本發明係有關於一種顯示器，特別是一種具微隔間結構的真空填充電泳式顯示器。The present invention relates to a display, in particular to a vacuum-filled electrophoretic display with a micro-compartment structure.
電子紙顯示器，例如電泳式顯示器(electrophoretic display,EPD)具有輕薄易攜帶及低耗能等特點，也具備關閉電源後仍能保留影像的特性。除了應用於閱讀器、手機、穿戴式裝置外，電子紙顯示器也能用於大賣場的貨架標籤、公車站的即時訊息看板中，兼顧節能與永續目標。Electronic paper displays, such as electrophoretic displays (EPDs), are thin, easy to carry, and have low energy consumption. They also retain images even when the power is turned off. In addition to being used in readers, mobile phones, and wearable devices, electronic paper displays can also be used in shelf labels in hypermarkets and instant messaging boards at bus stops, taking into account both energy conservation and sustainability goals.
圖1A顯示一習知電泳式顯示器100的剖視圖，此電泳式顯示器100為一黑白電泳式顯示器100。該電泳式顯示器100例如包含由上至下的一相對基板12(例如可為一透明塑膠基板)、一共同電極層14(例如可為一透明導電電極層)、一電泳層20、一控制電極層PEL、一驅動電路層30a及一控制基板10(例如可為一玻璃基板)。在圖1A所示架構中，觀看面係接近相對基板12的方向。此外，如圖1A所示，該電泳層20包含多數的中空腔體22(圖示僅為其中一個)、裝填在每一中空腔體22中的膠體溶液24內含有懸浮的多個帶電荷顏色粒子26(例如帶電荷黑色粒子26B及帶電荷白色粒子26W)，中空腔體22結構係作為電子墨水(或電泳材料)的容器。中空腔體22例如為有機高分子材料所構成，且用以裝填帶電荷顏色粒子26。此外，帶電荷顏色粒子26可為兩色組合(黑色/白色)，三色組合(黑色/紅色/白色，黑色/黃色/白色)，四色組合(黑色/紅色/黃色/白色，青色/黃色/洋紅色/白色)等組合。在圖1A所示結構中，帶電荷顏色粒子26例如為兩色組合且包含帶電荷黑色粒子26B及帶電荷白色粒子26W。FIG. 1A shows a cross-sectional view of a conventional electrophoretic display 100, which is a black-and-white electrophoretic display 100. The electrophoretic display 100 includes, from top to bottom, a counter substrate 12 (e.g., a transparent plastic substrate), a common electrode layer 14 (e.g., a transparent conductive electrode layer), an electrophoretic layer 20, a control electrode layer PEL, a driving circuit layer 30a, and a control substrate 10 (e.g., a glass substrate). In the structure shown in FIG. 1A, the viewing surface is the direction close to the counter substrate 12. In addition, as shown in FIG. 1A , the electrophoretic layer 20 includes a plurality of hollow cavities 22 (only one of which is shown), and a colloidal solution 24 filled in each hollow cavity 22 contains a plurality of suspended charged color particles 26 (e.g., charged black particles 26B and charged white particles 26W), and the hollow cavity 22 structure is used as a container for electronic ink (or electrophoretic material). The hollow cavity 22 is, for example, made of an organic polymer material and is used to fill the charged color particles 26. In addition, the charged color particles 26 can be a combination of two colors (black/white), three colors (black/red/white, black/yellow/white), four colors (black/red/yellow/white, cyan/yellow/magenta/white), and the like. In the structure shown in FIG. 1A , the charged color particles 26 are, for example, a two-color combination and include charged black particles 26B and charged white particles 26W.
共同電極層14一般而言係接到接地電位(0V)以提供共同電壓Vcom，而下方的控制基板10一般使用面板的TFT Array製程以在其上製作驅動電路層30a。驅動電路層30a的驅動開關大多包含非晶矽(a-Si)製程製作的薄膜電晶體(詳述於後)。非晶矽是一種供應充足的低成本材料，但是，非晶矽的電子遷移率非常低(大約1cm2/V*s)，並且物理上不支持高刷新率。然而非晶矽具有耐高壓的特性與超低漏電流的特性為電子紙控制所必需的條件。帶電荷顏色子26帶有預定極性的電荷，例如帶電荷黑色粒子26B係帶正電及帶電荷白色粒子26W係帶負電。藉由驅動電路層30a控制每一控制電極PE的電性及電壓大小，即可在對應每一像素吸引帶電荷黑色粒子26B並推斥帶電荷白色粒子26W(使該像素在與控制電極PE相反側的觀看面呈現白色)或是對應每一像素吸引帶電荷白色粒子26W並推斥帶電荷黑色粒子26B(使該像素在與控制電極PE相反側的觀看面呈現黑色)。The common electrode layer 14 is generally connected to the ground potential (0V) to provide a common voltage Vcom, and the control substrate 10 below generally uses the panel's TFT Array process to manufacture the drive circuit layer 30a thereon. The drive switches of the drive circuit layer 30a mostly include thin film transistors manufactured by an amorphous silicon (a-Si) process (described in detail below). Amorphous silicon is a low-cost material with abundant supply, but the electron mobility of amorphous silicon is very low (about1cm2 /V*s) and does not physically support high refresh rates. However, amorphous silicon has the characteristics of high voltage resistance and ultra-low leakage current, which are necessary conditions for electronic paper control. The charged color particles 26 carry a charge of a predetermined polarity, for example, the charged black particles 26B are positively charged and the charged white particles 26W are negatively charged. By controlling the electrical properties and voltage of each control electrode PE through the driving circuit layer 30a, the charged black particles 26B and the charged white particles 26W corresponding to each pixel can be attracted and repelled (making the pixel appear white on the viewing surface opposite to the control electrode PE) or the charged white particles 26W and the charged black particles 26B can be attracted and repelled corresponding to each pixel (making the pixel appear black on the viewing surface opposite to the control electrode PE).
圖1B顯示另一習知電泳式顯示器100的剖視圖，此電泳式顯示器100為一彩色電泳式顯示器100。該彩色電泳式顯示器100之結構大致類似於圖1A所示之黑白電泳式顯示器100結構，但是再於相對基板12上以光學膠13黏合一彩色濾光層CF，且該彩色濾光層CF係設置於一上玻璃基板16。FIG. 1B shows a cross-sectional view of another known electrophoretic display 100, which is a color electrophoretic display 100. The structure of the color electrophoretic display 100 is roughly similar to the structure of the black-and-white electrophoretic display 100 shown in FIG. 1A, but a color filter layer CF is bonded to the opposite substrate 12 with an optical adhesive 13, and the color filter layer CF is disposed on an upper glass substrate 16.
帶有彩色濾光層陣列的電泳式顯示器依靠區域共享及顏色混合來產生視覺上的顏色。在諸如紅/綠/藍(RGB)或紅/綠/藍/白(RGBW)的三或四個原色之間共享可用的顯示區域，以及濾光層可以一維(條紋)或二維(2x2)重複形態來進行排列。三個子像素(在RGB顯示器的情況下)或四個子像素(在RGBW顯示器的情況下)面積只要夠小，可以解讀為較高的解析度，在視覺上混合在一起成為具有均勻顏色單個像素。區域共享的固有缺點是著色劑始終存在，以及只能藉由將下面單色顯示器的相應像素切換為白色或黑色(打開或關閉相應的原色)來調製顏色。例如，在理想的RGBW顯示器中，紅色、綠色、藍色及白色原色中之每一者都佔據顯示區域的四分之一(四個子像素中的一個)，白色子像素與下面單色顯示器白色一樣亮，所以三個彩色子像素組合起來的貢獻不超過一個白色子像素。Electrophoretic displays with arrays of color filters rely on area sharing and color mixing to produce visual color. Available display area is shared between three or four primary colors such as red/green/blue (RGB) or red/green/blue/white (RGBW), and the filters can be arranged in a one-dimensional (striped) or two-dimensional (2x2) repeating pattern. Three sub-pixels (in the case of an RGB display) or four sub-pixels (in the case of an RGBW display) are visually mixed together into a single pixel of uniform color as long as the area is small enough to be interpreted at a high resolution. The inherent disadvantage of area sharing is that the colorant is always present, and color can only be modulated by switching the corresponding pixel of the underlying monochrome display to white or black (turning the corresponding primary color on or off). For example, in an ideal RGBW display, each of the red, green, blue, and white primary colors occupies a quarter of the display area (one of four subpixels), and the white subpixel is as bright as the white of the underlying monochrome display, so the combined contribution of the three color subpixels is no more than that of one white subpixel.
多色顯示方式可用多種不同顏色的帶電顏色粒子，運用不同帶電顏色粒子的電荷極性(正電荷或是負電荷)、電荷數量、粒子的密度、粒子的體積等不同的物理與電氣條件下在膠體溶液內運動的方式不同，來控制這些不同帶電顏色粒子到達觀看面時的距離，可以呈現不同的顏色。例如三色顯示(黑色、白色、紅色；黑色、白色、黃色)及四色顯示器(黑色、白色、紅色、黃色)。與黑白電泳顯示器的操作相似，具有三種或四種反射顏色之電泳顯示器的操作類似於簡單的黑白顯示器，但是因為所需的顏色粒子被驅動至觀看面，驅動方案遠比只有黑色及白色要複雜得多。Multicolor display can use charged color particles of different colors. Different charged color particles move differently in the colloidal solution under different physical and electrical conditions, such as charge polarity (positive charge or negative charge), charge quantity, particle density, and particle volume. This can control the distances at which these charged color particles reach the viewing surface, and different colors can be displayed. For example, three-color display (black, white, red; black, white, yellow) and four-color display (black, white, red, yellow). Similar to the operation of a black-and-white electrophoretic display, the operation of an electrophoretic display with three or four reflective colors is similar to that of a simple black-and-white display, but because the required color particles are driven to the viewing surface, the driving scheme is much more complicated than just black and white.
參見圖2A及2B，為分別說明圖1A之習知黑白電泳式顯示器100操作示意及控制電極層PEL/驅動電路層30a等效電路圖。如圖2A所示，藉由驅動電路層30a控制此控制電極層PEL中每一控制電極PE的電性及電壓大小，即可在觀看面(接近相對基板12處)形成黑白像素。若驅動電路層30a控制圖2A所示之控制電極PE1及PE3為正電壓，則會吸引帶負電荷白色粒子26W，並將帶正電的黑色粒子推離電極接觸面並移往觀看面，造成在觀看面的帶正電荷黑色粒子26B數量相對較多，以在觀看面提供黑色像素。反之，若驅動電路層30a控制圖2A所示之控制電極PE2為負電壓，則會吸引帶正電荷黑色粒子26B，並將帶負電的白色粒子推離電極接觸面並移往觀看面，造成在觀看面的帶負電荷白色粒子26W數量相對較多，以在觀看面提供白色像素。See Figures 2A and 2B, which respectively illustrate the operation schematic diagram of the conventional black and white electrophoretic display 100 of Figure 1A and the equivalent circuit diagram of the control electrode layer PEL/driving circuit layer 30a. As shown in Figure 2A, by controlling the electrical properties and voltage magnitude of each control electrode PE in the control electrode layer PEL by the driving circuit layer 30a, black and white pixels can be formed on the viewing surface (close to the opposite substrate 12). If the driving circuit layer 30a controls the control electrodes PE1 and PE3 shown in Figure 2A to be positive voltage, it will attract the negatively charged white particles 26W and push the positively charged black particles away from the electrode contact surface and move to the viewing surface, resulting in a relatively large number of positively charged black particles 26B on the viewing surface to provide black pixels on the viewing surface. On the contrary, if the driving circuit layer 30a controls the control electrode PE2 shown in FIG2A to be a negative voltage, it will attract the positively charged black particles 26B and push the negatively charged white particles away from the electrode contact surface and move to the viewing surface, resulting in a relatively large number of negatively charged white particles 26W on the viewing surface to provide white pixels on the viewing surface.
如圖2A所示，並配合參見圖2B，共同電極層14通常是電連接地電位(0V，亦即V com電位)且與控制電極層PEL之間夾著電泳層20。控制電極層PEL的控制電極PE與V com電位會形成一個電容(電泳電容Cp)，由於電泳層的厚度較厚，因此上述電容很小，在控制電極上的電荷很快與帶電荷粒子互動進入平衡狀態，帶電荷粒子移動的距離會很小，為了增加每次驅動的能量，必須增加儲存電容在驅動電路層30a中，儲存電容的一端連接控制電極，另一端在控制電極的面對電泳層的另一面的導體形成平行面的電容Cs，在圖2B中將電泳層20的等效電路標示為電泳電容Cp並聯電阻R(等效帶電荷顏色粒子移動所消耗的能量)，更包含上述的儲存電容Cs。如圖2B所示，驅動電路層30a包含多個薄膜電晶體32，且每一薄膜電晶體32之閘極金屬Mg電連接到閘極線GL、源極金屬Ms電連接到資料線DL而汲極金屬Md電連接到對應之控制電極(也可稱為像素電極)PE。依據閘極線GL施加在閘極金屬Mg上的電位，可以決定此薄膜電晶體32係導通(On)或是關閉(Off)；藉此決定是否將由源極金屬Ms經由資料線DL上的電壓傳送到汲極金屬Md，且更進一步的傳送到對應的控制電極PE並將儲存電容Cs充電至與資料線上的相同電壓。此控制電極PE也會將對應資料線上的電壓施加在電泳層20中，原則上驅動電路層，包含多個薄膜電晶體，多條閘極線與多條資料線，每一條該閘極線電連接到該多個薄膜電晶體的閘極，每一條該資料線電連接到該多個薄膜電晶體的汲極或源極，多個控制電極，每個該控制電極連接到一該薄膜電晶體的該源極或該汲極。As shown in FIG. 2A and in conjunction with FIG. 2B , the common electrode layer 14 is usually electrically connected to the ground potential (0 V, ie, V com potential) and has an electrophoretic layer 20 sandwiched between the common electrode layer 14 and the control electrode layer PEL. The control electrode PE of the control electrode layer PEL and the V com potential will form a capacitor (electrophoretic capacitor Cp). Since the electrophoretic layer is thicker, the above-mentioned capacitor is very small. The charge on the control electrode quickly interacts with the charged particles to enter a state of equilibrium, and the distance the charged particles move will be very small. In order to increase the energy of each drive, a storage capacitor must be added to the drive circuit layer 30a. One end of the storage capacitor is connected to the control electrode, and the other end forms a parallel capacitor Cs on the conductor on the other side of the control electrode facing the electrophoretic layer. In Figure 2B, the equivalent circuit of the electrophoretic layer 20 is marked as an electrophoretic capacitor Cp in parallel with a resistor R (equivalent energy consumed by the movement of charged color particles), and also includes the above-mentioned storage capacitor Cs. As shown in FIG. 2B , the driving circuit layer 30a includes a plurality of thin film transistors 32, and the gate metal Mg of each thin film transistor 32 is electrically connected to the gate line GL, the source metal Ms is electrically connected to the data line DL, and the drain metal Md is electrically connected to the corresponding control electrode (also called pixel electrode) PE. According to the potential applied to the gate metal Mg by the gate line GL, it can be determined whether the thin film transistor 32 is turned on (On) or off (Off); thereby determining whether the voltage on the data line DL is transmitted from the source metal Ms to the drain metal Md, and further transmitted to the corresponding control electrode PE and the storage capacitor Cs is charged to the same voltage as that on the data line. This control electrode PE will also apply the voltage on the corresponding data line to the electrophoretic layer 20, which in principle drives the circuit layer, including multiple thin film transistors, multiple gate lines and multiple data lines, each of which is electrically connected to the gate of the multiple thin film transistors, each of which is electrically connected to the drain or source of the multiple thin film transistors, and multiple control electrodes, each of which is connected to the source or drain of one of the thin film transistors.
電泳層包括電泳材料，該電泳材料包括複數個帶電顏色粒子，該複數個帶電顏色粒子係配置於一膠體溶液中且能在電場影響下移動通過該膠體溶液，該複數個帶電顏色粒子包含帶正電荷的顏色粒子與/或帶負電荷的顏色粒子，帶電荷顏色粒子26在具有適當黏滯性的電泳層20之膠體溶液24之間受電場的力量移動，移動速度會非常緩慢。驅動電路層30a先把能量快速的存放在儲存電容Cs內，再由儲存電容Cs慢慢的把能量經由控制電極PE而釋放到電泳層20作為帶電荷顏色粒子26移動的能量來源。儲存電容Cs的電容值越大，可以存放的能量越多，需要重複儲能的次數就會越少，電泳式顯示器100的畫面更新的速度就越快。所以電泳式顯示器100在電路布局(Layout)設計上會儘可能地加大儲存電容Cs的面積來增加電容值。但是在有多色帶電荷顏色粒子的系統中，由於要精準的控制帶電荷顏色粒子移動的距離與方向，所以會適度的減少儲存電容Cs的電容值來減少能量的供應以增加控制帶電荷顏色粒子移動距離的精度，但是需增加更多儲能的次數，會以降低電泳式顯示器100更新速度作為代價。The electrophoretic layer includes an electrophoretic material, which includes a plurality of charged color particles. The plurality of charged color particles are disposed in a colloidal solution and can move through the colloidal solution under the influence of an electric field. The plurality of charged color particles include positively charged color particles and/or negatively charged color particles. The charged color particles 26 are moved by the force of the electric field between the colloidal solution 24 of the electrophoretic layer 20 with appropriate viscosity, and the moving speed will be very slow. The driving circuit layer 30a first quickly stores energy in the storage capacitor Cs, and then the storage capacitor Cs slowly releases the energy to the electrophoretic layer 20 through the control electrode PE as an energy source for the movement of the charged color particles 26. The larger the capacitance of the storage capacitor Cs, the more energy can be stored, the fewer times the energy storage needs to be repeated, and the faster the screen of the electrophoretic display 100 is updated. Therefore, the electrophoretic display 100 will increase the area of the storage capacitor Cs as much as possible in the circuit layout design to increase the capacitance value. However, in a system with multi-color charged color particles, since the distance and direction of the movement of the charged color particles need to be accurately controlled, the capacitance of the storage capacitor Cs will be appropriately reduced to reduce the energy supply to increase the accuracy of controlling the movement distance of the charged color particles. However, the need to increase the number of energy storage times will reduce the update speed of the electrophoretic display 100 as a price.
參見圖2C，為說明習知技術中儲存電容Cs的形成方式的剖視圖。如此圖所示，一般薄膜電晶體32之閘極金屬Mg與儲存電容Cs第一電極CE1是在製作第一金屬層M1時與閘極線GL一起製作。此外薄膜電晶體32之源極金屬Ms/汲極金屬Md與儲存電容Cs的第二電極CE2是在製作第二金屬層M2與資料線DL一起製作。在習知技術中可利用製作第一金屬層M1時同步製作用於儲存電容Cs的第一電極CE1、利用製作閘極絕緣層的步驟同時製作用於儲存電容Cs的絕緣層CI、及利用製作第二金屬層M2時同步製作用於儲存電容Cs的第二電極CE2。因此可以形成如圖2C所示的金屬(第一電極CE1)-絕緣層(絕緣層CI)-金屬(第二電極CE2)的電容器結構。然而閘極金屬Mg及源極金屬Ms/汲極金屬Md必須用金屬製作以降低阻抗，進而使第一金屬層M1及第二金屬層M2也須用金屬製作。此造成在習知電泳式顯示器100中儲存電容Cs的第一電極CE1/第二電極CE2的材料選擇限制，進而使儲存電容Cs會遮蔽光線，降低習知電泳式顯示器之控制基板的開口率，亦即控制基板端元件(包含控制基板10、驅動電路層30a及控制電極層PEL)的總體開口率。See FIG. 2C for a cross-sectional view illustrating a method of forming a storage capacitor Cs in the prior art. As shown in this figure, the gate metal Mg of the thin film transistor 32 and the first electrode CE1 of the storage capacitor Cs are generally manufactured together with the gate line GL when the first metal layer M1 is manufactured. In addition, the source metal Ms/drain metal Md of the thin film transistor 32 and the second electrode CE2 of the storage capacitor Cs are manufactured together with the data line DL when the second metal layer M2 is manufactured. In the prior art, the first electrode CE1 for the storage capacitor Cs can be fabricated simultaneously when the first metal layer M1 is fabricated, the insulating layer CI for the storage capacitor Cs can be fabricated simultaneously when the gate insulating layer is fabricated, and the second electrode CE2 for the storage capacitor Cs can be fabricated simultaneously when the second metal layer M2 is fabricated. Thus, a capacitor structure of metal (first electrode CE1) - insulating layer (insulating layer CI) - metal (second electrode CE2) as shown in FIG. 2C can be formed. However, the gate metal Mg and the source metal Ms/drain metal Md must be made of metal to reduce impedance, and the first metal layer M1 and the second metal layer M2 must also be made of metal. This results in material selection restrictions for the first electrode CE1/second electrode CE2 of the storage capacitor Cs in the conventional electrophoretic display 100, and the storage capacitor Cs will block light, reducing the opening rate of the control substrate of the conventional electrophoretic display, that is, the overall opening rate of the control substrate end element (including the control substrate 10, the driving circuit layer 30a and the control electrode layer PEL).
此外習知技術的缺點還包含，其係將帶電荷粒子用推離的方式往觀看面移動，當粒子被推離得越遠，則控制電極上電荷的推動力就越弱；愈多與控制電極帶相異極性電荷的粒子被吸引靠近控制電極表面時，又會使電泳層的電場減少，導致遠離的粒子所受的推動力更弱。在這雙重因素影響下，往觀看面移動的帶電荷粒子速度會越來越慢，造成需要更高的能量以及更多的時間才能將帶電荷粒子移動到預期的觀看面位置，這就是習知技術的顯示器更新速度很慢的主要原因。In addition, the disadvantages of the known technology include that it pushes the charged particles toward the viewing surface. The farther the particles are pushed away, the weaker the pushing force of the charge on the control electrode. When more particles with charges of opposite polarity to the control electrode are attracted to the surface of the control electrode, the electric field of the electrophoretic layer will decrease, resulting in a weaker pushing force on the particles far away. Under the influence of these two factors, the speed of the charged particles moving toward the viewing surface will become slower and slower, resulting in higher energy and more time required to move the charged particles to the expected viewing surface position. This is the main reason why the display of the known technology has a very slow update speed.
再則往觀看面移動的帶電荷粒子會受不同控制電極之間的電壓大小與極性的不同產生橫向移動的現象，我們可以稱為粒子移動的擴散現象，在黑白顯示時會造成邊界區域對比下降影像模糊與邊線殘影的問題。這個問題在彩色顯示時尤其嚴重，會造成嚴重的影像殘影問題、顏色的飽和度降低與顏色失真，這就是使用習知技術的電泳式顯示器，在彩色顯示時不能如LCD般顯示真實的色彩以及在翻頁時會有影像殘影(與黑白的邊線殘影不同)的問題。多次的不均勻擴散讓帶電荷粒子橫向移動的距離越來越遠，會造成原來平均分布的不同顏色帶電荷粒子密度，產生不均勻現象造成畫面顯示劣化，當畫面顯示劣化到某個程度，顯示器壽命就終了。Furthermore, the charged particles moving toward the viewing surface will move horizontally due to the difference in voltage and polarity between different control electrodes. We can call this the diffusion phenomenon of particle movement. In black and white display, it will cause the boundary area contrast to decrease, image blur and edge afterimage. This problem is particularly serious in color display, which will cause serious image afterimage problems, color saturation reduction and color distortion. This is why electrophoretic displays using conventional technology cannot display true colors like LCDs in color display and there will be image afterimages when turning pages (different from the edge afterimages in black and white). Multiple uneven diffusions cause the charged particles to move farther and farther horizontally, which will cause the density of charged particles of different colors that were originally evenly distributed to become uneven, causing the image display to deteriorate. When the image display deteriorates to a certain extent, the life of the monitor will end.
當帶電荷粒子往觀看面移動時會吸引在共同電極上電荷與之靠近互相吸引，在共同電極上產生電荷移動，遍佈整個共同電極的電荷移動會彼此互相干擾，這些干擾的電荷移動又會把原先在觀看面的相同電荷的粒子推離，造成錯誤的顯示，當共同電極上與每個控制電極相對應的位置上的電荷密度不斷的變動也會造成帶電荷粒子不該有的橫向移動問題(粒子擴散問題)，讓彩色顯示的殘影問題更加嚴重也會影響使用壽命，此外驅動電路在切換閘極線電壓會以最極端的電壓差距變化，所產生的脈沖突波也會讓連接接地GND的共同電極層產生突發式電荷移動而影響顯示。When charged particles move toward the viewing surface, they attract the charges on the common electrode and attract each other. Charge movement occurs on the common electrode, and the charge movement throughout the common electrode interferes with each other. These interfering charge movements push away particles with the same charge that were originally on the viewing surface, causing erroneous display. When the charge on the common electrode corresponding to each control electrode The constant change of charge density will also cause the lateral movement of charged particles (particle diffusion problem), which will make the afterimage problem of color display more serious and affect the service life. In addition, the driving circuit will change the voltage of the switching gate line with the most extreme voltage difference, and the generated pulse surge will also cause sudden charge movement in the common electrode layer connected to the ground GND, affecting the display.
共同電極層是顯示器上最大面積的導體，很容易受其他靜電的影響讓畫面改變狀態。以上種種的缺點都讓彩色電泳顯示器的進展緩慢，因此需要由觀看面這個錯誤的源頭做徹底的改變。The common electrode layer is the largest conductor on the display and is easily affected by other static electricity, causing the screen to change state. The above shortcomings have slowed down the development of color electrophoretic displays, so it is necessary to make a thorough change from the viewing side, the source of the error.
依據本發明一實施方式，本發明揭露一種具微隔間結構的真空填充電泳式顯示器，包含：一控制基板，具有一第一表面及一第二表面；一驅動電路層，位於該控制基板之該第二表面上，包含多個薄膜電晶體，多條閘極線與多條資料線，至少一條該閘極線電連接到該多個薄膜電晶體的閘極，至少一條該資料線電連接到該多個薄膜電晶體的汲極或源極；一控制電極層，位於該驅動電路層遠離該控制基板之一表面上，其包含多個控制電極，至少一該控制電極電連接到一個該薄膜電晶體的該源極該或汲極；一微隔間結構，設立在該控制基板上方，且由高分子材料製成，該微隔間結構包含多個隔間壁，以界定多個裝填一膠體溶液之槽室，該膠體溶液包含至少一種帶電荷的顏色粒子；該膠體溶液在真空的環境條件下裝填入該微隔間結構；一相對基板，設置在該微隔間結構遠離該控制基板的一側。According to an embodiment of the present invention, the present invention discloses a vacuum-filled electrophoretic display with a micro-compartment structure, comprising: a control substrate having a first surface and a second surface; a driving circuit layer located on the second surface of the control substrate, comprising a plurality of thin film transistors, a plurality of gate lines and a plurality of data lines, at least one of the gate lines being electrically connected to the gates of the plurality of thin film transistors, and at least one of the data lines being electrically connected to the drains or sources of the plurality of thin film transistors; a control electrode layer located on the driving circuit layer away from the control substrate; On one surface of the board, it includes a plurality of control electrodes, at least one of which is electrically connected to the source or drain of the thin film transistor;A micro-compartment structure, which is set above the control substrate and is made of polymer material, and the micro-compartment structure includes a plurality of compartment walls to define a plurality of tanks filled with a colloid solution, and the colloid solution includes at least one charged color particle; the colloid solution is filled into the micro-compartment structure under vacuum environmental conditions; an opposing substrate, which is set on a side of the micro-compartment structure away from the control substrate.
依據本發明另一實施方式，本發明揭露一種具微隔間結構的真空填充電泳式顯示器，包含：一控制基板，具有一第一表面及一第二表面、一驅動電路層，位於該控制基板之該第二表面上，包含多個薄膜電晶體，多條閘極線與多條資料線，至少一條該閘極線電連接到多個該薄膜電晶體的閘極，至少一條該資料線電連接該到多個薄膜電晶體的該汲極或該源極；一控制電極層，位於該驅動電路層遠離該控制基板之一表面上，其包含多個控制電極，至少一該控制電極電連接到一個該薄膜電晶體的該源極或該汲極；一相對基板，位於該控制電極層遠離該控制基板的一側；一微隔間結構，設立在該相對基板上，且由高分子材料製成，該微隔間結構包含多個隔間壁，以界定多個裝填一膠體溶液之槽室，該膠體溶液包含至少一種帶電荷的顏色粒子；該膠體溶液在真空的環境條件下填入該微隔間結構。According to another embodiment of the present invention, the present invention discloses a vacuum-filled electrophoretic display with a micro-compartment structure, comprising: a control substrate having a first surface and a second surface, a driving circuit layer located on the second surface of the control substrate, comprising a plurality of thin film transistors, a plurality of gate lines and a plurality of data lines, at least one of the gate lines being electrically connected to the gates of the plurality of thin film transistors, and at least one of the data lines being electrically connected to the drain or the source of the plurality of thin film transistors; a control electrode layer located on the driving circuit layer away from the first surface and the second surface; A control substrate includes a plurality of control electrodes on one surface, at least one of which is electrically connected to the source or drain of the thin film transistor; an opposing substrate is located on a side of the control electrode layer away from the control substrate; a micro-compartment structure is provided on the opposing substrate and is made of a polymer material, the micro-compartment structure includes a plurality of partition walls to define a plurality of tanks filled with a colloid solution, the colloid solution includes at least one type of charged color particles; the colloid solution is filled into the micro-compartment structure under vacuum conditions.
習知技術製作電泳式顯示器所使用的電子紙，係採用微膠囊與微杯的技術製作而成，電子紙的生產成本受良率影響居高不下，本發明的目的即在省下電子紙的生產成本，把電子紙直接做在顯示器內。目前最常用的電子紙係採用微杯結構，生產方式大都採用捲對卷的方式。在製作時，係用凸形狀的滾輪，在樹脂薄膜上壓出凹痕做微杯結構。微杯結構係作為電子墨水的容器，且樹脂薄膜質軟很容易受壓迫而破裂，因此電子紙的產品必須受到很好的保護，造成製程上的重大困難。其次微杯的厚度(垂直於觀看面的延伸距離)在25~50um之間，因此對生產的精度要求非常高。以滾輪壓模生產而言，微杯的厚度越薄越容易破裂且會被剝離黏附在滾輪上，造成滾輪的毀損且生產良率越差，實務上都在25um以上，微杯越厚耗用的電子墨水就越多且由於膠體溶液的黏滯性與表面張力，造成電子墨水填入時在微杯的底部形成空隙，無法完全填滿，製作出來的顯示器也就不良而報廢，這些都讓電子紙的成本居高不下。再者，微杯的厚度越厚，還會加大了控制電極與共用電極的距離，讓帶電荷顏色粒子移動的速度減慢，移動的距離增加，需要更高的驅動電壓與更長的時間到定位，這會影響畫面的更新速度與品質。當使用在電子紙閱讀器時，會造成使用者體驗的觀感不佳，基於以上種種缺點，本發明可以徹底解決。The electronic paper used in the electrophoretic display is manufactured by using the technology of microcapsules and microcups. The production cost of electronic paper is high due to the yield rate. The purpose of the present invention is to save the production cost of electronic paper and make the electronic paper directly in the display. The most commonly used electronic paper at present is the microcup structure, and the production method is mostly roll-to-roll. During the production, a convex roller is used to press out a dent on the resin film to make a microcup structure. The microcup structure is used as a container for electronic ink, and the resin film is soft and easily cracked by pressure. Therefore, the electronic paper product must be well protected, which causes major difficulties in the process. Secondly, the thickness of the microcup (the extension distance perpendicular to the viewing surface) is between 25 and 50um, so the production precision requirement is very high. In roller die production, the thinner the microcup, the easier it is to break and will be peeled off and adhere to the roller, causing damage to the roller and poor production yield. In practice, it is above 25um. The thicker the microcup, the more electronic ink is consumed. Due to the viscosity and surface tension of the colloid solution, gaps are formed at the bottom of the microcup when the electronic ink is filled, and it cannot be completely filled. The produced display is also defective and scrapped, which makes the cost of electronic paper high. In addition, the thicker the microcup, the greater the distance between the control electrode and the common electrode, which slows down the movement of the charged color particles and increases the movement distance. It requires a higher drive voltage and a longer time to position, which will affect the update speed and quality of the screen. When used in an electronic paper reader, it will cause a poor user experience. Based on the above shortcomings, the present invention can completely solve them.
完成的微隔間所界定出來之槽室體積大都小於千分之1立方釐米，裝填膠體溶液時空氣很難排出，讓裝填膠體溶液後槽室內留有許多空隙，這些空隙是顏色粒子無法到達的區域，也就是顯示的無效區域，形成不良品，為了改善這個問題，在裝填膠體溶液時必須在真空的條件下，才能避免空氣無法排除形成空隙，便可避免不良品的發生。The volume of the chamber defined by the completed micro-compartment is mostly less than 1/1000 cubic centimeter. It is difficult to exhaust the air when filling the colloid solution, leaving many gaps in the chamber after filling the colloid solution. These gaps are areas that color particles cannot reach, that is, the invalid areas displayed, resulting in defective products. In order to improve this problem, the colloid solution must be filled under vacuum conditions to avoid air from being unable to be discharged and forming gaps, thereby avoiding the occurrence of defective products.
100:電泳式顯示器100: Electrophoretic display
10:控制基板10: Control board
10U:第二控制基板(上方控制基板)10U: Second control substrate (upper control substrate)
10D:第一控制基板(下方控制基板)10D: First control substrate (lower control substrate)
12:相對基板12: Relative substrate
13:光學膠13: Optical glue
14:共同電極層14: Common electrode layer
15:透明保護層15: Transparent protective layer
16:上玻璃基板16: Upper glass substrate
20,20a:電泳層20,20a: electrophoresis layer
22:中空腔體/微杯22: Hollow cavity/micro cup
24:膠體溶液24: Colloidal solution
26:帶電荷顏色粒子26: Charged colored particles
26B:帶電荷黑色粒子26B: Charged black particles
26W:帶電荷白色粒子26W: Charged white particles
26C:帶電荷青色粒子26C: Charged cyan particles
26M:帶電荷洋紅色粒子26M: Charged magenta particles
26Y:帶電荷黃色粒子26Y: Charged yellow particles
30,30a:驅動電路層30,30a: driving circuit layer
30U:第二驅動電路層(上方驅動電路層)30U: Second drive circuit layer (upper drive circuit layer)
30D:第一驅動電路層(下方驅動電路層)30D: First drive circuit layer (lower drive circuit layer)
PEL:控制電極層PEL: Control electrode layer
PE:控制電極PE: Control electrode
PELU:第二控制電極層(上方控制電極層)PELU: Second control electrode layer (upper control electrode layer)
PELD:第一控制電極層(下方控制電極層)PELD: first control electrode layer (lower control electrode layer)
PEU:第二控制電極PEU: Second control electrode
PED:第一控制電極PED: first control electrode
PE1,PE2,PE3:控制電極PE1, PE2, PE3: control electrodes
CF:彩色濾光層CF: Color filter
CF1,CF2,CF3,CFR,CFG,CFB,CFW:濾光顏色塊CF1,CF2,CF3,CFR,CFG,CFB,CFW: filter color blocks
CF-1:第一彩色濾光層CF-1: First color filter layer
CF-2:第二彩色濾光層CF-2: Second color filter layer
Vcom:共同電壓Vcom: common voltage
Cp:電泳電容Cp: electrophoretic capacitance
Cs:儲存電容Cs: Storage capacitor
R:電阻R: Resistance
32:薄膜電晶體32: Thin Film Transistor
320:絕緣層320: Insulation layer
322:摻雜層322: Doped layers
324:絕緣保護層324: Insulation protective layer
Mg:閘極金屬Mg: Gate metal
Ms:源極金屬Ms: Source Metal
Md:汲極金屬Md: Drain metal
M1:第一金屬層M1: First metal layer
M2:第二金屬層M2: Second metal layer
CE1:第一電極CE1: First electrode
CE2:第二電極CE2: Second electrode
CI:絕緣層CICI: Insulation layer CI
V1,V2:貫孔(via)V1, V2: via
ITO1:第一透明導電層ITO1: first transparent conductive layer
ITO2:第二透明導電層ITO2: Second transparent conductive layer
ITO3:第三透明導電層ITO3: The third transparent conductive layer
PLN:平坦層PLN: Flat layer
AS:半導體部AS: Semiconductor Division
GL:閘極線GL: Gate line
DL:資料線DL: Data Line
GLITO:透明導電閘極線GLITO: Transparent Conductive Gate Line
DLITO:透明導電資料線DLITO: Transparent conductive data line
BM:遮光層BM: Shading layer
L1,L2:入射光L1, L2: incident light
Ve:共同電壓線Ve: common voltage line
50:微隔間結構50: Micro-compartment structure
52:隔間壁52: Partition wall
54:槽室54: Tank room
56:縫隙56: Gap
D:長度D: Length
60:微卡榫60: Micro-tenon
GND:接地層GND: ground layer
VCL:共同電壓層VCL: common voltage layer
L:閘極通道長度L: Gate channel length
W:閘極通道寬度W: Gate channel width
W1,W2:寬度W1,W2: Width
PRA:第一殘餘光阻(第一高分子材料疊層)PRA: First residual photoresist (first polymer material stack)
PRB:第二殘餘光阻(第二高分子材料疊層)PRB: Second residual photoresist (second polymer material stack)
PR1:第一層光阻PR1: First layer of photoresist
PR2:第二層光阻PR2: Second layer of photoresist
PM:光罩PM: Photomask
H:孔洞H: Hole
Tx1,Tx2,TxN:觸控發射電極Tx1, Tx2, TxN: touch the transmitting electrode
Rx1,Rxn,RxM:觸控接收電極Rx1, Rxn, RxM: touch receiving electrode
200:顯示觸控整合驅動器(顯示驅動器)200: Display touch integrated driver (display driver)
S:間隙S: Gap
T:隔間壁厚度T: Partition wall thickness
H1:隔間壁高度(微隔間結構厚度)H1: Partition wall height (micro-partition structure thickness)
圖1A顯示一習知黑白電泳式顯示器100的剖視圖。FIG. 1A shows a cross-sectional view of a conventional black-and-white electrophoretic display 100.
圖1B顯示一習知彩色電泳式顯示器100的剖視圖。FIG. 1B shows a cross-sectional view of a conventional color electrophoretic display 100.
圖2A說明圖1A之習知黑白電泳式顯示器100操作示意。FIG. 2A illustrates the operation of the conventional black-and-white electrophoretic display 100 of FIG. 1A .
圖2B說明控制電極層PEL/驅動電路層30a等效電路圖。Figure 2B illustrates the equivalent circuit diagram of the control electrode layer PEL/driving circuit layer 30a.
圖2C說明儲存電容的設計方式。Figure 2C illustrates the design of the storage capacitor.
圖3A為說明本發明之一實施例的電泳式顯示器100的剖視圖。FIG. 3A is a cross-sectional view of an electrophoretic display 100 illustrating an embodiment of the present invention.
圖3B為依據本發明之一實施例的電泳式顯示器100的部份元件剖視圖。FIG3B is a cross-sectional view of some components of an electrophoretic display 100 according to an embodiment of the present invention.
圖3C為對應圖3B之上視圖。Figure 3C is a view corresponding to the upper side of Figure 3B.
圖4A為說明依據本發明另一實施方式之的電泳式顯示器100的部份元件剖視圖。FIG4A is a cross-sectional view of some components of an electrophoretic display 100 according to another embodiment of the present invention.
圖4B為對應圖4A之上視圖。Figure 4B is a view corresponding to the upper side of Figure 4A.
圖4C為依據本發明另一實施方式的電泳式顯示器100的部份元件上視圖。FIG. 4C is a top view of some components of an electrophoretic display 100 according to another embodiment of the present invention.
圖5A為說明依據本發明另一實施方式之的電泳式顯示器100的部份元件剖視圖。FIG5A is a cross-sectional view of some components of an electrophoretic display 100 according to another embodiment of the present invention.
圖5B為對應圖5A之上視圖。Figure 5B is a view corresponding to the upper side of Figure 5A.
圖5C為說明依據本發明另一實施方式之的電泳式顯示器100的部份元件剖視圖。FIG5C is a cross-sectional view of some components of an electrophoretic display 100 according to another embodiment of the present invention.
圖6A為說明一習知薄膜電晶體之結構圖。FIG6A is a structural diagram illustrating a conventional thin film transistor.
圖6B為習知薄膜電晶體32與其他相關元件之上視圖。FIG6B is a top view of the conventional thin film transistor 32 and other related components.
圖6C為依據本發明之一薄膜電晶體實施例。FIG6C is a thin film transistor embodiment according to the present invention.
圖6D為依據本發明所設計在不同解析度下的開口率實例。Figure 6D is an example of the opening ratio at different resolutions designed according to the present invention.
圖7A為習知之彩色電泳式顯示器100之剖視圖。FIG. 7A is a cross-sectional view of a conventional color electrophoretic display 100.
圖7B為本發明之一實施例之彩色電泳式顯示器之剖視圖。FIG7B is a cross-sectional view of a color electrophoretic display according to an embodiment of the present invention.
圖7C為圖7B之部份剖視圖。Figure 7C is a partial cross-sectional view of Figure 7B.
圖8A為本發明之一實施例之彩色電泳式顯示器之剖視圖。FIG8A is a cross-sectional view of a color electrophoretic display according to an embodiment of the present invention.
圖8B為圖8A之部份剖視圖。Figure 8B is a partial cross-sectional view of Figure 8A.
圖9A所示為彩色濾光層之一示意圖。Figure 9A shows a schematic diagram of a color filter layer.
圖9B所示為彩色濾光層之另一示意圖。FIG9B shows another schematic diagram of the color filter layer.
圖10A為習知電泳式顯示器的微杯隔間與相關彩色濾光層的上視圖。FIG. 10A is a top view of the microcup compartment and the associated color filter layer of a conventional electrophoretic display.
圖10B為依據本發明之一實施例之微隔間上視圖。Figure 10B is a top view of a micro-compartment according to one embodiment of the present invention.
圖10C為依據本發明之一實施例之微隔間另一上視圖。FIG. 10C is another top view of a micro-compartment according to an embodiment of the present invention.
圖10D為依據本發明之另一實施例之微隔間上視圖。Figure 10D is a top view of a micro-compartment according to another embodiment of the present invention.
圖11A至11C為依據本發明一實施例製作微隔間結構之流程示意圖。Figures 11A to 11C are schematic diagrams of the process of making a micro-compartment structure according to an embodiment of the present invention.
圖12A至12C為依據本發明另一實施例製作微隔間結構之流程示意圖。Figures 12A to 12C are schematic diagrams of the process of making a micro-compartment structure according to another embodiment of the present invention.
圖13A至13C為依據本發明另一實施例製作微隔間結構之流程示意圖。Figures 13A to 13C are schematic diagrams of the process of making a micro-compartment structure according to another embodiment of the present invention.
圖14A至14C為依據本發明另一實施例製作微隔間結構之流程示意圖。Figures 14A to 14C are schematic diagrams of the process of making a micro-compartment structure according to another embodiment of the present invention.
圖14D為依據本發明另一實施例之微隔間結構之剖視圖。Figure 14D is a cross-sectional view of a micro-compartment structure according to another embodiment of the present invention.
圖14E為依據本發明另一實施例之微隔間結構之剖視圖。Figure 14E is a cross-sectional view of a micro-compartment structure according to another embodiment of the present invention.
圖14F為依據本發明一實施例之微卡榫上視圖。Figure 14F is a top view of a micro-tenon according to an embodiment of the present invention.
圖15A為依據本發明製作透明雙色電泳式顯示器的部份上視圖。Figure 15A is a partial top view of a transparent two-color electrophoretic display manufactured according to the present invention.
圖15B至15D為依據本發明製作透明雙色電泳式顯示器的部份上視圖。Figures 15B to 15D are partial top views of a transparent two-color electrophoretic display manufactured according to the present invention.
圖16A-16D為依據本發明其他實施例製作透明雙色電泳式顯示器的剖視圖。Figures 16A-16D are cross-sectional views of a transparent two-color electrophoretic display manufactured according to other embodiments of the present invention.
圖17A-17F為說明微隔間之隔間壁製作流程圖。Figures 17A-17F are flowcharts for explaining the production process of the partition wall of a micro-partition.
圖18A為依據本發明之一實施例之彩色濾光層CF示意圖。FIG18A is a schematic diagram of a color filter layer CF according to an embodiment of the present invention.
圖18B為說明圖18A操作之示意圖。Figure 18B is a schematic diagram illustrating the operation of Figure 18A.
圖19為依據本發明之電泳式顯示器的內嵌式觸控示意圖。FIG19 is a schematic diagram of the embedded touch screen of the electrophoretic display according to the present invention.
圖20A-20C為本發明具有雙面控制基板之電泳式顯示器之實施例示意圖。Figures 20A-20C are schematic diagrams of an embodiment of the electrophoretic display with a double-sided control substrate of the present invention.
有關本發明的詳細說明及技術內容，請參閱以下的詳細說和附圖說明如下。然須知下列圖示僅為說明發明之各種實施例之示意，部份元件係以較易為人理解方式繪示，並非針對實際元件尺寸繪示。For detailed description and technical content of the present invention, please refer to the following detailed description and attached drawings. However, it should be noted that the following drawings are only for illustration of various embodiments of the invention, and some components are drawn in a way that is easier for people to understand, and are not drawn for actual component sizes.
如本文所用之「在...上方」及「在...上」之用語可指稱一元件相對於其他元件之一相對位置或是製程上的先後順序。例如元件A在元件B上，或是元件A在元件B上方，不代表元件A與元件B直接接觸，元件A與元件B中間可能尚有其他元件，另外例如元件A在元件B上，或是元件A在元件B上方代表製作順序的先後次序，元件B的製作程序先於元件A的製作程序，元件A與元件B中間可能尚有其他元件的製作程序。再者，所謂位置上下僅為了配合圖示方便敘述，不代表本發明在使用時的明確位置。As used herein, the terms "above" and "on" may refer to a relative position of a component relative to other components or a sequence in the manufacturing process. For example, component A is on component B, or component A is above component B, which does not mean that component A and component B are in direct contact. There may be other components between component A and component B. In addition, for example, component A is on component B, or component A is above component B, which means the sequence of manufacturing. The manufacturing process of component B precedes the manufacturing process of component A, and there may be other manufacturing processes of components between component A and component B. Furthermore, the so-called up and down positions are only for the convenience of description in conjunction with the diagram, and do not represent the specific position of the present invention when it is used.
如本文所用之「在...之間」之用語可指稱一元件相對於其他元件之一相對位置或是製程上的先後順序。例如元件A在元件B及元件C之間不代表元件A與元件B及元件C直接接觸，元件A與元件B及元件C中間可能尚有其他元件，另外例如元件A在元件B及元件C之間，代表製作順序的先後次序，元件B的製作程序先於元件A的製作程序，或是元件C的製作程序先於元件A，元件A與元件B中間可能尚有其他元件的製作程序，元件A與元件C中間可能尚有其他元件的製作程序。再者，所謂位置之間僅為了配合圖示方便敘述，不代表本發明在使用時的明確位置。As used herein, the term "between..." may refer to a relative position of a component relative to other components or a sequence in the manufacturing process. For example, component A being between components B and C does not mean that component A is in direct contact with components B and C. There may be other components between components A, B and C. For example, component A being between components B and C represents the sequence of manufacturing. The manufacturing process of component B precedes the manufacturing process of component A, or the manufacturing process of component C precedes that of component A. There may be other manufacturing processes between components A and B, and there may be other manufacturing processes between components A and C. Furthermore, the so-called position between is only for the convenience of description with the diagram, and does not represent the exact position of the present invention when it is used.
1.高開口率電泳式顯示器1. High aperture electrophoretic display
要達到觀看面在控制基板的表面，關鍵在於提高控制基板的開口率，開口率指在顯示區域的範圍內，除去所有的不透明區域(例如薄膜電晶體的金屬電極)後的光線可通過部分的面積和整體顯示區域面積之間的比例，由於顯示區域通常由顯示像素所組合而成，所以也等同於用單一的顯示像素內可以透過光線的面積與該像素的面積之比率來表示。習知技術使用金屬層在其驅動電路層30a中做儲存電容，所以在像素內的開口率都小於20%，因此無法把觀看面移到與控制基板的一面，本發明把開口率提高到不低於70%，較佳把開口率提高到不低於80%，最佳把開口率提高到不低於90%。提高開口率的關鍵要先把非透明的儲存電容電極，部份改用透明導電材料取代，其次是薄膜電晶體TFT的面積要縮小，最後閘極線與資料線的線寬也要有所限制，才能達到高開口率的要求。To achieve the viewing surface on the surface of the control substrate, the key is to increase the aperture ratio of the control substrate. The aperture ratio refers to the ratio between the area of the part through which light can pass after removing all opaque areas (such as the metal electrodes of thin film transistors) and the area of the entire display area within the display area. Since the display area is usually composed of display pixels, it is equivalent to expressing it by the ratio of the area through which light can pass in a single display pixel to the area of the pixel. The known technology uses a metal layer as a storage capacitor in its driving circuit layer 30a, so the aperture ratio in the pixel is less than 20%, so it is impossible to move the viewing surface to the side of the control substrate. The present invention increases the aperture ratio to not less than 70%, preferably increases the aperture ratio to not less than 80%, and most preferably increases the aperture ratio to not less than 90%. The key to improving the aperture ratio is to first replace part of the non-transparent storage capacitor electrode with transparent conductive materials, then reduce the area of the thin film transistor TFT, and finally limit the line width of the gate line and data line to achieve the high aperture ratio requirement.
參見圖3A，為說明本發明之一實施例的電泳式顯示器100的剖視圖，此電泳式顯示器100例如為黑白電泳式顯示器100，且包含由上至下的一相對基板12(例如可為一塑膠基板或是一玻璃基板或是一金屬基板)、一共同電極層14(例如可為一透明導電電極層或是不透明的導電金屬層或是其他可以導電的材料)、一電泳層20、一包含多個透明控制電極PE的控制電極層PEL、一高開口率驅動電路層30(以下簡稱驅動電路層30)及一控制基板10(例如可為一玻璃基板或是透明PI基板，或是其他光穿透率例如大於90%之基板材料)。其中，該共同電極層在特殊配套措施下也可以不用。如圖3A所示，該電泳層20包含多數的中空腔體22(圖示僅為其中一個)、裝填在每一中空腔體22中的膠體溶液24內含多個帶電荷顏色粒子(例如帶電荷黑色粒子26B及帶電荷白色粒子26W)，中空腔體22結構係作為電子墨水的容器。依據本發明之一實施方式，高開口率驅動電路層30中的儲存電容Cs的第一電極CE1/第二電極CE2的材料選用透明導電材料或是部分選用透明材料，俾能增進此電泳式顯示器100的開口率。此外，更有助於使用者由控制基板10側觀看此電泳式顯示器100，以利由接近觀看側的控制電極層PEL吸引帶電荷黑色粒子26B或是帶電荷白色粒子26W，以達成解決上述習之技術缺點之目的。依據本發明的其他實施例(圖未示)，該腔體22也可以裝填一膠體溶液24，該膠體溶液內含有顏色的流體(例如黑色)及單一顏色的多個帶電荷粒子(例如白色粒子)。當控制電極層PEL吸引該帶電荷顏色粒子時在觀看面顯示該粒子的顏色(例如白色)，當控制電極層PEL排斥該帶電荷顏色粒子時在觀看面顯示該流體的顏色(例如黑色)。可以定義為，電泳層包括電泳材料，該電泳材料包括複數個帶電荷顏色粒子，該複數個帶電荷顏色粒子係配置於一膠體溶液中且能在電場影響下移動通過該膠體溶液，該複數個帶電荷顏色粒子包含帶正電荷的顏色粒子與/或帶負電荷的顏色粒子。Referring to FIG. 3A , a cross-sectional view of an electrophoretic display 100 according to an embodiment of the present invention is shown. The electrophoretic display 100 is, for example, a black-and-white electrophoretic display 100, and includes, from top to bottom, a relative substrate 12 (for example, a plastic substrate, a glass substrate, or a metal substrate), a common electrode layer 14 (for example, a transparent conductive electrode layer, an opaque conductive metal layer, or other conductive materials), an electrophoretic layer 20, a control electrode layer PEL including a plurality of transparent control electrodes PE, a high aperture ratio driving circuit layer 30 (hereinafter referred to as the driving circuit layer 30), and a control substrate 10 (for example, a glass substrate, a transparent PI substrate, or other substrate materials with a light transmittance greater than 90%). The common electrode layer may not be required under special supporting measures. As shown in FIG3A , the electrophoretic layer 20 includes a plurality of hollow cavities 22 (only one of which is shown), and a colloid solution 24 filled in each hollow cavity 22 contains a plurality of charged color particles (e.g., charged black particles 26B and charged white particles 26W). The hollow cavity 22 structure serves as a container for electronic ink. According to an embodiment of the present invention, the material of the first electrode CE1/second electrode CE2 of the storage capacitor Cs in the high aperture ratio driving circuit layer 30 is selected from transparent conductive materials or partially transparent materials, so as to improve the aperture ratio of the electrophoretic display 100. In addition, it is more helpful for the user to view the electrophoretic display 100 from the control substrate 10 side, so that the control electrode layer PEL close to the viewing side attracts the charged black particles 26B or the charged white particles 26W, so as to achieve the purpose of solving the above-mentioned technical shortcomings. According to other embodiments of the present invention (not shown), the cavity 22 can also be filled with a colloid solution 24, which contains a colored fluid (e.g., black) and a plurality of charged particles of a single color (e.g., white particles). When the control electrode layer PEL attracts the charged colored particles, the color of the particles (e.g., white) is displayed on the viewing surface, and when the control electrode layer PEL repels the charged colored particles, the color of the fluid (e.g., black) is displayed on the viewing surface. It can be defined that the electrophoretic layer includes an electrophoretic material, the electrophoretic material includes a plurality of charged color particles, the plurality of charged color particles are disposed in a colloidal solution and can move through the colloidal solution under the influence of an electric field, and the plurality of charged color particles include positively charged color particles and/or negatively charged color particles.
參見圖3B，為依據本發明之一實施例的電泳式顯示器100的部份元件剖視圖，主要顯示依據本發明之控制電極層PEL、驅動電路層30及控制基板10。參見圖3C，為對應圖3B之上視圖。依據本發明之實施方式，觀看面是由接近控制電極層PEL的控制基板10方向觀看，因此，其顯示的顏色是受該些控制電極層PEL各個控制電極PE的電位吸引的膠體溶液24中的帶電荷顏色粒子的顏色。復配合參見圖1A及圖3A，在圖1A所示的習知電泳式顯示器100中，藉由驅動電路層30a控制每一控制電極PE的電性及電壓大小，即可在對應每一像素吸引帶電荷黑色粒子26B並推斥帶電荷白色粒子26W(使該像素在與控制電極層PEL相反側的觀看面呈現白色)或是對應每一像素吸引帶電荷白色粒子26W並推斥帶電荷黑色粒子26B(使該像素在與控制電極層PEL相反側的觀看面呈現黑色)。由於觀看面是較為遠離控制電極層PEL的相對基板12處，且越遠離控制電極層PEL則電場越弱，推斥帶電荷顏色粒子26的力量越弱，造成習知電泳式顯示器100的螢幕種種缺點。相反的，在本發明之電泳式顯示器100中，驅動電路層30係接近觀看面(位在控制基板10側)。藉由驅動電路層30控制每一控制電極PE的電性及電壓大小，即可在對應每一像素吸引帶電荷黑色粒子26B並推斥帶電荷白色粒子26W(使該像素在與控制電極層PEL接近的觀看面呈現黑色)或是對應每一像素吸引帶電荷白色粒子26W並推斥帶電荷黑色粒子26B(使該像素在與控制電極層PEL接近的觀看面呈現白色)。換言之，控制電極層PEL上的多個控制電極PE吸引與控制電極PE極性相異的帶電荷顏色粒子(例如帶電荷黑色粒子26B或是帶電荷白色粒子26W)堆積到電泳層20接近控制電極層PEL(包含多數控制電極PE)的那一面。由於觀看面是較為接近控制電極層PEL的控制基板10側，且越接近控制電極層PEL則電場越強，吸引帶電荷顏色粒子26的力量越強，靠近電極層的帶電荷粒子26可以牢固的鎖定，這樣即可在本發明之電泳式顯示器100達成極佳之螢幕更新率、亮度、對比度、飽和度等多項優點，且由於控制電極上的電荷在電晶體32不導通的狀態電荷不會移動呈現鎖定狀態，所以可以把帶電荷顏色粒子26穩定的吸住不會像習知技術會隨共同電極上電荷的移動造成帶電荷顏色粒子26移動(電壓回踢問題，由儲存電容放電後流向共同電極層的電荷，例如在共同電極呈現大部分帶負電荷的白色粒子的白底黑字時，就表示共同電極表面凝聚較大比例的正電荷，不利帶正電荷的黑色粒子靠近，黑色粒子會被逼回控制電極側，俗稱電壓回踢，讓原本的黑色字體變細或是不見，當畫面上的黑、白比例差異越大，問題越嚴重，或是在彩色顯示時造成色彩失真)，且移動後的粒子不會返回原位，讓觀看面的影像失真，使用本發明的方案就不會有帶電荷顏色粒子26橫移擴散與逼退的現象(彩色混色問題，飽和度降低問題)或是畫面更新時是無法移動到新的正確位置(殘影問題)。See FIG. 3B, which is a cross-sectional view of some components of an electrophoretic display 100 according to an embodiment of the present invention, mainly showing the control electrode layer PEL, the driving circuit layer 30 and the control substrate 10 according to the present invention. See FIG. 3C, which is a view corresponding to the upper side of FIG. 3B. According to the embodiment of the present invention, the viewing surface is viewed from the direction of the control substrate 10 close to the control electrode layer PEL, so the color displayed is the color of the charged color particles in the colloidal solution 24 attracted by the potential of each control electrode PE of the control electrode layer PEL. Referring to FIG. 1A and FIG. 3A , in the conventional electrophoretic display 100 shown in FIG. 1A , by controlling the electrical properties and voltage of each control electrode PE through the driving circuit layer 30a, the charged black particles 26B can be attracted and the charged white particles 26W can be repelled corresponding to each pixel (making the pixel appear white on the viewing surface opposite to the control electrode layer PEL), or the charged white particles 26W can be attracted and the charged black particles 26B can be repelled corresponding to each pixel (making the pixel appear black on the viewing surface opposite to the control electrode layer PEL). Since the viewing surface is far away from the control electrode layer PEL relative to the substrate 12, and the farther away from the control electrode layer PEL, the weaker the electric field is, the weaker the force of repelling the charged color particles 26 is, resulting in various defects of the screen of the conventional electrophoretic display 100. In contrast, in the electrophoretic display 100 of the present invention, the driving circuit layer 30 is close to the viewing surface (located on the control substrate 10 side). By controlling the electrical properties and voltage of each control electrode PE through the driving circuit layer 30, each pixel can attract the charged black particles 26B and repel the charged white particles 26W (making the pixel appear black on the viewing surface close to the control electrode layer PEL), or each pixel can attract the charged white particles 26W and repel the charged black particles 26B (making the pixel appear white on the viewing surface close to the control electrode layer PEL). In other words, the multiple control electrodes PE on the control electrode layer PEL attract the charged color particles (such as the charged black particles 26B or the charged white particles 26W) with different polarity from the control electrode PE to be accumulated on the side of the electrophoretic layer 20 close to the control electrode layer PEL (including the majority of the control electrodes PE). Since the viewing surface is closer to the control substrate 10 side of the control electrode layer PEL, and the closer to the control electrode layer PEL, the stronger the electric field, the stronger the force to attract the charged color particles 26, the charged particles 26 close to the electrode layer can be firmly locked, so that the electrophoretic display 100 of the present invention can achieve excellent screen refresh rate, brightness, and contrast. , saturation, etc., and because the charge on the control electrode does not move and is locked when the transistor 32 is not conducting, the charged color particles 26 can be stably attracted and will not move with the movement of the charge on the common electrode as in the prior art (voltage kickback problem, where the charge flows from the storage capacitor to the common electrode after discharge). For example, when the common electrode presents mostly negatively charged white particles with black characters on a white background, it means that a large proportion of positive charges are condensed on the surface of the common electrode, which is not conducive to the approach of positively charged black particles. The black particles will be forced back to the control electrode side, commonly known as voltage kickback, making the original black characters thinner or invisible. The greater the difference between the black and white ratios on the screen, the more serious the problem, or color distortion in color display), and the particles will not return to their original positions after movement, causing the image on the viewing surface to be distorted. Using the solution of the present invention, there will be no phenomenon of lateral diffusion and retreat of the charged color particles 26 (color mixing problem, saturation reduction problem) or the inability to move to the new correct position when the screen is updated (afterimage problem).
此外本發明更提供對於驅動電路層30的改良設計，以提昇由控制基板10觀看時的開口率。如圖3B所示，依據本發明的一實施方式，儲存電容Cs的第一電極CE1係由透明導電材料製成，例如可由氧化銦錫(ITO)或是類似的透明導電材料製成。此外，儲存電容Cs的第二電極CE2也係由透明導電材料製成，例如可由氧化銦錫(ITO)或是類似的透明導電材料製成。儲存電容Cs的絕緣層CI可由製作閘極絕緣層的步驟同時製作(詳見後述)。In addition, the present invention further provides an improved design for the driving circuit layer 30 to increase the opening rate when viewed from the control substrate 10. As shown in FIG. 3B , according to one embodiment of the present invention, the first electrode CE1 of the storage capacitor Cs is made of a transparent conductive material, such as indium tin oxide (ITO) or a similar transparent conductive material. In addition, the second electrode CE2 of the storage capacitor Cs is also made of a transparent conductive material, such as indium tin oxide (ITO) or a similar transparent conductive material. The insulating layer CI of the storage capacitor Cs can be made simultaneously with the step of making the gate insulating layer (see below for details).
復配合參見圖3C，在最上層的控制電極(又可稱為像素電極)PE也係由透明導電材料製成，例如可由氧化銦錫(ITO)或是類似的透明導電材料製成並藉由貫孔(via)V1而電連接到儲存電容Cs的第一透明導電層ITO1(第一電極CE1)；再者，控制電極PE也藉由貫孔(via)V2而電連接到汲極金屬Md。在製作依據本發明的儲存電容Cs時，將習知技術中原先的第一金屬層M1的對應金屬層部份(對應儲存電容Cs的電極部份)由透明導電材料(例如ITO)製成的第一透明導電層ITO1所取代。依據本發明一實施方式，先做第一金屬層M1後做第一透明導電層ITO1或是先做第一透明導電層ITO1後做第一金屬層M1都可以，基本上第一金屬層M1與第一透明導電層ITO1之間可以沒有絕緣層，當然第一金屬層M1與第一透明導電層ITO1之間加上絕緣層在功能上也是一樣的。Referring to FIG. 3C , the topmost control electrode (also referred to as pixel electrode) PE is also made of a transparent conductive material, such as indium tin oxide (ITO) or a similar transparent conductive material and is electrically connected to the first transparent conductive layer ITO1 (first electrode CE1) of the storage capacitor Cs through a via V1; furthermore, the control electrode PE is also electrically connected to the drain metal Md through a via V2. When manufacturing the storage capacitor Cs according to the present invention, the corresponding metal layer portion of the original first metal layer M1 in the prior art (corresponding to the electrode portion of the storage capacitor Cs) is replaced by the first transparent conductive layer ITO1 made of a transparent conductive material (such as ITO). According to an embodiment of the present invention, the first metal layer M1 can be made first and then the first transparent conductive layer ITO1, or the first transparent conductive layer ITO1 can be made first and then the first metal layer M1. Basically, there can be no insulating layer between the first metal layer M1 and the first transparent conductive layer ITO1. Of course, adding an insulating layer between the first metal layer M1 and the first transparent conductive layer ITO1 is also functionally the same.
此外，將習知技術中原先的第二金屬層M2的對應金屬部份由透明導電材料(例如ITO)製成的第二透明導電層ITO2所取代。第二透明導電層ITO2由投影方向觀之是在控制電極PE及第一透明導電層ITO1之間且係電連接到共同電壓Vcom或是直流電壓源例如0V電壓。再者，依據本發明一實施方式，先做第二金屬層M2後做第二透明導電層ITO2或是先做第二透明導電層ITO2後做第二金屬層M2都可以。基本上第二金屬層M2與第二透明導電層ITO2之間可以沒有絕緣層，當然第二金屬層M2與第二透明導電層ITO2之間加上絕緣層在功能上也是一樣的。In addition, the corresponding metal part of the original second metal layer M2 in the prior art is replaced by a second transparent conductive layer ITO2 made of a transparent conductive material (e.g., ITO). The second transparent conductive layer ITO2 is between the control electrode PE and the first transparent conductive layer ITO1 in the projection direction and is electrically connected to a common voltage Vcom or a DC voltage source such as 0V. Furthermore, according to an embodiment of the present invention, the second metal layer M2 can be made first and then the second transparent conductive layer ITO2, or the second transparent conductive layer ITO2 can be made first and then the second metal layer M2. Basically, there can be no insulating layer between the second metal layer M2 and the second transparent conductive layer ITO2. Of course, adding an insulating layer between the second metal layer M2 and the second transparent conductive layer ITO2 is also functionally the same.
如上所揭露，由圖3A至3C所揭露的電泳式顯示器100，由於儲存電容Cs的兩個電極分別由第一透明導電層ITO1及第二透明導電層ITO2製作，且第一透明導電層ITO1及第二透明導電層ITO2的間距極小(絕緣層CI的厚度約在0.1微米~0.5微米之間)，因此可以加大儲存電容Cs的電容值。再者，因為第一透明導電層ITO1及第二透明導電層ITO2及控制電極不會遮蔽光線而有助於提昇電泳式顯示器100由控制基板10觀看時控制基板的開口率。As disclosed above, the electrophoretic display 100 disclosed in FIGS. 3A to 3C has two electrodes of the storage capacitor Cs made of the first transparent conductive layer ITO1 and the second transparent conductive layer ITO2, respectively, and the spacing between the first transparent conductive layer ITO1 and the second transparent conductive layer ITO2 is extremely small (the thickness of the insulating layer CI is about 0.1 micrometers to 0.5 micrometers), so the capacitance value of the storage capacitor Cs can be increased. Furthermore, because the first transparent conductive layer ITO1, the second transparent conductive layer ITO2 and the control electrode will not block light, it helps to increase the opening rate of the control substrate when the electrophoretic display 100 is viewed from the control substrate 10.
復配合參見圖3A至3C，依據本發明，在製作電泳式顯示器100時，針對於控制基板10側部份，可先於控制基板10上表面以沈積製程或濺鍍製程製作金屬薄膜及微影製程製作第一金屬層M1，此第一金屬層M1用以形成閘極金屬Mg及閘極線GL，且隨後以濺鍍製程製作透明導電材料薄膜及微影製程製作第一透明導電層ITO1。上述的兩個步驟也可以互相對調，亦即先形成第一透明導電層ITO1，再形成第一金屬層M1。隨後，沈積儲存電容Cs的電容絕緣層CI(例如SiNx、SiO2)及a-Si層AS，並配合微影製程而界定出薄膜電晶體的半導體部。隨後再於所得結構上以沈積製程或濺鍍製程製作金屬薄膜及微影製程製作第二金屬層M2，此第二金屬層M2用以形成源極金屬Ms、汲極金屬Md及資料線DL，且隨後以濺鍍製程製作透明導電材料薄膜及微影製程製作第二透明導電層ITO2。上述的兩個步驟也可以互相對調，亦即先形成第二透明導電層ITO2，再形成第二金屬層M2。隨後在所得結構上用塗佈製程及微影製程製作平坦層PLN，且隨後以濺鍍製程製作透明導電材料薄膜及微影製程製作控制電極層PEL的控制電極PE(亦即第三透明導電層ITO3)。隨後可在控制電極層PEL上貼合或是製做電泳層20(內含中空腔體22係在多分子基板上形成樹脂薄膜，並利用滾輪在樹脂薄膜上壓出凹痕做中空腔體22結構後再做硬化處理，中空腔體22結構係作為電子墨水的容器，隨後在中空腔體22結構中注入所需內含帶電荷顏色粒子26的膠體溶液24後再用膠封頂硬化成為密封的腔體做成電泳層20，詳細製作過程可以參考台灣專利申請案號93100767，或是使用本發明中的微隔間結構，在後面詳述)。隨後製作相對基板12部份，相對基板12上可以形成共同電極層14，也可以不在相對基板12設置該共同電極層14。最後將控制基板10做好電泳層20的一側與相對基板12以光學膠黏合或是用本發明的微卡榫結構(詳述於後)用框膠貼合，上述沉積製程(CVD，PECVD)、濺鍍製程(sputter deposition)、塗佈製程(coating)、絕緣層製作皆為顯示面板常用的成熟製程，即可製作本發明之具高開口率及高畫面更新率等多種優點之電泳式顯示器100。Referring to FIGS. 3A to 3C , according to the present invention, when manufacturing the electrophoretic display 100, for the side portion of the control substrate 10, a metal film can be firstly formed on the upper surface of the control substrate 10 by a deposition process or a sputtering process and a first metal layer M1 can be formed by a lithography process. The first metal layer M1 is used to form a gate metal Mg and a gate line GL, and then a transparent conductive material film can be formed by a sputtering process and a first transparent conductive layer ITO1 can be formed by a lithography process. The above two steps can also be interchanged, that is, the first transparent conductive layer ITO1 can be formed first, and then the first metal layer M1 can be formed. Subsequently, a capacitor insulation layer CI (e.g., SiNx, SiO2) and an a-Si layer AS of the storage capacitor Cs are deposited, and the semiconductor portion of the thin film transistor is defined by a lithography process. A metal film is then formed on the obtained structure by a deposition process or a sputtering process, and a second metal layer M2 is formed by a lithography process. This second metal layer M2 is used to form a source metal Ms, a drain metal Md, and a data line DL, and then a transparent conductive material film is formed by a sputtering process and a second transparent conductive layer ITO2 is formed by a lithography process. The above two steps can also be interchanged, that is, the second transparent conductive layer ITO2 is formed first, and then the second metal layer M2 is formed. Then, a planarization layer PLN is fabricated on the obtained structure by coating and lithography, and then a transparent conductive material film is fabricated by sputtering and a control electrode PE (ie, the third transparent conductive layer ITO3) of the control electrode layer PEL is fabricated by lithography. Then, the electrophoretic layer 20 can be bonded or manufactured on the control electrode layer PEL (the hollow cavity 22 is formed by forming a resin film on a multi-molecule substrate, and a roller is used to press out indentations on the resin film to form a hollow cavity 22 structure, and then hardening treatment is performed. The hollow cavity 22 structure is used as a container for electronic ink. Then, the required colloid solution 24 containing charged color particles 26 is injected into the hollow cavity 22 structure, and then the top is sealed with glue and hardened to form a sealed cavity to form the electrophoretic layer 20. The detailed manufacturing process can refer to Taiwan Patent Application No. 93100767, or use the micro-compartment structure in the present invention, which will be described in detail later). Then, the relative substrate 12 is manufactured. A common electrode layer 14 may be formed on the relative substrate 12, or the common electrode layer 14 may not be provided on the relative substrate 12. Finally, the control substrate 10 is bonded to the relative substrate 12 with one side of the electrophoretic layer 20 by optical adhesive or by frame adhesive using the micro-clip structure (described in detail later) of the present invention. The above-mentioned deposition process (CVD, PECVD), sputter deposition process (sputter deposition), coating process (coating), and insulating layer manufacturing are all mature processes commonly used for display panels, and the electrophoretic display 100 of the present invention with multiple advantages such as high aperture ratio and high screen refresh rate can be manufactured.
在實務上電子紙的生產廠商會先一步的把上述的相對基板12形成共同電極層14後貼合裝有電子墨水的微杯薄膜成為電子紙，模組廠商將上述製作好的控制基板10貼合電子紙後也可以完成電泳顯示器100，但是電子紙由於微杯是在樹脂上壓出凹痕所形成，因此結構上非常柔弱，在生產的過程中良率很低，無形的墊高了成本，使用本發明中的微隔間結構可以大幅改善這個問題。In practice, electronic paper manufacturers will first form the common electrode layer 14 on the above-mentioned relative substrate 12 and then bond the microcup film containing electronic ink to form electronic paper. The module manufacturer can also complete the electrophoretic display 100 by bonding the above-made control substrate 10 to the electronic paper. However, since the microcups of electronic paper are formed by pressing dents on the resin, the structure is very weak, and the yield rate is very low during the production process, which invisibly increases the cost. The use of the micro-compartment structure in the present invention can greatly improve this problem.
參見圖4A，為說明依據本發明另一實施方式之的電泳式顯示器100的部份元件剖視圖，主要顯示依據本發明之控制電極層PEL、驅動電路層30及控制基板10。參見圖4B，為對應圖4A之上視圖。此外，圖4A及4B所示之控制電極層PEL、驅動電路層30及控制基板10也可用於圖3A所示架構中，其觀看面是由接近控制電極層PEL的控制基板10方向觀看，因此其影像顯示原理是利用控制電極層PEL的電位以吸引而非排斥膠體溶液24中的帶電荷顏色粒子26，以達成較佳之顯示效果與較高的螢幕更新率等多種優點。此外本發明更提供對於驅動電路層30的改良設計，以提昇由控制基板10觀看時的開口率與光穿透率。圖4A揭露之實施例類似圖3A揭露之實施例，然而圖4A之控制電極(又稱像素電極)PE兼代了圖3B中在第一透明導電層ITO1之電極CE1的作用，且在圖4A中於第一透明導電層ITO1製作電極CE2，係取代圖3B中位於第二透明導電層ITO2的電極CE2作用。換言之，在圖4A及4B所示之實施例中，儲存電容Cs的第一電極CE1(控制電極PE)及第二電極CE2(電連接到共同電壓Vcom或是一直流電壓例如0V)分別由透明導電材料形成的控制電極PE及第一透明導電層ITO1所提供，且儲存電容Cs的絕緣層可由製作閘極絕緣層的步驟同時製作。控制電極PE由投影方向觀之是在第一透明導電層ITO1之上。此外，對於第一透明導電層ITO1(儲存電容Cs的第二電極CE2)的共同電壓線Ve，也是與第一金屬層M1的閘極線GL同方向延伸(亦即共同電壓線Ve電連接到第一透明導電層ITO1且與驅動電路層30之一閘極線GL大致平行)。See FIG. 4A, which is a cross-sectional view of some components of an electrophoretic display 100 according to another embodiment of the present invention, mainly showing the control electrode layer PEL, the drive circuit layer 30 and the control substrate 10 according to the present invention. See FIG. 4B, which is a top view corresponding to FIG. 4A. In addition, the control electrode layer PEL, the drive circuit layer 30 and the control substrate 10 shown in FIG. 4A and FIG. 4B can also be used in the structure shown in FIG. 3A, and the viewing surface is viewed from the direction of the control substrate 10 close to the control electrode layer PEL. Therefore, the image display principle is to use the potential of the control electrode layer PEL to attract rather than repel the charged color particles 26 in the colloidal solution 24, so as to achieve a better display effect and a higher screen refresh rate and other advantages. In addition, the present invention further provides an improved design for the driving circuit layer 30 to increase the aperture ratio and light transmittance when viewed from the control substrate 10. The embodiment disclosed in FIG4A is similar to the embodiment disclosed in FIG3A, but the control electrode (also called pixel electrode) PE in FIG4A replaces the function of the electrode CE1 in the first transparent conductive layer ITO1 in FIG3B, and the electrode CE2 is made in the first transparent conductive layer ITO1 in FIG4A to replace the function of the electrode CE2 in the second transparent conductive layer ITO2 in FIG3B. In other words, in the embodiment shown in FIGS. 4A and 4B , the first electrode CE1 (control electrode PE) and the second electrode CE2 (electrically connected to the common voltage Vcom or a DC voltage such as 0V) of the storage capacitor Cs are respectively provided by the control electrode PE and the first transparent conductive layer ITO1 formed of transparent conductive materials, and the insulating layer of the storage capacitor Cs can be made at the same time as the step of making the gate insulating layer. The control electrode PE is on the first transparent conductive layer ITO1 when viewed from the projection direction. In addition, the common voltage line Ve of the first transparent conductive layer ITO1 (the second electrode CE2 of the storage capacitor Cs) also extends in the same direction as the gate line GL of the first metal layer M1 (that is, the common voltage line Ve is electrically connected to the first transparent conductive layer ITO1 and is substantially parallel to one of the gate lines GL of the driving circuit layer 30).
同樣的，在圖4A及4B所示實施例中，因為儲存電容Cs的第一電極CE1及第二電極CE2分別為透明導電材料形成，可增加電泳式顯示器100的開口率。再者，在本實施例中直接以透明導電材料形成的控制電極PE兼當作儲存電容Cs的第一電極CE1。這樣即可簡化結構，並減少製程。此外，圖4A及4B所示實施例也可應用於圖3A之架構，亦即觀看面係在控制基板10側。圖4A及4B所揭露的控制電極層PEL、驅動電路層30及控制基板10應用於圖3A架構時，可使驅動電路層30更接近觀看面(位在控制基板10側)，使本發明之電泳式顯示器100具有極佳之顯示效果與較高的螢幕更新率等多方面的進步性。且由於圖4A的疊層比圖3B的疊層少了一層透明導電層，因此有更佳的透光度。Similarly, in the embodiment shown in FIGS. 4A and 4B , because the first electrode CE1 and the second electrode CE2 of the storage capacitor Cs are respectively formed of transparent conductive materials, the opening rate of the electrophoretic display 100 can be increased. Furthermore, in this embodiment, the control electrode PE directly formed of transparent conductive materials also serves as the first electrode CE1 of the storage capacitor Cs. This simplifies the structure and reduces the manufacturing process. In addition, the embodiment shown in FIGS. 4A and 4B can also be applied to the structure of FIG. 3A , that is, the viewing surface is on the control substrate 10 side. When the control electrode layer PEL, driving circuit layer 30 and control substrate 10 disclosed in FIGS. 4A and 4B are applied to the structure of FIG. 3A, the driving circuit layer 30 can be closer to the viewing surface (located on the side of the control substrate 10), so that the electrophoretic display 100 of the present invention has excellent display effects and higher screen refresh rate and other improvements. And because the stacking layer of FIG. 4A has one less transparent conductive layer than the stacking layer of FIG. 3B, it has better light transmittance.
復配合參見圖4A及4B，在製作電泳式顯示器100時，針對於控制基板10側部份，可先於控制基板10上表面以沈積製程或濺鍍製程製作金屬薄膜及微影製程(photolithography)製作第一金屬層M1，此第一金屬層M1用以形成閘極金屬Mg、閘極線GL，隨後以濺鍍製程製作透明導電材料薄膜及微影製程製作第一透明導電層ITO1與共同電壓線Ve。上述的兩個步驟也可以互相對調，亦即先形成第一透明導電層ITO1，再形成第一金屬層M1。隨後，沈積電容絕緣層CI(例如SiNx，SiO2)及a-Si層AS，並配合微影製程而界定出薄膜電晶體的半導體部。隨後再於所得結構上以沈積製程或濺鍍製程製作金屬薄膜及微影製程製作步驟，製作第二金屬層M2，此第二金屬層M2用以形成源極金屬Ms、汲極金屬Md及資料線DL且隨後以濺鍍製程製作透明導電材料薄膜及微影製程製作步驟，製作控制電極層PEL(ITO2)。上述的兩個步驟也可以互相對調，亦即先形成控制電極層PEL(ITO2)，再形成第二金屬層M2，只要控制電極層PEL(ITO2)及第二金屬層M2中的汲極金屬Md之間有部份重疊以達成電連接即可。隨後在所得結構上用塗佈製程及微影製程製作步驟，製作平坦層PLN。隨後可在平坦層PLN上貼合或是製做電泳層20(內含中空腔體22係在塑膠基板上形成樹脂薄膜，並利用滾輪在樹脂薄膜上壓出凹痕做中空腔體22結構，中空腔體22結構係作為電子墨水的容器，隨後在中空腔體22結構中注入所需內含帶電荷顏色粒子26的膠體溶液24後再用膠封頂成為密封的腔體做成電泳層20。詳細製作過程可以參考台灣專利申請案號93100767，或是使用本發明中的微隔間結構，在後面詳述)。隨後製作相對基板12側部份，相對基板12上可以形成共同電極層14，也可以不在相對基板12設置該共同電極層14。最後將控制基板10做好電泳層20的一側與相對基板12的一側以光學膠黏合或是用本發明的微卡榫結構(詳述於後)用框膠貼合，上述沉積製程(CVD，PECVD)、濺鍍製程(sputter deposition)、塗佈製程(coating)皆為顯示面板常用的成熟製程，即可製作本發明之具高開口率及高畫面更新率等具多種進步性之電泳式顯示器100。Referring to FIGS. 4A and 4B , when manufacturing the electrophoretic display 100, for the side portion of the control substrate 10, a metal film can be firstly formed on the upper surface of the control substrate 10 by a deposition process or a sputtering process and a first metal layer M1 can be formed by a photolithography process. The first metal layer M1 is used to form a gate metal Mg and a gate line GL, and then a transparent conductive material film can be formed by a sputtering process and a photolithography process can be formed to form a first transparent conductive layer ITO1 and a common voltage line Ve. The above two steps can also be interchanged, that is, the first transparent conductive layer ITO1 is formed first, and then the first metal layer M1 is formed. Subsequently, a capacitor insulating layer CI (e.g. SiNx, SiO2) and an a-Si layer AS are deposited, and the semiconductor part of the thin film transistor is defined by a lithography process. A metal film is then formed on the obtained structure by a deposition process or a sputtering process and a lithography process is performed to form a second metal layer M2, which is used to form a source metal Ms, a drain metal Md and a data line DL, and then a transparent conductive material film is formed by a sputtering process and a lithography process is performed to form a control electrode layer PEL (ITO2). The above two steps can also be reversed, that is, the control electrode layer PEL (ITO2) is formed first, and then the second metal layer M2 is formed, as long as the control electrode layer PEL (ITO2) and the drain metal Md in the second metal layer M2 are partially overlapped to achieve electrical connection. Then, the planar layer PLN is formed on the obtained structure using coating process and lithography process steps. Then, an electrophoretic layer 20 can be bonded or manufactured on the flat layer PLN (the hollow cavity 22 is formed by forming a resin film on a plastic substrate, and a roller is used to press out indentations on the resin film to form a hollow cavity 22 structure. The hollow cavity 22 structure serves as a container for electronic ink. Then, a colloid solution 24 containing charged color particles 26 is injected into the hollow cavity 22 structure and then sealed with glue to form a sealed cavity to form the electrophoretic layer 20. The detailed manufacturing process can be referred to Taiwan Patent Application No. 93100767, or the micro-compartment structure of the present invention is used, which will be described in detail later). Then, the side of the opposing substrate 12 is manufactured. A common electrode layer 14 may be formed on the opposing substrate 12, or the common electrode layer 14 may not be provided on the opposing substrate 12. Finally, the side of the control substrate 10 with the electrophoretic layer 20 is bonded to the side of the opposing substrate 12 with optical adhesive or with a frame adhesive using the micro-clip structure of the present invention (described in detail later). The above-mentioned deposition process (CVD, PECVD), sputter deposition process (sputter deposition), and coating process (coating) are all mature processes commonly used for display panels, and can be used to manufacture the electrophoretic display 100 of the present invention with a high aperture ratio and a high screen refresh rate and other improvements.
參見圖4C，為依據本發明另一實施方式的電泳式顯示器100的部份元件上視圖，主要顯示依據本發明之控制電極層PEL及驅動電路層30。此實施例類似圖4A及4B所示之實施例，但是原先第一金屬層M1所製作的閘極線GL部分改以第一透明導電層ITO1實現以形成透明導電閘極線GLITO，而第二金屬層M2的資料線DL部分改以一第二透明導電層也就是控制電極層PEL(ITO2)實現以形成透明導電資料線DLITO。換言之，第一金屬層M1的製程主要形成薄膜電晶體的閘極金屬Mg，而第二金屬層M2的製程主要形成薄膜電晶體的源極金屬Ms/汲極金屬Md。儲存電容Cs的第一電極CE1由控制電極PE提供，而儲存電容Cs的第二電極CE2由第一透明導電層ITO1提供。同樣的，因為第一金屬層M1的閘極線部份改以第一透明導電層ITO1實現，對於第一透明導電層ITO1用以施加共同電壓Vcom的共同電壓線Ve，也是與透明導電閘極線GLITO同方向延伸(亦即共同電壓線Ve與透明導電閘極線GLITO大致平行)，上述中的更換金屬GL為透明導電材料GLITO與更換金屬DL為透明導電材料DLITO的部分可以同時更換兩項或是只更換其中一項都在本發明的範疇之中。再者，閘極線GL也可以部分改以第一透明導電層ITO1實現，而其他部份仍是以第一金屬層M1製作；且資料線DL也可以部分改以第二透明導電層ITO2實現，而其他部份仍是以第二金屬層M2製作，皆在本發明範圍內。4C is a top view of some components of an electrophoretic display 100 according to another embodiment of the present invention, mainly showing the control electrode layer PEL and the driving circuit layer 30 according to the present invention. This embodiment is similar to the embodiment shown in FIGS. 4A and 4B, but the gate line GL originally made by the first metal layer M1 is replaced by the first transparent conductive layer ITO1 to form a transparent conductive gate line GLITO, and the data line DL of the second metal layer M2 is replaced by a second transparent conductive layer, that is, the control electrode layer PEL (ITO2) to form a transparent conductive data line DLITO. In other words, the process of the first metal layer M1 mainly forms the gate metal Mg of the thin film transistor, and the process of the second metal layer M2 mainly forms the source metal Ms/drain metal Md of the thin film transistor. The first electrode CE1 of the storage capacitor Cs is provided by the control electrode PE, and the second electrode CE2 of the storage capacitor Cs is provided by the first transparent conductive layer ITO1. Similarly, because the gate line portion of the first metal layer M1 is implemented by the first transparent conductive layer ITO1, the common voltage line Ve for applying the common voltage Vcom to the first transparent conductive layer ITO1 also extends in the same direction as the transparent conductive gate line GLITO (that is, the common voltage line Ve and the transparent conductive gate line GLITO are roughly parallel). The above-mentioned replacement of the metal GL with the transparent conductive material GLITO and the replacement of the metal DL with the transparent conductive material DLITO can be replaced at the same time or only one of them can be replaced, both of which are within the scope of the present invention. Furthermore, the gate line GL can also be partially implemented by the first transparent conductive layer ITO1, while the other part is still made of the first metal layer M1; and the data line DL can also be partially implemented by the second transparent conductive layer ITO2, while the other part is still made of the second metal layer M2, all within the scope of the present invention.
同樣的，在圖4C所示實施例中，因為儲存電容Cs的第一電極CE1及第二電極CE2分別為透明導電材料形成，透明導電閘極線GLITO及透明導電資料線DLITO分別為透明導電材料形成或是任一者為至少有部份透明導電材料形成都在本發明的範圍以內，可增加電泳式顯示器100的開口率。再者，儲存電容Cs的第一電極CE1在操作上須電連接到控制電極PE，而在本實施例係直接以透明導電材料形成的控制電極PE作為儲存電容Cs的第一電極CE1。這樣即可簡化結構，並進一步減少製程。此外，圖4C所示實施例也可應用於圖3A之架構，亦即觀看面係在控制基板10側，故在將圖4C所揭露的控制電極層PEL、驅動電路層30及控制基板10應用於圖3A架構時，也可使驅動電路層30係接近觀看面(位在控制基板10側)，而使本發明之電泳式顯示器100具有極佳之顯示效果與較高的螢幕更新率與反射率等多項進步性。此外，圖4C所示結構的製程類似於圖4A及4B所示結構的製程，但是在圖4A及4B的第一金屬層M1製程中不製作閘極線，而是在第一透明導電層ITO1的製程中，同時製作透明導電閘極線GLITO及共同電壓線Ve。再者，在圖4A及4B的第二金屬層M2製程中不製作資料線，而是在第二透明導電層ITO2的製程中，同時製作透明導電資料線DLITO，將閘極線與資料線改用透明導電材料可以進一步的提高控制基板10的開口率到90%以上。Similarly, in the embodiment shown in FIG. 4C , because the first electrode CE1 and the second electrode CE2 of the storage capacitor Cs are respectively formed of transparent conductive materials, the transparent conductive gate line GLITO and the transparent conductive data line DLITO are respectively formed of transparent conductive materials or at least part of any one of them is formed of transparent conductive materials, which is within the scope of the present invention, and the aperture ratio of the electrophoretic display 100 can be increased. Furthermore, the first electrode CE1 of the storage capacitor Cs needs to be electrically connected to the control electrode PE in operation, and in this embodiment, the control electrode PE formed of transparent conductive materials is directly used as the first electrode CE1 of the storage capacitor Cs. In this way, the structure can be simplified and the manufacturing process can be further reduced. In addition, the embodiment shown in FIG. 4C can also be applied to the structure of FIG. 3A , that is, the viewing surface is on the side of the control substrate 10. Therefore, when the control electrode layer PEL, the driving circuit layer 30 and the control substrate 10 disclosed in FIG. 4C are applied to the structure of FIG. 3A , the driving circuit layer 30 can also be made close to the viewing surface (located on the side of the control substrate 10), so that the electrophoretic display 100 of the present invention has many improvements such as excellent display effect, higher screen refresh rate and reflectivity. In addition, the process of the structure shown in FIG. 4C is similar to the process of the structure shown in FIG. 4A and 4B, but the gate line is not made in the process of the first metal layer M1 in FIG. 4A and 4B, but the transparent conductive gate line GLITO and the common voltage line Ve are made at the same time in the process of the first transparent conductive layer ITO1. Furthermore, the data line is not made in the process of the second metal layer M2 in FIG. 4A and 4B, but the transparent conductive data line DLITO is made at the same time in the process of the second transparent conductive layer ITO2. Using transparent conductive materials for the gate line and the data line can further increase the opening rate of the control substrate 10 to more than 90%.
參見圖5A，為說明依據本發明另一實施方式之的電泳式顯示器100的部份元件剖視圖，主要顯示依據本發明之控制電極層PEL、驅動電路層30及控制基板10的另一種實現方式。參見圖5B，為對應圖5A之上視圖。此外，圖5A及5B所示之控制電極層PEL、驅動電路層30及控制基板10也可用於圖3A所示架構中，其觀看面是由接近控制電極層PEL的控制基板10方向觀看，因此其影像顯示原理是利用控制電極層PEL的電位以吸引而非排斥膠體溶液24中的帶電荷顏色粒子，以達成較佳之顯示效果與較高的螢幕更新率等多種優點。此外本發明更提供對於驅動電路層30的改良設計，以提昇由控制基板10觀看時的開口率。See FIG5A, which is a cross-sectional view of some components of an electrophoretic display 100 according to another embodiment of the present invention, mainly showing another implementation method of the control electrode layer PEL, the drive circuit layer 30 and the control substrate 10 according to the present invention. See FIG5B, which is a view corresponding to the upper view of FIG5A. In addition, the control electrode layer PEL, the drive circuit layer 30 and the control substrate 10 shown in FIG5A and FIG5B can also be used in the structure shown in FIG3A, and the viewing surface is viewed from the direction of the control substrate 10 close to the control electrode layer PEL. Therefore, the image display principle is to use the potential of the control electrode layer PEL to attract rather than repel the charged color particles in the colloidal solution 24, so as to achieve a better display effect and a higher screen refresh rate and other advantages. In addition, the present invention further provides an improved design for the driving circuit layer 30 to increase the opening ratio when viewed from the control substrate 10.
如圖5A所示，本實施例類似圖4A的實施例，但是控制電極PE及第一透明導電層ITO1都製作於第二金屬層M2之上。同樣的，儲存電容Cs的第一電極CE1由控制電極PE提供，而儲存電容Cs的第二電極CE2由第一透明導電層ITO1提供。此外，由於控制電極PE及第一透明導電層ITO1都製作於平坦層PLN之上，不需配合第一金屬層M1及第二金屬層M2製程製作，本實施例相對於圖4A之實施例而言，增加製程的彈性程度，再者平坦層PLN也可以取消不做，第一透明導電層ITO1製作於第二金屬層M2之上，或是第二金屬層M2製作於第一透明導電層ITO1之上(後文將配合圖5C說明)。再者，如圖5B所示，第一透明導電層ITO1的一部分與資料線DL延伸方向相同，以形成接收共同電壓Vcom的共同電壓線Ve(亦即共同電壓線Ve與資料線DL大致平行)。As shown in FIG5A , this embodiment is similar to the embodiment of FIG4A , but the control electrode PE and the first transparent conductive layer ITO1 are both fabricated on the second metal layer M2 . Similarly, the first electrode CE1 of the storage capacitor Cs is provided by the control electrode PE, and the second electrode CE2 of the storage capacitor Cs is provided by the first transparent conductive layer ITO1 . In addition, since the control electrode PE and the first transparent conductive layer ITO1 are both made on the flat layer PLN, there is no need to cooperate with the first metal layer M1 and the second metal layer M2 process. Compared with the embodiment of Figure 4A, this embodiment increases the flexibility of the process. Moreover, the flat layer PLN can also be eliminated, and the first transparent conductive layer ITO1 is made on the second metal layer M2, or the second metal layer M2 is made on the first transparent conductive layer ITO1 (which will be explained later with Figure 5C). Furthermore, as shown in Figure 5B, a part of the first transparent conductive layer ITO1 extends in the same direction as the data line DL to form a common voltage line Ve that receives the common voltage Vcom (that is, the common voltage line Ve is roughly parallel to the data line DL).
同樣的，在圖5A及5B所示實施例中，因為儲存電容Cs的第一電極CE1及第二電極CE2分別為透明導電材料形成，可增加電泳式顯示器100中控制基板10的開口率。再者，儲存電容Cs的第一電極CE1在操作上須電連接到控制電極PE，而在本實施例係直接以透明導電材料形成的控制電極PE作為儲存電容Cs的第一電極CE1。這樣即可簡化結構，並進一步減少製程。此外，圖5A及5B所示實施例也可應用於圖3A之架構，亦即觀看面係在控制基板10側，故在將圖5A及5B所示所揭露的控制電極層PEL、驅動電路層30及控制基板10應用於圖3A架構時，也可使驅動電路層30係接近觀看面(位在控制基板10側)，而使本發明之電泳式顯示器100具有極佳之顯示效果與較高的螢幕更新率等多種進步性。Similarly, in the embodiment shown in FIGS. 5A and 5B , because the first electrode CE1 and the second electrode CE2 of the storage capacitor Cs are respectively formed of transparent conductive materials, the opening rate of the control substrate 10 in the electrophoretic display 100 can be increased. Furthermore, the first electrode CE1 of the storage capacitor Cs needs to be electrically connected to the control electrode PE in operation, and in this embodiment, the control electrode PE formed of transparent conductive material is directly used as the first electrode CE1 of the storage capacitor Cs. This simplifies the structure and further reduces the manufacturing process. In addition, the embodiments shown in FIGS. 5A and 5B can also be applied to the structure of FIG. 3A, that is, the viewing surface is on the control substrate 10 side. Therefore, when the control electrode layer PEL, the driving circuit layer 30 and the control substrate 10 disclosed in FIGS. 5A and 5B are applied to the structure of FIG. 3A, the driving circuit layer 30 can also be close to the viewing surface (located on the control substrate 10 side), so that the electrophoretic display 100 of the present invention has various improvements such as excellent display effect and higher screen refresh rate.
此外，圖5A及5B所示實施例之製作方式，針對於控制基板10側部份，可先於控制基板10上表面以沈積製程或濺鍍製程製作金屬薄膜及微影製程製作第一金屬層M1，此第一金屬層M1用以形成閘極金屬Mg及閘極線GL。隨後，沈積絕緣層(例如SiNx)及a-Si層AS，並配合微影製程而界定出薄膜電晶體的半導體層。隨後再於所得結構上以沈積製程或濺鍍製程製作金屬薄膜及微影製程製作第二金屬層M2，此第二金屬層M2用以形成源極金屬Ms、汲極金屬Md及資料線DL。隨後在所得結構上用旋轉塗佈及微影製程製作平坦層PLN與貫孔VIA。隨後以濺鍍製程製作透明導電材料薄膜及微影製程製作第一透明導電層ITO1，以作為儲存電容Cs的第二電極CE2、沈積絕緣材料及微影製程製作儲存電容Cs的電容絕緣層CI、以濺鍍製程製作透明導電材料薄膜(第二透明導電層ITO2)及微影製程製作控制電極層PEL的控制電極PE，以做為儲存電容Cs的第一電極CE1，之後製作絕緣保護層。隨後可貼合或是製做電泳層20(例如內含中空腔體22係在塑膠基板上形成樹脂薄膜，並利用滾輪在樹脂薄膜上壓出凹痕做中空腔體22結構，中空腔體22結構係作為電子墨水的容器，隨後在中空腔體22結構中注入所需內含帶電荷顏色粒子26的膠體溶液24後再用膠封頂成為密封的腔體做成電泳層20。詳細製作過程可以參考台灣專利申請案號93100767)。隨後製作相對基板12側部份，可在相對基板12上形成共同電極層14與絕緣層。最後將控制基板10做好電泳層20的一側與相對基板12做好共同電極與絕緣層的一側以光學膠黏合，上述沉積製程(CVD，PECVD)、濺鍍製程(sputter deposition)、塗佈製程(coating)皆為顯示面板常用的成熟製程，即可製作本發明之具高開口率及高畫面更新率等多種進步性之電泳式顯示器100。In addition, the manufacturing method of the embodiment shown in Figures 5A and 5B, for the side portion of the control substrate 10, can firstly form a metal film on the upper surface of the control substrate 10 by a deposition process or a sputtering process and form a first metal layer M1 by a lithography process. This first metal layer M1 is used to form a gate metal Mg and a gate line GL. Subsequently, an insulating layer (such as SiNx) and an a-Si layer AS are deposited, and the semiconductor layer of the thin film transistor is defined in conjunction with a lithography process. Subsequently, a metal film is formed on the obtained structure by a deposition process or a sputtering process and a second metal layer M2 is formed by a lithography process. This second metal layer M2 is used to form a source metal Ms, a drain metal Md and a data line DL. Then, a planar layer PLN and a through hole VIA are fabricated on the obtained structure by spin coating and lithography. Then, a transparent conductive material film is fabricated by sputtering and a first transparent conductive layer ITO1 is fabricated by lithography to serve as the second electrode CE2 of the storage capacitor Cs, an insulating material is deposited and a lithography process is used to fabricate a capacitor insulating layer CI of the storage capacitor Cs, a transparent conductive material film (second transparent conductive layer ITO2) is fabricated by sputtering and a lithography process is used to fabricate a control electrode PE of a control electrode layer PEL to serve as the first electrode CE1 of the storage capacitor Cs, and then an insulating protective layer is fabricated. Then, the electrophoretic layer 20 can be bonded or manufactured (for example, the hollow cavity 22 is formed on the plastic substrate by forming a resin film, and a roller is used to press out a dent on the resin film to form a hollow cavity 22 structure, and the hollow cavity 22 structure is used as a container for electronic ink. Then, the colloidal solution 24 containing charged color particles 26 is injected into the hollow cavity 22 structure, and then the top is sealed with glue to form a sealed cavity to form the electrophoretic layer 20. The detailed manufacturing process can refer to Taiwan Patent Application No. 93100767). Then, the side portion of the opposite substrate 12 is manufactured, and the common electrode layer 14 and the insulating layer can be formed on the opposite substrate 12. Finally, the control substrate 10 with the electrophoretic layer 20 and the opposite substrate 12 with the common electrode and the insulating layer are bonded with optical adhesive. The above deposition process (CVD, PECVD), sputtering process (sputter deposition), coating process (coating) are all mature processes commonly used in display panels, and can be used to produce the electrophoretic display 100 of the present invention with multiple improvements such as high aperture ratio and high screen refresh rate.
參見圖5C，為依據為說明依據本發明另一實施方式之的電泳式顯示器100的部份元件剖視圖，主要顯示依據本發明之控制電極層PEL、驅動電路層30及控制基板10的另一種實現方式。圖5C所示之控制電極層PEL、驅動電路層30及控制基板10也可用於圖3A所示架構中，其觀看面是由接近控制電極層PEL的控制基板10方向觀看，因此其影像顯示原理是利用控制電極層PEL的電位以吸引而非排斥膠體溶液24中的帶電荷顏色粒子，以達成較佳之顯示效果與較高的螢幕更新率等多種優點。此外本發明更提供對於驅動電路層30的改良設計，以提昇由控制基板10觀看時的開口率。See FIG. 5C , which is a cross-sectional view of some components of an electrophoretic display 100 according to another embodiment of the present invention, mainly showing another implementation of the control electrode layer PEL, the drive circuit layer 30 and the control substrate 10 according to the present invention. The control electrode layer PEL, the drive circuit layer 30 and the control substrate 10 shown in FIG. 5C can also be used in the structure shown in FIG. 3A , and the viewing surface is viewed from the direction of the control substrate 10 close to the control electrode layer PEL. Therefore, the image display principle is to use the potential of the control electrode layer PEL to attract rather than repel the charged color particles in the colloidal solution 24, so as to achieve a better display effect and a higher screen refresh rate and other advantages. In addition, the present invention further provides an improved design for the driving circuit layer 30 to increase the opening ratio when viewed from the control substrate 10.
如圖5C所示，本實施例類似圖5A的實施例，儲存電容Cs的第一電極CE1由控制電極PE提供，而儲存電容Cs的第二電極CE2由第一透明導電層ITO1提供，但是控制電極PE及第一透明導電層ITO1並不製作於平坦層PLN上。因為儲存電容Cs的第一電極CE1及第二電極CE2分別為透明導電材料形成，可增加電泳式顯示器100中控制基板10的開口率。再者，儲存電容Cs的第一電極CE1在操作上須電連接到控制電極PE，而在本實施例係直接以透明導電材料形成的控制電極PE作為儲存電容Cs的第一電極CE1。這樣即可簡化結構，並進一步減少製程。此外，圖5C所示實施例也可應用於圖3A之架構，亦即觀看面係在控制基板10側，故在將圖5C所示所揭露的控制電極層PEL、驅動電路層30及控制基板10應用於圖3A架構時，也可使驅動電路層30係接近觀看面(位在控制基板10側)，而使本發明之電泳式顯示器100具有極佳之顯示效果與較高的螢幕更新率等多種進步性。As shown in FIG. 5C , this embodiment is similar to the embodiment of FIG. 5A , the first electrode CE1 of the storage capacitor Cs is provided by the control electrode PE, and the second electrode CE2 of the storage capacitor Cs is provided by the first transparent conductive layer ITO1, but the control electrode PE and the first transparent conductive layer ITO1 are not made on the flat layer PLN. Because the first electrode CE1 and the second electrode CE2 of the storage capacitor Cs are respectively formed of transparent conductive materials, the opening rate of the control substrate 10 in the electrophoretic display 100 can be increased. Furthermore, the first electrode CE1 of the storage capacitor Cs needs to be electrically connected to the control electrode PE in operation, and in this embodiment, the control electrode PE formed of transparent conductive material is directly used as the first electrode CE1 of the storage capacitor Cs. In this way, the structure can be simplified and the manufacturing process can be further reduced. In addition, the embodiment shown in FIG5C can also be applied to the structure of FIG3A, that is, the viewing surface is on the control substrate 10 side. Therefore, when the control electrode layer PEL, the driving circuit layer 30 and the control substrate 10 disclosed in FIG5C are applied to the structure of FIG3A, the driving circuit layer 30 can also be close to the viewing surface (located on the control substrate 10 side), so that the electrophoretic display 100 of the present invention has various improvements such as excellent display effect and higher screen refresh rate.
此外，圖5C所示實施例之製作方式，針對於控制基板10側部份，可先於控制基板10上表面以沈積製程或濺鍍製程製作金屬薄膜及微影製程製作第一金屬層M1，此第一金屬層M1用以形成閘極金屬Mg及閘極線GL。隨後，沈積絕緣層(例如SiNx)及a-Si層AS，並配合微影製程而界定出薄膜電晶體的半導體層。隨後再於所得結構上以沈積製程或濺鍍製程製作金屬薄膜及微影製程製作第二金屬層M2，此第二金屬層M2用以形成源極金屬Ms、汲極金屬Md及資料線DL。隨後以濺鍍製程製作透明導電材料薄膜及微影製程製作第一透明導電層ITO1與共同電壓線Ve。上述的兩個步驟也可以互相對調，亦即先形成第一透明導電層ITO1，再形成第二金屬層M2。基本上，第一透明導電層ITO1與第二金屬層M2係在同一層上或是高度上接近的位置。隨後沈積絕緣層，並配合微影製程而界定出用於儲存電容Cs的絕緣層CI；且隨後以濺鍍製程製作透明導電材料薄膜及微影製程製作步驟，製作控制電極層PEL(ITO2)。隨後可隨選的在所得結構上用塗佈製程及微影製程製作步驟，製作平坦層PLN或是製作絕緣層，之後貼合或是製做電泳層20(內含中空腔體22係在塑膠基板上形成樹脂薄膜，並利用滾輪在樹脂薄膜上壓出凹痕做中空腔體22結構，中空腔體22結構係作為電子墨水的容器，隨後在中空腔體22結構中注入所需內含帶電荷顏色粒子26的膠體溶液24後再用膠封頂成為密封的腔體做成電泳層20。詳細製作過程可以參考台灣專利申請案號93100767，或是使用本發明中的微隔間結構，在後面詳述)。隨後製作相對基板12側部份，相對基板12上可以形成共同電極層14，也可以不在相對基板12設置該共同電極層14。最後將控制基板10做好電泳層20的一側與相對基板12的一側以光學膠黏合或是用本發明的微卡榫結構(詳述於後)用框膠貼合，上述沉積製程(CVD，PECVD)、濺鍍製程(sputter deposition)、塗佈製程(coating)皆為顯示面板常用的成熟製程，即可製作本發明之具高開口率及高畫面更新率等具多種進步性之電泳式顯示器100。在圖3B-3C、4A-4C、5A-5C所示範例中，依據一種可行方式，至少一個儲存電容Cs包含一透明的第一電極CE1、一透明的第二電極CE2及在該第一電極CE1及該第二電極CE2之間的一絕緣層CI；依據另一種可行方式，全部儲存電容Cs都分別包含一透明的第一電極CE1、一透明的第二電極CE2及在該第一電極CE1及該第二電極CE2之間的一絕緣層CI；依據又另一種可行方式，至少在電泳式顯示器觀看區的儲存電容Cs都分別包含一透明的第一電極CE1、一透明的第二電極CE2及在該第一電極CE1及該第二電極CE2之間的一絕緣層CI。In addition, the manufacturing method of the embodiment shown in FIG. 5C is for the side portion of the control substrate 10. A metal film can be first formed on the upper surface of the control substrate 10 by a deposition process or a sputtering process and a first metal layer M1 can be formed by a lithography process. The first metal layer M1 is used to form a gate metal Mg and a gate line GL. Subsequently, an insulating layer (such as SiNx) and an a-Si layer AS are deposited, and the semiconductor layer of the thin film transistor is defined by a lithography process. Subsequently, a metal film can be formed on the obtained structure by a deposition process or a sputtering process and a second metal layer M2 can be formed by a lithography process. The second metal layer M2 is used to form a source metal Ms, a drain metal Md and a data line DL. Then, a transparent conductive material film is produced by a sputtering process and a first transparent conductive layer ITO1 and a common voltage line Ve are produced by a lithography process. The above two steps can also be interchanged, that is, the first transparent conductive layer ITO1 is formed first, and then the second metal layer M2 is formed. Basically, the first transparent conductive layer ITO1 and the second metal layer M2 are on the same layer or close in height. Then, an insulating layer is deposited, and the lithography process is used to define the insulating layer CI for the storage capacitor Cs; and then a transparent conductive material film is produced by a sputtering process and a lithography process is performed to produce a control electrode layer PEL (ITO2). Then, the obtained structure can be optionally coated and lithographically processed to form a flat layer PLN or an insulating layer, and then bonded or electrophoretic layer 20 (including a hollow cavity 22 formed by forming a resin film on a plastic substrate and using a roller to press out a dent on the resin film to form a hollow cavity 22 structure, and the hollow cavity 22 structure is made The container of the electronic ink is then filled with the colloidal solution 24 containing the charged color particles 26 in the hollow cavity 22 structure and then sealed with glue to form a sealed cavity to form an electrophoretic layer 20. The detailed manufacturing process can refer to Taiwan Patent Application No. 93100767, or use the micro-compartment structure of the present invention, which will be described in detail later). Then, the side portion of the relative substrate 12 is manufactured, and the common electrode layer 14 can be formed on the relative substrate 12, or the common electrode layer 14 can be not set on the relative substrate 12. Finally, the control substrate 10 with the electrophoretic layer 20 on one side is bonded to the opposite substrate 12 with optical adhesive or with frame adhesive using the micro-latching structure of the present invention (described in detail later). The above-mentioned deposition process (CVD, PECVD), sputtering process (sputter deposition), and coating process (coating) are all mature processes commonly used for display panels, and can be used to produce the electrophoretic display 100 of the present invention with various improvements such as high aperture ratio and high screen refresh rate. In the examples shown in FIGS. 3B-3C, 4A-4C, and 5A-5C, according to one feasible method, at least one storage capacitor Cs includes a transparent first electrode CE1, a transparent second electrode CE2, and an insulating layer CI between the first electrode CE1 and the second electrode CE2; according to another feasible method, all storage capacitors Cs include a transparent first electrode C E1, a transparent second electrode CE2 and an insulating layer CI between the first electrode CE1 and the second electrode CE2; according to another feasible method, at least the storage capacitor Cs in the viewing area of the electrophoretic display includes a transparent first electrode CE1, a transparent second electrode CE2 and an insulating layer CI between the first electrode CE1 and the second electrode CE2.
在圖3A-3C、圖4A-4C及圖5A-5C所示實施例中，因為共同電極層14係在遠離觀看面的位置，共同電極層14不需以導電透明材料製作。例如共同電極層14可以用不透明導電材料，例如為鋁薄膜製作。由於觀看面不在相對基板側，因此不在相對基板上設置共同電極層14也是本發明的一種實施方式。此外，依據圖3A-3C、圖4A-4C及圖5A-5C所示實施方式，開口率提高到不低於70%，較佳把開口率提高到不低於80%，最佳把開口率提高到不低於90%。依據本發明一實施方式，將閘極線加上資料線的線寬的和設計為不大於20微米(大尺寸顯示器或是低解析度顯示器)，或是不大於10微米(中、小尺寸顯示器或是高解析度顯示器)，可進一步提升開口率。In the embodiments shown in FIGS. 3A-3C , 4A-4C and 5A-5C , because the common electrode layer 14 is located far away from the viewing surface, the common electrode layer 14 does not need to be made of a conductive transparent material. For example, the common electrode layer 14 can be made of an opaque conductive material, such as an aluminum film. Since the viewing surface is not on the opposite substrate side, it is also an embodiment of the present invention not to set the common electrode layer 14 on the opposite substrate. In addition, according to the embodiments shown in FIGS. 3A-3C , 4A-4C and 5A-5C , the opening rate is increased to not less than 70%, preferably the opening rate is increased to not less than 80%, and most preferably the opening rate is increased to not less than 90%. According to an embodiment of the present invention, the sum of the line widths of the gate line and the data line is designed to be no greater than 20 microns (large-size display or low-resolution display), or no greater than 10 microns (medium- or small-size display or high-resolution display), which can further improve the opening rate.
此外，在圖3A-3C、圖4A-4C及圖5A及5C所示實施例之中，薄膜電晶體32的半導體部AS的面積可不大於1000平方微米、薄膜電晶體32與閘極線GL的重疊面積可不小於20平方微米、薄膜電晶體32與資料線DL的重疊面積可不小於5平方微米；此外，閘極線GL的線寬可不大於5微米或是10微米、資料線DL的線寬可不大於5微米或是10微米；閘極線GL的線寬與資料線DL的線寬和可不大於20微米。再者，該儲存電容Cs的第一電極CE1與第二電極CE2在投影方向彼此重疊，且其重疊面積不小於像素面積的30%。圖3A-3C、圖4A-4C及圖5A及5C所示實施例所適用的電泳式顯示器100中，電泳層20可具有本發明圖11A-11C、圖12A-12C、圖13A-13C及圖14A-14E所示或是類似方式實現的微隔間結構，且電泳式顯示器100也可有相應於圖14C-14E、圖16A-16D所相應或是類似方式實現的微卡榫60。本領域人員應該可適度修正上述實施例的微隔間及微卡榫揭露，而應用於本發明圖3A-3C、圖4A-4C及圖5A及5C所示實施例之中。此外，若使用圖3A-3C、圖4A-4C及圖5A及5C所示實施例之的電泳式顯示器100具有彩色濾光層，則該彩色濾光層可具有如本發明圖18A所示之結構，亦即彩色濾光層CF包含多個不同顏色的濾光顏色塊(CFR、CFG、CFB)，該濾光顏色塊包含多數個孔洞H且至少一該孔洞H面積不大於100平方微米。此外，使用圖3A-3C、圖4A-4C及圖5A及5C所示實施例之的電泳式顯示器100也可如圖19所示架構，將該些共同電壓線Ve電連接到一顯示驅動器200或一顯示觸控整合驅動器200；在該電泳式顯示器100之觸控操作時，該顯示觸控整合驅動器200將多個資料線DL電連接在一起作為一單一觸控發射電極；該顯示觸控整合驅動器200將多個共同電壓線Ve電連接在一起作為一單一觸控接收電極或是上述的觸控發射電極與觸控接收電極可以互相對調。In addition, in the embodiments shown in Figures 3A-3C, Figures 4A-4C and Figures 5A and 5C, the area of the semiconductor portion AS of the thin film transistor 32 may not be greater than 1000 square microns, the overlapping area of the thin film transistor 32 and the gate line GL may not be less than 20 square microns, and the overlapping area of the thin film transistor 32 and the data line DL may not be less than 5 square microns; in addition, the line width of the gate line GL may not be greater than 5 microns or 10 microns, and the line width of the data line DL may not be greater than 5 microns or 10 microns; the sum of the line width of the gate line GL and the line width of the data line DL may not be greater than 20 microns. Furthermore, the first electrode CE1 and the second electrode CE2 of the storage capacitor Cs overlap each other in the projection direction, and the overlapping area is not less than 30% of the pixel area. In the electrophoretic display 100 to which the embodiments shown in FIGS. 3A-3C, 4A-4C, and 5A and 5C are applicable, the electrophoretic layer 20 may have a micro-compartment structure shown in FIGS. 11A-11C, 12A-12C, 13A-13C, and 14A-14E of the present invention or implemented in a similar manner, and the electrophoretic display 100 may also have a micro-tenon 60 corresponding to FIGS. 14C-14E, 16A-16D or implemented in a similar manner. Those skilled in the art should be able to appropriately modify the micro-compartments and micro-latches disclosed in the above-mentioned embodiments and apply them to the embodiments shown in FIGS. 3A-3C, 4A-4C, and 5A and 5C of the present invention. In addition, if the electrophoretic display 100 using the embodiments shown in FIGS. 3A-3C, 4A-4C, and 5A and 5C has a color filter layer, the color filter layer may have a structure as shown in FIG. 18A of the present invention, that is, the color filter layer CF includes a plurality of filter color blocks (CFR, CFG, CFB) of different colors, and the filter color block includes a plurality of holes H and at least one of the holes H has an area of no more than 100 square micrometers. In addition, the electrophoretic display 100 using the embodiments shown in FIGS. 3A-3C, 4A-4C, and 5A and 5C can also be structured as shown in FIG. 19, where the common voltage lines Ve are electrically connected to a display driver 200 or a display touch integrated driver 200; during the touch operation of the electrophoretic display 100, the display touch integrated driver 200 electrically connects multiple data lines DL together as a single touch emitting electrode; the display touch integrated driver 200 electrically connects multiple common voltage lines Ve together as a single touch receiving electrode, or the above-mentioned touch emitting electrode and touch receiving electrode can be interchanged.
2.在閘極線上製作薄膜電晶體2. Fabricate thin film transistors on gate lines
參見圖6A，為說明一習知薄膜電晶體之結構圖。薄膜電晶體的製程一般包含五道光罩步驟，於第一道光罩製程，係於玻璃基板(例如控制基板10)之上形成第一金屬層M1，亦即配合第一道光罩的微影製程而界定出閘極金屬Mg及閘極線GL。在習知的電泳式顯示器，此第一金屬層M1也作為儲存電容Cs的第一電極CE1。隨後，沈積絕緣層320(例如SiNx，SiO2)及a-Si層，並配合第二道光罩的微影製程而界定出半導體部(亦即a-Si層AS)，之後進行離子佈植形成摻雜層322。隨後形成第二金屬層M2，亦即配合第三道光罩的微影製程而界定出源極金屬Ms/汲極金屬Md、資料線。在習知的電泳式顯示器，此第二金屬層M2也作為儲存電容Cs的第二電極CE2。隨後濺鍍製程製作透明導電層(ITO)，並以配合第四道光罩的微影製程而製作控制電極PE與源極金屬Ms的接觸點。沈積絕緣保護層(passivation layer)324，並以配合第五道光罩的微影製程而界定出其餘需裸露的金屬表面。Refer to FIG6A , which is a structural diagram of a conventional thin film transistor. The manufacturing process of a thin film transistor generally includes five mask steps. In the first mask process, a first metal layer M1 is formed on a glass substrate (e.g., a control substrate 10), that is, the gate metal Mg and the gate line GL are defined in cooperation with the lithography process of the first mask. In the conventional electrophoretic display, this first metal layer M1 also serves as the first electrode CE1 of the storage capacitor Cs. Subsequently, an insulating layer 320 (e.g., SiNx, SiO2) and an a-Si layer are deposited, and the semiconductor portion (i.e., the a-Si layer AS) is defined in cooperation with the lithography process of the second mask, and then ion implantation is performed to form a doping layer 322. Then, the second metal layer M2 is formed, that is, the source metal Ms/drain metal Md and data line are defined by the lithography process of the third mask. In the known electrophoretic display, this second metal layer M2 also serves as the second electrode CE2 of the storage capacitor Cs. Then, the transparent conductive layer (ITO) is made by sputtering process, and the contact point between the control electrode PE and the source metal Ms is made by the lithography process of the fourth mask. The insulating protection layer (passivation layer) 324 is deposited, and the remaining metal surface to be exposed is defined by the lithography process of the fifth mask.
參見圖6B，為習知薄膜電晶體32與其他相關元件之上視圖。如此圖所示，薄膜電晶體之源極金屬Ms係電連接到資料線DL，汲極金屬Md係透過貫孔V1而連接到控制電極PE，而閘極金屬Mg則電連接到閘極線GL。此外，薄膜電晶體32之半導體層，亦即半導體部AS則並未與閘極線GL或是資料線DL在投影角度重疊，由於非晶矽TFT的設計上會佔據較大的面積會影響控制基板的開口率。See FIG. 6B for a top view of the thin film transistor 32 and other related components. As shown in this figure, the source metal Ms of the thin film transistor is electrically connected to the data line DL, the drain metal Md is connected to the control electrode PE through the via V1, and the gate metal Mg is electrically connected to the gate line GL. In addition, the semiconductor layer of the thin film transistor 32, that is, the semiconductor part AS, does not overlap with the gate line GL or the data line DL in the projection angle, because the amorphous silicon TFT design will occupy a larger area, which will affect the opening rate of the control substrate.
參見圖6C，為了進一步提升控制基板的開口率，依據本發明之一薄膜電晶體實施例，此薄膜電晶體32之a-Si層(亦即半導體部)AS至少有部份與閘極線GL或資料線DL其中之一重疊，也可以是此薄膜電晶體32之a-Si層AS至少有部份與閘極線GL及資料線DL兩者重疊。此外，此薄膜電晶體32之貫孔V1也與閘極線GL重疊。換言之，本發明將電泳式顯示器100原本放在控制電極PE區域內的薄膜電晶體32，移往相對於資料線(Data line)與閘極線(Gate line)的交界點來增加電泳式顯示器100開口率，經實際的設計在最佳條件下，本發明之電泳式顯示器100可以具有下列開口率：參考圖6D使用本發明的設計範例。(a)在166PPI的黑白解析度下(像素大小為150umX150um)，控制基板的開口率可以達到95.5%，(b)在250PPI的黑白解析度下(像素大小為100umX100um)，控制基板的開口率可以達到92.88%，(c)在300PPI的黑白解析度下(像素大小為85umX85um)，控制基板的開口率可以達到91.39%，(d)在200PPI的彩色解析度下(像素大小為120umX120um，RGB子像素各為40umX120um)控制基板的開口率可以達到87.67%。依據本發明，在大部分的運用場景的解析度下使用保守的設計方案，調整閘極線寬度為5微米，資料線寬度為5微米(也就是閘極線的寬度加上資料線的寬度不大於10微米)，上述的解析度條件下開口率都可以達到80%以上。此外依據本發明一實施方式，調整閘極線寬度為10微米，資料線寬度為10微米(也就是閘極線的寬度加上資料線的寬度不大於20微米)，上述的解析度條件下開口率都可以達到70%以上。依據本發明一實施方式，把閘極線與資料線在與TFT的AS區(半導體區)不重疊的區域改用透明導電材料，也就是閘極線的部分區域改用透明導電材料或是資料線的部分區域改用透明導電材料，上述的解析度條件下開口率可以達到90%以上。Referring to FIG. 6C , in order to further improve the opening rate of the control substrate, according to a thin film transistor embodiment of the present invention, at least a portion of the a-Si layer (i.e., the semiconductor portion) AS of the thin film transistor 32 overlaps with one of the gate line GL or the data line DL, or at least a portion of the a-Si layer AS of the thin film transistor 32 overlaps with both the gate line GL and the data line DL. In addition, the through hole V1 of the thin film transistor 32 also overlaps with the gate line GL. In other words, the present invention moves the thin film transistor 32 originally placed in the control electrode PE region of the electrophoretic display 100 to the junction point relative to the data line and the gate line to increase the aperture ratio of the electrophoretic display 100. Through actual design and under optimal conditions, the electrophoretic display 100 of the present invention can have the following aperture ratio: Refer to FIG. 6D for the design example of the present invention. (a) At a black-and-white resolution of 166 PPI (pixel size is 150umX150um), the opening rate of the control substrate can reach 95.5%; (b) At a black-and-white resolution of 250 PPI (pixel size is 100umX100um), the opening rate of the control substrate can reach 92.88%; (c) At a black-and-white resolution of 300 PPI (pixel size is 85umX85um), the opening rate of the control substrate can reach 91.39%; (d) At a color resolution of 200 PPI (pixel size is 120umX120um, RGB sub-pixels are 40umX120um each), the opening rate of the control substrate can reach 87.67%. According to the present invention, a conservative design scheme is used under the resolution of most application scenarios, and the gate line width is adjusted to 5 microns and the data line width is adjusted to 5 microns (that is, the gate line width plus the data line width is not more than 10 microns). Under the above resolution conditions, the opening rate can reach more than 80%. In addition, according to an embodiment of the present invention, the gate line width is adjusted to 10 microns and the data line width is adjusted to 10 microns (that is, the gate line width plus the data line width is not more than 20 microns). Under the above resolution conditions, the opening rate can reach more than 70%. According to an implementation method of the present invention, the gate line and the data line are replaced with transparent conductive materials in the area that does not overlap with the AS area (semiconductor area) of the TFT, that is, part of the gate line area is replaced with transparent conductive materials or part of the data line area is replaced with transparent conductive materials. Under the above-mentioned resolution conditions, the opening rate can reach more than 90%.
現今標準的顯示器驅動電路設計都採用原本LCD的電路設計作為範本，其中使用非晶矽薄膜電晶體a-Si設計時，由於a-Si的漂移速度很慢，造成導通的電阻很大，所以TFT在設計上都會採用較高的(閘極通道寬度W/閘極通道長度L)，因此薄膜電晶體會佔據很高比例的面積，尤其是在越高的解析度下，薄膜電晶體的面積占比就會越高。由於薄膜電晶體是屬於不透明的，越高的薄膜電晶體面積占比就代表越低的開口率，由於LCD的液晶轉態的速度遠高於電泳顯示器中帶電荷粒子移動的速度，所以LCD顯示器可以提供較高的畫面更新率。然而使用電泳方式的顯示器，帶電荷粒子在膠體溶液中移動的速度很慢，畫面更新的速度也會很慢，所以在薄膜電晶體的設計考量上應該可與LCD驅動電路的薄膜電晶體設計有所不同。LCD的薄膜電晶體設計要考量使用較低的導通電阻，而在電泳式顯示器上則允許使用較高導通電阻的設計。復參見圖6C，電泳式顯示器的驅動電路層30中的薄膜電晶體32可以縮小電晶體的面積來增加開口率。依據本發明的一個實施方式，如圖6C所示，係將薄膜電晶體的閘極通道長度L及閘極通道寬度W參數針對於電泳式顯示器加以調整，以增加開口率。一般LCD驅動電路中的薄膜電晶體，其W/L的比例都大於10：1，亦即閘極通道長度L遠小於閘極通道寬度W。依據本發明的一個實施方式，薄膜電晶體的閘極通道寬度W及閘極通道長度L參數之比例為1：1，亦即閘極通道長度L等於閘極通道寬度W，即可增加電泳式顯示器100之開口率。The current standard display driver circuit design uses the original LCD circuit design as a template. When using amorphous silicon thin film transistor a-Si design, the drift speed of a-Si is very slow, resulting in a large conduction resistance. Therefore, the TFT design will use a higher (gate channel width W/gate channel length L), so the thin film transistor will occupy a high proportion of the area, especially at higher resolutions. The area ratio of thin film transistors will be higher. Since thin film transistors are opaque, a higher area ratio of thin film transistors means a lower opening rate. Since the liquid crystal transition speed of LCD is much higher than the speed of charged particles moving in electrophoretic displays, LCD displays can provide a higher screen refresh rate. However, in a display using electrophoresis, the speed at which charged particles move in the colloidal solution is very slow, and the screen update speed will also be very slow, so the design considerations of thin film transistors should be different from the thin film transistor design of the LCD drive circuit. The thin film transistor design of LCD should consider the use of a lower on-resistance, while the electrophoretic display allows the use of a higher on-resistance design. Referring again to FIG6C, the thin film transistor 32 in the drive circuit layer 30 of the electrophoretic display can reduce the area of the transistor to increase the opening rate. According to one embodiment of the present invention, as shown in FIG6C, the gate channel length L and gate channel width W parameters of the thin film transistor are adjusted for the electrophoretic display to increase the opening rate. The W/L ratio of thin film transistors in general LCD driver circuits is greater than 10:1, that is, the gate channel length L is much smaller than the gate channel width W. According to an embodiment of the present invention, the ratio of the gate channel width W and the gate channel length L parameters of the thin film transistor is 1:1, that is, the gate channel length L is equal to the gate channel width W, which can increase the opening rate of the electrophoretic display 100.
復參見圖6C，依據本發明之一實施例，此薄膜電晶體32之a-Si層(半導體部)AS面積小於1000平方微米(um2)。此薄膜電晶體32之半導體部AS與資料線DL重疊面積大於5平方微米(um2)。此薄膜電晶體32之半導體部AS與閘極線GL重疊面積大於20平方微米(um2)。換言之，依據本發明一實施方式，半導體部層AS的主要部份係建構在閘極線GL上；因為閘極線GL一般係由非透明的導電材料形成，藉由將薄膜電晶體32之半導體部AS的主要部份建構在閘極線GL，即可大幅提昇此電泳式顯示器100之控制基板開口率。此外，為了進一步優化薄膜電晶體32使用於電泳式顯示器100之設計參數，依據本發明之一實施例，此薄膜電晶體32之設計上閘極通道長度L小於10um，閘極通道寬度W小於25um。依據本發明一實施方式，閘極通道長度L為5um，而閘極通道寬度W為5um，設計上會要求閘極通道的寬度不大於閘極通道長度的5倍，也就是W/L的比率小於5倍。在不同尺寸的顯示器需求下會有不同的設計規範，尺寸越大的顯示器其解析度相對較低，為了提高生產良率，都會採用線寬較大的資料線與閘極線，例如資料線與閘極線寬都為10微米，也就是閘極線的線寬與資料線的線寬的和不大於20微米，在小尺寸的顯示器必須用比較細的線寬，例如資料線與閘極線寬都為5微米，也就是閘極線的線寬與資料線的線寬的和不大於10微米，如此控制基板的開口率可以大於80%。在電晶體通道設計上也是如此，大尺寸的顯示器的閘極通道長度L為不大於10微米，在W/L為5倍的條件下閘極通道的寬度W為不大於50微米。小尺寸的顯示器設計上，閘極通道長度L為不大於5微米，在W/L為5倍的條件下閘極通道的寬度W為不大於25微米。Referring again to FIG. 6C , according to an embodiment of the present invention, the area of the a-Si layer (semiconductor portion) AS of the thin film transistor 32 is less than 1000 square micrometers (um2 ). The overlapping area of the semiconductor portion AS of the thin film transistor 32 and the data line DL is greater than 5 square micrometers (um2 ). The overlapping area of the semiconductor portion AS of the thin film transistor 32 and the gate line GL is greater than 20 square micrometers (um2 ). In other words, according to an embodiment of the present invention, the main part of the semiconductor layer AS is constructed on the gate line GL; because the gate line GL is generally formed of a non-transparent conductive material, by constructing the main part of the semiconductor layer AS of the thin film transistor 32 on the gate line GL, the control substrate opening rate of the electrophoretic display 100 can be greatly improved. In addition, in order to further optimize the design parameters of the thin film transistor 32 used in the electrophoretic display 100, according to an embodiment of the present invention, the design upper gate channel length L of the thin film transistor 32 is less than 10um, and the gate channel width W is less than 25um. According to an embodiment of the present invention, the gate channel length L is 5 um, and the gate channel width W is 5 um. The design requires that the gate channel width is not greater than 5 times the gate channel length, that is, the W/L ratio is less than 5 times. There will be different design specifications for different display sizes. The larger the display, the lower its resolution. In order to improve the production yield, data lines and gate lines with larger line widths will be used. For example, the widths of the data line and the gate line are both 10 microns, that is, the sum of the line widths of the gate line and the data line is no more than 20 microns. Small-sized displays must use thinner line widths, for example, the widths of the data line and the gate line are both 5 microns, that is, the sum of the line widths of the gate line and the data line is no more than 10 microns. In this way, the opening rate of the substrate can be controlled to be greater than 80%. The same is true for transistor channel design. For large-sized displays, the gate channel length L is no more than 10 microns, and the gate channel width W is no more than 50 microns when W/L is 5 times. For small-sized display designs, the gate channel length L is no more than 5 microns, and the gate channel width W is no more than 25 microns when W/L is 5 times.
圖6C之至少部份建構在閘極線GL上的薄膜電晶體32架構，可應用於本發明之高開口率驅動電路層30，以更進一步提高電泳式顯示器100之整體開口率。例如，圖6C之薄膜電晶體32架構，可應用於本發明圖3A-3C、圖4A-4C及圖5A-5C所示之高開口率驅動電路層30中。這樣即可在由透明導電材料建構儲存電容Cs的第一電極CE1/第二電極CE2之外，更進一步提高電泳式顯示器100之整體開口率。然而圖6C之薄膜電晶體32架構，也可利用於習知的驅動電路層30a，例如圖1A-1B所示之習知電泳式顯示器100中，這樣可在不變更儲存電容Cs的設計下，依然提昇電泳式顯示器100之控制基板的開口率。The thin film transistor 32 structure at least partially constructed on the gate line GL in FIG6C can be applied to the high aperture ratio driving circuit layer 30 of the present invention to further improve the overall aperture ratio of the electrophoretic display 100. For example, the thin film transistor 32 structure in FIG6C can be applied to the high aperture ratio driving circuit layer 30 shown in FIG3A-3C, FIG4A-4C and FIG5A-5C of the present invention. In this way, in addition to constructing the first electrode CE1/second electrode CE2 of the storage capacitor Cs by transparent conductive materials, the overall aperture ratio of the electrophoretic display 100 can be further improved. However, the thin film transistor 32 structure of FIG. 6C can also be used in the known driving circuit layer 30a, such as the known electrophoretic display 100 shown in FIG. 1A-1B. In this way, the opening rate of the control substrate of the electrophoretic display 100 can be improved without changing the design of the storage capacitor Cs.
再者，在使用如圖6C部份建構在閘極線GL上的薄膜電晶體32架構及閘極通道寬度/長度設計的電泳式顯示器100中，電泳層20可具有本發明圖11A-11C、圖12A-12C、圖13A-13C及圖14A-14E所示或是類似方式實現的微隔間結構，且電泳式顯示器100也可有相應於圖14C-14E、圖16A-16D所相應或是類似方式實現的微卡榫60。本領域人員應該可適度修正上述實施例所揭露的微隔間及微卡榫，以應用於使用如圖6C部份建構在閘極線GL上的薄膜電晶體32架構及閘極通道寬度/長度設計的電泳式顯示器100中。此外，若使用如圖6C部份建構在閘極線GL上的薄膜電晶體32架構及閘極通道寬度/長度設計的電泳式顯示器100具有彩色濾光層，則該彩色濾光層可具有如本發明圖18A所示之結構，亦即彩色濾光層CF包含多個不同顏色的濾光顏色塊(CFR、CFG、CFB)，該濾光顏色塊包含多數個孔洞H且至少一該孔洞H面積不大於100平方微米。此外，使用如圖6C部份建構在閘極線GL上的薄膜電晶體32架構及閘極通道寬度/長度設計的電泳式顯示器100也可如圖19所示架構，將該些共同電壓線Ve電連接到一顯示驅動器200或一顯示觸控整合驅動器200；在該電泳式顯示器100之觸控操作時，該顯示觸控整合驅動器200將多個資料線DL電連接在一起作為一單一觸控發射電極；該顯示觸控整合驅動器200將多個共同電壓線Ve電連接在一起作為一單一觸控接收電極或是上述的觸控發射電極與觸控接收電極可以互相對調。Furthermore, in the electrophoretic display 100 using the thin film transistor 32 architecture and gate channel width/length design partially constructed on the gate line GL as shown in Figure 6C, the electrophoretic layer 20 may have a micro-compartment structure shown in Figures 11A-11C, Figures 12A-12C, Figures 13A-13C and Figures 14A-14E of the present invention or implemented in a similar manner, and the electrophoretic display 100 may also have a micro-tenon 60 corresponding to Figures 14C-14E, Figures 16A-16D or implemented in a similar manner. Those skilled in the art should be able to appropriately modify the micro-compartments and micro-latches disclosed in the above embodiments to apply them to the electrophoretic display 100 using the thin film transistor 32 structure and gate channel width/length design partially constructed on the gate line GL as shown in FIG. 6C . In addition, if the electrophoretic display 100 using the thin film transistor 32 structure and gate channel width/length design partially constructed on the gate line GL as shown in FIG. 6C has a color filter layer, the color filter layer can have a structure as shown in FIG. 18A of the present invention, that is, the color filter layer CF includes a plurality of filter color blocks (CFR, CFG, CFB) of different colors, and the filter color block includes a plurality of holes H and at least one of the holes H has an area of no more than 100 square microns. In addition, the electrophoretic display 100 using the thin film transistor 32 structure and gate channel width/length design partially constructed on the gate line GL as shown in FIG. 6C can also be constructed as shown in FIG. 19, and the common voltage lines Ve are electrically connected to a display driver 200 or a display touch integrated driver 200; during the touch operation of the electrophoretic display 100, the display touch integrated driver 200 electrically connects multiple data lines DL together as a single touch emission electrode; the display touch integrated driver 200 electrically connects multiple common voltage lines Ve together as a single touch receiving electrode, or the above-mentioned touch emission electrode and touch receiving electrode can be interchanged.
3.彩色濾光層移到控制基板3. The color filter layer is moved to the control substrate
參考圖7A，為習知之彩色電泳式顯示器100之剖視圖，此彩色電泳式顯示器100例如包含由上至下的上玻璃基板16、彩色濾光層CF、光學膠13、一相對基板12(例如可為一透明塑膠基板)、一共同電極層14(例如可為一透明導電電極層)、一電泳層20、一控制電極層PEL、一驅動電路層30及一控制基板10(例如可為一玻璃基板)。此外，如圖7A所示，該電泳層20包含多數的中空腔體22(圖示僅為其中一個)、裝填在每一中空腔體22中的含多個帶電荷顏色粒子26(例如帶電荷黑色粒子26B及帶電荷白色粒子26W)的膠體溶液24，中空腔體22結構係作為電子墨水的容器。然而在圖7A所示的彩色電泳式顯示器100中，由於彩色濾光層CF距離帶電荷顏色粒子中間隔有相對基板12厚度加上中空腔體22腔體膜加上光學膠13的厚度，範圍約有100~200um的厚度。這個厚度會造成入射光進來的顏色，反射出去經過其他顏色的濾光顏料時被吸收後無反射光穿透到外部，讓可視亮度下降。如圖7A所示，入射光L1先經由第二濾光顏色塊CF2入射，經過接觸帶電荷顏色粒子(例如帶電荷白色粒子26W)反射後，再經由第二濾光顏色塊CF2離開彩色電泳式顯示器100。然而此入射光L1須歷經相對基板12與第二濾光顏色塊CF2才能到達帶電荷白色粒子26W，會有一定程度衰減。再者，此入射光L1可能會再度通過第二濾光顏色塊CF2離開彩色電泳式顯示器100，造成二次濾光衰減。7A is a cross-sectional view of a known color electrophoretic display 100, which includes, from top to bottom, an upper glass substrate 16, a color filter layer CF, an optical adhesive 13, a relative substrate 12 (e.g., a transparent plastic substrate), a common electrode layer 14 (e.g., a transparent conductive electrode layer), an electrophoretic layer 20, a control electrode layer PEL, a driving circuit layer 30, and a control substrate 10 (e.g., a glass substrate). In addition, as shown in FIG. 7A , the electrophoretic layer 20 includes a plurality of hollow cavities 22 (only one of them is shown), a colloidal solution 24 containing a plurality of charged color particles 26 (e.g., charged black particles 26B and charged white particles 26W) filled in each hollow cavity 22, and the hollow cavity 22 structure serves as a container for electronic ink. However, in the color electrophoretic display 100 shown in FIG. 7A , since the color filter layer CF is separated from the charged color particles by the thickness of the relative substrate 12 plus the cavity film of the hollow cavity 22 plus the thickness of the optical glue 13, the thickness range is about 100 to 200 um. This thickness will cause the color of the incident light to be reflected and absorbed by the filter pigments of other colors, and no reflected light will penetrate to the outside, which will reduce the visible brightness. As shown in FIG. 7A , the incident light L1 first enters the second filter color block CF2, and after being reflected by the charged color particles (e.g., the charged white particles 26W), it leaves the color electrophoretic display 100 through the second filter color block CF2. However, the incident light L1 must pass through the relative substrate 12 and the second filter color block CF2 to reach the charged white particles 26W, and there will be a certain degree of attenuation. Furthermore, the incident light L1 may leave the color electrophoretic display 100 through the second filter color block CF2 again, resulting in secondary filtering attenuation.
復如圖7A所示，更糟的狀況是另一入射光L2先經由第二濾光顏色塊CF2入射，經過接觸帶電荷顏色粒子(例如帶電荷白色粒子26W)反射後，再經由不同顏色的第三濾光顏色塊CF3離開彩色電泳式顯示器100。由於第三濾光顏色塊CF3(例如藍色)與第二濾光顏色塊CF2(例如綠色)顏色不同，造成入射光L2完全被吸收而無法離開彩色電泳式顯示器100，因此無法呈現帶電荷白色粒子26W配合第二濾光顏色塊CF2所產生的顏色。上述狀況在入射光由濾光顏料入射面、到接觸帶電荷顏色粒子、再由濾光顏料離開面的行程距離越大時，問題越嚴重。簡言之，相對基板12厚度及中空腔體22腔體膜的厚度越厚及光學較厚度越大或是解析度越高，則造成顏色失真，可視亮度減少，飽和度不足等問題就越加嚴重。長年以來這個問題一直困擾使用彩色濾光層做彩色電子紙顯示器的發展，彩色電泳式顯示器100螢幕解析度也嚴重受限而無法往高解析度發展。As shown in FIG. 7A , a worse situation is that another incident light L2 is first incident through the second filter color block CF2, and after being reflected by the charged color particles (e.g., the charged white particles 26W), it leaves the color electrophoretic display 100 through the third filter color block CF3 of a different color. Since the third filter color block CF3 (e.g., blue) and the second filter color block CF2 (e.g., green) have different colors, the incident light L2 is completely absorbed and cannot leave the color electrophoretic display 100, so the color generated by the charged white particles 26W and the second filter color block CF2 cannot be presented. The above situation is more serious when the incident light travels a greater distance from the incident surface of the filter pigment to the charged color particles and then from the filter pigment to the exit surface. In short, the thicker the thickness of the cavity film relative to the thickness of the substrate 12 and the hollow cavity 22, the greater the optical thickness or the higher the resolution, the more serious the color distortion, reduced visible brightness, insufficient saturation and other problems will be. For many years, this problem has been a problem that has plagued the development of color electronic paper displays using color filter layers, and the screen resolution of color electrophoretic displays 100 is also severely limited and cannot be developed to high resolution.
參考圖7B，本發明將彩色濾光層CF製作在控制基板10上，或是接近控制基板10的位置，如此可以減少彩色濾光層CF與反射粒子間的距離，當觀看面在控制基板10同側時，彩色濾光層CF與帶電荷顏色粒子26的距離就會縮小到30um以內(減少基板12的厚度)，上述的問題就可以迎刃而解。如果電泳層20的中空腔體22使用本發明中的微隔間(詳見後述)來建置時，彩色濾光層CF與帶電荷顏色粒子26的距離可以進一步縮小到3um以下或直接接觸的零距離，這樣就可以達到彩色電泳式顯示器100的最佳顯示品質。Referring to FIG. 7B , the present invention makes the color filter layer CF on the control substrate 10 or close to the control substrate 10, so that the distance between the color filter layer CF and the reflective particles can be reduced. When the viewing surface is on the same side as the control substrate 10, the distance between the color filter layer CF and the charged color particles 26 will be reduced to less than 30um (reducing the thickness of the substrate 12), and the above-mentioned problem can be solved. If the hollow cavity 22 of the electrophoretic layer 20 is constructed using the micro compartments in the present invention (see below for details), the distance between the color filter layer CF and the charged color particles 26 can be further reduced to less than 3um or zero distance of direct contact, so that the best display quality of the color electrophoretic display 100 can be achieved.
如圖7B所示，為了說明方便，亦即與習知之電泳式顯示器有更清楚之比對；即使本發明之電泳式顯示器100係由控制基板10側觀看，然而圖7B所示結構，控制基板10仍處於結構下方。依據此實施例，本發明之電泳式顯示器100包含由下而上之控制基板10、彩色濾光層CF、高開口率驅動電路層30(以下簡稱驅動電路層30)、控制電極層PEL、電泳層20、共同電極層14(例如可為一透明導電電極層、或是一不透明金屬導電層等)及一相對基板12。同樣的，該電泳層20包含多數的中空腔體22(圖示僅為其中一個)、裝填在每一中空腔體22中包含多個帶電荷顏色粒子26(例如帶電荷黑色粒子26B及帶電荷白色粒子26W)的膠體溶液24。中空腔體22例如為有機高分子材料所構成的中空腔體，且用以裝填帶電荷顏色粒子26。依據本發明的其他實施例(圖未示)，該中空腔體22也可以裝填一膠體溶液24，該膠體溶液內含有顏色的流體(例如黑色)及單一顏色的多個帶電荷粒子(例如白色粒子)，中空腔體22結構係作為電子墨水的容器。As shown in FIG. 7B , for the sake of convenience of explanation, that is, to make a clearer comparison with the known electrophoretic display, even if the electrophoretic display 100 of the present invention is viewed from the control substrate 10 side, the control substrate 10 is still located below the structure in the structure shown in FIG. 7B . According to this embodiment, the electrophoretic display 100 of the present invention includes, from bottom to top, the control substrate 10, the color filter layer CF, the high aperture ratio driving circuit layer 30 (hereinafter referred to as the driving circuit layer 30), the control electrode layer PEL, the electrophoretic layer 20, the common electrode layer 14 (for example, a transparent conductive electrode layer, or an opaque metal conductive layer, etc.) and a relative substrate 12. Similarly, the electrophoretic layer 20 includes a plurality of hollow cavities 22 (only one of which is shown in the figure), and a colloidal solution 24 containing a plurality of charged color particles 26 (e.g., charged black particles 26B and charged white particles 26W) filled in each hollow cavity 22. The hollow cavity 22 is, for example, a hollow cavity made of an organic polymer material and is used to fill the charged color particles 26. According to other embodiments of the present invention (not shown), the hollow cavity 22 can also be filled with a colloidal solution 24, which contains a colored fluid (e.g., black) and a plurality of charged particles of a single color (e.g., white particles), and the hollow cavity 22 structure serves as a container for electronic ink.
本發明中之電子墨水：定義為包括複數個帶電荷顏色粒子，該複數個帶電荷顏色粒子係配置於一膠體溶液中且能在電場影響下移動通過該膠體溶液，該複數個帶電荷顏色粒子包含帶正電荷的顏色粒子與/或帶負電荷的顏色粒子。The electronic ink in the present invention is defined as comprising a plurality of charged color particles, which are disposed in a colloidal solution and can move through the colloidal solution under the influence of an electric field, and the plurality of charged color particles include positively charged color particles and/or negatively charged color particles.
如圖7C所示，為對應圖7B實施例之部份剖視圖，主要顯示控制基板10、彩色濾光層CF、高開口率驅動電路層30、控制電極層PEL部份。圖7C之高開口率驅動電路層30可採取類似圖5A之結構，亦即控制電極PE及第一透明導電層ITO1都製作於平坦層PLN之上。儲存電容Cs的兩個電極層(第一電極CE1及第二電極CE2)分別由控制電極PE及第一透明導電層ITO1所提供。再者，薄膜電晶體32之源極金屬Ms/汲極金屬Md係由第二金屬層M2形成，且汲極金屬Md係透過貫孔(via)V1而連接到控制電極PE。如圖7C所示，由於儲存電容Cs的兩個電極層(第一電極CE1及第二電極CE2)都由透明導電材料(例如ITO)所製作，不會遮蔽光線，可增加此高開口率驅動電路層30的電泳式顯示器之開口率。此外，儲存電容Cs的絕緣層CI可以依據設計而減少厚度，這樣即可最大化儲存電容Cs的電容值而不至於影響電泳式顯示器100的控制基板開口率。再者，驅動電路層30及彩色濾光層CF之間可有一氮化矽材料、氧化矽材料或是兩者的複合疊層的透明保護層15。As shown in FIG. 7C , it is a partial cross-sectional view corresponding to the embodiment of FIG. 7B , mainly showing the control substrate 10, the color filter layer CF, the high aperture ratio driving circuit layer 30, and the control electrode layer PEL. The high aperture ratio driving circuit layer 30 of FIG. 7C can adopt a structure similar to that of FIG. 5A , that is, the control electrode PE and the first transparent conductive layer ITO1 are both made on the flat layer PLN. The two electrode layers (the first electrode CE1 and the second electrode CE2) of the storage capacitor Cs are provided by the control electrode PE and the first transparent conductive layer ITO1 respectively. Furthermore, the source metal Ms/drain metal Md of the thin film transistor 32 is formed by the second metal layer M2, and the drain metal Md is connected to the control electrode PE through the via V1. As shown in FIG. 7C, since the two electrode layers (the first electrode CE1 and the second electrode CE2) of the storage capacitor Cs are made of transparent conductive materials (such as ITO), they will not block light, and the opening rate of the electrophoretic display of this high opening rate driving circuit layer 30 can be increased. In addition, the insulating layer CI of the storage capacitor Cs can be reduced in thickness according to the design, so that the capacitance value of the storage capacitor Cs can be maximized without affecting the opening rate of the control substrate of the electrophoretic display 100. Furthermore, there may be a transparent protective layer 15 made of silicon nitride material, silicon oxide material or a composite layer of the two between the driving circuit layer 30 and the color filter layer CF.
此外，在製作圖7B及7C所示之電泳式顯示器100時，可依循類似圖5A所示實施例步驟。但是在於控制基板10上表面形成薄膜電晶體之前，先形成彩色濾光層CF。此彩色濾光層CF之形成方式可依著色劑材質不同，例如顏料(Pigment)或是染料(Dye)不同，而有不同製程。以顏料而言，可以用印刷、電沉積、或塗佈後再曝光顯影或是蝕刻等方式；以染料而言，可使用染色或塗佈後再曝光顯影或蝕刻方式，藉此在控制基板10上表面形成包含多個色彩的彩色濾光層CF，由於彩色濾光層的厚度越厚造成的光損就越大，能夠穿透的光線就越少，所以實務上彩色濾光層的厚度都會限制在5微米(um)以內，也就是彩色濾光層的濾光顏色塊的厚度不超過5微米。在製作彩色濾光層CF後，可在彩色濾光層CF表面上形成氮化矽材料、氧化矽材料或是兩者的複合疊層的透明保護層15。隨後於控制基板10上表面以沈積製程或濺鍍製程製作金屬薄膜及微影製程製作第一金屬層M1，此第一金屬層M1用以形成閘極金屬Mg及閘極線GL。隨後，沈積絕緣層(例如SiNx，SiO2)及a-Si層，並配合微影製程而界定出薄膜電晶體的半導體部AS。隨後再於所得結構上以沈積製程或濺鍍製程製作金屬薄膜及微影製程製作第二金屬層M2，此第二金屬層M2用以形成源極金屬Ms、汲極金屬Md及資料線DL。隨後在所得結構上製作平坦層PLN與貫孔。隨後以濺鍍製程製作透明導電材料薄膜及微影製程製作第一透明導電層ITO1，以作為儲存電容Cs的第二電極CE2、沉積絕緣材料以作為儲存電容Cs的電容絕緣層CI、濺鍍製程製作透明導電材料薄膜(ITO2)及微影製程製作控制電極層PEL的控制電極PE，以做為儲存電容Cs的第一電極CE1。隨後可貼合或製做電泳層20(內含中空腔體22係在塑膠基板上形成樹脂薄膜，並利用滾輪在樹脂薄膜上壓出凹痕做中空腔體22結構，中空腔體22結構係作為電子墨水的容器，隨後在中空腔體22結構中注入所需內含帶電荷顏色粒子26的膠體溶液24後再用膠封頂成為密封的腔體做成電泳層20。詳細製作過程可以參考台灣專利申請案號93100767，或是本發明的微隔間結構)。隨後製作相對基板12側部份，可在相對基板12上形成共同電極層14與絕緣層。最後將控制基板10做好電泳層20的一側與相對基板12做好共同電極與絕緣層的一側以光學膠黏合或是用本發明的微卡榫結構(詳述於後)用框膠貼合。並且當觀看面不在相對基板12側時，在相對基板12上設置共同電極層14就非屬必要。上述沉積製程(CVD，PECVD)、濺鍍製程(sputter deposition)、塗佈製程(coating)皆為顯示面板常用的成熟製程，即可製作本發明之具高開口率及高畫面更新率之電泳式顯示器100。In addition, when manufacturing the electrophoretic display 100 shown in FIGS. 7B and 7C , the steps of the embodiment shown in FIG. 5A can be followed. However, before forming the thin film transistor on the upper surface of the control substrate 10, a color filter layer CF is first formed. The color filter layer CF can be formed in different processes according to different colorant materials, such as pigments or dyes. For pigments, printing, electroplating, or coating followed by exposure, development, or etching can be used; for dyes, dyeing or coating followed by exposure, development, or etching can be used to form a color filter layer CF containing multiple colors on the upper surface of the control substrate 10. Since the thicker the color filter layer, the greater the light loss caused, the less light can penetrate, so in practice the thickness of the color filter layer is limited to within 5 microns (um), that is, the thickness of the filter color block of the color filter layer does not exceed 5 microns. After the color filter layer CF is made, a transparent protective layer 15 of silicon nitride material, silicon oxide material, or a composite laminate of the two can be formed on the surface of the color filter layer CF. Then, a metal film is formed on the upper surface of the control substrate 10 by a deposition process or a sputtering process and a first metal layer M1 is formed by a lithography process. This first metal layer M1 is used to form a gate metal Mg and a gate line GL. Then, an insulating layer (such as SiNx, SiO2) and an a-Si layer are deposited, and the semiconductor portion AS of the thin film transistor is defined in cooperation with a lithography process. Then, a metal film is formed on the obtained structure by a deposition process or a sputtering process and a second metal layer M2 is formed by a lithography process. This second metal layer M2 is used to form a source metal Ms, a drain metal Md and a data line DL. Then, a planarization layer PLN and a through hole are formed on the obtained structure. Then, a transparent conductive material film is fabricated by sputtering process and a first transparent conductive layer ITO1 is fabricated by lithography process to serve as the second electrode CE2 of the storage capacitor Cs, an insulating material is deposited to serve as the capacitor insulating layer CI of the storage capacitor Cs, a transparent conductive material film (ITO2) is fabricated by sputtering process and a control electrode layer PEL is fabricated by lithography process to serve as the first electrode CE1 of the storage capacitor Cs. Then, the electrophoretic layer 20 can be bonded or manufactured (the hollow cavity 22 is formed by forming a resin film on a plastic substrate, and a roller is used to press out a dent on the resin film to form a hollow cavity 22 structure. The hollow cavity 22 structure is used as a container for electronic ink. Then, the colloidal solution 24 containing charged color particles 26 is injected into the hollow cavity 22 structure and then sealed with glue to form a sealed cavity to form the electrophoretic layer 20. The detailed manufacturing process can refer to Taiwan Patent Application No. 93100767, or the micro-compartment structure of the present invention). Then, the side portion of the opposite substrate 12 is manufactured, and the common electrode layer 14 and the insulating layer can be formed on the opposite substrate 12. Finally, the side of the control substrate 10 with the electrophoretic layer 20 and the side of the opposite substrate 12 with the common electrode and the insulating layer are bonded with optical glue or frame glue using the micro-lock structure of the present invention (described in detail later). And when the viewing surface is not on the opposite substrate 12 side, it is not necessary to set the common electrode layer 14 on the opposite substrate 12. The above-mentioned deposition process (CVD, PECVD), sputter deposition process (sputter deposition), and coating process (coating) are all mature processes commonly used for display panels, which can produce the electrophoretic display 100 of the present invention with high aperture ratio and high screen refresh rate.
然而在上述製程中，若彩色濾光層CF之材質會受隨後薄膜電晶體製程時的溫度影響，則須對於薄膜電晶體之製程方式加以選擇。例如薄膜電晶體可採取低溫製程的a-Si TFT(溫度低於200度C)，或是採用製程溫度更低的有機薄膜電晶體(Organic TFT，溫度低於100度C)。However, in the above process, if the material of the color filter layer CF is affected by the temperature of the subsequent thin film transistor process, the thin film transistor process method must be selected. For example, the thin film transistor can adopt a-Si TFT with a low temperature process (temperature below 200 degrees C), or an organic thin film transistor with a lower process temperature (Organic TFT, temperature below 100 degrees C).
如圖7B及7C所示，依據本發明之電泳式顯示器100，觀看面在控制基板10側，且彩色濾光層CF移到控制基板10之上。再者，驅動電路層30及控制電極層PEL的加總厚度遠小於圖7A中的相對基板12之厚度，故由控制基板10側入射之光線與電泳層20之距離可以減少。再者，如前所述，被高開口率驅動電路層30所吸引之帶電荷顏色粒子26(例如帶電荷黑色粒子26B及帶電荷白色粒子26W)可更快到達電泳層20接近控制電極層PEL之側面，更進一步減少由控制基板10側入射之光線與帶電荷顏色粒子26之距離，增加電泳式顯示器100之色彩準確度、色彩的飽和度與對比、亮度等多種進步性。As shown in FIGS. 7B and 7C , according to the electrophoretic display 100 of the present invention, the viewing surface is on the control substrate 10 side, and the color filter layer CF is moved above the control substrate 10. Furthermore, the total thickness of the driving circuit layer 30 and the control electrode layer PEL is much smaller than the thickness of the relative substrate 12 in FIG. 7A , so the distance between the light incident from the control substrate 10 side and the electrophoretic layer 20 can be reduced. Furthermore, as mentioned above, the charged color particles 26 (such as the charged black particles 26B and the charged white particles 26W) attracted by the high aperture ratio driving circuit layer 30 can reach the side of the electrophoretic layer 20 close to the control electrode layer PEL more quickly, further reducing the distance between the light incident from the control substrate 10 side and the charged color particles 26, thereby increasing the color accuracy, color saturation and contrast, brightness and other improvements of the electrophoretic display 100.
圖8A顯示依據本發明另一實施例之電泳式顯示器100的剖視圖。此圖所顯示的結構類似圖7B所顯示之結構，亦即彩色濾光層CF也設置在接近控制基板10的位置。然而在圖8A所顯示之結構中，係將彩色濾光層CF的位置移到控制電極層PEL之上，實務上也可以設置於驅動電路層與控制電極層之間，控制電極可以經由在彩色濾光層上的貫孔電連接到電晶體的源極或是汲極。因此這實施例之電泳式顯示器100包含由下而上之控制基板10、高開口率驅動電路層30、控制電極層PEL、彩色濾光層CF、電泳層20、共同電極層14(例如可為一透明導電電極層或是不透明金屬導電層)及一相對基板12，其中控制電極層PEL與彩色濾光層CF可以對調。FIG8A shows a cross-sectional view of an electrophoretic display 100 according to another embodiment of the present invention. The structure shown in this figure is similar to the structure shown in FIG7B, that is, the color filter layer CF is also arranged near the control substrate 10. However, in the structure shown in FIG8A, the position of the color filter layer CF is moved to the control electrode layer PEL, and in practice, it can also be arranged between the driving circuit layer and the control electrode layer. The control electrode can be electrically connected to the source or drain of the transistor through the through hole on the color filter layer. Therefore, the electrophoretic display 100 of this embodiment includes, from bottom to top, a control substrate 10, a high aperture driving circuit layer 30, a control electrode layer PEL, a color filter layer CF, an electrophoretic layer 20, a common electrode layer 14 (for example, a transparent conductive electrode layer or an opaque metal conductive layer) and a relative substrate 12, wherein the control electrode layer PEL and the color filter layer CF can be swapped.
如圖8B所示，為對應圖8A實施例之部份剖視圖，主要顯示控制基板10、彩色濾光層CF、高開口率驅動電路層30、控制電極層PEL部份。圖8B之高開口率驅動電路層30可採取類似圖5A之結構，亦即控制電極PE及第一透明導電層ITO1都製作於平坦層PLN之上。儲存電容Cs的兩個電極層(第一電極CE1及第二電極CE2)分別由控制電極PE及第一透明導電層ITO1所提供。再者，薄膜電晶體32之源極金屬Ms/汲極金屬Md係由第二金屬層M2形成，且透過貫孔(via)V1而連接到控制電極PE(ITO2)。如圖8B所示，由於儲存電容Cs的兩個電極層(第一電容導電層及第二電容導電層)都由透明導電材料(例如ITO)所製作，不會遮蔽光線。此外，儲存電容Cs的絕緣層CI可以依據設計而減少厚度，這樣即可最大化儲存電容Cs的電容值而不至於影響電泳式顯示器100的開口率。As shown in FIG8B, it is a partial cross-sectional view corresponding to the embodiment of FIG8A, mainly showing the control substrate 10, the color filter layer CF, the high aperture ratio driving circuit layer 30, and the control electrode layer PEL. The high aperture ratio driving circuit layer 30 of FIG8B can adopt a structure similar to that of FIG5A, that is, the control electrode PE and the first transparent conductive layer ITO1 are both made on the flat layer PLN. The two electrode layers (the first electrode CE1 and the second electrode CE2) of the storage capacitor Cs are provided by the control electrode PE and the first transparent conductive layer ITO1 respectively. Furthermore, the source metal Ms/drain metal Md of the thin film transistor 32 is formed by the second metal layer M2 and connected to the control electrode PE (ITO2) through the via V1. As shown in FIG8B , since the two electrode layers (the first capacitor conductive layer and the second capacitor conductive layer) of the storage capacitor Cs are made of transparent conductive materials (such as ITO), they will not block light. In addition, the insulating layer CI of the storage capacitor Cs can be reduced in thickness according to the design, so that the capacitance value of the storage capacitor Cs can be maximized without affecting the opening rate of the electrophoretic display 100.
此外，在製作圖8A及8B所示之電泳式顯示器100時，可依循類似圖5A所示實施例步驟。但是在於控制基板10上表面形成薄膜電晶體32及控制電極PE之後，即在薄膜電晶體32及控制電極PE之上形成彩色濾光層CF。此彩色濾光層CF之形成方式可依著色劑材質不同，例如顏料(Pigment)或是染料(Dye)不同，而有不同製程。以顏料而言，可以用印刷、彩色光阻曝光顯影或是蝕刻等方式；以染料而言，可使用蝕刻或是彩色光阻曝光顯影方式，藉此在薄膜電晶體32及控制電極PE之上形成包含多個色彩的彩色濾光層CF。在製作彩色濾光層CF後，可以隨選的在彩色濾光層CF表面上形成一為壓克力樹脂(Acryl resin)或是環氧樹脂(Epoxy resin)材質的透明保護層或是使用無機材料SiNx、SiO2等製作保護膜或是都不做也可以。In addition, when manufacturing the electrophoretic display 100 shown in FIGS. 8A and 8B, the steps of the embodiment shown in FIG. 5A can be followed. However, after the thin film transistor 32 and the control electrode PE are formed on the upper surface of the control substrate 10, a color filter layer CF is formed on the thin film transistor 32 and the control electrode PE. The formation method of this color filter layer CF can be different according to the different colorant materials, such as pigments (pigment) or dyes (dye), and there are different processes. For pigments, printing, color photoresist exposure and development, or etching can be used; for dyes, etching or color photoresist exposure and development can be used to form a color filter layer CF containing multiple colors on the thin film transistor 32 and the control electrode PE. After the color filter layer CF is made, a transparent protective layer made of acrylic resin or epoxy resin can be formed on the surface of the color filter layer CF, or a protective film made of inorganic materials such as SiNx and SiO2 can be used, or neither can be done.
復配合參見圖3A，隨後於彩色濾光層CF上(或是透明保護層上)貼合或製做電泳層20(內含中空腔體22係在塑膠基板上形成樹脂薄膜，並利用滾輪在樹脂薄膜上壓出凹痕做中空腔體22結構，中空腔體22結構係作為電子墨水的容器，隨後在中空腔體22結構中注入所需內含帶電荷顏色粒子26的膠體溶液24後再用膠封頂成為密封的腔體做成電泳層20。詳細製作過程可以參考台灣專利申請案號93100767，或是本發明的微隔間結構)。隨後製作相對基板12側部份，可在相對基板12上形成共同電極層14。最後將控制基板10做好電泳層20的一側與相對基板12做好共同電極的一側以光學膠黏合或是用本發明的微卡榫結構(詳述於後)用框膠貼合，當觀看面不在相對基板12側時，可以不在相對基板12設置該共同電極層14，上述沉積製程(CVD，PECVD)、濺鍍製程(sputter deposition)、塗佈製程(coating)皆為顯示面板常用的成熟製程，即可製作本發明之具高開口率及高畫面更新率之電泳式顯示器100。See FIG. 3A for the composite, and then the electrophoretic layer 20 is laminated or manufactured on the color filter layer CF (or on the transparent protective layer) (the hollow cavity 22 is formed by forming a resin film on the plastic substrate, and a roller is used to press out a dent on the resin film to form a hollow cavity 22 structure, and the hollow cavity 22 structure is used as a container for the electronic ink. Then, the colloidal solution 24 containing the required charged color particles 26 is injected into the hollow cavity 22 structure and then sealed with glue to form a sealed cavity to form the electrophoretic layer 20. The detailed manufacturing process can refer to Taiwan Patent Application No. 93100767, or the micro-compartment structure of the present invention). Then, the side of the opposite substrate 12 is manufactured, and a common electrode layer 14 can be formed on the opposite substrate 12. Finally, the side of the control substrate 10 with the electrophoretic layer 20 and the side of the opposite substrate 12 with the common electrode are bonded with optical glue or frame glue using the micro-lock structure of the present invention (described in detail later). When the viewing surface is not on the side of the opposite substrate 12, the common electrode layer 14 can be omitted on the opposite substrate 12. The above-mentioned deposition process (CVD, PECVD), sputter deposition process (sputter deposition), and coating process (coating) are all mature processes commonly used for display panels, and the electrophoretic display 100 with high aperture ratio and high screen refresh rate of the present invention can be manufactured.
如圖8A及8B所示，依據本發明之電泳式顯示器100，觀看面在控制基板10側，且彩色濾光層CF設置在控制基板10上。再者，彩色濾光層CF係幾乎與電泳層20貼合，故由控制基板10側入射之光線在經過彩色濾光層CF後與電泳層20之距離可以減少，增加電泳式顯示器100之顯示之色彩準確度、色彩的飽和度、對比度與可視亮度。As shown in FIGS. 8A and 8B , according to the electrophoretic display 100 of the present invention, the viewing surface is on the control substrate 10 side, and the color filter layer CF is disposed on the control substrate 10. Furthermore, the color filter layer CF is almost bonded to the electrophoretic layer 20, so the distance between the light incident from the control substrate 10 side and the electrophoretic layer 20 can be reduced after passing through the color filter layer CF, thereby increasing the color accuracy, color saturation, contrast and visible brightness of the electrophoretic display 100.
由於電子墨水有黑色的帶電荷粒子，有足夠的黑色飽和度，不需要用黑色的遮光層(BM)來增加黑色的飽和度，所以原來黑色邊框用來遮蔽金屬線的薄膜電晶體所使用黑色的遮光層(BM)部分可以改用白色，或是透明來取代。彩色濾光層由對應各種不同顏色的光阻材料經過光罩的曝光後，顯影過程會把沒曝光的區域清洗掉，留下曝光區域(負光阻)的顏色光阻。例如要形成紅綠藍三色的光阻材料，可以利用不同的光罩而保留不同位置的光阻材料。此外，在製作彩色濾光層時，也可以把曝光的顏色光阻洗掉留下沒曝光的區域(正光阻)的顏色光阻。換言之，經過多次的顏色光阻曝光流程把需要的顏色光阻鋪在設計的指定位置，顏色光阻可以用旋轉塗佈的方式做成不同需求的厚度。Since electronic ink has black charged particles and sufficient black saturation, there is no need to use a black shading layer (BM) to increase the black saturation. Therefore, the black shading layer (BM) used by the thin film transistor that originally used the black frame to shield the metal wire can be replaced by white or transparent. After the color filter layer is exposed by the mask with the corresponding photoresist materials of various colors, the development process will wash away the unexposed areas and leave the color photoresist in the exposed area (negative photoresist). For example, to form red, green and blue photoresist materials, different masks can be used to retain the photoresist materials in different positions. In addition, when making the color filter layer, the exposed color photoresist can also be washed away to leave the color photoresist in the unexposed area (positive photoresist). In other words, after multiple color resist exposure processes, the required color resist is laid at the designated location of the design. The color resist can be made into different required thicknesses by spin coating.
如圖9A所示，彩色濾光層在設計上多分為三區域(紅，綠，藍，亦即紅色濾光顏色塊CFR、綠色濾光顏色塊CFG及藍色濾光顏色塊CFB)。如圖9B所示，彩色濾光層在設計上也可分為四區域(紅，綠，藍，白，亦即紅色濾光顏色塊CFR、綠色濾光顏色塊CFG、藍色濾光顏色塊CFB及白色濾光顏色塊CFW)，其中區域白色的部分不用填入光阻維持透明即可。As shown in FIG9A , the color filter layer is usually divided into three regions in design (red, green, and blue, namely, the red filter color block CFR, the green filter color block CFG, and the blue filter color block CFB). As shown in FIG9B , the color filter layer can also be divided into four regions in design (red, green, blue, and white, namely, the red filter color block CFR, the green filter color block CFG, the blue filter color block CFB, and the white filter color block CFW), and the white part of the region does not need to be filled with photoresist and can be kept transparent.
在電子紙顯示裝置的運用上，原先用來增加黑色飽和度的黑色的遮光層(BM)區域，可以不用黑色，因為電子紙的黑色飽和度已經足夠。所以本區域可以用黑色，白色，或不上色的透明取代。彩色濾光層分3個區塊填入紅色，藍色，綠色，加上邊框(BM)的黑色，共計4種顏色。彩色濾光層分3個區塊填入紅色，藍色，綠色，加上邊框(BM)的白色，共計4種顏色。彩色濾光層分3個區塊填入紅色，藍色，綠色，加上邊框(BM)的透明，共計3種顏色。In the application of electronic paper display devices, the black shading layer (BM) area, which was originally used to increase the black saturation, does not need to be black, because the black saturation of electronic paper is already sufficient. Therefore, this area can be replaced by black, white, or transparent without color. The color filter layer is divided into 3 blocks and filled with red, blue, green, plus the black of the border (BM), a total of 4 colors. The color filter layer is divided into 3 blocksFilled with red, blue, green, plus the white of the border (BM), a total of 4 colors. The color filter layer is divided into 3 blocks and filled with red, blue, green, plus the transparent of the border (BM), a total of 3 colors.
彩色濾光層為了提高灰階的範圍也可以做灰階補償，所以顏色上可以做成4個區塊，在每個區塊內填入紅色，藍色，綠色，透明加上邊框的顏色。彩色濾光層分4個區塊填入紅色，藍色，綠色，透明，加上邊框(BM)的黑色，共計4種顏色。彩色濾光層分4個區塊填入紅色，藍色，綠色，透明，加上邊框(BM)的白色，共計4種顏色。彩色濾光層分4個區塊填入紅色，藍色，綠色，透明，加上邊框(BM)的透明，共計3種顏色。透明為在該區域留空不放入顏色光阻。In order to improve the range of grayscale, the color filter layer can also do grayscale compensation, so the color can be made into 4 blocks, and red, blue, green, transparent and the color of the border are filled in each block. The color filter layer is divided into 4 blocks and filled with red, blue, green, transparent, plus the black of the border (BM), a total of 4 colors. The color filter layer is divided into 4 blocks and filled with red, blue, green, transparent, plus the white of the border (BM), a total of 4 colors. The color filter layer is divided into 4 blocks and filled with red, blue, green, transparent, plus the transparent of the border (BM), a total of 3 colors. Transparency means leaving the area blank without putting in color photoresist.
再者，在使用如圖7B-7C及圖8A-8B的將彩色濾光層設置到接近控制基板10的電泳式顯示器100中，電泳層20可具有本發明圖11A-11C、圖12A-12C、圖13A-13C及圖14A-14E所示或是類似方式實現的微隔間結構，且電泳式顯示器100也可有相應於圖14C-14E、圖16A-16D所相應或是類似方式實現的微卡榫60。本領域人員應該可適度修正上述實施例的微隔間及微卡榫揭露，而應用於使用如圖7B-7C及圖8A-8B的將彩色濾光層設置到接近控制基板10的電泳式顯示器100。此外，在使用如圖7B-7C及圖8A-8B的將彩色濾光層設置到接近控制基板10的電泳式顯示器100中，該彩色濾光層可具有如本發明圖18A所示之結構，亦即彩色濾光層CF包含多個不同顏色的濾光顏色塊(CFR、CFG、CFB)，該濾光顏色塊包含多數個孔洞H且至少一該孔洞H面積不大於100平方微米。此外，使用如圖7B-7C及圖8A-8B的將彩色濾光層設置到接近控制基板10的電泳式顯示器100也可如圖19所示架構，將該些共同電壓線Ve電連接到一顯示驅動器200或一顯示觸控整合驅動器200；在該電泳式顯示器100之觸控操作時，該顯示觸控整合驅動器200將多個資料線DL電連接在一起作為一單一觸控發射電極；該顯示觸控整合驅動器200將多個共同電壓線Ve電連接在一起作為一單一觸控接收電極或是上述的觸控發射電極與觸控接收電極可以互相對調。Furthermore, in the electrophoretic display 100 in which the color filter layer is disposed close to the control substrate 10 as shown in FIGS. 7B-7C and 8A-8B, the electrophoretic layer 20 may have a micro-compartment structure as shown in FIGS. 11A-11C, 12A-12C, 13A-13C and 14A-14E of the present invention or implemented in a similar manner, and the electrophoretic display 100 may also have a micro-clip 60 corresponding to FIGS. 14C-14E and 16A-16D or implemented in a similar manner. Those skilled in the art should be able to appropriately modify the disclosure of the micro-compartments and micro-clip of the above embodiments and apply them to the electrophoretic display 100 in which the color filter layer is disposed close to the control substrate 10 as shown in FIGS. 7B-7C and 8A-8B. In addition, in the electrophoretic display 100 in which the color filter layer is disposed close to the control substrate 10 as shown in Figures 7B-7C and 8A-8B, the color filter layer may have a structure as shown in Figure 18A of the present invention, that is, the color filter layer CF includes a plurality of filter color blocks (CFR, CFG, CFB) of different colors, and the filter color block includes a plurality of holes H and the area of at least one of the holes H is not greater than 100 square microns. In addition, the electrophoretic display 100 in which the color filter layer is disposed close to the control substrate 10 as shown in FIGS. 7B-7C and 8A-8B can also be constructed as shown in FIG. 19, and the common voltage lines Ve are electrically connected to a display driver 200 or a display touch integrated driver 200; during the touch operation of the electrophoretic display 100, the display touch integrated driver 200 electrically connects multiple data lines DL together as a single touch emission electrode; the display touch integrated driver 200 electrically connects multiple common voltage lines Ve together as a single touch receiving electrode, or the above-mentioned touch emission electrode and touch receiving electrode can be interchanged.
4.微隔間設計4. Micro compartment design
習知技術製作電子紙顯示器所使用的電子紙，係採用微膠囊與微杯的技術製作而成，電子紙的生產成本受良率影響居高不下，且在之後製作電泳顯示器時，還要把製作好的電子紙撕下保護膜後貼合在控制基板上，貼合時接觸面上的異物與氣泡都會造成良率的重大損失，由於電子紙的結構非常柔弱，在撕離保護膜的過程很容易破裂毀損也是造成生產過程中的重大損失，本發明的目的即在省下電子紙的生產成本並且不需貼合程序也就沒有貼合的良率損失，把電子紙直接做在顯示器內。目前最常用的電子紙係採用微杯結構，生產方式大都採用卷對卷的方式。在製作時，係用凸形狀的滾輪，在樹脂薄膜上壓出凹痕做微杯結構。微杯結構係作為電子墨水的容器，且樹脂薄膜質軟很容易受壓迫而破裂，因此電子紙的產品必須受到很好的保護，造成製程上的重大困難。其次微杯的厚度(垂直於觀看面的延伸距離)約在25~50um，因此對生產的精度要求非常高。以滾輪壓模生產而言，微杯的厚度越薄，基體的樹脂越容易破裂且會被剝離黏附在滾輪上，造成滾輪的毀損且生產良率越差；微杯越厚耗用的電子墨水就越多且由於樹脂溶液的黏滯性與表面張力，造成填入時在微杯的底部形成空隙，無法完全填滿，製作出來的顯示器也就會因顯示不良而報廢，這些都讓電子紙的成本居高不下。再者，微杯的厚度越厚，還會加大了控制電極與共用電極的距離，讓帶電荷顏色粒子移動的速度減慢，移動的距離增加，需要更高的驅動電壓與更長的時間才能到定位，這會影響畫面的更新速度與顯示品質。當使用在電子紙閱讀器時，會造成使用者體驗的觀感不佳，基於以上種種缺點，本發明都可以解決。The electronic paper used in the production of electronic paper displays is made by using microcapsules and microcups. The production cost of electronic paper is high due to the yield rate. When making electrophoretic displays, the protective film of the electronic paper must be removed and then bonded to the control substrate. Foreign matter and bubbles on the contact surface during bonding will cause a significant loss in yield. Since the structure of the electronic paper is very fragile, it is easy to break and damage during the process of tearing off the protective film, which also causes a significant loss in the production process. The purpose of the present invention is to save the production cost of the electronic paper and do not require a bonding process, so there is no yield loss in bonding, and the electronic paper is directly made in the display. At present, the most commonly used electronic paper adopts a microcup structure, and the production method mostly adopts a roll-to-roll method. During the production process, a convex roller is used to press out indentations on the resin film to form a microcup structure. The microcup structure serves as a container for electronic ink, and the resin film is soft and easily cracked by pressure, so the electronic paper product must be well protected, which causes major difficulties in the production process. Secondly, the thickness of the microcup (the extension distance perpendicular to the viewing surface) is about 25~50um, so the production precision requirements are very high. In roller die production, the thinner the microcup, the easier it is for the resin on the base to break and be peeled off and adhere to the roller, causing damage to the roller and lower production yields. The thicker the microcup, the more electronic ink is consumed, and due to the viscosity and surface tension of the resin solution, gaps are formed at the bottom of the microcup when filling, and it cannot be completely filled. The display produced will also be scrapped due to poor display. All these factors make the cost of electronic paper high. Furthermore, the thicker the microcup, the greater the distance between the control electrode and the common electrode, which slows down the movement of the charged color particles and increases the movement distance. It requires a higher driving voltage and a longer time to reach the position, which will affect the screen update speed and display quality. When used in an electronic paper reader, it will cause a poor user experience. Based on the above shortcomings, the present invention can solve them.
參考圖10A，為習知電泳式顯示器的微杯隔間與相關彩色濾光層的上視圖。微杯的隔間壁厚度(參見本發明圖11A，本發明隔間壁厚度標示為T，圖10A中微杯22的隔間壁厚度也是沿著圖面平行方向延伸的厚度)要大於10um才有足夠的支撐力量，且習知電泳式顯示器的微杯22在上方投射角度觀看，多採六角形的隔間結構以增加結構強度，在微杯壁內的範圍內帶電荷顏色粒子是無法到達，可以視為影響顯示開口率的關鍵因素，習知電泳式顯示器在該處是沒有帶電荷顏色粒子26。當圖10A所示的微杯隔間與控制基板(例如圖1A所示之控制基板10)貼合時，會遮蔽控制基板上的電極，造成顯示顏色部分被遮蔽，會形成背景紋路影響成像品質也會因微杯壁遮蔽位置在彩色濾光層上的不均勻讓色彩失真。Referring to FIG. 10A , it is a top view of the microcup compartment and the related color filter layer of the conventional electrophoretic display. The thickness of the compartment wall of the microcup (see FIG. 11A of the present invention, the compartment wall thickness of the present invention is marked as T, and the compartment wall thickness of the microcup 22 in FIG. 10A is also the thickness extending in the direction parallel to the drawing) must be greater than 10 μm to have sufficient supporting strength, and the microcup 22 of the conventional electrophoretic display is viewed from an upward projection angle, and the hexagonal compartment structure is mostly adopted to increase the structural strength. The charged color particles cannot reach the range within the microcup wall, which can be regarded as a key factor affecting the display aperture ratio. The conventional electrophoretic display does not have the charged color particles 26 there. When the microcup compartment shown in FIG. 10A is attached to the control substrate (such as the control substrate 10 shown in FIG. 1A ), the electrodes on the control substrate will be shielded, causing the displayed color to be partially shielded, forming background textures that affect the imaging quality, and also causing color distortion due to the unevenness of the microcup wall shielding position on the color filter layer.
參考圖10B，依據本發明之一實施例，將微隔間製作在基板上，可以很精準的對位像素電極(控制電極PE)，讓微隔間結構50的隔間壁52做在像素與像素之間的非顯示區域，多個隔間壁在觀看面的投影方向，隔間壁與控制電極的重疊面積越小越好，最少要小於控制電極面積的50%。換言之，依據本發明的設計，微隔間結構50的隔間壁52可以製作成接近像素的矩形結構，更可配合像素的邊界而不至於影響顯示。依據本發明，例如可使用光罩來顯影光阻薄膜的圖案，製作微隔間壁面，其中光阻薄膜可以使用硬度較高的材質(例如壓克力做成的透明光阻劑)。再者，依據本發明其餘實施方式，微隔間結構50的隔間壁52也可由高分子材料(如平坦層材料、樹脂或是壓克力材料)製作。再者，如圖10B所示，微隔間結構50的隔間壁52可與閘極線GL或是資料線DL部份對齊。更詳細而言，多個隔間壁52由垂直投影方向(例如垂直於觀看面方向)看與部分的資料線DL及/或部分的閘極線GL重疊。Referring to FIG. 10B , according to one embodiment of the present invention, micro-compartments are fabricated on a substrate, and the pixel electrodes (control electrodes PE) can be precisely aligned, so that the partition walls 52 of the micro-compartment structure 50 are formed in the non-display area between pixels. In the projection direction of the multiple partition walls on the viewing surface, the overlapping area of the partition walls and the control electrodes is as small as possible, and at least less than 50% of the control electrode area. In other words, according to the design of the present invention, the partition walls 52 of the micro-compartment structure 50 can be fabricated into a rectangular structure close to the pixel, and can also be matched with the boundaries of the pixel without affecting the display. According to the present invention, for example, a mask can be used to develop the pattern of a photoresist film to fabricate the micro-compartment wall surface, wherein the photoresist film can use a material with a higher hardness (such as a transparent photoresist made of acrylic). Furthermore, according to other embodiments of the present invention, the partition walls 52 of the micro-compartment structure 50 may also be made of polymer materials (such as planar layer materials, resins or acrylic materials). Furthermore, as shown in FIG. 10B , the partition walls 52 of the micro-compartment structure 50 may be partially aligned with the gate lines GL or the data lines DL. More specifically, the plurality of partition walls 52 overlap with a portion of the data lines DL and/or a portion of the gate lines GL when viewed from a vertical projection direction (e.g., a direction perpendicular to the viewing surface).
由於本發明使用硬質的高分子材料(例如透明光阻材料)作為微隔間結構50的隔間壁52，其硬度可達鉛筆硬度3H以上，遠高於習知技術的微杯容器所用的樹脂材料(硬度不及1H)。故本發明可以用更薄的壁厚支撐上下基板的重量與壓力，微隔間的壁厚T(配合參見圖11A)可以小於10um。參考圖10C，由於本發明之微隔間結構50的隔間壁52可以準確的定位在像素的非顯示區域(像素與像素之間)，所以不會影響顯示品質，其高精確度的特性，會帶來很好的良率，可以降低生產成本，更大的優勢是去除了習知的微杯製成電子紙的費用與成本，且不需貼合基板可省下的光學膠的費用與貼合時造成的良率損失，可以製作更薄的電泳式顯示器。此外，製做微隔間結構50還可以使用平坦層(PLN)的材料使用蝕刻的方式將壁面以外的區域剝離後，完成微隔間。本發明做出的微隔間結構50可以製作更薄的電泳式顯示器，可以很容易製作小於25um厚度的電泳層20(微隔間壁面高度H1(配合參見圖11A)可以小於25um)。當電泳式顯示器使用本發明的微隔間結構50做出的電泳層厚度越薄，控制電極與共用電極的距離就會更近，電場強度就會更大，可以工作在更低的驅動電壓，帶電荷顏色粒子的移動也會比較快，需要移動的距離也比較短，讓畫面的更新速度大幅提高，解決困擾電泳式顯示器的畫面更新問題，這個問題在彩色的電泳式顯示器上尤其重要。Since the present invention uses hard polymer materials (such as transparent photoresist materials) as the partition walls 52 of the micro-compartment structure 50, the hardness of the materials can reach pencil hardness 3H or more, which is much higher than the resin materials (hardness less than 1H) used in the prior art micro-cup containers. Therefore, the present invention can use thinner walls to support the weight and pressure of the upper and lower substrates, and the wall thickness T of the micro-compartment (see FIG. 11A ) can be less than 10 um. Referring to FIG. 10C , since the partition wall 52 of the micro-compartment structure 50 of the present invention can be accurately positioned in the non-display area of the pixel (between pixels), it will not affect the display quality. Its high-precision characteristics will bring a good yield rate and reduce production costs. The greater advantage is that it eliminates the cost and cost of making electronic paper with the conventional micro-cups, and does not require the cost of optical glue that can be saved by laminating the substrate and the yield loss caused by laminating, so that a thinner electrophoretic display can be made. In addition, the micro-compartment structure 50 can also be made by using a flat layer (PLN) material to etch away the area outside the wall surface to complete the micro-compartment. The micro-compartment structure 50 made by the present invention can be used to make a thinner electrophoretic display, and can easily make an electrophoretic layer 20 with a thickness of less than 25um (the micro-compartment wall height H1 (see Figure 11A) can be less than 25um). When the electrophoretic layer thickness made by the electrophoretic display using the micro-compartment structure 50 of the present invention is thinner, the distance between the control electrode and the common electrode will be closer, the electric field strength will be greater, and it can work at a lower driving voltage. The movement of charged color particles will also be faster, and the distance required to move will also be shorter, which greatly improves the screen update speed and solves the screen update problem that troubles the electrophoretic display. This problem is particularly important in color electrophoretic displays.
參考圖10D，為依據本發明之另一實施例之微隔間結構上視圖。依據此實施例，微隔間結構50之隔間壁52(以加斜線圖形表示以更突顯其形狀)，由於微隔間結構50的隔間壁52若採用硬度較高的材料製作，製作微隔間的基板為柔性基板，運用在可彎折的柔性電泳顯示器時，很容易因為彎折造成隔間壁碎裂以致損毀。為了改善這個問題可將微隔間結構50的隔間壁52製作成不連續的形狀，參考圖10D上的十字形隔間壁52，隔間壁52上的縫隙56可以做為基板彎折造成隔間壁52擠壓時的伸縮空間。依據本發明的一實施方式，縫隙56的面積不大於隔間壁52面積的50%，或是縫隙56的長度D不大於隔間壁52長度的50%。依據本發明的一實施方式，縫隙56的長度D可大於0.5um，以提供隔間壁52擠壓時的伸縮空間。依據本發明的一實施方式，十字形隔間壁52所構成的槽室可以容納一個像素，例如由不同顏色的濾光顏色塊(CFR、CFG、CFB)所構成的一個像素。此外，雖然圖10D所繪示之隔間壁52由上視視角為十字形，以在相鄰隔間壁52有縫隙時提供槽室；但是本發明之隔間壁52由上視視角也可為其他形狀，例如T形或是U形，只要至少部份相鄰的隔間壁52之間有縫隙56即可。此外，雖然圖10D所繪示實施例中，隔間壁52上的縫隙56為均勻分佈，但是須知在實際製作時，縫隙56可因製程誤差而有不同的長度，此外，縫隙56不一定要在厚度方向貫通隔間壁52，只要能提供隔間壁52擠壓時的伸縮空間即可。Referring to FIG. 10D , it is a top view of a micro-compartment structure according to another embodiment of the present invention. According to this embodiment, the partition wall 52 of the micro-compartment structure 50 (indicated by a diagonal line figure to highlight its shape) is easily broken and damaged by bending when the partition wall 52 of the micro-compartment structure 50 is made of a material with a higher hardness and the substrate for making the micro-compartment is a flexible substrate. In order to improve this problem, the partition wall 52 of the micro-compartment structure 50 can be made into a discontinuous shape. Referring to the cross-shaped partition wall 52 in FIG. 10D , the slit 56 on the partition wall 52 can be used as a stretching space when the partition wall 52 is squeezed by bending the substrate. According to one embodiment of the present invention, the area of the slit 56 is not greater than 50% of the area of the partition wall 52, or the length D of the slit 56 is not greater than 50% of the length of the partition wall 52. According to one embodiment of the present invention, the length D of the slit 56 may be greater than 0.5 um to provide expansion space when the partition wall 52 is squeezed. According to one embodiment of the present invention, the slot chamber formed by the cross-shaped partition wall 52 can accommodate a pixel, such as a pixel formed by filter color blocks of different colors (CFR, CFG, CFB). In addition, although the partition wall 52 shown in FIG. 10D is a cross shape when viewed from above, so as to provide a slot chamber when there is a gap between adjacent partition walls 52; however, the partition wall 52 of the present invention may also be other shapes when viewed from above, such as a T shape or a U shape, as long as there is a gap 56 between at least some adjacent partition walls 52. In addition, although the gaps 56 on the partition wall 52 are evenly distributed in the embodiment shown in FIG. 10D, it should be noted that in actual manufacturing, the gaps 56 may have different lengths due to process errors. In addition, the gaps 56 do not necessarily need to pass through the partition wall 52 in the thickness direction, as long as they can provide expansion and contraction space when the partition wall 52 is squeezed.
參見圖11A至11C，為依據本發明一實施例製作微隔間結構50之流程示意圖，這些示意圖分別顯示沿圖10C結構在線A-A於不同流程的剖視圖。在此實施例中，微隔間結構50係製作於驅動電路層30之上(亦即在控制基板10側)。參見圖11A，首先在控制基板10上製作驅動電路層30、透明控制電極層PEL及絕緣保護層。隨後使用透明光阻及曝光顯影製程製作出微隔間結構50的隔間壁52。由於在顯影過程中，可顯影的深度受光照的強度與照射的次數有因果關係，實務上受限於生產成本與良率考量，可顯影的光阻劑的厚度通常小於5um。當電泳層的厚度太薄時可放入的顏色粒子的數量就會受限，進而影響顏色粒子堆疊的層數，顏色粒子堆疊的層數不足時會影響反射率，造成反射光線不足讓可視的亮度下降，所以通常電泳層的厚度都要不小於5um(微隔間壁面高度H1(配合參見圖11A)不小於5um)。參見圖17A至17F，為說明依據本發明一實施例，於基板側(例如控制基板10側或是相對基板12側)上製作隔間壁52的步驟流程。依據本發明，可以於基板之一表面上直接以透明光阻及曝光顯影製程製作隔間壁52。此外，基板之表面上也可存有其他結構，例如透明控制電極層PEL、絕緣層、保護層、驅動電路層30、彩色濾光層CF或是共同電極層14，且在該些結構上直接以透明光阻及曝光顯影製程製作隔間壁52。再者，也可以在基板上其他結構(例如透明控制電極層PEL、驅動電路層30、彩色濾光層CF)上加上平坦層PLN後，再以透明光阻及曝光顯影製程製作隔間壁52。因此雖然圖17A至17F概略示出最初結構為基板10/12，但是不限定其上是否有其他結構。如圖17A所示，首先於一基板10/12上進行清洗，該基板可為控制基板10或是相對基板12，且其接受清洗表面上可能有其他結構。隨後參見圖17B，在基板10/12上塗佈一第一層光阻PR1，例如為透明光阻材料。隨後參見圖17C，利用一光罩PM以進行曝光，對待形成隔間壁52的位置進行曝光，以界定第一殘餘光阻PRA(亦即第一高分子材料疊層)。依據本發明一實施方式，該第一層光阻PR1為負光阻材質，亦即照光部份在顯影後會留下；然依據本發明另一可行實施方式，該第一層光阻PR1也為正光阻材質，而光罩PM須做因應之變更設計。隨後參見圖17D，在基板10/12上塗佈一第二層光阻PR2，例如也為透明光阻材料。隨後參見圖17E，再利用一光罩PM以進行曝光，亦即重複曝光，對待形成隔間壁52的位置進行曝光，以界定第二殘餘光阻PRB(亦即第二高分子材料疊層)，第二層光阻殘餘的範圍可以小於前一層殘餘光阻的範圍，形成向上遞減的形狀。最後參見圖17F，對所得結構做顯影，以留下第一殘餘光阻PRA及第二殘餘光阻PRB，其疊加所得結構(第一高分子材料疊層疊上第二高分子材料疊層)即為本發明之隔間壁52。依據上述方式，藉由重複的塗佈光阻及曝光，及最後的顯影，顯影劑把不需要的部分(挖空區域)清除掉，留下足夠高的微隔間壁面，可以重複大於1次的光阻塗佈曝光後再顯影，也可以重複大於2次的光阻塗佈曝光後再顯影，每次曝光的面積可以遞減讓隔間壁減薄，隔間壁直徑減薄每層可以遞減小於5um(W1-W2)。參見圖11B製作完隔間壁52後在真空的環境條件下，在隔間壁52所界定的槽室54內填入膠體溶液，可以避免空氣殘存在微隔間結構內造成填充失敗，填入的方法可以先用遮罩版(未圖示)把非顯示區域遮住後再用噴塗設備將加熱後的膠體溶液噴塗在顯示區域內。為了之後填充膠體溶液的良率，由於每層曝光會有對位誤差，依據本發明一實施方式，在設計上會採用讓壁面厚度隨成長的疊層遞減，避免壁面呈現凹凸不平讓填充膠體溶液時接觸面積變小，進而填入膠體溶液時產生更多的未填滿空隙以致產品成為不良品。實作上第一層塗佈的光阻(亦即第一高分子材料疊層)曝光的線寬會是最大然後每層遞減，例如每層的製作為隔間壁面的高分子材料疊層的寬度(斷面寬度)遞減小於5微米，做出的微隔間壁面形狀為下方厚往上減薄的形狀。如圖17F所示，第二高分子材料疊層寬度W2與第一高分子材料疊層寬度W1之寬度差(減少量)小於5微米。Referring to Figs. 11A to 11C, schematic diagrams of the process of manufacturing a micro-compartment structure 50 according to an embodiment of the present invention are shown respectively as cross-sectional views along the line A-A of the structure of Fig. 10C at different processes. In this embodiment, the micro-compartment structure 50 is manufactured on the driving circuit layer 30 (i.e., on the control substrate 10 side). Referring to Fig. 11A, the driving circuit layer 30, the transparent control electrode layer PEL and the insulating protective layer are first manufactured on the control substrate 10. Then, the partition wall 52 of the micro-compartment structure 50 is manufactured using a transparent photoresist and an exposure and development process. Since the depth of the developable layer is causally related to the intensity of the light and the number of times of exposure during the development process, the thickness of the developable photoresist is usually less than 5um due to production cost and yield considerations. When the thickness of the electrophoretic layer is too thin, the number of color particles that can be placed will be limited, which in turn affects the number of layers of color particle stacking. When the number of layers of color particle stacking is insufficient, the reflectivity will be affected, resulting in insufficient reflected light and a decrease in visible brightness. Therefore, the thickness of the electrophoretic layer is usually not less than 5um (the height H1 of the micro-compartment wall (see FIG. 11A ) is not less than 5um). See FIGS. 17A to 17F for a description of the steps of making a partition wall 52 on a substrate side (e.g., the control substrate 10 side or the relative substrate 12 side) according to an embodiment of the present invention. According to the present invention, partition walls 52 can be directly formed on one surface of a substrate by using a transparent photoresist and an exposure and development process. In addition, other structures may also exist on the surface of the substrate, such as a transparent control electrode layer PEL, an insulating layer, a protective layer, a driving circuit layer 30, a color filter layer CF, or a common electrode layer 14, and partition walls 52 may be directly formed on these structures by using a transparent photoresist and an exposure and development process. Furthermore, a planarization layer PLN may be added to other structures on the substrate (such as a transparent control electrode layer PEL, a driving circuit layer 30, and a color filter layer CF), and then partition walls 52 may be formed by using a transparent photoresist and an exposure and development process. Therefore, although FIGS. 17A to 17F schematically show that the initial structure is a substrate 10/12, it is not limited whether there are other structures thereon. As shown in FIG. 17A , first, cleaning is performed on a substrate 10/12, which may be a control substrate 10 or a relative substrate 12, and other structures may be present on the surface to be cleaned. Then, referring to FIG. 17B , a first layer of photoresist PR1, such as a transparent photoresist material, is coated on the substrate 10/12. Then, referring to FIG. 17C , a photomask PM is used for exposure, and the position where the partition wall 52 is to be formed is exposed to define the first residual photoresist PRA (i.e., the first polymer material stack). According to one embodiment of the present invention, the first layer of photoresist PR1 is a negative photoresist material, i.e., the illuminated portion will remain after development; however, according to another feasible embodiment of the present invention, the first layer of photoresist PR1 is also a positive photoresist material, and the photomask PM needs to be changed accordingly. Then, referring to FIG. 17D , a second photoresist layer PR2 is coated on the substrate 10/12, for example, also a transparent photoresist material. Then, referring to FIG. 17E , a photomask PM is used for exposure, that is, repeated exposure is performed to expose the position where the partition wall 52 is to be formed to define the second residual photoresist PRB (that is, the second polymer material stacking layer). The range of the residual photoresist of the second layer can be smaller than the range of the residual photoresist of the previous layer, forming an upward decreasing shape. Finally, referring to FIG. 17F , the obtained structure is developed to leave the first residual photoresist PRA and the second residual photoresist PRB, and the superimposed structure (the first polymer material stacking layer on the second polymer material stacking layer) is the partition wall 52 of the present invention. According to the above method, by repeatedly applying photoresist and exposing, and finally developing, the developer removes the unnecessary parts (hollowed areas), leaving a sufficiently high micro-cell wall. The photoresist can be applied and exposed more than once and then developed, or more than twice and then developed. The area of each exposure can be gradually reduced to thin the cell wall. The cell wall diameter can be reduced to less than 5um (W1-W2) per layer. Referring to FIG. 11B , after the partition wall 52 is manufactured, the colloidal solution is filled into the chamber 54 defined by the partition wall 52 under vacuum conditions to avoid filling failure caused by air residue in the micro-compartment structure. The filling method can first use a mask plate (not shown) to cover the non-display area and then use a spraying device to spray the heated colloidal solution into the display area. In order to improve the yield of the subsequent filling of the colloid solution, since there will be alignment errors in each layer exposure, according to an embodiment of the present invention, the wall thickness is designed to decrease with the growing stacking layer to avoid the wall surface being uneven, which will reduce the contact area when filling the colloid solution, thereby generating more unfilled gaps when filling the colloid solution, resulting in defective products. In practice, the line width of the first layer of photoresist (i.e., the first polymer material stack) exposed will be the largest and then decrease with each layer. For example, the width (cross-sectional width) of each layer of the polymer material stack used as the partition wall decreases to less than 5 microns, and the shape of the micro-compartment wall is thick at the bottom and thinner at the top. As shown in FIG. 17F, the width difference (reduction amount) between the width W2 of the second polymer material stack and the width W1 of the first polymer material stack is less than 5 microns.
在本實施例中，可以於製作透明控制電極層PEL之後進行圖17A至17F之隔間壁52製程，也可以於透明控制電極層PEL上製作一層平坦層PLN之後進行圖17A至17F之隔間壁52製程。上述的平坦層PLN的材料可為有機絕緣材料、無機絕緣材料或其組合。依據一個可實施方式，有機絕緣材料可為聚醯亞胺(polyimide,PI)、聚醯胺酸(polyamic acid,PAA)、聚醯胺(polyamide,PA)、聚乙烯醇(polyvinyl alcohol,PVA)、聚乙烯醇肉桂酸酯(polyvinyl cinnamate,PVCi)、聚甲基丙烯酸甲酯(poly(methyl methacrylate))或其他適合的光阻材料或其組合。此外，無機絕緣材料可為氧化矽、氮化矽、氮氧化矽、矽氧烷或其組合。In this embodiment, the partition wall 52 process of Figures 17A to 17F can be performed after the transparent control electrode layer PEL is manufactured, or the partition wall 52 process of Figures 17A to 17F can be performed after a flat layer PLN is manufactured on the transparent control electrode layer PEL. The material of the above-mentioned flat layer PLN can be an organic insulating material, an inorganic insulating material or a combination thereof. According to one embodiment, the organic insulating material can be polyimide (PI), polyamic acid (PAA), polyamide (PA), polyvinyl alcohol (PVA), polyvinyl cinnamate (PVCi), polymethyl methacrylate (methyl methacrylate) or other suitable photoresist materials or a combination thereof. In addition, the inorganic insulating material may be silicon oxide, silicon nitride, silicon oxynitride, siloxane or a combination thereof.
復配合參見圖11A，在本發明中，為了方便說明，界定微隔間結構50厚度為隔間壁52高度H1，而隔間壁52厚度為T，依據本發明，微隔間結構50厚度(亦即隔間壁高度H1)是大於5微米而小於25微米，而隔間壁厚度為T是小於或是等於10微米。此外，配合參見圖11A及圖17F，該微隔間結構50的該隔間壁52的斷面平均寬度不大於10微米。參見圖11B製作完隔間壁52後，在隔間壁52所界定的槽室54內填入膠體溶液，該膠體溶液內含帶電荷黑色粒子及/或帶電荷白色粒子；或該膠體溶液含有帶電荷彩色粒子，例如如圖11B所示之帶電荷青色粒子26C、帶電荷洋紅色粒子26M、帶電荷黃色粒子26Y及帶電荷白色粒子26W。隨後參見圖11C進行貼上相對基板製程，亦即提供一具有導電薄膜(例如共同電極層14)的相對基板12或是無共同電極層14的相對基板12(當觀看面不在相對基板12側時)，並在相對基板12及隔間壁52之間使用光學膠13或是在顯示區的四個邊框塗上框膠後進行貼合，完成後送入氣體加壓腔內加熱加壓兩片基板，完成把膠體溶液擠入並填滿微隔間結構50內的空隙，最後再固化光學膠或是框膠，完成製作電泳式顯示器100成品。如圖11C所示，該隔間壁52與任一控制電極PE的重疊面積小於該控制電極面積(在控制電極層PEL中的電極)的50%。Referring to FIG. 11A , in the present invention, for the convenience of explanation, the thickness of the micro-compartment structure 50 is defined as the height H1 of the compartment wall 52, and the thickness of the compartment wall 52 is T. According to the present invention, the thickness of the micro-compartment structure 50 (i.e., the height H1 of the compartment wall) is greater than 5 microns and less than 25 microns, and the thickness T of the compartment wall is less than or equal to 10 microns. In addition, referring to FIG. 11A and FIG. 17F , the average cross-sectional width of the compartment wall 52 of the micro-compartment structure 50 is not greater than 10 microns. After the partition wall 52 is manufactured as shown in FIG11B , a colloid solution is filled into the chamber 54 defined by the partition wall 52. The colloid solution contains charged black particles and/or charged white particles; or the colloid solution contains charged colored particles, such as charged cyan particles 26C, charged magenta particles 26M, charged yellow particles 26Y, and charged white particles 26W as shown in FIG11B . Then, referring to FIG. 11C , a process of laminating an opposing substrate is performed, that is, providing an opposing substrate 12 having a conductive film (e.g., a common electrode layer 14) or an opposing substrate 12 without a common electrode layer 14 (when the viewing surface is not on the opposing substrate 12 side), and using optical glue 13 between the opposing substrate 12 and the partition wall 52 or applying frame glue on the four side frames of the display area for lamination. After completion, the two substrates are sent into a gas pressure chamber for heating and pressurization to squeeze the colloid solution into and fill the gaps in the micro-compartment structure 50, and finally the optical glue or frame glue is cured to complete the production of the electrophoretic display 100 product. As shown in FIG. 11C , the overlapping area of the partition wall 52 and any control electrode PE is less than 50% of the area of the control electrode (the electrode in the control electrode layer PEL).
參見圖12A至12C，為依據本發明另一實施例製作微隔間結構50之流程示意圖，此實施例中微隔間結構50係於驅動電路層30之後製作，且此電泳式顯示器100係為彩色電泳式顯示器100。如圖12A所示，首先在控制基板10上製作驅動電路層30、透明控制電極層PEL及絕緣保護層(未圖示)，再製作彩色濾光層CF。在本實施例中，可以於彩色濾光層CF完成後進行圖17A至17F之隔間壁52製程，也可以於彩色濾光層CF上製作一層平坦層PLN後進行圖17A至17F之隔間壁52製程。上述的平坦層PLN的材料可為有機絕緣材料、無機絕緣材料或其組合。在製作完成隔間壁52後參見圖12B，在真空的工作條件下，在隔間壁52所界定的槽室54內填入膠體溶液，該膠體溶液內含帶電荷黑色粒子26B及帶電荷白色粒子26W。隨後參見圖12C進行貼上相對基板製程，亦即提供一具有導電薄膜(例如共同電極層14)的相對基板12或是無共同電極層14的相對基板12(當觀看面不在相對基板12側時)，並在相對基板12及隔間壁52之間使用光學膠13或是在顯示區的四個邊框塗上框膠後進行貼合，完成後送入氣體加壓腔內加熱加壓兩片基板，完成把膠體溶液擠入並填滿微隔間結構內的空隙，最後再固化光學膠或是框膠，以製作電泳式顯示器100成品。See Figures 12A to 12C, which are schematic diagrams of the process of manufacturing a micro-compartment structure 50 according to another embodiment of the present invention. In this embodiment, the micro-compartment structure 50 is manufactured after the driving circuit layer 30, and the electrophoretic display 100 is a color electrophoretic display 100. As shown in Figure 12A, the driving circuit layer 30, the transparent control electrode layer PEL and the insulating protective layer (not shown) are first manufactured on the control substrate 10, and then the color filter layer CF is manufactured. In this embodiment, the partition wall 52 process of Figures 17A to 17F can be performed after the color filter layer CF is completed, or the partition wall 52 process of Figures 17A to 17F can be performed after a flat layer PLN is manufactured on the color filter layer CF. The material of the flat layer PLN can be an organic insulating material, an inorganic insulating material or a combination thereof. After the partition wall 52 is manufactured, refer to FIG. 12B , under vacuum working conditions, a colloidal solution is filled into the chamber 54 defined by the partition wall 52 , and the colloidal solution contains charged black particles 26B and charged white particles 26W. Then, refer to FIG. 12C to perform the process of attaching the opposite substrate, that is, providing an opposite substrate 12 with a conductive film (such as a common electrode layer 14) or an opposite substrate 12 without a common electrode layer 14 (when the viewing surface is not on the opposite substrate 12 side), and using optical glue 13 between the opposite substrate 12 and the partition wall 52 or applying frame glue on the four side frames of the display area for bonding, and then sending the two substrates into a gas pressure chamber for heating and pressurization to squeeze the colloid solution into and fill the gap in the micro-compartment structure, and finally curing the optical glue or frame glue to produce the finished electrophoretic display 100.
參見圖13A至13C，為依據本發明另一實施例製作微隔間結構50之流程示意圖，此實施例中微隔間結構50係製作於彩色濾光層CF之上。如圖13A所示，首先於相對基板12上製作彩色濾光層CF，然後於彩色濾光層CF上製作共同電極層14，這兩層製作程序可以對調先做共同電極層14後做彩色濾光層。再於共同電極層14或是彩色濾光層上使用透明光阻及曝光顯影製程製作出微隔間結構50的隔間壁52。See Figures 13A to 13C, which are schematic diagrams of the process of manufacturing a micro-compartment structure 50 according to another embodiment of the present invention. In this embodiment, the micro-compartment structure 50 is manufactured on a color filter layer CF. As shown in Figure 13A, the color filter layer CF is first manufactured on the relative substrate 12, and then the common electrode layer 14 is manufactured on the color filter layer CF. The manufacturing process of these two layers can be reversed, with the common electrode layer 14 being manufactured first and the color filter layer being manufactured later. Then, a transparent photoresist and an exposure and development process are used on the common electrode layer 14 or the color filter layer to manufacture the partition wall 52 of the micro-compartment structure 50.
在本實施例中，可以於彩色濾光層CF上或是共同電極層14上直接進行圖17A至17F之隔間壁52製程，也可以於彩色濾光層CF或是共同電極層14上製作一層平坦層PLN後進行圖17A至17F之隔間壁52製程。上述的平坦層PLN的材料可為有機絕緣材料、無機絕緣材料或其組合。In this embodiment, the partition wall 52 process of Figures 17A to 17F can be directly performed on the color filter layer CF or the common electrode layer 14, or the partition wall 52 process of Figures 17A to 17F can be performed after a flat layer PLN is formed on the color filter layer CF or the common electrode layer 14. The material of the above-mentioned flat layer PLN can be an organic insulating material, an inorganic insulating material or a combination thereof.
參見圖13B，製作完隔間壁52後，在真空的工作條件下，在隔間壁52所界定的槽室54內填入膠體溶液，該膠體溶液內含帶電荷黑色粒子26B及帶電荷白色粒子26W。隨後參見圖13C進行貼上控制基板製程，亦即提供一具有控制電極層PEL與驅動電路層30的控制基板10，並用光學膠13或是在顯示區的四個邊框塗上框膠後進行貼合控制基板10與製作好微隔間的相對基板12，完成後送入氣體加壓腔內加熱加壓兩片基板，完成把膠體溶液擠入並填滿微隔間結構內的空隙，最後再固化光學膠或是框膠，以製作電泳式顯示器100成品。在此實施例中，由於驅動電路層30並非位於接近觀看面側，因此可以有更寬的設計可能，不需要使用本發明之高開口率驅動電路層30。再者，因為此實施例使用透明光阻(例如壓克力做成的光阻劑)以製作出微隔間結構50的隔間壁52，隔間壁52之高度H1可小於25um。換言之，驅動電路層30及共同電極層14之距離可小於25um，這樣即可大幅增加施加在電子墨水上之電場，增加畫面更新速率等多種進步性。此外，因為是在真空的工作條件下，在隔間壁52所界定的槽室54內填入膠體溶液，槽室54內膠體溶液的填充率可到達70%以上，配合本發明的微卡榫可以進一步的把微卡榫體積相當的膠體溶液擠壓入槽室內，槽室54內膠體溶液的填充率可到達90%以上。Referring to FIG. 13B , after the partition wall 52 is manufactured, a colloidal solution containing charged black particles 26B and charged white particles 26W is filled into the chamber 54 defined by the partition wall 52 under vacuum working conditions. Then, referring to FIG. 13C , a control substrate laminating process is performed, that is, a control substrate 10 having a control electrode layer PEL and a driving circuit layer 30 is provided, and the control substrate 10 is laminated with a counter substrate 12 with micro compartments made thereon after optical glue 13 or frame glue is applied on the four side frames of the display area. After completion, the two substrates are sent into a gas pressure chamber for heating and pressurization, and the colloid solution is squeezed into and filled in the gaps in the micro compartment structure, and finally the optical glue or frame glue is cured to manufacture the finished product of the electrophoretic display 100. In this embodiment, since the driving circuit layer 30 is not located near the viewing side, a wider design possibility can be provided, and the high opening ratio driving circuit layer 30 of the present invention does not need to be used. Furthermore, because this embodiment uses transparent photoresist (e.g., photoresist made of acrylic) to make the partition wall 52 of the micro-compartment structure 50, the height H1 of the partition wall 52 can be less than 25um. In other words, the distance between the driving circuit layer 30 and the common electrode layer 14 can be less than 25um, which can greatly increase the electric field applied to the electronic ink, increase the screen update rate and other improvements. In addition, because the colloidal solution is filled into the groove chamber 54 defined by the partition wall 52 under vacuum working conditions, the filling rate of the colloidal solution in the groove chamber 54 can reach more than 70%. With the micro-tenon of the present invention, the colloidal solution of a considerable volume of the micro-tenon can be further squeezed into the groove chamber, and the filling rate of the colloidal solution in the groove chamber 54 can reach more than 90%.
參見圖14A至14C，為依據本發明另一實施例製作微隔間結構50之流程示意圖，此實施例中微隔間結構50係製作於一導電層(例如共同電極層14)之上。如圖14A所示，首先於相對基板12上形成共同電極層14與隨選的絕緣層，再於共同電極層14上進行圖17A至17F之隔間壁52製程。絕緣層可以用氮化矽材料、氧化矽材料或是兩者一起用的複合疊層使用沉積法製作在共同電極層14之上。See Figures 14A to 14C, which are schematic diagrams of the process of manufacturing a micro-compartment structure 50 according to another embodiment of the present invention. In this embodiment, the micro-compartment structure 50 is manufactured on a conductive layer (e.g., a common electrode layer 14). As shown in Figure 14A, a common electrode layer 14 and a selected insulating layer are first formed on a relative substrate 12, and then the partition wall 52 process of Figures 17A to 17F is performed on the common electrode layer 14. The insulating layer can be made of silicon nitride material, silicon oxide material, or a composite stack of the two by using a deposition method on the common electrode layer 14.
在本實施例中，可以於共同電極層14上直接進行圖17A至17F之隔間壁52製程，也可以於共同電極層14上製作一層平坦層PLN後進行圖17A至17F之隔間壁52製程。上述的平坦層PLN的材料可為有機絕緣材料、無機絕緣材料或其組合。In this embodiment, the partition wall 52 process of Figures 17A to 17F can be directly performed on the common electrode layer 14, or the partition wall 52 process of Figures 17A to 17F can be performed after a flat layer PLN is formed on the common electrode layer 14. The material of the above-mentioned flat layer PLN can be an organic insulating material, an inorganic insulating material or a combination thereof.
如圖14B所示，於微隔間結構50的隔間壁52在真空的工作條件下，在隔間壁52所界定的槽室54內填入膠體溶液，該膠體溶液內含帶電荷青色粒子26C、帶電荷洋紅色粒子26M、帶電荷黃色粒子26Y及帶電荷白色粒子26W。參見圖14C，製備一具有微卡榫(micro tenon)60之控制基板10，並藉由將此微卡榫(micro tenon)60與隔間壁52所定義的槽室54對位(registration)而將此上控制基板10固定在相對基板12上，達成兩基板之緊密結合並且可以進一步的把膠體溶液填滿整個槽室54。更具體而言，在控制基板10先成長驅動電路層30，例如本發明之高開口率驅動電路層30；隨後形成控制電極層PEL，並於控制電極層PEL上形成微卡榫60。再者，微卡榫60的細節可詳見下述。As shown in FIG14B , under vacuum working conditions, the partition wall 52 of the micro-compartment structure 50 is filled with a colloidal solution in the chamber 54 defined by the partition wall 52. The colloidal solution contains charged cyan particles 26C, charged magenta particles 26M, charged yellow particles 26Y, and charged white particles 26W. Referring to FIG14C , a control substrate 10 having a micro tenon 60 is prepared, and the micro tenon 60 is registered with the chamber 54 defined by the partition wall 52 to fix the control substrate 10 on the opposite substrate 12, so that the two substrates are closely bonded and the colloidal solution can be further filled in the entire chamber 54. More specifically, a driving circuit layer 30, such as the high opening rate driving circuit layer 30 of the present invention, is first grown on the control substrate 10; then a control electrode layer PEL is formed, and a micro-clip 60 is formed on the control electrode layer PEL. Furthermore, the details of the micro-clip 60 can be found below.
5.微卡榫5. Micro-tenon
電子紙在生產過程中，把電子墨水填入微杯或是包覆在微膠囊內，是整個生產程序中影響良率最大的部分，也是生產設備投資最高的部分。由於電子墨水是由膠體溶液混入帶電荷顏色粒子所製作而成，為了達到粒子懸浮的能力，膠體溶液的密度與黏滯性都要提高。這會造成把膠體溶液填入微杯或是微隔間的過程中，由於膠體溶液的表面張力與黏滯性較大，所以不易填滿整個微杯或是微隔間內，會造成底部有空隙發生。這空隙就會造成影像品質劣化，這就是電子紙生產良率不佳的關鍵因素。使用本發明的微卡榫可以解決這個問題，運用微卡榫卡入微隔間時將膠體溶液進一步擠壓入微隔間內並擠滿微隔間的內部空間，可以透過調整微卡榫的厚度決定擠壓的體積來解決空隙的問題，對提升生產良率有莫大的貢獻。此外卡入微隔間的微卡榫還可以阻擋空氣進入，所以在真空中完成填充膠體溶液後，可以用框膠貼合面板的四周取代用光學膠貼合的程序，運用大氣壓力把具有微隔間與微卡榫的兩片基板均勻且緊密的壓合在一起。就算框膠瑕疵有漏氣的現象，空氣也會受微卡榫與微隔間的阻擋，不會影響基板的壓合力量，少了光學膠厚度，可以減少帶電荷顏色粒子與控制電極的距離，增加畫面更新速度還可以降低驅動電壓，種種的好處都建構在這微卡榫的巧妙設計上。In the production process of electronic paper, filling the electronic ink into microcups or encapsulating it in microcapsules is the part that has the greatest impact on the yield rate in the entire production process, and it is also the part with the highest investment in production equipment. Since electronic ink is made by mixing charged color particles with a colloid solution, in order to achieve the ability to suspend the particles, the density and viscosity of the colloid solution must be increased. This will cause the colloid solution to be filled into the microcup or microcompartment in the process. Due to the large surface tension and viscosity of the colloid solution, it is not easy to fill the entire microcup or microcompartment, which will cause gaps at the bottom. This gap will cause the image quality to deteriorate, which is the key factor for the poor yield rate of electronic paper production. The use of the micro-clip of the present invention can solve this problem. When the micro-clip is inserted into the micro-compartment, the colloid solution is further squeezed into the micro-compartment and fills the internal space of the micro-compartment. The problem of gaps can be solved by adjusting the thickness of the micro-clip to determine the squeezed volume, which has a great contribution to improving the production yield. In addition, the micro-clip inserted into the micro-compartment can also block the entry of air, so after the colloid solution is filled in a vacuum, the frame glue can be used to glue the four sides of the panel instead of the optical glue bonding process, and the atmospheric pressure is used to press the two substrates with micro-compartments and micro-clip together evenly and tightly. Even if there is air leakage due to defects in the frame glue, the air will be blocked by the micro-clip and micro-compartment, and will not affect the pressing force of the substrate. Reducing the thickness of the optical glue can reduce the distance between the charged color particles and the control electrode, increase the screen update speed and reduce the driving voltage. All these benefits are built on the ingenious design of the micro-clip.
參見圖14F，微卡榫60可以使用光阻透過曝光顯影後，留下微卡榫的區域，其餘清洗掉；微卡榫也可以使用彩色濾光層取代；此外微卡榫的製作也可以使用平坦層(PLN)經過微影製程留下微卡榫的區域。微卡榫60與微隔間的槽室54的邊壁之間要保持一定的間隙S，以作為對準裕隙。此間隙S例如為1~50um的間隙。依據本發明的一實施方式，此間隙範圍在1~5um之間，配合貼合基板時光罩對位的精度而定，作為對位貼合時的誤差容許範圍，避免對位貼合由於誤差造成微隔間與微卡榫碰撞而損壞。微卡榫的厚度可以為0.5~50um，厚度越厚可以密封的越牢固，但是會影響控制電極的吸引力或是排斥力，所以密封程度與電氣效應需要做合理的分配，依據本發明的一實施方式，微卡榫60厚度範圍也在1~5um之間。Referring to FIG. 14F , the micro-tenon 60 can be exposed and developed using a photoresist, leaving the micro-tenon area and washing away the rest; the micro-tenon can also be replaced by a color filter layer; in addition, the micro-tenon can also be made by using a flat layer (PLN) through a lithography process to leave the micro-tenon area. A certain gap S should be maintained between the micro-tenon 60 and the side wall of the micro-compartment slot 54 as an alignment margin. This gap S is, for example, a gap of 1 to 50 um. According to one embodiment of the present invention, this gap ranges from 1 to 5 um, which is determined in conjunction with the accuracy of the mask alignment when bonding the substrate, as an allowable error range during alignment and bonding, to avoid damage to the micro-compartment and the micro-tenon due to collision caused by errors in alignment and bonding. The thickness of the micro-clip can be 0.5~50um. The thicker the thickness, the more secure the seal can be. However, it will affect the attraction or repulsion of the control electrode. Therefore, the sealing degree and the electrical effect need to be reasonably allocated. According to one embodiment of the present invention, the thickness of the micro-clip 60 is also between 1~5um.
參見圖14D，為依據本發明另一實施例製作微隔間結構50之示意圖，此實施例中微隔間結構50係製作於一導電層(例如共同電極層14)之後，導電層上包含有絕緣層(圖未式)用來與帶電荷顏色粒子做電氣隔離。如圖14D所示，首先於相對基板12上形成共同電極層14與絕緣層，絕緣層可以用氮化矽材料、氧化矽材料或是兩者一起用的複合疊層使用沉積法製作在共同電極層14之上。再於共同電極層14與絕緣層上使用光阻及曝光顯影製程製作出微隔間結構50的隔間壁52。該隔間壁52之製程可如圖17A至17F之隔間壁52製程。如圖14D所示，於微隔間結構50的隔間壁52之間填入含帶電荷粒子的膠體溶液，例如含有帶電荷黑色粒子26B及帶電荷白色粒子26W的膠體溶液。參見圖14D，此實施例更包含製備一具有微卡榫(micro tenon)60之控制基板10，並藉由將此微卡榫(micro tenon)60與隔間壁52所定義的槽室54對位(registration)而將此控制基板10固定在相對基板12上，達成兩基板之結合。更具體而言，在上控制基板10先成長驅動電路層30，例如本發明之高開口率驅動電路層30；隨後形成控制電極層PEL，並於控制電極層PEL上形成彩色濾光層CF。於彩色濾光層CF上製作形成微卡榫60，如果彩色濾光層的厚度合於需求，也可以用彩色濾光層作為微卡榫60使用。See FIG. 14D, which is a schematic diagram of manufacturing a micro-compartment structure 50 according to another embodiment of the present invention. In this embodiment, the micro-compartment structure 50 is manufactured after a conductive layer (e.g., a common electrode layer 14), and the conductive layer includes an insulating layer (not shown in the figure) for electrical isolation from the charged color particles. As shown in FIG. 14D, firstly, a common electrode layer 14 and an insulating layer are formed on the opposite substrate 12. The insulating layer can be made of silicon nitride material, silicon oxide material, or a composite laminate of the two by using a deposition method on the common electrode layer 14. Then, the partition wall 52 of the micro-compartment structure 50 is manufactured on the common electrode layer 14 and the insulating layer by using photoresist and exposure development process. The process of manufacturing the partition wall 52 can be the partition wall 52 process shown in Figures 17A to 17F. As shown in Figure 14D, a colloidal solution containing charged particles, such as a colloidal solution containing charged black particles 26B and charged white particles 26W, is filled between the partition walls 52 of the micro-compartment structure 50. Referring to Figure 14D, this embodiment further includes preparing a control substrate 10 having a micro tenon 60, and fixing the control substrate 10 on the relative substrate 12 by registering the micro tenon 60 with the slot 54 defined by the partition wall 52, thereby achieving the combination of the two substrates. More specifically, a driving circuit layer 30 is first grown on the upper control substrate 10, such as the high-opening driving circuit layer 30 of the present invention; then a control electrode layer PEL is formed, and a color filter layer CF is formed on the control electrode layer PEL. A micro-clip 60 is formed on the color filter layer CF. If the thickness of the color filter layer meets the requirements, the color filter layer can also be used as the micro-clip 60.
參見圖14F，微卡榫可以使用透明光阻透過曝光顯影後，留下微卡榫的區域，其餘清洗掉；微卡榫可以使用參考圖14D的實施例中的彩色濾光層作為微卡榫使用；此外微卡榫的製作也可以使用平坦層(PLN)經過微影製程(photolithography)留下微卡榫的區域。微卡榫60與微隔間的槽室54的邊壁之間要保持一定的間隙S，以作為對準裕隙。此間隙S例如為1~50um的間隙。依據本發明的一實施方式，此間隙範圍在1~5um之間，配合光罩對位的精度而定，作為對位貼合時的誤差容許範圍，避免對位貼合由於誤差造成微隔間與微卡榫碰撞而損壞。微卡榫的厚度可以為0.5~50um，厚度越厚可以密封的越牢固，但是會影響控制電極的吸引力或是排斥力，所以密封程度與電氣效應需要做合理的分配，依據本發明的一實施方式，微卡榫60厚度範圍也在1~5um之間。Referring to FIG. 14F , the micro-tenons can be made by using a transparent photoresist to expose and develop, leaving the micro-tenon area and washing away the rest; the micro-tenons can use the color filter layer in the embodiment of reference FIG. 14D as the micro-tenons; in addition, the micro-tenons can also be made by using a flat layer (PLN) through a photolithography process to leave the micro-tenon area. A certain gap S should be maintained between the micro-tenon 60 and the side wall of the groove chamber 54 of the micro compartment as an alignment margin. This gap S is, for example, a gap of 1 to 50 um. According to one embodiment of the present invention, this gap ranges from 1 to 5 um, which is determined in conjunction with the accuracy of the mask alignment, as the error tolerance range during alignment and bonding, to avoid the micro compartment and the micro-tenon from colliding and being damaged due to errors in alignment and bonding. The thickness of the micro-clip can be 0.5~50um. The thicker the thickness, the more secure the seal can be. However, it will affect the attraction or repulsion of the control electrode. Therefore, the sealing degree and the electrical effect need to be reasonably allocated. According to one embodiment of the present invention, the thickness of the micro-clip 60 is also between 1~5um.
參見圖14E，為依據本發明另一實施例製作微隔間結構50之示意圖，此實施例中微隔間結構50係製作於一導電層(例如共同電極層14)之上。如圖14E所示，首先於相對基板12上形成共同電極層14。再於共同電極層14上製作彩色濾光層CF，後用透明光阻及曝光顯影製程製作出微隔間結構50的隔間壁52。See FIG. 14E, which is a schematic diagram of manufacturing a micro-compartment structure 50 according to another embodiment of the present invention. In this embodiment, the micro-compartment structure 50 is manufactured on a conductive layer (e.g., a common electrode layer 14). As shown in FIG. 14E, a common electrode layer 14 is first formed on a relative substrate 12. A color filter layer CF is then manufactured on the common electrode layer 14, and then a partition wall 52 of the micro-compartment structure 50 is manufactured using a transparent photoresist and an exposure and development process.
在本實施例中，可以於彩色濾光層CF上直接進行圖17A至17F之隔間壁52製程，也可以於彩色濾光層CF上製作一層平坦層PLN後進行圖17A至17F之隔間壁52製程。上述的平坦層PLN的材料可為有機絕緣材料、無機絕緣材料或其組合。In this embodiment, the partition wall 52 process of Figures 17A to 17F can be directly performed on the color filter layer CF, or the partition wall 52 process of Figures 17A to 17F can be performed after a flat layer PLN is formed on the color filter layer CF. The material of the above-mentioned flat layer PLN can be an organic insulating material, an inorganic insulating material or a combination thereof.
如圖14E所示，於微隔間結構50的隔間壁52之間填入含有帶電荷顏色粒子的膠體溶液，例如含有帶電荷黑色粒子26B及帶電荷白色粒子26W的膠體溶液。參見圖14E，此實施例更包含製備一具有微卡榫(micro tenon)60之控制基板10，並藉由將此微卡榫(micro tenon)60與隔間壁52所定義的槽室54對位(registration)而將此控制基板10固定在相對基板12上，達成兩基板之結合。更具體而言，在控制基板10先成長驅動電路層30，例如本發明之高開口率驅動電路層30；隨後形成控制電極層PEL，並於控制電極層PEL上製作形成微卡榫60。As shown in FIG14E , a colloidal solution containing charged color particles, such as a colloidal solution containing charged black particles 26B and charged white particles 26W, is filled between the partition walls 52 of the micro-compartment structure 50. Referring to FIG14E , this embodiment further includes preparing a control substrate 10 having a micro tenon 60, and fixing the control substrate 10 on the relative substrate 12 by registering the micro tenon 60 with the slot chamber 54 defined by the partition wall 52, thereby achieving the combination of the two substrates. More specifically, a driving circuit layer 30, such as the high opening rate driving circuit layer 30 of the present invention, is first grown on the control substrate 10; then a control electrode layer PEL is formed, and a micro tenon 60 is formed on the control electrode layer PEL.
參見圖14F，微卡榫可以使用透明光阻透過曝光顯影後，留下微卡榫的區域，其餘清洗掉；此外微卡榫的製作也可以使用平坦層(PLN)經過微影製程留下微卡榫的區域。微卡榫60與微隔間的槽室54的邊壁之間要保持一定的間隙S，以作為對準裕隙。此間隙S例如為1~50um的間隙。依據本發明的一實施方式，此間隙範圍在1~5um之間，配合光罩對位的精度而定，作為對位貼合時的誤差容許範圍，避免對位貼合由於誤差造成微隔間與微卡榫碰撞而損壞。微卡榫的厚度可以為0.5~50um，厚度越厚可以密封的越牢固，但是會影響控制電極的吸引力或是排斥力，所以密封程度與電氣效應需要做合理的分配，依據本發明的一實施方式，微卡榫60厚度範圍也在1~5um之間。Referring to FIG. 14F , the micro-tenons can be made by using a transparent photoresist to expose and develop, leaving the micro-tenon area and washing away the rest; in addition, the micro-tenons can also be made by using a flat layer (PLN) through a lithography process to leave the micro-tenon area. A certain gap S should be maintained between the micro-tenon 60 and the side wall of the micro-compartment slot chamber 54 as an alignment margin. This gap S is, for example, a gap of 1 to 50 um. According to one embodiment of the present invention, this gap ranges from 1 to 5 um, which is determined in conjunction with the accuracy of the mask alignment, as an allowable error range during alignment and bonding, to avoid damage to the micro-compartment and the micro-tenon due to collision caused by errors in alignment and bonding. The thickness of the micro-clip can be 0.5~50um. The thicker the thickness, the more secure the seal. However, it will affect the attraction or repulsion of the control electrode. Therefore, the sealing degree and the electrical effect need to be reasonably allocated. According to one embodiment of the present invention, the thickness of the micro-clip 60 is also between 1~5um.
在上述實施例中，微隔間結構50的隔間壁52可採用高硬度的高分子材料製作，此高硬度的高分子材料例如硬度大於3H。藉此，隔間壁52的平均壁厚度可以做到不大於5um還保有足夠的支撐能力。再者，雖然沒有清楚繪示於圖11A-11C、圖12A-12C、圖13A-13C、圖14A-14E，但是本領域人員可知在該些圖示中，彩色濾光層CF可具有如本發明圖18A所示之結構，亦即彩色濾光層CF包含多個不同顏色的濾光顏色塊(CFR、CFG、CFB)，該濾光顏色塊包含多數個孔洞H且至少一該孔洞H面積不大於100平方微米。In the above embodiment, the partition wall 52 of the micro-compartment structure 50 can be made of a high-hardness polymer material, such as a high-hardness polymer material with a hardness greater than 3H. Thus, the average wall thickness of the partition wall 52 can be no more than 5um while maintaining sufficient support capacity. Furthermore, although it is not clearly shown in Figures 11A-11C, 12A-12C, 13A-13C, and 14A-14E, those skilled in the art can know that in these diagrams, the color filter layer CF can have a structure as shown in Figure 18A of the present invention, that is, the color filter layer CF includes a plurality of filter color blocks (CFR, CFG, CFB) of different colors, and the filter color block includes a plurality of holes H and at least one of the holes H has an area of no more than 100 square microns.
此外，在圖11A-11C、圖12A-12C、圖13A-13C、圖14A-14E所示實施例之電泳式顯示器100中，可具有如圖3A-3C、圖4A-4C及圖5A及5C所示之控制電極層PEL及驅動電路層30架構，以增加電泳式顯示器100之開口率；此外，其薄膜電晶體32及閘極通道寬度/長度設計也可採用如圖6C部份建構在閘極線GL上的薄膜電晶體32架構及閘極通道寬度/長度設計。In addition, in the electrophoretic display 100 of the embodiment shown in Figures 11A-11C, Figures 12A-12C, Figures 13A-13C, and Figures 14A-14E, the control electrode layer PEL and the drive circuit layer 30 structure shown in Figures 3A-3C, Figures 4A-4C, and Figures 5A and 5C can be provided to increase the opening rate of the electrophoretic display 100; in addition, the thin film transistor 32 and the gate channel width/length design can also adopt the thin film transistor 32 structure and the gate channel width/length design partially constructed on the gate line GL as shown in Figure 6C.
更具體而言，在圖11A-11C、圖12A-12C、圖13A-13C、圖14A-14E所示實施例之電泳式顯示器100中，其控制電極層PEL及驅動電路層30可採取如圖3B-3C、圖4A-4C、圖5A-5C所示架構，驅動電路層30更包含多數之儲存電容Cs，且驅動電路層30更包含多數之共同電壓線Ve，該些共同電壓線Ve分別對應該些儲存電容Cs設立且大致與該些閘極線GL平行或與該些資料線DL平行。依據本發明之一實施方式，在圖11A-11C、圖12A-12C、圖13A-13C、圖14A-14E所示實施例之電泳式顯示器100中，也可如圖19所示架構，將其共同電壓線Ve電連接到一顯示驅動器200或一顯示觸控整合驅動器200；在該電泳式顯示器100之觸控操作時，該顯示觸控整合驅動器200將多個資料線DL電連接在一起作為一單一觸控發射電極；該顯示觸控整合驅動器200將多個共同電壓線Ve電連接在一起作為一單一觸控接收電極或是上述的觸控發射電極與觸控接收電極可以互相對調。More specifically, in the electrophoretic display 100 of the embodiments shown in Figures 11A-11C, Figures 12A-12C, Figures 13A-13C, and Figures 14A-14E, the control electrode layer PEL and the driving circuit layer 30 can adopt the structure shown in Figures 3B-3C, Figures 4A-4C, and Figures 5A-5C, and the driving circuit layer 30 further includes a plurality of storage capacitors Cs, and the driving circuit layer 30 further includes a plurality of common voltage lines Ve, and the common voltage lines Ve are respectively set corresponding to the storage capacitors Cs and are roughly parallel to the gate lines GL or the data lines DL. According to one embodiment of the present invention, in the electrophoretic display 100 of the embodiment shown in FIGS. 11A-11C, 12A-12C, 13A-13C, and 14A-14E, the common voltage line Ve can also be electrically connected to a display driver 200 or a display touch integrated driver 200 as shown in FIG. 19; In the electrophoretic display During the touch operation of the display 100, the display touch integrated driver 200 electrically connects multiple data lines DL together as a single touch emitting electrode; the display touch integrated driver 200 electrically connects multiple common voltage lines Ve together as a single touch receiving electrode, or the above-mentioned touch emitting electrode and touch receiving electrode can be interchanged.
6.半透明的電泳式顯示器6. Translucent electrophoretic display
習知技術的電子紙顯示器(如電泳式顯示器)無法使用半透明的顯示方式，半透明的顯示可以用於車窗上做為訊息顯示，置於展示櫃玻璃上做產品說明，窗戶上外牆廣告，戶內彩繪玻璃等。目前能用於半透明的顯示方式的技術只有有機發光二極體(OLED)與微發光二極體(micro LED)可以辦到，而傳統的LCD由於需要背光問題做起來效果不好。習知技術的電泳式顯示器由於不透明所以無法用於此上述場景，無論用OLED或是micro LED的方式都會消耗很多的能源。更具體而言，習知技術的電泳式顯示器因為大部分的面積係用於電子墨水的顯示，且電子墨水包含多種帶電荷顏色粒子，造成，習知技術的電泳式顯示器的不透明狀態。Conventional electronic paper displays (such as electrophoretic displays) cannot use translucent displays. Translucent displays can be used as information displays on car windows, placed on display cabinet glass for product descriptions, on windows for exterior wall advertising, and on indoor stained glass. Currently, only organic light-emitting diodes (OLED) and micro-LEDs can be used for translucent displays, while traditional LCDs do not work well because they require backlight. Conventional electrophoretic displays cannot be used in the above scenarios because they are opaque. Whether using OLED or micro-LED, it consumes a lot of energy. More specifically, the electrophoretic display of the conventional technology is opaque because most of the area is used for electronic ink display, and the electronic ink contains a variety of charged color particles.
用電泳式顯示器做半透明顯示器的好處是可以用於戶外的櫥窗，對外顯示的車窗(例如後擋風玻璃，可以顯示訊息提醒後車，廣告)，屋內可以看到窗外的窗戶上外牆廣告，可透光的戶內彩繪玻璃等，使用電泳顯示器的不耗電優勢在能源短缺的現在是最佳的選擇。The advantage of using electrophoretic displays as semi-transparent displays is that they can be used for outdoor showcases, car windows that display to the outside (such as rear windshields, which can display messages to remind the following cars, advertisements), advertisements on exterior walls that can be seen outside the windows, and light-transmitting indoor stained glass. The advantage of using electrophoretic displays is that they do not consume electricity, making them the best choice in the current energy shortage.
參見圖15A，為依據本發明製作半透明半雙色電泳式顯示器的上視圖。依據本發明，在製作透明雙色電泳式顯示器時係在控制基板10製作具有多個隔間壁52之微隔間結構50，或是在彩色濾光層完成後製作微隔間結構50，或是在導電基板完成後製作微隔間結構50。微隔間結構50的隔間壁52可以製作成接近彩色像素的長方形結構或是黑白像素的正方型結構，更可配合像素的邊界而不至於影響顯示。依據本發明，例如可使用光罩來顯影透明光阻的圖案，製作透明的微隔間壁面。透明光阻的材料可以用硬度較高的材質(例如壓克力材料做成的光阻劑)。將透明光阻製作微隔間結構50的隔間壁52，由於微隔間的壁面位置沒有帶電荷的顏色粒子，所以在顯示上可以穿透到顯示器背面的景物，用增加隔間壁52的壁厚方法來增加透明的面積即可增大透明雙色電泳式顯示器的透明部份(由操作面角度觀之)。透明光阻的光穿透率很高，大於90%以上。此具有高透光率的微隔間結構50配合本發明的配置有具高開口率驅動電路層30的控制基板10，再配合具有透明導電層的相對基板12，就可以做出半透明的電泳式顯示器100。此半透明的電泳式顯示器100的透明程度取決於微隔間內容器的面積(裝有電子墨水的不透明區域)與整個顯示面的比例。裝有電子墨水(內含帶電荷顏色粒子的膠體溶液)的微隔間內容器面積為不透明的區域，其餘的面積為透明的區域。換言之，圖15A內灰色區域皆為微隔間的隔間壁52，其為透明區域，其餘區域為裝有電子墨水的不透明區域。See FIG. 15A, which is a top view of a semi-transparent semi-dual-color electrophoretic display manufactured according to the present invention. According to the present invention, when manufacturing a transparent dual-color electrophoretic display, a micro-compartment structure 50 having a plurality of partition walls 52 is manufactured on the control substrate 10, or the micro-compartment structure 50 is manufactured after the color filter layer is completed, or the micro-compartment structure 50 is manufactured after the conductive substrate is completed. The partition walls 52 of the micro-compartment structure 50 can be manufactured into a rectangular structure close to a color pixel or a square structure of a black and white pixel, and can also be matched with the boundary of the pixel without affecting the display. According to the present invention, for example, a photomask can be used to develop a transparent photoresist pattern to manufacture a transparent micro-compartment wall surface. The material of the transparent photoresist can be a material with a higher hardness (for example, a photoresist made of acrylic material). Transparent photoresist is used to make the partition wall 52 of the micro-compartment structure 50. Since there are no charged color particles on the wall of the micro-compartment, the scene on the back of the display can be penetrated. By increasing the thickness of the partition wall 52 to increase the transparent area, the transparent part of the transparent two-color electrophoretic display can be increased (from the perspective of the operating surface). The light transmittance of transparent photoresist is very high, greater than 90%. This micro-compartment structure 50 with high light transmittance is combined with the control substrate 10 of the present invention with a high-opening drive circuit layer 30, and then combined with the relative substrate 12 with a transparent conductive layer, a semi-transparent electrophoretic display 100 can be made. The degree of transparency of this semi-transparent electrophoretic display 100 depends on the ratio of the area of the container in the micro-compartment (the opaque area containing electronic ink) to the entire display surface. The container area of the micro-compartment filled with electronic ink (colloid solution containing charged color particles) is an opaque area, and the rest of the area is a transparent area. In other words, the gray area in Figure 15A is the compartment wall 52 of the micro-compartment, which is a transparent area, and the rest of the area is an opaque area filled with electronic ink.
參考圖15B，為依據本發明一實施例製作半透明雙色電泳式顯示器100的剖視圖。要達到電泳式顯示器雙面都透明的程度，要使用本發明的配置有具高開口率驅動電路層30的控制基板10，再配合具有透明導電層的透明相對基板12。此外，此透明雙色電泳式顯示器100，進行圖17A至17F之隔間壁52製程，並且把隔間壁的壁厚增大來增加透明度。依據本發明之一實施例，微隔間的隔間壁52壁厚的總面積不小於電泳式顯示器100整個顯示範圍面積的10%。依據本發明之另一實施例，微隔間的隔間壁52壁厚的總面積不小於電泳式顯示器100整個顯示範圍面積的35%。如圖15B所示，此半透明雙色電泳式顯示器100包含由上至下的相對基板12(亦即一第二基板，例如可為一透明塑膠基板或是一玻璃基板)、一共同電極層14(例如可為一透明導電電極層)、一電泳層20a、一控制電極層PEL、一高開口率驅動電路層30(以下簡稱驅動電路層30)及一控制基板10(例如可為一玻璃基板)。此外，如圖15B所示，該電泳層20a包含多數的隔間壁52所構成的微隔間結構50且該些隔間壁52界定多個槽室54(如圖所示有兩個槽室54)、裝填在每一槽室54中的含多個帶電荷顏色粒子(例如帶電荷黑色粒子26B及帶電荷白色粒子26W)的膠體溶液24。依據本發明之一實施方式，高開口率驅動電路層30中的儲存電容Cs的第一電極CE1/第二電極CE2的材料選用透明導電材料，俾能增進此電泳式顯示器100的開口率。此外，更有助於使用者由控制基板10側觀看此電泳式顯示器100，以利與觀看側接近的控制電極層PEL吸引所需的帶電荷黑色粒子26B及帶電荷白色粒子26W，達成更快的螢幕更新率。圖15B所示之驅動電路層30例如可由圖3B-3C、圖4A-4C、圖5A-5C所示的驅動電路層30實現。Referring to FIG. 15B , a cross-sectional view of a semi-transparent two-color electrophoretic display 100 is shown according to an embodiment of the present invention. To achieve the level of transparency on both sides of the electrophoretic display, the control substrate 10 of the present invention, which is equipped with a driving circuit layer 30 with a high opening ratio, is used in combination with a transparent opposite substrate 12 having a transparent conductive layer. In addition, the transparent two-color electrophoretic display 100 is subjected to the partition wall 52 manufacturing process of FIGS. 17A to 17F , and the thickness of the partition wall is increased to increase transparency. According to an embodiment of the present invention, the total area of the wall thickness of the partition wall 52 of the micro-compartment is not less than 10% of the entire display range area of the electrophoretic display 100. According to another embodiment of the present invention, the total area of the wall thickness of the micro-compartment wall 52 is not less than 35% of the entire display area of the electrophoretic display 100. As shown in FIG15B , the semi-transparent two-color electrophoretic display 100 comprises, from top to bottom, a relative substrate 12 (i.e., a second substrate, such as a transparent plastic substrate or a glass substrate), a common electrode layer 14 (such as a transparent conductive electrode layer), an electrophoretic layer 20a, a control electrode layer PEL, a high aperture ratio driving circuit layer 30 (hereinafter referred to as the driving circuit layer 30) and a control substrate 10 (such as a glass substrate). In addition, as shown in FIG. 15B , the electrophoretic layer 20a includes a micro-compartment structure 50 formed by a plurality of partition walls 52, and the partition walls 52 define a plurality of chambers 54 (two chambers 54 are shown in the figure), and a colloidal solution 24 containing a plurality of charged color particles (e.g., charged black particles 26B and charged white particles 26W) is filled in each chamber 54. According to one embodiment of the present invention, the material of the first electrode CE1/second electrode CE2 of the storage capacitor Cs in the high aperture ratio driving circuit layer 30 is a transparent conductive material, so as to improve the aperture ratio of the electrophoretic display 100. In addition, it is more helpful for the user to view the electrophoretic display 100 from the control substrate 10 side, so that the control electrode layer PEL close to the viewing side can attract the required charged black particles 26B and charged white particles 26W, thereby achieving a faster screen refresh rate. The driving circuit layer 30 shown in FIG. 15B can be realized by the driving circuit layer 30 shown in FIG. 3B-3C, FIG. 4A-4C, and FIG. 5A-5C, for example.
參考圖15C，為依據本發明另一實施例製作半透明彩色電泳式顯示器100的剖視圖，本實施例可以顯示一面彩色畫面，其相對另一面為黑白畫面。首先在有透明控制電極層PEL與高開口率驅動電路層30的控制基板10上製作彩色濾光層CF，然後進行圖17A至17F之隔間壁52製程，然後填入含雙色的帶電荷粒子26(例如帶電荷黑色粒子26B及帶電荷白色粒子26W)的膠體溶液。然後貼合透明的共同電極層14的透明相對基板12(第二基板)所製作而成。同樣的，圖15C所示之電泳式顯示器100中，用透明光阻製作微隔間的隔間壁52，並且把隔間壁的壁厚增大來增加透明度。依據本發明之一實施方式，微隔間的隔間壁52壁厚的總面積不小於電泳式顯示器100整個顯示範圍面積的10%。依據本發明之另一實施方式，微隔間的隔間壁52壁厚的總面積不小於電泳式顯示器100整個顯示範圍面積的35%。如圖15C所示，此半透明彩色電泳式顯示器100包含由上至下的相對基板12(例如可為一透明塑膠基板或是一玻璃基板)、一共同電極層14(例如可為一透明導電電極層)、一電泳層20a、一彩色濾光層CF、一控制電極層PEL、一高開口率驅動電路層30(以下簡稱驅動電路層30)及一控制基板10(例如可為一玻璃基板)。此外，如圖15C所示，該電泳層20a包含多數的隔間壁52所構成的微隔間結構50且該些隔間壁52界定多個槽室54(如圖所示有兩個槽室54)、裝填在每一槽室54中的含多個帶電荷顏色粒子(例如帶電荷黑色粒子26B及帶電荷白色粒子26W)的膠體溶液24。依據本發明之一實施方式，高開口率驅動電路層30中的儲存電容Cs的第一電極CE1/第二電極CE2的材料選用透明導電材料，俾能增進此電泳式顯示器100的開口率。此外，更有助於使用者由控制基板10側觀看此電泳式顯示器100，以利與觀看側接近的控制電極層PEL吸引所需的帶電荷黑色粒子26B及帶電荷白色粒子26W，達成更快的螢幕更新率等多項進步性。圖15C所示之驅動電路層30例如可由圖3B-3C、圖4A-4C、圖5A-5C所示的驅動電路層30實現。Referring to FIG. 15C , it is a cross-sectional view of a semi-transparent color electrophoretic display 100 manufactured according to another embodiment of the present invention. This embodiment can display a color image on one side, and a black and white image on the other side. First, a color filter layer CF is manufactured on a control substrate 10 having a transparent control electrode layer PEL and a high aperture ratio driving circuit layer 30, and then the partition wall 52 process of FIGS. 17A to 17F is performed, and then a colloidal solution containing two-color charged particles 26 (e.g., charged black particles 26B and charged white particles 26W) is filled. Then, a transparent opposite substrate 12 (second substrate) with a transparent common electrode layer 14 is bonded to manufacture it. Similarly, in the electrophoretic display 100 shown in FIG. 15C , the partition walls 52 of the microcompartments are made of transparent photoresist, and the thickness of the partition walls is increased to increase transparency. According to one embodiment of the present invention, the total area of the wall thickness of the partition walls 52 of the microcompartments is not less than 10% of the entire display area of the electrophoretic display 100. According to another embodiment of the present invention, the total area of the wall thickness of the partition walls 52 of the microcompartments is not less than 35% of the entire display area of the electrophoretic display 100. As shown in FIG. 15C , the semi-transparent color electrophoretic display 100 comprises, from top to bottom, a relative substrate 12 (e.g., a transparent plastic substrate or a glass substrate), a common electrode layer 14 (e.g., a transparent conductive electrode layer), an electrophoretic layer 20a, a color filter layer CF, a control electrode layer PEL, a high aperture ratio driving circuit layer 30 (hereinafter referred to as the driving circuit layer 30) and a control substrate 10 (e.g., a glass substrate). In addition, as shown in FIG. 15C , the electrophoretic layer 20a includes a micro-compartment structure 50 formed by a plurality of partition walls 52, and the partition walls 52 define a plurality of chambers 54 (two chambers 54 are shown in the figure), and a colloidal solution 24 containing a plurality of charged color particles (e.g., charged black particles 26B and charged white particles 26W) is filled in each chamber 54. According to one embodiment of the present invention, the material of the first electrode CE1/second electrode CE2 of the storage capacitor Cs in the high aperture ratio driving circuit layer 30 is a transparent conductive material, so as to improve the aperture ratio of the electrophoretic display 100. In addition, it is more helpful for users to view the electrophoretic display 100 from the control substrate 10 side, so that the control electrode layer PEL close to the viewing side can attract the required charged black particles 26B and charged white particles 26W, achieving a faster screen refresh rate and other improvements. The driving circuit layer 30 shown in FIG. 15C can be realized by the driving circuit layer 30 shown in FIG. 3B-3C, FIG. 4A-4C, and FIG. 5A-5C, for example.
參考圖15D，為依據本發明又另一實施例製作半透明彩色電泳式顯示器100的剖視圖。此電泳式顯示器100首先製作具有透明控制電極層PEL與高開口率驅動電路層30的控制基板10，然後用高分子材料(例如透明光阻材料)進行圖17A至17F之隔間壁52製程，然後填入含雙色的帶電荷粒子26(例如帶電荷黑色粒子26B及帶電荷白色粒子26W)的膠體溶液。然後貼合透明的共同電極層14的透明相對基板12所製作而成。其中此透明相對基板12更製作位在共同電極層14上的彩色濾光層CF及微卡榫(micro tenon)60。復配合參見圖14F，微卡榫60可以使用透明光阻透過曝光顯影後，留下微卡榫的區域，其餘清洗掉；此外微卡榫的製作也可以使用平坦層(PLN)經過微影製程留下微卡榫的區域。微卡榫60與微隔間結構50的槽室54的邊壁之間要保持一定的間隙S，以作為對準裕隙。此間隙S例如為1~50um的間隙。依據本發明的一實施方式，此間隙範圍在1~5um之間，配合貼合基板時光罩對位的精度而定，作為對位貼合時的誤差容許範圍，避免對位貼合由於誤差造成微隔間與微卡榫碰撞而損壞。微卡榫的厚度可以為0.5~50um，厚度越厚可以密封的越牢固，但是會影響控制電極的吸引力或是排斥力，所以密封程度與電氣效應需要做合理的分配，依據本發明的一實施方式，微卡榫60厚度範圍也在1~5um之間。Referring to FIG. 15D , it is a cross-sectional view of a semi-transparent color electrophoretic display 100 manufactured according to another embodiment of the present invention. The electrophoretic display 100 first manufactures a control substrate 10 having a transparent control electrode layer PEL and a high aperture ratio driving circuit layer 30, then uses a polymer material (e.g., a transparent photoresist material) to perform the partition wall 52 process of FIGS. 17A to 17F , and then fills in a colloidal solution containing two-color charged particles 26 (e.g., charged black particles 26B and charged white particles 26W). Then, a transparent opposing substrate 12 with a transparent common electrode layer 14 is bonded to manufacture the display. The transparent opposing substrate 12 is further manufactured with a color filter layer CF and micro tenons 60 located on the common electrode layer 14. As shown in FIG. 14F, the micro-tenon 60 can be made by using a transparent photoresist to expose and develop, leaving the micro-tenon area and washing away the rest; in addition, the micro-tenon can also be made by using a flat layer (PLN) through a lithography process to leave the micro-tenon area. A certain gap S should be maintained between the micro-tenon 60 and the side wall of the groove chamber 54 of the micro-compartment structure 50 as an alignment margin. This gap S is, for example, a gap of 1 to 50 μm. According to an embodiment of the present invention, this gap ranges from 1 to 5 μm, which is determined according to the accuracy of the mask alignment when bonding the substrate, as the error tolerance range during alignment bonding, to avoid the micro-compartment and micro-tenon collision and damage due to the error in alignment bonding. The thickness of the micro-clip can be 0.5~50um. The thicker the thickness, the more secure the seal can be. However, it will affect the attraction or repulsion of the control electrode. Therefore, the sealing degree and the electrical effect need to be reasonably allocated. According to one embodiment of the present invention, the thickness of the micro-clip 60 is also between 1~5um.
同樣的，圖15D所示之電泳式顯示器100中，用透明光阻製作微隔間的隔間壁52，並且把隔間壁的壁厚增大來增加透明度。依據本發明之一實施方式，微隔間的隔間壁52壁厚的總面積不小於電泳式顯示器100整個顯示範圍面積的10%。依據本發明之另一實施方式，微隔間的隔間壁52壁厚的總面積不小於電泳式顯示器100整個顯示範圍面積的35%。如圖15D所示，此透明雙色電泳式顯示器100包含由上至下的相對基板12(例如可為一透明塑膠基板或是一玻璃基板)、一共同電極層14(例如可為一透明導電電極層)、一彩色濾光層CF、一微卡榫60、一電泳層20a、一控制電極層PEL、一高開口率驅動電路層30(以下簡稱驅動電路層30)及一控制基板10(例如可為一玻璃基板)。此外，如圖15D所示，該電泳層20a包含多數的隔間壁52所構成的微隔間結構50且該些隔間壁52界定多個槽室54(如圖所示有兩個槽室54)、裝填在每一槽室54中的含多個帶電荷顏色粒子(例如帶電荷黑色粒子26B及帶電荷白色粒子26W)的膠體溶液24。此外，相對基板12更包含位在共同電極層14上且面向電泳層20a的彩色濾光層CF及微卡榫(micro tenon)60。微卡榫(micro tenon)60適於嵌入微隔間結構50的相應槽室54內。依據本發明之一實施方式，高開口率驅動電路層30中的儲存電容Cs的第一電極CE1/第二電極CE2的材料選用透明導電材料，俾能增進此電泳式顯示器100的開口率。此外，更有助於使用者由控制基板10側觀看此電泳式顯示器100，以利與觀看側接近的控制電極層PEL吸引所需的帶電荷黑色粒子26B及帶電荷白色粒子26W，達成更快的螢幕更新率。圖15D所示之驅動電路層30例如可由圖3B-3C、圖4A-4C、圖5A-5C所示的驅動電路層30實現。Similarly, in the electrophoretic display 100 shown in FIG. 15D , the partition walls 52 of the microcompartments are made of transparent photoresist, and the thickness of the partition walls is increased to increase transparency. According to one embodiment of the present invention, the total area of the wall thickness of the partition walls 52 of the microcompartments is not less than 10% of the entire display area of the electrophoretic display 100. According to another embodiment of the present invention, the total area of the wall thickness of the partition walls 52 of the microcompartments is not less than 35% of the entire display area of the electrophoretic display 100. As shown in FIG. 15D , the transparent two-color electrophoretic display 100 includes from top to bottom a relative substrate 12 (for example, a transparent plastic substrate or a glass substrate), a common electrode layer 14 (for example, a transparent conductive electrode layer), a color filter layer CF, a micro-latch 60, an electrophoretic layer 20a, a control electrode layer PEL, a high aperture ratio driving circuit layer 30 (hereinafter referred to as the driving circuit layer 30) and a control substrate 10 (for example, a glass substrate). In addition, as shown in FIG. 15D , the electrophoretic layer 20a includes a micro-compartment structure 50 formed by a plurality of partition walls 52, and the partition walls 52 define a plurality of chambers 54 (two chambers 54 are shown in the figure), and a colloidal solution 24 containing a plurality of charged color particles (e.g., charged black particles 26B and charged white particles 26W) filled in each chamber 54. In addition, the counter substrate 12 further includes a color filter layer CF and a micro tenon 60 located on the common electrode layer 14 and facing the electrophoretic layer 20a. The micro tenon 60 is suitable for being embedded in the corresponding chamber 54 of the micro-compartment structure 50. According to one embodiment of the present invention, the material of the first electrode CE1/second electrode CE2 of the storage capacitor Cs in the high aperture ratio driving circuit layer 30 is a transparent conductive material, so as to increase the aperture ratio of the electrophoretic display 100. In addition, it is more helpful for the user to view the electrophoretic display 100 from the control substrate 10 side, so that the control electrode layer PEL close to the viewing side can attract the required charged black particles 26B and charged white particles 26W, thereby achieving a faster screen refresh rate. The driving circuit layer 30 shown in FIG. 15D can be realized by the driving circuit layer 30 shown in FIG. 3B-3C, FIG. 4A-4C, and FIG. 5A-5C, for example.
參考圖16A，為依據本發明又另一實施例製作半透明雙色雙面電泳式顯示器100的剖視圖，此電泳式顯示器100可在雙面顯示不同畫面。此實施例之架構部份類似圖15B所示架構，但是相對基板12係由一第二控制基板10U取代，此第二控制基板10U也為透明基板且係藉由微卡榫60嵌入微隔間結構50的相應槽室54內而與第一控制基板10D結合。再者，第二控制基板10U處也具有在上方的高開口率驅動電路層(第二驅動電路層)30U及上方的控制電極層(第二控制電極層)PELU，此第二控制電極層PELU具有多數的第二控制電極PEU。再者第一控制基板10D處具有下方的的高開口率驅動電路層(第一控制電極層)30D及下方的控制電極層(第一控制電極層)PELD，此第一控制電極層PELD具有多數的第一控制電極PED。Referring to FIG. 16A , it is a cross-sectional view of a semi-transparent double-color double-sided electrophoretic display 100 manufactured according to another embodiment of the present invention. This electrophoretic display 100 can display different images on both sides. The structure of this embodiment is similar to that shown in FIG. 15B , but the relative substrate 12 is replaced by a second control substrate 10U. This second control substrate 10U is also a transparent substrate and is embedded in the corresponding chamber 54 of the micro-compartment structure 50 by a micro-clip 60 to be combined with the first control substrate 10D. Furthermore, the second control substrate 10U also has a high-opening drive circuit layer (second drive circuit layer) 30U on the top and a control electrode layer (second control electrode layer) PELU on the top. This second control electrode layer PELU has a plurality of second control electrodes PEU. Furthermore, the first control substrate 10D has a high opening ratio driving circuit layer (first control electrode layer) 30D and a control electrode layer (first control electrode layer) PELD below. The first control electrode layer PELD has a plurality of first control electrodes PED.
同樣的，微卡榫60可以使用透明光阻透過曝光顯影後，留下微卡榫的區域，其餘清洗掉；此外微卡榫的製作也可以使用平坦層(PLN)經過微影製程留下微卡榫的區域。微卡榫60與微隔間結構50的槽室54的邊壁之間要保持一定的間隙S，以作為對準裕隙。此間隙S例如為1~50um的間隙。依據本發明的一實施方式，此間隙範圍在1~5um之間，配合貼合基板時光罩對位的精度而定，作為對位貼合時的誤差容許範圍，避免對位貼合由於誤差造成微隔間與微卡榫碰撞而損壞。微卡榫的厚度可以為0.5~50um，厚度越厚可以密封的越牢固，但是會影響控制電極的吸引力或是排斥力，所以密封程度與電氣效應需要做合理的分配，依據本發明的一實施方式，微卡榫60厚度範圍也在1~5um之間。Similarly, the micro-tenon 60 can be made by using a transparent photoresist to expose and develop, leaving the micro-tenon area and cleaning the rest; in addition, the micro-tenon can also be made by using a flat layer (PLN) through a lithography process to leave the micro-tenon area. A certain gap S must be maintained between the micro-tenon 60 and the side wall of the groove chamber 54 of the micro-compartment structure 50 as an alignment margin. This gap S is, for example, a gap of 1 to 50 um. According to one embodiment of the present invention, this gap ranges from 1 to 5 um, which is determined according to the accuracy of the mask alignment when bonding the substrate, and serves as the allowable error range during alignment and bonding to avoid damage to the micro-compartment and micro-tenon due to collision caused by errors in alignment and bonding. The thickness of the micro-clip can be 0.5~50um. The thicker the thickness, the more secure the seal can be. However, it will affect the attraction or repulsion of the control electrode. Therefore, the sealing degree and the electrical effect need to be reasonably allocated. According to one embodiment of the present invention, the thickness of the micro-clip 60 is also between 1~5um.
在圖16A所示之電泳式顯示器100中，用透明光阻進行圖17A至17F之隔間壁52製程，並且把隔間壁的壁厚增大來增加透明度。依據本發明之一實施方式，微隔間的隔間壁52壁厚的總面積不小於電泳式顯示器100整個顯示範圍面積的10%。依據本發明之另一實施方式，微隔間的隔間壁52壁厚的總面積不小於電泳式顯示器100整個顯示範圍面積的35%。依據本發明之一實施方式，高開口率驅動電路層30U與30D中的儲存電容Cs的第一電極CE1/第二電極CE2的材料選用透明導電材料，俾能增進此電泳式顯示器100的開口率。此外，更有助於使用者由第一控制基板10D與第二控制基板10U側觀看此電泳式顯示器100，以利與觀看側接近的控制電極層PELU與PELD吸引所需的帶電荷黑色粒子26B及帶電荷白色粒子26W，達成更快的螢幕更新率。圖16A所示之驅動電路層30U及30D例如可由圖3B-3C、圖4A-4C、圖5A-5C所示的驅動電路層30實現。再者，控制電極層PELU及控制電極層PELD也可對應圖3B-3C、圖4A-4C、圖5A-5C所示的控制電極層PEL實現。In the electrophoretic display 100 shown in FIG. 16A , the partition wall 52 process of FIG. 17A to 17F is performed using a transparent photoresist, and the thickness of the partition wall is increased to increase transparency. According to one embodiment of the present invention, the total area of the wall thickness of the partition wall 52 of the micro-compartment is not less than 10% of the entire display area of the electrophoretic display 100. According to another embodiment of the present invention, the total area of the wall thickness of the partition wall 52 of the micro-compartment is not less than 35% of the entire display area of the electrophoretic display 100. According to one embodiment of the present invention, the material of the first electrode CE1/second electrode CE2 of the storage capacitor Cs in the high aperture ratio driving circuit layer 30U and 30D is selected from a transparent conductive material so as to increase the aperture ratio of the electrophoretic display 100. In addition, it is more helpful for the user to view the electrophoretic display 100 from the first control substrate 10D and the second control substrate 10U side, so that the control electrode layers PELU and PELD close to the viewing side can attract the required charged black particles 26B and charged white particles 26W, thereby achieving a faster screen refresh rate. The drive circuit layers 30U and 30D shown in FIG. 16A can be implemented by the drive circuit layer 30 shown in FIG. 3B-3C, FIG. 4A-4C, and FIG. 5A-5C, for example. Furthermore, the control electrode layer PELU and the control electrode layer PELD can also be implemented corresponding to the control electrode layer PEL shown in FIG. 3B-3C, FIG. 4A-4C, and FIG. 5A-5C.
復配合參考圖16A，當上方的高開口率第二驅動電路層30U控制第二控制基板10U處的電極(第二控制電極PEU)帶負電，下方的高開口率第一驅動電路層30D控制此第一控制基板10D相應的電極(第一控制電極PED)帶正電時，帶正電的黑色粒子26B會移往上方之第二控制電極PEU，讓上方的電極位置顯示黑色的像素；帶負電的白色粒子26W會移往下方的第一控制電極PED，讓下方的第一控制電極PED的位置顯示出白色像素。當上下方電極的極性互換時，顯示像素的顏色也會互換。Referring to FIG. 16A, when the upper high-aperture second driving circuit layer 30U controls the electrode (second control electrode PEU) at the second control substrate 10U to be negatively charged, and the lower high-aperture first driving circuit layer 30D controls the corresponding electrode (first control electrode PED) of the first control substrate 10D to be positively charged, the positively charged black particles 26B will move to the upper second control electrode PEU, so that the upper electrode position displays a black pixel; the negatively charged white particles 26W will move to the lower first control electrode PED, so that the lower first control electrode PED position displays a white pixel. When the polarity of the upper and lower electrodes is swapped, the color of the displayed pixel will also be swapped.
參考圖16B，對應圖16A之結構，當上下電極(上方的第二控制電極PEU及下方相應第一控制電極PED)為相同極性時，例如都帶正電荷時，此時帶負電的白色粒子26W會移往上下兩電極，讓上下兩電極顯示白色像素，帶正電的黑色粒子26B會往中間移動而被白色粒子26W遮蔽看不到。反之上下電極都帶負電荷時，帶正電的黑色粒子26B會移往上下兩電極，白色粒子26W會往中間移動，被黑色粒子26B遮蔽而看不到，這時上下兩電極顯示黑色像素。Referring to FIG. 16B , corresponding to the structure of FIG. 16A , when the upper and lower electrodes (the upper second control electrode PEU and the corresponding lower first control electrode PED) have the same polarity, for example, when both are positively charged,the negatively charged white particles 26W will move to the upper and lower electrodes, allowing the upper and lower electrodes to display white pixels, and the positively charged black particles 26B will move to the middle and be blocked by the white particles 26W. On the contrary, when both the upper and lower electrodes are negatively charged, the positively charged black particles 26B will move to the upper and lower electrodes, and the white particles 26W will move to the middle and be blocked by the black particles 26B and cannot be seen. At this time, the upper and lower electrodes display black pixels.
參考圖16C，為依據本發明又另一實施例製作半透明彩色雙面顯示電泳式顯示器100的剖視圖，此電泳式顯示器100可在雙面顯示不同彩色畫面。此電泳式顯示器100首先在下方的有透明第一控制電極層PELD(具有第一控制電極PED)與高開口率第一驅動電路層30D的第一控制基板10D上製作第一彩色濾光層CF-1，然後用透明光阻進行圖17A至17F之隔間壁52製程，然後填入含雙色帶電荷粒子26(例如帶電荷黑色粒子26B及帶電荷白色粒子26W)的膠體溶液。然後壓合具有微卡榫60的透明第二控制基板10U所製作而成。此外，如圖16C，透明第二控制基板10U也具有於上方的高開口率第二驅動電路層30U、透明的第二控制電極層PELU(具有第二控制電極PEU)及於透明的第二控制電極層PELU上形成的第二彩色濾光層CF-2。Referring to FIG. 16C , it is a cross-sectional view of a semi-transparent color double-sided display electrophoretic display 100 according to another embodiment of the present invention. The electrophoretic display 100 can display different color images on both sides. The electrophoretic display 100 firstly forms a first color filter layer CF-1 on a first control substrate 10D with a transparent first control electrode layer PELD (having a first control electrode PED) and a first driving circuit layer 30D with a high aperture ratio, and then uses a transparent photoresist to perform the partition wall 52 process of FIGS. 17A to 17F , and then fills in a colloidal solution containing two-color charged particles 26 (e.g., charged black particles 26B and charged white particles 26W). Then, a transparent second control substrate 10U with a micro-lock 60 is pressed and formed. In addition, as shown in FIG. 16C , the transparent second control substrate 10U also has a second driving circuit layer 30U with a high opening ratio on the top, a transparent second control electrode layer PELU (having a second control electrode PEU), and a second color filter layer CF-2 formed on the transparent second control electrode layer PELU.
復配合參見圖14F，微卡榫60可以使用透明光阻透過曝光顯影後，留下微卡榫的區域，其餘清洗掉；此外微卡榫的製作也可以使用平坦層(PLN)經過微影製程留下微卡榫的區域。微卡榫60與微隔間結構50的槽室54的邊壁之間要保持一定的間隙S，以作為對準裕隙。此間隙S例如為1~50um的間隙。依據本發明的一實施方式，此間隙範圍在1~5um之間，配合光罩對位的精度而定，作為對位貼合時的誤差容許範圍，避免對位貼合由於誤差造成微隔間與微卡榫碰撞而損壞。微卡榫的厚度可以為0.5~50um，厚度越厚可以密封的越牢固，但是會影響控制電極的吸引力或是排斥力，所以密封程度與電氣效應需要做合理的分配，依據本發明的一實施方式，微卡榫60厚度範圍也在1~5um之間。Refer to FIG. 14F for the complex matching. The micro-tenon 60 can be made by using a transparent photoresist to expose and develop, leaving the micro-tenon area and cleaning the rest. In addition, the micro-tenon can also be made by using a flat layer (PLN) through a lithography process to leave the micro-tenon area. A certain gap S should be maintained between the micro-tenon 60 and the side wall of the groove chamber 54 of the micro-compartment structure 50 as an alignment margin. This gap S is, for example, a gap of 1 to 50 um. According to one embodiment of the present invention, this gap ranges from 1 to 5 um, which is determined in conjunction with the accuracy of the mask alignment, as an allowable error range during alignment and bonding, to avoid damage to the micro-compartment and the micro-tenon due to collision caused by errors in alignment and bonding. The thickness of the micro-clip can be 0.5~50um. The thicker the thickness, the more secure the seal. However, it will affect the attraction or repulsion of the control electrode, so the sealing degree and the electrical effect need to be reasonably allocated. According to one embodiment of the present invention, the thickness of the micro-clip 60 is also between 1~5um.
在圖16C所示之電泳式顯示器100中，用透明光阻製作微隔間的隔間壁52，並且把隔間壁的壁厚增大來增加透明度。依據本發明之一實施方式，微隔間的隔間壁52壁厚的總面積不小於電泳式顯示器100整個顯示範圍面積的10%。依據本發明之另一實施方式，微隔間的隔間壁52壁厚的總面積不小於電泳式顯示器100整個顯示範圍面積的35%。依據本發明之一實施方式，高開口率驅動電路層30U及30D中的儲存電容Cs的第一電極CE1/第二電極CE2的材料選用透明導電材料，俾能增進此電泳式顯示器100的開口率。此外，更有助於使用者由第一控制基板10D與第二控制基板10U側觀看此電泳式顯示器100，以利與觀看側接近的控制電極層PELU與PELD吸引所需的帶電荷黑色粒子26B及帶電荷白色粒子26W，達成更快的螢幕更新率等多種進步性。圖16C所示之驅動電路層30U及30D例如可由圖3B-3C、圖4A-4C、圖5A-5C所示的驅動電路層30實現。再者，控制電極層PELU及控制電極層PELD也可對應圖3B-3C、圖4A-4C、圖5A-5C所示的控制電極層PEL實現。In the electrophoretic display 100 shown in FIG. 16C , the partition walls 52 of the microcompartments are made of transparent photoresist, and the thickness of the partition walls is increased to increase transparency. According to one embodiment of the present invention, the total area of the wall thickness of the partition walls 52 of the microcompartments is not less than 10% of the entire display area of the electrophoretic display 100. According to another embodiment of the present invention, the total area of the wall thickness of the partition walls 52 of the microcompartments is not less than 35% of the entire display area of the electrophoretic display 100. According to one embodiment of the present invention, the material of the first electrode CE1/second electrode CE2 of the storage capacitor Cs in the high aperture ratio driving circuit layers 30U and 30D is selected from transparent conductive materials to increase the aperture ratio of the electrophoretic display 100. In addition, it is more helpful for users to view the electrophoretic display 100 from the first control substrate 10D and the second control substrate 10U side, so that the control electrode layers PELU and PELD close to the viewing side can attract the required charged black particles 26B and charged white particles 26W, and achieve various improvements such as faster screen refresh rate. The drive circuit layers 30U and 30D shown in FIG. 16C can be implemented by the drive circuit layer 30 shown in FIG. 3B-3C, FIG. 4A-4C, and FIG. 5A-5C. Furthermore, the control electrode layer PELU and the control electrode layer PELD can also be implemented corresponding to the control electrode layer PEL shown in FIG. 3B-3C, FIG. 4A-4C, and FIG. 5A-5C.
參考圖16D，為依據本發明又另一實施例製作半透明雙面顯示電泳式顯示器100的剖視圖，此電泳式顯示器100可在一面顯示彩色，另一面顯示黑白畫面。此實施例之電泳式顯示器100類似圖16C所示之電泳式顯示器，但是在第二控制基板10U側不具有彩色濾光層，因此可以在第二控制基板10U側顯示黑白畫面，而在第一控制基板10D處顯示彩色畫面。同樣的，第二控制基板10U具有形成於其上的微卡榫60，而第一控制基板10D具有形成於其上的微隔間結構50(具有槽室54)，同樣的在第二控制基板10U上形成微隔間結構50，第一控制基板10D上形成微卡榫60也在本發明的範圍內，且第二控制基板10U係藉由微卡榫60嵌入微隔間結構50的相應槽室54內而與第一控制基板10D結合。或是且第一控制基板10D係藉由微卡榫60嵌入微隔間結構50的相應槽室54內而與第二控制基板10U結合。微卡榫60可以使用透明光阻透過曝光顯影製作；此外微卡榫的製作也可以使用平坦層(PLN)經過微影製程留下微卡榫的區域而製作。微卡榫60與微隔間結構50的槽室54的邊壁之間要保持一定的間隙S，以作為對準裕隙。此間隙S例如為1~50um的間隙。依據本發明的一實施方式，此間隙範圍在1~5um之間，配合對位的精度而定，作為光罩對位貼合時的誤差容許範圍，避免對位貼合由於誤差造成微隔間與微卡榫碰撞而損壞。微卡榫的厚度可以為0.5~50um，厚度越厚可以密封的越牢固，但是會影響控制電極的吸引力或是排斥力，所以密封程度與電氣效應需要做合理的分配，依據本發明的一實施方式，微卡榫60厚度範圍也在1~5um之間。Referring to FIG. 16D , it is a cross-sectional view of a semi-transparent double-sided display electrophoretic display 100 manufactured according to another embodiment of the present invention. The electrophoretic display 100 can display color on one side and black and white on the other side. The electrophoretic display 100 of this embodiment is similar to the electrophoretic display shown in FIG. 16C , but does not have a color filter layer on the second control substrate 10U side, so that a black and white image can be displayed on the second control substrate 10U side, and a color image can be displayed on the first control substrate 10D. Similarly, the second control substrate 10U has a micro-cage 60 formed thereon, and the first control substrate 10D has a micro-compartment structure 50 (having a groove chamber 54) formed thereon. Similarly, the micro-compartment structure 50 is formed on the second control substrate 10U, and the micro-cage 60 is formed on the first control substrate 10D. It is also within the scope of the present invention, and the second control substrate 10U is combined with the first control substrate 10D by embedding the micro-cage 60 into the corresponding groove chamber 54 of the micro-compartment structure 50. Or the first control substrate 10D is combined with the second control substrate 10U by embedding the micro-cage 60 into the corresponding groove chamber 54 of the micro-compartment structure 50. The micro-cage 60 can be made by using a transparent photoresist through exposure and development; in addition, the micro-cage can also be made by using a flat layer (PLN) through a lithography process to leave a micro-cage area. A certain gap S should be maintained between the micro-cage 60 and the side wall of the slot chamber 54 of the micro-compartment structure 50 as an alignment margin. This gap S is, for example, a gap of 1 to 50 um. According to one embodiment of the present invention, this gap ranges from 1 to 5 um, depending on the accuracy of the alignment, as an error tolerance range during the alignment of the mask, to avoid the alignment error causing the micro-compartment and the micro-cage to collide and be damaged. The thickness of the micro-cage can be 0.5 to 50 um. The thicker the thickness, the more secure the seal can be, but it will affect the attraction or repulsion of the control electrode, so the sealing degree and the electrical effect need to be reasonably allocated. According to one embodiment of the present invention, the thickness of the micro-cage 60 also ranges from 1 to 5 um.
在圖16D所示之電泳式顯示器100中，用透明光阻製作微隔間的隔間壁52，並且把隔間壁的壁厚增大來增加透明度。依據本發明之一實施方式，微隔間的隔間壁52壁厚的總面積不小於電泳式顯示器100整個顯示範圍面積的10%。依據本發明之另一實施方式，微隔間的隔間壁52壁厚的總面積不小於電泳式顯示器100整個顯示範圍面積的35%。依據本發明之一實施方式，高開口率驅動電路層30U及30D中的儲存電容Cs的第一電極CE1/第二電極CE2的材料選用透明導電材料，俾能增進此電泳式顯示器100的開口率。此外，更有助於使用者由第一控制基板10D與第二控制基板10U側觀看此電泳式顯示器100，以利與觀看側接近的控制電極層PELU與PELD吸引所需的帶電荷黑色粒子26B及帶電荷白色粒子26W，達成更快的螢幕更新率。圖16D所示之驅動電路層30U及30D例如可由圖3B-3C、圖4A-4C、圖5A-5C所示的驅動電路層30實現。再者，控制電極層PELU及控制電極層PELD也可對應圖3B-3C、圖4A-4C、圖5A-5C所示的控制電極層PEL實現。In the electrophoretic display 100 shown in FIG. 16D , the partition walls 52 of the microcompartments are made of transparent photoresist, and the thickness of the partition walls is increased to increase transparency. According to one embodiment of the present invention, the total area of the wall thickness of the partition walls 52 of the microcompartments is not less than 10% of the entire display area of the electrophoretic display 100. According to another embodiment of the present invention, the total area of the wall thickness of the partition walls 52 of the microcompartments is not less than 35% of the entire display area of the electrophoretic display 100. According to one embodiment of the present invention, the material of the first electrode CE1/second electrode CE2 of the storage capacitor Cs in the high aperture ratio driving circuit layers 30U and 30D is selected from transparent conductive materials to increase the aperture ratio of the electrophoretic display 100. In addition, it is more helpful for the user to view the electrophoretic display 100 from the first control substrate 10D and the second control substrate 10U side, so that the control electrode layers PELU and PELD close to the viewing side can attract the required charged black particles 26B and charged white particles 26W, thereby achieving a faster screen refresh rate. The drive circuit layers 30U and 30D shown in FIG. 16D can be implemented by the drive circuit layer 30 shown in FIG. 3B-3C, FIG. 4A-4C, and FIG. 5A-5C, for example. Furthermore, the control electrode layer PELU and the control electrode layer PELD can also be implemented corresponding to the control electrode layer PEL shown in FIG. 3B-3C, FIG. 4A-4C, and FIG. 5A-5C.
7.具有孔洞的彩色濾光層7. Color filter with holes
如圖7A所示，在電子紙顯示器使用彩色濾光層來顯示彩色的畫面時，由於光線進入彩色濾光層會有一次的光損，反射出來後又一次的光損，兩次的光損會造成可視亮度降低。此外由於彩色濾光層與反射粒子之間的距離，會造成入射光線進入的顏色區域與反射出來的顏色區域不同時，經過不同顏色的濾光後幾乎無光線穿透而全被吸收，造成可視亮度又下降。As shown in Figure 7A, when the electronic paper display uses a color filter to display a color image, the light will be lost once when it enters the color filter, and will be lost again after being reflected. The two light losses will cause the visible brightness to decrease. In addition, due to the distance between the color filter and the reflective particles, the color area where the incident light enters and the color area where it is reflected will be different. After passing through the filters of different colors, almost no light penetrates and is completely absorbed, causing the visible brightness to decrease again.
參見圖18A，依據本發明之一實施例，可於彩色濾光層CF的濾光顏色塊，例如紅色濾光顏色塊CFR、綠色濾光顏色塊CFG及藍色濾光顏色塊CFB上分別設置多個孔洞H。依據一實施方式，至少一個孔洞H的面積不大於100平方微米，或是大多數的孔洞H面積都不大於100平方微米。此外，依據另一實施方式，同色內孔洞H的總面積不小於該顏色總面積的10%。例如對於紅色濾光顏色塊CFR而言，其範圍內孔洞H的總面積不小於紅色濾光顏色塊CFR總面積的10%。藉由設置孔洞H及規劃其個別面積及總和面積，即可減少彩色濾光層CF的光損。Referring to FIG. 18A , according to one embodiment of the present invention, a plurality of holes H may be provided on the filter color blocks of the color filter layer CF, such as the red filter color block CFR, the green filter color block CFG, and the blue filter color block CFB. According to one embodiment, the area of at least one hole H is not greater than 100 square microns, or the area of most holes H is not greater than 100 square microns. In addition, according to another embodiment, the total area of the holes H in the same color is not less than 10% of the total area of the color. For example, for the red filter color block CFR, the total area of the holes H in its range is not less than 10% of the total area of the red filter color block CFR. By setting the holes H and planning their individual areas and total areas, the light loss of the color filter layer CF can be reduced.
復配合參見圖18B，當入射光L2進入在有顏色的區域(例如紅色濾光顏色塊CFR)且反射光也在有顏色的區域(例如紅色濾光顏色塊CFR)時，光線經過了2次的濾光，因此衰減量較高。入射光L1進入在有顏色的區域(例如紅色濾光顏色塊CFR)且反射光在沒有顏色的區域(例如對應孔洞H)時，光線僅經過了1次的濾光，因此衰減量度較低。若入射光進入在沒有顏色的區域(例如對應孔洞H)且反射光在有顏色的區域(例如紅色濾光顏色塊CFR)時，光線經過了1次的濾光，因此衰減量度較低。入射光與反射光都在沒有顏色的區域(例如對應孔洞H)，則沒有濾光衰減，但是出去的顏色為帶電荷顏色粒子26的顏色。不過上述狀況的機率最低，只有在垂直的入射角度附近或是特殊角度入射的光線才會發生，使用本發明具有孔洞H的彩色濾光層CF可以提高顏色的飽和度與亮度，對電子紙的彩色顯示有莫大的助益。Refer to FIG. 18B for a complex combination. When the incident light L2 enters a colored area (e.g., the red filter color block CFR) and the reflected light is also in a colored area (e.g., the red filter color block CFR), the light has been filtered twice, so the attenuation is higher. When the incident light L1 enters a colored area (e.g., the red filter color block CFR) and the reflected light is in an uncolored area (e.g., the corresponding hole H), the light has only been filtered once, so the attenuation is lower. If the incident light enters an uncolored area (e.g., the corresponding hole H) and the reflected light is in a colored area (e.g., the red filter color block CFR), the light has been filtered once, so the attenuation is lower. If both the incident light and the reflected light are in the area without color (e.g. corresponding to the hole H), there is no light filtering attenuation, but the color that comes out is the color of the charged color particle 26. However, the probability of the above situation is the lowest, and it will only occur when the light is incident near the vertical angle of incidence or at a special angle. The use of the color filter layer CF with the hole H of the present invention can improve the color saturation and brightness, which is of great benefit to the color display of the electronic paper.
上述具有孔洞H的彩色濾光層CF，可以運用在習知的電泳式顯示器100中，例如圖2A所示之電泳式顯示器100；也可以運用到具有本發明圖3B-3C、圖4A-4C、圖5A-5C所示的具有高開口率的驅動電路層30之彩色電泳式顯示器100中；也可以運用到具有本發明圖6C所示的可提昇開口率的薄膜電晶體之彩色電泳式顯示器100中；也可以運用到本發明圖7B-7C，圖8A-8B所示之彩色濾光層CF在接近控制基板側的彩色電泳式顯示器100中；也可以運用到本發明圖12A-12C，圖13A-13C，圖14D及圖14E所示之具有微隔間結構50的彩色電泳式顯示器100中；也可以運用到本發明圖15C-15D，圖16C-16D所示之彩色半透明電泳式顯示器100中。因此使用在上述各種實施例及其組合的彩色濾光層CF，都在本發明的保護範圍中。The color filter layer CF having the hole H can be used in a conventional electrophoretic display 100, such as the electrophoretic display 100 shown in FIG. 2A ; it can also be used in a color electrophoretic display 100 having a driving circuit layer 30 with a high aperture ratio as shown in FIGS. 3B-3C , 4A-4C , and 5A-5C of the present invention; it can also be used in a color electrophoretic display 100 having a thin film transistor with an increased aperture ratio as shown in FIG. 6C of the present invention; It can be applied to the color electrophoretic display 100 close to the control substrate side of the color filter layer CF shown in Figures 7B-7C and 8A-8B of the present invention; it can also be applied to the color electrophoretic display 100 with a micro-compartment structure 50 shown in Figures 12A-12C, 13A-13C, 14D and 14E of the present invention; it can also be applied to the color semi-transparent electrophoretic display 100 shown in Figures 15C-15D and 16C-16D of the present invention. Therefore, the color filter layer CF used in the above-mentioned various embodiments and their combinations are all within the protection scope of the present invention.
8.具有內嵌式觸控的電泳式顯示器8. Electrophoretic display with built-in touch
參見圖19，為依據本發明之電泳式顯示器100的內嵌式觸控示意圖。復配合參見本發明圖4A及圖4B之實施例。如圖4B所示，用於提供儲存電容Cs的第二電極之透明導電電極ITO1(CE2)的共同電壓線Ve係沿著閘極線GL大致平行的方向延伸。再者，由第二金屬層M2製作的資料線DL與共同電壓線Ve大致垂直，提供儲存電容Cs的第一電極與第二電極其間夾有絕緣層，其中該些資料線及該些共同電壓線之間的絕緣層係與該些儲存電容的一絕緣層同層(例如儲存電容Cs的絕緣層CI，或是薄膜電晶體32的絕緣層或其延伸)，因此可由資料線DL及透明導電材料ITO1製作的共同電壓線Ve提供互電容觸控感測結構，以使電泳式顯示器100具有內嵌式觸控的功能。復參見圖19，多條沿著閘極線GL的共同電壓線Ve係在延伸到電泳式顯示器100顯示面周緣位置處後，在一顯示觸控整合驅動器200(TDDI)內或是外部以大於一條的方式分組連接在一起。下列即以四條共同電壓線Ve可以電連接成一組以做範例說明。但是依據本發明其他可行實施方式，也可以由其他數目的共同電壓線Ve可以電連接成一組，故本發明下列範例僅為舉例說明，並非用於限制本發明之範圍。例如假設有4M條共同電壓線Ve，且每四條共同電壓線Ve為一組彼此電連接，則共有M組觸控接收電極(Rx)，且分別電連接到顯示觸控整合驅動器200(TDDI)。換言之，依據本發明的一個實施方式，共有4M條共同電壓線Ve電連接到顯示觸控整合驅動器200(TDDI)，且在顯示觸控整合驅動器200(TDDI)內部係藉由多個開關而將每四條共同電壓線Ve為一組電連接在一起，以構成M組觸控接收電極(Rx)。再者，依據本發明的另一個實施方式共有4M條共同電壓線Ve，且每四條共同電壓線Ve電連接在一起，藉此構成M組觸控接收電極(Rx)。M組觸控接收電極(Rx)再電連接到此顯示觸控整合驅動器200(TDDI)。See FIG. 19 for a schematic diagram of an embedded touch screen of an electrophoretic display 100 according to the present invention. See also the embodiments of FIG. 4A and FIG. 4B of the present invention. As shown in FIG. 4B , the common voltage line Ve of the transparent conductive electrode ITO1 (CE2) for providing the second electrode of the storage capacitor Cs extends in a direction substantially parallel to the gate line GL. Furthermore, the data lines DL made of the second metal layer M2 are roughly perpendicular to the common voltage line Ve, providing an insulating layer between the first electrode and the second electrode of the storage capacitor Cs, wherein the insulating layer between the data lines and the common voltage lines is the same layer as an insulating layer of the storage capacitors (for example, the insulating layer CI of the storage capacitor Cs, or the insulating layer of the thin film transistor 32 or its extension). Therefore, a mutual capacitance touch sensing structure can be provided by the data lines DL and the common voltage line Ve made of transparent conductive material ITO1, so that the electrophoretic display 100 has an embedded touch function. Referring again to FIG. 19 , a plurality of common voltage lines Ve along the gate line GL are extended to the peripheral position of the display surface of the electrophoretic display 100 and then connected together in groups in a display touch integrated driver 200 (TDDI) or outside in a manner of more than one line. The following example is used to illustrate that four common voltage lines Ve can be electrically connected into a group. However, according to other feasible implementations of the present invention, other numbers of common voltage lines Ve can also be electrically connected into a group, so the following examples of the present invention are only for illustration and are not intended to limit the scope of the present invention. For example, assuming that there are 4M common voltage lines Ve, and every four common voltage lines Ve are electrically connected to each other as a group, there are M groups of touch receiving electrodes (Rx), and they are electrically connected to the display touch integrated driver 200 (TDDI). In other words, according to an embodiment of the present invention, there are 4M common voltage lines Ve electrically connected to the display touch integrated driver 200 (TDDI), and inside the display touch integrated driver 200 (TDDI), every four common voltage lines Ve are electrically connected together as a group through a plurality of switches to form M groups of touch receiving electrodes (Rx). Furthermore, according to another embodiment of the present invention, there are 4M common voltage lines Ve, and every four common voltage lines Ve are electrically connected together to form M groups of touch receiving electrodes (Rx). The M groups of touch receiving electrodes (Rx) are then electrically connected to the display touch integrated driver 200 (TDDI).
再者，資料線DL由電泳式顯示器100進入顯示觸控整合驅動器200(TDDI)內部後使用切換開關的方式，以大於一條的方式分組連接在一起。下列即以四條資料線DL可以電連接成一組以做範例說明。但是依據本發明其他可行實施方式，也可以由其他數目的資料線DL可以電連接成一組，故本發明下列範例僅為舉例說明，並非用於限制本發明之範圍。例如假設有4N條資料線DL，且在4N條資料線DL電連接顯示觸控整合驅動器200(TDDI)後，可在顯示觸控整合驅動器200(TDDI)內將每四條資料線DL為一組選擇性電連接，以構成N組觸控發射電極(Tx)。此外，上述之選擇性電連接具體係為顯示觸控整合驅動器200(TDDI)可依據所需操作而選擇性將每四條資料線DL為一組電連接在一起，或是選擇性斷開這四條資料線DL的電連接。藉由上述的架構，即可在電泳式顯示器中提供解析度為MxN的內嵌式觸控結構。Furthermore, the data lines DL from the electrophoretic display 100 enter the display touch integrated driver 200 (TDDI) and are connected together in groups of more than one using a switching switch. The following example uses four data lines DL that can be electrically connected into a group as an example. However, according to other feasible implementations of the present invention, other numbers of data lines DL can also be electrically connected into a group. Therefore, the following examples of the present invention are only for illustration and are not intended to limit the scope of the present invention. For example, assuming that there are 4N data lines DL, and after the 4N data lines DL are electrically connected to the display touch integrated driver 200 (TDDI), every four data lines DL can be selectively electrically connected as a group in the display touch integrated driver 200 (TDDI) to form N groups of touch emitter electrodes (Tx). In addition, the above-mentioned selective electrical connection specifically means that the display touch integrated driver 200 (TDDI) can selectively electrically connect every four data lines DL as a group according to the required operation, or selectively disconnect the electrical connection of these four data lines DL. With the above-mentioned architecture, an embedded touch structure with a resolution of MxN can be provided in an electrophoretic display.
在電泳式顯示器100的畫面顯示階段，M組的觸控接收電極(Rx)在顯示觸控整合驅動器200(TDDI)內部電氣連接在一起，以作為共同電壓線Ve(亦即提供Vcom)使用，且顯示觸控整合驅動器200(TDDI)控制4N條資料線DL全部分開作為輸出畫面的控制訊號。在觸控階段，M組的觸控接收電極(Rx)分別作觸控的輸入訊號端，亦即由顯示觸控整合驅動器200(TDDI)對這些共同電壓線Ve分組連接並接收後，再送到一觸控感測電路做後續處理。再者，顯示觸控整合驅動器200(TDDI)控制4N條資料線DL以使每四條資料線DL作為一組電連接以提供N組觸控發射電極(Tx)並由一觸控驅動電路提供發射訊號，藉此成為MxN的內嵌式觸控結構。此外，將觸控驅動積體電路及顯示驅動積體電路整合成一顯示觸控整合驅動器200(TDDI)(Touch with Display Driver)，可以簡化電泳式顯示器100在提供觸控及畫面顯示時之架構。In the screen display stage of the electrophoretic display 100, the M groups of touch receiving electrodes (Rx) are electrically connected together inside the display touch integrated driver 200 (TDDI) to be used as a common voltage line Ve (i.e., to provide Vcom), and the display touch integrated driver 200 (TDDI) controls all 4N data lines DL to be separated as control signals for outputting the screen. In the touch stage, the M groups of touch receiving electrodes (Rx) are respectively used as input signal terminals for touch, i.e., after the display touch integrated driver 200 (TDDI) connects and receives these common voltage lines Ve in groups, they are sent to a touch sensing circuit for subsequent processing. Furthermore, the display touch integrated driver 200 (TDDI) controls 4N data lines DL so that every four data lines DL are electrically connected as a group to provide N groups of touch emission electrodes (Tx) and a touch driver circuit provides emission signals, thereby forming an MxN embedded touch structure. In addition, the touch driver integrated circuit and the display driver integrated circuit are integrated into a display touch integrated driver 200 (TDDI) (Touch with Display Driver), which can simplify the structure of the electrophoretic display 100 when providing touch and screen display.
依據本發明的另一實施方式，此4M條共同電壓線Ve也可以構成M組觸控發射電極(Tx)。相對的，此4N條資料線DL也可以構成N組觸控接收電極(Rx)。例如在4N條資料線DL電連接顯示觸控整合驅動器200(TDDI)後，可在顯示觸控整合驅動器200(TDDI)內將每四條資料線DL為一組選擇性電連接，以構成N組觸控接收電極(Rx)。在電泳式顯示器100的畫面顯示階段，M組的觸控發射電極(Tx)在顯示觸控整合驅動器200(TDDI)內部電氣連接在一起，以作為共同電壓線Ve(亦即提供Vcom)使用，且顯示觸控整合驅動器200(TDDI)控制4N條資料線DL全部分開作為輸出畫面的控制訊號。在觸控階段，一觸控驅動電路提供發射訊號至M組的觸控發射電極(Tx)。再者，顯示觸控整合驅動器200(TDDI)控制4N條資料線DL以使每四條資料線DL作為一組電連接以提供N組觸控接收電極(Rx)，亦即由顯示觸控整合驅動器200(TDDI)對這些資料線分組連接並接收後，再送到一觸控感測電路做後續處理，藉此提供MxN的內嵌式觸控結構。此外，將觸控驅動積體電路及顯示驅動積體電路整合成一顯示觸控整合驅動器200(TDDI)(Touch with Display Driver)，可以簡化電泳式顯示器100在提供觸控及畫面顯示時之架構，此外顯示觸控整合驅動器200，也可以把觸控的感應電路與驅動電路做在其他晶片上，也在本發明的範圍以內。According to another embodiment of the present invention, the 4M common voltage lines Ve can also constitute M groups of touch transmitting electrodes (Tx). In contrast, the 4N data lines DL can also constitute N groups of touch receiving electrodes (Rx). For example, after the 4N data lines DL are electrically connected to the display touch integrated driver 200 (TDDI), every four data lines DL can be selectively electrically connected as a group in the display touch integrated driver 200 (TDDI) to constitute N groups of touch receiving electrodes (Rx). In the screen display stage of the electrophoretic display 100, M groups of touch emitter electrodes (Tx) are electrically connected together inside the display touch integrated driver 200 (TDDI) to be used as a common voltage line Ve (i.e., to provide Vcom), and the display touch integrated driver 200 (TDDI) controls all 4N data lines DL to be separated as control signals for outputting the screen. In the touch stage, a touch driver circuit provides a transmission signal to the M groups of touch emitter electrodes (Tx). Furthermore, the display touch integrated driver 200 (TDDI) controls 4N data lines DL so that every four data lines DL are electrically connected as a group to provide N groups of touch receiving electrodes (Rx), that is, after the display touch integrated driver 200 (TDDI) groups and connects and receives these data lines, they are sent to a touch sensing circuit for subsequent processing, thereby providing an MxN embedded touch structure. In addition, the touch driver integrated circuit and the display driver integrated circuit are integrated into a display touch integrated driver 200 (TDDI) (Touch with Display Driver), which can simplify the structure of the electrophoretic display 100 when providing touch and screen display. In addition, the display touch integrated driver 200 can also make the touch sensing circuit and driving circuit on other chips, which is also within the scope of the present invention.
整合上述的說明，作觸控操作時，該顯示觸控整合驅動器將多個該資料線電連接在一起作為一單一觸控發射電極；該顯示觸控整合驅動器將多個該共同電壓線電連接在一起作為一單一觸控接收電極。或者作觸控操作時，該顯示觸控整合驅動器將多個該資料線電連接在一起作為一單一觸控接收電極；該顯示觸控整合驅動器將多個該共同電壓線電連接在一起作為一單一觸控發射電極。以上兩種方式都在本發明的範疇以內。Integrating the above description, when performing a touch operation, the display touch integrated driver electrically connects multiple data lines together as a single touch emitting electrode; the display touch integrated driver electrically connects multiple common voltage lines together as a single touch receiving electrode. Or when performing a touch operation, the display touch integrated driver electrically connects multiple data lines together as a single touch receiving electrode; the display touch integrated driver electrically connects multiple common voltage lines together as a single touch emitting electrode. Both of the above methods are within the scope of the present invention.
在上述說明中，雖然係以4M條共同電壓線Ve為例，且每四條共同電壓線Ve為一組彼此電連接，以組成M組觸控接收電極(Rx)或是M組觸控發射電極(Tx)作為說明，但是上述範例不應為本發明範圍限制，本領域人員可以設計使不同數量(至少大於一)的共同電壓線Ve為一組彼此電連接。再者在上述說明中，雖然係以4N條資料線DL為例，且每四條資料線DL為一組彼此電連接，以組成N組觸控發射電極(Tx)或是N組觸控接收電極(Rx)作為說明，但是上述範例不應為本發明範圍限制，本領域人員可以設計使不同數量(至少大於一)的資料線DL為一組於觸控操作時彼此電連接。In the above description, although 4M common voltage lines Ve are taken as an example, and every four common voltage lines Ve are electrically connected to each other as a group to form M groups of touch receiving electrodes (Rx) or M groups of touch transmitting electrodes (Tx) for illustration, the above example should not be limited to the scope of the present invention. Those skilled in the art can design to make different numbers (at least greater than one) of common voltage lines Ve electrically connected to each other as a group. Furthermore, in the above description, although 4N data lines DL are used as an example, and every four data lines DL are electrically connected to each other as a group to form N groups of touch transmitting electrodes (Tx) or N groups of touch receiving electrodes (Rx) for illustration, the above example should not be limited to the scope of the present invention. Persons skilled in the art can design different numbers (at least greater than one) of data lines DL to be electrically connected to each other as a group during touch operation.
具有圖19所示內嵌式觸控的電泳式顯示器可具有如本發明圖3B-3C、圖4A-4C、圖5A-5C所示的具有高開口率的驅動電路層30及控制電路層PEL架構。再者，具有圖19所示內嵌式觸控的電泳式顯示器可具有如圖11A-11C、圖12A-12C，圖13A-13C，圖14A-圖14E所示之微隔間結構50及相應微卡榫60架構。The electrophoretic display with embedded touch as shown in FIG. 19 may have a driving circuit layer 30 and a control circuit layer PEL structure with a high opening rate as shown in FIG. 3B-3C, FIG. 4A-4C, and FIG. 5A-5C of the present invention. Furthermore, the electrophoretic display with embedded touch as shown in FIG. 19 may have a micro-compartment structure 50 and a corresponding micro-tenon 60 structure as shown in FIG. 11A-11C, FIG. 12A-12C, FIG. 13A-13C, and FIG. 14A-FIG. 14E.
9.具有雙面控制基板之電泳式顯示器9. Electrophoretic display with double-sided control substrate
如圖20A所示，為依據本發明一實施例之具有雙面控制基板之電泳式顯示器。此具有雙面控制基板之電泳式顯示器100具有由上至下之一第二控制基板10U、一微隔間結構50及一第一控制基板10D。再者，第一控制基板10D具有一第一表面及與該微隔間結構50接近的一第二表面，於第一控制基板10D的第二表面上具有一第一高開口率驅動電路層30D及一第一控制電極層PELD(具有多個第一控制電極PED)。第二控制基板10U具有一第四表面及與該微隔間結構50接近的一第三表面，於第二控制基板10U的第三表面上具有一第二高開口率驅動電路層30U及一第二控制電極層PELU(具有多個第二控制電極PEU)。依據本發明之一實施方式，製作具有雙面控制基板之電泳式顯示器100時，係在第一控制基板10D側製作具有多個隔間壁52之微隔間結構50。更詳細而言，首先第一控制基板10D上製作第一驅動電路層30D、第一透明控制電極層PELD及絕緣保護層(未圖示)，再製作彩色濾光層CF。在本實施例中，可以於彩色濾光層CF完成後進行圖17A至17F之隔間壁52製程，也可以於彩色濾光層CF上製作一層平坦層PLN後進行圖17A至17F之隔間壁52製程。上述的平坦層PLN的材料可為有機絕緣材料、無機絕緣材料或其組合。在製作完成隔間壁52可在真空的工作條件下，在隔間壁52所界定的槽室54內填入膠體溶液，該膠體溶液內含帶電荷黑色粒子26B及帶電荷白色粒子26W。隨後進行貼上第二控制基板10U製程，亦即提供一具第二高開口率驅動電路層30U及第二控制電極層PELU的第二控制基板10U，此外，如圖20A所示。在第二控制電極層PELU上具有與槽室54形狀相應的微卡榫60。As shown in FIG. 20A , an electrophoretic display with a double-sided control substrate according to an embodiment of the present invention is shown. The electrophoretic display with a double-sided control substrate 100 has, from top to bottom, a second control substrate 10U, a micro-compartment structure 50, and a first control substrate 10D. Furthermore, the first control substrate 10D has a first surface and a second surface close to the micro-compartment structure 50, and has a first high-opening ratio driving circuit layer 30D and a first control electrode layer PELD (having a plurality of first control electrodes PED) on the second surface of the first control substrate 10D. The second control substrate 10U has a fourth surface and a third surface close to the micro-compartment structure 50, and has a second high-opening ratio driving circuit layer 30U and a second control electrode layer PELU (having a plurality of second control electrodes PEU) on the third surface of the second control substrate 10U. According to one embodiment of the present invention, when manufacturing an electrophoretic display 100 having a double-sided control substrate, a micro-compartment structure 50 having a plurality of partition walls 52 is manufactured on the first control substrate 10D side. More specifically, firstly, a first driving circuit layer 30D, a first transparent control electrode layer PELD and an insulating protective layer (not shown) are manufactured on the first control substrate 10D, and then a color filter layer CF is manufactured. In this embodiment, the partition wall 52 manufacturing process of Figures 17A to 17F can be performed after the color filter layer CF is completed, or the partition wall 52 manufacturing process of Figures 17A to 17F can be performed after a flat layer PLN is manufactured on the color filter layer CF. The material of the flat layer PLN can be an organic insulating material, an inorganic insulating material or a combination thereof. After the partition wall 52 is manufactured, a colloidal solution can be filled into the chamber 54 defined by the partition wall 52 under vacuum working conditions. The colloidal solution contains charged black particles 26B and charged white particles 26W. Then, a second control substrate 10U is attached, that is, a second control substrate 10U having a second high opening rate driving circuit layer 30U and a second control electrode layer PELU is provided. In addition, as shown in FIG. 20A , a micro-tenon 60 corresponding to the shape of the chamber 54 is provided on the second control electrode layer PELU.
復配合參見圖14F，微卡榫60可以使用透明光阻透過曝光顯影後，留下微卡榫的區域，其餘清洗掉；此外微卡榫的製作也可以使用平坦層(PLN)經過微影製程留下微卡榫的區域。微卡榫60與微隔間結構50的槽室54的邊壁之間要保持一定的間隙S，以作為對準裕隙。此間隙S例如為1~50um的間隙。依據本發明的一實施方式，此間隙範圍在1~5um之間，配合光罩對位的精度而定，作為對位貼合時的誤差容許範圍，避免對位貼合由於誤差造成微隔間與微卡榫碰撞而損壞。微卡榫的厚度可以為0.5~50um，厚度越厚可以密封的越牢固，但是會影響控制電極的吸引力或是排斥力，所以密封程度與電氣效應需要做合理的分配，依據本發明的一實施方式，微卡榫60厚度範圍也在1~5um之間。Refer to FIG. 14F for the complex matching. The micro-tenon 60 can be made by using a transparent photoresist to expose and develop, leaving the micro-tenon area and cleaning the rest. In addition, the micro-tenon can also be made by using a flat layer (PLN) through a lithography process to leave the micro-tenon area. A certain gap S should be maintained between the micro-tenon 60 and the side wall of the groove chamber 54 of the micro-compartment structure 50 as an alignment margin. This gap S is, for example, a gap of 1 to 50 um. According to one embodiment of the present invention, this gap ranges from 1 to 5 um, which is determined in conjunction with the accuracy of the mask alignment, as an allowable error range during alignment and bonding, to avoid damage to the micro-compartment and the micro-tenon due to collision caused by errors in alignment and bonding. The thickness of the micro-clip can be 0.5~50um. The thicker the thickness, the more secure the seal. However, it will affect the attraction or repulsion of the control electrode. Therefore, the sealing degree and the electrical effect need to be reasonably allocated. According to one embodiment of the present invention, the thickness of the micro-clip 60 is also between 1~5um.
如圖20A所示，運用第一控制電極PED與第二控制電極PEU在驅動時給予相異極性的電壓，可以加速帶電荷粒子的移動，並可解離正、負電荷粒子團聚產生的欉集現象，可以加快畫面的更新速度與提高反射率。當上方的第二驅動電路層30U控制第二控制基板10U處的電極(第二控制電極PEU)帶負電，下方的第一驅動電路層30D控制第一控制基板10D相應的電極(第一控制電極PED)帶正電時，帶正電的黑色粒子26B會移往上方之第二控制電極PEU；帶負電的白色粒子26W會移往下方的第一控制電極PED，讓下方的第一控制電極PED的位置與彩色濾光層CF的相應濾光顏色塊配合而顯示彩色像素。更具體而言，由於下方的第一驅動電路層30D控制此第一控制電極PED對於帶負電的白色粒子26W產生吸引力，可讓白色粒子貼附在PED的表面，由第一控制基板10D的第一表面看到經由白色粒子反射後的彩色濾光塊顏色，而上方的第二驅動電路層30U控制此第二控制電極PEU對於帶負電的白色粒子26W產生推斥力，加速讓白色粒子往第一控制電極PED移動，達成具有雙面控制基板之電泳式顯示器畫面更新速度加快的顯示效果。上述操作係以觀看面在第一表面為例，可在第一表面呈現更新率更佳的彩色畫面。類似的，若觀看面在第二控制基板10U第四表面(最遠離第一表面之側)，則可在第四表面呈現更新率更佳的黑白畫面，此外兩基板所產生的吸引力與推斥力遠大於習知技術的吸引力與推斥力，可以有效的解離由正、負帶電荷粒子團聚所產生的叢集現象，因此可以用更高密度的帶電荷粒子濃度，增加粒子在控制電極PEU與PED的堆疊的層數，便可提高光的反射率。As shown in FIG. 20A , by applying voltages of opposite polarity to the first control electrode PED and the second control electrode PEU during driving, the movement of charged particles can be accelerated, and the clustering phenomenon caused by the agglomeration of positive and negative charged particles can be dissociated, thereby speeding up the screen update speed and improving the reflectivity. When the upper second driving circuit layer 30U controls the electrode (second control electrode PEU) at the second control substrate 10U to be negatively charged, and the lower first driving circuit layer 30D controls the corresponding electrode (first control electrode PED) of the first control substrate 10D to be positively charged, the positively charged black particles 26B will move to the upper second control electrode PEU; the negatively charged white particles 26W will move to the lower first control electrode PED, so that the position of the lower first control electrode PED cooperates with the corresponding filter color block of the color filter layer CF to display color pixels. More specifically, the first driving circuit layer 30D below controls the first control electrode PED to generate an attraction force for the negatively charged white particles 26W, allowing the white particles to adhere to the surface of PED, and the color of the color filter block after the reflection of the white particles can be seen from the first surface of the first control substrate 10D, while the second driving circuit layer 30U above controls the second control electrode PEU to generate a repulsive force for the negatively charged white particles 26W, accelerating the movement of the white particles toward the first control electrode PED, achieving a display effect with a faster screen update speed of the electrophoretic display with a double-sided control substrate. The above operation is based on the example of the viewing surface on the first surface, and a color screen with a better update rate can be presented on the first surface. Similarly, if the viewing surface is on the fourth surface of the second control substrate 10U (the side farthest from the first surface), a black and white image with a better refresh rate can be presented on the fourth surface. In addition, the attraction and repulsion generated by the two substrates are much greater than the attraction and repulsion of the conventional technology, which can effectively dissolve the clustering phenomenon caused by the agglomeration of positive and negative charged particles. Therefore, a higher density of charged particles can be used to increase the number of stacked layers of particles in the control electrodes PEU and PED, which can improve the reflectivity of light.
如圖20B所示，為依據本發明另一實施例之具有雙面控制基板之電泳式顯示器。此具有雙面控制基板之電泳式顯示器100具有由上至下之一第二控制基板10U、一微隔間結構50及一第一控制基板10D。再者，第一控制基板10D具有一第一表面及與該微隔間結構50接近的一第二表面，於第一控制基板10D的第二表面上具有一第一高開口率驅動電路層30D及一第一控制電極層PELD(具有多個第一控制電極PED)。第二控制基板10U具有一第四表面及與該微隔間結構50接近的一第三表面，於第二控制基板10U的第三表面上具有一第二高開口率驅動電路層30U及一第二控制電極層PELU(具有多個第二控制電極PEU)。依據本發明之一實施方式，製作具有雙面控制基板之電泳式顯示器100時，係在第一控制基板10D側製作具有多個隔間壁52之微隔間結構50。更詳細而言，首先第一控制基板10D上製作第一驅動電路層30D、第一透明控制電極層PELD及絕緣保護層(未圖示)，再於第一透明控制電極層PELD進行圖17A至17F之隔間壁52製程，也可以於第一透明控制電極層PELD上製作一層平坦層PLN後進行圖17A至17F之隔間壁52製程。上述的平坦層PLN的材料可為有機絕緣材料、無機絕緣材料或其組合。在製作完成隔間壁52可在真空的工作條件下，在隔間壁52所界定的槽室54內填入膠體溶液，該膠體溶液內含帶電荷彩色粒子，例如帶電荷青色粒子26C、帶電荷洋紅色粒子26M、帶電荷黃色粒子26Y及帶電荷白色粒子26W。隨後進行貼上第二控制基板10U製程，亦即提供一具第二高開口率驅動電路層30U及第二控制電極層PELU的第二控制基板10U，此外，如圖20B所示。在第二控制電極層PELU上具有與槽室54形狀相應的微卡榫60。As shown in FIG. 20B , an electrophoretic display with a double-sided control substrate according to another embodiment of the present invention is shown. The electrophoretic display 100 with a double-sided control substrate has, from top to bottom, a second control substrate 10U, a micro-compartment structure 50, and a first control substrate 10D. Furthermore, the first control substrate 10D has a first surface and a second surface close to the micro-compartment structure 50, and has a first high-opening-ratio driving circuit layer 30D and a first control electrode layer PELD (having a plurality of first control electrodes PED) on the second surface of the first control substrate 10D. The second control substrate 10U has a fourth surface and a third surface close to the micro-compartment structure 50, and has a second high-opening-ratio driving circuit layer 30U and a second control electrode layer PELU (having a plurality of second control electrodes PEU) on the third surface of the second control substrate 10U. According to one embodiment of the present invention, when manufacturing an electrophoretic display 100 with a double-sided control substrate, a micro-compartment structure 50 having a plurality of partition walls 52 is manufactured on the first control substrate 10D side. More specifically, firstly, a first driving circuit layer 30D, a first transparent control electrode layer PELD and an insulating protective layer (not shown) are manufactured on the first control substrate 10D, and then the partition wall 52 process of Figures 17A to 17F is performed on the first transparent control electrode layer PELD. Alternatively, a flat layer PLN may be manufactured on the first transparent control electrode layer PELD before the partition wall 52 process of Figures 17A to 17F is performed. The material of the above-mentioned flat layer PLN may be an organic insulating material, an inorganic insulating material or a combination thereof. After the partition wall 52 is manufactured, a colloidal solution can be filled into the chamber 54 defined by the partition wall 52 under vacuum working conditions. The colloidal solution contains charged color particles, such as charged cyan particles 26C, charged magenta particles 26M, charged yellow particles 26Y, and charged white particles 26W. Then, a second control substrate 10U is attached, that is, a second control substrate 10U having a second high opening rate driving circuit layer 30U and a second control electrode layer PELU is provided. In addition, as shown in FIG. 20B , a micro-tenon 60 corresponding to the shape of the chamber 54 is provided on the second control electrode layer PELU.
復配合參見圖14F，微卡榫60可以使用透明光阻透過曝光顯影後，留下微卡榫的區域，其餘清洗掉；此外微卡榫的製作也可以使用平坦層(PLN)經過微影製程留下微卡榫的區域。微卡榫60與微隔間結構50的槽室54的邊壁之間要保持一定的間隙S，以作為對準裕隙。此間隙S例如為1~50um的間隙。依據本發明的一實施方式，此間隙範圍在1~5um之間，配合光罩對位的精度而定，作為對位貼合時的誤差容許範圍，避免對位貼合由於誤差造成微隔間與微卡榫碰撞而損壞。微卡榫的厚度可以為0.5~50um，厚度越厚可以密封的越牢固，但是會影響控制電極的吸引力或是排斥力，所以密封程度與電氣效應需要做合理的分配，依據本發明的一實施方式，微卡榫60厚度範圍也在1~5um之間。Refer to FIG. 14F for the complex matching. The micro-tenon 60 can be made by using a transparent photoresist to expose and develop, leaving the micro-tenon area and cleaning the rest. In addition, the micro-tenon can also be made by using a flat layer (PLN) through a lithography process to leave the micro-tenon area. A certain gap S should be maintained between the micro-tenon 60 and the side wall of the groove chamber 54 of the micro-compartment structure 50 as an alignment margin. This gap S is, for example, a gap of 1 to 50 um. According to one embodiment of the present invention, this gap ranges from 1 to 5 um, which is determined in conjunction with the accuracy of the mask alignment, as an allowable error range during alignment and bonding, to avoid damage to the micro-compartment and the micro-tenon due to collision caused by errors in alignment and bonding. The thickness of the micro-clip can be 0.5~50um. The thicker the thickness, the more secure the seal. However, it will affect the attraction or repulsion of the control electrode. Therefore, the sealing degree and the electrical effect need to be reasonably allocated. According to one embodiment of the present invention, the thickness of the micro-clip 60 is also between 1~5um.
如圖20B所示，當上方的第二驅動電路層30U控制第二控制基板10U處的電極(第二控制電極PEU)帶負電，下方的第一驅動電路層30D控制此第一控制基板10D相應的電極(第一控制電極PED)帶正電時，可控制帶電荷青色粒子26C(正電荷)、帶電荷洋紅色粒子26M(正電荷)、帶電荷黃色粒子26Y(負電荷)及帶電荷白色粒子26W(負電荷)往相應方向移動。舉例而言，由於下方的第一驅動電路層30D控制此第一控制電極PED對於帶負電的白色粒子26W與黃色粒子26Y產生吸引力，對於帶正電的洋紅色粒子26M與青色粒子26C產生推斥力，而上方的第二驅動電路層30U控制此第二控制電極PEU對於帶正電的洋紅色粒子26M與青色粒子26C產生吸引力，對於帶負電的白色粒子26W與黃色粒子26Y產生推斥力，且由於其帶電荷數的不同吸引力也會不同，可以藉由電壓的變化與極性的變化，來控制4種帶電荷粒子的移動行為，由於雙面控制電極PED與PEU的電荷極性不同，可以讓電荷的移動速度比習之技術快上數倍，讓畫面的更新速度加快，且可以解決帶電荷粒子密度較高時發生的叢集現象，可以用較高密度帶電荷粒子的膠體溶液，增加接觸控制電極PED與PEU表面的粒子堆疊層數，增加光的反射率，改善習之技術反射率不足的缺點，達成具有雙面控制基板之電泳式顯示器100之更佳畫面更新率與反射率的進步性。As shown in Figure 20B, when the upper second driving circuit layer 30U controls the electrode (second control electrode PEU) at the second control substrate 10U to be negatively charged, and the lower first driving circuit layer 30D controls the corresponding electrode (first control electrode PED) of the first control substrate 10D to be positively charged, the charged cyan particles 26C (positive charge), the charged magenta particles 26M (positive charge), the charged yellow particles 26Y (negative charge) and the charged white particles 26W (negative charge) can be controlled to move in corresponding directions. For example, the first driving circuit layer 30D below controls the first control electrode PED to generate attraction for the negatively charged white particles 26W and yellow particles 26Y, and repulsion for the positively charged magenta particles 26M and cyan particles 26C, while the second driving circuit layer 30U above controls the second control electrode PEU to generate attraction for the positively charged magenta particles 26M and cyan particles 26C, and repulsion for the negatively charged white particles 26W and yellow particles 26Y. The attraction will be different due to the different charges, and the voltage and polarity can be changed. The movement of the four kinds of charged particles can be controlled by changing the charge polarity of the double-sided control electrodes PED and PEU. The charge movement speed can be several times faster than the conventional technology, which speeds up the screen update speed and solves the clustering phenomenon that occurs when the density of charged particles is high. A colloidal solution with higher density charged particles can be used to increase the number of particle stacking layers contacting the surfaces of the control electrodes PED and PEU, increase the light reflectivity, and improve the defect of insufficient reflectivity of the conventional technology, thereby achieving a better screen update rate and reflectivity of the electrophoretic display 100 with a double-sided control substrate.
如圖20C所示，為依據本發明另一實施例之具有雙面控制基板之電泳式顯示器。此具有雙面控制基板之電泳式顯示器100具有由上至下之一第二控制基板10U、一微隔間結構50及一第一控制基板10D。再者，第一控制基板10D具有一第一表面及與該微隔間結構50接近的一第二表面，於第一控制基板10D的第二表面上具有一第一高開口率驅動電路層30D及一第一控制電極層PELD(具有多個第一控制電極PED)。第二控制基板10U具有一第四表面及與該微隔間結構50接近的一第三表面，於第二控制基板10U的第三表面上具有一第二高開口率驅動電路層30U及一第二控制電極層PELU(具有多個第二控制電極PEU)。依據本發明之一實施方式，製作具有雙面控制基板之電泳式顯示器100時，係在第一控制基板10D側製作具有多個隔間壁52之微隔間結構50。更詳細而言，首先第一控制基板10D上製作第一驅動電路層30D、第一透明控制電極層PELD及絕緣保護層(未圖示)，再製作第一彩色濾光層CF-1。在本實施例中，可以於第一彩色濾光層CF-1完成後進行圖17A至17F之隔間壁52製程，也可以於第一彩色濾光層CF-1上製作一層平坦層PLN後進行圖17A至17F之隔間壁52製程。上述的平坦層PLN的材料可為有機絕緣材料、無機絕緣材料或其組合。在製作完成隔間壁52可在真空的工作條件下，在隔間壁52所界定的槽室54內填入膠體溶液，該膠體溶液內含帶電荷黑色粒子26B及帶電荷白色粒子26W。隨後進行貼上第二控制基板10U製程，亦即提供一具第二高開口率驅動電路層30U及第二控制電極層PELU的第二控制基板10U，此外，如圖20C所示。在第二控制電極層PELU上具有一第二彩色濾光層CF-2。並在第二控制基板10U及隔間壁52之間使用光學膠或是在顯示區的四個邊框塗上框膠後進行貼合，完成後送入氣體加壓腔內加熱加壓兩片基板，完成把膠體溶液擠入並填滿微隔間結構50內的空隙，最後再固化光學膠或是框膠，完成製作電泳式顯示器100成品。As shown in FIG. 20C , an electrophoretic display with a double-sided control substrate according to another embodiment of the present invention is shown. The electrophoretic display with a double-sided control substrate 100 has, from top to bottom, a second control substrate 10U, a micro-compartment structure 50, and a first control substrate 10D. Furthermore, the first control substrate 10D has a first surface and a second surface close to the micro-compartment structure 50, and has a first high-opening ratio driving circuit layer 30D and a first control electrode layer PELD (having a plurality of first control electrodes PED) on the second surface of the first control substrate 10D. The second control substrate 10U has a fourth surface and a third surface close to the micro-compartment structure 50, and has a second high-opening ratio driving circuit layer 30U and a second control electrode layer PELU (having a plurality of second control electrodes PEU) on the third surface of the second control substrate 10U. According to one embodiment of the present invention, when manufacturing an electrophoretic display 100 having a double-sided control substrate, a micro-compartment structure 50 having a plurality of partition walls 52 is manufactured on the first control substrate 10D side. More specifically, firstly, a first driving circuit layer 30D, a first transparent control electrode layer PELD and an insulating protective layer (not shown) are manufactured on the first control substrate 10D, and then a first color filter layer CF-1 is manufactured. In this embodiment, the partition wall 52 process of Figures 17A to 17F can be performed after the first color filter layer CF-1 is completed, or the partition wall 52 process of Figures 17A to 17F can be performed after a flat layer PLN is manufactured on the first color filter layer CF-1. The material of the flat layer PLN can be an organic insulating material, an inorganic insulating material or a combination thereof. After the partition wall 52 is manufactured, a colloidal solution can be filled into the chamber 54 defined by the partition wall 52 under vacuum working conditions. The colloidal solution contains charged black particles 26B and charged white particles 26W. Then, a second control substrate 10U is attached, that is, a second control substrate 10U having a second high opening rate driving circuit layer 30U and a second control electrode layer PELU is provided. In addition, as shown in FIG. 20C , a second color filter layer CF-2 is provided on the second control electrode layer PELU. Optical glue is used between the second control substrate 10U and the partition wall 52, or frame glue is applied to the four side frames of the display area for bonding. After completion, the two substrates are sent into a gas pressure chamber for heating and pressurization to squeeze the colloid solution into and fill the gaps in the micro-compartment structure 50. Finally, the optical glue or frame glue is cured to complete the production of the electrophoretic display 100 product.
如圖20C所示，當上方的第二驅動電路層30U控制第二控制基板10U處的電極(第二控制電極PEU)帶負電，下方的第一驅動電路層30D控制此第一控制基板10D相應的電極(第一控制電極PED)帶正電時，帶正電的黑色粒子26B會移往上方之第二控制電極PEU；帶負電的白色粒子26W會移往下方的第一控制電極PED，讓下方的第一控制電極PED的位置與彩色濾光層CF的相應濾光顏色塊配合而顯示彩色像素。更具體而言，由於下方的第一驅動電路層30D控制此第一控制電極PED對於帶負電的白色粒子26W產生吸引力，而上方的第二驅動電路層30U控制此第二控制電極PEU對於帶負電的白色粒子26W產生推斥力，即可加速白色粒子26W的移動速度，達成具有雙面控制基板之電泳式顯示器100之更佳畫面更新率，此外兩基板所產生的吸引力與推斥力遠大於習之技術的吸引力與推斥力，可以有效的解離由正、負帶電荷粒子團聚所產生的叢集現象，因此可以用更高密度的帶電荷粒子濃度，增加粒子在控制電極PEU與PED的堆疊的層數，便可提高光的反射率。As shown in Figure 20C, when the upper second driving circuit layer 30U controls the electrode (second control electrode PEU) at the second control substrate 10U to be negatively charged, and the lower first driving circuit layer 30D controls the corresponding electrode (first control electrode PED) of the first control substrate 10D to be positively charged, the positively charged black particles 26B will move to the upper second control electrode PEU; the negatively charged white particles 26W will move to the lower first control electrode PED, so that the position of the lower first control electrode PED cooperates with the corresponding filter color block of the color filter layer CF to display color pixels. More specifically, since the first driving circuit layer 30D below controls the first control electrode PED to generate an attractive force for the negatively charged white particles 26W, and the second driving circuit layer 30U above controls the second control electrode PEU to generate a repulsive force for the negatively charged white particles 26W, the moving speed of the white particles 26W can be accelerated, and a better screen refresh rate of the electrophoretic display 100 with a double-sided control substrate can be achieved. In addition, the attractive force and repulsive force generated by the two substrates are much greater than the attractive force and repulsive force of the conventional technology, which can effectively dissolve the clustering phenomenon caused by the agglomeration of positive and negative charged particles. Therefore, a higher density of charged particles can be used to increase the number of stacked layers of particles in the control electrodes PEU and PED, thereby improving the reflectivity of light.
如圖20C所示，當上方的第二驅動電路層30U控制第二控制基板10U處的電極(第二控制電極PEU)，下方的第一驅動電路層30D控制此第一控制基板10D相應的電極(第一控制電極PED)，PEU與PED的電荷呈現各自顯示畫面所需的電壓時，本發明實施例可以做為雙面顯示不同彩色畫面的電泳顯示器，當上下電極(上方的第二控制電極PEU及下方相應第一控制電極PED)為相同極性時，例如都帶正電荷時，此時帶負電的白色粒子26W會移往上下兩電極，讓上下兩電極顯示白色像素所反射的彩色濾光塊的顏色，帶正電的黑色粒子26B會往中間移動而被白色粒子26W遮蔽看不到。反之上下電極都帶負電荷時，帶正電的黑色粒子26B會移往上下兩電極，白色粒子26W會往中間移動，被黑色粒子26B遮蔽而看不到，這時上下兩電極顯示黑色像素，例如上下電極的電荷極性對調時，帶正電的黑色粒子26B會往帶負電荷的控制電極移動而在該控制電極的觀看面呈現黑色，帶負電的白色粒子26W會往帶正電的控制電極移動而在該控制電極的觀看面呈現白色像素所反射的彩色濾光塊的顏色，如此在10D的第一表面看到的畫面可以與10U第四表面看到的畫面不同，呈現雙面彩色畫面顯示的電泳顯示器100。As shown in FIG. 20C , when the upper second driving circuit layer 30U controls the electrode (second control electrode PEU) at the second control substrate 10U, and the lower first driving circuit layer 30D controls the corresponding electrode (first control electrode PED) of the first control substrate 10D, and the charges of PEU and PED present the voltage required for each display screen, the embodiment of the present invention can be used as a double-sided display of different color pictures. In the electrophoretic display, when the upper and lower electrodes (the upper second control electrode PEU and the corresponding lower first control electrode PED) are of the same polarity, for example, both are positively charged, the negatively charged white particles 26W will move to the upper and lower electrodes, allowing the upper and lower electrodes to display the color of the color filter block reflected by the white pixel, and the positively charged black particles 26B will move to the middle and be blocked by the white particles 26W and cannot be seen. On the contrary, when both the upper and lower electrodes are negatively charged, the positively charged black particles 26B will move to the upper and lower electrodes, and the white particles 26W will move to the middle and be blocked by the black particles 26B and cannot be seen. At this time, the upper and lower electrodes display black pixels. For example, when the charge polarity of the upper and lower electrodes is reversed, the positively charged black particles 26B will move to the negatively charged control electrode and appear black on the viewing surface of the control electrode, and the negatively charged white particles 26W will move to the positively charged control electrode and appear the color of the color filter block reflected by the white pixel on the viewing surface of the control electrode. In this way, the picture seen on the first surface of 10D can be different from the picture seen on the fourth surface of 10U, presenting an electrophoretic display 100 with double-sided color picture display.
然以上所述者，僅為本發明之較佳實施例，當不能限定本發明實施之範圍，即凡依本發明申請專利範圍所作之均等變化與修飾等，皆應仍屬本發明之專利涵蓋範圍意圖保護之範疇。本發明還可有其它多種實施例，在不背離本發明精神及其實質的情況下，熟悉本領域的技術人員當可根據本發明作出各種相應的改變和變形，但這些相應的改變和變形都應屬於本發明所附的權利要求的保護範圍。綜上所述，當知本發明已具有產業利用性、新穎性與進步性，又本發明之構造亦未曾見於同類產品及公開使用，完全符合發明專利申請要件，爰依專利法提出申請。However, the above is only the preferred embodiment of the present invention, and it should not limit the scope of the implementation of the present invention. That is, all equivalent changes and modifications made according to the scope of the patent application of the present invention should still fall within the scope of the patent coverage of the present invention. The present invention can also have many other embodiments. Without departing from the spirit and essence of the present invention, technicians familiar with the field can make various corresponding changes and modifications based on the present invention, but these corresponding changes and modifications should fall within the scope of protection of the claims attached to the present invention. In summary, it is known that this invention has industrial applicability, novelty and advancement, and the structure of this invention has never been seen in similar products and has never been used publicly, so it fully meets the requirements for invention patent application, and therefore an application is filed in accordance with the Patent Law.
100:電泳式顯示器100: Electrophoretic display
10:控制基板10: Control board
12:相對基板12: Relative substrate
13:光學膠13: Optical glue
14:共同電極層14: Common electrode layer
26W:帶電荷白色粒子26W: Charged white particles
26C:帶電荷青色粒子26C: Charged cyan particles
26M:帶電荷洋紅色粒子26M: Charged magenta particles
26Y:帶電荷黃色粒子26Y: Charged yellow particles
30:驅動電路層30: Driving circuit layer
PEL:控制電極層PEL: Control electrode layer
50:微隔間結構50: Micro-compartment structure
54:槽室54: Tank room
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW112135043ATWI854833B (en) | 2023-09-14 | 2023-09-14 | Electrophoresis display with vacuum-filled micro partition structure |
| CN202411279107.4ACN119620498A (en) | 2023-09-14 | 2024-09-12 | Vacuum-filled electrophoretic display with micro-compartment structure |
| KR1020240124676AKR102870136B1 (en) | 2023-09-14 | 2024-09-12 | Electrophoresis display with vacuum-filled micro partition structure |
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW112135043ATWI854833B (en) | 2023-09-14 | 2023-09-14 | Electrophoresis display with vacuum-filled micro partition structure |
| Publication Number | Publication Date |
|---|---|
| TWI854833Btrue TWI854833B (en) | 2024-09-01 |
| TW202511835A TW202511835A (en) | 2025-03-16 |
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW112135043ATWI854833B (en) | 2023-09-14 | 2023-09-14 | Electrophoresis display with vacuum-filled micro partition structure |
| Country | Link |
|---|---|
| CN (1) | CN119620498A (en) |
| TW (1) | TWI854833B (en) |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201205522A (en)* | 2010-07-22 | 2012-02-01 | Chi-Yuan Huang | Method for manufacturing flexible display panel |
| TW201213451A (en)* | 2010-08-07 | 2012-04-01 | Merck Patent Gmbh | Particles for electrophoretic displays |
| TW201307976A (en)* | 2011-08-08 | 2013-02-16 | Toray Advanced Mat Korea Inc | Dielectric adhesive film for electronic paper display device |
| TW201730983A (en)* | 2009-07-10 | 2017-09-01 | 半導體能源研究所股份有限公司 | Semiconductor device and method for manufacturing the same |
| Publication number | Priority date | Publication date | Assignee | Title |
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| TW201730983A (en)* | 2009-07-10 | 2017-09-01 | 半導體能源研究所股份有限公司 | Semiconductor device and method for manufacturing the same |
| TW201205522A (en)* | 2010-07-22 | 2012-02-01 | Chi-Yuan Huang | Method for manufacturing flexible display panel |
| TW201213451A (en)* | 2010-08-07 | 2012-04-01 | Merck Patent Gmbh | Particles for electrophoretic displays |
| TW201307976A (en)* | 2011-08-08 | 2013-02-16 | Toray Advanced Mat Korea Inc | Dielectric adhesive film for electronic paper display device |
| Publication number | Publication date |
|---|---|
| TW202511835A (en) | 2025-03-16 |
| CN119620498A (en) | 2025-03-14 |
| KR20250039908A (en) | 2025-03-21 |
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