本發明涉及一種光學元件，特別是指一種可提升反射可見光的均勻度的光學元件及其鍍膜結構。The present invention relates to an optical element, and more particularly to an optical element and a coating structure thereof that can improve the uniformity of reflected visible light.
現有用於濾除可見光且含有氫化矽(SiH)層的濾光元件通常對可見光具有較強的吸收能力，使得某些波段的可見光不會被反射出去(即反射顏色不均勻)，導致濾光元件的入光側在視覺上會有偏向某一種顏色的問題。Existing filters containing silicon hydride (SiH) layers for filtering visible light typically have a strong absorption capacity for visible light, preventing certain wavelengths of visible light from being reflected (i.e., resulting in uneven reflected color). This results in the light incident side of the filter appearing to have a certain color bias.
舉例來說，如圖1所示的現有濾光元件1在基板11上設置有鍍膜結構12，鍍膜結構12是由交錯堆疊在基板11上的氫化矽層13和二氧化矽(SiO2)層14構成，且採用了表一的膜層配置。For example, the conventional filter element 1 shown in FIG1 has a coating structure 12 disposed on a substrate 11. The coating structure 12 is composed of hydrogenated silicon layers 13 and silicon dioxide (SiO2) layers 14 alternately stacked on the substrate 11, and adopts the film layer configuration shown in Table 1.
表一
對表一的鍍膜結構12進行穿透率和反射率的模擬試驗，模擬試驗是在參考光的波長為550nm、參考光的入射角為0度的條件下進行，並獲得如圖2和圖3所示的結果。A simulation test of transmittance and reflectance was conducted on the coating structure 12 in Table 1. The simulation test was conducted under the conditions of a reference light wavelength of 550nm and an incident angle of 0 degrees, and the results shown in Figures 2 and 3 were obtained.
從圖2的曲線C1可知，對應可見光的波段的反射率在高於5%至低於95%的區間中起伏變化。從圖3的曲線C2可知，對應可見光的波段的穿透率竟是趨近於0%。這表示，未穿透濾光元件1的可見光中有部分波段的光(低於波長700 nm的波段的可見光)因被鍍膜結構12吸收而未能被反射出去。因此，濾光元件1的入光側(即最遠離基板11的膜層13朝外的一側)在視覺上會偏向紅色。As can be seen from curve C1 in Figure 2, the reflectivity for the visible light band fluctuates between above 5% and below 95%. Curve C2 in Figure 3 shows that the transmittance for the visible light band approaches 0%. This indicates that some of the visible light that does not penetrate filter element 1 (visible light below a wavelength of 700 nm) is absorbed by coating structure 12 and thus not reflected. Therefore, the light-incident side of filter element 1 (i.e., the side of film layer 13 farthest from substrate 11 facing outward) appears reddish.
為此，本發明的目的是提供一種可提升反射可見光的均勻度的光學元件及其鍍膜結構，其透過介電材料層的設置來解決含有矽的膜層所帶來反射可見光不均勻的問題，藉此讓鍍膜結構的入光側在視覺上不會偏向某一種顏色。Therefore, the present invention aims to provide an optical device and its coating structure that can improve the uniformity of visible light reflection. By incorporating a dielectric material layer, the device solves the problem of uneven visible light reflection caused by silicon-containing films, thereby ensuring that the incident side of the coating structure does not visually favor a particular color.
本發明根據一實施例所提供的一種可提升反射可見光的均勻度的光學元件的鍍膜結構，適於配置在該光學元件的基板上，且包含：多個膜層，包含：一第一膜層組，設在該基板上且包含至少一個第一高折射率材料層和至少一個第一低折射率材料層，該至少一個第一高折射率材料層和該至少一個第一低折射率材料層交錯地堆疊在該基板上，該至少一個第一高折射率材料層為含有矽的材料層；及一第二膜層組，設在該第一膜層組上且包含至少兩個第二高折射率材料層和至少一個第二低折射率材料層，該至少兩個第二高折射率材料層和該至少一個第二低折射率材料層交錯地堆疊在該第一膜層組上，該至少兩個第二高折射率材料層為介電材料層，該至少一個第二低折射率材料層在材質上相同於該至少一個第一低折射率材料層。According to one embodiment of the present invention, a coating structure for an optical element capable of improving the uniformity of reflecting visible light is provided. The coating structure is suitable for being disposed on a substrate of the optical element and comprises: a plurality of film layers, including: a first film layer group disposed on the substrate and comprising at least one first high refractive index material layer and at least one first low refractive index material layer, wherein the at least one first high refractive index material layer and the at least one first low refractive index material layer are alternately stacked on the substrate; The material layer is a material layer containing silicon; and a second film layer group is disposed on the first film layer group and includes at least two second high-refractive-index material layers and at least one second low-refractive-index material layer, wherein the at least two second high-refractive-index material layers and the at least one second low-refractive-index material layer are stacked alternately on the first film layer group, the at least two second high-refractive-index material layers are dielectric material layers, and the at least one second low-refractive-index material layer is materially identical to the at least one first low-refractive-index material layer.
可選擇性地，該鍍膜結構對於可見光的反射率超過95%。Optionally, the coating structure has a reflectivity of greater than 95% for visible light.
本發明根據一實施例提供的一種可提升反射可見光的均勻度的光學元件，其包含一基板和設置在此基板上的一鍍膜結構。此基板例如但不限於是玻璃基板。According to one embodiment, the present invention provides an optical element capable of improving the uniformity of reflected visible light, comprising a substrate and a coating structure disposed on the substrate. The substrate is, for example but not limited to, a glass substrate.
上述的鍍膜結構包含N個膜層，N為大於或等於5的正整數。這N個膜層包含設在基板上的一第一膜層組以及設在第一膜層組上的一第二膜層組。The above-mentioned film coating structure includes N film layers, where N is a positive integer greater than or equal to 5. The N film layers include a first film layer group disposed on the substrate and a second film layer group disposed on the first film layer group.
第一膜層組包含P個第一高折射率材料層和Q個第一低折射率材料層，這P個第一高折射率材料層和這Q個第一低折射率材料層交錯地堆疊在基板上。P為大於或等於1的正整數，Q為大於或等於1的正整數，且2≤P+Q＜N。The first layer set includes P first high-refractive-index material layers and Q first low-refractive-index material layers, which are stacked alternately on the substrate. P is a positive integer greater than or equal to 1, Q is a positive integer greater than or equal to 1, and 2≤P+Q＜N.
第二膜層組包含S個第二高折射率材料層和T個第二低折射率材料層，這S個第二高折射率材料層和這T個第二低折射率材料層交錯地堆疊在第一膜層組上。S為大於或等於2的正整數，T為大於或等於1的正整數，S+T=N-(P+Q)。The second layer set includes S layers of a second high-refractive-index material and T layers of a second low-refractive-index material. The S layers of the second high-refractive-index material and the T layers of the second low-refractive-index material are stacked alternately on the first layer set. S is a positive integer greater than or equal to 2, and T is a positive integer greater than or equal to 1. S + T = N - (P + Q).
第二高折射率材料層在材質上不同於第一高折射率材料層。第一高折射率材料層為含有矽的材料層，且第二高折射率材料層為介電材料層。第二低折射率材料層在材質上相同於第一低折射率材料層。The second high-refractive-index material layer is different in material from the first high-refractive-index material layer. The first high-refractive-index material layer is a material layer containing silicon, and the second high-refractive-index material layer is a dielectric material layer. The second low-refractive-index material layer is the same in material as the first low-refractive-index material layer.
此鍍膜結構對於可見光的反射率超過95%。The reflectivity of this coating structure for visible light exceeds 95%.
本發明的鍍膜結構透過介電材料層的設置來解決含有矽的膜層所帶來反射可見光不均勻的問題，藉此讓鍍膜結構的入光側在視覺上不會偏向某一種顏色。The coating structure of the present invention solves the problem of uneven visible light reflection caused by silicon-containing films by providing a dielectric material layer, thereby ensuring that the light-incident side of the coating structure does not visually bias towards a particular color.
可選擇地，鍍膜結構中最靠近基板的膜層是第一高折射率材料層。Optionally, the film layer closest to the substrate in the film-coated structure is the first high refractive index material layer.
可選擇地，鍍膜結構中最遠離基板的膜層是第二高折射率材料層。Optionally, the film layer farthest from the substrate in the film-deposited structure is the second high refractive index material layer.
可選擇地，在第一膜層組中，最遠離基板的膜層是第一低折射率材料層。Optionally, in the first film layer group, the film layer farthest from the substrate is the first low refractive index material layer.
可選擇地，在第二膜層組中，最靠近第一膜層組的膜層是第二高折射率材料層。Optionally, in the second film layer group, the film layer closest to the first film layer group is the second high refractive index material layer.
可選擇地，鍍膜結構中最靠近基板的膜層的厚度大於最遠離基板的膜層的厚度。Optionally, the thickness of the film layer closest to the substrate in the film deposition structure is greater than the thickness of the film layer farthest from the substrate.
可選擇地，在第一膜層組中，最遠離基板的膜層的厚度大於最靠近基板的膜層的厚度。Optionally, in the first film layer group, the thickness of the film layer farthest from the substrate is greater than the thickness of the film layer closest to the substrate.
可選擇地，在第二膜層組中，最靠近第一膜層組的膜層的厚度大於最遠離第一膜層組的膜層的厚度。Optionally, in the second film layer group, the thickness of the film layer closest to the first film layer group is greater than the thickness of the film layer farthest from the first film layer group.
可選擇地，在第一膜層組中最遠離基板的膜層的厚度大於在第二膜層組中最靠近第一膜層組的膜層的厚度。Optionally, the thickness of the film layer farthest from the substrate in the first film layer group is greater than the thickness of the film layer closest to the first film layer group in the second film layer group.
選擇地，在相鄰的兩膜層中，較靠近基板的膜層的厚度對較遠離基板的膜層的厚度的比值在0.13至9.62的範圍內。Optionally, in two adjacent film layers, a ratio of a thickness of the film layer closer to the substrate to a thickness of the film layer farther from the substrate is in a range of 0.13 to 9.62.
選擇地，在相鄰的兩膜層中，折射率較高的膜層的厚度對折射率較低的膜層的厚度的比值在0.13至3的範圍內。Optionally, in two adjacent film layers, a ratio of the thickness of the film layer with a higher refractive index to the thickness of the film layer with a lower refractive index is in a range of 0.13 to 3.
選擇地，在第一膜層組的相鄰的兩膜層中，較靠近基板的膜層的厚度對較遠離基板的膜層的厚度的比值在0.44至3的範圍內。Optionally, in two adjacent film layers of the first film layer group, a ratio of a thickness of the film layer closer to the substrate to a thickness of the film layer farther from the substrate is in a range of 0.44 to 3.
選擇地，在第一膜層組的相鄰的兩膜層中，折射率較高的膜層的厚度對折射率較低的膜層的厚度的比值在0.56至3的範圍內。Optionally, in two adjacent layers of the first layer group, a ratio of the thickness of the layer with a higher refractive index to the thickness of the layer with a lower refractive index is in a range of 0.56 to 3.
選擇地，在第二膜層組的相鄰的兩膜層中，較靠近基板的膜層的厚度對較遠離基板的膜層的厚度的比值在0.13至9.62的範圍內。Optionally, in two adjacent film layers of the second film layer group, a ratio of a thickness of the film layer closer to the substrate to a thickness of the film layer farther from the substrate is in a range of 0.13 to 9.62.
選擇地，在第二膜層組的相鄰的兩膜層中，折射率較高的膜層的厚度對折射率較低的膜層的厚度的比值在0.13至1.86的範圍內。Optionally, in two adjacent layers of the second layer group, a ratio of the thickness of the layer with a higher refractive index to the thickness of the layer with a lower refractive index is in a range of 0.13 to 1.86.
選擇地，在第一膜層組中最遠離基板的膜層的厚度對在第二膜層組中最靠近第一膜層組的膜層的厚度的比值在2.18至3.26的範圍內。Optionally, a ratio of a thickness of a film layer farthest from the substrate in the first film layer group to a thickness of a film layer closest to the first film layer group in the second film layer group is in a range of 2.18 to 3.26.
選擇地，第一高折射率材料層為氫化矽(SiH)層，第一低折射率材料層和第二低折射率材料層為二氧化矽(SiO2)層，第二高折射率材料層為五氧化二鈮(Nb2O5)層。Optionally, the first high refractive index material layer is a silicon hydride (SiH) layer, the first low refractive index material layer and the second low refractive index material layer are silicon dioxide (SiO2) layers, and the second high refractive index material layer is a niobium pentoxide (Nb2O5) layer.
選擇地，第二膜層組的膜層數不同於第一膜層組的膜層數。Optionally, the number of film layers in the second film layer group is different from the number of film layers in the first film layer group.
為了簡要說明本發明的內容，以下列舉N為55作為範例；然而，本發明並不限於此實施態樣。To briefly describe the content of the present invention, the following example assumes that N is 55; however, the present invention is not limited to this embodiment.
請參考圖4至圖6所示，本發明根據一實施例提供一種可提升反射可見光的均勻度的光學元件2，其包含一基板21和設置在此基板21上的一鍍膜結構22。基板21例如但不限於是玻璃基板。4 to 6 , the present invention provides an optical element 2 capable of improving the uniformity of reflecting visible light, according to one embodiment. The optical element 2 includes a substrate 21 and a coating structure 22 disposed on the substrate 21. The substrate 21 is, for example but not limited to, a glass substrate.
鍍膜結構22包含55個膜層(亦即膜層L1~L55)，這55個膜層例如但不限於可區分成設在基板21上的一第一膜層組23以及設在第一膜層組23上的一第二膜層組24。最靠近基板21的第一膜層為膜層L1，第二靠近基板21的第二膜層為膜層L2，第二遠離基板21的第五十四膜層為膜層L54，最遠離基板21的第五十五膜層為膜層L55，而其餘的膜層L3~L53的定義以此類推。The coating structure 22 includes 55 film layers (i.e., film layers L1-L55). These 55 film layers can be divided into, for example but not limited to, a first film layer group 23 disposed on the substrate 21 and a second film layer group 24 disposed on the first film layer group 23. The first film layer closest to the substrate 21 is film layer L1, the second film layer second closest to the substrate 21 is film layer L2, the fifty-fourth film layer second farthest from the substrate 21 is film layer L54, and the fifty-fifth film layer farthest from the substrate 21 is film layer L55. The definitions of the remaining film layers L3-L53 are similar.
第一膜層組23包含14個膜層(亦即膜層L1~L14)，這14個膜層是由7個第一高折射率材料層和7個第一低折射率材料層交錯地堆疊在基板21上所構成。第一高折射率材料層例如但不限於是氫化矽層，在波長550 nm的折射率為3.56，在波長550 nm的消光係數為0.18。第一低折射率材料層例如但不限於是二氧化矽層，在波長550 nm的折射率為1.46，在波長550 nm的消光係數趨近於0。The first film layer assembly 23 includes 14 film layers (i.e., film layers L1-L14). These 14 film layers are composed of seven first high-refractive-index material layers and seven first low-refractive-index material layers stacked alternately on the substrate 21. The first high-refractive-index material layers are, for example, but not limited to, hydrogenated silicon layers, with a refractive index of 3.56 at a wavelength of 550 nm and an extinction coefficient of 0.18 at 550 nm. The first low-refractive-index material layers are, for example, but not limited to, silicon dioxide layers, with a refractive index of 1.46 at a wavelength of 550 nm and an extinction coefficient approaching zero at 550 nm.
第二膜層組24包含41個膜層(亦即膜層L15~L55)，這41個膜層是由21個第二高折射率材料層和20個第二低折射率材料層交錯地堆疊在第一膜層組23上所構成。第二高折射率材料層例如但不限於是五氧化二鈮層，在波長550 nm的折射率為2.36，在波長550 nm的消光係數趨近於0。第二低折射率材料層例如但不限於是二氧化矽層，在波長550 nm的折射率為1.46，在波長550 nm的消光係數趨近於0。The second film layer assembly 24 includes 41 film layers (i.e., film layers L15-L55). These 41 film layers are composed of 21 layers of a second high refractive index material and 20 layers of a second low refractive index material alternately stacked on the first film layer assembly 23. The second high refractive index material layers are, for example, but not limited to, niobium pentoxide layers, which have a refractive index of 2.36 at a wavelength of 550 nm and an extinction coefficient approaching zero at 550 nm. The second low refractive index material layers are, for example, but not limited to, silicon dioxide layers, which have a refractive index of 1.46 at a wavelength of 550 nm and an extinction coefficient approaching zero at 550 nm.
以下請參考表二來示範性地說明鍍膜結構22的配置細節。表二中，第一比值是指在相鄰的兩膜層中，折射率較高的膜層的厚度對折射率較低的膜層的厚度的比值；第二比值是指在相鄰的兩膜層中，較靠近基板21的膜層的厚度對較遠離基板21的膜層的厚度的比值。Please refer to Table 2 below for an exemplary description of the configuration details of the coating structure 22. In Table 2, the first ratio refers to the ratio of the thickness of the layer with the higher refractive index to the thickness of the layer with the lower refractive index, of two adjacent layers. The second ratio refers to the ratio of the thickness of the layer closer to the substrate 21 to the thickness of the layer farther from the substrate 21, of two adjacent layers.
從表二可知，鍍膜結構22中最靠近基板21的膜層是膜層L1且是第一高折射率材料層，而鍍膜結構22中最遠離基板21的膜層是膜層L55且是第二高折射率材料層；在第一膜層組23中，最靠近基板21的膜層是膜層L1，第二靠近基板21的膜層是膜層L2，最遠離基板21的膜層是膜層L14且是第一低折射率材料層，第二遠離基板21的膜層是膜層L13且是第一高折射率材料層，其餘膜層以此類推；並且在第二膜層組24中，最靠近第一膜層組23的膜層是膜層L15且是第二高折射率材料層，第二靠近第一膜層組23的膜層是膜層L16且是第二高折射率材料層，最遠離第一膜層組23的膜層是膜層L55，第二遠離第一膜層組23的膜層是膜層L54且是第二低折射率材料層，第三遠離第一膜層組23的膜層是膜層L53且是第二高折射率材料層，其餘膜層以此類推。As can be seen from Table 2, the film layer closest to the substrate 21 in the film structure 22 is film layer L1, which is the first high refractive index material layer, and the film layer farthest from the substrate 21 in the film structure 22 is film layer L55, which is the second high refractive index material layer. In the first film layer group 23, the film layer closest to the substrate 21 is film layer L1, the film layer second closest to the substrate 21 is film layer L2, the film layer farthest from the substrate 21 is film layer L14, which is the first low refractive index material layer, and the film layer second farthest from the substrate 21 is film layer L13, which is the first high refractive index material layer. The same applies to the remaining film layers; and in the second film layer group 24, the film layer closest to the first film layer group 23 is film layer L15, which is the second highest refractive index material layer, the film layer second closest to the first film layer group 23 is film layer L16, which is the second highest refractive index material layer, the film layer farthest from the first film layer group 23 is film layer L55, the film layer second farthest from the first film layer group 23 is film layer L54, which is the second lowest refractive index material layer, and the film layer third farthest from the first film layer group 23 is film layer L53, which is the second highest refractive index material layer, and the same applies to the remaining film layers.
從表二也可知，鍍膜結構22中，最靠近基板21的膜層L1的厚度大於最遠離基板21的膜層L55的厚度；在第一膜層組23中，最遠離基板21的膜層L14的厚度大於最靠近基板21的膜層L1的厚度；在第二膜層組24中，最靠近第一膜層組23的膜層L15的厚度大於最遠離第一膜層組23的膜層L55的厚度；在第一膜層組23中最遠離基板21的膜層L14的厚度大於在第二膜層組24中最靠近第一膜層組23的膜層L15的厚度。As can be seen from Table 2, in the film coating structure 22, the thickness of the film layer L1 closest to the substrate 21 is greater than the thickness of the film layer L55 farthest from the substrate 21; in the first film layer group 23, the thickness of the film layer L14 farthest from the substrate 21 is greater than the thickness of the film layer L1 closest to the substrate 21; in the second film layer group 24, the thickness of the film layer L15 closest to the first film layer group 23 is greater than the thickness of the film layer L55 farthest from the first film layer group 23; and in the first film layer group 23, the thickness of the film layer L14 farthest from the substrate 21 is greater than the thickness of the film layer L15 closest to the first film layer group 23 in the second film layer group 24.
從表二也可知，在鍍膜結構22的相鄰的兩膜層的厚度的第一比值在0.13至3的範圍內；在鍍膜結構22的相鄰的兩膜層的厚度的第二比值在0.13至9.62的範圍內；在第一膜層組23的相鄰的兩膜層的厚度的第一比值在0.56至3的範圍內；在第一膜層組23的相鄰的兩膜層的厚度的第二比值在0.44至3的範圍內；在第二膜層組24的相鄰的兩膜層的厚度的第一比值在0.13至1.86的範圍內；在第二膜層組24的相鄰的兩膜層的厚度的第二比值在0.13至9.62的範圍內；並且在第一膜層組23中最遠離基板21的膜層L14的厚度對在第二膜層組24中最靠近第一膜層組23的膜層L15的厚度的比值為2.72。As can be seen from Table 2, the first ratio of the thickness of two adjacent film layers in the film structure 22 is in the range of 0.13 to 3; the second ratio of the thickness of two adjacent film layers in the film structure 22 is in the range of 0.13 to 9.62; the first ratio of the thickness of two adjacent film layers in the first film layer group 23 is in the range of 0.56 to 3; the second ratio of the thickness of two adjacent film layers in the first film layer group 23 is in the range of 0.44 to 3. range; a first ratio of the thicknesses of two adjacent film layers in the second film layer group 24 is in the range of 0.13 to 1.86; a second ratio of the thicknesses of two adjacent film layers in the second film layer group 24 is in the range of 0.13 to 9.62; and a ratio of the thickness of the film layer L14 farthest from the substrate 21 in the first film layer group 23 to the thickness of the film layer L15 closest to the first film layer group 23 in the second film layer group 24 is 2.72.
另一方面，對表二列舉的鍍膜結構22進行穿透率和反射率的模擬試驗，模擬試驗是在參考光的波長為550nm、參考光的入射角為0度的條件下進行。模擬試驗的結果如圖5和圖6所示。Meanwhile, simulation tests of transmittance and reflectance were conducted on the coating structure 22 listed in Table 2. The simulation tests were conducted under the conditions of a reference light wavelength of 550 nm and an incident angle of 0 degrees. The results of the simulation tests are shown in Figures 5 and 6.
從圖5的曲線C3可知，對應可見光的波段的反射率可高於90%，甚至可趨近於100%，而對應不可見光的特定波段(例如850nm~1100nm的波段)的反射率則低於5%，甚至趨近於0%。從圖6的曲線C4可知，對應可見光的波段的穿透率相應地低於10%，甚至趨近於0%，而對應不可見光的特定波段的穿透率則相應地高於95%，甚至趨近於99%。Curve C3 in Figure 5 shows that the reflectivity for visible light is higher than 90%, even approaching 100%, while the reflectivity for specific invisible light bands (e.g., the 850nm-1100nm band) is lower than 5%, even approaching 0%. Curve C4 in Figure 6 shows that the transmittance for visible light is correspondingly lower than 10%, even approaching 0%, while the transmittance for specific invisible light bands is higher than 95%, even approaching 99%.
由上述的穿透率和反射率的模擬試驗結果可證明，本發明的鍍膜結構22不僅可有效地反射可見光，降低對於可見光的透光率，從而避免反射顏色不均勻的問題發生。並且，在配置有本發明的鍍膜結構22的光學元件2的應用方面，可協助其他用顏色作感應的感測器抗干擾，讓感測器能正確地感測。The above-mentioned transmittance and reflectance simulation test results demonstrate that the coating structure 22 of the present invention not only effectively reflects visible light, reducing its transmittance and thus preventing uneven reflected color, but also helps other color-sensing sensors resist interference, ensuring accurate sensing.
雖然本發明以前述之實施例揭露如上，然而這些實施例並非用以限定本發明。在不脫離本發明之精神和範圍內，所為之更動、潤飾與各實施態樣的組合，均屬本發明之專利保護範圍。關於本發明所界定之保護範圍請參考所附之申請專利範圍。Although the present invention is disclosed above with reference to the aforementioned embodiments, these embodiments are not intended to limit the present invention. Any modifications, enhancements, and combinations of the various embodiments that do not depart from the spirit and scope of the present invention are within the scope of patent protection of the present invention. Please refer to the attached patent application for details on the scope of protection defined by the present invention.
1:濾光元件 11:基板 12:鍍膜結構 13:氫化矽層 14:二氧化矽層 C1:曲線 C2:曲線 2:光學元件 21:基板 22:鍍膜結構 23:第一膜層組 24:第二膜層組 C3:曲線 C4:曲線 L1,L2,L13,L14,L15,L16,L53,L54,L55:膜層1: Filter element11: Substrate12: Coating structure13: Hydrogenated silicon layer14: Silicon dioxide layerC1: CurveC2: Curve2: Optical element21: Substrate22: Coating structure23: First film layer group24: Second film layer groupC3: CurveC4: CurveL1, L2, L13, L14, L15, L16, L53, L54, L55: Film layers
在結合以下附圖研究了詳細描述之後，將發現本發明的其他方面及其優點： 圖1為現有技術的光學元件的結構示意圖； 圖2為對圖1的光學元件的鍍膜結構進行反射率模擬試驗的結果的光譜圖； 圖3為對圖1的光學元件的鍍膜結構進行穿透率模擬試驗的結果的光譜圖； 圖4為根據本發明一實施例的光學元件的結構示意圖； 圖5為對圖2的光學元件的鍍膜結構進行反射率模擬試驗的結果的光譜圖；及 圖6為對圖2的光學元件的鍍膜結構進行穿透率模擬試驗的結果的光譜圖。Other aspects and advantages of the present invention will become apparent after studying the detailed description in conjunction with the following figures:Figure 1 is a schematic diagram of the structure of a conventional optical element;Figure 2 is a spectrum diagram showing the results of a reflectivity simulation test on the film-coated structure of the optical element of Figure 1;Figure 3 is a spectrum diagram showing the results of a transmittance simulation test on the film-coated structure of the optical element of Figure 1;Figure 4 is a schematic diagram of the structure of an optical element according to an embodiment of the present invention;Figure 5 is a spectrum diagram showing the results of a reflectivity simulation test on the film-coated structure of the optical element of Figure 2; andFigure 6 is a spectrum diagram showing the results of a transmittance simulation test on the film-coated structure of the optical element of Figure 2.
2:光學元件2: Optical components
21:基板21:Substrate
22:鍍膜結構22: Coating structure
23:第一膜層組23: First film layer group
24:第二膜層組24: Second film layer group
L1,L2,L13,L14,L15,L16,L53,L54,L55:膜層L1, L2, L13, L14, L15, L16, L53, L54, L55: Membrane layer
| Publication Number | Publication Date |
|---|---|
| TWI898764Btrue TWI898764B (en) | 2025-09-21 |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN220509163U (en) | 2023-07-28 | 2024-02-20 | 光驰科技(上海)有限公司 | Optical filter |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN220509163U (en) | 2023-07-28 | 2024-02-20 | 光驰科技(上海)有限公司 | Optical filter |
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