US12158612B2 - Evacuated periodic structures and methods of manufacturing - Google Patents

Abstract

Gratings may be used in waveguides. Deep surface relief gratings (SRGs) may offer many advantages over conventional SRGs, an important one being a higher S-diffraction efficiency. Deep SRGs can be implemented as polymer surface relief gratings or evacuated periodic structures (EPSs). EPSs can be formed by first recording a holographic polymer dispersed liquid crystal (HPDLC) periodic structure. Removing the liquid crystal from the cured periodic structure provides a polymer surface relief grating. Polymer surface relief gratings have many applications including for use in waveguide-based displays.

Description

CROSS-REFERENCED APPLICATIONS

This application claims priority to U.S. Provisional Application 63/157,467 filed on Mar. 5, 2021, U.S. Provisional Application 63/174,401 filed on Apr. 13, 2021, and U.S. Provisional Application 63/223,311 filed on Jul. 19, 2021, the disclosures of which are incorporated by reference in their entirety.

FIELD OF THE DISCLOSURE

The present invention generally relates to waveguides and methods for fabricating waveguides and more specifically to waveguide displays containing gratings formed in a multi-component mixture from which one material component is removed and methods for fabricating said gratings.

BACKGROUND

Waveguides can be referred to as structures with the capability of confining and guiding waves (i.e., restricting the spatial region in which waves can propagate). One subclass includes optical waveguides, which are structures that can guide electromagnetic waves, typically those in the visible spectrum. Waveguide structures can be designed to control the propagation path of waves using a number of different mechanisms. For example, planar waveguides can be designed to utilize diffraction gratings to diffract and couple incident light into the waveguide structure such that the in-coupled light can proceed to travel within the planar structure via total internal reflection (TIR).

Fabrication of waveguides can include the use of material systems that allow for the recording of holographic optical elements within or on the surface of the waveguides. One class of such material includes polymer dispersed liquid crystal (PDLC) mixtures, which are mixtures containing photopolymerizable monomers and liquid crystals. A further subclass of such mixtures includes holographic polymer dispersed liquid crystal (HPDLC) mixtures. Holographic optical elements, such as volume phase gratings, can be recorded in such a liquid mixture by illuminating the material with two mutually coherent laser beams. During the recording process, the monomers polymerize, and the mixture undergoes a photopolymerization-induced phase separation, creating regions densely populated by liquid crystal (LC) micro-droplets, interspersed with regions of clear polymer. The alternating liquid crystal-rich and liquid crystal-depleted regions form the fringe planes of the grating.

Waveguide optics, such as those described above, can be considered for a range of display and sensor applications. In many applications, waveguides containing one or more grating layers encoding multiple optical functions can be realized using various waveguide architectures and material systems, enabling new innovations in near-eye displays for Augmented Reality (AR) and Virtual Reality (VR), compact Heads Up Displays (HUDs) for aviation and road transport, and sensors for biometric and laser radar (LIDAR) applications. As many of these applications are directed at consumer products, there is a growing requirement for efficient low cost means for manufacturing holographic waveguides in large volumes.

SUMMARY OF THE DISCLOSURE

Many embodiments are directed to polymer grating structures, their design, methods of manufacture, and materials.

Various embodiments are directed to a method for fabricating a periodic structure, the method including: providing a holographic mixture on a base substrate; sandwiching the holographic mixture between the base substrate and a cover substrate, where the holographic mixture forms a holographic mixture layer on the base substrate; applying holographic recording beams to the holographic mixture layer to form a holographic polymer dispersed liquid crystal periodic structure comprising alternating polymer rich regions and liquid crystal rich regions; and removing the cover substrate from the holographic polymer dispersed liquid crystal periodic structure, wherein the cover substrate has different properties than the base substrate to allow for the cover substrate to adhere to the unexposed holographic mixture layer while capable of being removed from the formed holographic polymer dispersed liquid crystal periodic structure after exposure.

Further, various embodiments are directed to a method for fabricating periodic structures, the method including: providing a first holographic mixture on a first base substrate; sandwiching the first holographic mixture between the first base substrate and a cover substrate, where the first holographic mixture forms a first holographic mixture layer on the first base substrate; applying holographic recording beams to the first holographic mixture layer to form a first holographic polymer dispersed liquid crystal periodic structure comprising alternating polymer rich regions and liquid crystal rich regions; removing the cover substrate from the holographic polymer dispersed liquid crystal periodic structure; providing a second holographic mixture on a second base substrate; sandwiching the second holographic mixture between the second base substrate and the cover substrate, wherein the second holographic mixture forms a second holographic mixture layer on the second base substrate; and applying holographic recording beams to the second holographic mixture layer to form a second holographic polymer dispersed liquid crystal periodic structure comprising alternating polymer rich regions and liquid crystal rich regions.

Further, various embodiments are directed to a device for fabricating a deep surface relief grating (SRG) including: a holographic mixture sandwiched between a base substrate and a cover substrate, where the holographic mixture is configured to form a holographic polymer dispersed liquid crystal grating comprising alternating polymer rich regions and liquid crystal rich regions when exposed to holographic recording beams, and where the base substrate and the cover substrate have different properties to allow the cover substrate to adhere to the unexposed holographic mixture layer while capable of being removed from the formed holographic polymer dispersed liquid crystal grating after exposure.

Further, various embodiments are directed to a waveguide device including: a waveguide supporting a polymer grating structure for diffracting light propagating in total internal reflection in said waveguide, where the polymer grating structure includes: a polymer regions; air gaps between adjacent portions of the polymer regions; and a coating disposed on the tops of the polymer regions and the tops of the waveguide.

Further, various embodiments are directed to a waveguide device including: a waveguide supporting a polymer grating structure for diffracting light propagating in total internal reflection in said waveguide, where the polymer grating structure includes: a polymer regions; air gaps between adjacent portions of the polymer regions; an optical layer disposed between the polymer regions and the waveguide; and a coating disposed on the tops of the polymer regions and the tops of the optical layer.

Further, various embodiments are directed to a waveguide device including: a waveguide supporting a polymer grating structure for diffracting light propagating in total internal reflection in said waveguide, where the polymer grating structure includes: a polymer regions; air gaps between adjacent portions of the polymer regions; and an optical layer disposed between the polymer regions and the waveguide.

Further, various embodiments are directed to a waveguide device including: a waveguide supporting a polymer grating structure for diffracting light propagating in total internal reflection in said waveguide, where the polymer grating structure includes: a polymer regions; and air gaps between adjacent portions of the polymer regions, where the polymer regions and air gaps directly contact the waveguide.

Further, various embodiments are directed to a method for fabricating a grating, the method including: providing a mixture of monomer and a nonreactive material; providing a substrate; coating a layer of the mixture on a surface of the substrate; applying holographic recording beams to the layer to form a holographic polymer dispersed grating including alternating polymer rich regions and nonreactive material rich regions; removing at least a portion of the nonreactive material in the nonreactive material rich regions to form a polymer surface relief grating including alternating polymer regions and air regions; and applying a coating to the top surfaces of the polymer regions and the top surfaces of the substrate in the air regions.

Further, various embodiments are directed to a method for fabricating a grating, the method including: providing a mixture of monomer and a nonreactive material; providing a substrate; coating a layer of the mixture on a surface of the substrate; applying holographic recording beams to the layer to form a holographic polymer dispersed grating including alternating polymer rich regions and nonreactive material rich regions; removing at least a portion of the nonreactive material in the nonreactive material rich regions to form a polymer surface relief grating including alternating polymer regions and air regions, wherein an optical layer is disposed between the polymer regions and the substrate; and applying a coating to the top surfaces of the polymer regions and the top surfaces of the optical layer in the air regions.

Further, various embodiments are directed to a method for fabricating a grating, the method including: providing a mixture of monomer and a nonreactive material; providing a substrate; coating a layer of the mixture on a surface of the substrate; applying holographic recording beams to the layer to form a holographic polymer dispersed grating including alternating polymer rich regions and nonreactive material rich regions; removing at least a portion of the nonreactive material in the nonreactive material rich regions to form a polymer surface relief grating including alternating polymer regions and air regions; and performing a plasma ashing process to remove at least a portion of polymer from the polymer regions.

BRIEF DESCRIPTION OF THE DRAWINGS

The description will be more fully understood with reference to the following figures and data graphs, which are presented as exemplary embodiments of the invention and should not be construed as a complete recitation of the scope of the invention.

FIG.1A conceptually illustrates a step of a method for fabricating a surface relief grating in which a mixture of monomer and liquid crystal deposited on a transparent substrate is exposed to holographic exposure beams in accordance with an embodiment of the invention.

FIG.1B conceptually illustrates a step of a method for fabricating a surface relief grating from an HPDLC grating formed on a transparent substrate in accordance with an embodiment of the invention.

FIG.1C conceptually illustrates a step of a method for fabricating a surface relief grating in which liquid crystal is removed from an HPDLC grating to form a polymer surface relief grating in accordance with an embodiment of the invention.

FIG.1D conceptually illustrates a step of a method for covering a surface relief grating with a protective layer in accordance with an embodiment of the invention.

FIG.2 is a flow chart conceptually illustrating a method for forming a polymer surface relief grating from an HPDLC grating formed on a transparent substrate in accordance with an embodiment of the invention.

FIG.3A is an example implementation of a polymer surface relief grating or evacuated periodic structure.

FIG.3B illustrates a cross sectional schematic view of a polymer-airperiodic structure3000ain accordance with an embodiment of the invention.

FIG.3C is a graph illustrating the effect of optical layer thickness on the diffraction efficiency versus incident angle.

FIG.4A conceptually illustrates a step of a method for fabricating a surface relief grating in which a mixture of monomer and liquid crystal deposited on a transparent substrate is exposed to holographic exposure beams in accordance with an embodiment of the invention.

FIG.4B conceptually illustrates a step of a method for fabricating a surface relief grating from an HPDLC periodic structure formed on a transparent substrate in accordance with an embodiment of the invention.

FIG.4C conceptually illustrates a step of a method for fabricating a surface relief grating in which liquid crystal is removed from an HPDLC periodic structure to form a polymer surface relief grating in accordance with an embodiment of the invention.

FIG.4D conceptually illustrates a step of a method for fabricating a surface relief grating in which the surface relief grating is partially refilled with liquid crystal to form a hybrid surface relief-periodic structure in accordance with an embodiment of the invention.

FIG.4E conceptually illustrates a step of a method for fabricating a surface relief grating in which a hybrid surface relief-periodic structure is covered with a protective layer in accordance with an embodiment of the invention.

FIG.5 is a flow chart conceptually illustrating a method for forming a hybrid surface relief-periodic structure in accordance with an embodiment of the invention.

FIG.6 is a graph showing calculated P-polarized and S-polarized diffraction efficiency versus incidence angle for a 1-micrometer thickness deep surface relief grating in accordance with an embodiment of the invention.

FIG.7 is a graph showing calculated P-polarized and S-polarized diffraction efficiency versus incidence angle for a 2-micrometer thickness deep surface relief grating in accordance with an embodiment of the invention.

FIG.8 is a graph showing calculated P-polarized and S-polarized diffraction efficiency versus incidence angle for a 3-micrometer thickness deep surface relief grating in accordance with an embodiment of the invention.

FIGS.9A and9B illustrate scanning electron microscope images of multiple embodiments including different thiol concentrations.

FIGS.10A and10B are images comparing an HPDLC periodic structure and a polymer surface relief grating or evacuated periodic structure.

FIGS.11A and11B are two plots comparing an HPDLC periodic structure and a polymer surface relief grating or evacuated periodic structure.

FIGS.12A and12B are two plots of S-diffraction efficiency and P-diffraction efficiency of two example polymer surface relief gratings with different depths.

FIGS.13A and13B are two different plots of S-diffraction efficiency and P-diffraction efficiency of various example polymer surface relief gratings produced with different initial liquid crystal concentrations.

FIGS.14A and14B are two different plots of S-diffraction efficiency and P-diffraction efficiency of various example polymer surface relief gratings produced with different initial liquid crystal concentrations.

FIG.15 is a graph of diffraction efficiency versus grating layer thickness showing the dependence of evanescent coupling on the grating layer thickness.

FIGS.16A-16G illustrate various stages of manufacture of a surface relief grating implementing a cover substrate in accordance with an embodiment of the invention.

FIG.17 illustrates an example reaction forming a holographic mixture layer in accordance with an embodiment of the invention.

FIG.18 illustrates a reaction between reagents and a base substrate in accordance with an embodiment of the invention.

FIG.19 illustrates a reaction between release material and a cover substrate in accordance with an embodiment of the invention.

FIGS.20A and20B illustrate various grating in accordance with an embodiment of the invention.

FIG.20C illustrates a grating in accordance with an embodiment of the invention.

FIGS.21A-21C conceptually illustrate three embodiments of waveguides in which evanescent coupling into a grating can occur.

FIGS.22A-22D illustrate various stages of manufacturing an inverse grating in accordance with an embodiment of the invention.

FIG.23A illustrates a schematic representation of a grating in accordance with an embodiment of the invention.

FIG.23B illustrates a schematic representation of a grating in accordance with an embodiment of the invention.

FIG.23C illustrates a schematic representation of a grating in accordance with an embodiment of the invention.

FIG.24 illustrates an example process flow for fabricating SRGs in accordance with an embodiment of the invention.

FIGS.25A and25B illustrate the principles of a dual interaction grating for implementation in a waveguide.

FIG.26 conceptually illustrates a cross section of a grating in accordance with an embodiment of the invention.

FIG.27 is a conceptual representation of beam propagation with the grating ofFIG.26.

FIG.28 illustrates an example of a partially backfilled grating in accordance with an embodiment of the invention.

FIG.29 schematically illustrates a ray-grating interaction geometry of a TIR surface grating.

FIG.30 conceptually illustrates a waveguide display in accordance with an embodiment of the invention.

FIG.31 conceptually illustrates a waveguide display having two air-spaced waveguide layers in accordance with an embodiment of the invention.

FIG.32 conceptually illustrates typical ray paths for a waveguide display in accordance with an embodiment of the invention.

FIG.33 conceptually illustrates a waveguide display in which the waveguide supports a curved optical surface in accordance with an embodiment of the invention.

FIG.34 conceptually illustrates a waveguide display in which the waveguide supports upper and lower curved optical surfaces in accordance with an embodiment of the invention.

FIG.35 conceptually illustrates a waveguide display in which the waveguide supports a curved optical surface and an input image is provided using a pixel array predistorted to compensate for aberrations introduced by the curved optical surface in accordance with an embodiment of the invention.

FIG.36 conceptually illustrates a waveguide display in which the waveguide supports a curved optical surface and an input image is provided using a pixel array supported by a curved substrate and predistorted to compensate for aberrations introduced by the curved optical surface in accordance with an embodiment of the invention.

FIG.37 is a flow chart conceptually illustrating a method for projecting image light for view using a waveguide containing S-diffracting and P-diffracting gratings in accordance with an embodiment of the invention.

FIG.38 is a flow chart conceptually illustrating a method for projecting image light for view using a waveguide supporting an optical prescription surface and containing S-diffracting and P-diffracting gratings in accordance with an embodiment of the invention.

FIG.39A conceptually illustrates a portion of a pixel pattern having rectangular elements of differing size and aspect ratio for use in an emissive display panel in accordance with an embodiment of the invention.

FIG.39B conceptually illustrates a portion of a pixel pattern having Penrose tiles for use in an emissive display panel in accordance with an embodiment of the invention.

FIG.39C conceptually illustrates a portion of a pixel pattern having hexagonal elements for use in an emissive display panel in accordance with an embodiment of the invention.

FIG.39D conceptually illustrates a portion of a pixel pattern having square elements for use in an emissive display panel in accordance with an embodiment of the invention.

FIG.39E conceptually illustrates a portion of a pixel pattern having diamond-shaped elements for use in an emissive display panel in accordance with an embodiment of the invention.

FIG.39F conceptually illustrates a portion of a pixel pattern having isosceles triangular elements for use in an emissive display panel in accordance with an embodiment of the invention.

FIG.39G conceptually illustrates a portion of a pixel pattern having hexagonal elements with horizontally biased aspect ratios for use in an emissive display panel in accordance with an embodiment of the invention.

FIG.39H conceptually illustrates a portion of a pixel pattern having rectangular elements with horizontally biased aspect ratios for use in an emissive display panel in accordance with an embodiment of the invention.

FIG.39I conceptually illustrates a portion of a pixel pattern having diamond shaped elements with horizontally biased aspect ratios for use in an emissive display panel in accordance with an embodiment of the invention.

FIG.39J conceptually illustrates a portion of a pixel pattern having triangles with horizontally biased aspect ratios for use in an emissive display panel in accordance with an embodiment of the invention.

FIG.40 conceptually illustrates a portion of a pixel pattern having diamond shaped elements in which different pixels can have different emission characteristics in accordance with an embodiment of the invention.

DETAILED DESCRIPTION

There is a growing interest in the use of various periodic structure (e.g. gratings) on waveguides in order to provide a variety of functions. These periodic structure may include angle multiplexed gratings, color multiplexed gratings, fold gratings, dual interaction gratings, rolled K-vector gratings, crossed fold gratings, tessellated gratings, chirped gratings, gratings with spatially varying refractive index modulation, gratings having spatially varying grating thickness, gratings having spatially varying average refractive index, gratings with spatially varying refractive index modulation tensors, and gratings having spatially varying average refractive index tensors. In specific examples, gratings for diffraction of various polarizations of light (e.g. S-polarized light and P-polarized light) may be beneficial. It would be specifically advantageous to have a grating which diffracts either S-polarized light or P-polarized light. Specific applications for this technology include waveguide-based displays such as augmented reality displays and virtual reality displays. One example is input gratings which may be used to input one or both of S-polarized light or P-polarized light into the waveguide. However, in many cases, it would be advantageous to have a grating which diffracts either S-polarized light and P-polarized light. For example, waveguide displays using unpolarized light sources such as OLED light sources produce both S-polarized and P-polarized light and thus it would be advantageous to have gratings which can diffract both S-polarized and P-polarized light.

One specific class of gratings includes surface relief gratings (SRGs) which may be used to diffract either P-polarized light or S-polarized light. Another class of gratings are surface relief gratings (SRGs) which are normally P-polarization selective, leading to a 50% efficiency loss with unpolarized light sources such as organic light emitting diodes (OLEDs) and light emitting diodes (LEDs). Combining a mixture of S-polarization diffracting and P-polarization diffracting gratings may provide a theoretical 2× improvement over waveguides using P-diffracting gratings only. Thus, it would be advantageous to have a high efficiency S-polarization diffraction grating. In many embodiments, an S-polarization diffracting grating can be provided by a periodic structure formed in a holographic photopolymer. One periodic structure includes a grating such as a Bragg grating. In some embodiments, an S-polarization diffracting grating can be provided by a periodic structure formed in a holographic polymer dispersed liquid crystal (HPDLC) with birefringence altered using an alignment layer or other processes for realigning the liquid crystal (LC) directors. In several embodiments, an S-polarization diffracting periodic structure can be formed using liquid crystals, monomers, and other additives that naturally organize into S-diffracting periodic structures under phase separation. In some embodiments, these HPDLC periodic structures may form deep SRGs which have superior S-polarization diffraction efficiency.

One class of deep SRGs are polymer-air SRGs or evacuated periodic structure (EPSs) which may exhibit high S-diffraction efficiency (up to 99%) and low P-diffraction efficiency and may be implemented as input gratings for waveguides. The EPSs may be evacuated Bragg gratings (EBGs). Such periodic structures can be formed by removing the liquid crystal from HPDLC periodic structures formed from holographic phase separation of a liquid crystal and monomer mixture. Deep SRGs formed by such a process typically have a thickness in the range 1-3 micrometers with a fringe spacing 0.35 to 0.80 micrometers. In some embodiments, the ratio of grating depth to fringe spacing may be 1:1 to 5:1. As can readily be appreciated, such gratings can be formed with different dimensions depending on the specific requirements of the given application. Examples of how the thickness of SRGs may yield different resultant diffraction efficiencies are described in connection withFIGS.6-8.

In many embodiments, the condition for a deep SRGs is characterized by a high grating depth to fringe spacing ratio. In some embodiments, the condition for the formation of a deep SRGs is that the grating depth is approximately twice the grating period. Modelling such deep SRGs using the Kogelnik theory can give reasonably accurate estimates of diffraction efficiency, avoiding the need for more advanced modelling, which typically entails the numerical solution of Maxwell's equations. The grating depths that can be achieved using liquid crystal removal from HPDLC periodic structures greatly surpass those possible using conventional nanoimprint lithographic methods, which cannot achieve the conditions for deep SRGs (typically providing only 250-300 nm depth for grating periods 350-460 nm). (Pekka Äyräs, Pasi Saarikko, Tapani Levola, “Exit pupil expander with a large field of view based on diffractive optics”, Journal of the SID 17/8, (2009), pp 659-664). It should be emphasized here that, although the S-polarization diffracting deep SRGs are emphasized within the present application, deep SRGs can, as will be discussed below, provide a range of polarization response characteristics depending on the thickness of the grating prescription and, in particular, the grating depth. As such, deep SRGs can be implemented in a variety of different applications.

The literature supports equivalence of deep SRGs and periodic structures. One reference (Kiyoshi Yokomori, “Dielectric surface-relief gratings with high diffraction efficiency” Applied Optics; Vol. 23; Issue 14; (1984); pp. 2303-2310), discloses the investigation of the diffraction properties of dielectric surface-relief gratings by solving Maxwell's equations numerically. The diffraction efficiency of a grating with a groove depth about twice as deep as the grating period was found to be comparable with the efficiency of a volume phase grating. The modelling by Yokomori predicted that dielectric surface-relief gratings interferometrically recorded in photoresist can possess a high diffraction efficiency of up to 94% (throughput efficiency 85%). The equivalence of deep SRGs and periodic structures is also discussed in another article by Golub (M. A. Golub, A. A. Friesem, L. Eisen “Bragg properties of efficient surface relief gratings in the resonance domain”, Optics Communications; 235; (2004); pp 261-267). A further article by Gerritsen discusses the formation of Bragg-like SRGs in photoresist (Gerritsen H J, Thornton D K, Bolton S R; “Application of Kogelnik's two-wave theory to deep, slanted, highly efficient, relief transmission gratings” Applied Optics; Vol. 30; Issue 7; (1991); pp 807-814).

Many embodiments of this disclosure provide for methods of making SRGs such as deep SRGs that can offer very significant advantages over nanoimprint lithographic process particularly for slanted gratings. Periodic structures of any complexity can be made using interference or master and contact copy replication. In some embodiments, after removing the LC, the SRGs can be back filled with a material with different properties to the LC. This allows a periodic structure with modulation properties that are not limited by the grating chemistry needed for grating formation.

In some embodiments the backfill material may not be a LC material. In some embodiments, the backfill material may have a higher index of refraction than air which may increase the angular bandwidth of a waveguide. In several embodiments, the deep SRGs can be partially backfilled with LC to provide a hybrid SRG/periodic structure. Alternatively, in some embodiments, the refill step can be avoided by removing just a portion of the LC from the LC rich regions of the HPDLC to provide a hybrid SRG/periodic structure. The refill approach has the advantage that a different LC can be used to form the hybrid periodic structures. The materials can be deposited using an inkjet deposition process.

In some embodiments, the methods described herein may be used to create photonic crystals. Photonic crystals may be implemented to create a wide variety of diffracting structures including periodic structures such as Bragg gratings. Periodic structures may be used as diffraction gratings to provide functionality including but not limited to input gratings, output gratings, beam expansion gratings, diffract more than one primary color. A photonic crystal can be a three-dimensional lattice structure that can have diffractive capabilities not achievable with a basic periodic structures. Photonic crystals can include many structures including all 2-D and 3-D Bravais lattices. Recording of such structures may benefit from more than two recording beams.

In some embodiments, waveguides incorporating photonic crystals can be arranged in stacks of waveguides, each having a grating prescription for diffracting a unique spectral bandwidth. In many embodiments, a photonic crystal formed by liquid crystal extraction provide a deep SRG. In many embodiments, a deep SRG formed using a liquid crystal extraction process can typically have a thickness in the range 1-3 micron with a fringe spacing 0.35 micron to 0.80 micron. The fringe spacing may be a Bragg fringe spacing. In many embodiments, the condition for a deep SRG is characterized by a high grating depth to fringe spacing ratio. In some embodiments the condition for the formation of a deep SRG is that the grating depth can be approximately twice the grating period. It should be emphasized here that, although S-polarization diffracting deep SRGs are described in the present application, deep SRGs can, as will be discussed below, provide a range of polarization response characteristics depending on the thickness of the grating prescription and, in particular, the grating depth. Deep SRGs can also be used in conjunction with conventional Bragg gratings to enhance the color, uniformity and other properties of waveguide displays.

Deep SRGs have been fabricated in glassy monomeric azobenzene materials using laser holographic exposure (O. Sakhno, L. M. Goldenberg, M. Wegener, J. Stumpe, “Deep surface relief grating in azobenzene-containing materials using a low intensity 532 nm laser”, Optical Materials: X, 1, (2019), 100006, pp 3-7. The Sakhno reference also discloses how SRGs can be recorded in a holographic photopolymer using two linearly orthogonally polarized laser beams.

The disclosure provides a method for making a surface relief grating that can offer very significant advantages over nanoimprint lithographic process particularly for slanted gratings. Periodic structures of any complexity can be made using interference or master and contact copy replication. In some embodiments after removing the LC the SRG can be back filled with a material with different properties to the LC. This allows a periodic structure with modulation properties that are not limited by the grating chemistry needed for grating formation. In some embodiments the SRGs can be partially backfilled with LC to provide a hybrid SRG/periodic structure. Alternatively, in some embodiments, the refill step can be avoided by removing just a portion of the LC from the LC rich regions of the HPDLC to provide a hybrid SRG/periodic structure. The refill approach has the advantage that a different LC can be used to form the hybrid grating. The materials can be deposited using an inkjet process. In some embodiments, the refill material may have a higher index of refraction than air which may increase diffraction efficiency of the periodic structure.

While this disclosure has been made in the context of fabricating deep SRGs, it is appreciated that many other grating structures may be produced using the techniques described herein. For example, any type of SRG including SRGs in which the grating depth is smaller than the grating frequency (e.g. Raman-Nath gratings) may be fabricated as well.

FIGS.1A-1D illustrate a processing apparatus that can be used in a method for fabricating deep SRGs or EPSs in accordance with an embodiment.FIG.1A conceptually illustrates anapparatus190A that can be used in a step of a method for fabricating a surface relief grating in which amixture191 of monomer and liquid crystal deposited on atransparent substrate192 is exposed to holographic exposure beams193,194, in accordance with an embodiment of the invention. The holographic exposure beams193,194 may be deep UV beams. In some examples, themixture191 may also include at least one of a photoinitiator, a coinitiator, a multifunctional thiol, adhesion promoter, surfactant, and/or additional additives.

Themixture191 may include nanoparticles. Themixture191 may include photoacids. Themixture191 may be a monomer diluted with a non-reactive polymer. Themixture191 may include more than one monomer. In some embodiments, the monomer may be isocyanate-acrylate based or thiolene based. In some embodiments, the liquid crystal may be a full liquid crystal mixture or a liquid crystal single. A liquid crystal single may only include a portion of a full liquid crystal mixture. Various examples, liquid crystal singles may include one or all of cyanobiphenyls, alkyl, alkoxy, cyanobiphenyls, and/or terphenyls. The liquid crystal mixture may be a cholesteric liquid crystal. The liquid crystal mixture may include chiral dopants which may control the grating period. The liquid crystal mixture may include photo-responsive and/or halogen bonded liquid crystals. In some embodiments, liquid crystal may be replaced with another substance that phase separates with the monomer during exposure to create polymer rich regions and substance rich regions. Advantageously, the substance and liquid crystal singles may be a cost-effective substitute to full liquid crystal mixtures which are removed at a later step as described below.

In some embodiments, the liquid crystal in themixture191 may have a different between an extraordinary refractive index and an ordinary refractive index of less than 0.01. In some embodiments, the liquid crystal in themixture191 may have a different between an extraordinary refractive index and an ordinary refractive index of less than 0.025. In some embodiments, the liquid crystal in themixture191 may have a different between an extraordinary refractive index and an ordinary refractive index of less than 0.05.

FIG.1B conceptually illustrates anapparatus190B that can be used in a step of a method for fabricating a surface relief grating from an HPDLC Bragg grating195 formed on a transparent substrate using the holographic exposure beams, in accordance with an embodiment of the invention. The holographic exposure beams may transform the monomer into a polymer in some areas. The holographic exposure beams may include intersecting recording beams and include alternating bright and dark illumination regions. A polymerization-driven diffusion process may cause the diffusion of monomers and LC in opposite directions, with the monomers undergoing gelation to form polymer-rich regions (in the bright regions) and the liquid crystal becoming trapped in a polymer matrix to form liquid crystal rich regions (in the dark regions).

FIG.1C conceptually illustrates anapparatus190C that can be used in a step of a method for fabricating a deep polymer surface relief grating196 or EPS in which liquid crystal is removed from an HPDLC periodic structure ofFIG.1B to form a polymer surface relief grating in accordance with an embodiment of the invention. Advantageously, a polymer surface relief grating196 may include a large depth with a comparatively small grating period in order to form a deep SRG. The liquid crystal may be removed by washing with a solvent such as isopropyl alcohol (IPA). The solvent may be strong enough to wash away the liquid crystal but weak enough to maintain the polymer. In some embodiments, the solvent may be chilled below room temperature before washing the grating.FIG.1D conceptually illustrates an apparatus190D that can be used in a step of a method for fabricating a polymer surface relief grating in which the polymer surface relief grating is covered with aprotective layer197 in accordance with an embodiment of the invention.

FIG.2 conceptually illustrates a method for forming deep SRGs from a HPDLC periodic structure formed on a transparent substrate in accordance with an embodiment of the invention. As shown, amethod200 of forming deep SRGs or EPSs is provided. Referring to the flow diagram, themethod200 includes providing (201) a mixture of at least one monomer and at least one liquid crystal. The at least one monomer may include an isocyanate-acrylate monomer or thiolene. For example, the mixture may include a liquid crystal and a thiolene based photopolymer. In some embodiments, the mixture may include a liquid crystal and an acrylate-based photopolymer. In some embodiments, the at least one liquid crystal may be a full liquid crystal mixture or may be a liquid crystal single which may include only a portion of the liquid crystal mixture such as a single component of the liquid crystal mixture. In some embodiments, the at least one liquid crystal may be substituted for a solution which phase separates with the monomer during exposure. The criteria for such a solution may include ability to phase separate with the monomer during exposure, ease of removal after curing and during washing, and ease of handing. Example substitute solutions include solvents, non-reactive monomers, inorganics, and nanoparticles.

Providing the mixture of the monomer and the liquid crystal may also include mixing one or more of the following with the at least one monomer and the liquid crystal: initiators such as photoinitiators or coinitiators, multifunctional thiol, dye, adhesion promoters, surfactants, and/or additional additives such as other cross linking agents. This mixture may be allowed to rest in order to allow the coinitiator to catalyze a reaction between the monomer and the thiol. The rest period may occur in a dark space or a space with red light (e.g. infrared light) at a cold temperature (e.g. 20° C.) for a period of approximately 8 hours. After resting, additional monomers may be mixed into the monomer. This mixture may be then strained or filtered through a filter with a small pore size (e.g. 0.45 μm pore size). After straining, this mixture may be stored at room temperature in a dark space or a space with red light before coating.

Next, a transparent substrate can be provided (202). In certain embodiments, the transparent substrate may be a glass substrate or a plastic substrate. In some embodiments, the transparent substrate may be a flexible substrate to facilitate roll to roll processing. In some embodiments, the EPS may be manufactured on a flexible substrate through a roll to roll process and then peeled off and adhered to a rigid substrate. In some embodiments, the EPS may be manufactured on a flexible substrate and a second flexible release layer may be peeled off and discarded which would leave the EPS on a flexible layer. The flexible layer may be then bonded to another rigid substrate.

A layer of the mixture can be deposited or coated (203) onto a surface of the substrate. The layer of mixture may be deposited using inkjet printing. In some embodiments, the mixture is sandwiched between the transparent substrate and another substrate using glass spacers to maintain internal dimensions. A non-stick coating may be applied to the other substrate before the mixture is sandwiched. The non-stick coating may include a fluoropolymer such as OPTOOL UD509 (produced by Daikin Chemicals), Dow Corning 2634, Fluoropel (produced by Cytonix), and EC200 (produced by PPG Industries, Inc). Holographic recording beams can be applied (204) to the mixture layer. holographic recording beams may be a two-beam interference pattern which may cause phase separation of the LC and the polymer. In response to the holographic recording beam, the liquid monomer changes to a solid polymer whereas the neutral, non-reactive substance (e.g. LC) diffuses during holographic exposure in response to a change in chemical potential driven by polymerization. While LC may be one implementation of the neutral, non-reactive substance, other substances may also be used. The substance and the monomer may form a miscible mixture prior to the holographic exposure and become immiscible upon holographic exposure.

After applying the holographic recording beams, the mixture may be cured. The curing process may include leaving the mixture under low-intensity white light for a period of time until the mixture fully cures. The low intensity white light may also cause a photo-bleach dye process to occur. Thus, a HPDLC periodic structure having alternating polymer rich and liquid crystal rich regions can be formed (205). In some embodiments, the curing process may occur in two hours or less. After curing, one of the substrates may be removed exposing the HPDLC periodic structure. Advantageously, the non-stick coating may allow the other substrate to be removed while the HPDLC periodic structure remaining.

HPDLC periodic structure may include alternating sections of liquid crystal rich regions and polymer regions. The liquid crystal in the liquid crystal rich regions can be removed (206) to form polymer surface relief gratings or EPSs which may be used as deep SRGs. The liquid crystal may be removed by gently immersing the grating into a solvent such as IPA. The IPA may be chilled and may be kept at a temperature lower than room temperature while the grating is immersed in the IPA. The periodic structure may be then removed from the solvent and dried. In some embodiments, the periodic structure is dried using a high flow air source such as compressed air. After the LC is removed from the periodic structure, a polymer-air surface relief grating is formed.

As shown inFIGS.1A-1D, the formed surface relief grating can further be covered with a protective layer. In some instances, the protective layer may be a moisture and oxygen barrier with scratch resistance capabilities. In some instances, the protective layer may be a coating that does not fill in air gap regions where LC that was removed once existed. The coating may be deposited using a low temperature process. In some implementations, the protective layer may have anti-reflective (AR) properties. The coating may be a silicate or silicon nitride. The coating process may be performed by a plasma assisted chemical vapor deposition (CVD) process such as a nanocoating process. The coating may be a parylene coating. The protective layer may be a glass layer. A vacuum or inert gas may fill the gaps where LC that was removed once existed before the protective layer is applied. In some embodiments, the coating process may be integrated with the LC removal process (206). For example, a coating material may be mixed with the solvent which is used to wash the LC from the periodic structure.

FIG.3A illustrates a cross sectional schematic view of an exemplary embodiment of a polymer-airperiodic structure3000 implemented on awaveguide3002. The polymer-airsurface relief grating3000 includesperiodic polymer sections3004a.Adjacent polymer sections3004asandwich air sections3004b. Theair sections3004bare sandwiched bypolymer sections3004a. Theair sections3004bandpolymer sections3004ahave different indexes of refraction. Advantageously, the polymer-air surface relief Bragg grating3000 may be formed with ahigh grating depth3006atoBragg fringe spacing3006bratio which may create a deep SRG. As illustrated, thepolymer sections3004aand theair sections3004bextend all the way to thewaveguide3002 to directly contact thewaveguide3002. As illustrated, there may be no bias layer between thepolymer sections3004aand theair sections3004band thewaveguide3002. As discussed previously, deep SRGs may exhibit many beneficial qualities such as high 5-diffraction efficiency which may not be present within the typical SRGs.

In one example, a polymer-air surface relief Bragg grating3000 may have aBragg fringe spacing3006bof 0.35 μm to 0.8 μm and a grating depth of 1 μm to 3 μm. in some embodiments, a grating depth of 1 μm to 3 μm may be too thick for most EPS (with ashing and ALD) for fold and output gratings for waveguide applications, where leaky structures are needed. Values in the ranges of 0.1 μm to 0.5 μm might be more suitable for leaky structures, particularly when modulation is increased with ashing and ALD. For example, Input structures may include a depth in the range of 0.4 μm up to 1 μm. Structures with a depth from 1 μm to 3 μm may be advantageous for display cases, and structures even taller may be advantageous for non-display applications. Structures with half period (e.g. a critical dimension) to height ratio of 7:1 or even 8:1 have been demonstrated with advantageous effects.

In some embodiments, thepolymer sections3004amay include at least some residual liquid crystal when the liquid crystal is not completely removed duringstep206 described in connection withFIG.2. In some embodiments, the presence of residual LC within the polymer rich regions may increase refractive index modulation of the final polymer SRG. In some embodiments, theair sections3004bmay include some residual liquid crystal if the liquid crystal is not completely removed duringstep206 from theseair sections3004b. In some embodiments, by leaving some residual liquid crystal within theair sections3004b, a hybrid grating as described in connection withFIGS.4-5 may be created.

In some embodiments, anoptical layer3008 may also exist between thepolymer sections3004aand theair sections3004band thewaveguide3002. Theoptical layer3008 may be a bias layer between thepolymer sections3004aand theair sections3004band thewaveguide3002.FIG.3B illustrates a cross sectional schematic view of a polymer-airperiodic structure3000ain accordance with an embodiment of the invention. The polymer-airperiodic structure3000aincludes many identically numbered components with the polymer-airperiodic structure3000 ofFIG.3A. The description of these components is applicable with the polymer-airperiodic structure3000adescribed in connection withFIG.3B and this description will not be repeated in detail. As illustrated, anoptical layer3008 is positioned between thepolymer sections3004aand theair sections3004band thewaveguide3002. The waveguide may include asubstrate3002 and an optical layer3008 (e.g. the bias layer) sandwiched by thesubstrate3002 and the polymer periodic structure and wherein the polymer periodic structure extends all the way to the optical layer to directly contact the optical layer. The polymer periodic structure includes thepolymer sections3004aand theair sections3004b.

In some examples, anoptical layer3008 may be formed when gratings are formed using Nano Imprint Lithography (NIL). The grating pattern may be imprinted in a resin leaving a thin layer underneath the period structure which is a few microns thick. Thisoptical layer3008, which may be a few microns in thickness, may reside between the waveguide (e.g. glass) substrate and the period grating layer and may not be removed without damaging the NIL grating structure. When the bias refractive index is lower than that of the waveguide substrate the bias layer may confine light for some field angles (furthest from TIR in the waveguide) to the high index substrate which may be analogous to cladding on an optical fiber core. This may cause the field supported in the waveguide to be clipped and hence not supported by the waveguide. Elimination of the bias layer can offer grating coupling from a high index substrate with a grating structure of lower index than the substrate which may not be possible with the bias layer present.

In formation of EPSs, since the phase separation process leading to grating formation may take place through the entire holographic recording material layer, gratings may be formed throughout the volume of the cell gap resulting in nooptical layer3008. The elimination of theoptical layer3008 can allow wider fields of view to be realized when using high index waveguide substrates. Wide field of view angular content may be propagated with lower refractive index grating structures. EPSs may deliver similar optical performance characteristics to nanoimprinted SRGs by offering taller structures albeit at lower peak refractive index. This may open up the possibility of low-cost fabrication of diffractive structures for high efficiency waveguides.

Although the elimination of theoptical layer3008 from a waveguide grating device can offer the field of view benefits as discussed above, in some embodiments, aoptical layer3008 may be present in EPSs. The present disclosure allows for waveguide grating devices with or without theoptical layer3008.

In some embodiments, having theoptical layer3008 can be an advantage as the evanescent coupling between the waveguide and the grating is a function of the indices of the gratings structure (e.g. the grating depth the angles of the faces making up the structure and the grating depth), the waveguide core, and the optical layer3008 (if present). In some embodiments, theoptical layer3008 may be used as a tuning parameter for optimizing the overall waveguide design for better efficiency and bandwidth. Unlike nanograting SRGs, a bias layer used with an EPS may not be of the same index as the grating structure.

FIG.3C is a graph illustrating the effect ofoptical layer3008 thickness on the diffraction efficiency versus incident angle. The dotted line3052 represents an incident angle of +6 degrees. Evanescent coupling may begin (towards negative angles) at an angle of approximately +6 degrees. The various plots represent different thicknesses ofoptical layer3008. The plots show that theoptical layer3008 thickness can be used to increase the diffractive coupling (e.g. for an optical layer thickness of 300 nm) over the approximate angular range from +6 degrees to +16 degrees. There may be lower coupling over the approximate angular range from 0 degrees to +6 degrees. The S-shaped characteristic can be altered by replacing the 300 nm optical layer with a thicker or thinner bias layer as shown inFIG.3C. In some embodiments, the thickness of the optical layer may be 2 μm to 3 μm, 1 μm to 2 μm, or 0.5 μm to 1 μm.

In some embodiments, the EPS may be fabricated as part of a stacked grating structure. Examples of stacked grating structures are discussed in International Pub. No. WO 2022015878, entitled “Nanoparticle-based holographic photopolymer materials and related applications” and filed Jul. 14, 2021, which is hereby incorporated by reference in its entirety for all purposes. In some embodiments, the EPS may include a multilayer structure including a release layer. Release layers may be used in a grating stacking process that may reduce the number of glass layers. The release layer may be applied at each exposure step to allow the deposition of a new layer of recording material. Similar processes may also allow angular bandwidth to be increased by stacking multiple gratings with different slant angles.

As discussed above, in many the embodiments, the invention also provides a method for fabricating a hybrid surface relief/periodic structure.FIG.4A conceptually illustrates anapparatus210A that can be used in a step of a method for fabricating hybrid surface relief gratings (hybrid SRGs) in which amixture211 of monomer and liquid crystal deposited on atransparent substrate212 is exposed to holographic exposure beams213,214, in accordance with an embodiment of the invention.FIG.4B conceptually illustrates anapparatus210B that can be used in a step of a method for fabricating hybrid SRGs from an HPDLCperiodic structure215 formed on the transparent substrate using the holographic exposure beams in accordance with an embodiment of the invention.FIG.4C conceptually illustrates anapparatus210C that can be used in a step of a method for fabricating a surface relief grating in which liquid crystal is removed from an HPDLCperiodic structure215 to form polymer-air SRGs216 in accordance with an embodiment of the invention. These polymer-air SRGs216 or EPSs may be deep SRGs. It is appreciated that the steps illustrated in and described in connection withFIGS.4A-4C roughly correspond to the steps illustrated in and described in connection withFIGS.2A-2C in the process to create a polymer-air SRG and thus the previous description will be applicable toFIGS.4A-4C.

In addition,FIG.4D conceptually illustrates an additional step which may be performed to create a hybrid grating. Theapparatus210D can be used in a step of a method for fabricating a surface relief grating in which a surface relief grating is at least partially refilled with liquid crystal to form ahybrid SRGs217, in accordance with an embodiment of the invention. The refilled liquid crystal may be of different consistency to the previously removed liquid crystal that was previously removed inFIG.4C. Further, it is appreciated that the liquid crystal removed inFIG.3C may only be partially removed in an alternative method to forminghybrid SRGs217. In addition,FIG.4E conceptually illustrates anapparatus210E can be used in a step of a method for fabricating a surface relief grating in whichhybrid SRGs217 formed in the step illustrated inFIG.4D is covered with aprotective layer218, in accordance with an embodiment of the invention. In the hybrid EPSs, theair sections3004bofFIGS.3A and3B may be replaced with a backfill material as discussed above.

FIG.5 is a flowchart showing an exemplary method for forming a hybrid surface relief-periodic structure from a HPDLC periodic structure formed on a transparent substrate in accordance with an embodiment of the invention. As shown, themethod220 of forming hybrid surface relief-periodic structure is provided. Referring to the flow diagram,method220 includes providing (221) a mixture of at least one monomer and at least one liquid crystal. The at least one monomer may include an isocyanate-acrylate monomer. Providing the mixture of the monomer and the liquid crystal may also include mixing one or more of the following with the at least one monomer and the liquid crystal: photoinitiator, coinitiator, multifunctional thiol, and/or additional additives. This mixture may be allowed to rest in order to allow the coinitiator to catalyze a reaction between the monomer and the thiol. The rest period may occur in a dark space or a space with red light (e.g. infrared light) at a cold temperature (e.g. 20° C.) for a period of approximately 8 hours. After resting, additional monomers may be mixed into the monomer. This mixture may be then strained or filtered through a filter with a small pore size (e.g. 0.45 μm pore size). After straining this mixture may be stored at room temperature in a dark space or a space with red light before coating.

Next, a transparent substrate can be provided (222). In certain embodiments, the transparent substrate may be a glass substrate or a plastic substrate. A non-stick coating may be applied to the transparent substrate before the mixture is coated on the substrate. The non-stick coating may be a release layer which allows the transparent substrate to easily release from the exposed periodic structure. Various examples of release layers are discussed below. A layer of the mixture can be deposited (223) onto a surface of the substrate. In some embodiments, the mixture is sandwiched between the transparent substrate and another substrate using glass spacers to maintain internal dimensions. Holographic recording beams can be applied (224) to the mixture layer. The holographic recording beams may be a two-beam interference pattern which may cause phase separation of the LC and the polymer. After applying the holographic recording beams, the mixture may be cured. The curing process may include leaving the mixture under low-intensity white light for a period of time under the mixture fully cures. The low intensity white light may also cause a photo-bleach dye process to occur. Thus, an HPDLC periodic structure having alternating polymer rich and liquid crystal rich regions can be formed (225). In some embodiments, the curing process may occur in 2 hours or less. After curing, one of the substrates may be removed exposing the HPDLC periodic structure. The release layer may aid in allowing the one of the substrates to not stick to the exposed periodic structure.

HPDLC grating may include alternating sections of liquid crystal rich regions and polymer regions. The liquid crystal in the liquid crystal rich regions can be removed (226) to form polymer surface relief gratings or EPSs which is a form of deep SRGs. The liquid crystal may be removed by gently immersing the exposed periodic structure into a solvent such as isopropyl alcohol (IPA). The IPA may be kept at a lower temperature while the periodic structure is immersed in the IPA. The periodic structure is them removed from the solvent and dried. In some embodiments, the periodic structure is dried using a high flow air source such as compressed air. After the LC is removed from the grating, a polymer-air surface relief periodic structure is formed. The resulting periodic structure may be the periodic structure described in connection withFIGS.3A and3B. There may or may not be a bias layer present as illustrated inFIG.3A or3B. The steps221-226 ofFIG.5 roughly correspond to the steps described in connection withFIG.2 in creating a polymer-air SRG and thus these descriptions are applicable toFIG.5.

Further,method220 includes at least partially refilling (227) cleared liquid crystal rich regions with liquid crystal to form hybrid SRGs. The refilled liquid crystal may be of different consistency to the previously removed liquid crystal that was previously removed instep226. Further, it is appreciated that the liquid crystal removed instep226 may only be partially removed in an alternative method to forming hybrid SRGs. Advantageously, hybrid SRGs may provide the ability to tailor specific beneficial characteristics of the SRGs. One particular characteristic that may be improved by the inclusion of at least some liquid crystal within the SRGs is a decrease in haze properties. In some embodiments, the cleared liquid crystal rich regions may be backfilled with a different refractive material than liquid crystal. The backfill material may have a different refractive index than the remaining polymer rich regions.

As shown inFIG.4E, the formed surface relief grating can further be covered with a protective layer. In some instances, the protective layer may be a moisture and oxygen barrier with scratch resistance capabilities. In some instances, the protective layer may be a coating that does not fill in air gap regions where LC that was removed once existed. The coating may be deposited using a low temperature process. In some implementations, the protective layer may have anti-reflective (AR) properties. The coating may be a silicate or silicon nitride. The coating process may be performed by a plasma assisted chemical vapor deposition (CVD) process such as a plasma-treat nanocoating process. The coating may be a parylene coating. The protective layer may be a glass layer. A vacuum or inert gas may fill the gaps where LC that was removed once existed before the protective layer is implemented. In some embodiments, the coating process may be integrated with the LC removal process (226). For example, a coating material may be mixed with the solvent which is used to wash the LC from the grating. In some implementations, the coating material may be a material with a lower or higher refractive index than the polymer and fill the spaces between adjacent polymer portions. The refractive index difference between the polymer and the coating material may allow the polymer SRGs to continue to diffract.

AlthoughFIGS.1-5 illustrate specific methods and apparatus for forming deep SRGs and hybrid surface relief/Bragg gratings, various manufacturing methods implementing different steps or modifications of such steps can be utilized. As can readily be appreciated, the specific process utilized can depend on the specific requirements of the given application. For example, many embodiments utilize another periodic structure as a protective layer.

Hybrid SRG/periodic structure with shallow SRG structures may lead to low SRG diffraction efficiencies. The methods disclosed in the present disclosure allows for more effective SRG structures to be formed by optimizing the depth of the liquid crystal in the liquid crystal rich regions such that the SRGs has a high depth to grating pitch ratio while allowing the periodic structure to be sufficiently thick for efficient diffraction. In many embodiments, the periodic structure component of the hybrid grating can have a thickness in the range 1-3 micrometer. In some embodiments, the SRG component of the hybrid grating can have a thickness in the range 0.25-3 micrometer. The initial HPDLC periodic structure would have a thickness equal to the sum of the final SRG and periodic structure components. As can readily be appreciated, the thickness ratio of the two periodic structure components can depend on the waveguide application. In some embodiments, the combination of an SRG with a periodic structure may be used to fine-tune angular bandwidth of the periodic structure. In some cases, the SRG can increase the angular bandwidth of the periodic structure.

In many embodiments, in the hybrid SRGs illustrated inFIGS.4A-4E, the refill depth of the liquid crystal regions of the periodic structure can be varied across the periodic structure to provide spatially varying relative SRG/periodic structure strengths. In some embodiments, during the liquid crystal removal and refill as defined insteps206,226, and227, the liquid crystal in the liquid crystal rich grating regions can be totally or partially removed. In several embodiments, the liquid crystal used to refill or partially refill the liquid crystal-cleared regions can have a different chemical composition to the liquid crystal used to form the initial HPDLC periodic structure. In various embodiments, a first liquid crystal with phase separation properties compatible with the monomer can be specified to provide a HPDLC grating with optimal modulation and grating definitions while a second refill liquid crystal can be specified to provide desired index modulation properties in the final hybrid grating. In a number of embodiments, the polymer portion of the hybrid grating can be switchable with electrodes applied to surfaces of the substrate and the cover layer. In many embodiments, the refill liquid crystals can contain additives which may include but are not limited to the features of improving switching voltage, switching time, polarization, transparency, and other parameters. A hybrid grating formed using a refill process would have the further advantages that the LC would form a continuum (rather than an assembly of LC droplets), thereby reducing haze. In some embodiments the backfill material may be a material with a different refractive index than the polymer regions. The backfill material may not be a liquid crystal material.

While deep SRGs, EPSs, and/or hybrid SRGs may be described in the context of S-diffracting gratings and P-diffracting gratings, these periodic structures have applicability in many other periodic structure types. These include but are not limited to angle multiplexed gratings, color multiplexed gratings, fold gratings, dual interaction gratings, rolled K-vector gratings, crossed fold gratings, tessellated gratings, chirped gratings, gratings with spatially varying refractive index modulation, gratings having spatially varying grating thickness, gratings having spatially varying average refractive index, gratings with spatially varying refractive index modulation tensors, and gratings having spatially varying average refractive index tensors. Further, deep SRGs, EPSs, and/or hybrid SRGs may be switchable or non-switchable periodic structures depending on their specific implementation. Deep SRGs, EPSs, and/or hybrid SRGs may be fabricated on a plastic substrate or a glass substrate. These periodic structures may also be fabricated on one substrate and transferred to another substrate.

In some embodiments, EPSs may be either unslanted or slanted, or spatially varying slanted structures (e.g., rolled K-vector type with very large height to period aspect ratio, typically in the range of 2 to 12). Slanted EPSs will be illustrated in various examples below. An EPS may include a height of 2.0 μm with a 0.400 μm period (e.g. aspect ratio=5). The combination of controlled, repeatable, slant angles and tall aspect ratios may provide EPS structures Bragg properties which enable high efficiency waveguide designs. Moreover, EPSs can be fabricated with or without bias layers. EPSs may be made using a phase separation process that can be implemented using ink jet printing processes and offers significant economic advantages in mass production over the complex wafer etching and nano imprint lithographic process used to produce some SRG display waveguides.

In some embodiments, EPSs may be configured as at least one of multiplexed grating, a slanted grating, a photonic crystal, mixed modulation grating, a hybrid polymer grating structure, a sinusoidal grating (e.g. formed by plasma ashing of isotropic photopolymer gratings), a metasurface, or a grating structure combining a slanted volume grating overlaid by a surface relief grating. Slanted volume grating overlaid by a surface relief grating may include a grating structure which is substantially a volume grating with the grating thickness of the low index regions having a slight smaller grating thickness than the high index regions. The variation of the grating thickness may be tens of nanometers while the average volume grating thickness may be from 1-10 micron depending on the application. The configuration is equivalent to an SRG layer sitting on top of a volume grating layer. In some embodiments, the SRG and volume grating may combine the benefit of the wider angular bandwidth of the SRG and the higher efficiency of the volume grating. This is more likely to be the case when the volume grating is thinner. The surface relief structure can arise naturally as a result of non-linearity in the diffusion process at the extremities of the grating. The effect may be controlled using plasma ashing or some other type of etching processed applied to the grating. A combined SRG and volume grating can also be formed by fabricating an EPS and then partially backfilling it with another material. Such a configuration is discussed as a hybrid grating throughout the current disclosure.

In some embodiments, the EPS is formed using different diffusion regimes having different diffusion constants in at least two different directions. In complex grating structures such as photonic crystals the spacing of the diffracting nodes may lead to nonuniformities in the modulation of the finished grating. Material components with different diffusion time constants may allow more efficient grating formation along different directions. In some embodiments, the EPS is formed to provide a photonic structure incorporating a slanted grating structure and a photonic crystal structure including diffracting nodes. Grating configurations including regions in which the grating includes slanted (or unslanted) planar fringes and photonic crystal regions where the diffracting structures comprising diffracting nodes may include elongate elements such as cylinders which many may be tilted. The photonic crystal regions may include a 3D diffracting node structure. In some embodiments, the EPS is formed to provide a photonic crystal including slanted diffracting features wherein the principle nodes of the photonic crystal are formed by multiplexed gratings wherein plasma ashing is applied along tracks parallel to principal crystal directions. The photonic crystal may be formed by multiplexing two or more gratings such that the intersection regions of the bright fringes form modulation peaks. The regions around these peaks may be eroded using plasma ashing applied along the low modulation tracks which are parallel to the principle crystal directions. The cross-section geometry of the nodes may depend on the number of gratings and their relative orientations. For example, crossing two gratings at ninety degrees may result in square cross section nodes. Tilted photonic crystal nodes may be formed using slanted gratings. This principle can be extended to three dimensional photonic crystals.

In some embodiments, the polymer grating structure may be formed to provide photonic crystal formed by three-beam-recorded Bravais lattices and other structures, the process including plasma ashing. All five two dimensional Bravais lattices (e.g. square, triangular, rhombic) may be recoded using a three-beam exposure system. The techniques for fabricating two dimensional photonic crystals may also be applied to more complex three-dimensional structures, including 3D Bravais lattices and other structures. All fourteen of the Bravais lattice can be recorded using three beams or even two beams using more multiple exposure techniques. Dual-beam multiple exposure schemes may be used with the recording medium undergoing a single axis rotation between each exposure.

Discussion of Various Implementations of Deep SRGs or EPSs

In many embodiments, deep SRGs can provide a means for controlling polarization in a waveguide. SBGs are normally P-polarization selective, leading to a 50% efficiency loss with unpolarized light sources such as OLEDs and LEDs. Hence, combining S-polarization diffracting and P-polarization diffracting periodic structures can provide a theoretical 2× improvement over waveguides using P-diffracting periodic structures only. In some embodiments, an S-polarization diffracting periodic structures can be provided by a periodic structure formed in a conventional holographic photopolymer. In some embodiments an S-polarization diffracting periodic structures can be provided by a periodic structure formed in a HPDLC with birefringence altered using an alignment layer or other process for realigning the liquid crystal directors. In some embodiments, an S-polarization diffracting periodic structure can be formed using liquid crystals, monomers and other additives that naturally organize into S-diffracting periodic structures under phase separation. In many embodiments, an S-polarization diffracting periodic structures can be provided by SRGs. Using the processes described above, a deep SRG exhibiting high S-diffraction efficiency (up to 99%) and low P-diffraction efficiency can be formed by removing the liquid crystal from SBGs formed from holographic phase separation of a liquid crystal and monomer mixture.

Deep SRGs can also provide other polarization response characteristics. Several prior art theoretical studies such as an article by Moharam (Moharam M. G. et al. “Diffraction characteristics of photoresist surface-relief gratings”, Applied Optics, Vol. 23, page 3214, Sep. 15, 1984) point to deep surface relief gratings having both S and P sensitivity with S being dominant. In some embodiments, deep SRGs demonstrate the capability of providing an S-polarization response. However, deep SRGs may also provide other polarization response characteristics. In many embodiments, deep surface relief gratings having both S and P sensitivity with S being dominant are implemented. In some embodiments, the thickness of the SRG can be adjusted to provide a variety of S and P diffraction characteristics. In several embodiments, diffraction efficiency can be high for P across a spectral bandwidth and angular bandwidth and low for S across the same spectral bandwidth and angular bandwidth. In number of embodiments, diffraction efficiency can be high for S across the spectral bandwidth and angular bandwidth and low for P across the same spectral bandwidth and angular bandwidth. In some embodiments, high efficiency for both S and P polarized light can be provided. A theoretical analysis of an SRG of refractive index 1.6 immersed in air (hence providing an average grating index of 1.3) of period 0.48 micron, with a 0 degrees incidence angle and 45 degree diffracted angle for a wavelength of 0.532 micron is shown inFIGS.5-7.FIG.5 is a graph showing calculated P-polarized and S-polarized diffraction efficiency versus incidence angle for a 1-micrometer thickness deep surface relief grating, demonstrating that in this case high S and P response can be achieved.FIG.6 is a graph showing calculated P-polarized and S-polarized diffraction efficiency versus incidence angle for a 2-micrometer thickness deep surface relief grating, demonstrating that in this case the S-polarization response is dominant over most of the angular range of the grating.FIG.7 is a graph showing calculated P-polarized and S-polarized diffraction efficiency versus incidence angle for a 3-micrometer thickness, demonstrating that in this case the P-polarization response is dominant over a substantial portion of the angular range of the grating.

In many embodiments, a photonic crystal can be a reflection periodic structure or deep SRG formed by a LC extraction process. A reflection deep SRG made using phase separation followed by LC subtraction can enable wide angular and spectral bandwidth. In many embodiments replacing the current input SBG with a reflection photonic crystal can be used to reduce the optical path from a picture generation unit (PGU) to a waveguide. In some embodiments, a PGU pupil and the waveguide can be in contact. In many embodiments, the reflection deep SRG can be approximately 3 microns in thickness. The diffracting properties of an LC extracted periodic structure mainly result from the index gap between the polymer and air (not from the depth of the periodic structure as in the case of a typical SRG).

Discussion of Thiol Additives within Initial Mixture

FIGS.9A and9B illustrate comparative scattering electron microscopy (SEM) images of example mixtures used to fabricate polymer-air SRGs. As discussed previously, the monomer within the initial mixture may be acrylate or thiolene based. It has been discovered that with some monomers such as acrylate-based monomers, after holographic exposure, during washing, the solvent not only removes liquid crystal material but also polymer which is unideal. It has been discovered that a multifunctional thiol additive may solve this issue by strengthening the polymer and thus allowing it to be strong enough to withstand the solvent wash. Without limiting to any particular theory, thiol additive may improve the mechanical strength of formulations consisting of low functionality acrylate monomers which tend to form mechanically weak polymers due to reduced cross-linking. Acrylate monomer formulations may be advantageous because they may exhibit high diffraction efficiency with lower haze. Thus, adding thiol could allow Acrylate monomer formations to be a viable option in fabrication of polymer SRGs.

There may be a trade-off between phase separation, periodic structure formation, and mechanical strength between different formulations. Periodic structure formation may benefit from mixtures that contain low functionality monomers that react slower, form fewer cross-linkages, and allow greater diffusion of non-reactive components (e.g. LC) during holographic exposure. Conversely, mixtures consisting of high functionality monomers may exhibit better phase separation and polymer mechanical strength due to greater cross-linking, but may react so rapidly that the non-reactive components do not have sufficient time to diffuse and thus may exhibit lower diffraction efficiency as a result.

Without limitation to any particular theory, the thiol additives may get around these limitations by reacting with acrylates or isocyanate-acrylates to form a loose scaffolding prior to holographic exposure. This scaffolding may improve the mechanical strength and uniformity of the cured polymer. Thus, the mechanical strength may be tuned through slight adjustments of the thiol functionality and concentration without significantly raising the average functionality of the monomer mixture and disrupting grating formation.

FIG.9A illustrates an initial mixture whereasFIG.9B illustrate a comparative mixture which includes 1.5 wt % thiol. However, other weight percentages of thiol additive have been contemplated. For example, a weight percentage of thiol additive may be 1 to 4% or 1.5% to 3%. In some embodiments, the multifunctional thiol may be trimethylolpropane tris(3-mercaptopropionate). BothFIGS.9A and9B include polymerdense regions902a/902bandair regions904a/904b. As illustrated, the added thiol may produce a denser polymer structure within the polymerdense regions902aofFIG.9B than the polymerdense regions902bofFIG.9A which may increase grating performance. It has been discovered that the weight percentage of thiol additive should be balanced in order to provide stability within the polymer structure to withstand the solvent wash however not to be rigid as to not allow the liquid crystal to be released during the solvent wash.

Comparison Between HPDLC Periodic Structure Performance with Polymer-Air SRG Performance

FIGS.10A and10B illustrates images of comparative examples of an HPDLC grating and a polymer SRG or EPS.FIG.10A illustrates performance for an example HPDLC periodic structure where liquid crystal has not been removed. The periodic structure ofFIG.10A includes a 20-30% P-diffraction efficiency while exhibiting a nominal or almost 0% S-diffraction efficiency.FIG.10B illustrates performance of an example polymer-air SRG where the LC has been removed. The periodic structure ofFIG.10B includes a 18-28% P-diffraction efficiency while exhibiting a S-diffraction efficiency of 51-77%. Thus, polymer-air SRGs where LC has been removed demonstrate a comparatively high S-diffraction efficiency while maintaining a comparable P-diffraction efficiency. Further, the grating ofFIG.10B includes a P-diffraction haze of 0.11-0.15% and a S-diffraction haze of 0.12-0.16%.

FIGS.11A and11B illustrates plots of comparative examples of an HPDLC periodic structure where liquid crystal has not been removed and a polymer SRG or EPS where liquid crystal has been removed.FIG.11A illustrates the P-diffraction efficiency and S-diffraction efficiency for an HPDLC periodic structure where liquid crystal remains. Afirst line1102acorresponds to P-diffraction efficiency and asecond line1104acorresponds to S-diffraction efficiency.FIG.11B illustrates the P-diffraction efficiency and S-diffraction efficiency for a polymer SRG or EPS where liquid crystal has been removed. Afirst line1102bcorresponds to P-diffraction efficiency and asecond line1104bcorresponds to S diffraction efficiency. As illustrated, S-diffraction efficiency dramatically increases after liquid crystal has been removed while P-diffraction efficiency remains relatively similar. In some embodiments, the ratio of S-diffraction efficiency to P-diffraction efficiency may be adjusted by using different grating periods, grating slant angles, and grating thicknesses.

Various Example Deep SRG Depths

FIGS.12A and12B illustrate various comparative examples of P-diffraction and S-diffraction efficiencies with deep SRGs of various depths. Each of these plots show diffraction efficiency vs. angle. InFIG.12A, the deep SRG has a depth of approximately 1.1 μm. Thefirst line1102arepresents S-diffraction efficiency and thesecond line1104arepresents P-diffraction efficiency. As illustrated the peak S-diffraction efficiency is approximately 58% and the peak P-diffraction efficiency is 23%. It is noted that the haze for S-diffraction is 0.12% and haze for P-diffraction is 0.11% for this example. Such high diffraction efficiency with low haze may make deep SRGs with a depth of approximately 1.1 μm particularly suitable for multiplexed gratings.

InFIG.12B, the deep SRG has a depth of approximately 1.8 μm. Thefirst line1102brepresents S-diffraction efficiency and thesecond line1104brepresents P-diffraction efficiency. As illustrated the peak S-diffraction efficiency is approximately 92% and the peak P-diffraction efficiency is 63%. It is noted that the haze for S-diffraction is 0.34% and haze for P-diffraction is 0.40% for this example. Thus, both S-diffraction and P-diffraction efficiency increase dramatically with an increased grating depth. It is noted that haze appears to increase with the increased grating depth.

In some embodiments, an EPS may be spatially variable depth for a single EPS grating. In some embodiments, different EPSs on the same substrate may have different depths from each other not forgoing the modulation variation mentioned above on one or more of a multiplicity of EPS gratings on a single substrate. In some embodiments, one or more EPSs may be positioned on each side of a same substrate. In some embodiments, a mixture of planar and multiplexed EPSs may be positioned on a same waveguide.

In some embodiments, multiple EPSs may be positioned on a substrate including spacially varied duty cycle, grating shape, slant, and/or ALD coating properties. The different ALD coating properties may spatially affect modulation.

Various Example Initial LC Concentrations in Mixture

FIGS.13A and13B illustrate the results of a comparative study of various EPSs with various initial LC concentrations in the initial mixture.FIG.13A illustrates S-diffraction efficiency vs. angle.FIG.13B illustrates P-diffraction efficiency vs. angle. InFIG.13A, afirst line1202acorresponds to 20% initial LC content, asecond line1204acorresponds to 30% initial LC content, and athird line1206acorresponds to 40% initial LC content. InFIG.13B, afirst line1202bcorresponds to 20% initial LC content, asecond line1204bcorresponds to 30% initial LC content, and athird line1206bcorresponds to 40% initial LC content. Table 1 illustrates a summary of various results of the comparative study.

TABLE 1
Initial LC	Maximum	Maximum
Content	S-Diffraction	P-Diffraction	S-Diffraction	P-Diffraction
in Mixture	Efficiency	Efficiency	Haze	Haze

20%	10%	5%	0.10%	0.12%
30%	≥40%	18%	0.14%	0.13%
40%	≥55%	23%	0.12%	0.11%

As is illustrated inFIGS.13A and13B and noted in Table 1, the maximum 5-diffraction and maximum P-diffraction appear to both increase with higher initial LC content while the S-diffraction haze and P-diffraction haze stay approximately constant.

FIGS.14A and14B illustrate additional example S-diffraction and P-diffraction efficiencies for various initial LC concentrations.FIG.14A illustrates S-diffraction efficiency for various example EPSs including various initial LC contents.FIG.14B illustrate P-diffraction efficiency for various example EPSs including various LC contents. For bothFIGS.14A and14B, sequentially from top to bottom the lines represent: 32% LC content, 30% LC content, 28% LC content, 26% LC content, 24% LC content, 22% LC content, and 20% LC content. As illustrated, the S-diffraction and P-diffraction efficiencies are directly related to the amount of LC content (e.g. higher LC content yields higher 5-diffraction and P-diffraction efficiencies).

Without being limited to any particular theory, the initial LC content relates to the amount of phase separation between the LC and the monomer that occurs during the holographic exposure process and polymerization process. Thus, a higher LC content will increase the amount of LC rich regions which are removed to make more air regions after washing. The increased air regions make greater refractive index differences (Δn) between the air regions (formerly liquid crystal rich regions) and the polymer rich regions which increases both S-diffraction and P-diffraction efficiencies. In some embodiments, the average refractive index of the polymer SRGs may be adjusted by adjusting the initial neutral substance (e.g. LC) content, thereby either increasing or decreasing the volume of polymer after removal of the neutral substance. Further, increasing the initial neutral substance content may impact the mechanical strength. Thus, an increase or decrease in mechanical strengthener such as thiol additive may be used to balance out the increase or decrease in mechanical strength.

Various Example Grating Thicknesses

FIG.15 is a graph of diffraction efficiency versus grating layer thickness showing the dependence of evanescent coupling on the grating layer thickness. The duty cycle refers to the ratio of the width of a polymer fringe to the width of the air gap between neighboring polymer fringes. In other words, a 90% duty cycle means 90% of the grating is polymer and 10% is air.

Note that increased grating thickness may lead to increased coupling when fringe and substrate refractive indices are matched. For poor refractive index match to substrate (e.g. 1.6 refractive index fringes on 1.8 refractive index substrate) there may be only evanescent coupling, so increasing fringe depth may not affect coupling significantly. The plots inFIG.15 show that a grating structure of refractive index 1.6 with a 90% duty cycle gives an average refractive index of 1.54. Increasing the grating index to 1.65 at the same duty cycle results in an average refractive index of 1.59. No diffraction efficiency exists in either case. Increase the grating refractive index may result in a diffraction efficiency. For example, for a grating structure of index 1.7 and 1.8 with a 90% duty cycle with resulting average refractive indices of 1.63 and 1.72 respectively both provide diffractive efficiency. In some embodiments, there may be grating structures on a 1.8 index substrate with input light incident at 0 degrees to the grating normal.

Embodiments Manufactured Using Various Substrate Configurations

In various embodiments, a pair of substrates may sandwich an unexposed holographic mixture. The pair of substrates may include a base substrate and a cover substrate. Advantageously, the cover substrate may have different properties than the base substrate to allow for the cover substrate to adhere to the unexposed holographic mixture layer while capable of being removed from the formed holographic polymer dispersed liquid crystal periodic structure after exposure. The formed holographic polymer dispersed liquid crystal grating may remain on the base substrate after the cover substrate is removed.

FIGS.16A-16G illustrate an example process flow for fabricating deep SRGs in accordance with an embodiment of the invention. This process flow is similar to the process flows described in connection withFIGS.1A-1D andFIGS.4A-4E and includes many of the same references numbers the description of which is applicable to the description ofFIGS.15A-15G. Further,FIGS.15A-15G also includes acover substrate1502, the function of which will be described in detail below.

InFIG.16A, a pair ofsubstrate212,1502 sandwiches an unexposedholographic mixture layer211. The pair ofsubstrate212,1502 may include abase substrate212 and acover substrate1502. Thecover substrate1502 may have different properties than thebase substrate212 to allow for the cover substrate to adhere to the unexposedholographic mixture layer211 while capable of being removed from the formed holographic polymer dispersed liquid crystal grating after exposure.

InFIG.16B, theholographic mixture layer211 is exposed by a pair of holographic recording beams213,214. As illustrated inFIG.16C, the holographic recording beams213,214 expose theholographic mixture layer211 to form a holographic polymer dispersedliquid crystal grating215. The holographic polymer dispersed liquid crystal grating215 may include alternating polymer rich regions and liquid crystal rich regions. InFIG.16D, thecover substrate1502 may be removed exposing the holographic polymer dispersedliquid crystal grating215.

Advantageously, thecover substrate1502 may have different properties than thebase substrate212 such as different materials or different surface properties. For example, thebase substrate212 may be made out of plastic whereas thecover substrate1502 may be made out of glass. Thecover substrate1502 may be removed allowing the holographic polymer dispersed liquid crystal grating215 to remain on the base substrate without damaging the holographic polymer dispersed liquid crystal grating215 during removal.

In some embodiments, thebase substrate212 may be treated on the surface contacting theholographic mixture layer211 with an adhesion promotion layer such as reagents.

As illustrated inFIG.16E, the liquid crystal may be removed or evacuated from the liquid crystal rich regions between the polymer rich regions leaving air regions. The polymer rich regions and the air regions form polymer-air SRGs216. InFIG.16F, a material of different refractive index from the polymer rich regions may be refilled into the air regions to formhybrid SRGs217. In some embodiments, the material may be a liquid crystal material. The liquid crystal material may be different from the liquid crystal material removed or evacuated from the liquid crystal rich regions. In some embodiments, a portions of the liquid crystal in the liquid crystal rich regions may be left between the polymer rich regions to form thehybrid SRGs217.

InFIG.16G, aprotective substrate218 may be positioned such that thehybrid SRGs217 are between theprotective substrate218 and thebase substrate212. Theprotective substrate218 may be used to protect thehybrid SRGs217. Theprotective substrate218 may be omitted in some instances. Theprotective substrate218 and thecover substrate1502 may have different properties where theprotective substrate218 may add more protection when the grating is implemented into a usable device than thecover substrate1502.

In some embodiments, the polymer-air SRGs216 may be manufactured as described in connection withFIGS.1A-1D. In these embodiments, theprotective substrate218 may be used to protect the polymer-air SRGs216.

In some embodiments thebase substrate212 may be a glass, quartz, or silica substrate including a glass surface. In some embodiments, thebase substrate212 may be a plastic substrate and may be coated with a silicon oxide coating (e.g. SiO₂) which may act similar to a glass surface. The silicon oxide coating or the glass surface may include hydroxyl groups on the top surface. The adhesion promotion material may be coated on top of the silicon oxide coating. The hydroxyl groups may be beneficial in allowing the adhesion promotion material to adhere to thebase substrate212.

In some embodiments, thebase substrate212 may include a glass surface including hydroxyl groups and may be reacted with reagents such that the reagents react with the hydroxyl groups.FIG.17 illustrates an example reaction where thebase substrate212 is exposed toreagents1604 in accordance with an embodiment of the invention. Thebase substrate212 may includehydroxyl groups1608 on the surface. Thebase substrate212 is exposed toreagents1604 and aholographic mixture material1602 including polymer. Thereagents1604 may be a silane coupling agent. In some embodiments, thereagents1604 include (R′O)₃—Si—R where R′O— is an alkoxy group and —R is an organofunctional group. The alkoxy groups may condense with thehydroxyl groups1608 available on the surface resulting in surfaces decorated with organofunctional —R groups, which may promote formation of covalent bonding of the coupling agent with polymeric networks within the holographic polymer dispersedliquid crystal grating215. Thereagents1604 may adhere to thehydroxyl groups1608 and to theholographic mixture material1602 creating improved adhesion when compared to the adhesion of theholographic mixture material1602 without thereagents1604. Theholographic mixture material1602 may form aholographic mixture layer1610 on the surface of thebase substrate212.

FIG.18 illustrates an example reaction wherereagents1704 are exposed to thebase substrate212. Thereagents1704 may include a silane coupling agent as illustrated and may couple to hydroxyl groups on the surface of a glass surface of thebase substrate212.

In some embodiments thecover substrate1502 may be a glass, quartz, or silica substrate including a glass surface. In some embodiments, thecover substrate1502 may be a plastic substrate and may be coated with a silicon oxide coating (e.g. SiO₂) which may act similar to a glass surface. A release layer may be coated on top of the glass surface. In some embodiments, similar to thebase substrate212 discussed above, thecover substrate1502 may include a glass surface including hydroxyl groups and may be reacted with reactants such that the reactants bond with the hydroxyl groups to form the release layer.

FIG.19 illustrates an example process for forming the release layer. Thecover substrate1502 may be exposed to arelease material1804. Therelease material1804 may include a silane based fluoropolymer or fluoro monomer reactant as illustrated. Therelease material1804 may include a fluoropolymer such as OPTOOL UD509 (produced by Daikin Chemicals), Dow Corning 2634, Fluoropel (produced by Cytonix), and EC200 (produced by PPG Industries, Inc) or a fluoro monomer. In some embodiments, therelease material1804 may include a polysiloxane coating. A polysiloxane coating may adhere better to materials such as plastic that do not have hydroxyl groups on the surface. A polysiloxane coating may be more robust and processable, and may be more environmentally-friendly to produce than a fluoropolymer. Therelease material1804 may be applied through vapor deposition, spin coating, or spraying. In some embodiments, thecover substrate1502 may be reusable and thus after removal after holographic exposure, thecover substrate1502 may be placed on another holographic mixture layer which may be exposed with holographic beams.

In some embodiments, thecover substrate1502 and/or thebase substrate212 may be a substrate that does not include SiO₂as discussed above. In these instances, a very thin layer of SiO₂may be applied to the surface to facilitate bonding/adhesion of the applied reagent hence enabling silane chemistry. When thecover substrate1502 and/or thebase substrate212 is a substrate that does not include SiO₂any surface modification followed by bonding can provide adhesion. Surface modification may include treating with reagents to introduce reactive functional groups including but not limited to hydroxyl groups. In some embodiments, thecover substrate1502 and/or thebase substrate212 may not be a glass substrate but may still include hydroxyl groups on the surface. For example, thecover substrate1502 and/or thebase substrate212 may be sapphire or silicate which may include hydroxyl groups on the surface. In this case, the hydroxyl groups may help facilitate adhesion of the reagent and thus the thin layer of SiO₂would not be present. Examples of silicate substrates are manufactured by: Corning Inc. of Corning, NY, Schott AG of Mainz, Germany, Ohara Inc. of Chuo-ku, Sagamihara, Kanagawa, Japan, Hoya Inc. of Japan, AGC Inc. of Marunouchi, Chiyoda-ku, Tokyo, Japan, and CDGM Glass of Central Islip, NY.

In some embodiments, thecover substrate1502 and/or thebase substrate212 may include Cleartran which is a form of chemical vapor deposited (CVD) zinc sulfide. A thin layer of SiO₂may be applied to the Cleartran substrate to facilitate bonding/adhesion of the applied reagent. In some embodiments, thecover substrate1502 and/or thebase substrate212 may be a transparent ceramic such as aluminum oxynitride or magnesium aluminate. A thin layer of SiO₂may be applied to the transparent ceramic substrate to facilitate bonding/adhesion of the applied reagent. In some embodiments, thecover substrate1502 and/or thebase substrate212 may include plastic such as PMMA, acrylic, polystyrene, polycarbonate, cyclic olefin copolymer, cyclo olefin polymer, polyester. A thin layer of SiO₂may be applied to the plastic substrate to facilitate bonding/adhesion of the applied reagent.

Application of Ashing and/or Atomic Layer Deposition Processes in EPS Fabrication

In some embodiments, a further post treatment of the EPSs might be used to remove more of the weak polymer network regions. The post treatment may include using a plasma ashing, to reduce or eliminate this vestigial polymer network. The plasma ashing may be similar to the plasma ashing in semiconductor manufacturing for removing the photoresist from an etched wafer. Exemplary equipment and processes are supplied by Plasma Etch, Inc. incorporated in CA, USA. In plasma ashing, a monatomic (single atom) substance known as a reactive species may be generated from a plasma source and may be introduced into a vacuum chamber where it is used to oxidize or plasma ash the material to be removed. The reactive species may include oxygen or fluorine during the plasma ashing. Advantageously, for processing slanted gratings, the plasma beam can be directional. In some embodiments, the plasma ashing may be inductively coupled plasma ashing which is a process that allows independent control of chemical and physical contributions to the ashing process by forming reactive species and ions. A RF bias on a substrate electrode may be used to control the acceleration of the ions to match the requirements of different surface structures. Electrons and ions in a plasma have different mobilities resulting in a direct current (DC) bias. Electrons, with their low mass, may respond quickly to RF fields, resulting in a fast electron flow to surfaces which in turn imparts a net negative dc bias to the (wafer) surface in contact with the plasma. The voltage difference between the plasma and the wafer surface accelerates positive ions to the surface. The negative DC bias may be used to fine tune many features of the ashing process, such as ashing rate, anisotropy, angular/spatial selectivity and others. In some embodiments, a surface treatment of chemical additives may be applied to the EPS before plasma ashing which may enhance DC bias application. In some embodiments, the EPS may be placed in the presence of a gas such as a noble gas during plasma ashing. The noble gas may be argon. In some embodiments, the plasma ashing may be used to adjust at least one of fringe shape and spatial variation of the polymer grating structure. In some embodiments, the plasma ashing beam intensity may be variable to provide spatially varying modulation depths. Angular variation of the intensity of the plasma ashing beam may be used for fringe shaping. In some embodiments, the plasma ashing may be applied along more than one intersecting direction for forming a photonic crystal. In some embodiments, a high functionality acrylate around the edge of the diffracting features may change the density of a diffracting feature of the EPS with the plasma ashing rate being controlled at a spatial resolution comparable to the EPS spatial frequency. The morphology of the EPS may be modified to improve grating performance and increase the efficiency of processes such as ashing, improve the grating definition, change the surface structure to reduce haze adding materials for increasing the chemical affinity with gases present during the plasma ashing process, and/or change the effective refractive index of the grating. In some embodiments, the modulation depth of the EPS may be determined by the plasma ashing time since the greater the plasma ashing time the more material is removed.

In some embodiments, oxygen and/or fluorine may be used as reactive species in the plasma ashing process. In some embodiments, hydrogen plasmas may be used in the plasma washing process. In some embodiments, ashing rates in oxygen plasma may be controlled by additives in the HPDLC mixture such as nitrogen. In some embodiments, a plasma ashing process for ashing organic material may use a gas mixture of oxygen and NH₃. An oxygen based process may suffer from substrate surface oxidation. In some embodiments, the plasma ashing process may include oxygen free plasmas which may include mixtures of nitrogen and hydrogen to overcome surface oxidation. Such plasma mixtures may further comprise fluorine.

In some embodiments, post coating the EPSs with a very thin atomic layer of high index material can enhance the diffractive properties (e.g. the refractive index modulation) of the grating. The coating may be a metallic layer or a dielectric layer. One such process, Atomic Layer Deposition (ALD), involves coating the gratings with TiO₂or ZnO₂or similar. The coating may provide a grating structure that is more robust against temperature variations and various other environmental conditions. The ALD process can also provide a large effective index even when the grating structures are made of lower index materials. This technique may be similarly applied to the fabrication of nanoimprinted SRGs where a few nanometer thick ALD can protect the resin into which the SRG is stamped and can also improve the effective refractive index modulation. The use of Atomic Layer Deposition (ALD) on top of an EPS may yield further performance improvement. In many embodiments, the duty cycle of the EPS might not be optimal for weak polymer networks. In some embodiments, the duty cycle of the EPS may be 30% polymer.

Various EPS manufacturing processes are described above inFIGS.1A-1D.FIGS.3A and3B illustrate various EPSs after manufacturing.FIGS.20A and20B illustrate various grating in accordance with an embodiment of the invention. The grating includes many identically numbered elements to those ofFIGS.3A and3B. The description of these elements ofFIGS.3A and3B are applicable to the gratings ofFIGS.19A and19B and will not be repeated in detail. The gratings may be EPSs which are manufactured using processes described in connection withFIGS.1A-1D andFIG.2. The gratings may also be hybrid gratings which are manufactured using processes described in connection withFIGS.4A-4E and5. As illustrated inFIGS.19A and19B, the grating may include acoating1902. Thecoating1902 may be present on the horizontal surfaces such as the top of thepolymer regions3004aand thesubstrate3002. As illustrated,FIG.19B includes anoptical layer3008 which is in direction contact with thesubstrate3002 such that theoptical layer3008 is positioned between thepolymer regions3004aand thesubstrate3002. Thecoating1902 may be positioned on theoptical layer3008. Thecoating1902 may be deposited using a process such as ALD. Thecoating1902 may not have step coverage and thus only be deposited on the horizontal surfaces such as the top of thepolymer regions3004aand thesubstrate3002 oroptical layer3008. In some embodiments, thecoating1902 may be deposited using a process that includes step coverage such that thecoating1902 is present on the sidewalls of thepolymer regions3004a. In some embodiments, thecoating1902 may be TiO₂or ZnO₂. Thecoating1902 may be multilayered to include multiple different layered materials. In some embodiments, an additional passivation coating may be applied to the surfaces of the polymer grating structure over thecoating1902. The additional passivation coating may provide environmental protection (e.g. protection from moisture and/or contamination).

In some embodiments, thecoating1902 may be present on thesubstrate3002 oroptical layer3008 and not the top of thepolymer regions3004a.FIG.20C illustrates a grating in accordance with an embodiment of the invention. The grating includes many identically numbered elements to those ofFIGS.3A and3B. The description of these elements ofFIGS.3A and3B are applicable to the gratings ofFIG.20C and will not be repeated in detail. As illustrated, the grating ofFIG.20C includes acoating1902 similar toFIGS.20A and19B. However, thecoating1902 is only present on thesubstrate3002 and not the tops of thepolymer regions3004aas is the case inFIGS.20A and20B. In embodiments with anoptical layer3008, thecoating1902 may only be present on theoptical layer3008 and not on the tops of thepolymer regions3004a. In some embodiments, thecoating1902 may be removed off the tops of thepolymer regions3004aor thecoating1902 may be selectively deposited on thesubstrate3002. Thecoating1902 may function as a bias layer similar to theoptical layer3008.

Embodiments Including Slanted EPSs

In some embodiments, the gratings include slanted EPSs making up slanted gratings. Slanted gratings can be configured as binary gratings, blazed gratings, and/or multilevel gratings and other structures. Slanted gratings may couple monochromatic angular light into waveguides with high diffraction efficiency. They also allow angular content to be managed more efficiency once the light is inside the waveguide. When configured with stepwise or continuously spatially varying K-vectors the angular bandwidth that can be coupled into a waveguide may be increased.

Embodiments Including Eyeglow Suppression

In waveguide-based displays light may be diffracted toward the user and also away from the user. Eye glow may include unwanted light emerging from the front face of a display waveguide (e.g. the waveguide face furthest from the eye) and originating at a reflective surface of the eye, a waveguide reflective surface and a surface of grating (due to leakage, stray light diffractions, scatter, and other effects). The light that is diffracted away is commonly called “eye-glow” and poses a liability for security, privacy, and social acceptability. “Eye glow” may refer to the phenomenon in which a user's eyes appear to glow or shine through an eye display caused by leakage of light from the display, which creates an aesthetic that can be unsettling to some people. In addition to concerns regarding social acceptability in a fashion sense, eye glow can present a different issue where, when there is sufficient clarity to the eye glow, a viewer looking at the user may be able to see the projected image intended for only the user. As such, eye glow can pose a serious security concern for many users. A discussion of various eyeglow suppression systems is discussed in detail in WO 2021/242898, entitled “Eye Glow Suppression in Waveguide Based Displays” and filed May 26, 2021, which is hereby incorporated by reference in its entirety for all purposes.

FIGS.21A-21C conceptually illustrate three embodiments of waveguides in which evanescent coupling into a grating can occur. In these embodiments, agrating layer2004 is positioned on asubstrate2002. InFIG.21A, twoidentical substrates2002,2006 sandwich thegrating layer2004. InFIG.21B, athin substrate2006aand athick substrate2006 sandwich thegrating layer2004. InFIG.21C, athick substrate2002 supports thegrating layer2004 without the presence of a top substrate. Thetop substrate2006,2006amay be a cover substrate or coating. In other embodiments, a thin protective coating can be applied to thegrating layer2004. The upper surface of each the waveguide embodiments faces the user's eye. Thegrating layer2004 may eject light2010 from the waveguide towards the user's eye.Unwanted eyeglow light2008 may also be ejected towards the environment as illustrated in the cases ofFIGS.21A and21B.

Eyeglow and/or light leakage can be reduced from the opposing outer surface by eliminating the top substrate as illustrated inFIG.21C. The elimination of an upper substrate may result in less eyeglow/light leakage than the other two embodiments. Note that, in each embodiment illustrated, all rays shown undergoing TIR are at TIR angles that may be evanescently coupled to thegrating layer2004. Zero order light rays are indicated by dashed lines. In some embodiments, the evanescent grating coupling may result in eyeside output light substantially normal to the waveguide, as shown.

Where the grating average refractive index is lower than the substrates, then for high angles (far from TIR) where only evanescent coupling can occur, zero order TIR light cannot pass through thegrating layer2004 to TIR off both air interfaces. Light propagating in TIR can therefore get trapped on one side of the grating or the other. Grating depth in the thickness of the waveguide may affect the amount of light that is coupled to the desired eyeside, and the undesired non-eye side where light is lost as eyeglow/light leakage. In some embodiments, evanescent coupling may result in at least a portion of the coupled light being converted to guided modes within at least one the grating and the eyeside waveguide substrate2006,2006a. The evanescent coupling behaviors may be a function of the TIR angle, grating thickness, modulation, average index and the index and thickness of theeyeside substrate2006,2006a.

In some embodiments, a slanted EPS may also provide eyeglow suppression. One advantage to the use of EPSs in the context of eyeglow suppression and other stray light control applications such as glint suppression, is that a variety of grating types can be implemented on a waveguide substrate to provide different types of beam angular selectivity for dealing with the stray light present in various regions of the waveguide. In some regions of a waveguide where wide angle capability is desired, an EPS may be configured as a Raman-Nath grating, which may have a modulation depth less than the grating pitch across at least a portion of the polymer grating structure. In other regions where high diffraction efficiency for certain beam angles is required, an EPS may operate in the Bragg regime.

Embodiments Including Inverse Gratings

In some embodiments, the gratings disclosed in connection withFIGS.20A and20B may be used to create inverse gratings. These inverse gratings may be thin film gratings.FIGS.22A-22D illustrate various stages of manufacturing an inverse grating in accordance with an embodiment of the invention. The various stages of manufacturing includes many identically numbered elements to those ofFIGS.3A,3B,20A, and20B. The description of these elements ofFIGS.3A,3B,20A, and20B are applicable to the gratings ofFIG.20C and will not be repeated in detail.FIG.22A corresponds to the structure created inFIG.1B which includespolymer regions3004aseparated by phase separatedmaterial2102. The phase separation grating may be formed from a mixture of monomer and a second component deposited onto thesubstrate3002 using the recording process described above. The second component can include a liquid crystal or a suspension of nanoparticles. Other materials capable of phase separation can be used. After exposure, a grating may be created including alternating fringes rich in polymer and fringes rich in the second component.

InFIG.22B, the phase separatedmaterial2102 is removed to createair gap regions3004bto create an EPS. The EPS structure created inFIG.22B corresponds to the EPS structure inFIG.3A. In this step, the second component can be removed to form a polymer surface relief grating including polymer regions separated by air spaces.

InFIG.22C, acoating1902 is applied to the surfaces of thesubstrate3002 and the tops of thepolymer regions3004a. In some embodiments, thecoating1902 may be applied through an ALD process. The structure created inFIG.22C corresponds to the structure inFIG.19A. In some embodiments, theair regions3004bcan be at least partially backfilled with a material of refractive index differing from that of thepolymer regions3004a. The backfilling can be performed by applying an ALD coating similar to the one described above. In some embodiments, the ALD coating may be higher thickness than the thin coatings described in connection withFIGS.20A-20C. Other methods of backfilling the grating may be used depending on the type of material and the thickness of backfilled layer. The backfill material can have an index higher or lower than that of thepolymer regions3004a, according to the intended grating application. At the end of this step, the polymer surface relief grating may be partially filled with the backfill material as shown inFIG.22C. As illustrated, some of the backfill material may adhere to the top faces of thepolymer regions3004a. Some of the backfill material may also adhere to the upper portions of thepolymer regions3004a.

InFIG.22D, thepolymer regions3004aare removed. Thecoating1902 on the tops of thepolymer regions3004ais removed as well. The remainingcoating1902 disposed on thesubstrate3002 may be used as an inverse grating. The remainingcoating1902 alternates withair regions2104. In this step, thepolymer regions3004aandunwanted coating1902 can be removed using an etching process such as a plasma ashing process to reveal a slanted Bragg surface relief grating composed of thecoating1902 supported by thesubstrate3002. In some embodiments, thepolymer regions3004amay be removed through a plasma ashing technique. The inverse grating may be a thin film Bragg surface relief grating.

Embodiments for Fabricating a Surface Relief Grating with Improved Grating Definition

One strategy for reducing haze is to reduce the surface roughness of SRGs. In many embodiments, a composite grating with improved surface definition, e.g. low surface roughness.FIG.23A illustrates a schematic representation of a grating in accordance with an embodiment of the invention. In a first step, the grating may be formed using phase separation of a starting mixture including a material A and a material B using the procedures discussed earlier. Material A may be a polymer. After curing of the grating, component B may be extracted to leave a grating including high indexregions containing voids2301 embedded inpolymer2302 and low index regions containing a weak polymer structure and other residues resulting from incomplete phase separation. The polymer structure and other residues may be further removed using a process such as plasma ashing to leaveair regions2303.

FIG.23B illustrates a schematic representation of a grating in accordance with an embodiment of the invention. The grating may be manufactured with a process starting with the process described in connection ofFIG.23A. In a next step, the grating is immersed in a material C which fills thevoids2304 and air regions2305. The material C may be cured using a process such as UV exposure.

FIG.23C illustrates a schematic representation of a grating in accordance with an embodiment of the invention. The grating may be manufactured with a process starting with the process described in connection ofFIG.23B. In a next step, material C may be removed from the gap regions by a process such as plasma ashing to leave composite polymer andmaterial C regions2306 separated byair gaps2307. The plasma ashing step may be separate from the plasma ashing step described in connection withFIG.30A. After plasma ashing, the composite material may have a smoother surface thepolymer2302 described in connection withFIG.23A. Material A and material C may provide a refractive index contrast that is low enough to minimise scattering while providing a desired refractive index modulation.

In many embodiments bulk scatter may be strongly influenced by the refractive index contrast within the high index region while surface scattering may be dependent on the surface texture. In many embodiments, by filling surface voids as in the process discussed inFIGS.23A-23C in combination with ashing may result in a smoother surface structure. In many embodiments, the above process may be used to eliminate the bulk scatter contributions that may arise from voids within thepolymer regions2304.

FIG.24 illustrates an example process flow for fabricating SRGs in accordance with an embodiment of the invention. In a first step, a grating structure may be formed2410 using a phase separation process utilizing a starting mixture including a material A and a material B. After phase separation, there may be a material A rich region and a material B rich region. In a second step which includes a first ashing step, material B may be extracted (2411) to leave a grating structure including high index regions containing voids embedded in polymer and index regions containing a residual polymer matrix. The material B rich regions may become an air regions after the first ashing step. In a third step, the grating structure may be immersed (2412) in a material C to fill the voids in the polymer rich regions and air regions. In a fourth step, the material C may be extracted (2413), using a second ashing step, to remove material C from the previous air regions to leave a composite polymer and material C region separated by air gaps. As described previously, this may result in a lower surface roughness in the fabricated SRGs. In some embodiments, the SRGs may be deep SRGs as discussed previously.

Surface Relief Gratings Configured as Dual Interaction Gratings

In conventional Bragg gratings, dual interaction can be understood using basic ray optics by considering upwards and downward TIR ray interactions with a fold grating. The upward and downwards rays occurring when guided light is reflected at the lower and upper waveguide TIR surfaces. The two ray paths give rise to two shifted diffraction efficiency vs angle characteristics which combine to extend the angular bandwidth. Examples of an optical waveguide including at least two TIR surfaces and containing a grating of a first prescription configured such that an input TIR light with a first angular range along a first propagation direction undergoes at least two diffractions within said grating and undergoes a change in propagation direction from said first propagation direction to a second propagation direction, wherein each ray from said first angular range and its corresponding diffracted rays lie on a diffraction cone of said grating, wherein each diffraction provides a unique TIR angular range along said second propagation direction are disclosed in U.S. Pat. No. 9,632,226, entitled “Waveguide Grating Device” and filed Feb. 12, 2015, which is incorporated herein by reference in its entirety for all purposes.

FIGS.25A and25B illustrate the principles of a dual interaction grating for implementation in a waveguide. Thewaveguide30 includesgrating fringes31 slanted with respect to the waveguide TIR faces and aligned at a clocking angle within the waveguide plane. In many embodiments clocking angle may be 45 degrees to provide a 90 degree beam deflection. InFIG.25A, a first TIR path lies in theinput propagation plane2020 and, after diffraction in theoutput propagation plane2021. The grating has a k-vector2022 also labelled by the symbol k. Thetilt angle2023 of the grating fringes relative to the waveguide surface normal2024 is also indicated. TIR light2025 in the propagation plane2001 having aTIR angle2026 relative to the waveguide plane normal2027 strikes the grating fringe as an upward-goingray2028 which is diffracted into theTIR direction2029 lying inside thepropagation plane2021. InFIG.25B, a second TIR path in the input propagation plane2001 indicated by2030 has aTIR angle2031 relative to the waveguide plane normal2027 strikes the grating fringe as a downward-goingray2033 which is diffracted into theTIR direction2034 lying inside theoutput propagation plane2021. Since the upward-going and downward-going TIR rays are asymmetric in this case there may be two peaks in the output diffraction efficiency versus angle characteristics.

FIG.26 conceptually illustrates a cross section of a grating in accordance with an embodiment of the invention. The grating may be aSRG2100 including slantedfringes2101 separated byair volumes2103. In many embodiments, the gratings may be clocked or slanted within the waveguide plane.FIG.27 is a conceptual representation of beam propagation with the grating ofFIG.26. The grating is represented as aconfiguration2110 which for conceptual purposes may be divided up into a deepgrating portion2111 including alternatinghigh index fringes2113 andlow index fringes2114, which operates in the Bragg regime, overlaid by a thingrating portion2112 including alternatinghigh index regions2115 andlow index regions2116 which operates in the Raman-Nath regime. In many embodiments, thehigh index regions2115 are polymer and thelow index regions2116 are air. Thegrating configuration2110 supports TIR beam propagation include ray paths such as2117. To simplify the explanation of the embodiment the guided ray reflection as represented by therays2118,2119, is represented as taking place at the interface of thevolume grating portion2111 and the thingrating portion2112. A reasonable approximation of the TIR at the thingrating portion2112 may be considered separated from the coupled wave propagation through thevolume grating portion2112.

In some embodiments, the thickgrating portion2112 may be partially backfilled with a different refractive index material up to the level of the thingrating portion2112 and thickgrating portion2111 interface.FIG.28 illustrates an example of a partially backfilled grating2121 in accordance with an embodiment of the invention. This partially backfilled grating2121 may be considered a hybrid surface relief grating/volume Bragg grating. The backfilled grating2121 is the grating described in connection withFIG.27 that has been backfilled with a different refractive index material. The backfilled grating2121 may be considered a volume grating. In many embodiments, the unfilled regions that remain after partial backfilling of the air regions may provide a polymer Raman-Nath surface relief grating2802 including alternating polymer regions and air regions overlaying a Bragg grating2804 comprising alternating polymer regions and backfilled material regions. In a waveguide implementation the upward and downward TIR propagation directions may be produced by TIR at the waveguide to air interfaces.

The dual interaction illustrated inFIGS.25A-25B may include upward and downward propagating TIR rays. In an SRG, one of the TIR propagation directions results from the reflective diffraction at the SRG taking place at an angle equal to the TIR angle. The SRG may allow diffraction TIR to take place with high efficiency subject to some constraints on the ranges of incidence angles, K-vector directions, grating clock angles, grating period, and/or grating thickness. In some embodiments, the SRG may be a fold grating. Hence a firstTIR propagation direction2119 produced by the surface grating and an opposingTIR propagation direction2120 produced by reflection from the opposite face of the grating substrate may interact within the volume grating portion shown inFIG.28. In many embodiments, this ray-grating interaction may result in a dual interaction according to the embodiments and teachings of U.S. Pat. No. 9,632,226 which is hereby incorporated by reference in its entirety for all purposes. The grating diffraction efficiency may be dependent on the at least one of the guide beam angular bandwidth, grating vector, grating thickness, and/or grating fringe spacing. In some embodiments, the thickgrating portion2111 may be eliminated to provide only the thin surfacerelief grating portion2112 supported by a transparent substrate.

Hybrid surface relief grating/volume Bragg grating structures may offer several advantages including wider cumulative angular response which, in many embodiments, may allow thicker gratings to be used for improving DE without compromising angular bandwidth. Coating the hybrid gratings with an ALD coating to increase the effective index may further enhance the angular bandwidth. In many embodiments, the hybrid surface relief grating/volume Bragg grating structures may improve the diffraction efficiency for P-polarized light. In some embodiments, a hybrid surface relief grating/volume Bragg grating structures formed by phase separating a mixture of an inorganic component and a monomer may include fully inorganic SRG after complete removal of the final polymer component from the cured grating. In many embodiments the inorganic component may be nanoparticles. In many embodiments, a hybrid surface relief grating/volume Bragg grating structures may be used in at least one of a fold grating and/or an output grating to reduce haze and to reduce coupling losses in a fold grating. Reducing haze may increase contrast. Reducing coupling losses in the fold grating may be equivalent to increasing diffraction efficiency in the fold grating. In many embodiments, a polymer/air SRG may be used as an input grating with high diffraction efficiency.

As illustrated previously, hybrid surface relief grating/volume Bragg grating structures may be formed by partial back filling of a grating structure to form a structure comprising a volume Bragg grating with an overlaid surface relief grating. Hybrid surface relief grating/volume Bragg grating structures may show improved angular response after an additional plasma ashing or reactive ion etch.

In many embodiments, hybrid surface relief grating/volume Bragg grating structures may be formed during holographic phase separation and curing. In many embodiments, the grating may be formed in a cell in which the grating material is sandwiched by a base substrate and a release layer. The surface structure may be revealed when the release layer is removed. Without limitation to any particular theory, the surface grating may be formed because of polymerization induced shrinkage during to mass migration and phase separation. The relative depths of high and low index regions can be adjusted by utilizing an additional plasma ashing step. An ALD deposited layer can be added to the grating surface to increase effective index. In many embodiments, the grating thickness may be 1.1 microns with a grating period of 375 nm and a 22-degree slant angle (relative to the cell optical surface normal). The finished gratings may be isotropic or anisotropic depending on the system components in the initial mixture.

FIG.29 schematically illustrates a ray-gratinginteraction geometry2130 of a TIR surface grating. Such configurations are commonly referred to as conical diffraction configurations. For a TIR grating recorded on a transparent substrate of refractive index n_Simmersed in a low index medium of index n₀(which in many embodiments will be air) but can be any medium satisfying the relation n_S>n₀, only reflected diffracted orders exist for rays that satisfy the relation n_S/n₀≤|sin(u_inc)|≤1. Referring to the xyz Cartesian reference frame inFIG.28, the equations relating incident and diffracted ray angles to the grating vectors may be expressed as follows:
xdirection: −k n_Ssin(u_inc)+K_Scos(φ_S)=−k n_Ssin(u_diff)cos(φ_diff);
ydirection:K_Ssin(φ_S)=k n_Ssin(u_diff)sin(φ_diff); and
zdirection:k n_Scos(u_inc)=k n_Scos(u_diff)+K_S/tan(φ_S).
where u_incis the polar angle of the incident ray vector r_inc, φ_Sis the azimuth angle of the incident ray, u_diffis the polar angle of the diffracted ray vector r_diff, φ_Sis the azimuth angle of the grating vector, and us is the polar angle of the grating vector K.

The wavenumber k of the incident light may be provided by k=2π/λ, where λ is the wavelength of the guided light. The modulus of the surface component of the grating vector is given by K_S=k=2π/Λs where Λs is the surface grating pitch. Solutions to the above equations may be obtain by setting the incidence angle equal to the diffracted angle.

In many embodiments, the dual interaction grating is implemented in a polymer grating structure comprising alternating polymer rich and air regions. In many embodiments, the grating depth of the polymer grating structure is less than the Bragg fringe spacing. In many embodiments, the grating depth of the polymer grating structure is greater than the Bragg fringe spacing. In many embodiments, the total internal reflection from the polymer grating structure occurs when the first order diffraction from the polymer grating structures has a diffraction angle equal to the TIR angle of the waveguide. In many embodiments, the polymer grating structure provides no transmitted diffraction orders. In many embodiments, the polymer grating structure is a photonic crystal. In many embodiments, the polymer grating structure is configured as a Raman Nath grating having a first grating period overlaying a Bragg grating having the same grating period with the minima of the Raman Nath grating overlaying the minima of the Bragg grating. In many embodiments, the polymer grating structure is a slanted grating. In many embodiments, the air regions of polymer grating structure may be at least partially backfilled with a material having a refractive index different than that of the polymer rich regions.

Embodiments Including OLED Arrays as Image Generators

There is growing interest in the use of Organic Light Emitting Diode (OLED) arrays as image generators in waveguide displays. OLEDs have many advantages in waveguide display applications. As an emissive technology, OLEDs require no light source. OLEDs can be printed cost-effectively over large areas. Non-rectangular pixel array patterns can be printed onto curved or flexible substrates. As will be discussed below, the ability to pre-distort a pixel array and create a curved focal plane adds a new design dimension that can enable compensation for guided beam wavefront distortions caused by curved waveguides and prescription lenses supported by a waveguide. OLEDs with resolutions of 4K×4K pixels are currently available with good prospects of higher resolution in the near term, offering a faster route to high resolution, wide FOV AR displays than can be provided by technologies such as Liquid Crystal on Silicon (LCoS) and Micro Electro Mechanical Systems (MEMS) devices such as digital light processing (DLP) devices. Another significant advantage over LCoS is that OLEDs can switch in microseconds (compared with milliseconds for LC devices).

OLEDs have certain disadvantages. In their basic form, OLEDs are Lambertian emitters, which makes efficient light collection much more challenging than with LCoS and DLP micro displays. The red, green, and blue spectral bandwidths of OLEDs are broader than those of Light Emitting Diodes (LEDs), presenting further light management problems in holographic waveguides. The most significant disadvantage of OLEDs is that in waveguides using HPDLC periodic structures such as switchable periodic structures, which tend to be P-polarization selective, half of the available light from the OLED is wasted. As such, many embodiments of the invention are directed towards waveguide displays for use with emissive unpolarized image sources that can provide high light efficiency for unpolarized light and towards related methods of manufacturing such waveguide displays.

For the purposes of describing embodiments, some well-known features of optical technology known to those skilled in the art of optical design and visual displays have been omitted or simplified in order to not obscure the basic principles of the invention. Unless otherwise stated, the term “on-axis” in relation to a ray or a beam direction refers to propagation parallel to an axis normal to the surfaces of the optical components described in relation to the invention. In the following description the terms light, ray, beam, and direction may be used interchangeably and in association with each other to indicate the direction of propagation of electromagnetic radiation along rectilinear trajectories. The term light and illumination may be used in relation to the visible and infrared bands of the electromagnetic spectrum. Parts of the following description will be presented using terminology commonly employed by those skilled in the art of optical design. As used herein, the term grating may encompass a grating comprised of a set of gratings in some embodiments. For illustrative purposes, it is to be understood that the drawings are not drawn to scale unless stated otherwise.

Turning now to the drawings, methods and apparatus for providing waveguide displays using emissive input image panels in accordance with various embodiments of the invention are illustrated.FIG.30 conceptually illustrates a waveguide display in accordance with an embodiment of the invention. As shown, theapparatus100 includes awaveguide101 supportinginput102 andoutput103 gratings with high diffraction efficiency for P-polarized light in a first wavelength band andinput104 andoutput105 gratings with high diffraction efficiency for S-polarized light in the first wavelength band.

Theapparatus100 further includes anOLED microdisplay106 emitting unpolarized light with an emission spectral bandwidth that includes the first wavelength band and acollimation lens107 for projecting light from theOLED microdisplay106 into a field of view. In the illustrative embodiment, the S and P diffracting gratings102-105 can be layered with no air gap required. In other embodiments, the grating layers can be separated by an air gap or a transparent layer. The S and P diffracting gratings102-105 may be the deep SRGs or EPSs described above.

FIG.31 conceptually illustrates a waveguide display in accordance with an embodiment of the invention in which the P-diffracting and S-diffracting gratings are disposed in separate air-spaced waveguide layers. As shown, theapparatus110 comprises upper111 and lower112 waveguide layers (supporting thegratings102,103 and104,105, respectively) separated by anair gap113. Thegratings102,103 and104,105 may be the deep SRGs and EPSs described above.

FIG.32 conceptually illustrates typical ray paths in a waveguide display in accordance with an embodiment of the invention. In theembodiment120 illustrated inFIG.32, amicrodisplay106 is configured to emitunpolarized light121 in a first wavelength band, which is collimated and projected into a field of view by acollimator lens107. The S-polarized emission from themicrodisplay106 can be coupled into a total internal reflection path in awaveguide101 by an S-diffracting input grating104 and extracted from thewaveguide101 by an S-diffractingoutput grating105. P-polarized light from themicrodisplay106 can be in-coupled and extracted using P-diffracting input andoutput gratings102,103 in a similar fashion. Dispersion can be corrected for both S and P light provided that the input and output gratings spatial frequencies are matched. The input andoutput gratings102,103 may be the deep SRGs or EPSs described above.

AlthoughFIGS.23-25 show specific waveguide display configurations, various configurations including modifications to those shown can be implemented, the specific implementation of which can depend on the specific requirements of the given application. Furthermore, such displays can be manufactured using a number of different methods. For example, in many embodiments, the two grating layers are formed using an inkjet printing process.

In many embodiments, the waveguide operates in a monochrome band. In some embodiments, the waveguide operates in the green band. In several embodiments, waveguide layers operating in different spectral bands such as red, green, and blue (RGB) can be stacked to provide a three-layer waveguiding structure. In further embodiments, the layers are stacked with air gaps between the waveguide layers. In various embodiments, the waveguide layers operate in broader bands such as blue-green and green-red to provide two-waveguide layer solutions. In other embodiments, the gratings are color multiplexed to reduce the number of grating layers. Various types of gratings can be implemented. In some embodiments, at least one grating in each layer is a switchable periodic structure.

The invention can be applied using a variety of waveguides architectures, including those disclosed in the literature. In many embodiments, the waveguide can incorporate at least one of: angle multiplexed gratings, color multiplexed gratings, fold gratings, dual interaction gratings, rolled K-vector gratings, crossed fold gratings, tessellated gratings, chirped gratings, gratings with spatially varying refractive index modulation, gratings having spatially varying grating thickness, gratings having spatially varying average refractive index, gratings with spatially varying refractive index modulation tensors, and gratings having spatially varying average refractive index tensors. In some embodiments, the waveguide can incorporate at least one of: a half wave plate, a quarter wave plate, an anti-reflection coating, a beam splitting layer, an alignment layer, a photochromic back layer for glare reduction, louvre films for glare reduction In several embodiments, the waveguide can support gratings providing separate optical paths for different polarizations. In various embodiments, the waveguide can support gratings providing separate optical paths for different spectral bandwidths. In a number of embodiments, gratings for use in the invention can be HPDLC gratings, switching gratings recorded in HPDLC (such switchable Bragg Gratings), Bragg gratings recorded in holographic photopolymer, or surface relief gratings.

In some embodiments, the EPS may be a dual axis expansion grating for use in a display waveguide. In Bragg gratings, dual interaction can be understood using basic ray optics by considering upwards and downward TIR ray interactions with a fold grating, the upward and downwards rays occurring when guided light is reflected at the lower and upper waveguide TIR surfaces. In an EPS, one of the TIR interfaces is replaced by the grating. Using diffraction grating theory, it can be shown that a SRG (and a SRG fold in particular) may allow the diffraction angle into first order to equal the incidence angle such that TIR can take place subject to some constraints on the ranges of incidence angles, K-vector directions, grating clock angles, grating depths and grating periods. Hence upward and downward TIR paths through the grating exist for SRGs. Increasing the SRG thickness into the Bragg domain, dual interaction may occur in an EPS in the same way as in a volume Bragg grating. Thus, various embodiments of the invention pertain to a dual interaction EPS.

In many embodiments, the waveguide display can provide an image field of view of at least 50° diagonal. In further embodiments, the waveguide display can provide an image field of view of at least 70° diagonal. In some embodiments, an OLED display can have a luminance greater than 4000 nits and a resolution of 4k×4k pixels. In several embodiments, the waveguide can have an optical efficiency greater than 10% such that a greater than 400 nit image luminance can be provided using an OLED display of luminance 4000 nits. Waveguide displays implementing P-diffracting gratings typically have a waveguide efficiency of 5%-6.2%. Providing S-diffracting gratings as discussed above can increase the efficiency of the waveguide by a factor of 2. In various embodiments, an eyebox of greater than 10 mm with an eye relief greater than 25 mm can be provided. In many embodiments, the waveguide thickness can be between 2.0-5.0 mm.

FIG.33 conceptually illustrates a waveguide display in accordance with an embodiment of the invention in which at least one portion of at least one of the waveguide optical surfaces is curved and the effect of the curved surface portion on the guided beam wavefronts. As shown, theapparatus130 includes awaveguide131 supporting thecurved surface portion132. In the illustrative embodiment, thewaveguide131 supportsinput102 andoutput103 gratings with high diffraction efficiency for P-polarized light in a first wavelength band andinput104 andoutput105 gratings with high diffraction efficiency for S-polarized light in the first wavelength band. Themicrodisplay106, which displays a rectangular array ofpixels133 emitsunpolarized light134 in the first wavelength band, which is collimated and projected into a field of view by acollimator lens107. The P-polarized emission from themicrodisplay106 can be coupled into a total internal reflection path into the waveguide by the P-diffracting input grating102 and extracted from the waveguide by the P-diffractingoutput grating103. The presence of any non-planar surface in a waveguide can distort the waterfronts of the guided light such that the output light when viewed from the eyebox exhibits defocus, geometric distortion, and other aberrations. For example, inFIG.33, the light projected by thecollimator lens107 from a single pixel hasplanar wavefronts135, which after propagating through thewaveguide131 along theTIR path136 forms non-parallel output rays137-139 that are normal to thecurved output wavefront139A. On the other hand, a perfect planar waveguide would instead provide parallel beam expanded light.FIG.34 conceptually illustrates aversion140 of the waveguide in which thewaveguide substrate141 supports two overlapping upper142 and lower143 curved surfaces.

FIG.35 conceptually illustrates a waveguide display in accordance with an embodiment of the invention in which the aberrations introduced by a curved surface portion can be corrected by pre-distorting the pixel pattern of the OLED microdisplay. In the illustrative embodiment, thewaveguide apparatus150 is similar to the one illustrated inFIG.25. As shown, theapparatus150 includes amicrodisplay151 that supports apre-distorted pixel pattern152. Unpolarizedfirst wavelength light153 emitted by the microdisplay is focused by thelens107, which substantially collimates the beam entering the waveguide while formingwavefronts154 that are pre-distorted by a small amount. After in-coupling andpropagation155 through thewaveguide131, the predistorted wavefronts are focused by thecurved surface132 to form parallel output rays156-158, which are normal to theplanar output wavefront159.

FIG.36 conceptually illustrates a waveguide display in accordance with an embodiment of the invention in which the aberrations introduced by a curved surface portion can be corrected by pre-distorting the pixel pattern of an OLED microdisplay formed on a curved substrate. The curved microdisplay substrates can help to correct focus errors field curvature, distortion, and other aberrations in association with the distorted pixel pattern. In the illustrative embodiment, thewaveguide apparatus160 is similar to the one illustrated inFIG.32. As shown, thecurved substrate microdisplay161 supports thepre-distorted pixel pattern164. Unpolarizedfirst wavelength light163 emitted by the microdisplay is focused by thelens107 to form substantially collimated guided beams with slightlypre-distorted wavefronts164, which, after in-coupling andpropagation165 through thewaveguide131, form parallel output rays166-168 that are normal to theplanar output wavefront169.

AlthoughFIGS.32-36 show specific configurations of waveguides having curved surfaces, many other different configurations and modifications can be implemented. For example, the techniques and underlying theory illustrated in such embodiments can also be applied to waveguides supporting eye prescription optical surfaces. In many embodiments, prescription waveguide substrates can be custom-manufactured using similar processes to those used in the manufacture of eye prescription spectacles, with a standard baseline prescription being fine-tuned to individual user requirements. In some embodiments, waveguide gratings can be inkjet printed with a standard baseline prescription. In several embodiments, the OLED display can be custom-printed with a pre-distorted pixel pattern formed. In various embodiments, the OLED display can be printed onto a curved backplane substrate. In a number of embodiments, additional refractive or diffractive pre-compensation elements can be supported by the waveguide. In many embodiments, additional correction functions can be encoded in at least one of the input and output gratings. The input and output gratings may be the deep SRGs or EPSs or the hybrid gratings described above and may be manufactured in the methods described in connection withFIGS.1-5. The input and output gratings may also have thicknesses described in connection withFIGS.6-8.

FIG.37 is a flow chart conceptually illustrating a method for projecting image light for view using a waveguide containing S-diffracting and P-diffracting gratings in accordance with an embodiment of the invention. As shown, themethod170 of forming an image is provided. Referring to the flow diagram,method170 includes providing (171) an OLED array emitting light in a first wavelength range, a collimation lens, and a waveguide supporting input and output gratings with high diffraction efficiency for S-polarized light in a first wavelength band and input and output gratings with high diffraction efficiency for P-polarized light in the first wavelength band. In some embodiments, the input and output gratings may be the deep SRGs, EPSs, or hybrid gratings discussed previously. Image light emitted by the OLED array can be collimated (172) using the collimation lens. S-polarized light can be coupled (173) into a total internal reflection path in the waveguide using the S-diffracting input grating. P-polarized light can be coupled (174) into a total internal reflection path in the waveguide using the P-diffracting input grating. S-polarized light can be beam expanded and extracted (175) from the waveguide for viewing. P-polarized light can be beam expanded and extracted (176) from the waveguide for viewing.

FIG.38 is a flow chart conceptually illustrating a method for projecting image light for view using a waveguide supporting an optical prescription surface and containing S-diffracting and P-diffracting gratings in accordance with an embodiment of the invention. As shown, themethod180 of forming an image is provided. Referring to the flow diagram,method180 includes providing (181) an OLED array with a predistorted pixel pattern emitting light in a first wavelength range, a collimation lens, and a waveguide supporting input and output gratings with high diffraction efficiency for S-polarized light into a first wavelength band and input and output gratings with high diffraction efficiency for P-polarized light in the first wavelength band and further providing (182) a prescription optical surface supported by the waveguide. In some embodiments, the input and output gratings may be the deep SRGs, EPSs, or hybrid gratings discussed previously. Image light emitted by the OLED array can be collimated (183) using the collimation lens. S-polarized light can be coupled (184) into a total internal reflection path in the waveguide using the S-diffracting input grating. P-polarized light can be coupled (185) into a total internal reflection path in the waveguide using the P-diffracting input grating. The pre-distorted wavefront can be reflected (186) at the prescription surface. A planar wavefront can be formed (187) from the pre-distorted wavefront using the optical power of the prescription surface. S-polarized light can be beam expanded and extracted (188) from the waveguide for viewing. P-polarized light can be beam expanded and extracted (189) from the waveguide for viewing.

Discussion of Embodiments Including Varied Pixel Geometries

The various apparatus discussed in this disclosure can be applied using emissive displays with input pixel arrays of many different geometries that are limited only by geometrical constraints and the practical issues in implementing the arrays. In many embodiments, the pixel array can include pixels that are aperiodic (non-repeating). In such embodiments, the asymmetry in the geometry and the distribution of the pixels can be used to produce uniformity in the output illumination from the waveguide. The optimal pixel sizes and geometries can be determined using reverse vector raytracing from the eyebox though the output and input gratings (and fold gratings, if used) onto the pixel array. A variety of asymmetric pixel patterns can be used in the invention. For example,FIG.39A conceptually illustrates aportion230 of a pixel pattern comprisingrectangular elements230A-230F of differing size and aspect ratios for use in an emissive display panel in accordance with an embodiment of the invention. In some embodiments, the pixels array can be based a non-repeating pattern based on a finite set of polygonal base elements. For example,FIG.39B conceptually illustrates aportion240 of a pixel pattern havingPenrose tiles240A-240J for use in an emissive display panel in accordance with an embodiment of the invention. The tiles can be based on the principles disclosed in U.S. Pat. No. 4,133,152 by Penrose entitled “Set of tiles for covering a surface” which is hereby incorporated by reference in its entirety. Patterns occurring in nature, of which honeycombs are well known examples, can also be used in many embodiments.

In many embodiments, the pixels can include arrays of identical regular polygons. For example,FIG.39C conceptually illustrates aportion250 of a pixel pattern having hexagonal elements in accordance with an embodiment of the invention.FIG.39D conceptually illustrates aportion260 of a pixel pattern havingsquare elements250A-250C in accordance with an embodiment of the invention.FIG.39E conceptually illustrates aportion270 of a pixel pattern having diamond-shapedelements270A-270D in accordance with an embodiment of the invention.FIG.39F conceptually illustrates aportion280 of a pixel pattern havingisosceles triangle elements280A-280H in accordance with an embodiment of the invention.

In many embodiments, the pixels have vertically or horizontally biased aspect ratios.FIG.39G conceptually illustrates aportion290 of a pixel pattern havinghexagonal elements290A-290C of horizontally biased aspect ratio.FIG.39H conceptually illustrates aportion300 of a pixel pattern havingrectangular elements300A-300D of horizontally biased aspect ratio in accordance with an embodiment of the invention.FIG.39I conceptually illustrates aportion310 of a pixel pattern having diamond shapedelements310A-310D of horizontally biased aspect ratio in accordance with an embodiment of the invention.FIG.39J conceptually illustrates aportion320 of a pixel pattern havingtriangular elements320A-320H of horizontally biased aspect ratio in accordance with an embodiment of the invention.

In many embodiments, OLEDs can be fabricated with cavity shapes and multilayer structures for shaping the spectral emission characteristics of the OLED. In some embodiments microcavity OLEDs optimized to provide narrow spectral bandwidths can be used. In some embodiments, the spectral bandwidth can be less than 40 nm. In some embodiments, spectral bandwidth of 20 nm or less can be provided. In some embodiments, OLEDs can be made from materials that provide electroluminescent emission in a relatively narrow band centered near selected spectral regions which correspond to one of the three primary colors.FIG.40 conceptually illustrates a pixel pattern in which different pixels may have different emission characteristics. In some embodiments, pixels may have differing spectral emission characteristics according to their position in the pixel array. In some embodiments, pixels may have differing angular emission characteristics according to their position in the pixel array. In some embodiments the pixels can have both spectral and angular emission characteristics that vary spatially across the pixel array. The pixel pattern can be based on any of the patterns illustrated inFIGS.39A-39J. In many embodiments, pixels of different sizes and geometries can be arranged to provide a spatial emission variation for controlling uniformity in the final image.

In many embodiments, OLEDs can have cavity structures designed for transforming a given light distribution into a customized form. This is typically achieved by secondary optical elements, which can be bulky for wearable display application. Such designs also suffer from the problem that they limit the final light source to a single permanent operational mode, which can only be overcome by employing mechanically adjustable optical elements. In some embodiments, OLEDs can enable real-time regulation of a beam shape without relying on secondary optical elements and without using any mechanical adjustment. In some embodiments, an OLED can be continuously tuned between forward and off axis principal emission directions while maintaining high quantum efficiency in any setting as disclosed in an article by Fries (Fries F. et al, “Real-time beam shaping without additional optical elements”, Light Science & Applications, 7(1), 18, (2018)).

An important OLED development, the “microcavity OLED”, may offer potential for more controlled spectral bandwidths and emission angles in some embodiments. However, microcavity OLEDs are not yet ready for commercial exploitation. In one embodiment (corresponding to a 2-micron grating with index modulation 0.1, an average index 1.65 and an incident angle in the waveguide of 45 degrees) the diffraction efficiency of an SBG is greater than 75% over the OLED emission spectrum (between 25%-of-peak points). Narrower bandwidth OLEDs using deeper cavity structures will reduce bandwidths down 40 nm. and below.

Advantageously, the invention can use OLEDs optimized for use in the blue at 460 nm, which provides better blue contrast in daylight AR display applications than the more commonly used 440 nm OLED as well as better reliability and lifetime.

In some embodiments, the emissive display can be an OLED full color silicon backplane microdisplay similar to one developed by Kopin Corporation (Westborough, MA). The Kopin microdisplay provides an image diagonal of 0.99 inch and a pixel density of 2490 pixels per inch. The microdisplay uses Kopin's patented Pantile™ magnifying lenses to enable a compact form factor.

Although the invention has been discussed in terms of embodiments using OLED microdisplays as an input image source, in many other embodiments, the invention can be applied with any other type of emissive microdisplay technology. In some embodiment the emissive microdisplay can be a micro LED. Micro-LEDs benefit from reduced power consumption and can operate efficiently at higher brightness than that of an OLED display. However, microLEDs are inherently monochrome Phosphors typically used for converting color in LEDs do not scale well to small size, leading to more complicated device architectures which are difficult to scale down to microdisplay applications.

Although polymer periodic structures have been discussed in terms of use within OLED array based waveguide displays, polymer periodic structures have advantageous synergetic applications with other classes of displays. Examples of these displays include image generators using a non-emissive display technology such as LCoS and MEMS based displays. While LCoS based displays typically emit polarized light which may make the polarization based advantages of polymer grating structures less applicable, polymer grating structures may provide an advantageous efficiency and manufacturing cost savings over conventional imprinted gratings. Further, polymer grating structures may be applicable in various other non-display waveguide-based implementations such as waveguide sensors and/or waveguide illumination devices.

Example Embodiments

Although many embodiments of the invention have been described in detail, it should be appreciated that the invention may be implemented in many other forms without departing from the spirit or scope of the invention. For example, embodiments such as enumerated below are contemplated:

Item 1: A method for fabricating a periodic structure, the method comprising:

• • providing a holographic mixture on a base substrate;
  • sandwiching the holographic mixture between the base substrate and a cover substrate, wherein the holographic mixture forms a holographic mixture layer on the base substrate;
  • applying holographic recording beams to the holographic mixture layer to form a holographic polymer dispersed liquid crystal periodic structure comprising alternating polymer rich regions and liquid crystal rich regions; and
  • removing the cover substrate from the holographic polymer dispersed liquid crystal periodic structure, wherein the cover substrate has different properties than the base substrate to allow for the cover substrate to adhere to the unexposed holographic mixture layer while capable of being removed from the formed holographic polymer dispersed liquid crystal periodic structure after exposure.

Item 2: The method ofItem 1, further comprising removing at least a portion of the liquid crystal in the liquid crystal rich regions to form a polymer periodic structure.

Item 3: The method ofItem 2, further comprising refilling the liquid crystal rich regions with a backfill material.

Item 4: The method ofItem 3, wherein the backfill material has a different refractive index than the refractive index of the remaining polymer rich regions.

Item 5: The method ofItem 3, wherein the backfill material comprises a liquid crystal material.

Item 6: The method of claim5, wherein the liquid crystal material is different from the liquid crystal removed from the liquid crystal rich regions.

Item 7: The method ofItem 2, wherein removing at least a portion of the liquid crystal comprises removing substantially all of the liquid crystal in the liquid crystal rich regions.

Item 8: The method ofItem 2, wherein removing at least a portion of the liquid crystal further comprises leaving at least a portion of the liquid crystal in the liquid crystal rich regions.

Item 9: The method ofItem 2, wherein removing at least a portion of liquid crystal comprises washing the holographic polymer dispersed liquid crystal grating with a solvent.

Item 10: The method of any one of the preceding items, wherein the base substrate comprises plastic.

Item 11: The method ofItem 1, wherein a silicon oxide layer is deposited on the base substrate.

Item 12: The method of any one of Items 1-6, wherein the base substrate comprises glass, quartz, or silica.

Item 13: The method of any one of items 1-6, wherein the cover substrate comprises plastic.

Item 14: The method ofItem 10, wherein a silicon oxide layer is deposited on the cover substrate.

Item 15: The method of any one of items 1-6, wherein the cover substrate comprises glass, quartz, or silica.

Item 16: The method of any one of the preceding Items, wherein an adhesion promotion layer is coated on top of the base substrate which promotes adhesion between the base substrate and the holographic polymer dispersed liquid crystal periodic structure.

Item 17: The method of Item 16, wherein the base substrate comprises a glass surface including hydroxyl groups and wherein a silane-based reagent bonds with the hydroxyl group and the adhesion promotion layer.

Item 18: The method of any one of the preceding items, wherein a release layer is coated on top of the cover substrate which allows the cover substrate to easily release from the holographic polymer dispersed liquid crystal periodic structure.

Item 19: The method of Item 18, wherein the cover substrate comprises a glass surface including hydroxyl groups and wherein the release layer is a silane based fluoro reactant which bonds with the hydroxyl groups.

Item 20: The method of any one of the preceding items, further comprising applying a protective substrate to the holographic polymer dispersed liquid crystal periodic structure, wherein the holographic polymer dispersed liquid crystal periodic structure is positioned between the protective substrate and the base substrate.

Item 21: A method for fabricating periodic structures, the method comprising:

• • providing a first holographic mixture on a first base substrate;
  • sandwiching the first holographic mixture between the first base substrate and a cover substrate, wherein the first holographic mixture forms a first holographic mixture layer on the first base substrate;
  • applying holographic recording beams to the first holographic mixture layer to form a first holographic polymer dispersed liquid crystal periodic structure comprising alternating polymer rich regions and liquid crystal rich regions;
  • removing the cover substrate from the holographic polymer dispersed liquid crystal periodic structure;
  • providing a second holographic mixture on a second base substrate;
  • sandwiching the second holographic mixture between the second base substrate and the cover substrate, wherein the second holographic mixture forms a second holographic mixture layer on the second base substrate; and
  • applying holographic recording beams to the second holographic mixture layer to form a second holographic polymer dispersed liquid crystal periodic structure comprising alternating polymer rich regions and liquid crystal rich regions.

Item 22: The method of Item 21, wherein the cover substrate has different properties than the first base substrate and second base substrate to allow for the cover substrate to adhere to the first and second unexposed holographic mixture layer while capable of being removed from the formed first and second holographic polymer dispersed liquid crystal periodic structure after exposure.

Item 23: The method of any one ofItems 21 or 22, further comprising removing the cover substrate from the second holographic polymer dispersed liquid crystal periodic structure.

Item 24: The method of any one of Items 21-23, further comprising removing at least a portion of the liquid crystal in the liquid crystal rich regions of the first or second holographic polymer dispersed liquid crystal periodic structure to form a polymer surface relief grating.

Item 25: The method ofItem 24, further comprising refilling the liquid crystal rich regions of the first or second holographic polymer dispersed liquid crystal periodic structure with a backfill material.

Item 26: The method of Item 25, wherein the backfill material has a different refractive index than the refractive index of the remaining polymer rich regions.

Item 27: The method of Item 25, wherein the backfill material comprises a liquid crystal material.

Item 28: The method of Item 27, wherein the liquid crystal material is different from the liquid crystal removed from the liquid crystal rich regions.

Item 29: The method ofItem 24, wherein removing at least a portion of the liquid crystal comprises removing substantially all of the liquid crystal in the liquid crystal rich regions.

Item 30: The method ofItem 24, wherein removing at least a portion of the liquid crystal further comprises leaving at least a portion of the liquid crystal in the liquid crystal rich regions.

Item 31: The method ofItem 24, wherein removing at least a portion of liquid crystal comprises washing the holographic polymer dispersed liquid crystal grating with a solvent.

Item 32: The method of any one of Items 21-31, wherein the first base substrate and/or second base substrate comprises plastic.

Item 33: The method of Items 21-32, wherein a silicon oxide layer is deposited on the first base substrate and/or second base substrate.

Item 34: The method of any one of Items 21-31, wherein the first base substrate and/or second base substrate comprises glass, quartz, or silica.

Item 35: The method of any one of Items 21-31, wherein the cover substrate comprises plastic.

Item 36: The method of Item 35, wherein a silicon oxide layer is deposited on the cover substrate.

Item 37: The method of any one of Items 21-31, wherein the cover substrate comprises glass, quartz, or silica.

Item 38: The method of any one of Items 21-31, wherein an adhesion promotion layer is coated on top of the first base substrate which promotes adhesion between the first base substrate and the first holographic polymer dispersed liquid crystal grating.

Item 39: The method of Item 38, wherein the first base substrate comprises a glass surface including hydroxyl groups and wherein a silane-based reagent bonds with the hydroxyl group and the adhesion promotion layer.

Item 40: The method of Items 21-39, wherein a release layer is coated on top of the cover substrate which allows the cover substrate to easily release from the holographic polymer dispersed liquid crystal grating.

Item 41: The method ofItem 40, wherein the cover substrate comprises a glass surface including hydroxyl groups and wherein the release layer is a silane based fluoro reactant which bonds with the hydroxyl groups.

Item 42: A device for fabricating a deep surface relief grating (SRG) comprising:

• • a holographic mixture sandwiched between a base substrate and a cover substrate,
  • wherein the holographic mixture is configured to form a holographic polymer dispersed liquid crystal grating comprising alternating polymer rich regions and liquid crystal rich regions when exposed to holographic recording beams, and
  • wherein the base substrate and the cover substrate have different properties to allow the cover substrate to adhere to the unexposed holographic mixture layer while capable of being removed from the formed holographic polymer dispersed liquid crystal grating after exposure.

Item 43: The device of Item 42, wherein the base substrate comprises plastic.

Item 44: The device of Item 43, wherein a silicon oxide layer is disposed on the base substrate.

Item 45: The device of Item 42, wherein the base substrate comprises glass, quartz, or silica.

Item 46: The device of Item 45, wherein the cover substrate comprises plastic.

Item 47: The device of Item 46, wherein a silicon oxide layer is disposed on the cover substrate.

Item 48: The device of Item 42, wherein the cover substrate comprises glass, quartz, or silica.

Item 49: The device of any one of Items 42-48, wherein an adhesion promotion layer is coated on top of the first base substrate which promotes adhesion between the first base substrate and the first holographic polymer dispersed liquid crystal grating.

Item 50: The device of Item 49, wherein the first base substrate comprises a glass surface including hydroxyl groups and wherein a silane-based reagent bonds with the hydroxyl group and the adhesion promotion layer.

Item 51: The device of any one of Items 42-50, wherein a release layer is coated on top of the cover substrate which allows the cover substrate to easily release from the holographic polymer dispersed liquid crystal grating.

Item 52: The device of Item 51, wherein the cover substrate comprises a glass surface including hydroxyl groups and wherein the release layer is a silane based fluoro reactant which bonds with the hydroxyl groups.

Item 53: A waveguide device comprising:

• • a waveguide supporting a polymer grating structure for diffracting light propagating in total internal reflection in said waveguide,
  • wherein the polymer grating structure comprises:
    • a polymer regions;
    • air gaps between adjacent portions of the polymer regions; and
    • a coating disposed on the tops of the polymer regions and the tops of the waveguide.

Item 54: The waveguide device of Item 53, wherein the coating comprises an atomic layer deposition (ALD) deposited metallic layer or dielectric layer to enhance evanescent coupling between the waveguide and the polymer grating structure.

Item 55: The waveguide device of Item 53, wherein the coating comprises an atomic layer deposition (ALD) deposited metallic layer or dielectric layer to enhance the effective refractive index of the polymer grating structure.

Item 56: The waveguide device of Item 53, wherein the coating comprises an atomic layer deposition (ALD) deposited metallic layer or dielectric layer to enhance adhesion and/or perform as a bias layer.

Item 57: The waveguide device of Item 53, wherein the coating comprises an atomic layer deposition (ALD) conformally deposited metallic layer or dielectric layer disposed over the entirety of the polymer regions and the tops of the waveguide.

Item 58: The waveguide device of Item 53, wherein the coating comprises an atomic layer deposition (ALD) deposited metallic layer or dielectric layer disposed over one or more facets of the polymer regions including one or more of the upper, lower, or sidewall facets of the polymer regions.

Item 59: The waveguide device of Item 53, wherein a passivation coating is applied to the surfaces of the polymer grating structure and/or the coating.

Item 60: The waveguide device of Item 53, wherein the polymer regions include a slant angle with respect to the waveguide.

Item 61: The waveguide device of Item 53, wherein the polymer grating structure further comprises an isotropic material between adjacent portions of the polymer network, wherein the isotropic material has a refractive index higher or lower than the refractive index of the polymer network.

Item 62: The waveguide device of Item 61, wherein the isotropic material occupies a space at a bottom portion of the space between adjacent portions of the polymer network and the air occupies the space from above the top surface of the isotropic material to the modulation depth.

Item 63: The waveguide device of Item 61, wherein the isotropic material comprises a birefringent crystal material.

Item 64: The waveguide device of Item 63, wherein the birefringent crystal material comprises a liquid crystal material.

Item 65: The waveguide device of Item 53, wherein the polymer grating structure has a modulation depth greater than a wavelength of visible light.

Item 66: The waveguide device of Item 53, wherein the polymer grating structure comprises a modulation depth and a grating pitch and wherein the modulation depth is greater than the grating pitch.

Item 67: The waveguide device of Item 53, wherein the waveguide comprises two substrates and the polymer grating structure is either sandwiched between the two substrates or positioned on an external surface of either substrate.

Item 68: The waveguide device of Item 53, wherein the Bragg fringe spacing of the polymer network is 0.35 μm to 0.8 μm and the grating depth of the polymer network is 1 μm to 3 μm.

Item 69: The waveguide device of Item 53, wherein the ratio of grating depth of the polymer network to the Bragg fringe spacing is 1:1 to 5:1.

Item 70: The waveguide device of Item 53, further comprising a picture generating unit, and wherein the polymer grating structure comprises a waveguide diffraction grating.

Item 71: The waveguide device ofItem 70, wherein the waveguide diffraction grating is configured as a multiplexing grating.

Item 72: The waveguide device of Item 71, wherein the waveguide diffraction grating is configured to accept light from the picture generating unit which includes multiple images.

Item 73: The waveguide device ofItem 70, wherein the waveguide diffraction grating is configured to outcouple light from the waveguide.

Item 74: The waveguide device ofItem 70, wherein the waveguide diffraction grating is configured as a beam expander.

Item 75: The waveguide device ofItem 70, wherein the waveguide diffraction grating is configured to incouple light including image data generated from the picture generating unit.

Item 76: The waveguide device of Item 75, wherein the waveguide diffraction grating is further configured to incouple S-polarized light with a high degree of efficiency.

Item 77: The waveguide device of Item 76, wherein the diffraction grating is further configured to incouple S-polarized light at an efficiency of 70% to 95% at a Bragg angle.

Item 78. The waveguide device of Item 76, wherein the diffraction grating is further configured to incouple P-polarized light at an efficiency of 25% to 50% at a Bragg angle.

Item 79: The waveguide device of Item 53, wherein the refractive index difference between the polymer network and the air gaps is 0.25 to 0.4.

Item 80: The waveguide device of Item 63, wherein the refractive index difference between the polymer network and the birefringent crystal material is 0.05 to 0.2.

Item 81: The waveguide device of Item 53, wherein the polymer grating structure comprises a two-dimensional lattice structure or a three-dimensional lattice structure.

Item 82: The waveguide device of Item 53, further comprising another grating structure.

Item 83: The waveguide device of Item 82, wherein the polymer grating structure comprises an incoupling grating and the other grating structure comprises a beam expander or an outcoupling grating.

Item 84: A waveguide device comprising:

• • a waveguide supporting a polymer grating structure for diffracting light propagating in total internal reflection in said waveguide,
  • wherein the polymer grating structure comprises:
    • a polymer regions;
    • air gaps between adjacent portions of the polymer regions;
    • an optical layer disposed between the polymer regions and the waveguide; and
    • a coating disposed on the tops of the polymer regions and the tops of the optical layer.

Item 85: The waveguide device of Item 84, wherein the coating comprises an atomic layer deposition (ALD) deposited metallic layer or dielectric layer to enhance evanescent coupling between the waveguide and the polymer grating structure.

Item 86: The waveguide device of Item 84, wherein the coating comprises an atomic layer deposition (ALD) deposited metallic layer or dielectric layer to enhance the effective refractive index of the polymer grating structure.

Item 87: The waveguide device of Item 84, wherein the coating comprises an atomic layer deposition (ALD) deposited metallic layer or dielectric layer to enhance adhesion and/or perform as a bias layer.

Item 88: The waveguide device of Item 84, wherein the coating comprises an atomic layer deposition (ALD) conformally deposited metallic layer or dielectric layer disposed over the entirety of the polymer regions and the exposed tops of the optical layer.

Item 89: The waveguide device of Item 84, wherein the coating comprises an atomic layer deposition (ALD) deposited metallic layer or dielectric layer disposed over one or more facets of the polymer regions including one or more of the upper, lower, or sidewall facets of the polymer regions.

Item 90: The waveguide device of Item 84, wherein a passivation coating is applied to the surfaces of the polymer grating structure.

Item 91: The waveguide device of Item 84, wherein the polymer regions include a slant angle with respect to the waveguide.

Item 92: The waveguide device of Item 84, wherein the thickness of optical layer is designed to selectively modify diffraction efficiency vs angle characteristics within a defined angular range.

Item 93: The waveguide device of Item 84, wherein the polymer grating structure further comprises an isotropic material between adjacent portions of the polymer network, wherein the isotropic material has a refractive index higher or lower than the refractive index of the polymer network.

Item 94: The waveguide device of Item 93, wherein the isotropic material occupies a space at a bottom portion of the space between adjacent portions of the polymer network and the air occupies the space from above the top surface of the isotropic material to the modulation depth.

Item 95: The waveguide device of Item 93, wherein the isotropic material comprises a birefringent crystal material.

Item 96: The waveguide device of Item 95, wherein the birefringent crystal material comprises a liquid crystal material.

Item 97: The waveguide device of Item 84, wherein the polymer grating structure has a modulation depth greater than a wavelength of visible light.

Item 98: The waveguide device of Item 84, wherein the polymer grating structure comprises a modulation depth and a grating pitch and wherein the modulation depth is greater than the grating pitch.

Item 99: The waveguide device of Item 84, wherein the waveguide comprises two substrates and the polymer grating structure is either sandwiched between the two substrates or positioned on an external surface of either substrate.

Item 100: The waveguide device of Item 84, wherein the Bragg fringe spacing of the polymer network is 0.35 μm to 0.8 μm and the grating depth of the polymer network is 1 μm to 3 μm.

Item 101: The waveguide device of Item 84, wherein the ratio of grating depth of the polymer network to the Bragg fringe spacing is 1:1 to 5:1.

Item 102: The waveguide device of Item 84, further comprising a picture generating unit, and wherein the polymer grating structure comprises a waveguide diffraction grating.

Item 103: The waveguide device ofItem 102, wherein the waveguide diffraction grating is configured as a multiplexing grating.

Item 104: The waveguide device ofItem 103, wherein the waveguide diffraction grating is configured to accept light from the picture generating unit which includes multiple images.

Item 105: The waveguide device ofItem 104, wherein the waveguide diffraction grating is configured to outcouple light from the waveguide.

Item 106: The waveguide device ofItem 102, wherein the waveguide diffraction grating is configured as a beam expander.

Item 107: The waveguide device ofItem 102, wherein the waveguide diffraction grating is configured to incouple light including image data generated from the picture generating unit.

Item 108: The waveguide device ofItem 107, wherein the waveguide diffraction grating is further configured to incouple S-polarized light with a high degree of efficiency.

Item 109: The waveguide device of Item 108, wherein the diffraction grating is further configured to incouple S-polarized light at an efficiency of 70% to 95% at a Bragg angle.

Item 110: The waveguide device of Item 108, wherein the diffraction grating is further configured to incouple P-polarized light at an efficiency of 25% to 50% at a Bragg angle.

Item 111: The waveguide device of Item 84, wherein the refractive index difference between the polymer network and the air gaps is 0.25 to 0.4.

Item 112: The waveguide device of Item 95, wherein the refractive index difference between the polymer network and the birefringent crystal material is 0.05 to 0.2.

Item 113: The waveguide device of Item 84, wherein the polymer grating structure comprises a two-dimensional lattice structure or a three-dimensional lattice structure.

Item 114: The waveguide device of Item 84, further comprising another grating structure.

Item 115: The waveguide device of Item 114, wherein the polymer grating structure comprises an incoupling grating and the other grating structure comprises a beam expander or an outcoupling grating.

Item 116: A waveguide device comprising:

• • a waveguide supporting a polymer grating structure for diffracting light propagating in total internal reflection in said waveguide,
  • wherein the polymer grating structure comprises:
    • a polymer regions;
    • air gaps between adjacent portions of the polymer regions; and
    • an optical layer disposed between the polymer regions and the waveguide.

Item 117: The waveguide device of Item 116, wherein the thickness of optical layer is designed to selectively modify diffraction efficiency vs angle characteristics within a defined angular range.

Item 118: The waveguide device of Item 116, wherein the polymer grating structure further comprises an isotropic material between adjacent portions of the polymer network, wherein the isotropic material has a refractive index higher or lower than the refractive index of the polymer network.

Item 119: The waveguide device of Item 118, wherein the isotropic material occupies a space at a bottom portion of the space between adjacent portions of the polymer network and the air occupies the space from above the top surface of the isotropic material to the modulation depth.

Item 120: The waveguide device of Item 118, wherein the isotropic material comprises a birefringent crystal material.

Item 121: The waveguide device ofItem 120, wherein the birefringent crystal material comprises a liquid crystal material.

Item 122: The waveguide device of Item 118, wherein the polymer grating structure has a modulation depth greater than a wavelength of visible light.

Item 123: The waveguide device of Item 118, wherein the polymer grating structure comprises a modulation depth and a grating pitch and wherein the modulation depth is greater than the grating pitch.

Item 124: The waveguide device of Item 118, wherein the waveguide comprises two substrates and the polymer grating structure is either sandwiched between the two substrates or positioned on an external surface of either substrate.

Item 125: The waveguide device of Item 118, wherein the Bragg fringe spacing of the polymer network is 0.35 μm to 0.8 μm and the grating depth of the polymer network is 1 μm to 3 μm.

Item 126: The waveguide device of Item 118, wherein the ratio of grating depth of the polymer network to the Bragg fringe spacing is 1:1 to 5:1.

Item 127: The waveguide device of Item 118, further comprising a picture generating unit, and wherein the polymer grating structure comprises a waveguide diffraction grating.

Item 128: The waveguide device of Item 127, wherein the waveguide diffraction grating is configured as a multiplexing grating.

Item 129: The waveguide device of Item 128, wherein the waveguide diffraction grating is configured to accept light from the picture generating unit which includes multiple images.

Item 130: The waveguide device of Item 127, wherein the waveguide diffraction grating is configured to outcouple light from the waveguide.

Item 131: The waveguide device ofItem 130, wherein the waveguide diffraction grating is configured as a beam expander.

Item 132: The waveguide device of Item 127, wherein the waveguide diffraction grating is configured to incouple light including image data generated from the picture generating unit.

Item 133: The waveguide device ofItem 132, wherein the waveguide diffraction grating is further configured to incouple S-polarized light with a high degree of efficiency.

Item 134: The waveguide device ofItem 133, wherein the diffraction grating is further configured to incouple S-polarized light at an efficiency of 70% to 95% at a Bragg angle.

Item 135: The waveguide device ofItem 133, wherein the diffraction grating is further configured to incouple P-polarized light at an efficiency of 25% to 50% at a Bragg angle.

Item 136: The waveguide device of Item 116, wherein the refractive index difference between the polymer network and the air gaps is 0.25 to 0.4.

Item 137: The waveguide device ofItem 120, wherein the refractive index difference between the polymer network and the birefringent crystal material is 0.05 to 0.2.

Item 138: The waveguide device of Item 116, wherein the polymer grating structure comprises a two-dimensional lattice structure or a three-dimensional lattice structure.

Item 139: The waveguide device of Item 116, further comprising another grating structure.

Item 140: The waveguide device ofItem 139, wherein the polymer grating structure comprises an incoupling grating and the other grating structure comprises a beam expander or an outcoupling grating.

Item 141: The waveguide device of Item 116, wherein the optical is sandwiched by the waveguide and the polymer grating structure and wherein the polymer grating structure extends all the way to the optical layer to directly contact the optical layer.

Item 142: A waveguide device comprising:

• • a waveguide supporting a polymer grating structure for diffracting light propagating in total internal reflection in said waveguide,
  • wherein the polymer grating structure comprises:
    • a polymer regions; and
    • air gaps between adjacent portions of the polymer regions,
    • wherein the polymer regions and air gaps directly contact the waveguide.

Item 143: The waveguide device ofItem 142, wherein the thickness of optical layer is designed to selectively modify diffraction efficiency vs angle characteristics within a defined angular range.

Item 144: The waveguide device ofItem 142, wherein the polymer surface relief grating extends all the way to directly contact the waveguide.

Item 145. The waveguide device ofclaim 142, wherein there is no bias layer between the polymer surface relief grating and the substrate.

Item 146: The waveguide device ofItem 142, wherein the polymer grating structure further comprises an isotropic material between adjacent portions of the polymer network, wherein the isotropic material has a refractive index higher or lower than the refractive index of the polymer network.

Item 147: The waveguide device of Item 146, wherein the isotropic material occupies a space at a bottom portion of the space between adjacent portions of the polymer network and the air occupies the space from above the top surface of the isotropic material to the modulation depth.

Item 148: The waveguide device of Item 146, wherein the isotropic material comprises a birefringent crystal material.

Item 149: The waveguide device of Item 148, wherein the birefringent crystal material comprises a liquid crystal material.

Item 150: The waveguide device ofItem 142, wherein the polymer grating structure has a modulation depth greater than a wavelength of visible light.

Item 151: The waveguide device ofItem 142, wherein the polymer grating structure comprises a modulation depth and a grating pitch and wherein the modulation depth is greater than the grating pitch.

Item 152: The waveguide device ofItem 142, wherein the waveguide comprises two substrates and the polymer grating structure is either sandwiched between the two substrates or positioned on an external surface of either substrate.

Item 153: The waveguide device ofItem 142, wherein the Bragg fringe spacing of the polymer network is 0.35 μm to 0.8 μm and the grating depth of the polymer network is 1 μm to 3 μm.

Item 154: The waveguide device ofItem 142, wherein the ratio of grating depth of the polymer network to the Bragg fringe spacing is 1:1 to 5:1.

Item 155: The waveguide device ofItem 142, further comprising a picture generating unit, and wherein the polymer grating structure comprises a waveguide diffraction grating.

Item 156: The waveguide device ofItem 155, wherein the waveguide diffraction grating is configured as a multiplexing grating.

Item 157: The waveguide device ofItem 156, wherein the waveguide diffraction grating is configured to accept light from the picture generating unit which includes multiple images.

Item 158: The waveguide device ofItem 155, wherein the waveguide diffraction grating is configured to outcouple light from the waveguide.

Item 159: The waveguide device ofItem 155, wherein the waveguide diffraction grating is configured as a beam expander.

Item 160: The waveguide device ofItem 155, wherein the waveguide diffraction grating is configured to incouple light including image data generated from the picture generating unit.

Item 161: The waveguide device ofItem 160, wherein the waveguide diffraction grating is further configured to incouple S-polarized light with a high degree of efficiency.

Item 162: The waveguide device ofItem 160, wherein the waveguide diffraction grating is further configured to incouple S-polarized light at an efficiency of 70% to 95% at a Bragg angle.

Item 163: The waveguide device ofItem 160, wherein the diffraction grating is further configured to incouple P-polarized light at an efficiency of 25% to 50% at a Bragg angle.

Item 164: The waveguide device ofItem 142, wherein the refractive index difference between the polymer network and the air gaps is 0.25 to 0.4.

Item 165: The waveguide device ofItem 164, wherein the refractive index difference between the polymer network and the birefringent crystal material is 0.05 to 0.2.

Item 166: The waveguide device ofItem 142, wherein the polymer grating structure comprises a two-dimensional lattice structure or a three-dimensional lattice structure.

Item 167: The waveguide device ofItem 142, further comprising another grating structure.

Item 168: The waveguide device ofItem 167, wherein the polymer grating structure comprises an incoupling grating and the other grating structure comprises a beam expander or an outcoupling grating.

Item 169. A method for fabricating a grating, the method comprising:

• • providing a mixture of monomer and a nonreactive material;
  • providing a substrate;
  • coating a layer of the mixture on a surface of the substrate;
  • applying holographic recording beams to the layer to form a holographic polymer dispersed grating comprising alternating polymer rich regions and nonreactive material rich regions;
  • removing at least a portion of the nonreactive material in the nonreactive material rich regions to form a polymer surface relief grating including alternating polymer regions and air regions; and
  • applying a coating to the top surfaces of the polymer regions and the top surfaces of the substrate in the air regions.

Item 170: The method ofItem 169, wherein applying the coating comprises an atomic layer deposition (ALD) process.

Item 171: The method ofItem 169, wherein the coating comprises TiO₂or ZnO₂.

Item 172: The method ofItem 169, wherein the monomer comprises acrylates, methacrylates, vinyls, isocyanates, thiols, isocyanate-acrylate, and/or thiolene.

Item 173: The method ofItem 172, wherein the mixture further comprises at least one of a photoinitiator, a coinitiator, or additional additives.

Item 174: The method ofItem 172, wherein the thiols comprise thiol-vinyl-acrylate.

Item 175: The method ofItem 173, wherein the photoinitiator comprises photosensitive components.

Item 176: The method ofItem 175, wherein the photosensitive components comprise dyes and/or radical generators.

Item 177: The method ofItem 169, wherein providing a mixture of monomer and liquid crystal comprises:

• • mixing the monomer, liquid crystal, and at least one of a photoinitiator, a coinitiator, multifunctional thiol, or additional additives;
  • storing the mixture in a location absent of light at a temperature of 22° C. or less;
  • adding additional monomer;
  • filtering the mixture through a filter of 0.6 μm or less; and
  • storing the filtered mixture in a location absent of light.

Item 178: The method ofItem 169, wherein the substrate comprises a glass substrate or plastic substrate.

Item 179: The method ofItem 169, wherein the substrate comprises a transparent substrate.

Item 180: The method ofItem 169, further comprising sandwiching the mixture between the substrate and another substrate with one or more spacers for maintaining internal dimensions.

Item 181: The method ofItem 180, further comprising applying a non-stick release layer on one surface of the other substrate.

Item 182: The method ofItem 181, wherein the non-stick release layer comprises a fluoropolymer.

Item 183: The method ofItem 169, further comprising refilling the liquid crystal rich regions with a liquid crystal material.

Item 184: The method ofItem 183, wherein the liquid crystal material has a different molecular structure than the previously removed liquid crystal.

Item 185: The method ofItem 169, wherein removing at least a portion of the liquid crystal comprises removing substantially all of the liquid crystal in the liquid crystal rich regions.

Item 186: The method ofItem 169, wherein removing at least a portion of the liquid crystal further comprises leaving at least a portion of the liquid crystal in the polymer rich regions.

Item 187: The method ofItem 169, further comprising applying a protective layer over the deep SRG.

Item 188: The method ofItem 187, wherein the protective layer comprises an anti-reflective layer.

Item 189: The method ofItem 187, wherein the protective layer comprises silicate or silicon nitride.

Item 190: The method ofItem 187, wherein applying a protective layer comprises depositing the protective layer on the deep SRG.

Item 191: The method of Item 190, wherein depositing the protective layer comprises chemical vapor deposition.

Item 192: The method ofItem 191, wherein the chemical vapor deposition is a nanocoating process.

Item 193: The method of Item 190, wherein the protective layer comprises a parylene coating.

Item 194: The method ofItem 169, wherein the liquid crystal rich regions comprise air gaps after removing at least a portion of the liquid crystal in the liquid crystal rich regions.

Item 195: The method ofItem 194, further comprising creating a vacuum in the air gaps or filling the air gaps with an inert gas.

Item 196: The method ofItem 169, wherein removing at least a portion of liquid crystal comprises washing the holographic polymer dispersed liquid crystal grating with a solvent.

Item 197: The method ofItem 196, wherein washing the holographic polymer dispersed liquid crystal grating comprises immersing the holographic polymer dispersed liquid crystal grating in the solvent.

Item 198: The method ofItem 196, wherein the solvent comprises isopropyl alcohol.

Item 199: The method ofItem 196, wherein the solvent is kept at a temperature lower than room temperature while washing the holographic polymer dispersed liquid crystal grating.

Item 200: The method ofItem 196, wherein removing at least a portion of the liquid crystal further comprises drying the holographic polymer dispersed liquid crystal grating with a high flow air source.

Item 201: The method ofItem 169, further comprising curing the holographic polymer dispersed liquid crystal grating.

Item 202: The method ofItem 201, wherein curing the holographic polymer dispersed liquid crystal grating comprises exposing the holographic polymer dispersed liquid crystal grating to a low intensity white light for a period of about an hour.

Item 203: The method ofItem 169, wherein the polymer surface relief grating is configured to incouple S-polarized light at an efficiency of 70% to 95%.

Item 204: The method ofItem 203, wherein the polymer surface relief grating is further configured to incouple P-polarized light at an efficiency of 25% to 50%.

Item 205: The method ofItem 169, wherein the refractive index difference between the polymer network and the air gaps is 0.25 to 0.4.

Item 206: The method ofItem 183, wherein the refractive index difference between the polymer network and the liquid crystal material is 0.05 to 0.2.

Item 207: The method ofItem 169, wherein the polymer surface relief grating comprises a Bragg fringe spacing of 0.35 μm to 0.8 μm and the grating depth of 1 μm to 3 μm.

Item 208: The method ofItem 169, wherein the polymer surface relief grating comprises a ratio of Bragg fringe spacing to grating depth of 1:1 to 5:1.

Item 209: The method ofItem 169, wherein the liquid crystal content in the mixture of monomer and liquid crystal is approximately 20% to 50%.

Item 210: The method ofItem 169, wherein the liquid crystal in the mixture of monomer and liquid crystal comprises liquid crystal singles.

Item 211: The method of Item 210, wherein the liquid crystal singles comprise cyanobiphenyl and/or pentylcyanobiphenyl.

Item 212: A method for fabricating a grating, the method comprising:

• • providing a mixture of monomer and a nonreactive material;
  • providing a substrate;
  • coating a layer of the mixture on a surface of the substrate;
  • applying holographic recording beams to the layer to form a holographic polymer dispersed grating comprising alternating polymer rich regions and nonreactive material rich regions;
  • removing at least a portion of the nonreactive material in the nonreactive material rich regions to form a polymer surface relief grating including alternating polymer regions and air regions, wherein an optical layer is disposed between the polymer regions and the substrate; and
  • applying a coating to the top surfaces of the polymer regions and the top surfaces of the optical layer in the air regions.

Item 213: The method ofItem 212, wherein applying the coating comprises an atomic layer deposition (ALD) process.

Item 214: The method ofItem 212, wherein the coating comprises TiO₂or ZnO₂.

Item 215: The method ofItem 212, wherein the monomer comprises acrylates, methacrylates, vinyls, isocyanates, thiols, isocyanate-acrylate, and/or thiolene.

Item 216: The method ofItem 215, wherein the mixture further comprises at least one of a photoinitiator, a coinitiator, or additional additives.

Item 217: The method ofItem 215, wherein the thiols comprise thiol-vinyl-acrylate.

Item 218: The method ofItem 216, wherein the photoinitiator comprises photosensitive components.

Item 219: The method ofItem 218, wherein the photosensitive components comprise dyes and/or radical generators.

Item 220: The method ofItem 212, wherein providing a mixture of monomer and liquid crystal comprises:

• • mixing the monomer, liquid crystal, and at least one of a photoinitiator, a coinitiator, multifunctional thiol, or additional additives;
  • storing the mixture in a location absent of light at a temperature of 22° C. or less;
  • adding additional monomer;
  • filtering the mixture through a filter of 0.6 μm or less; and
  • storing the filtered mixture in a location absent of light.

Item 221: The method ofItem 212, wherein the substrate comprises a glass substrate or plastic substrate.

Item 222: The method ofItem 212, wherein the substrate comprises a transparent substrate.

Item 223: The method ofItem 212, further comprising sandwiching the mixture between the substrate and another substrate with one or more spacers for maintaining internal dimensions.

Item 224: The method ofItem 223, further comprising applying a non-stick release layer on one surface of the other substrate.

Item 225: The method ofItem 224, wherein the non-stick release layer comprises a fluoropolymer.

Item 226: The method ofItem 212, further comprising refilling the liquid crystal rich regions with a liquid crystal material.

Item 227: The method ofItem 226, wherein the liquid crystal material has a different molecular structure than the previously removed liquid crystal.

Item 228: The method ofItem 212, wherein removing at least a portion of the liquid crystal comprises removing substantially all of the liquid crystal in the liquid crystal rich regions.

Item 229: The method ofItem 212, wherein removing at least a portion of the liquid crystal further comprises leaving at least a portion of the liquid crystal in the polymer rich regions.

Item 230: The method ofItem 212, further comprising applying a protective layer over the deep SRG.

Item 231: The method ofItem 230, wherein the protective layer comprises an anti-reflective layer.

Item 232: The method ofItem 230, wherein the protective layer comprises silicate or silicon nitride.

Item 233: The method ofItem 230, wherein applying a protective layer comprises depositing the protective layer on the deep SRG.

Item 234: The method ofItem 233, wherein depositing the protective layer comprises chemical vapor deposition.

Item 235: The method of Item 234, wherein the chemical vapor deposition is a nanocoating process.

Item 236: The method ofItem 230, wherein the protective layer comprises a parylene coating.

Item 237: The method ofItem 212, wherein the liquid crystal rich regions comprise air gaps after removing at least a portion of the liquid crystal in the liquid crystal rich regions.

Item 238: The method of Item 237, further comprising creating a vacuum in the air gaps or filling the air gaps with an inert gas.

Item 239: The method ofItem 212, wherein removing at least a portion of liquid crystal comprises washing the holographic polymer dispersed liquid crystal grating with a solvent.

Item 240: The method of Item 239, wherein washing the holographic polymer dispersed liquid crystal grating comprises immersing the holographic polymer dispersed liquid crystal grating in the solvent.

Item 241: The method of Item 239, wherein the solvent comprises isopropyl alcohol.

Item 242: The method of Item 239, wherein the solvent is kept at a temperature lower than room temperature while washing the holographic polymer dispersed liquid crystal grating.

Item 243: The method of Item 239, wherein removing at least a portion of the liquid crystal further comprises drying the holographic polymer dispersed liquid crystal grating with a high flow air source.

Item 244: The method ofItem 212, further comprising curing the holographic polymer dispersed liquid crystal grating.

Item 245: The method of Item 244, wherein curing the holographic polymer dispersed liquid crystal grating comprises exposing the holographic polymer dispersed liquid crystal grating to a low intensity white light for a period of about an hour.

Item 246: The method ofItem 212, wherein the polymer surface relief grating is configured to incouple S-polarized light at an efficiency of 70% to 95%.

Item 247: The method of Item 246, wherein the polymer surface relief grating is further configured to incouple P-polarized light at an efficiency of 25% to 50%.

Item 248: The method ofItem 212, wherein the refractive index difference between the polymer network and the air gaps is 0.25 to 0.4.

Item 249: The method ofItem 226, wherein the refractive index difference between the polymer network and the liquid crystal material is 0.05 to 0.2.

Item 250: The method ofItem 212, wherein the polymer surface relief grating comprises a Bragg fringe spacing of 0.35 μm to 0.8 μm and the grating depth of 1 μm to 3 μm.

Item 251: The method ofItem 212, wherein the polymer surface relief grating comprises a ratio of Bragg fringe spacing to grating depth of 1:1 to 5:1.

Item 252: The method ofItem 212, wherein the liquid crystal content in the mixture of monomer and liquid crystal is approximately 20% to 50%.

Item 253: The method ofItem 212, wherein the liquid crystal in the mixture of monomer and liquid crystal comprises liquid crystal singles.

Item 254: The method of Item 253, wherein the liquid crystal singles comprise cyanobiphenyl and/or pentylcyanobiphenyl.

Item 255: A method for fabricating a grating, the method comprising:

• • providing a mixture of monomer and a nonreactive material;
  • providing a substrate;
  • coating a layer of the mixture on a surface of the substrate;
  • applying holographic recording beams to the layer to form a holographic polymer dispersed grating comprising alternating polymer rich regions and nonreactive material rich regions;
  • removing at least a portion of the nonreactive material in the nonreactive material rich regions to form a polymer surface relief grating including alternating polymer regions and air regions; and
  • performing a plasma ashing process to remove at least a portion of polymer from the polymer regions.

Item 256: The method of Item 255, wherein the mixture contains chemical additives for enhancing the effectiveness of the plasma ashing process.

Item 257: The method of Item 256, wherein the plasma ashing process includes reactive species including oxygen and the mixture includes nitrogen to control the plasma ashing rate.

Item 258: The method of Item 256, wherein the plasma ashing process includes reactive species including oxygen, fluorine, and/or hydrogen.

Item 259: The method of Item 258, wherein the plasma ashing process includes a plasma mixture of nitrogen and hydrogen.

Item 260: The method of Item 259, wherein the plasma mixture further includes fluorine.

Item 261: The method of Item 255, wherein the monomer comprises acrylates, methacrylates, vinyls, isocynates, thiols, isocyanate-acrylate, and/or thioline.

Item 262: The method of Item 261, wherein the mixture further comprises at least one of a photoinitiator, a coinitiator, or additional additives.

Item 263: The method of Item 261, wherein the thiols comprise thiol-vinyl-acrylate.

Item 264: The method of Item 262, wherein the photoinitiator comprises photosensitive components.

Item 265: The method of Item 264, wherein the photosensitive components comprise dyes and/or radical generators.

Item 266: The method of Item 255, wherein providing a mixture of monomer and liquid crystal comprises:

• • mixing the monomer, liquid crystal, and at least one of a photoinitiator, a coinitiator, multifunctional thiol, or additional additives;
  • storing the mixture in a location absent of light at a temperature of 22° C. or less;
  • adding additional monomer;
  • filtering the mixture through a filter of 0.6 μm or less; and
  • storing the filtered mixture in a location absent of light.

Item 267: The method of Item 255, wherein the substrate comprises a glass substrate or plastic substrate.

Item 268: The method of Item 255, wherein the substrate comprises a transparent substrate.

Item 269: The method of Item 255, further comprising sandwiching the mixture between the substrate and another substrate with one or more spacers for maintaining internal dimensions.

Item 270: The method of Item 265, further comprising applying a non-stick release layer on one surface of the other substrate.

Item 271: The method ofItem 270, wherein the non-stick release layer comprises a fluoropolymer.

Item 272: The method of Item 255, further comprising refilling the liquid crystal rich regions with a liquid crystal material.

Item 273: The method of Item 272, wherein the liquid crystal material has a different molecular structure than the previously removed liquid crystal.

Item 274: The method of Item 255, wherein removing at least a portion of the liquid crystal comprises removing substantially all of the liquid crystal in the liquid crystal rich regions.

Item 275: The method of Item 255, wherein removing at least a portion of the liquid crystal further comprises leaving at least a portion of the liquid crystal in the polymer rich regions.

Item 276: The method of Item 255, further comprising applying a protective layer over the deep SRG.

Item 277: The method of Item 276, wherein the protective layer comprises an anti-reflective layer.

Item 278: The method of Item 276, wherein the protective layer comprises silicate or silicon nitride.

Item 279: The method of Item 276, wherein applying a protective layer comprises depositing the protective layer on the deep SRG.

Item 280: The method of Item 279, wherein depositing the protective layer comprises chemical vapor deposition.

Item 281: The method ofItem 280, wherein the chemical vapor deposition is a nanocoating process.

Item 282: The method of Item 276, wherein the protective layer comprises a parylene coating.

Item 283: The method of Item 255, wherein the liquid crystal rich regions comprise air gaps after removing at least a portion of the liquid crystal in the liquid crystal rich regions.

Item 284: The method of Item 283, further comprising creating a vacuum in the air gaps or filling the air gaps with an inert gas.

Item 285: The method of Item 254, wherein removing at least a portion of liquid crystal comprises washing the holographic polymer dispersed liquid crystal grating with a solvent.

Item 286: The method of Item 285, wherein washing the holographic polymer dispersed liquid crystal grating comprises immersing the holographic polymer dispersed liquid crystal grating in the solvent.

Item 287: The method of Item 285, wherein the solvent comprises isopropyl alcohol.

Item 288: The method of Item 285, wherein the solvent is kept at a temperature lower than room temperature while washing the holographic polymer dispersed liquid crystal grating.

Item 289: The method of Item 285, wherein removing at least a portion of the liquid crystal further comprises drying the holographic polymer dispersed liquid crystal grating with a high flow air source.

Item 290: The method of Item 255, further comprising curing the holographic polymer dispersed liquid crystal grating.

Item 291: The method ofItem 290, wherein curing the holographic polymer dispersed liquid crystal grating comprises exposing the holographic polymer dispersed liquid crystal grating to a low intensity white light for a period of about an hour.

Item 292: The method of Item 255, wherein the polymer surface relief grating is configured to incouple S-polarized light at an efficiency of 70% to 95%.

Item 293: The method of Item 292, wherein the polymer surface relief grating is further configured to incouple P-polarized light at an efficiency of 25% to 50%.

Item 294: The method of Item 255, wherein the refractive index difference between the polymer network and the air gaps is 0.25 to 0.4.

Item 295: The method of Item 272, wherein the refractive index difference between the polymer network and the liquid crystal material is 0.05 to 0.2.

Item 296: The method of Item 255, wherein the polymer surface relief grating comprises a Bragg fringe spacing of 0.35 μm to 0.8 μm and the grating depth of 1 μm to 3 μm.

Item 297: The method of Item 255, wherein the polymer surface relief grating comprises a ratio of Bragg fringe spacing to grating depth of 1:1 to 5:1.

Item 298: The method of Item 255, wherein the liquid crystal content in the mixture of monomer and liquid crystal is approximately 20% to 50%.

Item 299: The method of Item 255, wherein the liquid crystal in the mixture of monomer and liquid crystal comprises liquid crystal singles.

Item 300: The method of Item 299, wherein the liquid crystal singles comprise cyanobiphenyl and/or pentylcynobiphenyl.

Item 301: The method of Item 255, for fabricating a grating, further comprising:

• • immersing the grating in a refractive material to fill the air regions and voids in the polymer rich regions formed by removal of the nonreactive material to form alternating polymer regions and refractive material regions; and
  • removing the refractive material in the refractive material regions to leave alternating composite polymer and second nonreactive material regions and air regions.

Item 302: The method of Item 301, wherein removing the refractive material in the refractive materials is performed using a plasma ashing process.

Item 303. A waveguide comprising:

• • an optical substrate supporting a polymer grating structure for diffracting light propagating in total internal reflection in said waveguide,
  • wherein the polymer grating structure comprises:
    • a polymer regions;
    • air gaps between adjacent portions of the polymer regions, wherein a portion of the polymer regions on the same level as the air gaps along with the air gaps form a surface relief grating; and
    • backfill material regions below the air gaps, wherein a portion of the polymer regions on the same level as the backfill material regions along with the backfill material regions form a volume grating, and
    • wherein the polymer grating structure comprises a dual interaction grating in which total internal reflection light from the surface relief grating formed by the polymer grating structure interacts with the volume grating formed by the polymer grating structure to provide a first diffraction efficiency versus angle characteristic and total internal reflection light from an opposing face of the optical substrate interacts with the volume grating formed by the polymer grating structure to provide a second diffraction efficiency versus angle characteristic.

Item 304: The waveguide of Item 303, wherein the polymer grating structure is a fold grating.

Item 305: The waveguide of Item 303, wherein grating depth of the polymer grating structure is less than the fringe spacing of the polymer grating structure.

Item 306: The waveguide of Item 303, wherein grating depth of the polymer grating structure is greater than the fringe spacing of the polymer grating structure.

Item 307. The waveguide of Item 303, wherein total internal reflection from the surface relief grating formed by the polymer grating structure occurs when the reflected first order diffraction from the surface relief grating formed by the polymer grating structure has a diffraction angle equal to the TIR angle of the waveguide.

Item 308: The waveguide of Item 303, wherein the polymer grating structure provides no transmitted diffraction orders.

Item 309: The waveguide of Item 303, wherein the polymer grating structure is a photonic crystal.

Item 310: The waveguide of Item 303, wherein the polymer grating structure comprises a Raman Nath grating overlaying a Bragg grating, wherein the Raman Nath grating has the same grating period as the Bragg grating, and the minima of the Raman Nath grating overlays the minima of the Bragg grating.

Item 311. The waveguide of Item 303, wherein the polymer grating structure is a slanted grating.

Item 312: The waveguide of Item 303, wherein the polymer grating structure is an unslanted grating.

Item 313. The waveguide of Item 303, wherein the backfill material regions have a refractive index different from that of the polymer rich regions.

Item 314. The waveguide device of Item 313, wherein the air regions and the polymer rich regions on the same level of the air regions comprise a Raman-Nath grating.

Item 315. The waveguide device of claim 314, wherein the backfilled material regions and the polymer rich regions on the same level as the backfilled material regions comprise a volume Bragg grating.

DOCTRINE OF EQUIVALENTS

While the above description contains many specific embodiments of the invention, these should not be construed as limitations on the scope of the invention, but rather as an example of one embodiment thereof. It is therefore to be understood that the present invention may be practiced in ways other than specifically described, without departing from the scope and spirit of the present invention. Thus, embodiments of the present invention should be considered in all respects as illustrative and not restrictive. Accordingly, the scope of the invention should be determined not by the embodiments illustrated, but by the appended claims and their equivalents.

Claims (18)

What is claimed is:

1. A method for fabricating a periodic structure, the method comprising:

providing a holographic mixture on a base substrate;

sandwiching the holographic mixture between the base substrate and a cover substrate, wherein the holographic mixture forms a holographic mixture layer on the base substrate;

applying holographic recording beams to the holographic mixture layer to form a holographic polymer dispersed periodic structure comprising alternating polymer rich regions and non-reactive material rich regions; and

removing the cover substrate from the holographic polymer dispersed periodic structure, wherein the cover substrate has different properties than the base substrate to allow for the cover substrate to adhere to the unexposed holographic mixture layer while capable of being removed from the formed holographic polymer dispersed periodic structure after exposure,

wherein a release layer is coated on top of the cover substrate which allows the cover substrate to easily release from the holographic polymer dispersed periodic structure,

wherein the cover substrate comprises a glass surface including hydroxyl groups and wherein the release layer is a silane based fluoro reactant which bonds with the hydroxyl groups.

2. The method ofclaim 1, further comprising removing at least a portion of the non-reactive material in the non-reactive material rich regions to form a polymer periodic structure.

3. The method ofclaim 2, further comprising refilling the non-reactive material rich regions with a backfill material.

4. The method ofclaim 3, wherein the backfill material has a different refractive index than the refractive index of the remaining polymer rich regions.

5. The method ofclaim 3, wherein the backfill material comprises a liquid crystal material.

6. The method ofclaim 5, wherein the liquid crystal material is different from the non-reactive material removed from the non-reactive material rich regions.

7. The method ofclaim 2, wherein removing at least a portion of the non-reactive material comprises removing substantially all of the non-reactive material in the non-reactive material rich regions.

8. The method ofclaim 2, wherein removing at least a portion of the non-reactive material further comprises leaving at least a portion of the non-reactive material in the non-reactive material rich regions.

9. The method ofclaim 2, wherein removing at least a portion of non-reactive material comprises washing the holographic polymer dispersed periodic structure with a solvent.

10. The method ofclaim 1, wherein the base substrate comprises plastic.

11. The method ofclaim 10, wherein a silicon oxide layer is deposited on the cover substrate.

12. The method ofclaim 1, wherein a silicon oxide layer is deposited on the base substrate.

13. The method ofclaim 1, wherein the base substrate comprises glass, quartz, or silica.

14. The method ofclaim 1, wherein the cover substrate comprises plastic.

15. The method ofclaim 1, wherein the cover substrate comprises glass, quartz, or silica.

16. The method ofclaim 1, further comprising applying a protective substrate to the holographic polymer dispersed periodic structure, wherein the holographic polymer dispersed periodic structure is positioned between the protective substrate and the base substrate.

17. The method ofclaim 1, wherein the non-reactive material comprises a liquid crystal material.

18. A method for fabricating a periodic structure, the method comprising:

providing a holographic mixture on a base substrate;

sandwiching the holographic mixture between the base substrate and a cover substrate, wherein the holographic mixture forms a holographic mixture layer on the base substrate;

applying holographic recording beams to the holographic mixture layer to form a holographic polymer dispersed periodic structure comprising alternating polymer rich regions and non-reactive material rich regions; and

removing the cover substrate from the holographic polymer dispersed periodic structure, wherein the cover substrate has different properties than the base substrate to allow for the cover substrate to adhere to the unexposed holographic mixture layer while capable of being removed from the formed holographic polymer dispersed periodic structure after exposure,

wherein an adhesion promotion layer is coated on top of the base substrate which promotes adhesion between the base substrate and the holographic polymer dispersed periodic structure, and

wherein the base substrate comprises a glass surface including hydroxyl groups and wherein a silane-based reagent bonds with the hydroxyl group and the adhesion promotion layer.

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