US10095127B2 - Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium - Google Patents

Abstract

A liquid immersion exposure apparatus includes a liquid immersion member which forms a liquid immersion space on an object disposed opposite to an emitting surface of an optical member. The liquid immersion member includes (i) a first member that has a first liquid supply port and a first opening through which the exposure light is projected, (ii) a second member that has a first liquid recovery port facing downwardly and that is movable with respect to the first member, and (iii) a gas supply port arranged radially outward of the first liquid recovery port with respect to a path of the exposure light. The first liquid recovery port has a plurality of openings disposed in a four-sided shape to surround the first opening of the first member. The second member is movable relative to the first member in a direction perpendicular to an optical axis of the optical member.

Description

CROSS-REFERENCE TO RELATED APPLICATION

This is a divisional of U.S. patent application Ser. No. 14/743,430 filed Jun. 18, 2015 (now U.S. Pat. No. 9,823,583), which in turn is a continuation of International Application PCT/JP2013/084758, filed on Dec. 25, 2013, which claims the filing date benefit of U.S. Provisional Patent Application No. 61/746,497, filed Dec. 27, 2012. The contents of the above applications are incorporated herein by reference in their entireties.

BACKGROUNDTechnical Field

The present invention relates to a liquid immersion member, an exposure apparatus, an exposing method, a method of manufacturing a device, a program, and a recording medium.

For example, in an exposure apparatus which is used in a photolithography process, as disclosed in U.S. Pat. No. 7,864,292, a liquid immersion exposure apparatus which exposes a substrate by exposure light via a liquid is known.

SUMMARY

For example, in a liquid immersion exposure apparatus, if liquid flows out from a predetermined space or remains on an object such as a substrate, exposure failure may occur. As a result, a defective device may be manufactured.

An object of an aspect of the present invention is to provide a liquid immersion member, an exposure apparatus, and an exposing method capable of suppressing occurrences of exposure failure. Moreover, an object of another aspect of the present invention is to provide a method of manufacturing a device, a program, and a recording medium capable of suppressing occurrences of defective devices.

According to a first aspect of the present invention, there is provided a liquid immersion member that is used in a liquid immersion exposure apparatus, and is capable of forming a liquid immersion space in a surface of an object opposite to an emitting surface of an optical member which emits exposure light, including: a first member that includes a first part disposed at surrounding of an optical path of the exposure light, and in which a first opening part, through which the exposure light is able to pass, and a first liquid supply part, which is disposed at at least a portion of surrounding of the first opening part and is capable of opposing the surface of the object, are provided at the first part; and a second member that includes a first liquid recovery part which is capable of opposing the surface of the object and is movable with respect to the first member outside the first part with respect to the optical path.

According to a second aspect of the present invention, there is provided a liquid immersion member that is used in a liquid immersion exposure apparatus, and is capable of forming a liquid immersion space on a surface of an object opposite to an emitting surface of an optical member which emits exposure light, including: a first member that includes a first part disposed at surrounding of an optical path of the exposure light, and in which a first opening part, through which the exposure light is able to pass, is provided at the first part; and a second member that includes a first liquid recovery part and a first gas supply part, and is movable with respect to the first member outside the first part with respect to the optical path, the first liquid recovery part being capable of opposing the surface of the object, the first gas supply part being disposed outside the first liquid recovery part in a radial direction with respect to an optical axis of the optical member and being capable of opposing the surface of the object.

According to a third aspect of the present invention, there is provided a liquid immersion member that is used in a liquid immersion exposure apparatus, and is capable of forming a liquid immersion space on a surface of an object opposite to an emitting surface of an optical member which emits exposure light, including: a first member that includes a first part disposed at surrounding of an optical path of the exposure light, and in which a first opening part, through which the exposure light is able to pass, is provided at the first part; and a second member that includes a first liquid recovery part and a second liquid supply part, and that is movable with respect to the first member outside the first part with respect to the optical path, the first liquid recover part being capable of opposing the surface of the object, the second liquid supply part being disposed between the optical path and the first liquid recovery part in a radial direction with respect to an optical axis of the optical member and being capable of opposing the surface of the object.

According to a fourth aspect of the present invention, there is provided a liquid immersion member that is used in a liquid immersion exposure apparatus, and is capable of forming a liquid immersion space on a surface of an object opposite to an emitting surface of an optical member which emits exposure light, including: a first member that includes a first part disposed at surrounding of an optical path of the exposure light, and in which a first opening part, through which the exposure light is able to pass, is provided at the first part; and a second member that includes a first liquid recovery part which is capable of opposing the surface of the object and is movable with respect to the first member outside the first part with respect to the optical path; and a second liquid recovery part that is disposed at the first member and is capable of recovering at least a portion of liquid which has flowed in a gap between the first member and the second member from above the object.

According to a fifth aspect of the present invention, there is provided a liquid immersion member that is used in a liquid immersion exposure apparatus, and is capable of forming a liquid immersion space on a surface of an object opposite to an emitting surface of an optical member which emits exposure light, including: a first member that includes a first part disposed at surrounding of an optical path of the exposure light, and in which a first opening part, through which the exposure light is able to pass, is provided at the first part; a second member that includes a first liquid recovery part which is capable of opposing the surface of the object and is movable with respect to the first member outside the first part with respect to the optical path; and a second liquid recovery part which is capable of recovering at least a portion of liquid which has flowed in a gap between the first member and the second member from above the object, wherein the gap between the first member and the second member includes a first gap part having a first size, and a second gap part which is disposed outside the first gap part with respect to the optical axis of the optical member and has a second size smaller than the first size, and wherein the second liquid recovery part is capable of recovering liquid from the first gap part.

According to a sixth aspect of the present invention, there is provided an exposure apparatus which exposes a substrate via liquid by exposure light, the exposure apparatus including: the liquid immersion member according to any one of the first to fifth aspects.

According to a seventh aspect of the present invention, there is provided an exposure apparatus that exposes a substrate via liquid by exposure light, including: an optical member that includes an emitting surface from which the exposure light is emitted; a liquid immersion member that is capable of forming a liquid immersion space of the liquid on an object capable of moving below the optical member, and includes a first member which is disposed at at least a portion of surrounding of an optical path of the exposure light, and a second member in which at least a portion is disposed to be opposite to the object below the first member and which is movable with respect to the first member; and a gas supply part that supplies gas to at least a portion of surrounding of the liquid immersion space.

According to an eighth aspect of the present invention, there is provided a method of manufacturing a device, including: exposing the substrate using the exposure apparatus according to the sixth aspect or the seventh aspect; and developing the exposed substrate.

According to a ninth aspect of the present invention, there is provided an exposing method that exposes a substrate by exposure light via liquid between an emitting surface of an optical member emitting the exposure light and the substrate, including: forming a liquid immersion space of the liquid on a surface of the substrate by using a liquid immersion member that includes a first member and a second member, the first member including a first part disposed at surrounding of an optical path of the exposure light, a first opening part, through which the exposure light is able to pass, and a first liquid supply part being provided at the first part of the first member, the first liquid supply part being disposed at at least surrounding of the first opening part and being capable of opposing the surface of the substrate, the second member including a first liquid recovery part which is capable of opposing the surface of the substrate and being movable with respect to the first member outside the first part with respect to the optical path; exposing the substrate by the exposure light emitted from the emitting surface via the liquid of the liquid immersion space; and moving the second member with respect to the first member in at least a portion of exposure of the substrate.

According to a tenth aspect of the present invention, there is provided an exposing method that exposes a substrate by exposure light via liquid between an emitting surface of an optical member emitting the exposure light and the substrate, including: forming a liquid immersion space of the liquid on a surface of the substrate by using a liquid immersion member that includes a first member and a second member, the first member including a first part disposed at surrounding of an optical path of exposure light, a first opening part, through which the exposure light is able to pass, being provided at the first part of the first member, the second member including a first liquid recovery part and a first gas supply part and being movable with respect to the first member outside the first part with respect to the optical path, the first liquid recovery part being capable of opposing the surface of the object, the first gas supply part being disposed outside the first liquid recovery part in a radial direction with respect to an optical axis of an optical member and being capable of opposing the surface of the object; exposing the substrate by the exposure light emitted from the emitting surface via the liquid of the liquid immersion space; and moving the second member with respect to the first member in at least a portion of exposure of the substrate.

According to an eleventh aspect of the present invention, there is provided an exposing method that exposes a substrate to exposure light via liquid between an emitting surface of an optical member emitting the exposure light and the substrate, including: forming a liquid immersion space of the liquid on a surface of the substrate by using a liquid immersion member that includes a first member and a second member, the first member including a first part disposed at surrounding of an optical path of the exposure light, a first opening part, through which the exposure light is able to pass, being provided at the first part of the first member, the second member including a first liquid recovery part and a second liquid supply part and being movable with respect to the first member outside the first part with respect to the optical path, the first liquid recovery part being capable of opposing the surface of the object, the second liquid supply part being disposed between the optical path and the first liquid recovery part in a radial direction with respect to an optical axis of the optical member and being capable of opposing the surface of the object; exposing the substrate by the exposure light emitted from the emitting surface via the liquid of the liquid immersion space; and moving the second member with respect to the first member in at least a portion of exposure of the substrate.

According to a twelfth aspect of the present invention, there is provided an exposing method that exposes a substrate by exposure light via liquid between an emitting surface of an optical member emitting the exposure light and the substrate, including: forming a liquid immersion space of the liquid on a surface of the substrate by using a liquid immersion member that includes a first member, a second member, and a second liquid recovery part, the first member including a first part disposed at surrounding of an optical path of the exposure light, a first opening part, through which the exposure light is able to pass, being provided at the first part of the first member, the second member including a first liquid recovery part and being movable with respect to the first member outside the first part with respect to the optical path, the first liquid recovery part being capable of opposing a surface of the object, the second liquid recovery part being disposed at the first member and being capable of recovering at least a portion of liquid which has flowed in a gap between the first member and the second member from above the object; exposing the substrate by the exposure light emitted from the emitting surface via the liquid of the liquid immersion space; and moving the second member with respect to the first member in at least a portion of exposure of the substrate.

According to a thirteenth aspect of the present invention, there is provided an exposing method that exposes a substrate by exposure light via liquid between an emitting surface of an optical member emitting the exposure light and the substrate, including: forming a liquid immersion space of the liquid on a surface of a substrate by using a liquid immersion member that includes a first member, a second member, and a second liquid recovery part, wherein a gap between the first member and the second member includes a first gap part having a first size, and a second gap part having a second size which is disposed outside the first gap part with respect to the optical axis of the optical member and is smaller than the first size, and the second liquid recovery part is capable of recovering liquid from the first gap part, the first member including a first part disposed at surrounding of an optical path of the exposure light, a first opening part, through which the exposure light is able to pass, being provided at the first part of the first member, the second member including a first liquid recovery part which is capable of opposing a surface of the object and being movable with respect to the first member outside the first part with respect to the optical path, the second liquid recovery part being capable of recovering at least a portion of liquid which has flowed in the gap between the first member and the second member from above the object; exposing the substrate by the exposure light emitted from the emitting surface via the liquid of the liquid immersion space; and moving the second member with respect to the first member in at least a portion of exposure of the substrate.

According to a fourteenth aspect of the present invention, there is provided an exposing method that exposes a substrate by exposure light via liquid between an emitting surface of an optical member emitting the exposure light and the substrate, including: forming a liquid immersion space of the liquid on a substrate which is movable below the optical member by using a first liquid immersion member that includes a first member and a second member. the first member being disposed at at least a portion of surrounding of an optical path of the exposure light, the second member being disposed so that at least a portion of the second member is capable of opposing the object below the first member and being movable with respect to the first member; exposing the substrate by the exposure light emitted from the emitting surface via the liquid of the liquid immersion space; moving the second member with respect to the first member in at least a portion of the exposure of the substrate; and supplying gas from a gas supply part to at least a portion of surrounding of the liquid immersion space.

According to a fifteenth aspect of the present invention, there is provided a method of manufacturing a device, including: exposing a substrate using the exposing method according to any one of the ninth to fourteenth aspects; and developing the exposed substrate.

According to a sixteenth aspect of the present invention, there is provided a program that causes a computer to execute a control of a liquid immersion exposure apparatus which exposes a substrate by exposure light via liquid between an emitting surface of an optical member emitting the exposure light and the substrate, wherein the program performs: forming a liquid immersion space of the liquid on a surface of the substrate by using a liquid immersion member that includes a first member and a second member, the first member including a first part disposed at surrounding of an optical path of the exposure light, a first opening part, through which the exposure light is able to pass, and a first liquid supply part being provided at the first part of the first member, the first liquid supply part being disposed at at least surrounding of the first opening part and being capable of opposing the surface of the substrate, the second member including a first liquid recovery part which is capable of opposing the surface of the substrate and being movable with respect to the first member outside the first part with respect to the optical path; exposing the substrate by the exposure light emitted from the emitting surface via the liquid of the liquid immersion space; and moving the second member with respect to the first member in at least a portion of exposure of the substrate.

According to a seventeenth aspect of the present invention, there is provided a program that causes a computer to execute a control of a liquid immersion exposure apparatus which exposes a substrate by exposure light via liquid between an emitting surface of an optical member emitting the exposure light and the substrate, wherein the program performs: forming a liquid immersion space of the liquid on a surface of the substrate by using a liquid immersion member that includes a first member and a second member, the first member including a first part disposed at surrounding of an optical path of exposure light, a first opening part, through which the exposure light is able to pass, being provided at the first part of the first member, the second member including a first liquid recovery part and a first gas supply part and being movable with respect to the first member outside the first part with respect to the optical path, the first liquid recovery part being capable of opposing the surface of the object, the first gas supply part being disposed outside the first liquid recovery part in a radial direction with respect to an optical axis of an optical member and being capable of opposing the surface of the object; exposing the substrate by the exposure light emitted from the emitting surface via the liquid of the liquid immersion space; and moving the second member with respect to the first member in at least a portion of exposure of the substrate.

According to an eighteenth aspect of the present invention, there is provided a program that causes a computer to execute a control of a liquid immersion exposure apparatus which exposes a substrate by exposure light via liquid between an emitting surface of an optical member emitting the exposure light and the substrate, wherein the program performs: forming a liquid immersion space of the liquid on a surface of the substrate by using a liquid immersion member that includes a first member and a second member, the first member including a first part disposed at surrounding of an optical path of the exposure light, a first opening part, through which the exposure light is able to pass, being provided at the first part of the first member, the second member including a first liquid recovery part and a second liquid supply part and being movable with respect to the first member outside the first part with respect to the optical path, the first liquid recovery part being capable of opposing the surface of the object, the second liquid supply part being disposed between the optical path and the first liquid recovery part in a radial direction with respect to an optical axis of the optical member and being capable of opposing the surface of the object; exposing the substrate by the exposure light emitted from the emitting surface via the liquid of the liquid immersion space; and moving the second member with respect to the first member in at least a portion of exposure of the substrate.

According to a nineteenth aspect of the present invention, there is provided a program that causes a computer to execute a control of a liquid immersion exposure apparatus which exposes a substrate to exposure light via liquid between an emitting surface of an optical member emitting the exposure light and the substrate, wherein the program performs: forming a liquid immersion space of the liquid on a surface of the substrate by using a liquid immersion member that includes a first member, a second member, and a second liquid recovery part, the first member including a first part disposed at surrounding of an optical path of the exposure light, a first opening part, through which the exposure light is able to pass, being provided at the first part of the first member, the second member including a first liquid recovery part and being movable with respect to the first member outside the first part with respect to the optical path, the first liquid recovery part being capable of opposing a surface of the object, the second liquid recovery part being disposed at the first member and being capable of recovering at least a portion of liquid which has flowed in a gap between the first member and the second member from above the object; exposing the substrate by the exposure light emitted from the emitting surface via the liquid of the liquid immersion space; and moving the second member with respect to the first member in at least a portion of exposure of the substrate.

According to a twentieth aspect of the present invention, there is provided a program that causes a computer to execute a control of a liquid immersion exposure apparatus which exposes a substrate by exposure light via liquid between an emitting surface of an optical member emitting the exposure light and the substrate, wherein the program performs: forming a liquid immersion space of the liquid on a surface of a substrate by using a liquid immersion member that includes a first member, a second member, and a second liquid recovery part, wherein a gap between the first member and the second member includes a first gap part having a first size, and a second gap part having a second size which is disposed outside the first gap part with respect to the optical axis of the optical member and is smaller than the first size, and the second liquid recovery part is capable of recovering liquid from the first gap part, the first member including a first part disposed at surrounding of an optical path of the exposure light, a first opening part, through which the exposure light is able to pass, being provided at the first part of the first member, the second member including a first liquid recovery part which is capable of opposing a surface of the object and being movable with respect to the first member outside the first part with respect to the optical path, the second liquid recovery part being capable of recovering at least a portion of liquid which has flowed in the gap between the first member and the second member from above the object; exposing the substrate by the exposure light emitted from the emitting surface via the liquid of the liquid immersion space; and moving the second member with respect to the first member in at least a portion of exposure of the substrate.

According to a twenty-first aspect of the present invention, there is provided a program which causes a computer to execute a control of a liquid immersion exposure apparatus which exposes a substrate by exposure light via liquid between an emitting surface of an optical member emitting the exposure light and the substrate, wherein the program performs: forming a liquid immersion space of the liquid on a substrate which is movable below the optical member by using a first liquid immersion member that includes a first member and a second member. the first member being disposed at at least a portion of surrounding of an optical path of the exposure light, the second member being disposed so that at least a portion of the second member is capable of opposing the object below the first member and being movable with respect to the first member; exposing the substrate by the exposure light emitted from the emitting surface via the liquid of the liquid immersion space; moving the second member with respect to the first member in at least a portion of the exposure of the substrate; and supplying gas from a gas supply part to at least a portion of surrounding of the liquid immersion space.

According to a twenty-second of the present invention, there is provided a computer-readable recording medium on which the program according to any one of the sixteenth to twenty-first aspects is recorded.

According to the aspects of the present invention, occurrence of exposure failure can be prevented. In addition, according to the aspects of the present invention, occurrence of a defective device can be prevented.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a view showing an example of an exposure apparatus according to a first embodiment.

FIG. 2 is a side cross-sectional view showing an example of a liquid immersion member according to the first embodiment.

FIG. 3 is a side cross-sectional view showing a portion of the liquid immersion member according to the first embodiment.

FIG. 4 is a view of the liquid immersion member according to the first embodiment as seen from below.

FIG. 5 is a view of a first member according to the first embodiment as seen from below.

FIG. 6 is a view for explaining an example of an operation of the exposure apparatus according to the first embodiment.

FIG. 7 is a view for explaining an example of an operation of a second member according to the first embodiment.

FIG. 8 is a view for explaining an example of the operation of the exposure apparatus according to the first embodiment.

FIG. 9 is a view for explaining an example of the operation of the exposure apparatus according to the first embodiment.

FIG. 10 is a view for explaining an example of the operation of the exposure apparatus according to the first embodiment.

FIG. 11 is a view showing an example of a second member according to a second embodiment.

FIG. 12 is a view showing an example of the second member according to the second embodiment.

FIG. 13 is a view showing an example of the second member according to the second embodiment.

FIG. 14 is a view showing an example of the second member according to the second embodiment.

FIG. 15 is a view showing an example of the second member according to the second embodiment.

FIG. 16 is a view showing an example of the second member according to the second embodiment.

FIG. 17 is a view showing an example of a liquid immersion member according to a third embodiment.

FIG. 18 is a view showing an example of a liquid immersion member according to a fourth embodiment.

FIG. 19 is a view showing an example of a liquid immersion member according to a fifth embodiment.

FIG. 20 is a view showing an example of a liquid immersion member according to a sixth embodiment.

FIG. 21 is a view for explaining an example of a liquid immersion member according to a seventh embodiment.

FIG. 22 is a view showing an example of a liquid immersion member according to an eighth embodiment.

FIG. 23 is a view showing an example of a liquid immersion member according to a ninth embodiment.

FIG. 24 is a view for explaining an example of an operation of an exposure apparatus according to a tenth embodiment.

FIG. 25 is a side cross-sectional view showing a portion of a liquid immersion member according to an eleventh embodiment.

FIG. 26 is a view of the liquid immersion member according to the eleventh embodiment as seen from below.

FIG. 27 is a view for explaining an example of an operation of the liquid immersion member according to the eleventh embodiment.

FIG. 28 is a side cross-sectional view showing a portion of the liquid immersion member according to the eleventh embodiment.

FIG. 29 is a side cross-sectional view showing a portion of the liquid immersion member according to the eleventh embodiment.

FIG. 30 is a side cross-sectional view showing a portion of the liquid immersion member according to the eleventh embodiment.

FIG. 31 is a view showing an example of a substrate stage.

FIG. 32 is a flowchart for explaining an example of a method of manufacturing a device.

DESCRIPTION OF EMBODIMENTS

Hereinafter, embodiments of the present invention will be described referring to the drawings. However, the present invention is not limited thereto. In the descriptions below, an XYZ rectangular coordinate system is set, and a positional relationship of each portion will be described with reference to the XYZ rectangular coordinate system. A predetermined direction in a horizontal surface is set to an X axis direction, a direction orthogonal to the X axis direction in the horizontal surface is set to a Y axis direction, and a direction (that is, a vertical direction) orthogonal to each of the X axis direction and the Y axis direction is set to a Z axis direction. Moreover, the rotation (inclination) directions around the X axis, the Y axis, and the Z axis are set to the θX direction, the θY direction, and the θZ direction.

First Embodiment

A first embodiment will be described.FIG. 1 is a schematic configuration view showing an example of an exposure apparatus EX according to the first embodiment. The exposure apparatus EX of the present embodiment is a liquid immersion exposure apparatus which exposes a substrate P via a liquid LQ using exposure light EL. In the present embodiment, a liquid immersion space LS is formed so that an optical path of the exposure light EL which is radiated to the substrate P is filled with the liquid LQ. The liquid immersion space LS means a portion (space or region) which is filled with the liquid. The substrate P is exposed by the exposure light EL via the liquid LQ in the liquid immersion space LS. In the present embodiment, water (pure water) is used as the liquid LQ.

For example, the exposure apparatus EX of the present embodiment is an exposure apparatus which includes a substrate stage and a measurement stage as disclosed in U.S. Pat. No. 6,897,963, European Patent Application, Publication No. 1,713,113, or the like.

InFIG. 1, the exposure apparatus EX includes: a mask stage1 which is movable while holding a mask M; a substrate stage2 which is movable while holding a substrate P; a measurement stage3 which does not hold the substrate P, and which is movable while mounting a measurement member (measurement instrument) C which measures the exposure light EL; ameasurement system4 which measures positions of the substrate stage2 and the measurement stage3; an illumination system IL which illuminates the mask M with the exposure light EL; a projection optical system PL which projects an image of a pattern of the mask M which is illuminated with the exposure light EL to the substrate P; aliquid immersion member5 which forms the liquid immersion space LS of a liquid LQ; a controller6 which controls an operation of the entire exposure apparatus EX; and a storage apparatus7 which is connected to the controller6 and stores various information with respect to the exposure.

Moreover, the exposure apparatus EX includes areference frame8A which supports the projection optical system PL and various measurement systems including themeasurement system4, anapparatus frame8B which supports thereference frame8A, and avibration isolator10 which is disposed between thereference frame8A and theapparatus frame8B, and suppresses transmission of vibration from theapparatus frame8B to thereference frame8A. Thevibration isolator10 includes a spring apparatus or the like. In the present embodiment, thevibration isolator10 includes a gas spring (for example, an air mount). In addition, either a detection system which detects an alignment mark of the substrate P or a detection system which detects the position of the surface of an object such as the substrate P, or both detection systems may be supported by thereference frame8A.

Moreover, the exposure apparatus EX includes achamber apparatus9 which adjusts an environment (at least one of temperature, humidity, pressure, and a degree of cleanness) of a space CS to which the exposure light EL advances. Thechamber apparatus9 includes an air conditioner9S which supplies a gas GS to the space CS. The air conditioner9S supplies the gas GS, in which the temperature, the humidity, and the degree of cleanness are adjusted, to the space CS.

At least the projection optical system PL, theliquid immersion member5, the substrate stage2, and the measurement stage3 are disposed at the space CS. In the present embodiment, at least a portion of the mask stage1 and the illumination system IL is also disposed at the space CS.

The mask M includes a reticle on which a device pattern projected to the substrate P is formed. For example, the mask M includes a transmission type mask which includes a transparent plate such as a glass plate, and a pattern formed on the transparent plate using a light-shielding material such as chromium. Moreover, a reflection type mask may be used as the mask M.

The substrate P is a substrate used to manufacture a device. For example, the substrate P includes a base material such as a semiconductor wafer and a photosensitive film which is formed on the base material. The photosensitive film is a film of a photosensitive material (photoresist). Moreover, the substrate P may include other films in addition to the photosensitive film. For example, the substrate P may include an antireflection film and a protective film (top coat film) which protects the photosensitive film.

The illumination system IL radiates the exposure light EL to an illumination region IR. The illumination region IR includes positions which can be radiated with the exposure light EL emitted from the illumination system IL. The illumination system IL illuminates at least a portion of the mask M disposed at the illumination region IR by the exposure light EL having a uniform illumination distribution. For example, as for the exposure light EL which is emitted from the illumination system IL, far-ultraviolet light (DUV light) such as a bright line (g-line, h-line, i-line) emitted from a mercury lamp and KrF excimer laser light (248 nm in wavelength), ArF excimer laser light (193 nm in wavelength), vacuum-ultraviolet light (VUV light) such as F₂laser light (157 nm in wavelength), and the like are used. In the present embodiment, as for the exposure light EL, ArF excimer laser light, which is ultraviolet light (vacuum-ultraviolet light), is used.

The mask stage1 is movable in a state where it holds the mask M. For example, the mask stage1 is moved by an operation of a driving system11 which includes a planar motor as disclosed in U.S. Pat. No. 6,452,292. In the present embodiment, the mask stage1 is movable in six directions of the X axis, the Y axis, the Z axis, the θX, the θY, and the θZ by the operation of the driving system11. Moreover, the driving system11 may not include a planar motor. The driving system11 may include a linear motor.

The projection optical system PL radiates the exposure light EL to a projection region PR. The projection region PR includes positions which can be radiated with the exposure light EL emitted from the projection optical system PL. The projection optical system PL projects the image of the pattern of the mask M on at least a portion of the substrate P disposed at the projection region PR by a predetermined projection magnification. In the present embodiment, the projection optical system PL is a reduction system. The projection magnification of the projection optical system PL is ¼. In addition, the projection magnification of the projection optical system PL may be ⅕, ⅛, or the like. Moreover, the projection optical system PL may be either an equal magnification system or an enlargement system. In the present embodiment, the optical axis of the projection optical system PL is parallel to the Z axis. The projection optical system PL may be any of a refraction system which does not include a reflective optical element, a reflection system which does not include a refractive optical element, or a reflective refraction system which includes the reflective optical element and the refractive optical element. The projection optical system PL may form either an inverted image or an erected image.

The projection optical system PL includes a terminaloptical element13 which includes an emittingsurface12 from which the exposure light EL is emitted. The emittingsurface12 emits the exposure light EL toward the image surface of the projection optical system PL. The terminaloptical element13 is an optical element nearest to the image surface of the projection optical system PL among the plurality of optical elements of the projection optical system PL. The projection region PR includes positions which can be radiated with the exposure light EL emitted from the emittingsurface12. In the present embodiment, the emittingsurface12 faces the −Z direction. The exposure light EL emitted from the emittingsurface12 advances in the −Z direction. The emittingsurface12 is parallel to the XY plane. Moreover, the emittingsurface12 facing the −Z direction may have a convex surface or a concave surface. In addition, the emittingsurface12 may be inclined with respect to the XY plane and may include a curved surface. In the present embodiment, the optical axis AX of the terminaloptical element13 is parallel to the Z axis.

With respect to the direction parallel to the optical axis AX of the terminaloptical element13, the emittingsurface12 side is at the −Z side, and the incident surface side is at the +Z side. With respect to the direction parallel to the optical axis of the projection optical system PL, the image surface side of the projection optical system PL is at the −Z side, and the object surface side of the projection optical system PL is at the +Z side. In the present embodiment, the emittingsurface12 side (image surface side) is at the lower side (lower portion), and the incident surface side (object surface side) is at the upper side (upper portion).

The substrate stage2 is movable in the XY plane, which includes positions (projection region PR) which can be radiated with the exposure light EL from the emittingsurface12, in a state where the substrate stage holds the substrate P. The measurement stage3 is movable in the XY plane, which includes positions (projection region PR) which can be radiated with the exposure light EL from the emittingsurface12, in a state where a measurement member (measurement instrument) C is mounted on the measurement stage. Each of the substrate stage2 and the measurement stage3 is movable on aguide surface14G of abase member14. Theguide surface14G and the XY plane are substantially parallel to each other.

The substrate stage2 includes a first holding part which releasably holds the substrate P and a second holding part which is disposed at the surrounding of the first holding part and releasably holds a cover member T as disclosed in, for example, United States Patent Application, Publication No. 2007/0177125, United States Patent Application, Publication No. 2008/0049209, and the like. The first holding part holds the substrate P so that the surface (upper surface) of the substrate P and the XY plane are substantially parallel to each other. The upper surface of the substrate P held by the first holding part and the upper surface of the cover member T held by the second holding part are disposed at substantially the same plane. With respect to the Z axis direction, the distance between the emittingsurface12 and the upper surface of the substrate P held by the first holding part is substantially the same as the distance between the emittingsurface12 and the upper surface of the cover member T held by the second holding part.

Moreover, with respect to the Z axis direction, the distance between the emittingsurface12 and the upper surface of the substrate P being substantially the same as the distance between the emittingsurface12 and the upper surface of the cover member T includes a difference of the distance between the emittingsurface12 and the upper surface of the substrate P and the distance between the emittingsurface12 and the upper surface of the cover member T being within 10% of the distance (a so-called working distance) between the emittingsurface12 and the upper surface of the substrate P when the substrate P is exposed, for example. In addition, the upper surface of the substrate P held by the first holding part and the upper surface of the cover member T held by the second holding part may not be disposed on substantially the same plane. For example, with respect to the Z axis direction, the position of the upper surface of the substrate P and the position of the upper surface of the cover member T may be different from each other. For example, there may be a step between the upper surface of the substrate P and the upper surface of the cover member T. In addition, the upper surface of the cover member T may be inclined with respect to the upper surface of the substrate P. The upper surface of the cover member T may include a curved surface.

The substrate stage2 and the measurement stage3 are moved by an operation of adriving system15 which includes a planar motor as disclosed in, for example, U.S. Pat. No. 6,452,292. The drivingsystem15 includes a mover2C which is disposed at the substrate stage2, a mover3C which is disposed at the measurement stage3, and astator14M which is disposed at thebase member14. Each of the substrate stage2 and the measurement stage3 is movable on aguide surface14G in six directions of the X axis, the Y axis, the Z axis, the θX, the θY, and the θZ directions by the operation of the drivingsystem15. Moreover, the drivingsystem15 may not include a planar motor. The drivingsystem15 may include a linear motor.

Themeasurement system4 includes an interferometer system. The interferometer system includes a unit which radiates measurement light to a measurement mirror of the substrate stage2 and a measurement mirror of the measurement stage3 and measures the positions of the substrate stage2 and the measurement stage3. In addition, for example, the measurement system may include an encoder system disclosed in United States Patent Application, Publication No. 2007/0288121. Moreover, themeasurement system4 may include only one of the interferometer system and the encoder system.

When exposure processing of the substrate P is performed, or when predetermined measurement processing is performed, the controller6 performs position controls of the substrate stage2 (substrate P) and the measurement stage3 (measurement member C) based on the measurement results of themeasurement system4.

Next, theliquid immersion member5 according to the present embodiment will be described. In addition, the liquid immersion member may also be referred to as a nozzle member.FIG. 2 is a cross-sectional view of the terminaloptical element13 and theliquid immersion member5 parallel to the XZ plane.FIG. 3 is a view in which a portion ofFIG. 2 is enlarged.FIG. 4 is a view of theliquid immersion member5 as seen from below (−Z side).FIG. 5 is a view of afirst member21 of theliquid immersion member5 as seen from below (−Z side).

The terminaloptical element13 includes the emittingsurface12 facing the −Z axis direction and anouter surface131 which is disposed at the surrounding of the emittingsurface12. The exposure light EL is emitted from the emittingsurface12. The exposure light EL is not emitted from theouter surface131. The exposure light EL passes through the emittingsurface12 and does not pass through theouter surface131. Theouter surface131 is a non-emitting surface from which the exposure light EL is not emitted. In the present embodiment, theouter surface131 is inclined upwardly and outwardly in a radial direction with respect to the optical path AX of the terminaloptical element13.

Theliquid immersion member5 forms a liquid immersion space LS of the liquid LQ above the surface (upper surface) of the object which is movable below the terminaloptical element13.

The object which is movable below the terminaloptical element13 is movable in the XY plane which includes the position opposite to the emittingsurface12. The surface (upper surface) of the object is able to be opposite to the emittingsurface12 and is capable of being disposed at the projection region PR. The object is movable below theliquid immersion member5 and is capable of being opposite to theliquid immersion member5.

In the present embodiment, the object includes at least one of at least a portion of the substrate stage2 (for example, the cover member T of the substrate stage2), the substrate P which is held by the substrate stage2 (first holding part), and the measurement stage3.

In the exposure of the substrate P, the liquid immersion space LS is formed so that the optical path K of the exposure light EL between the emittingsurface12 of the terminaloptical element13 and the substrate P is filled with the liquid LQ. When the exposure light EL is radiated to the substrate P, the liquid immersion space LS is formed so that only a portion of the surface region of the substrate P which includes the projection region PR is covered by the liquid LQ.

In descriptions below, the object is defined as the substrate P. Moreover, as described above, the object may be at least one of the substrate stage2 and the measurement stage3, and the object may be one other than the substrate P, the substrate stage2, and the measurement stage3.

The liquid immersion space LS may be formed over two objects. For example, the liquid immersion space LS may be formed over the cover member T of the substrate stage2 and the substrate P. The liquid immersion space LS may be formed over the substrate stage2 and the measurement stage3.

The liquid immersion space LS is formed so that the optical path K of the exposure light EL emitted from the emittingsurface12 of the terminaloptical element13 is filled with the liquid LQ. At least a portion of the liquid immersion space LS is formed in a space between the terminaloptical element13 and the substrate P (object). At least a portion of the liquid immersion space LS is formed in a space between theliquid immersion member5 and the substrate P (object).

Theliquid immersion member5 includes thefirst member21 including afirst part211 disposed at at least a portion of the surrounding of the optical path of the exposure light EL, and thesecond member22 in which at least a portion is disposed outside thefirst part211 with respect to the optical path K. Thesecond member22 is movable with respect to thefirst member21 outside thefirst part211 with respect to the optical path of the exposure light EL.

In the present embodiment, thefirst part211 is disposed at at least a portion of the surrounding of the optical path K of the exposure light EL emitted from the emittingsurface12. Moreover, thefirst part211 may be disposed at at least a portion of the surrounding of the optical path K of the exposure light EL emitted from the emittingsurface12, and may be disposed at at least a portion of the surrounding of the optical path KL (the optical path KL of the exposure light EL which passes through the terminal optical element13) of the exposure light EL in the terminaloptical element13. In other words, in the present embodiment, the optical path of the exposure light EL may include the optical path K of the exposure light EL between the emittingsurface12 and the substrate P (object), and may also include the optical path KL of the exposure light EL in the terminaloptical element13. Thefirst part211 may be a portion which is disposed at at least a portion of the surrounding of the optical path K, and may be a portion which is disposed at at least a portion of the surrounding of the optical path K and the optical path KL (optical path K and the terminal optical element13).

Thefirst part211 of thefirst member21 includes a lowermost part of thefirst member21. Thefirst part211 of thefirst member21 includes a portion closest to the surface (upper surface) of the substrate P (object) of thefirst member21. In the present embodiment, thefirst part211 of thefirst member21 is disposed below the emittingsurface12 of the terminaloptical element13. At least a portion of thefirst part211 may be disposed above the emittingsurface12.

Thesecond member22 is a movable member which is able to move. The terminaloptical element13 does not substantially move. Thefirst member21 also does not substantially move. Thefirst member21 does not substantially move with respect to theoptical element13.

Thefirst member21 is disposed so as not to contact the terminaloptical element13. A gap is formed between the terminaloptical element13 and thefirst member21. Thesecond member22 is disposed so as not to contact the terminaloptical element13 and thefirst member21. A gap is formed between thefirst member21 and thesecond member22. Thesecond member22 moves so as not to contact the terminaloptical element13 and thefirst member21.

The substrate P (object) is able to be opposite to at least a portion of the terminaloptical element13 via the gap. The substrate P (object) is able to be opposite to at least a portion of thefirst member21 via the gap. The substrate P (object) is able to be opposite to at least a portion of thesecond member22 via the gap. The substrate P (object) is movable below the terminaloptical element13, thefirst member21, and thesecond member22.

At least a portion of thefirst member21 is opposite to the terminaloptical element13 via the gap. In the present embodiment, thefirst member21 is opposite to theouter surface131, and is not opposite to the emittingsurface12.

At least a portion of thesecond member22 is opposite to thefirst member21 via the gap. Thesecond member22 is not opposite to the terminaloptical element13. Thefirst member21 is disposed between thesecond member22 and the terminaloptical element13.

Thefirst member21 includes thefirst part211 which is disposed at at least a portion of the surrounding of the optical path K, and asecond part212 which is disposed at at least a portion of the surrounding of the terminaloptical element13. Thesecond part212 is disposed above thefirst part211. In the present embodiment, thefirst member21 is an annular member. Thefirst part211 is disposed at the surrounding of the optical path K. Thesecond member212 is disposed at the surrounding of the terminaloptical element13.

Thefirst member21 includes afirst opening part23 through which the exposure light EL emitted from the emittingsurface12 is able to pass, alower surface24 which is disposed at the surrounding of thefirst opening part23 and faces the −Z axis direction, aninner surface25 in which at least a portion is opposite to theouter surface131 of the terminaloptical element13, anouter surface26 which faces the direction opposite to theinner surface25, anupper surface27 which faces the +Z axis direction, alower surface28 which faces the direction opposite to theupper surface27, and anouter surface29 which faces outward in the radial direction with respect to the optical axis AX.

Thelower surface24 is disposed at the surrounding of the lower end of thefirst opening part23. The surface (upper surface) of the substrate P (object) is able to be opposite to thelower surface24. Thelower surface24 does not face thesecond member22. Thefirst opening part23 and thelower surface24 are provided at thefirst part211.

At least a portion of theinner surface25 is opposite to theouter surface131 via a gap. A portion (the lower portion) of theinner surface25 is disposed at the surrounding of the optical path K. A portion (the upper portion) of theinner surface25 is disposed at the surrounding of the terminaloptical element13. Thefirst part211 includes a portion (the lower portion) of theinner surface25, and thesecond part212 includes a portion (the upper portion) of theinner surface25.

At least a portion of theouter surface26 is opposing thesecond member22 via a gap. Thefirst part211 includes a portion (the lower portion) of theouter surface26, and thesecond part212 includes a portion (the upper portion) of theouter surface26.

Thelower surface24 is disposed so that the lower end of theinner surface25 and the lower end of theouter surface26 are connected to each other. An inner edge of thelower surface24 is connected to the lower end of theinner surface25. An outer edge of thelower surface24 is connected to the lower end of theouter surface26.

Theupper surface27 faces the space CS. Theupper surface27 does not face thesecond member22. Theupper surface27 is connected to the upper end of theinner surface25. Theupper surface27 is disposed at the surrounding of the upper end of theinner surface25. Thesecond part212 includes theupper surface27.

At least a portion of thelower surface28 is opposite to thesecond member22 via a gap. Thelower surface28 is connected to the upper end of theouter surface26. Thelower surface28 is disposed at the surrounding of the upper end of theupper surface26. Thesecond part212 includes thelower surface28.

Theouter surface29 faces the space CS. Theouter surface29 does not face thesecond member22. Theouter surface29 is disposed so that the outer edge of theupper surface27 and the outer edge of thelower surface28 are connected to each other. Thesecond member212 includes theouter surface29.

Each of thelower surface24, theinner surface25, theouter surface26, theupper surface27, thelower surface28, and theouter surface29 is a non-recovery part which is not able to recover the liquid LQ. Thelower surface24 is able to hold the liquid LQ between thelower surface24 and the substrate P (object). Theinner surface25 is able to hold the liquid LQ between theinner surface25 and the terminaloptical element13. Theouter surface26 and thelower surface28 are able to hold the liquid LQ between theouter surface26 and thelower surface28, and thesecond member22.

In the descriptions below, a portion of thefirst member21 including thelower surface24, theinner surface25, and theouter surface26 is appropriately referred to as ansurrounding part213, and a portion of thefirst member21 including theupper surface27, thelower surface28, and theouter surface29 is appropriately referred to as anupper plate part214.

At least a portion of thesurrounding part213 is opposite to theouter surface131 of the terminaloptical element13. The enclosingpart213 is disposed at the surrounding of the optical path K and the terminal optical element13 (optical path K). Theupper plate part214 is disposed above thesurrounding part213. Theupper plate part214 is connected to the upper end of thesurrounding part213. Thesurrounding part213 includes thefirst part211. Thesurrounding part213 includes a portion of thesecond part212. Theupper plate part214 includes a portion of thesecond part212. Thesecond member22 is disposed below the upper plate part214 (second part212). In addition, the surroundingpart213 may not include thesecond part212. In addition, theupper plate part214 may include thefirst part211.

Thelower surface24 is disposed below the emittingsurface12. Thelower surface24 is substantially parallel to the plane (XY plane) perpendicular to the optical axis AX (Z axis) of the terminaloptical element13.

Theinner surface25 is disposed above thelower surface24. At least a portion of theinner surface25 is inclined upwardly and outwardly in a radial direction with respect to the optical axis AX. In the present embodiment, theinner surface25 is connected to the inner edge of thelower surface24, and includes aregion251 which is substantially parallel to the optical axis AX (Z axis), and aregion252 which is disposed above theregion251 and is inclined upwardly and outwardly in the radial direction with respect to the optical axis AX. With respect to the Z axis direction, a size of theregion252 is larger than a size of theregion251.

Theouter surface26 is disposed above thelower surface24. At least a portion of theouter surface26 is inclined upwardly and outwardly in the radial direction with respect to the optical axis AX. Theouter surface26 is disposed outside thelower surface24 in the radial direction with respect to the optical axis AX.

Theupper surface27 is disposed above thelower surface24, theinner surface25, theouter surface26, and thelower surface28. Theupper surface27 is substantially parallel to the XY plane.

Thelower surface28 is disposed above thelower surface24 and theouter surface26. Thelower surface28 is disposed outside thelower surface24 and theouter surface26 in the radial direction with respect to the optical axis AX. A step is formed between thelower surface26 and thelower surface28. Thelower surface28 is substantially parallel to the XY plane.

Thesecond member22 is disposed to surround at least a portion of thefirst part211 and thesecond part212. Moreover, thesecond member22 may be disposed to surround at least a portion of thefirst part211, and may not surround thesecond part212. In the present embodiment, thesecond member22 is an annular member.

In the present embodiment, thesecond member22 is disposed outside thesurrounding part213. At least a portion of thesecond member22 is disposed below theupper plate part214. In other words, at least a portion of thesecond member22 is disposed between theupper plate part214 and the substrate P (object). In the present embodiment, thesecond member22 is disposed at a space outside thesurrounding part213 below theupper plate part214. Thesecond member22 moves in the space outside thesurrounding part213 below theupper plate part214.

Thesecond member22 includes asecond opening part30 through which the emitting light EL emitted from the emittingsurface12 is able to pass, alower surface31 which is disposed at the surrounding of thesecond opening part30 and faces the −Z axis direction, aninner surface32 in which at least a portion is opposite to theouter surface26 of thefirst member21, aupper surface33 in which at least a portion faces the +Z axis direction, and anouter surface34 which faces outward in the radial direction with respect to the optical axis AX.

In the XY plane, thesecond opening part30 is larger than thefirst opening part23. At least a portion of the optical path K and thefirst member21 is disposed inside thesecond opening part30. In the present embodiment, thefirst part211 of thefirst member21 is disposed inside thesecond opening part30.

In the descriptions below, an opening part of one end (lower end) of a gap between thefirst member21 and thesecond member22 is appropriately referred to as anopening part301. Theopening part301 is disposed between thefirst part211 and thesecond member22. Theopening part301 is disposed between the outer edge of thelower surface24 and the inner edge of thelower surface31. The one end (opening part301) of the gap between thefirst member21 and thesecond member22 is disposed to be opposite to the surface (upper surface) of the substrate P (object). The liquid LQ on the substrate P (object) is able to flow into the gap between thefirst member21 and thesecond member22 from theopening part301.

Thelower surface31 is disposed at the surrounding of the lower end of the second opening part30 (opening part301). In the present embodiment, thelower surface31 is disposed at the surrounding of thelower surface24. The surface (upper surface) of the substrate P (object) is able to be opposite to thelower surface31. Theopening part301 is disposed between thelower surface24 and thelower surface31.

At least a portion of theinner surface32 is opposite to thefirst member21 via a gap. In the present embodiment, at least a portion of theinner surface32 is opposite to theouter surface26 via a gap. At least a portion of theinner surface32 is disposed at the surrounding of thesurrounding part213. The inner edge of thelower surface31 and the lower end of theinner surface32 are connected to each other.

At least a portion of theupper surface33 is opposite to thefirst member21 via a gap. Theupper surface33 is connected to the upper end of theinner surface32. Theupper surface33 is disposed at the surrounding of the upper end of theinner surface32.

Theouter surface34 faces the space CS. Theouter surface34 does not face thefirst member21. Theouter surface34 is disposed to connect the outer edge of theupper surface33 and the outer edge of thelower surface31.

Each of thelower surface31, theinner surface32, theupper surface33, and theouter surface34 is a non-recovery part which is not able to recover the liquid LQ. Thelower surface31 is able to hold the liquid LQ between thelower surface31 and the substrate P (object). Theinner surface32 and theupper surface33 is able to hold the liquid LQ between theinner surface32 and theupper surface33, and thefirst member21.

Thelower surface31 is disposed below the emittingsurface12. Thelower surface31 is substantially parallel to the plane (XY plane) perpendicular to the optical axis AX (Z axis) of the terminaloptical element13. In the present embodiment, thelower surface24 and thelower surface31 are disposed on substantially a same plane (are flush with each other).

Theinner surface32 is disposed above thelower surface31. At least a portion of theinner surface32 is inclined upwardly and outwardly in the radial direction with respect to the optical axis AX. In the present embodiment, theinner surface32 is connected to the inner edge of thelower surface31, and includes aregion321 which is substantially parallel to the optical axis AX (Z axis), and aregion322 which is disposed above theregion321 and is inclined upwardly and outwardly in the radial direction with respect to the optical axis AX. With respect to the Z axis direction, a size of theregion322 is larger than a size of theregion321.

Theupper surface33 is disposed above thelower surface31 and theouter surface32. Theupper surface33 is disposed outside theinner surface32 in the radial direction with respect to the optical axis AX. In the present embodiment, theupper surface33 includes aregion331 which is connected to the upper end of theinner surface32, and aregion332 which is positioned outside theregion331 in the radial direction with respect to the optical axis AX and is disposed above theregion331. In the present embodiment, a size of theregion332 is smaller than a size of theregion331 in the radial direction with respect to the optical axis AX. Theregion331 is substantially parallel to the XY plane. Theregion332 is substantially parallel to the XY plane. A step is formed between theregion331 and theregion332.

In the present embodiment, thesecond member22 includes a protruding part (wall part)333 at the surrounding of theregion331. Theregion332 includes the upper surface of theprotruding part333.

As shown inFIG. 4, thefirst opening part23 has substantially the circular shape in the XY plane. Thesecond opening part30 also has a substantially circular shape. Theopening part301 has an annular shape (circular annular shape).

As shown inFIG. 4, in the XY plane, an outer shape of thefirst member21 has substantially the circular shape. The outer shape of thesecond member22 is rectangular. Theregion332 has an annular shape (circular annular shape).

In the descriptions below, a space to which the emittingsurface12 faces is appropriately referred to as an optical path space SPK. The optical path space SPK is a space at the emittingsurface12 side. The optical path space SPK is a space between the terminaloptical element13 and the substrate P (object). The optical path space SPK is a space which includes the optical path K between the emittingsurface12 and the upper surface of the substrate P (object).

Moreover, a space to which thelower surface24 faces is appropriately referred to as a first space SP1. The first space SP1 is a space of thelower surface24 side. The first space SP1 is a space between thefirst member21 and the substrate P (object). The first space SP1 is a space between thelower surface24 and the upper surface of the substrate P (object).

In addition, a space to which thelower surface31 faces is appropriately referred to as a second space SP2. The second space SP2 is a space at thelower surface31 side. The second space SP2 is a space between thesecond member22 and the substrate P (object). The second space SP2 is a space between thelower surface31 and the upper surface of the substrate P (object).

Moreover, in the present embodiment, a size in the Z axis direction of the second space SP2, that is, a distance between thelower surface31 and the upper surface of the substrate P (object) in the Z axis direction is 0.1 mm to 0.2 mm.

In addition, a space to which theinner surface25 faces is appropriately referred to as a third space SP3. The third space SP3 is a space at theinner surface25 side. The third space SP3 is a space between thefirst member21 and the terminaloptical element13. The third space SP3 is a space between theinner surface25 and theouter surface131.

In addition, a space to which theinner surface32 and theupper surface33 face is appropriately referred to as a fourth space SP4. The fourth space SP4 is a space to which theinner surface32 and theupper surface33 face. The fourth SP4 is a gap (space) between thefirst member21 and thesecond member22. The fourth space SP4 is a space between theinner surface32 and theupper surface33, and theouter surface26 and thelower surface28.

Moreover, in the fourth space SP4, a space between the surrounding part213 (first part211) and thesecond member22 is appropriately referred to as a space SP4a, and a space SP4 between the upper plate part214 (second part212) and thesecond member22 is appropriately referred to as a space SP4b.

In the present embodiment, the gap (fourth space SP4) between thefirst member21 and thesecond member22 includes a first gap part having a size Ha, and a second gap part which is disposed outside the first gap part with respect to the optical axis AX of the terminaloptical element13 and which has a size Hb smaller than the size Ha.

In the present embodiment, the first gap part includes a gap (space) between theregion331 and thelower surface28. The second gap part includes a gap (space) between theregion332 and thelower surface28. Thelower surface28 of thefirst member21 defining the second gap part and theregion332 of thesecond member22 opposite to thelower surface28 are substantially parallel to the XY plane.

In the present embodiment, at least a portion of one or both of the surface of thefirst member21 and the surface of thesecond member22 facing the gap (fourth space SP4) between thefirst member21 and thesecond member22 may have a liquid repellent property with respect to the liquid LQ. For example, theupper surface33 of thesecond member22 may have the liquid repellent property with respect to the liquid LQ. Thelower surface28 of thefirst member21 may have the liquid repellent property with respect to the liquid LQ. For example, the surface having the liquid repellent property with respect to the liquid LQ includes a surface in which a contact angle with respect to the liquid LQ is 90° or more. Moreover, for example, the surface having the liquid repellent property with respect to the liquid LQ may include a surface in which the contact angle with respect to the liquid LQ is 100° or more, a surface in which the contact angle is 110° or more, or a surface in which the contact angle is 120° or more. The surface having the liquid repellent property with respect to the liquid LQ includes a surface of a film having the liquid repellent property with respect to the liquid LQ. For example, the film may be a resin film which includes fluorine. For example, theupper surface33 may be a surface of the resin film including fluorine. Thelower surface28 may be a surface of the resin film including fluorine. The film having the liquid repellent property with respect to the liquid LQ may be a film including Tetra fluoro ethylene-perfluoro alkylvinyl ether copolymer (PFA). The film having the liquid repellent property with respect to the liquid LQ may be a film including Poly tetra fluoro ethylene (PTFE).

In the present embodiment, a portion of an interface LG of the liquid LQ in the liquid immersion space LS is formed between thesecond member22 and the substrate P (object). A portion of the interface LG of the liquid LQ in the liquid immersion space LS is formed between thefirst member21 and thesecond member22. A portion of the interface LG of the liquid LQ in the liquid immersion space LS is formed between the terminaloptical element13 and thefirst member21.

In the descriptions below, the interface LG which is formed between thesecond member22 and the substrate P (object) is appropriately referred to as a first interface LG1. The interface LG of the liquid LQ which is formed between thefirst member21 and thesecond member22 is appropriately referred to as a second interface LG2. The interface LG which is formed between the terminaloptical element13 and thefirst member21 is appropriately referred to as a third interface LG3.

Theliquid immersion member5 includes a firstliquid supply part41, a secondliquid supply part42, and a thirdliquid supply part43 capable of supplying the liquid LQ, a firstliquid recovery part51, a secondliquid recovery part52, and a thirdliquid recovery part53 capable of recovering the liquid LQ, and a firstgas supply part61 capable of supplying gas.

The firstliquid supply part41 is disposed at thefirst part211 of thefirst member21. The firstliquid supply part41 is disposed at at least a portion of the surrounding of thefirst opening part23. The firstliquid supply part41 is disposed to be opposite to the upper surface of the substrate P (object). The firstliquid supply part41 is disposed to face the first space SP1. The firstliquid supply part41 is disposed at thelower surface24.

In the present embodiment, the firstliquid supply part41 is disposed at thelower surface24, and includes an opening (first liquid supply port)41M capable of supplying the liquid LQ. As shown inFIG. 4, a plurality of firstliquid supply ports41M are disposed at thelower surface24. The plurality of firstliquid supply ports41M are disposed to surround the optical path K. The plurality of firstliquid supply ports41M are disposed with intervals at the surrounding of the optical path K. In the present embodiment, the plurality of firstliquid supply ports41M are disposed along a circular virtual line in the XY plane.

Each of the first liquid supply parts41 (firstliquid supply port41M) is connected to a liquid supply apparatus (not shown) via asupply channel41R which is formed inside thefirst member21. The liquid supply apparatus includes a filter apparatus which cleans the liquid LQ to be supplied, a temperature adjustment apparatus which is able to adjust the temperature of the liquid LQ to be supplied, or the like, and the liquid supply apparatus is able to supply a cleaned liquid LQ in which the temperature is adjusted. The liquid LQ discharged from the liquid supply apparatus is sent to the firstliquid supply part41 via thesupply channel41R. The firstliquid supply part41 supplies the liquid LQ supplied from the liquid supply apparatus via thesupply channel41R to the first space SP1.

The secondliquid supply part42 is disposed at thesecond member22. The secondliquid supply part42 is disposed at at least a portion of the surrounding of thesecond opening part30. The secondliquid supply part42 is disposed to be opposite to the upper surface of the substrate P (object). The secondliquid supply part42 is disposed to face the second space SP2. The secondliquid supply part42 is disposed at thelower surface31.

In the present embodiment, the secondliquid supply part42 is disposed at thelower surface31, and includes an opening (second liquid supply port)42M which is able to supply the liquid LQ. As shown inFIG. 4, a plurality of the secondliquid supply ports42M are disposed at thelower surface31. The plurality of secondliquid supply ports42M are disposed to surround the optical path K. The secondliquid supply ports42M are disposed with intervals at the surrounding of the optical path K. In the present embodiment, the plurality of secondliquid supply parts42M are disposed along a rectangular virtual line in the XY plane.

The second liquid supply part42 (secondliquid supply port42M) is connected to the liquid supply apparatus (not shown) via asupply channel42R which is formed inside thesecond member22. The liquid LQ discharged from the liquid supply apparatus is sent to the secondliquid supply part42 via thesupply channel42R. The secondliquid supply part42 supplies the liquid LQ supplied from the liquid supply apparatus via thesupply channel42R to the second space SP2.

The thirdliquid supply part43 is disposed at thefirst member21. In the present embodiment, the thirdliquid supply part43 is disposed at thefirst part211 of thefirst member21. The thirdliquid supply part43 is disposed at a least a portion of the surrounding of the optical path K. The thirdliquid supply part43 is disposed to face the optical path K. The thirdliquid supply part43 is disposed to face the optical path space SPK. The thirdliquid supply part43 is disposed at theinner surface25.

In the present embodiment, the thirdliquid supply part43 is disposed at theinner surface25, and includes an opening (third liquid supply port)43M which is able to supply the liquid LQ. A plurality of the thirdliquid supply ports43M are disposed at theinner surface25. The thirdliquid supply ports43M may be disposed at each of the +X side and the −X side with respect to the optical path K. The thirdliquid supply ports43M may be disposed at each of the +Y side and the −Y side with respect to the optical path K. The thirdliquid supply ports43M may be disposed at each of the +X side, the −X side, the +Y side, and the −Y side with respect to the optical path K. A plurality of the thirdliquid supply ports43M may be provided to surround the optical path K.

The third liquid supply part43 (thirdliquid supply port43M) is connected to the liquid supply apparatus (not shown) via asupply channel43R which is formed inside thefirst member21. The liquid LQ discharged from the liquid supply apparatus is sent to the thirdliquid supply part43 via thesupply channel43R. The thirdliquid supply part43 supplies the liquid LQ supplied from the liquid supply apparatus via thesupply channel43R to the optical path space SPK.

Moreover, the third liquid supply part43 (thirdliquid supply part43M) may be disposed at thefirst member21 to face the third space SP3. That is, the thirdliquid supply port43M may be disposed at theinner surface25 of thefirst member21 to be opposite to theouter surface131. The thirdliquid supply part43 may supply the liquid LQ to the gap (third space SP3) between thefirst member21 and the terminaloptical element13. When thefirst part211 is a portion of thefirst member21 which is disposed at the surrounding of the optical path K and the optical path KL (terminal optical element13), the thirdliquid supply part43 may be disposed at thefirst part211 to be opposite to theouter surface131 of the terminaloptical element13.

The firstliquid recovery part51 is disposed at thesecond member22. The firstliquid recovery part51 is disposed at at least a portion of the surrounding of thesecond opening part30. The firstliquid recovery part51 is disposed to be opposite to the upper surface of the substrate P (object). The firstliquid recovery part51 is disposed to face the second space SP2. The firstliquid recovery part51 is disposed at thelower surface31.

In the present embodiment, the firstliquid recovery part51 is disposed at thelower surface31, and includes an opening (first liquid recover port)51M which is able to recover the liquid LQ. As shown inFIG. 4, a plurality of the firstliquid recovery ports51M are disposed at thelower surface31. The plurality of firstliquid recovery ports51M are disposed to surround the optical path K. The plurality of firstliquid recovery ports51M are disposed with intervals in the surrounding of the optical path K. In the present embodiment, the plurality of firstliquid recovery ports51M are disposed along a rectangular virtual line in the XY plane.

The first liquid recovery part51 (first liquid recoverport51M) is connected to a liquid recovery apparatus (not shown) via arecovery channel51R which is formed inside of thesecond member22. The liquid recovery apparatus is able to be connected to the firstliquid recovery part51 and a vacuum system (suction apparatus). The liquid recovery apparatus may include a tank which accommodates the recovered liquid LQ. The firstliquid recovery part51 is able to recover at least a portion of the liquid LQ of the second space SP2. The liquid LQ recovered from the firstliquid recovery part51 is recovered to the liquid recovery apparatus via therecovery channel51R.

In the present embodiment, the first liquid recovery part51 (firstliquid recovery port51M) recovers (suctions) both of the liquid LQ and the gas G of the second space SP1. The firstliquid recovery part51 is able to recover the liquid LQ and the gas G together. In other words, the firstliquid recovery part51 performs a gas-liquid mixture recovery. Moreover, when the liquid LQ does not exist below the first liquid recovery part51 (firstliquid recovery port51M), the first liquid recovery part51 (firstliquid recovery port51M) may only recover the gas from the first liquid recovery part51 (firstliquid recovery port51M).

The secondliquid recovery part52 is disposed at thefirst member21. The secondliquid recovery part52 is able to recover at least a portion of the liquid LQ which is flowed from the substrate P (object) into the gap (fourth space SP4) between thefirst member21 and thesecond member22. The secondliquid recovery part52 is able to recover at least a portion of the liquid LQ which is flowed to the fourth space SP4 between thefirst member21 and thesecond member22 via theopening part301. The secondliquid recovery part52 is disposed to face the fourth space SP4. The secondliquid recovery part52 is disposed above theopening part301 inside the fourth space SP4. In the present embodiment, the secondliquid recovery part52 is disposed at thesecond part212 of thefirst member21. In the present embodiment, the secondliquid recovery part52 is disposed at the upper plate part214 (second part212) to face the space SP4bbetween the upper plate part214 (second part212) and thesecond member22. In the present embodiment, the secondliquid recovery part52 is disposed at thelower surface28. The secondliquid recovery part52 recovers the liquid LQ from the first gap part having the size Ha in the space SP4b.

The second liquid recovery part52 (secondliquid recovery port52M) is connected to the liquid recovery apparatus (not shown) via therecovery channel52R which is formed inside thefirst member21. The secondliquid recovery part52 is able to recover at least a portion of the liquid LQ of the fourth space SP4. The liquid LQ recovered from the secondliquid recovery part52 is recovered to the liquid recovery apparatus via therecovery channel52R.

In the present embodiment, the secondliquid recovery part52 includes aporous member57. Theporous member57 includes a mesh plate. Theporous member57 includes a lower surface which is able to be opposite to theupper surface33, an upper surface which faces therecovery channel52R, and a plurality of holes which connect the lower surface and the upper surface. Thelower surface28 is disposed at the surrounding of the lower surface of theporous member57. The secondliquid recovery part52 recovers the liquid LQ via the holes of theporous member57. In the present embodiment, the holes of theporous member57 function as the openings (second liquid recover port)52M which are able to recover the liquid LQ. The liquid LQ in the fourth space SP4 recovered from the second liquid recovery part52 (secondliquid recovery port52M) flows into therecovery channel52R, flows through therecovery channel52R, and is recovered by the liquid recovery apparatus.

In the present embodiment, only the liquid LQ is substantially recovered via the secondliquid recovery part52, and the recovery of the gas G is limited. The controller6 adjusts a difference between a pressure (pressure in fourth space SP4) at the lower surface side of theporous member57 and a pressure (pressure inrecovery channel52R) at the upper surface side so that the liquid LQ in the fourth space SP4 passes through the holes of theporous member57 and flows into therecovery channel52R, and the gas G does not pass through the holes. Moreover, for example, an example of the technology, which only recovers the liquid via the porous member, is disclosed in U.S. Pat. No. 7,292,313 and the like.

In addition, the secondliquid recovery part52 may recover (suction) both of the liquid LQ and the gas G via theporous member57. That is, the secondliquid recovery part52 may recover the liquid LQ along with the gas. Moreover, when the liquid LQ does not exist below the secondliquid recovery part52, only the gas may be recovered from the secondliquid recovery part52. In addition, the secondliquid recovery part52 may not include theporous member57. That is, a fluid (one or both of the liquid LQ and the gas G) in the fourth space SP4 may be recovered without going through the porous member.

The thirdliquid recovery part53 is disposed at thefirst member21. The thirdliquid recovery part53 recovers the liquid LQ from the gap (third space SP3) between the terminaloptical element13 and thefirst member21. The thirdliquid recovery part53 is able to recover at least a portion of the liquid LQ which flows in the third space SP3 between the terminaloptical element13 and thefirst member21. The thirdliquid recovery part53 is disposed to face the third space SP3. The thirdliquid recovery part53 is disposed above thefirst opening part23. The thirdliquid recovery part53 is disposed above the thirdliquid supply part43. The thirdliquid recovery part53 is disposed above the emittingsurface12. The thirdliquid recovery part53 is disposed to be opposite to theouter surface131 of the terminaloptical element13. The thirdliquid recovery part53 is disposed at thefirst part211. Thefirst part211 may be a portion of thefirst member21 which is disposed at the surrounding of the optical path K, and may include a portion of thefirst member21 which is disposed at the surrounding of the optical path KL (terminal optical element13). In the present embodiment, the thirdliquid recovery part53 is disposed at theinner surface25.

The third liquid recovery part53 (thirdliquid recovery port53M) is connected to the liquid recovery apparatus (not shown) via arecovery channel53R which is formed inside thefirst member21. The thirdliquid recovery part53 is able to recover at least a portion of the liquid LQ of the third space SP3. The liquid LQ recovered from the thirdliquid recovery part53 is recovered to the liquid recovery apparatus via therecovery channel53R.

In the present embodiment, the thirdliquid recovery part53 includes aporous member58. Theporous member58 includes a mesh plate. Theporous member58 includes one surface which is able to be opposite to theouter surface131, the other surface which faces therecovery channel53R, and a plurality of holes which connect the one surface and the other surface. In the present embodiment, theinner surface25 is disposed at the surrounding of the one surface of theporous member58. The thirdliquid recovery part53 recovers the liquid LQ via the holes of theporous member58. In the present embodiment, the holes of theporous member58 function as openings (third liquid recovery port)53M which are able to recover the liquid LQ. The liquid LQ in the third space SP3 recovered from the third liquid recovery part53 (thirdliquid recovery port53M) flows into therecovery channel53R, flows through therecovery channel53R, and is recovered by the liquid recovery apparatus.

In the present embodiment, only the liquid LQ is substantially recovered via the thirdliquid recovery part53, and the recovery of the gas G is limited. The controller6 adjusts a difference between a pressure (pressure in third space SP3) at the one surface side of theporous member58 and a pressure (pressure inrecovery channel53R) at the other surface side so that the liquid LQ in the third space SP3 passes through the holes of theporous member58 and flows into therecovery channel53R, and the gas G does not pass through the holes. Moreover, for example, an example of the technology, which only recovers the liquid via the porous member, is disclosed in U.S. Pat. No. 7,292,313 or like.

Moreover, the thirdliquid recovery part53 may recover (suction) both of the liquid LQ and the gas G via theporous member58. That is, the thirdliquid recovery part53 may recover the liquid LQ along with the gas. In addition, when the liquid LQ does not exist between the thirdliquid recovery part53 and the terminaloptical element13, only the gas may be recovered from the thirdliquid recovery part53. Moreover, the thirdliquid recovery part53 may not include theporous member58. That is, a fluid (one or both of the liquid LQ and the gas G) in the third space SP3 may be recovered without going through the porous member.

The firstgas supply part61 is disposed at thesecond member22. The firstgas supply part61 is disposed at at least a portion of the surrounding of thesecond opening part30. The firstgas supply part61 is disposed to be opposite to the upper surface of the substrate P (object). The firstgas supply part61 is disposed to face the second space SP2. The firstgas supply part61 is disposed at thelower surface31.

In the present embodiment, the firstgas supply part61 includes an opening (first gas supply port)61M which is disposed at thelower surface31 and is able to supply the gas G. As shown inFIG. 4, a plurality of the firstgas supply ports61M are disposed at thelower surface31. The plurality of firstgas supply ports61M are disposed to surround the optical path K. The plurality of firstgas supply ports61M are disposed with intervals at the surrounding of the optical path K. In the present embodiment, the plurality of firstgas supply ports61M are disposed along a rectangular virtual line in the XY plane.

The first liquid supply part61 (firstliquid supply port61M) is connected to a gas supply apparatus (not shown) via asupply channel61R which is formed inside thesecond member22. The gas supply apparatus includes a filter apparatus which cleans the gas G to be supplied, a temperature adjustment apparatus which is able to adjust the temperature of the gas G to be supplied, or the like, and the liquid supply apparatus is able to supply the cleaned gas G in which the temperature is adjusted. Moreover, in the present embodiment, the gas supply apparatus includes a humidity adjustment apparatus which is able to adjust humidity of the gas G to be supplied, and thus, is able to supply the humidified gas G, for example. The humidity adjustment apparatus is able to increase the humidity of the gas G by using the liquid LQ (liquid LQ for exposure) forming the liquid immersion space LS. The gas G discharged from the gas supply apparatus is sent to the firstgas supply part61 via thesupply channel61R. The firstgas supply part61 supplies the gas G, which is supplied from the gas supply apparatus via thesupply channel61R, to the second space SP2.

In the present embodiment, the firstgas supply part61 is disposed outside the firstliquid recovery part51 in the radial direction with respect to the optical path K (optical axis AX).

The secondliquid supply part42 is disposed between the optical path K and the firstliquid recovery part51 in the radial direction with respect to the optical path K (optical axis AX). The secondliquid supply part42 is disposed between a center of thesecond opening part30 and the firstliquid recovery part51 in the radial direction with respect to the center of thesecond opening part30.

The firstliquid supply part41 is disposed between the optical path K and the secondliquid supply part42 in the radial direction with respect to the optical path K (optical axis AX). The firstliquid supply part41 is disposed between a center of thefirst opening part23 and theopening part301 in the radial direction with respect to the center of thefirst opening part23.

The thirdliquid supply part43 is disposed to be closer to the optical path K side than the secondliquid supply part42. The thirdliquid supply part43 is disposed above the first and secondliquid supply parts41 and42. The thirdliquid supply part43 is disposed below the thirdliquid recovery part53. The thirdliquid supply part43 is disposed to be closer to the optical path K side than the thirdliquid recovery part53.

The secondliquid recovery part52 is disposed above the first and secondliquid supply parts41 and42. The secondliquid recovery part52 is disposed above theopening part301. The secondliquid recovery part52 is disposed outside theopening part301 in the radial direction with respect to the optical path K (optical axis AX).

The third space SP3 communicates with the space CS outside theliquid immersion member5 via theopening part35 different from thefirst opening part23. The openingpart35 is disposed at the upper end of the gap between the terminaloptical element13 and thefirst member21. The third space SP3 is opened to the space CS (atmosphere at the surrounding of the liquid immersion member5) via theopening part35. When the space CS is the atmospheric pressure, the third space SP3 is opened to the atmosphere via theopening part35. In addition, the pressure of the space CS may be higher or lower than the atmosphere pressure.

The openingpart35 is disposed at a higher position than thefirst opening part23. The openingpart35 is disposed between theouter surface131 and the upper surface27 (inner edge of upper surface27). The openingpart35 does not contact the liquid LQ on the substrate P (object).

The fourth space SP4 communicates with the space CS outside theliquid immersion member5 via theopening part302 different from theopening part301. Theopening part302 is disposed at the other end of the gap (fourth space SP4) between thefirst member21 and thesecond member22. The fourth space SP4 is opened to the space CS (atmosphere at the surrounding of the liquid immersion member5) via theopening part302. When the space CS is the atmospheric pressure, the fourth space SP4 is opened to the atmosphere via theopening part302. In addition, the pressure of the space CS may be higher or lower than the atmosphere pressure.

The other end (opening part302) of the gap between thefirst member21 and thesecond member22 is positioned at a higher position than the one end (opening part301) of the gap between thefirst member21 and thesecond member22. Theopening part302 is disposed between the lower surface28 (the outer edge of the lower surface28) and the upper surface33 (the outer edge of the upper surface33). In other words, theopening part302 is disposed between theouter surface29 and theouter surface34. Theopening part302 is disposed not to be opposite to the surface of the substrate P (object). Theopening part302 does not contact the liquid LQ on the substrate P (object).

The second space SP2 communicates with the space CS outside theliquid immersion member5 via theopening part36. The openingpart36 is disposed at the other end of the gap between thesecond member22 and the substrate P (object). The openingpart36 is disposed between the lower surface31 (the outer edge of the lower surface31) and the upper surface of the substrate P (object). The second space SP2 is opened to the space CS (atmosphere at the surrounding of the liquid immersion member5) via theopening part36. When the space CS is the atmospheric pressure, the second space SP2 is opened to the atmosphere via theopening part36. In addition, the pressure of the space CS may be higher or lower than the atmosphere pressure.

The second space SP2 and the fourth space SP4 are connected to each other via theopening part301. The first space SP1 and the fourth space SP4 are connected to each other via theopening part301. The first space SP1 and the optical path space SPK are connected to each other via thefirst opening part23. The optical path space SPK and the third space SP3 are connected to each other via theopening part37 between the emittingsurface12 and theinner surface25.

That is, the fluid (one or both of the liquid LQ and the gas G) is able to circulate (move) between the optical path space SPK and the third space SP3, is able to circulate (move) between the optical path space SPK and the first space SP1, is able to circulate (move) between the first space SP1 and the third space SP3, is able to circulate (move) between the second space SP1 and the third space SP3, and is able to circulate (move) between the first space SP1 and the second space SP2.

In addition, the pressure of the fourth space SP4 to which the second liquid recovery part52 (porous member57) faces is able to be adjusted by thechamber apparatus9. The pressure of the recovery channel57R is able to be adjusted by the liquid recovery apparatus which is connected to the recovery channel57R.

Moreover, the pressure of the third space SP3 to which the third liquid recovery part53 (porous member58) faces is able to be adjusted by thechamber apparatus9. The pressure of the recovery channel58R is able to be adjusted by the liquid recovery apparatus which is connected to the recovery channel58R.

In the present embodiment, a recovery operation of the liquid LQ from the firstliquid recovery part51 is performed in parallel with at least one of the liquid LQ supply operation from the firstliquid supply part41, the secondliquid supply part42, and the thirdliquid supply part43, and thus, the liquid immersion space LS is formed by the liquid LQ between the terminaloptical element13 and theliquid immersion member5 on a one side, and between the terminaloptical element13 and the substrate P (object) on the another side.

When the supply operation of the liquid LQ in the firstliquid supply part41 is performed, the firstliquid recovery part51 is able to recover at least a portion of the liquid LQ from the firstliquid recovery part41. When the supply operation of the liquid LQ in the secondliquid supply part42 is performed, the firstliquid recovery part51 is able to recover at least a portion of the liquid LQ from the secondliquid recovery part42. When the supply operation of the liquid LQ in the thirdliquid supply part43 is performed, the firstliquid recovery part51 is able to recover at least a portion of the liquid LQ from the thirdliquid recovery part43.

By performing the recovery operation of the liquid LQ from the firstliquid recovery part51, the interface LG (first interface LG1) of the liquid LQ in the liquid immersion space LS is maintained more inside than the firstliquid recovery part51 in the radial direction with respect to the optical axis AX (optical path K). The first interface LG1 is at least maintained more inside than the end part outside the first liquid recovery part51 (firstliquid recovery port51M).

For example, the recovery operation of the liquid LQ from the firstliquid recovery part51 is performed in parallel with the supply operation of the liquid LQ from the secondliquid supply part42, and thus, the interface LG (first interface LG1) of the liquid LQ in the liquid immersion space LS is maintained between the secondliquid supply part42 and the firstliquid recovery part51 in the radial direction with respect to the optical axis AX (optical path K). The first interface LG1 is maintained at least between the secondliquid supply part42 and the end part outside the first liquid recovery part51 (firstliquid recovery port51M). The recovery operation of the liquid LQ from the firstliquid recovery part51 is performed in parallel with the supply operation of the liquid LQ from the secondliquid supply part42, and thus, even when thesecond member22 moves in the XY plane in the state where the liquid immersion space LS is formed, the first interface LG1 is maintained between the secondliquid supply part42 and the firstliquid recovery part51.

Moreover, in the present embodiment, a recovery operation of the liquid LQ from the secondliquid recovery part52 is performed in parallel with at least one of the supply operation of the liquid LQ from the firstliquid supply part41, the secondliquid supply part42, and the thirdliquid supply part43, and the recovery operation of the liquid LQ from the firstliquid recovery part51. Accordingly, the liquid LQ flowing into the fourth space SP4 via theopening part301 is suppressed from flowing out from the fourth space SP4.

In addition, in the present embodiment, a recovery operation of the liquid LQ from the thirdliquid recovery part53 is performed in parallel with at least one of the supply operation of the liquid LQ from the firstliquid supply part41, the secondliquid supply part42, and the thirdliquid supply part43, and the recovery operation of the liquid LQ from the firstliquid recovery part51. Accordingly, the liquid LQ flowing into the third space SP3 is suppressed from flowing out from the third space SP3.

In addition, in the present embodiment, a supply operation of the gas G from the firstgas supply part61 is performed in parallel with at least one of the supply operation of the liquid LQ from the firstliquid supply part41, the secondliquid supply part42, and the thirdliquid supply part43, and the recovery operation of the liquid LQ from the firstliquid recovery part51. The firstgas supply part61 is able to supply the gas G at the outside of the liquid immersion space LS. By the gas G supplied from the firstgas supply part61, a gas seal is formed outside the liquid immersion space LS. Accordingly, the liquid LQ in the second space SP2 is suppressed from flowing out from the second space SP2.

In the present embodiment, the humidified gas G may be supplied from the firstgas supply part61. The humidity of the gas G supplied from the firstgas supply part61 is higher than the humidity of the gas Gs supplied from the air conditioner9S of thechamber apparatus9. Occurrence of vaporization heat is suppressed by the supply of the humidified gas G. Accordingly, occurrence of a temperature change of the substrate P (object), a temperature change of theliquid immersion member5, a temperature change of the liquid LQ in the liquid immersion space LS, a temperature change in the space (environment) in which theliquid immersion member5 is disposed, or the like, which occurs due to the vaporization heat, is suppressed.

Next, an example of an operation of thesecond member22 will be described.

Thesecond member22 is movable with respect to thefirst member21. Thesecond member22 is movable with respect to the terminaloptical element13. A relative position between thesecond member22 and thefirst member21 is changed. The relative position between thesecond member22 and the terminaloptical element13 is changed.

Thesecond member22 is able to relatively move in the XY plane perpendicular to the optical axis AX of the terminaloptical element13. Thesecond member22 is able to move to be substantially parallel to the XY plane. In the present embodiment, thesecond member22 is able to move in at least the X axis direction.

Moreover, thesecond member22 may be able to move in six directions of the X axis, the Y axis, the Z axis, the θX, the θy, and the θZ directions, and may be able to move in at least one direction of the six directions. Moreover, thesecond member22 may be able to move in at least one direction of the Y axis, the Z axis, the θX, the θy, and the θZ directions, in addition to the X axis direction.

For example, thesecond member22 moves in the XY plane, and thus, the size of the gap between theouter surface26 of thefirst member21 and theinner surface32 of thesecond member22 is changed. In other words, thesecond member22 moves in the XY plane, and thus, the size of the space between theouter surface26 and theinner surface32 is changed. For example, thesecond member22 moves in the −X axis direction, and thus, the size of the gap between theouter surface26 and theinner surface32 in the +X side with respect to the terminaloptical element13 is decreased (the space between theouter surface26 and theinner surface32 is decreased). Thesecond member22 moves in the +X axis direction, and thus, the size of the gap between theouter surface26 and theinner surface32 in the +X side with respect to the terminaloptical element13 is increased (the space between theouter surface26 and theinner surface32 is increased).

In the present embodiment, a movable range of thesecond member22 is determined so that the first member21 (outer surface26) and the second member22 (inner surface32) do not contact each other.

Thesecond member22 is movable in cooperation with the movement of the substrate P (object). Thesecond member22 is movable to be independent of the substrate P (object). Thesecond member22 is movable in parallel with at least a portion of the movement of the substrate P (object).

Thesecond member22 may move in parallel with at least a part of a period in which the substrate P (object) moves. Thesecond member22 may move in a movement direction of the substrate P (object). For example, in at least a part of the period in which the substrate P moved, thesecond member22 may move in the movement direction of the substrate P. For example, when the substrate P is moved in one direction (for example, +X axis direction) in the XY plane, thesecond member22 may move in one direction (the +X axis direction) in the XY plane in synchronization with the movement of the substrate P.

Thesecond member22 may move in a state where the liquid immersion space LS is formed. Thesecond member22 may move in a state where the liquid LQ of the liquid immersion space LS contacts thesecond member22. Thesecond member22 may move in a state where the liquid LQ exists in one or both of the second space SP2 and the fourth space SP4.

Thesecond member22 may move in parallel with the supply operation of the liquid LQ from at least one of the firstliquid supply part41, the secondliquid supply part42, and the thirdliquid supply part43.

Thesecond member22 may move in parallel with the recovery operation of the liquid LQ from at least one of the firstliquid recovery part51, the secondliquid recovery part52, and the thirdliquid recovery part53.

Thesecond member22 may move in parallel with the supply operation of the gas G from the firstgas supply part61.

Thesecond member22 may move in at least a part of a period in which the exposure light EL is emitted from the emittingsurface12.

Thesecond member22 may move in parallel with at least a part of a period in which the substrate P (object) moves in the state where the liquid immersion space LS is formed.

Thesecond member22 may move in at least a part of a period in which the exposure light EL is emitted from the emittingsurface12 in the state where the liquid immersion space LS is formed.

Thesecond member22 may move when thesecond member22 and the substrate P (object) are not opposite to each other. Thesecond member22 may move when the object does not exist below thesecond member22.

Thesecond member22 may move when the liquid LQ does not exist in the space between thesecond member22 and the substrate P (object). Thesecond member22 may move when the liquid immersion space LS is not formed.

In the present embodiment, for example, thesecond member22 moves based on movement conditions of the substrate P (object). For example, the controller6 moves thesecond member22 in parallel with at least a portion of the movement of the substrate P (object) based on the movement conditions of the substrate P (object). The controller6 moves thesecond member22 while performing the supply of the liquid LQ from at least one of the first, the second, and the thirdliquid supply parts41,42, and43 and the recovery of the liquid LQ from the firstliquid recovery part51 so that the liquid immersion space LS is continuously formed.

In the present embodiment, thesecond member22 is movable so that a relative movement between thesecond member22 and the substrate P (object) is decreased. Thesecond member22 is movable so that the relative movement between thesecond member22 and the substrate P (object) is smaller than the relative movement between the terminaloptical element13 and the substrate P (object). Thesecond member22 is movable so that the relative movement between thesecond member22 and the substrate P (object) is smaller than the relative movement between thefirst member21 and the substrate P (object). For example, thesecond member22 may move in synchronization with the substrate P (object). For example, thesecond member22 may move to follow the substrate P (object).

The relative movement includes at least one of a relative speed and a relative acceleration. For example, in the state where the liquid immersion space LS is formed, that is, in a state where the liquid LQ exists in the second space SP2, thesecond member22 may move so that the relative speed between thesecond member22 and the substrate P (object) is decreased.

Moreover, in the state where the liquid immersion space LS is formed, that is, in the state where the liquid LQ exists in the second space SP2, thesecond member22 may move so that the relative acceleration between thesecond member22 and the substrate P (object) is decreased.

In addition, in the state where the liquid immersion space LS is formed, that is, in the state where the liquid LQ exists in the second space SP2, thesecond member22 may move so that the relative speed between thesecond member22 and the substrate P (object) is smaller than the relative speed between thefirst member21 and the substrate P (object).

Moreover, in the state where the liquid immersion space LS is formed, that is, in the state where the liquid LQ exists in the second space SP2, thesecond member22 may move so that the relative acceleration between thesecond member22 and the substrate P (object) is smaller than the relative acceleration between thefirst member21 and the substrate P (object).

For example, thesecond member22 is movable in the movement direction of the substrate P (object). For example, when the substrate P (object) moves in the +X axis direction (or the −X axis direction), thesecond member22 is movable in the +X axis direction (or the −X axis direction). Moreover, when the substrate P (object) moves in the +Y axis direction (or the −Y axis direction) while moving in the +X axis direction, thesecond member22 is movable in the +X axis direction. In addition, when the substrate P (object) moves in the +Y axis direction (or the −Y axis direction) while moving in the −X axis direction, thesecond member22 is movable in the −X axis direction.

That is, in the present embodiment, when the substrate P (object) moves in the direction which includes the component of the X axis direction, thesecond member22 moves in the X axis direction. For example, thesecond member22 may move in the X axis direction in parallel with at least a portion of the movement of the substrate P (object) in the direction including the component in the X axis direction.

Moreover, thesecond member22 is movable in the Y axis direction. When the substrate P (object) moves in the direction including the component in the Y axis direction, thesecond member22 may move in the Y axis direction. For example, thesecond member22 may move in the Y axis direction so that the relative speed between thesecond member22 and the substrate P (object) is decreased in parallel with at least a portion of the movement of the substrate P (object) in the direction including the component in the Y axis direction.

Next, a method of exposing the substrate P using the above-described exposure apparatus EX will be described.

In the descriptions below, in order to form the liquid immersion space LS, the liquid LQ is supplied from each of the firstliquid supply part41, the secondliquid supply part42, and the thirdliquid supply part43, and the liquid LQ is recovered from each of the firstliquid recovery part51, the secondliquid recovery part52, and the thirdliquid recovery part53.

Moreover, in the descriptions below, the first, the second, the thirdliquid supply parts41,42, and43 are collectively referred to as a liquid supply part40 appropriately. The first, the second, the thirdliquid recovery parts51,52, and53 are collectively referred to as a liquid recovery part50 appropriately.

In addition, for example, in order to form the liquid immersion space LS, the liquid LQ may be supplied from the thirdliquid supply part43, and the liquid LQ may not be supplied from the first and secondliquid supply parts41 and42. The liquid LQ may be supplied from the second and thirdliquid supply parts42 and43, and the liquid LQ may not be provided from the firstliquid supply part41. The liquid LQ may be supplied from the secondliquid supply part42, and the liquid LQ may not be provided from the first and thirdliquid supply parts41 and43. The liquid LQ may be supplied from the first and secondliquid supply parts41 and42, and the liquid LQ may not be provided from the thirdliquid supply part43. The liquid LQ may be supplied from the firstliquid supply part41, and the liquid LQ may not be provided from the second and thirdliquid supply parts42 and43.

In addition, for example, the liquid LQ may be recovered from the firstliquid recovery part51, and the liquid LQ may not be recovered from the second and thirdliquid recovery parts51 and52. The liquid LQ may be recovered from the first and secondliquid recovery parts51 and52, and the liquid LQ may not be recovered from the thirdliquid recovery part53. The liquid LQ may be recovered from the first and thirdliquid recovery parts51 and53, and the liquid LQ may not be recovered from the secondliquid recovery part52.

In a substrate exchange position away from theliquid immersion member5, processing which carries (loads) the substrate P before the exposure to the substrate stage2 (first holding part) is performed. In at least a part of a period in which the substrate stage2 is away from theliquid immersion member5, the measurement stage3 is disposed to be opposite to the terminaloptical element13 and theliquid immersion member5. The controller6 performs the supply of the liquid LQ from the liquid supply part40 and the recovery of the liquid LQ from the liquid recovery part50, and thus, forms the liquid immersion space LS on the measurement stage3.

After the substrate P before the exposure is loaded on the substrate stage2 and the measurement processing using the measurement stage3 is terminated, the controller6 moves the substrate stage2 so that the terminaloptical element13 and theliquid immersion member5 are opposite to the substrate stage2 (substrate P). In the state where the terminaloptical element13 and theliquid immersion member5 are opposite to the substrate stage2 (substrate P), the recovery of the liquid LQ from the liquid recovery part50 is performed in parallel with the supply of the liquid LQ from the liquid supply part40, and thus, the liquid immersion space LS is formed between the terminaloptical element13 and theliquid immersion member5, and the substrate stage2 (substrate P) so that the optical path K is filled with the liquid LQ.

The controller6 starts the exposure processing of the substrate P. In the state where the liquid immersion space LS is formed on the substrate P, the controller6 emits the exposure light EL from the illumination system IL. The illumination system IL illuminates the mask M with the exposure light EL. The exposure light EL from the mask M is radiated to the substrate P via the liquid LQ in the liquid immersion space LS between the projection optical system PL and the emittingsurface12, and the substrate P. Accordingly, the substrate P is exposed by the exposure light EL which is emitted from the emittingsurface12 via the liquid LQ in the liquid immersion space LS between the emittingsurface12 of the terminaloptical element13 and the substrate P, and the image of the pattern of the mask M is projected to the substrate P.

The exposure apparatus EX of the present embodiment is a scanning type exposure apparatus (a so-called scanning stepper) in which the mask M and the substrate P synchronously move in a predetermined scanning direction and the image of the pattern of the mask M is projected to the substrate P. In the present embodiment, the scanning direction of the substrate P (synchronous movement direction) is set to the Y axis direction, and the scanning direction (synchronous movement direction) of the mask M is also set to the Y axis direction. The controller6 radiates the exposure light EL to the substrate P via the projection optical system PL and the liquid LQ in the liquid immersion space LS on the substrate P while moving the substrate P in the Y axis direction with respect to the projection region PR of the projection optical system PL and moving the mask M in the Y axis direction with respect to the illumination region IR of the illumination system IL in synchronization with the movement in the Y axis direction of the substrate P.

FIG. 6 is a view showing an example of the substrate P which is held by the substrate stage2. In the present embodiment, a plurality of shot regions S, which are regions to be exposed on the substrate P, are arranged in a matrix form. The controller6 sequentially exposes the plurality of shot regions S of the substrate P by the exposure light EL emitted from the emittingsurface12 via the liquid LQ in the liquid immersion space LS between the emittingsurface12 and the substrate P while moving the substrate P held in the first holding part in the Y axis direction (scanning direction) with respect to the exposure light EL emitted from the emittingsurface12 of the terminaloptical element13.

For example, in order to expose one shot region S of the substrate P, in the state where the liquid immersion space LS is formed, the controller6 radiates the exposure light EL to the shot region S via the projection optical system PL and the liquid LQ in the liquid immersion space LS on the substrate P while moving the substrate P in the Y axis direction with respect to the exposure light EL emitted from the emitting surface12 (the projection region PR of the projection optical system PL), and moving the mask M in the Y axis direction with respect to the illumination region IR of the illumination system IL in synchronization with the movement in the Y axis direction of the substrate P. Accordingly, the image of the pattern of the mask M is projected to the shot region S, and the shot region S is exposed by the exposure light EL which is emitted from the emittingsurface12.

After the exposure of the shot region S is terminated, in order to start the exposure of a next shot region S, in the state where the liquid immersion space LS is formed, the controller6 moves the substrate P in the direction (for example, X axis direction, directions which are inclined with respect to the X axis direction and Y axis direction in the XY plane, or the like) which intersects the Y axis in the XY plane, and moves the next shot region S to an exposure starting position. Thereafter, the controller6 starts the exposure of the shot region S.

The controller6 repeats the operation which exposes the shot region while moving the shot region in the Y axis direction with respect to the position (projection region PR) radiated with the exposure light EL from the emittingsurface12 in the state where the liquid immersion space LS is formed above the substrate P (substrate stage2), and after the exposure of the shot region, the operation which moves the substrate P in the direction (for example, X axis direction, directions which are inclined with respect to the X axis direction and Y axis direction in the XY plane, or the like) which intersects the Y axis direction in the XY plane so that the next shot region is disposed at the exposure starting position in the state where the liquid immersion space LS is formed on the substrate P (substrate stage2), and the controller sequentially exposes the plurality of shot regions of the substrate P.

In the descriptions below, the operation, which moves the substrate P (shot region) in the Y axis direction with respect to the position (projection region PR) radiated with the exposure light EL from the emittingsurface12 in the state where the liquid immersion space LS is formed above the substrate P (substrate stage2) in order to expose the shot region, is appropriately referred to as a scan movement operation. Moreover, the operation, which moves the substrate P in the XY plane before the exposure of the next shot region starts in the state where the liquid immersion space LS is formed on the substrate P (substrate stage2) after the exposure of a predetermined shot region is terminated, is appropriately referred to as a step movement operation.

In the present embodiment, the scan movement operation includes an operation in which the substrate P moves in the Y axis direction from a state where a predetermined shot region S is disposed at the exposure starting position to a state where the predetermined shot region is disposed at the exposure termination position. The step movement operation includes an operation in which the substrate P moves in a direction intersecting the Y axis direction in the XY plane from a state where a predetermined shot region S is disposed at the exposure termination position to a state where the next shot region S is disposed at the exposure starting position.

The exposure starting position includes a position of the substrate P when one end in the Y axis direction of a predetermined shot region S passes through the projection region PR in order to expose the shot region S. The exposure termination position includes a position of the substrate P when the other end in the Y axis direction of the shot region S radiated by the exposure light EL passes through the projection region PR.

The exposure starting position of the shot region S includes a starting position of the scan movement operation in order to expose the shot region S. The exposure starting position of the shot region S includes a termination position of the step movement operation in order to dispose the shot region S at the exposure starting position.

The exposure termination position of the shot region S includes a termination position of the scan movement operation in order to expose the shot region S. The exposure termination position of the shot region S includes a starting position of the step movement operation in order to dispose the next shot region S at the exposure starting position after the exposure of the shot region S is terminated.

In the descriptions below, a period, in which the scan movement operation is performed in order to expose a predetermined shot region S, is appropriately referred to as a scan movement period. In the descriptions below, a period, in which the step movement operation is performed in order to start the exposure of the next shot region S after the exposure termination of a predetermined shot region S, is appropriately referred to as a step movement period.

The scan movement period includes the exposure period from the exposure start of a predetermined shot region S to the exposure termination. The step movement period includes a movement period of the substrate P from the exposure termination of a predetermined shot region S to the exposure start of the next shot region S.

In the scan movement operation, the exposure light EL is emitted from the emittingsurface12. In the scan movement operation, the exposure light EL is radiated to the substrate P (object). In the step movement operation, the exposure light EL is not emitted from the emittingsurface12. In the step movement operation, the exposure light EL is not radiated to the substrate P (object).

The controller6 sequentially exposes the plurality of shot regions S of the substrate P while repeating the scan movement operation and the step movement operation. Moreover, the scan movement operation is an equal speed movement mainly in the Y axis direction. The step movement operation includes acceleration and deceleration movements. For example, the step movement operation from the exposure termination of a predetermined shot region S to the exposure start of the next shot region S includes one or both of the acceleration and deceleration movements in the Y axis direction and the acceleration and deceleration movements in the X axis direction.

Moreover, there is a case where at least a portion of the liquid immersion space LS may be formed above the substrate stage2 (cover member T) in at least a portion of the scan movement operation and the step movement operation. There is a case where the liquid immersion space LS may be formed over the substrate P and the substrate stage2 (cover member T) in at least a portion of the scan movement operation and the step movement operation. When the exposure of the substrate P is performed in a state where the substrate stage2 and the measurement stage3 approach or contact each other, there is a case where the liquid immersion space LS may be formed over the substrate stage2 (cover member T) and the measurement stage3 in at least a portion of the scan movement operation and the step movement operation.

The controller6 controls the drivingsystem15 based on exposure conditions of the plurality of shot regions S on the substrate P and moves the substrate P (substrate stage2). For example, the exposure conditions of the plurality of shot regions S are defined by exposure control information referred to as an exposure recipe. The exposure control information is stored in the storage apparatus7.

The exposure conditions (exposure control information) include arrangement information of the plurality of shot regions S (the position of each of the plurality of shot regions S in the substrate P). Moreover, the exposure conditions (exposure control information) include size information (size information with respect to the Y axis direction) of each of the plurality of shot regions S.

The controller6 sequentially exposes the plurality of shot regions S while moving the substrate P by a predetermined movement condition based on the exposure conditions (exposure control information) stored in the storage apparatus7. The movement conditions of the substrate P (object) include at least one of the movement speed, the acceleration, the movement distance, the movement direction, and the movement locus in the XY plane.

As an example, when the plurality of shot regions S are sequentially exposed, the controller6 radiates the exposure light EL to the projection region PR while moving the substrate stage2 so that the projection region PR of the projection optical system PL and the substrate P are relatively moved along the movement locus shown by an arrow Sr inFIG. 6, and sequentially exposes the plurality of shot regions S via the liquid LQ by the exposure light EL. The controller6 sequentially exposes the plurality of shot regions S while repeating the scan movement operation and the step movement operation.

In the present embodiment, thesecond member22 moves in at least a portion of the exposure processing of the substrate P. For example, thesecond member22 moves in parallel with at least a portion of the step movement operation of the substrate P (substrate stage2) in the state where the liquid immersion space LS is formed. For example, thesecond member22 moves in parallel with at least a portion of the scan movement operation of the substrate P (substrate stage2) in the state where the liquid immersion space LS is formed. The exposure light EL is emitted from the emittingsurface12 in parallel with the movement of thesecond member22.

For example, thesecond member22 may move so that the relative movement (relative speed, relative acceleration) between thesecond member22 and the substrate P (substrate stage2) is smaller than the relative movement (relative speed, relative acceleration) between thefirst member21 and the substrate P (substrate stage2) when the substrate P (substrate stage2) performs the step movement operation.

In addition, thesecond member22 may move so that the relative movement (relative speed, relative acceleration) between thesecond member22 and the substrate P (substrate stage2) is smaller than the relative movement (relative speed, relative acceleration) between thefirst member21 and the substrate P (substrate stage2) when the substrate P (substrate stage2) performs the scan movement operation.

Moreover, thesecond member22 may not move during the scan movement operation. That is, thesecond member22 may not move in parallel with the emission of the exposure light EL from the emittingsurface12.

FIG. 7 is a schematic view showing an example of the operation of thesecond member22.FIG. 7 is a view of thesecond member22 as seen from the upper side.

In the descriptions below, thesecond member22 moves in the X axis direction. Moreover, as described above, thesecond member22 may move in the Y axis direction and may move in an arbitrary direction in the XY plane which includes the component in the X axis direction (or the Y axis direction).

Thesecond member22 moves within the movable range which is defined with respect to the X axis direction. The movable range of thesecond member22 is determined so that the exposure light EL from the emittingsurface12 passes through thefirst opening part23 and thesecond opening part30 and thesecond member22 does not contact thefirst member21.

In at least a part of a period in which the substrate P (object) moves, as shown inFIGS. 7(A) to 7(E), thesecond member22 moves in the X axis direction.FIG. 7(A) shows a state where thesecond member22 is disposed at a position Jr which is positioned at the furthest end of the +X side of the movable range.FIG. 7(C) shows a state where thesecond member22 is disposed at a center position Jm in the movable range.FIG. 7(E) shows a state where thesecond member22 is disposed at a position Js which is positioned at the furthest end of the −X side of the movable range.

In the descriptions below, the position Jr of thesecond member22 shown inFIG. 7(A) is appropriately referred to as a first end position Jr. The position Jm of thesecond member22 shown inFIG. 7(C) is appropriately referred to as a center position Jm. The position Js of thesecond member22 shown inFIG. 7(E) is appropriately referred to as a second end position Js.

Moreover,FIG. 7(B) shows a state where thesecond member22 is positioned at a position Jrm between the first end position Jr and the center position Jm.FIG. 7(D) shows a state where thesecond member22 is positioned at a position Jsm between the second end position Js and the center position Jm.

In addition, in the present embodiment, the state where thesecond member22 is disposed at the center position Jm includes a state where the center of thesecond opening part30 of thesecond member22 substantially coincides with the optical axis AX of the terminaloptical element13. The position of thesecond member22, in which the center of thesecond opening part30 coincides with the optical axis AX, may also be referred to as an origin point.

The size of the movable range of thesecond member22 includes the distance between the first end position Jr and the second end position Js in the X axis direction.

The controller6 is able to make the positions of thesecond member22 with respect to the terminal optical element13 (projection region PR) be different to each other. The controller6 is able to move thesecond member22 between two positions which are selected from the position Jr, the position Jrm, the position Jm, the position Jsm, and the position Js. The controller6 is able to stop thesecond member22 in at least one of the position Jr, the position Jrm, the position Jm, the position Jsm, and the position Js. The controller6 may stop thesecond member22 at arbitrary positions, which are not limited to the position Jr, the position Jrm, the position Jm, the position Jsm, and the position Js.

The movement distance of thesecond member22 between the position Jr and the position Jm is longer than the movement distance of thesecond member22 between the position Jrm and the position Jm. The movement distance of thesecond member22 between the position Js and the position Jm is longer than the movement distance of thesecond member22 between the position Jsm and the Jm.

The controller6 is able to move thesecond member22 according to determined movement conditions. The movement conditions of thesecond member22 include at least one of the movement direction, the movement speed, the acceleration, and the movement distance. The controller6 is able to control at least one of the movement direction, the movement speed, the acceleration, and the movement distance of thesecond member22.

FIG. 8 is a view schematically showing an example of the movement locus of the substrate P when sequentially exposing a shot region Sa, a shot region Sb, and a shot region Sc while performing the step movement which includes the components in the +X axis direction on the substrate P. The shot regions Sa, Sb, and Sc are disposed in the X axis direction.

As shown inFIG. 8, when the shot regions Sa, Sb, and Sc are exposed, the substrate P sequentially moves a pathway Tp1 from a state where the projection region PR is disposed at a position d1 of the substrate P to a state where the projection region PR is disposed at a position d2 adjacent at the +Y side with respect to the position d1, a pathway Tp2 from the state where the projection region PR is disposed at the position d2 to a state where the projection region PR is disposed at a position d3 adjacent at the +X side with respect to the position d2, a pathway Tp3 from the state where the projection region PR is disposed at the position d3 to a state where the projection region PR is disposed at a position d4 adjacent at the −Y side with respect to the position d3, a pathway Tp4 from the state where the projection region PR is disposed at the position d4 to a state where the projection region is disposed at a position d5 adjacent at the +X side with respect to the position d4, and a pathway Tp5 from the state where the projection region PR is disposed at the position d5 to a state where the projection region PR is disposed at a position d6 adjacent at the +Y side with respect to the position d5, under the terminal optical element13. The positions d1, d2, d3, d4, d5, and d6 are positions in the XY plane.

At least a portion of the pathway Tp1 is a straight line parallel to the Y axis. At least a portion of the pathway Tp3 is a straight line parallel to the Y axis. At least a portion of the pathway Tp5 is a straight line parallel to the Y axis. The pathway Tp2 includes a curved line passing through a position d25. The pathway Tp4 includes a curved line passing through a position d4.5. The position d1 includes the start point of the pathway Tp1, and the position d2 includes the end point of the pathway Tp1. The position d2 includes the start point of the pathway Tp2, and the position d3 includes the end point of the pathway Tp2. The position d3 includes the start point of the pathway Tp3, and the position d4 includes the end point of the pathway Tp3. The position d4 includes the start point of the pathway Tp4, and the position d5 includes the end point of the pathway Tp4. The position d5 includes the start point of the pathway Tp5, and the position d6 includes the end point of the pathway Tp5. The pathway Tp1 is a pathway on which the substrate P moves in the −Y axis direction. The pathway Tp3 is a pathway on which the substrate P moves in the +Y axis direction. The pathway Tp5 is a pathway on which the substrate P moves in the −Y axis direction. The pathway Tp2 and the pathway Tp4 are pathways on which the substrate P moves in the direction which has the −X axis direction as the main component.

When the substrate P moves the pathway Tp1 in the state where the liquid immersion space LS is formed, the exposure light EL is radiated to the shot region Sa via the liquid LQ. When the substrate P moves the pathway Tp3 in the state where the liquid immersion space LS is formed, the exposure light EL is radiated to the shot region Sb via the liquid LQ. When the substrate P moves the pathway Tp5 in the state where the liquid immersion space LS is formed, the exposure light EL is radiated to the shot region Sc via the liquid LQ. When the substrate P moves the pathway Tp2 and the pathway Tp4, the exposure light EL is not radiated.

The operation in which the substrate P moves the pathway Tp1, the operation in which the substrate P moves the pathway Tp3, and the operation in which the substrate P moves the pathway Tp5 each include the scan movement operation. Moreover, the operation in which the substrate P moves the pathway Tp2 and the operation in which the substrate P moves the pathway Tp4 each include the step movement operation.

That is, the period in which the substrate P moves the pathway Tp1, the period in which the substrate P moves the pathway Tp3, and the period in which the substrate P moves the pathway Tp5 each include the scan movement period (exposure period). The period in which the substrate P moves the pathway Tp2 and the period in which the substrate P moves the pathway Tp4 each include the step movement period.

FIGS. 9 and 10 are schematic views showing an example of the operation of thesecond member22 when the shot regions Sa, Sb, and Sc are exposed.FIGS. 9 and 10 are views of thesecond member22 as seen from the upper side.

When the substrate P is positioned at the position d1, as shown inFIG. 9(A), thesecond member22 is positioned at the position Js with respect to the projection region PR (the optical path K of the exposure light EL).

When the substrate P is positioned at the position d2, as shown inFIG. 9(B), thesecond member22 is positioned at the position Jr with respect to the projection region PR (the optical path K of the exposure light EL). That is, during the scan movement operation of the substrate P from the position d1 to the position d2, thesecond member22 moves in the +X axis direction reverse to the direction (−X axis direction) of the step movement of the substrate P. During the scan movement operation of the substrate P from the position d1 to the position d2, thesecond member22 moves from the position Js to the position Jr via the position Jsm, the position Jm, and the position Jrm. In order words, when the substrate P moves the pathway Tp1, thesecond member22 moves in the +X axis direction so that thesecond member22 is changed from the state shown inFIG. 9(A) to the state shown inFIG. 9(B).

When the substrate P is positioned at the position d2.5, as shown inFIG. 9(C), thesecond member22 is positioned at the position Jm with respect to the projection region PR (the optical path K of the exposure light EL).

When the substrate P is positioned at the position d3, as shown inFIG. 9(D), thesecond member22 is disposed at the position Js with respect to the projection region PR (the optical path K of the exposure light EL). That is, during the step movement operation of the substrate P from the position d2 to the position d3, thesecond member22 moves in the −X axis direction which is the same as the direction (−X axis direction) of the step movement of the substrate P. During the step movement operation of the substrate P from the position d2 to the position d3, thesecond member22 moves from the position Jr to the position Jm via the position Jrm, the position Jm, and the position Jsm. In other words, when the substrate P moves the pathway Tp2, thesecond member22 moves in the −X axis direction so that thesecond member22 is changed from the state shown inFIG. 9(B) to the state shown inFIG. 9(D) via the state shown inFIG. 9(C).

When the substrate P is positioned at the position d4, as shown inFIG. 10(A), thesecond member22 is disposed at the position Jr with respect to the projection region PR (the optical path K of the exposure light EL). That is, during the scan movement operation of the substrate P from the position d3 to the position d4, thesecond member22 moves in the +X axis direction reverse to the direction (−X axis direction) of the step movement of the substrate P. During the scan movement operation of the substrate P from the position d3 to the position d4, thesecond member22 moves from the position Js to the position Jr via the position Jsm, the position Jm, and the position Jrm. In other words, when the substrate P moves the pathway Tp3, thesecond member22 moves in the +X axis direction so that thesecond member22 is changed from the state shown inFIG. 9(D) to the state shown inFIG. 10(A).

When the substrate P is positioned at the position d4.5, as shown inFIG. 10(B), thesecond member22 is positioned at the position Jm with respect to the projection region PR (the optical path K of the exposure light EL).

When the substrate P is positioned at the position d5, as shown inFIG. 10(C), thesecond member22 is disposed at the position Js with respect to the projection region PR (the optical path K of the exposure light EL). That is, during the step movement operation of the substrate P from the position d4 to the position d5, thesecond member22 moves in the −X axis direction which is the same as the direction (−X axis direction) of the step movement of the substrate P. During the step movement operation of the substrate P from the position d4 to the position d5, thesecond member22 moves from the position Jr to the position Jm via the position Jrm, the position Jm, and the position Jsm. In other words, when the substrate P moves the pathway Tp4, thesecond member22 moves in the −X axis direction so that thesecond member22 is changed from the state shown inFIG. 10(A) to the state shown inFIG. 10(C) via the state shown inFIG. 10(B).

When the substrate P is positioned at the position d6, as shown inFIG. 10(D), thesecond member22 is disposed at the position Jr with respect to the projection region PR (the optical path K of the exposure light EL). That is, during the scan operation movement of the substrate P from the position d5 to the position d6, thesecond member22 moves in the +X axis direction reverse to the direction (−X axis direction) of the step movement of the substrate P. During the scan movement operation of the substrate P from the position d5 to the position d6, thesecond member22 moves from the position Js to the position Jr via the position Jsm, the position Jm, and the position Jrm. In other words, when the substrate P moves the pathway Tp5, thesecond member22 moves in the +X axis direction so that thesecond member22 is changed from the state shown inFIG. 10(C) to the state shown inFIG. 10(D).

That is, in the present embodiment, in at least a part of the period in which the substrate P moves along the pathway Tp2, thesecond member22 moves in the −X axis direction so that the relative speed between thesecond member22 and the substrate P is decreased. In other words, in at least a part of the period of the step movement operation in which the substrate P includes the component in the −X axis direction, thesecond member22 moves in the −X axis direction so that the relative speed between thesecond member22 and the substrate P in the X axis direction is decreased. Similarly, in at least a part of the period in which the substrate P moves along the pathway Tp4, thesecond member22 moves in the −X axis direction so that the relative speed between thesecond member22 and the substrate P in the X axis direction is decreased.

In addition, in the present embodiment, thesecond member22 moves in the +X axis direction in at least of a part of the period in which the substrate P moves along the pathway Tp3. Accordingly, after the substrate P moves the pathway Tp3, during the movement of the pathway Tp4, even when thesecond member22 moves in the −X axis direction, the exposure light EL is able to pass through the first andsecond opening parts23 and30, and the contact between thefirst member21 and thesecond member22 is able to be suppressed. The case where the substrate P moves the pathways Tp1 and Tp5 is also similar to the above-described case.

That is, when the substrate P repeats the scan movement operation and the step movement operation including the component in the X axis direction, during the step movement operation, thesecond member22 moves in the −X axis direction from the position Jr to the position Js so that the relative speed between thesecond member22 and the substrate P is decreased, and during the scan movement operation, thesecond member22 returns from the position Js to the position Jr so that thesecond member22 moves in the −X axis direction again in the next step movement operation. That is, since thesecond member22 moves in the +X axis direction in at least a portion of the period in which the substrate P performs the scan movement operation, the size of thesecond opening part30 is able to be reduced to the required minimum, and the contact between thefirst member21 and thesecond member22 is suppressed.

Moreover, in the embodiment, even when thesecond member22 is disposed at the first end position Jr (second end position Js), at least a portion of the firstliquid recovery part51 is continuously opposite to the substrate P (object). Accordingly, for example, in the step movement operation, the firstliquid recovery part51 is able to recover the liquid LQ on the substrate P (object).

In addition, in the present embodiment, even when thesecond member22 is disposed at the first end position Jr (second end position Js), at least a portion of the firstgas supply part61 is continuously opposite to the substrate P (object). Accordingly, the gas seal is continuously formed between thesecond member22 and the substrate P (object). Therefore, flowing-out of the liquid is suppressed.

Moreover, in the example described usingFIGS. 9 and 10, when the substrate P is positioned at the positions d1, d3, and d5, thesecond member22 is disposed at the second end position Js. When the substrate P is positioned at the positions d1, d3, and d5, thesecond member22 may be disposed at the center position Jm, and may be disposed at the position Jsm between the center position Jm and the second end position Js.

In addition, in the example described usingFIGS. 9 and 10, when the substrate P is positioned at the positions d2, d4, and d6, thesecond member22 is disposed at the first end position Jr. When the substrate P is positioned at the positions d2, d4, and d6, thesecond member22 may be disposed at the center position Jm and may be disposed at the position Jrm between the center position Jm and the first end position Jr.

Moreover, when the substrate P is positioned at the positions d2.5 and d4.5, thesecond member22 may be disposed at positions different from the center position Jm. That is, when the substrate P is positioned at the positions d2.5 and d4.5, for example, thesecond member22 may be disposed at the position Jsm between the center position Jm and the second end position Js, and may be disposed at the position Jrm between the center position Jm and the first end position Jr.

In addition, in at least a part of the scan movement period of the substrate P, thesecond member22 may stop, and may move in the −X axis direction which is the same as the direction (−X axis direction) of the step movement of the substrate P.

Moreover, in at least a part of the step movement period of the substrate P, thesecond member22 may stop, and may move in the +X axis direction reverse to the direction (−X axis direction) of the step movement of the substrate P.

That is, in a portion of the movement period (scan movement period and step movement period) of the substrate P, thesecond member22 moves so that the relative speed between thesecond member22 and the substrate P (object) is smaller than the relative speed between thefirst member21 and the substrate P (object), and in a portion of the movement period of the substrate P, thesecond member22 may stop or may move so that the relative speed between thesecond member22 and the substrate is larger than the relative speed between the first member and the substrate.

As described above, according to the present embodiment, since thesecond member22 which is movable with respect to thefirst member21 is provided, even when the object such as the substrate P moves in the XY plane in the state where the liquid immersion space LS is formed, for example, the liquid LQ is suppressed from flowing out from the space between theliquid immersion member5 and the object or from remaining on the object.

That is, when the object such as the substrate P moves in the XY plane at a high speed in the state where the liquid immersion space LS is formed, if the member (liquid immersion member or the like) opposite to the object is stopped, there is possibility that the liquid LQ may flow out, the liquid LQ may remain on the substrate P (object), or bubbles may occur in the liquid LQ.

In the present embodiment, for example, thesecond member22 is movable so that the relative movement (relative speed and relative acceleration) between thesecond member22 and the object is decreased. Accordingly, even when the object moves at a high speed in the state where the liquid immersion space LS is formed, the liquid LQ is suppressed from flowing out, the liquid LQ is suppressed from remaining on the substrate P (object), or the bubbles are suppressed from occurring in the liquid LQ.

Moreover, in the present embodiment, thefirst part211 of thefirst member21 is disposed at the surrounding of the optical path K (optical path KL), and thesecond member22 moves outside thefirst part211. Accordingly, formations of gas portion are suppressed from occurring in the optical path space SPK, or occurrences of bubbles are suppressed from occurring in the liquid LQ of the optical path K. That is, in the present embodiment, since thefirst part211 of thefirst member21 is disposed at at least a portion of the surrounding of the optical path K (optical path KL), even when thesecond member22 moves outside than thefirst part211, the pressure inside thefirst part211 is suppressed from being changed, the pressure of the liquid LQ in the optical path space SPK is suppressed from being changed, or the shape of the third interface LG3 of the liquid LQ is suppressed from being largely changed. Accordingly, for example, occurrences of bubbles and the like are suppressed in the liquid LQ. Moreover, an excessive force is suppressed from being applied to the terminaloptical element13. In addition, in the present embodiment, since thefirst member21 does not substantially move, the pressure between the terminaloptical element13 and thefirst member21 is suppressed from being largely changed, or the shapes of the second and third interfaces LG2 and LG3 of the liquid LQ are prevented from being significantly changed.

Accordingly, occurrence of exposure failure and occurrence of a defective device are able to be prevented.

Moreover, in the present embodiment, thesecond member22 includes the firstliquid recovery part51. Accordingly, the shape of the first interface LG1 formed between the firstliquid recovery part51 and the substrate P (object) is suppressed from being changed. Therefore, the liquid LQ in the liquid immersion space LS is suppressed from flowing out from the space between the liquid immersion member5 (second member22) and the substrate P (object), or the liquid LQ is suppressed from remaining on the substrate P (object).

Moreover, in the present embodiment, the firstliquid supply part41 is provided at thelower surface24 of thefirst part211. Accordingly, for example, even when the first interface LG1 approaches thefirst opening part23 due to the movement of the object or the like, the first interface LG1 is suppressed from moving inside thefirst opening part23 due to the liquid LQ supplied from the firstliquid supply part41, or the gas is suppressed from entering in the liquid LQ inside thefirst opening part23.

Moreover, in the present embodiment, the secondliquid supply part42 is provided at thelower surface31 of thesecond member22. Accordingly, for example, even when the first interface LG1 approaches the first opening part23 (opening part301) due to the movement of the object or the like, the first interface LG1 is suppressed from moving inside the first opening part23 (opening part301), or the gas is suppressed from entering in the liquid LQ inside the first opening part23 (opening part301) due to the liquid LQ supplied from the secondliquid supply part42.

Moreover, in the present embodiment, the firstgas supply part61 is provided at thelower surface31 of thesecond member22. Therefore, the gas seal is formed between thesecond member22 and the object. Accordingly, the liquid LQ is suppressed from flowing out from the second space SP2. In addition, since the gas G is supplied from the firstgas supply part61 in parallel with the recovery operation from the firstliquid recovery part51, a decrease in the pressure of the second space SP2 due to the recovery operation of the firstliquid recovery part51 is able to be suppressed.

Moreover, in the present embodiment, the gap (fourth space SP4) between thefirst member21 and thesecond member22 is opened to the atmosphere. Accordingly, the liquid LQ on the object is able to smoothly flow in the fourth space SP4 via theopening part301. Therefore, for example, the change in the pressure of the optical path space SPK, the change in the pressure of the third space SP3, or the change in the pressure of the second space SP2 is able to be suppressed.

In addition, in the present embodiment, the secondliquid recovery part52 is provided. Accordingly, the liquid LQ flowing in the gap (fourth space SP4) between thefirst member21 and thesecond member22 is suppressed from flowing out from the gap (fourth space SP4).

Moreover, in the present embodiment, the secondliquid recovery part52 is disposed at thesecond part212. Accordingly, after the liquid LQ entering in the fourth space SP4 from theopening part301 contacts at least a portion of theouter surface26, theinner surface32, and thelower surface28, and at least a portion of theupper surface33, the liquid LQ is recovered from the secondliquid recovery part52. That is, since the secondliquid recovery part52 is disposed at thesecond part212, a contact area (contact time) between the liquid LQ and thefirst member21 and a contact area (contact time) between the liquid LQ and thesecond member22 is able to be increased (lengthened). Accordingly, temperatures of thefirst member21 and thesecond member22 are adjusted by the liquid LQ which is supplied from the liquid supply part40 (at least one of the first, the second, the thirdliquid supply parts41,42, and43).

Moreover, in the present embodiment, in the fourth space SP4, the first gap part having the size Ha and the second gap part having the size Hb are provided. Since the secondliquid recovery part52 recovers the liquid LQ from the first gap part, the second gap part becomes a gas space. The second gap part filled with the gas functions as a damping part which suppresses vibration of thesecond member22. The second gap part filled with the gas is able to function as a so-called squeeze film damper. For example, even when thesecond member22 moves in the XY plane, vibration (undesired vibration) of thesecond member22 with respect to the Z axis direction is suppressed by the second gap part (damping part).

Moreover, the size Hb is 0.2 mm or less, and may be 0.01 mm to 0.1 mm.

Moreover, in the present embodiment, thewall part333 forming the second gap part is provided. Accordingly, the liquid LQ in the fourth space SP4 is suppressed from flowing out from the fourth space SP4.

In addition, in the present embodiment, at least a portion of the surface (outer surface26 and lower surface28) of thefirst member21 and the surface (inner surface32 and upper surface33) of thesecond member22 facing the gap (fourth space SP4) between thefirst member21 and thesecond member22 has liquid repellent property with respect to the liquid LQ. Accordingly, for example, even when thesecond member22 moves, the pressure of the liquid LQ in the liquid immersion space LS is suppressed from being changed, and occurrence of undesired flow of the liquid LQ is suppressed.

Moreover, according to the present embodiment, the thirdliquid supply part43 is provided. Accordingly, the optical path K is able to be filled with the liquid LQ.

In addition, in the present embodiment, the gap (third space SP3) between the terminaloptical element13 and thefirst member21 is opened to the atmosphere. Accordingly, the liquid LQ above the object is able to smoothly flow into the third space SP3 via theopening part37. Therefore, for example, the change in the pressure of the optical path space SPK, the change in the pressure of the third space SP3, or the change in the pressure of the second space SP2 is prevented.

Moreover, in the present embodiment, the thirdliquid recovery part53 is provided. Accordingly, the liquid LQ flowing in the gap (third space SP3) between the terminaloptical element13 and thefirst member21 is prevented from flowing out from the gap (third space SP3).

In addition, in the present embodiment, thefirst member21 may move. Thefirst member21 may move with respect to the terminaloptical element13. Thefirst member21 may move in at least one of six directions of the X axis, Y axis, Z axis, θX, θY, and θZ directions. For example, in order to adjust a positional relationship between the terminaloptical element13 and thefirst member21 or a positional relationship between thefirst member21 and thesecond member22, thefirst member21 may move.

In addition, thefirst member21 may not substantially move in the period in which thesecond member22 moves, and may move in at least a part of the period in which thesecond member22 does not move.

Moreover, thefirst member21 may not substantially move in the state where the liquid immersion space LS is formed, and may move in the state where the liquid immersion space LS is not formed.

In addition, thefirst member21 may not move in the period in which the exposure light EL is emitted from the emittingsurface12, and may move in the period in which the exposure light EL is not emitted from the emittingsurface12.

Moreover, thefirst member21 may move in at least a part of the period in which thesecond member22 moves. In addition, thefirst member21 may move in the state where the liquid immersion space LS is formed. Moreover, thefirst member12 may move in at least a part of the period in which the exposure light EL is emitted from the emittingsurface12. In addition, thefirst member21 may move in at least a part of the period in which the substrate P (object) moves.

Thefirst member21 may move at a lower speed than thesecond member22. Thefirst member21 may move at a lower acceleration than thesecond member22. Thefirst member21 may move at a lower speed than the substrate P. Thefirst member21 may move at a lower acceleration than the substrate P.

Second Embodiment

A second embodiment will be described. In the descriptions below, the same reference numerals are assigned to the same or similar components as those of the above-described embodiment, and descriptions thereof are simplified or omitted here.

FIGS. 11 to 16 show examples of dispositions of the first liquid recoverports51M.

As shown inFIG. 11, the plurality of firstliquid recovery ports51M may be disposed along a rectangular virtual line. InFIG. 11, a rectangular shape drawing the virtual line is a substantially square. Apexes (corners) of the rectangular shape are disposed at the +X side and the −X side and disposed at the +Y side and the −Y side with respect to the optical path K (optical axis AX). The outer shape of the first interface LG1 of the liquid LQ between thesecond member22 and the substrate P (object) is defined as a substantially rectangular shape along the plurality of firstliquid recovery ports51M.

As shown inFIG. 12, the sides of the rectangular virtual line may be curved. The plurality of firstliquid recovery ports51M may be disposed along the virtual line including the curved line.

As shown inFIG. 13, the plurality of firstliquid recovery ports51M may be disposed along a rhombic virtual line which is longer in the Y axis direction. Moreover, the plurality of firstliquid recovery ports51M may be disposed along a rhombic virtual line which is longer in the X axis direction.

As shown inFIG. 14, the plurality of firstliquid recovery ports51M may be disposed along a circular virtual line.

As shown inFIG. 15, the plurality of firstliquid recovery ports51M may be disposed along an elliptical virtual line which is longer in the Y axis direction. In addition, the plurality of firstliquid recovery ports51M may be disposed along an elliptical virtual line which is longer in the X axis direction.

As shown inFIG. 16, the corners of the rectangular virtual line may be rounded. The plurality of firstliquid recovery ports51M may be disposed along the virtual line including the curved line.

Third Embodiment

A third embodiment will be described. In the descriptions below, the same reference numerals are assigned to the same or similar components as those of the above-described embodiments, and descriptions thereof are simplified or omitted here.

FIG. 17 shows an example of a second liquid recovery part52C according to the present embodiment. The second liquid recovery part52C recovers at least a portion of the liquid LQ flowing in the gap (fourth space SP4) between the first member21C and the second member22C from above the substrate P (object). In the present embodiment, the second liquid recovery part52C is disposed at the second member22C. In the example shown inFIG. 17, the second liquid recovery part52C is disposed at theupper surface33 of the second member22C.

In addition, the second liquid recovery part, which recovers at least a portion of the liquid flowing in the gap between thefirst member21 and thesecond member22, may be disposed at both of thefirst member21 and thesecond member22.

Fourth Embodiment

A fourth embodiment will be described. In the descriptions below, the same reference numerals are assigned to the same or similar components as those of the above-described embodiments, and descriptions thereof are simplified or omitted here.

FIG. 18 shows an example of a second gap part according to the present embodiment. As shown inFIG. 18, a protruding part (wall part)333D may be provided at a first member21D. The protrudingpart333D is provided at thelower surface28 of the first member21D. The protrudingpart333D protrudes below (toward a second member22D side). The second gap part having the size Hb is defined by the lower surface of theprotruding part333D and theupper surface28 of the second member22D.

In addition, the protruding part for defining the second gap part may be provided at both of thefirst member21 and thesecond member22. That is, the second gap part may be defined between the lower surface of the protruding part provided at thefirst member21 to protrude below and the upper surface of the protruding part provided at thesecond member22 to protrude above.

Fifth Embodiment

A fifth embodiment will be described. In the descriptions below, the same reference numerals are assigned to the same or similar components as those of the above-described embodiments, and descriptions thereof are simplified or omitted here.

FIG. 19 shows an example of asecond member22E according to the present embodiment. As shownFIG. 19(A), a secondgas supply part62 may be disposed outside the firstgas supply part61 in the radial direction with respect to the optical axis AX of the terminaloptical element13. The secondgas supply part62 is disposed at thelower surface31 of thesecond member22. By the gas G supplied from the secondgas supply part62, the liquid LQ is suppressed from flowing out from the second space SP2.

Sixth Embodiment

A sixth embodiment will be described. In the descriptions below, the same reference numerals are assigned to the same or similar components as those of the above-described embodiments, and descriptions thereof are simplified or omitted here.

FIG. 20 is a view showing an example of the exposure apparatus EX according to the present embodiment. As shown inFIG. 20(A), athird member230 including a secondgas supply part62F, which is able to be opposite to the surface of the substrate P (object), may be disposed outside thesecond member22 with respect to the optical path K (optical axis AX) of the exposure light EL. Thethird member230 may move based on the movement conditions (movement direction, movement speed, acceleration, or the like) of thesecond member22 in at least a part of the period in which thesecond member22 moves so that thethird member230 does not contact thesecond member22. Thethird member230 may perform the supply operation of the gas G from the secondgas supply part62F while moving.

Moreover, in the examples shown inFIGS. 19(A) and 20(A), a liquid recovery part may be disposed instead of the second gas supply part62 (62F). The liquid recovery part is provided outside the firstliquid recovery part51 and the firstgas supply part61 with respect to the optical path K (optical axis AX) of the exposure light EL, and thus, even when the liquid LQ flows outside than the firstgas supply part61, the liquid LQ is able to be recovered from the liquid recovery part.

In addition, as shown inFIG. 19(B), agas recovery part63 may be disposed instead of the secondgas supply part62. Thegas recovery part63 is provided outside than the firstliquid recovery part51 and the firstgas supply part61 with respect to the optical path K (optical axis AX) of the exposure light EL, and thus, a humid gas which has contacted with the liquid LQ or a portion of the gas G supplied from the firstgas supply part61 is able to be recovered from the gas recovery part.

Moreover, as shown inFIG. 20(B), agas recovery part63F may be disposed instead of the secondgas supply part62F. Thegas recovery part63F is provided outside the firstliquid recovery part51 and the firstgas supply part61 with respect to the optical path K (optical axis AX) of the exposure light EL, and thus, a humid gas which has contacted the liquid LQ or a portion of the gas G supplied from the firstgas supply part61 is able to be recovered from the gas recovery part.

In addition, droplets of the liquid LQ, or the like may flow in from the gas recovery part63 (63F) along with the gas G.

Moreover, a liquid recovery part may be disposed at addition to the second gas supply part62 (62F).

Seventh Embodiment

A seventh embodiment will be described. In the descriptions below, the same reference numerals are assigned to the same or similar components as those of the above-described embodiments, and descriptions thereof are simplified or omitted here.

FIG. 21 is a schematic view showing a relationship among the emittingsurface12 of the terminaloptical element13, thelower surface24 of the first member21 (first part211), and thelower surface31 of thesecond member22.

As shown inFIG. 21, thelower surface24 of the first member21 (first part211) may be disposed below the emittingsurface12, may be disposed at substantially the same height as the emittingsurface12, and may be disposed above the emittingsurface12. Thelower surface24 may be disposed at substantially the same plane as the emittingsurface12. Thelower surface24 may be substantially parallel to the XY plane, may be inclined to the emittingsurface12, may be inclined to the XY plane, may be a flat surface, and may include a curved surface.

As shown inFIG. 21, thelower surface31 of thesecond member22 may be disposed below the emittingsurface12, may be disposed at substantially the same height as the emittingsurface12, and may be disposed above the emittingsurface12. Thelower surface31 may be disposed at substantially the same plane as the emittingsurface12. Thelower surface31 may be substantially parallel to the XY plane, may be inclined to the emittingsurface12, may be inclined to the XY plane, may be a flat surface, and may include a curved surface.

As shown inFIG. 21, thelower surface31 of thesecond member22 may be disposed below thelower surface24 of the first member21 (first part211), may be disposed at substantially the same height as thelower surface24, and may be disposed above thelower surface24. Thelower surface31 may be disposed at substantially the same plane as thelower surface24. Thelower surface31 may be inclined with respect to thelower surface24. Thelower surface24 may be disposed below the emittingsurface12, may be disposed at substantially the same height as the emittingsurface12, and may be disposed above the emittingsurface12.

Eighth Embodiment

An eighth embodiment will be described. In the descriptions below, the same reference numerals are assigned to the same or similar components as those of the above-described embodiments, and descriptions thereof are simplified or omitted here.

FIG. 22 is a view showing an example of a liquid immersion member5H according to the present embodiment. As shown inFIG. 22, at least a portion of asecond member22H may be disposed below thelower surface24 of afirst part211H. In other words, at least a portion of thesecond member22H may be disposed between thefirst part211H and the substrate P (object). In addition, as shown inFIG. 22, at least a portion of thesecond member22H may be disposed below the emittingsurface12 of the terminaloptical element13. In order words, at least a portion of thesecond member22 may be disposed between the terminaloptical element13 and the substrate P (object).

Moreover, as shown inFIG. 22, asecond opening part30H of thesecond member22 may be smaller than afirst opening part23H of thefirst member21.

Ninth Embodiment

A ninth embodiment will be described. In the descriptions below, the same reference numerals are assigned to the same or similar components as those of the above-described embodiments, and descriptions thereof are simplified or omitted here.

FIG. 23 is a view showing an example of a liquid immersion member5I (first member21I) according to the present embodiment. As shown inFIG. 23, a third liquid supply part43I opposite to theouter surface131 of the terminaloptical element13 is disposed at one side (for example, +X side) with respect to the optical axis AX of the terminaloptical element13, and a third liquid recovery part53I opposite to theouter surface131 of the terminaloptical element13 may be disposed at the other side (for example, −X side) with respect to the optical axis AX of the terminaloptical element13. Accordingly, the liquid LQ flows from the one side to the other side with respect to the optical axis AX in the optical path space SPK.

Moreover, the third liquid supply part43I is disposed to face the optical path K (optical path space SPK) between the emittingsurface12 and the substrate P (object). The third liquid recovery part53I may be disposed to face the optical path K (optical path space SPK). In other words, one or both of the third liquid supply part43I and the third liquid recovery part53I may be disposed below the emittingsurface12.

Tenth Embodiment

Next, a tenth embodiment will be described. In the descriptions below, the same reference numerals are assigned to the same or similar components as those of the above-described embodiments, and descriptions thereof are simplified or omitted here.

In the present embodiment, an example of the operation of thesecond member22 will be described.FIG. 24(A) is a view schematically showing an example of the movement locus of the substrate P when the shot region Sa and the shot region Sb are sequentially exposed.FIG. 24(B) is a view schematically showing an example of the movement locus of thesecond member22 according to the present embodiment when the shot region Sa and the shot region Sb are sequentially exposed.

Also in the present embodiment, when the substrate P (substrate stage2) performs the scan movement operation and the step movement operation in the state where the liquid immersion space LS is formed, thesecond member22 moves so that the relative movement (relative speed, relative acceleration) between thesecond member22 and the substrate P (substrate stage2) is smaller than the relative movement (relative speed, the relative acceleration) between thefirst member21 and the substrate P (substrate stage2).

As shown inFIG. 24(A), when the shot regions Sa is exposed, the substrate P sequentially moves the pathway Tp1 from the state where the projection region PR is disposed at the position d1 of the substrate P to the state where the projection region PR is disposed at the position d2 adjacent at the +Y side with respect to the position d1, the pathway Tp2 from the state where the projection region PR is disposed at the position d2 to the state where the projection region PR is disposed at the position d3 adjacent at the +X side with respect to the position d2, the pathway Tp3 from the state where the projection region PR is disposed at the position d3 to the state where the projection region PR is disposed at the position d4 adjacent at the −Y side with respect to the position d3, and the pathway Tp4 from the state where the projection region PR is disposed at the position d4 to the state where the projection region is disposed at the position d5 adjacent at the +X side with respect to the position d4, under the terminaloptical element13. The positions d1, d2, d3, and d4 are positions in the XY plane.

At least a portion of the pathway Tp1 is a straight line parallel to the Y axis. At least a portion of the pathway Tp3 is a straight line parallel to the Y axis. The pathway Tp2 includes a curved line. The pathway Tp4 includes a curved line. The position d1 includes the start point of the pathway Tp1, and the position d2 includes the end point of the pathway Tp1. The position d2 includes the start point of the pathway Tp2, and the position d3 includes the end point of the pathway Tp2. The position d3 includes the start point of the pathway Tp3, and the position d4 includes the end point of the pathway Tp3. The position d4 includes the start point of the pathway Tp4, and the position d5 includes the end point of the pathway Tp4. The pathway Tp1 is a pathway on which the substrate P moves in the −Y axis direction. The pathway Tp3 is a pathway on which the substrate P moves in the +Y axis direction. The pathway Tp2 and the pathway Tp4 are pathways on which the substrate P substantially moves in the −X axis direction.

When the substrate P moves the pathway Tp1 in the state where the liquid immersion space LS is formed, the exposure light EL is radiated to the shot region Sa via the liquid LQ. The operation in which the substrate P moves the pathway Tp1 includes the scan movement operation. In addition, when the substrate P moves the pathway Tp3 in the state where the liquid immersion space LS is formed, the exposure light EL is radiated to the shot region Sb via the liquid LQ.

The operation in which the substrate P moves the pathway Tp3 includes the scan movement operation. The operation in which the substrate P moves the pathway Tp2 and the operation in which the substrate P moves the pathway Tp4 include the step movement operation.

When the substrate P sequentially moves the pathways Tp1, Tp2, Tp3, and Tp4, as shown inFIG. 24(B), thesecond member22 sequentially moves pathways Tn1, Tn2, Tn3, and Tn4. The pathway Tn1 is a pathway from a position e1 to a position e2. The pathway Tn2 is a pathway from the position e2 to a position e3. The pathway Tn3 is a pathway from the position e3 to a position e4. The pathway Tn4 is a pathway from the position e4 to the position e1. The pathway Tn1 includes a straight line. The pathway Tn2 includes a curved line. The pathway Tn3 includes a straight line. The pathway Tn4 includes a curved line. The pathway Tn1 and the pathway Tn3 intersect each other. The pathway Tn1 and the pathway Tn3 are inclined to both of the X axis and the Y axis.

That is, in the present embodiment, thesecond member22 moves in the XY plane such as drawing a character “8” of Arabic numerals.

In the pathway Tn1, thesecond member22 moves in the +Y axis direction while moving in the +X axis direction. That is, in the scan movement period of the substrate P, thesecond member22 moves in the direction reverse to the movement direction of the substrate P in the step movement period of the substrate P with respect to the X axis direction.

In the pathway Tn2, thesecond member22 substantially moves in the −X axis direction. That is, in the step movement period of the substrate P, thesecond member22 moves in substantially the same direction as the movement direction of the substrate P in the step movement period of the substrate P. Thesecond member22 moves so that the relative speed (relative acceleration) between thesecond member22 and the substrate P is decreased.

In the pathway Tn3, thesecond member22 moves in the −Y axis direction while moving in the +X axis direction. That is, in the scan movement period of the substrate P, thesecond member22 moves in the direction reverse to the movement direction of the substrate P in the step movement period of the substrate P with respect to the X axis direction.

In the pathway Tn4, thesecond member22 substantially moves in the −X axis direction. That is, in the step movement period of the substrate P, thesecond member22 moves in substantially the same direction as the movement direction of the substrate P in the step movement period of the substrate P. Thesecond member22 moves so that the relative speed (relative acceleration) between the second member and the substrate P is decreased.

Also in the present embodiment, the liquid LQ is suppressed from flowing out, and bubbles are suppressed from occurring in the liquid LQ. Accordingly, occurrence of exposure failure is able to be prevented, and occurrence of a defective device is able to be prevented.

Moreover, in the above-described first to tenth embodiments, the gas G may be substantially recovered from the firstliquid recovery part51, and the recovery of the liquid LQ may be suppressed. For example, the inner surface of the firstliquid recovery port51M of the firstliquid recovery part51 is formed of a film having liquid repellent property with respect to the liquid LQ, and thus, the recovery of the liquid LQ from the firstliquid recovery port51 is prevented.

Moreover, in each of the above-described embodiments, the gas G may not be actively provided from the firstgas supply part61. In other words, the firstgas supply part61 may not be connected to the gas supply apparatus. For example, the firstgas supply part61 may be opened to the atmosphere (for example, exposed to the atmosphere). In the state where the firstgas supply part61 is opened to the atmosphere (exposed to the atmosphere), the recovery operation (suction operation) from the firstliquid recovery part51 is performed, and thus, the gas G passively flows in the second space SP2 from the firstgas supply part61. Therefore, a decrease in the pressure of the second space SP2 according to the recovery operation of the firstliquid recovery part51 is prevented.

In addition, in each of the above-described embodiments, for example, the liquid LQ supplied from the firstliquid supply part41 and the liquid LQ supplied from the secondliquid supply part42 may be different from each other. The liquid LQ supplied from the firstliquid supply part41 and the liquid LQ supplied from the thirdliquid supply part43 may be different from each other. The liquid LQ supplied from the secondliquid supply part42 and the liquid LQ supplied from the thirdliquid supply part43 may be different from each other. The liquids LQ being different from each other includes kinds (physical properties) of the liquids LQ being different from each other, and the kinds of the liquids LQ being the same as each other and the liquids LQ being different from each other in at least one of temperature and degree of cleanness.

Moreover, in each of the above-described embodiments, the firstliquid recovery part51 and the firstliquid supply part41 may be provided at theliquid immersion member5, and at least a portion of the second and thirdliquid recovery parts52 and53, the second and thirdliquid supply parts42 and43, and the first and secondgas supply parts61 and62 may be omitted.

In addition, in each of the above-described embodiments, the firstliquid recovery part51 and the secondliquid supply part42 may be provided at theliquid immersion member5, and at least a portion of the second and thirdliquid recovery parts52 and53, the first and thirdliquid supply parts41 and43, and the first and secondgas supply parts61 and62 may be omitted.

Moreover, in each of the above-described embodiments, the firstliquid recovery part51 and the thirdliquid supply part43 may be provided at theliquid immersion member5, and at least a portion of the second and thirdliquid recovery parts52 and53, the first and secondliquid supply parts41 and42, and the first and secondgas supply parts61 and62 may be omitted.

Moreover, in each of the above-described embodiments, the firstliquid recovery part51 and the firstgas supply part61 may be provided at theliquid immersion member5, and at least a portion of the second and thirdliquid recovery parts52 and53, the first, second, and thirdliquid supply parts41,42, and43, and the secondgas supply part62 may be omitted.

In addition, in each of the above-described embodiments, the firstliquid recovery part51 and the secondliquid recovery part52 may be provided at theliquid immersion member5, and at least a portion of the thirdliquid recovery part53, the first, second, and thirdliquid supply parts41,42, and43, and the first and secondgas supply parts61 and62 may be omitted.

Moreover, in each of the above-described embodiments, the second gap part having the size Hb may not be provided.

In addition, in each of the above-described embodiments, thefirst member21 may not include thesecond part212. Thefirst member21 may not include theupper plate part214.

Moreover, in each of the above-described embodiments, the liquid supply part which supplies liquid to the fourth space SP4 may be provided at at least one of thefirst member21 and thesecond member22 to face the fourth space SP4.

In addition, in each of the above-described embodiments, the gas seal may not be formed by the gas G from the gas supply part (61 or the like) of the second member (22 or the like). That is, the gas supply from the gas supply part (61 or the like) may not have the function which prevents the liquid LQ from flowing out.

Moreover, in each of the above-described embodiments, the gas supplied from the gas supply part (61 or the like) of the second member (22 or the like) may be the same as the gas of the surrounding of the liquid immersion member (5 or the like) or may be different from the gas. For example, gas (carbon dioxide gas) including carbon dioxide may be supplied from the gas supply part (61 or the like).

Eleventh Embodiment

An eleventh embodiment will be described. In the descriptions below, the same reference numerals are assigned to the same or similar components as those of the above-described embodiments, and descriptions thereof are simplified or omitted here.

FIG. 25 is a view showing an example of aliquid immersion member5K according to the present embodiment.FIG. 26 is a view of theliquid immersion member5K (second member22K) according to the present embodiment as seen from below. Theliquid immersion member5K is able to form the liquid immersion space LS of the liquid LQ above the substrate P (object) movable below the terminaloptical element13. Theliquid immersion member5K includes afirst member21K which is disposed at at least a portion of the surrounding of the optical path K (KL) of the exposure light EL, and asecond member22K in which at least a portion is disposed to be opposite to the substrate P (object) below thefirst member21K. Thesecond member22K is disposed at at least a portion of the surrounding of the optical path K. Thesecond member22 is movable with respect to thefirst member21.

Thefirst member21K is disposed at a position further away from the substrate P (object) than thesecond member22K. At least a portion of thesecond member22K is disposed between thefirst member21K and the substrate P (object). At least a portion of thesecond member22K is disposed between the terminaloptical element13 and the substrate P (object). In addition, thesecond member22K may not be disposed between the terminaloptical element13 and the substrate P (object).

Thefirst member21K includes alower surface23K facing the −Z direction and afluid recovery part24K which is disposed at at least a portion of the surrounding of thelower surface23K. Thesecond member22K includes anupper surface25K facing the +Z direction, alower surface26K facing the −Z direction, and afluid recovery part27K which is disposed at at least a portion of the surrounding of thelower surface26K. Thefluid recovery part24K recovers at least a portion of the liquid LQ of the liquid immersion space LS. Thefluid recovery part27K recovers at least a portion of the liquid LQ of the liquid immersion space LS.

Thefirst member21K includes aninner surface28K which is opposite to aside surface131 of the terminaloptical element13, and anouter surface29K toward the outside with respect to the optical path K (KL) of the exposure light EL. Thesecond member22K includes aninner surface30K which is opposite to theouter surface29K via a gap.

Theinner surface28K of thefirst member21K is opposite to theside surface131 of the terminaloptical element13 via a gap.

Thesecond member22K is able to be opposite to thelower surface23K. Thesecond member22K is able to be opposite to thefluid recovery part24K. At least a portion of theupper surface25K of thesecond member22K is opposite to thelower surface23K via a gap. At least a portion of theupper surface25K is opposite to the emittingsurface12 via a gap. Moreover, theupper surface25K may not be opposite to the emittingsurface12.

The substrate P (object) is able to be opposite to thelower surface26K. The substrate P (object) is able to be opposite to at least a portion of thefluid recovery part27K. At least a portion of the upper surface of the substrate P is opposite to thelower surface26K via a gap. At least a portion of the upper surface of the substrate P is opposite to the emittingsurface12 via a gap.

In the Z axis direction, the size of the gap between the upper surface of the substrate P (object) and the emittingsurface12 is larger than the size of the gap between the upper surface of the substrate P (object) and thelower surface26K. Moreover, the size of the gap between the upper surface of the substrate P (object) and the emittingsurface12 may be substantially the same as the size of the gap between the upper surface of the substrate P (object) and thelower surface26K. In addition, the size of the gap between the upper surface of the substrate P (object) and the emittingsurface12 may be smaller than the size of the gap between the upper surface of the substrate P (object) and thelower surface26K.

A space SP5 is formed between thelower surface23K and theupper surface25K. A space SP6 is formed between thelower surface26K and the upper surface of the substrate P (object). A space SP7 is formed between theside surface131 and theinner surface28K.

Theside surface131 of the terminaloptical element13 is disposed at the surrounding of the emittingsurface12. Theside surface131 is a non-emitting surface from which the exposure light EL is not emitted. The exposure light EL passes through the emittingsurface12 and does not pass through theside surface131.

Thelower surface23K of thefirst member21K does not recover the liquid LQ. Thelower surface23K is a non-recovery part and is not able to recover the liquid LQ. Thelower surface23K of thefirst member21K is able to hold the liquid LQ between the lower surface and thesecond member22K.

Theupper surface25K of thesecond member22K does not recover the liquid LQ. Theupper surface25K is a non-recovery part and is not able to recover the liquid LQ. Theupper surface25K of thesecond member22K is able to hold the liquid LQ between theupper surface25K and thefirst member21K.

Thelower surface26K of thesecond member22K does not recover the liquid LQ. Thelower surface26K is a non-recovery part and is not able to recover the liquid LQ. Thelower surface26K of thesecond member22K is able to hold the liquid LQ between the substrate P (object) and thelower surface26K.

Theinner surface28K, theouter surface29K, and theinner surface30K do not recover the liquid LQ. Theinner surface28K, theouter surface29K, and theinner surface30K are non-recovery parts and they are not able to recover the liquid LQ.

In the present embodiment, thelower surface23K is substantially parallel to the XY plane. Theupper surface25K is also substantially parallel to the XY plane. Thelower surface26K is also substantially parallel to the XY plane. That is, thelower surface23K and theupper surface25K are substantially parallel to each other. Theupper surface25K and thelower surface26K are substantially parallel to each other.

Moreover, thelower surface23K may not be parallel to the XY plane. Thelower surface23K may be inclined with respect to the XY plane and may include a curved surface.

In addition, theupper surface25K may not be parallel to the XY plane. Theupper surface25K may be inclined with respect to the XY plane and may include a curved surface.

Moreover, thelower surface26K may not be parallel to the XY plane. Thelower surface26K may be inclined with respect to the XY plane and may include a curved surface.

In addition, thelower surface23K and theupper surface25K may be parallel to each other or may not be parallel to each other. Theupper surface25K and thelower surface26K may be parallel to each other or may not be parallel to each other. Thelower surface23K and thelower surface26K may be parallel to each other or may not be parallel to each other.

Thefirst member21K includes anopening34K through which the exposure light EL emitted from the emittingsurface12 is able to pass. Thesecond member22 includes anopening35K through which the exposure light EL emitted from the emittingsurface12 is able to pass. At least a portion of the terminaloptical element13 is disposed inside theopening34K. Thelower surface23K is disposed at the surrounding of the lower end of theopening34K. Theupper surface25K is disposed at the surrounding of the upper end of theopening35K. Thelower surface26K is disposed at the surrounding of the lower end of theopening35K.

The size of theopening34K in the XY plane is larger than the size of theopening35K. With respect to the X axis direction, the size of theopening34K is larger than the size of theopening35K. With respect to the Y axis direction, the size of theopening34K is larger than the size of theopening35K. In the present embodiment, thefirst member21K is not disposed immediately below the emittingsurface12. Theopening34K of thefirst member21K is disposed at the surrounding of the emittingsurface12. Theopening34K is larger than the emittingsurface12. The lower end of the gap which is formed between theside surface131 of the terminaloptical element13 and thefirst member21K faces theupper surface25K of thesecond member22K. Moreover, theopening35K of thesecond member22K is disposed to be opposite to the emittingsurface12. In the present embodiment, the shape of theopening35K in the XY plane is a rectangular shape. Theopening35K is long in the X axis direction. Moreover, the shape of theopening35K may be an elliptical shape which is long in the X axis direction and may be a polygonal shape which is long in the X axis direction.

In addition, the size of theopening34K may be smaller than the size of theopening35K. Moreover, the size of theopening34K may be substantially the same as the size of theopening35K.

Thefirst member21K is disposed at the surrounding of the terminaloptical element13. Thefirst member21K is an annular member. Thefirst member21K is disposed so as not to contact the terminaloptical element13. A gap is formed between thefirst member21K and the terminal optical element13K. Thefirst member21K does not face the emittingsurface12. Moreover, a portion of thefirst member21K may not be opposite to the emittingsurface12. That is, a portion of thefirst member21K may be disposed between the emittingsurface12 and the upper surface of the substrate P (object). In addition, thefirst member21K may not be annular. For example, thefirst member21K may be disposed at a portion of the surrounding of the terminal optical element13 (optical path K). For example, a plurality of thefirst members21K may be disposed at the surrounding of the terminal optical element13 (optical path K).

Thesecond member22K is disposed at the surrounding of the optical path K. Thesecond member22K is an annular member. Thesecond member22K is disposed so as not to contact thefirst member21K. A gap is formed between thesecond member22K and thefirst member21K.

Thesecond member22K is movable with respect to thefirst member21K. Thesecond member22K is movable with respect to the terminaloptical element13. A relative position between thefirst member21K and thesecond member22K is changed. The relative position between thesecond member22K and the terminaloptical element13 is changed.

Thesecond member22K is movable in the XY plane perpendicular to the optical axis of the terminaloptical element13. Thesecond member22K is movable to be substantially parallel to the XY plane. In the present embodiment, thesecond member22K is movable in at least the X axis direction. Moreover, thesecond member22K may move in at least one direction of the Y axis, Z axis, θX, θY, and θZ directions, in addition to the X axis direction.

In the present embodiment, the terminaloptical element13 does not substantially move. Thefirst member21K also does not substantially move.

Thesecond member22K is movable below at least a portion of thefirst member21K. Thesecond member22K is movable between thefirst member21K and the substrate P (object).

Thesecond member22K moves in the XY plane, and thus, the size of the gap between theouter surface29K of thefirst member21K and theinner surface30K of thesecond member22K is changed. In other words, thesecond member22K moves in the XY plane, and thus, the size of the space between theouter surface29K and theinner surface30K is changed. For example, according to the movement of thesecond member22K in the −X axis direction, the size of the gap between theouter surface29K and theinner surface30K is decreased (the space between theouter surface29K and theinner surface30K is decreased) at the +X side with respect to the terminaloptical element13. According to the movement of thesecond member22K in the +X axis direction, the size of the gap between theouter surface29K and theinner surface30K is increased (the space between theouter surface29K and theinner surface30K is increased) at the +X side with respect to the terminaloptical element13.

In the present embodiment, a movable range of thesecond member22K is determined so that thefirst member21K (outer surface29K) and thesecond member22K (inner surface30K) do not contact each other.

Theliquid immersion member5K includes aliquid supply part31K which supplies the liquid LQ to form the liquid immersion space LS. Theliquid supply part31K is disposed at thefirst member21K.

Moreover, theliquid supply part31K may be disposed at both of thefirst member21K and thesecond member22K. In addition, theliquid supply part31K may be disposed at thefirst member21K and may not be disposed at thesecond member22K. In addition, theliquid supply part31K may be disposed at thesecond member22K and may not be disposed at thefirst member21K. Moreover, theliquid supply part31K may be disposed at members other than thefirst member21K and thesecond member22K.

Theliquid supply part31K is disposed inside thefluid recovery part24K and thefluid recovery part27K in the radial direction with respect to the optical path K (the optical axis of the terminal optical element13). In the present embodiment, theliquid supply part31K includes an opening (liquid supply port) which is disposed at theinner surface28K of thefirst member21K. Theliquid supply part31K is disposed to be opposite to theside surface131. Theliquid supply part31K supplies the liquid LQ to the space SP7 between theside surface131 and theinner surface28K. In the present embodiment, theliquid supply part31K is disposed at each of the +X side and the −X side with respect to the optical path K (terminal optical element13).

Moreover, theliquid supply part31K may be disposed at the Y axis direction with respect to the optical path K (terminal optical element13), and the plurality of liquid supply parts may be disposed at the surrounding of the optical path K (terminal optical element13) which includes the X axis direction and the Y axis direction. Oneliquid supply part31K may be provided. In addition, instead of theliquid supply part31K or in addition to theliquid supply part31K, a liquid supply part which is able to supply the liquid LQ may be provided at thelower surface23K.

In the present embodiment, the liquid supply part (liquid supply port)31K is connected to a liquid supply apparatus31SK via a supply channel31RK which is formed in the inner portion of thefirst member21K. The liquid supply apparatus31SK is able to supply the cleaned liquid LQ, in which the temperature is adjusted, to theliquid supply part31K. In order to form the liquid immersion space LS, theliquid supply part31K supplies the liquid LQ from the liquid supply apparatus31SK.

Anopening40K is formed between the inner edge of thelower surface23K and theupper surface25K. The optical path space SPK which includes the optical path K between the emittingsurface12 and the substrate P (object), and the space SPK5 between thelower surface23K and theupper surface25K are connected to each other via theopening40K. In the present embodiment, the optical path space SPK includes the space between the emittingsurface12 and the substrate P (object) and the space between the emittingsurface12 and theupper surface25K. Theopening40K is disposed so as to face the optical path K. The space SP7 between theside surface131 and theinner surface28K, and the space SP5 are connected to each other via theopening40K.

At least a portion of the liquid LQ from theliquid supply part31K is supplied to the space SP5 between thelower surface23K and theupper surface25K via theopening40K. At least a portion of the liquid LQ, which is supplied from theliquid supply part31K to form the liquid immersion space LS, is supplied to the substrate P (object) opposite to the emittingsurface12 via theopening34K and theopening35K. Accordingly, the optical path K is filled with the liquid LQ. At least a portion of the liquid LQ from theliquid supply part31K is supplied to the space SP6 between thelower surface26K and the upper surface of the substrate P (object).

Thefluid recovery part24K is disposed outside thelower surface23K with respect to the optical path K (with respect to an optical axis of the terminal optical element13). Thefluid recovery part24K is disposed at the surrounding of thelower surface23K. Thefluid recovery part24K is disposed at the surrounding of the optical path K of the exposure light EL. Moreover, thefluid recovery part24K may be disposed at a portion of the surrounding of thelower surface23K. For example, a plurality of thefluid recovery parts24K may be disposed at the surrounding of thelower surface23K. Thefluid recovery part24K is disposed to face the space SP5. Thefluid recovery part24K recovers the liquid LQ from the space SP5.

Thefluid recovery part27K is disposed outside thelower surface26K with respect to the optical path K (with respect to the optical axis of the terminal optical element13). Thefluid recovery part27K is disposed at the surrounding of thelower surface26K. Thefluid recovery part27K is disposed at the surrounding of the optical path K of the exposure light EL. Moreover, thefluid recovery part27K may be disposed at a portion of the surrounding of thelower surface26K. For example, a plurality of thefluid recovery parts27K may be disposed at the surrounding of thelower surface26K. Thefluid recovery part27K is disposed to face the space SP6. Thefluid recovery part27K recovers the liquid LQ from the space SP6.

Thefluid recovery part27K is disposed outside thefirst member21K with respect to the optical path K (the optical axis of the terminal optical element13). Thefluid recovery part27K is disposed outside the space SP5 with respect to the optical path K (the optical axis of the terminal optical element13).

In the present embodiment, movement of the liquid LQ from one of the space SP5 at theupper surface25 side and the space SP6 at thelower surface26 side to the other is suppressed. The space SP5 and the second space SP6 are partitioned by thesecond member22K. The liquid LQ in the space SP5 is able to move to the space SP6 via theopening35K. The liquid LQ in the space SP5 is not able to move to the space SP6 without going through theopening35K. The liquid LQ, which exists in the space SP5 outside than theopening35K with respect to the optical path K, is not able to move to the space SP6. The liquid LQ in the space SP6 is able to move to the space SP5 via theopening35K. The liquid LQ in the space SP6 is not able to move to the space SP5 without going through theopening35K. The liquid LQ, which exists in the space SP6 outside than theopening35K with respect to the optical path K, is not able to move to the space SP5. That is, in the present embodiment, theliquid immersion member5K does not have a channel which fluidly connects the space SP5 and the space SP6, other than theopening35K.

In the present embodiment, thefluid recovery part27K recovers the liquid LQ from the space SP6 and does not recover the liquid LQ in the space SP5. Thefluid recovery part24K recovers the liquid LQ from the space SP5 and does not recover the liquid LQ in the space SP6.

Moreover, the liquid LQ, which has moved to the outside (outside theouter surface29K) of the space SP5 with respect to the optical path K, is prevented from moving to the substrate P (the space SP5) due to theinner surface30K.

Thefluid recovery part24 includes an opening (fluid recovery port) which is disposed at at least a portion of the surrounding of thelower surface23K of thefirst member21K. Thefluid recovery part24K is disposed to be opposite to theupper surface25K. Thefluid recovery part24K is connected to a liquid recovery apparatus24CK via a recovery channel (space)24RK which is formed in the inner portion of thefirst member21K. The liquid recovery apparatus24CK is able to connect thefluid recovery part24K and a vacuum system (not shown). Thefluid recovery part24K is able to recover the liquid L from the space SP5. At least a portion of the liquid LQ in the space SP5 is able to flow into the recovery channel24RK via thefluid recovery part24K.

In the present embodiment, thefluid recovery part24 includes a porous member, and the fluid recovery port includes holes of the porous member. In the present embodiment, the porous member includes a mesh plate. Thefluid recovery part24 recovers the liquid LQ via the holes of the porous member. The liquid LQ in the space SP5 recovered from thefluid recovery part24K (holes of the porous member) flows into the recovery channel24R, flows through the recovery channel24RK, and is recovered by the liquid recovery apparatus24CK.

Thefluid recovery part27K includes an opening (fluid recovery port) which is disposed at at least a portion of the surrounding of thelower surface26K of thesecond member22K. Thefluid recovery part27K is disposed to be opposite to the upper surface of the substrate P (object). Thefluid recovery part27K is connected to a liquid recovery apparatus27CK via a recovery channel (space)27RK which is formed in the inner portion of thesecond member22K. The liquid recovery apparatus27CK is able to connect thefluid recovery part27K and the vacuum system (not shown). Thefluid recovery part27K is able to recover at least a portion of the liquid LQ in the second space SP6. At least a portion of the liquid LQ in the second space SP6 is able to flow into the recovery channel27RK via thefluid recovery part27K. Accordingly, thefluid recovery part27K may be also referred to as aliquid recovery part27K.

In the present embodiment, thefluid recovery part27K includes a porous member, and the fluid recovery port includes holes of the porous member. In the present embodiment, the porous member includes a mesh plate. Theliquid recovery part27K recovers the fluid (one or both of the liquid LQ and the gas) via the holes of the porous member. The liquid LQ in the space SP6 recovered from thefluid recovery part27K (holes of the porous member) flows into the recovery channel27RK, flows through the recovery channel27KR, and is recovered by the liquid recovery apparatus27CK.

The recovery channel27RK is disposed outside theinner surface30K with respect to the optical path K (the optical axis of the terminal optical element13). The recovery channel27RK is disposed above theliquid recovery part27K. According to the movement of thesecond member22K, thefluid recovery part27K and the recovery channel27RK of thesecond member22K move outside of theouter surface29K of thefirst member21K.

The gas is recovered via thefluid recovery part27K along with the liquid LQ. In addition, the porous member may not be provided at thesecond member22K.

That is, the fluid (one or both of liquid LQ and gas) in the space SP6 may be recovered without going through the porous member.

In the present embodiment, since the recovery operation of the liquid LQ from thefluid recovery part27K is performed in parallel with the supply operation of the liquid LQ from theliquid supply part31K, the liquid immersion space LS is formed between the terminaloptical element13 and theliquid immersion member5K at one side and the substrate P (object) at the another side, by the liquid LQ.

Moreover, in the present embodiment, the recovery operation of the fluid from thefluid recovery part24K is performed in parallel with the supply operation of the liquid LQ from theliquid supply part31K and the recovery operation of the fluid from thefluid recovery part27K.

In present embodiment, the interface LG5 of the liquid LQ in the liquid immersion space LS is formed between thefirst member21K and thesecond member22K. The interface LG6 of the liquid LQ in the liquid immersion space LS is formed between thesecond member22K and the substrate P (object). The interface LG7 of the liquid LQ in the liquid immersion space LS is formed between the terminaloptical element13 and thefirst member21.

In the present embodiment, thesecond member22K includes agas supply part61K which supplies the gas G to at least a portion of the surrounding of the liquid immersion space LS. The substrate P (object) is able to be opposite to thegas supply part61K. Thegas supply part61K is disposed to be opposite to the substrate P (object). Thegas supply part61K is disposed outside thefluid recovery part27K with respect to the optical path K (the center of the opening35). Thegas supply part61K is disposed at at least a portion of the surrounding of thefluid recovery part27K. A plurality of thefluid recovery parts27K are provided at thesecond member22K, and includes openings (gas supply ports) which are able to supply the gas G. As shown inFIG. 26, in the present embodiment, a plurality of thegas supply parts61K are disposed to surround the optical path K (the center of theopening35K) outside of thefluid recovery part27K with respect to the optical path K (the center of theopening35K).

Thegas supply part61K is connected to a gas supply apparatus61SK via a supply channel61RK (space) which is formed in the inner portion of thesecond member22K. The gas supply apparatus61SK is able to supply the cleaned gas G in which the temperature is adjusted. In addition, the gas supply apparatus61SK includes a humidity adjustment apparatus which is able to adjust humidity of the supplied gas G, and thus, is able to supply the humidified gas G. The gas G discharged from the gas supply apparatus61SK is supplied to thegas supply part61K via the supply channel61RK. Thegas supply part61K supplies the gas G from the gas supply apparatus61SK to at least a portion of the surrounding of the liquid immersion space LS. In the present embodiment, thegas supply part61K supplies the gas G to at least a portion of the surrounding of the interface LG6 of the liquid LQ.

Next, an example of the operation of theliquid immersion member5K according to the present embodiment will be described. Similar to the above-described embodiments, in the state where the liquid immersion space LS is formed, one or both of thesecond member22 and the substrate P (object) are moved. The gas G is supplied from thegas supply part61K in at least a part of the period in which one or both of thesecond member22 and the substrate P (object) are moved.

Thegas supply part61K supplies the gas G so that the liquid LQ is suppressed from flowing out from the space SP6 between theliquid immersion member5K and the substrate P (object) in the state where the liquid immersion space LS is formed.

FIG. 27 is a schematic view showing an example of a gas supply operation of thegas supply part61K.FIG. 27 is a view of thesecond member22K as seen from the lower surface side. In the present embodiment, a gas supply condition from thegas supply part61K is determined based on one or both of the movement condition of thesecond member22K and the movement condition of the substrate P (object).

For example, when thesecond member22K moves in the +Y axis direction while moving the −X axis direction in the state where the substrate P is stopped, as shown inFIG. 27(A), the liquid immersion space LS moves to the +X side and the −Y side with respect to the center of thesecond member22K in the XY plane. That is, thesecond member22K and the liquid immersion space LS relatively move so that the interface LG6 of the liquid LQ approaches the edges at the +X side and the −Y side of thesecond member22K. In order words, thesecond member22K and the liquid immersion space LS relatively move so that the liquid LQ flows out from the edges at the +X side and the −Y side of thesecond member22K. Moreover, for example, when the substrate P (object) moves in the −Y axis direction while moving the +X axis direction in the state where thesecond member22 is stopped, as shown inFIG. 27(A), the relative position between thesecond member22K and the liquid immersion space LS is changed.

In addition, for example, when thesecond member22K moves in the −Y axis direction while moving the +X axis direction in the state where the substrate P stops, as shown inFIG. 27(B), the liquid immersion space LS moves to the −X side and the +Y side with respect to the center of thesecond member22K in the XY plane. That is, thesecond member22K and the liquid immersion space LS relatively move so that the interface LG6 of the liquid LQ approaches the edges at the −X side and the +Y side of thesecond member22K. In order words, thesecond member22K and the liquid immersion space LS relatively move so that the liquid LQ flows out from the edges of the −X side and the +Y side of thesecond member22K. Moreover, for example, when the substrate P (object) moves in the +Y axis direction while moving the −X axis direction in the state where thesecond member22 is stopped, as shown inFIG. 27(B), the relative position between thesecond member22K and the liquid immersion space LS is changed.

That is, based on the movement direction of thesecond member22K in the XY plane, at least one of the flowing-out position and the flowing-out direction of the liquid LQ from the space SP6 between theliquid immersion member5K and the substrate P (object) is changed. Moreover, based on the movement direction of the substrate P (object) in the XY plane, at least one of the flowing-out position and the flowing-out direction of the liquid LQ from the space SP6 between theliquid immersion member5K and the substrate P (object) is changed.

In addition, based on the movement locus of thesecond member22K in the XY plane, at least one of the flowing-out position and the flowing-out direction of the liquid LQ from the space SP6 between theliquid immersion member5K and the substrate P (object) is changed. Moreover, based on the movement locus of the substrate P (object) in the XY plane, at least one of the flowing-out position and the flowing-out direction of the liquid LQ from the space SP6 between theliquid immersion member5K and the substrate P (object) is changed.

In addition, based on the movement speed or the acceleration of thesecond member22K in the XY plane, at least one of the flowing-out position, the flowing-out direction, and the flowing-out amount of the liquid LQ from the space SP6 between theliquid immersion member5K and the substrate P (object) is changed. Moreover, based on the movement speed or the acceleration of the substrate P (object) in the XY plane, at least one of the flowing-out position, the flowing-out direction, and the flowing-out amount of the liquid LQ from the space SP6 between theliquid immersion member5K and the substrate P (object) is changed.

That is, based on one or both of the movement condition of thesecond member22K and the movement condition of the substrate P (object), at least one of the flowing-out position, the flowing-out direction, and the flowing-out amount of the liquid LQ from the space SP6 between theliquid immersion member5K and the substrate P (object) is determined. The movement condition of thesecond member22K includes at least one of the movement speed, the acceleration, the movement direction, and the movement locus of thesecond member22K. The movement condition of the substrate P (object) includes at least one of the movement speed, the acceleration, the movement direction, and the movement locus of the substrate P (object).

Accordingly, the controller6 is able to presume (estimate) at least one of the flowing-out position, the flowing-out direction, and the flowing-out amount of the liquid LQ from the space SP6 between theliquid immersion member5K and the substrate P (object) based on one or both of the movement condition of the second member2K and the movement condition of the substrate P (object).

The movement condition of the second member2K and the movement condition of the substrate P (object) are defined by the exposure recipe (exposure control information). That is, the movement condition of the second member2K and the movement condition of the substrate P (object) are known information. Therefore, the controller6 is able to presume (estimate) at least one of the flowing-out position, the flowing-out direction, and the flowing-out amount of the liquid LQ from the space SP6 between theliquid immersion member5K and the substrate P (object) based on one or both of the movement condition of the second member2K and the movement condition of the substrate P (object) which are the known information.

For example, based on one or both of the movement condition of the second member2K and the movement condition of the substrate P (object), at least one of the flowing-out position, the flowing-out direction, and the flowing-out amount of the liquid LQ is able to be obtained by simulation, or by experiment. That is, a relationship between one or both of the movement condition of the second member2K and the movement condition of the substrate P (object) and at least one of the flowing-out position, the flowing-out direction, and the flowing-out amount of the liquid LQ is able to be obtained in advance by simulation or experiment. The information is stored in the storage apparatus7. Based on the information of the storage apparatus7, and one or both of the movement condition of the second member2K and the movement condition of the substrate P (object) which are determined by the exposure recipe, the controller6 is able to obtain (presume) at least one of the flowing-out position, the flowing-out direction, and the flowing-out amount of the liquid LQ from the space SP6.

Based on information related to at least one of the flowing-out position, the flowing-out direction, and the flowing-out amount of the liquid LQ from the space SP6 between theliquid immersion member5 and the substrate P (object) which are presumed by one or both of the movement condition of thesecond member22 and the movement condition of the substrate P (object), the controller6 determines the gas supply condition of thegas supply part61K.

For example, as shown inFIG. 27(A), when one or both of thesecond member22K and the substrate P (object) move so that the liquid LQ flows out from edges at the +X side and the −Y side of thesecond member22K, the controller6 determines the gas supply condition of each of the plurality ofgas supply parts61K so that the liquid LQ is suppressed from flowing out. In the example shown inFIG. 27(A), the gas G is supplied from thegas supply parts61K which are disposed at the edges at the +X side and the −Y side of thesecond member22K among the plurality ofgas supply parts61K. In addition, as shown inFIG. 27(B), when one or both of thesecond member22K and the substrate P (object) move so that the liquid LQ flows out from the edges at the −X side and +Y side of thesecond member22K, the controller6 supplies the gas G from thegas supply parts61K disposed at the edges at the −X side and the +Y side of thesecond member22K among the plurality ofgas supply parts61K so that the liquid LQ is prevented from flowing out.

In addition, the controller6 may determine at least one of the supply direction, the supply range, the flow rate of the supplied gas G, and the presence or the absence of the gas supply from thegas supply part61K, as the gas supply condition of thegas supply part61K so that the flowing-out of the liquid LQ is suppressed.

In addition, a gas supply member, in which thegas supply part61K is provided, may be disposed at a member different from theliquid immersion member5K (second member22K). The gas supply member may move based on the movement condition of thesecond member22K so that the gas supply member does not contact thesecond member22K. The controller6 may determine the position of thegas supply part61K (gas supply member) so that the liquid LQ is prevented from flowing out, based on one or both of the movement condition of thesecond member22K and the movement condition of the substrate P (object).

As described above, also in the present embodiment, the liquid LQ is able to be prevented from flowing out. Accordingly, occurrence of exposure failure and occurrence of a defective device are able to be prevented.

Moreover, in the present embodiment, as shown inFIG. 28, thelower surface26K and thefluid recovery part27K may be disposed at substantially the same plane.

In addition, in the above-described eleventh embodiment, as shown inFIG. 29, at least a portion of thefirst member21K may be opposite to the emittingsurface12 of the terminaloptical element13. That is, a portion of thefirst member21K may be disposed between the emittingsurface12 and the upper surface of the substrate P (object).

In the example shown inFIG. 29, thefirst member21K includes anupper surface44K which is disposed at the surrounding of theopening34K. Theupper surface44K is disposed at the surrounding of the upper end of theopening34K. Moreover, in the example shown inFIG. 29, a portion of theupper surface25K of thesecond member22K also is opposite to the emittingsurface12.

In addition, in each of the above-described embodiments, as shown inFIG. 29, a liquid supply part (liquid supply port)3100 may be provided to face the space SP5. In the example shown inFIG. 29, in theliquid supply part3100, thelower surface23K of thefirst member21K is disposed to face the space SP5. Moreover, theliquid supply part3100 may be disposed at theupper surface25K of thesecond member22K to face the space SP5.

For example, the liquid LQ is supplied from theliquid supply part3100, and thus, even when the liquid LQ which is supplied from theliquid supply part31K facing the space SP7 does not flow in the space SP5, the space SP5 is filled with the liquid LQ.

In addition, in above-described eleventh embodiment, thesecond member22K may not be opposite to the emittingsurface12. That is, thesecond member22K may not be disposed between the emittingsurface12 and the upper surface of the substrate P (object). For example, as shown inFIG. 30, thelower surface23K of thefirst member21K may be disposed at more +Z side than the emittingsurface12. In addition, the position (height) of thelower surface23K of thefirst member21K with respect to the Z axis direction may be substantially the same as the position (height) of the emittingsurface12. Thelower surface23K of thefirst member21K may be disposed at more −Z side than the emitting surface12K.

Moreover, in each of the above-described embodiments, the size of the gap between the upper surface of the substrate P (object) and the emittingsurface12 may be substantially the same as the size of the gap between the upper surface of the substrate P and the lower surface of the second member (22 or the like).

Moreover, in each of the above-described embodiments, the size of the gap between the upper surface of the substrate P (object) and the emittingsurface12 may be smaller than the size of the gap between the upper surface of the substrate P and the lower surface of the second member (22 or the like).

In addition, in each of the above-described embodiments, a suction port, which sucks at least one of the liquid LQ and the gas from the space between the first member (21 or the like) and the terminaloptical element13, may be provided at thefirst member21.

In addition, in each of the above-described embodiments, the first member (21 or the like) may not have an annular shape. For example, thefirst member21 may be disposed at a portion of the surrounding of the terminal optical element13 (optical path K). For example, the plurality offirst members21 may be disposed at the surrounding of the terminal optical element13 (optical path K).

Moreover, in each of the above-described embodiments, the controller6 includes a computer system which includes a CPU or the like. In addition, the controller6 includes an interface which is able to perform communication with a computer system and an external apparatus. For example, the storage apparatus7 includes a memory such as a RAM, a hard disk, and a recording medium such as a CD-ROM. In the storage apparatus7, an operating system (OS) which controls the computer system is installed and a program used to control the exposure apparatus EX is stored.

Moreover, an input apparatus which is able to input signals may be connected to the controller6. The input apparatus includes input equipment such as a keyboard or a mouse, a communication apparatus or the like which is able to input data from the external apparatus, and the like. Moreover, a display apparatus such as a liquid crystal display may be also provided.

The controller (computer system)6 is able to read various information which includes the programs which are recorded in the storage apparatus7. Programs are recorded in the storage apparatus7, and the programs make the controller6 perform the control of the liquid immersion exposure apparatus which exposes the substrate by the exposure light via the liquid filled in the optical path of the exposure light between the emitting surface of the optical member from which the exposure light is emitted and the substrate.

Moreover, according to the above-described embodiments, the programs which are recorded in the storage apparatus7 may make the controller6 perform: forming a liquid immersion space of the liquid on a surface of the substrate by using a liquid immersion member that includes a first member and a second member, the first member including a first part disposed at surrounding of an optical path of the exposure light, a first opening part, through which the exposure light is able to pass, and a first liquid supply part being provided at the first part of the first member, the first liquid supply part being disposed at at least surrounding of the first opening part and being capable of opposing the surface of the substrate, the second member including a first liquid recovery part which is capable of opposing the surface of the substrate and being movable with respect to the first member outside the first part with respect to the optical path; exposing the substrate by the exposure light emitted from the emitting surface via the liquid of the liquid immersion space; and moving the second member with respect to the first member in at least a portion of exposure of the substrate.

Moreover, according to the above-described embodiments, the programs which are recorded in the storage apparatus7 may make the controller6 perform: forming a liquid immersion space of the liquid on a surface of the substrate by using a liquid immersion member that includes a first member and a second member, the first member including a first part disposed at surrounding of an optical path of exposure light, a first opening part, through which the exposure light is able to pass, being provided at the first part of the first member, the second member including a first liquid recovery part and a first gas supply part and being movable with respect to the first member outside the first part with respect to the optical path, the first liquid recovery part being capable of opposing the surface of the object, the first gas supply part being disposed outside the first liquid recovery part in a radial direction with respect to an optical axis of an optical member and being capable of opposing the surface of the object; exposing the substrate by the exposure light emitted from the emitting surface via the liquid of the liquid immersion space; and moving the second member with respect to the first member in at least a portion of exposure of the substrate.

Moreover, according to the above-described embodiments, the programs which are recorded in the storage apparatus7 may make the controller6 perform: forming a liquid immersion space of the liquid on a surface of the substrate by using a liquid immersion member that includes a first member and a second member, the first member including a first part disposed at surrounding of an optical path of the exposure light, a first opening part, through which the exposure light is able to pass, being provided at the first part of the first member, the second member including a first liquid recovery part and a second liquid supply part and being movable with respect to the first member outside the first part with respect to the optical path, the first liquid recovery part being capable of opposing the surface of the object, the second liquid supply part being disposed between the optical path and the first liquid recovery part in a radial direction with respect to an optical axis of the optical member and being capable of opposing the surface of the object; exposing the substrate by the exposure light emitted from the emitting surface via the liquid of the liquid immersion space; and moving the second member with respect to the first member in at least a portion of exposure of the substrate.

In addition, according to the above-described embodiments, the programs which are recorded in the storage apparatus7 may make the controller6 perform: forming a liquid immersion space of the liquid on a surface of the substrate by using a liquid immersion member that includes a first member, a second member, and a second liquid recovery part, the first member including a first part disposed at surrounding of an optical path of the exposure light, a first opening part, through which the exposure light is able to pass, being provided at the first part of the first member, the second member including a first liquid recovery part and being movable with respect to the first member outside the first part with respect to the optical path, the first liquid recovery part being capable of opposing a surface of the object, the second liquid recovery part being disposed at the first member and being capable of recovering at least a portion of liquid which has flowed in a gap between the first member and the second member from above the object; exposing the substrate by the exposure light emitted from the emitting surface via the liquid of the liquid immersion space; and moving the second member with respect to the first member in at least a portion of exposure of the substrate.

Moreover, according to the above-described embodiments, the programs which are recorded in the storage apparatus7 may make the controller6 perform: forming a liquid immersion space of the liquid on a surface of a substrate by using a liquid immersion member that includes a first member, a second member, and a second liquid recovery part, wherein a gap between the first member and the second member includes a first gap part having a first size, and a second gap part which is disposed outside the first gap part with respect to the optical axis of the optical member and has a second size smaller than the first size, and the second liquid recovery part is capable of recovering liquid from the first gap part, the first member including a first part disposed at surrounding of an optical path of the exposure light, a first opening part, through which the exposure light is able to pass, being provided at the first part of the first member, the second member including a first liquid recovery part which is capable of opposing a surface of the object and being movable with respect to the first member outside the first part with respect to the optical path, the second liquid recovery part being capable of recovering at least a portion of liquid which has flowed in the gap between the first member and the second member from above the object; exposing the substrate by the exposure light emitted from the emitting surface via the liquid of the liquid immersion space; and moving the second member with respect to the first member in at least a portion of exposure of the substrate.

Moreover, according to the above-described embodiments, the programs which are recorded in the storage apparatus7 may make the controller6 perform: forming a liquid immersion space of the liquid on a substrate which is movable below the optical member by using a first liquid immersion member that includes a first member and a second member. the first member being disposed at at least a portion of surrounding of an optical path of the exposure light, the second member being disposed so that at least a portion of the second member is capable of opposing the object below the first member and being movable with respect to the first member; exposing the substrate by the exposure light emitted from the emitting surface via the liquid of the liquid immersion space; moving the second member with respect to the first member in at least a portion of the exposure of the substrate; and supplying gas from a gas supply part to at least a portion of surrounding of the liquid immersion space.

The programs which are stored in the storage apparatus7 are read by the controller6, and thus, various apparatuses of the exposure apparatus EX such as the substrate stage2, the measurement stage3, and theliquid immersion member5 cooperate with one another and perform various processing such as the liquid immersion exposure of the substrate P in the state where the liquid immersion space LS is formed.

Moreover, in each of the above-described embodiments, the optical path K on the emittingsurface12 side (image surface side) of the terminaloptical element13 of the projection optical system PL is filled with the liquid LQ. However, for example, the projection optical system PL may be the projection optical system in which the optical path of the incident side (object surface side) at the terminaloptical element13 is also filled with the liquid LQ as disclosed in PCT International Publication No. WO 2004/019128.

In addition, in each of the above-described embodiments, the liquid LQ is water. However, the liquid may be liquid other than the water. Preferably, the liquid LQ is transparent with respect to the exposure light EL, has a high refractive index with respect to the exposure light EL, and is stable with respect to the projection optical system PL or the film of a photosensitive material (photoresist) which forms the surface of the substrate P or the like. For example, the liquid LQ may be fluorinated liquid such as hydrofluoroether (HFE), perfluorinated polyether (PFPE), and Fomblin® oil. Moreover, the liquid LQ may be various fluids, for example, supercritical liquid.

Moreover, in each of the above-described embodiment, the substrate P includes a semiconductor wafer used to manufacture a semiconductor device. However, for example, the substrate P include a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, a mask or an original plate (synthetic quartz, silicon wafer) of a reticle which is used in an exposure apparatus, or the like.

Moreover, in each of the above-described embodiments, the exposure apparatus EX is a scanning type exposure apparatus (scanning stepper) of a step-and-scan system in which the mask M and the substrate P synchronously move and the patterns of the mask M are scanned and exposed. However, for example, the exposure apparatus EX may be a projection exposure apparatus (stepper) of a step-and-repeat system in which patterns of the mask M are collectively exposed in a state where the mask M and the substrate P are stationary and the substrate P is sequentially step-moved.

In addition, the exposure apparatus EX may be an exposure apparatus (a collective exposure apparatus of a stitch system) in which, in the exposure of a step-and-repeat system, after the reduced image of a first pattern is transferred on the substrate P using the projection optical system in a state where the first pattern and the substrate P are substantially stationary, the reduced image of a second pattern is partially overlapped with the first pattern using the projection optical system and is collectively exposed on the substrate P in a state where the second pattern and the substrate P are substantially stationary. Moreover, the exposure apparatus of the stitch system may be an exposure apparatus of a step-and-stitch system in which at least two patterns are partially overlapped on the substrate P and transferred thereto, and the substrate P is sequentially moved.

In addition, for example, the exposure apparatus EX may be an exposure apparatus in which patterns of two masks are combined on the substrate via the projection optical system and one shot region on the substrate is approximately simultaneously double-exposed by single scanning exposure, as disclosed in U.S. Pat. No. 6,611,316. Moreover, the exposure apparatus EX may be an exposure apparatus of a proximity system, a mirror projection aligner, or the like.

In addition, in each of the above-described embodiments, the exposure apparatus EX may be an exposure apparatus of a twin stage type which includes a plurality of substrate stages, as disclosed in U.S. Pat. No. 6,341,007, U.S. Pat. No. 6,208,407, U.S. Pat. No. 6,262,796, or the like. For example, as shown inFIG. 31, when the exposure apparatus EX includes twosubstrate stages2001 and2002, the object which is capable of being disposed so as to be opposite to the emittingsurface12 includes at least one of one substrate stage, a substrate which is held by a first holding part of the one substrate stage, another substrate stage, and a substrate which is held by a first holding part of another substrate stage.

Moreover, the exposure apparatus EX may be an exposure apparatus which includes the plurality of substrate stages and measurement stages.

The exposure apparatus EX may be an exposure apparatus used to manufacture a semiconductor element which exposes a semiconductor element pattern on the substrate P, an exposure apparatus used to manufacture a liquid crystal display element or a display, or an exposure apparatus used to manufacture a thin film magnetic head, an imaging element (CCD), a micromachine, a MEMS, a DNA chip, or a reticle or mask, or the like.

Moreover, in each of the above-described embodiments, the light transmission type mask is used in which a predetermined light shielding pattern (or a phase pattern, a dimming pattern) is formed on the substrate having light transparency. However, instead of this mask, for example, as disclosed in U.S. Pat. No. 6,778,257, a variable molding mask (also referred to as an electronic mask, an active mask, or an image generator) may be used which forms a transparent pattern, a reflective pattern, or a light-emitting pattern based on electronic data of the pattern to be exposed. In addition, instead of the variable molding masks which include a non-light emission type image display element, a pattern-forming apparatus which includes a self light-emission type image display element may be provided.

In each of the above-described embodiments, the exposure apparatus EX includes the projection optical system PL. However, the components in each of the above-described embodiments may be applied to an exposure apparatus and an exposing method which do not use the projection optical system PL. For example, the components in each of the above-described embodiments may be applied to an exposure apparatus and an exposing method in which the liquid immersion space is formed between an optical member such as a lens and the substrate and the exposure light is radiated to the substrate via the optical member.

Moreover, for example, the exposure apparatus EX may be an exposure apparatus (a lithography system) in which interference fringes are formed on the substrate P, and thus, a line-and-space pattern is exposed on the substrate P, as disclosed in PCT International Publication No. WO 2001/035168.

The exposure apparatuses EX of the above-described embodiments are manufactured by assembling various subsystems including each above-described component so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. In order to secure the various accuracies, before and after the assembly, adjustment for achieving optical accuracy with respect to various optical systems, adjustment for achieving mechanical accuracy with respect to various mechanical systems, and adjustment for achieving electrical accuracy with respect to various electrical systems are performed. The process of assembling the exposure apparatus from various subsystems includes mechanical connections, wiring connections of electric circuits, piping connections of air-pressure circuits, or the like between various subsystems. Of course, the respective assembly processes of each subsystem are needed before the assembly process from various subsystems to the exposure apparatus. After the assembly process of exposure apparatus by various subsystems is terminated, a general adjustment is performed, and thus, various accuracies in the overall exposure apparatus are secured. Moreover, preferably, the manufacturing of the exposure apparatus is performed in a clean room in which temperature, a degree of cleanness, or the like is controlled.

As shown inFIG. 32, a micro-device such as a semiconductor device is manufactured through astep201 in which the function and performance design of the micro-device is performed, astep202 in which a mask (reticle) is manufactured based on the design step, astep203 in which a substrate which is a base material of the device is manufactured, asubstrate processing step204 which includes the substrate processing (exposure processing) including exposing the substrate by the exposure light from the pattern of the mask and developing the exposed substrate according to the above-described embodiments, a device assembly step (which includes manufacturing processes such as a dicing process, a bonding process, and a package process)205, aninspection step206, or the like.

Moreover, the aspects of each of the above-described embodiments may be appropriately combined. In addition, some components may not be used. Moreover, as long as legally permitted, the disclosures of all publications and United States Patents with respect to the exposure apparatuses or the like cited in each of the above-mentioned embodiments and modifications are incorporated in the disclosures of the present application.

Claims (33)

What is claimed is:

1. A liquid immersion exposure apparatus comprising:

a projection system having an optical member via which exposure light is projected; and

a liquid immersion member which forms a liquid immersion space on a surface of an object disposed opposite to an emitting surface of the optical member,

wherein:

the liquid immersion member includes (i) a first member that has a first liquid supply port and a first opening through which the exposure light is projected, (ii) a second member that has a first liquid recovery port facing downwardly and that is movable with respect to the first member, and (iii) a gas supply port arranged radially outward of the first liquid recovery port with respect to a path of the exposure light,

the first liquid supply port faces an outer surface of the optical member,

the first liquid recovery port has a plurality of openings disposed in a four-sided shape to surround the first opening of the first member,

the second member is movable relative to the first member in a direction perpendicular to an optical axis of the optical member so that a relative speed between the second member and the object is different than a relative speed between the first member and the object, while recovering liquid in a gap between the second member and the object via the first liquid recovery port of the second member,

the first member has a second liquid recovery port, and

the second liquid recovery port faces the outer surface of the optical member.

2. The exposure apparatus according toclaim 1, wherein:

the first liquid supply port is provided on a first side of the optical member, and

the second liquid recovery port is provided on a second side of the optical member, the second side opposite the first side.

3. The exposure apparatus according toclaim 1, further comprising:

a movable stage configured to hold the object and which moves in the direction perpendicular to the optical axis of the optical member while the exposure light is projected onto a surface of the object by the optical member,

wherein the second member is movable in a same direction in which the movable stage is moved so that the relative speed between the second member and the object is smaller than the relative speed between the first member and the object.

4. The exposure apparatus according toclaim 1, wherein

each of the four sides of the four-sided shape are curved.

5. The exposure apparatus according toclaim 4, wherein

the four-sided shape has four corners,

first and second corners of the four corners are opposite each other and are spaced from each other in a direction perpendicular to a moving direction in which the object is moved during exposure of the object to the exposure light, and

third and fourth corners of the four corners are opposite each other and are spaced from each other in a direction parallel to the moving direction in which the object is moved during the exposure of the object to the exposure light.

6. The exposure apparatus according toclaim 1, wherein

the four-sided shape has four corners,

first and second corners of the four corners are opposite each other and are spaced from each other in a direction perpendicular to a moving direction in which the object is moved during exposure of the object to the exposure light, and

third and fourth corners of the four corners are opposite each other and are spaced from each other in a direction parallel to the moving direction in which the object is moved during the exposure of the object to the exposure light.

7. A method of manufacturing a device, the method comprising:

exposing a substrate to exposure light using the exposure apparatus ofclaim 1; and

developing the exposed substrate.

8. The exposure apparatus according toclaim 1, wherein the second member has the gas supply port.

9. The exposure apparatus according toclaim 1, wherein the gas supply port faces downwardly.

10. The exposure apparatus according toclaim 1, wherein:

the object is a substrate to be exposed, and

the substrate is exposed with the exposure light via liquid in the liquid immersion space covering a portion of an upper surface of the substrate.

11. The exposure apparatus according toclaim 1, wherein the second member has a plurality of supply openings facing downwardly via which liquid is supplied, the plurality of supply openings being arranged radially inward of the plurality of recovery openings with respect to the path of the exposure light.

12. The exposure apparatus according toclaim 11, wherein the second member has a second opening through which the exposure light is projected and the plurality of supply openings are arranged between the second opening and the plurality of recovery openings.

13. The exposure apparatus according toclaim 1, wherein the first member has a plurality of supply openings facing downwardly via which liquid is supplied, the plurality of supply openings being arranged radially outward of the first opening.

14. The exposure apparatus according toclaim 1, further comprising a third liquid recovery port via which liquid is recovered from a space between the first and second members.

15. The exposure apparatus according toclaim 1, wherein the first member has a lower portion around the first opening, the lower portion of the first member being below the emitting surface of the optical member.

16. The exposure apparatus according toclaim 15, wherein the second member has a lower portion in which the plurality of recovery openings are arranged, the lower portion of the second member being below the emitting surface of the optical member.

17. The exposure apparatus according toclaim 1, wherein the second member has a lower portion in which the plurality of recovery openings are arranged, the lower portion of the second member being below the emitting surface of the optical member.

18. A liquid immersion exposure method comprising:

projecting exposure light onto an object through a projection system having an optical member; and

at least during the projecting, forming a liquid immersion space on a surface of the object while the object is disposed opposite to an emitting surface of the optical member, the liquid immersion space being formed by a liquid immersion member,

wherein:

the liquid immersion member includes (i) a first member that has a first liquid supply port and a first opening through which the exposure light is projected, (ii) a second member that has a first liquid recovery port facing downwardly and that is movable with respect to the first member, and (iii) a gas supply port arranged radially outward of the first liquid recovery port with respect to a path of the exposure light,

the first liquid supply port faces an outer surface of the optical member,

the first liquid recovery port has a plurality of recovery openings disposed in a four-sided shape to surround the first opening of the first member,

the second member is movable relative to the first member in a direction perpendicular to an optical axis of the optical member so that a relative speed between the second member and the object is different than a relative speed between the first member and the object, while recovering liquid in a gap between the second member and the object via the first liquid recovery port of the second member,

the first member has a second liquid recovery port, and

the second liquid recovery port faces the outer surface of the optical member.

19. The exposure method according toclaim 18, wherein:

the first liquid supply port is provided on a first side of the optical member, and

the second liquid recovery port is provided on a second side of the optical member, the second side opposite the first side.

20. The exposure method according toclaim 18, wherein:

the object is held by a movable stage which moves in the direction perpendicular to the optical axis of the optical member while the exposure light is projected onto a surface of the object by the optical member, and

the second member is movable in a same direction in which the movable stage is moved so that the relative speed between the second member and the object is smaller than the relative speed between the first member and the object.

21. The exposure method according toclaim 18, wherein

each of the four sides of the four-sided shape are curved.

22. The exposure method according toclaim 21, wherein

the four-sided shape has four corners,

first and second corners of the four corners are opposite each other and are spaced from each other in a direction perpendicular to a moving direction in which the object is moved during exposure of the object to the exposure light, and

third and fourth corners of the four corners are opposite each other and are spaced from each other in a direction parallel to the moving direction in which the object is moved during the exposure of the object to the exposure light.

23. The exposure method according toclaim 18, wherein

the four-sided shape has four corners,

first and second corners of the four corners are opposite each other and are spaced from each other in a direction perpendicular to a moving direction in which the object is moved during exposure of the object to the exposure light, and

third and fourth corners of the four corners are opposite each other and are spaced from each other in a direction parallel to the moving direction in which the object is moved during the exposure of the object to the exposure light.

24. The exposure method according toclaim 18, wherein the second member has the gas supply port.

25. The exposure method according toclaim 18, wherein the gas supply port faces downwardly.

26. The exposure method according toclaim 18, wherein:

the object is a substrate to be exposed, and

the substrate is exposed with the exposure light via liquid in the liquid immersion space covering a portion of an upper surface of the substrate.

27. The exposure method according toclaim 18, wherein the second member has a plurality of supply openings facing downwardly via which liquid is supplied, the plurality of supply openings being arranged radially inward of the plurality of recovery openings with respect to the path of the exposure light.

28. The exposure method according toclaim 27, wherein the second member has a second opening through which the exposure light is projected and the plurality of supply openings are arranged between the second opening and the plurality of recovery openings.

29. The exposure method according toclaim 18, wherein the first member has a plurality of supply openings facing downwardly via which liquid is supplied, the plurality of supply openings being arranged radially outward of the first opening.

30. The exposure method according toclaim 18, wherein liquid is recovered from a space between the first and second members by a third liquid recovery port.

31. The exposure method according toclaim 18, wherein the first member has a lower portion around the first opening, the lower portion of the first member being below the emitting surface of the optical member.

32. The exposure method according toclaim 31, wherein the second member has a lower portion in which the plurality of recovery openings are arranged, the lower portion of the second member being below the emitting surface of the optical member.

33. The exposure method according toclaim 18, wherein the second member has a lower portion in which the plurality of recovery openings are arranged, the lower portion of the second member being below the emitting surface of the optical member.

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