US20010044203A1 - Surface treatment of low-k siof to prevent metal interaction - Google Patents
Surface treatment of low-k siof to prevent metal interactionDownload PDFInfo
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- US20010044203A1 US20010044203A1US09/443,376US44337699AUS2001044203A1US 20010044203 A1US20010044203 A1US 20010044203A1US 44337699 AUS44337699 AUS 44337699AUS 2001044203 A1US2001044203 A1US 2001044203A1
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
- H01L21/0214—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC the material being a silicon oxynitride, e.g. SiON or SiON:H
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- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
- H01L21/02318—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment
- H01L21/02321—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment introduction of substances into an already existing insulating layer
- H01L21/02329—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment introduction of substances into an already existing insulating layer introduction of nitrogen
- H01L21/02332—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment introduction of substances into an already existing insulating layer introduction of nitrogen into an oxide layer, e.g. changing SiO to SiON
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- H01L21/02337—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to a gas or vapour
- H01L21/0234—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to a gas or vapour treatment by exposure to a plasma
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- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
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- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
- H01L21/02131—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC the material being halogen doped silicon oxides, e.g. FSG
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- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/0217—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon nitride not containing oxygen, e.g. SixNy or SixByNz
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- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
- H01L21/02208—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si
- H01L21/02211—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound being a silane, e.g. disilane, methylsilane or chlorosilane
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- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
- H01L21/02274—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition in the presence of a plasma [PECVD]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10S257/00—Active solid-state devices, e.g. transistors, solid-state diodes
- Y10S257/915—Active solid-state devices, e.g. transistors, solid-state diodes with titanium nitride portion or region
Definitions
- the present inventionrelates generally to the field of semiconductor chip processing, and more particularly, to the processing for an interlayer dielectric.
- Fluorinated SiO 2(typically PECVD or HDP) can be used to lower the dielectric constant of SiO 2 from, for example, 4.0 to 3.6-3.8.
- the lowering of the dielectric constantis advantageous for a number of reasons, including to reduce the capacitance of the semiconductor device and thereby increase its performance.
- fluorine in SiO 2will react with PVD barrier metals (Ti, TiN, Ta, TaN, Al, Cu, etc.) which are subsequently deposited on the surface of the fluorinated SiO 2 .
- PVD barrier metalsTi, TiN, Ta, TaN, Al, Cu, etc.
- the present inventioncomprises, in one aspect, a method for using low dielectric SiOF in a process to manufacture semiconductor products, comprising the steps of obtaining a layer of SiOF; and depleting the fluorine from a surface of the SiOF layer.
- the depleting stepcomprises the step of treating the surface of the layer of SiOF with a plasma containing hydrogen to yield a treated surface.
- the methodcomprises the step of passivating the treated surface.
- the passivating stepcomprises the step of applying substantially pure nitrogen plasma to the treated surface.
- the nitrogen plasmais applied at a lower plasma bias power and a higher pressure than the hydrogen-containing plasma used in the treating step.
- the treating stepis carried out in a CVD deposition chamber.
- the depleting stepforms a depletion layer that is greater than or equal to 30 Angstroms in thickness.
- the passivating stepcomprises the step of forming a passivation layer that is less than or equal to 25 Angstroms in thickness.
- a method for using low dielectric SiOF in a process to manufacture semiconductor integrated circuit chipscomprising the steps of: obtaining a layer of SiOF; treating in a CVD-TiN deposition chamber a surface of the layer of SiOF with a plasma containing hydrogen to deplete fluorine from the surface; passivating the treated surface with substantially pure N 2 plasma; and depositing a layer of TiN.
- a semiconductor chipcomprising: an integrated circuit with at least a first and second layers, and with a dielectric layer of SiOF disposed between said two layers, wherein the SiOF dielectric layer includes a first region at one edge thereof which is depleted of fluorine to a predetermined depth.
- the predetermined depth of the first regionis greater than or equal to 30 Angstroms.
- the depth of the second regionis less than or equal to 25 Angstroms.
- FIG. 1is a process flow diagram for a method in accordance with the present invention.
- FIG. 2is a cross-section of a select group of layers on a semiconductor chip.
- the present inventionwill be described in its context of use with an interlayer dielectric layer in a conducting layer stack on a semiconductor chip. However, the invention has broad application in any situation where SiOF is utilized as a layer.
- FIG. 1is a process flow diagram for a method in accordance with the present invention.
- FIG. 2illustrates a semiconductor chip 10 in accordance with present invention comprising a bulk substrate and various process layers, designated generally by the numeral 12 .
- a further layer 14 of same typeis then deposited.
- this further layer 14might be a conducting layer such as a metallic layer.
- an SiOF layer 16is shown as being deposited on this layer 14 .
- the SiOF layer 16may be formed, by way of example, but not by way of limitation, by introducing a fluorine species during an SiO 2 PECVD or HDP.
- viasare etched through the SiOF layer 16 . This via etch step is followed by a resist strip step and a solvent clean step, in the well known manner.
- the present inventionthen requires application of a process to deplete the fluorine form the top surface of the SiOF layer 16 to yield a depleted layer 18 having a desired thickness.
- this thickness of the depleted layer 18is equal to or greater than 30 Angstroms.
- the step used to form the depletion layer 16is accomplished by treating the surface of the SiOF layer 16 with a plasma containing hydrogen.
- the plasmamay be pure hydrogen, or it may be a diluted H 2 plasma, for example an H 2 /N 2 plasma.
- the purpose of diluting the hydrogen plasmais to make the hydrogen less volatile.
- the hydrogen in the plasmawill bond with the fluorine atoms to form HF, which, because of its high vapor pressure and low boiling point, will be vaporized and evacuated from the system.
- the hydrogen plasma treatmentis performed in a CVD deposition chamber, such as, for example, an Applied Material CVD deposition chamber.
- the CVD chambermay be the same chamber used to be used to deposit a subsequent conducting layer, such as TiN.
- the CVD chamber for the plasma treatmentshould have a slightly elevated temperature (5-50° C. higher) relative to the temperature used to deposit the subsequent conducting layer. For example, if a temperature falling in the range of 375° C. to 450° C. is to be used to deposit a subsequent conducting layer 22 , then a slightly elevated temperature that is 5° C. to 50° C. higher than the conducting layer CVD deposition temperature is used during the hydrogen plasma treatment step.
- the purpose of the use of this elevated temperatureis to lower the potential that heating during the subsequent conducting layer deposition step will drive the fluorine atoms from the bulk SiOF layer 16 into the fluorine-depleted layer 18 .
- the other parameters for the hydrogen plasma treatment stepwill be determined empirically. Typically, the pressure in the CVD chamber will be in the millitorr to torr range, the energy parameter will be in the several hundred watt range, and plasma treatment time will range from 20 seconds to several minutes. Optimized parameters will be determined based on the desired thickness of the depletion layer 18 .
- the depleted layer 18is then passivated to form a passivation layer 20 which is less than the thickness of layer 18 .
- One purpose of the passivationis to bond non-volatile atoms into the depleted layer 18 to lessen the potential for fluorine atoms from the bulk SiOF layer 16 diffusing up into the depleted layer 18 and thereafter reacting with the conducting layer atoms of the subsequently deposited layer 22 .
- This passivation stepmay be carried out by switching to a pure N 2 plasma in the CVD chamber to form SiON to a thickness that is less than the thickness of the depletion layer 18 .
- the passivation layer 20could have a thickness of 25 Angstroms or less, for example.
- a higher source powerwill be used in the CVD chamber, for example, 300-400 watts, to cause the nitrogen to bond with the SiO surface to yield an SiON dielectric barrier.
- This passivated dielectric barrier layerlessens the potential that fluorine atoms will diffuse up to the surface of layer 16 and react with, for example, a Ti or TiN barrier metal.
- bias poweris different than the plasma power
- a higher pressure conditionshould be used to treat sidewalls and vias in the SiOF layer 16 .
- a bias power of less than 100 wattscould be utilized.
- One purpose for the lower bias poweris to make the plasma less directional so that it will affect the sidewalls.
- the exact thickness of the passivation layer 20may be optimized empirically. Note that a SIMS analysis may be performed to measure the thickness of the depletion layer 18 and the thickness of the passivation layer 20 . Ultimately, optimization is achieved when the depletion and passivation layer thickness are such that it can be assumed that the subsequent layer 22 will not peel off during the remaining process steps for the semiconductor chip.
- a typical device realized using the present invention methodmight have bulk SiOF layer 16 of 8,000 Angstroms to 15,000 Angstroms, with a depletion layer 18 of 50 Angstroms, and a passivation layer 20 of 25 Angstroms.
- a conducting layer 22is deposited.
- an in-situ deposition of optimized CVD-TiNmay accomplished in the previously mentioned CVD chanber using a nitrogen-rich initial layer. This deposition would then be followed by a standard blanket tungsten deposition to form a layer 24 .
- the present inventionis not limited to TiN and Ta. A variety of metals are available to form these conducting layers, including Ti, TiN, Ta, Al, and Cu, for example.
- the present inventionis particularly advantageous when used to form an SiOF inter-metal dielectric layer, it has application in any situation where the fluorine atoms in an SiOF layer are causing interaction and/or adhesion problems with other layers.
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Abstract
Description
- 1. Field of the Invention[0001]
- The present invention relates generally to the field of semiconductor chip processing, and more particularly, to the processing for an interlayer dielectric.[0002]
- 2. Description of the Related Art[0003]
- Fluorinated SiO[0004]2(typically PECVD or HDP) can be used to lower the dielectric constant of SiO2from, for example, 4.0 to 3.6-3.8. The lowering of the dielectric constant is advantageous for a number of reasons, including to reduce the capacitance of the semiconductor device and thereby increase its performance.
- However, fluorine in SiO[0005]2will react with PVD barrier metals (Ti, TiN, Ta, TaN, Al, Cu, etc.) which are subsequently deposited on the surface of the fluorinated SiO2. This reaction between fluorine and the barrier metals will cause delamination on flat SiOF surfaces, as well as inside via holes.
- Briefly, the present invention comprises, in one aspect, a method for using low dielectric SiOF in a process to manufacture semiconductor products, comprising the steps of obtaining a layer of SiOF; and depleting the fluorine from a surface of the SiOF layer.[0006]
- In a further aspect of this inventive method, the depleting step comprises the step of treating the surface of the layer of SiOF with a plasma containing hydrogen to yield a treated surface.[0007]
- In a yet further aspect of the present invention, the method comprises the step of passivating the treated surface.[0008]
- In a further aspect of the present invention, the passivating step comprises the step of applying substantially pure nitrogen plasma to the treated surface.[0009]
- In a yet further aspect of the present invention, the nitrogen plasma is applied at a lower plasma bias power and a higher pressure than the hydrogen-containing plasma used in the treating step.[0010]
- In a further aspect of the present invention, the treating step is carried out in a CVD deposition chamber.[0011]
- In a yet further aspect of the present invention, the depleting step forms a depletion layer that is greater than or equal to 30 Angstroms in thickness.[0012]
- In a further aspect of the present invention, the passivating step comprises the step of forming a passivation layer that is less than or equal to 25 Angstroms in thickness.[0013]
- In a further embodiment of the present invention, a method is provided for using low dielectric SiOF in a process to manufacture semiconductor integrated circuit chips, comprising the steps of: obtaining a layer of SiOF; treating in a CVD-TiN deposition chamber a surface of the layer of SiOF with a plasma containing hydrogen to deplete fluorine from the surface; passivating the treated surface with substantially pure N[0014]2plasma; and depositing a layer of TiN.
- In a yet further embodiment of the present invention, a semiconductor chip is provided comprising: an integrated circuit with at least a first and second layers, and with a dielectric layer of SiOF disposed between said two layers, wherein the SiOF dielectric layer includes a first region at one edge thereof which is depleted of fluorine to a predetermined depth.[0015]
- In a further aspect of this inventive embodiment, the predetermined depth of the first region is greater than or equal to 30 Angstroms.[0016]
- In yet a further aspect of the present invention, the depth of the second region is less than or equal to 25 Angstroms.[0017]
- FIG. 1 is a process flow diagram for a method in accordance with the present invention.[0018]
- FIG. 2 is a cross-section of a select group of layers on a semiconductor chip.[0019]
- The present invention will be described in its context of use with an interlayer dielectric layer in a conducting layer stack on a semiconductor chip. However, the invention has broad application in any situation where SiOF is utilized as a layer.[0020]
- Referring now to the drawings, FIG. 1 is a process flow diagram for a method in accordance with the present invention. FIG. 2 illustrates a[0021]
semiconductor chip 10 in accordance with present invention comprising a bulk substrate and various process layers, designated generally by thenumeral 12. Afurther layer 14 of same type is then deposited. By of example, thisfurther layer 14 might be a conducting layer such as a metallic layer. For purposes of describing the present invention, an SiOFlayer 16 is shown as being deposited on thislayer 14. TheSiOF layer 16 may be formed, by way of example, but not by way of limitation, by introducing a fluorine species during an SiO2PECVD or HDP. Typically, after this SiOF deposition step, vias are etched through theSiOF layer 16. This via etch step is followed by a resist strip step and a solvent clean step, in the well known manner. - The present invention then requires application of a process to deplete the fluorine form the top surface of the[0022]
SiOF layer 16 to yield a depletedlayer 18 having a desired thickness. In a preferred embodiment this thickness of thedepleted layer 18 is equal to or greater than 30 Angstroms. - In a preferred embodiment, the step used to form the[0023]
depletion layer 16 is accomplished by treating the surface of theSiOF layer 16 with a plasma containing hydrogen. For example, the plasma may be pure hydrogen, or it may be a diluted H2plasma, for example an H2/N2plasma. The purpose of diluting the hydrogen plasma is to make the hydrogen less volatile. - The hydrogen in the plasma will bond with the fluorine atoms to form HF, which, because of its high vapor pressure and low boiling point, will be vaporized and evacuated from the system.[0024]
- In a preferred embodiment, the hydrogen plasma treatment is performed in a CVD deposition chamber, such as, for example, an Applied Material CVD deposition chamber. The CVD chamber may be the same chamber used to be used to deposit a subsequent conducting layer, such as TiN. Preferably the CVD chamber for the plasma treatment should have a slightly elevated temperature (5-50° C. higher) relative to the temperature used to deposit the subsequent conducting layer. For example, if a temperature falling in the range of 375° C. to 450° C. is to be used to deposit a subsequent conducting layer[0025]22, then a slightly elevated temperature that is 5° C. to 50° C. higher than the conducting layer CVD deposition temperature is used during the hydrogen plasma treatment step. The purpose of the use of this elevated temperature is to lower the potential that heating during the subsequent conducting layer deposition step will drive the fluorine atoms from the
bulk SiOF layer 16 into the fluorine-depletedlayer 18. - The other parameters for the hydrogen plasma treatment step will be determined empirically. Typically, the pressure in the CVD chamber will be in the millitorr to torr range, the energy parameter will be in the several hundred watt range, and plasma treatment time will range from 20 seconds to several minutes. Optimized parameters will be determined based on the desired thickness of the[0026]
depletion layer 18. - In a preferred embodiment, the[0027]
depleted layer 18 is then passivated to form a passivation layer20 which is less than the thickness oflayer 18. One purpose of the passivation is to bond non-volatile atoms into thedepleted layer 18 to lessen the potential for fluorine atoms from thebulk SiOF layer 16 diffusing up into thedepleted layer 18 and thereafter reacting with the conducting layer atoms of the subsequently deposited layer22. This passivation step may be carried out by switching to a pure N2plasma in the CVD chamber to form SiON to a thickness that is less than the thickness of thedepletion layer 18. For example, the passivation layer20 could have a thickness of 25 Angstroms or less, for example. Typically, a higher source power will be used in the CVD chamber, for example, 300-400 watts, to cause the nitrogen to bond with the SiO surface to yield an SiON dielectric barrier. This passivated dielectric barrier layer lessens the potential that fluorine atoms will diffuse up to the surface oflayer 16 and react with, for example, a Ti or TiN barrier metal. - Note that less bias power (the bias power is different than the plasma power) and a higher pressure condition should be used to treat sidewalls and vias in the[0028]
SiOF layer 16. For example, a bias power of less than 100 watts could be utilized. One purpose for the lower bias power is to make the plasma less directional so that it will affect the sidewalls. - The exact thickness of the passivation layer[0029]20 may be optimized empirically. Note that a SIMS analysis may be performed to measure the thickness of the
depletion layer 18 and the thickness of the passivation layer20. Ultimately, optimization is achieved when the depletion and passivation layer thickness are such that it can be assumed that the subsequent layer22 will not peel off during the remaining process steps for the semiconductor chip. - A typical device realized using the present invention method might have[0030]
bulk SiOF layer 16 of 8,000 Angstroms to 15,000 Angstroms, with adepletion layer 18 of 50 Angstroms, and a passivation layer20 of 25 Angstroms. - Next, a conducting layer[0031]22 is deposited. By way of example, an in-situ deposition of optimized CVD-TiN may accomplished in the previously mentioned CVD chanber using a nitrogen-rich initial layer. This deposition would then be followed by a standard blanket tungsten deposition to form a
layer 24. Note that the present invention is not limited to TiN and Ta. A variety of metals are available to form these conducting layers, including Ti, TiN, Ta, Al, and Cu, for example. - It should be noted that although the present invention is particularly advantageous when used to form an SiOF inter-metal dielectric layer, it has application in any situation where the fluorine atoms in an SiOF layer are causing interaction and/or adhesion problems with other layers.[0032]
- The foregoing description of a preferred embodiment of the invention has been presented for purposes of illustration and description. It is not intended to be exhaustive or to limit the invention to the precise form disclosed, and modifications and variations are possible in light of the above teachings or may be acquired from practice of the invention. The embodiment was chosen and described in order to explain the principles of the invention and its practical application to enable one skilled in the art to utilize the invention in various embodiments and with various modifications as are suited to the particular use contemplated. It is intended that the scope of the invention be defined by the claims appended hereto, and their equivalents.[0033]
Claims (23)
1. A method for using low dielectric SiOF in a process to manufacture semiconductor products, comprising the steps of:
obtaining a layer of SiOF; and
depleting the fluorine from a surface of the SiOF layer.
2. A method as defined in
claim 1
3. A method as defined in
claim 1
4. A method as defined in
claim 3
5. A method as defined in
claim 4
6. A method as defined in
claim 2
7. A method as defined in
claim 6
8. A method as defined in
claim 1
9. A method as defined in
claim 8
10. A method as defined in
claim 6
11. A method as defined in
claim 1
12. A method as defined in
claim 3
13. A method as defined in
claim 3
14. A method for using low dielectric SiOF in a process to manufacture semiconductor integrated circuit chips, comprising the steps of:
obtaining a layer of SiOF;
treating in a CVD-TiN deposition chamber a surface of said layer of SiOF with a plasma containing hydrogen to deplete fluorine from said surface;
passivating said treated surface with substantially pure N2plasma; and
depositing a layer of TiN.
15. A method as defined in
claim 14
16. A semiconductor chip comprising:
an integrated circuit with at least a first and second layers, and with a dielectric layer of SiOF disposed between said two layers, wherein said SiOF dielectric layer includes a first region at one edge thereof which is depleted of fluorine to a predetermined depth.
17. A semiconductor chip as defined in
claim 16
18. A semiconductor chip as defined in
claim 16
19. A semiconductor chip as defined in
claim 16
20. A semiconductor chip as defined in
claim 17
21. A semiconductor chip as defined in
claim 16
22. A semiconductor chip as defined in
claim 18
23. A semiconductor chip as defined in
claim 18
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/443,376US6335273B2 (en) | 1998-09-18 | 1999-11-19 | Surface treatment of low-K SiOF to prevent metal interaction |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/157,240US5994778A (en) | 1998-09-18 | 1998-09-18 | Surface treatment of low-k SiOF to prevent metal interaction |
| US09/443,376US6335273B2 (en) | 1998-09-18 | 1999-11-19 | Surface treatment of low-K SiOF to prevent metal interaction |
Related Parent Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US09/157,240DivisionUS5994778A (en) | 1998-09-18 | 1998-09-18 | Surface treatment of low-k SiOF to prevent metal interaction |
| US09157240Division | 1999-09-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| US20010044203A1true US20010044203A1 (en) | 2001-11-22 |
| US6335273B2 US6335273B2 (en) | 2002-01-01 |
Family
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US09/157,240Expired - LifetimeUS5994778A (en) | 1998-09-18 | 1998-09-18 | Surface treatment of low-k SiOF to prevent metal interaction |
| US09/443,376Expired - LifetimeUS6335273B2 (en) | 1998-09-18 | 1999-11-19 | Surface treatment of low-K SiOF to prevent metal interaction |
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| Application Number | Title | Priority Date | Filing Date |
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| US09/157,240Expired - LifetimeUS5994778A (en) | 1998-09-18 | 1998-09-18 | Surface treatment of low-k SiOF to prevent metal interaction |
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|---|---|---|---|---|
| US6846745B1 (en)* | 2001-08-03 | 2005-01-25 | Novellus Systems, Inc. | High-density plasma process for filling high aspect ratio structures |
| US7067440B1 (en) | 2001-08-24 | 2006-06-27 | Novellus Systems, Inc. | Gap fill for high aspect ratio structures |
| US7122485B1 (en) | 2002-12-09 | 2006-10-17 | Novellus Systems, Inc. | Deposition profile modification through process chemistry |
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| US7211525B1 (en) | 2005-03-16 | 2007-05-01 | Novellus Systems, Inc. | Hydrogen treatment enhanced gap fill |
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| US5753564A (en)* | 1992-11-24 | 1998-05-19 | Sumitomo Metal Industries, Ltd. | Method for forming a thin film of a silicon oxide on a silicon substrate, by BCR plasma |
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| US6042901A (en)* | 1996-02-20 | 2000-03-28 | Lam Research Corporation | Method for depositing fluorine doped silicon dioxide films |
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Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US6846745B1 (en)* | 2001-08-03 | 2005-01-25 | Novellus Systems, Inc. | High-density plasma process for filling high aspect ratio structures |
| US7067440B1 (en) | 2001-08-24 | 2006-06-27 | Novellus Systems, Inc. | Gap fill for high aspect ratio structures |
| US7122485B1 (en) | 2002-12-09 | 2006-10-17 | Novellus Systems, Inc. | Deposition profile modification through process chemistry |
| US7163896B1 (en) | 2003-12-10 | 2007-01-16 | Novellus Systems, Inc. | Biased H2 etch process in deposition-etch-deposition gap fill |
| US7476621B1 (en) | 2003-12-10 | 2009-01-13 | Novellus Systems, Inc. | Halogen-free noble gas assisted H2 plasma etch process in deposition-etch-deposition gap fill |
| US7217658B1 (en) | 2004-09-07 | 2007-05-15 | Novellus Systems, Inc. | Process modulation to prevent structure erosion during gap fill |
| US7176039B1 (en) | 2004-09-21 | 2007-02-13 | Novellus Systems, Inc. | Dynamic modification of gap fill process characteristics |
| US7381451B1 (en) | 2004-11-17 | 2008-06-03 | Novellus Systems, Inc. | Strain engineering—HDP thin film with tensile stress for FEOL and other applications |
| US7211525B1 (en) | 2005-03-16 | 2007-05-01 | Novellus Systems, Inc. | Hydrogen treatment enhanced gap fill |
| US7344996B1 (en) | 2005-06-22 | 2008-03-18 | Novellus Systems, Inc. | Helium-based etch process in deposition-etch-deposition gap fill |
| US7482245B1 (en) | 2006-06-20 | 2009-01-27 | Novellus Systems, Inc. | Stress profile modulation in STI gap fill |
| US8133797B2 (en) | 2008-05-16 | 2012-03-13 | Novellus Systems, Inc. | Protective layer to enable damage free gap fill |
Also Published As
| Publication number | Publication date |
|---|---|
| US6335273B2 (en) | 2002-01-01 |
| US5994778A (en) | 1999-11-30 |
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