 1-10 monolayers of a material selected from Ti, TiO, Sr, and SrO.

77. The process ofclaim 76 wherein the step of epitaxially growing a monocrystalline compound semiconductor layer comprises epitaxially depositing a layer selected from GaAs, AlGaAs, GaAsP, and GaInP.

78. The process ofclaim 76 further comprises the step of depositing a buffer layer overlying the template layer.

79. The process ofclaim 78 wherein the step of depositing a buffer layer comprises epitaxially depositing a superlattice layer of a material selected from GaAs_xP_1−xwhere x ranges from 0 to 1 and In_yGa_1−yP where y ranges from 0 to 1.

80. The process ofclaim 79 wherein the step of epitaxially growing a monocrystalline compound semiconductor layer comprises epitaxially depositing a layer selected from GaAs, AlGaAs, GaAsP, GaInAs, InP and GaInP.

81. The process ofclaim 75 wherein the step of forming a template layer comprises capping the monocrystalline oxide layer with 1-10 monolayers of a material selected from Ge—Sr and Ge—Ti.

82. The process ofclaim 81 further comprising the step of epitaxially depositing a buffer layer of germanium.

83. The process ofclaim 75 wherein the step of forming a template layer comprises the steps of:

capping the monocrystalline oxide layer with 1-10 monolayers of ZnO; and

depositing 1-3 monolayers of zinc rich ZnO overlying the monolayers of ZnO.

84. The process ofclaim 83 wherein the step of epitaxially growing a monocrystalline compound semiconductor layer comprises epitaxially growing a layer selected from ZnSe and ZnSeS.

85. The process ofclaim 75 wherein the step of forming a template layer comprises the step of capping the monocrystalline oxide layer with 1-2 monolayers of SrS.

86. The process ofclaim 85 wherein the step of epitaxially growing a monocrystalline compound semiconductor layer comprises epitaxially growing a layer of ZnSeS.

87. The process ofclaim 72 wherein the step of providing a monocrystalline oxide layer comprises providing a monocrystalline oxide layer comprising a material selected from the group consisting of alkaline earth metal zirconates, and alkaline earth metal hafnates.

88. The process ofclaim 87 wherein the process of forming a template layer comprises capping the monocrystalline oxide layer with 1-10 monolayers of a material selected from Zr—As, Zr—P, Hf—As, Hf—P, Sr—As, Sr—O—As, Sr—P, Sr—O—P, Ba—As, Ba—O—As, Ba—P, Sr—Ga—O, Ba—Ga—O, and Ba—O—P.

89. The process ofclaim 88 wherein the step of epitaxially growing a monocrystalline compound semiconductor layer comprises epitaxially growing a layer comprising a material selected from InP and InGaAs.

90. The process ofclaim 89 further comprising a buffer layer comprising a superlattice comprising InGaAs where indium ranges from 0 to about 47% deposited overlying the template.

91. A process for fabricating a semiconductor structure comprising the steps of:

providing a monocrystalline semiconductor substrate;

forming an accommodating buffer layer overlying the monocrystalline semiconductor substrate;

forming an amorphous intermediate layer between the monocrystalline semiconductor substrate and the accommodating buffer layer; and

epitaxially growing a monocrystalline compound semiconductor layer overlying the accommodating buffer layer.

92. The process ofclaim 91 wherein the step of forming an amorphous intermediate layer comprises the step of diffusing oxygen through the accommodating buffer layer to oxidize the monocrystalline semiconductor substrate.

93. The process ofclaim 91 wherein the step of forming an accommodating buffer layer comprises growing an epitaxial layer by a process selected from MBE, MOCVD, MEE, and ALE.

94. The process ofclaim 91 wherein the step of providing a monocrystalline semiconductor substrate comprises providing a monocrystalline silicon substrate having a silicon oxide layer on a surface thereof.

95. The process ofclaim 94 wherein the step of forming an accommodating buffer layer comprises the steps of:

reacting a material selected from Sr and SrO with the silicon oxide layer to form a template on the silicon substrate surface; and

epitaxially deposing a layer comprising Sr_zBa_1−zTiO₃wherein z ranges from 0 to 1 on the template.

96. The process ofclaim 91 further comprising the step of forming a template overlying the accommodating buffer layer prior to the step of epitaxially growing.

97. A process for fabricating a semiconductor structure comprising the steps of:

providing a monocrystalline silicon substrate comprising a first region and a second region, the second region having an oxidized surface;

forming a CMOS circuit in the first region;

depositing a material comprising strontium onto the second region having an oxidized surface and reacting the material with the oxidized surface to form a first template layer;

depositing a monocrystalline oxide layer comprising strontium, titanium and oxygen overlying the first template layer by introducing strontium, titanium, and a partial pressure of oxygen to the template layer;

increasing the partial pressure of oxygen to grow an amorphous layer of silicon oxide on the second region;

terminating the step of depositing a monocrystalline oxide layer by depositing a second template layer comprising a monolayer comprising titanium;

depositing a layer of a monocrystalline compound semiconductor material comprising gallium and arsenic overlying the second template layer;

forming a semiconductor component in the layer of a monocrystalline compound semiconductor material; and

depositing a metallic conductor configured to electrically couple the CMOS circuit and the semiconductor component.

98. A semiconductor structure comprising:

a monocrystalline semiconductor substrate;

a monocrystalline oxide layer comprising Sr_zBa_1−zTiO₃overlying the monocrystalline semiconductor substrate, wherein z ranges from 0 to 1; and

an amorphous layer positioned between the monocrystalline semiconductor substrate and the monocrystalline oxide layer.

99. The semiconductor structure ofclaim 89 wherein the monocrystalline semiconductor substrate comprises a Group IV element.

100. The semiconductor structure ofclaim 98 wherein the monocrystalline oxide layer has a thickness greater than 20 nm.

101. The semiconductor structure ofclaim 98 wherein the amorphous layer comprises silicon oxide and has a thickness sufficient to relieve strain in the monocrystalline oxide layer.

102. The semiconductor structure ofclaim 98 wherein the amorphous layer comprises silicon oxide and has a thickness greater than 1.0 nm.

103. The semiconductor structure ofclaim 98 wherein the amorphous layer comprises silicon oxide and has a thickness of 0.5 to 2.5 nm.

104. A communicating device including an integrated circuit, wherein the integrated circuit comprises:

an accommodating buffer layer;

a compound semiconductor portion overlying the accommodating buffer layer, wherein the compound semiconductor portion includes a feature selected from a group consisting of an amplifier, a modulating circuit, and a demodulating circuit; and

a Group IV semiconductor portion including a digital logic portion coupled to the feature.

105. The communicating device ofclaim 104, wherein the compound semiconductor portion has a crystal orientation that is rotated by approximately 45° with respect to a crystal orientation of the accommodating buffer layer.

106. The communicating device ofclaim 105, wherein:

the integrated circuit further comprises a monocrystalline Group IV substrate underlying the compound semiconductor portion; and

the accommodating buffer layer has a crystal orientation that is rotated by approximately 45° with respect to a crystal orientation of the monocrystalline Group IV substrate.

107. The communicating device ofclaim 106, wherein the accommodating buffer layer and the compound semiconductor portion have a lattice mismatch no greater than approximately 2.0% and a thickness of the compound semiconductor portion is at least approximately 20 nm.

108. The communicating device ofclaim 104, wherein the integrated circuit has a feature selected from a group consisting of:

the accommodating buffer layer has a crystal orientation that is rotated by approximately 45° with respect to a crystal orientation of the compound semiconductor portion; and

the accommodating buffer layer and the compound semiconductor portion have a lattice mismatch no greater than approximately 2.0% and a thickness of the compound semiconductor portion is at least approximately 20 nm.

109. The communicating device ofclaim 104, wherein the integrated circuit further comprises a monocrystalline Group IV substrate underlying the monocrystalline compound semiconductor portion, wherein:

the accommodating buffer layer has a crystal orientation that is rotated by approximately 45° with respect to a crystal orientation of the monocrystalline Group IV substrate; and

the accommodating buffer layer and the compound semiconductor portion have a lattice mismatch no greater than approximately 2.0% and a thickness of the compound semiconductor portion is at least approximately 20 nm.

110. The communicating device ofclaim 104, wherein the accommodating buffer layer and the compound semiconductor portion have a lattice mismatch no greater than approximately 2.0% and a thickness of the compound semiconductor portion is at least approximately 20 nm.

111. A communicating device including:

a signal transceiving means;

an integrated circuit including:

a compound semiconductor portion having an amplifier coupled to the signal transceiving means;

a Group IV semiconductor portion having a digital signal processing means coupled to the amplifier; and

a unit coupled to the integrated circuit.

112. The communicating device ofclaim 111, wherein the communicating device includes a portable telephone.

113. The communicating device ofclaim 111, wherein the communicating device is a cellular telephone.

114. The communicating device ofclaim 111, wherein the Group IV semiconductor portion includes a converter selected from a group selected from a digital-to-analog converter and an analog-to-digital converter, wherein the converter is coupled to the unit.

115. The communicating device ofclaim 111, wherein the unit is selected from a group consisting of keyboard, a microphone, a speaker, a visual display, and a memory means.

116. The communicating device ofclaim 111, wherein:

the Group IV semiconductor portion includes a bipolar portion and a field-effect portion; and

the bipolar portion includes a signal modulating means coupled to the digital signal processing means and the amplifier.

117. The communicating device ofclaim 111, wherein the compound semiconductor portion further includes a signal modulating means.

118. The communicating device ofclaim 111, wherein:

the signal transceiving means includes an antenna;

the amplifier is a Group III-V semiconductor power amplifier;

the integrated circuit includes a bipolar portion having a radio frequency to intermediate frequency mixer coupled to the Group III-V semiconductor power amplifier and the digital signal processing means;

the unit includes a microphone; and

the communicating device further includes a speaker.

119. An integrated circuit comprising:

a monocrystalline Group IV semiconductor substrate;

a compound semiconductor portion including a laser overlying the monocrystalline Group IV semiconductor substrate; and

a Group IV semiconductor portion including an electrical component coupled to the laser, wherein the Group IV semiconductor portion lies within or over the monocrystalline Group IV semiconductor substrate.

120. The integrated circuit ofclaim 119, further comprising a waveguide, wherein the waveguide is coupled to the laser and to the electrical component.

121. The integrated circuit ofclaim 119, wherein the electrical component is a transistor.

122. The integrated circuit ofclaim 119, wherein the Group IV semiconductor portion includes CMOS transistors, of which, the electrical component is one of the CMOS transistors.,

123. The integrated circuit ofclaim 119, further comprising an accommodating buffer layer lying between the monocrystalline Group IV semiconductor substrate and the compound semiconductor portion.

124. The integrated circuit ofclaim 123, further comprising a waveguide, wherein the waveguide is coupled to the laser and the electrical component, and wherein the waveguide comprises at least a portion of the accommodating buffer layer.

125. The integrated circuit ofclaim 123, wherein the compound semiconductor portion has a crystal orientation that is rotated by approximately 45° with respect to a crystal orientation of the accommodating buffer layer.

126. The integrated circuit ofclaim 125, wherein the accommodating buffer layer has a crystal orientation that is rotated by approximately 45° with respect to a crystal orientation of the monocrystalline Group IV semiconductor substrate.

127. The integrated circuit ofclaim 123, wherein the integrated circuit has a feature selected from a group consisting of:

the accommodating buffer layer has a crystal orientation that is rotated by approximately 45° with respect to a crystal orientation of the monocrystalline Group IV semiconductor substrate; and

the accommodating buffer layer and the compound semiconductor portion have a lattice mismatch no greater than approximately 2.0% and a thickness of the compound semiconductor portion is at least approximately 20 nm.

128. The integrated circuit ofclaim 123, wherein:

the accommodating buffer layer has a crystal orientation that is rotated by approximately 45° with respect to a crystal orientation of the monocrystalline Group IV semiconductor substrate; and

the accommodating buffer layer and the compound semiconductor portion have a lattice mismatch no greater than approximately 2.0% and a thickness of the compound semiconductor portion is at least approximately 20 nm.

129. The integrated circuit ofclaim 123, wherein the accommodating buffer layer and the compound semiconductor portion have a lattice mismatch no greater than approximately 2.0% and a thickness of the compound semiconductor portion is at least approximately 20 nm.

130. An integrated circuit comprising:

a first accommodating buffer layer;

a first monocrystalline semiconductor layer overlying the first accommodating buffer layer;

a second accommodating buffer layer overlying the first monocrystalline semiconductor layer; and

a second monocrystalline semiconductor layer overlying the second accommodating buffer layer.

131. The integrated circuit ofclaim 130, wherein:

one of the first and second monocrystalline semiconductor layers is a monocrystalline compound semiconductor layer; and

the other of the first and second monocrystalline semiconductor layers is a monocrystalline Group IV semiconductor layer.

132. The integrated circuit ofclaim 130, wherein:

the first monocrystalline semiconductor layer has a crystal orientation that is rotated by approximately 45° with respect to a crystal orientation of the first accommodating buffer layer;

the second accommodating buffer layer has a crystal orientation that is rotated by approximately 45° with respect to a crystal orientation of the first monocrystalline semiconductor layer; and

the second monocrystalline semiconductor layer has a crystal orientation that is rotated by approximately 45° with respect to a crystal orientation of the second accommodating buffer layer.

133. The integrated circuit ofclaim 130, wherein:

the first accommodating buffer layer and the first monocrystalline semiconductor layer have a lattice mismatch no greater than approximately 2.0% and a thickness of the first monocrystalline semiconductor layer is at least approximately 20 nm; and

the second accommodating buffer layer and the second monocrystalline semiconductor layer have a lattice mismatch no greater than approximately 2.0% and a thickness of the second monocrystalline semiconductor layer is at least approximately 20 nm.

134. The integrated circuit ofclaim 130, further comprising a monocrystalline Group IV substrate underlying the first accommodating buffer layer.

135. An integrated circuit comprising:

an accommodating buffer layer; and

active devices, wherein all the active devices lie at least partially within or over a monocrystalline compound semiconductor layer that overlies the accommodating buffer layer.

136. The integrated circuit ofclaim 135, wherein:

the integrated circuit includes electronic components;

the electronic components include the active devices active and at least one other component; and

all the electronic components lie at least partially within or over a monocrystalline compound semiconductor layer that overlies the accommodating buffer layer.

137. The integrated circuit ofclaim 135, wherein the compound semiconductor layer has a crystal orientation that is rotated by approximately 45° with respect to a crystal orientation of the accommodating buffer layer.

138. The integrated circuit ofclaim 135, further comprising a monocrystalline Group IV semiconductor substrate that underlies the accommodating buffer layer.

139. The integrated circuit ofclaim 138, wherein the monocrystalline Group IV semiconductor substrate that is at least approximately 300 millimeters wide.

140. The integrated circuit ofclaim 138, wherein the accommodating buffer layer has a crystal orientation that is rotated by approximately 45° with respect to a crystal orientation of the monocrystalline Group IV semiconductor substrate.

141. The integrated circuit ofclaim 138, wherein the integrated circuit has a feature selected from a group consisting of:

the accommodating buffer layer has a crystal orientation that is rotated by approximately 45° with respect to a crystal orientation of the monocrystalline Group IV semiconductor substrate; and

the accommodating buffer layer and the monocrystalline Group IV semiconductor substrate have a lattice mismatch no greater than approximately 2.0% and a thickness of the accommodating buffer layer is at least approximately 20 nm.

142. The integrated circuit ofclaim 138, wherein:

the accommodating buffer layer has a crystal orientation that is rotated by approximately 45° with respect to a crystal orientation of the monocrystalline Group IV semiconductor substrate; and

the accommodating buffer layer and the monocrystalline Group IV semiconductor substrate have a lattice mismatch no greater than approximately 2.0% and a thickness of the accommodating buffer layer is at least approximately 20 nm.

143. The integrated circuit ofclaim 135, wherein the accommodating buffer layer and the monocrystalline compound semiconductor layer have a lattice mismatch no greater than approximately 2.0% and a thickness of the monocrystalline compound semiconductor layer is at least approximately 20 nm.

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